WO2018211910A1 - Film conducteur transparent et dispositif d'affichage d'image - Google Patents

Film conducteur transparent et dispositif d'affichage d'image Download PDF

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Publication number
WO2018211910A1
WO2018211910A1 PCT/JP2018/016325 JP2018016325W WO2018211910A1 WO 2018211910 A1 WO2018211910 A1 WO 2018211910A1 JP 2018016325 W JP2018016325 W JP 2018016325W WO 2018211910 A1 WO2018211910 A1 WO 2018211910A1
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WIPO (PCT)
Prior art keywords
transparent conductive
layer
conductive layer
optical adjustment
transparent
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PCT/JP2018/016325
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English (en)
Japanese (ja)
Inventor
徹 梅本
仁志 西嶋
尚樹 橋本
鷹尾　寛行
Original Assignee
日東電工株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 日東電工株式会社 filed Critical 日東電工株式会社
Priority to CN201880032554.6A priority Critical patent/CN110636943B/zh
Priority to KR1020197030564A priority patent/KR102547456B1/ko
Publication of WO2018211910A1 publication Critical patent/WO2018211910A1/fr

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02—Physical, chemical or physicochemical properties
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/044—Forming conductive coatings; Forming coatings having anti-static properties
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
    • H01B13/0026—Apparatus for manufacturing conducting or semi-conducting layers, e.g. deposition of metal
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports

Definitions

  • the present invention relates to a transparent conductive film and an image display device including the same.
  • an image display device including a touch panel and an image display element includes a film for a touch panel in which a transparent conductive layer made of indium tin composite oxide (ITO) is formed on a transparent substrate.
  • a touch panel film for example, Patent Document 1 discloses a double-sided transparent conductive film in which ITO layers are disposed on both sides of a transparent substrate.
  • an image display element such as a liquid crystal cell generates an electromagnetic wave
  • an electromagnetic wave shielding effect for shielding the electromagnetic wave is desired for the image display device.
  • the ITO structure in which two ITO films are arranged to face each other has an electromagnetic wave shielding effect (see, for example, Non-Patent Document 1).
  • Non-Patent Document 1 describes that in order to reduce the resistance value of the ITO film, it is necessary to increase the thickness of the ITO film, but as a result, the light transmittance decreases. Further, it is described that if only one ITO film has a low resistance value (for example, about 10 ⁇ ), even if the other ITO film has a high resistance value, there is a good electromagnetic shielding effect.
  • Non-Patent Document 1 shows that a light transmission can be achieved while reducing the resistance value of only one ITO film and increasing the resistance value of the other ITO film while exhibiting a good electromagnetic shielding effect. It is disclosed that the rate reduction can be suppressed.
  • the two ITO layers arranged on both sides are etched into the electrode pattern shape.
  • an optical adjustment layer is provided between an ITO layer and a transparent base material.
  • the double-sided transparent conductive film further includes an optical adjustment layer, the light transmittance is lowered.
  • the present invention provides a transparent conductive film and an image display device having an electromagnetic wave shielding effect and having good light transmittance while suppressing visual recognition of an electrode pattern.
  • the present invention [1] comprises a first transparent conductive layer, a first optical adjustment layer, a transparent substrate, a second optical adjustment layer and a second transparent conductive layer in this order, and the surface resistance value of the second transparent conductive layer is: It is larger than the surface resistance value of the first transparent conductive layer, the surface resistance value of the first transparent conductive layer is 10 ⁇ / ⁇ or more and 70 ⁇ / ⁇ or less, and the surface resistance value of the second transparent conductive layer is The refractive index of the second optical adjustment layer is 50 ⁇ / ⁇ or more and 150 ⁇ / ⁇ or less, and includes a transparent conductive film that is smaller than the refractive index of the first optical adjustment layer.
  • the present invention [2] includes the transparent conductive film according to [1], wherein the thickness of the second transparent conductive layer is thinner than the thickness of the first transparent conductive layer.
  • the refractive index of the first optical adjustment layer is 1.65 or more and 1.75 or less
  • the refractive index of the second optical adjustment layer is 1.60 or more and 1.70 or less.
  • the transparent conductive film described in [1] or [2] is included.
  • the thicknesses of the first optical adjustment layer and the second optical adjustment layer are both 100 nm or less.
  • the transparent conductive film of description is included.
  • the first transparent conductive layer and the second transparent conductive layer are both patterned, and the first transparent conductive layer has a first pattern that is long in one direction, and the second transparent conductive layer
  • the conductive layer includes a second pattern that is long in an orthogonal direction orthogonal to the one direction, and the one-direction length of the first pattern is longer than the orthogonal direction length of the second pattern [1] to [4]
  • the transparent conductive film as described in any one of these is included.
  • the present invention [6] includes the transparent conductive film according to any one of [1] to [5] and an image display element disposed on the first transparent conductive layer side of the transparent conductive film.
  • An image display device is provided.
  • the first transparent conductive layer, the first optical adjustment layer, the transparent substrate, the second optical adjustment layer, and the second transparent conductive layer are provided in this order. For this reason, when the 1st transparent conductive layer and the 2nd transparent conductive layer are patterned, the visual recognition of the 1st transparent conductive layer and the 2nd transparent conductive layer can be controlled.
  • the transparent conductive film since the surface resistance value of the first transparent conductive layer is 10 ⁇ / ⁇ or more and 70 ⁇ / ⁇ or less, the transparent conductive film includes a transparent conductive layer having a small surface resistance value. For this reason, a transparent conductive film can express a favorable electromagnetic wave shielding effect.
  • the second transparent conductive layer is replaced with the first transparent conductive layer. It can be made thinner than the layer.
  • the refractive index of the second optical adjustment layer is lower than the refractive index of the first optical adjustment layer.
  • the image display device of the present invention has an electromagnetic wave shielding effect, and has good light transmittance while suppressing visual recognition of the patterned first transparent conductive layer and second transparent conductive layer.
  • FIG. 1 shows a cross-sectional view of one embodiment of the transparent conductive film of the present invention.
  • FIG. 1 shows a cross-sectional view of a film for a touch panel obtained by patterning the transparent conductive film shown in FIG. 3A to 3B are the touch panel films shown in FIG. 3, in which FIG. 3A is a plan view showing an electrode pattern of the first transparent conductive layer, and FIG. 3B is a bottom view showing the electrode pattern of the second transparent conductive layer.
  • FIG. 4 shows an image display apparatus provided with the transparent conductive film shown in FIG. 5A to 5B are modifications of the film for a touch panel according to the present invention (the electrode pattern of the transparent conductive layer includes a plurality of continuous rectangular patterns), and FIG. 5A illustrates the electrode of the first transparent conductive layer.
