WO2018036502A1 - 聚氨酯基体石材研磨抛光片及其制备方法 - Google Patents

聚氨酯基体石材研磨抛光片及其制备方法 Download PDF

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Publication number
WO2018036502A1
WO2018036502A1 PCT/CN2017/098586 CN2017098586W WO2018036502A1 WO 2018036502 A1 WO2018036502 A1 WO 2018036502A1 CN 2017098586 W CN2017098586 W CN 2017098586W WO 2018036502 A1 WO2018036502 A1 WO 2018036502A1
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Prior art keywords
component
stone
preparing
catalyst
polishing sheet
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PCT/CN2017/098586
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English (en)
French (fr)
Inventor
王建秋
王文婷
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王建秋
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Publication of WO2018036502A1 publication Critical patent/WO2018036502A1/zh

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
    • B24D18/0009—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for using moulds or presses
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/20—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
    • B24D3/28—Resins or natural or synthetic macromolecular compounds
    • B24D3/32—Resins or natural or synthetic macromolecular compounds for porous or cellular structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/34—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties
    • B24D3/342—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties incorporated in the bonding agent
    • B24D3/344—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties incorporated in the bonding agent the bonding agent being organic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/30—Low-molecular-weight compounds
    • C08G18/32—Polyhydroxy compounds; Polyamines; Hydroxyamines
    • C08G18/3203—Polyhydroxy compounds
    • C08G18/3206—Polyhydroxy compounds aliphatic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40—High-molecular-weight compounds
    • C08G18/48—Polyethers
    • C08G18/4829—Polyethers containing at least three hydroxy groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/65—Low-molecular-weight compounds having active hydrogen with high-molecular-weight compounds having active hydrogen
    • C08G18/66—Compounds of groups C08G18/42, C08G18/48, or C08G18/52
    • C08G18/6666—Compounds of group C08G18/48 or C08G18/52
    • C08G18/667—Compounds of group C08G18/48 or C08G18/52 with compounds of group C08G18/32 or polyamines of C08G18/38
    • C08G18/6674—Compounds of group C08G18/48 or C08G18/52 with compounds of group C08G18/32 or polyamines of C08G18/38 with compounds of group C08G18/3203
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
    • C08J9/04—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof using blowing gases generated by a previously added blowing agent
    • C08J9/12—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof using blowing gases generated by a previously added blowing agent by a physical blowing agent
    • C08J9/14—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof using blowing gases generated by a previously added blowing agent by a physical blowing agent organic
    • C08J9/141—Hydrocarbons
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L75/00—Compositions of polyureas or polyurethanes; Compositions of derivatives of such polymers
    • C08L75/04—Polyurethanes
    • C08L75/08—Polyurethanes from polyethers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2101/00—Manufacture of cellular products
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2203/00—Foams characterized by the expanding agent
    • C08J2203/14—Saturated hydrocarbons, e.g. butane; Unspecified hydrocarbons
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2375/00—Characterised by the use of polyureas or polyurethanes; Derivatives of such polymers
    • C08J2375/04—Polyurethanes
    • C08J2375/08—Polyurethanes from polyethers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C08K3/22—Oxides; Hydroxides of metals
    • C08K2003/2227—Oxides; Hydroxides of metals of aluminium
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C08K3/22—Oxides; Hydroxides of metals
    • C08K2003/2296—Oxides; Hydroxides of metals of zinc
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00—Specific properties of additives
    • C08K2201/002—Physical properties
    • C08K2201/003—Additives being defined by their diameter
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00—Specific properties of additives
    • C08K2201/014—Additives containing two or more different additives of the same subgroup in C08K
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00—Polymer mixtures characterised by other features
    • C08L2205/03—Polymer mixtures characterised by other features containing three or more polymers in a blend
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00—Polymer mixtures characterised by other features
    • C08L2205/14—Polymer mixtures characterised by other features containing polymeric additives characterised by shape
    • C08L2205/16—Fibres; Fibrils

Definitions

  • the invention relates to the technical field of grinding and polishing of stone surface.
  • a polyurethane-based stone abrasive polishing sheet and a preparation method thereof are used as a novel stone grinding and polishing material, and the abrasive polishing sheet is mainly applied to surface polishing and polishing of stone and stone floor renovation.
  • the surface of natural and artificial decorative stone has high gloss and clarity, which can show the color and decorative effect of stone. Therefore, people often regard the gloss of stone surface as the standard for evaluating stone processing quality and surface effect.
  • the surface grinding and polishing of stone plates and the grinding and polishing of stone floor refurbishment are realized by professional equipment with different performances and materials with grinding function. Therefore, polishing and polishing materials with better grinding, polishing functions and efficiency have become a topic of high concern in the stone processing and stone care industries.
  • the surface of the stone sheet is ground and polished to achieve the desired smooth or bright effect on the stone surface.
  • Grinding and polishing stone can be divided into three processes: coarse grinding, fine grinding and polishing. In the abrasive design system and operation process, it is also a process from coarse to fine, from rough to smooth.
  • the grinding and polishing effect of the stone surface has a great relationship with the performance of the grinding equipment.
  • the improvement of the performance of the grinding equipment has greatly affected the improvement of the polishing effect of the stone, and the improvement of the performance of the polishing material (sheet) appears to be lagging or stagnant.
  • the flatness of the ground after the stone paving will have different degrees of difference, especially the unevenness of the edge and diagonal parts of the plate. The sense is more obvious, affecting the decorative effect of the stone floor.
  • the stone floor is usually re-grinded and polished by a “stone floor integral grinding process” after the stone paving to obtain the ideal ground flatness and gloss effect.
  • the core component of this "stone floor overall grinding process” consists of two parts, one is equipment and the other is grinding.
  • polishing materials are usually used in the final polishing step of the floor grinding to improve the brightness of the stone surface.
  • polishing powders or polishing agents using oxalic acid and oxalate as main components are used.
  • the self-sharpness of the abrasive polishing sheet has a great influence on the grinding and polishing effect of the stone, which is an industry-recognized common sense. For small grinding equipment with low speed, light pressure and small working area, the performance of the abrasive polishing sheet often determines the final grinding effect.
  • the self-sharpness of the abrasive particles means that the abrasive grains buried in the matrix can be exposed or released in time to the other sharp-faced abrasive grains after the sharp faces are worn.
  • Abrasives (grinding sheets) of metal alloy substrates or epoxy resin substrates and phenolic resin substrates tend to have a good density and have a high clamping force for powder abrasive grains.
  • the epoxy resin matrix and the phenolic resin matrix are softened by heat during polishing, which also deteriorates the self-sharpness of the abrasive.
  • the self-sharpness of abrasives is a kind of "self-renewal” and “innovation” ability.
  • the ore grinding sheet is a traditional method for preparing stone grinding and polishing sheets by using the bitter soil. Due to the cumbersome production process, the manufacturing efficiency is low, and the hardness is difficult to adjust, it has been rarely used.
  • Metal alloy matrix abrasive sheet, the substrate is hard and inelastic, and there is the possibility of scratching the surface of the stone under the weight of the grinding equipment. Currently, it is only used for the rough grinding process of the stone.
  • Resin matrix abrasive sheet the matrix has low hardness relative to stone, and is suitable for rough grinding, fine grinding and polishing of stone.
  • Epoxy resin and phenolic resin are the mainstream choices of resin matrix abrasive materials at present, and the processing technology is relatively simple and easy, making resin abrasives the mainstream type in the current market.
  • it is an epoxy resin or a phenolic resin, there is a problem that the hardness and density of the substrate are relatively high after the solidification molding, so that the adhesion between the substrate and the abrasive grains and the polished surface of the stone is not high.
  • the heat generated during the work also makes the substrate soft and sticky, and the higher clamping degree of the resin on the abrasive grains makes the self-sharpness of the abrasive grains not good enough.
  • the existing formulation of such polishing pads is only suitable for the fine polishing of the surface of glass or other crystallites and amorphous objects; the second reason is the formulation of the existing polishing resin of this type of polishing sheet.
  • the system results in the hardness and density of the matrix is not suitable for stone, the third reason is that its abrasive system is not suitable for the grinding and polishing of stone.
  • the technical problem to be solved by the invention is to provide a novel polyurethane matrix stone grinding and polishing sheet and a preparation method thereof, which are used for grinding and polishing stone surface, have high gloss effect and work efficiency, and have higher economic significance and society. significance.
  • the stone grinding and polishing sheet with the polyurethane resin of the invention as the base is used for the renovation of the stone floor, and the effect and efficiency are obviously improved compared with the prior art;
  • the stone grinding and polishing sheet with the polyurethane resin as the base is used for The grinding and polishing of stone, especially for the refurbished grinding and polishing of stone floor, can eliminate the use of a large number of chemical polishing materials such as polishing powder, and avoid the pollution and damage caused by these chemical polishing materials to the environment and workers
  • the present invention adopts the following technical solutions.
