WO2021021671A1 - Aperture-metasurface and hybrid refractive-metasurface imaging systems - Google Patents
Aperture-metasurface and hybrid refractive-metasurface imaging systems Download PDFInfo
- Publication number
- WO2021021671A1 WO2021021671A1 PCT/US2020/043600 US2020043600W WO2021021671A1 WO 2021021671 A1 WO2021021671 A1 WO 2021021671A1 US 2020043600 W US2020043600 W US 2020043600W WO 2021021671 A1 WO2021021671 A1 WO 2021021671A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- metasurface
- image sensor
- imaging system
- lens
- aperture
- Prior art date
Links
- 238000003384 imaging method Methods 0.000 title claims abstract description 118
- 230000003287 optical effect Effects 0.000 claims abstract description 65
- 239000010410 layer Substances 0.000 claims description 105
- 239000000758 substrate Substances 0.000 claims description 85
- 125000006850 spacer group Chemical group 0.000 claims description 37
- 239000000463 material Substances 0.000 claims description 21
- 239000011521 glass Substances 0.000 claims description 6
- 239000002356 single layer Substances 0.000 claims description 6
- 238000000034 method Methods 0.000 abstract description 21
- 238000004519 manufacturing process Methods 0.000 abstract description 15
- 238000005286 illumination Methods 0.000 abstract description 12
- 230000010354 integration Effects 0.000 abstract description 5
- 238000013461 design Methods 0.000 description 17
- 235000012431 wafers Nutrition 0.000 description 15
- 239000002086 nanomaterial Substances 0.000 description 9
- 230000010363 phase shift Effects 0.000 description 7
- 230000008569 process Effects 0.000 description 6
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- 239000006059 cover glass Substances 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- 239000000470 constituent Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000004075 alteration Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000012634 optical imaging Methods 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 2
- 238000003491 array Methods 0.000 description 2
- 238000000231 atomic layer deposition Methods 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000004927 fusion Effects 0.000 description 2
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 2
- 230000002085 persistent effect Effects 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000001934 delay Effects 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002991 molded plastic Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/16—Optical objectives specially designed for the purposes specified below for use in conjunction with image converters or intensifiers, or for use with projectors, e.g. objectives for projection TV
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14625—Optical elements or arrangements associated with the device
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/002—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/22—Telecentric objectives or lens systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/0944—Diffractive optical elements, e.g. gratings, holograms
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/0988—Diaphragms, spatial filters, masks for removing or filtering a part of the beam
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
- G02B27/4244—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application in wavelength selecting devices
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4294—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect in multispectral systems, e.g. UV and visible
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1809—Diffraction gratings with pitch less than or comparable to the wavelength
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1814—Diffraction gratings structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14618—Containers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/1462—Coatings
- H01L27/14621—Colour filter arrangements
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/50—Constructional details
- H04N23/55—Optical parts specially adapted for electronic image sensors; Mounting thereof
Definitions
- the current disclosure is directed to optical arrangements of metasurface elements, integrated systems incorporating refractive optics, light sources and/or detectors with such metasurface elements, and methods of the manufacture of such optical arrangements and integrated systems.
- the application is directed to optical arrangements of metasurface elements, integrated systems incorporating light sources and/or detectors with such metasurace elements, and methods of the manufacture of such optical arrangements and integrated systems.
- Imaging system including:
- the aperture and the layer of metasurface elements are configured to gather light of a specified operational bandwidth across a specified field of view and shift the incoming light such that it comes to a focus on the at least one image sensor at a zero or near-zero degree chief ray angle.
- the field of view is at least ⁇ 30 degrees.
- the system further includes a narrow bandwidth optical filter disposed between the metasurface elements and the at least one image sensor
- Various embodiments are directed to an imaging system including:
- At least one image sensor At least one image sensor
- a substrate layer having a substrate thickness, the substrate layer configured to be transparent to a target wavelength of light, the substrate layer having a first surface distal the at least one image sensor and a second surface proximal with the at least one image sensor;
- a single layer of a plurality of identical or unique nanostructured elements comprising a metasurface disposed on one of either the first or second surfaces, such that light impinging on the aperture opening passes through at least a portion of the metasurface such that a specified angular deflection is imposed thereby;
- the aperture and the metasurface layer are configured to gather light of a specified operational bandwidth across a specified field of view and shift the incoming light such that it focuses on the at least one image sensor at a zero or near-zero degree chief ray angle.
- the metasurface layer is disposed on the first surface.
- the system further includes a narrow bandwidth optical filter disposed on the second surface between the metasurface elements and the at least one image sensor.
- a narrow bandwidth optical filter disposed on the second surface between the metasurface elements and the at least one image sensor.
- at least a portion of the aperture is interconnected with the first surface.
- the metasurface layer is disposed on the second surface.
- the image sensor is in contact with the second surface.
- the field of view is at least ⁇ 30 degrees.
- At least one image sensor At least one image sensor
- substrate layer having a substrate thickness, the substrate layer configured to be transparent to a target wavelength of light, the substrate layer having a first surface distal the at least one image sensor and a second surface proximal with the at least one image sensor;
- At least one refractive lens disposed above the substrate and configured to focus impinging light on the first surface of the substrate layer; and a single layer of a plurality of identical or unique nanostructured elements comprising a metasurface disposed on one of either the first or second surfaces, such that light impinging on the at least one refractive lens passes through at least a portion of the metasurface elements such that an angular deflection is imposed thereby;
- the distance between the at least one refractive lens and the layer of metasurface elements are separated by a first distance; and wherein the refractive lens and the layer of metasurface elements are configured to gather light of a specified operational bandwidth across a specified field of view and shift the incoming light such that it focuses on the at least one image sensor at a zero or near-zero degree chief ray angle.
- the system further includes an airgap between the second surface of the substrate and the image sensor.
- a spacer layer is disposed within the airgap.
- the metasurface layer is disposed on the first surface.
- the system further includes a narrow bandwidth optical filter disposed on the second surface between the metasurface elements and the at least one image sensor.
- At least a portion of at least one of the refractive lenses is interconnected with the first surface.
- the metasurface layer is disposed on the second surface.
- the image sensor is in contact with the second surface.
- the field of view is at least ⁇ 30 degrees.
- the at least one refractive lens is selected from the group consisting of plano-convex, convex-piano, bi-convex, bi-concave, plano concave, or concave-piano.
- the system includes at least two refractive lenses comprising a convex-concave lens and concave-convex lens.
- the system includes at least three refractive lenses comprising a convex-concave lens, a bi-convex lens and a concave-piano lens.
- At least the imaging sensor and metasurface have rectangular geometries.
- the at least one refractive lense proximal to the metasurface has a circular geometry.
- the image sensor is characterized by a vertical, v, and a horizontal, h, dimension
- FIG. 1 provides a schematic illustrating an aperture-metasurface imaging system incorporating a cover glass above the image sensor in accordance with embodiments of the invention.
- FIG. 2 provides a schematic illustrating a ray tracing diagram including the chief ray angle at the image sensor plane for the aperture-metasurface imaging system of FIG. 1 in accordance with embodiments of the invention.
- FIG. 3 provides a schematic illustrating an aperture-metasurface imaging system with an air gap between the aperture and metasurface in accordance with embodiments of the invention.
- FIG. 4 provides a schematic illustrating a ray tracing diagram including the chief ray angle at the image sensor plane for the aperture-metasurface imaging system of FIG. 3 in accordance with embodiments of the invention.
- FIG. 8A provides a data graphs showing the relative illumination versus field of view for an aperture-metasurface imaging system in accordance with embodiments of the invention.
- FIG. 8B provides a data graph showing the field of view versus degree of distortion for an aperture-metasurface imaging system in accordance with embodiments of the invention.
- FIGs. 10A and 10B provide schematics illustrating multiple refractive element and metasurface hybrid imaging systems in accordance with embodiments of the invention.
- FIG. 12A provides a schematic of a spacer wafer in accordance with embodiments of the invention.
- FIG. 16 provides a schematic illustrating an imaging system incorporating a rectangular metasurface lens element in accordance with embodiments of the invention.
- FIGs. 17A and 17B provide schematics illustrating the relative dimensions of an imaging sense (FIG. 17A) and a rectangular metasruface lens element (FIG. 17B) in accordance with embodiments of the invention.
- hybrid imaging systems incorporating conventional optical elements and metasurface elements with light sources and/or detectors, and methods of the manufacture and operation of such optical arrangements are provided.
- Many embodiments are directed to systems and methods for integrating apertures with metasurface elements in illumination sources and sensors.
- Various embodiments are directed to systems and methods for integrating refractive optics with metasurface elements in illumination sources and sensors.
- the metasurface element may be free standing or may be embedded within another material.
- the selection of the embedding material includes the appropriate selection of refractive index and absorption characteristics.
- the embedding material may provide mechanical stability and protection as well as an additional design degree of freedom that enables the metasurface to perform a desired optical function.
- a spacing layer of a defined thickness may be deposited on the CMOS image sensor, LED, VCSEL, etc., to implement an optical distance appropriate for a desired camera design, illuminator design or optimal system performance.
- the spacing layer material may be organic or inorganic and may have a lower refractive index than the dielectric elements comprising the metasurface.
- the thickness of the spacing layer may be modified to provide appropriate optical spacing for the specific optical system.
- a sequence may include: (i) sensor or illuminator, (ii) optional microlens array/collimator, optional filter, optional spacing layer, optional metasurface element, optional additional spacing layer, optional refractive optic or aperture elements, optional anti-reflection (AR) layer, optional protection layer.
- a sequence of elements may include: (i) sensor or illuminator, (ii) optional microlens array/collimator, optional filter, optional spacing layer, optional metasurface element, optional additional spacing layer, and optional refractive element or aperture.
- the system typically to form an optical system that is corrected for aberrations over a selected field of view, the system must comprise multiple optical surface or multiple optical elements (e.g., two or more). This is true for both conventional refractive optical systems and metasurface optical systems. Specifically, only optical systems with two or more metasurfaces and sufficiently low aberrations over some field of view have been demonstrated.
- Various embodiments are directed to imaging systems that integrate an aperture and a single metasurface element, that allow for the combined system to achieve high quality imaging over a large field of view, telecentricity (e.g., near 0 degree of incidence at the image sensor plane) over a large field of view, and with no fall-off in relative illumination.
- metasurface imaging systems implement multiple metasurface elements to provide enough degrees of freedom to adequately control these parameters (CRA, FOV and minimizing distortion).
- CRA CRA
- FOV FOV
- various embodiments show that by combining an aperture with a single metasurface, an imaging system with a wide FOV, controllable distortion and controllable CRA can be realized in accordance with embodiments.
- the system (10a to 10d) generally comprises an aperture structure (12a to 12d) disposed a set distance (13a to 13d) away from a metasurface layer (14a to 14d), which itself is set a distance (15a to 15d) away from an image sensor (16a to 16d).
- the distance between the aperture and metasurface layer, and the distance between the metasurface layer and the imaging system may take the form of an air gap or an optically transmissive material (e.g., substrate etc.).
- Embodiments of nanostructures generally comprise identical or unique three dimension elements (e.g., square, round, triangular, oval, etc.) having feature sizes smaller than the wavelength of light within the specified operational bandwidth and configured to impose a phase shift on impinging light within the plane of plurality separated by macroscopic distances (distances of 10 or more wavelengths), such that in combination the metasurface layer performs a single optical function.
- Each individual metasurface in the optical system may be configured to have some specific 2D phase and transmission function, ⁇
- each metasurface may have a unique distribution of phase and transmission
- the nanostructure elements that comprise any metasurface embedded in the same material, with the same base composition and at a specific wavelength are identical.
- the transmission can be configured to be maximized (near 1 ) and uniform across the metasurface while the phase can be configured to take on values between 0 and 2TT.
- a set of in-plane dimensions of the comprising nanostructures may be configured such that phase delays from 0 to 2p can be imprinted on an incident light field.
- the only variable from design to design is the distribution of suitable nanostructure elements across the metasurface.
- Metasurface layers may be designed to be freestanding, i.e. , the metasurface elements protrude from the end of the substrate with only air gaps separating them, the process is complete at this step.
- metasurfaces may be further configured to have an AR coating or mechanical protection.
- the metasurface constituent elements and substrate faces may be coated in some material or layers of material.
- the elements which can be any material with desired optical properties, are embedded in a lower-index of refraction medium.
- the low-index medium completely encapsulates the metasurfaces and extends some thickness above the metasurface elements.
- the low-index medium acts as a protective barrier to the metasurface elements (i.e. , provide mechanical stability) and provides an additional design degree of freedom for the system that allows for certain properties to be optimized, e.g., overall transmission or efficiency of the metasurface.
- Metasurface layers or metasurface systems can be fabricated in mass production using any suitable fabrication techniques, including, for example, lithography, machining, etching, and standard CMOS fabrication techniques, as has been previously described in U.S. Patent Application No. 16/120, 174, filed August 31 , 2018, the disclosure of which is incorporated herein by reference.
- the metasurface substrate may be any low-index material, e.g., polymer, S1O2, glass.
- the metasurface elements may also be any material which has been optimized for a specific bandwidth, e.g., silicon, Ti02, alumina, metal, etc.
- the imaging system may take the form of a single monolithic image sensor or a pixel array.
- image sensors and pixel arrays may take any suitable form including, for example, CMOS sensors.
- FIG. 1 provides a schematic illustration of an implementation of various embodiments of such hybrid aperture/metasurface imaging systems.
- a substrate layer (24a) transparent at the wavelength of interest and having a thickness (tsub) is provided having an aperture structure (12a) which is opaque to light at the wavelength of interest and completely transparent to light at that wavelength of interest over a distance, (d ap ) disposed on a first side distal to the imager (16a), and a metasurface layer (14a) composed of nanostructures (22a) with equal height disposed on a second side proximal to the imager (16a).
- the aperture structure (12a) and metasurface layer (14a) are separated by a first distance (13a) defined by the substrate thickness (tsub). Further in such embodiments, the aperture structure (12a) and metasurface layers (14a) may be deposited directly on the substrate (24a) or bonded via adhesive. Between the metasurface layer (14a) and the imager (16a) is disposed a distance (15a) defining the back-focal length formed by an air gap (tair).
- many embodiments of such imaging systems may further comprise an optional cover glass or filter (26) which does not impact the imaging performance of the device but provides other functionality (e.g., either optical or structural).
- the aperture imparts no optical function (does not deflect the light rays) but rather only limits the lateral extent of the light ray bundle that may enter the imaging system, or equivalently sets the entrance aperture or the f/# of the system.
- the metasurface layer may comprise the only functional optical layer that significantly deflects the light rays to form a focused image in such embodiments.
- the metasurface layer may act as an arbitrary phase mask, imparting any value from 0 to 2p phase shift on the incident light at an arbitrary radial position of the lens.
- FIG. 2 a ray-tracing diagram through an exemplary embodiment of a system comprising a single aperture (12a) and a single metasurface (14a) combined on a single substrate (24a) in accordance with the embodiment illustrated in FIG. 1 is provided.
- these metasurface elements could be fabricated using methods as described herein or in previously cited U.S. Pat. App. No.
- the aperture and metasurface elements have been configured such that in combination they are able to form a good image across a wide FOV ( ⁇ 40 degrees in this example, however, it will be understood that this is not a limiting case).
- Embodiments of such a single aperture and single metasurface system, as shown, have been surprisingly found to naturally produce focused rays at the image plane that are telecentric (i.e. , having 0 degree CRA).
- the metasurface layers (14b) and the imager (16b) may be directly bonded via adhesive or other suitable means. Between the metasurface layer (14b) and the imager (16b) is disposed a distance (15b) defining the back-focal length formed by the substrate thickness (tsub). This distance is used as a free parameter to design imaging systems with optimal performance and will change based on the desired f/# or field of view of the imaging system, for example. In such embodiments such imaging systems do not require the optional cover glass or filter used in the embodiment shown in FIG. 1 as the substrate (24b) provides such dual functionality.
- the aperture structure (12b), which is opaque to light at the wavelength of interest and completely transparent to light at that wavelength of interest over a distance, (d ap ), and metasurface layer (14b) are separated by a first distance (13b) defined by and airgap (tair).
- the aperture and metasurface elements have been configured such that in combination they are able to form a good image across a wide FOV ( ⁇ 40 degrees in this example, however, it will be understood that this is not a limiting case).
- Embodiments of such a single aperture and single metasurface system, as shown, have been surprisingly found to naturally produce focused rays at the image plane that are telecentric (i.e., having 0 degree CRA).
- the metasurface layers (14c) and the imager (16c) may be deposited directly on the substrate (24c) or bonded via adhesive. Such embodiments may also comprise suitable spacers (30) to support the substrate (24c) and maintain the distance between the substrate and the image sensor (16c). Between the metasurface layer (14c) and the imager (16c) is disposed a distance (15c) defining the back-focal length formed by the combination of the substrate thickness (tsub) and a spacer height (tspacer).