  • FIG. 5B is a plan view showing the pattern
  • FIG. 5B is a bottom view showing the electrode pattern of the second transparent conductive layer.
  • the vertical direction of the paper is the vertical direction (thickness direction, first direction)
  • the upper side of the paper is the upper side (one side in the thickness direction, the first direction)
  • the lower side of the paper is the lower side (thickness direction).
  • the left and right direction on the paper is the left and right direction (second direction, orthogonal direction orthogonal to the first direction)
  • the left side of the paper is the left side (one side in the second direction)
  • the right side of the paper is the right side (the other in the second direction).
  • Side the left and right direction on the paper is the left and right direction (second direction, orthogonal direction orthogonal to the first direction)
  • the paper thickness direction is the depth direction (the orthogonal direction orthogonal to the third direction, the first direction, and the second direction), the front side of the paper is the front side (one side in the third direction), and the back side of the paper is the rear side. This is the side (the other side in the third direction). Specifically, it conforms to the direction arrow in each figure.
  • the transparent conductive film 1 has a film shape (including a sheet shape) having a predetermined thickness, extends in a predetermined direction (surface direction) orthogonal to the thickness direction, and has a flat upper surface and a flat lower surface. .
  • the transparent conductive film 1 is a component for producing, for example, a base material for a touch panel provided in the image display device, that is, it is not an image display device. That is, the transparent conductive film 1 is an industrially available device that does not include an image display element such as a liquid crystal cell and is distributed alone as a component.
  • the transparent conductive film 1 includes a transparent substrate 2, a first hard coat layer 3 disposed on the upper surface (one surface) of the transparent substrate 2, and a first hard The first optical adjustment layer 4 disposed on the upper surface of the coat layer 3, the first transparent conductive layer 5 disposed on the upper surface of the first optical adjustment layer 4, and the lower surface (the other surface) of the transparent substrate 2.
  • the transparent conductive film 1 includes, in order from the bottom, the second transparent conductive layer 8, the second optical adjustment layer 7, the second hard coat layer 6, the transparent substrate 2, the first hard coat layer 3, and the first optical adjustment.
  • a layer 4 and a first transparent conductive layer 5 are provided.
  • the transparent conductive film 1 preferably has a second transparent conductive layer 8, a second optical adjustment layer 7, a second hard coat layer 6, a transparent substrate 2, a first hard coat layer 3, a first optical adjustment layer 4 and It consists of a first transparent conductive layer 5.
  • a second transparent conductive layer 8 preferably has a second transparent conductive layer 8, a second optical adjustment layer 7, a second hard coat layer 6, a transparent substrate 2, a first hard coat layer 3, a first optical adjustment layer 4 and It consists of a first transparent conductive layer 5.
  • each layer will be described in detail.
  • the transparent substrate 2 is a substrate that ensures the mechanical strength of the transparent conductive film 1.
  • the transparent substrate 2 includes the first transparent conductive layer 5 and the second transparent conductive layer 8 together with the first hard coat layer 3, the second hard coat layer 6, the first optical adjustment layer 4, and the second optical adjustment layer 7. I support it.
  • the transparent substrate 2 is, for example, a polymer film having transparency.
  • the material of the polymer film include polyester resins such as polyethylene terephthalate (PET), polybutylene terephthalate, and polyethylene naphthalate, for example, (meth) acrylic resins (acrylic resin and / or methacrylic resin) such as polymethacrylate, Olefin resins such as polyethylene, polypropylene, cycloolefin polymer (COP), for example, polycarbonate resin, polyether sulfone resin, polyarylate resin, melamine resin, polyamide resin, polyimide resin, cellulose resin, polystyrene resin, norbornene resin, etc. It is done.
  • the polymer film can be used alone or in combination of two or more.
  • an olefin resin is used, and more preferably, COP is used.
  • the thickness of the transparent substrate 2 is, for example, 2 ⁇ m or more, preferably 20 ⁇ m or more, for example, 300 ⁇ m or less, preferably from the viewpoints of mechanical strength, scratch resistance, and spot characteristics of the touch panel film 1a. 150 ⁇ m or less.
  • the thickness of the transparent substrate 2 can be measured using, for example, a micro gauge thickness gauge.
  • an easily bonding layer, an adhesive layer, etc. may be provided in the upper surface and / or lower surface of the transparent base material 2 as needed.
  • the first hard coat layer 3 is an abrasion protective layer for making the transparent conductive film 1 less susceptible to abrasion.
  • the first hard coat layer 3 has a film shape, and is disposed, for example, on the entire upper surface of the transparent substrate 2 so as to be in contact with the upper surface of the transparent substrate 2. More specifically, the first hard coat layer 3 is in contact with the upper surface of the transparent substrate 2 and the lower surface of the first optical adjustment layer 4 between the transparent substrate 2 and the first optical adjustment layer 4. Have been placed.
  • the first hard coat layer 3 is formed of, for example, a hard coat composition.
  • the hard coat composition of the first hard coat layer 3 contains a resin, and preferably consists only of a resin.
  • the resin examples include a curable resin, a thermoplastic resin (for example, a polyolefin resin), and preferably a curable resin.
  • the curable resin examples include an active energy ray-curable resin that is cured by irradiation with active energy rays (specifically, ultraviolet rays, electron beams, etc.), for example, a thermosetting resin that is cured by heating, and the like.
  • active energy ray curable resin is used.
  • Examples of the active energy ray-curable resin include a polymer having a functional group having a polymerizable carbon-carbon double bond in the molecule.
  • Examples of such a functional group include a vinyl group and a (meth) acryloyl group (methacryloyl group and / or acryloyl group).
  • active energy ray curable resin examples include (meth) acrylic ultraviolet curable resins such as urethane acrylate and epoxy acrylate.
  • examples of the curable resin other than the active energy ray curable resin include thermosetting resins such as urethane resin, melamine resin, alkyd resin, siloxane polymer, and organic silane condensate.
  • Resins can be used alone or in combination of two or more.
  • the hard coat composition can contain particles. Thereby, the 1st hard-coat layer 3 can be made into the anti blocking layer which has an anti-blocking characteristic.
  • Examples of the particles include inorganic particles and organic particles.
  • Examples of the inorganic particles include silica particles, for example, metal oxide particles made of zirconium oxide, titanium oxide, zinc oxide, tin oxide, and the like, for example, carbonate particles such as calcium carbonate.
  • Examples of the organic particles include crosslinked acrylic resin particles. The particles can be used alone or in combination of two or more.
  • the hard coat composition may further contain known additives such as a leveling agent, a thixotropic agent, and an antistatic agent.