  • a method for preparing a polyurethane matrix stone abrasive polishing sheet which is characterized in that the preparation is carried out according to the following steps:
  • component A the combined polyol, catalyst and foaming agent are separately poured into a mixing vessel and stirred uniformly to obtain a component A;
  • the mass ratio of the combined polyol, catalyst and blowing agent is: 100: 0.2 ⁇ 5: 0.1 ⁇ 5;
  • component B the predetermined powder abrasive is poured into the component A in proportion and stirred to obtain the component B;
  • the powder abrasive is a composition of synthetic diamond, silicon carbide, silicon oxide, and aluminum oxide according to a mass ratio of 100:0 to 40:0 to 10:0 to 40;
  • the mass ratio between the component A and the powder abrasive is 100:5 to 50;
  • the mass ratio between the polyisocyanate, the modified polyethylene wax powder and the reinforcing fiber as the component C is 100:0 to 5:0 to 5.
  • the mass ratio between the B component and the C component is 100: 60 to 110.
  • the step 1) is to prepare the component A: the combined polyol, the catalyst, and the foaming agent are respectively poured into the mixing container in proportion and stirred uniformly to obtain the component A;
  • the mass ratio of the combined polyol, catalyst, and foaming agent is: 100: 0.2 to 5: 0.1 to 5.
  • the combined polyol described in the step 1) is one or more of two or more kinds of polyether polyols or polyester polyols having different functionalities and different molecular weights.
  • the polyisocyanate in the step 3) is one of or a mixture of toluene diisocyanate, isophorone diisocyanate and a modified diisocyanate having a functionality of 2 to 4;
  • the modified polyethylene wax powder is a polyamide modified polyethylene wax;
  • the reinforcing fiber is glass fiber or synthetic fiber;
  • the combined polyol (including a polyether polyol or a polyester polyol or a mixture of the two) has a molecular weight in the range of 100 to 10,000, a hydroxyl value of 30 to 1000 mg KOH/g, and a functionality of 2 to 8.
  • a polyether polyol or a polyester polyol or a mixture of the two has a molecular weight in the range of 100 to 10,000, a hydroxyl value of 30 to 1000 mg KOH/g, and a functionality of 2 to 8.
  • the powder abrasive of step 2) is a powder having a particle diameter of 0.5 to 350 ⁇ m.
  • the mass ratio between the B component and the C component is 100:60 to 110.
  • the combined polyol is: a polyether polyol or a polyester polyol or a combination thereof in any ratio; wherein the catalyst is an amine catalyst, a triazine catalyst or an organometallic catalyst; or a tertiary amine catalyst, The combination of the triazine catalyst and the organometallic catalyst in any ratio; the foaming agent is a physical foaming agent or a chemical foaming agent or a combination of the two in any ratio.
  • the polyurethane matrix has a density of 0.1 to 0.5 g/cm 3 and a Shore A hardness of 30 to 90.
  • the method for preparing the polyurethane matrix stone abrasive polishing sheet is characterized by the following steps:
  • the mass ratio of the polyether polyol, the catalyst, the chain extender, the foaming agent and the plasticizer is: 100:0.3 to 5:1 to 6:0.5 to 5:1 to 5;
  • the catalyst is a tertiary amine catalyst or an organometallic catalyst or a combination of a tertiary amine catalyst and an organometallic catalyst in any ratio;
  • the powder abrasive is a composition of synthetic diamond, silicon carbide, silicon oxide, aluminum oxide and zinc oxide according to a mass ratio of 100:0 to 40, 100:0 to 10, 100:0 to 40, 100:0 to 5;
  • the mass ratio between the component A and the powder abrasive is 100:10 to 50;
  • the mass ratio between the polyisocyanate, the modified polyethylene wax powder and the reinforcing fiber as the component C is: 100:0 to 5:0 to 5;
  • a stone polishing polishing sheet having a density of 0.1 to 0.5 g/cm 3 and a Shore A hardness of 30 to 85 is obtained.
  • the polyether polyol described in the step 1) is one of two or more kinds of different functional low molecular weight polyether polyols;
  • the chain extender is a difunctional small molecular weight amine or An alcohol compound;
  • the foaming agent is a physical foaming agent; and
  • the plasticizer is fumed silica.
  • the polyisocyanate described in the step 3) is one of toluene diisocyanate, isophorone diisocyanate, polyarylpolymethylene isocyanate, and a modified diisocyanate having a functionality of 2 to 4 or two in any ratio. More than the above; the modified polyethylene wax powder is a polyamide modified polyethylene wax, used as a grinding aid and used to improve the wear resistance of the matrix; the reinforcing fiber is a glass fiber or a synthetic fiber, and is used as a matrix reinforcement. Rapid stirring means that the speed of the mixer is in the range of 1500 to 4500 rpm.
  • blowing agent is pentane
  • the polyether polyol has a molecular weight in the range of 300 to 2,000, a hydroxyl value of 50 to 600 mg KOH/g, and a functionality of 2 to 3.
  • the catalyst described in the step 1) is a tertiary amine catalyst.
  • the mass ratio between the B component and the C component is 100:60 to 110.
  • a polyurethane base stone abrasive polishing sheet prepared according to a preparation method of a polyurethane matrix stone abrasive polishing sheet.
  • a method for preparing a polyurethane matrix stone abrasive polishing sheet is characterized by the following steps:
  • component A the combined polyol, catalyst and foaming agent are separately poured into a mixing vessel and stirred uniformly to obtain a component A;
  • the mass ratio of the combined polyol, catalyst and blowing agent is: 100: 0.2 ⁇ 5: 0.1 ⁇ 5;
  • C component includes: mixing of polyisocyanate, modified polyethylene wax powder and reinforcing fiber;
  • the predetermined powder abrasive is poured into the polyisocyanate as the C component, the modified polyethylene wax powder and the reinforcing fiber;
  • the powder abrasive is a composition of synthetic diamond, silicon carbide, silicon oxide, and aluminum oxide according to a mass ratio of 100:0 to 40:0 to 10:0 to 40;
  • the mass ratio between the polyisocyanate, the modified polyethylene wax powder and the reinforcing fiber as the component C is 100:0 to 5:0 to 5.
  • the mass ratio between the C component and the powder abrasive is 100:10 to 50;
  • the mass ratio of component A to component D is from 100:60 to 120.
  • the component A is prepared by pouring the combined polyol, the catalyst and the foaming agent into the mixing container in proportion and stirring uniformly to obtain the component A;
  • the combined polyol is a polyether polyol or a polyester polyol, wherein the mass ratio of the polyether polyol or the polyester polyol, the catalyst, and the foaming agent is 100: 0.2 to 5: 0.1 to 5.
  • the combined polyol described in the step 1) is one or more of two or more kinds of polyether polyols or polyester polyols having different functionalities and different molecular weights.
  • the polyisocyanate according to the step 3) is one or more than two or more of toluene diisocyanate, isophorone diisocyanate and modified diisocyanate having a functionality of 2 to 4;
  • the modified polyethylene wax powder is a polyamide modified polyethylene wax;
  • the reinforcing fiber is glass fiber or synthetic fiber.
  • the combined polyol (including a polyether polyol or a polyester polyol or a mixture of the two) has a molecular weight in the range of 100 to 10,000, a hydroxyl value of 30 to 1000 mg KOH/g, and a functionality of 2 to 8. selected.
  • the powder abrasive of the step 2) is a powder having a particle diameter of 0.5 to 350 ⁇ m.
  • the mass ratio between the A component and the D component is 100:60 to 110.
  • the combined polyol is: a polyether polyol or a polyester polyol or a combination thereof in any ratio; wherein the catalyst is an amine catalyst, a triazine catalyst or an organometallic catalyst; or a tertiary amine catalyst, three A combination of a azine catalyst and an organometallic catalyst in any ratio.
  • the blowing agent is a physical blowing agent or a chemical blowing agent or a combination of the two in any ratio.
  • a polyurethane base stone abrasive polishing sheet prepared according to a preparation method of a polyurethane matrix stone abrasive polishing sheet.
  • the polyurethane matrix produced by the invention has suitable bubble walls and cells, and the abrasive particles are mixed therein, distributed on the polyurethane foam wall having a multi-dimensional structure, and the stone surface is rubbed under the pressure and rotation of the grinding device, and there is also Regularly releasing new, sharp, abrasive surfaces with working surfaces at different levels.
  • Abrasive grains have better self-sharpness, and thus the grinding sheet has higher grinding effect and efficiency.
  • the polyurethane matrix produced by the present invention has appropriate flexibility and has excellent adhesion and proper grinding force under the pressure of the grinding equipment, and thus has higher grinding effect and efficiency.
  • the polyurethane matrix produced by the present invention has suitable flexibility and cells.
  • the surface of the substrate is completely adhered to the surface of the stone to be polished.
  • the surface of the surface is always roughened, which not only has self-sharpness, but also has the largest working surface area.
  • the abrasive grains that have fallen off are continuously rubbed against the surface of the stone under these roughened abrasive surfaces, achieving secondary utilization and re-grinding, greatly improving the polishing rate, and thus having the best grinding and polishing effect and more. High grinding and polishing efficiency.
  • the polyurethane abrasive polishing sheet produced by the invention is composed of artificial diamond powder as the main grinding and polishing factor, and mixed with appropriate amount of silicon carbide, silicon oxide, aluminum oxide and zinc oxide powder to achieve the best grinding and polishing effect.
