WO2024014457A1 - 薄膜高分子積層コンデンサ及びその製造方法 - Google Patents
薄膜高分子積層コンデンサ及びその製造方法 Download PDFInfo
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- WO2024014457A1 WO2024014457A1 PCT/JP2023/025579 JP2023025579W WO2024014457A1 WO 2024014457 A1 WO2024014457 A1 WO 2024014457A1 JP 2023025579 W JP2023025579 W JP 2023025579W WO 2024014457 A1 WO2024014457 A1 WO 2024014457A1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
- H01G4/06—Solid dielectrics
- H01G4/14—Organic dielectrics
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
- H01G4/06—Solid dielectrics
- H01G4/14—Organic dielectrics
- H01G4/18—Organic dielectrics of synthetic material, e.g. derivatives of cellulose
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
- C08F220/301—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one oxygen in the alcohol moiety
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/10—Esters
- C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
- C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
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- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D135/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical, and containing at least another carboxyl radical in the molecule, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D135/02—Homopolymers or copolymers of esters
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/30—Stacked capacitors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/30—Stacked capacitors
- H01G4/306—Stacked capacitors made by thin film techniques
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/33—Thin- or thick-film capacitors (thin- or thick-film circuits; capacitors without a potential-jump or surface barrier specially adapted for integrated circuits, details thereof, multistep manufacturing processes therefor)
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2800/00—Copolymer characterised by the proportions of the comonomers expressed
- C08F2800/10—Copolymer characterised by the proportions of the comonomers expressed as molar percentages
Definitions
- the present invention relates to a thin film polymer multilayer capacitor and a method for manufacturing the same.
- a capacitor As a capacitor, a capacitor having a structure in which dielectric layers containing resin and electrode layers containing metal are alternately laminated is known.
- Patent Document 1 describes a thin film polymer laminated film capacitor and a method for manufacturing the same.
- This document describes a process of vapor depositing a monomer in a vacuum chamber to form a monomer layer, then irradiating the monomer layer with an electron beam to harden the monomer layer to form a resin thin film layer, and a process of vapor depositing a metal material.
- a method for manufacturing a polymer laminated film capacitor is described.
- Patent Document 2 discloses a capacitor including two electrodes separated by a dielectric member. This document describes that the dielectric member comprises a polyfunctional acrylate polymer with a specific chemical structure.
- An object of the present invention is to provide a thin film polymer multilayer capacitor that has the necessary electrical performance as a thin film polymer multilayer capacitor and has improved durability.
- a thin film polymer laminated capacitor having a structure in which resin thin film layers and internal electrode metal layers are alternately laminated,
- the resin thin film layer has a polymer structure formed by polymerizing a first monomer that is a polyfunctional monomer and a second monomer that is a monofunctional monomer,
- the manufacturing method (1) includes: providing the first monomer or the second monomer as a test monomer; Mixing a photoinitiator in a ratio of 0.2 ⁇ 0.01 mol to 100 mol of the test monomer to obtain a mixture; Injecting the mixture into a round dish, and UV irradiating the mixture injected into the round dish in a nitrogen atmosphere at 120 W and a distance of 250 mm until polymerization no longer progresses to form a 30 mm diameter x depth It consists of producing a disc-shaped polymer member with a diameter of 1 mm.
- At least one of the first monomer and the second monomer has an acrylate group or a methacrylate group, or at least one of the first monomer and the second monomer has an acrylate group or a methacrylate group.
- ⁇ Aspect 7> The first monomer and the second monomer both have an acrylate group or a methacrylate group, or the first monomer and the second monomer both have an acrylate group or a methacrylate group.
- ⁇ Aspect 8> 8 8. The capacitor according to any one of aspects 1 to 7, wherein the first monomer is a difunctional monomer.
- the first monomer is tricyclodecane dimethanol diacrylate or tricyclodecane dimethanol dimethacrylate, or the first monomer is tricyclodecane dimethanol diacrylate or tricyclodecane dimethanol dimethacrylate.
- the second monomer is 2-(biphenyl-2-yloxy)-ethyl acrylate or 4-phenylbenzyl acrylate, or the second monomer is 2-(biphenyl-2-yloxy)-ethyl acrylate.
- the manufacturing method (2) includes: providing the first monomer and the second monomer; mixing the first monomer and the second monomer in the same molar ratio as the resin thin film layer to obtain a monomer mixture; Mixing a photoinitiator at a ratio of 0.2 ⁇ 0.01 mol to 100 mol of the monomer mixture to obtain a mixture; Injecting the mixture into a round dish, and UV irradiating the mixture injected into the round dish in a nitrogen atmosphere at 120 W and a distance of 250 mm until polymerization no longer progresses to form a 30 mm diameter x depth consisting of producing a disc-shaped polymer member having dimensions of 1 mm in diameter, The capacitor according to any one of aspects 1 to 9.
- a method for manufacturing a thin film polymer multilayer capacitor having a structure in which resin thin film layers and internal electrode metal layers are alternately stacked comprising: forming the resin thin film layer by curing a monomer layer containing a first monomer that is a polyfunctional monomer and a second monomer that is a monofunctional monomer; A method in which the first monomer and the second monomer satisfy at least one of the following conditions (a) and (b): (a) the HLB value H2 of the second monomer is smaller than the HLB value H1 of the first monomer; (b) A first polymer member formed using only the first monomer as a monomer, and a second polymer member formed using only the second monomer as a monomer, according to the manufacturing method (1) below.