  • the refractive index of the first hard coat layer 3 is, for example, 1.40 or more, preferably 1.45 or more, for example, less than 1.60, preferably 1.55 or less. If the 1st hard coat layer 3 is the said range, the refractive index of the 1st hard coat layer 3 can be made lower than the refractive index of the 1st optical adjustment layer 4, and the visual recognition of an electrode pattern is suppressed further. be able to.
  • the refractive indexes of the hard coat layers can be measured using, for example, a spectroscopic ellipsometer.
  • the thickness of the first hard coat layer 3 is, for example, 0.1 ⁇ m or more, preferably 0.5 ⁇ m or more, and for example, 10 ⁇ m or less, preferably from the viewpoint of scratch resistance and suppression of visual recognition of the electrode pattern. 5 ⁇ m or less.
  • the thickness of the hard code layer (the first hard coat layer 3 and the second hard coat layer 6) can be calculated based on the waveform of the interference spectrum using an instantaneous multi-photometry system ("MCPD2000" manufactured by Otsuka Electronics Co., Ltd.). it can.
  • MCPD2000 instantaneous multi-photometry system
  • the first optical adjustment layer 4 is used to ensure excellent transparency in the transparent conductive film 1 while suppressing the visual recognition of the pattern (for example, electrode pattern) when the first transparent conductive layer 5 is patterned. It is a layer for adjusting the optical properties (for example, refractive index) of the transparent conductive film 1.
  • the first optical adjustment layer 4 has a film shape, and is disposed, for example, on the entire upper surface of the first hard coat layer 3 so as to be in contact with the upper surface of the first hard coat layer 3. More specifically, the first optical adjustment layer 4 is disposed between the first hard coat layer 3 and the first transparent conductive layer 5 on the upper surface of the first hard coat layer 3 and the lower surface of the first transparent conductive layer 5. It is arranged to come into contact.
  • the first optical adjustment layer 4 is formed from an optical adjustment composition.
  • the optical adjustment composition contains, for example, a resin.
  • the optical adjustment composition preferably contains a resin and particles, and more preferably consists only of a resin and particles.
  • resin Although it does not specifically limit as resin, The same thing as resin used with a hard-coat composition is mentioned.
  • the resins can be used alone or in combination of two or more.
  • a curable resin more preferably an active energy ray curable resin is used.
  • the content ratio of the resin is, for example, 10% by mass or more, preferably 25% by mass or more, and, for example, 95% by mass or less, preferably 60% by mass or less with respect to the optical adjustment composition.
  • a suitable material can be selected according to the refractive index required by the first optical adjustment layer 4, and examples thereof include inorganic particles and organic particles.
  • the inorganic particles include silica particles, for example, metal oxide particles made of zirconium oxide, titanium oxide, zinc oxide, oxidation, and the like, for example, carbonate particles such as calcium carbonate.
  • the organic particles include crosslinked acrylic resin particles. The particles can be used alone or in combination of two or more.
  • the particles are preferably inorganic particles, more preferably metal oxide particles, and more preferably zirconium oxide particles (ZnO 2 ).
  • the average particle diameter (median diameter) of the particles is, for example, 10 nm or more, preferably 20 nm or more, and for example, 100 nm or less, preferably 50 nm or less.
  • the content ratio of the particles is, for example, 5% by mass or more, preferably 40% by mass or more, and, for example, 90% by mass or less, preferably 75% by mass or less with respect to the optical adjustment composition.
  • the refractive index of the first optical adjustment layer 4 is higher than the refractive index of the second optical adjustment layer 7, and is, for example, 1.65 or more, preferably 1.70 or more.
  • the upper limit is, for example, 1.80 or less, preferably 1.75 or less. If the refractive index of the 1st optical adjustment layer 4 is the said range, the light transmittance of the transparent conductive film 1 can be made still more favorable.
  • the refractive index of the optical adjustment layer (the first optical adjustment layer 4 and the second optical configuration layer 7) can be measured using, for example, a spectroscopic ellipsometer.
  • the thickness of the first optical adjustment layer 4 is, for example, 150 nm or less, preferably 100 nm or less, more preferably 85 nm or less, and for example, 10 nm or more, preferably 20 nm or more. If the thickness of the first optical adjustment layer 4 is not more than the above upper limit, the hue of the transparent conductive film 1 (particularly, the color space of La * b * ) can be more reliably neutral. That is, coloring (for example, yellow) of the transparent conductive film 1 can be reduced, and the colorless and transparent transparent conductive film 1 can be obtained reliably.
  • the thickness of the optical adjustment layer (the first optical adjustment layer 4 and the second optical adjustment layer 7) is calculated based on the waveform of the interference spectrum using, for example, an instantaneous multi-photometry system (“MCPD2000” manufactured by Otsuka Electronics Co., Ltd.). be able to.
  • MCPD2000 instantaneous multi-photometry system
  • the first transparent conductive layer 5 is a transparent conductive layer for forming a predetermined pattern (for example, an electrode pattern) in a subsequent process such as etching.
  • the first transparent conductive layer 5 is the uppermost layer of the transparent conductive film 1 and has a film shape.
  • the first transparent conductive layer 5 is in contact with the entire upper surface of the first optical adjustment layer 4 and the upper surface of the first optical adjustment layer 4. So that it is arranged.
  • the material of the first transparent conductive layer 5 is, for example, at least selected from the group consisting of In, Sn, Zn, Ga, Sb, Ti, Si, Zr, Mg, Al, Au, Ag, Cu, Pd, and W.
  • a metal oxide containing one kind of metal can be given. If necessary, the metal oxide may be further doped with a metal atom shown in the above group.
  • the material of the first transparent conductive layer 5 is preferably an indium-containing oxide such as indium-tin composite oxide (ITO), for example, an antimony-containing oxide such as antimony-tin composite oxide (ATO). More preferably, an indium-containing oxide is used, and more preferably, ITO is used. Thereby, the 1st transparent conductive layer 5 can make the outstanding transparency and electroconductivity compatible.
  • ITO indium-tin composite oxide
  • ATO antimony-containing oxide
  • the tin oxide (SnO 2 ) content is, for example, 0.5% by mass or more with respect to the total amount of tin oxide and indium oxide (In 2 O 3 ).
  • the amount is preferably 3% by mass or more, and for example, 15% by mass or less, preferably 13% by mass or less.
  • ITO may be a composite oxide containing at least indium (In) and tin (Sn), and may contain additional components other than these.
  • additional component include metal elements other than In and Sn. Specifically, Zn, Ga, Sb, Ti, Si, Zr, Mg, Al, Au, Ag, Cu, Pd, W, Fe , Pb, Ni, Nb, Cr, Ga and the like.
