WO2018021273A1 - キット、洗浄剤組成物および半導体素子の製造方法 - Google Patents
キット、洗浄剤組成物および半導体素子の製造方法 Download PDFInfo
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- WO2018021273A1 WO2018021273A1 PCT/JP2017/026786 JP2017026786W WO2018021273A1 WO 2018021273 A1 WO2018021273 A1 WO 2018021273A1 JP 2017026786 W JP2017026786 W JP 2017026786W WO 2018021273 A1 WO2018021273 A1 WO 2018021273A1
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- Prior art keywords
- acid
- temporary adhesive
- formula
- polyether
- base
- Prior art date
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- 239000000203 mixture Substances 0.000 title claims abstract description 114
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 41
- 239000004065 semiconductor Substances 0.000 title claims abstract description 41
- 239000003599 detergent Substances 0.000 title claims abstract description 12
- 239000000853 adhesive Substances 0.000 claims abstract description 146
- 230000001070 adhesive effect Effects 0.000 claims abstract description 141
- 229920001296 polysiloxane Polymers 0.000 claims abstract description 124
- 150000001875 compounds Chemical class 0.000 claims abstract description 76
- 239000002253 acid Substances 0.000 claims abstract description 75
- 239000003960 organic solvent Substances 0.000 claims abstract description 54
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 claims abstract description 40
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 24
- 238000010494 dissociation reaction Methods 0.000 claims abstract description 18
- 230000005593 dissociations Effects 0.000 claims abstract description 18
- 238000005192 partition Methods 0.000 claims abstract description 10
- 229920001971 elastomer Polymers 0.000 claims description 136
- 239000000806 elastomer Substances 0.000 claims description 130
- 239000000758 substrate Substances 0.000 claims description 117
- -1 cyclic terpene Chemical class 0.000 claims description 100
- 238000004140 cleaning Methods 0.000 claims description 87
- 238000000034 method Methods 0.000 claims description 40
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 27
- 239000004793 Polystyrene Substances 0.000 claims description 27
- 229920000570 polyether Polymers 0.000 claims description 27
- 229920002223 polystyrene Polymers 0.000 claims description 27
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 20
- 235000007586 terpenes Nutrition 0.000 claims description 17
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims description 16
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims description 10
- 125000002947 alkylene group Chemical group 0.000 claims description 10
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 10
- 150000001491 aromatic compounds Chemical class 0.000 claims description 10
- 239000003795 chemical substances by application Substances 0.000 claims description 10
- 150000001334 alicyclic compounds Chemical class 0.000 claims description 9
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 claims description 8
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims description 8
- 150000004982 aromatic amines Chemical class 0.000 claims description 8
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 8
- 150000003997 cyclic ketones Chemical class 0.000 claims description 8
- 235000019256 formaldehyde Nutrition 0.000 claims description 8
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 claims description 8
- 229920006395 saturated elastomer Polymers 0.000 claims description 8
- 229920002545 silicone oil Polymers 0.000 claims description 7
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 claims description 6
- 238000005406 washing Methods 0.000 claims 1
- 239000012790 adhesive layer Substances 0.000 description 59
- 229920005989 resin Polymers 0.000 description 57
- 239000011347 resin Substances 0.000 description 57
- 125000004432 carbon atom Chemical group C* 0.000 description 51
- 239000002585 base Substances 0.000 description 46
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 42
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 34
- 239000003963 antioxidant agent Substances 0.000 description 31
- 125000000217 alkyl group Chemical group 0.000 description 30
- 239000002904 solvent Substances 0.000 description 29
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 28
- 229920000642 polymer Polymers 0.000 description 28
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 26
- 229910052710 silicon Inorganic materials 0.000 description 25
- 230000003078 antioxidant effect Effects 0.000 description 24
- 239000000126 substance Substances 0.000 description 23
- 239000010703 silicon Substances 0.000 description 21
- 229920001577 copolymer Polymers 0.000 description 19
- 238000010438 heat treatment Methods 0.000 description 19
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 19
- 125000001424 substituent group Chemical group 0.000 description 18
- 125000003118 aryl group Chemical group 0.000 description 16
- 238000001914 filtration Methods 0.000 description 16
- 150000002430 hydrocarbons Chemical group 0.000 description 15
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 14
- 239000010408 film Substances 0.000 description 14
- 238000011282 treatment Methods 0.000 description 14
- 239000000654 additive Substances 0.000 description 13
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 12
- 150000004985 diamines Chemical class 0.000 description 12
- 230000008569 process Effects 0.000 description 12
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 11
- 239000009719 polyimide resin Substances 0.000 description 11
- 229920006259 thermoplastic polyimide Polymers 0.000 description 11
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 11
- 230000000996 additive effect Effects 0.000 description 10
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 10
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 10
- 239000013032 Hydrocarbon resin Substances 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 125000005843 halogen group Chemical group 0.000 description 9
- 229920006270 hydrocarbon resin Polymers 0.000 description 9
- 239000010410 layer Substances 0.000 description 9
- 125000005647 linker group Chemical group 0.000 description 9
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 9
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 9
- GWHJZXXIDMPWGX-UHFFFAOYSA-N 1,2,4-trimethylbenzene Chemical compound CC1=CC=C(C)C(C)=C1 GWHJZXXIDMPWGX-UHFFFAOYSA-N 0.000 description 8
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 8
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 8
- 239000004925 Acrylic resin Substances 0.000 description 8
- 229920000178 Acrylic resin Polymers 0.000 description 8
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 8
- BGYHLZZASRKEJE-UHFFFAOYSA-N [3-[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxy]-2,2-bis[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxymethyl]propyl] 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CCC(=O)OCC(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)(COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)COC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=C1 BGYHLZZASRKEJE-UHFFFAOYSA-N 0.000 description 8
- 125000003545 alkoxy group Chemical group 0.000 description 8
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 8
- 239000000178 monomer Substances 0.000 description 8
- 239000004014 plasticizer Substances 0.000 description 8
- 229920000728 polyester Polymers 0.000 description 8
- 239000011148 porous material Substances 0.000 description 8
- 239000007787 solid Substances 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- YTZKOQUCBOVLHL-UHFFFAOYSA-N tert-butylbenzene Chemical compound CC(C)(C)C1=CC=CC=C1 YTZKOQUCBOVLHL-UHFFFAOYSA-N 0.000 description 8
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 8
- 229920000089 Cyclic olefin copolymer Polymers 0.000 description 7
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 7
- 239000003822 epoxy resin Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 238000002156 mixing Methods 0.000 description 7
- CFJYNSNXFXLKNS-UHFFFAOYSA-N p-menthane Chemical compound CC(C)C1CCC(C)CC1 CFJYNSNXFXLKNS-UHFFFAOYSA-N 0.000 description 7
- 239000003208 petroleum Substances 0.000 description 7
- 229920000647 polyepoxide Polymers 0.000 description 7
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- 239000005977 Ethylene Substances 0.000 description 6
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 6
- VSVVZZQIUJXYQA-UHFFFAOYSA-N [3-(3-dodecylsulfanylpropanoyloxy)-2,2-bis(3-dodecylsulfanylpropanoyloxymethyl)propyl] 3-dodecylsulfanylpropanoate Chemical compound CCCCCCCCCCCCSCCC(=O)OCC(COC(=O)CCSCCCCCCCCCCCC)(COC(=O)CCSCCCCCCCCCCCC)COC(=O)CCSCCCCCCCCCCCC VSVVZZQIUJXYQA-UHFFFAOYSA-N 0.000 description 6
- 239000003463 adsorbent Substances 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- 229920001400 block copolymer Polymers 0.000 description 6
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 6
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 150000002148 esters Chemical class 0.000 description 6
- 239000012530 fluid Substances 0.000 description 6
- 229910052731 fluorine Inorganic materials 0.000 description 6
- 125000001153 fluoro group Chemical group F* 0.000 description 6
- 125000000524 functional group Chemical group 0.000 description 6
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 6
- 239000012535 impurity Substances 0.000 description 6
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 6
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000004810 polytetrafluoroethylene Substances 0.000 description 6
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 6
- 239000004711 α-olefin Substances 0.000 description 6
- IANQTJSKSUMEQM-UHFFFAOYSA-N 1-benzofuran Chemical compound C1=CC=C2OC=CC2=C1 IANQTJSKSUMEQM-UHFFFAOYSA-N 0.000 description 5
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 5
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 5
- 229920000459 Nitrile rubber Polymers 0.000 description 5
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 5
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 5
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 5
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 5
- 150000002009 diols Chemical class 0.000 description 5
- DMEGYFMYUHOHGS-UHFFFAOYSA-N heptamethylene Natural products C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 5
- 239000006082 mold release agent Substances 0.000 description 5
- 229920002647 polyamide Polymers 0.000 description 5
- 229920005668 polycarbonate resin Polymers 0.000 description 5
- 239000004431 polycarbonate resin Substances 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 229910052717 sulfur Inorganic materials 0.000 description 5
- 239000011593 sulfur Substances 0.000 description 5
- 239000004094 surface-active agent Substances 0.000 description 5
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 5
- KVNYFPKFSJIPBJ-UHFFFAOYSA-N 1,2-diethylbenzene Chemical compound CCC1=CC=CC=C1CC KVNYFPKFSJIPBJ-UHFFFAOYSA-N 0.000 description 4
- 239000004808 2-ethylhexylester Substances 0.000 description 4
- VSAWBBYYMBQKIK-UHFFFAOYSA-N 4-[[3,5-bis[(3,5-ditert-butyl-4-hydroxyphenyl)methyl]-2,4,6-trimethylphenyl]methyl]-2,6-ditert-butylphenol Chemical compound CC1=C(CC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)C(C)=C(CC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)C(C)=C1CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 VSAWBBYYMBQKIK-UHFFFAOYSA-N 0.000 description 4
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 4
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 4
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 4
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- PWATWSYOIIXYMA-UHFFFAOYSA-N Pentylbenzene Chemical compound CCCCCC1=CC=CC=C1 PWATWSYOIIXYMA-UHFFFAOYSA-N 0.000 description 4
- 239000004952 Polyamide Substances 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000006087 Silane Coupling Agent Substances 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 4
- MOYAFQVGZZPNRA-UHFFFAOYSA-N Terpinolene Chemical compound CC(C)=C1CCC(C)=CC1 MOYAFQVGZZPNRA-UHFFFAOYSA-N 0.000 description 4
- KRADHMIOFJQKEZ-UHFFFAOYSA-N Tri-2-ethylhexyl trimellitate Chemical compound CCCCC(CC)COC(=O)C1=CC=C(C(=O)OCC(CC)CCCC)C(C(=O)OCC(CC)CCCC)=C1 KRADHMIOFJQKEZ-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 4
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 4
- OCKPCBLVNKHBMX-UHFFFAOYSA-N butylbenzene Chemical compound CCCCC1=CC=CC=C1 OCKPCBLVNKHBMX-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- RWGFKTVRMDUZSP-UHFFFAOYSA-N cumene Chemical compound CC(C)C1=CC=CC=C1 RWGFKTVRMDUZSP-UHFFFAOYSA-N 0.000 description 4
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 4
- 150000001993 dienes Chemical class 0.000 description 4
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 238000000227 grinding Methods 0.000 description 4
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 4
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 4
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 4
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 4
- XMGQYMWWDOXHJM-UHFFFAOYSA-N limonene Chemical compound CC(=C)C1CCC(C)=CC1 XMGQYMWWDOXHJM-UHFFFAOYSA-N 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 4
- HFPZCAJZSCWRBC-UHFFFAOYSA-N p-cymene Chemical compound CC(C)C1=CC=C(C)C=C1 HFPZCAJZSCWRBC-UHFFFAOYSA-N 0.000 description 4
- 239000002530 phenolic antioxidant Substances 0.000 description 4
- 229920001155 polypropylene Polymers 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- 150000003440 styrenes Chemical class 0.000 description 4
- 239000008096 xylene Substances 0.000 description 4
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical compound C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 3
- GDGWSSXWLLHGGV-UHFFFAOYSA-N 3-(4-aminophenyl)-1,1,3-trimethyl-2h-inden-5-amine Chemical compound C12=CC(N)=CC=C2C(C)(C)CC1(C)C1=CC=C(N)C=C1 GDGWSSXWLLHGGV-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 229920006310 Asahi-Kasei Polymers 0.000 description 3
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 3
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- 239000004743 Polypropylene Substances 0.000 description 3
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 3
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 229920004482 WACKER® Polymers 0.000 description 3
- 125000005396 acrylic acid ester group Chemical group 0.000 description 3
- 238000012644 addition polymerization Methods 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- KKEYFWRCBNTPAC-UHFFFAOYSA-N benzene-dicarboxylic acid Natural products OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 3
- YKGYQYOQRGPFTO-UHFFFAOYSA-N bis(8-methylnonyl) hexanedioate Chemical compound CC(C)CCCCCCCOC(=O)CCCCC(=O)OCCCCCCCC(C)C YKGYQYOQRGPFTO-UHFFFAOYSA-N 0.000 description 3
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 150000001735 carboxylic acids Chemical class 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000012459 cleaning agent Substances 0.000 description 3
- 125000004122 cyclic group Chemical group 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 description 3
- 150000004678 hydrides Chemical class 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- HSDFKDZBJMDHFF-UHFFFAOYSA-N methyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OC HSDFKDZBJMDHFF-UHFFFAOYSA-N 0.000 description 3
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- 229930004008 p-menthane Natural products 0.000 description 3
- 239000005011 phenolic resin Substances 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 239000011574 phosphorus Substances 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 125000003367 polycyclic group Chemical group 0.000 description 3
- 229920000098 polyolefin Polymers 0.000 description 3
- 229920006124 polyolefin elastomer Polymers 0.000 description 3
- 229920001451 polypropylene glycol Polymers 0.000 description 3
- 229920003225 polyurethane elastomer Polymers 0.000 description 3
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 3
- 229920002379 silicone rubber Polymers 0.000 description 3
- 150000003457 sulfones Chemical class 0.000 description 3
- 229920001169 thermoplastic Polymers 0.000 description 3
- 239000004416 thermosoftening plastic Substances 0.000 description 3
- 229920000428 triblock copolymer Polymers 0.000 description 3
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 3
- OJOWICOBYCXEKR-KRXBUXKQSA-N (5e)-5-ethylidenebicyclo[2.2.1]hept-2-ene Chemical compound C1C2C(=C/C)/CC1C=C2 OJOWICOBYCXEKR-KRXBUXKQSA-N 0.000 description 2
- BFIMMTCNYPIMRN-UHFFFAOYSA-N 1,2,3,5-tetramethylbenzene Chemical compound CC1=CC(C)=C(C)C(C)=C1 BFIMMTCNYPIMRN-UHFFFAOYSA-N 0.000 description 2
- FYGHSUNMUKGBRK-UHFFFAOYSA-N 1,2,3-trimethylbenzene Chemical compound CC1=CC=CC(C)=C1C FYGHSUNMUKGBRK-UHFFFAOYSA-N 0.000 description 2
- AGIQIOSHSMJYJP-UHFFFAOYSA-N 1,2,4-Trimethoxybenzene Chemical compound COC1=CC=C(OC)C(OC)=C1 AGIQIOSHSMJYJP-UHFFFAOYSA-N 0.000 description 2
- DPZNOMCNRMUKPS-UHFFFAOYSA-N 1,3-Dimethoxybenzene Chemical compound COC1=CC=CC(OC)=C1 DPZNOMCNRMUKPS-UHFFFAOYSA-N 0.000 description 2
- AFZZYIJIWUTJFO-UHFFFAOYSA-N 1,3-diethylbenzene Chemical compound CCC1=CC=CC(CC)=C1 AFZZYIJIWUTJFO-UHFFFAOYSA-N 0.000 description 2
- DSNHSQKRULAAEI-UHFFFAOYSA-N 1,4-Diethylbenzene Chemical compound CCC1=CC=C(CC)C=C1 DSNHSQKRULAAEI-UHFFFAOYSA-N 0.000 description 2
- HYFLWBNQFMXCPA-UHFFFAOYSA-N 1-ethyl-2-methylbenzene Chemical compound CCC1=CC=CC=C1C HYFLWBNQFMXCPA-UHFFFAOYSA-N 0.000 description 2
- JRLPEMVDPFPYPJ-UHFFFAOYSA-N 1-ethyl-4-methylbenzene Chemical compound CCC1=CC=C(C)C=C1 JRLPEMVDPFPYPJ-UHFFFAOYSA-N 0.000 description 2
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 2
- XCYJPXQACVEIOS-UHFFFAOYSA-N 1-isopropyl-3-methylbenzene Chemical compound CC(C)C1=CC=CC(C)=C1 XCYJPXQACVEIOS-UHFFFAOYSA-N 0.000 description 2
- QPUYECUOLPXSFR-UHFFFAOYSA-N 1-methylnaphthalene Chemical compound C1=CC=C2C(C)=CC=CC2=C1 QPUYECUOLPXSFR-UHFFFAOYSA-N 0.000 description 2
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Chemical compound C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 2
- BKUSIKGSPSFQAC-RRKCRQDMSA-N 2'-deoxyinosine-5'-diphosphate Chemical compound O1[C@H](CO[P@@](O)(=O)OP(O)(O)=O)[C@@H](O)C[C@@H]1N1C(NC=NC2=O)=C2N=C1 BKUSIKGSPSFQAC-RRKCRQDMSA-N 0.000 description 2
- IAIHUHQCLTYTSF-UHFFFAOYSA-N 2,2,4-trimethylbicyclo[2.2.1]heptan-3-ol Chemical compound C1CC2(C)C(O)C(C)(C)C1C2 IAIHUHQCLTYTSF-UHFFFAOYSA-N 0.000 description 2
- HBEDSQVIWPRPAY-UHFFFAOYSA-N 2,3-dihydrobenzofuran Chemical compound C1=CC=C2OCCC2=C1 HBEDSQVIWPRPAY-UHFFFAOYSA-N 0.000 description 2
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- GWHLJVMSZRKEAQ-UHFFFAOYSA-N 3-(2,3-dicarboxyphenyl)phthalic acid Chemical compound OC(=O)C1=CC=CC(C=2C(=C(C(O)=O)C=CC=2)C(O)=O)=C1C(O)=O GWHLJVMSZRKEAQ-UHFFFAOYSA-N 0.000 description 2
- ODJQKYXPKWQWNK-UHFFFAOYSA-L 3-(2-carboxylatoethylsulfanyl)propanoate Chemical compound [O-]C(=O)CCSCCC([O-])=O ODJQKYXPKWQWNK-UHFFFAOYSA-L 0.000 description 2
- YOOSAIJKYCBPFW-UHFFFAOYSA-N 3-[4-(3-aminopropoxy)butoxy]propan-1-amine Chemical compound NCCCOCCCCOCCCN YOOSAIJKYCBPFW-UHFFFAOYSA-N 0.000 description 2
- GPXCORHXFPYJEH-UHFFFAOYSA-N 3-[[3-aminopropyl(dimethyl)silyl]oxy-dimethylsilyl]propan-1-amine Chemical compound NCCC[Si](C)(C)O[Si](C)(C)CCCN GPXCORHXFPYJEH-UHFFFAOYSA-N 0.000 description 2
- ZLCSFXXPPANWQY-UHFFFAOYSA-N 3-ethyltoluene Chemical compound CCC1=CC=CC(C)=C1 ZLCSFXXPPANWQY-UHFFFAOYSA-N 0.000 description 2
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 2
- AJYDKROUZBIMLE-UHFFFAOYSA-N 4-[2-[2-[2-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=CC=C(OC=2C=CC(N)=CC=2)C=1C(C)(C)C1=CC=CC=C1OC1=CC=C(N)C=C1 AJYDKROUZBIMLE-UHFFFAOYSA-N 0.000 description 2
- WSSSPWUEQFSQQG-UHFFFAOYSA-N 4-methyl-1-pentene Chemical compound CC(C)CC=C WSSSPWUEQFSQQG-UHFFFAOYSA-N 0.000 description 2
- YCPXWRQRBFJBPZ-UHFFFAOYSA-N 5-sulfosalicylic acid Chemical compound OC(=O)C1=CC(S(O)(=O)=O)=CC=C1O YCPXWRQRBFJBPZ-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- BAVONGHXFVOKBV-UHFFFAOYSA-N Carveol Chemical compound CC(=C)C1CC=C(C)C(O)C1 BAVONGHXFVOKBV-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- UEXCJVNBTNXOEH-UHFFFAOYSA-N Ethynylbenzene Chemical compound C#CC1=CC=CC=C1 UEXCJVNBTNXOEH-UHFFFAOYSA-N 0.000 description 2
- WEEGYLXZBRQIMU-UHFFFAOYSA-N Eucalyptol Chemical compound C1CC2CCC1(C)OC2(C)C WEEGYLXZBRQIMU-UHFFFAOYSA-N 0.000 description 2
- LHXDLQBQYFFVNW-UHFFFAOYSA-N Fenchone Chemical compound C1CC2(C)C(=O)C(C)(C)C1C2 LHXDLQBQYFFVNW-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical group C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- LTEQMZWBSYACLV-UHFFFAOYSA-N Hexylbenzene Chemical compound CCCCCCC1=CC=CC=C1 LTEQMZWBSYACLV-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- FFOPEPMHKILNIT-UHFFFAOYSA-N Isopropyl butyrate Chemical compound CCCC(=O)OC(C)C FFOPEPMHKILNIT-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 2
- 229920002292 Nylon 6 Polymers 0.000 description 2
- JKIJEFPNVSHHEI-UHFFFAOYSA-N Phenol, 2,4-bis(1,1-dimethylethyl)-, phosphite (3:1) Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC=C1OP(OC=1C(=CC(=CC=1)C(C)(C)C)C(C)(C)C)OC1=CC=C(C(C)(C)C)C=C1C(C)(C)C JKIJEFPNVSHHEI-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- 229920002614 Polyether block amide Polymers 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- LCTONWCANYUPML-UHFFFAOYSA-N Pyruvic acid Chemical compound CC(=O)C(O)=O LCTONWCANYUPML-UHFFFAOYSA-N 0.000 description 2
- 229910004283 SiO 4 Inorganic materials 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- CGRTZESQZZGAAU-UHFFFAOYSA-N [2-[3-[1-[3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propanoyloxy]-2-methylpropan-2-yl]-2,4,8,10-tetraoxaspiro[5.5]undecan-9-yl]-2-methylpropyl] 3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C)=CC(CCC(=O)OCC(C)(C)C2OCC3(CO2)COC(OC3)C(C)(C)COC(=O)CCC=2C=C(C(O)=C(C)C=2)C(C)(C)C)=C1 CGRTZESQZZGAAU-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 125000005907 alkyl ester group Chemical group 0.000 description 2
- MBMBGCFOFBJSGT-KUBAVDMBSA-N all-cis-docosa-4,7,10,13,16,19-hexaenoic acid Chemical compound CC\C=C/C\C=C/C\C=C/C\C=C/C\C=C/C\C=C/CCC(O)=O MBMBGCFOFBJSGT-KUBAVDMBSA-N 0.000 description 2
- YZXBAPSDXZZRGB-DOFZRALJSA-N arachidonic acid Chemical compound CCCCC\C=C/C\C=C/C\C=C/C\C=C/CCCC(O)=O YZXBAPSDXZZRGB-DOFZRALJSA-N 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- CKDOCTFBFTVPSN-UHFFFAOYSA-N borneol Natural products C1CC2(C)C(C)CC1C2(C)C CKDOCTFBFTVPSN-UHFFFAOYSA-N 0.000 description 2
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 2
- NTXGQCSETZTARF-UHFFFAOYSA-N buta-1,3-diene;prop-2-enenitrile Chemical compound C=CC=C.C=CC#N NTXGQCSETZTARF-UHFFFAOYSA-N 0.000 description 2
- XUPYJHCZDLZNFP-UHFFFAOYSA-N butyl butanoate Chemical compound CCCCOC(=O)CCC XUPYJHCZDLZNFP-UHFFFAOYSA-N 0.000 description 2
- VHRGRCVQAFMJIZ-UHFFFAOYSA-N cadaverine Chemical compound NCCCCCN VHRGRCVQAFMJIZ-UHFFFAOYSA-N 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- BQOFWKZOCNGFEC-UHFFFAOYSA-N carene Chemical compound C1C(C)=CCC2C(C)(C)C12 BQOFWKZOCNGFEC-UHFFFAOYSA-N 0.000 description 2
- ULDHMXUKGWMISQ-UHFFFAOYSA-N carvone Chemical compound CC(=C)C1CC=C(C)C(=O)C1 ULDHMXUKGWMISQ-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- HIPIENNKVJCMAP-UHFFFAOYSA-N chrysanthemol Chemical compound CC(C)=CC1C(CO)C1(C)C HIPIENNKVJCMAP-UHFFFAOYSA-N 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 125000002993 cycloalkylene group Chemical group 0.000 description 2
- HGCIXCUEYOPUTN-UHFFFAOYSA-N cyclohexene Chemical compound C1CCC=CC1 HGCIXCUEYOPUTN-UHFFFAOYSA-N 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- HHNHBFLGXIUXCM-GFCCVEGCSA-N cyclohexylbenzene Chemical compound [CH]1CCCC[C@@H]1C1=CC=CC=C1 HHNHBFLGXIUXCM-GFCCVEGCSA-N 0.000 description 2
- WJTCGQSWYFHTAC-UHFFFAOYSA-N cyclooctane Chemical compound C1CCCCCCC1 WJTCGQSWYFHTAC-UHFFFAOYSA-N 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- GHVNFZFCNZKVNT-UHFFFAOYSA-N decanoic acid Chemical compound CCCCCCCCCC(O)=O GHVNFZFCNZKVNT-UHFFFAOYSA-N 0.000 description 2
- UZILCZKGXMQEQR-UHFFFAOYSA-N decyl-Benzene Chemical compound CCCCCCCCCCC1=CC=CC=C1 UZILCZKGXMQEQR-UHFFFAOYSA-N 0.000 description 2
- JXTHNDFMNIQAHM-UHFFFAOYSA-N dichloroacetic acid Chemical compound OC(=O)C(Cl)Cl JXTHNDFMNIQAHM-UHFFFAOYSA-N 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 2
- 125000005442 diisocyanate group Chemical group 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- DTGKSKDOIYIVQL-UHFFFAOYSA-N dl-isoborneol Natural products C1CC2(C)C(O)CC1C2(C)C DTGKSKDOIYIVQL-UHFFFAOYSA-N 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- SQNZJJAZBFDUTD-UHFFFAOYSA-N durene Chemical compound CC1=CC(C)=C(C)C=C1C SQNZJJAZBFDUTD-UHFFFAOYSA-N 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 229940116333 ethyl lactate Drugs 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- KEMQGTRYUADPNZ-UHFFFAOYSA-N heptadecanoic acid Chemical compound CCCCCCCCCCCCCCCCC(O)=O KEMQGTRYUADPNZ-UHFFFAOYSA-N 0.000 description 2
- NGAZZOYFWWSOGK-UHFFFAOYSA-N heptan-3-one Chemical compound CCCCC(=O)CC NGAZZOYFWWSOGK-UHFFFAOYSA-N 0.000 description 2
- MNWFXJYAOYHMED-UHFFFAOYSA-N heptanoic acid Chemical compound CCCCCCC(O)=O MNWFXJYAOYHMED-UHFFFAOYSA-N 0.000 description 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- PQNFLJBBNBOBRQ-UHFFFAOYSA-N indane Chemical compound C1=CC=C2CCCC2=C1 PQNFLJBBNBOBRQ-UHFFFAOYSA-N 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- MLFHJEHSLIIPHL-UHFFFAOYSA-N isoamyl acetate Chemical compound CC(C)CCOC(C)=O MLFHJEHSLIIPHL-UHFFFAOYSA-N 0.000 description 2
- HJOVHMDZYOCNQW-UHFFFAOYSA-N isophorone Chemical compound CC1=CC(=O)CC(C)(C)C1 HJOVHMDZYOCNQW-UHFFFAOYSA-N 0.000 description 2
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropyl acetate Chemical compound CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 235000001510 limonene Nutrition 0.000 description 2
- 229940087305 limonene Drugs 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 2
- YDSWCNNOKPMOTP-UHFFFAOYSA-N mellitic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(O)=O)=C(C(O)=O)C(C(O)=O)=C1C(O)=O YDSWCNNOKPMOTP-UHFFFAOYSA-N 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- QPJVMBTYPHYUOC-UHFFFAOYSA-N methyl benzoate Chemical compound COC(=O)C1=CC=CC=C1 QPJVMBTYPHYUOC-UHFFFAOYSA-N 0.000 description 2
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- XTEGVFVZDVNBPF-UHFFFAOYSA-N naphthalene-1,5-disulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1S(O)(=O)=O XTEGVFVZDVNBPF-UHFFFAOYSA-N 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- BKIMMITUMNQMOS-UHFFFAOYSA-N nonane Chemical compound CCCCCCCCC BKIMMITUMNQMOS-UHFFFAOYSA-N 0.000 description 2
- FBUKVWPVBMHYJY-UHFFFAOYSA-N nonanoic acid Chemical compound CCCCCCCCC(O)=O FBUKVWPVBMHYJY-UHFFFAOYSA-N 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- 125000000962 organic group Chemical group 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 150000003022 phthalic acids Chemical class 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 235000021110 pickles Nutrition 0.000 description 2
- 229920005575 poly(amic acid) Polymers 0.000 description 2
- 229920006122 polyamide resin Polymers 0.000 description 2
- 229920001707 polybutylene terephthalate Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920006324 polyoxymethylene Polymers 0.000 description 2
- 229920000346 polystyrene-polyisoprene block-polystyrene Polymers 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- ODLMAHJVESYWTB-UHFFFAOYSA-N propylbenzene Chemical compound CCCC1=CC=CC=C1 ODLMAHJVESYWTB-UHFFFAOYSA-N 0.000 description 2
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 2
- PBMFSQRYOILNGV-UHFFFAOYSA-N pyridazine Chemical compound C1=CC=NN=C1 PBMFSQRYOILNGV-UHFFFAOYSA-N 0.000 description 2
- NDVASEGYNIMXJL-UHFFFAOYSA-N sabinene Chemical compound C=C1CCC2(C(C)C)C1C2 NDVASEGYNIMXJL-UHFFFAOYSA-N 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- ZJMWRROPUADPEA-UHFFFAOYSA-N sec-butylbenzene Chemical compound CCC(C)C1=CC=CC=C1 ZJMWRROPUADPEA-UHFFFAOYSA-N 0.000 description 2
- 239000004945 silicone rubber Substances 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L sodium carbonate Substances [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- ATHGHQPFGPMSJY-UHFFFAOYSA-N spermidine Chemical compound NCCCCNCCCN ATHGHQPFGPMSJY-UHFFFAOYSA-N 0.000 description 2
- PFNFFQXMRSDOHW-UHFFFAOYSA-N spermine Chemical compound NCCCNCCCCNCCCN PFNFFQXMRSDOHW-UHFFFAOYSA-N 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 229920000468 styrene butadiene styrene block copolymer Polymers 0.000 description 2
- 238000000859 sublimation Methods 0.000 description 2
- 230000008022 sublimation Effects 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 210000000225 synapse Anatomy 0.000 description 2
- 229930006978 terpinene Natural products 0.000 description 2
- 150000003507 terpinene derivatives Chemical class 0.000 description 2
- MGSRCZKZVOBKFT-UHFFFAOYSA-N thymol Chemical compound CC(C)C1=CC=C(C)C=C1O MGSRCZKZVOBKFT-UHFFFAOYSA-N 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- RSJKGSCJYJTIGS-UHFFFAOYSA-N undecane Chemical compound CCCCCCCCCCC RSJKGSCJYJTIGS-UHFFFAOYSA-N 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- LHXDLQBQYFFVNW-XCBNKYQSSA-N (+)-Fenchone Natural products C1C[C@]2(C)C(=O)C(C)(C)[C@H]1C2 LHXDLQBQYFFVNW-XCBNKYQSSA-N 0.000 description 1
- NOOLISFMXDJSKH-UTLUCORTSA-N (+)-Neomenthol Chemical compound CC(C)[C@@H]1CC[C@@H](C)C[C@@H]1O NOOLISFMXDJSKH-UTLUCORTSA-N 0.000 description 1
- DNIAPMSPPWPWGF-VKHMYHEASA-N (+)-propylene glycol Chemical compound C[C@H](O)CO DNIAPMSPPWPWGF-VKHMYHEASA-N 0.000 description 1
- NDVASEGYNIMXJL-NXEZZACHSA-N (+)-sabinene Natural products C=C1CC[C@@]2(C(C)C)[C@@H]1C2 NDVASEGYNIMXJL-NXEZZACHSA-N 0.000 description 1
- 229930006727 (-)-endo-fenchol Natural products 0.000 description 1
- REPVLJRCJUVQFA-UHFFFAOYSA-N (-)-isopinocampheol Natural products C1C(O)C(C)C2C(C)(C)C1C2 REPVLJRCJUVQFA-UHFFFAOYSA-N 0.000 description 1