  • Synthetic diamond is currently the hardest type of stone grinding and polishing material system. It is more suitable for grinding and polishing mechanism with the right amount of abrasive with lower hardness. The effect and efficiency are enough to maximize.
  • the polyurethane abrasive polishing sheet produced by the invention adds an appropriate amount of modified high-density polyethylene wax powder, which not only makes the grinding substrate more wear-resistant, but also produces a “bead effect”, which reduces the grinding and grinding.
  • the surface resistance increases the grinding and polishing rate.
  • the polyurethane abrasive polishing sheet proposed by the present invention is a series or a set or a combination or unit of grinding and polishing functions having independent functions or combined functions to adapt to the rough surface grinding of the stone or from coarse to fine. Surface grinding or different requirements from coarse to fine to polishing process. It can be used to grind the stone with a grinding disc containing coarser abrasive grains. It can also be used to polish the surface of low-gloss stone with a grinding disc containing finer abrasive grains, or a set of grinding discs can be used to polish the stone. From coarse to fine to high gloss stone surface treatment.
  • the stone grinding and polishing sheet of the invention is carried out according to the following steps:
  • the mass ratio of the polyether polyol, the catalyst, the chain extender, the foaming agent and the plasticizer is: 100:0.3 to 5:1 to 6:0.5 to 5:1 to 5;
  • the catalyst is a tertiary amine catalyst or an organometallic catalyst or a combination of a tertiary amine catalyst and an organometallic catalyst in any ratio;
  • the powder abrasive is a composition of synthetic diamond, silicon carbide, silicon oxide, aluminum oxide and zinc oxide according to a mass ratio of 100:0 to 40, 100:0 to 10, 100:0 to 40, 100:0 to 5;
  • the mass ratio between the component A and the powder abrasive is 100:10 to 50;
  • the mass ratio between the polyisocyanate, the modified polyethylene wax powder and the reinforcing fiber as the component C is: 100:0 to 5:0 to 5;
  • a stone polishing polishing sheet having a density of 0.1 to 0.5 g/cm 3 and a Shore A hardness of 30 to 85 is obtained.
  • the mass ratio between the A component and the C component is 100: 60 to 110.
  • the mass ratio between the A component and the C component is 100: 90 to 110;
  • the mass ratio between the A component and the C component is 100: 80 to 100;
  • the mass ratio between the A component and the C component is 100:60 to 90.
  • the polyether polyol is one or a combination of different functional low molecular weight polyether polyols, the molecular weight of which is optional from 300 to 2000, and the hydroxyl value of which is optional from 50 to 600 KOH/g. Preference is given to polyether triols having a hydroxyl number of from 200 to 550 KOH/g.
  • the chain extender may be selected from a difunctional small molecular weight amine or alcohol compound, preferably ethylene glycol.
  • the blowing agent is a physical blowing agent, preferably pentane.
  • the catalyst is one or more of a tertiary amine catalyst and an organometallic catalyst, preferably a tertiary amine catalyst dimethylcyclohexylamine.
  • the plasticizer is an ultrafine silica powder, preferably a fumed silica fine powder.
  • the abrasive component is a combination of artificial stone diamond and one or more of silicon carbide, silicon oxide, aluminum oxide, and zinc oxide micropowder.
  • the synthetic diamond abrasive grain size is 0.2 ⁇ m-350 ⁇ m.
  • the diameter of the synthetic diamond abrasive grains for preparing the coarse abrasive grains is preferably from 100 ⁇ m to 350 ⁇ m; the diameter of the synthetic diamond abrasive grains for preparing the fine abrasive grains is preferably from 100 ⁇ m to 25 ⁇ m; and the size of the synthetic diamond abrasive grains for preparing the polishing sheets Preferably 25 ⁇ m - 1 ⁇ m;
  • the silicon carbide powder has a particle size of 20 ⁇ m to 100 ⁇ m, preferably a particle diameter of 20 ⁇ m to 50 ⁇ m.
  • the silica powder has a particle diameter of 0.1 ⁇ m to 20 ⁇ m, preferably a particle diameter of 1 ⁇ m to 10 ⁇ m.
  • the alumina powder has a particle diameter of 0.1 ⁇ m to 20 ⁇ m, preferably a particle diameter of 1 ⁇ m to 10 ⁇ m.
  • the zinc oxide powder has a particle size of 1.5 ⁇ m to 50 ⁇ m, preferably a particle diameter of 2 ⁇ m to 10 ⁇ m.
  • the polyisocyanate is one or more selected from the group consisting of toluene diisocyanate, isophorone diisocyanate, polyarylpolymethylene isocyanate, and modified diisocyanate having a functionality of 2-4.
  • a carbodiimide-modified liquefied MDI having an average functionality greater than 2 and an NCO mass fraction of from 28% to 30% is preferred.
  • the modified polyethylene wax is a polyamide modified polyethylene homopolymer, which is micro-powder and has a density of 0.95-1.
  • the density is 0.97 and the particle diameter D50 is 5.5-7 um.
  • the reinforcing fibers are polypropylene fibers having a length of 3-12 mm. Preferably, the length is 6 mm.
  • the stone abrasive polishing sheet prepared by the invention has a density of 0.1-0.5 g/cm 3 ; Shore A hardness 30-85, a single piece or a combination of one or more sets of functions.
  • This example provides a set of marble grinding and polishing sheets, which are produced according to the different abrasive particle sizes. 1#, 2#, 3#, 4#, 5#, 6#, 7# have coarse grinding, fine grinding and polishing functions. Grinding combination.
  • Prefabricated component A 100 g of polyether triol (average molecular weight 350, hydroxyl value 500), 3 g of tertiary amine catalyst dimethylcyclohexylamine, 5 g of chain extender ethylene glycol, and foaming 1.5 g of pentane and 5 g of plasticizer fumed silica fine powder, mixed in sequence and used until use.
  • 7 parts of the same component A were prefabricated for the preparation of the 1-7# grinding sheet group.
  • component B measuring 35 g of 270-300 ⁇ m synthetic diamond abrasive grains and 15 g of 30-35 ⁇ m carbonized silicon micropowder as 1# abrasive; measuring 125-150 ⁇ m synthetic diamond abrasive grains 35 g and 30-35 ⁇ m carbonized silicon micropowder 15 grams as 2# abrasive; measuring 50-60 ⁇ m synthetic diamond abrasive grains 35g and 30-35 ⁇ m carbonized silicon fine powder 15g as 3# abrasive; measuring 25-30 ⁇ m synthetic diamond abrasive grains 35g as 4# abrasive; measuring 12-15 ⁇ m 35 g of synthetic diamond abrasive grains were used as 5# abrasive; 35 g of 4-6 ⁇ m synthetic diamond abrasive grains were measured as 6# abrasive; 35 g of 1-3 ⁇ m synthetic diamond abrasive grains were measured as 7# abrasive.
  • component C 110 g of commercially available carbodiimide modified liquefied MDI, 3.5 g of polyamide modified high density polyethylene wax micropowder, 3 g of polypropylene fiber, mixed in sequence and ready for use .
  • 7 parts of the same C component were prefabricated for the preparation of the 1#-7# grinding sheet group.
  • the foamed molded 1# polyurethane foam is sliced according to the design specifications to form 1#
  • Example 2 uses the same ingredients of component A and component B as in example 1. Similarly, the A and B components are prefabricated in seven portions.
  • Example 3 uses the same components A and C as the example one. A and C components are prefabricated.
  • Example 3 B component only uses the same ingredients as the 7# abrasive in the example one B component, ie 1-3 ⁇ m Synthetic diamond abrasive grains 35 grams. Part B is prefabricated.
  • the 7# abrasive polishing sheet prepared in Example 3 can be used as a separate function polishing material for the polishing part of stone grinding to replace the existing commercially available polishing sheet and polishing powder.
  • Example 1 The following are the experimental test results of Example 1, Example 2 and Example 3 and the results of the comparative test experiments.
  • the grinding equipment was equipped with a 12-head floor grinder (12 pieces of grinding discs, rotating at 580 rpm), and the polyurethane grinding and polishing sheets 1-7# prepared in the same manner were used to refurbish and polish the worn marble floor.
  • the floor was coarsely ground by separately installing 1# grinding polishing sheet and 2# grinding polishing sheet, respectively.
  • the speed of the grinding machine was about 20 m/min, and each row of marble was grounded twice.
  • the floor was finely ground by separately installing 3# grinding polishing sheets, 4# grinding polishing sheets and 5# grinding polishing sheets, and the speed of the grinding machine was about 30 m/min, and each row of marble was grounded twice.
  • the floor was polished by 12 pieces of 6# grinding polishing pad and 7# grinding polishing piece respectively.
  • the speed of the grinding machine was about 25 m/min, and each row of marble was polished twice.
  • the gloss of the marble surface before and after grinding was measured using a mirror gloss meter. 10 panels were randomly tested, and 5 points were tested on each panel to calculate the average gloss. The results are shown in Table 1.
  • the worn marble floor was refurbished and polished in turn, and the grinding speed and process and experimental test of the grinder were the same.
  • the advancement speed and process of the grinder are the same as those of the experimental test.
  • the area after the polishing test and polishing the area of 10 square meters is selected, and the same as the experimental test is used.
  • the 12-floor floor grinder was re-polished with the 7# abrasive polishing sheet (used as an independent polishing function) prepared in Example 3.