  • the first transparent conductive layer 5 may be either crystalline or amorphous.
  • the first transparent conductive layer 5 is preferably made of a crystalline material, more specifically, a crystalline ITO layer. Thereby, the transparency of the 1st transparent conductive layer 5 can be improved, and the surface resistance value of the 1st transparent conductive layer 5 can be reduced further.
  • the transparent conductive layers are crystalline.
  • the transparent conductive layer is an ITO layer
  • the hydrochloric acid concentration 5% by mass
  • the ITO layer is crystalline when the resistance between terminals between 15 mm is 10 k ⁇ or less after immersion, washing and drying in hydrochloric acid (20 ° C., concentration: 5 mass%).
  • the surface resistance value of the first transparent conductive layer 5 is lower than the surface resistance value of the second transparent conductive layer 8, specifically 10 ⁇ / ⁇ or more and 70 ⁇ / ⁇ or less. Preferably, it is 20 ⁇ / ⁇ or more, more preferably 30 ⁇ / ⁇ or more, preferably 60 ⁇ / ⁇ or less, more preferably 50 ⁇ / ⁇ or less. If the surface resistance value of the 1st transparent conductive layer 5 is the said range, the transparent conductive film 1 can express the outstanding electromagnetic wave shielding property and electroconductivity.
  • the surface resistance value of the transparent conductive layer (the first transparent conductive layer 5 and the second transparent conductive layer 8) can be measured using, for example, a four-terminal method.
  • the thickness of the first transparent conductive layer 5 is preferably greater than the thickness of the second transparent conductive layer 8, for example, 30 nm or more, preferably 35 nm or more, and, for example, 200 nm or less, preferably 100 nm or less. More preferably, it is 60 nm or less. If the thickness of the 1st transparent conductive layer 5 is the said range, the electromagnetic wave shielding property of the transparent conductive film 1 can be made still better.
  • the thickness of the transparent conductive layer (the first transparent conductive layer 5 and the second transparent conductive layer 8) can be measured, for example, by observing the cross section of the transparent conductive layer with a transmission electron microscope (TEM).
  • TEM transmission electron microscope
  • the second hard coat layer 6 is a scratch protective layer for making it difficult to cause scratches on the transparent conductive film 1.
  • the second hard coat layer 6 has a film shape, and is disposed, for example, on the entire lower surface of the transparent substrate 2 so as to be in contact with the lower surface of the transparent substrate 2. More specifically, the second hard coat layer 6 is in contact with the lower surface of the transparent substrate 2 and the upper surface of the second optical adjustment layer 7 between the transparent substrate 2 and the second optical adjustment layer 7. Have been placed.
  • the second hard coat layer 6 is the same layer as the first hard coat layer 3, and has the same configuration (thickness, refractive index, etc.) from the same material as the first hard coat layer 3, for example. Therefore, the second hard coat layer 6 also has the same shape and the same dimensions as the first hard coat layer 3.
  • the second optical adjustment layer 7 When the second optical adjustment layer 7 patterns the second transparent conductive layer 8, the second optical adjustment layer 7 suppresses the visual recognition of the pattern (for example, the electrode pattern) and secures excellent transparency in the transparent conductive film 1. It is a layer for adjusting the optical properties (for example, refractive index) of the transparent conductive film 1.
  • the second optical adjustment layer 7 has a film shape and is disposed, for example, on the entire lower surface of the second hard coat layer 6 so as to be in contact with the lower surface of the second hard coat layer 6. More specifically, the second optical adjustment layer 7 includes a lower surface of the second hard coat layer 6 and an upper surface of the second transparent conductive layer 8 between the second hard coat layer 6 and the second transparent conductive layer 8. It is arranged to come into contact.
  • the second optical adjustment layer 7 is formed from an optical adjustment composition.
  • Examples of the optical adjustment composition include those similar to those described above for the first optical adjustment layer 4.
  • the refractive index of the second optical adjustment layer 7 is lower than the refractive index of the first optical adjustment layer 4, for example, 1.70 or less, preferably less than 1.65, more preferably 1.64 or less. is there.
  • the lower limit is, for example, 1.55 or more, preferably 1.60 or more. If the refractive index of the 2nd optical adjustment layer 7 is the said range, the light transmittance of the transparent conductive film 1 can be made still more favorable.
  • the difference in refractive index between the second optical adjustment layer 7 and the first optical adjustment layer 4 is, for example, 0.01 or more, preferably 0.05 or more, and for example, 0.20 or less, preferably 0.15 or less. If the difference in refractive index is within the above range, the transparency of the transparent conductive film 1 can be improved and the hue can be neutral.
  • the thickness of the second optical adjustment layer 7 is, for example, 150 nm or less, preferably 100 nm or less, more preferably 85 nm or less, and for example, 10 nm or more, preferably 20 nm or more. If the thickness of the second optical adjustment layer 7 is less than or equal to the above upper limit, the hue can be more neutralized.
  • the second transparent conductive layer 8 is a transparent conductive layer for forming a predetermined pattern (for example, an electrode pattern) in a subsequent process such as etching.
  • the second transparent conductive layer 8 is the lowermost layer of the transparent conductive film 1, has a film shape, and is in contact with the lower surface of the second optical adjustment layer 7 on the entire lower surface of the second optical adjustment layer 7. Is arranged.
  • the material constituting the second transparent conductive layer 8 examples include the same materials as those described above for the first transparent conductive layer 5. ITO is preferable.
  • the second transparent conductive layer 8 may be crystalline or amorphous, but is preferably made of a crystalline material, more specifically, a crystalline ITO layer.
  • the surface resistance value of the second transparent conductive layer 8 is higher than the surface resistance value of the first transparent conductive layer 5, specifically, 50 ⁇ / ⁇ or more and 150 ⁇ / ⁇ or less. Preferably, it is 60 ⁇ / ⁇ or more, more preferably 70 ⁇ / ⁇ or more, still more preferably 100 ⁇ / ⁇ or more, and preferably 120 ⁇ / ⁇ or less. If the surface resistance value of the 2nd transparent conductive layer 8 is the said range, the thickness of the 2nd transparent conductive layer 8 can be made thin, and the light transmittance of the transparent conductive film 1 can be made favorable.
  • the difference in the surface resistance value between the first transparent conductive layer 5 and the second transparent conductive layer 8 is, for example, 10 ⁇ / ⁇ or more, preferably 20 ⁇ / ⁇ or more, more preferably 40 ⁇ / ⁇ or more. 100 ⁇ / ⁇ or less, preferably 70 ⁇ / ⁇ or less.