- YSTPAHQEHQSRJD-SECBINFHSA-N (-)-piperitone Chemical compound CC(C)[C@H]1CCC(C)=CC1=O YSTPAHQEHQSRJD-SECBINFHSA-N 0.000 description 1
- BAVONGHXFVOKBV-ZJUUUORDSA-N (-)-trans-carveol Natural products CC(=C)[C@@H]1CC=C(C)[C@@H](O)C1 BAVONGHXFVOKBV-ZJUUUORDSA-N 0.000 description 1
- RRKODOZNUZCUBN-CCAGOZQPSA-N (1z,3z)-cycloocta-1,3-diene Chemical compound C1CC\C=C/C=C\C1 RRKODOZNUZCUBN-CCAGOZQPSA-N 0.000 description 1
- NNJPAMQRBHASEV-UHFFFAOYSA-N (2-phosphonophenyl)phosphonic acid Chemical compound OP(O)(=O)C1=CC=CC=C1P(O)(O)=O NNJPAMQRBHASEV-UHFFFAOYSA-N 0.000 description 1
- UXUFTKZYJYGMGO-CMCWBKRRSA-N (2s,3s,4r,5r)-5-[6-amino-2-[2-[4-[3-(2-aminoethylamino)-3-oxopropyl]phenyl]ethylamino]purin-9-yl]-n-ethyl-3,4-dihydroxyoxolane-2-carboxamide Chemical compound O[C@@H]1[C@H](O)[C@@H](C(=O)NCC)O[C@H]1N1C2=NC(NCCC=3C=CC(CCC(=O)NCCN)=CC=3)=NC(N)=C2N=C1 UXUFTKZYJYGMGO-CMCWBKRRSA-N 0.000 description 1
- ZHBRSHSRMYZHLS-UHFFFAOYSA-N (4-hydroxyphenyl)methylphosphonic acid Chemical compound OC1=CC=C(CP(O)(O)=O)C=C1 ZHBRSHSRMYZHLS-UHFFFAOYSA-N 0.000 description 1
- YIDVLWDHYNWHMH-UHFFFAOYSA-N (4-hydroxyphenyl)phosphonic acid Chemical compound OC1=CC=C(P(O)(O)=O)C=C1 YIDVLWDHYNWHMH-UHFFFAOYSA-N 0.000 description 1
- PRBHEGAFLDMLAL-GQCTYLIASA-N (4e)-hexa-1,4-diene Chemical compound C\C=C\CC=C PRBHEGAFLDMLAL-GQCTYLIASA-N 0.000 description 1
- DCSCXTJOXBUFGB-MQWKRIRWSA-N (5r)-2,6,6-trimethylbicyclo[3.1.1]hept-2-en-4-one Chemical compound CC1=CC(=O)[C@H]2C(C)(C)C1C2 DCSCXTJOXBUFGB-MQWKRIRWSA-N 0.000 description 1
- OYHQOLUKZRVURQ-NTGFUMLPSA-N (9Z,12Z)-9,10,12,13-tetratritiooctadeca-9,12-dienoic acid Chemical compound C(CCCCCCC\C(=C(/C\C(=C(/CCCCC)\[3H])\[3H])\[3H])\[3H])(=O)O OYHQOLUKZRVURQ-NTGFUMLPSA-N 0.000 description 1
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- 239000001124 (E)-prop-1-ene-1,2,3-tricarboxylic acid Substances 0.000 description 1
- DSSYKIVIOFKYAU-XCBNKYQSSA-N (R)-camphor Chemical compound C1C[C@@]2(C)C(=O)C[C@@H]1C2(C)C DSSYKIVIOFKYAU-XCBNKYQSSA-N 0.000 description 1
- MIOPJNTWMNEORI-GMSGAONNSA-N (S)-camphorsulfonic acid Chemical compound C1C[C@@]2(CS(O)(=O)=O)C(=O)C[C@@H]1C2(C)C MIOPJNTWMNEORI-GMSGAONNSA-N 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- NSGXIBWMJZWTPY-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropane Chemical compound FC(F)(F)CC(F)(F)F NSGXIBWMJZWTPY-UHFFFAOYSA-N 0.000 description 1
- AVQQQNCBBIEMEU-UHFFFAOYSA-N 1,1,3,3-tetramethylurea Chemical compound CN(C)C(=O)N(C)C AVQQQNCBBIEMEU-UHFFFAOYSA-N 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- RELMFMZEBKVZJC-UHFFFAOYSA-N 1,2,3-trichlorobenzene Chemical compound ClC1=CC=CC(Cl)=C1Cl RELMFMZEBKVZJC-UHFFFAOYSA-N 0.000 description 1
- QMMJWQMCMRUYTG-UHFFFAOYSA-N 1,2,4,5-tetrachloro-3-(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=C(Cl)C(Cl)=CC(Cl)=C1Cl QMMJWQMCMRUYTG-UHFFFAOYSA-N 0.000 description 1
- WNLWIOJSURYFIB-UHFFFAOYSA-N 1,2,4-triethylbenzene Chemical compound CCC1=CC=C(CC)C(CC)=C1 WNLWIOJSURYFIB-UHFFFAOYSA-N 0.000 description 1
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 1
- BBOLNFYSRZVALD-UHFFFAOYSA-N 1,2-diiodobenzene Chemical compound IC1=CC=CC=C1I BBOLNFYSRZVALD-UHFFFAOYSA-N 0.000 description 1
- FQYVVSNFPLKMNU-UHFFFAOYSA-N 1,2-dipentylbenzene Chemical compound CCCCCC1=CC=CC=C1CCCCC FQYVVSNFPLKMNU-UHFFFAOYSA-N 0.000 description 1
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- VUMCUSHVMYIRMB-UHFFFAOYSA-N 1,3,5-tri(propan-2-yl)benzene Chemical compound CC(C)C1=CC(C(C)C)=CC(C(C)C)=C1 VUMCUSHVMYIRMB-UHFFFAOYSA-N 0.000 description 1
- WJYMPXJVHNDZHD-UHFFFAOYSA-N 1,3,5-triethylbenzene Chemical compound CCC1=CC(CC)=CC(CC)=C1 WJYMPXJVHNDZHD-UHFFFAOYSA-N 0.000 description 1
- VNQNXQYZMPJLQX-UHFFFAOYSA-N 1,3,5-tris[(3,5-ditert-butyl-4-hydroxyphenyl)methyl]-1,3,5-triazinane-2,4,6-trione Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CN2C(N(CC=3C=C(C(O)=C(C=3)C(C)(C)C)C(C)(C)C)C(=O)N(CC=3C=C(C(O)=C(C=3)C(C)(C)C)C(C)(C)C)C2=O)=O)=C1 VNQNXQYZMPJLQX-UHFFFAOYSA-N 0.000 description 1
- UNEATYXSUBPPKP-UHFFFAOYSA-N 1,3-Diisopropylbenzene Chemical compound CC(C)C1=CC=CC(C(C)C)=C1 UNEATYXSUBPPKP-UHFFFAOYSA-N 0.000 description 1
- WIXDSJRJFDWTNY-UHFFFAOYSA-N 1,3-ditert-butyl-5-methylbenzene Chemical compound CC1=CC(C(C)(C)C)=CC(C(C)(C)C)=C1 WIXDSJRJFDWTNY-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- YPFDHNVEDLHUCE-UHFFFAOYSA-N 1,3-propanediol Substances OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 1
- RFFOTVCVTJUTAD-AOOOYVTPSA-N 1,4-cineole Chemical compound CC(C)[C@]12CC[C@](C)(CC1)O2 RFFOTVCVTJUTAD-AOOOYVTPSA-N 0.000 description 1
- SPPWGCYEYAMHDT-UHFFFAOYSA-N 1,4-di(propan-2-yl)benzene Chemical compound CC(C)C1=CC=C(C(C)C)C=C1 SPPWGCYEYAMHDT-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- OOWNNCMFKFBNOF-UHFFFAOYSA-N 1,4-ditert-butylbenzene Chemical compound CC(C)(C)C1=CC=C(C(C)(C)C)C=C1 OOWNNCMFKFBNOF-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- SGUVLZREKBPKCE-UHFFFAOYSA-N 1,5-diazabicyclo[4.3.0]-non-5-ene Chemical compound C1CCN=C2CCCN21 SGUVLZREKBPKCE-UHFFFAOYSA-N 0.000 description 1
- AXKZIDYFAMKWSA-UHFFFAOYSA-N 1,6-dioxacyclododecane-7,12-dione Chemical compound O=C1CCCCC(=O)OCCCCO1 AXKZIDYFAMKWSA-UHFFFAOYSA-N 0.000 description 1
- GJFNRSDCSTVPCJ-UHFFFAOYSA-N 1,8-bis(dimethylamino)naphthalene Chemical compound C1=CC(N(C)C)=C2C(N(C)C)=CC=CC2=C1 GJFNRSDCSTVPCJ-UHFFFAOYSA-N 0.000 description 1
- PWGJDPKCLMLPJW-UHFFFAOYSA-N 1,8-diaminooctane Chemical compound NCCCCCCCCN PWGJDPKCLMLPJW-UHFFFAOYSA-N 0.000 description 1
- FLBAYUMRQUHISI-UHFFFAOYSA-N 1,8-naphthyridine Chemical group N1=CC=CC2=CC=CN=C21 FLBAYUMRQUHISI-UHFFFAOYSA-N 0.000 description 1
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 1
- ZFPGARUNNKGOBB-UHFFFAOYSA-N 1-Ethyl-2-pyrrolidinone Chemical compound CCN1CCCC1=O ZFPGARUNNKGOBB-UHFFFAOYSA-N 0.000 description 1
- WWRCMNKATXZARA-UHFFFAOYSA-N 1-Isopropyl-2-methylbenzene Chemical compound CC(C)C1=CC=CC=C1C WWRCMNKATXZARA-UHFFFAOYSA-N 0.000 description 1
- LBNXAWYDQUGHGX-UHFFFAOYSA-N 1-Phenylheptane Chemical compound CCCCCCCC1=CC=CC=C1 LBNXAWYDQUGHGX-UHFFFAOYSA-N 0.000 description 1
- WKBPZYKAUNRMKP-UHFFFAOYSA-N 1-[2-(2,4-dichlorophenyl)pentyl]1,2,4-triazole Chemical compound C=1C=C(Cl)C=C(Cl)C=1C(CCC)CN1C=NC=N1 WKBPZYKAUNRMKP-UHFFFAOYSA-N 0.000 description 1
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical group C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 description 1
- HNAGHMKIPMKKBB-UHFFFAOYSA-N 1-benzylpyrrolidine-3-carboxamide Chemical compound C1C(C(=O)N)CCN1CC1=CC=CC=C1 HNAGHMKIPMKKBB-UHFFFAOYSA-N 0.000 description 1
- DLKQHBOKULLWDQ-UHFFFAOYSA-N 1-bromonaphthalene Chemical compound C1=CC=C2C(Br)=CC=CC2=C1 DLKQHBOKULLWDQ-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- MLRVZFYXUZQSRU-UHFFFAOYSA-N 1-chlorohexane Chemical compound CCCCCCCl MLRVZFYXUZQSRU-UHFFFAOYSA-N 0.000 description 1
- JTPNRXUCIXHOKM-UHFFFAOYSA-N 1-chloronaphthalene Chemical compound C1=CC=C2C(Cl)=CC=CC2=C1 JTPNRXUCIXHOKM-UHFFFAOYSA-N 0.000 description 1
- VDNSZPNSUQRUMS-UHFFFAOYSA-N 1-cyclohexyl-4-ethenylbenzene Chemical compound C1=CC(C=C)=CC=C1C1CCCCC1 VDNSZPNSUQRUMS-UHFFFAOYSA-N 0.000 description 1
- JZHGRUMIRATHIU-UHFFFAOYSA-N 1-ethenyl-3-methylbenzene Chemical compound CC1=CC=CC(C=C)=C1 JZHGRUMIRATHIU-UHFFFAOYSA-N 0.000 description 1
- VVTGQMLRTKFKAM-UHFFFAOYSA-N 1-ethenyl-4-propylbenzene Chemical compound CCCC1=CC=C(C=C)C=C1 VVTGQMLRTKFKAM-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- DMFAHCVITRDZQB-UHFFFAOYSA-N 1-propoxypropan-2-yl acetate Chemical compound CCCOCC(C)OC(C)=O DMFAHCVITRDZQB-UHFFFAOYSA-N 0.000 description 1
- HFZLSTDPRQSZCQ-UHFFFAOYSA-N 1-pyrrolidin-3-ylpyrrolidine Chemical compound C1CCCN1C1CNCC1 HFZLSTDPRQSZCQ-UHFFFAOYSA-N 0.000 description 1
- FZSPYHREEHYLCB-UHFFFAOYSA-N 1-tert-butyl-3,5-dimethylbenzene Chemical group CC1=CC(C)=CC(C(C)(C)C)=C1 FZSPYHREEHYLCB-UHFFFAOYSA-N 0.000 description 1
- QCWXDVFBZVHKLV-UHFFFAOYSA-N 1-tert-butyl-4-methylbenzene Chemical compound CC1=CC=C(C(C)(C)C)C=C1 QCWXDVFBZVHKLV-UHFFFAOYSA-N 0.000 description 1
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- CJGXJKVMUHXVHL-UHFFFAOYSA-N 2,2-dimethylpropylbenzene Chemical compound CC(C)(C)CC1=CC=CC=C1 CJGXJKVMUHXVHL-UHFFFAOYSA-N 0.000 description 1
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 1
- LEWZOBYWGWKNCK-UHFFFAOYSA-N 2,3-dihydro-1h-inden-5-amine Chemical compound NC1=CC=C2CCCC2=C1 LEWZOBYWGWKNCK-UHFFFAOYSA-N 0.000 description 1
- RFDZNGIWELUYOT-UHFFFAOYSA-N 2,4,5-trimethylbenzenesulfonic acid Chemical compound CC1=CC(C)=C(S(O)(=O)=O)C=C1C RFDZNGIWELUYOT-UHFFFAOYSA-N 0.000 description 1
- NHJVRSWLHSJWIN-UHFFFAOYSA-N 2,4,6-trinitrobenzenesulfonic acid Chemical compound OS(=O)(=O)C1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O NHJVRSWLHSJWIN-UHFFFAOYSA-N 0.000 description 1
- IRLYGRLEBKCYPY-UHFFFAOYSA-N 2,5-dimethylbenzenesulfonic acid Chemical compound CC1=CC=C(C)C(S(O)(=O)=O)=C1 IRLYGRLEBKCYPY-UHFFFAOYSA-N 0.000 description 1
- JZWGLBCZWLGCDT-UHFFFAOYSA-N 2,7-dichloronaphthalene-1,4,5,8-tetracarboxylic acid Chemical compound ClC1=CC(C(O)=O)=C2C(C(=O)O)=CC(Cl)=C(C(O)=O)C2=C1C(O)=O JZWGLBCZWLGCDT-UHFFFAOYSA-N 0.000 description 1
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- TYEYBOSBBBHJIV-UHFFFAOYSA-N 2-Oxobutanoic acid Natural products CCC(=O)C(O)=O TYEYBOSBBBHJIV-UHFFFAOYSA-N 0.000 description 1
- VFBJXXJYHWLXRM-UHFFFAOYSA-N 2-[2-[3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoyloxy]ethylsulfanyl]ethyl 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CC(C)(C)C1=C(O)C(C(C)(C)C)=CC(CCC(=O)OCCSCCOC(=O)CCC=2C=C(C(O)=C(C=2)C(C)(C)C)C(C)(C)C)=C1 VFBJXXJYHWLXRM-UHFFFAOYSA-N 0.000 description 1
- ZGDMDBHLKNQPSD-UHFFFAOYSA-N 2-amino-5-(4-amino-3-hydroxyphenyl)phenol Chemical group C1=C(O)C(N)=CC=C1C1=CC=C(N)C(O)=C1 ZGDMDBHLKNQPSD-UHFFFAOYSA-N 0.000 description 1
- UXGVMFHEKMGWMA-UHFFFAOYSA-N 2-benzofuran Chemical group C1=CC=CC2=COC=C21 UXGVMFHEKMGWMA-UHFFFAOYSA-N 0.000 description 1
- TVAJJUOMNRUGQA-UHFFFAOYSA-N 2-butoxyethyl dihydrogen phosphate Chemical compound CCCCOCCOP(O)(O)=O TVAJJUOMNRUGQA-UHFFFAOYSA-N 0.000 description 1
- ISPYQTSUDJAMAB-UHFFFAOYSA-N 2-chlorophenol Chemical compound OC1=CC=CC=C1Cl ISPYQTSUDJAMAB-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- FWWXYLGCHHIKNY-UHFFFAOYSA-N 2-ethoxyethyl prop-2-enoate Chemical compound CCOCCOC(=O)C=C FWWXYLGCHHIKNY-UHFFFAOYSA-N 0.000 description 1
- AVBBHCMDRGQBNW-UHFFFAOYSA-N 2-ethyl-n-(2-ethylhexyl)-n-(1,2,4-triazol-1-ylmethyl)hexan-1-amine Chemical compound CCCCC(CC)CN(CC(CC)CCCC)CN1C=NC=N1 AVBBHCMDRGQBNW-UHFFFAOYSA-N 0.000 description 1
- DHTAIMJOUCYGOL-UHFFFAOYSA-N 2-ethyl-n-(2-ethylhexyl)-n-[(4-methylbenzotriazol-1-yl)methyl]hexan-1-amine Chemical compound C1=CC=C2N(CN(CC(CC)CCCC)CC(CC)CCCC)N=NC2=C1C DHTAIMJOUCYGOL-UHFFFAOYSA-N 0.000 description 1
- LJKDOMVGKKPJBH-UHFFFAOYSA-N 2-ethylhexyl dihydrogen phosphate Chemical compound CCCCC(CC)COP(O)(O)=O LJKDOMVGKKPJBH-UHFFFAOYSA-N 0.000 description 1
- XKZGIJICHCVXFV-UHFFFAOYSA-N 2-ethylhexyl diphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OCC(CC)CCCC)OC1=CC=CC=C1 XKZGIJICHCVXFV-UHFFFAOYSA-N 0.000 description 1
- RLHGFJMGWQXPBW-UHFFFAOYSA-N 2-hydroxy-3-(1h-imidazol-5-ylmethyl)benzamide Chemical compound NC(=O)C1=CC=CC(CC=2NC=NC=2)=C1O RLHGFJMGWQXPBW-UHFFFAOYSA-N 0.000 description 1
- LVQFQZZGTZFUNF-UHFFFAOYSA-N 2-hydroxy-3-[4-(2-hydroxy-3-sulfonatopropyl)piperazine-1,4-diium-1-yl]propane-1-sulfonate Chemical compound OS(=O)(=O)CC(O)CN1CCN(CC(O)CS(O)(=O)=O)CC1 LVQFQZZGTZFUNF-UHFFFAOYSA-N 0.000 description 1
- SJZAUIVYZWPNAS-UHFFFAOYSA-N 2-methoxy-1,4-dimethylbenzene Chemical compound COC1=CC(C)=CC=C1C SJZAUIVYZWPNAS-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical class [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- HFCUBKYHMMPGBY-UHFFFAOYSA-N 2-methoxyethyl prop-2-enoate Chemical compound COCCOC(=O)C=C HFCUBKYHMMPGBY-UHFFFAOYSA-N 0.000 description 1
- ICPWFHKNYYRBSZ-UHFFFAOYSA-M 2-methoxypropanoate Chemical compound COC(C)C([O-])=O ICPWFHKNYYRBSZ-UHFFFAOYSA-M 0.000 description 1
- DTFKRVXLBCAIOZ-UHFFFAOYSA-N 2-methylanisole Chemical compound COC1=CC=CC=C1C DTFKRVXLBCAIOZ-UHFFFAOYSA-N 0.000 description 1
- 125000004493 2-methylbut-1-yl group Chemical group CC(C*)CC 0.000 description 1
- TWCXRVFSIAWFMA-UHFFFAOYSA-N 2-morpholin-4-ium-2-ylacetate Chemical compound OC(=O)CC1CNCCO1 TWCXRVFSIAWFMA-UHFFFAOYSA-N 0.000 description 1
- BFDYSJCMAFSRDH-UHFFFAOYSA-N 2-phenylethylphosphonic acid Chemical compound OP(O)(=O)CCC1=CC=CC=C1 BFDYSJCMAFSRDH-UHFFFAOYSA-N 0.000 description 1
- NCCTVAJNFXYWTM-UHFFFAOYSA-N 2-tert-butylcyclohexa-2,5-diene-1,4-dione Chemical compound CC(C)(C)C1=CC(=O)C=CC1=O NCCTVAJNFXYWTM-UHFFFAOYSA-N 0.000 description 1
- WMRCTEPOPAZMMN-UHFFFAOYSA-N 2-undecylpropanedioic acid Chemical compound CCCCCCCCCCCC(C(O)=O)C(O)=O WMRCTEPOPAZMMN-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- YMTYZTXUZLQUSF-UHFFFAOYSA-N 3,3'-Dimethylbisphenol A Chemical compound C1=C(O)C(C)=CC(C(C)(C)C=2C=C(C)C(O)=CC=2)=C1 YMTYZTXUZLQUSF-UHFFFAOYSA-N 0.000 description 1
- KCIZTNZGSBSSRM-UHFFFAOYSA-N 3,4,5-Trimethoxytoluene Chemical compound COC1=CC(C)=CC(OC)=C1OC KCIZTNZGSBSSRM-UHFFFAOYSA-N 0.000 description 1
- LXKCHCXZBPLTAE-UHFFFAOYSA-N 3,4-dimethyl-1H-pyrazole phosphate Chemical compound OP(O)(O)=O.CC1=CNN=C1C LXKCHCXZBPLTAE-UHFFFAOYSA-N 0.000 description 1
- UENRXLSRMCSUSN-UHFFFAOYSA-N 3,5-diaminobenzoic acid Chemical compound NC1=CC(N)=CC(C(O)=O)=C1 UENRXLSRMCSUSN-UHFFFAOYSA-N 0.000 description 1
- AIBRSVLEQRWAEG-UHFFFAOYSA-N 3,9-bis(2,4-ditert-butylphenoxy)-2,4,8,10-tetraoxa-3,9-diphosphaspiro[5.5]undecane Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC=C1OP1OCC2(COP(OC=3C(=CC(=CC=3)C(C)(C)C)C(C)(C)C)OC2)CO1 AIBRSVLEQRWAEG-UHFFFAOYSA-N 0.000 description 1
- LXJLFVRAWOOQDR-UHFFFAOYSA-N 3-(3-aminophenoxy)aniline Chemical compound NC1=CC=CC(OC=2C=C(N)C=CC=2)=C1 LXJLFVRAWOOQDR-UHFFFAOYSA-N 0.000 description 1
- LJGHYPLBDBRCRZ-UHFFFAOYSA-N 3-(3-aminophenyl)sulfonylaniline Chemical compound NC1=CC=CC(S(=O)(=O)C=2C=C(N)C=CC=2)=C1 LJGHYPLBDBRCRZ-UHFFFAOYSA-N 0.000 description 1
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 1
- ZMPZWXKBGSQATE-UHFFFAOYSA-N 3-(4-aminophenyl)sulfonylaniline Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=CC(N)=C1 ZMPZWXKBGSQATE-UHFFFAOYSA-N 0.000 description 1
- DVLFYONBTKHTER-UHFFFAOYSA-N 3-(N-morpholino)propanesulfonic acid Chemical compound OS(=O)(=O)CCCN1CCOCC1 DVLFYONBTKHTER-UHFFFAOYSA-N 0.000 description 1
- NUFBIAUZAMHTSP-UHFFFAOYSA-N 3-(n-morpholino)-2-hydroxypropanesulfonic acid Chemical compound OS(=O)(=O)CC(O)CN1CCOCC1 NUFBIAUZAMHTSP-UHFFFAOYSA-N 0.000 description 1
- TVZRAEYQIKYCPH-UHFFFAOYSA-N 3-(trimethylsilyl)propane-1-sulfonic acid Chemical compound C[Si](C)(C)CCCS(O)(=O)=O TVZRAEYQIKYCPH-UHFFFAOYSA-N 0.000 description 1
- TYKLCAKICHXQNE-UHFFFAOYSA-N 3-[(2,3-dicarboxyphenyl)methyl]phthalic acid Chemical compound OC(=O)C1=CC=CC(CC=2C(=C(C(O)=O)C=CC=2)C(O)=O)=C1C(O)=O TYKLCAKICHXQNE-UHFFFAOYSA-N 0.000 description 1
- CKOFBUUFHALZGK-UHFFFAOYSA-N 3-[(3-aminophenyl)methyl]aniline Chemical compound NC1=CC=CC(CC=2C=C(N)C=CC=2)=C1 CKOFBUUFHALZGK-UHFFFAOYSA-N 0.000 description 1
- FGWQCROGAHMWSU-UHFFFAOYSA-N 3-[(4-aminophenyl)methyl]aniline Chemical compound C1=CC(N)=CC=C1CC1=CC=CC(N)=C1 FGWQCROGAHMWSU-UHFFFAOYSA-N 0.000 description 1
- UCFMKTNJZCYBBJ-UHFFFAOYSA-N 3-[1-(2,3-dicarboxyphenyl)ethyl]phthalic acid Chemical compound C=1C=CC(C(O)=O)=C(C(O)=O)C=1C(C)C1=CC=CC(C(O)=O)=C1C(O)=O UCFMKTNJZCYBBJ-UHFFFAOYSA-N 0.000 description 1
- PAHZZOIHRHCHTH-UHFFFAOYSA-N 3-[2-(2,3-dicarboxyphenyl)propan-2-yl]phthalic acid Chemical compound C=1C=CC(C(O)=O)=C(C(O)=O)C=1C(C)(C)C1=CC=CC(C(O)=O)=C1C(O)=O PAHZZOIHRHCHTH-UHFFFAOYSA-N 0.000 description 1
- UVUCUHVQYAPMEU-UHFFFAOYSA-N 3-[2-(3-aminophenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]aniline Chemical compound NC1=CC=CC(C(C=2C=C(N)C=CC=2)(C(F)(F)F)C(F)(F)F)=C1 UVUCUHVQYAPMEU-UHFFFAOYSA-N 0.000 description 1
- DVXYMCJCMDTSQA-UHFFFAOYSA-N 3-[2-(3-aminophenyl)propan-2-yl]aniline Chemical compound C=1C=CC(N)=CC=1C(C)(C)C1=CC=CC(N)=C1 DVXYMCJCMDTSQA-UHFFFAOYSA-N 0.000 description 1
- DKKYOQYISDAQER-UHFFFAOYSA-N 3-[3-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=C(OC=3C=C(N)C=CC=3)C=CC=2)=C1 DKKYOQYISDAQER-UHFFFAOYSA-N 0.000 description 1
- MFTFTIALAXXIMU-UHFFFAOYSA-N 3-[4-[2-[4-(3-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropan-2-yl]phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=CC(=CC=2)C(C=2C=CC(OC=3C=C(N)C=CC=3)=CC=2)(C(F)(F)F)C(F)(F)F)=C1 MFTFTIALAXXIMU-UHFFFAOYSA-N 0.000 description 1
- NYRFBMFAUFUULG-UHFFFAOYSA-N 3-[4-[2-[4-(3-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=C(N)C=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=CC(N)=C1 NYRFBMFAUFUULG-UHFFFAOYSA-N 0.000 description 1
- MYCRGPYEHTUKSH-UHFFFAOYSA-N 3-[4-[4-(3-aminopropoxy)butoxy]butoxy]propan-1-amine Chemical compound NCCCOCCCCOCCCCOCCCN MYCRGPYEHTUKSH-UHFFFAOYSA-N 0.000 description 1
- LEEZDPXWPYCRRM-UHFFFAOYSA-N 3-hydroxy-beta-eudesmol Natural products C1CC(O)C(=C)C2CC(C(C)(O)C)CCC21C LEEZDPXWPYCRRM-UHFFFAOYSA-N 0.000 description 1
- WQPMYSHJKXVTME-UHFFFAOYSA-N 3-hydroxypropane-1-sulfonic acid Chemical compound OCCCS(O)(=O)=O WQPMYSHJKXVTME-UHFFFAOYSA-N 0.000 description 1
- XNXIYYFOYIUJIW-UHFFFAOYSA-N 3-methylbutylbenzene Chemical compound CC(C)CCC1=CC=CC=C1 XNXIYYFOYIUJIW-UHFFFAOYSA-N 0.000 description 1
- PUVMVPFLXCHEOY-UHFFFAOYSA-N 3-phosphonopropylphosphonic acid Chemical compound OP(O)(=O)CCCP(O)(O)=O PUVMVPFLXCHEOY-UHFFFAOYSA-N 0.000 description 1
- JASHGAIOBWYPBI-UHFFFAOYSA-N 3a,4a,7a,7b-tetrahydrodifuro[5,4-a:5',4'-d]furan-1,3,5,7-tetrone Chemical compound O=C1OC(=O)C2C1C1C(=O)OC(=O)C1O2 JASHGAIOBWYPBI-UHFFFAOYSA-N 0.000 description 1
- ICNFHJVPAJKPHW-UHFFFAOYSA-N 4,4'-Thiodianiline Chemical compound C1=CC(N)=CC=C1SC1=CC=C(N)C=C1 ICNFHJVPAJKPHW-UHFFFAOYSA-N 0.000 description 1
- QGRZMPCVIHBQOE-UHFFFAOYSA-N 4,8-dimethyl-1,2,3,5,6,7-hexahydronaphthalene-1,2,5,6-tetracarboxylic acid Chemical compound OC(=O)C1C(C(O)=O)CC(C)=C2C(C(O)=O)C(C(O)=O)CC(C)=C21 QGRZMPCVIHBQOE-UHFFFAOYSA-N 0.000 description 1
- FYYYKXFEKMGYLZ-UHFFFAOYSA-N 4-(1,3-dioxo-2-benzofuran-5-yl)-2-benzofuran-1,3-dione Chemical compound C=1C=C2C(=O)OC(=O)C2=CC=1C1=CC=CC2=C1C(=O)OC2=O FYYYKXFEKMGYLZ-UHFFFAOYSA-N 0.000 description 1
- AIVVXPSKEVWKMY-UHFFFAOYSA-N 4-(3,4-dicarboxyphenoxy)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1OC1=CC=C(C(O)=O)C(C(O)=O)=C1 AIVVXPSKEVWKMY-UHFFFAOYSA-N 0.000 description 1
- AVCOFPOLGHKJQB-UHFFFAOYSA-N 4-(3,4-dicarboxyphenyl)sulfonylphthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1S(=O)(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 AVCOFPOLGHKJQB-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- SCKDALTXEWVLPD-UHFFFAOYSA-N 4-(4-propylphenyl)phthalic acid Chemical compound C1=CC(CCC)=CC=C1C1=CC=C(C(O)=O)C(C(O)=O)=C1 SCKDALTXEWVLPD-UHFFFAOYSA-N 0.000 description 1
- ABSXMLODUTXQDJ-UHFFFAOYSA-N 4-(4-sulfophenyl)benzenesulfonic acid Chemical compound C1=CC(S(=O)(=O)O)=CC=C1C1=CC=C(S(O)(=O)=O)C=C1 ABSXMLODUTXQDJ-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- VBIRCRCPHNUJAS-AFHBHXEDSA-N 4-[(1S,3aR,4S,6aR)-4-(1,3-benzodioxol-5-yl)tetrahydrofuro[3,4-c]furan-1-yl]-2-methoxyphenol Chemical compound C1=C(O)C(OC)=CC([C@@H]2[C@@H]3[C@@H]([C@H](OC3)C=3C=C4OCOC4=CC=3)CO2)=C1 VBIRCRCPHNUJAS-AFHBHXEDSA-N 0.000 description 1
- HNHQPIBXQALMMN-UHFFFAOYSA-N 4-[(3,4-dicarboxyphenyl)-dimethylsilyl]phthalic acid Chemical compound C=1C=C(C(O)=O)C(C(O)=O)=CC=1[Si](C)(C)C1=CC=C(C(O)=O)C(C(O)=O)=C1 HNHQPIBXQALMMN-UHFFFAOYSA-N 0.000 description 1
- MOCQGMXEHQTAEN-UHFFFAOYSA-N 4-[(3,4-dicarboxyphenyl)-diphenylsilyl]phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1[Si](C=1C=C(C(C(O)=O)=CC=1)C(O)=O)(C=1C=CC=CC=1)C1=CC=CC=C1 MOCQGMXEHQTAEN-UHFFFAOYSA-N 0.000 description 1
- PGINWLUPVDUINN-UHFFFAOYSA-N 4-[(3,4-dicarboxyphenyl)-methyl-phenylsilyl]phthalic acid Chemical compound C=1C=C(C(O)=O)C(C(O)=O)=CC=1[Si](C=1C=C(C(C(O)=O)=CC=1)C(O)=O)(C)C1=CC=CC=C1 PGINWLUPVDUINN-UHFFFAOYSA-N 0.000 description 1
- IWXCYYWDGDDPAC-UHFFFAOYSA-N 4-[(3,4-dicarboxyphenyl)methyl]phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1CC1=CC=C(C(O)=O)C(C(O)=O)=C1 IWXCYYWDGDDPAC-UHFFFAOYSA-N 0.000 description 1
- OMHOXRVODFQGCA-UHFFFAOYSA-N 4-[(4-amino-3,5-dimethylphenyl)methyl]-2,6-dimethylaniline Chemical compound CC1=C(N)C(C)=CC(CC=2C=C(C)C(N)=C(C)C=2)=C1 OMHOXRVODFQGCA-UHFFFAOYSA-N 0.000 description 1
- IJJNNSUCZDJDLP-UHFFFAOYSA-N 4-[1-(3,4-dicarboxyphenyl)ethyl]phthalic acid Chemical compound C=1C=C(C(O)=O)C(C(O)=O)=CC=1C(C)C1=CC=C(C(O)=O)C(C(O)=O)=C1 IJJNNSUCZDJDLP-UHFFFAOYSA-N 0.000 description 1
- GEYAGBVEAJGCFB-UHFFFAOYSA-N 4-[2-(3,4-dicarboxyphenyl)propan-2-yl]phthalic acid Chemical compound C=1C=C(C(O)=O)C(C(O)=O)=CC=1C(C)(C)C1=CC=C(C(O)=O)C(C(O)=O)=C1 GEYAGBVEAJGCFB-UHFFFAOYSA-N 0.000 description 1
- BEKFRNOZJSYWKZ-UHFFFAOYSA-N 4-[2-(4-aminophenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]aniline Chemical compound C1=CC(N)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(N)C=C1 BEKFRNOZJSYWKZ-UHFFFAOYSA-N 0.000 description 1
- ZYEDGEXYGKWJPB-UHFFFAOYSA-N 4-[2-(4-aminophenyl)propan-2-yl]aniline Chemical compound C=1C=C(N)C=CC=1C(C)(C)C1=CC=C(N)C=C1 ZYEDGEXYGKWJPB-UHFFFAOYSA-N 0.000 description 1
- HESXPOICBNWMPI-UHFFFAOYSA-N 4-[2-[4-[2-(4-aminophenyl)propan-2-yl]phenyl]propan-2-yl]aniline Chemical compound C=1C=C(C(C)(C)C=2C=CC(N)=CC=2)C=CC=1C(C)(C)C1=CC=C(N)C=C1 HESXPOICBNWMPI-UHFFFAOYSA-N 0.000 description 1
- VVYGLSFSBRAUPW-UHFFFAOYSA-N 4-[4-(1,1,1,3,3,3-hexafluoropropan-2-yl)phenyl]phthalic acid Chemical compound C(=O)(O)C=1C=C(C=CC1C(=O)O)C1=CC=C(C=C1)C(C(F)(F)F)C(F)(F)F VVYGLSFSBRAUPW-UHFFFAOYSA-N 0.000 description 1
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 description 1
- HHLMWQDRYZAENA-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropan-2-yl]phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=C(C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)(C(F)(F)F)C(F)(F)F)C=C1 HHLMWQDRYZAENA-UHFFFAOYSA-N 0.000 description 1
- MRTAEHMRKDVKMS-UHFFFAOYSA-N 4-[4-[4-(3,4-dicarboxyphenoxy)phenyl]sulfanylphenoxy]phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1OC(C=C1)=CC=C1SC(C=C1)=CC=C1OC1=CC=C(C(O)=O)C(C(O)=O)=C1 MRTAEHMRKDVKMS-UHFFFAOYSA-N 0.000 description 1
- AXFZHOJOXNHNDY-UHFFFAOYSA-N 4-[[4-[(3,4-dicarboxyphenyl)-dimethylsilyl]phenyl]-dimethylsilyl]phthalic acid Chemical compound C=1C=C(C(O)=O)C(C(O)=O)=CC=1[Si](C)(C)C(C=C1)=CC=C1[Si](C)(C)C1=CC=C(C(O)=O)C(C(O)=O)=C1 AXFZHOJOXNHNDY-UHFFFAOYSA-N 0.000 description 1
- KZTROCYBPMKGAW-UHFFFAOYSA-N 4-[[4-amino-3,5-di(propan-2-yl)phenyl]methyl]-2,6-di(propan-2-yl)aniline Chemical compound CC(C)C1=C(N)C(C(C)C)=CC(CC=2C=C(C(N)=C(C(C)C)C=2)C(C)C)=C1 KZTROCYBPMKGAW-UHFFFAOYSA-N 0.000 description 1
- ACQVEWFMUBXEMR-UHFFFAOYSA-N 4-bromo-2-fluoro-6-nitrophenol Chemical compound OC1=C(F)C=C(Br)C=C1[N+]([O-])=O ACQVEWFMUBXEMR-UHFFFAOYSA-N 0.000 description 1
- ZDTXQHVBLWYPHS-UHFFFAOYSA-N 4-nitrotoluene-2-sulfonic acid Chemical compound CC1=CC=C([N+]([O-])=O)C=C1S(O)(=O)=O ZDTXQHVBLWYPHS-UHFFFAOYSA-N 0.000 description 1
- JKTORXLUQLQJCM-UHFFFAOYSA-N 4-phosphonobutylphosphonic acid Chemical compound OP(O)(=O)CCCCP(O)(O)=O JKTORXLUQLQJCM-UHFFFAOYSA-N 0.000 description 1
- WNKQDGLSQUASME-UHFFFAOYSA-N 4-sulfophthalic acid Chemical compound OC(=O)C1=CC=C(S(O)(=O)=O)C=C1C(O)=O WNKQDGLSQUASME-UHFFFAOYSA-N 0.000 description 1
- QRPPSTNABSMSCS-UHFFFAOYSA-N 4-tert-butyl-1,2-dimethylbenzene Chemical group CC1=CC=C(C(C)(C)C)C=C1C QRPPSTNABSMSCS-UHFFFAOYSA-N 0.000 description 1
- YGYCECQIOXZODZ-UHFFFAOYSA-N 4415-87-6 Chemical compound O=C1OC(=O)C2C1C1C(=O)OC(=O)C12 YGYCECQIOXZODZ-UHFFFAOYSA-N 0.000 description 1
- HOOIIRHGHALACD-UHFFFAOYSA-N 5-(2,5-dioxooxolan-3-yl)-3-methylcyclohex-3-ene-1,2-dicarboxylic acid Chemical compound C1C(C(O)=O)C(C(O)=O)C(C)=CC1C1C(=O)OC(=O)C1 HOOIIRHGHALACD-UHFFFAOYSA-N 0.000 description 1
- QQGYZOYWNCKGEK-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)oxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC=2C=C3C(=O)OC(C3=CC=2)=O)=C1 QQGYZOYWNCKGEK-UHFFFAOYSA-N 0.000 description 1
- QHHKLPCQTTWFSS-UHFFFAOYSA-N 5-[2-(1,3-dioxo-2-benzofuran-5-yl)-1,1,1,3,3,3-hexafluoropropan-2-yl]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)(C(F)(F)F)C(F)(F)F)=C1 QHHKLPCQTTWFSS-UHFFFAOYSA-N 0.000 description 1
- QEAYLNJEDDOYNQ-UHFFFAOYSA-N 6-anilino-4-hydroxynaphthalene-2-sulfonic acid Chemical compound C1=C2C(O)=CC(S(O)(=O)=O)=CC2=CC=C1NC1=CC=CC=C1 QEAYLNJEDDOYNQ-UHFFFAOYSA-N 0.000 description 1
- FWEOQOXTVHGIFQ-UHFFFAOYSA-N 8-anilinonaphthalene-1-sulfonic acid Chemical compound C=12C(S(=O)(=O)O)=CC=CC2=CC=CC=1NC1=CC=CC=C1 FWEOQOXTVHGIFQ-UHFFFAOYSA-N 0.000 description 1
- ADRNSOYXKABLGT-UHFFFAOYSA-N 8-methylnonyl diphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OCCCCCCCC(C)C)OC1=CC=CC=C1 ADRNSOYXKABLGT-UHFFFAOYSA-N 0.000 description 1
- SPBDXSGPUHCETR-JFUDTMANSA-N 8883yp2r6d Chemical compound O1[C@@H](C)[C@H](O)[C@@H](OC)C[C@@H]1O[C@@H]1[C@@H](OC)C[C@H](O[C@@H]2C(=C/C[C@@H]3C[C@@H](C[C@@]4(O[C@@H]([C@@H](C)CC4)C(C)C)O3)OC(=O)[C@@H]3C=C(C)[C@@H](O)[C@H]4OC\C([C@@]34O)=C/C=C/[C@@H]2C)/C)O[C@H]1C.C1C[C@H](C)[C@@H]([C@@H](C)CC)O[C@@]21O[C@H](C\C=C(C)\[C@@H](O[C@@H]1O[C@@H](C)[C@H](O[C@@H]3O[C@@H](C)[C@H](O)[C@@H](OC)C3)[C@@H](OC)C1)[C@@H](C)\C=C\C=C/1[C@]3([C@H](C(=O)O4)C=C(C)[C@@H](O)[C@H]3OC\1)O)C[C@H]4C2 SPBDXSGPUHCETR-JFUDTMANSA-N 0.000 description 1
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N Acrylic acid Chemical compound OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 101100064324 Arabidopsis thaliana DTX48 gene Proteins 0.000 description 1
- MGYMHQJELJYRQS-UHFFFAOYSA-N Ascaridole Chemical compound C1CC2(C)OOC1(C(C)C)C=C2 MGYMHQJELJYRQS-UHFFFAOYSA-N 0.000 description 1
- 229920001342 Bakelite® Polymers 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- IRIAEXORFWYRCZ-UHFFFAOYSA-N Butylbenzyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCC1=CC=CC=C1 IRIAEXORFWYRCZ-UHFFFAOYSA-N 0.000 description 1
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 1
- GACSBEGIDLXSNC-UHFFFAOYSA-N C(C)N(C1=CC=CC=C1)CCNC(C)(C)P(O)=O Chemical compound C(C)N(C1=CC=CC=C1)CCNC(C)(C)P(O)=O GACSBEGIDLXSNC-UHFFFAOYSA-N 0.000 description 1
- 239000005632 Capric acid (CAS 334-48-5) Substances 0.000 description 1
- 239000005635 Caprylic acid (CAS 124-07-2) Substances 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 239000005973 Carvone Substances 0.000 description 1
- 229930008410 Chrysanthemol Natural products 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- 241000723346 Cinnamomum camphora Species 0.000 description 1
- PMPVIKIVABFJJI-UHFFFAOYSA-N Cyclobutane Chemical compound C1CCC1 PMPVIKIVABFJJI-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- PJWWRFATQTVXHA-UHFFFAOYSA-N Cyclohexylaminopropanesulfonic acid Chemical compound OS(=O)(=O)CCCNC1CCCCC1 PJWWRFATQTVXHA-UHFFFAOYSA-N 0.000 description 1
- LVZWSLJZHVFIQJ-UHFFFAOYSA-N Cyclopropane Chemical compound C1CC1 LVZWSLJZHVFIQJ-UHFFFAOYSA-N 0.000 description 1
- NOOLISFMXDJSKH-UHFFFAOYSA-N DL-menthol Natural products CC(C)C1CCC(C)CC1O NOOLISFMXDJSKH-UHFFFAOYSA-N 0.000 description 1
- 102100035474 DNA polymerase kappa Human genes 0.000 description 1
- 101710108091 DNA polymerase kappa Proteins 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- JYFHYPJRHGVZDY-UHFFFAOYSA-N Dibutyl phosphate Chemical compound CCCCOP(O)(=O)OCCCC JYFHYPJRHGVZDY-UHFFFAOYSA-N 0.000 description 1
- KKUKTXOBAWVSHC-UHFFFAOYSA-N Dimethylphosphate Chemical compound COP(O)(=O)OC KKUKTXOBAWVSHC-UHFFFAOYSA-N 0.000 description 1
- 241001649081 Dina Species 0.000 description 1
- 241001050985 Disco Species 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- 229920006347 Elastollan Polymers 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- XXRCUYVCPSWGCC-UHFFFAOYSA-N Ethyl pyruvate Chemical compound CCOC(=O)C(C)=O XXRCUYVCPSWGCC-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229920003620 Grilon® Polymers 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- DTGKSKDOIYIVQL-MRTMQBJTSA-N Isoborneol Natural products C1C[C@@]2(C)[C@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-MRTMQBJTSA-N 0.000 description 1
- HTLAJCAGSLWZJN-SNAWJCMRSA-N Junionone Chemical compound CC(=O)\C=C\C1CCC1(C)C HTLAJCAGSLWZJN-SNAWJCMRSA-N 0.000 description 1
- HTLAJCAGSLWZJN-XNPJLODASA-N Junionone Natural products CC(=O)\C=C\[C@@H]1CCC1(C)C HTLAJCAGSLWZJN-XNPJLODASA-N 0.000 description 1
- 239000005639 Lauric acid Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- WRQNANDWMGAFTP-UHFFFAOYSA-N Methylacetoacetic acid Chemical compound COC(=O)CC(C)=O WRQNANDWMGAFTP-UHFFFAOYSA-N 0.000 description 1
- QFKIBXZORARTEH-UHFFFAOYSA-N N(C1=CC=CC=C1)C(C)(C)P(O)=O Chemical compound N(C1=CC=CC=C1)C(C)(C)P(O)=O QFKIBXZORARTEH-UHFFFAOYSA-N 0.000 description 1
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 1
- BACYUWVYYTXETD-UHFFFAOYSA-N N-Lauroylsarcosine Chemical compound CCCCCCCCCCCC(=O)N(C)CC(O)=O BACYUWVYYTXETD-UHFFFAOYSA-N 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- 229920000571 Nylon 11 Polymers 0.000 description 1
- 229920000299 Nylon 12 Polymers 0.000 description 1
- 229920002302 Nylon 6,6 Polymers 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- FKJXQCLQFWDQCL-UHFFFAOYSA-N P(=O)(O)OP(=O)O.C=1(C(=CC=CC1)C)C Chemical compound P(=O)(O)OP(=O)O.C=1(C(=CC=CC1)C)C FKJXQCLQFWDQCL-UHFFFAOYSA-N 0.000 description 1
- 235000021314 Palmitic acid Nutrition 0.000 description 1
- 239000004419 Panlite Substances 0.000 description 1
- 239000005643 Pelargonic acid Substances 0.000 description 1
- DIQMPQMYFZXDAX-UHFFFAOYSA-N Pentyl formate Chemical compound CCCCCOC=O DIQMPQMYFZXDAX-UHFFFAOYSA-N 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- QLZHNIAADXEJJP-UHFFFAOYSA-N Phenylphosphonic acid Chemical compound OP(O)(=O)C1=CC=CC=C1 QLZHNIAADXEJJP-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 229920000616 Poly(1,4-butylene adipate) Polymers 0.000 description 1
- 229930182556 Polyacetal Natural products 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004693 Polybenzimidazole Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 239000005700 Putrescine Substances 0.000 description 1
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 1
