WO2017193780A1 - Procédé de fabrication pour un écran de projection, et écran de projection connexe - Google Patents

Procédé de fabrication pour un écran de projection, et écran de projection connexe Download PDF

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Publication number
WO2017193780A1
WO2017193780A1 PCT/CN2017/081152 CN2017081152W WO2017193780A1 WO 2017193780 A1 WO2017193780 A1 WO 2017193780A1 CN 2017081152 W CN2017081152 W CN 2017081152W WO 2017193780 A1 WO2017193780 A1 WO 2017193780A1
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WO
WIPO (PCT)
Prior art keywords
light
substrate
microstructure
transparent
projection screen
Prior art date
Application number
PCT/CN2017/081152
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English (en)
Chinese (zh)
Inventor
胡飞
周宇轩
李屹
Original Assignee
深圳市光峰光电技术有限公司
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Filing date
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Application filed by 深圳市光峰光电技术有限公司 filed Critical 深圳市光峰光电技术有限公司
Publication of WO2017193780A1 publication Critical patent/WO2017193780A1/fr

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/54—Accessories
    • G03B21/56—Projection screens
    • G03B21/60—Projection screens characterised by the nature of the surface
    • G03B21/62—Translucent screens
    • G03B21/625—Lenticular translucent screens
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/54—Accessories
    • G03B21/56—Projection screens
    • G03B21/60—Projection screens characterised by the nature of the surface

