WO2021169726A1 - Film de collimation, film de collimation de réduction d'interférence, film de collimation stratifié, et film de collimation stratifié d'étanchéité de trou et son procédé de préparation - Google Patents

Film de collimation, film de collimation de réduction d'interférence, film de collimation stratifié, et film de collimation stratifié d'étanchéité de trou et son procédé de préparation Download PDF

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WO2021169726A1
WO2021169726A1 PCT/CN2021/074322 CN2021074322W WO2021169726A1 WO 2021169726 A1 WO2021169726 A1 WO 2021169726A1 CN 2021074322 W CN2021074322 W CN 2021074322W WO 2021169726 A1 WO2021169726 A1 WO 2021169726A1
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Prior art keywords
collimating
layer
film
hole
array
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PCT/CN2021/074322
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English (en)
Chinese (zh)
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李刚
夏寅
付坤
高斌基
刘建凯
陈建文
唐海江
张彦
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宁波激智科技股份有限公司
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Publication of WO2021169726A1 publication Critical patent/WO2021169726A1/fr

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/20—Adhesives in the form of films or foils characterised by their carriers
    • C09J7/29—Laminated material
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/30—Collimators
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Definitions

  • the invention belongs to the field of image recognition, and particularly relates to a collimating film, an interference reducing collimating film, a bonding type collimating film, a sealing bonding type collimating film and a preparation method thereof.
  • collimating devices In the field of image recognition, commonly used image sensors such as CMOS type or photo-TFT type, sensor modules generally contain collimating devices to enhance the signal-to-noise ratio, improve the recognition rate, and reduce crosstalk.
  • the function of the collimating device is mainly to collimate and filter the diffused light at a single point pixel of the image, and the normal collimated light or light (signal) that is close to collimation can be smoothly transmitted to At the corresponding photoelectric sensor, the large-angle light (noise) that deviates from the normal direction can only seldom or even not enter the non-corresponding photoelectric sensor, so the signal-to-noise ratio is enhanced.
  • Collimation devices usually have a top collimation structure layer and a bottom collimation structure layer:
  • the top and bottom double-layer collimation structures need to be accurately aligned, otherwise the signal light intensity will be greatly reduced (as shown in Figure 2);
  • Traditional collimating devices are generally rigid collimating plates, such as optical fiber bundle slices, or microlens and collimating diaphragms formed on both sides of the glass substrate.
  • Such rigid collimating plates generally need to be kept high. Thickness, on the one hand, is used to maintain the aspect ratio, on the other hand, it is used to maintain its mechanical properties and prevent breakage in the application environment.
  • this type of rigid collimator still cannot meet the application of large-size image recognition modules.
  • the overall thickness needs to be compressed such as ultra-thin large-screen mobile phones
  • it will become more brittle, more fragile, and lower production yield. Both performance and cost cannot meet the demand.
  • It is also obvious that such rigid collimating sheets are even less likely to be used in flexible image recognition modules.
  • the traditional rigid collimating sheet has high thickness, fragile and poor performance in the case of low thickness, the two-layer collimating structure (collimating diaphragm) is difficult to align, low yield, and low productivity. Large-size, ultra-thin, flexible image recognition applications.
  • the present invention provides a collimating film, an interference reducing collimating film, a bonding collimating film, and a sealing hole.
  • the collimating film provided by the present invention only includes one layer of collimating holes, which solves the problem of difficult alignment of two layers of collimating diaphragms.
  • the interference reducing collimating film provided by the present invention can reduce the phenomenon of light interference and improve the accuracy of image recognition.
  • the present invention adopts the following technical solutions:
  • the present invention provides a collimating film, which in turn includes a collimating lens layer, a flexible substrate layer and a collimating hole layer.
  • the collimating hole layer is a collimating diaphragm.
  • the collimating film provided by the present invention only includes one layer of collimating diaphragm.
  • the collimation film provided by the present invention only includes a layer of collimation holes.
  • the collimating film sequentially includes a collimating lens layer, a flexible substrate layer and a layer of collimating holes.
  • the collimating lens layer is placed on the upper surface of the flexible substrate, and the collimating hole layer is placed on the lower surface of the flexible substrate.
  • the collimating lens layer includes a microlens array and is thick.
  • the collimating hole layer includes an array of collimating holes.
  • the collimating hole layer includes a light-shielding medium layer and a collimating hole array.
  • the collimating hole layer includes a light-shielding medium and a collimating hole array formed by hollowing out the medium.
  • each collimating hole is on the main optical axis of the corresponding microlens. Further, the center of each collimating hole is on the main optical axis of the corresponding micro lens.
  • the collimating film is perforated by the micro-focusing method, the distribution of the collimating hole array and the micro lens array are exactly the same, the center of any collimating hole is on the main optical axis of the corresponding micro lens, one-to-one high-precision alignment , Alignment deviation ⁇ 1 ⁇ m.
  • the thickness T of the flexible base layer is selected from 10-50 ⁇ m, preferably 25-38 ⁇ m.
  • the micro lens arrays of the collimating lens layer are arranged in an orderly manner.
  • the aforementioned collimating film is called an ordered collimating film (also called an ordered collimating structure).
  • the aforementioned orderly arrangement is characterized in that the distance P between the main optical axes of adjacent microlenses is a constant value.
  • the microlens array of the collimating lens layer and the collimating hole array of the collimating hole layer are arranged in an orderly manner.
  • the aforementioned collimating film is called an ordered collimating film (also called an ordered collimating structure).
  • the microlens array of the collimating lens layer is arranged in disorder.
  • the collimating film in which the microlens array is arranged in disorder is called the interference-reducing collimating film (also called the disordered collimating structure, or the disordered array collimating film).
  • the aforementioned disordered arrangement is characterized in that the pitch P between the main optical axes of adjacent microlenses is a value that varies within a range.
  • the interference reduction collimation film can reduce the phenomenon of light interference and improve the accuracy of image recognition (recognition rate).
  • microlens array of the collimating lens layer and the collimating hole array of the collimating hole layer are arranged in disorder.
  • the aforementioned collimating film is called an interference-reducing collimating film (also called a disordered collimating structure).
  • the coordinates of the main optical axes of three adjacent microlenses are connected to form a non-equal triangle.
  • One collimating hole in the collimating hole array corresponds to a position of a micro lens in the micro lens array, and the main optical axis of the micro lens coincides with the center of the collimating hole or the deviation is less than 1 ⁇ m.
  • a micro lens corresponding to the position of a collimating hole is called the corresponding micro lens of the collimating hole.
  • the coordinates of the main optical axis of three adjacent microlenses are connected to form a regular triangle (composed of the main optical axis coordinates of three overlapping microlenses), or the main optical axis of four adjacent microlenses
  • the coordinates of are connected to form a square (connected by the coordinates of the main optical axis of four overlapping microlenses).
  • microlenses in the microlens array are closely arranged. That is, adjacent microlenses are in contact with each other or overlap each other.
  • the collimating lens array and the collimating hole array of the collimating film are both equilateral triangles (connected by the main optical axis coordinates of three overlapping microlenses) closely arranged, or square (comprised of four overlapping each other).
  • the main optical axis coordinates of the microlenses are connected) closely arranged.
  • the distance P between the main optical axes of adjacent microlenses is 10-50 ⁇ m
  • the radius R of the microlenses is 6.1 ⁇ m-30.2 ⁇ m
  • the height H of the collimating lens layer is 1.1 ⁇ m.
  • the refractive index n1 of the collimating lens layer material is 1.4 to 1.6; in the flexible base layer, the thickness T of the flexible base layer is 10-50 ⁇ m, and the refractive index n2 of the flexible base layer material is 1.5 to 1.65; In the collimating hole layer, the thickness t of the collimating hole layer is 0.5-7 ⁇ m, and the diameter ⁇ of the collimating hole in the collimating hole array is 1-10 ⁇ m.
  • the main optical axis pitches P of adjacent microlenses are all the same, and P is selected from 10 to 50 ⁇ m, preferably 15 to 30 ⁇ m, and more preferably 18 to 25 ⁇ m.
  • the microlenses of the collimating film focus the vertically incident light to form a light spot with a diameter of D on the lower surface of the flexible base layer.
  • D is selected from 0.1 to 7.8 ⁇ m, preferably 0.5 to 4.9 ⁇ m, and more preferably 1 to 2 ⁇ m.
  • the spot diameter D consists of the radius of curvature R (spherical radius R) of the microlens, the refractive index n1, the thickness of the collimating lens layer H (the vertical distance from the apex of the microlens to the upper surface of the substrate) and the refractive index n2 of the flexible substrate layer. T is jointly determined.
  • the radius of curvature R of the microlens is selected from 6.1 to 30.2 ⁇ m, and the thickness H of the collimating lens layer is selected from 1.1 to 27.4 ⁇ m.
  • R and H are not preferred, and adaptation is performed according to other parameters.
  • the refractive index n1 of the collimating lens layer (ie, the microlens layer) is selected from 1.4 to 1.6, preferably 1.5.
  • the refractive index n2 of the flexible base layer is selected from 1.5 to 1.65, which varies according to the material, and is not preferred, and ⁇ 0.02 errors caused by the same material and different processes are allowed.
  • the microlens array of the collimating film is made of the same thick material, and the material is all transparent polymer.
  • the transparent polymer of the microlens layer is selected from AR (Acrylic resin, acrylic resin or modified acrylic modified resin), PC (polycarbonate), PET (polyethylene terephthalate), PEN (polyethylene naphthalate), PI (polyimide), PS (polystyrene), SR (Silicon Resin), FEP (perfluoroethylene propylene copolymer) or EVA (ethylene- Vinyl acetate copolymer). Further, it is preferably one of PMMA (polymethyl methacrylate), PC, or PS.
  • the flexible base layer of the collimating film is a transparent polymer film.
  • the material of the transparent polymer film is selected from PET, PEN, PI, PC, PMMA (polymethyl methacrylate), PP (polypropylene), PO (polyolefin), SR or COP (cycloolefin copolymer). One of the things). Further, it is preferably one of PET, PI, PC, or PMMA.