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- 229910018557 Si O Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 229920013623 Solprene Polymers 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical group C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 1
- 239000005844 Thymol Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 229920003734 UBESTA® Polymers 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- WONIGEXYPVIKFS-UHFFFAOYSA-N Verbenol Chemical compound CC1=CC(O)C2C(C)(C)C1C2 WONIGEXYPVIKFS-UHFFFAOYSA-N 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- AIWAKBITCLOITM-QPJJXVBHSA-N [(e)-3-phenylprop-2-enyl]phosphonic acid Chemical compound OP(O)(=O)C\C=C\C1=CC=CC=C1 AIWAKBITCLOITM-QPJJXVBHSA-N 0.000 description 1
- DGEZNRSVGBDHLK-UHFFFAOYSA-N [1,10]phenanthroline Chemical group C1=CN=C2C3=NC=CC=C3C=CC2=C1 DGEZNRSVGBDHLK-UHFFFAOYSA-N 0.000 description 1
- QLBRROYTTDFLDX-UHFFFAOYSA-N [3-(aminomethyl)cyclohexyl]methanamine Chemical compound NCC1CCCC(CN)C1 QLBRROYTTDFLDX-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 125000004062 acenaphthenyl group Chemical group C1(CC2=CC=CC3=CC=CC1=C23)* 0.000 description 1
- 239000011354 acetal resin Substances 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- IPBVNPXQWQGGJP-UHFFFAOYSA-N acetic acid phenyl ester Natural products CC(=O)OC1=CC=CC=C1 IPBVNPXQWQGGJP-UHFFFAOYSA-N 0.000 description 1
- KVXNKFYSHAUJIA-UHFFFAOYSA-N acetic acid;ethoxyethane Chemical compound CC(O)=O.CCOCC KVXNKFYSHAUJIA-UHFFFAOYSA-N 0.000 description 1
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 229940091181 aconitic acid Drugs 0.000 description 1
- 125000000641 acridinyl group Chemical group C1(=CC=CC2=NC3=CC=CC=C3C=C12)* 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 235000010443 alginic acid Nutrition 0.000 description 1
- 229920000615 alginic acid Polymers 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 229920003232 aliphatic polyester Polymers 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000004450 alkenylene group Chemical group 0.000 description 1
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 125000004419 alkynylene group Chemical group 0.000 description 1
- JAZBEHYOTPTENJ-JLNKQSITSA-N all-cis-5,8,11,14,17-icosapentaenoic acid Chemical compound CC\C=C/C\C=C/C\C=C/C\C=C/C\C=C/CCCC(O)=O JAZBEHYOTPTENJ-JLNKQSITSA-N 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- DTOSIQBPPRVQHS-PDBXOOCHSA-N alpha-linolenic acid Chemical compound CC\C=C/C\C=C/C\C=C/CCCCCCCC(O)=O DTOSIQBPPRVQHS-PDBXOOCHSA-N 0.000 description 1
- 235000020661 alpha-linolenic acid Nutrition 0.000 description 1
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical compound CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 description 1
- KQAZVFVOEIRWHN-UHFFFAOYSA-N alpha-thujene Natural products CC1=CCC2(C(C)C)C1C2 KQAZVFVOEIRWHN-UHFFFAOYSA-N 0.000 description 1
- DNEHKUCSURWDGO-UHFFFAOYSA-N aluminum sodium Chemical compound [Na].[Al] DNEHKUCSURWDGO-UHFFFAOYSA-N 0.000 description 1
- DKNWSYNQZKUICI-UHFFFAOYSA-N amantadine Chemical compound C1C(C2)CC3CC2CC1(N)C3 DKNWSYNQZKUICI-UHFFFAOYSA-N 0.000 description 1
- 229960003805 amantadine Drugs 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 229940039407 aniline Drugs 0.000 description 1
- 125000005577 anthracene group Chemical group 0.000 description 1
- 230000002744 anti-aggregatory effect Effects 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 101150059062 apln gene Proteins 0.000 description 1
- 235000021342 arachidonic acid Nutrition 0.000 description 1
- 229940114079 arachidonic acid Drugs 0.000 description 1
- 150000004984 aromatic diamines Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- MGYMHQJELJYRQS-ZJUUUORDSA-N ascaridole Natural products C1C[C@]2(C)OO[C@@]1(C(C)C)C=C2 MGYMHQJELJYRQS-ZJUUUORDSA-N 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 125000003828 azulenyl group Chemical group 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- GCAIEATUVJFSMC-UHFFFAOYSA-N benzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1C(O)=O GCAIEATUVJFSMC-UHFFFAOYSA-N 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- LPTWEDZIPSKWDG-UHFFFAOYSA-N benzenesulfonic acid;dodecane Chemical compound OS(=O)(=O)C1=CC=CC=C1.CCCCCCCCCCCC LPTWEDZIPSKWDG-UHFFFAOYSA-N 0.000 description 1
- JDRCQIRZJMJGMW-UHFFFAOYSA-N benzhydrylphosphonic acid Chemical compound C=1C=CC=CC=1C(P(O)(=O)O)C1=CC=CC=C1 JDRCQIRZJMJGMW-UHFFFAOYSA-N 0.000 description 1
- BNBQRQQYDMDJAH-UHFFFAOYSA-N benzodioxan Chemical compound C1=CC=C2OCCOC2=C1 BNBQRQQYDMDJAH-UHFFFAOYSA-N 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- BKDVBBSUAGJUBA-UHFFFAOYSA-N bicyclo[2.2.2]oct-7-ene-2,3,5,6-tetracarboxylic acid Chemical compound C1=CC2C(C(O)=O)C(C(=O)O)C1C(C(O)=O)C2C(O)=O BKDVBBSUAGJUBA-UHFFFAOYSA-N 0.000 description 1
- 239000004305 biphenyl Chemical group 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- WXZOXVVKILCOPG-UHFFFAOYSA-N bis(2-ethylhexyl) benzene-1,3-dicarboxylate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC(C(=O)OCC(CC)CCCC)=C1 WXZOXVVKILCOPG-UHFFFAOYSA-N 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229940116229 borneol Drugs 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- OBNCKNCVKJNDBV-UHFFFAOYSA-N butanoic acid ethyl ester Natural products CCCC(=O)OCC OBNCKNCVKJNDBV-UHFFFAOYSA-N 0.000 description 1
- IAQRGUVFOMOMEM-UHFFFAOYSA-N butene Natural products CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 1
- YFNONBGXNFCTMM-UHFFFAOYSA-N butoxybenzene Chemical compound CCCCOC1=CC=CC=C1 YFNONBGXNFCTMM-UHFFFAOYSA-N 0.000 description 1
- IWPATTDMSUYMJV-UHFFFAOYSA-N butyl 2-methoxyacetate Chemical compound CCCCOC(=O)COC IWPATTDMSUYMJV-UHFFFAOYSA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 235000010354 butylated hydroxytoluene Nutrition 0.000 description 1
- UOKRBSXOBUKDGE-UHFFFAOYSA-N butylphosphonic acid Chemical compound CCCCP(O)(O)=O UOKRBSXOBUKDGE-UHFFFAOYSA-N 0.000 description 1
- 229930008380 camphor Natural products 0.000 description 1
- 229960000846 camphor Drugs 0.000 description 1
- 229930006737 car-3-ene Natural products 0.000 description 1
- 125000000609 carbazolyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 229930007646 carveol Natural products 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 150000003943 catecholamines Chemical class 0.000 description 1
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 1
- 229940106681 chloroacetic acid Drugs 0.000 description 1
- QZHPTGXQGDFGEN-UHFFFAOYSA-N chromene Chemical group C1=CC=C2C=C[CH]OC2=C1 QZHPTGXQGDFGEN-UHFFFAOYSA-N 0.000 description 1
- 125000005578 chrysene group Chemical group 0.000 description 1
- RFFOTVCVTJUTAD-UHFFFAOYSA-N cineole Natural products C1CC2(C)CCC1(C(C)C)O2 RFFOTVCVTJUTAD-UHFFFAOYSA-N 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- PMMYEEVYMWASQN-IMJSIDKUSA-N cis-4-Hydroxy-L-proline Chemical compound O[C@@H]1CN[C@H](C(O)=O)C1 PMMYEEVYMWASQN-IMJSIDKUSA-N 0.000 description 1
- BWRHOYDPVJPXMF-UHFFFAOYSA-N cis-Caran Natural products C1C(C)CCC2C(C)(C)C12 BWRHOYDPVJPXMF-UHFFFAOYSA-N 0.000 description 1
- GTZCVFVGUGFEME-IWQZZHSRSA-N cis-aconitic acid Chemical compound OC(=O)C\C(C(O)=O)=C\C(O)=O GTZCVFVGUGFEME-IWQZZHSRSA-N 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- 229940125904 compound 1 Drugs 0.000 description 1
- 229940125782 compound 2 Drugs 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- 229940013361 cresol Drugs 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- TXWRERCHRDBNLG-UHFFFAOYSA-N cubane Chemical compound C12C3C4C1C1C4C3C12 TXWRERCHRDBNLG-UHFFFAOYSA-N 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- CFBGXYDUODCMNS-UHFFFAOYSA-N cyclobutene Chemical compound C1CC=C1 CFBGXYDUODCMNS-UHFFFAOYSA-N 0.000 description 1
- LMGZGXSXHCMSAA-UHFFFAOYSA-N cyclodecane Chemical compound C1CCCCCCCCC1 LMGZGXSXHCMSAA-UHFFFAOYSA-N 0.000 description 1
- DDTBPAQBQHZRDW-UHFFFAOYSA-N cyclododecane Chemical compound C1CCCCCCCCCCC1 DDTBPAQBQHZRDW-UHFFFAOYSA-N 0.000 description 1
- ZXIJMRYMVAMXQP-UHFFFAOYSA-N cycloheptene Chemical compound C1CCC=CCC1 ZXIJMRYMVAMXQP-UHFFFAOYSA-N 0.000 description 1
- QYQADNCHXSEGJT-UHFFFAOYSA-N cyclohexane-1,1-dicarboxylate;hydron Chemical compound OC(=O)C1(C(O)=O)CCCCC1 QYQADNCHXSEGJT-UHFFFAOYSA-N 0.000 description 1
- UKJLNMAFNRKWGR-UHFFFAOYSA-N cyclohexatrienamine Chemical group NC1=CC=C=C[CH]1 UKJLNMAFNRKWGR-UHFFFAOYSA-N 0.000 description 1
- GPTJTTCOVDDHER-UHFFFAOYSA-N cyclononane Chemical compound C1CCCCCCCC1 GPTJTTCOVDDHER-UHFFFAOYSA-N 0.000 description 1
- 239000004914 cyclooctane Substances 0.000 description 1
- URYYVOIYTNXXBN-UPHRSURJSA-N cyclooctene Chemical compound C1CCC\C=C/CC1 URYYVOIYTNXXBN-UPHRSURJSA-N 0.000 description 1
- 239000004913 cyclooctene Substances 0.000 description 1
- WOSVXXBNNCUXMT-UHFFFAOYSA-N cyclopentane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1CC(C(O)=O)C(C(O)=O)C1C(O)=O WOSVXXBNNCUXMT-UHFFFAOYSA-N 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- OOXWYYGXTJLWHA-UHFFFAOYSA-N cyclopropene Chemical compound C1C=C1 OOXWYYGXTJLWHA-UHFFFAOYSA-N 0.000 description 1
- VFSFCYAQBIPUSL-UHFFFAOYSA-N cyclopropylbenzene Chemical compound C1CC1C1=CC=CC=C1 VFSFCYAQBIPUSL-UHFFFAOYSA-N 0.000 description 1
- KYTNZWVKKKJXFS-UHFFFAOYSA-N cycloundecane Chemical compound C1CCCCCCCCCC1 KYTNZWVKKKJXFS-UHFFFAOYSA-N 0.000 description 1
- FOTKYAAJKYLFFN-UHFFFAOYSA-N decane-1,10-diol Chemical compound OCCCCCCCCCCO FOTKYAAJKYLFFN-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- DZQISOJKASMITI-UHFFFAOYSA-N decyl-dioxido-oxo-$l^{5}-phosphane;hydron Chemical compound CCCCCCCCCCP(O)(O)=O DZQISOJKASMITI-UHFFFAOYSA-N 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 229920000359 diblock copolymer Polymers 0.000 description 1
- 229960005215 dichloroacetic acid Drugs 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- 229940043237 diethanolamine Drugs 0.000 description 1
- UCQFCFPECQILOL-UHFFFAOYSA-N diethyl hydrogen phosphate Chemical compound CCOP(O)(=O)OCC UCQFCFPECQILOL-UHFFFAOYSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 1
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- HBGGXOJOCNVPFY-UHFFFAOYSA-N diisononyl phthalate Chemical compound CC(C)CCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCC(C)C HBGGXOJOCNVPFY-UHFFFAOYSA-N 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
- PWWSSIYVTQUJQQ-UHFFFAOYSA-N distearyl thiodipropionate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCCCCCCCCCCCC PWWSSIYVTQUJQQ-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 235000020669 docosahexaenoic acid Nutrition 0.000 description 1
- 229940090949 docosahexaenoic acid Drugs 0.000 description 1
- QFTYSVGGYOXFRQ-UHFFFAOYSA-N dodecane-1,12-diamine Chemical compound NCCCCCCCCCCCCN QFTYSVGGYOXFRQ-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- KWKXNDCHNDYVRT-UHFFFAOYSA-N dodecylbenzene Chemical compound CCCCCCCCCCCCC1=CC=CC=C1 KWKXNDCHNDYVRT-UHFFFAOYSA-N 0.000 description 1
- SVMUEEINWGBIPD-UHFFFAOYSA-N dodecylphosphonic acid Chemical compound CCCCCCCCCCCCP(O)(O)=O SVMUEEINWGBIPD-UHFFFAOYSA-N 0.000 description 1
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 1
- 235000020673 eicosapentaenoic acid Nutrition 0.000 description 1
- 229960005135 eicosapentaenoic acid Drugs 0.000 description 1
- JAZBEHYOTPTENJ-UHFFFAOYSA-N eicosapentaenoic acid Natural products CCC=CCC=CCC=CCC=CCC=CCCCC(O)=O JAZBEHYOTPTENJ-UHFFFAOYSA-N 0.000 description 1
- 230000005489 elastic deformation Effects 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- JBKVHLHDHHXQEQ-UHFFFAOYSA-N epsilon-caprolactam Chemical compound O=C1CCCCCN1 JBKVHLHDHHXQEQ-UHFFFAOYSA-N 0.000 description 1
- BFZXXCSKNHQBEF-UHFFFAOYSA-N ethane-1,2-diamine;propane-1,3-diamine Chemical compound NCCN.NCCCN BFZXXCSKNHQBEF-UHFFFAOYSA-N 0.000 description 1
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 1
- HQQADJVZYDDRJT-UHFFFAOYSA-N ethene;prop-1-ene Chemical group C=C.CC=C HQQADJVZYDDRJT-UHFFFAOYSA-N 0.000 description 1
- BEFDCLMNVWHSGT-UHFFFAOYSA-N ethenylcyclopentane Chemical compound C=CC1CCCC1 BEFDCLMNVWHSGT-UHFFFAOYSA-N 0.000 description 1
- WNIHNYUROPJCLW-UHFFFAOYSA-N ethyl 2-ethoxy-2-methylpropanoate Chemical compound CCOC(=O)C(C)(C)OCC WNIHNYUROPJCLW-UHFFFAOYSA-N 0.000 description 1
- CKSRFHWWBKRUKA-UHFFFAOYSA-N ethyl 2-ethoxyacetate Chemical compound CCOCC(=O)OCC CKSRFHWWBKRUKA-UHFFFAOYSA-N 0.000 description 1
- LLIPXRJBGFGYJA-UHFFFAOYSA-N ethyl 2-hydroxypropanoate;1-methoxy-2-(2-methoxyethoxy)ethane Chemical compound CCOC(=O)C(C)O.COCCOCCOC LLIPXRJBGFGYJA-UHFFFAOYSA-N 0.000 description 1
- JLEKJZUYWFJPMB-UHFFFAOYSA-N ethyl 2-methoxyacetate Chemical compound CCOC(=O)COC JLEKJZUYWFJPMB-UHFFFAOYSA-N 0.000 description 1
- WHRLOJCOIKOQGL-UHFFFAOYSA-N ethyl 2-methoxypropanoate Chemical compound CCOC(=O)C(C)OC WHRLOJCOIKOQGL-UHFFFAOYSA-N 0.000 description 1
- IJUHLFUALMUWOM-UHFFFAOYSA-N ethyl 3-methoxypropanoate Chemical compound CCOC(=O)CCOC IJUHLFUALMUWOM-UHFFFAOYSA-N 0.000 description 1
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 1
- ZJXZSIYSNXKHEA-UHFFFAOYSA-N ethyl dihydrogen phosphate Chemical compound CCOP(O)(O)=O ZJXZSIYSNXKHEA-UHFFFAOYSA-N 0.000 description 1
- 229940117360 ethyl pyruvate Drugs 0.000 description 1
- GBASTSRAHRGUAB-UHFFFAOYSA-N ethylenetetracarboxylic dianhydride Chemical compound O=C1OC(=O)C2=C1C(=O)OC2=O GBASTSRAHRGUAB-UHFFFAOYSA-N 0.000 description 1
- GATNOFPXSDHULC-UHFFFAOYSA-N ethylphosphonic acid Chemical compound CCP(O)(O)=O GATNOFPXSDHULC-UHFFFAOYSA-N 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 229930006735 fenchone Natural products 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 125000002192 heptalenyl group Chemical group 0.000 description 1
- PWSKHLMYTZNYKO-UHFFFAOYSA-N heptane-1,7-diamine Chemical compound NCCCCCCCN PWSKHLMYTZNYKO-UHFFFAOYSA-N 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- GJWAEWLHSDGBGG-UHFFFAOYSA-N hexylphosphonic acid Chemical compound CCCCCCP(O)(O)=O GJWAEWLHSDGBGG-UHFFFAOYSA-N 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 150000001261 hydroxy acids Chemical class 0.000 description 1
- 238000006358 imidation reaction Methods 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 125000003427 indacenyl group Chemical group 0.000 description 1
- 125000003454 indenyl group Chemical group C1(C=CC2=CC=CC=C12)* 0.000 description 1
- 125000003406 indolizinyl group Chemical group C=1(C=CN2C=CC=CC12)* 0.000 description 1
- 125000001041 indolyl group Chemical group 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- 229940117955 isoamyl acetate Drugs 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- KXUHSQYYJYAXGZ-UHFFFAOYSA-N isobutylbenzene Chemical compound CC(C)CC1=CC=CC=C1 KXUHSQYYJYAXGZ-UHFFFAOYSA-N 0.000 description 1
- BHIWKHZACMWKOJ-UHFFFAOYSA-N isobutyric acid methyl ester Natural products COC(=O)C(C)C BHIWKHZACMWKOJ-UHFFFAOYSA-N 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000002183 isoquinolinyl group Chemical group C1(=NC=CC2=CC=CC=C12)* 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 229960004488 linolenic acid Drugs 0.000 description 1
- KQQKGWQCNNTQJW-UHFFFAOYSA-N linolenic acid Natural products CC=CCCC=CCC=CCCCCCCCC(O)=O KQQKGWQCNNTQJW-UHFFFAOYSA-N 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- MBKDYNNUVRNNRF-UHFFFAOYSA-N medronic acid Chemical compound OP(O)(=O)CP(O)(O)=O MBKDYNNUVRNNRF-UHFFFAOYSA-N 0.000 description 1
- 229940041616 menthol Drugs 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000005649 metathesis reaction Methods 0.000 description 1
- 125000005641 methacryl group Chemical group 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- PPFNAOBWGRMDLL-UHFFFAOYSA-N methyl 2-ethoxyacetate Chemical compound CCOCC(=O)OC PPFNAOBWGRMDLL-UHFFFAOYSA-N 0.000 description 1
- YVWPDYFVVMNWDT-UHFFFAOYSA-N methyl 2-ethoxypropanoate Chemical compound CCOC(C)C(=O)OC YVWPDYFVVMNWDT-UHFFFAOYSA-N 0.000 description 1
- XPIWVCAMONZQCP-UHFFFAOYSA-N methyl 2-oxobutanoate Chemical compound CCC(=O)C(=O)OC XPIWVCAMONZQCP-UHFFFAOYSA-N 0.000 description 1
- 229940095102 methyl benzoate Drugs 0.000 description 1
- CAAULPUQFIIOTL-UHFFFAOYSA-N methyl dihydrogen phosphate Chemical compound COP(O)(O)=O CAAULPUQFIIOTL-UHFFFAOYSA-N 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- CWKLZLBVOJRSOM-UHFFFAOYSA-N methyl pyruvate Chemical compound COC(=O)C(C)=O CWKLZLBVOJRSOM-UHFFFAOYSA-N 0.000 description 1
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 1
- WRDZMZGYHVUYRU-UHFFFAOYSA-N n-[(4-methoxyphenyl)methyl]aniline Chemical compound C1=CC(OC)=CC=C1CNC1=CC=CC=C1 WRDZMZGYHVUYRU-UHFFFAOYSA-N 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- KADGVXXDDWDKBX-UHFFFAOYSA-N naphthalene-1,2,4,5-tetracarboxylic acid Chemical compound OC(=O)C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC(C(O)=O)=C21 KADGVXXDDWDKBX-UHFFFAOYSA-N 0.000 description 1
- OBKARQMATMRWQZ-UHFFFAOYSA-N naphthalene-1,2,5,6-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 OBKARQMATMRWQZ-UHFFFAOYSA-N 0.000 description 1
- KYTZHLUVELPASH-UHFFFAOYSA-N naphthalene-1,2-dicarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 KYTZHLUVELPASH-UHFFFAOYSA-N 0.000 description 1
- DOBFTMLCEYUAQC-UHFFFAOYSA-N naphthalene-2,3,6,7-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C=C2C=C(C(O)=O)C(C(=O)O)=CC2=C1 DOBFTMLCEYUAQC-UHFFFAOYSA-N 0.000 description 1
- KVBGVZZKJNLNJU-UHFFFAOYSA-N naphthalene-2-sulfonic acid Chemical compound C1=CC=CC2=CC(S(=O)(=O)O)=CC=C21 KVBGVZZKJNLNJU-UHFFFAOYSA-N 0.000 description 1
- YTVNOVQHSGMMOV-UHFFFAOYSA-N naphthalenetetracarboxylic dianhydride Chemical compound C1=CC(C(=O)OC2=O)=C3C2=CC=C2C(=O)OC(=O)C1=C32 YTVNOVQHSGMMOV-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- SXJVFQLYZSNZBT-UHFFFAOYSA-N nonane-1,9-diamine Chemical compound NCCCCCCCCCN SXJVFQLYZSNZBT-UHFFFAOYSA-N 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- LIXVMPBOGDCSRM-UHFFFAOYSA-N nonylbenzene Chemical compound CCCCCCCCCC1=CC=CC=C1 LIXVMPBOGDCSRM-UHFFFAOYSA-N 0.000 description 1
- SJYNFBVQFBRSIB-UHFFFAOYSA-N norbornadiene Chemical compound C1=CC2C=CC1C2 SJYNFBVQFBRSIB-UHFFFAOYSA-N 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 229960002446 octanoic acid Drugs 0.000 description 1
- CDKDZKXSXLNROY-UHFFFAOYSA-N octylbenzene Chemical compound CCCCCCCCC1=CC=CC=C1 CDKDZKXSXLNROY-UHFFFAOYSA-N 0.000 description 1
- NJGCRMAPOWGWMW-UHFFFAOYSA-N octylphosphonic acid Chemical compound CCCCCCCCP(O)(O)=O NJGCRMAPOWGWMW-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 229960002969 oleic acid Drugs 0.000 description 1
- 235000021313 oleic acid Nutrition 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- KHPXUQMNIQBQEV-UHFFFAOYSA-N oxaloacetic acid Chemical compound OC(=O)CC(=O)C(O)=O KHPXUQMNIQBQEV-UHFFFAOYSA-N 0.000 description 1
- 125000002971 oxazolyl group Chemical group 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 125000005582 pentacene group Chemical group 0.000 description 1
- GUVXZFRDPCKWEM-UHFFFAOYSA-N pentalene group Chemical group C1=CC=C2C=CC=C12 GUVXZFRDPCKWEM-UHFFFAOYSA-N 0.000 description 1
- BEZDDPMMPIDMGJ-UHFFFAOYSA-N pentamethylbenzene Chemical compound CC1=CC(C)=C(C)C(C)=C1C BEZDDPMMPIDMGJ-UHFFFAOYSA-N 0.000 description 1
- 125000004817 pentamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- HPUOAJPGWQQRNT-UHFFFAOYSA-N pentoxybenzene Chemical compound CCCCCOC1=CC=CC=C1 HPUOAJPGWQQRNT-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- CKVICYBZYGZLLP-UHFFFAOYSA-N pentylphosphonic acid Chemical compound CCCCCP(O)(O)=O CKVICYBZYGZLLP-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- JGTNAGYHADQMCM-UHFFFAOYSA-N perfluorobutanesulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F JGTNAGYHADQMCM-UHFFFAOYSA-N 0.000 description 1
- 239000013500 performance material Substances 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical group C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 1
- JGGWKXMPICYBKC-UHFFFAOYSA-N phenanthrene-1,8,9,10-tetracarboxylic acid Chemical compound C1=CC=C(C(O)=O)C2=C(C(O)=O)C(C(O)=O)=C3C(C(=O)O)=CC=CC3=C21 JGGWKXMPICYBKC-UHFFFAOYSA-N 0.000 description 1
- RDOWQLZANAYVLL-UHFFFAOYSA-N phenanthridine Chemical group C1=CC=C2C3=CC=CC=C3C=NC2=C1 RDOWQLZANAYVLL-UHFFFAOYSA-N 0.000 description 1
- 125000001791 phenazinyl group Chemical group C1(=CC=CC2=NC3=CC=CC=C3N=C12)* 0.000 description 1
- DLRJIFUOBPOJNS-UHFFFAOYSA-N phenetole Chemical compound CCOC1=CC=CC=C1 DLRJIFUOBPOJNS-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- 125000001484 phenothiazinyl group Chemical group C1(=CC=CC=2SC3=CC=CC=C3NC12)* 0.000 description 1
- GJSGGHOYGKMUPT-UHFFFAOYSA-N phenoxathiine Chemical group C1=CC=C2OC3=CC=CC=C3SC2=C1 GJSGGHOYGKMUPT-UHFFFAOYSA-N 0.000 description 1
- 229940049953 phenylacetate Drugs 0.000 description 1
- WLJVXDMOQOGPHL-UHFFFAOYSA-N phenylacetic acid Chemical compound OC(=O)CC1=CC=CC=C1 WLJVXDMOQOGPHL-UHFFFAOYSA-N 0.000 description 1
- MLCHBQKMVKNBOV-UHFFFAOYSA-N phenylphosphinic acid Chemical compound OP(=O)C1=CC=CC=C1 MLCHBQKMVKNBOV-UHFFFAOYSA-N 0.000 description 1
- LFSXCDWNBUNEEM-UHFFFAOYSA-N phthalazine Chemical group C1=NN=CC2=CC=CC=C21 LFSXCDWNBUNEEM-UHFFFAOYSA-N 0.000 description 1
- CLYVDMAATCIVBF-UHFFFAOYSA-N pigment red 224 Chemical compound C=12C3=CC=C(C(OC4=O)=O)C2=C4C=CC=1C1=CC=C2C(=O)OC(=O)C4=CC=C3C1=C42 CLYVDMAATCIVBF-UHFFFAOYSA-N 0.000 description 1
- VPSRGTGHZKLTBU-UHFFFAOYSA-N piperitol Natural products COc1ccc(cc1OCC=C(C)C)C2OCC3C2COC3c4ccc5OCOc5c4 VPSRGTGHZKLTBU-UHFFFAOYSA-N 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920005559 polyacrylic rubber Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920002480 polybenzimidazole Polymers 0.000 description 1
- 229920002577 polybenzoxazole Polymers 0.000 description 1
- 229920001610 polycaprolactone Polymers 0.000 description 1
- 239000004632 polycaprolactone Substances 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920006149 polyester-amide block copolymer Polymers 0.000 description 1
- 229920006146 polyetheresteramide block copolymer Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920002742 polystyrene-block-poly(ethylene/propylene) -block-polystyrene Polymers 0.000 description 1
- 229920005996 polystyrene-poly(ethylene-butylene)-polystyrene Polymers 0.000 description 1
- 229920002743 polystyrene-poly(ethylene-ethylene/propylene) block-polystyrene Polymers 0.000 description 1
- 229920000166 polytrimethylene carbonate Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- AMCBXFAKLFFSQZ-UHFFFAOYSA-N propan-2-yl 2-methoxypropanoate Chemical compound COC(C)C(=O)OC(C)C AMCBXFAKLFFSQZ-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- ILPVOWZUBFRIAX-UHFFFAOYSA-N propyl 2-oxopropanoate Chemical compound CCCOC(=O)C(C)=O ILPVOWZUBFRIAX-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229940095050 propylene Drugs 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- NSETWVJZUWGCKE-UHFFFAOYSA-N propylphosphonic acid Chemical compound CCCP(O)(O)=O NSETWVJZUWGCKE-UHFFFAOYSA-N 0.000 description 1
- RTHVZRHBNXZKKB-UHFFFAOYSA-N pyrazine-2,3,5,6-tetracarboxylic acid Chemical compound OC(=O)C1=NC(C(O)=O)=C(C(O)=O)N=C1C(O)=O RTHVZRHBNXZKKB-UHFFFAOYSA-N 0.000 description 1
- IPEHBUMCGVEMRF-UHFFFAOYSA-N pyrazinecarboxamide Chemical compound NC(=O)C1=CN=CC=N1 IPEHBUMCGVEMRF-UHFFFAOYSA-N 0.000 description 1
- 125000003373 pyrazinyl group Chemical group 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 125000000714 pyrimidinyl group Chemical group 0.000 description 1
- YKWDNEXDHDSTCU-UHFFFAOYSA-N pyrrolidine-2,3,4,5-tetracarboxylic acid Chemical compound OC(=O)C1NC(C(O)=O)C(C(O)=O)C1C(O)=O YKWDNEXDHDSTCU-UHFFFAOYSA-N 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- 229940107700 pyruvic acid Drugs 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 125000001567 quinoxalinyl group Chemical group N1=C(C=NC2=CC=CC=C12)* 0.000 description 1
- SBYHFKPVCBCYGV-UHFFFAOYSA-N quinuclidine Chemical compound C1CC2CCN1CC2 SBYHFKPVCBCYGV-UHFFFAOYSA-N 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 230000011514 reflex Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 1
- 229960001755 resorcinol Drugs 0.000 description 1
- 238000007151 ring opening polymerisation reaction Methods 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 229930006696 sabinene Natural products 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 229940016590 sarkosyl Drugs 0.000 description 1
- 108700004121 sarkosyl Proteins 0.000 description 1
- 235000003441 saturated fatty acids Nutrition 0.000 description 1
- 150000004671 saturated fatty acids Chemical class 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- DZCAZXAJPZCSCU-UHFFFAOYSA-K sodium nitrilotriacetate Chemical compound [Na+].[Na+].[Na+].[O-]C(=O)CN(CC([O-])=O)CC([O-])=O DZCAZXAJPZCSCU-UHFFFAOYSA-K 0.000 description 1
- 229940048086 sodium pyrophosphate Drugs 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 235000019832 sodium triphosphate Nutrition 0.000 description 1
- 239000007779 soft material Substances 0.000 description 1
- 239000004334 sorbic acid Substances 0.000 description 1
- 235000010199 sorbic acid Nutrition 0.000 description 1
- 229940075582 sorbic acid Drugs 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 229940063673 spermidine Drugs 0.000 description 1
- 229940063675 spermine Drugs 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229920006132 styrene block copolymer Polymers 0.000 description 1
- 229920001935 styrene-ethylene-butadiene-styrene Polymers 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 229940116411 terpineol Drugs 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001935 tetracenyl group Chemical group C1(=CC=CC2=CC3=CC4=CC=CC=C4C=C3C=C12)* 0.000 description 1
- TUNFSRHWOTWDNC-HKGQFRNVSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCC[14C](O)=O TUNFSRHWOTWDNC-HKGQFRNVSA-N 0.000 description 1
- LVEOKSIILWWVEO-UHFFFAOYSA-N tetradecyl 3-(3-oxo-3-tetradecoxypropyl)sulfanylpropanoate Chemical compound CCCCCCCCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCCCCCCCC LVEOKSIILWWVEO-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- RYCLIXPGLDDLTM-UHFFFAOYSA-J tetrapotassium;phosphonato phosphate Chemical compound [K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])([O-])=O RYCLIXPGLDDLTM-UHFFFAOYSA-J 0.000 description 1
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 description 1
- GVIJJXMXTUZIOD-UHFFFAOYSA-N thianthrene Chemical compound C1=CC=C2SC3=CC=CC=C3SC2=C1 GVIJJXMXTUZIOD-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229960000790 thymol Drugs 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- GTZCVFVGUGFEME-UHFFFAOYSA-N trans-aconitic acid Natural products OC(=O)CC(C(O)=O)=CC(O)=O GTZCVFVGUGFEME-UHFFFAOYSA-N 0.000 description 1
- HPOHAUWWDDPHRS-UHFFFAOYSA-N trans-piperitol Natural products CC(C)C1CCC(C)=CC1O HPOHAUWWDDPHRS-UHFFFAOYSA-N 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- 150000003628 tricarboxylic acids Chemical class 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- 229960004319 trichloroacetic acid Drugs 0.000 description 1
- NYIKUOULKCEZDO-UHFFFAOYSA-N triethoxy(3,3,4,4,5,5,6,6,6-nonafluorohexyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)F NYIKUOULKCEZDO-UHFFFAOYSA-N 0.000 description 1
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- 125000005591 trimellitate group Chemical group 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 125000005580 triphenylene group Chemical group 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- KLNPWTHGTVSSEU-UHFFFAOYSA-N undecane-1,11-diamine Chemical compound NCCCCCCCCCCCN KLNPWTHGTVSSEU-UHFFFAOYSA-N 0.000 description 1
- 150000004670 unsaturated fatty acids Chemical class 0.000 description 1
- 235000021122 unsaturated fatty acids Nutrition 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 238000009489 vacuum treatment Methods 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- ABDKAPXRBAPSQN-UHFFFAOYSA-N veratrole Chemical compound COC1=CC=CC=C1OC ABDKAPXRBAPSQN-UHFFFAOYSA-N 0.000 description 1
- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- ZTWTYVWXUKTLCP-UHFFFAOYSA-N vinylphosphonic acid Chemical compound OP(O)(=O)C=C ZTWTYVWXUKTLCP-UHFFFAOYSA-N 0.000 description 1
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 description 1
- 125000001834 xanthenyl group Chemical group C1=CC=CC=2OC3=CC=CC=C3C(C12)* 0.000 description 1
- BURBOJZOZGMMQF-UHFFFAOYSA-N xanthoxylol Natural products C1=C(O)C(OC)=CC=C1C1C(COC2C=3C=C4OCOC4=CC=3)C2CO1 BURBOJZOZGMMQF-UHFFFAOYSA-N 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Images
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-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D9/00—Chemical paint or ink removers
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J125/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Adhesives based on derivatives of such polymers
- C09J125/02—Homopolymers or copolymers of hydrocarbons
- C09J125/04—Homopolymers or copolymers of styrene
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J125/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Adhesives based on derivatives of such polymers
- C09J125/02—Homopolymers or copolymers of hydrocarbons
- C09J125/04—Homopolymers or copolymers of styrene
- C09J125/06—Polystyrene
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J183/00—Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Adhesives based on derivatives of such polymers
- C09J183/04—Polysiloxanes
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J183/00—Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Adhesives based on derivatives of such polymers
- C09J183/10—Block or graft copolymers containing polysiloxane sequences
- C09J183/12—Block or graft copolymers containing polysiloxane sequences containing polyether sequences
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J5/00—Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/02—Inorganic compounds
- C11D7/04—Water-soluble compounds
- C11D7/08—Acids
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/34—Organic compounds containing sulfur
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
-
- C11D2111/22—
Definitions
- the present invention relates to a kit of a temporary adhesive containing a silicone compound and a cleaning composition for removing the temporary adhesive, a cleaning composition, and a method for manufacturing a semiconductor element.