  • the thickness of the second transparent conductive layer 8 is preferably thinner than the thickness of the first transparent conductive layer 5, for example, 35 nm or less, preferably 30 nm or less, and for example, 1 nm or more, preferably 10 nm or more. It is. If the thickness of the 2nd transparent conductive layer 8 is the said range, the light transmittance of the transparent conductive film 1 can be made still more favorable.
  • a transparent substrate 2 is prepared, and then a hard coat layer (first hard coat layer 3 and Second hard coat layer 6), optical adjustment layer (first optical adjustment layer 4 and second optical adjustment layer 7) and transparent conductive layer (first transparent conductive layer 5 and second transparent conductive layer 8) are provided in this order.
  • a diluted solution is prepared by diluting a hard coat composition for forming the first hard coat layer 3 or the second hard coat layer 6 with a solvent. Subsequently, the diluted solution is applied to the upper or lower surface of the transparent substrate 2, each diluted solution is dried, and the hard coat composition is cured as necessary. As a result, the first hard coat layer 3 is provided on the upper surface of the transparent substrate 2, and the second hard coat layer 6 is provided on the lower surface of the transparent substrate 2.
  • a diluted solution is prepared by diluting the optical adjustment composition forming the first optical adjustment layer 4 or the second optical adjustment layer 7 with a solvent. Subsequently, the diluted solution is applied to the upper surface of the first hard coat layer 3 or the lower surface of the second hard coat layer 6, each diluted solution is dried, and the optical adjustment composition is cured as necessary.
  • the first optical adjustment layer 4 is provided on the upper surface of the first hard coat layer 3, and the second optical adjustment layer 7 is provided on the lower surface of the second hard coat layer 6. That is, a laminate of the second optical adjustment layer 7 / second hard coat layer 6 / transparent substrate 2 / first hard coat layer 3 / first optical adjustment layer 4 is obtained.
  • the first transparent conductive layer 5 and the second transparent conductive layer 8 are sequentially formed on both surfaces of the laminate by a dry method.
  • Examples of the dry method include a vacuum deposition method, a sputtering method, and an ion plating method.
  • a sputtering method is used.
  • a thin transparent conductive layer can be formed by this method.
  • Examples of the sputtering method include a bipolar sputtering method, an ECR (electron cyclotron resonance) sputtering method, a magnetron sputtering method, and an ion beam sputtering method.
  • a magnetron sputtering method is preferable.
  • examples of the target material include the above-described metal oxides constituting the transparent conductive layer, and preferably ITO.
  • the tin oxide concentration of ITO is, for example, 0.5% by mass or more, preferably 3% by mass or more, and, for example, 15% by mass or less, preferably from the viewpoint of durability and crystallization of the ITO layer. 13 mass% or less.
  • the gas examples include an inert gas such as Ar.
  • reactive gas such as oxygen gas, can be used together as needed.
  • the flow rate ratio (sccm) of the reactive gas is not particularly limited.
  • the flow rate ratio of the sputtering gas and the reactive gas is, for example, 0.1 flow% or more and 5 flow% or less. It is.
  • the atmospheric pressure during sputtering is, for example, 1 Pa or less, preferably 0.1 Pa or more and 0.7 Pa or less, from the viewpoint of suppressing a decrease in sputtering rate, discharge stability, or the like.
  • the power source may be, for example, any of a DC power source, an AC power source, an MF power source, and an RF power source, or a combination thereof.
  • the surface resistance value of each transparent conductive layer can be adjusted by separately adjusting the thicknesses of the first transparent conductive layer 5 and the second transparent conductive layer 8 provided in the laminate. That is, by increasing the thickness of the transparent conductive layer, the surface resistance value can be lowered, and conversely, by reducing the thickness of the transparent conductive layer, the surface resistance value can be increased.
  • the formation of each transparent conductive layer is adjusted so that the thickness of the second transparent conductive layer 8 is thinner than the thickness of the first transparent conductive layer 5.
  • the second transparent conductive layer 8, the second optical adjustment layer 7, the second hard coat layer 6, the transparent substrate 2, the first hard coat layer 3, the first optical adjustment layer 4 and the first transparent conductive layer 5 are formed.
  • the transparent conductive film 1 provided in this order is obtained.
  • the transparent conductive film 1 is then heat-treated in the atmosphere.
  • the heat treatment can be performed using, for example, an infrared heater or an oven.
  • the heating temperature is, for example, 100 ° C. or higher, preferably 120 ° C. or higher, and for example, 200 ° C. or lower, preferably 160 ° C. or lower.
  • the heating time is appropriately determined according to the heating temperature, and is, for example, 10 minutes or more, preferably 30 minutes or more, and for example, 5 hours or less, preferably 3 hours or less.
  • each transparent conductive layer can be crystallized to obtain a desired surface resistance value.
  • each layer can be provided with respect to the transparent base material 2, for example by a roll-to-roll system, or a part or all of these layers is provided by a batch system (single-wafer system). You can also
  • the light transmittance (visual sensitivity average transmittance) of the transparent conductive film 1 is, for example, 86.0% or more, and preferably 86.5% or more. If the light transmittance is in the above range, a transparent transparent conductive film 1 can be obtained reliably.
  • the hue La * of the transparent conductive film 1 is, for example, ⁇ 1.5 or more, preferably ⁇ 1.0 or more, and for example, preferably 1.5 or less, preferably 0.5 or less. is there.
  • the hue Lb * is, for example, ⁇ 4.0 or more, preferably ⁇ 0.5 or more, and for example, preferably 4.0 or less, preferably 1.0 or less. If a hue is the said range, the colorless and transparent transparent conductive film 1 can be obtained reliably.
  • the transparent conductive film 1 can be used as a film for a touch panel such as an optical method, an ultrasonic method, a capacitance method, and a resistance film method.
  • a film for a touch panel of a capacitance type specifically, a projection type capacitance type.
  • the touch panel film 1 a includes a transparent substrate 2, a first hard coat layer 3 disposed on the upper surface of the transparent substrate 2, and a first hard coat layer 3 disposed on the upper surface of the first hard coat layer 3.
  • 1 optical adjustment layer 4 patterned first transparent conductive layer 5 a disposed on the upper surface of the first optical adjustment layer 4, second hard coat layer 6 disposed on the lower surface of the transparent substrate 2, and second hard coat
  • the second optical adjustment layer 7 disposed on the lower surface of the layer 6 and the patterned second transparent conductive layer 8a disposed on the lower surface of the second optical adjustment layer 7 are provided.
  • the transparent conductive film 1 includes, in order from the bottom, the patterned second transparent conductive layer 8a, the second optical adjustment layer 7, the second hard coat layer 6, the transparent substrate 2, the first hard coat layer 3, and the first optical.
