WO2018199169A1 - 成膜装置及び成膜方法 - Google Patents
成膜装置及び成膜方法 Download PDFInfo
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- WO2018199169A1 WO2018199169A1 PCT/JP2018/016817 JP2018016817W WO2018199169A1 WO 2018199169 A1 WO2018199169 A1 WO 2018199169A1 JP 2018016817 W JP2018016817 W JP 2018016817W WO 2018199169 A1 WO2018199169 A1 WO 2018199169A1
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- roller
- base material
- film forming
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
Definitions
- the present invention relates to a film forming apparatus and a film forming method for evaporating an evaporation material to form a film of the evaporation material on a substrate.
- Patent Documents 1, 2, and 3 there has been known a film forming apparatus in which a film of an evaporation material is formed on a substrate while the substrate unwound from the unwinding roller is wound around a can roll, and the substrate is wound up by a winding roller.
- the film forming apparatus when a metal film is formed on a substrate made of a long film or the like, high-temperature deposition is performed by depositing particles of a high-temperature metal material on the substrate. An excessive temperature difference may occur between the object and the base material, and the base material may be wrinkled.
- Patent Documents 1 and 2 the substrate immediately before contacting the can roll is heated, or in Patent Document 3, the temperature of the substrate on the can roll is within a predetermined temperature range.
- Patent Document 3 A technique for suppressing the generation of wrinkles due to a temperature difference between the deposit and the base material by adjusting the temperature of the can roll as described is described.
- an object of the present invention is to form a film forming apparatus and a film forming apparatus capable of suppressing the generation of wrinkles on the base material in the process until the base material on which the metal film is formed is recovered. It is to provide a method.
- a film forming apparatus includes an unwinding roller, a winding roller, a heating roller, a film forming unit, and a control unit.
- the unwinding roller unwinds a base material that is a long film.
- the winding roller winds the base material unwound from the unwinding roller.
- the heating roller includes a temperature control unit and is provided between the unwinding roller and the winding roller in the conveying direction of the base material to heat the base material.
- the film forming unit is provided to face the heating roller, includes an evaporation source having a heating mechanism for heating the metal material, and forms a metal film on the substrate.
- control unit In the process in which the base material is unwound from the heating roller and taken up by the take-up roller, the control unit is configured so that a temperature difference between the metal film and the base material is 0 ° C. or higher and lower than 180 ° C.
- the temperature control unit and the heating mechanism are configured to be controllable.
- the shrinkage behavior of the metal film and the base material can be made uniform in the slow cooling process until the base material on which the metal film is formed is wound on the take-up roller. Therefore, shrinkage mismatch between the metal film and the substrate is suppressed, and plastic deformation such as wrinkles is suppressed from occurring on the substrate on which the metal film is formed.
- the control unit is configured so that a temperature change per unit time of the base material is 3.6 ° C./min to 3600 ° C./min. You may comprise so that the said preheating part may be controlled.
- the base material is preheated and comes into contact with the heating roller while thermally expanding by a predetermined amount. Therefore, in the process of forming the metal film on the base material on the heating roller, the generation of wrinkles due to an excessive temperature difference between the base material and the metal film is suppressed.
- the control unit may be configured to control the temperature control unit so that the temperature of the heating roller is 0 ° C. or higher and 70 ° C. or lower.
- the control unit may be configured to control the temperature control unit and the heating mechanism such that a temperature difference between the evaporation source and the heating roller is 300 ° C. or more and 700 ° C. or less.
- a film forming method includes an unwinding roller for unwinding a base material that is a long film, and the above-described base material unwound from the unwinding roller.
- a winding roller and a temperature control unit are provided between the unwinding roller and the winding roller in the conveyance direction of the base material, and are opposed to the heating roller for heating the base material and the heating roller.
- a film forming unit that includes an evaporation source that evaporates a metal material and forms a metal film on the substrate.
- the temperature difference between the metal film and the substrate is maintained at 0 ° C. or more and less than 180 ° C. in the process in which the substrate is unwound from the heating roller and wound on the winding roller.
- the present invention it is possible to provide a film forming apparatus and a film forming method capable of suppressing the generation of wrinkles on a base material on which the base material on which the metal film is formed is collected. can do.
- FIG. 1 is a schematic sectional side view showing a configuration of a film forming apparatus 100 according to an embodiment of the present invention.
- the X-axis, Y-axis, and Z-axis directions shown in FIG. 1 indicate triaxial directions orthogonal to each other, the X-axis and Y-axis indicate horizontal directions, and the Z-axis direction indicates a vertical direction.