- Patent Document 1 discloses a peeling composition for peeling an adhesive containing a hydrogenated styrene-based elastomer, including a cyclic terpene solvent, a nonionic surfactant, and a silicon surfactant.
- a stripping composition comprising at least one is disclosed.
- the stripping composition described in Patent Document 1 When the stripping composition described in Patent Document 1 was examined, the stripping composition was effective in stripping the adhesive containing the hydrogenated styrene elastomer, but the residue derived from the release agent was sufficient. It turns out that it cannot be removed. Furthermore, when this inventor examined, it turned out that the residue derived from a silicone compound tends to remain especially.
- the present invention solves such a problem, and can appropriately remove a residue derived from a temporary adhesive containing a silicone compound, a kit including a temporary adhesive and a cleaning composition, a cleaning composition, and a semiconductor element It is an object to provide a manufacturing method.
- the above-mentioned problems are solved by removing the temporary adhesive containing a silicone compound with a cleaning composition containing an acid or base and an organic solvent. I found that I could do it. Specifically, the above problem has been solved by ⁇ 1>, preferably by ⁇ 2> to ⁇ 30>.
- Formula (b) ClogP ⁇ pKb In the formulas (a) and (b), ClogP is a 1-octanol / water partition coefficient P representing the ratio of equilibrium concentrations in 1-octanol and in water, expressed as a logarithmic logP form with respect to the base 10.
- PKa represents an acid dissociation constant
- pKb represents a base dissociation constant.
- the silicone compound is silicone oil.
- the silicone compound includes a polyether-modified silicone.
- the polyether-modified silicone has a ratio represented by the formula (A) of 80% or more; Formula (A) ⁇ (MO + EO) / AO ⁇ ⁇ 100
- MO is the mol% of methylene oxide contained in the polyether structure in the polyether-modified silicone
- EO is the mol% of ethylene oxide contained in the polyether structure in the polyether-modified silicone.
- AO refers to the mole percent of alkylene oxide contained in the polyether structure in the polyether-modified silicone.
- ⁇ 5> The kit according to any one of ⁇ 1> to ⁇ 4>, wherein the content of the silicone compound in the temporary adhesive is 0.001 to 1.0% by mass.
- the temporary adhesive includes an elastomer.
- ⁇ 7> The kit according to ⁇ 6>, wherein the elastomer is a polystyrene-based elastomer.
- ⁇ 8> The kit according to ⁇ 6> or ⁇ 7>, wherein the solubility of the elastomer in the organic solvent at 25 ° C.
- the cleaning composition includes a base, and the base is at least one selected from aliphatic amines, aromatic amines, and heterocyclic amines, and any one of ⁇ 1> to ⁇ 9>
- a detergent composition for temporary adhesives comprising a silicone compound which is Formula (a) ClogP ⁇ pKa Formula (b) ClogP ⁇ pKb
- ClogP is a 1-octanol / water partition coefficient P representing the ratio of equilibrium concentrations in 1-octanol and in water, expressed as a logarithmic logP form with respect to the base 10.
- PKa represents an acid dissociation constant
- pKb represents a base dissociation constant.
- the cleaning composition according to any one of ⁇ 13> to ⁇ 16>, wherein the mass ratio of the acid or base to the organic solvent is 0.0001: 99.9999 to 50:50.
- the silicone compound includes a polyether-modified silicone, and the polyether-modified silicone has a ratio represented by the formula (A) of 80% or more, and the content of the silicone compound in the temporary adhesive is 0.
- MO is the mol% of methylene oxide contained in the polyether structure in the polyether-modified silicone
- EO is the mol% of ethylene oxide contained in the polyether structure in the polyether-modified silicone
- AO refers to the mole percent of alkylene oxide contained in the polyether structure in the polyether-modified silicone.
- a temporary adhesive containing a silicone compound containing an acid or base and an organic solvent, wherein the value represented by the formula (a) of the acid is 0 to 10, and the formula (b) of the base A method for producing a semiconductor device comprising removing using a cleaning composition having a value represented by ⁇ 5 to 0; Formula (a) ClogP ⁇ pKa Formula (b) ClogP ⁇ pKb In the formulas (a) and (b), ClogP is a 1-octanol / water partition coefficient P representing the ratio of equilibrium concentrations in 1-octanol and in water, expressed as a logarithmic logP form with respect to the base 10.
- PKa represents an acid dissociation constant
- pKb represents a base dissociation constant
- ⁇ 23> The method for producing a semiconductor element according to any one of ⁇ 19> to ⁇ 22>, wherein the content of the silicone compound in the temporary adhesive is 0.001 to 1.0% by mass.
- ⁇ 24> The method for producing a semiconductor element according to any one of ⁇ 19> to ⁇ 23>, wherein the temporary adhesive includes an elastomer.
- ⁇ 25> The method for producing a semiconductor element according to ⁇ 24>, wherein the elastomer is a polystyrene-based elastomer.
- ⁇ 26> The method for producing a semiconductor element according to ⁇ 24> or ⁇ 25>, wherein the elastomer has a solubility of 18 to 40% by mass in the organic solvent at 25 ° C.
- ⁇ 27> The organic solvent according to any one of ⁇ 19> to ⁇ 26>, wherein the organic solvent is at least one selected from an aromatic compound, a saturated alicyclic compound, a cyclic ketone, and a cyclic terpene.
- the manufacturing method of the semiconductor element as described in one.
- ⁇ 29> Any one of ⁇ 19> to ⁇ 27>, wherein the cleaning composition contains a base, and the base is at least one selected from an aliphatic amine, an aromatic amine, and a heterocyclic amine.
- the manufacturing method of the semiconductor element of description. ⁇ 30> The temporary adhesive is used for temporary adhesion between a carrier substrate and a substrate to be processed, and the temporary adhesive removed by the cleaning composition is temporarily adhered to the substrate to be processed after the carrier substrate is peeled off.
- a kit including a temporary adhesive and a cleaning composition, a cleaning composition, and a method for manufacturing a semiconductor element, which can appropriately remove a residue derived from a temporary adhesive including a silicone compound.
- substitution and non-substitution includes what does not have a substituent and what has a substituent.
- the “alkyl group” includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
- Actinic light or “radiation” in the present specification means, for example, those including visible light, ultraviolet rays, far ultraviolet rays, electron beams, X-rays and the like.
- exposure includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams.
- the light used for the exposure generally includes an active ray or radiation such as an emission line spectrum of a mercury lamp, far ultraviolet rays typified by an excimer laser, extreme ultraviolet rays (EUV light), X-rays or electron beams.
- the total solid content refers to the total mass of components excluding the solvent from the composition.
- (meth) acrylate represents acrylate and methacrylate
- (meth) acryl represents acryl and methacryl
- (meth) acryloyl represents “acryloyl” and “methacryloyl”.
- a weight average molecular weight and a number average molecular weight are defined as a polystyrene conversion value by gel permeation chromatography (GPC) measurement.
- the weight average molecular weight (Mw) and the number average molecular weight (Mn) are, for example, HLC-8220GPC (manufactured by Tosoh Corp.) and TSKgel Super AWM-H (manufactured by Tosoh Corp., inner diameter) as a column. (ID) 6.0 mm ⁇ 15.0 cm) and a 10 mmol / L lithium bromide NMP (N-methylpyrrolidone) solution as an eluent.
- HLC-8220GPC manufactured by Tosoh Corp.
- TSKgel Super AWM-H manufactured by Tosoh Corp., inner diameter
- the kit of the present invention comprises a cleaning composition containing an acid or base and an organic solvent, and a temporary adhesive containing a silicone compound, wherein the value represented by the formula (a) for the acid is 0-10.
- a kit represented by formula (b) of the above base is -5 to 0;
- Formula (b) ClogP ⁇ pKb In the formulas (a) and (b), ClogP is a 1-octanol / water partition coefficient P representing the ratio of equilibrium concentrations in 1-octanol and in water, expressed as a logarithmic logP form with respect to the base 10.
- PKa represents an acid dissociation constant
- pKb represents a base dissociation constant.
- the cleaning composition in the present invention is a cleaning composition for a temporary adhesive containing a silicone compound, and is characterized by containing an acid or base and an organic solvent.
- the temporary adhesive refers to an adhesive used to temporarily bond the substrate and the substrate.
- the substrate are a carrier substrate and a substrate to be processed (for example, a device wafer).
- the carrier substrate is intended to facilitate the processing of the substrate to be processed by temporarily bonding the substrate to be processed to the carrier substrate when the substrate to be processed is processed. Details of these will be described later.
- the residue derived from the temporary adhesive can usually be removed to some extent by an organic solvent if an appropriate organic solvent is selected.
- the temporary adhesive agent containing a silicone compound can be removed appropriately by using the detergent composition containing an acid or a base and an organic solvent.
- ⁇ acid When the cleaning composition contains an acid, the value of the acid represented by formula (a) is preferably 0 to 10, more preferably 0.5 to 10, and more preferably 1 to 10. Is more preferable, 1.5 to 9 is more preferable, and 2 to 8 is even more preferable. By setting it as such a range, the removability of the residue derived from a silicone compound improves.
- Formula (a) ClogP ⁇ pKa Here, ClogP is a 1-octanol / water partition coefficient P representing the ratio of equilibrium concentrations in 1-octanol and water, and is a value expressed in the form of logarithmic logP with respect to the base 10, and pKa is an acid dissociation constant. Show.
- the acid is preferably at least one selected from phosphoric acid, phosphonic acid, phosphinic acid, sulfonic acid, and carboxylic acid, and preferably at least one selected from sulfonic acid and carboxylic acid. More preferred.
- phosphoric acid include monoalkyl phosphoric acid or dialkyl phosphoric acid such as methyl phosphate, dimethyl phosphate, ethyl phosphate, diethyl phosphate, butyl phosphate, dibutyl phosphate, butoxyethyl phosphate and 2-ethylhexyl phosphate. Illustrated.
- Examples of the phosphonic acid include vinyl phosphonic acid, methylene diphosphonic acid, ethyl phosphonic acid, propyl phosphonic acid, 1,3-propylene diphosphonic acid, butyl phosphonic acid, 1,4-butylene diphosphonic acid, pentyl phosphonic acid, 1, Alkylphosphonic acids such as 5-pentylenediphosphonic acid, hexylphosphonic acid, 1,6-dihexylenephosphonic acid, octylphosphonic acid, decylphosphonic acid, dodecylphosphonic acid, phenylphosphonic acid, phenylenediphosphonic acid, xylylenediphosphonic acid Aromatic phosphones such as (4-hydroxyphenyl) phosphonic acid, (2-phenylethyl) phosphonic acid, o-xylene diphosphonic acid, benzhydrylphosphonic acid, cinnamyl phosphonic acid, (4-hydroxybenzyl) phosphonic acid Examples are acids
- phosphinic acid examples include phenylphosphinic acid, 1-anilino-1-methylethylphosphinic acid, 1- (2- (n-ethylanilino) -ethylamino) -isopropylphosphinic acid, and tritylphosphinic acid.
- the sulfonic acid examples include methanesulfonic acid, ethanesulfonic acid, trifluoromethanesulfonic acid, vinylsulfonic acid, 1,5-propanedisulfonic acid, 3-hydroxypropanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, p-ethylbenzene.
- Sulfonic acid n-dodecylbenzenesulfonic acid, 2,4,5-trimethylbenzenesulfonic acid, nonafluoro-1-butanesulfonic acid, 2-naphthalenesulfonic acid, 1,5-naphthalenedisulfonic acid, heptadecafluorooctasulfonic acid, 10-camphorsulfonic acid, 3-cyclohexylaminopropanesulfonic acid, m-xylene-4-sulfonic acid, p-xylene-2-sulfonic acid, dansylic acid, 4,4'-biphenyldisulfonic acid, 8-anilino-1- Naphthalenesulfonic acid, 2- Ruphorinoethanesulfonic acid, 3-morpholinopropanesulfonic acid, piperazine-1,4-bis (2-hydroxypropanesulfonic acid), 7-anilino-4-hydroxy-2-naphthalenesulfonic acid
- Carboxylic acids include saturated fatty acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, caproic acid, enanthic acid, caprylic acid, pelargonic acid, capric acid, lauric acid, myristic acid, palmitic acid, margaric acid, stearic acid, etc.
- Oleic acid Oleic acid, linoleic acid, linolenic acid, arachidonic acid, eicosapentaenoic acid, docosahexaenoic acid, sorbic acid and other unsaturated fatty acids, lactic acid, malic acid, citric acid and other hydroxy acids, benzoic acid, phthalic acid, isophthalic acid, terephthalic acid Aromatic carboxylic acids such as acid, salicylic acid, 3,4,5-trihydroxybenzoic acid, mellitic acid, cinnamic acid, oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, fumaric acid, maleic acid, etc.
- Tricarboxylic acids such as dicarboxylic acid and aconitic acid, pyruvic acid, oxaloacetic acid, etc.
- Oxo carboxylic acid, chloroacetic acid, dichloroacetic acid, trichloroacetic acid, halogen-containing carboxylic acids such as trifluoroacetic acid are exemplified.
- the lower limit of the acid content is preferably 0.000008% by mass or more, more preferably 0.000080% by mass or more, and further 0.000800% by mass or more of the cleaning composition.
- 0.008000 mass% or more is more preferable.
- the upper limit of the acid content in the cleaning composition of the present invention is preferably 1.0% by mass or less, more preferably 0.8% by mass or less, and further preferably 0.5% by mass or less of the cleaning composition.
- 0.3 mass% or less is more preferable.
- the detergent composition of the present invention contains an acid, it may contain only one type or two or more types. When 2 or more types are included, the total amount is preferably within the above range.
- the value represented by the formula (b) of the base is ⁇ 5 to 0, preferably ⁇ 4.5 to 0, and preferably ⁇ 4 to 0. More preferably, it is -3.5 to 0, more preferably -3 to 0, still more preferably -2.5 to -0.5, and -2 to -1. Even more preferably.
- Formula (b) ClogP ⁇ pKb ClogP is a 1-octanol / water partition coefficient P representing the ratio of equilibrium concentrations in 1-octanol and water, and is a value expressed in the form of logarithmic logP with respect to the base 10, and pKb is a base dissociation constant. Show.
- the base is preferably at least one selected from amines, more preferably at least one selected from aliphatic amines, aromatic amines and heterocyclic amines, aliphatic amines and More preferably, it is at least one selected from heterocyclic amines.
- aliphatic amines are methylamine, dimethylamine, trimethylamine, ethylamine, diethylamine, triethylamine, ethylenediamine, triethanolamine, N, N-diisopropylethylamine, tetramethylethylenediamine, hexamethylenediamine, spermidine, spermine, amantadine, and diethanolamine. Is done.
- aromatic amine examples include aniline, phenethylamine, toluidine, catecholamine, and 1,8-bis (dimethylamino) naphthalene.
- Heterocyclic amines include pyrrolidine, piperidine, piperazine, morpholine, quinuclidine, pyrrole, pyrazole, imidazole, pyridine, pyridazine, pyrimidine, pyrazine, oxazole, thiazole, 4-dimethylaminopyridine, 1,4-diazabicyclo [2,2 , 2] octane, 1,5-diazabicyclo [4,3,0] -5-nonene, 1,8-diazabicyclo [5,4,0] -7-undecene.
- the lower limit of the content of the base in the cleaning composition of the present invention is preferably 0.000008% by mass or more, more preferably 0.000080% by mass or more, and further 0.000800% by mass or more of the cleaning composition. Preferably, 0.008000 mass% or more is more preferable.
- the upper limit of the content of the base is preferably 1.0% by mass or less, more preferably 0.8% by mass or less, and further preferably 0.5% by mass or less of the cleaning composition. Preferably, 0.3 mass% or less is more preferable.
- the detergent composition of the present invention contains a base, it may contain only one type or two or more types. When 2 or more types are included, the total amount is preferably within the above range.
- the cleaning composition of the present invention contains an organic solvent.
- the organic solvent is a temporary adhesive, for example, an organic solvent that dissolves the resin component of the temporary adhesive, and is at least one selected from an aromatic compound, a saturated alicyclic compound, a cyclic ketone, and a cyclic terpene. Preferably, it is at least one selected from an aromatic compound, an alicyclic compound and a cyclic terpene, and more preferably at least one selected from an aromatic compound.
- Aromatic compounds include benzene, toluene, xylene, ethylbenzene, cumene, n-butylbenzene, s-butylbenzene, t-butylbenzene, styrene, mesitylene, 1,2,4-trimethylbenzene, p-cymene, cyclohexylbenzene , Diethylbenzene, pentylbenzene, dipentylbenzene, dodecylbenzene, ethynylbenzene, tetralin, anisole, phenetol, butylphenyl ether, pentylphenyl ether, veratrol, 1,3-dimethoxybenzene, 1,2,4-trimethoxybenzene, 3, 4,5-trimethoxytoluene, 2-methoxytoluene, 2,5-dimethylanisole, o-chlorophenol, chlorobenz
- Saturated alicyclic compounds include cyclopropane, cyclobutane, cyclopentane, cyclohexane, methylcyclohexane, cycloheptane, cyclooctane, cyclononane, cyclodecane, cycloundecane, cyclododecane, cyclobutene, cyclopropene, cyclohexene, cycloheptene, cyclooctene, bicyclo Examples include undecane, decahydronaphthalene, norbornene, norbornadiene, cubane, basket, and howsan.
- cyclic ketone examples include cyclohexanone, cyclopentanone, isophorone, acetophenone, and benzophenone.
- Cyclic terpenes include chrysanthemol, grangesol, junionone, thioterpineol, iridoid, sequoidoid, menthane, limonene, ferrandrene, terpinolene, terpinene, cymen, terpinolene, terpinene, menthol, pregol, piperitol, terpineol, carveol, Monocyclic terpenes such as thymol, dihydrocarbeveol, mentone, pregon, ferrandral, carvone, carbenone, piperiton, 1,8-cineole, 1,4-cineole, ascaridol, caran, tujang, pinan, bornin, fencan, Isobornane
- the content of the organic solvent in the cleaning composition of the present invention is preferably from 50.0000 to 99.9999% by mass of the cleaning composition, more preferably from 99.0000 to 99.99990% by mass.
- the cleaning composition of the present invention may contain only one type or two or more types. When 2 or more types are included, the total amount is preferably within the above range.
- the mass ratio of the acid or base to the organic solvent is preferably 0.0001: 99.9999 to 50:50, and is 0.0010: 99.99990 to 10:90. It is more preferable that the ratio is 0.0100: 99.9900 to 1.0000: 99.0000. By setting it as such a range, the removal property of temporary adhesive improves more effectively.
- the cleaning composition may contain components other than the acid or base and the organic solvent.
- Other ingredients include sodium tripolyphosphate, 4-sodium pyrophosphate, potassium pyrophosphate, sodium aluminum silicate, sodium nitrilotriacetate, ethylenediaminetetraacetic acid, sodium citrate, and other micellar enhancements such as sodium sulfate.
- inorganic alkali components such as sodium silicate and sodium carbonate, IRGAMET 30, IRGAMET 39, IRGAMET 42 (above, manufactured by BASF Japan Ltd.), Belclen 510, Belclen 511, Belclen 512, Belclen 515 (above, BWA Water Addi BT-120, BT-LX, CBT-1, TT-LX, TT-LYK, JCL-400 (above, manufactured by Johoku Chemical Co., Ltd.), VERZONE C ryzon # 120, VERZONE MA-10, VERZONE A3-T, VERZONE Crystal # 130, VERZONE Crystal # 150, VERZONE Crystal # 270, VERZONE Crystal # 260, VERZONE SGONE VERZONE SGON Origin Oil # 1030, VERZONE Origin Oil # 220, VERZONE OIL-HD, VERZONE OIL-U (above, manufactured by Daiwa Kasei Co., Ltd.), top
- the temporary adhesive used by this invention can also be made into the aspect which does not contain surfactant substantially. Furthermore, the temporary adhesive used by this invention can also be set as the aspect which does not contain components other than the said acid or base and an organic solvent substantially. “Substantially free” means that the content of other components is 3% by mass or less of the cleaning composition of the present invention, preferably 1% by mass or less, and preferably 0.5% by mass or less. It is more preferable that
- the cleaning composition of the present invention is preferably prepared by mixing the components of the cleaning composition and then performing filtration.
- a filter having a pore size of 0.003 to 10 ⁇ m By performing the filtration, the removability of the temporary adhesive tends to be further improved.
- the filter is preferably made of polytetrafluoroethylene.
- the temporary adhesive used in the present invention contains a silicone compound.
- the silicone compound acts as a release agent, and the temporary adhesive can be easily removed from the substrate to be processed.
- the silicone compound is a compound containing a Si—O bond, and examples thereof include silicone oil, silane coupling agent, silicone resin, silicone rubber, and cyclic siloxane, and silicone oil is preferable.
- a silicone compound does not contain reactive groups, such as a polymeric group.
- the silicone compound is preferably a polyether-modified silicone.
- the polyether-modified silicone used in the present invention has a ratio represented by the formula (A) of 80% or more.
- Formula (A) ⁇ (MO + EO) / AO ⁇ ⁇ 100
- MO is the mol% of methylene oxide contained in the polyether structure in the polyether-modified silicone
- EO is the mol% of ethylene oxide contained in the polyether structure in the polyether-modified silicone
- AO refers to the mole percent of alkylene oxide contained in the polyether structure in the polyether-modified silicone.
- the ratio represented by the above formula (A) is preferably 90% or more, more preferably 95% or more, further preferably 98% or more, and further preferably 99% or more. 100% is even more preferable.
- the weight average molecular weight of the polyether-modified silicone is preferably 500 to 100,000, more preferably 1,000 to 50,000, and still more preferably 2,000 to 40,000.
- the polyether-modified silicone is heated at a temperature increase rate of 20 ° C./min from 20 ° C. to 280 ° C. under a nitrogen stream of 60 mL / min for 30 minutes at a temperature of 280 ° C. It is preferable that the mass reduction rate when held is 50% by mass or less. By using such a compound, the surface properties after processing of the substrate with heating tend to be further improved.
- the mass reduction rate of the polyether-modified silicone is preferably 45% by mass or less, more preferably 40% by mass or less, further preferably 35% by mass or less, and further preferably 30% by mass or less.
- the lower limit of the mass reduction rate of the polyether-modified silicone may be 0% by mass, but 15% by mass or more, and even 20% by mass or more is sufficiently practical.
- the refractive index of light of the polyether-modified silicone is preferably 1.440 or less.
- the lower limit is not particularly defined, but even if it is 1.400 or more, it is sufficiently practical.
- the polyether-modified silicone used in the present invention is preferably a polyether-modified silicone represented by any of the following formulas (101) to (104).
- Formula (101) In the above formula (101), R 11 and R 16 are each independently a substituent, R 12 and R 14 are each independently a divalent linking group, and R 13 and R 15 are hydrogen An atom or an alkyl group having 1 to 5 carbon atoms, m11, m12, n1 and p1 are each independently a number from 0 to 20, and x1 and y1 are each independently a number from 2 to 100.
- R 21 , R 25 and R 26 are each independently a substituent
- R 22 is a divalent linking group
- R 23 is a hydrogen atom or a carbon number of 1 to 5 M2 and n2 are each independently a number from 0 to 20, and x2 is a number from 2 to 100.
- R 31 and R 36 are each independently a substituent
- R 32 and R 34 are each independently a divalent linking group
- R 33 and R 35 are hydrogen.
- m31, m32, n3 and p3 are each independently a number from 0 to 20, and x3 is a number from 2 to 100.
- R 41 , R 42 , R 43 , R 44 , R 45 and R 46 are each independently a substituent, R 47 is a divalent linking group, and R 48 is ,
- a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, m4 and n4 are each independently a number from 0 to 20, and x4 and y4 are each independently a number from 2 to 100.
- R 11 and R 16 are each independently a substituent, preferably an alkyl group having 1 to 5 carbon atoms or a phenyl group, and more preferably a methyl group.
- R 12 and R 14 are each independently a divalent linking group, and are a carbonyl group, an oxygen atom, an alkylene group having 1 to 6 carbon atoms, or a cycloalkylene group having 6 to 16 carbon atoms.
- An alkenylene group having 2 to 8 carbon atoms, an alkynylene group having 2 to 5 carbon atoms, and an arylene group having 6 to 10 carbon atoms are preferable, and an oxygen atom is more preferable.
- R 13 and R 15 are a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, preferably a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and a hydrogen atom or an alkyl group having 1 to 3 carbon atoms.
- An alkyl group is more preferred.
- R 21 , R 25 and R 26 are each independently a substituent, which has the same meaning as R 11 and R 16 in formula (101), and the preferred range is also the same.
- R 22 is a divalent linking group and has the same meaning as R 12 in formula (101), and the preferred range is also the same.
- R 23 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms and has the same meaning as R 13 and R 15 in the formula (101), and the preferred range is also the same.
- R 31 and R 36 are each independently a substituent, which has the same meaning as R 11 and R 16 in formula (101), and the preferred range is also the same.
- R 32 and R 34 are each independently a divalent linking group, have the same meaning as R 12 in formula (101), and the preferred range is also the same.
- R 33 and R 35 are a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and are synonymous with R 13 and R 15 in the formula (101), and their preferred ranges are also the same.
- R 41 , R 42 , R 43 , R 44 , R 45 and R 46 are each independently a substituent, and have the same meaning as R 11 and R 16 in the formula (101), The preferable range is also the same.
- R 47 is a divalent linking group, and has the same meaning as R 12 in the formula (101), and the preferred range is also the same.
- R 48 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms and has the same meaning as R 13 and R 15 in the formula (101), and the preferred range is also the same.
- formula (103) or formula (104) is preferable, and formula (104) is more preferable.
- the polyoxyalkylene group content in the molecule is not particularly limited, but it is desirable that the polyoxyalkylene group content exceeds 1% by mass in the total molecular weight.
- the content of the polyoxyalkylene group is defined by “ ⁇ (formula weight of polyoxyalkylene group in one molecule) / molecular weight of one molecule ⁇ ⁇ 100”.
- silane coupling agent examples include a fluorine atom-containing silane coupling agent, and triethoxy (1H, 1H, 2H, 2H-nonafluorohexyl) silane is preferable.
- examples of the silane coupling agent include JP-A No. 62-36663, JP-A No. 61-226746, JP-A No. 61-226745, JP-A No. 62-170950, JP-A No. 63-34540.
- surfactants described in JP-A-7-230165, JP-A-8-62834, JP-A-9-54432, JP-A-9-5988, and JP-A-2001-330953. are incorporated herein.
- a commercial item can also be used for the silicone compound used by this invention.
- the silicone compounds include trade names “BYK-300”, “BYK-306”, “BYK-310”, “BYK-315”, “BYK-313”, “BYK-320”, “BYK-322”. , “BYK-323”, “BYK-325”, “BYK-330”, “BYK-333”, “BYK-337”, “BYK-341”, “BYK-344”, “BYK-370”, “ “BYK-375”, “BYK-UV3500”, “BYK-UV3510”, “BYK-UV3570”, “BYK-3550”, “BYK-SILCLEAN3700”, “BYK-SILCLEAN3720” (above, manufactured by Big Chemie Japan Co., Ltd.) ), Trade names “AC FS 180”, “AC FS 360”, “AC S 20” (above, Algin Chemi) e), trade names “Polyflow KL-400X”, “Polyflow KL-400HF”, “Polyflow
- the content of the silicone compound in the temporary adhesive used in the present invention is preferably 0.001 to 1.0% by mass of the solid content of the temporary adhesive.
- the lower limit of the content of the silicone compound is more preferably 0.004% by mass or more, further preferably 0.006% by mass or more, further preferably 0.008% by mass or more, and further preferably 0.009% by mass or more.
- the upper limit of the content of the silicone compound is preferably 0.8% by mass or less, more preferably 0.6% by mass or less, still more preferably 0.3% by mass or less, and even more preferably 0.15% by mass or less. 0.09 mass% or less is still more preferable.
- the temporary adhesive used in the present invention may contain only one kind of silicone compound or may contain two or more kinds. When 2 or more types are included, the total amount is preferably within the above range.
- a release agent other than the silicone compound may be included.
- a fluorine-type liquid compound is illustrated.
- the content is preferably in the range of 0.001 to 0.005 mass%.
- These other mold release agents may contain only 1 type and may contain 2 or more types. When 2 or more types are included, the total amount is preferably within the above range.
- it can be set as the structure which does not contain another mold release agent substantially. “Substantially free” means 1% by mass or less of the content of the silicone compound.
- the temporary adhesive used in the present invention preferably contains at least one resin.
- the resin include a block copolymer, a random copolymer, and a graft copolymer, and a block copolymer is preferable. If it is a block copolymer, since the flow of the temporary adhesive agent at the time of a heating process can be suppressed, adhesion can be maintained even at the time of a heating process, and the effect that peelability does not change even after a heating process can be expected.
- the resin is preferably an elastomer.
- an elastomer As the resin, it is possible to follow a fine unevenness of a substrate (a substrate to be processed such as a carrier substrate or a device wafer) and to form a temporary adhesive having excellent adhesiveness by an appropriate anchor effect.
- a substrate a substrate to be processed such as a carrier substrate or a device wafer
- One or more types of elastomers can be used in combination.
- an elastomer represents the high molecular compound which shows elastic deformation. That is, when an external force is applied, the polymer compound is defined as a polymer compound that has the property of instantly deforming according to the external force and recovering the original shape in a short time when the external force is removed.
- the weight average molecular weight of the elastomer is preferably 2,000 to 200,000, more preferably 10,000 to 200,000, and even more preferably 50,000 to 100,000.
- An elastomer having a weight average molecular weight within this range is excellent in solubility in a solvent. Therefore, after peeling the carrier substrate from the substrate to be processed, the solvent is used to derive from the elastomer remaining on the substrate to be processed or the carrier substrate. When removing the residue, the residue is easily dissolved in the solvent and removed. For this reason, there exists an advantage that a residue does not remain in a to-be-processed substrate, a carrier substrate, etc.
- the elastomer is not particularly limited, and an elastomer (polystyrene elastomer) containing a repeating unit derived from styrene, a polyester elastomer, a polyolefin elastomer, a polyurethane elastomer, a polyamide elastomer, a polyacryl elastomer, a silicone elastomer Elastomers, polyimide elastomers, etc. can be used.
- an elastomer polystyrene elastomer containing a repeating unit derived from styrene, a polyester elastomer, a polyolefin elastomer, a polyurethane elastomer, a polyamide elastomer, a polyacryl elastomer, a silicone elastomer Elastomers, polyimide elastomers, etc.
- a polystyrene-based elastomer, a polyester-based elastomer, and a polyamide-based elastomer are preferable, and a polystyrene-based elastomer is more preferable from the viewpoint of heat resistance and peelability.
- the elastomer is preferably a hydrogenated product.
- a hydrogenated product of a polystyrene-based elastomer is preferable.
- thermal stability and storage stability are improved.
- the releasability and the removability of the temporary adhesive after peeling are improved.
- the hydrogenated product means a polymer having a structure in which an elastomer is hydrogenated.
- the elastomer preferably has a 5% thermal mass reduction temperature of 250 ° C. or higher when the temperature is increased from 25 ° C. at a rate of temperature increase of 20 ° C./min, more preferably 300 ° C. or higher. Preferably, it is 350 degreeC or more, More preferably, it is 400 degreeC or more.
- an upper limit does not have limitation in particular, For example, 1000 degrees C or less is preferable and 800 degrees C or less is more preferable. According to this aspect, a temporary adhesive having excellent heat resistance can be obtained.
- the elastomer in the present invention can be deformed to 200% with a small external force at room temperature (20 ° C.) when the original size is 100%, and 130% or less in a short time when the external force is removed. It is preferable to have the property of returning to.
- Polystyrene Elastomer >>>>>
- the proportion of the repeating unit derived from styrene in the polystyrene elastomer is preferably 90% by mass or less, more preferably 55% by mass or less, further preferably 48% by mass or less, still more preferably 35% by mass or less, and more preferably 33% by mass or less. Even more preferred.
- the lower limit of the ratio of the repeating unit derived from styrene may be 0% by mass, but may be 10% by mass or more. By setting it as such a range, the curvature of the laminated body which bonds substrates together with a temporary adhesive can be suppressed more effectively.
- an elastomer A containing a repeating unit derived from styrene in a proportion of 10% by mass or more and 55% by mass or less in all repeating units, and a repeating unit derived from styrene in all repeating units.
- an elastomer B contained in a proportion of more than 55% by mass and 95% by mass or less.
- the elastomer A is a relatively soft material, it is easy to form a layered temporary adhesive (temporary adhesive layer) having elasticity. For this reason, even when a laminated body of a substrate and a carrier substrate is manufactured using a temporary adhesive and the substrate is polished to form a thin film, the temporary adhesive (temporary bonding) Layer) is elastically deformed and easily returns to its original shape. As a result, excellent flat polishing properties can be obtained.
- the said elastomer B is a comparatively hard material, it can be set as the temporary adhesive excellent in peelability by including the elastomer B.
- the polystyrene elastomer is preferably a block copolymer of styrene and another monomer, more preferably a styrene block copolymer having one end or both ends being styrene blocks, and both ends being styrene blocks. It is particularly preferred.
- both ends of the polystyrene-based elastomer are styrene blocks (repeating units derived from styrene), the heat resistance tends to be further improved. This is because a repeating unit derived from styrene having high heat resistance is present at the terminal.
- the block part of the repeating unit derived from styrene is preferably a reactive polystyrene hard block, which tends to be more excellent in heat resistance and chemical resistance.
- such an elastomer is more preferable from the viewpoint of solubility in a solvent and resistance to a resist solvent.
- the polystyrene elastomer is a hydrogenated product, the stability to heat is improved, and degradation such as decomposition and polymerization hardly occurs. Furthermore, it is more preferable from the viewpoint of solubility in a solvent and resistance to a resist solvent.
- the unsaturated double bond amount of the polystyrene elastomer is preferably less than 15 mmol, more preferably less than 5 mmol, and more preferably less than 0.5 mmol per 1 g of the polystyrene elastomer from the viewpoint of peelability. preferable.
- the amount of unsaturated double bonds here does not include the amount of unsaturated double bonds in the benzene ring derived from styrene.
- the amount of unsaturated double bonds can be calculated by NMR (nuclear magnetic resonance) measurement.
- a repeating unit derived from styrene is a structural unit derived from styrene contained in a polymer when styrene or a styrene derivative is polymerized, and may have a substituent.
- the styrene derivative include ⁇ -methylstyrene, 3-methylstyrene, 4-propylstyrene, 4-cyclohexylstyrene, and the like.
- the substituent include an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, an alkoxyalkyl group having 2 to 5 carbon atoms, an acetoxy group, and a carboxyl group.
- Examples of commercially available polystyrene elastomers include Tufprene A, Tufprene 125, Tufprene 126S, Solprene T, Asaprene T-411, Asaprene T-432, Asaprene T-437, Asaprene T-438, Asaprene T-439, Tuftec H1272 Tuftec P1500, Tuftec H1052, Tuftec H1062, Tuftec M1943, Tuftec M1911, Tuftec H1041, Tuftec MP10, Tuftec M1913, Tuftec H1051, Tuftec H1053, Tuftec P2000, Tuftech H1043 (above, manufactured by Asahi Kasei Elastomers AR) 850C, Elastomer AR-815C, Elastomer AR-840C, Elastomer AR-830C, Eras Mer AR-860C, Elastomer AR-875C, Elastomer AR-885C, Elasto
- Polyester elastomer >>>>>
- a polyester-type elastomer According to the objective, it can select suitably.
- the dicarboxylic acid include aromatic dicarboxylic acids such as terephthalic acid, isophthalic acid, and naphthalenedicarboxylic acid, and aromatic dicarboxylic acids in which the hydrogen atoms of these aromatic rings are substituted with a methyl group, an ethyl group, a phenyl group, or the like.
- Examples thereof include aliphatic dicarboxylic acids having 2 to 20 carbon atoms such as acid, sebacic acid and dodecanedicarboxylic acid, and alicyclic dicarboxylic acids such as cyclohexanedicarboxylic acid. These may be used alone or in combination of two or more.
- Examples of the diol compound include aliphatic diols such as ethylene glycol, 1,3-propanediol, 1,4-butanediol, 1,6-hexanediol, 1,10-decanediol, 1,4-cyclohexanediol, Examples thereof include alicyclic diols and divalent phenols represented by the following structural formulas.
- Y DO represents any one of an alkylene group having 1 to 10 carbon atoms, a cycloalkylene group having 4 to 8 carbon atoms, —O—, —S—, and —SO 2 —, or a single bond.
- R DO1 and R DO2 each independently represent a halogen atom or an alkyl group having 1 to 12 carbon atoms.
- p do1 and p do2 each independently represent an integer of 0 to 4, and n do1 represents 0 or 1.
- divalent phenol examples include bisphenol A, bis- (4-hydroxyphenyl) methane, bis- (4-hydroxy-3-methylphenyl) propane, resorcin and the like. These may be used alone or in combination of two or more.
- a polyester-based elastomer a multi-block copolymer having an aromatic polyester (for example, polybutylene terephthalate) portion as a hard segment component and an aliphatic polyester (for example, polytetramethylene glycol) portion as a soft segment component should be used. You can also.
- the multi-block copolymer includes various grades depending on the kind, ratio, and molecular weight of the hard segment and the soft segment.
- Hytrel manufactured by Toray DuPont Co., Ltd.
- Perprene manufactured by Toyobo Co., Ltd.