  • the adjustment layer 4 and the patterning 1st transparent conductive layer 5a are provided.
  • the touch panel film 1a is preferably formed by patterning the second transparent conductive layer 8a, the second optical adjustment layer 7, the second hard coat layer 6, the transparent substrate 2, the first hard coat layer 3, the first optical adjustment layer 4, and It consists of a patterned first transparent conductive layer 5a.
  • the touch panel film 1a has a substantially rectangular shape in plan view that is long in the left-right direction (one direction, long side direction) and short in the front-rear direction (other direction, short side direction).
  • the touch panel film 1a is a patterned transparent conductive film obtained by patterning (patterning) the transparent conductive layer (the first transparent conductive layer 5 and the second transparent conductive layer 8) of the transparent conductive film 1 described above. . Therefore, the second optical adjustment layer 7, the second hard coat layer 6, the transparent substrate 2, the first hard coat layer 3, and the first optical adjustment layer 4 of the touch panel film 1 a are the layers of the transparent conductive film 1 described above. It is the same.
  • the patterning 1st transparent conductive layer 5a is provided with the 1st rectangular pattern 11 extended in the left-right direction as an example of a 1st pattern as an example of a 1st pattern in planar view substantially center part, as shown to FIG. 3A.
  • the patterned first transparent conductive layer 5a includes a plurality of first rectangular patterns 11 that are spaced apart from each other in the front-rear direction.
  • a wiring 12 for electrically connecting the first rectangular pattern 11 to an integrated circuit (not shown) is integrally connected to the right end of the first rectangular pattern 11.
  • the patterning second transparent conductive layer 8a has, as an example of the second pattern, a second rectangular pattern 13 that extends long in the front-rear direction (orthogonal direction orthogonal to the left-right direction) at the substantially central portion when viewed from the bottom. It has. Specifically, the patterning second transparent conductive layer 8a includes a plurality of second rectangular patterns 13 arranged at intervals in the left-right direction. Further, a wiring 12 for electrically connecting the second rectangular pattern 13 to an integrated circuit (not shown) is integrally connected to the front end or the rear end.
  • the first rectangular pattern 11 of the patterned first transparent conductive layer 5a and the second rectangular pattern 13 of the patterned second transparent conductive layer 8a are orthogonal to each other when projected in the thickness direction (vertical direction). Has been placed.
  • the length (long side length) of the first rectangular pattern 11 of the patterned first transparent conductive layer 5a is the length (long side length) of the second rectangular pattern 13 of the patterning second transparent conductive layer 8a. Is longer than Thereby, since the surface resistance value of the patterning 1st transparent conductive layer 5a with a long electric current moving distance can be reduced, the current transmission speed of the patterning 1st transparent conductive layer 5a can be improved, or noise can be reduced. Can do. As a result, the size of the image display device 20 can be increased.
  • each transparent conductive layer is covered with a mask for forming an electrode pattern, and each transparent conductive layer is etched with an etching solution.
  • An acid is preferably used as the etching solution.
  • the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid and phosphoric acid, organic acids such as acetic acid, and mixtures thereof, and aqueous solutions thereof.
  • This transparent conductive film 1 includes the first transparent conductive layer 5, the first optical adjustment layer 4, the transparent substrate 2, the second optical adjustment layer 7, and the second transparent conductive layer 8 in this order, and thus the first transparent conductive layer 1
  • the conductive layer 5 and the second transparent conductive layer 8 are patterned, the visibility of the patterned first transparent conductive layer 5a and the patterned second transparent conductive layer 8a (for example, an electrode pattern) can be suppressed.
  • the transparent conductive film 1 since the surface resistance value of the first transparent conductive layer 5 is 10 ⁇ / ⁇ or more and 70 ⁇ / ⁇ or less, the transparent conductive film 1 includes the first transparent conductive layer 5 having a small surface resistance value on one side. For this reason, this transparent conductive film 1 can express a favorable electromagnetic wave shielding property relatively than a transparent conductive film provided with a transparent conductive layer with a high surface resistance on both sides.
  • the surface resistance value of the second transparent conductive layer 8 is larger than the surface resistance value of the first transparent conductive layer 5 and is 50 ⁇ / ⁇ or more and 150 ⁇ / ⁇ or less. It can be made thinner than the transparent conductive layer 5.
  • the refractive index of the second optical adjustment layer 7 is lower than the refractive index of the first optical adjustment layer 4. The light transmittance of the transparent conductive film 1 can be improved by these surface resistance value and refractive index.
  • the patterning 1st transparent conductive layer 5a is provided with the 1st rectangular pattern 11 long in the left-right direction, and patterning 2nd
  • the transparent conductive layer 8a includes a second rectangular pattern 13 that is long in the front-rear direction. Further, the length in the left-right direction of the first rectangular pattern 11 is longer than the length in the front-rear direction of the second pattern. Therefore, since the surface resistance value of the patterned first transparent conductive layer 5a having a long current moving distance can be reduced, the current transmission speed of the patterned first transparent conductive layer 5a can be improved or noise can be reduced. it can. As a result, an improvement in current speed and a reduction in noise as the transparent conductive film 1 as a whole can be achieved, so that the size of the image display device 20 can be increased.
  • one embodiment of the image display device 20 includes a transparent protective plate 21, a first transparent adhesive layer 22, a touch panel film 1 a, a second transparent adhesive layer 23, and an image display element. 24 in order.
  • the upper side is the element side
  • the lower side is the viewing side.
  • the transparent protective plate 21 is a layer for protecting internal members of the image display device 20 such as the image display element 24 against external impacts and dirt.
  • the transparent protective plate 21 examples include a resin plate made of a hard resin such as an acrylic resin or a polycarbonate resin, such as a glass plate.
  • the thickness of the transparent protective plate 21 is, for example, 10 ⁇ m or more, preferably 500 ⁇ m or more, and for example, 10 mm or less, more preferably 5 mm or less.
  • the first transparent pressure-sensitive adhesive layer 22 is a layer for bonding the transparent protective plate 21 and the touch panel film 1a.
  • the first transparent pressure-sensitive adhesive layer 22 has a film shape and is disposed on the transparent protective plate 21. More specifically, the first transparent pressure-sensitive adhesive layer 22 includes an upper surface of the transparent protective plate 21 and a lower surface of the touch panel film 1a (patterning second transparent conductive 8a) between the transparent protective plate 21 and the touch panel film 1a. It is arranged to come into contact.
  • the first transparent pressure-sensitive adhesive layer 22 is formed from a transparent pressure-sensitive adhesive composition.
  • the composition of the pressure-sensitive adhesive composition is not limited.