  • the light-shielding medium of the collimating hole layer of the collimating film is one or a combination of at least two of organic paint and inorganic coating.
  • the organic coating of the light-shielding medium is selected from an opaque polymer ink system.
  • the opaque polymer ink system includes a light-absorbing substance and a polymer curing system.
  • the light-absorbing material is selected from carbon (such as carbon black, carbon fiber, graphite, etc.), carbides (such as chromium carbide, titanium carbide, boron carbide, etc.), carbonitrides (such as titanium carbonitride, carbonitride, etc.) One or a combination of at least two of boron, etc.) and sulfides (such as ferrous sulfide, molybdenum disulfide, cobalt disulfide, nickel sulfide, etc.).
  • carbon such as carbon black, carbon fiber, graphite, etc.
  • carbides such as chromium carbide, titanium carbide, boron carbide, etc.
  • carbonitrides such as titanium carbonitride, carbonitride, etc.
  • sulfides such as ferrous sulfide, molybdenum disulfide, cobalt disulfide, nickel sulfide, etc.
  • the polymer curing system can be selected from acrylic system (AR), polyurethane system (PU), silicone resin system (SR), epoxy resin system (EP), melamine resin system (MF), phenolic resin system (PF), urea-formaldehyde resin system (UF), or thermoplastic elastomer material (for example, ethylene-vinyl acetate copolymer, thermoplastic elastomer TPE, or thermoplastic polyurethane elastomer TPU) or a combination of at least two of them.
  • AR acrylic system
  • PU polyurethane system
  • SR silicone resin system
  • EP epoxy resin system
  • MF melamine resin system
  • PF phenolic resin system
  • UF urea-formaldehyde resin system
  • thermoplastic elastomer material for example, ethylene-vinyl acetate copolymer, thermoplastic elastomer TPE, or thermoplastic polyurethane elastomer TPU
  • the polymer curing system may be selected from one or a combination of at least two of acrylic resin systems, polyurethane systems, silicone systems, epoxy resin systems, or thermoplastic elastic materials.
  • the inorganic coating of the light-shielding medium is selected from one or a combination of at least two of carbon element, carbide, carbonitride, and sulfide.
  • the thickness t of the collimating hole layer of the collimating film is selected from 0.5 to 7 ⁇ m, preferably 1 to 5 ⁇ m, and more preferably 2 to 3 ⁇ m.
  • the collimating hole diameter ⁇ of the collimating hole layer of the collimating film is selected from 1 to 10 ⁇ m, more preferably 3 to 5 ⁇ m.
  • the thickness T of the flexible base layer may be 10 ⁇ m-50 ⁇ m, for example, 10 ⁇ m, 15 ⁇ m, 20 ⁇ m, 25 ⁇ m, 38 ⁇ m or 50 ⁇ m.
  • the main optical axis pitch P between adjacent microlenses of the collimating lens layer may be 10 ⁇ m-15 ⁇ m, for example, 10 ⁇ m, 15 ⁇ m, 18 ⁇ m, 20 ⁇ m, 25 ⁇ m, 30 ⁇ m or 50 ⁇ m.
  • the microlens curvature radius R of the collimating lens layer may be 6.1 ⁇ m-30.2 ⁇ m, for example, 6.1 ⁇ m, 6.9 ⁇ m, 7.9 ⁇ m, 9.4 ⁇ m, 11.2 ⁇ m, 11.3 ⁇ m, 12 ⁇ m, 12.1 ⁇ m, 12.6 ⁇ m, 12.8 ⁇ m, 13.3 ⁇ m, 13.6 ⁇ m, 14 ⁇ m, 14.3 ⁇ m, 14.3 ⁇ m, 14.8 ⁇ m, 15 ⁇ m, 15.1 ⁇ m, 15.7 ⁇ m, 15.9 ⁇ m, 16 ⁇ m, 16.1 ⁇ m, 16.7 ⁇ m, 17 ⁇ m, 17.2 ⁇ m, 17.3 ⁇ m, 18 ⁇ m, 18.1 ⁇ m, 18.3 ⁇ m, 18.8 ⁇ m, 19.3 ⁇ m, 19.4 ⁇ m, 19.6 ⁇ m, 19.8 ⁇ m, 20 ⁇ m, 20.6 ⁇ m, 20.8 ⁇ m, 21.6 ⁇ m, 22.5 ⁇ m, 25.6 ⁇ m, or 30.2 ⁇ m.
  • the thickness H of the collimating lens layer may be 1.1 ⁇ m-27.4 ⁇ m, such as 1.1 ⁇ m, 2.4 ⁇ m, 2.5 ⁇ m, 3.0 ⁇ m, 3.1 ⁇ m, 3.2 ⁇ m, 3.5 ⁇ m, 3.8 ⁇ m, 4.1 ⁇ m, 5.0 ⁇ m, 5.8 ⁇ m, 6.0 ⁇ m, 6.2 ⁇ m, 6.8 ⁇ m, 7.2 ⁇ m, 7.8 ⁇ m, 8.5 ⁇ m, 8.6 ⁇ m, 8.7 ⁇ m, 9.2 ⁇ m, 10.4 ⁇ m, 10.7 ⁇ m, 10.8 ⁇ m, 11 ⁇ m, 11.1 ⁇ m, 11.4 ⁇ m, 11.5 ⁇ m, 12.9 ⁇ m, 13.6 ⁇ m, 14.1 ⁇ m, 14.6 ⁇ m, 15.0 ⁇ m, 15.4 ⁇ m, 16.3 ⁇ m, 17.3 ⁇ m, 18.1 ⁇ m, 19.8 ⁇ m, 20.5 ⁇ m, 21.3 ⁇ m, 22.2 ⁇ m, 22.7 ⁇ m, 25 ⁇ m, or 27.4 ⁇ m.
  • the spot diameter D formed by the microlens on the lower surface of the flexible substrate layer may be 0.1 ⁇ m-7.8 ⁇ m, for example, 0.1 ⁇ m, 0.3 ⁇ m, 0.4 ⁇ m, 0.5 ⁇ m, 0.6 ⁇ m, 0.7 ⁇ m, 0.8 ⁇ m, 1.0 ⁇ m.
  • the thickness t of the collimating hole layer may be 0.5-7 ⁇ m, for example, 0.5 ⁇ m, 1 ⁇ m, 2 ⁇ m, 3 ⁇ m, 4 ⁇ m, 5 ⁇ m, or 7 ⁇ m.
  • the collimating hole diameter ⁇ may be 1-10 ⁇ m, for example, 1 ⁇ m, 2 ⁇ m, 3 ⁇ m, 4 ⁇ m, 5 ⁇ m, 6 ⁇ m, 8 ⁇ m, or 10 ⁇ m.
  • the refractive index n1 of the collimating lens layer may be 1.34-1.7, for example, 1.34, 1.4, 1.47, 1.48, 1.5, 1.59, 1.6, 1.65, 1.66, or 1.7.
  • the refractive index n2 of the flexible substrate layer may be 1.48-1.7, such as 1.48, 1.49, 1.5, 1.6, 1.65, 1.66 or 1.7.
  • the collimating film provided by the present invention includes a collimating lens layer (41), a flexible substrate layer (42) (referred to as a substrate for short), and a collimating hole layer (43).
  • the collimating lens layer is placed on the upper surface of the substrate.
  • the collimating hole layer is placed on the lower surface of the substrate, the collimating lens layer (41) includes a microlens array (41A) and the thickness (41B), and the collimating hole layer (43) includes a light-shielding medium (43A) And a collimating hole array formed by hollowing out the medium (consisting of a certain number of collimating holes (43B)).
  • the collimating lens array and the collimating hole array in the collimating film are all arranged in equilateral triangles
  • the material of the collimating lens layer (41) is PMMA
  • the flexible substrate layer (42 The material of) is PET
  • the light-shielding medium (43A) of the collimating hole layer (43) is an inorganic coating titanium carbide
  • the collimating film uses a microlens perforating method to punch the collimating hole (43B).
  • P is 10-30 ⁇ m, R is 9.4 ⁇ m-20.6 ⁇ m, H is 3 ⁇ m-27.4 ⁇ m, and n1 is 1.5;
  • T 25 ⁇ m
  • n2 1.65
  • D 0.3 ⁇ 4.0 ⁇ m
  • t 2.0 ⁇ m
  • ⁇ 4.0 ⁇ m
  • the deviation ⁇ 0.18-0.90 ⁇ m.
  • the collimating lens array and the collimating hole array in the collimating film are all arranged in equilateral triangles
  • the material of the collimating lens layer (41) is PMMA
  • the flexible substrate layer (42) The material of is PET
  • the light-shielding medium (43A) of the collimating hole layer (43) is an inorganic coating titanium carbide
  • the collimating film uses a microlens perforation method to punch the collimating hole (43B)
  • the other parameters are as follows :
  • P is 10-25 ⁇ m, R is 6.1 ⁇ m-19.8 ⁇ m, H is 2.5 ⁇ m-10.7 ⁇ m, and n1 is 1.5;
  • T 10-50 ⁇ m, n2 is 1.65, D is 0.6 ⁇ 3.9 ⁇ m;
  • t 1.0-3.0 ⁇ m
  • ⁇ 2.0-5.0 ⁇ m
  • the deviation ⁇ is 0.26-0.49 ⁇ m.
  • the collimating lens array and the collimating hole array of the collimating film are all arranged closely in a regular triangle
  • the material of the collimating lens layer (41) is PMMA
  • the flexible substrate layer (42) The material of is PET
  • the light-shielding medium (43A) of the collimating hole layer (43) is an inorganic coating titanium carbide
  • the collimating film uses a microlens perforation method to punch the collimating hole (43B)
  • P is 10-50 ⁇ m, R is 16 ⁇ m-30.2 ⁇ m, H is 1.1 ⁇ m-21.3 ⁇ m, and n1 is 1.5;
  • T is 50 ⁇ m, n2 is 1.65, D is 0.1 ⁇ 7.8 ⁇ m;
  • t is 0.5 ⁇ m
  • ⁇ is 1.0-8.0 ⁇ m.
  • the deviation ⁇ is 0.21-0.88 ⁇ m.