- Primalloy manufactured by Mitsubishi Chemical Corporation
- Nouvelan manufactured by Teijin Limited
- Espel 1612, 1620 and above
- Hitachi Chemical Co., Ltd.
- the polyolefin elastomer is not particularly limited and can be appropriately selected depending on the purpose. Examples thereof include copolymers of ⁇ -olefins having 2 to 20 carbon atoms such as ethylene, propylene, 1-butene, 1-hexene and 4-methyl-1-pentene. Examples thereof include ethylene-propylene copolymer (EPR) and ethylene-propylene-diene copolymer (EPDM).
- EPR ethylene-propylene copolymer
- EPDM ethylene-propylene-diene copolymer
- copolymers of non-conjugated dienes having 4 to 20 carbon atoms such as dicyclopentadiene, 1,4-hexadiene, cyclooctadiene, methylene norbornene, ethylidene norbornene, butadiene and isoprene and ⁇ -olefin.
- a carboxy-modified nitrile rubber obtained by copolymerizing methacrylic acid with a butadiene-acrylonitrile copolymer can be mentioned.
- ethylene / ⁇ -olefin copolymer rubber ethylene / ⁇ -olefin / non-conjugated diene copolymer rubber, propylene / ⁇ -olefin copolymer rubber, butene / ⁇ -olefin copolymer
- rubber ethylene / ⁇ -olefin copolymer rubber, ethylene / ⁇ -olefin / non-conjugated diene copolymer rubber, propylene / ⁇ -olefin copolymer rubber, butene / ⁇ -olefin copolymer
- rubber ethylene / ⁇ -olefin copolymer rubber, ethylene / ⁇ -olefin / non-conjugated diene copolymer rubber, propylene / ⁇ -olefin copolymer rubber, butene / ⁇ -olefin copolymer
- rubber ethylene / ⁇ -ole
- Polyurethane Elastomer >>>>>
- an elastomer containing structural units of a hard segment composed of a low molecular weight glycol and diisocyanate and a soft segment composed of a polymer (long chain) diol and diisocyanate can be used.
- the polymer (long chain) diol include polypropylene glycol, polytetramethylene oxide, poly (1,4-butylene adipate), poly (ethylene / 1,4-butylene adipate), polycaprolactone, and poly (1,6-hexene).
- the number average molecular weight of the polymer (long chain) diol is preferably 500 to 10,000.
- the low molecular weight glycol short chain diols such as ethylene glycol, propylene glycol, 1,4-butanediol, and bisphenol A can be used.
- the number average molecular weight of the short chain diol is preferably 48 to 500.
- Examples of commercially available polyurethane elastomers include PANDEX T-2185, T-2983N (manufactured by DIC Corporation), Miractolan (manufactured by Japan Miractoran Corporation), Elastollan (manufactured by BASF Japan Ltd.), Resamine ( Dainichi Seika Kogyo Co., Ltd.), Peresen (Dow Chemical Japan Co., Ltd.), Iron Rubber (NOK Co., Ltd.), Mobilon (Nisshinbo Chemical Co., Ltd.), and the like.
- Polyamide Elastomer >>>>>
- a polyamide-type elastomer According to the objective, it can select suitably.
- This elastomer is roughly classified into two types, a polyether block amide type and a polyether ester block amide type.
- UBE polyamide elastomer examples include UBE polyamide elastomer, UBESTA XPA (manufactured by Ube Industries), Daiamide (manufactured by Daicel Evonik), PEBAX (manufactured by ARKEMA), Grilon ELX (manufactured by Emschemy Japan), Novamid ( DSM), Relax (Toyobo), Polyetheresteramide PA-200, PA-201, TPAE-12, TPAE-32, Polyesteramide TPAE-617, TPAE-617C (above, manufactured by T & K TOKA) ) And the like.
- UBE polyamide elastomer examples include UBE polyamide elastomer, UBESTA XPA (manufactured by Ube Industries), Daiamide (manufactured by Daicel Evonik), PEBAX (manufactured by ARKEMA), Grilon ELX (manufactured by Emschemy Japan), Novamid ( DSM
- Polyacrylic elastomer >>>>>
- copolymers containing acrylic acid esters such as ethyl acrylate, butyl acrylate, methoxyethyl acrylate, ethoxyethyl acrylate, etc. as the main component of the monomer material, or copolymers of acrylic acid esters with glycidyl methacrylate, allyl glycidyl ether, etc.
- acrylic acid ester and crosslinking point monomers such as acrylonitrile and ethylene, etc.
- Epoxy elastomers include, for example, bisphenol F-type epoxy resin, bisphenol A-type epoxy resin, salicylaldehyde-type epoxy resin, phenol novolac-type epoxy resin or cresol novolac-type epoxy resin with some or all of the epoxy groups at both terminal carboxylic acids. It can be obtained by modification with modified butadiene-acrylonitrile rubber, terminal amino-modified silicone rubber or the like.
- other polymer compounds other than the above-described resins can be used.
- Other polymer compounds can be used alone or in combination of two or more.
- Specific examples of other polymer compounds include, for example, hydrocarbon resins, novolak resins, phenol resins, epoxy resins, melamine resins, urea resins, unsaturated polyester resins, alkyd resins, polyamide resins, thermoplastic polyimide resins, polyamideimides.
- a resin containing a fluorine atom which will be described later, can be used as the resin, but a resin containing a fluorine atom (hereinafter also referred to as a fluororesin) is preferably substantially not contained.
- a resin containing a fluorine atom hereinafter also referred to as a fluororesin
- “Substantially free of fluororesin” means that the content of fluororesin is, for example, 0.1% by mass or less, preferably 0.05% by mass or less, and not contained at all with respect to the total mass of the resin. It is more preferable.
- any hydrocarbon resin can be used.
- the hydrocarbon resin basically means a resin composed of only carbon atoms and hydrogen atoms, but if the basic skeleton is a hydrocarbon resin, it may contain other atoms as side chains. That is, when a functional group other than a hydrocarbon group is directly bonded to the main chain, such as an acrylic resin, a polyvinyl alcohol resin, a polyvinyl acetal resin, or a polyvinylpyrrolidone resin, to a hydrocarbon resin consisting of only carbon atoms and hydrogen atoms.
- hydrocarbon resin it is included in the hydrocarbon resin in the invention, and in this case, the content of the repeating unit in which the hydrocarbon group is directly bonded to the main chain is 30 mol% or more based on the total repeating unit of the resin. Is preferred.
- hydrocarbon resins that meet the above conditions include cyclic terpene resins, cyclic terpene phenol resins, modified cyclic terpene resins, hydrogenated cyclic terpene resins, hydrogenated cyclic terpene phenol resins, rosin, rosin esters, and water.
- the acrylic resin in the present invention is a resin obtained by polymerizing a (meth) acrylate monomer.
- (Meth) acrylate monomers include 2-ethylhexyl (meth) acrylate, ethyl (meth) acrylate, methyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, pentyl (meth) acrylate, n- Octyl (meth) acrylate, isooctyl (meth) acrylate, isononyl (meth) acrylate, n-butyl (meth) acrylate, isobutyl (meth) acrylate, hexyl (meth) acrylate, n-nonyl (meth) acrylate, isoamyl (meth) Acrylate, n-decyl (meth) acrylate, isodecyl (meth)
- an acrylic resin having an organopolysiloxane in the side chain is also preferable.
- the acrylic resin having an organopolysiloxane in the side chain include acrylic resins represented by the following formula (3).
- Formula (3) In the formula (3), when there are a plurality of R 1 s , they may be the same or different, and —CH 3 , —C 2 H 5 , —CH 3 (CH 2 ) 2 or —CH 3 (CH 2 ) 3 is substituted. Show.
- R 2 s When there are a plurality of R 2 s , they may be the same or different and each represents —H, —CH 3 , —C 2 H 5 , —CH 3 (CH 2 ) 2 or —CH 3 (CH 2 ) 3 .
- R 3 s When there are a plurality of R 3 s , they may be the same or different and represent —H or —CH 3 .
- R 4 s When there are a plurality of R 4 s , they may be the same or different, and —H, —CH 3 , —C 2 H 5 , —CH 3 (CH 2 ) 2 , —CH 3 (CH 2 ) 3 , or an epoxy group,
- a is 50 to 150
- b is 50 to 150
- c 80 to 600.
- M is 1 to 10.
- acrylic resin having an organopolysiloxane in the side chain examples include silicone graft acrylic resins manufactured by Shin-Etsu Chemical Co., Ltd., trade names: X-24-798A, X-22-8004 (R 4 : C 2 H 4 OH, functional group equivalent: 3250 (g / mol)), X-22-8209 (R 4 : Si (OCH 3 ) 3 -containing alkyl group, functional group equivalent: 6200 (g / mol)), X-22 8053 (R 4 : H, functional group equivalent: 900 (g / mol)), X-22-8084, X-22-8084EM, X-22-8195 (R 4 : H, functional group equivalent: 2700 (g / mol) mol)), manufactured by Toagosei Co., Ltd., Cymac series (US-270, US-350, US-352, US-380, US-413, US-450, etc.), Reeta GS-1000 series GS-1015
- cycloolefin polymers examples include norbornene polymers, monocyclic olefin polymers, cyclic conjugated diene polymers, vinyl alicyclic hydrocarbon polymers, and hydrides of these polymers.
- Preferred examples of the cycloolefin polymer include addition (co) polymers containing at least one repeating unit represented by the following formula (II), and at least one repeating unit represented by the formula (I) And addition (co) polymers further comprising
- Another preferred example of the cycloolefin polymer is a ring-opening (co) polymer containing at least one cyclic repeating unit represented by the formula (III).
- m represents an integer of 0 to 4.
- R 1 to R 6 each represent a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms
- X 1 to X 3 and Y 1 to Y 3 each represent a hydrogen atom or a carbon group having 1 to 10 carbon atoms.
- R 11 , R 12 , R 13 , R 14 , R 15 , R 16 and R 17 are each a hydrogen atom or a hydrocarbon group (preferably a hydrocarbon group having 1 to 20 carbon atoms), Z is a carbon atom A hydrogen group or a hydrocarbon group substituted with a halogen; W represents SiR 18 p D 3-p (R 18 represents a hydrocarbon group having 1 to 10 carbon atoms; D represents a halogen atom; Represents OCOR 18 or —OR 18 , and p represents an integer of 0 to 3. n represents an integer of 0 to 10.
- Norbornene polymers are disclosed in JP-A-10-7732, JP-T 2002-504184, US2004 / 229157A1 or WO2004 / 070463A1, and the description thereof is incorporated in the present specification. .
- the norbornene-based polymer can be obtained by addition polymerization of norbornene-based polycyclic unsaturated compounds. If necessary, a norbornene-based polycyclic unsaturated compound and ethylene, propylene, butene; conjugated dienes such as butadiene and isoprene; non-conjugated dienes such as ethylidene norbornene can also be subjected to addition polymerization.
- the norbornene-based polymer is marketed by Mitsui Chemicals, Inc. under the name of Apel, such as APL8008T (Tg 70 ° C.), APL 6013T (Tg 125 ° C.) or APL 6015T (Tg 145 ° C.) having a different glass transition temperature (Tg).
- Apel such as APL8008T (Tg 70 ° C.), APL 6013T (Tg 125 ° C.) or APL 6015T (Tg 145 ° C.) having a different glass transition temperature (Tg).
- Apel such as APL8008T (Tg 70 ° C.), APL 6013T (Tg 125 ° C.) or APL 6015T (Tg 145 ° C.) having a different glass transition temperature (Tg).
- Tg glass transition temperature
- Pellets such as TOPAS 8007, 5013, 6013, 6015, etc. are available from Polyplastics. Further, Appear 3000 is
- the hydrides of norbornene polymers are disclosed in JP-A-1-240517, JP-A-7-196736, JP-A-60-26024, JP-A-62-19801, and JP-A-2003-1159767.
- it can be produced by subjecting a polycyclic unsaturated compound to addition polymerization or metathesis ring-opening polymerization and then hydrogenation.
- R 5 and R 6 are preferably hydrogen atoms or methyl groups
- X 3 and Y 3 are more preferably hydrogen atoms, and other groups are appropriately selected.
- hydrides of norbornene-based polymers are sold under the trade names of Arton G or Arton F by JSR Co., Ltd., and ZEONOR ZF14, ZF16, ZEONEX by Nippon Zeon Co., Ltd. 250, 280, and 480R are commercially available, and these can be used.
- siloxane polymer a siloxane polymer having a repeating unit represented by the following formula (1) is preferable.
- R 1 to R 4 represent a monovalent hydrocarbon group such as an alkyl group having 1 to 8 carbon atoms which may be the same or different.
- m is an integer of 1 to 100
- B is a positive integer
- A is 0 or a positive integer.
- X is a divalent organic group represented by the following formula (2).
- Z is a divalent organic group selected from any of the following, and n is 0 or 1.
- R 5 and R 6 are each independently an alkyl group having 1 to 4 carbon atoms or an alkoxy group having 2 to 4 carbon atoms, and may be the same or different from each other.
- k is independently 0, 1, or 2, respectively.
- R 1 to R 4 include a methyl group, an ethyl group, a phenyl group and the like, and m is preferably an integer of 3 to 60, more preferably 8 to 40.
- B / A is 0 to 20, particularly 0.5 to 5.
- siloxane polymer The details of the siloxane polymer can be referred to the descriptions in paragraph numbers 0038 to 0044 of JP2013-243350A, the contents of which are incorporated herein.
- thermoplastic siloxane polymer can be used as the siloxane polymer.
- the thermoplastic siloxane polymer is an R 21 R 22 R 23 SiO 1/2 unit (R 21 , R 22 and R 23 are each an unsubstituted or substituted monovalent hydrocarbon group having 1 to 10 carbon atoms or a hydroxyl group.
- organopolysiloxane molar ratio of the R 21 R 22 R 23 SiO 1/2 units / SiO 4/2 unit is 0.6-1.7, the following formula
- the organopolysiloxane represented by (4) is partially dehydrated and condensed, and the ratio of the organopolysiloxane to be dehydrated and condensed to the organopolysiloxane is 99: 1 to 50:50,
- the weight average molecular weight is preferably 200,000 to 1,500,000.
- Formula (4) (In Formula (4), R 11 and R 12 each independently represents a monovalent hydrocarbon group having 1 to 10 carbon atoms which may have a substituent, and n is 5000 to 10,000.)
- R 11 and R 12 are specifically methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, t-butyl group, n-pentyl group, cyclopentyl.
- Substituted groups are preferred, more preferably methyl and phenyl groups.
- the weight average molecular weight of the thermoplastic organopolysiloxane is preferably 200,000 or more, more preferably 350,000 or more, and preferably 1,500,000 or less, more preferably 1,000,000 or less.
- the content of low molecular weight components having a molecular weight of 740 or less is preferably 0.5% by mass or less, more preferably 0.1% by mass or less.
- SILRES 604 As a commercial item, SILRES 604 (Asahi Kasei Wacker Silicone Co., Ltd. product) is illustrated.
- thermoplastic polyimide resin one obtained by subjecting tetracarboxylic dianhydride and diamine to a condensation reaction by a known method can be used.
- Known methods include, for example, a method of dehydrating and ring-closing polyamic acid obtained by mixing tetracarboxylic dianhydride and diamine in an organic solvent in an approximately equimolar amount and reacting at a reaction temperature of 80 ° C. or lower. It is done.
- substantially equimolar means that the molar ratio of tetracarboxylic dianhydride and diamine is close to 1: 1.
- the composition ratio of tetracarboxylic dianhydride and diamine is 0.5 to 2.0 mol of diamine with respect to 1.0 mol of tetracarboxylic dianhydride in total. You may adjust as follows. By adjusting the composition ratio of tetracarboxylic dianhydride and diamine within the above range, the weight average molecular weight of the thermoplastic polyimide resin can be adjusted.
- the tetracarboxylic dianhydride is not particularly limited, and examples thereof include pyromellitic dianhydride, 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, 2,2 ′, 3,3′-biphenyltetracarboxylic dianhydride, 2,2-bis (3,4-dicarboxyphenyl) propane dianhydride, 2,2-bis (2,3-dicarboxyphenyl) propane dianhydride 1,1-bis (2,3-dicarboxyphenyl) ethane dianhydride, 1,1-bis (3,4-dicarboxyphenyl) ethane dianhydride, bis (2,3-dicarboxyphenyl) methane Dianhydride, bis (3,4-dicarboxyphenyl) methane dianhydride, bis (3,4-dicarboxyphenyl) sulfone dianhydride, 3,4,9,10-perylenetetracar
- 3,4,3 ′, 4′-benzophenone tetracarboxylic dianhydride, 2,3,2 ′, 3′-benzophenone tetracarboxylic dianhydride, 2,3,3 ′, 4′- Benzophenone tetracarboxylic dianhydride is preferred, and 3,4,3 ′, 4′-benzophenone tetracarboxylic dianhydride is more preferred.
- the diamine is not particularly limited and includes, for example, o-phenylenediamine, m-phenylenediamine, p-phenylenediamine, 3,3′-diaminodiphenyl ether, 3,4′-diaminodiphenyl ether, 4,4′-diaminodiphenyl ether, 3 , 3'-diaminodiphenylmethane, 3,4'-diaminodiphenylmethane, bis (4-amino-3,5-dimethylphenyl) methane, bis (4-amino-3,5-diisopropylphenyl) methane, 3,3'- Diaminodiphenyldifluoromethane, 3,4'-diaminodiphenyldifluoromethane, 4,4'-diaminodiphenyldifluoromethane, 3,3'-diaminodiphenylsulfone, 3,4
- One or more selected from the group consisting of diamines are preferred, and 3- (4-aminophenyl) -1,1,3-trimethyl-5-aminoindane is more preferred.
- Examples of the solvent used for the reaction of the tetracarboxylic dianhydride and diamine include N, N-dimethylacetamide, N-methyl-2-pyrrolidone, and N, N-dimethylformamide.
- a nonpolar solvent for example, toluene or xylene
- the reaction temperature of the tetracarboxylic dianhydride and the diamine is preferably less than 100 ° C, more preferably less than 90 ° C.
- imidation of polyamic acid is typically performed by heat treatment under an inert atmosphere (typically a vacuum or nitrogen atmosphere).
- the heat treatment temperature is preferably 150 ° C. or higher, more preferably 180 to 450 ° C.
- the weight average molecular weight (Mw) of the thermoplastic polyimide resin is preferably 10,000 to 1,000,000, and more preferably 20,000 to 100,000.
- the thermoplastic polyimide resin is at least one solvent selected from ⁇ -butyrolactone, cyclopentanone, N-methylpyrrolidone, N-ethyl-2-pyrrolidone, cyclohexanone, glycol ether, dimethyl sulfoxide and tetramethylurea.
- a thermoplastic polyimide resin having a solubility at 25 ° C. of 10% by mass or more is preferable.
- Thermoplastic polyimide resins having such solubility include, for example, 3,4,3 ′, 4′-benzophenonetetracarboxylic dianhydride and 3- (4-aminophenyl) -1,1,3-trimethyl- Examples thereof include thermoplastic polyimide resins obtained by reacting with 5-aminoindane. This thermoplastic polyimide resin is particularly excellent in heat resistance.
- thermoplastic polyimide resin A commercially available product may be used as the thermoplastic polyimide resin.
- Durimide registered trademark
- FUJIFILM Corporation GPT-LT (manufactured by Gunei Chemical Industry Co., Ltd.)
- SOXR-S SOXR-M
- SOXR-U SOXR -C
- EXTEM VH1003, VH1003F, VH1003M, XH1015 aboveve, SABIC Japan GK.
- the polycarbonate resin preferably has a repeating unit represented by the formula (11).
- Ar 1 and Ar 2 each independently represent an aromatic group, and L represents a single bond or a divalent linking group.
- Ar 1 and Ar 2 in formula (11) each independently represent an aromatic group.
- Aromatic groups include benzene ring, naphthalene ring, pentalene ring, indene ring, azulene ring, heptalene ring, indacene ring, perylene ring, pentacene ring, acenaphthene ring, phenanthrene ring, anthracene ring, naphthacene ring, chrysene ring, triphenylene ring , Fluorene ring, biphenyl ring, pyrrole ring, furan ring, thiophene ring, imidazole ring, oxazole ring, thiazole ring, pyridine ring, pyrazine ring, pyrimidine ring, pyridazine ring, indolizine ring, indole ring, benzofuran ring, benzothi
- aromatic groups may have a substituent, but preferably do not have a substituent.
- substituent that the aromatic group may have include a halogen atom, an alkyl group, an alkoxy group, and an aryl group.
- halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
- alkyl group include alkyl groups having 1 to 30 carbon atoms.
- the alkyl group preferably has 1 to 20 carbon atoms, more preferably 1 to 10 carbon atoms.
- the alkyl group may be linear or branched.
- the hydrogen atoms of the alkyl group may be substituted with halogen atoms.
- the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom, and a fluorine atom is preferable.
- the alkoxy group an alkoxy group having 1 to 30 carbon atoms is preferable. The number of carbon atoms of the alkoxy group is more preferably 1-20, and still more preferably 1-10.
- the alkoxy group may be linear, branched or cyclic.
- the aryl group an aryl group having 6 to 30 carbon atoms is preferable, and an aryl group having 6 to 20 carbon atoms is more preferable.
- the weight average molecular weight (Mw) of the polycarbonate resin is preferably 1,000 to 1,000,000, and more preferably 10,000 to 80,000. If it is the said range, the solubility to a solvent and heat resistance are favorable.
- polycarbonate resins include, for example, PCZ-200, PCZ-300, PCZ-500, PCZ-800 (manufactured by Mitsubishi Gas Chemical Co., Ltd.), APEC 9379 (manufactured by Bayer), Panlite L-1225LM (Teijin) Etc.).
- the resin preferably has a tensile elastic modulus E of 1 MPa or more and 4000 MPa or less, more preferably 1 MPa or more and 100 MPa or less, and more preferably 1 MPa or more, at 25 ° C., in accordance with JIS (Japanese Industrial Standard) K 7161: 1994. More preferably, it is 60 MPa or less, more preferably 1 MPa or more and 35 MPa or less, still more preferably 1 MPa or more and 20 MPa or less, still more preferably 1 MPa or more and 15 MPa or less, and 3 MPa or more and 10 MPa or less. It is even more preferable. By setting it as such a range, it becomes possible to suppress curvature more effectively.
- the temporary adhesive used in the present invention preferably contains a resin in a proportion of 50.00 to 99.99% by mass, more preferably 70.00 to 99.99% by mass in the total solid content of the temporary adhesive. 88.00 to 99.99% by mass is particularly preferable.
- the resin content is in the above range, the adhesiveness and the peelability are excellent.
- the elastomer is preferably included in the total solid content of the temporary adhesive in a proportion of 50.00 to 99.99% by mass, more preferably 70.00 to 99.99% by mass, 88 Particularly preferred is 0.000 to 99.99% by mass. If the content of the elastomer is in the above range, the adhesiveness and peelability are excellent.
- the total is preferably in the above range.
- the elastomer content in the total resin mass is preferably 50 to 100% by mass, more preferably 70 to 100% by mass, further preferably 80 to 100% by mass, and 90 to 100% by mass. Is more preferable.
- the resin may be substantially only an elastomer.
- 99 mass% or more is preferable, as for content of the elastomer in resin total mass, 99.9 mass% or more is more preferable, and it is still more preferable that it consists only of an elastomer.
- the temporary adhesive used by this invention may contain the plasticizer as needed. By blending a plasticizer, a temporary adhesive layer that satisfies the above-mentioned various performances can be obtained.
- the plasticizer phthalic acid esters, fatty acid esters, aromatic polycarboxylic acid esters, polyesters, and the like can be used.
- phthalic acid esters examples include DMP, DEP, DBP, # 10, BBP, DOP, DINP, DIDP (above, manufactured by Daihachi Chemical Industry Co., Ltd.), PL-200, DOIP (above, made by CG Esther Co., Ltd.) ), Sansosizer DUP (manufactured by Shin Nippon Rika Co., Ltd.) and the like.
- fatty acid esters examples include butyl stearate, Unistar M-9676, Unistar M-2222SL, Unistar H-476, Unistar H-476D, Panaceto 800B, Panaceto 875, Panaceto 810 (manufactured by NOF Corporation), DBA , DIBA, DBS, DOA, DINA, DIDA, DOS, BXA, DOZ, DESU (manufactured by Daihachi Chemical Industry Co., Ltd.).
- polyester examples include Polycizer TD-1720, Polycizer S-2002, Polycizer S-2010 (manufactured by DIC Corporation), BAA-15 (Daihachi Chemical Industry Co., Ltd.), and the like.
- plasticizers DIDP, DIDA, TOTM, Unistar M-2222SL and Polycizer TD-1720 are preferable, DIDA and TOTM are more preferable, and TOTM is particularly preferable. Only one type of plasticizer may be used, or two or more types may be combined.
- the plasticizer has a temperature at which the weight is reduced by 1% by mass under a nitrogen stream under a temperature rising condition at a constant rate of 20 ° C./min. It is preferably 250 ° C or higher, more preferably 270 ° C or higher, and particularly preferably 300 ° C or higher.
- the upper limit is not particularly defined, but can be, for example, 500 ° C. or less.
- the addition amount of the plasticizer is preferably 0.01% by mass to 5.0% by mass and more preferably 0.1% by mass to 2.0% by mass with respect to the total solid content of the temporary adhesive.
- the temporary adhesive used in the present invention contains a solvent.
- Any known solvent can be used without limitation, and an organic solvent is preferred.
- organic solvents include ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, isoamyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, methyl lactate, ethyl lactate, and alkyloxyacetic acid alkyl (eg, alkyl) Methyl oxyacetate, ethyl alkyloxyacetate, butyl alkyloxyacetate (eg, methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate etc.), 3-oxypropionic acid alkyl esters (eg: Methyl 3-oxypropionat
- Cypropionate alkyl esters eg, methyl 2-oxypropionate, ethyl 2-oxypropionate, propyl 2-alkyloxypropionate, etc.
- solvents are preferably mixed in two or more types from the viewpoint of improving the properties of the coated surface.
- particularly preferred are mesitylene, t-butylbenzene, 1,2,4-trimethylbenzene, p-menthane, ⁇ -butyrolactone, anisole, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate.
- Ethyl lactate diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, cyclohexanone, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol methyl ether, and propylene glycol methyl ether acetate It is the mixed solution comprised by 2 or more types.
- the solvent content of the temporary adhesive is preferably such that the total solid concentration of the temporary adhesive is 5 to 80% by mass, more preferably 10 to 50% by mass, and more preferably 15 to 40% by mass from the viewpoint of applicability. Is particularly preferred. One type of solvent may be sufficient and 2 or more types may be sufficient as it. When there are two or more solvents, the total is preferably in the above range.
- the content of the solvent in the temporary adhesive layer obtained by applying the temporary adhesive in layers and drying is preferably 1% by mass or less, more preferably 0.1% by mass or less, and particularly preferably not contained at all. .
- the temporary adhesive used in the present invention may contain an antioxidant.
- an antioxidant a phenol-based antioxidant, a sulfur-based antioxidant, a phosphorus-based antioxidant, a quinone-based antioxidant, an amine-based antioxidant, and the like can be used.
- phenolic antioxidants include p-methoxyphenol, 2,6-di-tert-butyl-4-methylphenol, Irganox 1010, Irganox 1330, Irganox 3114, Irganox 1035 (above, BASF Japan Ltd.), Sumilizer MDP- S, Sumilizer GA-80 (above, manufactured by Sumitomo Chemical Co., Ltd.)
- sulfur-based antioxidants include 3,3′-thiodipropionate distearyl, Sumilizer TPL-R, Sumilizer TPM, Sumilizer TPS, Sumilizer MB, and Sumitizer TP-D (manufactured by Sumitomo Chemical Co., Ltd.). Is mentioned.
- phosphorus antioxidants include tris (2,4-di-tert-butylphenyl) phosphite, bis (2,4-di-tert-butylphenyl) pentaerythritol diphosphite, poly (dipropylene glycol) Phenyl phosphite, diphenylisodecyl phosphite, 2-ethylhexyl diphenyl phosphite, triphenyl phosphite, Irgafos 168, Irgafos 38 (above, manufactured by BASF Japan Ltd.), Sumizer GP (Sumitomo Chemical Co., Ltd.), etc. .
- Examples of the quinone antioxidant include p-benzoquinone and 2-tert-butyl-1,4-benzoquinone.
- Examples of amine-based antioxidants include dimethylaniline and phenothiazine.
- Irganox 1010, Irganox 1330, 3,3′-thiodipropionate distearyl and Sumilizer TP-D are preferable, Irganox 1010 and Irganox 1330 are more preferable, and Irganox 1010 is particularly preferable.
- a phenol-based antioxidant and a sulfur-based antioxidant or a phosphorus-based antioxidant in combination, and a phenol-based antioxidant and a sulfur-based antioxidant are used in combination.
- a phenol-based antioxidant and a sulfur-based antioxidant are used in combination.
- a polystyrene-based elastomer when used as the elastomer, it is preferable to use a phenol-based antioxidant and a sulfur-based antioxidant in combination.
- phenolic antioxidant: sulfurous antioxidant 95: 5 to 5:95 is preferable, and 25:75 to 75:25 is more preferable.
- Irganox 1010 and Sumilizer TP-D Irganox 1330 and Sumilizer TP-D, and Sumilizer GA-80 and Sumilizer TP-D are preferred, Irganox 1010 and Sumilizer TP-D, 13g More preferred are Irganox 1010 and Sumilizer TP-D.
- the molecular weight of the antioxidant is preferably 400 or more, more preferably 600 or more, and particularly preferably 750 or more, from the viewpoint of preventing sublimation during heating.
- the content of the antioxidant is preferably 0.001 to 20.0% by mass, based on the total solid content of the temporary adhesive, and 0.005 to 10.0.
- the mass% is more preferable. Only one type of antioxidant may be used, or two or more types may be used. When there are two or more antioxidants, the total is preferably in the above range.
- additives In the temporary adhesive used in the present invention, various additives such as a surfactant, a curing agent, a curing catalyst, a filler, an adhesion promoter, and an ultraviolet absorber are added as necessary without departing from the effects of the present invention.
- An agent, an anti-aggregation agent and the like can be blended.
- the total blending amount is preferably 3% by mass or less based on the total solid content of the temporary adhesive.
- the temporary adhesive used in the present invention preferably does not contain impurities such as metals.
- the content of impurities contained in these materials is preferably 1 mass ppm (parts per million) or less, more preferably 100 mass ppt (parts per trigger) or less, still more preferably 10 mass ppt or less, and substantially no inclusion. (It is below the detection limit of the measuring device) is particularly preferred.
- Examples of a method for removing impurities such as metals from the temporary adhesive include filtration using a filter.
- the pore size of the filter is preferably a pore size of 10 nm or less, more preferably 5 nm or less, and further preferably 3 nm or less.
- the filter material is preferably a polytetrafluoroethylene, polyethylene, or nylon filter. You may use the filter previously wash
- a plurality of types of filters may be connected in series or in parallel. When a plurality of types of filters are used, filters having different hole diameters and / or materials may be used in combination. Moreover, you may filter several times using various filter materials, and the circulation filtration process may be sufficient as the process filtered several times.
- a raw material having a low metal content is selected as a raw material constituting the temporary adhesive, and filter filtration is performed on the raw material constituting the temporary adhesive.
- Examples thereof include a method of performing distillation under conditions where contamination is suppressed as much as possible by lining the inside of the apparatus with Teflon (registered trademark).
- the preferable conditions for filter filtration performed on the raw materials constituting the temporary adhesive are the same as those described above.
- impurities may be removed by an adsorbent, or a combination of filter filtration and adsorbent may be used.
- adsorbent known adsorbents can be used.
- inorganic adsorbents such as silica gel and zeolite, and organic adsorbents such as activated carbon can be used.
- the temporary adhesive layer is formed by applying a temporary adhesive on the substrate by spin coating, spraying, slit coating, roller coating, flow coating, doctor coating, dipping, etc. Can do. As described above, the temporary adhesive layer is formed on the surface of at least one of the two substrates to be temporarily bonded. The temporary adhesive layer may be formed on only one of the substrates and bonded to the other substrate, or the temporary adhesive layer may be provided on both substrates and bonded together. Next, since the temporary adhesive usually contains a solvent, the solvent is volatilized by heating. The heating temperature is preferably higher than the boiling point of the solvent, more preferably 110 ° C. or more, further preferably 130 ° C. to 200 ° C., and particularly preferably 160 ° C. to 190 ° C.
- the temporary adhesive used in the present invention can be prepared by mixing the above-described components.
- the mixing of each component is usually performed in the range of 0 ° C to 100 ° C.
- the filtered liquid can also be refiltered. Any filter can be used without particular limitation as long as it has been conventionally used for filtration.
- a filter made of a fluororesin such as PTFE (polytetrafluoroethylene), a polyamide resin such as nylon 6, nylon 6, 6 or the like, a polyolefin resin such as polyethylene or polypropylene (PP), or the like can be given.
- PTFE polytetrafluoroethylene
- nylon 6, nylon 6, 6 or the like a polyolefin resin such as polyethylene or polypropylene (PP), or the like
- PP polypropylene and nylon
- the pore size of the filter is suitably about 0.003 to 5.0 ⁇ m, for example. By setting it within this range, it becomes possible to reliably remove fine foreign matters such as impurities and aggregates contained in the composition while suppressing filtration clogging.
- different filters may be combined. At that time, the filtering by the first filter may be performed only once or may be performed twice or more.
- the second and subsequent holes have the same or smaller diameter than the first filtering.
- a plurality of first filters having different pore diameters within the above-described range may be combined.
- the pore diameter here can refer to the nominal value of the filter manufacturer.
- the commercially available filter can be selected from various filters provided by Nippon Pole Co., Ltd., Advantech Toyo Co., Ltd., Japan Entegris Co., Ltd., or Kitz Micro Filter Co., Ltd., for example.
- the organic solvent contained in the cleaning composition is such that when the temporary adhesive contains a resin and further an elastomer, the solubility of the elastomer in the organic solvent at 25 ° C. is 18 to 40% by mass. It is preferably 20 to 32% by mass. By setting it as such a range, removability can be improved more.
- the cleaning composition of the present invention is effective for removing the following temporary adhesives;
- the silicone compound comprises a polyether-modified silicone;
- the ratio of the polyether-modified silicone represented by the formula (A) is 80% or more,
- the content of the silicone compound in the temporary adhesive is 0.001 to 1.0% by mass,
- the temporary adhesive comprises a styrenic elastomer; Formula (A) ⁇ (MO + EO) / AO ⁇ ⁇ 100
- MO is the mol% of methylene oxide contained in the polyether structure in the polyether-modified silicone
- EO is the mol% of ethylene oxide contained in the polyether structure in the polyether-modified silicone.
- AO refers to the mole percent of alkylene oxide contained in the polyether structure in the polyether-modified silicone.
- the manufacturing method of the semiconductor element of this invention includes removing the temporary adhesive agent containing a silicone compound using the cleaning composition containing an acid or a base, and an organic solvent.
- the temporary adhesive agent containing a silicone compound can be removed effectively.
- removing the temporary adhesive containing the silicone compound removing the temporary adhesive layer on the substrate to be processed, removing excess temporary adhesive in the step of temporarily bonding the substrate to be processed and the carrier substrate.
- the temporary adhesive removed in the present invention includes a component derived from the temporary adhesive.
- the component derived from the temporary adhesive is a case where the temporary adhesive contains a solvent, the component after the solvent is removed from the temporary adhesive, and some components (for example, resin) And silicone compounds).
- the details of the temporary adhesive containing the silicone compound and the cleaning composition containing the acid or base and the organic solvent can be referred to the description of the temporary adhesive and the cleaning composition described above, respectively. Is the same.
- the temporary adhesive is used for temporary bonding between the carrier substrate and the substrate to be processed, and the temporary adhesive removed by the cleaning composition is applied The temporary adhesive remaining on the substrate and the temporary adhesive remaining on the substrate to be processed after peeling off the carrier substrate and peeling off the temporary adhesive are preferable.
- Peel-off is preferably performed at a temperature of 40 ° C. or less, and more preferably at a temperature of 10 to 40 ° C. Also, the peel-off is preferably manual peeling and mechanical peeling.
- the substrate to be processed include a device wafer in which silicon, glass, a compound semiconductor such as SiC, GaN, or GaAs, a mold resin, or the like is used as a substrate and a structure is formed on the surface and inside thereof.
- FIGS. 1A and 1E are schematic cross-sectional views (FIGS. 1A and 1B) illustrating temporary bonding between a carrier substrate and a device wafer, respectively, and a device wafer temporarily bonded to a carrier substrate.
- FIG. 1 (C) The thinned state
- D the carrier substrate and the device wafer are separated
- FIG. 1 (E) the state after the temporary adhesive is removed from the device wafer
- an adhesive carrier substrate 100 in which a temporary adhesive layer 11 is provided on a carrier substrate 12 is first prepared.
- the temporary adhesive layer 11 is formed using a temporary adhesive containing a silicone compound, and preferably has an aspect that does not substantially contain a solvent.
- the device wafer 60 is formed by providing a plurality of device chips 62 on a surface 61 a of a silicon substrate 61.
- the thickness of the silicon substrate 61 is preferably 200 to 1200 ⁇ m, for example.
- the device chip 62 is preferably a metal structure, for example, and the height is preferably 10 to 100 ⁇ m.
- the back surface of the carrier substrate and the device wafer may be referred to as a cleaning composition of the present invention, a peeling solution described later, or an organic solvent (hereinafter referred to as “the cleaning composition of the present invention”). ) May be used for cleaning. Specifically, by removing the residue of the temporary adhesive layer adhering to the end surface or back surface of the carrier substrate or device wafer using the cleaning composition of the present invention, contamination of the apparatus can be prevented, and the thickness is reduced. TTV (Total Thickness Variation) of the device wafer can be reduced.
- TTV Total Thickness Variation
- the adhesive carrier substrate 100 and the device wafer 60 are pressure-bonded, and the carrier substrate 12 and the device wafer 60 are temporarily bonded.
- the temporary adhesive layer 11 preferably completely covers the device chip 62. Further, when the height of the device chip is X ⁇ m and the thickness of the temporary adhesive layer is Y ⁇ m, it is preferable to satisfy the relationship of “X + 100 ⁇ Y> X”.
- the temporary adhesive layer 11 completely covering the device chip 62 is effective when it is desired to further reduce the TTV of the thinned device wafer (that is, when the flatness of the thinned device wafer is to be further improved). .
- the plurality of device chips 62 are protected by the temporary adhesive layer 11, so that it is possible to almost eliminate the uneven shape on the contact surface with the carrier substrate 12. Therefore, even if the thickness is reduced in such a supported state, the possibility that the shape derived from the plurality of device chips 62 is transferred to the back surface 61b1 of the reduced thickness device wafer is reduced.