- the manufacturing method (1) includes: providing the first monomer or the second monomer as a test monomer; Mixing a photoinitiator in a ratio of 0.2 ⁇ 0.01 mol to 100 mol of the test monomer to obtain a mixture; Injecting the mixture into a round dish, and UV irradiating the mixture injected into the round dish in a nitrogen atmosphere at 120 W and a distance of 250 mm until polymerization no longer progresses to form a 30 mm diameter x depth It consists of producing a disc-shaped polymer member with a diameter of 1 mm.
- the present invention it is possible to provide a thin film polymer multilayer capacitor that has the necessary electrical performance as a thin film polymer multilayer capacitor and has improved durability.
- FIG. 1 is a schematic perspective view of a thin film polymer multilayer capacitor 1.
- FIG. 2 is a graph showing the results of measuring the water absorption rates of the capacitors according to Example 1 and Comparative Example 1.
- a thin film polymer multilayer capacitor according to the present disclosure has a structure in which resin thin film layers and internal electrode metal layers are alternately laminated,
- the resin thin film layer has a polymer structure formed by polymerizing a first monomer that is a polyfunctional monomer and a second monomer that is a monofunctional monomer,
- the first monomer and the second monomer satisfy at least one of the following conditions (a) and (b):
- (a) the HLB value H2 of the second monomer is smaller than the HLB value H1 of the first monomer;
- the water absorption rate of each polymer member was measured after being left standing for 40 hours at 40°C and 95% relative humidity, the water absorption rate of the second polymer member was higher than that of the first polymer member.
- the manufacturing method (1) is providing a first monomer or a second monomer as a test monomer; Mixing the photoinitiator in a proportion of 0.2 ⁇ 0.01 mol with respect to 100 mol of the test monomer to obtain a mixture; The mixture was injected into a round dish, and the mixture injected into the round dish was irradiated with UV in a nitrogen atmosphere at 120 W and a distance of 250 mm until polymerization did not proceed, and the mixture was placed in a 30 mm diameter x 1 mm deep area. It consists of producing a disc-shaped polymer member having dimensions.
- the resin thin film layer is formed using not only a polyfunctional monomer but also a monofunctional monomer having a relatively low HLB value.
- a polyfunctional monomer due to the polyfunctional monomer, a sufficient degree of crosslinking of the polymer structure in the resin thin film layer can be ensured, and a monomer having a relatively low HLB value can be obtained. It is believed that the water absorption of the resin thin film layer can be reduced due to the polymer structural unit derived from the functional monomer, and as a result, excellent durability can be achieved.
- the resin thin film layer is formed using not only a polyfunctional monomer but also a monofunctional monomer that forms a polymer with relatively low water absorption.
- a polyfunctional monomer but also a monofunctional monomer that forms a polymer with relatively low water absorption.
- the resin thin film layer has a polymer structure formed by polymerizing a first monomer that is a polyfunctional monomer and a second monomer that is a monofunctional monomer.
- the ratio of monomer units derived from the first monomer and monomer units derived from the second monomer to all the monomer units constituting the polymer structure of the resin thin film layer is 80% or more in molar ratio. , 85% or more, 90% or more, or 95% or more, particularly preferably 100%.
- a polyfunctional monomer has multiple (especially two) polymerizable functional groups in one molecule.
- a monofunctional monomer has one polymerizable functional group in one molecule.
- polymerizable functional groups examples include vinyl groups (particularly acrylic groups, methacrylic groups, acrylate groups, and methacrylate groups), acrylonitrile groups, and epoxy groups.
- the polyfunctional monomer and/or the monofunctional monomer have at least either an acrylate group or a methacrylate group.
- both the polyfunctional monomer and the monofunctional monomer have acrylate groups. Note that the monomer having an acrylate group is an acrylate monomer, and the monomer having a methacrylate group is a methacrylate monomer.
- a polyfunctional monomer and a monofunctional monomer can be polymerized via a polymerizable functional group under conditions such as electron beam irradiation to form a polymer.
- the ratio of the first monomer to the second monomer that is, the ratio of the polyfunctional monomer to the monofunctional monomer, can be appropriately set depending on the desired characteristics of the capacitor.
- the molar ratio of the first monomer and the second monomer is preferably 10:90 to 90:10. This molar ratio is more preferably 20:80 to 80:20, 30:70 to 70:30, 40:60 to 60:40, or 45:55 to 55:45.
- the number of moles of the second monomer is preferably 10 to 90%, 20 to 80%, 30 to 70%, or 40% to the total number of moles of the first monomer and the second monomer. ⁇ 60%, or 45-55%.
- the ratio of the first monomer to the second monomer is within the above range, a capacitor having good electrical properties and particularly excellent durability can be provided.
- Polyfunctional monomers are in particular difunctional monomers.
- the polyfunctional monomer preferably has acrylate or methacrylate groups.
- the polyfunctional monomer most preferably has acrylate groups.
- the polyfunctional monomer preferably comprises or consists of monomers having acrylate or methacrylate groups.
- the polyfunctional monomer most preferably comprises or consists of a monomer having an acrylate group.