- the spacers (30) can be either fixed to the image sensor (16c) and substrate layer (24c), leading to a fixed distance for (tspacer) or the substrate can be placed into a standard optical barrel and (tspacer) can be adjustable post assembly. Such embodiments allow for the surface (34) of the substrate (24c) proximal to the image sensor (16c) to remain unpatterned, allowing for the direct integration of an optional optical filter thereon.
- the metasurface layer (14d) may also be disposed on the surface of the substrate (24d) proximal to the image sensor (16d) facing the air gap (32) supported by spacers (30’).
- Such an implementation allows for the protection of the metasurface elements from environmental contamination.
- such embodiments allow for the surface (34’) of the metasurface substrate (24d) distal to the image sensor (16d) to remain unpatterned, allowing for the direct integration of an optional optical filter on the substrate.
- the spacer (30’) can be either fixed to the image sensor (16d) and substrate (24d), leading to a fixed distance for (tspacer) or the substrate (24d) can be placed into a standard optical barrel and (tspacer) can be adjustable post assembly.
- embodiments illustrated in FIGs. 5 and 6 illustrate that the metasurface elements may be arranged to face inward or outward with respect to the air gap between the substrate and image sensor.
- Production of the metasurface system illustrated in FIGs. 5 and 6 can follow processes described, for example, in U.S. Pat. App. No. 16/120,174.
- the spacer layers may be any low-index material, e.g., polymer, S1O2, glass.
- FIGs. 3, 5 and 6 Although embodiments of hybrid aperture/metasurface imaging systems incorporating an airgap between the aperture and metasurface substrate have been shown in FIGs. 3, 5 and 6, these embodiments would require a separate supporting structure to secure the aperture and ensure the aperture distance (tair) remains constant.
- the aperture structure (12e) may also be attached directly to the substrate layer (24e).
- An exemplary embodiment of such an imaging system is illustrated in FIG. 7.
- the top aperture (12e) has an aperture body (36) with width d ap ,top that sets the entrance aperture of the system, has an aperture offset from the substrate by a distance (tap), and that is angled with a minimum angle set by the half field of view of the imaging system to a width of the aperture after a distance along the optical axis set by (tap) is set by the width of the metasurface layer and is given by (d ap , bottom).
- the metasurface layer (14e) is disposed on a surface of the substrate (24e) distal from the image sensor (16e)
- the metasurface layer may also be disposed on the surface (34”) of the substrate proximal to the image sensor.
- the exemplary embodiment incorporates a spacer structure (30”) and airgap between the substrate (24e) and image sensor (16e)
- embodiments may omit this element and mount the substrate directly atop the image sensor.
- An attribute of embodiments of such telecentric designs is that the metasurface imaging system provides a more uniform illumination at the image sensor (referred to by those in the art as “relative illumination”).
- relative illumination A data plot of relative illumination for an exemplary system according to embodiments is provided in FIG. 8A, and demonstrates that relative illumination for the aperture/metasurface imaging system is maintained at 100% across the entire field of view, which is a substantial improvement over conventional systems, which can have a difference between center and edge of 50% or more. Accordingly, embodiments of imaging systems are able to collect more total illumination across the full field of view.
- Embodiments of the metasurface system also provide an additional design variation with respect to traditional refractive lens systems.
- CMOS image sensors require a microlens to be associated with each pixel. Because there is a large variation in CRA across a given sensor plane that is inherent to refractive optical systems, the microlens array on the CIS also requires a complex CRA specification. However, in embodiments of metasurface systems as described herein, the CRA of the microlens array may be configured to be a constant 0 degrees across the CIS allowing for greater simplicity in the design and fabrication of the microlens array. Alternatively, in certain implementations the microlens array may be completely removed from the CIS, saving a process step in CIS production.
- aperture metasurface systems with 0 CRA allow one to limit a persistent problem in traditional imaging systems known by those in the art as“pixel crosstalk”.
- Traditional refractive systems that send light into the image sensor are prone to light coupling into neighboring pixels, which adds noise to the system.
- FIG. 8B provides a data plot illustrating distortion as a function of field at the CMOS image sensor for an imaging system based on the embodiment shown in FIG. 1 .
- FIG. 8B provides a data plot illustrating distortion as a function of field at the CMOS image sensor for an imaging system based on the embodiment shown in FIG. 1 .
- FIG. 8C shows a plot of the modulus transfer function over the field of view for an embodiment of an imaging system as shown in FIG. 1.
- FIG. 8D provides a standard test image illustrating the grid distortion for an imaging system based on the embodiment shown in FIGs. 8A to 8C. As shown, at the edge of the field of view the quality drops off.
- embodiments of the invention show that all of the wavelengths of light are tightly bundled indicating that the distortion can be corrected simply using known image processing software.
- FIG. 9 provides a schematic illustration of an implementation of various embodiments of such hybrid refractive lens/metasurface imaging systems.
- the hybrid imaging surface consists of at least one of each of the following: a refractive lens with one or more surface of curvature and a metasurface layer on a substrate where all of the elements comprising the metasurface are the same height.
- the hybrid optical system may be comprised of any number of refractive elements and multiple metasurface layers.
- FIG. 9 An exemplary embodiment of a hybrid refractive element/metasurface imaging system is illustrated in FIG. 9.
- the system includes at least one refractive optic (38) disposed a set distance away from a substrate layer (40) transparent at the wavelength of interest and having a thickness (tsub) having a metasurface layer (42) composed of nanostructures (44) with equal height disposed on a first surface (45) thereof that is distal to the image sensor (46), and an optional optical filter (48) disposed on a second side (47) of the substrate proximal to the imager.
- a dielectric material with an index of refraction lower than that of the constituent image sensor material may be deposited and planarized such that a single metasurface can be patterned on top of the dielectric material.
- each image sensor in the array has a unique metasurface patterned on its facet.
- the combined system may be optimized to achieve a desired performance.
- integration of a metasurface with an image sensor array may be accomplished using wafer level optics processes.
- the spacer layer may be air rather than a solid dielectric, illustrations of exemplary embodiments of such devices are shown in FIGs. 13 and 14.
- FIG. 14 illustrates and exemplary embodiment that excludes a spacer.
- the thickness of the lens die (84) determines the distance between the image sensor active area (86) and the metasurface area (88).
- the image sensor die (90) and lens die (84) can be directly attached, using adhesive, solder, fusion bond, bump bond, etc. Alternatively the image sensor wafer and lens wafer can be attached directly at the wafer level as previously described.
- the refractive lenses (91 ) of hybrid systems may first be assembled in a lens barrel (92), as is already known in the art.
- the metasurface element (94) can then be combined with the CMOS image sensor element (96) as described above with respect to FIGs. 13 and 14, above. These two sub components are then assembled together to form the final system.
- the refractive lenses may be configured to thread into a housing (98) such that the distance between the refractive elements and metasurface (t gap ) may be adjusted.
- the metasurface lens element may be formed in a rectangular configuration.
- Advantages of such rectangular or not circular lenses include: limiting the total area of the lens, eliminating portions of the lens that would otherwise have light impinge upon it that does not subsequently form an image on the image sensor, and simplifying post processing of lens wafers.
- Particular embodiments of rectangular metasurface lenses and the imaging systems are described here.
- metasurface lens systems having non-circular configurations have the following commonalities: an entrance aperture which is the stop of the lens system and a metasurface lens which is the final, active optical surface before the image sensor plane.
- the entrance aperture (and optical stop) can be circular in cross-section, as it would be in a traditional optical system, while the metasurface lens can be patterned as a rectangle or other arbitrary shape.
- FIG. 16 provides an illustration of an exemplary embodiment of a clear aperture metasurface, where the imaging system (100) is comprised of a rectangular image sensor (102) offset from a single rectangular metasurface (104), and a circular entrance aperture (106) offset from the rectangular metasurface lens (104).
- the optical systems are comprised of an entrance aperture, at least one refractive lens and a metasurface lens which is the last optical lens element in the system before the image sensor.
- the entrance aperture and the at least one refractive lens can still have a circular or radially symmetric cross section.
- embodiments of such hybrid systems would be comprised of a circular aperture (106) offset from at least one circular refractive lens (not shown) which is then offset from the rectangular metasurface lens (104), as shown in FIG. 16.
- the metasurface lens has rectangular dimensions which are configured to match a specific image sensor.
- the entrance aperture (and stop of the optical system) could also be rectangular or the at least one refractive lens could also be rectangular as long as at least the metasurface lens element, which is the last lens element before the image sensor, has a rectangular cross section.
- the dimensions of the rectangular lens in the system can be fully characterized by the dimensions of the image sensor in the system and the specifications of the lens.
- an image sensor is characterized by its vertical and horizontal dimensions, v and h, respectively.
- N f/D
- Such definitions of the lens dimensions will result in an image that almost perfectly fills the sensor geometry.
- This oversizing of the image allows for greater tolerance in the final assembly of the lens system.
- a typical oversizing range may be to take the nominal rectangular lens dimension, as given above, and increase each dimension by 40 microns.
- FIGs. 18A to 18B An example of such a system is shown in FIGs. 18A to 18B.
- Fig. 18A shows a single image sensor die (1 10) around which a single spacer (1 12) can be placed as shown in FIG. 18B.
- the spacer sets the distance between the rectangular metasurfaces (1 14), shown in FIG. 18C and the image sensor (1 10).
- the last element in the assembly contains a set of circular apertures (1 16) disposed in association with an additional spacing layer (1 18) to set the distance between the rectangular metasurface and the circular aperture.
- a cut away of the full assembly is shown in FIG. 18D.
- FIGs. 18A to FIG. 18D exemplify a 2x2 array of circular apertures over a rectangular metasurface
- the grid of circular apertures and rectangular metasurface lenses may be arrayed in any fashion, either symmetric or asymmetric, e.g., 3x3 or 5x2.
- each individual rectangular metasurface and circular aperture comprising the system may have unique dimensions relative to the other aperture metasurface pairs in the system.
- each aperture diameter in the array can generally be unique or each rectangular lens may be unique. Flowever, the distance between the metasurface lens and the image sensor and the metasurface lens and the circular apertures is generally fixed for the entire system.
- each sub camera can have a unique f/#, field-of-view, resolution, etc.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Optics & Photonics (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Signal Processing (AREA)
- Multimedia (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Lenses (AREA)
- Optical Filters (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP20847649.9A EP4004608A4 (en) | 2019-07-26 | 2020-07-24 | Aperture-metasurface and hybrid refractive-metasurface imaging systems |
KR1020227006332A KR20220035971A (en) | 2019-07-26 | 2020-07-24 | Aperture-Metasurface and Hybrid Refractive-Metasurface Imaging Systems |
JP2022505416A JP2022542172A (en) | 2019-07-26 | 2020-07-24 | Aperture Metasurface and Hybrid Refractive Metasurface Imaging Systems |
CN202080060755.4A CN114286953A (en) | 2019-07-26 | 2020-07-24 | Aperture-super surface and hybrid refraction-super surface imaging system |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201962878962P | 2019-07-26 | 2019-07-26 | |
US62/878,962 | 2019-07-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2021021671A1 true WO2021021671A1 (en) | 2021-02-04 |
Family
ID=74190695
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2020/043600 WO2021021671A1 (en) | 2019-07-26 | 2020-07-24 | Aperture-metasurface and hybrid refractive-metasurface imaging systems |
Country Status (6)
Country | Link |
---|---|
US (3) | US11978752B2 (en) |
EP (1) | EP4004608A4 (en) |
JP (1) | JP2022542172A (en) |
KR (1) | KR20220035971A (en) |
CN (1) | CN114286953A (en) |
WO (1) | WO2021021671A1 (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2023283270A1 (en) * | 2021-07-07 | 2023-01-12 | Qualcomm Incorporated | Meta-lens systems and techniques |
US11579456B2 (en) | 2017-08-31 | 2023-02-14 | Metalenz, Inc. | Transmissive metasurface lens integration |
WO2023179152A1 (en) * | 2022-03-24 | 2023-09-28 | 深圳迈塔兰斯科技有限公司 | Optical system design method and apparatus |
US11927769B2 (en) | 2022-03-31 | 2024-03-12 | Metalenz, Inc. | Polarization sorting metasurface microlens array device |
US11978752B2 (en) | 2019-07-26 | 2024-05-07 | Metalenz, Inc. | Aperture-metasurface and hybrid refractive-metasurface imaging systems |
EP4300939A4 (en) * | 2021-04-07 | 2024-08-21 | Samsung Electronics Co Ltd | Camera comprising meta lens and wearable electronic device comprising same camera |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US12050327B2 (en) * | 2019-06-04 | 2024-07-30 | Applied Materials, Inc. | Imaging system and method of manufacturing a metalens array |
US10979635B2 (en) * | 2019-08-08 | 2021-04-13 | Massachusetts Institute Of Technology | Ultra-wide field-of-view flat optics |
KR20220104507A (en) | 2021-01-18 | 2022-07-26 | 삼성전자주식회사 | Camera with metalens and electronic device including the same |