- the TTV of the integrated device wafer can be further reduced.
- the back surface 61b of the silicon substrate 61 is mechanically or chemically treated (though it is not particularly limited, for example, thinning such as grinding or chemical mechanical polishing (CMP)).
- CMP chemical mechanical polishing
- CVD chemical vapor deposition
- PVD physical vapor deposition
- other high-temperature and vacuum treatments treatment with chemicals such as organic solvents, acidic treatment solutions and basic treatment solutions, plating treatment, activity Light irradiation, heat treatment and cooling treatment.
- the thickness of the silicon substrate 61 is reduced (for example, the thickness is reduced to the above-described thickness) to obtain a reduced device wafer 60a.
- the temporary adhesive layer that protrudes outside the area of the substrate surface of the device wafer is washed with the cleaning composition of the present invention at a stage before the treatment under high temperature and vacuum.
- a process may be provided. Specifically, after thinning the device wafer, the protruding temporary adhesive layer is removed using the cleaning composition of the present invention, so that the treatment under high temperature and vacuum is directly applied to the temporary adhesive layer. It is possible to prevent the temporary adhesive layer from being deformed or altered.
- the area of the film surface of the temporary adhesive layer is preferably smaller than the area of the substrate surface of the carrier substrate.
- the diameter of the substrate surface of the carrier substrate is C ⁇ m
- the diameter of the substrate surface of the device wafer is D ⁇ m
- the diameter of the film surface of the temporary adhesive layer is T ⁇ m
- (C ⁇ 200) ⁇ T ⁇ D It is more preferable to satisfy.
- the diameter of the substrate surface of the carrier substrate is C ⁇ m
- the diameter of the substrate surface of the device wafer is D ⁇ m
- the diameter of the film surface of the temporary adhesive layer on the side in contact with the carrier substrate is TC ⁇ m
- the device wafer of the temporary adhesive layer It is preferable that (C ⁇ 200) ⁇ T C > T D ⁇ D is satisfied, where T D ⁇ m is the diameter of the film surface on the contact side.
- transformation and the quality change of the temporary adhesion layer by the process under high temperature and a vacuum being directly performed to a temporary adhesion layer can be suppressed more.
- the area of the film surface of the temporary adhesive layer means an area when viewed from a direction perpendicular to the carrier substrate, and the unevenness of the film surface is not considered.
- the substrate surface of the device wafer That is, the substrate surface of the device wafer referred to here is, for example, a surface corresponding to the surface 61a in FIG. 1 and a surface on which the device chip is provided. The same applies to the diameter of the temporary adhesive layer such as the film surface.
- the diameter T of the film surface of the temporary adhesive layer is the diameter of the film surface on the side of the temporary adhesive layer in contact with the carrier substrate, T C ⁇ m, and the film surface on the side of the temporary adhesive layer in contact with the device wafer.
- T (T C + T D ) / 2.
- the diameter of the substrate surface of the carrier substrate and the diameter of the substrate surface of the device wafer refer to the diameter of the surface in contact with the temporary adhesive layer.
- regulated as a "diameter" about a carrier substrate etc. it is not essential for a carrier substrate etc. to be circular (perfect circle) in a mathematical meaning, and what is necessary is just circular.
- the diameter when converted to a perfect circle of the same area is taken as the diameter.
- a through hole (not shown) penetrating the silicon substrate is formed from the back surface 61b1 of the thinned device wafer 60a after the thinning process, and the silicon through electrode is formed in the through hole. You may perform the process which forms (not shown).
- the heat treatment may be performed after the carrier substrate 12 and the device wafer 60 are temporarily bonded to each other before being peeled off. As an example of the heat treatment, heating is performed when performing a mechanical or chemical treatment.
- the maximum temperature achieved in the heat treatment is preferably 80 to 400 ° C, more preferably 130 ° C to 400 ° C, and still more preferably 180 ° C to 350 ° C.
- the highest temperature reached in the heat treatment is preferably lower than the decomposition temperature of the temporary adhesive layer.
- the heat treatment is preferably 30 seconds to 30 minutes at the highest temperature, and more preferably 1 minute to 10 minutes at the highest temperature.
- the carrier substrate 12 is peeled from the thinned device wafer 60a (device wafer subjected to mechanical or chemical treatment).
- the temperature at the time of peeling is preferably 40 ° C. or lower, and can also be 30 ° C. or lower.
- the lower limit of the temperature at the time of peeling is, for example, 0 ° C. or higher, and preferably 10 ° C. or higher.
- the peeling in the present invention is highly valuable in that it can be performed at a room temperature of about 15 to 35 ° C.
- the peeling method is not particularly limited, but it is preferable that the thinned device wafer 60a is fixed, and the carrier substrate 12 is pulled up from the end in a direction perpendicular to the thinned device wafer 60a to be peeled off.
- the peeling interface is preferably peeled off at the interface between the carrier substrate 12 and the temporary adhesive layer 11.
- the pulling speed during peeling is preferably 30 to 100 mm / min, and more preferably 40 to 80 mm / min.
- the adhesive strength A at the interface between the carrier substrate 12 and the temporary adhesive layer 11 and the adhesive strength B between the device wafer surface 61a and the temporary adhesive layer 11 preferably satisfy the following expressions.
- the force at the time of raising the edge part in the case of peeling is 0.33 N / mm or less, and can also be 0.2 N / mm or less.
- the lower limit is preferably 0.07 N / mm or more. The force at this time can be measured using a force gauge.
- the thinned device wafer can be obtained by removing the temporary adhesive layer 11 from the thinned device wafer 60a.
- the removal method of the temporary adhesive layer 11 is, for example, a method of removing the temporary adhesive layer using the cleaning composition of the present invention (a method of peeling and removing the temporary adhesive layer after swelling with the cleaning composition of the present invention, A method of spraying and cleaning the cleaning composition of the present invention, a method of dissolving and removing the temporary adhesive layer in the cleaning composition of the present invention), irradiation of the temporary adhesive layer with actinic rays, radiation or heat The method of removing by decomposition, vaporization, etc. is mentioned.
- the method of peeling and removing the temporary adhesive layer in a film state means that the temporary adhesive layer is peeled and removed (peel-off) without performing chemical treatment such as using the cleaning composition of the present invention. How to do.
- peeling by hand or mechanical peeling is preferable.
- the adhesion strength B between the device wafer surface 61a and the temporary adhesive layer 11 satisfies the following formula (B1).
- the stripping solution is a temporary adhesive stripping solution containing water or an organic solvent and does not contain an acid and a base.
- an organic solvent the organic solvent used with the cleaning composition of this invention is illustrated.
- FIG. 2A to 2E are schematic cross-sectional views (FIGS. 2A and 2B) for explaining temporary bonding between the carrier substrate and the device wafer, respectively, and the device wafer temporarily bonded to the carrier substrate.
- This embodiment is different from the first embodiment in that a temporary adhesive layer is formed on the surface 61a of the device wafer as shown in FIG.
- the temporary adhesive layer 11a is provided on the surface 61a of the device wafer 60
- the temporary adhesive is applied (preferably applied) to the surface 61a of the device wafer 60, and then dried (baked). be able to. Drying can be performed, for example, at 60 to 150 ° C. for 10 seconds to 2 minutes.
- FIG. 2B the carrier substrate 12 and the device wafer 60 are pressure-bonded, and the carrier substrate 12 and the device wafer 60 are temporarily bonded.
- FIG. 2B the carrier substrate 12 and the device wafer 60 are pressure-bonded, and the carrier substrate 12 and the device wafer 60 are temporarily bonded.
- the back surface 61b of the silicon substrate 61 is subjected to mechanical or chemical treatment, and the thickness of the silicon substrate 61 is reduced as shown in FIG. Thinning to obtain a thinned device wafer 60a.
- the carrier substrate 12 is peeled from the thinned device wafer 60a.
- the temporary adhesive layer 11a is removed from the thinned device wafer 60a.
- the method for manufacturing a semiconductor device of the present invention is not limited to the above-described embodiment, and appropriate modifications and improvements can be made.
- the silicon substrate is used as the device wafer.
- the present invention is not limited to this, and any device that can be subjected to mechanical or chemical treatment in the method for manufacturing a semiconductor element is described. It may be a processing member.
- the device wafer (silicon substrate) is mechanically or chemically treated as a device wafer thinning process and a through silicon via formation process, but is not limited thereto. Any processing required in the method for manufacturing a semiconductor device is not included.
- the shape, dimension, number, arrangement location, and the like of the device chip in the device wafer exemplified in the above-described embodiment are arbitrary and are not limited.
- each component of the temporary adhesive was mixed into a uniform solution, and then filtered using a polytetrafluoroethylene filter having a pore size of 0.2 ⁇ m to prepare a temporary adhesive.
- ⁇ Composition of cleaning composition >> -Compound 1 listed in Table 1-Amount described in Table 1-Compound 2 described in Table 1: Amount described in Table 1-Solvent described in Table 1: Amount described in Table 1
- Laminate A As a carrier substrate, a disc-shaped silicon wafer having a diameter of 12 inches (1 inch is 2.54 cm) is coated on the surface with the above temporary adhesive (EVG 101, manufactured by Evi Group Japan Co., Ltd.). Was used to form a layer. A temporary adhesive layer was formed on the surface of the carrier substrate by heating at 100 ° C. for 3 minutes using a hot plate (EVG Group Japan, EVG 105), and further heating at 180 ° C. for 3 minutes. A laminate A was obtained. The thickness of the temporary adhesive layer was 60 ⁇ m.
- a processed substrate was obtained in which a titanium layer having a thickness of 10 nm and a copper layer having a thickness of 50 nm were formed in this order on the surface of a disk-shaped silicon wafer having a diameter of 12 inches by sputtering.
- the laminated body A obtained above and the substrate to be processed obtained above were used at a pressure of 1 Pa, a temperature of 200 ° C., and 0.3 MPa using a wafer bonding apparatus (EVG Group Japan, EVG 540). Thermocompression bonding was performed for 1 minute under pressure to obtain a laminate B. At the time of pressure bonding, the copper layer and the temporary adhesive layer were disposed so as to contact each other.
- the laminated body B obtained above is polished to a thickness of 40 ⁇ m using a back grinder (DFG 8540, manufactured by DISCO Corporation) on the back surface (side on which the temporary adhesive layer is not provided) of the substrate to be processed.
- a processed (thinned) laminate C was obtained.
- Temporary bonding performance The surface of the laminate C on which the back grinding process was performed was on the lower side, and the lower silicon wafer was fixed together with the dicing frame at the center of the dicing tape using a dicing tape mounter. Then, using a wafer debonder device (Tokyo Electron Co., Ltd., Synapse Z), the upper silicon wafer is pulled up at a speed of 3 mm / min in a direction perpendicular to the lower silicon wafer at 25 ° C. A laminate D composed of a temporary adhesive layer (or a residue derived from a temporary adhesive) and a substrate to be processed was obtained. It was confirmed whether or not the upper silicon wafer could be peeled without breaking the lower silicon wafer.
- a wafer debonder device Tokyo Electron Co., Ltd., Synapse Z
- the laminate D was obtained by using the temporary adhesive (including the residue derived from the temporary adhesive) of the laminate D obtained by performing the above peeling evaluation. It was removed by feeding the cleaning composition while rotating.
- a Quantera SXM apparatus manufactured by ULVAC-PHI Co., Ltd.
- a monochromatic Al—K ⁇ ray energy value: 1486.6 eV, output: 25 W, voltage
- an X-ray source 15 kV, beam diameter 200 ⁇ m
- Pass Energy 140 eV
- step size 0.1 eV
- the number of integrations was 1 to 3.
- the presence ratio of carbon atoms and silicon atoms was evaluated according to the following criteria.
- ⁇ Abundance ratio of carbon atoms >>> A: Less than 40 mol% of carbon atoms B: More than 40 mol% but less than 50 mol% of carbon atoms C: More than 50 mol% and less than 60 mol% of carbon atoms D: More than 60 mol% of carbon atoms ⁇ Presence ratio of silicon atoms >> A: Silicon atom is less than 0.1 mol% B: Silicon atom is 0.1 mol% or more and less than 1 mol% C: Silicon atom is 1 mol% or more and less than 3 mol% D: Silicon atom is 3 mol% or more
- the temporary adhesive was excellent in removability and there were few residues (Examples 1 to 19).
- the silicone compound was not included in the temporary adhesive (Comparative Example 1), the temporary adhesive performance evaluation was inferior.
- the cleaning composition does not contain an acid and a base (Comparative Examples 2 and 3), and when the acid (ClogP ⁇ pKa) is outside the range of 0 to 10 (Comparative Examples 6 and 7), and When the base (ClogP ⁇ pKb) was outside the range of ⁇ 5 to 0 (Comparative Examples 8 and 9), the abundance of silicon atoms was significantly increased.
- the abundance ratio of carbon atoms was significantly increased (Comparative Examples 4 and 5).
- the kit of the styrenic elastomer, the temporary adhesive containing the polyether-modified silicone having a ratio represented by the formula (A) of 80% or more, and the cleaning composition of the present invention achieve high peelability.
- the residue was also small (Examples 1 to 4, Examples 7 to 19).
- Temporary adhesive layer 12 Carrier substrate 60: Device wafer 60a: Thinned device wafer 61: Silicon substrate 61a: Front surface 61b, 61b1: Back surface 62: Device chip 100: Adhesive carrier substrate
Abstract
Description
本発明はかかる課題を解決するものであって、シリコーン化合物を含む仮接着剤由来の残渣を適切に除去可能な、仮接着剤と洗浄剤組成物とを含むキット、洗浄剤組成物および半導体素子の製造方法を提供することを課題とする。
<1>酸または塩基と、有機溶剤とを含む、洗浄剤組成物と、シリコーン化合物を含む仮接着剤とを含み、上記酸の式(a)で表される値が0~10であり、上記塩基の式(b)で表される値が-5~0である、キット;
式(a) ClogP - pKa
式(b) ClogP - pKb
式(a)および(b)において、ClogPは、1-オクタノール中および水中の平衡濃度の比を表す1-オクタノール/水分配係数であるPを、底10に対する対数logPの形態で表した値を、pKaは酸解離定数を、pKbは塩基解離定数をそれぞれ示している。
<2>上記シリコーン化合物が、シリコーンオイルである、<1>に記載のキット。
<3>上記シリコーン化合物が、ポリエーテル変性シリコーンを含む、<1>または<2>に記載のキット。
<4>上記ポリエーテル変性シリコーンは、式(A)で表される比率が80%以上である、<3>に記載のキット;
式(A) {(MO+EO)/AO}×100
上記式(A)中、MOは、ポリエーテル変性シリコーン中のポリエーテル構造に含まれるメチレンオキシドのモル%であり、EOは、ポリエーテル変性シリコーン中のポリエーテル構造に含まれるエチレンオキシドのモル%であり、AOは、ポリエーテル変性シリコーン中のポリエーテル構造に含まれるアルキレンオキシドのモル%をいう。
<5>上記仮接着剤におけるシリコーン化合物の含有量が0.001~1.0質量%である、<1>~<4>のいずれか1つに記載のキット。
<6>上記仮接着剤がエラストマーを含む、<1>~<5>のいずれか1つに記載のキット。
<7>上記エラストマーがポリスチレン系エラストマーである、<6>に記載のキット。
<8>上記エラストマーの、上記有機溶剤に対する25℃における溶解度が18~40質量%である、<6>または<7>に記載のキット。
<9>上記有機溶剤が、芳香族化合物、飽和脂環式化合物、環式ケトンおよび環式テルペンから選択される少なくとも1種である、<1>~<8>のいずれか1つに記載のキット。
<10>上記洗浄剤組成物が酸を含み、上記酸がリン酸、ホスホン酸、ホスフィン酸、スルホン酸およびカルボン酸から選択される少なくとも1種である、<1>~<9>のいずれか1つに記載のキット。
<11>上記洗浄剤組成物が塩基を含み、上記塩基が脂肪族アミン、芳香族アミンおよび複素環式アミンから選択される少なくとも1種である、<1>~<9>のいずれか1つに記載のキット。
<12>上記酸または塩基と、上記有機溶剤の質量比が0.0001:99.9999~50:50である、<1>~<11>のいずれか1つに記載のキット。
<13>酸または塩基と、有機溶剤とを含み、上記酸の式(a)で表される値が0~10であり、上記塩基の式(b)で表される値が-5~0であるシリコーン化合物を含む仮接着剤用の洗浄剤組成物;
式(a) ClogP - pKa
式(b) ClogP - pKb
式(a)および(b)において、ClogPは、1-オクタノール中および水中の平衡濃度の比を表す1-オクタノール/水分配係数であるPを、底10に対する対数logPの形態で表した値を、pKaは酸解離定数を、pKbは塩基解離定数をそれぞれ示している。
<14>上記有機溶剤が、芳香族化合物、飽和脂環式化合物、環式ケトンおよび環式テルペンから選択される少なくとも1種である、<13>に記載の洗浄剤組成物。
<15>上記洗浄剤組成物が酸を含み、上記酸がリン酸、ホスホン酸、ホスフィン酸、スルホン酸およびカルボン酸から選択される少なくとも1種である、<13>または<14>に記載の洗浄剤組成物。
<16>上記洗浄剤組成物が塩基を含み、上記塩基が脂肪族アミン、芳香族アミンおよび複素環式アミンから選択される少なくとも1種である、<13>または<14>に記載の洗浄剤組成物。
<17>上記酸または塩基と、上記有機溶剤の質量比が0.0001:99.9999~50:50である、<13>~<16>のいずれか1つに記載の洗浄剤組成物。
<18>上記シリコーン化合物が、ポリエーテル変性シリコーンを含み、上記ポリエーテル変性シリコーンは、式(A)で表される比率が80%以上であり、上記仮接着剤におけるシリコーン化合物の含有量が0.001~1.0質量%であり、上記仮接着剤がポリスチレン系エラストマーを含む、<13>~<17>のいずれか1つに記載の洗浄剤組成物;
式(A) {(MO+EO)/AO}×100
上記式(A)中、MOは、ポリエーテル変性シリコーン中のポリエーテル構造に含まれるメチレンオキシドのモル%であり、EOは、ポリエーテル変性シリコーン中のポリエーテル構造に含まれるエチレンオキシドのモル%であり、AOは、ポリエーテル変性シリコーン中のポリエーテル構造に含まれるアルキレンオキシドのモル%をいう。
<19>シリコーン化合物を含む仮接着剤を、酸または塩基と、有機溶剤とを含み、上記酸の式(a)で表される値が0~10であり、上記塩基の式(b)で表される値が-5~0である洗浄剤組成物を用いて除去することを含む、半導体素子の製造方法;
式(a) ClogP - pKa
式(b) ClogP - pKb
式(a)および(b)において、ClogPは、1-オクタノール中および水中の平衡濃度の比を表す1-オクタノール/水分配係数であるPを、底10に対する対数logPの形態で表した値を、pKaは酸解離定数を、pKbは塩基解離定数をそれぞれ示している。
<20>上記シリコーン化合物が、シリコーンオイルである、<19>に記載の半導体素子の製造方法。
<21>上記シリコーン化合物が、ポリエーテル変性シリコーンを含む、<19>または<20>に記載の半導体素子の製造方法。
<22>上記ポリエーテル変性シリコーンは、式(A)で表される比率が80%以上である、<21>に記載の半導体素子の製造方法;
式(A) {(MO+EO)/AO}×100
上記式(A)中、MOは、ポリエーテル変性シリコーン中のポリエーテル構造に含まれるメチレンオキシドのモル%であり、EOは、ポリエーテル変性シリコーン中のポリエーテル構造に含まれるエチレンオキシドのモル%であり、AOは、ポリエーテル変性シリコーン中のポリエーテル構造に含まれるアルキレンオキシドのモル%をいう。
<23>上記仮接着剤におけるシリコーン化合物の含有量が0.001~1.0質量%である、<19>~<22>のいずれか1つに記載の半導体素子の製造方法。
<24>上記仮接着剤がエラストマーを含む、<19>~<23>のいずれか1つに記載の半導体素子の製造方法。
<25>上記エラストマーがポリスチレン系エラストマーである、<24>に記載の半導体素子の製造方法。
<26>上記エラストマーの、上記有機溶剤に対する25℃における溶解度が18~40質量%である、<24>または<25>に記載の半導体素子の製造方法。
<27>上記有機溶剤が、芳香族化合物、飽和脂環式化合物、環式ケトンおよび環式テルペンから選択される少なくとも1種である、<19>~<26>のいずれか1つに記載の半導体素子の製造方法。
<28>上記洗浄剤組成物が酸を含み、上記酸がリン酸、ホスホン酸、ホスフィン酸、スルホン酸およびカルボン酸から選択される少なくとも1種である、<19>~<27>のいずれか1つに記載の半導体素子の製造方法。
<29>上記洗浄剤組成物が塩基を含み、上記塩基が脂肪族アミン、芳香族アミンおよび複素環式アミンから選択される少なくとも1種である、<19>~<27>のいずれか1つに記載の半導体素子の製造方法。
<30>上記仮接着剤がキャリア基板と被加工基板の仮接着に用いられ、上記洗浄剤組成物で除去する仮接着剤は、上記キャリア基板を剥離した後の被加工基板上に残る仮接着剤、および、上記キャリア基板を剥離し、さらに、仮接着剤をピールオフした後の被加工基板上に残る仮接着剤である、<19>~<29>のいずれか1つに記載の半導体素子の製造方法。
本明細書における基(原子団)の表記において、置換および無置換を記していない表記は、置換基を有さないものと共に置換基を有するものをも包含するものである。例えば、「アルキル基」とは、置換基を有さないアルキル基(無置換アルキル基)のみならず、置換基を有するアルキル基(置換アルキル基)をも包含するものである。
本明細書中における「活性光線」または「放射線」は、例えば、可視光線、紫外線、遠紫外線、電子線、X線等を含むものを意味する。
本明細書において「露光」とは、特に断らない限り、光を用いた露光のみならず、電子線、イオンビーム等の粒子線を用いた描画も露光に含める。また、露光に用いられる光としては、一般的に、水銀灯の輝線スペクトル、エキシマレーザーに代表される遠紫外線、極紫外線(EUV光)、X線、電子線等の活性光線または放射線が挙げられる。
本明細書において、全固形分とは、組成物から溶剤を除いた成分の総質量をいう。
本明細書において、「(メタ)アクリレート」は、アクリレートおよびメタクリレートを表し、「(メタ)アクリル」は、アクリルおよびメタクリルを表し、「(メタ)アクリロイル」は、「アクリロイル」および「メタクリロイル」を表す。
本明細書において、重量平均分子量および数平均分子量は、ゲルパーミエーションクロマトグラフィー(GPC)測定によるポリスチレン換算値として定義される。本明細書において、重量平均分子量(Mw)および数平均分子量(Mn)は、例えば、HLC-8220GPC(東ソー(株)製)を用い、カラムとしてTSKgel Super AWM―H(東ソー(株)製、内径(ID)6.0mm×15.0cm)を用い、溶離液として10mmol/L リチウムブロミドNMP(N-メチルピロリドン)溶液を用いることによって求めることができる。
なお、以下に説明する実施の形態において、既に参照した図面において説明した部材等については、図中に同一符号あるいは相当符号を付すことにより説明を簡略化あるいは省略化する。
式(a) ClogP - pKa
式(b) ClogP - pKb
式(a)および(b)において、ClogPは、1-オクタノール中および水中の平衡濃度の比を表す1-オクタノール/水分配係数であるPを、底10に対する対数logPの形態で表した値を、pKaは酸解離定数を、pKbは塩基解離定数をそれぞれ示している。
上記洗浄剤組成物を用いることにより、シリコーン化合物を含む仮接着剤であっても、残渣を効果的に少なくすることができる。
以下、洗浄剤組成物と、仮接着剤について、詳細に説明する。
本発明における洗浄剤組成物は、シリコーン化合物を含む仮接着剤用の洗浄剤組成物であって、酸または塩基と、有機溶剤を含むことを特徴とする。
ここで、仮接着剤とは、基板と基板を仮接着するために用いる接着剤をいう。基板の例としては、キャリア基板と被加工基板(例えば、デバイスウェハ)である。キャリア基板は、被加工基板の加工の際に、被加工基板をキャリア基板に仮接着して、被加工基板の加工を容易にするものである。これらの詳細は後述する。
仮接着剤由来の残渣は、通常、適切な有機溶剤を選択すれば、有機溶剤である程度除去できる。しかしながら、シリコーン化合物を含む仮接着剤の場合、シリコーン化合物由来の残渣は、有機溶剤のみでは十分に除去できないことが分かった。シリコーン化合物由来の残渣は、その後に積層する絶縁層の剥がれの原因ともなる。本発明では、酸または塩基と、有機溶剤を含む洗浄剤組成物を用いることにより、シリコーン化合物を含む仮接着剤を適切に除去することができる。
洗浄剤組成物が酸を含む場合、酸の式(a)で表される値が、0~10でであることが好ましく、0.5~10であることがより好ましく、1~10であることがさらに好ましく、1.5~9が一層好ましく、2~8がより一層好ましい。このような範囲とすることにより、シリコーン化合物由来の残渣の除去性が向上する。
式(a) ClogP - pKa