  • the collimating lens array and the collimating hole array of the collimating film are arranged in equilateral triangles
  • the material of the collimating lens layer (41) is PMMA
  • the flexible substrate layer ( 42) is made of PET
  • the light-shielding medium (43A) of the collimating hole layer (43) is an inorganic coating titanium carbide.
  • the collimating film uses microlens perforation to make the collimating hole (43B). Other parameters are as follows :
  • P is 30 ⁇ m, R is 19.3 ⁇ m, H is 10.8 ⁇ m, and n1 is 1.5;
  • T 38 ⁇ m
  • n2 1.65
  • D 3.6 ⁇ m
  • t 0.5-7 ⁇ m
  • ⁇ 5.0-10.0 ⁇ m
  • the deviation ⁇ is 0.46-0.99 ⁇ m.
  • the collimating lens array and the collimating hole array of the collimating film are all arranged closely in a regular triangle, the material of the collimating lens layer (41) is PMMA, and further, it is cured by light Acrylic resin is polymerized, and the refractive index n1 is adjustable from 1.4 to 1.6.
  • the light-shielding medium (43A) of the collimating hole layer (43) is an inorganic coating titanium carbide, and the collimating film uses a microlens perforating method to punch the collimating hole (43B), and other parameters are as follows:
  • P is 20-25 ⁇ m, R is 15.9-22.5 ⁇ m, H is 3.2-9.2 ⁇ m, n1 is 1.4-1.6;
  • T 38-50 ⁇ m
  • n2 1.5-1.65
  • D is 0.5-3.6 ⁇ m
  • t 2.0 ⁇ m
  • ⁇ 4.0 ⁇ m
  • the deviation ⁇ is 0.25-0.66 ⁇ m.
  • Example 58 the collimating lens array and the collimating hole array of the collimating film are both square and closely arranged (as shown in FIG. 7), and the material of the collimating lens layer (41) is PMMA, a flexible substrate
  • the material of the layer (42) is PET
  • the light-shielding medium (43A) of the collimating hole layer (43) is an inorganic coating titanium carbide
  • the collimating film uses a microlens perforation method to punch the collimating hole (43B), and other items
  • the parameters are as follows:
  • P is 25 ⁇ m, R is 19.6 ⁇ m, H is 11.1 ⁇ m, and n1 is 1.5;
  • T 38 ⁇ m
  • n2 1.65
  • D 3.9 ⁇ m
  • t 2.0 ⁇ m
  • ⁇ 4.0 ⁇ m
  • the deviation ⁇ 0.69 ⁇ m.
  • the present invention also provides a method for preparing the collimating film, and the collimating hole is punched by a micro-focusing method.
  • the laser is vertically irradiated to the collimating lens layer, the laser is focused through the microlenses of the collimating lens layer, and the focused light spot falls on the collimating hole layer to make a collimating hole.
  • the distribution of the collimating hole array and the microlens array are completely consistent, and the center of any collimating hole is on the main optical axis of the corresponding microlens.
  • preparation method includes the following steps:
  • the collimating lens layer is formed on the upper surface of the flexible substrate layer (light curing, thermal curing, hot pressing, etc. can be used) to form a lens array (convex);
  • a large-area flat-top laser (parallel laser after Gaussian beam shaping) is used to irradiate the microlens array vertically with appropriate low energy, and after each microlens, it is focused on the light-shielding medium (ie micro-focusing method) and shot Corresponding to the collimating holes, an array of collimating holes with the same distribution is generated to form a collimating hole layer.
  • micro-focusing method includes the following features:
  • the flat-top laser after beam shaping is used as the laser source. After shaping, the irradiated area becomes larger and the energy density decreases;
  • the micro-focusing spot should be small enough within a reasonable range, and the focal position should be designed on the lower surface of the PET or deeper, so that the energy is concentrated on the light-shielding layer (light-shielding medium);
  • the process of the micro-focusing method (as shown in Figure 4) is divided into four basic steps: (a) Flat-top laser (5) with appropriate energy (too high hole is too large, even burned to the substrate, over Low, no perforation), hit the collimating lens layer (41) of the semi-finished collimating film, the micro lens (41A) realizes micro-focusing, the flesh thickness (41B) realizes the pre-shrinking of the spot area, and finally the laser passes through the substrate layer ( 42), the light-shielding medium (43A) is focused into a very small spot to achieve a high concentration of energy; (b) due to the absorption of light by the light-shielding medium, the instantaneous accumulation of energy causes the light-shielding medium at the spot position to be burned through instantly and produce Some ash content, in fact, the first two steps only need microsecond level, which is very fast; (c) After the ash content is removed, the collimating holes (43B) are exposed.
  • collimating holes are on the main optical axis of the microlens (40B). ), so it is highly aligned with the micro lens (41A), avoiding the time-consuming alignment process.
  • the collimating film (4) of the present invention is already a finished product, including a complete structure—the collimating lens layer (41), The base layer (42), the collimation hole layer (43); (d) the collimation film (4) has met the normal or close to normal collimation light transmission at this time, and can be tested with ordinary strength during on-line production
  • the light source such as white light, green light, three-wave lamp
  • the light source is irradiated from the surface of the microlens, and the light will pass through the collimating hole, so that the image of the light-transmitting hole array can be observed on the back side, and the transmitted light intensity can be quantified for inspection
  • the quality of punching can be easily detected automatically on the assembly line in this process, and the images captured by sampling at specific locations can also be analyzed digital
  • the traditional drilling method has greater limitations (as shown in Figure 5): (a) Gaussian laser (7), which is focused by the lens group of the laser head, The back side of the semi-finished product is hit on the light-shielding medium (43A); (b) the light-shielding layer is sequentially burned through at different positions, and some ash is generated; (c) when the ash is removed, the collimating hole is exposed.
  • Gaussian laser (7) which is focused by the lens group of the laser head, The back side of the semi-finished product is hit on the light-shielding medium (43A);
  • the light-shielding layer is sequentially burned through at different positions, and some ash is generated; (c) when the ash is removed, the collimating hole is exposed.
  • the entire alignment process needs to locate the origin O (or Mark point), the front CCD (Charge Coupled Device) high-definition camera is aligned with the optical center of the lens, and the laser head on the back will be linked with the front CCD lens to find To the corresponding collimation hole position, the initial displacement (vector or coordinate difference) between the first point and the position is calculated.
  • This initial positioning process is very time-consuming and complicated, and requires high equipment; then, based on the initial The displacement amount and the displacement amount between the points can be calculated to locate all the point positions, and 2 ⁇ n points can be printed in sequence.
  • the galvanometer group can be used to shorten the time in this process, n cannot be set too large, otherwise the cumulative error will inevitably exceed 1 ⁇ m , Will be even larger, especially the galvanometer will cause the angle to tilt, the spot becomes larger and deformed, and the error accumulates faster and faster; finally, when the error accumulates to be unacceptable, you need to return to the origin O and search for the first point again. That is, the initial positioning process is repeated.
  • the galvanometer group is used to shorten the time, since n cannot be too large, the initial positioning process needs to be performed frequently, which makes this method extremely time-consuming, complicated and dependent on equipment.
  • the punching process is not only costly but also low precision. .
  • the limitations of the traditional perforating method are more than this: the above-mentioned process of locating the first point and calculating the points from 2 to n requires a prerequisite, that is, the spacing of the microlenses is completely accurate; in fact, on the one hand , The micro lens mold is also prepared by laser drilling, there will be errors, so the alignment error of the traditional method will be further increased, especially when the mold accuracy is not so high; on the other hand, some special molds are prepared In the irregular microlens layer, the arrangement precision and shape precision of the microlenses are poor, or the designed pitch is uneven or even disordered.
  • the mold precision and preparation cost of the microlens layer are increased in disguise, resulting in a very high cost of the entire collimating film, not to mention the realization of the alignment and perforation of the irregular microlens layer (and the microfocusing method of the present invention) Can be easily achieved).
  • the molding method of the microlens array should be selected according to the type of transparent polymer and the application, and the present invention is not preferred; the coating method of the shading medium should be selected according to the type of the shading medium, and the wet coating method should be selected for the organic coating , Inorganic coating needs to choose dry coating (that is, physical vapor deposition) method.
  • the method for preparing the collimating film provided by the present invention is suitable for the production of sheets and also for the production of coils.
  • the collimating film can be used as a flexible collimating device for image sensor modules.
  • the collimating film can collimate and filter the diffuse light at a single point of the image to a certain extent, form a normal beamlet light signal, and transmit it to the corresponding photoelectric sensor. It is especially suitable for large-size, ultra-thin, Even in the flexible image recognition module.
  • the collimating film provided by the present invention uses a polymer film with a thickness of 10-50 ⁇ m as the flexible base layer, which realizes the flexibility, ultra-thinness and large-size of the collimating device, and is particularly suitable for large-scale applications. In image recognition modules of size, ultra-thin, and even flexibility.
  • the collimating film provided by the present invention adopts the micro-focus method to perforate.
  • the distribution of the collimating hole array and the microlens array are exactly the same, and the center of each collimating hole is at the center of the corresponding microlens.
  • one-to-one high-precision alignment, alignment deviation ⁇ 1 ⁇ m not only greatly improves the transmission of signal light, but also allows the collimation structure to be further reduced (such as the simultaneous reduction of microlenses and collimation holes) to reduce crosstalk and improve
  • the signal-to-noise ratio of the collimating film is improved, and the production efficiency is greatly improved, and the cost is reduced.
  • the collimating film provided by the present invention only includes one collimating hole layer, which fundamentally solves the problem of difficulty in alignment between the two collimating diaphragms, and has low thickness, good toughness, Not fragile, the center of the collimating hole prepared by the micro-focusing method is on the main optical axis of the corresponding micro lens, and the collimating hole and the corresponding micro lens are aligned accurately.
  • the preparation method of the collimating film provided by the present invention is easy to operate, can be mass-produced, and improves the production yield.
  • the collimating film provided by the present invention has excellent performance and can pass collimated light and filter diffused light.
