WO2021251476A1 - フィルムミラー積層体、及びミラー部材 - Google Patents
フィルムミラー積層体、及びミラー部材 Download PDFInfo
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- WO2021251476A1 WO2021251476A1 PCT/JP2021/022212 JP2021022212W WO2021251476A1 WO 2021251476 A1 WO2021251476 A1 WO 2021251476A1 JP 2021022212 W JP2021022212 W JP 2021022212W WO 2021251476 A1 WO2021251476 A1 WO 2021251476A1
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- 229910052751 metal Inorganic materials 0.000 claims abstract description 65
- 239000002184 metal Substances 0.000 claims abstract description 61
- 239000010410 layer Substances 0.000 claims description 232
- 239000000463 material Substances 0.000 claims description 41
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 17
- 239000012790 adhesive layer Substances 0.000 claims description 16
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 15
- 229910052782 aluminium Inorganic materials 0.000 claims description 9
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 9
- 239000010949 copper Substances 0.000 claims description 6
- 229910000484 niobium oxide Inorganic materials 0.000 claims description 6
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 4
- 239000000956 alloy Substances 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 claims description 3
- 239000010408 film Substances 0.000 description 123
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 43
- 239000000178 monomer Substances 0.000 description 42
- -1 polyethylene terephthalate Polymers 0.000 description 38
- 239000000203 mixture Substances 0.000 description 35
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 22
- 229920005989 resin Polymers 0.000 description 18
- 239000011347 resin Substances 0.000 description 18
- 229920000058 polyacrylate Polymers 0.000 description 17
- 238000004088 simulation Methods 0.000 description 15
- 238000000034 method Methods 0.000 description 14
- 230000001070 adhesive effect Effects 0.000 description 13
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 12
- 239000000853 adhesive Substances 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 11
- 238000010586 diagram Methods 0.000 description 10
- 229920000139 polyethylene terephthalate Polymers 0.000 description 10
- 239000005020 polyethylene terephthalate Substances 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 9
- 229910044991 metal oxide Inorganic materials 0.000 description 9
- 150000004706 metal oxides Chemical class 0.000 description 9
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 8
- 239000012948 isocyanate Substances 0.000 description 8
- 150000004767 nitrides Chemical class 0.000 description 8
- 230000001629 suppression Effects 0.000 description 8
- 239000003431 cross linking reagent Substances 0.000 description 7
- 238000006116 polymerization reaction Methods 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000004417 polycarbonate Substances 0.000 description 6
- 229920000515 polycarbonate Polymers 0.000 description 6
- 239000004814 polyurethane Substances 0.000 description 6
- 229920002635 polyurethane Polymers 0.000 description 6
- 238000001228 spectrum Methods 0.000 description 6
- 238000004804 winding Methods 0.000 description 6
- 229920000089 Cyclic olefin copolymer Polymers 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 5
- 239000004743 Polypropylene Substances 0.000 description 5
- 125000000217 alkyl group Chemical group 0.000 description 5
- 229920005601 base polymer Polymers 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 230000009477 glass transition Effects 0.000 description 5
- 229910001512 metal fluoride Inorganic materials 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 229920001155 polypropylene Polymers 0.000 description 5
- 229920001296 polysiloxane Polymers 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 206010040844 Skin exfoliation Diseases 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 239000002131 composite material Substances 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 150000002513 isocyanates Chemical class 0.000 description 4
- 238000001755 magnetron sputter deposition Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 3
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 3
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 3
- 229920000877 Melamine resin Polymers 0.000 description 3
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 3
- 239000004698 Polyethylene Substances 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 3
- 239000002932 luster Substances 0.000 description 3
- 229910052758 niobium Inorganic materials 0.000 description 3
- 239000010955 niobium Substances 0.000 description 3
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000002985 plastic film Substances 0.000 description 3
- 229920006255 plastic film Polymers 0.000 description 3
- 229920001707 polybutylene terephthalate Polymers 0.000 description 3
- 229920000573 polyethylene Polymers 0.000 description 3
- 239000011112 polyethylene naphthalate Substances 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 3
- XLPJNCYCZORXHG-UHFFFAOYSA-N 1-morpholin-4-ylprop-2-en-1-one Chemical compound C=CC(=O)N1CCOCC1 XLPJNCYCZORXHG-UHFFFAOYSA-N 0.000 description 2
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 2
- NDWUBGAGUCISDV-UHFFFAOYSA-N 4-hydroxybutyl prop-2-enoate Chemical compound OCCCCOC(=O)C=C NDWUBGAGUCISDV-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 2
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 2
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- 125000003368 amide group Chemical group 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 239000012986 chain transfer agent Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- ZSWFCLXCOIISFI-UHFFFAOYSA-N cyclopentadiene Chemical compound C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical group OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 2
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 229910052752 metalloid Inorganic materials 0.000 description 2
- 125000005395 methacrylic acid group Chemical group 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- NWAHZAIDMVNENC-UHFFFAOYSA-N octahydro-1h-4,7-methanoinden-5-yl methacrylate Chemical compound C12CCCC2C2CC(OC(=O)C(=C)C)C1C2 NWAHZAIDMVNENC-UHFFFAOYSA-N 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 2
- 229920005668 polycarbonate resin Polymers 0.000 description 2
- 239000004431 polycarbonate resin Substances 0.000 description 2
- 239000005056 polyisocyanate Substances 0.000 description 2
- 229920001228 polyisocyanate Polymers 0.000 description 2
- 239000003505 polymerization initiator Substances 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 230000001603 reducing effect Effects 0.000 description 2
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 2
- 239000013638 trimer Substances 0.000 description 2
- 229920001567 vinyl ester resin Polymers 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 1
- FKTHNVSLHLHISI-UHFFFAOYSA-N 1,2-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC=C1CN=C=O FKTHNVSLHLHISI-UHFFFAOYSA-N 0.000 description 1
- OVBFMUAFNIIQAL-UHFFFAOYSA-N 1,4-diisocyanatobutane Chemical compound O=C=NCCCCN=C=O OVBFMUAFNIIQAL-UHFFFAOYSA-N 0.000 description 1
- OZCMOJQQLBXBKI-UHFFFAOYSA-N 1-ethenoxy-2-methylpropane Chemical compound CC(C)COC=C OZCMOJQQLBXBKI-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 1
- WULAHPYSGCVQHM-UHFFFAOYSA-N 2-(2-ethenoxyethoxy)ethanol Chemical compound OCCOCCOC=C WULAHPYSGCVQHM-UHFFFAOYSA-N 0.000 description 1
- SBYMUDUGTIKLCR-UHFFFAOYSA-N 2-chloroethenylbenzene Chemical compound ClC=CC1=CC=CC=C1 SBYMUDUGTIKLCR-UHFFFAOYSA-N 0.000 description 1
- VUIWJRYTWUGOOF-UHFFFAOYSA-N 2-ethenoxyethanol Chemical compound OCCOC=C VUIWJRYTWUGOOF-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- IWTYTFSSTWXZFU-UHFFFAOYSA-N 3-chloroprop-1-enylbenzene Chemical compound ClCC=CC1=CC=CC=C1 IWTYTFSSTWXZFU-UHFFFAOYSA-N 0.000 description 1
- UVRCNEIYXSRHNT-UHFFFAOYSA-N 3-ethylpent-2-enamide Chemical compound CCC(CC)=CC(N)=O UVRCNEIYXSRHNT-UHFFFAOYSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- HMBNQNDUEFFFNZ-UHFFFAOYSA-N 4-ethenoxybutan-1-ol Chemical compound OCCCCOC=C HMBNQNDUEFFFNZ-UHFFFAOYSA-N 0.000 description 1
- SXIFAEWFOJETOA-UHFFFAOYSA-N 4-hydroxy-butyl Chemical group [CH2]CCCO SXIFAEWFOJETOA-UHFFFAOYSA-N 0.000 description 1
- OZAIFHULBGXAKX-VAWYXSNFSA-N AIBN Substances N#CC(C)(C)\N=N\C(C)(C)C#N OZAIFHULBGXAKX-VAWYXSNFSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 239000005058 Isophorone diisocyanate Substances 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 125000004018 acid anhydride group Chemical group 0.000 description 1
- BAPJBEWLBFYGME-UHFFFAOYSA-N acrylic acid methyl ester Natural products COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 1
- 239000003522 acrylic cement Substances 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000005250 alkyl acrylate group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 230000003373 anti-fouling effect Effects 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 150000001541 aziridines Chemical class 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000007720 emulsion polymerization reaction Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- GLVVKKSPKXTQRB-UHFFFAOYSA-N ethenyl dodecanoate Chemical compound CCCCCCCCCCCC(=O)OC=C GLVVKKSPKXTQRB-UHFFFAOYSA-N 0.000 description 1
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000003203 everyday effect Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000007765 extrusion coating Methods 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 239000000113 methacrylic resin Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- PJUIMOJAAPLTRJ-UHFFFAOYSA-N monothioglycerol Chemical compound OCC(O)CS PJUIMOJAAPLTRJ-UHFFFAOYSA-N 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 210000000056 organ Anatomy 0.000 description 1
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920003050 poly-cycloolefin Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001083 polybutene Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 239000011116 polymethylpentene Substances 0.000 description 1
- 229920000306 polymethylpentene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229920006264 polyurethane film Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 210000003660 reticulum Anatomy 0.000 description 1
- 230000035807 sensation Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000010557 suspension polymerization reaction Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
- G02B5/085—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal
- G02B5/0858—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal the reflecting layers comprising a single metallic layer with one or more dielectric layers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/36—Layered products comprising a layer of synthetic resin comprising polyesters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/36—Layered products comprising a layer of synthetic resin comprising polyesters
- B32B27/365—Layered products comprising a layer of synthetic resin comprising polyesters comprising polycarbonates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
- B32B7/023—Optical properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/12—Interconnection of layers using interposed adhesives or interposed materials with bonding properties
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/01—Head-up displays
- G02B27/0101—Head-up displays characterised by optical features
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2250/00—Layers arrangement
- B32B2250/24—All layers being polymeric
- B32B2250/244—All polymers belonging to those covered by group B32B27/36
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2255/00—Coating on the layer surface
- B32B2255/10—Coating on the layer surface on synthetic resin layer or on natural or synthetic rubber layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2255/00—Coating on the layer surface
- B32B2255/20—Inorganic coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2255/00—Coating on the layer surface
- B32B2255/20—Inorganic coating
- B32B2255/205—Metallic coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2255/00—Coating on the layer surface
- B32B2255/28—Multiple coating on one surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/416—Reflective
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2551/00—Optical elements
- B32B2551/08—Mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/01—Head-up displays
- G02B2027/0192—Supplementary details
- G02B2027/0194—Supplementary details with combiner of laminated type, for optical or mechanical aspects
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/40—Solar thermal energy, e.g. solar towers
Definitions
- the image from the light source is formed as a virtual image on the windshield in the dashboard device, so that the image is visually recognized by the driver.