- the polyfunctional monomer can have a chemical structure represented by the following general formula (1).
- R 1 is a group containing 1 to 20 carbon atoms; R2 is H or CH3 ; n is 2 to 4.
- R 1 preferably contains 3 to 20, more preferably 6 to 20, even more preferably 8 to 20 carbon atoms.
- R 1 in formula (1) can contain an oxygen atom.
- R 1 may contain 1 to 20, 1 to 10, 1 to 5, 1 to 3, or 1 to 2 oxygen atoms, or it may contain 1 oxygen atom.
- R 1 in formula (1) can in particular contain an ether bond.
- R 1 can contain 1 to 20, 1 to 10, 1 to 5, 1 to 3, or 1 to 2 ether bonds, or can contain 1 ether bond.
- R 1 in formula (1) consists of a carbon atom, a hydrogen atom, and an optional oxygen atom.
- R 1 can include a (linear or branched) aliphatic moiety, an alicyclic moiety, and/or an aromatic moiety.
- R 1 in formula (1) includes an alicyclic moiety
- the bulkiness of the molecule becomes large, so the molar volume becomes large, and it can have the effect of lowering the tan ⁇ of the capacitor.
- due to its bulk and rigidity it inhibits the micro-Brownian motion of the main chain segments in the three-dimensional network structure of the polymer due to temperature rise, and as a result, the glass transition point is relatively high and the heat resistance is excellent. This can result in a capacitor that is Furthermore, since curing shrinkage of the resin thin film layer is relatively suppressed, interlayer adhesion of the capacitor can be further improved.
- R 1 in formula (1) contains an aromatic moiety, it has a ⁇ -electron conjugated system, so polarization due to dipole orientation becomes larger than that of a simple alkyl skeleton, and a relatively large dielectric constant can be obtained. . Furthermore, especially when R 1 includes a bulky structure such as a biphenyl structure, it can have the effect of lowering the tan ⁇ of the capacitor, as described above with respect to the alicyclic moiety. Furthermore, since curing shrinkage of the resin thin film layer is relatively suppressed, the interlayer adhesion of the capacitor can be further improved.
- R 1 preferably does not contain an unsaturated bond. By not including unsaturated bonds, an increase in tan ⁇ of the capacitor can be suppressed in some cases.
- Examples M1 to M6 of compound structures of polyfunctional monomers that can be used in the present invention are shown below.
- n may be 1 to 20, preferably 5 to 18, more preferably 8 to 15, and even more preferably 9 to 12.
- n may be 1 to 20, preferably 1 to 10, more preferably 2 to 6, and even more preferably 3 to 4.
- Particularly preferred polyfunctional monomers include: tricyclodecane dimethanol diacrylate, tricyclodecane dimethanol dimethacrylate, dodecane-1,12-diyl dimethacrylate, dodecane-1,12-diyl diacrylate, ⁇ , ⁇ '-[propane-2,2-diylbis-(4,1-phenylene)]bis[ ⁇ -(acryloyloxy)poly(oxyethylene)] can be mentioned.
- the monofunctional monomer preferably has an acrylate group or a methacrylate group.
- Monofunctional monomers most preferably have acrylate groups.
- the monofunctional monomers preferably include or consist of monomers having acrylate or methacrylate groups.
- the monofunctional monomer most preferably comprises or consists of a monomer having an acrylate group.
- the monofunctional monomer can have a chemical structure represented by the following general formula (2).
- R 3 is a group containing 1 to 20 carbon atoms; R2 is H or CH3 .
- R 2 in formula (2) is preferably H.
- R 3 in formula (2) preferably contains 3 to 20, more preferably 6 to 20, even more preferably 8 to 20 carbon atoms.
- R 3 in formula (2) can contain an oxygen atom.
- R 3 can contain 1 to 20, 1 to 10, 1 to 5, 1 to 3, 1 to 2, or 1 oxygen atom.
- R 3 in formula (2) can in particular contain an ether bond.
- R 3 can contain 1-20, 1-10, 1-5, 1-3, 1-2, or one ether bond.
- R 3 in formula (2) consists of a carbon atom, a hydrogen atom, and an optional oxygen atom.
- R 3 can include a (linear or branched) aliphatic moiety, an alicyclic moiety, and/or an aromatic moiety.
- R 3 in formula (2) includes an alicyclic moiety
- the bulkiness of the molecule becomes large, so the molar volume becomes large, which can have the effect of lowering the tan ⁇ of the capacitor.
- due to its bulkiness and rigidity it inhibits the micro-Brownian motion of the main chain segments in the three-dimensional network structure of the polymer due to temperature rise, and as a result, the glass transition point is relatively high and the heat resistance is excellent. This can result in a capacitor that is Furthermore, since curing shrinkage of the resin thin film layer is relatively suppressed, the interlayer adhesion of the capacitor can be further improved.
- R 3 in formula (2) contains an aromatic moiety, it has a ⁇ -electron conjugated system, so the polarization due to dipole orientation becomes larger than that of a simple alkyl skeleton, and a relatively large dielectric constant can be obtained. . Furthermore, especially when R 3 includes a bulky structure such as a biphenyl structure, it can have the effect of lowering the tan ⁇ of the capacitor, as described above with respect to the alicyclic moiety. Furthermore, since curing shrinkage of the resin thin film layer is relatively suppressed, the interlayer adhesion of the capacitor can be further improved.