JP2024506062A (en) * | 2021-02-10 | 2024-02-08 | スリーエム イノベイティブ プロパティズ カンパニー | Sensor assembly with optical metasurface film |
US20220382064A1 (en) * | 2021-06-01 | 2022-12-01 | Microsoft Technology Licensing, Llc | Metalens for use in an eye-tracking system of a mixed-reality display device |
JP2024528908A (en) * | 2021-07-27 | 2024-08-01 | 株式会社メニコン | Systems and methods for forming ophthalmic lenses including metaoptics - Patents.com |
WO2023057458A1 (en) * | 2021-10-06 | 2023-04-13 | Nil Technology Aps | Image capture and light projection using at least one lens unit having a telecentric image plane or a telecentric object plane |
US20230133988A1 (en) * | 2021-10-29 | 2023-05-04 | L3Harris Technologies, Inc. | Apparatus and method for a vision system having a transparent display and a diffractive, planar lens |
CN113820839A (en) * | 2021-11-24 | 2021-12-21 | 深圳迈塔兰斯科技有限公司 | Telecentric lens |
WO2023130087A1 (en) * | 2021-12-30 | 2023-07-06 | Metalenz, Inc. | Optical module including metasurface chip and methods of manfuacturing thereof |
CN114545370A (en) * | 2022-02-25 | 2022-05-27 | 深圳迈塔兰斯科技有限公司 | Laser radar transmitting system and corresponding receiving system thereof |
CN114488525B (en) * | 2022-04-15 | 2022-08-23 | 中国科学院光电技术研究所 | Super-structure surface imaging system, design method and detector |
WO2024015012A1 (en) * | 2022-07-12 | 2024-01-18 | Agency For Science, Technology And Research | Optical system and method of forming the same, method of forming a multi-color image |
CN114994813B (en) * | 2022-07-15 | 2024-01-30 | 南京大学 | On-chip transflective superlens, design method and 4f optical system with transflective dual channels |
WO2024033505A1 (en) * | 2022-08-11 | 2024-02-15 | Nil Technology Aps | Optical devices that include a protected lens |
CN115327678A (en) * | 2022-09-01 | 2022-11-11 | 天津山河光电科技有限公司 | Bidirectional optical path system, optical module and optical equipment |
US20240125591A1 (en) * | 2022-10-12 | 2024-04-18 | 2Pi Inc. | Wide field-of-view metasurface optics, sensors, cameras and projectors |
WO2024117969A1 (en) * | 2022-12-02 | 2024-06-06 | Advanced Micro Foundry Pte. Ltd. | Optical beam receiver assembly |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008020899A2 (en) | 2006-04-17 | 2008-02-21 | Cdm Optics, Inc. | Arrayed imaging systems and associated methods |
EP2631740A2 (en) | 2012-02-22 | 2013-08-28 | Ming Fong | System for reproducing virtual objects |
US9482796B2 (en) * | 2014-02-04 | 2016-11-01 | California Institute Of Technology | Controllable planar optical focusing system |
US20170310907A1 (en) | 2016-04-20 | 2017-10-26 | Microsoft Technology Licensing, Llc | Flat lens imaging devices and systems |
US20180045953A1 (en) * | 2016-04-29 | 2018-02-15 | The Board Of Trustees Of The Leland Stanford Junior University | Device components formed of geometric structures |
WO2018204856A1 (en) | 2017-05-04 | 2018-11-08 | President And Fellows Of Harvard College | Meta-lens doublet for aberration correction |
US20190044003A1 (en) | 2018-03-21 | 2019-02-07 | Intel Corporation | Optical receiver employing a metasurface collection lens |
US20190064532A1 (en) * | 2017-08-31 | 2019-02-28 | Metalenz, Inc. | Transmissive Metasurface Lens Integration |
US20190086579A1 (en) * | 2017-09-21 | 2019-03-21 | Samsung Electronics Co., Ltd. | Meta-surface optical element and method of manufacturing the same |
Family Cites Families (605)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3877034A (en) | 1973-12-06 | 1975-04-08 | Trw Inc | Artificial dielectric structure and its method of fabrication |
DE3689606T2 (en) | 1985-10-22 | 1994-05-19 | Kuraray Co | Manufacturing method for composite pattern refraction type phase gratings. |
US4856899A (en) | 1985-12-20 | 1989-08-15 | Yokogawa Electric Corporation | Optical frequency analyzer using a local oscillator heterodyne detection of incident light |
US5085496A (en) | 1989-03-31 | 1992-02-04 | Sharp Kabushiki Kaisha | Optical element and optical pickup device comprising it |
US5337146A (en) | 1992-03-30 | 1994-08-09 | University Of New Orleans | Diffraction-grating photopolarimeters and spectrophotopolarimeters |
US5452126A (en) | 1993-11-10 | 1995-09-19 | The United States Of America As Represented By The Secretary Of The Army | Lightweight binocular telescope |
JPH07182709A (en) | 1993-11-15 | 1995-07-21 | Minnesota Mining & Mfg Co <3M> | Magneto-optical recording medium |
EP0959051A4 (en) | 1996-08-13 | 1999-12-15 | Nippon Sheet Glass Co Ltd | Laser machining method for glass substrate, diffraction type optical device fabricated by the machining method, and method of manufacturing optical device |
US6669803B1 (en) | 1997-10-03 | 2003-12-30 | Digital Optics Corp. | Simultaneous provision of controlled height bonding material at a wafer level and associated structures |
US6437925B1 (en) | 1998-06-30 | 2002-08-20 | Olympus Optical Co., Ltd. | Optical apparatus |
US6097856A (en) | 1998-07-10 | 2000-08-01 | Welch Allyn, Inc. | Apparatus and method for reducing imaging errors in imaging systems having an extended depth of field |
EP1153280A2 (en) | 1999-01-25 | 2001-11-14 | Newton Laboratories, Inc. | Imaging of tissue using polarized light |
HUP0000518D0 (en) | 2000-02-04 | 2000-04-28 | Method of placing data signals onto a carrier; method and apparatus for the holographic recording and read-out of data | |
US6834027B1 (en) | 2000-02-28 | 2004-12-21 | Nec Laboratories America, Inc. | Surface plasmon-enhanced read/write heads for optical data storage media |
US7039289B1 (en) | 2000-05-19 | 2006-05-02 | Optinetrics, Inc. | Integrated optic devices and processes for the fabrication of integrated optic devices |
US6731839B2 (en) | 2000-07-31 | 2004-05-04 | Corning Incorporated | Bulk internal Bragg gratings and optical devices |
US20020048727A1 (en) | 2000-10-20 | 2002-04-25 | Yan Zhou | Method for forming a refractive-index-patterned film for use in optical device manufacturing |
RU2179336C1 (en) | 2000-12-26 | 2002-02-10 | Общество С Ограниченной Ответственностью "Инсмат Технология" | Method and device for shaping optical image in incoherent light (alternatives) |
US7450618B2 (en) | 2001-01-30 | 2008-11-11 | Board Of Trustees Operating Michigan State University | Laser system using ultrashort laser pulses |
US6813056B2 (en) | 2001-02-28 | 2004-11-02 | Teracomm Research Inc. | High amplitude fast optical modulator |
EP1251397A3 (en) | 2001-03-27 | 2005-07-27 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Production of photoimaged structures with a phase shift of transmitted light portions |
AU2002319840A1 (en) | 2001-07-26 | 2003-02-17 | Koninklijke Philips Electronics N.V. | Opto-acoustic apparatus with optical heterodyning for measuring solid surfaces and thin films |
US7057151B2 (en) | 2001-08-31 | 2006-06-06 | Universite Louis Pasteur | Optical transmission apparatus with directionality and divergence control |
US20030107787A1 (en) | 2001-09-26 | 2003-06-12 | Arkady Bablumyan | Planar and fiber optical apodized diffraction structures fabrication |
US6927922B2 (en) | 2001-12-18 | 2005-08-09 | The University Of Rochester | Imaging using a multifocal aspheric lens to obtain extended depth of field |
ITMI20020405A1 (en) | 2002-02-28 | 2003-08-28 | Infm | SILICA AND POND DIOXIDE-BASED GLASS CERAMIC MATERIAL PARTICULARLY FOR OPTICAL APPLICATIONS AND RELATED PROCEDURE FOR REALIZATIONS |
US7312432B2 (en) | 2002-07-08 | 2007-12-25 | Dmetrix, Inc. | Single axis illumination for multi-axis imaging system |
AU2003278700A1 (en) | 2002-07-31 | 2004-02-16 | Arryx, Inc. | System and method of sorting materials using holographic laser steering |
US7118676B2 (en) | 2003-09-04 | 2006-10-10 | Arryx, Inc. | Multiple laminar flow-based particle and cellular separation with laser steering |
US7126541B2 (en) | 2002-11-19 | 2006-10-24 | Farrokh Mohamadi | Beam forming phased array system in a transparent substrate |
US7186969B2 (en) | 2003-02-12 | 2007-03-06 | Mitutoyo Corporation | Optical configuration for imaging-type optical encoders |
US7154083B2 (en) | 2003-02-24 | 2006-12-26 | Pentax Corporation | Confocal probe |
US7180673B2 (en) | 2003-03-28 | 2007-02-20 | Cdm Optics, Inc. | Mechanically-adjustable optical phase filters for modifying depth of field, aberration-tolerance, anti-aliasing in optical systems |
CN1768346B (en) | 2003-03-31 | 2010-11-17 | Cdm光学有限公司 | Systems and methods for minimizing aberrating effects in imaging systems |
JP4021443B2 (en) | 2003-05-12 | 2007-12-12 | 富士通株式会社 | Optical device with demultiplexing function |
EP1627526A1 (en) | 2003-05-13 | 2006-02-22 | Xceed Imaging Ltd. | Optical method and system for enhancing image resolution |
US7025501B2 (en) | 2003-06-18 | 2006-04-11 | J. A. Woollam Co., Inc | Tracking temperature change in birefringent materials |
JP4222141B2 (en) | 2003-07-25 | 2009-02-12 | 沖電気工業株式会社 | Manufacturing method and manufacturing apparatus for superstructure fiber Bragg grating |
US8351048B2 (en) | 2003-08-28 | 2013-01-08 | 4D Technology Corporation | Linear-carrier phase-mask interferometer |
WO2005036211A2 (en) | 2003-10-17 | 2005-04-21 | Explay Ltd. | Optical system and method for use in projection systems |
TWI335417B (en) | 2003-10-27 | 2011-01-01 | Zygo Corp | Method and apparatus for thin film measurement |
WO2005057247A2 (en) | 2003-12-05 | 2005-06-23 | University Of Pittsburgh | Metallic nano-optic lenses and beam shaping devices |
US20050211665A1 (en) | 2004-03-26 | 2005-09-29 | Sharp Laboratories Of America, Inc. | Methods of forming a microlens array |
JP4073886B2 (en) | 2004-03-30 | 2008-04-09 | アンリツ株式会社 | Variable wavelength light source |
US7365917B2 (en) | 2004-08-16 | 2008-04-29 | Xceed Imaging Ltd. | Optical method and system for extended depth of focus |
US7061693B2 (en) | 2004-08-16 | 2006-06-13 | Xceed Imaging Ltd. | Optical method and system for extended depth of focus |
US7061612B2 (en) | 2004-09-28 | 2006-06-13 | Osram Sylvania Inc. | LED Polarimeter |
US7561264B2 (en) | 2005-02-09 | 2009-07-14 | Chemimage Corporation | System and method for the coincident deposition, detection and identification of threat agents |
EP1854160B1 (en) | 2005-02-10 | 2017-06-21 | Yeda Research And Development Co., Ltd. | Redox-active structures and devices utilizing the same |
US7390746B2 (en) | 2005-03-15 | 2008-06-24 | Micron Technology, Inc. | Multiple deposition for integration of spacers in pitch multiplication process |
JP2006276373A (en) | 2005-03-29 | 2006-10-12 | Sony Corp | Hologram recording device and phase mask |
US20120258407A1 (en) | 2005-04-12 | 2012-10-11 | Sirat Gabriel Y | Multifield incoherent Lithography, Nomarski Lithography and multifield incoherent Imaging |
US7344928B2 (en) | 2005-07-28 | 2008-03-18 | Palo Alto Research Center Incorporated | Patterned-print thin-film transistors with top gate geometry |
JP4379402B2 (en) | 2005-09-16 | 2009-12-09 | ソニー株式会社 | Hologram recording / reproducing apparatus and optical apparatus for recording / reproducing |
EP1934945A4 (en) | 2005-10-11 | 2016-01-20 | Apple Inc | Method and system for object reconstruction |
US20070139792A1 (en) | 2005-12-21 | 2007-06-21 | Michel Sayag | Adjustable apodized lens aperture |
DE102006018928A1 (en) | 2006-04-24 | 2007-11-08 | Carl Zeiss Smt Ag | Projection exposure system and use thereof |
WO2007141788A2 (en) | 2006-06-06 | 2007-12-13 | Xceed Imaging Ltd. | Optical system and method for multi-range and dual-range imaging |
US8169703B1 (en) | 2006-09-06 | 2012-05-01 | Lightsmyth Technologies Inc. | Monolithic arrays of diffraction gratings |
JP4466632B2 (en) | 2006-10-03 | 2010-05-26 | ソニー株式会社 | Recording device, phase modulation device |
US7773307B2 (en) | 2006-12-12 | 2010-08-10 | Northrop Grumman Space & Mission Systems Corporation | Phase mask with continuous azimuthal variation for a coronagraph imaging system |
US7928900B2 (en) | 2006-12-15 | 2011-04-19 | Alliant Techsystems Inc. | Resolution antenna array using metamaterials |
US7646549B2 (en) | 2006-12-18 | 2010-01-12 | Xceed Imaging Ltd | Imaging system and method for providing extended depth of focus, range extraction and super resolved imaging |
CN101241173B (en) | 2007-02-07 | 2011-08-24 | 南京理工大学 | Infrared stereoscopic vision thermal image method and its system |
US8174696B2 (en) | 2007-03-22 | 2012-05-08 | Universite De Strasbourg | Device for sorting and concentrating electromagnetic energy and apparatus comprising at least one such device |
KR20080099452A (en) | 2007-05-09 | 2008-11-13 | 주식회사 대우일렉트로닉스 | Apparatus for processing optical information, method of reading optical information and method of recording optical information |
KR20080103149A (en) | 2007-05-23 | 2008-11-27 | 주식회사 대우일렉트로닉스 | Apparatus for recording optical information and method for recording optical information |
JP5144127B2 (en) | 2007-05-23 | 2013-02-13 | キヤノン株式会社 | Method for producing mold for nanoimprint |
KR20090002583A (en) | 2007-07-02 | 2009-01-09 | 주식회사 대우일렉트로닉스 | Gray ton mask, method for manufacturing of gray ton mask, method for manufacturing of phase mask using gray ton mask, phase mask of manufactured for gray ton mask and manufactured phase mask using gray ton mask |
WO2009012789A1 (en) | 2007-07-20 | 2009-01-29 | Medizinische Universität Innsbruck | Optical device with a pair of diffractive optical elements |
US8328396B2 (en) | 2007-11-19 | 2012-12-11 | President And Fellows Of Harvard College | Methods and apparatus for improving collimation of radiation beams |
CN100510783C (en) | 2007-11-20 | 2009-07-08 | 中国科学院光电技术研究所 | Metal film lens containing nano-slits |
WO2009071546A1 (en) | 2007-12-03 | 2009-06-11 | Seereal Technologies S.A. | Illumination unit comprising an optical wave guide and an imaging means |
DE102007058558A1 (en) | 2007-12-05 | 2009-06-25 | Carl Zeiss Microimaging Gmbh | Phase contrast microscope for analyzing sample, has optical unit producing reproduction beam path from light, and optical element connected with control circuit for changing phase of light during observation of sample |
CN100476504C (en) | 2007-12-07 | 2009-04-08 | 浙江大学 | Phase mask plate and imaging system using the same |
RU2367986C1 (en) | 2008-02-18 | 2009-09-20 | Корпорация "САМСУНГ ЭЛЕКТРОНИКС Ко., Лтд." | Lens with invariant modulation transfer function (mpf) |
CA2645794A1 (en) | 2008-03-14 | 2009-09-14 | The University Of Toronto Governing Council | Metallic screens for sub-wavelength focusing of electromagnetic waves |
WO2009115108A1 (en) | 2008-03-19 | 2009-09-24 | Ruprecht-Karls-Universität Heidelberg | A method and an apparatus for localization of single dye molecules in the fluorescent microscopy |
US8472797B2 (en) | 2008-03-24 | 2013-06-25 | Samsung Electronics Co., Ltd. | Image capturing lens system |
KR101550478B1 (en) | 2008-04-02 | 2015-09-04 | 오블롱 인더스트리즈, 인크 | Gesture based control using three-dimensional information extracted over an extended depth of filed |
FI20085304A0 (en) | 2008-04-11 | 2008-04-11 | Polar Electro Oy | Resonator structure in compact radio equipment |
US8401332B2 (en) | 2008-04-24 | 2013-03-19 | Old Dominion University Research Foundation | Optical pattern recognition technique |
WO2009155098A2 (en) | 2008-05-30 | 2009-12-23 | The Penn State Research Foundation | Flat transformational electromagnetic lenses |
US9116302B2 (en) | 2008-06-19 | 2015-08-25 | Ravenbrick Llc | Optical metapolarizer device |