- a mirror surface having a high reflectance is required. From the viewpoint of improving driving safety, head-up displays that require less movement of the viewpoint are attracting attention day by day, and the demand for mirror surfaces used as their reflectors is also increasing.
- a plastic substrate, especially a polycarbonate substrate due to its high heat resistance is used as the support substrate constituting the mirror surface. There is.
- the conventional mirror body manufacturing method a method of forming a metal thin film on a polycarbonate substrate by using a batch type vapor deposition / sputtering device has been common.
- the batch-type manufacturing method has a problem that the production efficiency is low and the demand for the mirror surface is increasing every day, but the supply is insufficient, and the mirror surface that can be manufactured with high productivity is desired. Further, the mirror surface is required to have high reflectance and suppress distortion of reflected light.
- Patent Document 1 discloses a film mirror having at least a light reflecting layer, a resin base material, and an adhesive layer in which the adhesive layer is formed of an acrylic adhesive, and is used in a reflecting device for solar thermal power generation.
- Patent Document 2 describes the first low refraction having a specific refractive index and optical film thickness for the purpose of obtaining an aluminum surface reflector having excellent scratch resistance and moisture resistance and a small difference in refractive index depending on the wavelength.
- An aluminum surface reflector in which a rate layer, a high refractive index layer, and a second low refractive index layer are laminated on an aluminum surface is disclosed.
- the inventors have studied a film mirror laminate capable of producing a mirror member that can be used as a mirror surface with high productivity by attaching it to a support base material made of resin.
- a film mirror laminate capable of producing a mirror member that can be used as a mirror surface with high productivity by attaching it to a support base material made of resin.
- the film mirror laminate may curl (warp), and the reflected light may be distorted when applied to the mirror member, and the reflection performance is not sufficient for use as a mirror surface in a head-up display device. I found out. Therefore, a mirror member having both high reflectance and excellent curl suppression and having excellent reflection performance, and a film that can be easily adapted to a complicated curved surface shape that can provide the mirror member with high productivity.
- a mirror laminate There is a demand for a mirror laminate.
- the present invention has been completed in view of the above, and the object thereof is to provide a mirror member having both high reflectance and excellent curl suppression, excellent reflection performance, and the mirror member with high productivity. It is an object of the present invention to provide a film mirror laminate that can be easily adapted to a complicated curved surface shape or the like.
- the present invention is as follows. [1] It has a base film, a metal reflective layer, a first low refractive index layer, a high refractive index layer, and a second low refractive index layer in this order.
- the thickness of the second low refractive index layer is 10 nm or more and 60 nm or less.
- Film mirror laminate [2] The film mirror laminate according to [1], wherein the thickness of the metal reflective layer is 100 ⁇ m or less.
- [3] The film mirror laminate according to [1] or [2], wherein the first low refractive index layer and the second low refractive index layer contain silicon oxide.
- the metal reflective layer is any one of at least one metal selected from aluminum (Al), zinc (Zn), lead (Pb), copper (Cu), and silver (Ag), and an alloy containing the metal as a main component.
- [6] The film mirror laminate according to any one of [1] to [5] and the supporting base material are provided. A mirror member in which the film mirror laminate is attached to the support base material via an adhesive layer.
- the present invention can easily adapt to a mirror member having both high reflectance and excellent curl suppression, a mirror member having excellent reflection performance, and a complicated curved surface shape which can provide the mirror member with high productivity. Can provide a flexible film mirror laminate.
- FIG. 1 is a schematic cross-sectional view of a film mirror laminate according to an embodiment of the present invention.
- FIG. 2 is a schematic cross-sectional view of a mirror member according to an embodiment of the present invention.
- FIG. 3 is a diagram showing the relationship between the wavelength (380 nm to 680 nm) of the incident light of 30 ° in the mirror member of Example 2 and the reflectance (%) simulation.
- FIG. 4 is a diagram showing the relationship between the wavelength (380 nm to 680 nm) of incident light at 30 ° and the reflectance (%) simulation in the mirror members of Example 3, Example 4, and Comparative Example 3.
- FIG. 3 is a diagram showing the relationship between the wavelength (380 nm to 680 nm) of incident light of 30 ° in the mirror member of Example 2 and the reflectance (%) simulation.
- FIG. 4 is a diagram showing the relationship between the wavelength (380 nm to 680 nm) of incident light at 30 ° and the reflectance (%) simulation in the mirror members
- FIG. 5 is a diagram showing the relationship between the wavelength (380 nm to 680 nm) of incident light at 30 ° and the reflectance (%) simulation in the mirror members of Examples 5, 6, and Comparative Example 4.
- FIG. 6 is a diagram showing the relationship between the wavelength (380 nm to 680 nm) of the incident light of 30 ° and the reflectance (%) simulation in the mirror members of Examples 7, 8 and 9.
- FIG. 7 is a diagram showing the relationship between the wavelength (380 nm to 680 nm) of the incident light of 30 ° and the reflectance (%) simulation in the mirror members of Examples 10, 11, and 12.
- the base film 11 may be formed with a hard coat layer such as a smooth or antiglare hard coat layer, if necessary. By providing the hard coat layer, scratch resistance can be improved.
- the hardcourt layer can be formed from the hardcourt composition. More specifically, it can be formed by applying a solution containing a curable resin to the base film 11 as a hard coat composition.
- the curable resin include thermosetting resins, ultraviolet curable resins, and electron beam curable resins.
- the thickness of the hard coat layer is preferably 0.5 ⁇ m or more, more preferably 1.0 ⁇ m or more, and preferably 10 ⁇ m or less, more preferably 7.0 ⁇ m or less, still more preferably 5.0 ⁇ m or less.
- the thickness of the hard coat layer can be measured using, for example, a film thickness meter (digital dial gauge).
- the metal reflective layer 12 is made of a metal having a relatively low melting point, as well as being able to exhibit sufficient brilliance. This is because the metal reflective layer 12 is preferably formed by thin film growth using sputtering. For this reason, a metal having a melting point of about 1000 ° C. or lower is suitable as the metal reflective layer 12, and for example, aluminum (Al), zinc (Zn), lead (Pb), copper (Cu), and silver ( It is preferable to contain at least one metal selected from Ag) and any of the alloys containing the metal as a main component. In particular, Al and their alloys are preferable because of the brilliance, stability, price, and the like of the substance. When an aluminum alloy is used, the aluminum content is preferably 50% by mass or more.
- the thickness of the metal reflective layer 12 is usually preferably 20 nm or more so as to exhibit sufficient brilliance, while it is usually preferably 100 nm or less from the viewpoint of sheet resistance and electromagnetic wave transmission. For example, 20 nm to 100 nm is preferable, and 30 nm to 70 nm is more preferable. This thickness is also suitable for forming a uniform film with high productivity, and also looks good when a mirror member produced by attaching the film mirror laminate 1 to a support base material is used as a mirror surface body. good.
- the first low refractive index layer 13a, the high refractive index layer 13b, and the second are on the surface of the metal reflective layer 12 opposite to the base film 11.
- the low refractive index layer 13c is provided in this order, and the thickness of the second low refractive index layer 13c is 10 nm or more and 60 nm or less.
- the first low refractive index layer 13a, the high refractive index layer 13b, and the second low refractive index layer 13c function as a reflection hue adjusting layer.
- the film mirror laminate may be curled and the reflected light may be distorted when applied to the mirror member.
- Examples of the material of the first low refractive index layer and the second low refractive index layer include metal oxides and metal fluorides.
- the metal element contained in the metal oxide and the metal fluoride referred to here includes a metalloid element such as Si.
- the metal oxide and / or the metal fluoride includes a metal acid fluoride.
- the metal oxide may be an oxide of a single metal element (single oxide) or an oxide of a plurality of metal elements (composite oxide).