  • the advancement speed and process of the grinder are the same as those of the experimental test.
  • the gloss test method of the comparison test 2 is the same as the test test 1, and the results are shown in Table 4.
  • a 10 square meter area was selected in a polished and polished area after comparative testing, and the marble floor was repolished using a disc floor polisher (175 rpm) in combination with a commercially available marble polishing powder.
  • the polishing speed is approximately 2 square meters / 3 minutes. Clean the polishing slurry.
  • the remaining 10 square meters area was selected in the area after the comparison test, grinding and polishing, using a disc floor polishing machine (rotation speed of 175 rpm), together with a commercially available precision glass polyurethane polishing sheet (containing particle size)
  • the marble floor was repolished with 0.8-2 ⁇ m yttrium oxide.
  • the polishing speed is approximately 2 square meters / 5 minutes.
  • the gloss test method of Comparative Test 4 is the same as Test Test 1, and the results are shown in Table 6.
  • the new polyurethane stone abrasive polishing sheet prepared by the invention not only has remarkable polishing and polishing effect, but also has higher working efficiency, and solves and compensates for the renovation of the existing stone floor.
  • the lack of gloss and the inefficiency of the original board also eliminates the harm caused by the use of polishing powder to workers and the environment.
  • Example 1 Comparing the results of Experimental Test 1 and Experimental Test 2, reflecting the difference in performance between the abrasive polishing sheets prepared in Example 1 and Example 2.
  • Example 1 Addition of modified polyethylene wax powder has a better improvement on the effect, efficiency and durability of the abrasive polishing sheet of the present invention.
  • the new polyurethane abrasive polishing sheet prepared by the above example has a density of 0.35-0.42 g/cm 3 and a Shore A hardness of 60-80.
  • the novel abrasive polishing sheet of the invention can adjust the composition, the proportion and the specification of the materials in the components A, B and C and the density and hardness of the foam matrix according to the variety and hardness of the stone to obtain the best effect and efficiency.
  • the new type of grinding disc of the invention can adjust the shape and specification of the grinding sheet, and is installed for the large-scale grinding machine specialized in the stone processing factory for the grinding and polishing of the stone large board.
  • the novel polyurethane matrix stone grinding and polishing sheet of the invention is used for grinding and polishing stone surface, has high gloss effect and work efficiency, and has higher economic significance and social significance.
  • the stone grinding and polishing sheet with polyurethane resin as the base is used for the renovation of the stone floor, and the effect and efficiency are obviously improved.
  • the stone grinding and polishing sheet with the polyurethane resin as the base is used for the grinding and polishing of the stone, especially for The refurbishment and polishing of the stone floor can eliminate the use of a large amount of chemical polishing materials such as polishing powder, which reduces the pollution and damage caused by these chemical polishing materials to the environment and workers.

Abstract

一种聚氨酯基体石材研磨抛光片及其制备方法，此石材研磨抛光片涉及了制取以聚氨酯基体，并混合人造金刚石微粉、碳化硅、氧化硅、氧化铝、氧化锌超细粉体为磨料组分的新型石材研磨抛光材料。石材研磨抛光材料的密度为0.1～0.5克/cm3、邵氏A硬度为30～85，聚氨酯基体具有适当的泡壁和泡孔，研磨颗粒混合其中，分布在呈多维结构的聚氨酯泡壁上，在研磨设备压力和旋转作用下磨擦石材表面，同时还会有规律的在不同的层面不断地释放出新的、锋利的具有工作面的磨粒。磨粒具有更好的自锐性，因而磨片具有更高的研磨效果和效率。

Description

聚氨酯基体石材研磨抛光片及其制备方法 技术领域
本发明涉及属于石材表面研磨抛光技术领域。特别是一种作为新型石材研磨抛光材料的以聚氨酯为基体的石材研磨抛光片及其制备方法，所述研磨抛光片主要应用于装饰石材的表面研磨抛光和石材地板翻新。