Definitions

  • the present invention relates to the field of optical structure application technologies, and in particular, to a method for fabricating a projection screen and an associated projection screen.
  • the projection screen is applied to the projection system for projecting the projected image.
  • the relative position of the projection screen and the projector is generally fixed, and the emitted light is incident on the screen at a certain angle of parallel light, and the incident light is reflected by the screen and reflected.
  • the light enters the human eye so that the viewer can view the image.
  • the position of the viewer relative to the projection screen is often fixed. It is hoped that the projection system will reflect the reflected light of the image on the screen only to the viewing area, and reduce the reflected light to the non-viewing area, which can improve the brightness of the viewing screen image, and people hope that the viewing area can be reflected by any position on the screen. Light is shining.
  • the present invention provides a method for fabricating a projection screen, which is formed by applying a surface structure to a projection screen, and is capable of adjusting an exit angle range of incident light that is reflected by the screen, and can achieve a preset angle range for the screen to emit light. The effect of the internal gain.
  • the present invention provides the following technical solutions:
  • a method of making a projection screen comprising fabricating a surface structure of a projection screen:
  • Step S1 fabricating a matrix-arranged transparent microstructure array, the transparent microstructure comprising: a light incident surface having a predetermined focal length having a converging effect on incident light; and a light reflecting surface disposed opposite to the light incident surface And being located in a focal length range of the light incident surface; connecting the light incident surface and a side surface of the light reflecting surface, wherein the side surface is incident with a predetermined incident angle incident light passing through an edge of the light incident surface Refracted light in parallel;
  • Step S2 forming a reflective layer on the light reflecting surface of the transparent microstructure, and filling a light absorber between adjacent side surfaces of the transparent microstructure.
  • step S1 includes:
  • Step S11 providing a substrate made of a photosensitive material, and pressing the one side of the substrate to form the light incident surface;
  • Step S12 illuminating one side of the substrate forming the light incident surface with approximately parallel light, exposing the substrate to an unexposed portion of the substrate to form a transparent micro-array Structure array.
  • the approximately parallel light is ultraviolet light.
  • the step S12 includes: illuminating the first region of the substrate with approximately parallel light at a first angle to the normal of the substrate, and illuminating the first parallel light at a second angle to the normal of the substrate a second region of the substrate, the first angle being different from the second angle.
  • step S11 includes:
  • the light incident surface is formed on one side of the substrate by using a flat stamper having a corresponding microstructure on the surface.
  • step S1 includes:
  • first stamper and a second stamper aligned on both sides of the substrate, simultaneously pressing on both sides of the substrate to form a matrix-arranged transparent microstructure array, the first stamper surface having a corresponding a microstructure of the light incident surface, the second stamper surface having a microstructure corresponding to the side surface and the light reflecting surface.
  • step S1 includes:
  • a second stamper In alignment with the alignment mark, a second stamper is pressed on the other surface of the substrate to form a side surface and a light reflecting surface aligned with the light incident surface, and the second stamper has a side surface and a light reflecting surface. microstructure.
  • step S2 includes:
  • a reflective layer is coated on the bottom surface of the surface structure on which the light absorber is formed.
  • step S2 includes:
  • the flat plate is pressed on the light reflecting surface of the formed transparent microstructure by a side coated with the reflective material layer;
  • a light absorbing material is filled between adjacent sides of the transparent microstructure, and is cured to form a light absorber.
  • step S2 includes:
  • the flat plate is pressed on the light reflecting surface of the formed transparent microstructure with one side having an elastic reflective layer;
  • a liquid light absorbing material is filled between adjacent sides of the transparent microstructure, and is cured to form a light absorber.
  • the present invention also provides a projection screen which is fabricated in accordance with the above-described manufacturing method.
  • the projection screen made by the present invention has a surface structure including a matrix-arranged transparent microstructure array, a reflective layer and a light absorber, wherein the transparent microstructure includes a light incident surface, a light reflecting surface and a side surface, and light incident The incident light has a converging effect and has a preset focal length; the light reflecting surface is located in a focal length range of the light incident surface, and a reflective layer is disposed on the light reflecting surface to make the light reflecting surface have a reflecting effect; the side connecting light incident surface And light reflecting surface.
  • the method for fabricating a projection screen comprises: fabricating a surface structure of a projection screen, comprising: fabricating a matrix-arranged transparent microstructure array; forming a reflective layer on the light-reflecting surface of the transparent microstructure, A light absorber is filled between the sides of the adjacent transparent microstructures, and the transparent microstructures produced thereof satisfy the corresponding design requirements.
  • the surface structure of the projection screen is based on the light incident surface and the light reflecting surface of the transparent microstructure, and can adjust the range of the exit angle of the light emitted by the screen, so that the incident light with a certain incident angle can be reflected by the projection screen and then emitted at a preset angle range.
  • the incident angle of the incident light and the range of the exit angle of the required screen light the focal length of the light incident surface of the transparent microstructure, the width of the light incident surface, and the distance from the light reflecting surface to the focal plane of the light incident surface can be controlled.
  • the projected light incident at a certain angle of incidence is emitted within a predetermined range of angles.
  • the effect of gaining the light emitted by the screen within a preset angle range is realized; and the stray light incident at other angles is deflected to the side surface after entering the transparent microstructure through the light incident surface, and is absorbed by the side light absorber. It can avoid stray light emission. Thereby, the brightness and contrast of the screen image viewed by the viewer can be improved.
  • FIG. 1 is a flowchart of a method for fabricating a surface structure of a projection screen according to an embodiment of the present invention
  • FIG. 2 is a schematic diagram of a surface structure of a projection screen according to an embodiment of the present invention.
  • FIG. 3 is a flowchart of a method for fabricating a transparent microstructure according to an embodiment of the present invention
  • FIG. 4 is a schematic view showing a transparent microstructure formed by compression molding according to an embodiment of the present invention.
  • FIG. 5 is a schematic diagram of a method for fabricating a light absorber and a reflective layer according to an embodiment of the present invention
  • FIG. 6 is a schematic diagram of another method for fabricating a light absorber and a reflective layer according to an embodiment of the present invention.
  • FIG. 7 is a schematic diagram of another method for fabricating a light absorber and a reflective layer according to an embodiment of the present invention.
  • a method for fabricating a projection screen according to an embodiment of the present invention includes the surface structure of the projection screen. Referring to FIG. 1, the method includes:
  • Step S1 fabricating a matrix-arranged transparent microstructure array, the transparent microstructure comprising: a light incident surface having a predetermined focal length having a converging effect on incident light; and a light reflecting surface disposed opposite to the light incident surface And being located in a focal length range of the light incident surface; connecting the light incident surface and a side surface of the light reflecting surface, wherein the side surface is incident with a predetermined incident angle incident light passing through an edge of the light incident surface Refracted light in parallel;