- the metal fluoride may be a fluoride of a single metal element (single fluoride) or a fluoride of a plurality of metal elements (composite fluoride).
- Examples of the metal element include Si and Mg.
- the high refractive index layer is preferably a layer made of a metal oxide and / or a metal nitride.
- the metal element contained in the metal oxide and the metal nitride referred to here includes a metalloid element such as Si. Further, the metal oxide and / or the metal nitride includes a metal oxynitride. Further, the metal oxide may be an oxide of a single metal element (single oxide) or an oxide of a plurality of metal elements (composite oxide). Similarly, the metal nitride may be a nitride of a single metal element (single nitride) or a nitride of a plurality of metal elements (composite nitride). Examples of the metal element include Ce, Nb, Si, Sb, Ti, Ta, Zr, Zn and the like.
- a material for the high refractive index layer for example, CeO 2 (2.30), NbO (2.33), Nb 2 O 3 (2.15), Nb 2 O 5 (2.32). , SiN (2.03), Sb 2 O 3 (2.10), TiO 2 (2.35), Ta 2 O 5 (2.10), ZrO 2 (2.05), ZnO (2.10) , ZnS (2.30), tin-doped indium oxide (ITO), antimony-doped tin oxide (ATO), etc. (the numerical values in parentheses of each of the above materials are the refractive index).
- the high refractive index layer preferably contains at least one selected from Nb, Si, and Ti, and preferably contains at least one selected from, for example, NbO x , SiN x , and TiO x , and NbO x (oxidation). It is more preferable to include niobium).
- the thickness of the high refractive index layer is preferably 50 nm or more, more preferably 52 nm or more, and further preferably 53 nm or more from the viewpoint of adjusting the visible light reflection spectrum to a desired range. Further, from the viewpoint of adjusting the visible light reflection spectrum to a desired range, it is preferably 100 nm or less, more preferably 59 nm or less, and further preferably 55 nm or less.
- the first low refractive index layer 13a, the high refractive index layer 13b, and the second low refractive index layer 13c are provided in this order on the metal reflective layer 12, and the second There is no particular limitation as long as the thickness of the low refractive index layer is 10 nm or more and 60 nm or less.
- the metal reflective layer 12 side a three-layer structure consisting of a first low refractive index layer, a high refractive index layer, and a second low refractive index layer; a high refractive index layer and a first low refractive index layer.
- the film mirror laminate according to the embodiment of the present invention includes the base film 11, the first low refractive index layer 13a, the high refractive index layer 13b, the second low refractive index layer 13c, and the metal reflective layer 12.
- Other layers may be provided depending on the application. Examples of other layers include an adhesive layer, a protective layer, a hard coat layer, a barrier layer, an easy-adhesion layer, an antireflection layer, a light extraction layer, an antiglare layer and the like.
- some oxides, such as niobium oxide are reduced when exposed to ultraviolet light while being laminated with an adhesive, and in order to prevent the reducing action, a layer made of silicon oxide is further laminated as a protective layer. You may be doing it.
- the pressure-sensitive adhesive layer 10 can be formed from the pressure-sensitive adhesive.
- the pressure-sensitive adhesive forming the pressure-sensitive adhesive layer 10 is preferably a transparent pressure-sensitive adhesive.
- any of the polyether adhesives can be used alone or in combination of two or more. From the viewpoint of transparency, processability, durability and the like, it is preferable to use an acrylic pressure-sensitive adhesive.
- the adhesive layer 10 is protected by a release liner until it is attached to the adherend member.
- the pressure-sensitive adhesive forming the pressure-sensitive adhesive layer 10 is preferably formed by a pressure-sensitive adhesive composition containing a base polymer (hereinafter, may be simply referred to as a “pressure-sensitive adhesive composition”).
- a base polymer a known polymer used for the pressure-sensitive adhesive can be used.
- the base polymer refers to the main component of the polymer contained in the pressure-sensitive adhesive composition.
- the “main component” refers to a component contained in an amount of more than 50% by mass, unless otherwise specified.
- the pressure-sensitive adhesive composition preferably contains a (meth) acrylic polymer as a base polymer.
- (meth) acrylate means acrylate and / or methacrylate. Some monomers constituting the (meth) acrylic polymer may be contained as unreacted monomers in the pressure-sensitive adhesive composition.
- the (meth) acrylic polymer in the embodiment of the present invention is preferably a hydroxyl group-containing (meth) acrylic polymer containing an alkyl (meth) acrylate and a hydroxyl group-containing monomer as a monomer unit.
- the method for introducing a hydroxyl group is not particularly limited, but for example, a method for copolymerizing a hydroxyl group-containing monomer can be easily performed.
- alkyl (meth) acrylate examples include methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate, and 2-ethylhexyl (meth) acrylate. Be done. These compounds may be used alone or in combination of two or more.
- the glass transition temperature (Tg) of the (meth) acrylic polymer is preferably 0 ° C. or lower (usually ⁇ 100 ° C. or higher), preferably ⁇ 10 ° C. or lower.
- the glass transition temperature (Tg) of the (meth) acrylic polymer can be adjusted within the above range by appropriately changing the monomer component and the composition ratio to be used.
- polymerizable monomers used in the (meth) acrylic polymer include, for example, a sulfonic acid group-containing monomer, a phosphoric acid group-containing monomer, a cyano group-containing monomer, a vinyl ester monomer, an aromatic vinyl monomer, and the like. It has a property-enhancing component and a functional group that acts as an adhesive strength improving and cross-linking base point for acid anhydride group-containing monomers, amide group-containing monomers, amino group-containing monomers, epoxy group-containing monomers, N-acryloylmorpholine, vinyl ether monomers, etc. Ingredients can be used as appropriate. These monomer compounds may be used alone or in combination of two or more.
- Examples of the cyano group-containing monomer include acrylonitrile and methacrylonitrile.
- vinyl ester monomer examples include vinyl acetate, vinyl propionate, vinyl laurate and the like.
- aromatic vinyl monomer examples include styrene, chlorostyrene, chloromethylstyrene, ⁇ -methylstyrene and the like.
- amide group-containing monomer examples include acrylamide, diethylacrylamide, N-vinyl-2-pyrrolidone and the like.
- amino group-containing monomer examples include N, N-dimethylaminoethyl (meth) acrylate, N, N-dimethylaminopropyl (meth) acrylate, N- (meth) acryloylmorpholine, and (meth) alkylaminoalkyl acrylate.
- epoxy group-containing monomer examples include glycidyl (meth) acrylate and allyl glycidyl ether.
- vinyl ether monomer examples include methyl vinyl ether, ethyl vinyl ether, isobutyl vinyl ether and the like.
- the polymerization method of the (meth) acrylic polymer is not particularly limited, and known polymerization methods such as solution polymerization, emulsion polymerization, suspension polymerization and UV polymerization can be adopted. Further, the obtained copolymer may be any of a random copolymer, a block copolymer, a graft copolymer and the like.
- the pressure-sensitive adhesive composition may contain a polymer component other than the above-mentioned base polymer.
- the pressure-sensitive adhesive composition preferably contains a cross-linking agent, and it is preferable to use an isocyanate-based cross-linking agent as the cross-linking agent.
- Isocyanate-based cross-linking agents are used to impart adhesion and cohesiveness.
- Aromatic isocyanates such as 4,4'-diphenylmethane diisocyanate and xylylene diisocyanate, trimethylolpropane / tolylene diisocyanate trimer adduct (trade name: Coronate L, manufactured by Nippon Polyurethane Industry Co., Ltd.), trimethylolpropane / hexamethylene.
- Aromatic isocyanates such as 4,4'-diphenylmethane diisocyanate and xylylene diisocyanate, trimethylolpropane / tolylene diisocyanate trimer adduct (trade name: Coronate L, manufactured by Nippon Polyurethane Industry Co., Ltd.), trimethylolpropane / hexamethylene.
- isocyanate adducts such as diisocyanate trimer adduct (trade name Coronate HL, manufactured by Nippon Polyurethane Industry Co., Ltd.) and isocyanur
- those having an isocyanurate ring are particularly preferable, and for example, a polyisocyanate having an isocyanurate ring modified with a long-chain alkylene diol (Bernock DN-995 manufactured by Dainippon Ink and Chemicals, Inc.) and an isocyanurate compound of hexamethylene diisocyanate. (Product name: Coronate HX, manufactured by Nippon Polyurethane Industry Co., Ltd.) and the like. These compounds may be used alone or in combination.
- the content of the cross-linking agent used in the embodiment of the present invention may be blended to such an extent that it does not affect the adhesive properties, but is usually 0.2 to 10 parts by mass with respect to 100 parts by mass of the (meth) acrylic polymer. It is contained, preferably 0.5 to 8 parts by mass, and more preferably 1 to 6 parts by mass.
- the pressure-sensitive adhesive composition contains a polyfunctional (meth) acrylic monomer such as 1,6-hexanediol diacrylate as a cross-linking component.
- the (meth) acrylic monomer in the embodiment of the present invention means an acrylic monomer and / or a methacrylic monomer.
- the polyfunctional (meth) acrylic monomer is usually contained in an amount of 0.2 to 10 parts by mass and preferably 0.5 to 8 parts by mass with respect to 100 parts by mass of the (meth) acrylic polymer. It is more preferable that the content is 6 parts by mass.
- the acrylic pressure-sensitive adhesives include cross-linking agents (polyamine compounds, melamine resins, aziridine derivatives, urea resins), polymerization initiators, tackifiers, plasticizers, silane coupling agents, colorants, and pigments other than those exemplified above.