- the film forming apparatus 100 includes a vacuum chamber 101, a film forming unit 110, a transfer unit 120, a transfer mechanism 130, a control unit 140, and a preheating unit 150.
- the vacuum chamber 101 has a sealed structure and is connected to an exhaust line L having a vacuum pump P. Thereby, the vacuum chamber 101 is configured such that the inside thereof can be evacuated or maintained in a predetermined reduced pressure atmosphere. Moreover, the vacuum chamber 101 has the partition plate 102 which divides the film-forming part 110 and the conveyance part 120, respectively, as shown in FIG.
- the film forming unit 110 is a film forming chamber partitioned by the partition plate 102 and the outer wall of the vacuum chamber 101, and has an evaporation source 111 therein.
- the film forming unit 110 is connected to the exhaust line L.
- the film forming unit 110 communicates with the transport unit 120, when the film forming unit 110 is exhausted, the transport unit 120 is also exhausted. Thereby, a pressure difference is generated between the film forming unit 110 and the transport unit 120. Due to this pressure difference, an evaporating flow of lithium metal, which will be described later, is prevented from entering the transport unit 120.
- the evaporation source 111 is an evaporation source for evaporating lithium metal, and has a heating mechanism (not shown) for heating the lithium metal.
- the heating temperature (T 1 ) of the heating mechanism is about 530 ° C. to 700 ° C.
- the shortest distance D between the evaporation source 111 and the heating roller 132 (the shortest distance between the hot water surface of the crucible holding lithium metal and the heating roller 132) is, for example, about several hundred mm.
- the evaporation source 111 according to the present embodiment includes, for example, a resistance heating evaporation source, an induction heating evaporation source, an electron beam heating evaporation source, or the like.
- the transfer unit 120 is a transfer chamber partitioned by the partition plate 102 and the outer wall of the vacuum chamber 101, and is arranged above the Y axis direction in the vacuum chamber 101.
- the exhaust line L is connected only to the film forming unit 110. However, by connecting another exhaust line to the transfer unit 120, the transfer unit 120 and the film forming unit 110 are independently exhausted. Also good.
- the conveyance mechanism 130 includes an unwinding roller 131, a heating roller 132, a winding roller 133, and guide rollers 134a and 134b.
- the tension (tension) when the transport mechanism 130 supports the substrate F is, for example, about 200N.
- the unwinding roller 131, the heating roller 132, and the winding roller 133 are each provided with a rotation drive unit (not shown) and configured to be rotatable around the Z axis in the direction of the arrow in FIG. 1 at a predetermined rotation speed.
- a rotation drive unit not shown
- the substrate F is transported from the unwinding roller 131 toward the winding roller 133 at a predetermined transport speed in the vacuum chamber 101.
- the conveyance speed of the base material F is preferably 0.1 m / min or more and 0.8 m / min or less, and more preferably 0.1 m / min.
- the unwinding roller 131 is provided on the upstream side in the transport direction of the base material F from the film forming unit 110 and has a function of feeding the base material F to the heating roller 132.
- a guide roller 134a which is a free roller not provided with a unique rotation driving unit, is disposed.
- the heating roller 132 is disposed between the unwinding roller 131 and the winding roller 133 in the conveyance direction of the base material F.
- the heating roller 132 is disposed at a position where at least a part of the lower portion in the Y-axis direction faces the film forming unit 110 through the opening 102 a provided in the partition plate 102.
- the heating roller 132 faces the opening 102a with a predetermined interval, and faces the evaporation source 111 in the Y-axis direction.
- the heating roller 132 is made of a metal material such as stainless steel, iron, or aluminum and is formed in a cylindrical shape, and a temperature control unit (not shown) such as a temperature control medium circulation system is provided therein.
- a temperature control unit such as a temperature control medium circulation system
- a high boiling point organic medium such as silicon oil can be used.
- the size of the heating roller 132 is not particularly limited, but typically, the width dimension in the Z-axis direction is set larger than the width dimension of the base material F in the Z-axis direction.
- the winding roller 133 is provided on the downstream side of the film forming unit 110 in the conveyance direction of the base material F, and collects the base material F that is unwound from the unwinding roller 131 and on which the metal material is formed by the film forming unit 110.
- a guide roller 134b which is a free roller that does not include a unique rotation drive unit, is disposed.
- the controller 140 is arranged outside the vacuum chamber 101 as shown in FIG.
- the control unit 140 includes, for example, a computer including a CPU (Central Processing Unit) and a memory, and controls the entire operation of the film forming apparatus 100 by controlling each unit of the film forming apparatus 100.