背景技术
天然和人造装饰石材表面具有较高的光泽和清晰度，更能展现石材的色彩和装饰效果，因此人们往往把石材表面光泽度的高低作为评价石材加工质量和表面效果的标准。石材板材的表面研磨抛光、石材地板翻新时的研磨抛光，都是通过性能不同的专业设备配合具有研磨功能的材料来实现的。因而具有更好研磨、抛光功能和效率的研磨抛光材料也成为石材加工和石材护理行业高度关注的一个课题。
在石材研磨领域，对石材板材表面进行磨削和抛光，旨在使石材表面得到理想的平整或光亮效果。对石材进行研磨抛光，简单的可以划分为粗磨、细磨和抛光三个过程。在磨料设计体系和操作工艺上也是一个从粗到细、从粗糙到光滑的过程。当然，石材表面研磨抛光效果与研磨设备的性能有较大的关系。近些年研磨设备性能的提升对石材研磨抛光效果的提升影响很大，而研磨抛光材料(片)性能的提高显得滞后或停滞不前。
在石材地板研磨或翻新领域，由于石材板材的平整度或铺装技巧等因素的影响，石材铺装后地面的平整度会出现程度不同的差异，尤其是板材的边缘和对角部位这些不平整感比较明显，影响着石材地面的装饰效果。为了消除这些问题和现象，通常在石材铺装后使用一种“石材地面整体研磨工艺”对石材地面进行重新整体研磨抛光，以获得理想的地面平整度和光泽效果。这种“石材地面整体研磨工艺”的核心组成有两部分，一个是设备，一个是磨片。由于受到设备的可移动性和可操作性等因素的制约，这些地面研磨设备的研磨性能远远不及石材工厂那些专业设备，因而在光泽效果上与板材原有光泽会存在较大的差异。为了弥补这种工艺上的缺陷和差异，通常在地板研磨最后的抛光环节使用一些化学抛光材料，以提高石材表面的光亮效果。例如，使用一些以草酸和草酸盐为主要成成分的抛光粉或抛光剂。这些以粉体或液体为物态形式的抛光材料在可操作性和效率上存在着一些缺憾，而且在程序和工艺上繁琐，效率低，成本高，对环境和和作 业人员也存在侵害等。
石材地面受到磨擦后其表面光泽也会受到破坏，这时也需要对其表面进行翻新处理，这也成为石材护理技术的一个重要内容。现有石材地面的翻新设备和研磨抛光材料与上述“石材地面整体研磨工艺”相同，研磨抛光材料(片)的性能和效率同样成为一个关键问题。
研磨抛光片的自锐性对石材的研磨和抛光效果有较大的影响，这是一个行业公认的常识。对于转速低、压力轻、工作面积小的小型研磨设备来说，研磨抛光片的性能往往决定着最终的研磨效果。磨粒的自锐性是指埋藏在基体里的磨粒在锋利面受到磨损后能够及时的暴露或释放出另外一些新的具有锋利面的磨粒。金属合金基体或环氧树脂基体以及酚醛树脂基体的磨料(磨片)往往有较好的密度，对粉体磨粒也有较高的夹持力。环氧树脂基体以及酚醛树脂基体在研磨时表层受热软化，也使得磨料的自锐性变差。实际上磨料的自锐性就是一种“自我更新”和“推陈出新”的能力。
目前国内外石材研磨抛光片生产制作主要有三种基体和形式，一种是矿土基体，一种是金属合金基体，一种是树脂基体。这三种不同的基体都是要在添加融合一定量的人造金刚石、炭化硅和氧化铝等磨料的基础上来完成研磨功能的。
矿土研磨片是利用菱苦土制备石材研磨抛光片的一种传统的做法，由于生产工艺繁琐，制造效率低下，并且硬度难以调整，目前已经很少采用。金属合金基体研磨片，基体坚硬无弹性，在研磨设备的重压下有对石材表面划伤的可能，目前仅仅被用于石材的粗磨程序。
树脂基体研磨片，基体相对于石材硬度较低，适合用于石材的粗磨、细磨和抛光。环氧树脂和酚醛树脂是目前树脂基体研磨材料的主流选择，而且在加工工艺上相对简单省事，使得树脂类磨料成为目前市场主流种类。但是，无论是环氧树脂还是酚醛树脂，在固化成型后也存在着基体硬度和密度相对较高的问题，使得基体和磨粒与石材被研磨表面的贴合度不高。而工作时产生的热量也使得基体变软变粘，树脂对磨粒较高的夹持度也使得磨粒的自锐性不够好。这些缺陷是目前行业的一个普遍问题和瓶颈，致使石材的研磨抛光效果在较长的一个时期没有显著的提高和突破。
以聚氨酯树脂为基体的抛光片应用于精密玻璃抛光的技术已经有报道。经过文献检索和市场调查发现，现有这类用于精密玻璃抛光的聚氨酯树脂抛光片的功能形式一般有两种：一种是不含磨料的，作为抛光模和介质使用，用于CMP化学机械抛光；一种是含有氧化铈磨料的，用于光学玻璃和半导体晶片等高精度抛光。但市场反应第二种抛光片如果用于玻璃抛光，其操作性和实用性并不高，这种抛光片对石材抛光的应用也未见报道和案例。
申请人采用上述这类聚氨酯树脂为基体的抛光片进行了多次石材抛光试验。 从测试上看，这类抛光片用于石材的抛光效果较差，其现有制作技术和工艺并不适合石材的研磨抛光。从理论上分析，原因之一是现有的这类抛光片的配方体系仅仅适合玻璃或其它微晶和无晶物体表面的精细抛光；原因之二是现有的这类抛光片聚氨酯树脂的配方体系导致基体硬度和密度并不适合石材，原因之三是其磨料体系并不适合石材的研磨抛光。
发明的公开
本发明所要解决的技术问题是，提供一种新型聚氨酯基体石材研磨抛光片及制备方法，用于石材表面的研磨抛光，具有较高的光泽效果和作业效率，也具有更高的经济意义和社会意义。第一、以聚氨酯树脂作基体，能使研磨抛光片与石材被研磨表面具有更好的贴合性，磨粒具有更好的自锐性，在作业效果和效率上有较大幅度的提升；第二、以本发明聚氨酯树脂作基体的石材研磨抛光片用于石材地板的翻新作业，在效果和效率上较之前的技术明显提高；第三、以聚氨酯树脂作基体的石材研磨抛光片用于石材的研磨抛光，尤其用于石材地板的翻新研磨抛光，能够省去使用大量的抛光粉等化学抛光材料，避免了这些化学抛光材料对环境和作业人员带来的污染和伤害。
为了解决上述技术问题，本发明采用了以下技术方案。
一种聚氨酯基体石材研磨抛光片的制备方法，其特征在于按照以下步骤进行制备：
1)制备A组分：将组合多元醇、催化剂和发泡剂按比例分别倒入混合容器中并搅拌均匀，得到A组分；
组合多元醇、催化剂和发泡剂的质量比为：100：0.2～5：0.1～5；
2)制备B组分：将预设的粉体磨料按比例倒入A组分中搅拌均匀得到B组分；
所述粉体磨料为人造金刚石、碳化硅、氧化硅、氧化铝按照质量比100：0～40：0～10：0～40的组合物；
A组分与粉体磨料之间的质量比是100：5～50；
3)制备石材研磨抛光片：将多异氰酸酯、改性聚乙烯蜡粉和增强纤维按比例混合作为C组分加入到B组分中快速搅拌，或者将B组份加入到C组份中快速搅拌，然后倒入模具内压模成型；
其中作为C组分的多异氰酸酯、改性聚乙烯蜡粉和增强纤维之间的质量比是：100：0～5：0～5。
B组分和C组分之间的质量比为100：60～110。
优选地，所述的步骤1)制备A组分是：将组合多元醇、催化剂、发泡剂按比例分别倒入混合容器中并搅拌均匀，得到A组分；
组合多元醇、催化剂、发泡剂的质量比为：100：0.2～5：0.1～5。
优选地，所述的步骤1)所述的组合多元醇为不同官能度和不同分子量的聚醚多元醇或聚酯多元醇中的一种或者任意比例的两种以上。
优选地，所述的步骤3)所述的多异氰酸酯为甲苯二异氰酸酯、异佛尔酮二异氰酸酯和官能度2～4的改性二异氰酸酯中的其中一种或者任意比例的两种以上；所述的改性聚乙烯蜡粉为聚酰胺改性聚乙烯蜡；所述的增强纤维为玻璃纤维或合成纤维；。
优选地，所述的组合多元醇(包括聚醚多元醇或聚酯多元醇或两者任意比混合物)分子量在100～10000范围内，羟值在30～1000mg KOH/g，官能度2～8可选。
优选地，步骤2)所述粉体磨料为粒径在0.5-350μm的粉体。
优选地，步骤3)中，B组分与C组分之间的质量比为100：60～110。
优选地，组合多元醇为：聚醚多元醇或聚酯多元醇或二者任意比例组合；其中所述的催化剂为胺类催化剂、三嗪类催化剂或者有机金属类催化剂；或者叔胺类催化剂、三嗪类催化剂与有机金属类催化剂任意比例的组合；发泡剂为物理发泡剂或化学发泡剂或二者任意比例的组合物。
优选地，所述的聚氨酯基体的密度为0.1～0.5克/cm3，邵氏A硬度为30～90。
优选地，所述的聚氨酯基体石材研磨抛光片的制备方法，其特征在于按照以下步骤进行：
1)、制备A组分：将聚醚多元醇、催化剂、扩链剂、发泡剂和增塑剂按比例分别倒入混合容器中并搅拌均匀，得到A组分；
聚醚多元醇、催化剂、扩链剂、发泡剂和增塑剂的质量比为：100：0.3～5：1～6：0.5～5：1～5；
其中所述的催化剂为叔胺类催化剂或者有机金属类催化剂或者叔胺类催化剂与有机金属类催化剂任意比例的组合；
2)、制备B组分：将预设的粉体磨料按比例倒入A组分中搅拌均匀得到B组分；
所述粉体磨料为人造金刚石、碳化硅、氧化硅、氧化铝和氧化锌按照质量比100：0～40、100：0～10、100：0～40、100：0～5的组合物；
A组分与粉体磨料之间的质量比是100：10～50；
3)、制备石材研磨抛光片：将多异氰酸酯、改性聚乙烯蜡粉和增强纤维按比例混合作为C组分加入到B组分中快速搅拌15～45秒的时间，然后倒入模具内 压模成型，最后机械切片成型，得到聚氨酯基体石材研磨抛光片；
其中作为C组分的多异氰酸酯、改性聚乙烯蜡粉和增强纤维之间的质量比是：100：0～5：0～5；
通过调整A组分和C组分之间的质量比，得到密度0.1～0.5克/cm3、邵氏A硬度30～85的石材研磨抛光片。