EP2141519A1 (en) | 2008-07-04 | 2010-01-06 | Université Jean-Monnet | Diffractive polarizing mirror device |
US8318386B2 (en) | 2008-08-07 | 2012-11-27 | Rolith Inc. | Fabrication of nanostructured devices |
US20100033701A1 (en) | 2008-08-08 | 2010-02-11 | Hyesog Lee | Superlens and lithography systems and methods using same |
WO2010017694A1 (en) | 2008-08-15 | 2010-02-18 | 北京泰邦天地科技有限公司 | Device for acquiring equally blurred intermediate images |
EP2338114B1 (en) | 2008-09-03 | 2017-03-15 | Oblong Industries, Inc. | Control system for navigating a principal dimension of a data space |
US8264637B2 (en) | 2008-10-10 | 2012-09-11 | Samsung Electronics Co., Ltd. | Photonic crystal optical filter, reflective color filter, display apparatus using the reflective color filter, and method of manufacturing the reflective color filter |
FR2937791B1 (en) | 2008-10-24 | 2010-11-26 | Thales Sa | POLARIMETRIC IMAGING DEVICE OPTIMIZED IN RELATION TO THE POLARIZATION CONTRAST |
EP2411838B1 (en) | 2009-03-25 | 2013-10-02 | Koninklijke Philips N.V. | Method to optimize the light extraction from scintillator crystals in a solid-state detector |
CN101510011B (en) | 2009-03-26 | 2010-09-01 | 浙江大学 | Composite phase mask plate |
CN101510012B (en) | 2009-03-26 | 2010-08-11 | 浙江大学 | Composite phase mask plate |
CN101510013B (en) | 2009-03-30 | 2010-06-23 | 浙江大学 | Composite phase mask plate |
US8816460B2 (en) | 2009-04-06 | 2014-08-26 | Nokia Corporation | Image sensor |
US9316916B2 (en) | 2009-04-07 | 2016-04-19 | Globalfounries Inc. | Method to mitigate resist pattern critical dimension variation in a double-exposure process |
ES2346175B1 (en) | 2009-04-08 | 2011-09-30 | Consejo Superior De Investigaciones Científicas (Csic) | INSTRUMENT FOR THE SIMULATION OF MULTIFOCAL OPHTHALM CORRECTIONS. |
US8456620B2 (en) | 2009-07-24 | 2013-06-04 | Empire Technology Development Llc | Enabling spectrometry on IR sensors using metamaterials |
DE102009037629B4 (en) | 2009-08-14 | 2012-12-06 | Friedrich-Schiller-Universität Jena | Pixelated, diffractive optical element with two height levels for generating a phase distribution with any phase shift |
TWI525346B (en) | 2009-09-01 | 2016-03-11 | 財團法人工業技術研究院 | Optical imaging systems and optical systems with extended depth of focus |
US9310535B1 (en) | 2009-09-03 | 2016-04-12 | Lightsmyth Technologies Inc. | Thermally compensated optical diffraction gratings |
US8152307B2 (en) | 2009-12-21 | 2012-04-10 | Microvision, Inc. | Diffractive optical element having periodically repeating phase mask and system for reducing perceived speckle |
WO2011100070A1 (en) | 2010-02-12 | 2011-08-18 | The Regents Of The University Of California | Metamaterial-based optical lenses |
WO2011106553A2 (en) | 2010-02-24 | 2011-09-01 | The Regents Of The University Of California | Planar, low loss transmitting or reflecting lenses using sub-wavelength high contrast grating |
TWI421618B (en) | 2010-04-09 | 2014-01-01 | Ind Tech Res Inst | Projection system for extending depth of field and image processing method thereof |
GB201006944D0 (en) | 2010-04-26 | 2010-06-09 | Univ Southampton | Spectral filter |
TWI524752B (en) | 2010-05-03 | 2016-03-01 | 量宏科技股份有限公司 | Devices and methods for high-resolution image and video capture |
US8558873B2 (en) | 2010-06-16 | 2013-10-15 | Microsoft Corporation | Use of wavefront coding to create a depth image |
US8189179B2 (en) | 2010-07-09 | 2012-05-29 | Raytheon Company | System and method for hyperspectral and polarimetric imaging |
US9212899B2 (en) | 2010-09-15 | 2015-12-15 | Ascentia Imaging, Inc. | Imaging, fabrication and measurement systems and methods |
US8351120B2 (en) | 2010-09-15 | 2013-01-08 | Visera Technologies Company Limited | Optical device having extented depth of field and fabrication method thereof |
US8138097B1 (en) | 2010-09-20 | 2012-03-20 | Kabushiki Kaisha Toshiba | Method for processing semiconductor structure and device based on the same |
US8760517B2 (en) | 2010-09-27 | 2014-06-24 | Apple Inc. | Polarized images for security |
US8687040B2 (en) | 2010-11-01 | 2014-04-01 | Omnivision Technologies, Inc. | Optical device with electrically variable extended depth of field |
TWI547683B (en) | 2010-12-06 | 2016-09-01 | Univ Nat Central | Multi-wavelength optical measurement method for thin film elements |
EP2479546B1 (en) | 2011-01-19 | 2013-08-21 | Howard Hughes Medical Institute | Wavefront correction of light beam |
WO2012122677A1 (en) | 2011-03-17 | 2012-09-20 | Chen Chih-Hsiao | Speckle reducing device for laser projection system and speckle reducing method using the same |
WO2012139634A1 (en) | 2011-04-12 | 2012-10-18 | Barco N.V. | Laser projector with reduced speckle |
EP2698871B1 (en) | 2011-04-12 | 2017-07-26 | Kuang-Chi Innovative Technology Ltd. | Metamaterial capable of deflecting electromagnetic waves |
CN102480008B (en) | 2011-04-14 | 2013-06-12 | 深圳光启高等理工研究院 | Metamaterial for converging electromagnetic waves |
CN103547956B (en) | 2011-04-20 | 2016-06-15 | 惠普发展公司,有限责任合伙企业 | Based on the optical element of sub-wave length grating |
US8912973B2 (en) | 2011-05-04 | 2014-12-16 | The Penn State Research Foundation | Anisotropic metamaterial gain-enhancing lens for antenna applications |
GB2490895B (en) | 2011-05-16 | 2013-07-31 | Univ Southampton | Nonlinear materials and related devices |
US20170329201A1 (en) | 2011-05-24 | 2017-11-16 | Craig B. Arnold | Tunable acoustic gradient index of refraction lens and system |
US9829700B2 (en) | 2011-06-09 | 2017-11-28 | Universite Laval | Imaging system for producing an image having at least one distorted zone |
GB201110025D0 (en) | 2011-06-15 | 2011-07-27 | Datalase Ltd | Radiation tracking apparatus |
JP5723243B2 (en) | 2011-08-11 | 2015-05-27 | 東京エレクトロン株式会社 | Film forming method, semiconductor device manufacturing method including the same, film forming apparatus, and semiconductor device |
JP2013044800A (en) | 2011-08-22 | 2013-03-04 | Sony Corp | Illumination device and display device |
WO2013033591A1 (en) | 2011-08-31 | 2013-03-07 | President And Fellows Of Harvard College | Amplitude, phase and polarization plate for photonics |
US9197881B2 (en) | 2011-09-07 | 2015-11-24 | Intel Corporation | System and method for projection and binarization of coded light patterns |
WO2013048135A2 (en) | 2011-09-27 | 2013-04-04 | 주식회사 엘지화학 | Transparent conductive substrate and method for manufacturing same |
DE102011118697B4 (en) | 2011-11-16 | 2016-09-08 | Carl Zeiss Optronics Gmbh | Image capture system |
US9411103B2 (en) | 2011-11-22 | 2016-08-09 | The University Of North Carolina At Charlotte | Contact focusing hollow-core fiber microprobes |
US9518864B2 (en) | 2011-12-15 | 2016-12-13 | Facebook, Inc. | Controllable optical sensing |
US9298060B2 (en) | 2011-12-20 | 2016-03-29 | Washington University | Imaging using metamaterials |
US8743923B2 (en) | 2012-01-31 | 2014-06-03 | Flir Systems Inc. | Multi-wavelength VCSEL array to reduce speckle |
GB201201936D0 (en) | 2012-02-03 | 2012-03-21 | Univ Southampton | Super-oscillatory lens device |
US9007451B2 (en) | 2012-03-08 | 2015-04-14 | University Of Southampton | Super-oscillatory lens apparatus and methods |
EP2639252A1 (en) | 2012-03-14 | 2013-09-18 | Sika Technology AG | Polymeric accelerator for two component epoxy resin |
US8734033B2 (en) | 2012-03-27 | 2014-05-27 | Ppg Industries Ohio, Inc. | Optical mechanism with indexing stage with at least one fixed diameter apodized aperture and method of making same |
WO2013184556A1 (en) | 2012-06-05 | 2013-12-12 | President And Fellows Of Harvard College | Ultra-thin optical coatings and devices and methods of using ultra-thin optical coatings |
US9726874B2 (en) | 2012-06-07 | 2017-08-08 | The University Of North Carolina At Charlotte | Methods and systems for super-resolution optical imaging using high-index of refraction microspheres and microcylinders |
US9367036B2 (en) | 2012-07-03 | 2016-06-14 | Samsung Electronics Co., Ltd. | High speed hologram recording apparatus |
US9885859B2 (en) | 2012-07-05 | 2018-02-06 | Martin Russell Harris | Structured illumination microscopy apparatus and method |
DE102012212753A1 (en) | 2012-07-20 | 2014-01-23 | Carl Zeiss Smt Gmbh | Projection optics for forming object field of optics plane in projection exposure system for microlithography, has blinding unit presetting outer boundary of optics with respect to diaphragm direction that is set parallel to planes |
US9625637B2 (en) | 2012-08-13 | 2017-04-18 | 3M Innovative Properties Company | Diffractive lighting devices with 3-dimensional appearance |
US9703019B2 (en) | 2012-08-28 | 2017-07-11 | President And Fellows Of Harvard College | Adaptive optic and acoustic devices |
CN202854395U (en) | 2012-09-29 | 2013-04-03 | 帝麦克斯(苏州)医疗科技有限公司 | Uniaxial lighting system used for multidimensional imaging system |
US9609190B2 (en) | 2012-10-31 | 2017-03-28 | Invisage Technologies, Inc. | Devices, methods, and systems for expanded-field-of-view image and video capture |
CN104798134B (en) | 2012-11-19 | 2017-06-09 | 日立民用电子株式会社 | Device for optical information recording, optical information recording/reproducing device, light information recording method, optical information recording/reproducing method and optical element |
CN103092049A (en) | 2013-01-16 | 2013-05-08 | 北京工业大学 | All-solid digital holography imaging system capable of reducing speckle noise |
US9353001B2 (en) | 2013-03-14 | 2016-05-31 | Ofs Fitel, Llc | Fiber bragg gratings in carbon-coated optical fibers and techniques for making same |
GB201307936D0 (en) | 2013-05-02 | 2013-06-12 | Optos Plc | Improvements in and relating to ophthalmoscopes |
CN103257441B (en) | 2013-05-13 | 2016-10-26 | 北京工业大学 | A kind of dynamic micro imaging system of incoherent digital holography three-dimensional and method |
WO2014188018A1 (en) * | 2013-05-21 | 2014-11-27 | BLASCO WHYTE, Isabel Lena | Monolithic integration of plenoptic lenses on photosensor substrates |
WO2014189801A1 (en) | 2013-05-22 | 2014-11-27 | Finisar Corporation | Systems and methods of aberration correction in optical systems |
US9726818B1 (en) | 2013-05-30 | 2017-08-08 | Hrl Laboratories, Llc | Multi-wavelength band optical phase and amplitude controller |
WO2015021255A1 (en) | 2013-08-07 | 2015-02-12 | Purdue Research Foundation | Light-source efficiency enhancement using metasurfaces |
WO2015027029A1 (en) | 2013-08-23 | 2015-02-26 | Carl Zeiss X-ray Microscopy, Inc. | Phase contrast imaging using patterned illumination/detector and phase mask |
JP6398164B2 (en) | 2013-09-27 | 2018-10-03 | セイコーエプソン株式会社 | Microlens array substrate manufacturing method, microlens array substrate, electro-optical device, and electronic apparatus |
US10007098B2 (en) | 2013-10-09 | 2018-06-26 | Northrop Grumman Systems Corporation | Optical systems and methods |
CN105814402B (en) | 2013-11-27 | 2018-11-06 | 苏州大学 | The super-resolution micro imaging method and system of continuously adjustable Structured Illumination |
CN105793758A (en) | 2013-12-06 | 2016-07-20 | 3M创新有限公司 | Semi-submersible microscope objective with protective element and use of the same in multiphoton imaging method |
WO2015095068A1 (en) | 2013-12-16 | 2015-06-25 | The Texas A&M University System | Systems and methods for in-situ formation of nanoparticles and nanofins |
JP6228300B2 (en) | 2013-12-24 | 2017-11-08 | ライトロ, インコーポレイテッドLytro, Inc. | Improving the resolution of plenoptic cameras |
US9195139B2 (en) | 2013-12-30 | 2015-11-24 | Periodic Structures, Inc. | Apparatus and method of direct writing with photons beyond the diffraction limit using two-color resist |
CN105917277B (en) | 2014-01-07 | 2020-04-17 | 视瑞尔技术公司 | Display device for holographic reconstruction |
US9766463B2 (en) | 2014-01-21 | 2017-09-19 | Osterhout Group, Inc. | See-through computer display systems |
US9836122B2 (en) | 2014-01-21 | 2017-12-05 | Osterhout Group, Inc. | Eye glint imaging in see-through computer display systems |
EP3096702B1 (en) | 2014-01-21 | 2019-06-19 | Koninklijke Philips N.V. | Device and method for non-invasive treatment of skin using laser light |
US10311285B2 (en) | 2014-01-22 | 2019-06-04 | Polaris Sensor Technologies, Inc. | Polarization imaging for facial recognition enhancement system and method |
US20170015901A1 (en) | 2014-01-27 | 2017-01-19 | Osram Sylvania Inc. | Ceramic Phosphor Target |
WO2015117115A1 (en) | 2014-02-03 | 2015-08-06 | President And Fellows Of Harvard College | Three-dimensional super-resolution fluorescence imaging using airy beams and other techniques |
US20150234295A1 (en) | 2014-02-20 | 2015-08-20 | Nikon Corporation | Dynamic patterning method that removes phase conflicts and improves pattern fidelity and cdu on a two phase-pixelated digital scanner |
GB2523741A (en) | 2014-02-26 | 2015-09-09 | Medical Wireless Sensing Ltd | Sensor |
US9958707B2 (en) | 2014-03-06 | 2018-05-01 | California Institute Of Technology | Systems and methods for implementing electrically tunable metasurfaces |
CN103869484B (en) | 2014-03-07 | 2016-01-13 | 南开大学 | The defining method of imaging depth in the large imaging depth three-dimensional display system of Optical processing system |
CN203799117U (en) | 2014-03-20 | 2014-08-27 | 中国科学院西安光学精密机械研究所 | Phase mask plate and wavefront coding imaging system capable of adjusting quality of intermediate coding image |
US10440244B2 (en) * | 2014-05-27 | 2019-10-08 | Technion Research & Development Foundation Limited | Near-field imaging devices |
JP6081520B2 (en) | 2014-05-28 | 2017-02-15 | インディアン インスティテュート オブ テクノロジー デリー | Non-interfering phase measurement |
US9825074B2 (en) | 2014-06-10 | 2017-11-21 | Invisage Technologies, Inc. | Layout and operation of pixels for image sensors |
US20170125911A1 (en) | 2014-06-17 | 2017-05-04 | Board Of Regents, The University Of Texas System | Parity-time symmetric metasurfaces and metamaterials |
DE102014213198B4 (en) | 2014-07-08 | 2020-08-06 | Carl Zeiss Ag | Process for the localization of defects on substrates |
US9891393B2 (en) | 2014-07-24 | 2018-02-13 | Empire Technology Development Llc | Imaging through optical fibers for coupling optimization |
WO2016014934A1 (en) | 2014-07-25 | 2016-01-28 | Jae Park | Color image sensor without the color filters |
US9507064B2 (en) | 2014-07-27 | 2016-11-29 | The Board Of Trustees Of The Leland Stanford Junior University | Dielectric metasurface optical elements |
CN106716227B (en) | 2014-07-31 | 2021-12-10 | 伊奎蒂公司 | Image and wave field projection through a diffusing medium |
CN107076884B (en) | 2014-09-15 | 2020-03-13 | 加州理工学院 | Device and method for controlling optical scattering |
US10594166B2 (en) | 2014-09-26 | 2020-03-17 | The Board Of Trustees Of The Leland Stanford Junior University | Planar immersion lens with metasurfaces |
WO2016051325A1 (en) | 2014-09-29 | 2016-04-07 | Glassup S.R.L. | Optical device for augmented reality applications and method for its fabrication |
US10663631B2 (en) | 2014-10-10 | 2020-05-26 | Duke University | Nanopatch antennas and related methods for tailoring the properties of optical materials and metasurfaces |
US9967541B2 (en) | 2014-11-05 | 2018-05-08 | The Regents Of The University Of Colorado, A Body Corporate | 3D imaging, ranging, and/or tracking using active illumination and point spread function engineering |