- R 3 particularly preferably has a biphenyl structure.
- R 3 preferably does not contain an unsaturated bond. By not including unsaturated bonds, an increase in tan ⁇ of the capacitor can be suppressed in some cases.
- n may be 1 to 20, preferably 5 to 18, and more preferably 12 to 16.
- n may be 1 to 20, preferably 10 to 20, more preferably 12 to 18, and still more preferably 14 to 16.
- Particularly preferred monofunctional monomers include: 2-(biphenyl-2-yloxy)-ethyl acrylate, 4-phenylbenzyl acrylate, 2-[(tricyclo[5.2.1.0(2,6)]dec-4-en-9-yl)oxy]ethyl acrylate, 2-[(tricyclo[5.2.1.0(2,6)]dec-4-en-9-yl)oxy]ethyl methacrylate.
- Particularly preferable combinations of the first monomer and the second monomer include the following (1) and (2): (1) A combination of tricyclodecane dimethanol diacrylate and 2-(biphenyl-2-yloxy)-ethyl acrylate; (2) A combination of tricyclodecane dimethanol diacrylate and 4-phenylbenzyl acrylate.
- At least one of the first monomer and the second monomer has an acrylate group or a methacrylate group (i.e. is an acrylate monomer or a methacrylate monomer), or the first monomer and At least one of the second monomers includes a monomer having an acrylate group or a methacrylate group (ie, an acrylate monomer or a methacrylate monomer).
- the first monomer and the second monomer both have acrylate groups or methacrylate groups (i.e. are acrylate monomers or methacrylate monomers), or the first monomer and the second monomer
- Each of the two monomers contains a monomer having an acrylate group or a methacrylate group (ie, an acrylate monomer or a methacrylate monomer).
- the first monomer is tricyclodecane dimethanol diacrylate or tricyclodecane dimethanol dimethacrylate, or the first monomer is tricyclodecane dimethanol diacrylate or tricyclodecane dimethanol diacrylate or tricyclodecane dimethanol dimethacrylate.
- the second monomer is 2-(biphenyl-2-yloxy)-ethyl acrylate or 4-phenylbenzyl acrylate, or the second monomer is 2-(biphenyl-2-yloxy)-ethyl acrylate or Contains 4-phenylbenzyl acrylate.
- the capacitor according to the present invention satisfies the condition (a) above. That is, the HLB value H2 of the second monomer, which is a monofunctional monomer, is smaller than the HLB value H1 of the first monomer, which is a polyfunctional monomer.
- the HLB value is an index representing the degree of affinity for water and oil, and is calculated based on the type of functional group constituting the monomer. The higher the HLB value, the higher the hydrophilicity of the monomer tends to be.
- the HLB value can be calculated according to the Davis method.
- the difference (H 1 - H 2 ) between the HLB value H 1 of the first monomer and the HLB value H 2 of the second monomer is 0.1 or more.
- This difference (H 1 - H 2 ) is more preferably 0.2 or more, 0.3 or more, 0.4 or more, or 0.5 or more, and/or 3.0 or less, 2.5 Below, it is 2.0 or less, 1.9 or less, 1.8 or less, 1.7 or less, 1.6 or less, 1.5 or less, 1.4 or less, 1.3 or less, or 1.2 or less.
- the HLB value H 1 of the first monomer is in the range of 3.0 to 5.0.
- This range is more preferably 3.1 or more, 3.2 or more, 3.3 or more, 3.4 or more, 3.5 or more, 3.6 or more, 3.7 or more, 3.8 or more, 3. 9 or more, or 4.0 or more, and/or 4.9 or less, 4.8 or less, 4.7 or less, 4.6 or less, 4.5 or less, 4.4 or less, or 4.3 or less It is.
- the HLB value H 2 of the second monomer is in the range of 2.0 to 4.0. This range is more preferably 2.1 or more, 2.2 or more, 2.3 or more, 2.4 or more, 2.5 or more, 2.6 or more, 2.7 or more, 2.8 or more, 2. 9 or more, or 3.0 or more, and/or 3.9 or less, 3.8 or less, 3.7 or less, 3.6 or less, 3.5 or less, 3.4 or less, 3.3 or less, Or it is 3.2 or less.
- the HLB value H 1 of the first monomer and the HLB value H 2 of the second monomer can be calculated based on the Davis method.
- HLB values calculated based on the Davis method for some representative polyfunctional monomers and monofunctional monomers are listed in Table 1 below.
- HLB value 7 + ⁇ (number of hydrophilic groups) + ⁇ (number of lipophilic groups) (A)
- hydrophilic groups are as follows: Ester group (-COO-) 2.4 Hydroxyl group (-OH) 1.9 Ether group (-O-) 1.3 (-CH 2 CH 2 O-) 0.33
- cyclic structure in the molecular structure of tricyclodecane dimethanol dimethacrylate and the methylene group directly bonded thereto are all alkanes (the cyclic structure is composed of a total of 10 alkanes).
- the capacitor according to the present invention satisfies the condition (b) above. That is, a first polymer member formed using only the first monomer as a monomer and a second polymer member formed using only the second monomer as a monomer according to the above manufacturing method (1).