进一步，步骤1)所述的聚醚多元醇为不同官能度低分子量聚醚多元醇中的一种或者任意比例的两种以上；所述的扩链剂为二官能度小分子量的胺类或醇类化合物；所述的发泡剂为物理发泡剂；所述的增塑剂为气相二氧化硅。
进一步，步骤3)所述的多异氰酸酯为甲苯二异氰酸酯、异佛尔酮二异氰酸酯、多芳基多亚甲基异氰酸酯和官能度2～4的改性二异氰酸酯中的一种或者任意比例的两种以上；所述的改性聚乙烯蜡粉为聚酰胺改性聚乙烯蜡，作为助磨剂并用于提高基体的耐磨度；所述的增强纤维为玻璃纤维或合成纤维，作为基体的增强剂；快速搅拌是指搅拌机的转速在1500～4500转/分钟范围内。
进一步，所述的发泡剂是戊烷。
进一步，聚醚多元醇分子量在300～2000范围内，羟值在50～600mg KOH/g，官能度2～3可选。
进一步，步骤1)所述的催化剂为叔胺类催化剂。
进一步，其特征在于：步骤3)中，B组分与C组分之间的质量比为100：60～110。
依据聚氨酯基体石材研磨抛光片的制备方法制备的聚氨酯基体石材研磨抛光片。
优选地，一种聚氨酯基体石材研磨抛光片的制备方法，其特征在于按照以下步骤制备：
1)制备A组分：将组合多元醇、催化剂和发泡剂按比例分别倒入混合容器中并搅拌均匀，得到A组分；
组合多元醇、催化剂和发泡剂的质量比为：100：0.2～5：0.1～5；
2)制备C组分：C组分包括：多异氰酸酯、改性聚乙烯蜡粉和增强纤维中混合；
制备D组分：将预设的粉体磨料按比例倒入作为C组分的多异氰酸酯、改性聚乙烯蜡粉和增强纤维中混合；
所述粉体磨料为人造金刚石、碳化硅、氧化硅、氧化铝按照质量比100：0～40：0～10：0～40的组合物；
其中作为C组分的多异氰酸酯、改性聚乙烯蜡粉和增强纤维之间的质量比是：100：0～5：0～5。
C组分与粉体磨料之间的质量比是100：10～50；
3)制备石材研磨抛光片：将A组分加入到D组分中、或者将D组份加入A组分中快速搅拌，然后倒入模具内压模成型。
A组分与D组分的质量比为100：60～120。
进一步，所述的步骤1)制备A组分是：将组合多元醇、催化剂、发泡剂按比例分别倒入混合容器中并搅拌均匀，得到A组分；
所述的组合多元醇为聚醚多元醇或聚酯多元醇，其中：聚醚多元醇或聚酯多元醇、催化剂、发泡剂的质量比为：100：0.2～5：0.1～5。
进一步，所述的步骤1)所述的组合多元醇为不同官能度和不同分子量的聚醚多元醇或聚酯多元醇中的一种或者任意比例的两种以上。
进一步，所述的步骤3)所述的多异氰酸酯为甲苯二异氰酸酯、异佛尔酮二异氰酸酯和官能度2～4的改性二异氰酸酯中的其中一种或者任意比例的两种以上；所述的改性聚乙烯蜡粉为聚酰胺改性聚乙烯蜡；所述的增强纤维为玻璃纤维或合成纤维。
进一步，所述的组合多元醇(包括聚醚多元醇或聚酯多元醇或两者任意比混合物)分子量在100～10000范围内，羟值在30～1000mg KOH/g，官能度2～8可选。
进一步，步骤2)所述粉体磨料为粒径在0.5-350μm的粉体。
进一步，步骤3)中，A组分与D组分之间的质量比为100：60～110。
进一步，组合多元醇为：聚醚多元醇或聚酯多元醇或二者任意比例组合；其中所述的催化剂为胺类催化剂、三嗪类催化剂或者有机金属类催化剂；或者叔胺类催化剂、三嗪类催化剂与有机金属类催化剂任意比例的组合。发泡剂为物理发泡剂或化学发泡剂或二者任意比例的组合物。
依据聚氨酯基体石材研磨抛光片的制备方法制备的聚氨酯基体石材研磨抛光片。
本发明的积极效果在于：
1、本发明所产生的聚氨酯基体具有适当的泡壁和泡孔，研磨颗粒混合其中，分布在呈多维结构的聚氨酯泡壁上，在研磨设备压力和旋转作用下磨擦石材表面，同时还会有规律的在不同的层面不断地释放出新的、锋利的具有工作面的磨粒。磨粒具有更好的自锐性，因而磨片具有更高的研磨效果和效率。
2、本发明所产生的聚氨酯基体具有适当柔韧性，在研磨设备的压力作用下与石材被研磨表面具有极好的贴合度和适当的研磨作用力，因而具有更高的研磨效果和效率。
3、本发明所产生的聚氨酯基体具有适当柔韧性和泡孔。在工作时基体表面与石材被研磨表面完全贴合，通过这些在基体不同层面上分布的泡孔，使得磨片表面始终粗糙化，不仅具有了自锐性，更具有了最大工作表面积。而那些从基体 中脱落下来的磨粒又在这些粗糙化的研磨表面下不断地与石材表面再磨擦，实现了二次利用和再研磨，极大的提高了研磨速率，因而具有最佳的研磨抛光效果和更高的研磨抛光效率。
4、本发明所产生的聚氨酯研磨抛光片是以人造金刚石粉体为主要研磨和抛光因子，搭配混合适量的碳化硅、氧化硅、氧化铝和氧化锌粉体，以达到最佳研磨和抛光效果。人造金刚石是目前石材研磨抛光材料体系中最坚硬的一种，搭配适量的硬度较低的磨料更加符合研磨和抛光机理，效果和效率够满足最大化。
5、本发明所产生的聚氨酯研磨抛光片添加了适量的改性高密度聚乙烯蜡粉，不仅使磨片基体更加耐磨，而且还会产生“微珠效应”,降低了磨片与被研磨表面的阻力，提高了研磨和抛光速率。
6、本发明所提出的聚氨酯研磨抛光片是一系列或一套或一组或一片具有独立功能或组合功能的研磨和抛光功能的组合或单元，以适应石材的粗表面研磨或由粗到细表面研磨或由粗到细再到抛光过程的不同要求。它既可以选用含有较粗磨粒的磨片对石材做磨平处理，也可选用含有较细磨粒的磨片对低光泽的石材表面进行抛光处理，也可选用成套的磨片对石材进行由粗到细再到高光泽的石材表面处理。
实现本发明的最佳方式
下面结合实施实例和对比实验效果进一步说明本发明。
本发明石材研磨抛光片按照以下步骤进行：
1)、制备A组分：将聚醚多元醇、催化剂、扩链剂、发泡剂和增塑剂按比例分别倒入混合容器中并搅拌均匀，得到A组分；
聚醚多元醇、催化剂、扩链剂、发泡剂和增塑剂的质量比为：100：0.3～5：1～6：0.5～5：1～5；
其中所述的催化剂为叔胺类催化剂或者有机金属类催化剂或者叔胺类催化剂与有机金属类催化剂任意比例的组合；
2)、制备B组分：将预设的粉体磨料按比例倒入A组分中搅拌均匀得到B组分；
所述粉体磨料为人造金刚石、碳化硅、氧化硅、氧化铝和氧化锌按照质量比100：0～40、100：0～10、100：0～40、100：0～5的组合物；
A组分与粉体磨料之间的质量比是100：10～50；
3)、制备石材研磨抛光片：将多异氰酸酯、改性聚乙烯蜡粉和增强纤维按比例混合作为C组分加入到B组分中快速搅拌15～45秒的时间，然后倒入模具内 压模成型，最后机械切片成型，得到聚氨酯基体石材研磨抛光片；
其中作为C组分的多异氰酸酯、改性聚乙烯蜡粉和增强纤维之间的质量比是：100：0～5：0～5；
通过调整A组分和C组分之间的质量比，得到密度0.1～0.5克/cm3、邵氏A硬度30～85的石材研磨抛光片。
步骤3)中，A组分与C组分之间的质量比为100：60～110。
其中用于粗磨阶段的研磨片，A组分和C组分之间的质量比为100：90～110；
其中用于细磨阶段的研磨片，A组分和C组分之间的质量比为100：80～100；
其中用于抛光阶段的研磨片，A组分和C组分之间的质量比为100：60～90。
所述的聚醚多元醇为不同官能度低分子量聚醚多元醇的一种和多种组合，其分子量在300-2000可选，其羟值在50-600KOH/g可选。优选羟值在200-550KOH/g的聚醚三醇。
所述的扩链剂可选二官能度小分子量的胺类或醇类化合物，优选乙二醇。
所述的发泡剂为物理发泡剂，优选戊烷。
所述的催化剂为叔胺类催化剂和有机金属催化剂中的一种或多种，优选叔胺催化剂二甲基环己胺。
所述的增塑剂为超细二氧化硅粉体，优选气相二氧化硅微粉。
所述的磨料组分由人造石金刚石和碳化硅、氧化硅、氧化铝和氧化锌微粉其中的一种或多种组合。
其中人造金刚石磨粒粒径0.2μm-350μm可选。用于制作粗磨磨片的人造金刚石磨粒粒径优选100μm-350μm；用于制作细磨磨片的人造金刚石磨粒粒径优选100μm-25μm；用于制作抛光片的人造金刚石磨粒粒径优选25μm-1μm；
其中碳化硅粉体粒径20μm-100μm可选，优选粒径20μm-50μm。
其中氧化硅粉体粒径0.1μm-20μm可选，优选粒径1μm-10μm。
其中氧化铝粉体粒径0.1μm-20μm可选，优选粒径1μm-10μm。
其中氧化锌粉体粒径1.5μm-50μm可选，优选粒径2μm-10μm。
所述的多异氰酸酯为甲苯二异氰酸酯、异佛尔酮二异氰酸酯、多芳基多亚甲基异氰酸酯和官能度2-4的改性二异氰酸酯中的一种或者任意比例的两种以上。优选平均官能度大于2、NCO质量份数在28％-30％的碳化二亚胺改性液化MDI。
所述的改性聚乙烯蜡为聚酰胺改性聚乙烯均聚物，微粉状，密度0.95-1。优选密度为0.97、粒径D50：5.5-7um。
所述的增强纤维为聚丙烯纤维，长度3-12mm。优选长度为6mm。
本发明制备的石材研磨抛光片的密度0.1-0.5克/cm3；邵氏A硬度30-85，单片或一组或多组的功能组合。
以下是本发明的具体制备实例。
实例一
本实例提供一组大理石研磨抛光片的制作方法，按所用磨料粒径不同产生1#、2#、3#、4#、5#、6#、7#具备粗磨、细磨和抛光功能的磨片组合。