US10371936B2 (en) | 2014-11-10 | 2019-08-06 | Leo D. Didomenico | Wide angle, broad-band, polarization independent beam steering and concentration of wave energy utilizing electronically controlled soft matter |
CN107209293B (en) | 2014-11-26 | 2021-09-03 | 苏普利亚·杰西瓦尔 | Materials, assemblies and methods for photolithography using extreme ultraviolet radiation, and other applications |
US10795144B2 (en) | 2014-12-06 | 2020-10-06 | Howard Hughes Medical Institute | Microscopy with structured plane illumination and point accumulation for imaging and nanoscale topography |
WO2016140720A2 (en) | 2014-12-10 | 2016-09-09 | President And Fellows Of Harvard College | Achromatic metasurface optical components by dispersive phase compensation |
US9778404B2 (en) | 2015-02-10 | 2017-10-03 | University Of Central Florida Research Foundation, Inc. | Achromatic holographic phase masks, methods, and applications |
US9553423B2 (en) | 2015-02-27 | 2017-01-24 | Princeton Optronics Inc. | Miniature structured light illuminator |
US20180066991A1 (en) | 2015-03-12 | 2018-03-08 | President And Fellows Of Harvard College | Polarization-selective scattering antenna arrays based polarimeter |
US10084239B2 (en) | 2015-03-16 | 2018-09-25 | Vadum, Inc. | RF diffractive element with dynamically writable sub-wavelength pattern spatial definition |
US9995930B2 (en) | 2015-04-08 | 2018-06-12 | Samsung Electronics Co., Ltd. | Focusing device comprising a plurality of scatterers and beam scanner and scope device |
CN204719330U (en) | 2015-04-09 | 2015-10-21 | 中国科学院西安光学精密机械研究所 | Wavefront coded imaging system |
CN104834089B (en) | 2015-04-09 | 2017-06-27 | 中国科学院西安光学精密机械研究所 | Wavefront coding imaging system and super-resolution processing method |
CN104834088B (en) | 2015-04-09 | 2017-12-05 | 中国科学院西安光学精密机械研究所 | Wavefront coding imaging system and super-resolution processing method based on single image amplification |
US10187626B2 (en) | 2015-04-10 | 2019-01-22 | The Board Of Trustees Of The Leland Stanford Junior University | Apparatuses and methods for three-dimensional imaging of an object |
US10267956B2 (en) | 2015-04-14 | 2019-04-23 | California Institute Of Technology | Multi-wavelength optical dielectric metasurfaces |
WO2016168173A1 (en) | 2015-04-14 | 2016-10-20 | California Institute Of Technology | Multi-wavelength optical dielectric metasurfaces |
KR101704584B1 (en) | 2015-04-16 | 2017-02-22 | 포항공과대학교 산학협력단 | Microscopic apparatus for super-resolution imaging organisms or biomatter and method for super-resolution imaging organisms or biomatter using the same |
WO2016171962A1 (en) | 2015-04-23 | 2016-10-27 | California Institute Of Technology | Conformal optical metasurfaces |
CN104834079B (en) | 2015-04-24 | 2017-04-05 | 中国科学院西安光学精密机械研究所 | Long-focus large-caliber large-F-number telescopic imaging system |
US20160341859A1 (en) | 2015-05-22 | 2016-11-24 | Board Of Regents, The University Of Texas System | Tag with a non-metallic metasurface that converts incident light into elliptically or circularly polarized light regardless of polarization state of the incident light |
WO2016191142A2 (en) | 2015-05-27 | 2016-12-01 | Verily Life Sciences Llc | Nanophotonic hyperspectral/lightfield superpixel imager |
US10338275B1 (en) | 2015-05-27 | 2019-07-02 | Verily Life Sciences Llc | Flexible nanophotonic meta-optics |
WO2016188934A1 (en) | 2015-05-28 | 2016-12-01 | Carl Zeiss Smt Gmbh | Imaging optical unit for imaging an object field into an image field as well as projection exposure system having such an imaging optical unit |
DE102015221985A1 (en) | 2015-11-09 | 2017-05-11 | Carl Zeiss Smt Gmbh | Imaging optics for imaging an object field in an image field and projection exposure apparatus with such an imaging optics |
US10581175B2 (en) | 2015-06-05 | 2020-03-03 | Elwha Llc | Windshield smart reflector systems and methods |
US9835870B2 (en) | 2015-06-05 | 2017-12-05 | Vasily N. Astratov | Super-resolution microscopy methods and systems enhanced by dielectric microspheres or microcylinders used in combination with metallic nanostructures |
US10690826B2 (en) | 2015-06-15 | 2020-06-23 | Magic Leap, Inc. | Virtual and augmented reality systems and methods |
US9391700B1 (en) | 2015-06-16 | 2016-07-12 | Sunlight Photonics Inc. | Integrated optical receiver skin |
US10315951B2 (en) | 2015-06-17 | 2019-06-11 | The Board Of Trustees Of The University Of Illinois | Bowtie nanoantennas and methods of using the same |
CN104932043B (en) | 2015-06-30 | 2017-01-11 | 武汉大学 | Reflective off-axis lens based on metal micro-nanostructure antenna array |
US10317667B2 (en) | 2015-07-04 | 2019-06-11 | The Regents Of The University Of California | Compressive plenoptic microscopy for functional brain imaging |
US10161797B2 (en) * | 2015-07-05 | 2018-12-25 | Purdue Research Foundation | Sub-millimeter real-time circular dichroism spectrometer with metasurfaces |
DE102015212619A1 (en) | 2015-07-06 | 2017-01-12 | Carl Zeiss Smt Gmbh | Imaging optics for imaging an object field in an image field and projection exposure apparatus with such an imaging optics |
US20170235162A1 (en) | 2015-07-13 | 2017-08-17 | Purdue Research Foundation | Time-varying metasurface structure |
US10514296B2 (en) | 2015-07-29 | 2019-12-24 | Samsung Electronics Co., Ltd. | Spectrometer including metasurface |
KR102587061B1 (en) | 2015-07-29 | 2023-10-10 | 삼성전자주식회사 | Spectrometer including metasurface |
US9958251B1 (en) | 2015-08-05 | 2018-05-01 | Ad Technology Corporation | Single snap-shot fringe projection system |
DE102015216342B3 (en) | 2015-08-26 | 2016-12-22 | Laser-Laboratorium Göttingen e.V. | Technique for the production of periodic structures |
US10458846B2 (en) | 2015-08-31 | 2019-10-29 | Hewlett-Packard Development Company, L.P. | Spectral microscope |
US20180259700A1 (en) | 2015-09-02 | 2018-09-13 | President And Fellows Of Harvard College | Broadband dispersion-compensated and chiral meta-holograms |
WO2017044637A1 (en) * | 2015-09-08 | 2017-03-16 | University Of Washington | Low contrast silicon nitride-based metasurfaces |
EP3825738A3 (en) | 2015-09-23 | 2021-08-25 | OSRAM Opto Semiconductors GmbH | Collimating metalenses and technologies incorporating the same |
JP2017062373A (en) | 2015-09-25 | 2017-03-30 | 富士ゼロックス株式会社 | Image reproducing apparatus |
CN106611699A (en) | 2015-10-22 | 2017-05-03 | 中芯国际集成电路制造(上海)有限公司 | A dual composition method and a manufacturing method for a semiconductor device |
US10435814B2 (en) | 2015-10-30 | 2019-10-08 | The Board Of Trustees Of The Leland Stanford Junior University | Single metal crystals |
US11231544B2 (en) | 2015-11-06 | 2022-01-25 | Magic Leap, Inc. | Metasurfaces for redirecting light and methods for fabricating |
US10591643B2 (en) | 2015-11-20 | 2020-03-17 | The Board Of Trustees Of The Leland Stanford Junior University | Light-field imaging using a gradient metasurface optical element |
EP4361312A3 (en) | 2015-11-24 | 2024-07-24 | President And Fellows Of Harvard College | Atomic layer deposition process for fabricating dielectric metasurfaces for wavelengths in the visible spectrum |
US10466494B2 (en) | 2015-12-18 | 2019-11-05 | Nlight, Inc. | Reverse interleaving for laser line generators |
US9992474B2 (en) | 2015-12-26 | 2018-06-05 | Intel Corporation | Stereo depth camera using VCSEL with spatially and temporally interleaved patterns |
WO2017117751A1 (en) | 2016-01-06 | 2017-07-13 | 苏州大学 | Real-time variable-parameter micro-nano optical field modulation system and interference photoetching system |
WO2017176343A2 (en) | 2016-01-22 | 2017-10-12 | California Institute Of Technology | Dispersionless and dispersion-controlled optical dielectric metasurfaces |
US10126466B2 (en) | 2016-01-29 | 2018-11-13 | The Board Of Trustees Of The Leland Stanford Junior University | Spatially multiplexed dielectric metasurface optical elements |
CN105655286A (en) | 2016-02-04 | 2016-06-08 | 上海华虹宏力半导体制造有限公司 | Forming method of semiconductor structure |
US20180035101A1 (en) | 2016-07-29 | 2018-02-01 | Osterhout Group, Inc. | See-through computer display systems |
US10489924B2 (en) | 2016-03-30 | 2019-11-26 | Samsung Electronics Co., Ltd. | Structured light generator and object recognition apparatus including the same |
EP3226042B1 (en) | 2016-03-30 | 2022-05-04 | Samsung Electronics Co., Ltd. | Structured light generator and object recognition apparatus including the same |
CN105676314B (en) | 2016-03-31 | 2018-01-09 | 中国科学院光电技术研究所 | Multi-spectral phase type super-surface device |
US11092717B2 (en) | 2016-04-05 | 2021-08-17 | President And Fellows Of Harvard College | Meta-lenses for sub-wavelength resolution imaging |
KR20180125600A (en) | 2016-04-07 | 2018-11-23 | 매직 립, 인코포레이티드 | Systems and methods for augmented reality |
CN105866981A (en) | 2016-04-20 | 2016-08-17 | 中国科学院光电技术研究所 | Broadband electromagnetic wave phase control method and super-surface sub-wavelength structure |
KR102315190B1 (en) | 2016-04-21 | 2021-10-19 | 배 시스템즈 피엘시 | Display with meta-material coated waveguide |
US9899547B2 (en) | 2016-04-25 | 2018-02-20 | International Business Machines Corporation | Multi-wavelength detector array incorporating two dimensional and one dimensional materials |
WO2017193012A1 (en) * | 2016-05-06 | 2017-11-09 | Magic Leap, Inc. | Metasurfaces with asymetric gratings for redirecting light and methods for fabricating |
CN205620619U (en) | 2016-05-10 | 2016-10-05 | 华南师范大学 | Produce device of gauss's vortex light beam in ending |
KR102357638B1 (en) | 2016-06-02 | 2022-01-28 | 도쿄엘렉트론가부시키가이샤 | Dark Field Wafer Nano Defect Inspection System Using Single Beam |
US20190257984A1 (en) | 2016-06-09 | 2019-08-22 | President And Fellows Of Harvard College | Electrically-stretchable planar optical elements using dielectric elastomer actuators |
CN105974503B (en) | 2016-06-15 | 2018-05-11 | 南开大学 | Terahertz synthetic birefringence device based on cycle chirp grating |
US10901230B2 (en) | 2016-06-21 | 2021-01-26 | Illumina, Inc. | Super-resolution microscopy |
US10609359B2 (en) | 2016-06-22 | 2020-03-31 | Intel Corporation | Depth image provision apparatus and method |
EP3482196B1 (en) | 2016-07-05 | 2022-02-23 | Quantapore, Inc. | Optically based nanopore sequencing |
DE102016212578A1 (en) | 2016-07-11 | 2018-01-11 | Carl Zeiss Smt Gmbh | Projection optics for EUV projection lithography |
CN106199997B (en) | 2016-07-15 | 2018-08-17 | 中国科学院光电技术研究所 | Large-view-field super-resolution imaging device |
CN106200276B (en) | 2016-07-19 | 2017-10-24 | 西安电子科技大学 | Controllable sub-wavelength maskless lithography system and method based on random scattering media |
CN106324832B (en) | 2016-08-22 | 2019-07-19 | 哈尔滨工业大学 | A method of based on wavefront coded passivation Conformal Optical System aberration |
TWI728175B (en) | 2016-08-22 | 2021-05-21 | 美商魔法飛躍股份有限公司 | Dithering methods and apparatus for wearable display device |
WO2018067246A2 (en) | 2016-08-24 | 2018-04-12 | President And Fellows Of Harvard College | Arbitrary polarization-switchable metasurfaces |
CN106199956B (en) | 2016-09-06 | 2019-02-12 | 哈尔滨工业大学 | A method of based on wavefront coded expansion infrared optical system visual field |
US9880377B1 (en) | 2016-09-09 | 2018-01-30 | Photonicsys Ltd. | Multiple wavelengths real time phase shift interference microscopy |
CN106485761B (en) | 2016-09-16 | 2019-08-09 | 天津大学 | Simple lens color image encryption system |
DE102016218996A1 (en) | 2016-09-30 | 2017-09-07 | Carl Zeiss Smt Gmbh | Imaging optics for projection lithography |
US20190235139A1 (en) | 2016-10-14 | 2019-08-01 | President And Fellows Of Harvard College | High performance visible wavelength meta-axicons for generating bessel beams |
US10539723B2 (en) | 2016-10-19 | 2020-01-21 | Finisar Corporation | Phase-transforming optical reflector formed by partial etching or by partial etching with reflow |
US10642056B2 (en) | 2016-10-19 | 2020-05-05 | CSEM Centre Suisse d'Electronique et de Microtechnique SA—Recherche et Développement | Multispectral or hyperspectral imaging and imaging system based on birefringent subwavelength resonating structure |
CN110139827B (en) | 2016-10-26 | 2023-04-14 | 得克萨斯州大学系统董事会 | High throughput, high resolution optical metrology for reflective and transmissive nanophotonic devices |
US20180129866A1 (en) | 2016-11-10 | 2018-05-10 | Intel Corporation | Meta illuminator |
CN106526730B (en) | 2016-11-21 | 2019-07-12 | 苏州苏大维格光电科技股份有限公司 | A kind of wide viewing angle waveguide eyeglass and production method and wear-type three-dimensional display apparatus |
WO2018111810A1 (en) | 2016-12-13 | 2018-06-21 | Duke University | Single-frequency dynamic metasurface microwave imaging systems and methods of use |
US10416565B2 (en) | 2016-12-16 | 2019-09-17 | Intel Corporation | Display device having integrated metamaterial lens |
US11194082B2 (en) | 2016-12-20 | 2021-12-07 | President And Fellows Of Harvard College | Ultra-compact, aberration corrected, visible chiral spectrometer with meta-lenses |
US10928614B2 (en) | 2017-01-11 | 2021-02-23 | Searete Llc | Diffractive concentrator structures |
CN106848555B (en) | 2017-01-13 | 2019-12-24 | 浙江大学 | Random irradiation aperture antenna for compressed sensing radar and application thereof |
DE102017200935A1 (en) | 2017-01-20 | 2018-07-26 | Carl Zeiss Smt Gmbh | Imaging optics for guiding EUV imaging light and adjustment arrangement for such imaging optics |
IL268115B2 (en) | 2017-01-27 | 2024-01-01 | Magic Leap Inc | Antireflection coatings for metasurfaces |
CN114200562A (en) | 2017-01-27 | 2022-03-18 | 奇跃公司 | Diffraction gratings formed from supersurfaces with differently oriented nanobeams |
US10408416B2 (en) | 2017-01-31 | 2019-09-10 | President And Fellows Of Harvard College | Achromatic metalens and metalens with reverse chromatic dispersion |
US11841520B2 (en) | 2017-02-02 | 2023-12-12 | Technology Innovation Momentum Fund (Israel) Limited Partnership | Multilayer optical element for controlling light |
WO2018148153A1 (en) | 2017-02-08 | 2018-08-16 | Giant Leap Holdings, Llc | Light steering and focusing by dielectrophoresis |
US20180231700A1 (en) | 2017-02-10 | 2018-08-16 | Khaled Ahmed | Lens arrangement for compact virtual reality display system |
US10763290B2 (en) | 2017-02-22 | 2020-09-01 | Elwha Llc | Lidar scanning system |
CN106950195B (en) | 2017-02-24 | 2019-05-07 | 西安电子科技大学 | Programmable optical elements and light field regulator control system and method based on scattering medium |
US20180248268A1 (en) | 2017-02-24 | 2018-08-30 | Board Of Regents, The University Of Texas System | Electro-optical device utilizing an array of plasmonic field-effect transistors |
US10244230B2 (en) | 2017-03-01 | 2019-03-26 | Avalon Holographics Inc. | Directional pixel for multiple view display |
US10838110B2 (en) | 2017-03-03 | 2020-11-17 | Microsoft Technology Licensing, Llc | Metasurface optical coupling elements for a display waveguide |
EP3385770A1 (en) | 2017-04-07 | 2018-10-10 | Universite Paris Descartes | Spatio-temporal wavefront shaping of optical beams |
WO2018195309A1 (en) | 2017-04-19 | 2018-10-25 | California Institute Of Technology | Highly scattering metasurface phase masks for complex wavefront engineering |
US10649303B2 (en) | 2017-04-28 | 2020-05-12 | Samsung Electronics Co., Ltd. | Optical device and optical system including the same |
KR102409392B1 (en) | 2017-04-28 | 2022-06-15 | 삼성전자주식회사 | Optical device and soptical system comprising the same |