- Powders such as dyes, surfactants, surface lubricants, leveling agents, softeners, antioxidants, antistatic agents, antioxidants, light stabilizers, UV absorbers, polymerization inhibitors, inorganic or organic fillings Agents, metal powders, particles, foils and the like can also be used as appropriate. These components may be used alone or in combination of two or more.
- the pressure-sensitive adhesive layer can also be formed, for example, by applying the pressure-sensitive adhesive composition on a base film and drying and removing a solvent or the like. When applying the pressure-sensitive adhesive composition, one or more solvents may be added as appropriate. Further, the pressure-sensitive adhesive layer is formed, for example, by adhering a base film to the surface of the laminate of the pressure-sensitive adhesive layer and the protective film formed on the protective film by the pressure-sensitive adhesive composition on the pressure-sensitive adhesive layer side. You can also do it.
- the thickness of the pressure-sensitive adhesive layer is preferably 5 ⁇ m or more, more preferably 10 ⁇ m or more, still more preferably 25 ⁇ m or more, from the viewpoint of appearance when the film mirror laminate and the supporting base material are bonded to each other. .. Further, from the viewpoint of suppressing foaming generated by high temperature heating, it is preferably 100 ⁇ m or less, more preferably 75 ⁇ m or less, and further preferably 50 ⁇ m or less. The thickness of the pressure-sensitive adhesive layer can be measured with a dial gauge.
- Various methods are used as the method for applying the pressure-sensitive adhesive composition. Specifically, for example, roll coat, kiss roll coat, gravure coat, reverse coat, roll brush, spray coat, dip roll coat, bar coat, knife coat, air knife coat, curtain coat, lip coat, die coater, etc. Examples include the extrusion coating method.
- the heating and drying temperature is preferably 30 ° C to 200 ° C, more preferably 40 ° C to 180 ° C, and even more preferably 80 ° C to 160 ° C. By setting the heating temperature in the above range, a pressure-sensitive adhesive layer having excellent pressure-sensitive properties can be obtained.
- As the drying time an appropriate time may be adopted as appropriate. The drying time is preferably 5 seconds to 20 minutes, more preferably 30 seconds to 10 minutes, still more preferably 1 minute to 8 minutes.
- the pressure-sensitive adhesive layer can be formed by irradiating with active energy rays such as ultraviolet rays.
- active energy rays such as ultraviolet rays.
- a high-pressure mercury lamp, a low-pressure mercury lamp, a metal halide lamp, a chemical light lamp, or the like can be used for ultraviolet irradiation.
- the pressure-sensitive adhesive layer in the film mirror laminate can be protected by a release sheet (separator).
- a release sheet separatator
- the pressure-sensitive adhesive layer is protected by a release sheet, and then the release sheet can be peeled off and bonded to a supporting base material to manufacture a mirror member.
- the release sheet is not particularly limited as long as it can protect the pressure-sensitive adhesive layer, and is, for example, a porous material such as a plastic film, paper, cloth, or non-woven fabric, a net, a foam sheet, a metal foil, and the like.
- a porous material such as a plastic film, paper, cloth, or non-woven fabric, a net, a foam sheet, a metal foil, and the like.
- An appropriate thin leaf body such as a laminated body can be mentioned, but a plastic film is preferably used because of its excellent surface smoothness.
- plastic film examples include polyethylene film, polypropylene film, polybutene film, polybutadiene film, polymethylpentene film, polyvinyl chloride film, vinyl chloride copolymer film, polyethylene terephthalate film, polybutylene terephthalate film, polyurethane film, and ethylene.
- -Vinyl acetate copolymer film and the like can be mentioned.
- the thickness of the release sheet is usually 5 to 200 ⁇ m, preferably 5 to 100 ⁇ m.
- the release sheet may be subjected to mold release and antifouling treatment with a silicone-based, fluorine-based, long-chain alkyl-based or fatty acid amide-based mold release agent, silica powder, etc., as well as a coating type, a kneading type, and a vapor deposition.
- Antistatic treatment such as mold can also be performed.
- the peelability from the pressure-sensitive adhesive layer can be further enhanced by appropriately performing a peeling treatment such as a silicone treatment, a long-chain alkyl treatment, or a fluorine treatment on the surface of the peeling sheet.
- the forming method for forming the metal reflective layer 12, the first low refractive index layer 13a, the high refractive index layer 13b, and the second low refractive index layer 13c is not particularly limited, and for example, a vacuum vapor deposition method or a sputtering method. , Ion plating method and the like.
- the sputtering method is preferable because the thickness can be strictly controlled even in a large area.
- the base film at the time of film formation is formed.
- the tension of the film mirror laminate By adjusting the tension of the film mirror laminate, the heating dimension change rate of the film mirror laminate can be adjusted.
- the tension of the base film at the time of film formation include feeding tension, intermediate tension, and winding tension.
- the feeding tension is the tension when the film is fed onto the pass line from the original fabric in which the film is wound, and the tension between the feeding portion and the first tension cutting portion is the feeding tension. From the viewpoint of tightening the roll, it is preferable that the force is close to the tension at which the roll is wound.
- the film mirror laminate according to the embodiment of the present invention can be used as a mirror member. Further, the film mirror laminate according to the embodiment of the present invention can also be used for decorating members. For example, it may be used by being attached to an adherend member, and the adherend member may be, for example, a member made of glass or plastic, but is not limited thereto.
- FIG. 2 is a schematic cross-sectional view of a mirror member according to an embodiment of the present invention.
- the mirror member 100 shown in FIG. 2 has a base film 11, a metal reflective layer 12, a first low refractive index layer 13a, a high refractive index layer 13b, and a second low refractive index layer 13c in this order.
- a film mirror laminate having a thickness of the second low refractive index layer 13c of 10 nm or more and 60 nm or less is attached to the support base material 21 via the pressure-sensitive adhesive layer 10.
- the method for manufacturing a mirror member according to an embodiment of the present invention is a step of corona-treating at least a part of the surface of the support base material, and a pressure-sensitive adhesive layer of the film mirror laminate on the corona-treated surface of the support base material. It may include a step of sticking to the support base material via the above.
- the material of the supporting base material is not particularly limited, and examples thereof include resin, glass, and metal, and it is preferable to use resin.
- the resin include polyester resins such as polyethylene terephthalate (PET), polybutylene terephthalate, and polyethylene naphthalate, and (meth) acrylic resins (acrylic resin and / or methacrylic resin) such as polymethacrylate, such as polyethylene and polypropylene.
- Organ resin such as cycloolefin polymer (for example, norbornen type, cyclopentadiene type), for example, polycarbonate resin, polyether sulfone resin, polyarylate resin, melamine resin, polyamide resin, polyimide resin, cellulose resin, polystyrene resin and the like. Be done. These materials can be used alone or in combination of two or more. Of these, a polycarbonate resin is preferable because it can be made black and has a light-shielding property.
- cycloolefin polymer for example, norbornen type, cyclopentadiene type
- polycarbonate resin for example, polycarbonate resin, polyether sulfone resin, polyarylate resin, melamine resin, polyamide resin, polyimide resin, cellulose resin, polystyrene resin and the like.
- a polycarbonate resin is preferable because it can be made black and has a light-shielding property.
- films mirror laminates and mirror members Applications of the film mirror laminate and the mirror member according to the embodiment of the present invention include, for example, structural parts for vehicles, vehicle-mounted products such as head-up displays, housings for electronic devices, housings for home appliances, structural parts, and the like. Examples thereof include mechanical parts, various automobile parts, electronic equipment parts, furniture, kitchen appliances and other household goods, medical equipment, building material parts, and other structural parts and exterior parts. More specifically, in the vehicle field, instrument panels, console boxes, door knobs, door trims, shift levers, pedals, glove boxes, bumpers, bonnets, fenders, trunks, doors, roofs, pillars, seats, steering wheels.
- ECU box electrical parts, engine peripheral parts, drive system / gear peripheral parts, intake / exhaust system parts, cooling system parts and the like.
- home appliances such as refrigerators, washing machines, vacuum cleaners, microwave ovens, air conditioners, lighting equipment, electric water heaters, TVs, watches, ventilation fans, projectors, speakers, personal computers, mobile phones , Smartphones, digital cameras, tablet PCs, portable music players, portable game machines, chargers, electronic information devices such as batteries, and the like.
- Example 1 Preparation of adhesion layer
- a PET film Lumirror manufactured by Toray Industries, Inc. product number: QTQ2, thickness 50 ⁇ m, with HC layer
- the pure silicon target and the base film were set in a magnetron sputtering apparatus for a laboratory, and a silicon oxide layer (SiO 2 layer) having a thickness of 5 nm was formed as an adhesion layer on one side of the base film.
- the Al target and the base film on which the adhesion layer was formed were set in a magnetron sputtering apparatus for a laboratory, and an aluminum layer (Al layer) having a thickness of 44 nm was formed as a metal reflection layer on the adhesion layer.
- the feeding tension and winding tension of the base film were set to 50N, and the intermediate tension was set to 50N.
- a pure silicon target and a pure niobium target were used as targets, oxygen gas was introduced in addition to argon gas, and reactive sputtering was performed to obtain transparent oxides, respectively.
- a thin film was obtained.
- the feeding tension and winding tension of the base film were set to 50N, and the intermediate tension was set to 50N.