  • the collimating film provided by the present invention can be applied to large-size, ultra-thin image recognition modules, so that the mass production of large-size, ultra-thin, and even flexible image recognition modules is greatly improved.
  • the collimating film of the present invention has obvious advantages.
  • the orderly distributed collimating structure (referring to the orderly arrangement of the microlens array of the collimating lens layer) can meet the basic image recognition requirements in practical applications, but there are interference fringes caused by excessive regularity, such as Shown in Figure 11a. Therefore, it is necessary to optimize the collimation structure to a disorderly distribution, destroy regularity, and weaken interference fringes, as shown in Figure 11b, to further improve the accuracy of image recognition (recognition rate).
  • the microlens array of the collimating lens layer of the interference-reducing collimating film provided by the present invention is arranged in a disorderly manner. Due to the micro-focus perforation method, the collimating hole array of the collimating hole layer is completely consistent with the micro lens array. It not only maintains the characteristics of disorderly distribution, but also maintains high-precision coaxial alignment, which is always impossible to achieve with traditional punching methods.
  • the collimating film of the disordered microlens array can destroy the regularity of the ordered microlens array and reduce the interference fringes caused by the regularity (as shown in FIG. 11b), so as to further improve the image recognition of the collimating film provided by the present invention. Accuracy (recognition rate).
  • the collimating lens array and the collimating hole array of the disordered array collimating film are both disordered arrays, and the microlenses are closely arranged and overlap each other (as shown in FIG. 12, any three The main optical axis coordinates of the overlapping microlenses are connected to form a normal triangle (not a regular triangle)).
  • the value of P ranges from 5 to 55 ⁇ m, and the main optical axis spacing P of the two overlapping microlenses varies randomly within a certain value range
  • the change in the distance P between adjacent main optical axes is A (the difference between the highest value and the lowest value in the value range of P)
  • the median value of the distance between adjacent main optical axes P is Pm (the highest value in the value range of P And the average of the lowest value)
  • Pm-0.5A ⁇ P ⁇ Pm+0.5A the median value Pm is selected from 10-50 ⁇ m, preferably 15-30 ⁇ m, more preferably 18-25 ⁇ m
  • the amount A is selected from 1-10um, preferably 2-6um.
  • the radius R of the microlens is 6.1 ⁇ m-30.2 ⁇ m
  • the height H of the collimating lens layer is 1.1 ⁇ m-27.4 ⁇ m
  • the collimating lens layer is made of
  • the refractive index n1 is 1.34 to 1.7
  • the thickness T of the flexible substrate layer is 10 to 50 ⁇ m
  • the refractive index n2 of the material of the flexible substrate layer is 1.48 to 1.7
  • the thickness t of the straight hole layer is 0.5-7 ⁇ m
  • the diameter ⁇ of the collimating hole in the collimating hole array is 1-10 ⁇ m.
  • the collimating lens array and the collimating hole array in the collimating film are both disordered arrays, and the micro lenses are closely arranged and overlap each other (as shown in FIG. 12, any three overlap each other).
  • the main optical axis coordinates of the microlenses are connected to form a common triangle (not a regular triangle).
  • the main optical axis spacing P of the two overlapping microlenses changes disorderly within a certain value range (Pm ⁇ 0.5A).
  • the material of the collimating lens layer 41 is PMMA
  • the material of the flexible base layer 42 is PET
  • the light-shielding medium 43A of the collimating hole layer 43 is an inorganic coating titanium carbide
  • the collimating film uses microlens perforation to produce collimation.
  • Hole 43B other parameters are as follows:
  • P is Pm ⁇ 0.5A, Pm is 30 ⁇ m, A is 1-10 ⁇ m, R is 20.6 ⁇ m, H is 27.4 ⁇ m, and n1 is 1.5;
  • T 25 ⁇ m
  • n2 1.65
  • D 3.1 ⁇ m
  • t 2.0 ⁇ m
  • ⁇ 4.0 ⁇ m
  • the deviation ⁇ 0.81 ⁇ m.
  • the interference-reducing collimating film provided by the present invention only includes one layer of collimating holes, which fundamentally solves the problem of difficulty in alignment between the two layers of collimating diaphragms, and has low thickness and toughness.
  • Good, not fragile the center of the collimating hole prepared by the micro-focusing method is on the main optical axis of the corresponding micro lens, and the alignment of the collimating hole and the corresponding micro lens is accurate.
  • the preparation method of the interference-reducing collimating film provided by the present invention is easy to operate, can be mass-produced, and improves the production yield.
  • the interference-reducing collimating film provided by the present invention has excellent performance, can pass collimated light, filter diffused light, and reduce light interference.
  • the interference-reducing collimating film provided by the present invention can be applied to large-size, ultra-thin image recognition modules, which greatly improves the mass production of large-size, ultra-thin, and even flexible image recognition modules.
  • the interference-reducing collimating film of the present invention has obvious advantages.
  • the present invention provides a laminated collimating film, which includes a laminated adhesive layer and the interference reducing collimation film of the present invention; the laminated adhesive layer and the interference reducing collimation film The collimating hole layers in the collimating film are glued together.
  • the bonding adhesive layer is selected from one of solid optical transparent adhesives, high-transmittance pressure-sensitive adhesives or transparent hot melt adhesives.
  • the thickness of the adhesive layer is 5 to 35 ⁇ m.
  • the present invention also provides an image recognition module.
  • the image recognition module sequentially includes a collimation layer, a filter layer and a photoelectric sensing layer; the collimation layer is selected from the laminated type described in the present invention.
  • the collimating film or the interference reducing collimating film of the present invention is selected from the laminated type described in the present invention.
  • Figure 14 is a schematic diagram of the trend of large-screen image recognition modules (take the OLED mobile phone fingerprint recognition module as an example), showing the top view of four designs of OLED mobile phones (01), and there is a fingerprint recognition module under the OLED screen (02) (03). Fingers (04) need to be placed in these specific areas to be able to identify and unlock: Among them, (a) is the traditional local recognition design.
  • the fingerprint recognition module is very small, it is often displayed in this area when the screen is activated An icon to indicate the precise position of the finger; (b) The fingerprint recognition module covers an area of about 1/4 screen, and it is no problem to expand from single-finger recognition and unlocking to two-finger recognition and unlocking; (c), ( The design of d) intends to realize half-screen or even full-screen, which puts forward higher requirements for the large-screen fingerprint recognition module.
  • FIG 15 is a schematic diagram of the structure of the image recognition module (take the OLED mobile phone fingerprint recognition module as an example).
  • the collimating film layer (05) is in the middle layer, and the OLED is above the collimating film.
  • the screen (02) has a filter layer (06) and a photoelectric sensing layer (07) underneath.
  • the collimating film is a soft base component, its dimensional stability (heat shrinkage, thermal expansion, wrinkles, etc.) is its weak point. Therefore, it needs to be bound with the underlying component to increase the overall stiffness and thickness when used in a large area.
  • the component can be a hard-based component (such as a filter layer), or a soft-based component (such as a filter layer can also be prepared with a soft substrate, and the photoelectric sensor chip can also be prepared with a TFT (thin film transistor).
  • the laminated collimating film provided by the present invention has a bonding adhesive layer (44), which can bond the collimating film of the soft base (that is, the flexible base layer) with the lower part of the image recognition module, thereby improving the collimating film
  • the dimensional stability is shown in Figure 16. Obviously, the flatness of the collimating film after lamination is higher, which can reduce the optical distortion caused by the film material wave (Waving), and enhance the accuracy of its image recognition.
  • the laminated collimating film has four main structures from top to bottom, which are a disordered array collimating lens layer (41), a flexible substrate layer (42), a collimating hole layer (43), and an adhesive layer (44), as shown in Figure 17.
  • the design parameters of the disordered array collimating lens layer (41), the flexible substrate layer (42), and the collimating hole layer (43) are exactly the same as those of the interference-reducing collimating film, and the adhesive layer (44)
  • the thickness of is T 2 , selected from 5-50 ⁇ m, preferably 10-25 ⁇ m. Too thin glue layer will lead to incomplete bonding (regardless of reliability before and after), and too thick will cause signal light loss or crosstalk.
  • the bonding adhesive layer may be selected from solid OCA (optical transparent adhesive), high-transmittance PSA (pressure sensitive adhesive), or transparent hot melt adhesive, etc., preferably OCA and PSA with high light transmittance and reworkability.
  • the materials of the OCA and PSA are respectively selected from a thermosetting polyacrylate system or a light curing polyacrylate system.
  • the collimating lens array and the collimating hole array are both disordered arrays, and the microlenses are closely arranged and overlap each other (as shown in FIG. 12, any three of them intersect each other).
  • the main optical axis coordinates of the stacked microlenses are connected to form a common triangle (not a regular triangle).
  • the value of P ranges from 5 to 55 ⁇ m.
  • the main optical axis spacing P of the two microlenses changes randomly within a certain value range, and the change of the adjacent main optical axis spacing P is A (the difference between the highest value and the lowest value in the value range of P), adjacent
  • the median value of the main optical axis pitch P is Pm (the average of the highest value and the lowest value in the value range of P), then Pm-0.5A ⁇ P ⁇ Pm+0.5A; the median value Pm is selected from 10-50 ⁇ m, preferably It is 15 to 30 ⁇ m, more preferably 18 to 25 ⁇ m, and the amount of change A of the main optical axis pitch P is selected from 1 to 10 ⁇ m, preferably 2 to 6 ⁇ m.
  • the radius R of the microlens is 6.1 ⁇ m-30.2 ⁇ m
  • the height H of the collimating lens layer is 1.1 ⁇ m-27.4 ⁇ m
  • the refractive index n1 of the material of the collimating lens layer is 1.34-1.7
  • the thickness T of the flexible base layer is 10-50 ⁇ m
  • the refractive index n2 of the flexible base layer material is 1.48-1.7
  • the thickness t of the collimating hole layer is 0.5-7 ⁇ m
  • the collimating hole array The diameter of the collimating hole ⁇ is 1 to 10 ⁇ m.
  • the present invention also provides a method for preparing the laminated collimating film, and the collimating hole is punched by a micro-focusing method.