  • an acrylic pressure-sensitive adhesive such as butyl rubber
  • a rubber-based pressure-sensitive adhesive such as butyl rubber
  • a silicone-based pressure-sensitive adhesive such as butyl rubber
  • a polyester-based pressure-sensitive adhesive such as butyl rubber
  • a polyurethane-based pressure-sensitive adhesive such as polyamide-based pressure-sensitive adhesive
  • an epoxy-based pressure-sensitive adhesive Agents vinyl alkyl ether adhesives, fluororesin adhesives, and the like.
  • the thickness of the first transparent pressure-sensitive adhesive layer 22 is, for example, 1 ⁇ m or more, preferably 5 ⁇ m or more, and, for example, 300 ⁇ m or less.
  • the thickness is preferably 150 ⁇ m or less, more preferably 50 ⁇ m or less.
  • the touch panel film 1a is disposed on the first transparent adhesive layer 22 so that the patterned first transparent conductive layer 5a is located on the upper side and the patterned second transparent conductive layer 8a is located on the lower side. More specifically, in the touch panel film 1a, the patterning second transparent conductive layer 8a is in contact with the first transparent adhesive layer 22 between the first transparent adhesive layer 22 and the second transparent adhesive layer 23. It arrange
  • the upper surface and the side surface of the first rectangular pattern 11 of the patterning first transparent conductive layer 5a and the upper surface of the first optical adjustment layer 4 exposed from the patterning first transparent conductive layer 5a are as follows. In contact with the first transparent adhesive layer 22. On the bottom surface of the touch panel film 1a, the bottom surface and the side surface of the second rectangular pattern 13 of the patterned transparent conductive layer 28a and the top surface of the second optical adjustment layer 7 exposed from the patterned second transparent conductive layer 8a are the second. The transparent adhesive layer 23 is in contact.
  • the second transparent pressure-sensitive adhesive layer 23 is a layer for bonding the image display element 24 and the touch panel film 1a.
  • the 2nd transparent adhesive layer 23 has a film shape, and is arrange
  • the second transparent pressure-sensitive adhesive layer 23 is formed from the same pressure-sensitive adhesive composition as the first transparent pressure-sensitive adhesive layer 22.
  • the thickness of the second transparent pressure-sensitive adhesive layer 23 is the same as the thickness of the first transparent pressure-sensitive adhesive layer 22.
  • the image display element 24 is disposed on the second transparent adhesive layer 23. More specifically, the image display element 24 has the second transparent adhesive layer 23 such that the image display surface 25 is on the lower side and the image display surface 25 is in contact with the upper surface of the second transparent adhesive layer 23. It is arrange
  • Examples of the image display element 24 include a liquid crystal cell and an organic EL.
  • the image display device 20 includes the touch panel film 1a, the image display device 20 has an electromagnetic wave shielding effect, and suppresses the visual recognition of the patterning first transparent conductive layer 5a and the patterning second transparent conductive layer 8a (electrode pattern), and provides good light. Provide transparency. Therefore, a large screen can be achieved.
  • the image display element 24 is disposed on the patterning first transparent conductive layer 5a side (upper side). For this reason, the distance between the patterned first transparent conductive layer 5a (first transparent conductive layer 5) having a strong electromagnetic shielding effect and the image display element 24 that generates electromagnetic waves is shortened. Therefore, the electromagnetic wave of the image display element 24 can be absorbed more reliably, and the electromagnetic wave shielding effect as the image display device 20 is excellent.
  • the transparent conductive film 1 includes, in order from the bottom, the second transparent conductive layer 8, the second optical adjustment layer 7, the second hard coat layer 6, the transparent substrate 2, and the first.
  • the hard coat layer 3, the first optical adjustment layer 4, and the first transparent conductive layer 5 are provided, for example, although not shown, the second hard coat layer 6 and the first hard coat layer 3 may not be provided. That is, the transparent conductive film 1 includes a second transparent conductive layer 8, a second optical adjustment layer 7, a transparent substrate 2, a first optical adjustment layer 4, and a first transparent conductive layer 5 in order from the bottom.
  • the embodiment shown in FIG. The same applies to the touch panel film 1 a and the image display device 20.
  • the patterned first transparent conductive layer 5a includes a first rectangular pattern 11 that is long in the left-right direction, and the patterned second transparent conductive layer 8a is long in the front-rear direction.
  • the rectangular pattern 13 is provided, for example, although not illustrated, the patterning second transparent conductive layer 8a includes the first rectangular pattern 11 that is long in the left-right direction, and the patterning first transparent conductive layer 5a is provided in the front-rear direction.
  • a long second rectangular pattern 13 can also be provided.
  • the lateral length of the first rectangular pattern 11 of the patterned second transparent conductive layer 8a is longer than the longitudinal length of the second rectangular pattern 13 of the patterned first transparent conductive layer 5a.
  • the embodiment shown in FIGS. 3A and 3B can be mentioned because the current speed and noise of the transparent conductive layer having a long electrode pattern length can be improved.
  • the first rectangular pattern 11 extending in the left-right direction is an example of the first pattern
  • the second rectangular pattern 13 extending in the front-rear direction is an example of the second pattern.
  • a first continuous rectangular pattern 14 in which a plurality of rectangular patterns are continuous in the left-right direction is used as an example of the first pattern
  • a plurality of rectangular patterns are used in the front-rear direction as an example of the second pattern.
  • the second continuous rectangular pattern 15 may be continuous.
  • the patterned first transparent conductive layer 5a includes a plurality of first continuous rectangular patterns 14 arranged at intervals in the left-right direction.
  • the plurality of substantially rectangular patterns are arranged on a straight line such that their diagonal lines are along the left-right direction.
  • the patterned second transparent conductive layer 8a includes a plurality of second continuous rectangular patterns 15 that are spaced apart from each other in the front-rear direction.
  • the plurality of substantially rectangular patterns are arranged on a straight line such that their diagonal lines are along the front-rear direction.
  • the first continuous rectangular pattern 14 of the patterned first transparent conductive layer 5a and the second continuous rectangular pattern 15 of the patterned second transparent conductive layer 8a are arranged to be orthogonal to each other when projected in the thickness direction. ing. Further, the first continuous rectangular pattern so that the rectangular pattern constituting the first continuous rectangular pattern 14 does not overlap with the rectangular pattern constituting the second continuous rectangular pattern 15 when projected in the thickness direction. 14 and the second continuous rectangular pattern 15 are arranged. Further, when projected in the thickness direction, the first continuous rectangular pattern 14 and the second continuous rectangular pattern 15 are combined so that the pattern of the first continuous rectangular pattern 15 covers the entire surface of the substantially central portion of the touch panel film 1a. The shape pattern 14 and the second continuous rectangular pattern 15 are arranged.