(一)、预制A组份：以聚醚三醇(平均分子量350，羟值500)100克、叔胺催化剂二甲基环己胺3克、扩链剂乙二醇5克、、发泡剂戊烷1.5克、增塑剂气相二氧化硅微粉5克，按序混合搅拌均匀待用。本实例预制相同A组份7份，用于制取1-7#磨片组。
(二)、准备B组份：计量270-300μm人造金刚石磨粒35克和30-35μm炭化硅微粉15克作为1#磨料；计量125-150μm人造金刚石磨粒35克和30-35μm炭化硅微粉15克作为2#磨料；计量50-60μm人造金刚石磨粒35克和30-35μm炭化硅微粉15克作为3#磨料；计量25-30μm人造金刚石磨粒35克作为4#磨料；计量12-15μm人造金刚石磨粒35克作为5#磨料；计量4-6μm人造金刚石磨粒35克作为6#磨料；计量1-3μm人造金刚石磨粒35克作为7#磨料。
(三)、制备C组份：一种市售碳化二亚胺改性液化MDI 110克、聚酰胺改性高密度聚乙烯蜡微粉3.5克、聚丙烯纤维3克，按序混合搅拌均匀待用。本实例预制相同C组份7份，用于制取1#-7#磨片组。
(四)、将计量好的B组份1#磨料与一份A组分混合，使用电动搅拌机搅拌均匀。再将计量好的C组份一份倒入上述AB混合物内，使用电动搅拌机快速混合均匀，然后倒入模具内发泡成型待用。
(五)、将发泡成型的1#聚氨酯泡沫体按照设计的规格切片成型，形成1#
研磨抛光片成品，并做好标记。
(六)、分别依次选用B组分其余6个规格的磨料组份，与一份A组份混合，再与一份C组份混合。由此制取另外6个2#-7#研磨抛光片，并分别做好相应标记。
实例二
(一)实例二采用与实例一完全相同的A组份和B组份配料。同样A、B组份各预制七份。
(二)将实例一C组份中聚酰胺改性高密度聚乙烯蜡粉和聚丙烯纤维减掉。同样预制七份。
(三)采用与实例一相同的工艺和程序制取1-7#研磨抛光片组。
实例三
(一)实例三采用与实例一完全相同的A组份和C组份配料。A、C组份各预制一份。
(二)实例三B组份仅采用与实例一B组份中7#磨料相同的配料，即1-3μm 人造金刚石磨粒35克。B组份预制一份。
(三)采用与实例一相同的工艺和程序制取7#抛光片。
(四)实例三制取的7#研磨抛光片可作为独立功能的抛光材料单独用于石材研磨的抛光环节，以替代现有市售的抛光片和抛光粉。
以下是实例一、实例二和实例三的实验测试结果和对比测试实验过结果。
实验测试一
对受到磨损、失光严重的大理石地板重新研磨抛光，做翻新处理。研磨设备采用12头地板研磨机(安装12片磨片，转速为580转/分钟)，配合实例一制取的聚氨酯研磨抛光片1-7#依次对受到磨损的大理石地板进行翻新研磨和抛光。
分别安装1#研磨抛光片和2#研磨抛光片各12片对地板进行粗磨处理，研磨机推进的速度约为20米/分钟，每行大理石研磨两个来回。
分别安装3#研磨抛光片、4#研磨抛光片和5#研磨抛光片各12片对地板进行细磨处理，研磨机推进的速度约为30米/分钟，每行大理石研磨两个来回。
分别安装6#研磨抛光片和7#研磨抛光片各12片对地板进行抛光处理，研磨机推进的速度约为25米/分钟，每行大理石研磨两个来回。
使用镜向光泽仪测量研磨前后的大理石表面光泽。随机测试10块板面，每块板面测试5个点，计算平均光泽度。结果见表1。
表1
Figure PCTCN2017098586-appb-000001
实验测试二
与实验测试一相同区域的受到磨损、失光严重的大理石地板重新研磨抛光，做翻新处理。
使用与实验测试一相同的12头地板研磨机，配合实例二制取的聚氨酯研磨抛光1-7#依次对受到磨损的大理石地板进行翻新研磨和抛光，研磨机的推进速度和工艺与实验测试一相同。
实验测试二的光泽测试方法与实验测试一相同，结果表2。
表2
Figure PCTCN2017098586-appb-000002
Figure PCTCN2017098586-appb-000003
对比测试一
与实验测试一相同区域的受到磨损、失光严重的大理石地板重新研磨抛光，做翻新处理。
使用与实验测试一相同的12头地板研磨机，配合市售酚醛树脂软磨片1-7#(同样具有粗磨、细磨和抛光功能，用于大理石地板研磨抛光)依次对受到磨损的大理石地板进行翻新研磨和抛光。
研磨机的推进速度和工艺与实验测试一相同。
对比测试一的光泽测试方法与实验测试一相同，结果见表3。
表3
Figure PCTCN2017098586-appb-000004
对比测试二
在经过对比测试一研磨抛光后的区域内选择10平方米的面积，使用与实验测试一相同的
12头地板研磨机，配合使用实例三制取的7#研磨抛光片(作为独立抛光功能使用)对大理石地板进行再抛光。
研磨机的推进速度和工艺与实验测试一相同。
对比测试二的光泽测试方法与实验测试一相同，结果见表4
表4
Figure PCTCN2017098586-appb-000005
对比测试三
在经过对比测试一研磨抛光后的区域内选择10平方米的面积，使用圆盘式地板抛光机(转速为175转/分钟)配合使用市售大理石抛光粉对大理石地板进行再抛光。抛光速度约为2平方米/3分钟。清理干净抛光粉浆液。
对比测试三的光泽测试方法与实验测试一相同，结果见表5。
表5
Figure PCTCN2017098586-appb-000006
Figure PCTCN2017098586-appb-000007
对比测试四
在经过对比测试一研磨抛光后的区域内选择余下的10平方米面积，使用圆盘式地板抛光机(转速为175转/分钟)，配合使用一种市售精密玻璃聚氨酯抛光片(含有粒径0.8-2μm氧化铈)对大理石地板进行再抛光。抛光速度约为2平方米/5分钟。对比测试四的光泽测试方法与实验测试一相同，结果见表6。
表6
Figure PCTCN2017098586-appb-000008
实验测试和对比测试结果总结：
通过上述实例测试和对比测试可以明显看出，本发明制取的新型聚氨酯石材研磨抛光片不仅具有显著的研磨抛光效果，而且更有较高的工作效率，解决和弥补了现有石材地板翻新时光泽比原板有较大差异的不足以及效率低下的问题，也排除了使用抛光粉对作业人员和环境带来的危害。
1、通过实验测试一和实验测试二的结果对比，反映出实例一和实例二制取的研磨抛光片在性能上的差异。实例一添加改性聚乙烯蜡粉对本发明研磨抛光片的效果、效率和耐用性有较好地改善。
2、通过实验测试一、实验测试二和对比测试一的测试结果看出，本发明制取的新型聚氨酯石材研磨抛光片与现有市场主流酚醛树脂研磨抛光片在效果上有显著的提高。
3、通过实验测试一、实验测试二和对比测试二、对比测试三的测试结果看出，本发明制取的新型聚氨酯石材研磨抛光片与现有市场主流研磨抛光片加大理石抛光粉的方法不仅光泽效果高，而且在效率上有显著的优势。现有技术的做法通常就是对比测试一和对比测试三的结合。但是从效果和效率上看，本发明的实验测试一(实例一)和实验测试二(实例二)的结果远远高于现有的做法。从单一的抛光程序看，无论是效果还是效率，本发明的对比测试二(实例三)均明显高于现有的抛光粉(对比测试三)。
4、通过对比测试一、对比测试二和对比测试三的测试结果看出，实例三制取的7#研磨抛光片作为具有独立抛光功能的抛光片使用，同样具有显著的效果和效率。
5、通过对比测试四的测试结果看出，现有市售的含有氧化铈磨粒的用于精 密玻璃等抛光的聚氨酯抛光片对于石材的抛光没有明显的效果和效率。
以上说明是依据本发明的构思和工作原理并实施该发明构思和工作原理的最佳实施例。上述实施例不应理解为对本发明构思和工作原理的限定，依照本发明构思的其他实施例和实现方式，以及实施例和实现方式的组合均属于本发明的保护范围。以下的实施方式也属于本发明的保护范围:
1、上述实例制取的聚氨酯新型研磨抛光片，密度为0.35-0.42克/cm3，邵氏硬度A为60-80。
2、上述磨片制取时可按照不同的规格或型号添加适量的着色剂以得到不同颜色的磨片，有利于区分不同规格和型号。
3、上述实例所用材料及组合，不代表本发明涉及技术的全部。
4、本发明新型研磨抛光片，可根据石材的品种和硬度，调整A、B、C组分中物料的成分、配合比例、规格以及泡沫基体的密度和硬度，以得到最佳效果和效率。
5、本发明新型磨片，可调整磨片的外形和规格，安装用于石材加工厂专业的大型研磨机用于石材大板的研磨抛光。
工业实用性
本发明的新型聚氨酯基体石材研磨抛光片，用于石材表面的研磨抛光，具有较高的光泽效果和作业效率，也具有更高的经济意义和社会意义。第一、以聚氨酯树脂作基体，能使磨片与石材被研磨表面具有更好的贴合性，磨粒具有更好的自锐性，在效果和效率上有较大幅度的提升；第二、以聚氨酯树脂作基体的石材研磨抛光片用于石材地板的翻新作业，在效果和效率上明显提高；第三、以聚氨酯树脂作基体的石材研磨抛光片用于石材的研磨抛光，尤其用于石材地板的翻新研磨抛光，能够省去使用大量的抛光粉等化学抛光材料，减少了这些化学抛光材料对环境和作业人员带来的污染和伤害。

Claims (26)

  1. 一种聚氨酯基体石材研磨抛光片的制备方法，其特征在于按照以下步骤进行制备：
    1)制备A组分：将组合多元醇、催化剂和发泡剂按比例分别倒入混合容器中并搅拌均匀，得到A组分；