  • the laser is vertically irradiated to the collimating lens layer, the laser is focused through the microlenses of the collimating lens layer, and the focused light spot falls on the collimating hole layer to make a collimating hole.
  • the distribution of the collimating hole array and the microlens array are completely consistent, and the center of any collimating hole is on the main optical axis of the corresponding microlens.
  • the present invention also provides a method for preparing the laminated collimating film, which includes the following steps:
  • preparation method includes the following steps:
  • the OCA/PSA adhesive layer is used for the bonding of the underlying components.
  • the collimating lens array and the collimating hole array in the collimating film are both disordered arrays, and the microlenses are closely arranged and overlap each other (as shown in FIG. 12, any three overlap each other).
  • the main optical axis coordinates of the microlenses are connected to form a common triangle.
  • the main optical axis spacing P of the two overlapping microlenses varies randomly within a certain value range (Pm ⁇ 0.5A), where the median value Pm Is 18 ⁇ m or 15 ⁇ m, and the amount of change A is 4 ⁇ m, that is, the value range of P is 18 ⁇ 2 ⁇ m or 15 ⁇ 2 ⁇ m, and other parameters are listed in Table 10.
  • the collimating lens layer 41 is made of PMMA, and the flexible base layer 42
  • the material of the collimating hole layer 43 is PET, and the light-shielding medium 43A of the collimating hole layer 43 is an inorganic coating titanium carbide.
  • the collimating film uses a microlens perforating method to make the collimating hole 43B. The other parameters are listed in Table 10.
  • the adhesive layer 44 of Examples 93 to 99 is solid OCA, and the material is a heat-curing polyacrylate system; the adhesive layer 44 of Example 100 is a high-permeability PSA, and the material is a heat-curing polyacrylate system; The laminating adhesive layer 44 is solid OCA and the material is a light-curing polyacrylate system; the laminating adhesive layer 44 of Example 102 is a high-transmittance PSA and the material is a light-curing polyacrylate system.
  • Other parameters are as follows:
  • P is Pm ⁇ 0.5A
  • Pm is 18 ⁇ m
  • A is 4 ⁇ m
  • R is 14.8 ⁇ m
  • H is 16.3 ⁇ m
  • n1 is 1.5;
  • T 25 ⁇ m
  • n2 1.65
  • D is 1.1 ⁇ m
  • t 2 ⁇ m
  • ⁇ 4 ⁇ m
  • the deviation ⁇ 0.41 ⁇ m.
  • P is Pm ⁇ 0.5A
  • Pm is 15 ⁇ m
  • A is 4 ⁇ m
  • R is 17 ⁇ m
  • H is 2.4 ⁇ m
  • n1 is 1.5;
  • T 50 ⁇ m
  • n2 is 1.65
  • D is 0.5 ⁇ m
  • t is 0.5 ⁇ m
  • ⁇ is 5.0 ⁇ m
  • the deviation ⁇ is 0.25 ⁇ m.
  • the laminated collimating film provided by the present invention only includes one layer of collimating holes, which fundamentally solves the problem of difficulty in alignment between the two layers of collimating diaphragms, and has a low thickness.
  • Good toughness, not fragile the center of the collimating hole prepared by the micro-focusing method is on the main optical axis of the corresponding micro lens, and the collimating hole is accurately aligned with the corresponding micro lens.
  • the preparation method of the laminated collimating film provided by the present invention is easy to operate, can be mass-produced, and improves the production yield.
  • the laminated collimating film provided by the present invention has excellent performance, can pass collimated light, filter diffused light, and reduce light interference.
  • the laminated collimating film provided by the present invention has a bonding adhesive layer, which can be bonded to the lower layer components, thereby improving the dimensional stability of the flexible collimating film and reducing optical distortion.
  • the laminated collimating film provided by the present invention can be applied to large-size, ultra-thin image recognition modules, so that the mass production of large-size, ultra-thin, and even flexible image recognition modules is greatly improved.
  • the laminated collimating film of the present invention has obvious advantages.
  • the image recognition module provided by the present invention has high recognition accuracy and can be applied to fingerprint unlocking of consumer electronic products such as mobile phones (OLED screens).
  • the above-mentioned lamination collimating film is attached to the back of the collimating film by using the finished lamination tape (OCA/PSA).
  • OCA/PSA finished lamination tape
  • the collimating hole is deeper, and the adhesive layer and More air will be left between the collimating holes, that is, bubbles will be formed.
  • the junction of the bubbles and the adhesive layer will be deformed.
  • the convexity will make the light more divergent, and the concave will make the light more convergent.
  • the light path is different from the normal area, thus affecting the image quality.
  • the normal signal light path is as shown in 081, and the final propagation direction in the adhesive layer 44 depends only on the base layer 42 and the adhesive layer.
  • the refractive index of the glue layer 44 (the refractive index of the intermediate medium air will cancel each other in the two calculations); and when the junction between the glue layer 44 and the bubble 09 is deformed, the abnormal signal light path is shown as 082, and finally
  • the propagation direction in the bonding adhesive layer 44 not only affects the refractive index difference between the base layer 42 and the bonding adhesive layer 44, but also the refractive index of the intermediate medium air and the normal direction of the deformed interface (not perpendicular to the horizontal plane).
  • the figure shows that the bubble 09 is convex after the reliability, so the light will change and diverge.
  • the collimating hole layer In order to improve or solve the bubble problem of the laminated collimating film designed with a thicker shading layer (collimating hole layer), after the preparation of the collimating film is completed, the collimating hole is fully filled with a transparent medium to completely seal it It is a better method. At the same time, if the sealing process and the adhesive process (introduction of the adhesive layer) can be integrated into one process, the cost will be greatly reduced;
  • the present invention provides a sealing and bonding type collimating film, which includes a collimating lens layer, a flexible substrate layer, a collimating hole layer and a sealing and bonding adhesive layer;
  • the collimating lens layer includes a microlens array and a thickness;
  • the collimating hole layer includes a shading medium and a collimating hole array formed by hollowing out the shading medium;
  • the sealing adhesive layer collimates the collimating holes of the hole layer The array is fully filled.
  • the collimating hole array includes a plurality of collimating holes, and the sealing adhesive layer fully fills the collimating holes of the collimating hole layer.
  • the sealing and bonding collimating film has four main structures from top to bottom, which are a collimating lens layer (41), a flexible substrate layer (42), a collimating hole layer (43), and a sealing glue Layer (46), as shown in Figure 22.
  • a collimating lens layer (41) a collimating lens layer (41)
  • a flexible substrate layer (42) a collimating hole layer (43)
  • a sealing glue Layer (46) as shown in Figure 22.
  • the design parameters of the collimating lens layer (41), the flexible base layer (42) and the collimating hole layer (43) are completely the same as those of the collimating film.
  • the thickness t of the collimating hole layer is 3-7 ⁇ m.
  • the cut-off performance of the light-shielding medium of the collimating hole layer to visible light and infrared light at least reaches the OD2 level, that is, the transmittance is less than or equal to 1%.
  • the thickness T 2 of the sealing adhesive layer is 5-50 ⁇ m, preferably 10-25 ⁇ m.
  • sealing adhesive layer is selected from one of solid optical transparent adhesives, high light transmittance pressure sensitive adhesives or transparent hot melt adhesives.
  • the sealing adhesive layer can be selected from solid OCA (optical clear adhesive), high permeability PSA (pressure sensitive adhesive) or transparent hot melt adhesive, etc., preferably OCA with high light transmittance and reworkability. PSA.
  • the materials of the OCA and PSA are respectively selected from a heat-curing polyacrylate system or a light-curing polyacrylate system.
  • the sealing and pasting adhesive layer of the sealing and pasting collimation film is prepared by using the process shown in FIG. 21: (a) Coating the sealing and pasting adhesive layer 46 on the back of the collimating film, and Cover the release film 47 to form a sandwich structure; (b) Curing with resin under the required conditions (thermal curing type adopts heat curing, and light curing type adopts light curing); (c) tear off the release film 47 before use, and it will produce Sealing and bonding type collimating film;
  • Embodiments 103-111 provide a sealing and bonding collimating film, the cross section of which is shown in Figure 23, including a collimating lens layer (41), a flexible substrate layer (42), a collimating hole layer (43) and The sealing glue layer (46), the collimating lens layer (41) is placed on the upper surface of the base (42), the collimating hole layer (43) is placed on the lower surface of the base (42), the collimating lens layer (41) includes a microlens array (41A) and a thickness (41B), the collimating hole layer (43) includes a light-shielding medium (43A) and a collimating hole array formed by hollowing out the medium, and the collimating hole array is composed of A certain number of collimating holes (43B) are formed, and the adhesive layer (46) fully fills the collimating holes (43B) of the collimating hole layer (43); the collimating lens array of the collimating film and the collimating The hole arrays are all arranged in an orderly
  • the thickness T of the flexible base layer (42) is 38 ⁇ m.
  • the material of the collimating lens layer (41) is PMMA
  • the material of the flexible substrate layer (42) is PET
  • the shading medium (43A) of the collimating hole layer (43) is organic coating black ink.
  • the collimating film uses a microlens perforating method to punch a collimating hole (43B).
  • P is the minimum distance between the main optical axis of the microlens, which is 30 ⁇ m; R is the radius of curvature of the microlens, which is 19.3 ⁇ m; H is the thickness of the collimating lens layer, which is 10.8 ⁇ m; n1 is the refractive index of the collimating lens layer, The dimensionless unit is 1.5; T is the thickness of the flexible substrate layer, which is 38 ⁇ m; n2 is the refractive index of the flexible substrate layer, and the dimensionless unit is 1.65; D is the light spot formed on the lower surface of the flexible substrate layer after focusing by the microlens The diameter is 3.6 ⁇ m; t is the thickness of the collimating hole layer, which is 5-7 ⁇ m, such as 5 ⁇ m, or 7 ⁇ m; ⁇ is the diameter of the collimating hole, which is 3.0-5.0 ⁇ m, such as 3.0 ⁇ m, or 5.0 ⁇ m; ⁇ is 0.19-0.33, for example, ⁇ is 0.19, 0.19, 0.