- the water absorption rate of each polymer member was measured after being left standing for 40 hours under conditions of 40°C and 95% relative humidity, the water absorption rate of the second polymer member was higher than that of the first polymer member. water absorption rate is smaller than that of
- the difference between the water absorption rate (%) of the second polymer member and the water absorption rate (%) of the first polymer member may be 0.05 or more. This difference is preferably 0.1 or more, 0.2 or more, or 0.3 or more. The upper limit of this difference is not particularly limited, but may be, for example, 2.0 or less.
- the water absorption rate of the first polymer member may be 0.5% to 2.0%.
- the water absorption rate of the first polymer member is preferably 0.7% or more, 0.8% or more, 0.9% or more, and/or 1.8% or less, 1.6% or less, 1 .4% or less, or 1.2% or less.
- the water absorption rate of the second polymer member may be 0.1% to 1.0%.
- the water absorption rate of the first polymer member is preferably 0.2% or more, 0.3% or more, 0.4% or more, and/or 1.0% or less, 0.9% or less, 0. .8% or less, or 0.7% or less.
- the water absorption rate of the first polymer member and the second polymer member is the weight change of the polymer member when a moisture absorption test is performed in which the polymer member to be measured is left standing for 40 hours at 40°C and 95% relative humidity. It can be calculated from the rate.
- the weight change rate (%) can be calculated from the weight of the polymer member before this moisture absorption test and the weight of the polymer member immediately after this moisture absorption test, and this can be taken as the water absorption rate. can.
- a first polymer member and a second polymer member for measuring water absorption are manufactured according to manufacturing method (1).
- Manufacturing method (1) is providing a first monomer or a second monomer as a test monomer; mixing a photoinitiator in a proportion of 0.2 ⁇ 0.01 mol with respect to 100 mol of test monomer to obtain a mixture; The mixture was injected into a round dish, and the mixture injected into the round dish was irradiated with UV in a nitrogen atmosphere at 120 W and a distance of 250 mm until polymerization did not proceed, and the mixture was placed in a 30 mm diameter x 1 mm deep area. It consists of producing a disc-shaped polymer member having dimensions.
- the photoinitiator can be appropriately set depending on the type of test monomer.
- a specific photoinitiator includes 2-benzyl-2-dimethylamino-4'morpholinobutyrophenone. Mixing of the test monomer and photoinitiator can be carried out according to known methods.
- the round plate has dimensions such that when the mixture placed therein is polymerized by UV irradiation, a disc-shaped polymer member having dimensions of 30 mm in diameter and 1 mm in depth is created.
- the round plate may be a round plate having a planar area with an inner diameter of 30 mm and a depth of 1 to 5 cm, and the mixture may be poured into the round plate to a height of 1 mm. I can do it.
- UV irradiation is carried out to advance the polymerization of the test monomers and is carried out at an intensity of 120 W and at a distance of 250 mm from the sample.
- the irradiation time of UV irradiation is determined depending on the type of test monomer, and in particular, the irradiation time is determined so that the polymerization of the test monomer (i.e., curing of the mixture) proceeds sufficiently, and the polymerization does not proceed even if UV irradiation is continued. Do this until it runs out.
- a person skilled in the art can determine the duration of such UV radiation depending on the type of monomer to be tested. For example, if the test monomer is an acrylate monomer (a monomer having an acrylate group), UV irradiation can be carried out for 60 seconds.
- test monomer when the test monomer is a methacrylate monomer (a monomer having a methacrylate group), UV irradiation can be performed for 360 seconds. If the test monomer has acrylate and methacrylate groups, UV irradiation can be carried out for 360 seconds.
- methacrylate monomer a monomer having a methacrylate group
- the thin film polymer multilayer capacitor according to the present disclosure has a structure in which resin thin film layers and internal electrode metal layers are alternately laminated.
- FIG. 1 is a schematic perspective view of a thin film polymer multilayer capacitor 1.
- the thin film polymer multilayer capacitor 1 has a laminate 2 in which resin thin film layers and metal thin film layers (internal electrode metal layers) are alternately laminated, and this laminate 2 has two external electrodes 3 and 4. is attached.
- a thin film polymer multilayer capacitor can have 10 to 10,000 layers, 50 to 5000 layers, or 100 to 2,000 layers.
- the resin thin film layer may have a thickness of 10 nm to 3000 nm, preferably 100 to 1500 nm.
- the metal material constituting the internal electrode metal layer includes at least one selected from the group consisting of Al, Cu, Zn, Sn, Au, Ag, Pt, and combinations thereof.
- the internal electrode metal layer may have a thickness of 1 nm to 100 nm, preferably 10 to 40 nm. Further, the metal thin film layer preferably has a deposition resistance value of 1 to 50 ⁇ / ⁇ , 5 to 40 ⁇ / ⁇ , or 5 to 30 ⁇ / ⁇ .
- the capacitor according to the present disclosure has a dielectric constant of 2.0 or more when measured at 25° C. and 1 kHz.
- This dielectric constant is more preferably 2.1 or more, 2.2 or more, 2.3 or more, or 2.5 or more.
- the upper limit of this dielectric constant is not particularly limited, but may be 5.0 or less.