    组合多元醇、催化剂和发泡剂的质量比为：100：0.2～5：0.1～5；
    2)制备B组分：将预设的粉体磨料按比例倒入A组分中搅拌均匀得到B组分；
    所述粉体磨料为人造金刚石、碳化硅、氧化硅、氧化铝按照质量比100：0～40：0～10：0～40的组合物；
    A组分与粉体磨料之间的质量比是100：5～50；
    3)制备石材研磨抛光片：将多异氰酸酯、改性聚乙烯蜡粉和增强纤维按比例混合作为C组分加入到B组分中快速搅拌，或者将B组份加入到C组份中快速搅拌，然后倒入模具内压模成型；
    其中作为C组分的多异氰酸酯、改性聚乙烯蜡粉和增强纤维之间的质量比是：100：0～5：0～5。
    B组分和C组分之间的质量比为100：60～110。
  2. 如权利要求1所述的聚氨酯基体石材研磨抛光片的制备方法，其特征在于：所述的步骤1)制备A组分是：将组合多元醇、催化剂、发泡剂按比例分别倒入混合容器中并搅拌均匀，得到A组分；
    组合多元醇、催化剂、发泡剂的质量比为：100：0.2～5：0.1～5。
  3. 如权利要求1所述的聚氨酯基体石材研磨抛光片的制备方法，其特征在于：所述的步骤1)所述的组合多元醇为不同官能度和不同分子量的聚醚多元醇或聚酯多元醇中的一种或者任意比例的两种以上。
  4. 如权利要求1所述的聚氨酯基体石材研磨抛光片的制备方法，其特征在于：所述的步骤3)所述的多异氰酸酯为甲苯二异氰酸酯、异佛尔酮二异氰酸酯和官能度2～4的改性二异氰酸酯中的其中一种或者任意比例的两种以上；所述的改性聚乙烯蜡粉为聚酰胺改性聚乙烯蜡；所述的增强纤维为玻璃纤维或合成纤维；。
  5. 如权利要求1所述的聚氨酯基体石材研磨抛光片的制备方法，其特征在于：所述的组合多元醇(包括聚醚多元醇或聚酯多元醇或两者任意比混合物)分子量在100～10000范围内，羟值在30～1000mg KOH/g，官能度2～8可选。
  6. 如权利要求1所述的聚氨酯基体石材研磨抛光片的制备方法，其特征在于：步骤2)所述粉体磨料为粒径在0.5-350μm的粉体。
  7. 如权利要求1所述的聚氨酯基体石材研磨抛光片的制备方法，其特征在于：步骤3)中，B组分与C组分之间的质量比为100：60～110。
  8. 如权利要求1-7任意一项聚氨酯基体石材研磨抛光片的制备方法，其特征在于：组合多元醇为：聚醚多元醇或聚酯多元醇或二者任意比例组合；其中所述的催化剂为胺类催化剂、三嗪类催化剂或者有机金属类催化剂；或者叔胺类催化剂、三嗪类催化剂与有机金属类催化剂任意比例的组合；发泡剂为物理发泡剂或化学发泡剂或二者任意比例的组合物。
  9. 如权利要求1-7任意一项聚氨酯基体石材研磨抛光片的制备方法，其特征在于：所述的聚氨酯基体的密度为0.1～0.5克/cm3，邵氏A硬度为30～90。
  10. 如权利要求1-9任意一项所述的聚氨酯基体石材研磨抛光片的制备方法，其特征在于按照以下步骤进行：
    1)、制备A组分：将聚醚多元醇、催化剂、扩链剂、发泡剂和增塑剂按比例分别倒入混合容器中并搅拌均匀，得到A组分；
    聚醚多元醇、催化剂、扩链剂、发泡剂和增塑剂的质量比为：100：0.3～5：1～6：0.5～5：1～5；
    其中所述的催化剂为叔胺类催化剂或者有机金属类催化剂或者叔胺类催化剂与有机金属类催化剂任意比例的组合；
    2)、制备B组分：将预设的粉体磨料按比例倒入A组分中搅拌均匀得到B组分；
    所述粉体磨料为人造金刚石、碳化硅、氧化硅、氧化铝和氧化锌按照质量比100：0～40、100：0～10、100：0～40、100：0～5的组合物；
    A组分与粉体磨料之间的质量比是100：10～50；
    3)、制备石材研磨抛光片：将多异氰酸酯、改性聚乙烯蜡粉和增强纤维按比例混合作为C组分加入到B组分中快速搅拌15～45秒的时间，然后倒入模具内压模成型，最后机械切片成型，得到聚氨酯基体石材研磨抛光片；
    其中作为C组分的多异氰酸酯、改性聚乙烯蜡粉和增强纤维之间的质量比是：100：0～5：0～5；
    通过调整A组分和C组分之间的质量比，得到密度0.1～0.5克/cm3、邵氏A硬度30～85的石材研磨抛光片。
  11. 如权利要求10所述的聚氨酯基体石材研磨抛光片的制备方法，其特征在于：步骤1)所述的聚醚多元醇为不同官能度低分子量聚醚多元醇中的一种或者任意比例的两种以上；所述的扩链剂为二官能度小分子量的胺类或醇类化合物；所述的发泡剂为物理发泡剂；所述的增塑剂为气相二氧化硅。
  12. 如权利要求10所述的聚氨酯基体石材研磨抛光片的制备方法，其特征在于：步骤3)所述的多异氰酸酯为甲苯二异氰酸酯、异佛尔酮二异氰酸酯、多 芳基多亚甲基异氰酸酯和官能度2～4的改性二异氰酸酯中的一种或者任意比例的两种以上；所述的改性聚乙烯蜡粉为聚酰胺改性聚乙烯蜡，作为助磨剂并用于提高基体的耐磨度；所述的增强纤维为玻璃纤维或合成纤维，作为基体的增强剂；快速搅拌是指搅拌机的转速在1500～4500转/分钟范围内。
  13. 如权利要求10所述的聚氨酯基体石材研磨抛光片的制备方法，其特征在于：所述的发泡剂是戊烷。
  14. 如权利要求10所述的聚氨酯基体石材研磨抛光片的制备方法，其特征在于：聚醚多元醇分子量在300～2000范围内，羟值在50～600mg KOH/g，官能度2～3可选。
  15. 如权利要求10所述的聚氨酯基体石材研磨抛光片的制备方法，其特征在于：步骤1)所述的催化剂为叔胺类催化剂。
  16. 如权利要求10任意一项所述的聚氨酯基体石材研磨抛光片的制备方法，其特征在于：步骤3)中，B组分与C组分之间的质量比为100：60～110。
  17. 如权利要求1-16任意一项聚氨酯基体石材研磨抛光片的制备方法制备的聚氨酯基体石材研磨抛光片。
  18. 一种聚氨酯基体石材研磨抛光片的制备方法，其特征在于按照以下步骤制备：
    1)制备A组分：将组合多元醇、催化剂和发泡剂按比例分别倒入混合容器中并搅拌均匀，得到A组分；
    组合多元醇、催化剂和发泡剂的质量比为：100：0.2～5：0.1～5；
    2)制备C组分：C组分包括：多异氰酸酯、改性聚乙烯蜡粉和增强纤维中混合；
    制备D组分：将预设的粉体磨料按比例倒入作为C组分的多异氰酸酯、改性聚乙烯蜡粉和增强纤维中混合；
    所述粉体磨料为人造金刚石、碳化硅、氧化硅、氧化铝按照质量比100：0～40：0～10：0～40的组合物；
    其中作为C组分的多异氰酸酯、改性聚乙烯蜡粉和增强纤维之间的质量比是：100：0～5：0～5。
    C组分与粉体磨料之间的质量比是100：10～50；
    3)制备石材研磨抛光片：将A组分加入到D组分中、或者将D组份加入A组分中快速搅拌，然后倒入模具内压模成型。
    A组分与D组分的质量比为100：60～120。
  19. 如权利要求18所述的聚氨酯基体石材研磨抛光片的制备方法，其特征在于:所述的步骤1)制备A组分是：将组合多元醇、催化剂、发泡剂按比例分别倒入混合容器中并搅拌均匀，得到A组分；
    所述的组合多元醇为聚醚多元醇或聚酯多元醇，其中：聚醚多元醇或聚酯多元醇、催化剂、发泡剂的质量比为：100：0.2～5：0.1～5。
  20. 如权利要求18所述的聚氨酯基体石材研磨抛光片的制备方法，其特征在于：所述的步骤1)所述的组合多元醇为不同官能度和不同分子量的聚醚多元醇或聚酯多元醇中的一种或者任意比例的两种以上。
  21. 如权利要求18所述的聚氨酯基体石材研磨抛光片的制备方法，其特征在于：所述的步骤3)所述的多异氰酸酯为甲苯二异氰酸酯、异佛尔酮二异氰酸酯和官能度2～4的改性二异氰酸酯中的其中一种或者任意比例的两种以上；所述的改性聚乙烯蜡粉为聚酰胺改性聚乙烯蜡；所述的增强纤维为玻璃纤维或合成纤维。
  22. 如权利要求18所述的聚氨酯基体石材研磨抛光片的制备方法，其特征在于：所述的组合多元醇(包括聚醚多元醇或聚酯多元醇或两者任意比混合物)分子量在100～10000范围内，羟值在30～1000mg KOH/g，官能度2～8可选。
  23. 如权利要求18所述的聚氨酯基体石材研磨抛光片的制备方法，其特征在于：步骤2)所述粉体磨料为粒径在0.5-350μm的粉体。
  24. 如权利要求18所述的聚氨酯基体石材研磨抛光片的制备方法，其特征在于：步骤3)中，A组分与D组分之间的质量比为100：60～110。
  25. 如权利要求18-24任意一项聚氨酯基体石材研磨抛光片的制备方法，其特征在于：组合多元醇为：聚醚多元醇或聚酯多元醇或二者任意比例组合；其中所述的催化剂为胺类催化剂、三嗪类催化剂或者有机金属类催化剂；或者叔胺类催化剂、三嗪类催化剂与有机金属类催化剂任意比例的组合。发泡剂为物理发泡剂或化学发泡剂或二者任意比例的组合物。
  26. 如权利要求18-25任意一项聚氨酯基体石材研磨抛光片的制备方法制备的聚氨酯基体石材研磨抛光片。
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