US10324314B2 (en) | 2017-05-24 | 2019-06-18 | Uchicago Argonne, Llc | Ultra-flat optical device with high transmission efficiency |
DE112018002670T5 (en) | 2017-05-24 | 2020-03-05 | The Trustees Of Columbia University In The City Of New York | Broadband achromatic flat optical components due to dispersion-technical dielectric meta-surfaces |
JP6640149B2 (en) | 2017-05-25 | 2020-02-05 | 京セラ株式会社 | Electromagnetic wave detection device and information acquisition system |
DE102017208979A1 (en) | 2017-05-29 | 2018-11-29 | Trumpf Laser- Und Systemtechnik Gmbh | Method for deep welding a workpiece, with distribution of the laser power to several foci |
US20210149082A1 (en) | 2017-06-02 | 2021-05-20 | President And Fellows Of Harvard College | Planar achromatic and dispersion-tailored meta-surfaces in visible spectrum |
GB2578049A (en) | 2017-06-19 | 2020-04-15 | Harvard College | Topology optimized multi-layered meta-optics |
US10234383B2 (en) | 2017-06-20 | 2019-03-19 | Konica Minolta Laboratory U.S.A., Inc. | Terahertz spectral imaging system and security surveillance system employing the same |
US11635546B2 (en) | 2017-06-30 | 2023-04-25 | University Of Massachusetts | Optically transmissive devices and fabrication |
WO2019015735A1 (en) | 2017-07-18 | 2019-01-24 | Baden-Württemberg Stiftung Ggmbh | Method of fabricating an imaging system and corresponding imaging system |
US11119255B2 (en) | 2017-07-19 | 2021-09-14 | President And Fellows Of Harvard College | Highly efficient data representation of dense polygonal structures |
US20190025463A1 (en) | 2017-07-19 | 2019-01-24 | President And Fellows Of Harvard College | Substrate-formed metasurface devices |
US10922828B2 (en) | 2017-07-31 | 2021-02-16 | Samsung Electronics Co., Ltd. | Meta projector and electronic apparatus including the same |
KR102464366B1 (en) * | 2017-07-31 | 2022-11-07 | 삼성전자주식회사 | Meta projector and electronic apparatus including the same |
US10969584B2 (en) | 2017-08-04 | 2021-04-06 | Mentor Acquisition One, Llc | Image expansion optic for head-worn computer |
KR102485447B1 (en) | 2017-08-09 | 2023-01-05 | 삼성전자주식회사 | Optical window system and see-through type display apparatus including the same |
WO2019031680A1 (en) * | 2017-08-11 | 2019-02-14 | 한국과학기술원 | Flat metalens and cover glass comprising same |
KR101905444B1 (en) | 2017-08-11 | 2018-12-05 | 한국과학기술원 | Active metasurface, optical device including the same and manufacturing method thereof |
WO2019203876A2 (en) | 2017-08-17 | 2019-10-24 | The Trustees Of Columbia University In The City Of New York | Systems and methods for controlling electromagnetic radiation |
JP6908470B2 (en) | 2017-08-25 | 2021-07-28 | 京セラ株式会社 | Electromagnetic wave detectors, programs, and electromagnetic wave detection systems |
EP3451027A1 (en) | 2017-09-01 | 2019-03-06 | Thomson Licensing | Optical device capable of providing at least two different optical functions |
US10802301B2 (en) | 2017-09-08 | 2020-10-13 | California Institute Of Technology | Active metasurfaces for dynamic polarization conversion |
US20240241288A1 (en) | 2017-09-15 | 2024-07-18 | President And Fellows Of Harvard College | Spin-to-orbital angular momentum converter for light |
CN107561857A (en) | 2017-09-20 | 2018-01-09 | 南方科技大学 | Method for preparing optical super-structure surface based on nano-imprinting |
FR3071342B1 (en) | 2017-09-21 | 2019-09-06 | Safran Electronics & Defense | BAYER MATRIX IMAGE SENSOR |
US10578492B2 (en) | 2017-09-29 | 2020-03-03 | Samsung Electronics Co., Ltd. | Polarimeter for detecting polarization rotation |
KR102623515B1 (en) | 2017-09-29 | 2024-01-10 | 삼성전자주식회사 | Polarimeter for detecting polarization rotation |
WO2019075335A1 (en) | 2017-10-13 | 2019-04-18 | Trustees Of Boston University | Lens-free compound eye cameras based on angle-sensitive meta-surfaces |
US10761328B2 (en) * | 2017-11-06 | 2020-09-01 | Darwin Hu | Display glasses using meta-surface planar lens |
EP3714241A2 (en) | 2017-11-21 | 2020-09-30 | CSEM Centre Suisse d'Electronique et de Microtechnique SA | Spectrometer |
US10935501B2 (en) | 2017-12-01 | 2021-03-02 | Onto Innovation Inc. | Sub-resolution defect detection |
US11445125B2 (en) | 2017-12-12 | 2022-09-13 | B.G. Negev Technologies And Applications Ltd., At Ben-Gurion University | Partial aperture imaging system |
WO2019118646A1 (en) | 2017-12-13 | 2019-06-20 | President And Fellows Of Harvard College | Endoscopic imaging using nanoscale metasurfaces |
US11431889B2 (en) | 2017-12-18 | 2022-08-30 | Seeing Machines Limited | High performance imaging system using a dielectric metasurface |
US11385104B2 (en) | 2017-12-22 | 2022-07-12 | Arizona Board Of Regents On Behalf Of Arizona State University | On-chip polarization detection and polarimetric imaging |
CN108089325A (en) | 2017-12-26 | 2018-05-29 | 西安博雅精密光学科技有限公司 | Based on wavefront coded hyperfocal distance imaging system |
CN207623619U (en) | 2017-12-26 | 2018-07-17 | 西安博雅精密光学科技有限公司 | Based on wavefront coded hyperfocal distance imaging system |
TWI696297B (en) * | 2017-12-26 | 2020-06-11 | 中央研究院 | Broadband achromatic metalens in the visible spectrum |
CN207923075U (en) | 2018-01-04 | 2018-09-28 | 广东普密斯视觉技术有限公司 | A kind of non-contact interference measuring instrument of three-dimensional surface |
WO2019136166A1 (en) | 2018-01-04 | 2019-07-11 | President And Fellows Of Harvard College | Angle-dependent or polarization-dependent metasurfaces with wide field of view |
CA3085459A1 (en) | 2018-01-04 | 2019-07-11 | Magic Leap, Inc. | Optical elements based on polymeric structures incorporating inorganic materials |
CN111819489B (en) | 2018-01-24 | 2024-04-02 | 哈佛学院院长及董事 | Polarization state generation using a subsurface |
JP7328232B2 (en) | 2018-01-29 | 2023-08-16 | ユニヴァーシティ オブ ワシントン | Metasurfaces and systems for full-color imaging and methods of imaging |
US11353626B2 (en) | 2018-02-05 | 2022-06-07 | Samsung Electronics Co., Ltd. | Meta illuminator |
WO2019164849A1 (en) | 2018-02-20 | 2019-08-29 | President And Fellows Of Harvard College | Aberration correctors based on dispersion-engineered metasurfaces |
EP3756035A4 (en) | 2018-02-21 | 2021-11-24 | University of Utah Research Foundation | Diffractive optic for holographic projection |
WO2019173357A1 (en) | 2018-03-05 | 2019-09-12 | Vijayakumar Bhagavatula | Display system for rendering a scene with multiple focal planes |
CN108507542B (en) | 2018-04-02 | 2021-03-09 | 北京理工大学 | Ultra-high speed moving target attitude measurement system and method |
US10345519B1 (en) | 2018-04-11 | 2019-07-09 | Microsoft Technology Licensing, Llc | Integrated optical beam steering system |
JP7068904B2 (en) | 2018-04-13 | 2022-05-17 | 京セラ株式会社 | Electromagnetic wave detection device and information acquisition system |
WO2019204667A1 (en) | 2018-04-20 | 2019-10-24 | President And Fellows Of Harvard College | Polarization-dependent metasurfaces for 2d/3d switchable displays |
CN108680544B (en) | 2018-04-23 | 2021-04-06 | 浙江大学 | Structured illumination light slice fluorescence microscopic imaging method and device |
US11187652B2 (en) | 2018-04-27 | 2021-11-30 | Ecole Polytechnique Federale De Lausanne (Epfl) | Method and spectrometer apparatus for investigating an infrared absorption of a sample |
KR102050599B1 (en) | 2018-05-14 | 2019-12-02 | 주식회사 에스오에스랩 | Lidar device |
CN208270846U (en) | 2018-05-31 | 2018-12-21 | 西安电子科技大学 | Wavefront coding imaging system with adjustable phase mask |
CN108761779B (en) | 2018-05-31 | 2024-04-05 | 西安电子科技大学 | Wavefront coding imaging system with adjustable phase mask |
US11624912B2 (en) | 2018-06-01 | 2023-04-11 | University Of Rochester | Augmented reality display |
CN109000692A (en) | 2018-06-14 | 2018-12-14 | 深圳伊讯科技有限公司 | A kind of automatic detection fiber grating inscription location means |
KR102036640B1 (en) | 2018-06-15 | 2019-10-25 | 고려대학교 산학협력단 | Optical imaging method capable of high-speed correction of optical aberration |
DE102018115001A1 (en) | 2018-06-21 | 2019-12-24 | Carl Zeiss Microscopy Gmbh | Procedure for calibrating a phase mask and microscope |
DE102018210603A1 (en) | 2018-06-28 | 2020-01-02 | Carl Zeiss Microscopy Gmbh | Method for generating an overview image using a high aperture lens |
US10310362B2 (en) | 2018-06-29 | 2019-06-04 | Intel Corporation | LED pattern projector for 3D camera platforms |
EP3799626A4 (en) | 2018-07-02 | 2022-03-30 | Metalenz, Inc. | Metasurfaces for laser speckle reduction |
FR3083645B1 (en) * | 2018-07-05 | 2020-07-31 | Thales Sa | IMPROVED BI-SPECTRAL DETECTOR |
CN208421387U (en) * | 2018-08-09 | 2019-01-22 | 秦皇岛本征晶体科技有限公司 | Image space telecentric imaging camera lens based on calcium fluoride crystal |
CN109360139B (en) | 2018-09-03 | 2020-10-30 | 中国科学院西安光学精密机械研究所 | Sub-pixel super-resolution imaging system and method based on translation adjustable wavefront coding |
EP3620430A1 (en) * | 2018-09-10 | 2020-03-11 | Essilor International (Compagnie Generale D'optique) | Method for determining an optical system with a metasurface and associated products |
US20190041660A1 (en) | 2018-09-12 | 2019-02-07 | Intel Corporation | Vertical-cavity surface emitting laser (vcsel) illuminator for reducing speckle |
US11960051B2 (en) | 2018-11-15 | 2024-04-16 | Agency For Science, Technology And Research | Meta-lens structure and method of fabricating the same |
US10564330B2 (en) | 2018-12-21 | 2020-02-18 | Intel Corporation | Metasurface devices for display and photonics devices |
US20220214219A1 (en) | 2019-02-06 | 2022-07-07 | California Institute Of Technology | Metasurface Mask for Full-Stokes Division of Focal Plane Polarization of Cameras |
EP3696523A1 (en) | 2019-02-12 | 2020-08-19 | Hahn-Schickard-Gesellschaft für angewandte Forschung e.V. | Ir emitter with modular emissions level based on metamaterials |
US11473191B2 (en) | 2019-02-27 | 2022-10-18 | Applied Materials, Inc. | Method for creating a dielectric filled nanostructured silica substrate for flat optical devices |
US10915737B2 (en) | 2019-03-04 | 2021-02-09 | The United States Of America As Represented By The Secretary Of The Army | 3D polarimetric face recognition system |
US20220206186A1 (en) | 2019-04-15 | 2022-06-30 | President And Fellows Of Harvard College | Hybrid metasurface-refractive super superachromatic lenses |
CN110160685A (en) | 2019-06-04 | 2019-08-23 | 深圳大学 | Fiber grating directionality pressure sensor, fiber grating preparation method and device |
US11978752B2 (en) | 2019-07-26 | 2024-05-07 | Metalenz, Inc. | Aperture-metasurface and hybrid refractive-metasurface imaging systems |
CN110376665B (en) | 2019-07-31 | 2021-08-06 | 深圳迈塔兰斯科技有限公司 | Superlens and optical system with same |
US20210208469A1 (en) | 2019-08-02 | 2021-07-08 | Giant Leap Holdings, Llc | Light control by means of forced translation, rotation, orientation, and deformation of particles using dielectrophoresis |
JP2023508378A (en) * | 2019-12-23 | 2023-03-02 | エイエムエス-オスラム アーゲー | Optical device with phase correction |
CN113050295A (en) | 2019-12-26 | 2021-06-29 | 郝成龙 | Super lens and glasses with same |
US11232284B2 (en) | 2019-12-27 | 2022-01-25 | Omnivision Technologies, Inc. | Techniques for robust anti-spoofing in biometrics using polarization cues for NIR and visible wavelength band |
US11733552B2 (en) | 2020-03-31 | 2023-08-22 | Arizona Board Of Regents On Behalf Of Arizona State University | Ultra-fast optical modulation and ultra-short pulse generation based on tunable graphene-plasmonic hybrid metasurfaces |
US11781913B2 (en) | 2020-04-24 | 2023-10-10 | Meta Platforms Technologies, Llc | Polarimetric imaging camera |
US20230208104A1 (en) | 2020-05-08 | 2023-06-29 | President And Fellows Of Harvard College | Wavelength tunable metasurface based external cavity laser |
WO2021230868A1 (en) * | 2020-05-14 | 2021-11-18 | Hewlett-Packard Development Company, L.P. | Nitrogen vacancy sensor with integrated optics |
CN113703080B (en) | 2020-05-22 | 2023-07-28 | 深圳迈塔兰斯科技有限公司 | Superlens and optical system with superlens |
CN113917578B (en) | 2020-07-07 | 2023-06-06 | 深圳迈塔兰斯科技有限公司 | Large-caliber chromatic aberration correction superlens, superlens system and optical system |
CN213903843U (en) | 2020-09-14 | 2021-08-06 | 深圳迈塔兰斯科技有限公司 | Far infrared silicon-based super-lens antireflection film and super-lens |
CN213902664U (en) | 2020-09-14 | 2021-08-06 | 深圳迈塔兰斯科技有限公司 | Thermopile infrared sensor |
CN213092332U (en) | 2020-09-14 | 2021-04-30 | 深圳迈塔兰斯科技有限公司 | Fingerprint sensor and display device under screen based on super lens |
US20240012177A1 (en) | 2021-01-06 | 2024-01-11 | Metalenz, Inc. | Self-Aligned Nano-Pillar Coatings and Method of Manufacturing |
CN114740631A (en) | 2021-01-07 | 2022-07-12 | 深圳迈塔兰斯科技有限公司 | 3D-ToF transmitting module |
CN214098104U (en) | 2021-01-07 | 2021-08-31 | 深圳迈塔兰斯科技有限公司 | 3D-ToF module |
CN115047432A (en) | 2021-03-09 | 2022-09-13 | 深圳迈塔兰斯科技有限公司 | Double-spectrum super-surface and point cloud generating device and laser radar transmitting system |
CN215010478U (en) | 2021-03-12 | 2021-12-03 | 深圳迈塔兰斯科技有限公司 | Huygens-super lens-based near-infrared imaging system |
CN115166876B (en) | 2021-04-02 | 2024-04-26 | 深圳迈塔兰斯科技有限公司 | Near infrared superlens and light guide optical system for intracranial tumor thermotherapy |
CN215005942U (en) | 2021-04-02 | 2021-12-03 | 深圳迈塔兰斯科技有限公司 | Wafer-level optical imaging system based on superlens |
CN217983382U (en) | 2021-05-17 | 2022-12-06 | 深圳迈塔兰斯科技有限公司 | Light-emitting diode based on coaxial encapsulation of super lens |
CN113834568A (en) | 2021-09-23 | 2021-12-24 | 深圳迈塔兰斯科技有限公司 | Spectral measuring device and method |
CN113851573B (en) | 2021-09-23 | 2023-09-01 | 深圳迈塔兰斯科技有限公司 | Super surface for improving light-taking efficiency of LED |
CN113835227B (en) | 2021-09-23 | 2023-02-24 | 深圳迈塔兰斯科技有限公司 | Compensator, preparation method thereof, image display device and display equipment |
CN113807312A (en) | 2021-09-30 | 2021-12-17 | 深圳迈塔兰斯科技有限公司 | Super surface and have its fingerprint identification device |
CN215932365U (en) | 2021-09-30 | 2022-03-01 | 深圳迈塔兰斯科技有限公司 | Photoetching system for super surface processing |
CN113791524A (en) | 2021-09-30 | 2021-12-14 | 深圳迈塔兰斯科技有限公司 | Photoetching system and method for super surface processing |
CN113917574B (en) | 2021-09-30 | 2023-04-07 | 深圳迈塔兰斯科技有限公司 | Stepped substrate super-surface and related design method, processing method and optical lens |
CN113900162B (en) | 2021-09-30 | 2023-08-18 | 深圳迈塔兰斯科技有限公司 | Super surface of curved substrate and preparation method thereof |
CN113899451B (en) | 2021-09-30 | 2024-01-30 | 深圳迈塔兰斯科技有限公司 | Spectrometer and super-surface light-splitting device |
CN113934005B (en) | 2021-10-26 | 2023-06-13 | 深圳迈塔兰斯科技有限公司 | Relay steering device, display device and near-to-eye display system |
CN113934004B (en) | 2021-10-26 | 2023-06-09 | 深圳迈塔兰斯科技有限公司 | Image generation device, head-up display and vehicle |
CN113959984A (en) | 2021-10-28 | 2022-01-21 | 深圳迈塔兰斯科技有限公司 | Film refractive index detection device and detection method |
CN113885106B (en) | 2021-11-09 | 2023-03-24 | 深圳迈塔兰斯科技有限公司 | Design method and device of super-lens antireflection film and electronic equipment |
CN114019589B (en) | 2021-11-09 | 2024-03-22 | 深圳迈塔兰斯科技有限公司 | Optical attenuation sheet |
CN113900078A (en) | 2021-11-09 | 2022-01-07 | 深圳迈塔兰斯科技有限公司 | Transmitter for laser radar and laser radar |