ここでClogPは、1-オクタノール中および水中の平衡濃度の比を表す1-オクタノール/水分配係数であるPを、底10に対する対数logPの形態で表した値を、pKaは酸解離定数をそれぞれ示している。
リン酸としては、リン酸メチル、リン酸ジメチル、リン酸エチル、リン酸ジエチル、リン酸ブチル、リン酸ジブチル、リン酸ブトキシエチル、リン酸2-エチルヘキシルなどのモノアルキルリン酸またはジアルキルリン酸が例示される。
ホスホン酸としては、ビニルホスホン酸、メチレンジホスホン酸、エチルホスホン酸、プロピルホスホン酸、1,3-プロピレンジホスホン酸、ブチルホスホン酸、1,4-ブチレンジホスホン酸、ペンチルホスホン酸、1,5-ペンチレンジホスホン酸、ヘキシルホスホン酸、1,6-ジヘキシレンホスホン酸、オクチルホスホン酸、デシルホスホン酸、ドデシルホスホン酸などのアルキルホスホン酸、フェニルホスホン酸、フェニレンジホスホン酸、キシリレンジホスホン酸、(4-ヒドロキシフェニル)ホスホン酸、(2-フェニルエチル)ホスホン酸、o-キシレンジホスホン酸、ベンズヒドリルホスホン酸、シンナミルホスホン酸、(4-ヒドロキシベンジル)ホスホン酸などの芳香族ホスホン酸が例示される。
ホスフィン酸としては、フェニルホスフィン酸、1-アニリノ-1-メチルエチルホスフィン酸、1-(2-(n-エチルアニリノ)-エチルアミノ)-イソプロピルホスフィン酸、トリチルホスフィン酸が例示される。
スルホン酸としては、メタンスルホン酸、エタンスルホン酸、トリフルオロメタンスルホン酸、ビニルスルホン酸、1,5-プロパンジスルホン酸、3-ヒドロキシプロパンスルホン酸、ベンゼンスルホン酸、p-トルエンスルホン酸、p-エチルベンゼンスルホン酸、n-ドデシルベンゼンスルホン酸、2,4,5-トリメチルベンゼンスルホン酸、ノナフルオロ-1-ブタンスルホン酸、2-ナフタレンスルホン酸、1,5-ナフタレンジスルホン酸、ヘプタデカフルオロオクタスルホン酸、10-カンファースルホン酸、3-シクロヘキシルアミノプロパンスルホン酸、m-キシレン-4-スルホン酸、p-キシレン-2-スルホン酸、ダンシル酸、4,4’-ビフェニルジスルホン酸、8-アニリノ-1-ナフタレンスルホン酸、2-モルホリノエタンスルホン酸、3-モルホリノプロパンスルホン酸、ピペラジン-1,4-ビス(2-ヒドロキシプロパンスルホン酸)、7-アニリノ-4-ヒドロキシ-2-ナフタレンスルホン酸、7-アニリノ-1-ナフトール-3-スルホン酸、4-スルホフタル酸、2-ヒドロキシ-3-モルホリノプロパンスルホン酸、4-ニトロトルエン-2-スルホン酸、ピクリルスルホン酸、5-スルホサリチル酸、4-スルホ-2,3,5,6-テトラフルオロ安息香酸、5-スルホサリチル酸が例示される。
カルボン酸としては、ギ酸、酢酸、プロピオン酸、酪酸、吉草酸、カプロン酸、エナント酸、カプリル酸、ペラルゴン酸、カプリン酸、ラウリン酸、ミリスチン酸、パルミチン酸、マルガリン酸、ステアリン酸などの飽和脂肪酸、オレイン酸、リノール酸、リノレン酸、アラキドン酸、エイコサペンタエン酸、ドコサヘキサエン酸、ソルビン酸などの不飽和脂肪酸、乳酸、リンゴ酸、クエン酸などのヒドロキシ酸、安息香酸、フタル酸、イソフタル酸、テレフタル酸、サリチル酸、3,4,5-トリヒドロキシ安息香酸、メリト酸、ケイ皮酸などの芳香族カルボン酸、シュウ酸、マロン酸、コハク酸、グルタル酸、アジピン酸、フマル酸、マレイン酸などのジカルボン酸、アコニット酸などのトリカルボン酸、ピルビン酸、オキサロ酢酸などのオキソカルボン酸、クロロ酢酸、ジクロロ酢酸、トリクロロ酢酸、トリフルオロ酢酸などのハロゲン含有カルボン酸が例示される。
本発明の洗浄剤組成物における、酸の含有量の上限値は、洗浄剤組成物の1.0質量%以下が好ましく、0.8質量%以下がより好ましく、0.5質量%以下がさらに好ましく、0.3質量%以下が一層好ましい。
本発明の洗浄剤組成物は、酸を含む場合、1種のみ含んでいてもよいし、2種以上含んでいてもよい。2種以上含む場合は、合計量が上記範囲となることが好ましい。
洗浄剤組成物が塩基を含む場合、塩基の式(b)で表される値が、-5~0であり、-4.5~0であることが好ましく、-4~0であることがより好ましく、-3.5~0であることがさらに好ましく、-3~0であることが一層好ましく、-2.5~-0.5であることがより一層好ましく、-2~-1であることがさらに一層好ましい。
式(b) ClogP - pKb
ここでClogPは、1-オクタノール中および水中の平衡濃度の比を表す1-オクタノール/水分配係数であるPを、底10に対する対数logPの形態で表した値を、pKbは塩基解離定数をそれぞれ示している。
脂肪族アミンとしては、メチルアミン、ジメチルアミン、トリメチルアミン、エチルアミン、ジエチルアミン、トリエチルアミン、エチレンジアミン、トリエタノールアミン、N,N-ジイソプロピルエチルアミン、テトラメチルエチレンジアミン、ヘキサメチレンジアミン、スペルミジン、スペルミン、アマンタジン、ジエタノールアミンが例示される。
芳香族アミンとしては、アニリン、フェネチルアミン、トルイジン、カテコールアミン、1,8-ビス(ジメチルアミノ)ナフタレンが例示される。
複素環式アミンとしては、ピロリジン、ピペリジン、ピペラジン、モルホリン、キヌクリジン、ピロール、ピラゾール、イミダゾール、ピリジン、ピリダジン、ピリミジン、ピラジン、オキサゾール、チアゾール、4-ジメチルアミノピリジン、1,4-ジアザビシクロ[2,2,2]オクタン、1,5-ジアザビシクロ[4,3,0]-5-ノネン、1,8-ジアザビシクロ[5,4,0]-7-ウンデセンが例示される。
本発明の洗浄剤組成物における、塩基の含有量の上限値は、洗浄剤組成物の1.0質量%以下が好ましく、0.8質量%以下がより好ましく、0.5質量%以下がさらに好ましく、0.3質量%以下が一層好ましい。
本発明の洗浄剤組成物は、塩基を含む場合、1種のみ含んでいてもよいし、2種以上含んでいてもよい。2種以上含む場合は、合計量が上記範囲となることが好ましい。
本発明の洗浄剤組成物は、有機溶剤を含む。有機溶剤は、仮接着剤、例えば、仮接着剤の樹脂成分を溶解する有機溶剤が用いられ、芳香族化合物、飽和脂環式化合物、環式ケトンおよび環式テルペンから選択される少なくとも1種であることが好ましく、芳香族化合物、脂環式化合物および環式テルペンから選択される少なくとも1種であることがより好ましく、芳香族化合物から選択される少なくとも1種であることがさらに好ましい。
芳香族化合物としては、ベンゼン、トルエン、キシレン、エチルベンゼン、クメン、n-ブチルベンゼン、s-ブチルベンゼン、t-ブチルベンゼン、スチレン、メシチレン、1,2,4-トリメチルベンゼン、p-シメン、シクロヘキシルベンゼン、ジエチルベンゼン、ペンチルベンゼン、ジペンチルベンゼン、ドデシルベンゼン、エチニルベンゼン、テトラリン、アニソール、フェネトール、ブチルフェニルエーテル、ペンチルフェニルエーテル、ベラトロール、1,3-ジメトキシベンゼン、1,2,4-トリメトキシベンゼン、3,4,5-トリメトキシトルエン、2-メトキシトルエン、2,5-ジメチルアニソール、o-クロロフェノール、クロロベンゼン、ジクロロベンゼン、トリクロロベンゼン、1-クロロナフタレン、1-ブロモナフタレン、1-メチルナフタレン、o-ジヨードベンゼン、アセトフェノン、2,3-ベンゾフラン、2,3-ジヒドロベンゾフラン、1,4-ベンゾジオキサン、酢酸フェニル、安息香酸メチル、クレゾール、アニリン、ニトロベンゼンが例示される。
飽和脂環式化合物としては、シクロプロパン、シクロブタン、シクロペンタン、シクロヘキサン、メチルシクロヘキサン、シクロヘプタン、シクロオクタン、シクロノナン、シクロデカン、シクロウンデカン、シクロドデカン、シクロブテン、シクロプロペン、シクロヘキセン、シクロヘプテン、シクロオクテン、ビシクロウンデカン、デカヒドロナフタレン、ノルボルネン、ノルボルナジエン、キュバン、バスケタン、ハウサンが例示される。
環式ケトンとしては、シクロヘキサノン、シクロペンタノン、イソホロン、アセトフェノン、ベンゾフェノンが例示される。
環式テルペンとしては、クリサンテモール、グランジソール、ジュニオノン、チオテルピネオール、イリドイド、セコイリドイド、メンタン、リモネン、フェランドレン、テルピノレン、テルピネン、シメン、テルピノレン、テルピネン、メントール、プレゴール、ピペリトール、テルピネオール、カルベオール、チモール、ジヒドロカルベオール、メントン、プレゴン、フェランドラール、カルボン、カルベノン、ピペリトン、1,8-シネオール、1,4-シネオール、アスカリドールなどの単環式テルペン、カラン、ツジャン、ピナン、ボルナン、フェンカン、イソボルナン、イソカンファン、3-カレン、ツジェン、サビネン、ツジョン、ツジャノール、ピネン、ベルベノール、ベルベノン、ピノカルボン、カンファー、ボルネオール、イソボルネオール、フェンコン、フェンコールフェンケンなどの二環式テルペンが例示される。
本発明の洗浄剤組成物は、有機溶剤を含む場合、1種のみ含んでいてもよいし、2種以上含んでいてもよい。2種以上含む場合は、合計量が上記範囲となることが好ましい。
本発明の洗浄剤組成物は、酸または塩基と、有機溶剤の質量比が0.0001:99.9999~50:50であることが好ましく、0.0010:99.9990~10:90であることがより好ましく、0.0100:99.9900~1.0000:99.0000であることがさらに好ましい。このような範囲とすることにより、仮接着剤の除去性がより効果的に向上する。
洗浄剤組成物は、上記酸または塩基と、有機溶剤以外の成分を含んでいてもよい。他の成分としては、トリポリリン酸ナトリウム、ピロリン酸-4-ナトリウム、ピロリン酸カリウム、ケイ酸アルミニウムナトリウム、ニトリロ三酢酸ナトリウム、エチレンジアミン四酢酸、クエン酸ナトリウムなどの洗浄助剤、硫酸ナトリウムなどのミセル増強剤、ケイ酸ナトリウムや炭酸ナトリウムなどの無機アルカリ成分、IRGAMET 30、IRGAMET 39、IRGAMET 42(以上、BASFジャパン(株)製)、Belclene 510、Belclene 511、Belclene 512、Belclene 515(以上、BWA Water Additives社製)、BT-120、BT-LX、CBT-1、TT-LX、TT-LYK、JCL-400(以上、城北化学工業(株)製)、VERZONE Crystal #120、VERZONE MA-10、VERZONE A3-T、VERZONE Crystal #130、VERZONE Crystal #150、VERZONE Crystal #270、VERZONE Crystal #260、VERZONE SG Powder、VERZONE グリーン SH-K、VERZONE Oil #1022、VERZONE Origin Oil #1030、VERZONE Origin Oil #220、VERZONE OIL-HD、VERZONE OIL-U(以上、大和化成(株)製)、トップ防錆剤Y、トップ防錆剤511(以上、奥野製薬工業(株)製)CBブライト(菱江化学(株)製)などの防錆剤、IRGACOR L12、IRGACOR DSS G、IRGACOR NPA、IRGALUBE 349、SARKOSYL O(以上、BASFジャパン(株)製)などの腐食防止剤、VERZONE COR-280、シルバーリップ、VERZONE DA-1、New Dain Silver S-1、New Dain Silver V-2、New Dain Silver、シーユーガード 1000R、シーユーガード 1000N、シーユーガード 1000、シーユーガード D、VERZONE NFS-Oil、VERZONE OA-386、VERZONE C-BTA、VERZONE TTA、VERZONE Crystal #120(以上、大和化成(株)製)、Cu-423Y、Ag-422Y、Ag-420Y(以上、ディップソール(株)製)、エンテックCU-560、エンテックCU-56、メルディップAG-6801(以上、メルテックス(株)製)、トップリンスCU-5、トップリンス CU-3(以上、奥野製薬工業(株)製)、BT-5、BT-7、BT-8、BT-14(以上、(株)ASAHI製)などの金属表面の変色防止剤、CU-500、CU-600(以上、(株)ASAHI製)、エスクリーンS-800、エスクリーンS-800FR、エスクリーンS-101PN、エスピュアSJ-400、エスピュアSJジェル、エスクリーンSK-507、エスクリーンW-2550、エスクリーンS-105、エスクリーンS-109、エスクリーンAG-301、エスクリーンS-1000(以上、佐々木化学薬品(株)製)、ピクル25、ピクル27、Z-2218(日本表面化学(株)製)などの金属酸化膜除去剤、帯電防止剤、酸化防止剤、界面活性剤が例示される。
また、本発明で用いる仮接着剤は、界面活性剤を実質的に含まない態様とすることもできる。さらに、本発明で用いる仮接着剤は、上記酸または塩基と、有機溶剤以外の成分を実質的に含まない態様とすることもできる。実質的に含まないとは、他の成分の含有量が、本発明の洗浄剤組成物の3質量%以下であることをいい、1質量%以下であることが好ましく、0.5質量%以下であることがより好ましい。
本発明の洗浄剤組成物の調製は、洗浄剤組成物の各成分を混合した後、ろ過を行うことが好ましい。ろ過は、孔径が0.003~10μmのフィルタを用いることが好ましい。ろ過を行うことにより、仮接着剤の除去性がより向上する傾向にある。フィルタは、ポリテトラフルオロエチレン製であることが好ましい。
<<シリコーン化合物>>
本発明で用いる仮接着剤は、シリコーン化合物を含む。シリコーン化合物は、離型剤として働き、仮接着剤を被加工基板から容易に除去することが可能になる。
シリコーン化合物としては、Si-O結合を含む化合物であり、シリコーンオイル、シランカップリング剤、シリコーン樹脂、シリコーンゴム、環状シロキサンなどが例示され、シリコーンオイルが好ましい。
また、シリコーン化合物は、重合性基などの反応性基を含まないことが好ましい。
シリコーン化合物は、ポリエーテル変性シリコーンであることが好ましい。
式(A) {(MO+EO)/AO}×100
上記式(A)中、MOは、ポリエーテル変性シリコーン中のポリエーテル構造に含まれるメチレンオキシドのモル%であり、EOは、ポリエーテル変性シリコーン中のポリエーテル構造に含まれるエチレンオキシドのモル%であり、AOは、ポリエーテル変性シリコーン中のポリエーテル構造に含まれるアルキレンオキシドのモル%をいう。
上記式(A)で表される比率は、90%以上であることが好ましく、95%以上であることがより好ましく、98%以上であることがさらに好ましく、99%以上であることが一層好ましく、100%がより一層好ましい。
式(101)
式(102)
式(103)
式(104)
上記式(101)中、R12およびR14は、それぞれ独立に、2価の連結基であり、カルボニル基、酸素原子、炭素数1~6のアルキレン基、炭素数6~16のシクロアルキレン基、炭素数2~8のアルケニレン基、炭素数2~5のアルキニレン基、および炭素数6~10のアリーレン基が好ましく、酸素原子がより好ましい。
式(101)中、R13およびR15は、水素原子または炭素数1~5のアルキル基であり、水素原子または炭素数1~4のアルキル基が好ましく、水素原子または炭素数1~3のアルキル基がより好ましい。
上記式(102)中、R22は、2価の連結基であり、式(101)におけるR12と同義であり、好ましい範囲も同様である。
上記式(102)中、R23は、水素原子または炭素数1~5のアルキル基であり、式(101)におけるR13およびR15と同義であり、好ましい範囲も同様である。
上記式(103)中、R32およびR34は、それぞれ独立に、2価の連結基であり、式(101)におけるR12と同義であり、好ましい範囲も同様である。
上記式(103)中、R33およびR35は、水素原子または炭素数1~5のアルキル基であり、式(101)におけるR13およびR15と同義であり、好ましい範囲も同様である。
上記式(104)中、R47は、2価の連結基であり、式(101)におけるR12と同義であり、好ましい範囲も同様である。
上記式(104)中、R48は、水素原子または炭素数1~5のアルキル基であり、式(101)におけるR13およびR15と同義であり、好ましい範囲も同様である。
ポリオキシアルキレン基の含有率は、「{(1分子中のポリオキシアルキレン基の式量)/1分子の分子量}×100」で定義される。
さらに、シランカップリング剤の例としては、特開昭62-36663号、特開昭61-226746号、特開昭61-226745号、特開昭62-170950号、特開昭63-34540号、特開平7-230165号、特開平8-62834号、特開平9-54432号、特開平9-5988号、特開2001-330953号各公報に記載の界面活性剤も挙げられ、これらの記載は本明細書に組み込まれる。
例えば、「ADVALON FA33」、「FLUID L03」、「FLUID L033」、「FLUID L051」、「FLUID L053」、「FLUID L060」、「FLUID L066」、「IM22」、「WACKER-Belsil DMC 6038」(以上、旭化成ワッカーシリコーン(株)製)、「KF-352A」、「KF-353」、「KF-615A」、「KP-112」、「KP-341」、「X-22-4515」、「KF-354L」、「KF-355A」、「KF-6004」、「KF-6011」、「KF-6011P」、「KF-6012」、「KF-6013」、「KF-6015」、「KF-6016」、「KF-6017」、「KF-6017P」、「KF-6020」、「KF-6028」、「KF-6028P」、「KF-6038」、「KF-6043」、「KF-6048」、「KF-6123」、「KF-6204」、「KF-640」、「KF-642」、「KF-643」、「KF-644」、「KF-945」、「KP-110」、「KP-355」、「KP-369」、「KS-604」、「Polon SR-Conc」、「X-22-4272」、「X-22-4952」(以上、信越化学工業(株)製)、「8526 ADDITIVE」、「FZ-2203」、「FZ-5609」、「L-7001」、「SF 8410」、「2501 COSMETIC WAX」、「5200 FORMULATION AID」、「57 ADDITIVE」、「8019 ADDITIVE」、「8029 ADDITIVE」、「8054 ADDITIVE」、「BY16-036」、「BY16-201」、「ES-5612 FORMULATION AID」、「FZ-2104」、「FZ-2108」、「FZ-2123」、「FZ-2162」、「FZ-2164」、「FZ-2191」、「FZ-2207」、「FZ-2208」、「FZ-2222」、「FZ-7001」、「FZ-77」、「L-7002」、「L-7604」、「SF8427」、「SF8428」、「SH 28 PAINR ADDITIVE」、「SH3749」、「SH3773M」、「SH8400」、「SH8700」(以上、東レ・ダウコーニング(株)製)、「BYK-378」、「BYK-302」、「BYK-307」、「BYK-331」、「BYK-345」、「BYK-B」、「BYK-347」、「BYK-348」、「BYK-349」、「BYK-377」(以上、ビックケミー・ジャパン(株)製)、「Silwet L-7001」、「Silwet L-7002」、「Silwet L-720」、「Silwet L-7200」、「Silwet L-7210」、「Silwet L-7220」、「Silwet L-7230」、「Silwet L-7605」、「TSF4445」、「TSF4446」、「TSF4452」、「Silwet Hydrostable 68」、「Silwet L-722」、「Silwet L-7280」、「Silwet L-7500」、「Silwet L-7550」、「Silwet L-7600」、「Silwet L-7602」、「Silwet L-7604」、「Silwet L-7607」、「Silwet L-7608」、「Silwet L-7622」、「Silwet L-7650」、「Silwet L-7657」、「Silwet L-77」、「Silwet L-8500」、「Silwet L-8610」、「TSF4440」、「TSF4441」、「TSF4450」、「TSF4460」(以上、モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社製)が例示される。
また、シリコーン化合物としては、商品名「BYK-300」、「BYK-306」、「BYK-310」、「BYK-315」、「BYK-313」、「BYK-320」、「BYK-322」、「BYK-323」、「BYK-325」、「BYK-330」、「BYK-333」、「BYK-337」、「BYK-341」、「BYK-344」、「BYK-370」、「BYK-375」、「BYK-UV3500」、「BYK-UV3510」、「BYK-UV3570」、「BYK-3550」、「BYK-SILCLEAN3700」、「BYK-SILCLEAN3720」(以上、ビックケミー・ジャパン(株)製)、商品名「AC FS 180」、「AC FS 360」、「AC S 20」(以上、Algin Chemie製)、商品名「ポリフローKL-400X」、「ポリフローKL-400HF」、「ポリフローKL-401」、「ポリフローKL-402」、「ポリフローKL-403」、「ポリフローKL-404」、「ポリフローKL-700」(以上、共栄社化学(株)製)、商品名「KP-301」、「KP-306」、「KP-109」、「KP-310」、「KP-310B」、「KP-323」、「KP-326」、「KP-341」、「KP-104」、「KP-110」、「KP-112」、「KP-360A」、「KP-361」、「KP-354」、「KP-357」、「KP-358」、「KP-359」、「KP-362」、「KP-365」、「KP-366」、「KP-368」、「KP-330」、「KP-650」、「KP-651」、「KP-390」、「KP-391」、「KP-392」(以上、信越化学工業(株)製)、商品名「LP-7001」、「LP-7002」、「8032 ADDITIVE」、「FZ-2110」、「FZ-2105」、「67 ADDITIVE」、「8618 ADDITIVE」、「3 ADDITIVE」、「56 ADDITIVE」(以上、東レ・ダウコーニング(株)製)、「TEGO WET 270」(エボニック・デグサ・ジャパン(株)製)、「NBX-15」((株)ネオス製)なども使用することができる。
本発明で用いる仮接着剤は、シリコーン化合物を1種のみ含んでいてもよく、2種以上含んでいてもよい。2種以上含む場合、合計量が上記範囲となることが好ましい。
本発明では、シリコーン化合物以外の他の離型剤を含んでいてもよい。他の離型剤としては、フッ素系液体状化合物が例示される。
他の離型剤を含有する場合、その含有量は、0.001~0.005質量%の範囲が好ましい。これらの他の離型剤は、1種のみ含んでいてもよいし、2種以上含んでいてもよい。2種以上含む場合、合計量が上記範囲となることが好ましい。
また、本発明では、他の離型剤を実質的に含まない構成とすることができる。実質的に含まないとは、シリコーン化合物の含有量の1質量%以下であることをいう。
本発明で用いる仮接着剤は、樹脂を少なくとも1種含むことが好ましい。
樹脂は、ブロック共重合体、ランダム共重合体、グラフト共重合体が挙げられ、ブロック共重合体が好ましい。ブロック共重合体であれば、加熱プロセス時の仮接着剤の流動を抑えることができるため、加熱プロセス時においても接着を維持でき、また加熱プロセス後でも剥離性が変化しないという効果が期待できる。
なお、本明細書において、エラストマーとは、弾性変形を示す高分子化合物を表す。すなわち外力を加えたときに、その外力に応じて瞬時に変形し、かつ外力を除いたときには、短時間に元の形状を回復する性質を有する高分子化合物と定義する。
本発明において、エラストマーの重量平均分子量は、2,000~200,000が好ましく、10,000~200,000がより好ましく、50,000~100,000がさらに好ましい。重量平均分子量がこの範囲にあるエラストマーは、溶剤への溶解性が優れるため、キャリア基板を被加工基板から剥離した後、溶剤を用いて、被加工基板やキャリア基板の上に残存するエラストマー由来の残渣を除去する際、残渣が容易に溶剤に溶解して除去される。このため、被加工基板やキャリア基板などに残渣が残らないなどの利点がある。
本発明におけるエラストマーは、元の大きさを100%としたときに、室温(20℃)において小さな外力で200%まで変形させることができ、かつ外力を除いたときに、短時間で130%以下に戻る性質を有することが好ましい。
ポリスチレン系エラストマーとしては、特に制限はなく、目的に応じて適宜選択することができる。例えば、スチレン-ブタジエン-スチレンブロック共重合体(SBS)、スチレン-イソプレン-スチレンブロック共重合体(SIS)、ポリスチレン-ポリ(エチレン-プロピレン)ジブロック共重合体(SEP)、ポリスチレン-ポリ(エチレン-プロピレン)-ポリスチレントリブロック共重合体(SEPS)、ポリスチレン-ポリ(エチレン-ブチレン)-ポリスチレントリブロック共重合体(SEBS)、ポリスチレン-ポリ(エチレン/エチレン-プロピレン)-ポリスチレントリブロック共重合体(SEEPS)から選ばれる少なくとも1種のポリスチレン系エラストマーであることが好ましい。
また、上記エラストマーBは、比較的硬い材料であるため、エラストマーBを含むことで、剥離性に優れた仮接着剤とすることができる。
また、ポリスチレン系エラストマーは水添物であると、熱に対する安定性が向上し、分解や重合等の変質が起こりにくい。さらに、溶剤への溶解性およびレジスト溶剤への耐性の観点からもより好ましい。
ポリスチレン系エラストマーの不飽和二重結合量としては、剥離性の観点から、ポリスチレン系エラストマー1gあたり、15mmol未満であることが好ましく5mmol未満であることがより好ましく、0.5mmol未満であることがさらに好ましい。なお、ここでいう不飽和二重結合量は、スチレン由来のベンゼン環内の不飽和二重結合の量を含まない。不飽和二重結合量は、NMR(核磁気共鳴)測定により算出することができる。
ポリエステル系エラストマーとしては、特に制限はなく、目的に応じて適宜選択することができる。例えば、ジカルボン酸またはその誘導体と、ジオール化合物またはその誘導体とを重縮合して得られるものが挙げられる。
ジカルボン酸としては、例えば、テレフタル酸、イソフタル酸、ナフタレンジカルボン酸等の芳香族ジカルボン酸およびこれらの芳香環の水素原子がメチル基、エチル基、フェニル基等で置換された芳香族ジカルボン酸、アジピン酸、セバシン酸、ドデカンジカルボン酸等の炭素数2~20の脂肪族ジカルボン酸、およびシクロヘキサンジカルボン酸などの脂環式ジカルボン酸などが挙げられる。これらは、1種単独で使用してもよく、2種以上併用してもよい。
ジオール化合物としては、例えば、エチレングリコール、1,3-プロパンジオール、1,4-ブタンジオール、1,6-ヘキサンジオール、1,10-デカンジオール、1,4-シクロヘキサンジオールなどの脂肪族ジオール、脂環式ジオール、下記構造式で表される2価のフェノールなどが挙げられる。
また、ポリエステル系エラストマーとして、芳香族ポリエステル(例えば、ポリブチレンテレフタレート)部分をハードセグメント成分に、脂肪族ポリエステル(例えば、ポリテトラメチレングリコール)部分をソフトセグメント成分にしたマルチブロック共重合体を用いることもできる。マルチブロック共重合体としては、ハードセグメントとソフトセグメントとの種類、比率、および分子量の違いによりさまざまなグレードのものが挙げられる。具体例としては、ハイトレル(東レ・デュポン(株)製)、ペルプレン(東洋紡(株)製)、プリマロイ(三菱化学(株)製)、ヌーベラン(帝人(株)製)、エスペル1612、1620(以上、日立化成工業(株)製)などが挙げられる。
ポリオレフィン系エラストマーとしては、特に制限はなく、目的に応じて適宜選択することができる。例えば、エチレン、プロピレン、1-ブテン、1-ヘキセン、4-メチル-1-ペンテン等の炭素数2~20のα-オレフィンの共重合体などが挙げられる。例えば、エチレン-プロピレン共重合体(EPR)、エチレン-プロピレン-ジエン共重合体(EPDM)等が挙げられる。また、ジシクロペンタジエン、1,4-ヘキサジエン、シクロオクタジエン、メチレンノルボルネン、エチリデンノルボルネン、ブタジエン、イソプレンなどの炭素数4~20の非共役ジエンとα-オレフィンの共重合体などが挙げられる。また、ブタジエン-アクリロニトリル共重合体にメタクリル酸を共重合したカルボキシ変性ニトリルゴムが挙げられる。具体的には、エチレン・α-オレフィンの共重合体ゴム、エチレン・α-オレフィン・非共役ジエン共重合体ゴム、プロピレン・α-オレフィンの共重合体ゴム、ブテン・α-オレフィンの共重合体ゴムなどが挙げられる。
市販品として、ミラストマー(三井化学(株)製)、サーモラン(三菱化学(株)製)EXACT(エクソンモービル製)、ENGAGE(ダウ・ケミカル日本(株)製)、エスポレックス(住友化学(株)製)、Sarlink(東洋紡(株)製)、ニューコン(日本ポリプロ(株)製)、EXCELINK(JSR(株)製)などが挙げられる。
ポリウレタン系エラストマーとしては、特に制限はなく、目的に応じて適宜選択することができる。例えば、低分子のグリコールおよびジイソシアネートからなるハードセグメントと、高分子(長鎖)ジオールおよびジイソシアネートからなるソフトセグメントとの構造単位を含むエラストマーなどが挙げられる。
高分子(長鎖)ジオールとしては、ポリプロピレングリコール、ポリテトラメチレンオキサイド、ポリ(1,4-ブチレンアジペート)、ポリ(エチレン・1,4-ブチレンアジペート)、ポリカプロラクトン、ポリ(1,6-ヘキシレンカーボネート)、ポリ(1,6-ヘキシレン・ネオペンチレンアジペート)などが挙げられる。高分子(長鎖)ジオールの数平均分子量は、500~10,000が好ましい。
低分子のグリコールとしては、エチレングリコール、プロピレングリコール、1,4-ブタンジオール、ビスフェノールA等の短鎖ジオールを用いることができる。短鎖ジオールの数平均分子量は、48~500が好ましい。
ポリウレタン系エラストマーの市販品としては、PANDEX T-2185、T-2983N(以上、DIC(株)製)、ミラクトラン(日本ミラクトラン(株)製)、エラストラン(BASFジャパン(株)製)、レザミン(大日精化工業(株)製)、ペレセン(ダウ・ケミカル日本(株)製)、アイアンラバー(NOK(株)製)、モビロン(日清紡ケミカル(株)製)などが挙げられる。
ポリアミド系エラストマーとしては、特に制限はなく、目的に応じて適宜選択することができる。例えば、ポリアミド6、11、12などのポリアミドをハードセグメントに用い、ポリオキシエチレン、ポリオキシプロピレン、ポリテトラメチレングリコールなどのポリエーテルおよびポリエステルのうちの少なくとも一方をソフトセグメントに用いたエラストマーなどが挙げられる。このエラストマーは、ポリエーテルブロックアミド型、ポリエーテルエステルブロックアミド型の2種に大別される。
市販品として、UBEポリアミドエラストマー、UBESTA XPA(宇部興産(株)製)、ダイアミド(ダイセルエボニック(株)製)、PEBAX(ARKEMA社製)、グリロンELX(エムスケミージャパン(株)製)、ノバミッド(DSM社製)、グリラックス(東洋紡製)、ポリエーテルエステルアミドPA-200、PA-201、TPAE-12、TPAE-32、ポリエステルアミドTPAE-617、TPAE-617C(以上、(株)T&K TOKA製)などが挙げられる。
ポリアクリル系エラストマーとしては、特に制限はなく、目的に応じて適宜選択することができる。例えば、エチルアクリレート、ブチルアクリレート、メトキシエチルアクリレート、エトキシエチルアクリレートなどのアクリル酸エステルをモノマー材料の主成分としたものや、アクリル酸エステルと、グリシジルメタクリレート、アリルグリシジルエーテルなどを共重合した共重合体が挙げられる。さらに、アクリル酸エステルと、アクリロニトリルやエチレンなどの架橋点モノマーとを共重合してなるものなどが挙げられる。具体的には、アクリロニトリル-ブチルアクリレート共重合体、アクリロニトリル-ブチルアクリレート-エチルアクリレート共重合体、アクリロニトリル-ブチルアクリレート-グリシジルメタクリレート共重合体などが挙げられる。
本発明では、エラストマーとして、ゴム変性したエポキシ樹脂(エポキシ系エラストマー)を用いることができる。エポキシ系エラストマーは、例えば、ビスフェノールF型エポキシ樹脂、ビスフェノールA型エポキシ樹脂、サリチルアルデヒド型エポキシ樹脂、フェノールノボラック型エポキシ樹脂あるいはクレゾールノボラック型エポキシ樹脂の一部または全部のエポキシ基を、両末端カルボン酸変性型ブタジエン-アクリロニトリルゴム、末端アミノ変性シリコーンゴム等で変性することによって得られる。
本発明では、樹脂として、上述した樹脂以外の他の高分子化合物(他の高分子化合物ともいう)を用いることができる。他の高分子化合物は、1種または2種以上を併用することができる。
他の高分子化合物の具体例としては、例えば、炭化水素樹脂、ノボラック樹脂、フェノール樹脂、エポキシ樹脂、メラミン樹脂、ユリア樹脂、不飽和ポリエステル樹脂、アルキド樹脂、ポリアミド樹脂、熱可塑性ポリイミド樹脂、ポリアミドイミド樹脂、ポリベンズイミダゾール樹脂、ポリベンゾオキサゾール樹脂、ポリ塩化ビニル樹脂、ポリ酢酸ビニル樹脂、ポリアセタール樹脂、ポリカーボネート樹脂、ポリフェニレンエーテル樹脂、ポリブチレンテレフタレート樹脂、ポリエチレンテレフタレート樹脂、ポリフェニレンスルフィド樹脂、ポリスルホン樹脂、ポリエーテルスルホン樹脂、ポリアリレート樹脂、ポリエーテルエーテルケトン樹脂、シロキサン共重合体などが挙げられる。なかでも、炭化水素樹脂、熱可塑性ポリイミド樹脂、ポリカーボネート樹脂が好ましく、炭化水素樹脂がより好ましい。
また、本発明では、樹脂として後述するフッ素原子を含むものを用いることができるが、フッ素原子を含む樹脂(以下、フッ素樹脂ともいう)は、実質的に含まないことが好ましい。フッ素樹脂を実質的に含まないとは、フッ素樹脂の含有量が、樹脂の全質量に対し、例えば、0.1質量%以下のことをいい、0.05質量%以下が好ましく、全く含有しないことがより好ましい。
炭化水素樹脂は、基本的には炭素原子と水素原子のみからなる樹脂を意味するが、基本となる骨格が炭化水素樹脂であれば、側鎖としてその他の原子を含んでいてもよい。すなわち、炭素原子と水素原子のみからなる炭化水素樹脂に、アクリル樹脂、ポリビニルアルコール樹脂、ポリビニルアセタール樹脂、ポリビニルピロリドン樹脂のように、主鎖に炭化水素基以外の官能基が直接結合する場合も本発明における炭化水素樹脂に包含されるものであり、この場合、主鎖に炭化水素基が直接結合されてなる繰り返し単位の含有量が、樹脂の全繰り返し単位に対して30モル%以上であることが好ましい。
上記条件に合致する炭化水素樹脂としては例えば、環式テルペン樹脂、環式テルペンフェノール樹脂、変性環式テルペン樹脂、水添環式テルペン樹脂、水添環式テルペンフェノール樹脂、ロジン、ロジンエステル、水添ロジン、水添ロジンエステル、重合ロジン、重合ロジンエステル、変性ロジン、ロジン変性フェノール樹脂、アルキルフェノール樹脂、脂肪族石油樹脂、芳香族石油樹脂、水添石油樹脂、変性石油樹脂、脂環族石油樹脂、クマロン石油樹脂、インデン石油樹脂、ポリスチレン-ポリオレフィン共重合体、オレフィンポリマー(例えば、メチルペンテン共重合体)、およびシクロオレフィンポリマー(例えば、ノルボルネン系共重合体、ジシクロペンタジエン共重合体、テトラシクロドデセン共重合体)などが挙げられる。
(メタ)アクリレートモノマーとしては、2-エチルヘキシル(メタ)アクリレート、エチル(メタ)アクリレート、メチル(メタ)アクリレート、n-プロピル(メタ)アクリレート、イソプロピル(メタ)アクリレート、ペンチル(メタ)アクリレート、n-オクチル(メタ)アクリレート、イソオクチル(メタ)アクリレート、イソノニル(メタ)アクリレート、n-ブチル(メタ)アクリレート、イソブチル(メタ)アクリレート、ヘキシル(メタ)アクリレート、n-ノニル(メタ)アクリレート、イソアミル(メタ)アクリレート、n-デシル(メタ)アクリレート、イソデシル(メタ)アクリレート、ドデシル(メタ)アクリレート、イソボルニル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、フェニル(メタ)アクリレート、ベンジル(メタ)アクリレート、および2-メチルブチル(メタ)アクリレートが例示される。
また、本発明の趣旨を逸脱しない範囲で、他のモノマーを共重合してもよい。他のモノマーを共重合する場合、全モノマーの10モル%以下が好ましい。
式(3)
オルガノポリシロキサンを側鎖に有するアクリル樹脂の具体例としては、信越化学工業(株)製、シリコーングラフトアクリル樹脂、商品名:X-24-798A、X-22-8004(R4:C2H4OH、官能基当量:3250(g/mol))、X-22-8009(R4:Si(OCH3)3含有アルキル基、官能基当量:6200(g/mol))、X-22-8053(R4:H、官能基当量:900(g/mol))、X-22-8084、X-22-8084EM、X-22-8195(R4:H、官能基当量:2700(g/mol))、東亞合成(株)製、サイマックシリーズ(US-270、US-350、US-352、US-380、US-413、US-450等)、レゼタGS-1000シリーズ(GS-1015、GS-1302等)等が挙げられる。
また、上記の他、三菱レイヨン(株)製、アクリペット MF 001、スリーエム ジャパン(株)製、LC-5320 F1035などが例示される。
式(III)中、R5およびR6は、水素原子またはメチル基であることが好ましく、X3およびY3は水素原子であることがより好ましく、その他の基は適宜選択される。ノルボルネン系重合体の水素化物は、JSR(株)からアートン(Arton)GあるいはアートンFという商品名で発売されており、また日本ゼオン(株)からゼオノア(Zeonor)ZF14、ZF16、ゼオネックス(ZEONEX)250、同280、同480Rという商品名で市販されており、これらを使用することができる。
熱可塑性シロキサン重合体は、R21R22R23SiO1/2単位(R21、R22、R23はそれぞれ、非置換または置換の炭素数1~10の1価炭化水素基または水酸基である。)およびSiO4/2単位を含有し、上記R21R22R23SiO1/2単位/SiO4/2単位のモル比が0.6~1.7であるオルガノポリシロキサンと、下記式(4)で表わされるオルガノポリシロキサンとが、部分的に脱水縮合したものであって、上記脱水縮合させるオルガノポリシロキサンと上記オルガノポリシロキサンとの比率が、99:1~50:50であり、重量平均分子量が200,000~1,500,000であることが好ましい。
式(4)
市販品としては、SILRES 604(旭化成ワッカーシリコーン(株)製)が例示される。
公知の方法としては、例えば、有機溶剤中で、テトラカルボン酸二無水物とジアミンを略等モル混合し、反応温度80℃以下で反応させて得られたポリアミック酸を脱水閉環させる方法などが挙げられる。ここで、略等モルとは、テトラカルボン酸二無水物とジアミンのモル量比が1:1近傍であることを言う。なお、必要に応じて、テトラカルボン酸二無水物とジアミンの組成比が、テトラカルボン酸二無水物の合計1.0モルに対して、ジアミンの合計が0.5~2.0モルとなるように調整してもよい。テトラカルボン酸二無水物とジアミンの組成比を上記の範囲内で調整することによって、熱可塑性ポリイミド樹脂の重量平均分子量を調整することができる。
これらのジアミンの中でも、3-(4-アミノフェニル)-1,1,3-トリメチル-5-アミノインダン、1,3-ビス(3-アミノプロピル)テトラメチルジシロキサン、ポリオキシプロピレンジアミン、2,2-ビス(4-アミノフェノキシフェニル)プロパン、4,9-ジオキサドデカン-1,12-ジアミン、1,6-ジアミノヘキサン、および、4,9,14-トリオキサへプタデカン-1,17-ジアミンからなる群から選択される1種以上が好ましく、3-(4-アミノフェニル)-1,1,3-トリメチル-5-アミノインダンがより好ましい。
上記テトラカルボン酸二無水物とジアミンとの反応温度は、好ましくは100℃未満、さらに好ましくは90℃未満である。また、ポリアミック酸のイミド化は、代表的には不活性雰囲気(代表的には、真空または窒素雰囲気)下で加熱処理することにより行われる。加熱処理温度は、好ましくは150℃以上、さらに好ましくは180~450℃である。
このような溶解度を有する熱可塑性ポリイミド樹脂は、例えば、3,4,3’,4’-ベンゾフェノンテトラカルボン酸二無水物と、3-(4-アミノフェニル)-1,1,3-トリメチル-5-アミノインダンとを反応させて得られる熱可塑性ポリイミド樹脂などが挙げられる。この熱可塑性ポリイミド樹脂は、耐熱性が特に優れる。
これらの芳香族基は、置換基を有していてもよいが、有していない方が好ましい。
芳香族基が有していてもよい置換基の例としては、ハロゲン原子、アルキル基、アルコキシ基、アリール基などが挙げられる。
ハロゲン原子としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子等が挙げられる。
アルキル基としては、炭素数1~30のアルキル基が挙げられる。アルキル基の炭素数は、1~20がより好ましく、1~10がさらに好ましい。アルキル基は、直鎖、分岐のいずれであってもよい。また、アルキル基の水素原子の一部または全部は、ハロゲン原子で置換されていてもよい。ハロゲン原子としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子等が挙げられ、フッ素原子が好ましい。
アルコキシ基としては、炭素数1~30のアルコキシ基が好ましい。アルコキシ基の炭素数は、1~20がより好ましく、1~10がさらに好ましい。アルコキシ基は、直鎖、分岐、環状のいずれでもよい。
アリール基としては、炭素数6~30のアリール基が好ましく、炭素数6~20のアリール基がより好ましい。
上記樹脂は、25℃における、JIS(日本工業規格) K 7161:1994に準拠した、引張弾性率Eが1MPa以上4000MPa以下であることが好ましく、1MPa以上100MPa以下であることがより好ましく、1MPa以上60MPa以下であることがさらに好ましく、1MPa以上35MPa以下であることが一層好ましく、1MPa以上20MPa以下であることがより一層好ましく、1MPa以上15MPa以下であることがさらに一層好ましく、3MPa以上10MPa以下であることが特に一層好ましい。このような範囲にすることにより、反りをより効果的に抑制することが可能になる。
本発明で用いる仮接着剤は、樹脂を、仮接着剤の全固形分中に50.00~99.99質量%の割合で含むことが好ましく、70.00~99.99質量%がより好ましく、88.00~99.99質量%が特に好ましい。樹脂の含有量が上記範囲であれば、接着性および剥離性に優れる。
樹脂としてエラストマーを用いる場合、エラストマーは、仮接着剤の全固形分中に50.00~99.99質量%の割合で含むことが好ましく、70.00~99.99質量%がより好ましく、88.00~99.99質量%が特に好ましい。エラストマーの含有量が上記範囲であれば、接着性および剥離性に優れる。エラストマーを2種以上使用した場合は、合計が上記範囲であることが好ましい。
また、樹脂としてエラストマーを用いる場合、樹脂全質量におけるエラストマーの含有量は、50~100質量%が好ましく、70~100質量%がより好ましく、80~100質量%がさらに好ましく、90~100質量%が一層好ましい。また、樹脂は、実質的にエラストマーのみであってもよい。なお、樹脂が、実質的にエラストマーのみである場合、樹脂全質量におけるエラストマーの含有量が、99質量%以上が好ましく、99.9質量%以上がより好ましく、エラストマーのみからなることが一層好ましい。
本発明で用いる仮接着剤は、必要に応じて可塑剤を含んでいてもよい。可塑剤を配合することにより、上記諸性能を満たす仮接着層とすることができる。
可塑剤としては、フタル酸エステル、脂肪酸エステル、芳香族多価カルボン酸エステル、ポリエステルなどが使用できる。
脂肪酸エステルとしては例えば、ブチルステアレート、ユニスターM-9676、ユニスターM-2222SL、ユニスターH-476、ユニスターH-476D、パナセート800B、パナセート875、パナセート810(以上、日油(株)製)、DBA、DIBA、DBS、DOA、DINA、DIDA、DOS、BXA、DOZ、DESU(以上、大八化学工業(株)製)などが挙げられる。
芳香族多価カルボン酸エステルとしては、TOTM(大八化学工業(株)製)、モノサイザーW-705(大八化学工業(株)製)、UL-80、UL-100((株)ADEKA製)などが挙げられる。
ポリエステルとしては、ポリサイザーTD-1720、ポリサイザーS-2002、ポリサイザーS-2010(以上、DIC(株)製)、BAA-15(大八化学工業(株)製)などが挙げられる。
上記可塑剤の中では、DIDP、DIDA、TOTM、ユニスターM-2222SL、ポリサイザーTD-1720が好ましく、DIDA、TOTMがより好ましく、TOTMが特に好ましい。
可塑剤は1種のみを用いてもよいし、2種以上を組み合わせてもよい。
本発明で用いる仮接着剤は、溶剤を含有する。溶剤は、公知のものを制限なく使用でき、有機溶剤が好ましい。