- a computer including a CPU (Central Processing Unit) and a memory
- control unit 140 includes, for example, control of the exhaust line L including the vacuum pump P, control of the conveyance speed and film formation speed of the substrate F, heating temperature control of the temperature control unit, and a heating mechanism included in the evaporation source 111. Heating temperature control, heating temperature control of the preheating unit 150, rotation drive control of the transport mechanism 130, and the like are performed.
- the preheating unit 150 is a lamp heater for heating the base material F, and is arranged with the heat radiation surface facing the base material F.
- the preheating unit 150 is provided in the vacuum chamber 101 on the upstream side of the film forming unit 110 in the transport direction of the substrate F.
- the base material F continuously conveyed from the unwinding roller 131 to the heating roller 132 is heated by heat radiation from the preheating unit 150.
- the base material F is heated by the preheating unit 150 in a region in front of being in contact with the heating roller 132.
- the temperature at which the preheating unit 150 heats the base material F is, for example, about 550 ° C.
- the base material F is, for example, a long film made of copper cut to a predetermined width. Further, as the base material F, a resin film having heat resistance that does not cause thermal deformation on the heating roller 132 may be used.
- the thickness of the substrate F is not particularly limited and is, for example, several ⁇ m to several tens of ⁇ m. Moreover, there is no restriction
- the film forming apparatus 100 has the above configuration. Note even not shown, the film forming apparatus 100, the metal film has been formed substrate F is unwound from the heating roller 132, in the course to be taken up by the take-up roller 133, and the temperature of the metal film (T 2) A detection unit for monitoring the temperature (T 3 ) of the substrate F is provided.
- control unit 140 can control the temperature difference (T 2 ⁇ T 3 ) between the metal film and the substrate F within a desired range in real time based on the output of the detection unit.
- the detection unit is configured to be able to measure the temperatures of the metal film and the base material F in a non-contact manner.
- a radiation thermometer etc. are employ
- the configuration of the film forming apparatus 100 is not limited to the configuration shown in FIG. 1.
- the film forming unit 110, the transport unit 120, the unwinding roller 131, the heating roller 132, the winding roller 133, and the guide roller 134 a , 134b can be appropriately changed.
- FIG. 2 is a flowchart showing a film forming method using the film forming apparatus 100.
- a film forming method of the film forming apparatus 100 will be described with reference to FIG.
- Step S01 exhaust processing
- the vacuum pump P is activated, the inside of the vacuum chamber 101 is evacuated, and each of the film forming unit 110 and the transfer unit 120 is maintained at a predetermined degree of vacuum.
- the transport mechanism 130 that supports the base material F is driven, and the base material F is transported from the unwinding roller 131 toward the winding roller 133.
- the evaporation source 111 evaporates lithium metal and forms an evaporating flow of lithium material that is emitted toward the base material F on the heating roller 132.
- Step S02 Heat treatment
- the unwinding roller 131, the heating roller 132, and the winding roller 133 are continuously rotated at a predetermined rotation speed around the Z axis.
- the base material F is conveyed to the heating roller 132 while being guided by the guide roller 134a.
- the control unit 140 has a temperature increase rate (temperature change per unit time) of the base material F of 3.6 ° C./min or more until the base material F passes through the preheating unit 150 and contacts the heating roller 132.
- the heating temperature of the preheating unit 150 is controlled to be 3600 ° C./min or less.
- the base material F is preheated and comes into contact with the heating roller 132 while thermally expanding by a predetermined amount. Therefore, generation of wrinkles due to a difference in thermal expansion between the front surface side and the back surface side of the base material F is suppressed in a film forming step (step S03) described later.
- the base material F cannot be sufficiently preheated, and there is a risk that wrinkles will occur when the base material F contacts the heating roller 132. is there. Further, if the temperature exceeds 3600 ° C./min, the temperature of the base material F changes abruptly as the base material F passes through the preheating unit 150, and thus the preheating process itself may cause wrinkles in the base material F. There is.
- Step S03 Film forming step
- the unwinding roller 131, the heating roller 132, and the winding roller 133 are continuously rotated around the Z axis at a predetermined rotation speed, so that the substrate F heated by the preheating unit 150 is wound around the outer peripheral surface of the heating roller 132. Turned. Then, the substrate F passes through the film forming unit 110 while being heated by the heating roller 132.
- step S03 in the above-described heat treatment step (step S02), the control unit 140 is heated by controlling the temperature increase rate of the base material F to be 3.6 ° C./min or more and 3600 ° C./min or less.