- the dielectric constant at 25° C. and 1 kHz can be calculated based on the capacitance measured using an LCR meter, as well as the electrode area and dielectric thickness.
- the capacitor according to the present disclosure has tan ⁇ (also referred to as dielectric loss tangent or loss factor) of less than 1.0% when measured at 25° C. and 1 kHz.
- tan ⁇ also referred to as dielectric loss tangent or loss factor
- This tan ⁇ is more preferably 0.9% or less, 0.8% or less, 0.7% or less, 0.6% or less, 0.5% or less, 0.4% or less, 0.3% or less, It is 0.2% or less, or 0.1% or less.
- the lower limit of this tan ⁇ is not particularly limited, but may be 0.05% or more.
- the capacitor according to the present disclosure has a tan ⁇ of less than 0.01 when measured at 25° C. and 1 kHz.
- This tan ⁇ is more preferably 0.009 or less, 0.008 or less, 0.007 or less, 0.006 or less, 0.005 or less, 0.004 or less, 0.003 or less, 0.002 or less, or 0 It is .001 or less.
- the lower limit of tan ⁇ is not particularly limited, but may be 0.0005 or more.
- Tan ⁇ at 25° C. and 1 kHz can be measured using an LCR meter.
- the water absorption rate of the third polymer member manufactured according to the following manufacturing method (2) when left standing for 40 hours under conditions of 40° C. and 95% relative humidity is , 0.8% or less.
- This water absorption of the third polymer member is preferably 0.7% or less, 0.6% or less, 0.5% or less, or 0.4% or less.
- the lower limit of the water absorption rate of the third polymer member is not particularly limited, but may be, for example, 0.01% or more.
- the manufacturing method (2) for manufacturing the third polymer member includes: providing a first monomer and a second monomer; mixing the first monomer and the second monomer in the same molar ratio as in the resin thin film layer to obtain a monomer mixture; Mixing a photoinitiator in a proportion of 0.2 ⁇ 0.01 mol with respect to 100 mol of the monomer mixture to obtain a mixture; Injecting the mixture into a round dish, and UV irradiating the mixture injected into the round dish in a nitrogen atmosphere at 120 W and a distance of 250 mm until polymerization no longer progresses to form a 30 mm diameter x 1 mm depth.
- the method consists of producing a disc-shaped polymer member having dimensions of .
- the method for manufacturing the thin film polymer multilayer capacitor according to the present disclosure is not particularly limited.
- a step of forming a resin thin film layer and a step of vapor depositing a metal material to form a metal thin film layer are alternately repeated on a rotating drum in a vacuum chamber. It can be manufactured by a method including manufacturing a laminate in which resin thin film layers and metal thin film layers are alternately laminated on a rotating drum.
- the above laminate formed on the rotating drum can be removed from the rotating drum and pressed under heat to flatten it. Then, after cutting the flattened laminate into stick shapes, external electrodes are formed, and this is further cut into chip shapes to obtain a thin film polymer multilayer capacitor.
- the thin film polymer multilayer capacitor according to the present disclosure can be manufactured according to the following manufacturing method according to the present disclosure.
- Method for manufacturing a capacitor according to the present invention A method for manufacturing a thin film polymer multilayer capacitor having a structure in which resin thin film layers and internal electrode metal layers are alternately stacked, the method comprising: Forming a resin thin film layer by curing a monomer layer containing a first monomer that is a polyfunctional monomer and a second monomer that is a monofunctional monomer, A method in which the first monomer and the second monomer satisfy at least one of the following conditions (a) and (b): (a) the HLB value H2 of the second monomer is smaller than the HLB value H1 of the first monomer; (b) A first polymer member formed using only a first monomer as a monomer and a second polymer member formed using only a second monomer as a monomer according to the manufacturing method (1) below.
- the manufacturing method (1) is providing a first monomer or a second monomer as a test monomer; mixing a photoinitiator in a proportion of 0.2 ⁇ 0.01 mol with respect to 100 mol of test monomer to obtain a mixture; The mixture was injected into a round dish, and the mixture injected into the round dish was irradiated with UV in a nitrogen atmosphere at 120 W and a distance of 250 mm until polymerization did not proceed, and the mixture was placed in a 30 mm diameter x 1 mm deep area. It consists of producing a disc-shaped polymer member having dimensions.
- the above description regarding the capacitor according to the present disclosure can be referred to.
- the above description of the capacitor according to the present disclosure can be referred to regarding the manufacturing method (1), conditions (a), and conditions (b).
- “Curing treatment” when forming a resin thin film layer can be performed according to a known method, for example, according to the method described in International Publication No. 2015/118693. Specifically, for example, this can be carried out by depositing a monomer in a vacuum chamber to form a monomer layer, and then irradiating the monomer layer with an electron beam to cure the monomer layer.
- test monomer of Reference Example 1 was a monomer having an acrylate group
- the mixture was irradiated with UV for 60 seconds to sufficiently advance the polymerization (that is, curing treatment). Even if there were some defects in the polymer, it was used as is for water absorption evaluation.
- a hygroscopicity test was conducted on the obtained polymer member. Specifically, the polymer member was placed in a constant temperature and humidity chamber set at 40° C. and 95% relative humidity, and left standing for 40 hours. Then, the weight change rate before and after the hygroscopicity test was measured, and this was taken as the water absorption rate. The results are shown in Table 2 below.