  • the touch panel film 1 a and the image display element 24 are arranged so that the image display element 24 is positioned on the patterning first transparent conductive layer 5 a side.
  • the touch panel film 1a and the image display element 24 may be arranged so that the image display element 24 is positioned on the patterning second transparent conductive layer 8a side. That is, the image display device 20 includes the transparent protective plate 21, the first transparent adhesive layer 22, and the touch panel so that the patterning first transparent conductive layer 5a is on the lower side and the patterning second transparent conductive layer 8a is on the upper side.
  • the film 1a, the second transparent pressure-sensitive adhesive layer 23, and the image display element 24 can be provided in order from the lower side.
  • Example 1 On both sides of a transparent substrate (COP film, manufactured by Nippon Zeon Co., Ltd., trade name “Zeonor ZF-16”, thickness 100 ⁇ m), a hard coat composition (acrylic UV curable resin, manufactured by DIC Corporation, “Unidic RS29- 120 ”) was applied using a gravure coater and dried by heating at 80 ° C. for 1 minute. Then, the 1st and 2nd hard-coat layer (each thickness 1.0micrometer, each refractive index 1.53) was formed by irradiating an ultraviolet-ray using a high pressure mercury lamp. Thereby, the laminated body of the 1st hard coat layer, the transparent base material, and the 2nd hard coat layer was obtained.
  • COP film manufactured by Nippon Zeon Co., Ltd., trade name “Zeonor ZF-16”, thickness 100 ⁇ m
  • a hard coat composition acrylic UV curable resin, manufactured by DIC Corporation, “Unidic RS29- 120 ”
  • a diluted solution of the optical adjustment composition having a refractive index of 1.70 was applied to the surface of the first hard coat layer of the laminate using a gravure coater, and dried by heating at 60 ° C. for 1 minute. Then, the 1st optical adjustment layer (refractive index 1.70, thickness 80nm) was formed by irradiating an ultraviolet-ray using a high pressure mercury lamp. Further, a second optical adjustment layer (refractive index 1.64, thickness 80 nm) was formed on the surface of the second hard coat layer in the same manner as described above except that the optical adjustment composition having a refractive index of 1.64 was used. Formed. Thereby, the laminated body of the 1st optical adjustment layer, the 1st hard coat layer, the transparent base material, the 2nd hard coat layer, and the 1st optical adjustment layer was obtained.
  • Each optical adjustment composition includes a refractive index adjusting agent having a refractive index of 1.60 (manufactured by JSR, “OPSTAR”) and a refractive index adjusting agent having a refractive index of 1.74 (manufactured by JSR, “OPSTAR KZ6734”). And were appropriately mixed.
  • the obtained laminate was put into a sputtering apparatus, and indium tin oxide layers (ITO layers) were laminated on both sides of the laminate.
  • ITO layers indium tin oxide layers
  • the gas a mixed gas composed of 98% argon gas and 2% oxygen was used, and the pressure of the atmosphere was 0.4 Pa.
  • a sintered body composed of 90% by mass of indium oxide and 10% by mass of tin oxide was used. Further, the thickness of the first transparent conductive layer laminated on the first optical adjustment layer side was adjusted to 40 nm, and the thickness of the second transparent conductive layer laminated on the second optical adjustment layer side was adjusted to 30 nm.
  • the transparent conductive film which consists of a 1st transparent conductive layer, a 1st optical adjustment layer, a 1st hard coat layer, a transparent base material and a 2nd hard coat layer, a 1st optical adjustment layer, and a 2nd transparent conductive layer is obtained. It was.
  • this transparent conductive film was heated in an oven at 140 ° C. for 90 minutes to crystallize the first and second transparent conductive layers, and the double-sided transparent conductive film of Example 1 was produced.
  • Examples 2 to 9 and Comparative Examples 1 to 5 The thickness and refractive index of the optical adjustment layer, and the thickness and surface resistance value of the transparent conductive layer were changed to the thickness and refractive index of the optical adjustment layer shown in Table 1, and the thickness and surface resistance value of the transparent conductive layer. Except for the above, a transparent conductive film was produced in the same manner as in Example 1.
  • Example 6 A transparent conductive film was produced in the same manner as in Example 1 except that the first optical adjustment layer and the second optical adjustment layer were not provided.
  • ⁇ Layer thickness> The thickness of each hard coat layer and each optical adjustment layer was calculated based on the waveform from the interference spectrum using an instantaneous multi-photometry system (“MCPD2000” manufactured by Otsuka Electronics Co., Ltd.).
  • each transparent conductive layer was measured by observing a cross-sectional view of the transparent conductive film with a transmission electron microscope (TEM).
  • TEM transmission electron microscope
  • a transparent film (manufactured by ZEON Corporation, “ZEONOR ZF-”) is provided on both sides of the transparent conductive film of each example and each comparative example via a transparent acrylic adhesive (manufactured by Nitto Denko, model No. 7, thickness 25 ⁇ m). 14 ”and a thickness of 100 ⁇ m).
  • a sample for measuring transmittance transparent film / adhesive / transparent conductive film / adhesive / transparent film
  • the first transparent conductive layer and the second transparent conductive layer were etched using an etching solution and patterned into the electrode patterns of FIGS. 3A and 3B.
  • the patterned transparent conductive film was viewed from obliquely above.
  • the case where the electrode pattern was clearly visually recognized was evaluated as x, and the case where the electrode pattern was hardly visually recognized was evaluated as ⁇ .
  • the results are shown in Table 1.
  • the transparent conductive film and the image display device of the present invention can be applied to various industrial products.
  • the transparent conductive film of the present invention is suitably used for an image display device including a touch panel.

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Abstract

La présente invention concerne un film conducteur transparent pourvu séquentiellement d'une première couche conductrice transparente, d'une première couche de réglage optique, d'un substrat transparent, d'une seconde couche de réglage optique et d'une seconde couche conductrice transparente. La résistivité de surface de la seconde couche conductrice transparente est supérieure à la résistivité de surface de la première couche conductrice transparente ; la résistivité de surface de la première couche conductrice transparente est de 10 Ω/□ à 70 Ω/□ (inclus) ; la résistivité de surface de la seconde couche conductrice transparente est de 50 Ω/□ à 150 Ω/□ (inclus) ; et l'indice de réfraction de la seconde couche de réglage optique est inférieure à l'indice de réfraction de la première couche de réglage optique.
PCT/JP2018/016325 2017-05-18 2018-04-20 Film conducteur transparent et dispositif d'affichage d'image WO2018211910A1 (fr)

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CN110636943A (zh) 2019-12-31
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