CN114112058B (en) | 2021-11-19 | 2024-05-14 | 深圳迈塔兰斯科技有限公司 | Microbridge structure and preparation method thereof |
CN114047637B (en) | 2021-11-23 | 2024-04-30 | 深圳迈塔兰斯科技有限公司 | Point cloud projection system |
CN113820839A (en) | 2021-11-24 | 2021-12-21 | 深圳迈塔兰斯科技有限公司 | Telecentric lens |
CN114047632B (en) | 2021-11-26 | 2024-05-17 | 深圳迈塔兰斯科技有限公司 | Multi-view display device, head-up display and vehicle |
CN114156168A (en) | 2021-11-30 | 2022-03-08 | 深圳迈塔兰斯科技有限公司 | Composite wafer processing method and super surface prepared by using same |
CN216351311U (en) | 2021-12-06 | 2022-04-19 | 深圳迈塔兰斯科技有限公司 | Super-lens-based extended wide-angle lens, handheld terminal comprising same and protective shell |
CA3241199A1 (en) | 2021-12-17 | 2023-06-22 | Robert C. DEVLIN | Spoof-resistant facial recognition through illumination and imaging |
CN114280716B (en) | 2021-12-21 | 2024-03-08 | 深圳迈塔兰斯科技有限公司 | Component for optical isolator, optical isolator and device |
CN216593224U (en) | 2021-12-21 | 2022-05-24 | 深圳迈塔兰斯科技有限公司 | Super lens-based 3D sensing system and handheld terminal comprising same |
CN216351591U (en) | 2021-12-21 | 2022-04-19 | 深圳迈塔兰斯科技有限公司 | 2D/3D convertible lens array, integrated imaging display and acquisition device |
CN216345776U (en) | 2021-12-22 | 2022-04-19 | 深圳迈塔兰斯科技有限公司 | Spectrum simulation system |
CN216355281U (en) | 2021-12-22 | 2022-04-19 | 深圳迈塔兰斯科技有限公司 | Optical fiber amplifier |
CN115524775A (en) | 2021-12-23 | 2022-12-27 | 深圳迈塔兰斯科技有限公司 | Supercritical lens and super-resolution imaging system |
CN114280704B (en) | 2021-12-28 | 2023-07-07 | 深圳迈塔兰斯科技有限公司 | Superlens array and wavefront detection system |
CN114296180A (en) | 2021-12-28 | 2022-04-08 | 深圳迈塔兰斯科技有限公司 | Optical isolator, optical isolation device and equipment containing optical isolation device |
CN217034311U (en) | 2021-12-29 | 2022-07-22 | 深圳迈塔兰斯科技有限公司 | Optical fiber adapter with modulation function and equipment for manufacturing same |
CN216361353U (en) | 2021-12-31 | 2022-04-22 | 深圳迈塔兰斯科技有限公司 | Superlens-based vehicle lighting system |
CN114176492A (en) | 2022-01-05 | 2022-03-15 | 深圳迈塔兰斯科技有限公司 | Endoscope probe, endoscope and scanning control method thereof |
CN217467338U (en) | 2022-01-05 | 2022-09-20 | 深圳迈塔兰斯科技有限公司 | Endoscope probe |
CN216933177U (en) | 2022-01-05 | 2022-07-12 | 深圳迈塔兰斯科技有限公司 | Optical coherence tomography system based on superlens |
CN217281621U (en) | 2022-01-10 | 2022-08-23 | 深圳迈塔兰斯科技有限公司 | Mode locker and mode-locked laser comprising same |
CN216605227U (en) | 2022-01-10 | 2022-05-27 | 深圳迈塔兰斯科技有限公司 | Photocatalytic device |
CN217280797U (en) | 2022-01-10 | 2022-08-23 | 深圳迈塔兰斯科技有限公司 | Solar cell |
CN114373825A (en) | 2022-01-10 | 2022-04-19 | 深圳迈塔兰斯科技有限公司 | Heterojunction device based on two-dimensional material, photoelectric detector comprising heterojunction device and method |
CN114326163A (en) | 2022-01-10 | 2022-04-12 | 深圳迈塔兰斯科技有限公司 | Terahertz wave modulator and method |
CN217034418U (en) | 2022-01-11 | 2022-07-22 | 深圳迈塔兰斯科技有限公司 | Optical system and photocuring printing system comprising same |
CN216622749U (en) | 2022-01-12 | 2022-05-27 | 深圳迈塔兰斯科技有限公司 | Dual-functional super lens and super-resolution imaging device comprising same |
CN114384612B (en) | 2022-01-12 | 2024-02-02 | 深圳迈塔兰斯科技有限公司 | Super surface unit, phase-adjustable super surface with same and optical system |
CN114397092B (en) | 2022-01-14 | 2024-01-30 | 深圳迈塔兰斯科技有限公司 | Method and system for measuring super-surface phase |
CN217276608U (en) | 2022-01-14 | 2022-08-23 | 深圳迈塔兰斯科技有限公司 | Visual touch sensor |
CN114354141B (en) | 2022-01-14 | 2024-05-07 | 深圳迈塔兰斯科技有限公司 | Method and system for measuring super-surface phase based on frequency domain |
CN217279168U (en) | 2022-01-17 | 2022-08-23 | 深圳迈塔兰斯科技有限公司 | Polarized light 3D lens device based on super lens and 3D glasses with same |
CN216900930U (en) | 2022-01-21 | 2022-07-05 | 深圳迈塔兰斯科技有限公司 | Compact ToF module |
CN217279110U (en) | 2022-01-21 | 2022-08-23 | 深圳迈塔兰斯科技有限公司 | Optical imaging system for confocal endoscope and confocal endoscope |
CN115524768A (en) | 2022-01-27 | 2022-12-27 | 深圳迈塔兰斯科技有限公司 | Contact lens based on superlens and processing method thereof |
CN217279003U (en) | 2022-01-27 | 2022-08-23 | 深圳迈塔兰斯科技有限公司 | Frequency domain filter based on super surface, optical 4f system and optical module |
CN217466052U (en) | 2022-01-27 | 2022-09-20 | 深圳迈塔兰斯科技有限公司 | Tactile sensor based on superlens ToF module |
CN217467336U (en) | 2022-01-29 | 2022-09-20 | 深圳迈塔兰斯科技有限公司 | Microscope imaging probe and microscope imaging system based on super lens |
CN216901952U (en) | 2022-02-08 | 2022-07-05 | 深圳迈塔兰斯科技有限公司 | Traffic signal lamp based on super lens |
CN114488365A (en) | 2022-02-18 | 2022-05-13 | 深圳迈塔兰斯科技有限公司 | Far infrared superlens and processing method thereof |
CN114325886B (en) | 2022-02-23 | 2023-08-25 | 深圳迈塔兰斯科技有限公司 | Super-surface, design method and device thereof and electronic equipment |
CN114397718B (en) | 2022-02-23 | 2023-09-29 | 深圳迈塔兰斯科技有限公司 | Athermalized superlens and design method thereof |
CN217639519U (en) | 2022-02-25 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Small laser radar transmitting system |
CN114415386A (en) | 2022-02-25 | 2022-04-29 | 深圳迈塔兰斯科技有限公司 | Collimated light source system |
CN114545367A (en) | 2022-02-25 | 2022-05-27 | 深圳迈塔兰斯科技有限公司 | Laser radar transmitting system |
CN114545370A (en) | 2022-02-25 | 2022-05-27 | 深圳迈塔兰斯科技有限公司 | Laser radar transmitting system and corresponding receiving system thereof |
CN114554062A (en) | 2022-02-25 | 2022-05-27 | 深圳迈塔兰斯科技有限公司 | Super-lens-based light field camera and algorithm thereof |
GB2616271A (en) | 2022-03-01 | 2023-09-06 | Metahelios Ltd | Plasmonic metasurface light filter |
CN216903719U (en) | 2022-03-02 | 2022-07-05 | 深圳迈塔兰斯科技有限公司 | Vertical cavity surface emitting laser, light emitting array, projection apparatus, and imaging system |
CN216896898U (en) | 2022-03-03 | 2022-07-05 | 深圳迈塔兰斯科技有限公司 | Automobile projection lamp based on super lens |
CN216901317U (en) | 2022-03-08 | 2022-07-05 | 深圳迈塔兰斯科技有限公司 | Artificial bionic compound eye based on superlens |
CN114561266A (en) | 2022-03-08 | 2022-05-31 | 深圳迈塔兰斯科技有限公司 | Particle sorting device and system |
CN216901121U (en) | 2022-03-08 | 2022-07-05 | 深圳迈塔兰斯科技有限公司 | Superlens-based detector array |
CN114623960B (en) | 2022-03-08 | 2024-06-14 | 深圳迈塔兰斯科技有限公司 | Pressure sensor, pressure analyzer and preparation method thereof |
CN114593689B (en) | 2022-03-08 | 2024-04-09 | 深圳迈塔兰斯科技有限公司 | Optical fiber end face detection method and device |
CN216901165U (en) | 2022-03-11 | 2022-07-05 | 深圳迈塔兰斯科技有限公司 | Light source module, structured light generator and depth camera |
CN114624878B (en) | 2022-03-24 | 2024-03-22 | 深圳迈塔兰斯科技有限公司 | Method and device for designing optical system |
US11927769B2 (en) | 2022-03-31 | 2024-03-12 | Metalenz, Inc. | Polarization sorting metasurface microlens array device |
CN217279244U (en) | 2022-04-08 | 2022-08-23 | 深圳迈塔兰斯科技有限公司 | Projection system |
CN114578642A (en) | 2022-04-08 | 2022-06-03 | 深圳迈塔兰斯科技有限公司 | Projection system |
CN217278911U (en) | 2022-04-11 | 2022-08-23 | 深圳迈塔兰斯科技有限公司 | Laser radar blind guiding device and head-mounted blind guiding equipment |
CN217278915U (en) | 2022-04-12 | 2022-08-23 | 深圳迈塔兰斯科技有限公司 | Transmitting module and laser radar device |
CN217034466U (en) | 2022-04-12 | 2022-07-22 | 深圳迈塔兰斯科技有限公司 | All-solid-state optical phased array and laser radar device |
CN114743714A (en) | 2022-04-21 | 2022-07-12 | 深圳迈塔兰斯科技有限公司 | Target control device, system and method |
CN217809433U (en) | 2022-04-22 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | Optical system of PCR (polymerase chain reaction) fluorescence detector and PCR fluorescence detector |
CN217279087U (en) | 2022-04-25 | 2022-08-23 | 深圳迈塔兰斯科技有限公司 | Optical system, imaging device including the same, and electronic apparatus including the same |
CN114690387A (en) | 2022-04-25 | 2022-07-01 | 深圳迈塔兰斯科技有限公司 | Variable focus optical system |
CN114779437A (en) | 2022-04-25 | 2022-07-22 | 深圳迈塔兰斯科技有限公司 | Optical system |
CN217280851U (en) | 2022-04-27 | 2022-08-23 | 深圳迈塔兰斯科技有限公司 | Multifunctional phase change unit and multifunctional super surface |
CN217278989U (en) | 2022-04-28 | 2022-08-23 | 深圳迈塔兰斯科技有限公司 | Super surface structure |
CN217639715U (en) | 2022-04-28 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Optical system, superlens therein, imaging device comprising same and electronic equipment |
CN114660683A (en) | 2022-04-28 | 2022-06-24 | 深圳迈塔兰斯科技有限公司 | Super surface structure |
CN114660780A (en) | 2022-04-28 | 2022-06-24 | 深圳迈塔兰斯科技有限公司 | Optical system, imaging device comprising same and electronic equipment |
CN217639611U (en) | 2022-04-29 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Superlens assembly, superlens and imaging system |
CN217466667U (en) | 2022-05-09 | 2022-09-20 | 深圳迈塔兰斯科技有限公司 | Optical detection equipment and atmosphere detection system based on super lens |
CN217467176U (en) | 2022-05-09 | 2022-09-20 | 深圳迈塔兰斯科技有限公司 | Beam splitting module and laser radar transmitting device |
CN217281623U (en) | 2022-05-11 | 2022-08-23 | 深圳迈塔兰斯科技有限公司 | Laser homogenization system and laser system with same |
CN217820828U (en) | 2022-05-17 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | Lidar transmitting device, receiving device and semi-solid lidar system |
CN217467452U (en) | 2022-05-24 | 2022-09-20 | 深圳迈塔兰斯科技有限公司 | Laser display system based on superlens |
CN217467396U (en) | 2022-05-24 | 2022-09-20 | 深圳迈塔兰斯科技有限公司 | Self-adaptive vision wafer and glasses lens |
CN217467395U (en) | 2022-05-24 | 2022-09-20 | 深圳迈塔兰斯科技有限公司 | Self-adaptive vision lens and self-adaptive vision glasses |
CN114859570B (en) | 2022-05-24 | 2024-05-14 | 深圳迈塔兰斯科技有限公司 | Self-adaptive vision lens, self-adaptive vision glasses and design method |
CN217467399U (en) | 2022-05-24 | 2022-09-20 | 深圳迈塔兰斯科技有限公司 | Colored contact lens based on super surface |
CN217821122U (en) | 2022-05-24 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | Elliptical beam shaping system based on super lens and laser system with same |
CN217467162U (en) | 2022-05-27 | 2022-09-20 | 深圳迈塔兰斯科技有限公司 | Laser radar transmitting system based on super lens and laser radar |
CN217467177U (en) | 2022-05-27 | 2022-09-20 | 深圳迈塔兰斯科技有限公司 | Multi-line laser radar system based on super surface |
CN217820829U (en) | 2022-05-27 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | Coaxial multiline laser radar system of receiving and dispatching |
CN217467353U (en) | 2022-05-31 | 2022-09-20 | 深圳迈塔兰斯科技有限公司 | Near-to-eye display optical system and head-mounted display equipment |
CN217820831U (en) | 2022-05-31 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | Bionic compound eye type laser radar system |
CN217467352U (en) | 2022-05-31 | 2022-09-20 | 深圳迈塔兰斯科技有限公司 | Near-to-eye display optical system |
CN217467351U (en) | 2022-05-31 | 2022-09-20 | 深圳迈塔兰斯科技有限公司 | Near-to-eye display optical system and head-mounted display equipment |
CN114935741A (en) | 2022-06-02 | 2022-08-23 | 深圳迈塔兰斯科技有限公司 | Laser radar system |
CN217639515U (en) | 2022-06-02 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Laser radar system |
CN217467355U (en) | 2022-06-09 | 2022-09-20 | 深圳迈塔兰斯科技有限公司 | Holographic near-to-eye display system and head-mounted display equipment |
CN114859446B (en) | 2022-06-14 | 2023-06-02 | 深圳迈塔兰斯科技有限公司 | Composite superlens, forming method thereof and lattice projection system |
CN115047653A (en) | 2022-06-14 | 2022-09-13 | 深圳迈塔兰斯科技有限公司 | Adjustable super surface system |
CN115016150A (en) | 2022-06-14 | 2022-09-06 | 深圳迈塔兰斯科技有限公司 | Pixel structure, super surface and method for controlling pixel structure |
CN217639539U (en) | 2022-06-16 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Ocean laser radar system |
CN217821696U (en) | 2022-06-17 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | Intelligent lock and burglary-resisting door based on super lens |
CN217467357U (en) | 2022-06-20 | 2022-09-20 | 深圳迈塔兰斯科技有限公司 | Light expansion expander and near-to-eye projection system |
CN217467226U (en) | 2022-06-20 | 2022-09-20 | 深圳迈塔兰斯科技有限公司 | Super surface structure and point cloud generator |
CN217822825U (en) | 2022-06-20 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | SPAD sensor |
CN217639544U (en) | 2022-06-20 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Vehicle-mounted laser radar system based on adjustable super lens and automobile |
CN217467358U (en) | 2022-06-21 | 2022-09-20 | 深圳迈塔兰斯科技有限公司 | Eye movement tracking system based on superlens, near-to-eye display optical system and equipment |
CN217820834U (en) | 2022-06-21 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | Angle amplification MEMS galvanometer and laser radar transmitting system |
CN217820838U (en) | 2022-06-21 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | Laser radar transmitting system |
CN217820840U (en) | 2022-06-21 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | Receiving module and laser radar system |
CN115113174A (en) | 2022-06-21 | 2022-09-27 | 深圳迈塔兰斯科技有限公司 | Angle amplifier, transmitting system and design method of angle amplifier |
CN217823690U (en) | 2022-06-22 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | Semiconductor laser light source, light source array and multi-line laser radar system |
CN217467439U (en) | 2022-06-22 | 2022-09-20 | 深圳迈塔兰斯科技有限公司 | Multifunctional projection module and imaging device |
CN217456368U (en) | 2022-06-22 | 2022-09-20 | 深圳迈塔兰斯科技有限公司 | Unmanned aerial vehicle with landing laser radar system |
CN217981857U (en) | 2022-06-22 | 2022-12-06 | 深圳迈塔兰斯科技有限公司 | Vehicle-mounted unmanned aerial vehicle laser radar, vehicle-mounted unmanned aerial vehicle detection system and vehicle |
CN217467327U (en) | 2022-06-24 | 2022-09-20 | 深圳迈塔兰斯科技有限公司 | Optical system, imaging device including the same, and electronic apparatus including the same |
CN217467326U (en) | 2022-06-24 | 2022-09-20 | 深圳迈塔兰斯科技有限公司 | Optical system, imaging device comprising same and electronic equipment |
CN115032766A (en) | 2022-06-24 | 2022-09-09 | 深圳迈塔兰斯科技有限公司 | Optical system, imaging device comprising same and electronic equipment |
CN114859447A (en) | 2022-06-24 | 2022-08-05 | 深圳迈塔兰斯科技有限公司 | Compound lens and optical system comprising same |
CN115016099A (en) | 2022-06-24 | 2022-09-06 | 深圳迈塔兰斯科技有限公司 | Optical system, imaging device including the same, and electronic apparatus including the same |
CN217639612U (en) | 2022-06-24 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Compound lens, optical system comprising same, imaging device and electronic equipment |
CN217465697U (en) | 2022-06-27 | 2022-09-20 | 深圳迈塔兰斯科技有限公司 | Optical displacement sensor |
CN217639763U (en) | 2022-06-28 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Near-eye projection system and display device comprising same |
CN217639765U (en) | 2022-06-30 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Holographic near-to-eye display projection system |
CN114995038A (en) | 2022-07-05 | 2022-09-02 | 深圳迈塔兰斯科技有限公司 | Projection system and three-dimensional measurement module comprising same |
CN217467364U (en) | 2022-07-05 | 2022-09-20 | 深圳迈塔兰斯科技有限公司 | Projection system based on focusing super lens and equipment with same |
CN217467363U (en) | 2022-07-05 | 2022-09-20 | 深圳迈塔兰斯科技有限公司 | Near-to-eye display optical system and head-mounted display equipment |