- the temperature control unit is controlled so that the temperature (T 4 ) of the roller 132 is 0 ° C. or higher and 70 ° C. or lower, more preferably 30 ° C. or higher and 50 ° C. or lower.
- FIG. 3 shows the results of experiments on the occurrence of wrinkles on the base material F by changing the temperature of the heating roller 132 when the temperature increase rate of the base material F is 3.6 ° C./min or more and 3600 ° C./min or less. It is a star chart showing. Note that “ ⁇ ” shown in FIG. 3 indicates that the base material F was not wrinkled. “ ⁇ ” indicates that the base material F is a non-defective product level although it is slightly wrinkled. “X” indicates that the product is defective due to wrinkles generated on the base material F.
- the temperature of the heating roller 132 is 0 ° C. or higher and 70 ° C. or lower, generation of wrinkles on the substrate F is suppressed, and if it is 30 ° C. or higher and 50 or lower, wrinkles are generated on the substrate F. Is prevented.
- the temperature of the heating roller 132 is less than 0 ° C., the temperature difference between the lithium metal particles and the base material F becomes large, and wrinkles may occur due to the difference in linear expansion coefficient. Moreover, when it exceeds 70 degreeC, there exists a possibility that lithium metal and the base material F may alloy by the temperature rise at the time of film-forming.
- lithium metal particles are deposited on the substrate F, and a lithium metal film is formed on the substrate F.
- the thickness of the lithium metal film is not particularly limited, and is, for example, several ⁇ m to several tens of ⁇ m.
- step S03 the temperature difference (T 2 -T 3 ) between the lithium metal film and the base material F falls within the range of 0 ° C. or more and less than 180 ° C. in the recovery process (step S04) described later by the control unit 140.
- the heating temperature of at least one of the temperature control unit or the heating mechanism is controlled.
- the control unit 140 controls the temperature adjustment unit and the heating mechanism so that the temperature difference (T 1 -T 4 ) between the evaporation source 111 and the heating roller 132 is 300 ° C. or more and 700 ° C. or less. .
- Step S04 Recovery
- the base material F on which the lithium metal film is formed is conveyed to the take-up roller 133 and collected while being guided by the guide roller 134b.
- the temperature difference (T 2 -T 3 ) between the lithium metal film and the base material F is controlled to be maintained at 0 ° C. or more and less than 180 ° C. by the above-described step S03. Has been.
- the shrinkage behavior of the lithium metal film and the base material F is uniform in the slow cooling process until the base material F on which the lithium metal film is formed is unwound from the heating roller 132 and taken up by the take-up roller 133. Is achieved. Therefore, shrinkage mismatch between the lithium metal film and the base material F is suppressed, and plastic deformation such as wrinkles is suppressed from occurring on the base material F on which the lithium metal film is formed.
- the base material F is typically made of copper, but is not limited thereto, and may be made of aluminum, nickel, stainless steel, ITO (Indium (Tin Oxide), or the like.
- the metal material held in the evaporation source 111 is typically lithium metal, but is not limited to this.
- indium (In), zinc (Zn), tin (Sn), gallium (Ga), bismuth ( Bi), sodium (Na), potassium (K) and the like may be used.
- the base material F is preheated before the metal film is formed on the base material F, thereby suppressing the generation of wrinkles on the base material F.
- the present invention is not limited to this.
- the film forming apparatus 100 may suppress wrinkling of the base material F by adjusting the transport speed of the base material F and the opening diameter of a shutter or the like that houses the evaporation source 111.
- the vacuum deposition method is adopted as an example of the film forming method, but is not limited thereto.
- the present invention is generally applicable to a film forming technique in which particles of a metal material are generated at a high temperature and the particles are deposited on the substrate F.
- a molecular beam evaporation method, an ion plating method, an ion beam evaporation method, or the like may be employed.