- a film mirror laminate 1 in which a thin layer is formed in the order of silicon oxide 5 nm, aluminum 44 nm, silicon oxide 67 nm, niobium oxide 53 nm, and silicon oxide 40 nm on one surface of a 50 ⁇ m PET base material (base film). was produced.
- Adhesive Composition 1 (Preparation of Oligomer Composition 1) 60 parts by mass of dicyclopentanyl methacrylate (DCPMA) and 40 parts by mass of methyl methacrylate (MMA) as a monomer component, 3.5 parts by mass of ⁇ -thioglycerol as a chain transfer agent, and 100 parts by mass of toluene as a polymerization solvent are mixed. Then, the mixture was stirred at 70 ° C. for 1 hour under a nitrogen atmosphere. Next, 0.2 parts by mass of 2,2'-azobisisobutyronitrile (AIBN) was added as a thermal polymerization initiator, and the mixture was reacted at 70 ° C.
- DICPMA dicyclopentanyl methacrylate
- MMA methyl methacrylate
- AIBN 2,2'-azobisisobutyronitrile
- Adhesive Composition 1 100 parts by mass of the obtained prepolymer composition, 15 parts by mass of the oligomer composition, 1,6-hexanediol diacrylate (trade name "A-HD-N", manufactured by Shin-Nakamura Chemical Industry Co., Ltd.) 0. 3 parts by mass and 0.3 parts by mass of a silane coupling agent (trade name "KBM-403", manufactured by Shin-Etsu Chemical Industry Co., Ltd.) were added and mixed uniformly to obtain a pressure-sensitive adhesive composition 1. The gel fraction was 82%.
- Adhesive sheet 1 A 75 ⁇ m-thick polyethylene terephthalate (PET) film (“Diafoil MRF75” manufactured by Mitsubishi Chemical Corporation) with a silicone-based release layer on the surface is used as a base material (heavy release film), and the above-mentioned adhesiveness is applied on the base material.
- the agent composition 1 was applied so as to have a thickness of 25 ⁇ m to form a coating layer.
- This laminated body is photo-cured by irradiating it with ultraviolet rays from the cover sheet side with a black light whose position is adjusted so that the irradiation intensity on the irradiation surface directly under the lamp is 5 mW / cm 2, and the pressure-sensitive adhesive layer has a thickness of 25 ⁇ m.
- An adhesive sheet made of was obtained.
- the light release film of the pressure-sensitive adhesive sheet having a thickness of 25 ⁇ m produced above was peeled off and bonded to the surface of the base film of the laminate 1 which was not sputter-deposited to obtain a laminate.
- the heavy release film on the adhesive layer side of the obtained laminate is peeled off and bonded to a 3.0 mm thick polycarbonate base material (Carboglass black manufactured by Asahi Glass Co., Ltd.) as a support base material to prepare a mirror member. did.
- the size of the obtained mirror member is 50 mm ⁇ 150 mm.
- Example 1 A film mirror laminate and a mirror member were produced in the same manner as in Example 1 except that the thickness of the second low refractive index layer was changed to 100 nm.
- Examples 3 to 12, Comparative Examples 3 and 4 Using the film mirror laminate and the mirror member shown in Table 3 as a simulation model, the reflectance at a wavelength (380 nm to 680 nm) when incident was performed under the same conditions as in Example 1 was simulated. The relationship between the wavelength (380 nm to 680 nm) and the reflectance (%) simulation is shown in FIGS. 4 to 7.
- FIG. 4 is a diagram showing the relationship between the wavelength (380 nm to 680 nm) of incident light at 30 ° and the reflectance (%) simulation in the mirror members of Example 3, Example 4, and Comparative Example 3.
- FIG. 4 is a diagram showing the relationship between the wavelength (380 nm to 680 nm) of incident light at 30 ° and the reflectance (%) simulation in the mirror members of Example 3, Example 4, and Comparative Example 3.
- FIG. 4 is a diagram showing the relationship between the wavelength (380 nm to 680 nm) of incident light at 30 ° and the reflectance (%) simulation in the mirror members
- Film mirror laminate 10 Adhesive layer 11 Base film 12 Metal reflective layer 13 Reflective hue adjustment layer 13a First low refractive index layer 13b High refractive index layer 13c Second low refractive index layer 21 Support base material 100 Mirror member
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Abstract
Description
運転の安全性を高める観点より、視点の移動が少なくて済むヘッドアップディスプレイは、日に日に注目を高めており、その反射鏡として利用される鏡面体の需要も高まっている。また車両の衝突等の事故により破損するリスクが低いこと、重量が軽いことなどの理由から、鏡面体を構成する支持基板としては、プラスチック基板、特に耐熱性の高さよりポリカーボネート基板等が用いられている。
従来の鏡面体の製法ではバッチ式の蒸着・スパッタ装置を用いて、ポリカーボネート基板に金属薄膜を形成する手法が一般的であった。しかし、バッチ式製法は生産の効率が低く、日々鏡面体の需要が高まる傾向に対し、供給不足となるという課題があり、生産性良く製造し得る鏡面体が望まれている。また、鏡面体には、高い反射率と反射光の歪みを抑えることが要求される。
また、特許文献2には、耐擦傷性および耐湿性に優れ、波長による反射率差が少ないアルミニウム表面反射鏡を得ることを目的として、特定の屈折率および光学的膜厚を有する第一低屈折率層、高屈折率層および第二低屈折率層を、アルミニウム表面に積層したアルミニウム表面反射鏡が開示されている。