  • T 2 is the thickness of the adhesive layer in ⁇ m.
  • the thickness T 2 is 5-50 ⁇ m, for example, 5 ⁇ m, 10 ⁇ m, 25 ⁇ m, 35 ⁇ m or 50 ⁇ m; It means that the imaging performance is deteriorated, and ⁇ SNR is -1.0 to -2.3, for example, ⁇ SNR is -1.0, -2.0, -2.1, -2.2, or 2.3.
  • the laser is vertically irradiated to the collimating lens layer, the laser is focused through the microlenses of the collimating lens layer, and the focused light spot falls on the collimating hole layer to make a collimating hole.
  • the distribution of the collimating hole array and the microlens array are completely consistent, and the center of any collimating hole is on the main optical axis of the corresponding microlens.
  • the present invention also provides a method for preparing the sealing and sticking collimating film.
  • the preparation method includes the following steps:
  • preparation method includes the following steps:
  • the hole-sealing laminated collimating film provided by the present invention only includes one layer of collimating holes, which fundamentally solves the problem of difficulty in positioning the two layers of collimating diaphragms with each other.
  • Low, good toughness, not fragile the center of the collimating hole prepared by the micro-focusing method is on the main optical axis of the corresponding micro lens, and the alignment of the collimating hole and the corresponding micro lens is accurate.
  • the preparation method of the sealing and bonding type collimating film provided by the present invention is easy to operate, can be mass-produced, and improves the production yield.
  • the hole-sealing laminating collimating film provided by the present invention has excellent performance, can pass collimated light, filter diffused light, and reduce light interference.
  • the sealing and bonding collimating film provided by the present invention has a bonding adhesive layer, which can be bonded to the lower layer components, thereby improving the dimensional stability of the flexible collimating film and reducing optical distortion.
  • the adhesive layer of the hole-sealing adhesive collimating film provided by the present invention can fully fill the collimating holes, and solves the problem that the air bubbles in the holes affect the imaging quality when a thicker light-shielding layer is designed.
  • the sealing and laminating collimating film provided by the present invention can be applied to large-size, ultra-thin image recognition modules, so that the mass production of large-size, ultra-thin, and even flexible image recognition modules is greatly improved.
  • the sealing and bonding type collimator of the present invention Due to the great market demand and the higher pursuit of ultra-thin, large screen, flexibility and other characteristics, the sealing and bonding type collimator of the present invention
  • the membrane has obvious advantages.
  • the sealing and bonding collimating film provided by the present invention is applied to an image recognition module, so that the recognition accuracy is high.
  • the image recognition module provided by the present invention has high recognition accuracy and can be applied to fingerprint unlocking of consumer electronic products such as mobile phones (OLED screens).
  • Figure 1 is a schematic diagram of the basic principle of a collimator device
  • Figure 2 shows the impact of the alignment accuracy of the collimation structure on the signal strength; the higher the alignment accuracy, the greater the signal strength;
  • Figure 3 shows the influence of the aspect ratio of the collimating structure on the crosstalk intensity; the higher the aspect ratio, the smaller the crosstalk intensity;
  • Figure 4 shows the drilling principle of the micro-focus method
  • Figure 5 shows the accumulation process of alignment errors of traditional punching
  • Figure 6 is a schematic cross-sectional view of a collimating film provided by the present invention.
  • Fig. 7 is a three-dimensional schematic diagram of the collimating film provided by the present invention (square arrangement);
  • Fig. 8 is a three-dimensional schematic diagram of the collimating film provided by the present invention (arranged in equilateral triangle);
  • Figure 9 is a schematic cross-sectional view of a collimating film (collimating sheet) provided by a comparative example
  • FIG. 10 is a test process of the light blocking performance (minimum light blocking angle) of the collimating film provided by the present invention.
  • Figure 11a shows the interference fringes produced by the ordered collimation structure
  • Figure 11b shows the interference fringes produced by the disordered collimation structure
  • Figure 12 is a top view of the collimating lens layer with disordered distribution (used to illustrate the meaning of disordered distribution);
  • Figure 13 is a three-dimensional schematic diagram of the interference-reducing collimating film provided by the present invention (the microlens array is disorderly distributed);
  • Figure 14 is a schematic diagram of the trend of large-screen image recognition modules (taking OLED mobile phone fingerprint recognition modules as an example);
  • Figure 15 is a schematic diagram of the architecture of the image recognition module (take an OLED mobile phone fingerprint recognition module as an example);
  • Figure 16 is a schematic diagram of the laminated collimating film and the lower part after being laminated (taking the OLED mobile phone fingerprint recognition module as an example);
  • Figure 17 shows the four-layer basic structure of the laminated collimating film
  • Figure 18 shows the influence of the thickness of the adhesive layer on the signal reception of the photoelectric sensor
  • Figure 19 is a schematic diagram of the structure of a laminated collimating film
  • Figure 20 shows the bubble problem of the laminated collimating film designed with a thick shading layer
  • Figure 21 is a schematic diagram of the preparation process of the sealing adhesive layer
  • Figure 22 shows the four-layer basic structure of the sealed and bonded collimating film
  • Fig. 23 is a schematic diagram of the structure of a sealed and bonded collimating film.
  • Figure 9 shows a collimating film for comparison, including a collimating lens layer 41, a flexible substrate layer (abbreviated as the substrate) 42 and a collimating hole layer 43.
  • the collimating lens layer is placed on the upper surface of the substrate and collimating The hole layer is placed on the bottom surface of the substrate.
  • the collimating lens layer 41 includes a microlens array 41A and a thickness 41B.
  • the collimating hole layer 43 includes a light-shielding medium 43A and a collimating hole array formed by hollowing out the medium.
  • the number of collimating holes 43B is constituted); the thickness T of the flexible base layer is 25 ⁇ m.
  • the collimating lens array and the collimating hole array of the collimating film are all closely arranged in equilateral triangles (as shown in FIG. 8).
  • the minimum pitch P of the main optical axis of the microlens is 18 ⁇ m
  • the radius of curvature R is 12.6 ⁇ m
  • the thickness of the collimating lens layer H (the vertical distance from the apex of the microlens to the upper surface of the substrate) is 8.5 ⁇ m
  • the thickness of the collimating hole layer t is 2 ⁇ m
  • the collimating hole diameter ⁇ is 4 ⁇ m.
  • the microlens array and the thickness of the collimating lens layer are made of transparent polymer PMMA, and the refractive index n1 is 1.5.
  • the material of the flexible base layer is transparent polymer film PET, and the refractive index n2 is 1.65.
  • the light-shielding medium 43A of the collimating hole layer 43 is an inorganic plating layer of titanium carbide.
  • the collimating film uses a traditional laser drilling method (as shown in FIG. 5) to drill collimating holes 43B.
  • the main optical axis 40 of the microlens and the center of the collimating hole 43B have alignment deviations.
  • the alignment deviation of the first hole is ⁇ 1
  • the alignment deviation of the n-th hole is ⁇ n
  • ⁇ n-1 ⁇ n (n is a natural number greater than 2)
  • n is a natural number greater than 2
  • the bit deviation ⁇ exceeds 1 ⁇ m or even more.
  • the light transmittance coefficient k is easy to drop, even lower than 0.6, reaching the "poor" evaluation level.
  • the collimating film provided by the present invention includes a collimating lens layer 41, a flexible base layer 42, and a collimating hole layer 43.
  • the collimating lens layer is placed on the upper surface of the base, and the collimating hole layer is placed on the base.
  • the collimating lens layer 41 includes a microlens array 41A and a thickness 41B, and the collimating hole layer 43 includes a light-shielding medium 43A and a collimating hole array formed by hollowing out the medium (a certain number of collimating holes 43B Composition);
  • the thickness T of the flexible base layer is 25 ⁇ m.
  • the collimating lens array and the collimating hole array of the collimating film are all closely arranged in equilateral triangles (as shown in FIG. 8).
  • the minimum pitch P of the main optical axis of the microlens is 18 ⁇ m
  • the radius of curvature R is 12.6 ⁇ m
  • the thickness H of the collimating lens layer is 8.5 ⁇ m
  • the thickness t of the collimating hole layer is 2 ⁇ m
  • the collimating hole diameter ⁇ is 4 ⁇ m .
  • the microlens array and the thickness of the collimating lens layer are made of transparent polymer PMMA, and the refractive index n1 is 1.5.
  • the material of the flexible base layer is transparent polymer film PET, and the refractive index n2 is 1.65.
  • the light-shielding medium 43A of the collimating hole layer is an inorganic plating layer of titanium carbide.
  • the collimating film adopts the micro-focus method (as shown in Figure 4) to punch collimating holes 43B.
  • the distribution of the collimating hole array and the microlens array are exactly the same, and the center of any collimating hole is in the main lens of the corresponding microlens.
  • the alignment deviation ⁇ between the center of the collimating hole and the main optical axis of the corresponding microlens is 0.47 ⁇ m, ⁇ 1 ⁇ m.
  • the laser is precisely focused on the lower surface of the PET, the spot diameter D is 1.7 ⁇ m, the minimum light blocking angle ⁇ is 7.5°, and the light transmission coefficient k is 0.98. Overall, the performance advantage of Comparative Example 1 is obvious.
  • the combination of collimating lens structure parameters is not limited to the above embodiments: for the same collimating filter effect, various changes can be made according to the material of the collimating lens layer, the refractive index, the material of the flexible substrate layer, and the refractive index. For example, change P, R, H, ⁇ , t, etc. accordingly; for the shading effect of the collimating hole of the same thickness t, various changes can be made to the shading medium, such as changing the types and combinations of organic coatings and inorganic coatings. Even proportions and so on.
  • the performance of the collimating film provided by the present invention was evaluated in the following manner.
  • the final important performance index of the collimating film is the ability to block stray light, which is generally evaluated by the smallest angle that can block oblique light.
  • the minimum angle ⁇ that can completely block the oblique light can be obtained through conventional optical simulation software (Light tools, ZeMax, Tracepro, etc.) or theoretical calculations.