有機溶剤としては、酢酸エチル、酢酸-n-ブチル、酢酸イソブチル、ギ酸アミル、酢酸イソアミル、プロピオン酸ブチル、酪酸イソプロピル、酪酸エチル、酪酸ブチル、乳酸メチル、乳酸エチル、アルキルオキシ酢酸アルキル(例:アルキルオキシ酢酸メチル、アルキルオキシ酢酸エチル、アルキルオキシ酢酸ブチル(例えば、メトキシ酢酸メチル、メトキシ酢酸エチル、メトキシ酢酸ブチル、エトキシ酢酸メチル、エトキシ酢酸エチル等))、3-オキシプロピオン酸アルキルエステル類(例:3-オキシプロピオン酸メチル、3-アルキルオキシプロピオン酸エチル等(例えば、3-メトキシプロピオン酸メチル、3-メトキシプロピオン酸エチル、3-エトキシプロピオン酸メチル、3-エトキシプロピオン酸エチル等))、2-オキシプロピオン酸アルキルエステル類(例:2-オキシプロピオン酸メチル、2-オキシプロピオン酸エチル、2-アルキルオキシプロピオン酸プロピル等(例えば、2-メトキシプロピオン酸メチル、2-メトキシプロピオン酸エチル、2-メトキシプロピオン酸プロピル、2-エトキシプロピオン酸メチル、2-エトキシプロピオン酸エチル))、2-アルキルオキシ-2-メチルプロピオン酸メチルおよび2-オキシ-2-メチルプロピオン酸エチル(例えば、2-メトキシ-2-メチルプロピオン酸メチル、2-エトキシ-2-メチルプロピオン酸エチル等)、ピルビン酸メチル、ピルビン酸エチル、ピルビン酸プロピル、アセト酢酸メチル、アセト酢酸エチル、2-オキソブタン酸メチル、2-オキソブタン酸エチル、1-メトキシ-2-プロピルアセテート等のエステル類;
ジエチレングリコールジメチルエーテル、テトラヒドロフラン、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、メチルセロソルブアセテート、エチルセロソルブアセテート、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールモノブチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノエチルエーテルアセテート、プロピレングリコールモノプロピルエーテルアセテート等のエーテル類;
メチルエチルケトン、シクロヘキサノン、2-ヘプタノン、3-ヘプタノン、N-メチル-2-ピロリドン、γ-ブチロラクトン等のケトン類;
トルエン、キシレン、アニソール、メシチレン、エチルベンゼン、プロピルベンゼン、クメン、n-ブチルベンゼン、sec-ブチルベンゼン、イソブチルベンゼン、t-ブチルベンゼン、アミルベンゼン、イソアミルベンゼン、(2,2-ジメチルプロピル)ベンゼン、1-フェニルへキサン、1-フェニルヘプタン、1-フェニルオクタン、1-フェニルノナン、1-フェニルデカン、シクロプロピルベンゼン、シクロヘキシルベンゼン、2-エチルトルエン、1,2-ジエチルベンゼン、o-シメン、インダン、1,2,3,4-テトラヒドロナフタレン、3-エチルトルエン、m-シメン、1,3-ジイソプロピルベンゼン、4-エチルトルエン、1,4-ジエチルベンゼン、p-シメン、1,4-ジイソプロピルベンゼン、4-t-ブチルトルエン、1,4-ジ-t-ブチルベンゼン、1,3-ジエチルベンゼン、1,2,3-トリメチルベンゼン、1,2,4-トリメチルベンゼン、4-t-ブチル-o-キシレン、1,2,4-トリエチルベンゼン、1,3,5-トリエチルベンゼン、1,3,5-トリイソプロピルベンゼン、5-t-ブチル-m-キシレン、3,5-ジ-t-ブチルトルエン、1,2,3,5-テトラメチルベンゼン、1,2,4,5-テトラメチルベンゼン、ペンタメチルベンゼン等の芳香族炭化水素類;
リモネン、p-メンタン、ノナン、デカン、ドデカン、デカリン等の炭化水素類などが好適に挙げられる。
これらの中でも、メシチレン、t-ブチルベンゼン、1,2,4-トリメチルベンゼン、p-メンタン、γ-ブチロラクトン、アニソール、3-エトキシプロピオン酸メチル、3-エトキシプロピオン酸エチル、エチルセロソルブアセテート、乳酸エチル、ジエチレングリコールジメチルエーテル、酢酸ブチル、3-メトキシプロピオン酸メチル、2-ヘプタノン、シクロヘキサノン、エチルカルビトールアセテート、ブチルカルビトールアセテート、プロピレングリコールメチルエーテル、およびプロピレングリコールメチルエーテルアセテートが好ましい。
溶剤は1種のみでもよいし、2種以上であってもよい。溶剤が2種以上の場合は、その合計が上記範囲であることが好ましい。
尚、仮接着剤を層状に適用し、乾燥させて得られる仮接着層における溶剤の含有率は、1質量%以下が好ましく、0.1質量%以下がより好ましく、全く含有しないことが特に好ましい。
本発明で用いる仮接着剤は、酸化防止剤を含有してもよい。酸化防止剤としては、フェノール系酸化防止剤、硫黄系酸化防止剤、リン系酸化防止剤、キノン系酸化防止剤、アミン系酸化防止剤などが使用できる。
フェノール系酸化防止剤としては例えば、p-メトキシフェノール、2,6-ジ-tert-ブチル-4-メチルフェノール、Irganox1010、Irganox1330、Irganox3114、Irganox1035(以上、BASFジャパン(株)製)、Sumilizer MDP-S、Sumilizer GA-80(以上、住友化学(株)製)などが挙げられる。
硫黄系酸化防止剤としては例えば、3,3’-チオジプロピオネートジステアリル、Sumilizer TPL-R、Sumilizer TPM、Sumilizer TPS、Sumilizer MB、Sumilizer TP-D(以上、住友化学(株)製)などが挙げられる。
リン系酸化防止剤としては例えば、トリス(2,4-ジ-tert-ブチルフェニル)ホスファイト、ビス(2,4-ジ-tert-ブチルフェニル)ペンタエリスリトールジホスフィト、ポリ(ジプロピレングリコール)フェニルホスフィト、ジフェニルイソデシルホスフィト、2-エチルヘキシルジフェニルホスフィト、トリフェニルホスフィト、Irgafos168、Irgafos38(以上、BASFジャパン(株)製)、Sumilizer GP(住友化学(株)製)などが挙げられる。
キノン系酸化防止剤としては例えば、p-ベンゾキノン、2-tert-ブチル-1,4-ベンゾキノンなどが挙げられる。
アミン系酸化防止剤としては例えば、ジメチルアニリンやフェノチアジンなどが挙げられる。
酸化防止剤は、Irganox1010、Irganox1330、3,3’-チオジプロピオネートジステアリル、Sumilizer TP-Dが好ましく、Irganox1010、Irganox1330がより好ましく、Irganox1010が特に好ましい。
また、上記酸化防止剤のうち、フェノール系酸化防止剤と、硫黄系酸化防止剤またはリン系酸化防止剤とを併用することが好ましく、フェノール系酸化防止剤と硫黄系酸化防止剤とを併用することが最も好ましい。特に、エラストマーとして、ポリスチレン系エラストマーを使用した場合において、フェノール系酸化防止剤と硫黄系酸化防止剤とを併用することが好ましい。このような組み合わせにすることにより、酸化反応による仮接着剤の劣化を、効率よく抑制できる効果が期待できる。フェノール系酸化防止剤と硫黄系酸化防止剤とを併用する場合、フェノール系酸化防止剤と硫黄系酸化防止剤との質量比は、フェノール系酸化防止剤:硫黄系酸化防止剤=95:5~5:95が好ましく、25:75~75:25がより好ましい。
酸化防止剤の組み合わせとしては、Irganox1010とSumilizer TP-D、Irganox1330とSumilizer TP-D、および、Sumilizer GA-80とSumilizer TP-Dが好ましく、Irganox1010とSumilizer TP-D、Irganox1330とSumilizer TP-Dがより好ましく、Irganox1010とSumilizer TP-Dが特に好ましい。
酸化防止剤は1種のみでもよいし、2種以上であってもよい。酸化防止剤が2種以上の場合は、その合計が上記範囲であることが好ましい。
本発明で用いる仮接着剤には、本発明の効果を損なわない範囲で、必要に応じて、各種添加物、例えば、界面活性剤、硬化剤、硬化触媒、充填剤、密着促進剤、紫外線吸収剤、凝集防止剤等を配合することができる。これらの添加剤を配合する場合、その合計配合量は仮接着剤の全固形分の3質量%以下が好ましい。
仮接着剤から金属等の不純物を除去する方法としては、例えば、フィルタを用いた濾過を挙げることができる。フィルタ孔径としては、ポアサイズ10nm以下が好ましく、5nm以下がより好ましく、3nm以下がさらに好ましい。フィルタの材質としては、ポリテトラフロロエチレン製、ポリエチレン製、ナイロン製のフィルタが好ましい。フィルタは、有機溶剤であらかじめ洗浄したものを用いてもよい。フィルタ濾過工程では、複数種類のフィルタを直列または並列に接続して用いてもよい。複数種類のフィルタを使用する場合は、孔径および/または材質が異なるフィルタを組み合わせて使用してもよい。また、各種フィルタ材料を用いて複数回濾過してもよく、複数回濾過する工程が循環濾過工程であってもよい。
また、仮接着剤に含まれる金属等の不純物を低減する方法としては、仮接着剤を構成する原料として金属含有量が少ない原料を選択する、仮接着剤を構成する原料に対してフィルタ濾過を行う、装置内をテフロン(登録商標)でライニングする等してコンタミネーションを可能な限り抑制した条件下で蒸留を行う等の方法を挙げることができる。仮接着剤を構成する原料に対して行うフィルタ濾過における好ましい条件は、上記した条件と同様である。
フィルタ濾過の他、吸着材による不純物の除去を行っても良く、フィルタ濾過と吸着材を組み合わせて使用してもよい。吸着材としては、公知の吸着材を用いることができ、例えば、シリカゲル、ゼオライトなどの無機系吸着材、活性炭などの有機系吸着材を使用することができる。
仮接着層は、仮接着剤を、スピンコート法、スプレー法、スリットコート法、ローラーコート法、フローコート法、ドクターコート法、浸漬法などによって、基板の上に適用することによって、形成することができる。
仮接着層は、上述のとおり、仮接着する2つの基板の少なくとも一方の基板の表面に形成する。基板の一方のみに仮接着層を形成して他方の基板と貼り合わせてもよいし、両方の基板に仮接着層を設けて両者を貼り合わせてもよい。
次いで、仮接着剤は通常、溶剤を含むため、加熱を行って溶剤を揮発させる。この加熱温度としては、溶剤の沸点よりも高い温度であることが好ましく、110℃以上であることがより好ましく、130℃~200℃がさらに好ましく、160℃~190℃が特に好ましい。
本発明で用いる仮接着剤は、上述の各成分を混合して調製することができる。各成分の混合は、通常、0℃~100℃の範囲で行われる。また、各成分を混合した後、例えば、フィルタでろ過することが好ましい。ろ過は、多段階で行ってもよいし、多数回繰り返してもよい。また、ろ過した液を再ろ過することもできる。
フィルタとしては、従来からろ過用途等に用いられているものであれば特に限定されることなく用いることができる。例えば、PTFE(ポリテトラフルオロエチレン)等のフッ素樹脂、ナイロン6、ナイロン6,6等のポリアミド系樹脂、ポリエチレン、ポリプロピレン(PP)等のポリオレフィン樹脂等によるフィルタが挙げられる。これら素材の中でもポリプロピレンおよびナイロンが好ましい。
フィルタの孔径は、例えば、0.003~5.0μm程度が適している。この範囲とすることにより、ろ過詰まりを抑えつつ、組成物に含まれる不純物や凝集物など、微細な異物を確実に除去することが可能となる。
フィルタを使用する際、異なるフィルタを組み合わせてもよい。その際、第一のフィルタでのフィルタリングは、1回のみでもよいし、2回以上行ってもよい。異なるフィルタを組み合わせて2回以上フィルタリングを行う場合は、1回目のフィルタリングの孔径に対し、2回目以降の孔径が同じ、もしくは小さい方が好ましい。また、上述した範囲内で異なる孔径の第一のフィルタを複数組み合わせてもよい。ここでの孔径は、フィルタメーカーの公称値を参照することができる。市販のフィルタとしては、例えば、日本ポール(株)、アドバンテック東洋(株)、日本インテグリス(株)または(株)キッツマイクロフィルタ等が提供する各種フィルタの中から選択することができる。
本発明では、洗浄剤組成物に含まれる有機溶剤は、仮接着剤が樹脂、さらには、エラストマーを含む場合、上記エラストマーの、上記有機溶剤に対する25℃における溶解度が18~40質量%であることが好ましく、20~32質量%であることがより好ましい。
このような範囲とすることにより、より除去性を向上させることができる。
特に、本発明の洗浄剤組成物は、以下の仮接着剤の除去に効果的である;
シリコーン化合物が、ポリエーテル変性シリコーンを含み、
ポリエーテル変性シリコーンの、式(A)で表される比率が80%以上であり、
仮接着剤におけるシリコーン化合物の含有量が0.001~1.0質量%であり、
仮接着剤がスチレン系エラストマーを含む;
式(A) {(MO+EO)/AO}×100
上記式(A)中、MOは、ポリエーテル変性シリコーン中のポリエーテル構造に含まれるメチレンオキシドのモル%であり、EOは、ポリエーテル変性シリコーン中のポリエーテル構造に含まれるエチレンオキシドのモル%であり、AOは、ポリエーテル変性シリコーン中のポリエーテル構造に含まれるアルキレンオキシドのモル%をいう。
本発明の半導体素子の製造方法は、シリコーン化合物を含む仮接着剤を、酸または塩基と、有機溶剤とを含む、洗浄剤組成物を用いて除去することを含む。この様な構成とすることにより、シリコーン化合物を含む仮接着剤をを効果的に除去できる。
シリコーン化合物を含む仮接着剤を除去する態様としては、被加工基板上の仮接着層を除去すること、被加工基板とキャリア基板とを仮接着する工程中における余剰な仮接着剤を除去すること、および、キャリア基板の再利用のため、キャリア基板上に残存する仮接着剤を除去することなどが例示される。
また、本発明で除去される仮接着剤には、仮接着剤由来の成分を含むことは言うまでもない。仮接着剤由来の成分とは、仮接着剤が溶剤を含む場合であって、仮接着剤から溶剤が除去された後の成分、および、仮接着剤に含まれる一部の成分(例えば、樹脂やシリコーン化合物など)が例示される。
シリコーン化合物を含む仮接着剤、および、酸または塩基と、有機溶剤とを含む、洗浄剤組成物の詳細は、それぞれ、上述の、仮接着剤および洗浄剤組成物の記載を参酌でき、好ましい範囲も同様である。
本発明の半導体素子の製造方法は、仮接着剤がキャリア基板と被加工基板の仮接着に用いられ、洗浄剤組成物で除去する仮接着剤は、キャリア基板を剥離した後の被加工基板上に残る仮接着剤、および、キャリア基板を剥離し、さらに、仮接着剤をピールオフした後の被加工基板上に残る仮接着剤であることが好ましい。ピールオフは、40℃以下の温度で行うことが好ましく、10~40℃の温度で行うことがより好ましい。また、ピールオフは、手での剥離および機械剥離であることが好ましい。
被加工基板としては、シリコンやガラス、SiC、GaN、GaAsなどの化合物半導体、モールド樹脂などを基板とし、その表面と内部とに構造体が形成されたデバイスウェハが例示される。
以下、半導体素子の製造方法の一実施形態について、図1をあわせて参照しながら説明する。なお、本発明は、以下の実施形態に限定されるものではない。
図1(A)~(E)は、それぞれ、キャリア基板とデバイスウェハとの仮接着を説明する概略断面図(図1(A)、(B))、キャリア基板に仮接着されたデバイスウェハが薄型化された状態(図1(C))、キャリア基板とデバイスウェハを剥離した状態(図1(D))、デバイスウェハから仮接着剤を除去した後の状態(図1(E))を示す概略断面図である。
仮接着層11は、シリコーン化合物を含む仮接着剤を用いて形成されるものであり、実質的に溶剤を含まない態様であることが好ましい。
デバイスウェハ60は、シリコン基板61の表面61aに複数のデバイスチップ62が設けられてなる。
シリコン基板61の厚さは、例えば、200~1200μmが好ましい。デバイスチップ62は例えば金属構造体であることが好ましく、高さは10~100μmが好ましい。
仮接着層を形成させる過程で、キャリア基板およびデバイスウェハの裏面を本発明の洗浄剤組成物、後述する剥離液、または有機溶剤(以下、「本発明の洗浄剤組成物等」ということがある)を用いて洗浄する工程を設けてもよい。具体的には、キャリア基板やデバイスウェハの端面または裏面に付着した仮接着層の残渣を、本発明の洗浄剤組成物等を用いて除去することで、装置の汚染を防ぐことができ、薄型化デバイスウェハのTTV(Total Thickness Variation)を低下させることができる。
仮接着層11は、デバイスチップ62を完全に覆っていることが好ましい。また、デバイスチップの高さがXμm、仮接着層の厚みがYμmの場合、「X+100≧Y>X」の関係を満たすことが好ましい。
仮接着層11がデバイスチップ62を完全に被覆していることは、薄型化デバイスウェハのTTVをより低下したい場合(すなわち、薄型化デバイスウェハの平坦性をより向上させたい場合)に有効である。
すなわち、デバイスウェハを薄型化する際において、複数のデバイスチップ62を仮接着層11によって保護することにより、キャリア基板12との接触面において、凹凸形状をほとんど無くすことが可能である。よって、このように支持した状態で薄型化しても、複数のデバイスチップ62に由来する形状が、薄型化デバイスウェハの裏面61b1に転写されるおそれは低減され、その結果、最終的に得られる薄型化デバイスウェハのTTVをより低下することができる。
本発明では、仮接着層の膜面の面積は、キャリア基板の基板面の面積よりも小さいことが好ましい。また、本発明では、キャリア基板の基板面の直径をCμm、デバイスウェハの基板面の直径をDμm、仮接着層の膜面の直径をTμmとしたとき、(C‐200)≧T≧Dを満たすことがより好ましい。さらに、キャリア基板の基板面の直径をCμm、デバイスウェハの基板面の直径をDμm、仮接着層のキャリア基板と接している側の膜面の直径をTCμm、仮接着層のデバイスウェハと接している側の膜面の直径をTDμmとしたとき、(C-200)≧TC>TD≧Dを満たすことが好ましい。このような構成とすることにより、高温および真空下での処理が仮接着層に直接施されることによる仮接着層の変形、変質をより抑制することができる。
尚、仮接着層の膜面の面積とは、キャリア基板に対し垂直な方向から見たときの面積をいい、膜面の凹凸は考えないものとする。デバイスウェハの基板面についても同様である。すなわち、ここでいう、デバイスウェハの基板面とは、例えば、図1の61a面に対応する面であり、デバイスチップが設けられている側の面である。仮接着層の膜面等の直径についても、同様に考える。
また、仮接着層の膜面の直径Tとは、仮接着層のキャリア基板と接している側の膜面の直径をTCμm、仮接着層のデバイスウェハと接している側の膜面の直径をTDμmとしたとき、T=(TC+TD)/2とする。キャリア基板の基板面の直径およびデバイスウェハの基板面の直径は、仮接着層と接している側の表面の直径をいう。
尚、キャリア基板等について、「直径」と規定しているが、キャリア基板等が、数学的な意味で円形(正円)であることを必須とするものではなく、概ね円形であればよい。正円でない場合、同じ面積の正円に換算した時の直径をもって、上記直径とする。
また、機械的または化学的な処理として、薄膜化処理の後に、薄型化デバイスウェハ60aの裏面61b1からシリコン基板を貫通する貫通孔(図示せず)を形成し、この貫通孔内にシリコン貫通電極(図示せず)を形成する処理を行ってもよい。
また、キャリア基板12とデバイスウェハ60とを仮接着した後、剥離するまでの間に加熱処理を行ってもよい。加熱処理の一例として、機械的または化学的な処理を行う際に、加熱を行うことが挙げられる。
加熱処理における最高到達温度は80~400℃が好ましく、130℃~400℃がより好ましく、180℃~350℃がさらに好ましい。加熱処理における最高到達温度は仮接着層の分解温度よりも低い温度とすることが好ましい。加熱処理は、最高到達温度での30秒~30分間の加熱であることが好ましく、最高到達温度での1分~10分の加熱であることがより好ましい。
剥離の方法は特に限定されるものではないが、薄型化デバイスウェハ60aを固定し、キャリア基板12を、端部から薄型化デバイスウェハ60aに対して垂直方向に引き上げて剥離することが好ましい。このとき、剥離界面は、キャリア基板12と仮接着層11の界面で剥離されることが好ましい。剥離の際の引き上げ速度は、30~100mm/分の速さであることが好ましく、40~80mm/分の速さであることがより好ましい。この場合、キャリア基板12と仮接着層11の界面の密着強度A、デバイスウェハ表面61aと仮接着層11の密着強度Bは、以下の式を満たすことが好ましい。
A<B ・・・・式(A1)
また、剥離の際の端部を引き上げる際の力は、0.33N/mm以下であることが好ましく、0.2N/mm以下とすることもできる。下限値としては、好ましくは0.07N/mm以上である。この際の力は、フォースゲージを用いて測定することができる。
仮接着層11の除去方法は、例えば、本発明の洗浄剤組成物を用いて除去する方法(仮接着層を本発明の洗浄剤組成物で膨潤させた後に剥離除去する方法、仮接着層に本発明の洗浄剤組成物を噴射して破壊除去する方法、仮接着層を本発明の洗浄剤組成物に溶解させて溶解除去する方法等)、仮接着層を活性光線、放射線または熱の照射により分解、気化して除去する方法などが挙げられる。
溶剤の使用量削減の観点からは、仮接着層をフィルム状の状態のまま剥離除去(ピールオフ)することが好ましい。仮接着層をフィルム状の状態のまま剥離除去する方法とは、本発明の洗浄剤組成物等を用いる等の化学的処理を行うことなく、仮接着層をフィルム状のまま剥離除去(ピールオフ)する方法をいう。仮接着層をフィルム状の状態のままで剥離除去する場合、手での剥離または機械剥離が好ましい。仮接着層をフィルム状の状態のまま剥離除去するためには、デバイスウェハ表面61aと仮接着層11の密着強度Bが以下の式(B1)を満たすことが好ましい。
B≦4N/cm ・・・・式(B1)
尚、本発明における、剥離液とは、水または有機溶剤を含む仮接着剤の剥離液であって、酸および塩基を含まないものをいう。有機溶剤としては、本発明の洗浄剤組成物で用いる有機溶剤が例示される。
半導体の製造方法の第二の実施形態について、図2をあわせて参照しながら説明する。上述した第一の実施形態と同一箇所は、同一符号を付してその説明を省略する。
図2(A)~(E)は、それぞれ、キャリア基板とデバイスウェハとの仮接着を説明する概略断面図(図2(A)、(B))、キャリア基板に仮接着されたデバイスウェハが薄型化された状態(図2(C))、キャリア基板とデバイスウェハを剥離した状態(図2(D))、デバイスウェハから仮接着層を除去した後の状態(図2(E))を示す概略断面図である。
この実施形態では、図2(A)に示すように、デバイスウェハの表面61a上に仮接着層を形成する点が上記第一の実施形態と相違する。
デバイスウェハ60の表面61a上に、仮接着層11aを設ける場合は、デバイスウェハ60の表面61aの表面に仮接着剤を適用(好ましくは塗布)し、次いで、乾燥(ベーク)することにより形成することができる。乾燥は、例えば、60~150℃で、10秒~2分行うことができる。
次いで、図2(B)に示す通り、キャリア基板12とデバイスウェハ60とを圧着させ、キャリア基板12とデバイスウェハ60とを仮接着させる。次いで、図2(C)に示すように、シリコン基板61の裏面61bに対して、機械的または化学的な処理を施して、図2(C)に示すように、シリコン基板61の厚さを薄くし、薄型化デバイスウェハ60aを得る。次いで、図2(D)に示すように、キャリア基板12を、薄型化デバイスウェハ60aから剥離させる。そして、図2(E)に示すように、薄型化デバイスウェハ60aから仮接着層11aを除去する。
また、上述した実施形態においては、デバイスウェハとして、シリコン基板を挙げたが、これに限定されるものではなく、半導体素子の製造方法において、機械的または化学的な処理に供され得るいずれの被処理部材であってもよい。
また、上述した実施形態においては、デバイスウェハ(シリコン基板)に対する機械的または化学的な処理として、デバイスウェハの薄膜化処理、および、シリコン貫通電極の形成処理を挙げたが、これらに限定されるものではなく、半導体素子の製造方法において必要ないずれの処理も挙げられる。
その他、上述した実施形態において例示した、デバイスウェハにおけるデバイスチップの形状、寸法、数、配置箇所等は任意であり、限定されない。
下記に示す通り、仮接着剤の各成分を混合して均一な溶液とした後、0.2μmの孔径を有するポリテトラフルオロエチレン製フィルタを用いてろ過して、仮接着剤を調製した。
・セプトン4033 ((株)クラレ製、ポリスチレン系エラストマー):98質量部
・Irganox1010 (BASFジャパン(株)製):1質量部
・Sumilizer TP-D (住友化学(株)製):1質量部
・シリコーン化合物 表1に記載の化合物:0.04質量部
・メシチレン(東洋合成工業(株)製):400質量部
・SILRES 604(シロキサン共重合体、旭化成ワッカーシリコーン(株)製):100質量部
・シリコーン化合物 表1に記載の化合物:0.04質量部
・メチルイソブチルケトン(三協化学(株)製):300質量部
・LC-5320 F1035(アクリル樹脂、スリーエム ジャパン(株)製):100質量部
・シリコーン化合物 表1に記載の化合物:0.04質量部
下記に示す通り、洗浄剤組成物の各成分を混合して均一な溶液とした後、0.2μmの孔径を有するポリテトラフルオロエチレン製フィルタを用いてろ過して、洗浄剤組成物を調製した。
尚、一部の実施例および比較例については、下記に示す成分の一部について表1に記載がないが、これは、その実施例または比較例においては、その成分を配合していないことを意味する。
<<洗浄剤組成物の組成>>
・表1に記載の化合物1:表1に記載の量
・表1に記載の化合物2:表1に記載の量
・表1に記載の溶剤:表1に記載の量
<<積層体Aの形成>>
キャリア基板として、直径12インチの円盤状のシリコンウェハ(1インチは、2.54cmである)を用い、その表面に、上記仮接着剤をコーティング装置(イーヴィグループジャパン(株)製、EVG 101)を用いて、層状に成膜した。ホットプレート(イーヴィグループジャパン(株)製、EVG 105)を用いて、100℃で3分間加熱し、さらに、180℃で3分間加熱することで、キャリア基板の表面に仮接着層を成膜した積層体Aを得た。仮接着層の厚さは、60μmであった。
得られた積層体Aのキャリア基板を下側にしてコーティング装置(イーヴィグループジャパン(株)製、EVG 101)にセットし、回転数1250rpmから、50rpm/sの加速度で回転数を2000rpmまで加速しながら、流量20mL/分のメシチレンで、キャリア基板のべベル部について、BSR(Back Side Rince)処理を行うことで、ベベル部に付着した仮接着層を除去した。
直径12インチの円盤状のシリコンウェハ表面にスパッタリングにより、厚さ10nmのチタン層と、厚さ50nmの銅層を、この順で成膜した被加工基板を得た。
上記で得られた積層体Aと、上記で得られた被加工基板を、ウェハボンディング装置(イーヴィグループジャパン(株)製、EVG 540)を用い、気圧1Pa下、温度200℃、0.3MPaの圧力下で1分間熱圧着し、積層体Bを得た。圧着に際し、銅層と仮接着層が接するように配置した。
上記で得られた積層体Bの、被加工基板の裏面(仮接着層を設けていない側)を、バックグラインダー((株)ディスコ製、DFG8540)を用いて40μmの厚さまで研磨し、バックグラインド加工(薄膜化)した積層体Cを得た。
上記積層体Cの、バックグラインド加工を施した面を下側にし、下側のシリコンウェハを、ダイシングテープマウンターを用いてダイシングテープ中央にダイシングフレームと共に固定した。その後、ウェハデボンダー装置(東京エレクトロン(株)製、Synapse Z)を用いて、25℃で、上側のシリコンウェハを下側のシリコンウェハに対して垂直方向に、3mm/分の速さで引き上げ、仮接着層(または仮接着剤由来の残渣)と被加工基板からなる積層体Dを得た。上側のシリコンウェハを、下側のシリコンウェハが割れたりせずに、剥離できるかどうかを確認した。以下の基準で評価を行った。
A: 剥離が可能であった。
B: 接着力が弱くウェハの周辺が一部浮いていたが剥離が可能、または、引き上げ速度が3mm/分ではウェハが割れたが引き上げ速度2mm/分では剥離可能であった。
C: 上記AおよびBのいずれにも該当しなかった。
上記剥離評価を行い得られた積層体Dの仮接着剤(仮接着剤由来の残渣を含む)を、ウェハデボンダー装置(東京エレクトロン(株)製、Synapse Z)を用いて、積層体Dを回転させながら洗浄剤組成物を供給することで除去した。
洗浄後の被加工基板の表面を、Quantera SXM装置(アルバック・ファイ(株)製)を使用し、X線源として単色化Al-Kα線(エネルギー値;1486.6eV、出力;25W、電圧;15kV、ビーム直径200μm)を用いて測定した。測定領域は1400×700μm2、測定条件はPass Energy=140eV、ステップサイズ=0.1eV、積算回数1~3回で行い、炭素原子とケイ素原子の存在割合について以下の基準で評価を行った。
<<<炭素原子の存在割合>>>
A: 炭素原子が40mol%未満
B: 炭素原子が40mol%以上50mol%未満
C: 炭素原子が50mol%以上60mol%未満
D: 炭素原子が60mol%以上
<<<ケイ素原子の存在割合>>>
A: ケイ素原子が0.1mol%未満
B: ケイ素原子が0.1mol%以上1mol%未満
C: ケイ素原子が1mol%以上3mol%未満
D: ケイ素原子が3mol%以上
一方、仮接着剤にシリコーン化合物が含まれない場合(比較例1)、仮接着性能評価が劣ってしまった。
洗浄剤組成物が酸および塩基を含まない場合(比較例2、3)、ならびに、酸の(ClogP - pKa)が、0~10の範囲外である場合(比較例6、7)、および、塩基の(ClogP - pKb)が、-5~0の範囲外である場合(比較例8、9)、ケイ素原子の存在割合が著しく多くなってしまった。
また、溶剤として、有機溶剤ではなく、水を用いた場合、炭素原子の存在割合が著しく高くなってしまった(比較例4、5)。
特に、スチレン系エラストマーと、式(A)で表される比率が80%以上であるポリエーテル変性シリコーンを含む仮接着剤と、本発明の洗浄剤組成物のキットは、高い剥離性を達成しつつ、かつ、残渣も少なかった(実施例1~4、実施例7~19)。
12:キャリア基板
60:デバイスウェハ
60a:薄型化デバイスウェハ
61:シリコン基板
61a:表面
61b、61b1:裏面
62:デバイスチップ
100:接着性キャリア基板
Claims (30)
- 酸または塩基と、有機溶剤とを含む、洗浄剤組成物と、
シリコーン化合物を含む仮接着剤とを含み、
前記酸の式(a)で表される値が0~10であり、前記塩基の式(b)で表される値が-5~0である、キット;
式(a) ClogP - pKa
式(b) ClogP - pKb
式(a)および(b)において、ClogPは、1-オクタノール中および水中の平衡濃度の比を表す1-オクタノール/水分配係数であるPを、底10に対する対数logPの形態で表した値を、pKaは酸解離定数を、pKbは塩基解離定数をそれぞれ示している。 - 前記シリコーン化合物が、シリコーンオイルである、請求項1に記載のキット。
- 前記シリコーン化合物が、ポリエーテル変性シリコーンを含む、請求項1または2に記載のキット。
- 前記ポリエーテル変性シリコーンは、式(A)で表される比率が80%以上である、請求項3に記載のキット;
式(A) {(MO+EO)/AO}×100
上記式(A)中、MOは、ポリエーテル変性シリコーン中のポリエーテル構造に含まれるメチレンオキシドのモル%であり、EOは、ポリエーテル変性シリコーン中のポリエーテル構造に含まれるエチレンオキシドのモル%であり、AOは、ポリエーテル変性シリコーン中のポリエーテル構造に含まれるアルキレンオキシドのモル%をいう。 - 前記仮接着剤におけるシリコーン化合物の含有量が0.001~1.0質量%である、請求項1~4のいずれか1項に記載のキット。
- 前記仮接着剤がエラストマーを含む、請求項1~5のいずれか1項に記載のキット。
- 前記エラストマーがポリスチレン系エラストマーである、請求項6に記載のキット。
- 前記エラストマーの、前記有機溶剤に対する25℃における溶解度が18~40質量%である、請求項6または7に記載のキット。
- 前記有機溶剤が、芳香族化合物、飽和脂環式化合物、環式ケトンおよび環式テルペンから選択される少なくとも1種である、請求項1~8のいずれか1項に記載のキット。
- 前記洗浄剤組成物が酸を含み、前記酸がリン酸、ホスホン酸、ホスフィン酸、スルホン酸およびカルボン酸から選択される少なくとも1種である、請求項1~9のいずれか1項に記載のキット。
- 前記洗浄剤組成物が塩基を含み、前記塩基が脂肪族アミン、芳香族アミンおよび複素環式アミンから選択される少なくとも1種である、請求項1~9のいずれか1項に記載のキット。
- 前記酸または塩基と、前記有機溶剤の質量比が0.0001:99.9999~50:50である、請求項1~11のいずれか1項に記載のキット。
- 酸または塩基と、
有機溶剤と
を含み、
前記酸の式(a)で表される値が0~10であり、前記塩基の式(b)で表される値が-5~0であるシリコーン化合物を含む仮接着剤用の洗浄剤組成物;
式(a) ClogP - pKa
式(b) ClogP - pKb
式(a)および(b)において、ClogPは、1-オクタノール中および水中の平衡濃度の比を表す1-オクタノール/水分配係数であるPを、底10に対する対数logPの形態で表した値を、pKaは酸解離定数を、pKbは塩基解離定数をそれぞれ示している。 - 前記有機溶剤が、芳香族化合物、飽和脂環式化合物、環式ケトンおよび環式テルペンから選択される少なくとも1種である、請求項13に記載の洗浄剤組成物。
- 前記洗浄剤組成物が酸を含み、前記酸がリン酸、ホスホン酸、ホスフィン酸、スルホン酸およびカルボン酸から選択される少なくとも1種である、請求項13または14に記載の洗浄剤組成物。
- 前記洗浄剤組成物が塩基を含み、前記塩基が脂肪族アミン、芳香族アミンおよび複素環式アミンから選択される少なくとも1種である、請求項13または14に記載の洗浄剤組成物。
- 前記酸または塩基と、前記有機溶剤の質量比が0.0001:99.9999~50:50である、請求項13~16のいずれか1項に記載の洗浄剤組成物。
- 前記シリコーン化合物が、ポリエーテル変性シリコーンを含み、
前記ポリエーテル変性シリコーンは、式(A)で表される比率が80%以上であり、
前記仮接着剤におけるシリコーン化合物の含有量が0.001~1.0質量%であり、
前記仮接着剤がポリスチレン系エラストマーを含む、請求項13~17のいずれか1項に記載の洗浄剤組成物;
式(A) {(MO+EO)/AO}×100
上記式(A)中、MOは、ポリエーテル変性シリコーン中のポリエーテル構造に含まれるメチレンオキシドのモル%であり、EOは、ポリエーテル変性シリコーン中のポリエーテル構造に含まれるエチレンオキシドのモル%であり、AOは、ポリエーテル変性シリコーン中のポリエーテル構造に含まれるアルキレンオキシドのモル%をいう。 - シリコーン化合物を含む仮接着剤を、
酸または塩基と、有機溶剤とを含み、前記酸の式(a)で表される値が0~10であり、前記塩基の式(b)で表される値が-5~0である洗浄剤組成物を用いて除去することを含む、半導体素子の製造方法;
式(a) ClogP - pKa
式(b) ClogP - pKb
式(a)および(b)において、ClogPは、1-オクタノール中および水中の平衡濃度の比を表す1-オクタノール/水分配係数であるPを、底10に対する対数logPの形態で表した値を、pKaは酸解離定数を、pKbは塩基解離定数をそれぞれ示している。 - 前記シリコーン化合物が、シリコーンオイルである、請求項19に記載の半導体素子の製造方法。
- 前記シリコーン化合物が、ポリエーテル変性シリコーンを含む、請求項19または20に記載の半導体素子の製造方法。
- 前記ポリエーテル変性シリコーンは、式(A)で表される比率が80%以上である、請求項21に記載の半導体素子の製造方法;
式(A) {(MO+EO)/AO}×100
上記式(A)中、MOは、ポリエーテル変性シリコーン中のポリエーテル構造に含まれるメチレンオキシドのモル%であり、EOは、ポリエーテル変性シリコーン中のポリエーテル構造に含まれるエチレンオキシドのモル%であり、AOは、ポリエーテル変性シリコーン中のポリエーテル構造に含まれるアルキレンオキシドのモル%をいう。 - 前記仮接着剤におけるシリコーン化合物の含有量が0.001~1.0質量%である、請求項19~22のいずれか1項に記載の半導体素子の製造方法。
- 前記仮接着剤がエラストマーを含む、請求項19~23のいずれか1項に記載の半導体素子の製造方法。
- 前記エラストマーがポリスチレン系エラストマーである、請求項24に記載の半導体素子の製造方法。
- 前記エラストマーの、前記有機溶剤に対する25℃における溶解度が18~40質量%である、請求項24または25のいずれか1項に記載の半導体素子の製造方法。
- 前記有機溶剤が、芳香族化合物、飽和脂環式化合物、環式ケトンおよび環式テルペンから選択される少なくとも1種である、請求項19~26のいずれか1項に記載の半導体素子の製造方法。
- 前記洗浄剤組成物が酸を含み、前記酸がリン酸、ホスホン酸、ホスフィン酸、スルホン酸およびカルボン酸から選択される少なくとも1種である、請求項19~27のいずれか1項に記載の半導体素子の製造方法。
- 前記洗浄剤組成物が塩基を含み、前記塩基が脂肪族アミン、芳香族アミンおよび複素環式アミンから選択される少なくとも1種である、請求項19~27のいずれか1項に記載の半導体素子の製造方法。
- 前記仮接着剤がキャリア基板と被加工基板の仮接着に用いられ、
前記洗浄剤組成物で除去する仮接着剤は、前記キャリア基板を剥離した後の被加工基板上に残る仮接着剤、および、前記キャリア基板を剥離し、さらに、仮接着剤をピールオフした後の被加工基板上に残る仮接着剤である、請求項19~29のいずれか1項に記載の半導体素子の製造方法。
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020119952A (ja) * | 2019-01-22 | 2020-08-06 | 株式会社ディスコ | キャリア板の除去方法 |
JPWO2021033654A1 (ja) * | 2019-08-19 | 2021-02-25 | ||
US20230131533A1 (en) * | 2020-03-23 | 2023-04-27 | Nissan Chemical Corporation | Method for cleaning semiconductor substrate, method for producing processed semiconductor substrate, and peeling composition |
CN113840670B (zh) * | 2019-05-22 | 2024-05-10 | 信越化学工业株式会社 | 清洗剂组合物、基板的清洗方法和支承体或基板的清洗方法 |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009197175A (ja) * | 2008-02-25 | 2009-09-03 | The Inctec Inc | 洗浄剤原液 |
US20110146727A1 (en) * | 2008-08-13 | 2011-06-23 | Kalyankar Nikhil D | Combinatorial approach to the development of cleaning formulations for glue removal in semiconductor applications |
US20130032296A1 (en) * | 2011-08-02 | 2013-02-07 | Brewer Science Inc. | Cleaning composition for temporary wafer bonding materials |
WO2014092022A1 (ja) * | 2012-12-11 | 2014-06-19 | 富士フイルム株式会社 | シロキサン樹脂の除去剤、それを用いたシロキサン樹脂の除去方法並びに半導体基板製品及び半導体素子の製造方法 |
JP2015232088A (ja) * | 2014-06-10 | 2015-12-24 | 信越化学工業株式会社 | ウエハ加工用仮接着材料、ウエハ加工体及びこれらを使用する薄型ウエハの製造方法 |
JP2016011361A (ja) * | 2014-06-27 | 2016-01-21 | 東京応化工業株式会社 | 剥離用組成物及び剥離方法 |
KR20160123707A (ko) * | 2015-04-17 | 2016-10-26 | 재원산업 주식회사 | 접착제 제거용 조성물 및 이를 이용한 박형 웨이퍼의 제조방법 |
KR20170028158A (ko) * | 2015-09-03 | 2017-03-13 | 동우 화인켐 주식회사 | 웨이퍼 배면연삭 후의 접착층 잔류물에 대한 세정전 전처리 조성물 및 그를 이용한 웨이퍼 배면연삭 후의 접착층 잔류물의 제거방법 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6170672B2 (ja) * | 2012-12-27 | 2017-07-26 | 富士フイルム株式会社 | 半導体装置製造用仮接着剤、並びに、それを用いた接着性支持体、及び、半導体装置の製造方法 |
-
2017
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- 2017-07-25 JP JP2018529893A patent/JP6724140B2/ja active Active
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Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009197175A (ja) * | 2008-02-25 | 2009-09-03 | The Inctec Inc | 洗浄剤原液 |
US20110146727A1 (en) * | 2008-08-13 | 2011-06-23 | Kalyankar Nikhil D | Combinatorial approach to the development of cleaning formulations for glue removal in semiconductor applications |
US20130032296A1 (en) * | 2011-08-02 | 2013-02-07 | Brewer Science Inc. | Cleaning composition for temporary wafer bonding materials |
WO2014092022A1 (ja) * | 2012-12-11 | 2014-06-19 | 富士フイルム株式会社 | シロキサン樹脂の除去剤、それを用いたシロキサン樹脂の除去方法並びに半導体基板製品及び半導体素子の製造方法 |
JP2015232088A (ja) * | 2014-06-10 | 2015-12-24 | 信越化学工業株式会社 | ウエハ加工用仮接着材料、ウエハ加工体及びこれらを使用する薄型ウエハの製造方法 |
JP2016011361A (ja) * | 2014-06-27 | 2016-01-21 | 東京応化工業株式会社 | 剥離用組成物及び剥離方法 |
KR20160123707A (ko) * | 2015-04-17 | 2016-10-26 | 재원산업 주식회사 | 접착제 제거용 조성물 및 이를 이용한 박형 웨이퍼의 제조방법 |
KR20170028158A (ko) * | 2015-09-03 | 2017-03-13 | 동우 화인켐 주식회사 | 웨이퍼 배면연삭 후의 접착층 잔류물에 대한 세정전 전처리 조성물 및 그를 이용한 웨이퍼 배면연삭 후의 접착층 잔류물의 제거방법 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020119952A (ja) * | 2019-01-22 | 2020-08-06 | 株式会社ディスコ | キャリア板の除去方法 |
JP7146354B2 (ja) | 2019-01-22 | 2022-10-04 | 株式会社ディスコ | キャリア板の除去方法 |
CN113840670B (zh) * | 2019-05-22 | 2024-05-10 | 信越化学工业株式会社 | 清洗剂组合物、基板的清洗方法和支承体或基板的清洗方法 |
JPWO2021033654A1 (ja) * | 2019-08-19 | 2021-02-25 | ||
WO2021033654A1 (ja) * | 2019-08-19 | 2021-02-25 | 富士フイルム株式会社 | 洗浄用組成物、リンス液、洗浄キット、洗浄体の製造方法および半導体素子の製造方法 |
JP7160475B2 (ja) | 2019-08-19 | 2022-10-25 | 富士フイルム株式会社 | 洗浄用組成物、リンス液、洗浄キット、洗浄体の製造方法および半導体素子の製造方法 |
US20230131533A1 (en) * | 2020-03-23 | 2023-04-27 | Nissan Chemical Corporation | Method for cleaning semiconductor substrate, method for producing processed semiconductor substrate, and peeling composition |
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KR20190022734A (ko) | 2019-03-06 |
JPWO2018021273A1 (ja) | 2019-05-30 |
SG11201900729TA (en) | 2019-02-27 |
TWI732005B (zh) | 2021-07-01 |
KR102160021B1 (ko) | 2020-09-25 |
TW201829655A (zh) | 2018-08-16 |
JP6724140B2 (ja) | 2020-07-15 |
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