そこで、高い反射率と優れたカールの抑制を両立し、優れた反射性能を有するミラー部材、及び該ミラー部材を生産性良く提供し得る、複雑な曲面形状等へも簡単に適応が可能なフィルムミラー積層体が求められている。
〔1〕
基材フィルム、金属反射層、第一の低屈折率層、高屈折率層、及び第二の低屈折率層をこの順に有し、
前記第二の低屈折率層の厚みが10nm以上60nm以下である、
フィルムミラー積層体。
〔2〕
前記金属反射層の厚みが、100μm以下である、〔1〕に記載のフィルムミラー積層体。
〔3〕
前記第一の低屈折率層及び前記第二の低屈折率層が酸化珪素を含有する、〔1〕又は〔2〕に記載のフィルムミラー積層体。
〔4〕
前記高屈折率層が酸化ニオブを含有する、〔1〕~〔3〕のいずれか一項に記載のフィルムミラー積層体。
〔5〕
前記金属反射層は、アルミニウム(Al)、亜鉛(Zn)、鉛(Pb)、銅(Cu)、銀(Ag)から選択された少なくとも一種の金属、および該金属を主成分とする合金のいずれかを含む、〔1〕~〔4〕のいずれか一項に記載のフィルムミラー積層体。
〔6〕
〔1〕~〔5〕のいずれか一項に記載のフィルムミラー積層体と支持基材とを備え、
前記フィルムミラー積層体が、粘着剤層を介して前記支持基材に貼付されている、ミラー部材。
図1に、本発明の一実施形態によるフィルムミラー積層体1の概略断面図を示す。
本発明の実施形態に係るフィルムミラー積層体1は、基材フィルム11、金属反射層12、第一の低屈折率層13a、高屈折率層13b、及び第二の低屈折率層13cをこの順に有し、前記第二の低屈折率層の厚みが10nm以上60nm以下である。
本発明の実施形態に係るフィルムミラー積層体1において、第一の低屈折率層13a、高屈折率層13b、及び第二の低屈折率層13cは反射色相調整層として機能し、光の波長による反射スペクトルを調整し、反射率を上げることを可能とする。
金属反射層12上に、第一の低屈折率層13a、高屈折率層13b、及び第二の低屈折率層13cの順に設け、第二の低屈折率層の厚みを10nm以上60nm以下とすることにより、高い反射率と優れたカールの抑制を両立し、優れた反射性能を有するフィルムミラー積層体が得られる。
基材フィルム11は、特に限定はされず、例えばポリエチレンテレフタレート(PET)、ポリエチレンナフタレート(PEN)、ポリブチレンテレフタレート、ポリアミド、ポリ塩化ビニル、ポリカーボネート(PC)、シクロオレフィンポリマー(COP)、ポリスチレン、ポリプロピレン(PP)、ポリエチレン、ポリシクロオレフィン、ポリウレタン、アクリル(PMMA)、ABSなどの単独重合体や共重合体からなるフィルムを用いることができる。これらの部材によれば、透明で光学吸収は少なく、視覚効果に影響を与えることもない。但し、後に基材フィルム11上に種々の層を形成するため、蒸着やスパッタ等の高温に耐え得るものであることが好ましく、従って、上記材料の中でも、例えば、ポリエチレンテレフタレート、ポリエチレンナフタレート、アクリル、ポリカーボネート、シクロオレフィンポリマー、ABS、ポリプロピレン、ポリウレタンが好ましい。なかでも、耐熱性とコストとのバランスがよいことからポリエチレンテレフタレートやシクロオレフィンポリマー、ポリカーボネート、アクリルが好ましい。基材フィルム11は、単層フィルムでもよいし積層フィルムでもよい。
加工のし易さ等から、厚さは、例えば、6μm~250μmが好ましい。より好ましくは20μm以上であり、更に好ましくは40μm以上である。また、より好ましくは100μm以下、更に好ましくは75μm以下である。また、基材フィルム上に形成される層との付着力を強くするために、プラズマ処理やコロナ処理、さらには易接着処理などが施されてもよい。
ハードコート層は、ハードコート組成物から形成することができる。より具体的には、硬化性樹脂を含有する溶液をハードコート組成物として基材フィルム11に塗布することにより形成できる。
硬化性樹脂としては、熱硬化型樹脂、紫外線硬化型樹脂、電子線硬化型樹脂等が挙げられる。硬化性樹脂の種類としてはポリエステル系、アクリル系、ウレタン系、アクリルウレタン系、アミド系、シリコーン系、シリケート系、エポキシ系、メラミン系、オキセタン系、アクリルウレタン系等の各種の樹脂が挙げられる。これら硬化性樹脂は、一種又は二種以上を、適宜選択して使用できる。これらの中でも、硬度が高く、紫外線硬化が可能で生産性に優れることから、アクリル系樹脂、アクリルウレタン系樹脂、及びエポキシ系樹脂が好ましい。
本実施形態における金属反射層12は、基材フィルム11の上に形成される。金属反射層12は、金属光沢を有する層であることが好ましい。金属反射層12を形成する材料に特に限定はなく、金属及び樹脂を含んでいてもよい。金属反射層12は金属層であってもよい。
金属反射層12が金属層である場合について説明する。
特に、物質の光輝性や安定性、価格等の理由からAlおよびそれらの合金が好ましい。また、アルミニウム合金を用いる場合には、アルミニウム含有量を50質量%以上とすることが好ましい。
本発明の実施形態に係るフィルムミラー積層体1は、金属反射層12の基材フィルム11とは反対側の面上に第一の低屈折率層13a、高屈折率層13b、及び第二の低屈折率層13cをこの順に有し、第二の低屈折率層13cの厚みが10nm以上60nm以下である。
第一の低屈折率層13a、高屈折率層13b、及び第二の低屈折率層13cは反射色相調整層として機能する。
従来の技術においては、フィルムミラー積層体にカールが生じ、ミラー部材に適用した場合に反射光に歪みが生じる場合があった。本発明者らは、フィルムミラー積層体のカールの発生は、高い反射率を得るために低屈折率層と高屈折率層を積層した反射色相調整層に起因すると考えた。そして、本発明者らの検討の結果、金属反射層12上に第一の低屈折率層13a、高屈折率層13b、及び第二の低屈折率層13cをこの順に設け、第二の低屈折率層の厚みを10nm以上60nm以下とすることで、高い反射率と優れたカールの抑制を両立し、優れた反射性能を有するフィルムミラー積層体が得られることを見出した。
第一の低屈折率層及び第二の低屈折率層は、高屈折率層よりも低い屈折率を有する層であり、その屈折率は、例えば1.35~1.55であり、好ましくは1.40~1.50である。第一の低屈折率層の屈折率は、第二の低屈折率層と同じであってもよく、異なっていてもよい。
本明細書において、「屈折率」は、特に言及しない限り、温度25℃で波長λ=550nmの光を用いて、JIS K0062:1992の規定に準拠して測定された値を意味する。
なお、ここでいう金属酸化物、金属フッ化物に含有される金属元素には、Si等の半金属元素が包含される。また、金属酸化物及び/又は金属フッ化物には、金属酸フッ化物が包含される。また、金属酸化物は、単独の金属元素の酸化物(単独酸化物)であってもよく、複数の金属元素の酸化物(複合酸化物)であってもよい。同様に、金属フッ化物は、単独の金属元素のフッ化物(単独フッ化物)であってもよく、複数の金属元素のフッ化物(複合フッ化物)であってもよい。
金属元素としては、例えば、Si、Mgなどが挙げられる。
高屈折率層は、第一の低屈折率層及び第二の低屈折率層よりも高い屈折率を有する層であり、その屈折率は、例えば1.6~3.2であり、好ましくは1.80~2.40の範囲である。高屈折率層を複数備える場合は、高屈折率層の屈折率は、同じであってもよく、異なっていてもよい。
金属元素としては、例えば、Ce、Nb、Si、Sb、Ti、Ta、Zr、Znなどが挙げられる。
特に、高屈折率層は、Nb、Si、Tiより選択される少なくとも一種を含むことが好ましく、例えばNbOx、SiNx、TiOxより選択される少なくとも一種を含むことが好ましく、NbOx(酸化ニオブ)を含むことがより好ましい。
また、屈折率1.50~1.85程度の中屈折率層として、例えば、酸化チタンや、上記低屈折率材料と高屈折率材料の混合物(酸化チタンと酸化珪素との混合物等)からなる薄膜をさらに備えていてもよい。
例えば、金属反射層12側から、第一の低屈折率層と、高屈折率層と、第二の低屈折率層との3層構成;高屈折率層と、第一の低屈折率層と、高屈折率層と、第二の低屈折率層との4層構成;第一の低屈折率層と、高屈折率層と、低屈折率層と、高屈折率層と、第二の低屈折率層との5層構成等が挙げられる。
また、反射色相調整層は、6層以上の薄膜の積層体でもよい。
本発明の実施形態に係るフィルムミラー積層体は、基材フィルム11、第一の低屈折率層13a、高屈折率層13b、及び第二の低屈折率層13c、金属反射層12の他に、用途に応じてその他の層を備えていてもよい。
その他の層としては、例えば、粘着剤層、保護層、ハードコート層、バリア層、易接着層、反射防止層、光取出し層、アンチグレア層等が挙げられる。
例えば、酸化物によっては、酸化ニオブのように、粘着剤と積層された状態で紫外光を受けると還元される物質もあり、還元作用を防ぐために、更に保護層として酸化珪素からなる層を積層していてもよい。
粘着剤層10は、粘着剤から形成することができる。
粘着剤層10を形成する粘着剤は透明粘着剤であることが好ましく、例えばアクリル系粘着剤、ゴム系粘着剤、シリコーン系粘着剤、ポリエステル系粘着剤、ウレタン系粘着剤、エポキシ系粘着剤、及びポリエーテル系粘着剤のいずれかを単独で、或いは、2種類以上を組み合わせて使用することができる。透明性、加工性及び耐久性などの観点から、アクリル系粘着剤を用いることが好ましい。
粘着剤組成物は、ベースポリマーとして(メタ)アクリル系ポリマーを含むことが好ましい。なお、(メタ)アクリレートはアクリレート及び/又はメタクリレートをいう。(メタ)アクリル系ポリマーを構成する一部のモノマーは粘着剤組成物中に未反応モノマーとして含まれていてもよい。
多官能(メタ)アクリル系モノマーは、通常(メタ)アクリル系ポリマー100質量部に対し、0.2~10質量部含有され、0.5~8質量部含有されていることが好ましく、1~6質量部含有されていることがより好ましい。
粘着剤層は、例えば、前記粘着剤組成物を基材フィルム上に塗布し、溶剤等を乾燥除去することにより形成することもできる。粘着剤組成物の塗布にあたっては、適宜に一種以上の溶剤を加えてもよい。
また、粘着剤層は、例えば、前記粘着剤組成物により保護フィルム上に形成した粘着剤層と保護フィルムとの積層体の粘着剤層側の面と、基材フィルムを貼り合せることにより形成することもできる。
粘着剤層の厚さは、ダイヤルゲージにより測定することができる。
例えば、フィルムミラー積層体の出荷時には粘着剤層を剥離シートにより保護した状態であり、その後、剥離シートを剥離し支持基材に貼り合わせてミラー部材を製造することができる。
本発明の実施形態に係るフィルムミラー積層体の製造方法は特に限定されない。例えば、基材フィルム11の一方の面に金属反射層12を形成し、金属反射層12上に第一の低屈折率層13a、高屈折率層13b、及び第二の低屈折率層13cをこの順に形成することができる。
フィルムミラー積層体は更に粘着剤層を備えていてもよく、粘着剤層10は、基材フィルム11の他方の面に、粘着剤層10を形成し得る組成物を塗布等により直接形成してもよく、別途形成した粘着剤層10を貼り合せることにより形成してもよい。