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Abstract
Description
上記巻出しローラは、長尺のフィルムである基材を巻き出す。
上記巻取りローラは、上記巻出しローラから巻き出された上記基材を巻き取る。
上記加熱ローラは、温調ユニットを含み、上記基材の搬送方向において上記巻出しローラと上記巻取りローラとの間に設けられ、上記基材を加熱する。
上記成膜部は、上記加熱ローラに対向して設けられ、金属材料を加熱する加熱機構を有する蒸発源を含み、上記基材上に金属膜を成膜する。
上記制御部は、上記基材が上記加熱ローラから巻き出され、上記巻取りローラに巻き取られる過程において、上記金属膜と上記基材との温度差が0℃以上180℃未満となるように、上記温調ユニットと上記加熱機構の少なくとも一方を制御可能に構成される。
上記制御部は、上記基材が巻出しローラから上記加熱ローラへ搬送される過程において、上記基材の単位時間あたりの温度変化が3.6℃/min以上3600℃/min以下となるように上記予熱部を制御するように構成されてもよい。
上記成膜方法は、上記基材が上記加熱ローラから巻き出され、上記巻取りローラに巻き取られる過程において、上記金属膜と上記基材との温度差が0℃以上180℃未満に維持される。
図1は、本発明の一実施形態に係る成膜装置100の構成を示す概略側断面図である。図1に示すX軸、Y軸及びZ軸方向は相互に直交する3軸方向を示し、X軸及びY軸は水平方向、Z軸方向は鉛直方向を示す。
図2は、成膜装置100を用いた成膜方法を示すフローチャートである。以下、成膜装置100の成膜方法について、図2に沿って説明する。
真空ポンプPを起動させ、真空チャンバ101内を排気し、成膜部110と搬送部120各々を所定の真空度に維持する。
巻出しローラ131、加熱ローラ132及び巻取りローラ133がZ軸周りの所定の回転速度で連続的に回転する。基材Fは、ガイドローラ134aによって走行をガイドされながら加熱ローラ132へ搬送される。
巻出しローラ131、加熱ローラ132及び巻取りローラ133がZ軸周りに所定の回転速度で連続的に回転することによって、予熱部150により加熱された基材Fが加熱ローラ132の外周面に巻回される。そして、基材Fは加熱ローラ132により加熱されながら成膜部110を通過する。
続いて、リチウム金属膜が形成された基材Fは、ガイドローラ134bによって走行をガイドされながら巻取りローラ133へ搬送され、回収される。ここで、本実施形態に係る成膜方法では、前述のステップS03によりリチウム金属膜と基材Fとの温度差(T2-T3)が0℃以上180℃未満に維持されるように制御されている。
110・・・成膜部
131・・・巻出しローラ
132・・・加熱ローラ
133・・・巻取りローラ
140・・・制御部
150・・・予熱部
F・・・・・基材
Claims (5)
- 長尺のフィルムである基材を巻き出す巻出しローラと、
前記巻出しローラから巻き出された前記基材を巻き取る巻取りローラと、
温調ユニットを含み、前記基材の搬送方向において前記巻出しローラと前記巻取りローラとの間に設けられ、前記基材を加熱する加熱ローラと、
前記加熱ローラに対向して設けられ、金属材料を加熱する加熱機構を有する蒸発源を含み、前記基材上に金属膜を成膜する成膜部と、
前記基材が前記加熱ローラから巻き出され、前記巻取りローラに巻き取られる過程において、前記金属膜と前記基材との温度差が0℃以上180℃未満となるように、前記温調ユニットと前記加熱機構の少なくとも一方を制御可能に構成された制御部と
を具備する成膜装置。 - 請求項1に記載の成膜装置であって、
前記成膜部より前記基材の搬送方向上流側に設けられた予熱部をさらに具備し、
前記制御部は、前記基材が巻出しローラから前記加熱ローラへ搬送される過程において、前記基材の単位時間あたりの温度変化が3.6℃/min以上3600℃/min以下となるように前記予熱部を制御するように構成される
成膜装置。 - 請求項2に記載の成膜装置であって、
前記制御部は、前記加熱ローラの温度が0℃以上70℃以下となるように、前記温調ユニットを制御するように構成される
成膜装置。 - 請求項1~3のいずれか1つに記載の成膜装置であって、
前記制御部は、前記蒸発源と前記加熱ローラとの温度差が300℃以上700℃以下となるように前記温調ユニット及び前記加熱機構を制御するように構成される
成膜装置。 - 長尺のフィルムである基材を巻き出す巻出しローラと、前記巻出しローラから巻き出された前記基材を巻き取る巻取りローラと、温調ユニットを含み、前記基材の搬送方向において前記巻出しローラと前記巻取りローラとの間に設けられ、前記基材を加熱する加熱ローラと、前記加熱ローラに対向して設けられ、金属材料を蒸発させる蒸発源を含み、前記基材上に金属膜を成膜する成膜部と、を有する成膜装置の成膜方法であって、
前記基材が前記加熱ローラから巻き出され、前記巻取りローラに巻き取られる過程において、前記金属膜と前記基材との温度差を0℃以上180℃未満に維持する
成膜方法。
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