  • the minimum angle test process of the collimating film According to the size of ⁇ (accurate to 0.5°), the present invention divides the light blocking performance into 5 levels, and the corresponding relationship in turn is: excellent: 0° ⁇ ⁇ 5°, excellent: 5° ⁇ 7.5°, good: 7.5° ⁇ 10°, medium: 10° ⁇ 15°), poor: ⁇ 15°.
  • Another important performance index of the collimating film is the ability to transmit signal light.
  • the alignment accuracy between the collimating hole and the microlens can be checked: when the alignment is high enough, the light spot is always within the diameter of the collimating hole, and the light transmission performance is the best at this time, and the transmittance is the largest (Using optical simulation or laser head high-precision standard sample test, generally around 90%); when the alignment error increases, the transmittance will continue to decay; because the number of collimating holes is very large, this method can be used The change in transmittance was tested under macro conditions to compare the degree of alignment.
  • the ratio of the measured transmittance to the highest transmittance (the highest transmittance refers to the light transmittance measured when the main optical axis of the microlens is completely coincident with the center line of the corresponding collimating hole) Defined as the transmittance coefficient k, which is 1 when the degree of alignment is sufficiently high.
  • the present invention divides the light transmittance performance into 5 grades, and the corresponding relationships are as follows: excellent: 1 ⁇ k>0.95, excellent: 0.95 ⁇ k>0.9, good: 0.9 ⁇ k>0.8, medium : 0.8 ⁇ k>0.6, difference: k ⁇ 0.6.
  • the collimating lens array and the collimating hole array in the collimating film are all arranged in equilateral triangles
  • the material of the collimating lens layer 41 is PMMA
  • the material of the flexible base layer 42 is PMMA.
  • the material is PET
  • the light-shielding medium 43A of the collimating hole layer 43 is an inorganic coating titanium carbide.
  • the collimating film uses a microlens perforation method to punch the collimating hole 43B. The other parameters are listed in Table 1.
  • Table 1 it is a relatively preferred embodiment designed with different P values on a flexible base layer with a thickness of 25 ⁇ m.
  • the P value is 10, 15, 18, 20, 25, and 30 ⁇ m
  • the focal length becomes farther, the micro-focus spot on the light-shielding layer becomes larger, so it is necessary to cooperate with the increase of H to make the focus return to the light-shielding layer, the light spot is reduced, and the matching change of R and H can make the micro-focus spot diameter D Continuously shrinking, the minimum light blocking angle ⁇ is gradually reduced, and the light blocking performance is improved.
  • the spot diameter D is to the diameter of the opening (collimation hole) ⁇ , the greater the impact of the alignment deviation ⁇ on the light transmittance, and a slight deviation will cause the loss of signal light, while D is relatively ⁇ When it is small, the impact on the position deviation is small, and it is still in the hole no matter which direction it moves.
  • the examples 1-24 provided by the present invention all have a fixed opening diameter ⁇ of 4 ⁇ m. Except that D and ⁇ in Examples 21-23 are relatively close, the other examples all maintain a certain difference, and the light transmittance coefficient k is greater than 0.9. In general, most of the examples 1-24 can reach the level of double excellent in light blocking performance and light transmission performance, which is based on the better implementation effect of the 25 ⁇ m thick flexible substrate.
  • the collimating lens array and the collimating hole array in the collimating film are both equilateral triangles and tightly arranged
  • the collimating lens layer 41 is made of PMMA
  • the flexible base layer 42 is made of It is PET
  • the light-shielding medium 43A of the collimating hole layer 43 is an inorganic coating titanium carbide.
  • the collimating film uses a microlens perforation method to punch the collimating hole 43B. The other parameters are listed in Table 2.
  • Examples 25-30 are Examples 25-30 with different flexible substrate thicknesses.
  • Another set of collimating films with T 25, 38, 50 ⁇ m.
  • the microlens structure When T keeps increasing, in order to maintain the micro-focusing effect (the focus always falls on the bottom surface of the substrate and the light-shielding layer and the spot is as small as possible), the microlens structure obviously needs to be shallow, that is, when the P value and the refractive index are fixed, R As the value increases, H becomes lower (compared to the difference in the embodiment in Table 1, the focal length design has been adapted as T increases, so H does not need to increase, but instead decreases). It can be found that when other conditions remain unchanged, the thickness T increases, which helps the structure become shallower, the light spot D is reduced, the minimum light blocking angle ⁇ is reduced, the light blocking performance is improved, and the light transmission coefficient is further improved.
  • T is selected from 10 to 50 ⁇ m, and more preferably 25 to 38 ⁇ m.
  • the collimating lens array and the collimating hole array of the collimating film are all arranged in equilateral triangles closely, the material of the collimating lens layer 41 is PMMA, and the material of the flexible substrate layer 42 is PMMA. It is PET, and the light-shielding medium 43A of the collimating hole layer 43 is an inorganic coating titanium carbide.
  • the collimating film uses a microlens perforation method to punch the collimating hole 43B. The other parameters are listed in Table 3.
  • the opening diameter ⁇ can be reduced by adjusting the laser energy, which is not necessarily limited to a fixed value. It can be found that the opening diameter is reduced After that, the light blocking performance can be further improved, but the light transmission effect will be reduced.
  • the P value of Example 40 is 50 ⁇ m, and the corresponding R and H are both large.
  • the size of the microlens has reached the upper limit of the design, including the spot diameter D is also large (D is particularly small ,Especially less than 0.5 ⁇ m is not good, it is easy to cause the single point energy to be too high and burn the substrate), which leads to the hole diameter ⁇ reaching the upper limit of 8 ⁇ m.
  • the minimum light blocking angle ⁇ is 12 degrees and the light blocking performance is not considered. That's great.
  • P is selected from 10 to 50 ⁇ m, preferably 15 to 30 ⁇ m, and more preferably 18 to 25 ⁇ m.
  • ⁇ is selected from 1 to 10 ⁇ m (10 ⁇ m from Example 47), and more preferably 3 to 5 ⁇ m.
  • D is selected from 0.1 to 7.8 ⁇ m, preferably 0.5 to 4.9 ⁇ m, and more preferably 1 to 2 ⁇ m.
  • the collimating lens array and the collimating hole array of the collimating film are all arranged in equilateral triangles closely, the material of the collimating lens layer 41 is PMMA, and the material of the flexible substrate layer 42 is PMMA. It is PET, and the light-shielding medium 43A of the collimating hole layer 43 is an inorganic coating titanium carbide.
  • the collimating film uses a microlens perforation method to punch the collimating hole 43B. The other parameters are listed in Table 4.
  • Examples 41 to 47 are Examples 41 to 47 with different collimating hole layer thickness t. Comparing the first group of Examples 41 to 44 or the second group of Examples 45 to 47, it can be seen that when other conditions remain unchanged, increasing t helps to improve the light blocking performance, and that t is too thin is not a preferred value. Since laser drilling generally forms a cavity with a smaller aspect ratio, the opening diameter is often larger than t. In fact, when t is too thick, the opening diameter will be too large (as in the second group of embodiments). Gradually reduce the light blocking performance. In the present invention, t is selected from 0.5 to 7 ⁇ m, preferably 1 to 5 ⁇ m, and more preferably 2 to 3 ⁇ m.
  • the collimating lens array and the collimating hole array of the collimating film are all arranged in equilateral triangles
  • the material of the collimating lens layer 41 is PMMA, and further, it is cured by light Acrylic resin is polymerized, and the refractive index n1 is adjustable from 1.4 to 1.6.
  • the light-shielding medium 43A of 43 is an inorganic coating titanium carbide, and the collimating film uses a microlens perforating method to make a collimating hole 43B.
  • Table 5 The other parameters are listed in Table 5.
  • n1 is selected from 1.4 to 1.6, preferably 1.5.
  • n2 is selected from 1.5 to 1.65, and it is not preferred depending on the material difference.
  • the collimating lens array and the collimating hole array of the collimating film are both square and closely arranged (as shown in FIG. 7), and the material of the collimating lens layer 41 is PMMA, The material of the flexible base layer 42 is PET, the light-shielding medium 43A of the collimating hole layer 43 is an inorganic coating titanium carbide, and the collimating film uses a microlens perforation method to punch the collimating holes 43B.
  • the other parameters are shown in Table 6. Listed.
  • the collimating lens array and the collimating hole array of the collimating film are all arranged closely in a regular triangle, and the minimum distance P of the main optical axis of the microlenses of the collimating lens layer is 20 ⁇ m,
  • the radius of curvature R is 18.3 ⁇ m
  • the total thickness of the collimating lens layer is 4.1 ⁇ m
  • the thickness of the flexible substrate layer is 50 ⁇ m
  • the thickness of the collimating hole layer is 2 ⁇ m
  • the diameter of the collimating hole ⁇ is 4 ⁇ m.
  • the alignment error ⁇ of the microlens and the collimating hole are all ⁇ 1 ⁇ m.
  • the light blocking angle ⁇ is less than 5°, the light blocking performance is excellent, the light transmission coefficient k is all greater than 0.95, and the light transmission performance is excellent.
  • the material of the collimating lens layer, the material of the flexible base layer, and the material of the light-shielding medium of the collimating hole layer are listed in Table 7.
  • the refractive index of the collimating lens layer n1 and the refractive index of the flexible base layer n2 vary depending on the material. , And allow ⁇ 0.02 errors caused by the same material and different processes, which are no longer listed in the table.
  • the molding method is not limited to light curing, thermal curing, injection molding, hot pressing, etc.
  • the cross-section is shown in FIG. 6, and the three-dimensional view is shown in FIG.
  • the collimating lens array and the collimating hole array in the collimating film are both disordered arrays, and the microlenses are closely arranged and overlap each other (as shown in FIG. 12, the main optical axis coordinates of any three overlapping microlenses are Connected to form a common triangle (not a regular triangle).
  • the main optical axis spacing P of the two overlapping microlenses changes disorderly within a certain value range (Pm ⁇ 0.5A), where the median value Pm is the amount of change A is listed in Table 8.
  • the material of the collimating lens layer 41 is PMMA
  • the material of the flexible substrate layer 42 is PET
  • the light-shielding medium 43A of the collimating hole layer 43 is an inorganic coating titanium carbide
  • the collimating film adopts micro
  • the collimating hole 43B is punched by the lens punching method, and the other various parameters are listed in Table 8.