成膜時の基材フィルムの張力としては、例えば、繰り出し張力、中間張力、巻取り張力が挙げられる。
繰り出し張力はフィルムが巻かれた状態の原反からパスライン上にフィルムを送り出すときにおける張力であり、繰り出し部から最初の張力カット部間の張力が繰り出し張力となる。原反の巻き締まりの観点から原反を巻き取った張力に近い力であることが好ましい。
中間張力は繰り出し張力と巻取り張力を形成するために存在するそれぞれのパスカット部の間の張力であり、中間張力は、繰り出し張力、および巻取り張力よりも100N以上大きい張力であることが好ましく、200N以上大きい張力であることがより好ましい。また、中間張力は、繰り出し張力、および巻取り張力よりも400N以下小さい張力であることが好ましく、300N以下小さい張力であることがより好ましい。
巻取り張力はパスラインに流しているフィルムを原反として巻き取るときにおける張力であり、巻取り部から巻取り部より最も近い張力カット部間の張力が巻取り張力となる。次工程の観点から次工程の繰り出し張力に近い力であることが好ましい。
また、本発明の実施形態に係るフィルムミラー積層体は、部材の加飾に用いることもできる。例えば、被着部材に貼付して用いてもよく、被着部材としては、例えば、ガラスやプラスチックからなる部材を使用することができるが、これに限定されるものではない。
本発明の実施形態に係るミラー部材は、上記フィルムミラー積層体と支持基材とを備え、前記フィルムミラー積層体が、粘着剤層を介して前記支持基材に貼付されている。
図2は、本発明の一実施形態によるミラー部材の概略断面図である。図2に示すミラー部材100は、基材フィルム11、金属反射層12、第一の低屈折率層13a、高屈折率層13b、及び第二の低屈折率層13cをこの順に有し、第二の低屈折率層13cの厚みが10nm以上60nm以下であるフィルムミラー積層体が、粘着剤層10を介して支持基材21に貼付されている。
本発明の実施形態に係るミラー部材は、支持基材に貼付することにより作製できるため、複雑な曲面形状の部材であっても生産性良く製造することができる。
本発明の実施形態に係るミラー部材の製造方法は、前記支持基材の表面の少なくとも一部をコロナ処理する工程、及び該支持基材のコロナ処理面に、前記フィルムミラー積層体を粘着剤層を介して前記支持基材に貼付する工程を含んでいてもよい。
支持基材の材料としては、特に限定はなく、樹脂、ガラス、金属等が挙げられ、樹脂を用いることが好ましい。樹脂としては、例えば、ポリエチレンテレフタレート(PET)、ポリブチレンテレフタレート、ポリエチレンナフタレートなどのポリエステル樹脂、例えば、ポリメタクリレートなどの(メタ)アクリル樹脂(アクリル樹脂および/またはメタクリル樹脂)、例えば、ポリエチレン、ポリプロピレン、シクロオレフィンポリマー(例えば、ノルボルネン系、シクロペンタジエン系)などのオレフィン樹脂、例えば、ポリカーボネート樹脂、ポリエーテルスルフォン樹脂、ポリアリレート樹脂、メラミン樹脂、ポリアミド樹脂、ポリイミド樹脂、セルロース樹脂、ポリスチレン樹脂などが挙げられる。これらの材料は、単独使用または2種以上併用することができる。中でも、黒色にすることが可能であり遮光性の観点からポリカーボネート樹脂が好ましい。
本実施形態に係るフィルムミラー積層体及びミラー部材の反射率は、波長380nm~680nmの範囲における反射光の測定における反射率Yが、90%以上であることが好ましい。本発明の実施形態に係るフィルムミラー積層体及びミラー部材は、第二の低屈折率層の厚みが10nm以上60nm以下であるため、反射率Yを90%以上とすることができ、ヘッドアップディスプレイ装置における鏡面体に適した高い反射率のフィルムミラー積層体及びミラー部材とすることができる。
反射率Yは視感を表し、ディスプレイ映像の反射の観点から反射率Yは、91%以上であることがより好ましく、92%以上であることが更に好ましい。
反射率Yは、標準光源としてD65を使用して、(株)日立ハイテクサイエンス製の日立分光光度計 U-4100測定機器により測定することができる。反射率Yは、具体的には、実施例に記載の方法により測定することができる。
本発明の実施形態に係るフィルムミラー積層体及びミラー部材の用途としては例えば、車両用構造部品、ヘッドアップディスプレイ等の車両搭載用品、電子機器の筐体、家電機器の筐体、構造用部品、機械部品、種々の自動車用部品、電子機器用部品、家具、台所用品等の家財向け用途、医療機器、建築資材の部品、その他の構造用部品や外装用部品等が挙げられる。より具体的には、車両関係では、インスツルメントパネル、コンソールボックス、ドアノブ、ドアトリム、シフトレバー、ペダル類、グローブボックス、バンパー、ボンネット、フェンダー、トランク、ドア、ルーフ、ピラー、座席シート、ステアリングホイール、ECUボックス、電装部品、エンジン周辺部品、駆動系・ギア周辺部品、吸気・排気系部品、冷却系部品等が挙げられる。電子機器及び家電機器としてより具体的には、冷蔵庫、洗濯機、掃除機、電子レンジ、エアコン、照明機器、電気湯沸かし器、テレビ、時計、換気扇、プロジェクター、スピーカー等の家電製品類、パソコン、携帯電話、スマートフォン、デジタルカメラ、タブレット型PC、携帯音楽プレーヤー、携帯ゲーム機、充電器、電池等電子情報機器等が挙げられる。
[密着層の作製]
基材フィルムとして、東レ株式会社製のPETフィルムルミラー(品番:QTQ2、厚み50μm、HC層付き)を準備した。
純珪素ターゲット及び基材フィルムを、ラボ用のマグネトロンスパッタリング装置にセットし、基材フィルムの片面に、密着層として、厚み5nmの酸化珪素層(SiO2層)を形成した。
到達真空度:1.0×10-4Pa
スパッタガス:Ar及びO2を用いてO2/(Ar+O2)が0.3となるよう調整
チャンバー気圧:0.30Pa
基材温度:25℃
Alターゲット、及び密着層を形成した基材フィルムを、ラボ用のマグネトロンスパッタリング装置にセットし、密着層の上に、金属反射層として、厚み44nmのアルミニウム層(Al層)を形成した。
基材フィルムの繰り出し張力と巻取り張力は50Nに設定し、中間張力は50Nに設定した。
到達真空度:1.0×10-3Pa
スパッタガス:Ar
チャンバー気圧:0.30Pa
基材温度:25℃
ラボ用のマグネトロンスパッタリング装置を用いてAl層を形成した基材フィルムを、マグネトロンスパッタリング装置にセットし、Al層の上に、第一の低屈折率層として酸化珪素67nm(屈折率1.46)、高屈折率層として酸化ニオブ(Nb2O5)53nm(屈折率2.32)、第二の低屈折率等として酸化珪素(SiO2)40nm(屈折率1.46)の順で、透明酸化物の薄膜を形成し反射色相調整層とした。酸化珪素と酸化ニオブの薄膜の形成にあたっては、ターゲットとしては純珪素ターゲット、純ニオブターゲットを用い、アルゴンガスに加え、酸素ガスを導入し、反応性スパッタリングを実施することで、それぞれ透明酸化物の薄膜を得た。
基材フィルムの繰り出し張力と巻取り張力は50Nに設定し、中間張力は50Nに設定した。
到達真空度:1.0×10-4Pa
スパッタガス:Ar及びO2を用いてO2/(Ar+O2)が0.4となるよう調整
チャンバー気圧:0.30Pa
基材温度:25℃
到達真空度:1.0×10-3Pa
スパッタガス:Ar及びO2を用いてO2/(Ar+O2)が0.2となるよう調整
チャンバー気圧:0.30Pa
基材温度:25℃
〔粘着剤組成物1の調製〕
(オリゴマー組成物1の調製)
モノマー成分としてメタクリル酸ジシクロペンタニル(DCPMA)60質量部及びメタクリル酸メチル(MMA)40質量部、連鎖移動剤としてα-チオグリセロール3.5質量部、および重合溶媒としてトルエン100質量部を混合し、窒素雰囲気下にて70℃で1時間攪拌した。次に、熱重合開始剤として、2,2’-アゾビスイソブチロニトリル(AIBN)0.2質量部を投入し、70℃で2時間反応させたのち、80℃に昇温して2時間反応させた。その後、反応液を130℃に加熱して、トルエン、連鎖移動剤及び未反応モノマーを乾燥除去して、固形状のアクリルオリゴマー(オリゴマー組成物)を得た。オリゴマー組成物1の重量平均分子量は5100、ガラス転移温度(Tg)は130℃であった。
モノマー成分としての2-エチルヘキシルアクリレート(2EHA)67質量部、N-ビニル-2-ピロリドン(NVP)15質量部、ヒドロキシエチルアクリレート(HEA)3質量部、4-ヒドロキシブチルアクリレート(4-HBA)15質量部、光重合開始剤としての商品名「イルガキュア651」(BASF社製)0.05質量部および商品名「イルガキュア184」(BASF社製)0.05質量部を配合した後、このモノマー混合物を窒素雰囲気下で紫外線に曝露して部分的に光重合させることにより、プレポリマー組成物1(重合率約10%)を得た。
得られたプレポリマー組成物1 100質量部に、オリゴマー組成物1 5質量部、1,6-ヘキサンジオールジアクリレート(商品名「A-HD-N」、新中村化学工業株式会社製)0.3質量部、シランカップリング剤(商品名「KBM-403」、信越化学工業社製)0.3質量部を添加して均一に混合し、粘着剤組成物1を得た。ゲル分率は82%であった。
(粘着シート1)
表面にシリコーン系離型層が設けられた厚み75μmのポリエチレンテレフタラート(PET)フィルム(三菱ケミカル株式会社製「ダイアホイルMRF75」)を基材(重剥離フィルム)として、基材上に上記の粘着剤組成物1を厚み25μmになるように塗布して塗布層を形成した。この塗布層上に、カバーシート(軽剥離フィルム)として片面がシリコーン剥離処理された厚み75μmのPETフィルム(三菱ケミカル株式会社製「ダイアホイルMRE75」)を貼り合わせた。
この積層体に、カバーシート側から、ランプ直下の照射面における照射強度が5mW/cm2になるように位置調節したブラックライトにより、紫外線を照射して光硬化を行い、厚み25μmの粘着剤層からなる粘着シートを得た。
上記で作製した厚み25μmの粘着シートの軽剥離フィルムを剥離し、積層体1の基材フィルムのスパッタ成膜のされていない面に貼り合わせ積層体を得た。
得られた積層体の粘着剤層側の重剥離フィルムを剥離し、支持基材としての3.0mm厚みのポリカーボネート基材(旭硝子株式会社製カーボグラス 黒色)に貼り合わせをし、ミラー部材を作製した。得られたミラー部材のサイズは50mm×150mmである。
第二の低屈折率層の厚みを10nmに変更した以外は実施例1と同様にしてフィルムミラー積層体及びミラー部材を作製した。
第二の低屈折率層の厚みを100nmに変更した以外は実施例1と同様にしてフィルムミラー積層体及びミラー部材を作製した。
第二の低屈折率層を設けなかった以外は実施例1と同様にしてフィルムミラー積層体及びミラー部材を作製した。
各実施例および各比較例で得られたフィルムミラー積層体を、縦100mm×横100mmのサイズにカッターでカットしサンプルとした。