- the polymer member (Reference Example 3) formed from a mixture of tricyclodecane dimethanol diacrylate and 2-(biphenyl-2-yloxy)-ethyl acrylate was It exhibited relatively low water absorption compared to the polymer member formed only from candimethanol diacrylate (Reference Example 1).
- Table 2 also shows the HLB value calculated for each monomer according to the Davis method. As seen in Table 2, when calculated according to the Davis method, the HLB value of the monofunctional monomer 2-(biphenyl-2-yloxy)-ethyl acrylate is 3.1, and the HLB value of the difunctional monomer tricyclode The HLB value of candimethanol diacrylate was 4.2. That is, 2-(biphenyl-2-yloxy)-ethyl acrylate has a smaller HLB value than tricyclodecane dimethanol diacrylate.
- the results in Table 2 show that there is a correlation between the HLB value of the monomer and the water absorption rate when measured on the polymer member.
- Example 1 and Comparative Example 1 In Example 1 and Comparative Example 1, capacitors having resin thin film layers formed from the monomers or monomer mixtures shown in Table 3 below were manufactured, and their durability was evaluated.
- Example 1> Manufacture of thin film polymer multilayer capacitors
- a resin thin film layer and a metal thin film layer By alternately repeating the process of forming a resin thin film layer and the process of forming a metal thin film layer on a rotating drum in a vacuum chamber, a resin thin film layer and a metal thin film layer (internal A laminate was manufactured in which a total of 2,550 layers (electrode metal layers) were alternately stacked.
- a bifunctional monomer tricyclodecane dimethanol diacrylate manufactured by Shin Nakamura Chemical Co., Ltd., product name: A-DCP
- a thin resin film layer was formed from a monomer mixture containing ethyl acrylate (manufactured by Shin Nakamura Chemical Co., Ltd., product name: A-LEN-10) at a molar ratio of 50:50.
- the monomer layer was irradiated with an electron beam to cure the monomer layer, thereby forming a resin thin film layer.
- the electron beam irradiation was performed under the conditions of an accelerating voltage of 5.0 kV and an irradiation current of 50 mA.
- the thickness of the resin thin film layer was 0.5 ⁇ m.
- metal thin film layer aluminum (Al) as a metal material was vapor-deposited on the resin thin film layer, which was partially masked by vapor deposition coating of fluorine oil, to form a metal thin film layer.
- the vapor deposition resistance value of the metal thin film layer was 10 ⁇ / ⁇ .
- the produced laminate was removed from the rotating drum and flattened by pressing under heating at 160°C. Then, after cutting the flattened laminate into stick shapes, external electrodes (brass metallicon sprayed material, copper plating, and tin plating) were attached, and this was further cut into chip shapes.
- a thin film polymer multilayer capacitor according to the above was obtained. The size of the capacitor was 4.5 mm x 3.2 mm.
- Example 1 The durability of the capacitor according to Example 1 was evaluated by a humidity environment test. In this humidity environment test, the capacitor was placed in a constant temperature and humidity chamber having conditions of a temperature of 60° C. and a relative humidity of 90%, and left standing for 1000 hours with a DC voltage of 50 V applied.
- the tan ⁇ (dielectric loss tangent) and capacitance were measured before and after the humidity environment test. Tan ⁇ was measured using an LCR meter at 25° C. and 1 kHz. The capacitance ( ⁇ F) of the capacitor was measured using an LCR meter at 25° C. and 1 kHz. The results are shown in Table 3 below.
- Example 1 Water absorption evaluation of capacitor
- a capacitor is placed in a constant temperature and humidity chamber at a temperature of 40°C and a relative humidity of 95%, and the weight change rate of the capacitor after being left standing for a predetermined period of time is measured, and this is calculated as the water absorption rate of the capacitor. did.
- Table 3 and FIG. 2 The results are shown in Table 3 and FIG. 2 below.
- the water absorption of the capacitors was evaluated according to the following criteria: Good: The water absorption rate measured after the above water absorption test over 500 hours was less than 1%. x: The water absorption rate measured after the above water absorption test over 500 hours was 1% or more.
- Comparative Example 1 In Comparative Example 1, only the bifunctional monomer tricyclodecane dimethanol diacrylate (manufactured by Shin Nakamura Chemical Co., Ltd., product name: A-DCP) was used instead of the monomer mixture. Capacitors were manufactured and evaluated in the same manner as in Example 1. The results are shown in Table 3 and FIG. 2 below.
- Example 1 As seen in Table 3, regarding the initial characteristics, both the capacitors of Example 1 and Comparative Example 1 showed good initial capacitance characteristics ( ⁇ F). Further, the initial tan ⁇ value of Example 1 was better than that of Comparative Example 1.
- the capacitor of Example 1 maintained a relatively good tan ⁇ even after the humidity environment evaluation test, and no decrease in capacity was observed ( ⁇ C>0).
- the capacitor according to Example 1 exhibited superior water absorption (relatively reduced water absorption) than the capacitor according to Comparative Example 1.