  • P is the distance between the main optical axes of two microlenses that overlap each other.
  • the value range of P is Pm ⁇ 0.5A, in ⁇ m;
  • Pm is the average of the maximum and minimum values in the range of P. Called the median value, A is the difference between the maximum value and the minimum value in the value range of P, called the amount of change, in ⁇ m;
  • R is the radius of curvature of the microlens, in ⁇ m;
  • H is the thickness of the collimating lens layer (or Called height), unit ⁇ m;
  • n1 is the refractive index of the collimating lens layer, a dimensionless unit;
  • T is the thickness of the flexible substrate layer, unit ⁇ m;
  • n2 is the refractive index of the flexible substrate layer, a dimensionless unit;
  • D is through the microlens
  • t is the thickness of the collimating
  • the collimating lens array and the collimating hole array of Example 24 are all arranged in equilateral triangles; the collimating lens array and the collimating hole array of Examples 81 to 86 are both disordered arrays and tightly arranged;
  • the collimating film changes from a fixed P value to a disorderly changing P value, which basically does not affect the performance.
  • the A value is the amount of change, selected from 1 to 10 ⁇ m, preferably 2 to 6 ⁇ m.
  • A is too small, the interference reduction effect is not obvious.
  • A is too large, the array shape becomes uncontrollable, the reproducibility is poor, and there are more light leakage areas caused by the distance too far.
  • the cross-section is shown in FIG. 6 and the three-dimensional view is shown in FIG. 13.
  • the collimating lens array and the collimating hole array in the collimating film are both disordered arrays, and the microlenses are closely arranged and overlap each other (as shown in FIG. 12, the main optical axis coordinates of any three overlapping microlenses are Connected to form a common triangle (not a regular triangle).
  • the main optical axis spacing P of the two overlapping microlenses changes disorderly within a certain value range (Pm ⁇ 0.5A), where the median value Pm is the amount of change A is listed in Table 9.
  • the material of the collimating lens layer 41 is PMMA
  • the material of the flexible substrate layer 42 is PET
  • the light-shielding medium 43A of the collimating hole layer 43 is inorganic coating titanium carbide
  • the collimating film adopts micro
  • the collimating hole 43B is punched by the lens punching method, and the other various parameters are listed in Table 9.
  • the collimating lens array and the collimating hole array of Example 4 are all arranged in equilateral triangles; the collimating lens array and the collimating hole array of Examples 87 to 92 are all disordered arrays and are arranged closely;
  • the collimating film changes from a fixed P value of 18 ⁇ m to a disordered change (the narrowest range is 17.5 ⁇ 18.5 ⁇ m, the widest range is 13 ⁇ 23 ⁇ m). Value, basically does not affect performance.
  • the A value is the amount of change, selected from 1 to 10 ⁇ m, preferably 2 to 6 ⁇ m. When A is too small, the interference reduction effect is not obvious. When A is too large, the array shape becomes uncontrollable, the reproducibility is poor, and there are more light leakage areas caused by the distance too far.
  • the cross-sections of the collimating films provided in Examples 93 to 102 are shown in FIG. 19.
  • the collimating lens array and the collimating hole array in the collimating film are both disordered arrays, and the microlenses are closely arranged and overlap each other (as shown in FIG. 12, the main optical axis coordinates of any three overlapping microlenses are Connected to form a common triangle.
  • the main optical axis spacing P of the two overlapping microlenses varies randomly within a certain value range (Pm ⁇ 0.5A), where the median value Pm is 18 ⁇ m or 15 ⁇ m, and the amount of change A Is 4 ⁇ m, that is, the value range of P is 18 ⁇ 2 ⁇ m or 15 ⁇ 2 ⁇ m, and other parameters are listed in Table 10.
  • the material of the collimating lens layer 41 is PMMA
  • the material of the flexible substrate layer 42 is PET
  • the light-shielding medium 43A of the layer 43 is an inorganic coating titanium carbide.
  • the collimating film adopts a microlens perforation method to make a collimating hole 43B, and the other parameters are listed in Table 10.
  • the bonding adhesives of Examples 93 to 99 The layer 44 is solid OCA, and the material is a thermosetting polyacrylate system; the adhesive layer 44 of Example 100 is a high-permeability PSA, and the material is a thermosetting polyacrylate system; the adhesive layer 44 of Example 101 is a solid OCA , The material is a light-curing polyacrylate system; the adhesive layer 44 of Example 102 is a high-transmittance PSA, and the material is a light-curing polyacrylate system.
  • collimating lens arrays and collimating hole arrays of Examples 93-102 are all disordered arrays, closely arranged;
  • T 2 is the thickness of the adhesive layer, in ⁇ m
  • Example 98 and Example 99 a flexible substrate with a thickness of 50 ⁇ m is used. Layer (if 25 ⁇ m thickness is still used, problems will occur) and 2.4 ⁇ m H. Comparing Examples 97, 100 to 102, it can be seen that when the parameters of the three-layer core structure (41, 42, 43) of the interference-reducing collimating film remain unchanged, the material of the adhesive layer (44) does not affect the optical collimation performance.
  • any example of the ordered collimation film in the present invention can change the P value to a certain degree to obtain a new disordered collimation film. Therefore, the Pm value in the disordered collimation film is similar to that of the ordered collimation film.
  • the P value in the straight film is selected from 10 to 50 ⁇ m, preferably 15 to 30 ⁇ m, and more preferably 18 to 25 ⁇ m. In the present invention, only embodiment 24 is used for disorder optimization, and no more examples will be described for details, but this does not affect the patent scope of the disordered collimating film provided by the present invention.
  • the laminated collimating film provided in Example 93 has a cross-section as shown in Figure 19, including a collimating lens layer 41, a flexible base layer 42, a collimating hole layer 43 and a bonding glue layer 44, and the collimating lens layer 41 is placed on the upper surface of the base 42, a collimating hole layer 43 is placed on the lower surface of the base 42, the collimating lens layer 41 includes a microlens array 41A and a thickness 41B, and the collimating hole layer 43 includes a light-shielding medium 43A And a collimating hole array formed by hollowing out the medium, the collimating hole array is composed of a certain number of collimating holes 43B, and the lower surface of the collimating hole layer is attached to the adhesive layer 44; the flexible substrate layer
  • the thickness T of 42 is 38 ⁇ m.
  • the collimating lens array and the collimating hole array of the collimating film are all closely arranged in equilateral triangles (as shown in FIG. 8).
  • the material of the collimating lens layer 41 is PMMA
  • the material of the flexible substrate layer 42 is PET
  • the shading medium 43A of the collimating hole layer 43 is organic coating black ink
  • the adhesive layer 44 is solid OCA
  • the material is thermal curing Polyacrylate system.
  • the collimating film uses a microlens perforating method to punch the collimating hole 43B, and the other various parameters and optical properties are listed in Table 11.
  • Embodiments 103-111 provide a sealing and pasting collimating film, the cross section of which is shown in FIG. 23, including a collimating lens layer 41, a flexible base layer 42, a collimating hole layer 43, and a sealing and pasting adhesive layer 46.
  • the collimating lens layer 41 is placed on the upper surface of the base 42 and the collimating hole layer 43 is placed on the lower surface of the base 42.
  • the collimating lens layer 41 includes a microlens array 41A and a thickness 41B.
  • the layer 43 includes a light-shielding medium 43A and a collimating hole array formed after the medium is hollowed out.
  • the collimating hole array is composed of a certain number of collimating holes 43B.
  • the adhesive layer 46 connects the collimating holes 43B of the collimating hole layer 43. Fully filled; the thickness T of the flexible base layer 42 is 38 ⁇ m.
  • the collimating lens array and the collimating hole array of the collimating film are all closely arranged in equilateral triangles (as shown in FIG. 8).
  • the material of the collimating lens layer 41 is PMMA
  • the material of the flexible base layer 42 is PET
  • the light-shielding medium 43A of the collimating hole layer 43 is organic coating black ink.
  • the collimating film uses a microlens perforating method to punch the collimating hole 43B, and the other various parameters and optical properties are listed in Table 11.
  • the sealing adhesive layer 46 of Examples 103 to 108 is solid OCA, and the material is a heat-curing polyacrylate system; the sealing adhesive layer 46 of Example 109 is a high-permeability PSA, and the material is a heat-curing polyacrylate system
  • the sealing adhesive layer 46 of Example 110 is solid OCA, and the material is a light-curing polyacrylate system; the sealing adhesive layer 46 of Example 111 is a high-permeability PSA, and the material is a light-curing polyacrylate system.
  • the collimating lens arrays and collimating hole arrays of Examples 103-111 are all ordered arrays, and are arranged closely in a regular triangle;

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Abstract

L'invention concerne un film de collimation stratifié d'étanchéité de trou, comprenant une couche de lentille de collimation (41), une couche de substrat souple (42), une couche de trou de collimation (43), et une couche adhésive stratifiée d'étanchéité de trou (46). La couche de lentille de collimation (41) comprend un réseau de microlentilles (41A) et une épaisseur de paroi (41B); la couche de trou de collimation (43) comprend un milieu de protection contre la lumière (43A) et un réseau de trous de collimation (43B) formée après que le milieu de protection contre la lumière (43A) est creusé; le réseau de trous de collimation (43B) de la couche de trou de collimation (43) est entièrement rempli avec la couche adhésive stratifiée d'étanchéité de trou (46). Le film de collimation stratifié d'étanchéité de trou est appliqué à un module d'identification d'image, de telle sorte que la précision d'identification du module d'identification d'image est élevée. L'invention concerne également un film de collimation, un film de collimation de réduction d'interférence, un film de collimation stratifié, et un procédé de préparation du film de collimation stratifié d'étanchéité de trou.
PCT/CN2021/074322 2020-02-24 2021-01-29 Film de collimation, film de collimation de réduction d'interférence, film de collimation stratifié, et film de collimation stratifié d'étanchéité de trou et son procédé de préparation WO2021169726A1 (fr)

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