CN217639903U (en) | 2022-07-05 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Structured light generator, imaging device and comprehensive screen electronic equipment |
CN217639767U (en) | 2022-07-06 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Holographic near-to-eye display system |
CN115061114A (en) | 2022-07-06 | 2022-09-16 | 深圳迈塔兰斯科技有限公司 | Laser radar transmitting system, scanning method and wafer-level packaged device |
CN217467367U (en) | 2022-07-08 | 2022-09-20 | 深圳迈塔兰斯科技有限公司 | AR near-eye display device and electronic equipment with same |
CN217821091U (en) | 2022-07-08 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | Projection system and corresponding AR and VR near-to-eye display device and AR glasses |
CN217639768U (en) | 2022-07-08 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Image combiner and near-to-eye display device |
CN217639769U (en) | 2022-07-11 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Image combination device and near-to-eye projection display equipment |
CN217639770U (en) | 2022-07-11 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Image combiner and AR near-to-eye display optical system |
CN217467368U (en) | 2022-07-11 | 2022-09-20 | 深圳迈塔兰斯科技有限公司 | Image combiner and near-to-eye display system |
CN115185082A (en) | 2022-07-11 | 2022-10-14 | 深圳迈塔兰斯科技有限公司 | Image combiner and near-to-eye display system |
CN115079415B (en) | 2022-07-12 | 2024-07-19 | 深圳迈塔兰斯科技有限公司 | Hole light near-to-eye display system |
CN217639772U (en) | 2022-07-12 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Image combiner and near-to-eye display system |
CN217639771U (en) | 2022-07-12 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Image combiner and near-to-eye display system |
CN217639773U (en) | 2022-07-14 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Image combiner based on achromatic superlens and display device with same |
CN217818613U (en) | 2022-07-14 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | Line laser imaging system and 3D shooting equipment |
CN115166958B (en) | 2022-07-15 | 2024-09-03 | 深圳迈塔兰斯科技有限公司 | Miniaturized tomography system |
CN217639774U (en) | 2022-07-18 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Near-to-eye display system based on polarization dependent super lens and head-mounted display device |
CN217639719U (en) | 2022-07-25 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Light sheet fluorescence microscope and sample detection system |
CN115211799A (en) | 2022-07-25 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Insertion device for endoscope system and endoscope system comprising same |
CN217639722U (en) | 2022-07-25 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Structured light illumination microscopic imaging system |
CN217639776U (en) | 2022-07-25 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Light source module and retina projection system |
CN217639718U (en) | 2022-07-25 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Receiving system and microscope |
CN217885960U (en) | 2022-07-25 | 2022-11-25 | 深圳迈塔兰斯科技有限公司 | Endoscope distortion correcting device and optical fiber endoscope device |
CN217639723U (en) | 2022-07-25 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Multi-focus structured light illumination microscopic imaging system |
CN217639777U (en) | 2022-07-25 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Virtual reality display device |
CN217825178U (en) | 2022-07-27 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | Imaging system of binocular stereoscopic vision camera and binocular stereoscopic vision camera |
CN217820971U (en) | 2022-07-27 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | Optical fiber adapter based on superlens |
CN217982120U (en) | 2022-07-27 | 2022-12-06 | 深圳迈塔兰斯科技有限公司 | Optical system of binocular structured light 3D camera and binocular structured light 3D camera |
CN217639920U (en) | 2022-07-29 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Point cloud projection device and measuring module comprising same |
CN217820839U (en) | 2022-07-29 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | 3D-ToF emission module and depth camera comprising same |
CN217821058U (en) | 2022-08-01 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | TOF lens and imaging system |
CN217639613U (en) | 2022-08-01 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Super lens group and optical system comprising same |
CN217639724U (en) | 2022-08-01 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Dark field microscope |
CN217639720U (en) | 2022-08-01 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Failure analysis microscope |
CN217820945U (en) | 2022-08-01 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | Contour extraction enhancement system and imaging system |
CN217639726U (en) | 2022-08-02 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Light sheet microscopic device and sample detection system |
CN217639725U (en) | 2022-08-02 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Dark field microscopic system based on super surface |
CN115236795B (en) | 2022-08-02 | 2024-03-08 | 深圳迈塔兰斯科技有限公司 | Super-surface manufacturing method and optical fiber end face super-surface |
CN115268058A (en) | 2022-08-03 | 2022-11-01 | 深圳迈塔兰斯科技有限公司 | Phase-controlled metamaterial body, phase-controlled metamaterial device and radiation modulation method |
CN217639778U (en) | 2022-08-03 | 2022-10-21 | 深圳迈塔兰斯科技有限公司 | Head-up display and vehicle comprising same |
CN217821071U (en) | 2022-08-04 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | Two-photon microscope and sample detection system |
CN217821236U (en) | 2022-08-05 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | Projection imaging device and projection imaging system |
CN217821680U (en) | 2022-08-05 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | Iris imaging system based on superlens, iris detection device and mobile terminal |
CN217821110U (en) | 2022-08-05 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | Augmented reality system and display device comprising same |
CN217821111U (en) | 2022-08-10 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | Time multiplexing display device and AR glasses based on optical waveguide |
CN217821068U (en) | 2022-08-11 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | Large-view-field microscopic imaging device and article detection system |
CN217981833U (en) | 2022-08-12 | 2022-12-06 | 深圳迈塔兰斯科技有限公司 | ToF emission module and electronic equipment comprising same |
CN217820943U (en) | 2022-08-12 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | ToF emission module and electronic equipment comprising same |
CN217821160U (en) | 2022-08-16 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | Terahertz modulation unit, terahertz modulator and radar transmitting system |
CN217982089U (en) | 2022-08-17 | 2022-12-06 | 深圳迈塔兰斯科技有限公司 | Light filling lamp and monitoring system comprising same |
CN115164714A (en) | 2022-08-18 | 2022-10-11 | 深圳迈塔兰斯科技有限公司 | Interference system |
CN217821113U (en) | 2022-08-18 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | Augmented reality head-up display system and vehicle |
CN217820944U (en) | 2022-08-24 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | Vehicle-mounted projection device and vehicle with same |
CN217982020U (en) | 2022-08-24 | 2022-12-06 | 深圳迈塔兰斯科技有限公司 | AR glasses with adjustable illuminance |
CN217902222U (en) | 2022-08-24 | 2022-11-25 | 深圳迈塔兰斯科技有限公司 | Code reader optical system based on super lens and code reader |
CN115343795B (en) | 2022-08-25 | 2024-04-30 | 深圳迈塔兰斯科技有限公司 | Diffraction optical waveguide and imaging system |
CN217819022U (en) | 2022-09-01 | 2022-11-15 | 深圳迈塔兰斯科技有限公司 | Terahertz signal receiving module and terahertz imaging device |
CN115390176A (en) | 2022-09-05 | 2022-11-25 | 深圳迈塔兰斯科技有限公司 | Terahertz polarization conversion unit and terahertz polarization converter |
CN217984044U (en) | 2022-09-13 | 2022-12-06 | 深圳迈塔兰斯科技有限公司 | Terahertz radiation source and terahertz transceiving system |
CN115332917A (en) | 2022-09-13 | 2022-11-11 | 深圳迈塔兰斯科技有限公司 | Terahertz source and terahertz detector |
CN115421295A (en) | 2022-09-14 | 2022-12-02 | 深圳迈塔兰斯科技有限公司 | Design method of super lens, super lens and processing technology |
CN217902220U (en) | 2022-09-14 | 2022-11-25 | 深圳迈塔兰斯科技有限公司 | Tomography system based on superlens |
CN115327865A (en) | 2022-09-14 | 2022-11-11 | 深圳迈塔兰斯科技有限公司 | Photoetching process for processing transparent substrate |
CN217981991U (en) | 2022-09-21 | 2022-12-06 | 深圳迈塔兰斯科技有限公司 | Dental imaging device |
CN217981992U (en) | 2022-09-22 | 2022-12-06 | 深圳迈塔兰斯科技有限公司 | Telescope objective and telescope based on super lens |
CN217982038U (en) | 2022-09-22 | 2022-12-06 | 深圳迈塔兰斯科技有限公司 | Monocular structure light emission module based on super lens and structured light system |
CN115524874A (en) | 2022-10-14 | 2022-12-27 | 深圳迈塔兰斯科技有限公司 | Optical encryption structure, optical encryption method and device |
CN115453754A (en) | 2022-10-18 | 2022-12-09 | 深圳迈塔兰斯科技有限公司 | Super-surface phase coefficient optimization method and device and electronic equipment |
-
2020
- 2020-07-24 US US16/938,823 patent/US11978752B2/en active Active
- 2020-07-24 EP EP20847649.9A patent/EP4004608A4/en active Pending
- 2020-07-24 CN CN202080060755.4A patent/CN114286953A/en active Pending
- 2020-07-24 KR KR1020227006332A patent/KR20220035971A/en unknown
- 2020-07-24 JP JP2022505416A patent/JP2022542172A/en active Pending
- 2020-07-24 WO PCT/US2020/043600 patent/WO2021021671A1/en unknown
-
2021
- 2021-09-14 US US17/475,149 patent/US20220052093A1/en active Pending
-
2024
- 2024-02-05 US US18/433,269 patent/US20240234461A1/en active Pending
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008020899A2 (en) | 2006-04-17 | 2008-02-21 | Cdm Optics, Inc. | Arrayed imaging systems and associated methods |
EP2631740A2 (en) | 2012-02-22 | 2013-08-28 | Ming Fong | System for reproducing virtual objects |
US9482796B2 (en) * | 2014-02-04 | 2016-11-01 | California Institute Of Technology | Controllable planar optical focusing system |
US20170310907A1 (en) | 2016-04-20 | 2017-10-26 | Microsoft Technology Licensing, Llc | Flat lens imaging devices and systems |
US20180045953A1 (en) * | 2016-04-29 | 2018-02-15 | The Board Of Trustees Of The Leland Stanford Junior University | Device components formed of geometric structures |
WO2018204856A1 (en) | 2017-05-04 | 2018-11-08 | President And Fellows Of Harvard College | Meta-lens doublet for aberration correction |
US20190064532A1 (en) * | 2017-08-31 | 2019-02-28 | Metalenz, Inc. | Transmissive Metasurface Lens Integration |
US20190086579A1 (en) * | 2017-09-21 | 2019-03-21 | Samsung Electronics Co., Ltd. | Meta-surface optical element and method of manufacturing the same |
US20190044003A1 (en) | 2018-03-21 | 2019-02-07 | Intel Corporation | Optical receiver employing a metasurface collection lens |
Non-Patent Citations (3)
Title |
---|
AMIR ARBABI ET AL., MINIATURE OPTICAL PLANAR CAMERA BASED ON A WIDE-ANGLE MEATSURFACE DOUBLET CORRECTED FOR MONOCHROMATIC ABERRATIONS |
See also references of EP4004608A4 |
ZHOU, YI AND RUI CHEN AND YUNGUI MA: "Characteristic Analysis of Compact Spectrometer Based on Off-Axis Meta-Lens", APPL. SCI., vol. 8, no. 321, 2018, pages 1 - 11, XP055791072, Retrieved from the Internet <URL:https://www.mdpi.com/2076-3417/8/3/321/htm> [retrieved on 20200928], DOI: 10.3390/app8030321 * |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11579456B2 (en) | 2017-08-31 | 2023-02-14 | Metalenz, Inc. | Transmissive metasurface lens integration |
US11988844B2 (en) | 2017-08-31 | 2024-05-21 | Metalenz, Inc. | Transmissive metasurface lens integration |
US11978752B2 (en) | 2019-07-26 | 2024-05-07 | Metalenz, Inc. | Aperture-metasurface and hybrid refractive-metasurface imaging systems |
EP4300939A4 (en) * | 2021-04-07 | 2024-08-21 | Samsung Electronics Co Ltd | Camera comprising meta lens and wearable electronic device comprising same camera |
WO2023283270A1 (en) * | 2021-07-07 | 2023-01-12 | Qualcomm Incorporated | Meta-lens systems and techniques |
WO2023179152A1 (en) * | 2022-03-24 | 2023-09-28 | 深圳迈塔兰斯科技有限公司 | Optical system design method and apparatus |
US11927769B2 (en) | 2022-03-31 | 2024-03-12 | Metalenz, Inc. | Polarization sorting metasurface microlens array device |
Also Published As
Publication number | Publication date |
---|---|
EP4004608A1 (en) | 2022-06-01 |
JP2022542172A (en) | 2022-09-29 |
US20240234461A1 (en) | 2024-07-11 |
US20210028215A1 (en) | 2021-01-28 |
KR20220035971A (en) | 2022-03-22 |
CN114286953A (en) | 2022-04-05 |
US20220052093A1 (en) | 2022-02-17 |
US11978752B2 (en) | 2024-05-07 |
EP4004608A4 (en) | 2023-08-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US11978752B2 (en) | Aperture-metasurface and hybrid refractive-metasurface imaging systems | |
US11567240B2 (en) | Multilayered meta lens and optical apparatus including the same | |
KR101228658B1 (en) | Camera module, array based thereon, and method for the production thereof | |
US5751492A (en) | Diffractive/Refractive lenslet array incorporating a second aspheric surface | |
CN110061018B (en) | Monolithic integration of plenoptic lenses on photosensor substrates | |
US7587109B1 (en) | Hybrid fiber coupled artificial compound eye | |
EP1987379B1 (en) | Intergrated lens system for image sensor and method for manufacturing the same | |
US8953087B2 (en) | Camera system and associated methods | |
US9817158B2 (en) | Gradient index lens for infrared imaging | |
KR101642168B1 (en) | Variable power optical system | |
US5696371A (en) | Diffractive/refractive lenslet array | |
US9448104B2 (en) | Imaging optics and optical device for mapping a curved image field | |
US20150177496A1 (en) | Apparatus comprising a compact telescope | |
JP5580207B2 (en) | Wafer scale package and manufacturing method thereof, and optical device and manufacturing method thereof | |
EP2044629A2 (en) | Camera system and associated methods | |
US20100171866A1 (en) | Multiscale Optical System | |
US8391705B2 (en) | Folded optic, camera system including the same, and associated methods | |
KR20060119020A (en) | Wafer scale lens and optical system having the same | |
US10782513B2 (en) | Total internal reflection aperture stop imaging | |
WO2000052762A1 (en) | Multicolor detector and focal plane array using diffractive lenses | |
KR100332018B1 (en) | Image sensing module | |
JP2021096283A (en) | Lens system | |
KR100798864B1 (en) | Image sensor and manufacturing method thereof and camera module having the image sensor | |
JP2004336228A (en) | Lens array system | |
TW202427012A (en) | Multi-element wide-field lens for wafer-assembled chip-cube cameras |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 20847649 Country of ref document: EP Kind code of ref document: A1 |
|
ENP | Entry into the national phase |
Ref document number: 2022505416 Country of ref document: JP Kind code of ref document: A |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
ENP | Entry into the national phase |
Ref document number: 20227006332 Country of ref document: KR Kind code of ref document: A |
|
ENP | Entry into the national phase |
Ref document number: 2020847649 Country of ref document: EP Effective date: 20220228 |