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| JP2024533725A JP7772945B2 (ja) | 2022-07-11 | 2023-07-11 | 薄膜高分子積層コンデンサ及びその製造方法 |
| DE112023003019.7T DE112023003019T5 (de) | 2022-07-11 | 2023-07-11 | Dünnschichtpolymerlaminierter kondensator und herstellungsverfahren für diesen |
| CN202380052358.6A CN119547167B (zh) | 2022-07-11 | 2023-07-11 | 薄膜高分子层叠电容器及其制造方法 |
| US18/874,668 US12456584B2 (en) | 2022-07-11 | 2023-07-11 | Thin film polymer laminated capacitor and manufacturing method therefor |
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| WO2025183177A1 (ja) * | 2024-03-01 | 2025-09-04 | ルビコン株式会社 | 薄膜高分子積層コンデンサ、及びその製造方法 |
| US12456584B2 (en) * | 2022-07-11 | 2025-10-28 | Rubycon Corporation | Thin film polymer laminated capacitor and manufacturing method therefor |
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| JP2000216049A (ja) * | 1999-01-25 | 2000-08-04 | Matsushita Electric Ind Co Ltd | 有機薄膜コンデンサの製造方法 |
| WO2015118693A1 (ja) * | 2014-02-10 | 2015-08-13 | ルビコン株式会社 | 薄膜高分子積層フィルムコンデンサの製造方法及び薄膜高分子積層フィルムコンデンサ |
| JP2017033966A (ja) * | 2015-07-28 | 2017-02-09 | ルビコン株式会社 | 薄膜高分子積層コンデンサの製造方法及び薄膜高分子積層コンデンサ |
| JP2021019133A (ja) * | 2019-07-22 | 2021-02-15 | ルビコン電子株式会社 | 薄膜高分子積層コンデンサ及びその製造方法 |
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| US4842893A (en) * | 1983-12-19 | 1989-06-27 | Spectrum Control, Inc. | High speed process for coating substrates |
| US4490774A (en) | 1983-12-19 | 1984-12-25 | General Electric Company | Capacitors containing polyfunctional acrylate polymers as dielectrics |
| EP0146089B1 (en) | 1983-12-19 | 1992-08-05 | SPECTRUM CONTROL, INC. (a Pennsylvania corporation) | Capacitor with dielectric comprising polyfunctional acrylate polymer and method of making |
| JPH0726193A (ja) | 1993-06-25 | 1995-01-27 | Matsushita Electric Ind Co Ltd | 誘電体用塗料及びフィルムコンデンサ |
| JPH09194759A (ja) | 1996-01-11 | 1997-07-29 | Nippon Kayaku Co Ltd | フィルムコンデンサー用誘電体塗料及びその硬化物 |
| JPH11199799A (ja) | 1998-01-16 | 1999-07-27 | Nippon Kayaku Co Ltd | 誘電体用塗料、硬化物及びフィルムコンデンサー |
| DE60230358D1 (de) * | 2001-06-15 | 2009-01-29 | Jsr Corp | (Meth)acryloylgruppen enthaltende Ethylen-Alpha-Olefin Copolymere, Verfahren zu deren Herstellung und Kautschukzusammensetzung |
| CN102112507B (zh) * | 2008-07-31 | 2013-12-11 | 积水化学工业株式会社 | 聚合物粒子、导电性粒子、各向异性导电材料以及连接结构体 |
| WO2021132257A1 (ja) | 2019-12-27 | 2021-07-01 | 株式会社村田製作所 | フィルムコンデンサ、及び、フィルムコンデンサ用フィルム |
| KR20230126307A (ko) * | 2022-02-22 | 2023-08-30 | 삼성디스플레이 주식회사 | 수지 조성물, 및 이를 포함한 디스플레이 장치 |
| US12456584B2 (en) * | 2022-07-11 | 2025-10-28 | Rubycon Corporation | Thin film polymer laminated capacitor and manufacturing method therefor |
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| JP2000216049A (ja) * | 1999-01-25 | 2000-08-04 | Matsushita Electric Ind Co Ltd | 有機薄膜コンデンサの製造方法 |
| WO2015118693A1 (ja) * | 2014-02-10 | 2015-08-13 | ルビコン株式会社 | 薄膜高分子積層フィルムコンデンサの製造方法及び薄膜高分子積層フィルムコンデンサ |
| JP2017033966A (ja) * | 2015-07-28 | 2017-02-09 | ルビコン株式会社 | 薄膜高分子積層コンデンサの製造方法及び薄膜高分子積層コンデンサ |
| JP2021019133A (ja) * | 2019-07-22 | 2021-02-15 | ルビコン電子株式会社 | 薄膜高分子積層コンデンサ及びその製造方法 |
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| US12456584B2 (en) * | 2022-07-11 | 2025-10-28 | Rubycon Corporation | Thin film polymer laminated capacitor and manufacturing method therefor |
| WO2025183177A1 (ja) * | 2024-03-01 | 2025-09-04 | ルビコン株式会社 | 薄膜高分子積層コンデンサ、及びその製造方法 |
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| JPWO2024014457A1 (https=) | 2024-01-18 |
| US12456584B2 (en) | 2025-10-28 |
| US20250259791A1 (en) | 2025-08-14 |
| CN119547167B (zh) | 2025-09-16 |
| CN119547167A (zh) | 2025-02-28 |
| DE112023003019T5 (de) | 2025-05-22 |
| JP7772945B2 (ja) | 2025-11-18 |
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