得られたサンプルを水平の台に置き、台からサンプルの4つの角の端部までの高さをそれぞれ定規で測定し、測定した4つの端部の平均をカール値とした。
サンプルを台と基材フィルムが接触するように置き、金属光沢層等を成膜した面方向にカールする場合を+(プラス)とした。また、サンプルを台と第二の低屈折率層が接触するように置き、金属光沢層等を成膜した面方向と反対の方向(背面方向)にカールする場合を-(マイナス)とし、結果を表1に示した。
作製した各実施例及び比較例のミラー部材について、標準光源としてD65を使用して、(株)日立ハイテクサイエンス製の日立分光光度計 U-4100測定機器を用いて、波長380nm~680nmの範囲の可視光線について反射率Y(%)を測定した。
なお、測定する際は、得られたミラー部材の表面のスパッタ成膜面(第二の低屈折率層側の面)に上記可視光線を30°の入射角にて入射させるようにした。
380nm~680nmの波長で反射率が90%以上の場合を〇(良)、380nm~680nmで反射率が90%を下回る場合を×(不良)と評価した。結果を表1に示す。
また、第二の低屈折率層の厚みが10nmである実施例2は、第二の低屈折率層の厚みが40nmである実施例1と比べるとカールの抑制効果が更に優れていた。
一方、第二の低屈折率層の厚みが100nmである比較例1は、実施例1及び2と同程度の高い反射率を示したが、実施例1及び2に比べ背面方向に大きなカールが発生した。
第二の低屈折率層を設けなかった比較例2は、カールの発生は抑えられたが、反射率が90%未満であり鏡面体に適用するに不十分な反射率であった。
なおシミュレーションはTFCalc(Software Spectra社製)を用いて実施した。結果を図3に示す。
図3は、実施例2のミラー部材における30°の入射光の波長(380nm~680nm)と反射率(%)のシミュレーションの値(反射率(%)シミュレーション)との関係を示す図である。
実施例2で得られたミラー部材について、表2に記載の波長における反射率(%)の、実測値及びシミュレーションの値を表2に示す。
表2によれば、実施例2の反射率(%)は、実測値とシミュレーションの値が、ほぼ一致することがわかる。
表3に示すフィルムミラー積層体及びミラー部材をシミュレーションのモデルとして、実施例1と同様の条件で入射した場合の波長(380nm~680nm)における反射率をシミュレーションした。波長(380nm~680nm)と反射率(%)シミュレーションとの関係を図4~7に示す。
図4は、実施例3、実施例4、及び比較例3のミラー部材における30°の入射光の波長(380nm~680nm)と反射率(%)シミュレーションの関係を示す図である。図5は、実施例5、実施例6、及び比較例4のミラー部材における30°の入射光の波長(380nm~680nm)と反射率(%)シミュレーションの関係を示す図である。図6は、実施例7、実施例8、及び実施例9のミラー部材における30°の入射光の波長(380nm~680nm)と反射率(%)シミュレーションの関係を示す図である。図7は、実施例10、実施例11、及び実施例12のミラー部材における30°の入射光の波長(380nm~680nm)と反射率(%)シミュレーションの関係を示す図である。
本出願は、2020年6月12日出願の日本特許出願(特願2020-102341)、2020年6月22日出願の日本特許出願(特願2020-107154)、2020年11月16日出願の日本特許出願(特願2020-190351)、及び2021年3月5日出願の日本特許出願(特願2021-035697)に基づくものであり、その内容はここに参照として取り込まれる。
10 粘着剤層
11 基材フィルム
12 金属反射層
13 反射色相調整層
13a 第一の低屈折率層
13b 高屈折率層
13c 第二の低屈折率層
21 支持基材
100 ミラー部材
Claims (6)
- 基材フィルム、金属反射層、第一の低屈折率層、高屈折率層、及び第二の低屈折率層をこの順に有し、
前記第二の低屈折率層の厚みが10nm以上60nm以下である、
フィルムミラー積層体。 - 前記金属反射層の厚みが、100μm以下である、請求項1に記載のフィルムミラー積層体。
- 前記第一の低屈折率層及び前記第二の低屈折率層が酸化珪素を含有する、請求項1又は2に記載のフィルムミラー積層体。
- 前記高屈折率層が酸化ニオブを含有する、請求項1~3のいずれか一項に記載のフィルムミラー積層体。
- 前記金属反射層は、アルミニウム(Al)、亜鉛(Zn)、鉛(Pb)、銅(Cu)、銀(Ag)から選択された少なくとも一種の金属、および該金属を主成分とする合金のいずれかを含む、請求項1~4のいずれか一項に記載のフィルムミラー積層体。
- 請求項1~5のいずれか一項に記載のフィルムミラー積層体と支持基材とを備え、
前記フィルムミラー積層体が、粘着剤層を介して前記支持基材に貼付されている、ミラー部材。
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KR1020227043437A KR20230019854A (ko) | 2020-06-12 | 2021-06-10 | 필름 미러 적층체 및 미러 부재 |
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Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006010928A (ja) * | 2003-06-27 | 2006-01-12 | Asahi Glass Co Ltd | 高反射鏡 |
JP2008129153A (ja) * | 2006-11-17 | 2008-06-05 | Asahi Glass Co Ltd | 反射鏡の製造方法 |
WO2010013389A1 (ja) * | 2008-07-28 | 2010-02-04 | 日本電気硝子株式会社 | 広帯域反射鏡 |
JP2011221208A (ja) * | 2010-04-08 | 2011-11-04 | Konica Minolta Opto Inc | アルミニウム表面反射鏡 |
JP2015210335A (ja) | 2014-04-24 | 2015-11-24 | コニカミノルタ株式会社 | フィルムミラーおよび反射装置 |
JP2020102341A (ja) | 2018-12-21 | 2020-07-02 | 日亜化学工業株式会社 | 集積型発光装置 |
JP2020107154A (ja) | 2018-12-28 | 2020-07-09 | 株式会社Airobo | シミュレーション装置、プログラム、及び制御方法 |
JP2020190351A (ja) | 2019-05-21 | 2020-11-26 | シャープ株式会社 | 送風機 |
JP2021035697A (ja) | 2017-11-28 | 2021-03-04 | 川崎重工業株式会社 | 作業機の動作制御方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ZA912915B (en) * | 1990-05-10 | 1992-04-29 | Boc Group Inc | Novel monolithic front surface mirror |
JPH05173005A (ja) | 1991-12-19 | 1993-07-13 | Asahi Optical Co Ltd | アルミニウム表面反射鏡 |
JP4793259B2 (ja) * | 2006-12-27 | 2011-10-12 | コニカミノルタオプト株式会社 | 反射鏡 |
US11143800B2 (en) * | 2017-06-16 | 2021-10-12 | Corning Incorporated | Extending the reflection bandwith of silver coating stacks for highly reflective mirrors |
-
2021
- 2021-06-10 JP JP2022530629A patent/JPWO2021251476A1/ja active Pending
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- 2021-06-10 CN CN202180042159.8A patent/CN115803659A/zh active Pending
- 2021-06-11 TW TW110121561A patent/TW202216429A/zh unknown
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006010928A (ja) * | 2003-06-27 | 2006-01-12 | Asahi Glass Co Ltd | 高反射鏡 |
JP2008129153A (ja) * | 2006-11-17 | 2008-06-05 | Asahi Glass Co Ltd | 反射鏡の製造方法 |
WO2010013389A1 (ja) * | 2008-07-28 | 2010-02-04 | 日本電気硝子株式会社 | 広帯域反射鏡 |
JP2011221208A (ja) * | 2010-04-08 | 2011-11-04 | Konica Minolta Opto Inc | アルミニウム表面反射鏡 |
JP2015210335A (ja) | 2014-04-24 | 2015-11-24 | コニカミノルタ株式会社 | フィルムミラーおよび反射装置 |
JP2021035697A (ja) | 2017-11-28 | 2021-03-04 | 川崎重工業株式会社 | 作業機の動作制御方法 |
JP2020102341A (ja) | 2018-12-21 | 2020-07-02 | 日亜化学工業株式会社 | 集積型発光装置 |
JP2020107154A (ja) | 2018-12-28 | 2020-07-09 | 株式会社Airobo | シミュレーション装置、プログラム、及び制御方法 |
JP2020190351A (ja) | 2019-05-21 | 2020-11-26 | シャープ株式会社 | 送風機 |
Non-Patent Citations (1)
Title |
---|
See also references of EP4166998A4 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2024053692A1 (ja) * | 2022-09-09 | 2024-03-14 | 日東電工株式会社 | 光学積層体、凹面鏡、及び凹面鏡の製造方法 |
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