JP7772945B2 - 薄膜高分子積層コンデンサ及びその製造方法 - Google Patents

薄膜高分子積層コンデンサ及びその製造方法

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Publication number
JP7772945B2
JP7772945B2 JP2024533725A JP2024533725A JP7772945B2 JP 7772945 B2 JP7772945 B2 JP 7772945B2 JP 2024533725 A JP2024533725 A JP 2024533725A JP 2024533725 A JP2024533725 A JP 2024533725A JP 7772945 B2 JP7772945 B2 JP 7772945B2
Authority
JP
Japan
Prior art keywords
monomer
capacitor
polymer member
mixture
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2024533725A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2024014457A5 (https=
JPWO2024014457A1 (https=
Inventor
利仁 金井
有奈 早川
智直 加古
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rubycon Corp
Original Assignee
Rubycon Corp
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Filing date
Publication date
Application filed by Rubycon Corp filed Critical Rubycon Corp
Publication of JPWO2024014457A1 publication Critical patent/JPWO2024014457A1/ja
Publication of JPWO2024014457A5 publication Critical patent/JPWO2024014457A5/ja
Application granted granted Critical
Publication of JP7772945B2 publication Critical patent/JP7772945B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00—Fixed capacitors; Processes of their manufacture
    • H01G4/002—Details
    • H01G4/018—Dielectrics
    • H01G4/06—Solid dielectrics
    • H01G4/14—Organic dielectrics
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C08F220/301—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one oxygen in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D135/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical, and containing at least another carboxyl radical in the molecule, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D135/02—Homopolymers or copolymers of esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00—Fixed capacitors; Processes of their manufacture
    • H01G4/002—Details
    • H01G4/018—Dielectrics
    • H01G4/06—Solid dielectrics
    • H01G4/14—Organic dielectrics
    • H01G4/18—Organic dielectrics of synthetic material, e.g. derivatives of cellulose
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00—Fixed capacitors; Processes of their manufacture
    • H01G4/30—Stacked capacitors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00—Fixed capacitors; Processes of their manufacture
    • H01G4/30—Stacked capacitors
    • H01G4/306—Stacked capacitors made by thin film techniques
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00—Fixed capacitors; Processes of their manufacture
    • H01G4/33—Thin- or thick-film capacitors (thin- or thick-film circuits; capacitors without a potential-jump or surface barrier specially adapted for integrated circuits, details thereof, multistep manufacturing processes therefor)
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2800/00—Copolymer characterised by the proportions of the comonomers expressed
    • C08F2800/10—Copolymer characterised by the proportions of the comonomers expressed as molar percentages

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Power Engineering (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2024533725A 2022-07-11 2023-07-11 薄膜高分子積層コンデンサ及びその製造方法 Active JP7772945B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022111232 2022-07-11
JP2022111232 2022-07-11
PCT/JP2023/025579 WO2024014457A1 (ja) 2022-07-11 2023-07-11 薄膜高分子積層コンデンサ及びその製造方法

Publications (3)

Publication Number Publication Date
JPWO2024014457A1 JPWO2024014457A1 (https=) 2024-01-18
JPWO2024014457A5 JPWO2024014457A5 (https=) 2025-01-20
JP7772945B2 true JP7772945B2 (ja) 2025-11-18

Family

ID=89536732

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024533725A Active JP7772945B2 (ja) 2022-07-11 2023-07-11 薄膜高分子積層コンデンサ及びその製造方法

Country Status (5)

Country Link
US (1) US12456584B2 (https=)
JP (1) JP7772945B2 (https=)
CN (1) CN119547167B (https=)
DE (1) DE112023003019T5 (https=)
WO (1) WO2024014457A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12456584B2 (en) * 2022-07-11 2025-10-28 Rubycon Corporation Thin film polymer laminated capacitor and manufacturing method therefor
WO2025183177A1 (ja) * 2024-03-01 2025-09-04 ルビコン株式会社 薄膜高分子積層コンデンサ、及びその製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000216049A (ja) 1999-01-25 2000-08-04 Matsushita Electric Ind Co Ltd 有機薄膜コンデンサの製造方法
WO2015118693A1 (ja) 2014-02-10 2015-08-13 ルビコン株式会社 薄膜高分子積層フィルムコンデンサの製造方法及び薄膜高分子積層フィルムコンデンサ
JP2017033966A (ja) 2015-07-28 2017-02-09 ルビコン株式会社 薄膜高分子積層コンデンサの製造方法及び薄膜高分子積層コンデンサ
JP2021019133A (ja) 2019-07-22 2021-02-15 ルビコン電子株式会社 薄膜高分子積層コンデンサ及びその製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4842893A (en) * 1983-12-19 1989-06-27 Spectrum Control, Inc. High speed process for coating substrates
US4490774A (en) 1983-12-19 1984-12-25 General Electric Company Capacitors containing polyfunctional acrylate polymers as dielectrics
EP0146089B1 (en) 1983-12-19 1992-08-05 SPECTRUM CONTROL, INC. (a Pennsylvania corporation) Capacitor with dielectric comprising polyfunctional acrylate polymer and method of making
JPH0726193A (ja) 1993-06-25 1995-01-27 Matsushita Electric Ind Co Ltd 誘電体用塗料及びフィルムコンデンサ
JPH09194759A (ja) 1996-01-11 1997-07-29 Nippon Kayaku Co Ltd フィルムコンデンサー用誘電体塗料及びその硬化物
JPH11199799A (ja) 1998-01-16 1999-07-27 Nippon Kayaku Co Ltd 誘電体用塗料、硬化物及びフィルムコンデンサー
DE60230358D1 (de) * 2001-06-15 2009-01-29 Jsr Corp (Meth)acryloylgruppen enthaltende Ethylen-Alpha-Olefin Copolymere, Verfahren zu deren Herstellung und Kautschukzusammensetzung
CN102112507B (zh) * 2008-07-31 2013-12-11 积水化学工业株式会社 聚合物粒子、导电性粒子、各向异性导电材料以及连接结构体
WO2021132257A1 (ja) 2019-12-27 2021-07-01 株式会社村田製作所 フィルムコンデンサ、及び、フィルムコンデンサ用フィルム
KR20230126307A (ko) * 2022-02-22 2023-08-30 삼성디스플레이 주식회사 수지 조성물, 및 이를 포함한 디스플레이 장치
US12456584B2 (en) * 2022-07-11 2025-10-28 Rubycon Corporation Thin film polymer laminated capacitor and manufacturing method therefor

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000216049A (ja) 1999-01-25 2000-08-04 Matsushita Electric Ind Co Ltd 有機薄膜コンデンサの製造方法
WO2015118693A1 (ja) 2014-02-10 2015-08-13 ルビコン株式会社 薄膜高分子積層フィルムコンデンサの製造方法及び薄膜高分子積層フィルムコンデンサ
JP2017033966A (ja) 2015-07-28 2017-02-09 ルビコン株式会社 薄膜高分子積層コンデンサの製造方法及び薄膜高分子積層コンデンサ
JP2021019133A (ja) 2019-07-22 2021-02-15 ルビコン電子株式会社 薄膜高分子積層コンデンサ及びその製造方法

Also Published As

Publication number Publication date
WO2024014457A1 (ja) 2024-01-18
JPWO2024014457A1 (https=) 2024-01-18
US12456584B2 (en) 2025-10-28
US20250259791A1 (en) 2025-08-14
CN119547167B (zh) 2025-09-16
CN119547167A (zh) 2025-02-28
DE112023003019T5 (de) 2025-05-22

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