  • Step S2 forming a reflective layer on the light reflecting surface of the transparent microstructure, and filling a light absorber between adjacent side surfaces of the transparent microstructure.
  • FIG. 2 is a schematic diagram of a surface structure of a projection screen produced in the embodiment.
  • the projection screen surface structure formed by the present embodiment comprises an array of matrix-arranged transparent microstructures 100, a reflective layer 104 and a light absorber 105, wherein the transparent microstructure 100 comprises a light incident surface 101, a light reflecting surface 102 and a side surface. 103, the light incident surface 101 has a converging effect on the incident light, and has a preset focal length; the light reflecting surface 102 is disposed opposite to the light incident surface 101, and is located in a focal length range of the light incident surface 101; and the reflective layer is disposed on the light reflecting surface 102. 104, causing the light reflection to have a reflection effect on the light.
  • the side surface 103 connects the light incident surface 101 and the light reflecting surface 102.
  • the surface structure is applied to the projection screen.
  • the incident light is irradiated to the projection screen at a certain incident angle
  • the incident light is irradiated into the transparent microstructure by the light incident surface 101 of the surface structure, and the formed refracted light is concentrated and irradiated to the focal plane.
  • the light reflecting surface 102 after being reflected, the light beam is again refracted through the light incident surface 101 to form an outgoing light.
  • the reverse extension of the exiting light forms a virtual image of a point source within the transparent microstructure, each transparent microstructure having a virtual image of a point source, and the projection screen comprising a plurality of arrays of transparent microstructures arranged in a matrix form A virtual image of multiple point sources.
  • the light reflected by the projection screen is equivalent to the combined light of the light emitted from the plurality of point sources, which greatly improves the utilization of the reflected light and improves the brightness and viewing experience.
  • the emission range of the outgoing light can be limited; the light reflecting surface 102 is located within the focal length of the light incident surface 101, so that the refracted light is focused before focusing on the focal plane.
  • the side surface 103 of the transparent microstructure 100 is parallel to the refracted light formed by the edge of the light incident surface 101 by the incident light of the predetermined incident angle, and the transparent microstructure may have one or more curved surfaces or plane sides 103.
  • There is a parallel incident light whose refracted light formed on the side where the light incident surface is connected to either side is parallel to the side surface, and the light absorber 105 is provided on the side surface 103.
  • the outgoing light formed by the transparent microstructure is emitted at a predetermined angular range, and the stray light incident at other angles is deflected to the transparent microstructure after entering the transparent microstructure through the light incident surface 101.
  • the side surface 103 is absorbed by the side light absorber. Therefore, the projection screen surface structure avoids the influence of stray light from being refracted by the light incident surface to affect the quality of the projected image.
  • the focal length and width of the transparent microstructure light incident surface and the thickness of the transparent microstructure are designed correspondingly.
  • the distance from the light reflecting surface can control the incident light with a certain incident angle to exit within a preset angle range, thereby realizing the effect of gaining the light emitted by the screen within a preset angle range.
  • the exiting light of the projection screen can be limited to the viewing area, the effect of the output light gain corresponding to the viewing area can be achieved, and the viewer can view the screen image. Brightness, while based on the side's absorption of stray light, reduces stray light and improves the contrast of the viewer's viewing of the screen image.
  • a transparent microstructure array formed in a matrix arrangement is formed, and the light incident surface, the light reflecting surface and the side surface of the transparent microstructure satisfy the corresponding design size requirements, and then are transparent.
  • the light-reflecting surface of the microstructure is formed to form a reflective layer, and the light-absorbing body is filled between the sides of the adjacent transparent microstructures, thereby completely forming a surface structure for forming a projection screen.
  • the following method is employed to fabricate a transparent microstructure array forming a matrix arrangement.
  • the fabrication method is formed by photolithography to form a transparent microstructure. Please refer to Figure 3, including the following steps:
  • Step S11 providing a substrate made of a photosensitive material.
  • the light incident surface is formed by pressing on one side of the substrate.
  • a light incident surface is formed on one side of the substrate, and the light incident surface may be formed on one side of the substrate by using a roller having a corresponding microstructure on the surface.
  • the light incident surface may be formed on one side of the substrate by using a flat stamper having a corresponding microstructure on the surface.
  • Step S12 illuminating one side of the substrate forming the light incident surface with approximately parallel light, exposing the substrate to an unexposed portion of the substrate to form a transparent micro-array Structure array.
  • the nearly parallel light in the present invention is the parallel light that we routinely describe. Since it is difficult to have absolute parallel light in nature, the present invention uses the approximation of parallel light instead of parallel light, so the approximate parallel light and parallel light appearing in this specification. Is synonymous.
  • approximately parallel light refers to light that is considered to be parallel within the error range, and it can be considered that the angle between the two sub-beams having the largest internal angle of the beam is less than 5°.
  • the side parallel to the light forming the light incident surface is irradiated with the parallel light, and the parallel light is refracted into the substrate, focused, and concentrated in the focus range.
  • the portion of the light that passes through the substrate is exposed to light, and the portion where no light passes is not exposed.
  • the side faces are formed by the parallel light exposure treatment, correspondingly forming a transparent microstructure.
  • the parallel light when the surface of the substrate is subjected to exposure treatment using parallel light, the parallel light is irradiated in a direction having an angle ⁇ with respect to the normal to the substrate, and 0° ⁇ ⁇ ⁇ 90°.
  • the parallel light irradiates the surface of the substrate at the same angle as the incident angle of the incident light for exposure processing, so that the side surface of the transparent microstructure formed after the exposure processing can meet the design requirements. .
  • the photosensitive material comprises a photosensitive resin
  • the approximately parallel light may be ultraviolet light
  • the photosensitive material can be cured under irradiation of ultraviolet light. It can be understood that parallel light of other wavelength types can also be used depending on the photosensitive material in actual production.
  • the portion of the substrate that is not exposed is washed away with a special solution to form a matrix-arranged transparent microstructure array.
  • the plane area is generally large, and the projector placement position is fixed relative to the screen. Therefore, the projector illuminates the incident light on the screen surface, and the incident angle of different areas irradiated on the screen surface will be different, which corresponds to the exit angle of the viewing area.
  • the range is also different.
  • the surface structure includes at least a first region and a second region, a transparent microstructure located in the first region, and a transparent portion located in the second region
  • the size of the microstructure is different, the focal lengths of the light incident surfaces of the transparent microstructures located in different regions are different, the range of the exit angle of the incident light formed by the transparent microstructure of the first region, and the incident light passing through the second
  • the range of exit angles of the outgoing light formed by the regional transparent microstructure is different.
  • the substrate made of the photosensitive material includes at least a first region and a second region, and a focal length of the light reflecting surface in the first region and a focal length of the light reflecting surface in the second region are different.
  • step S12 includes: illuminating the first region of the substrate with parallel light at a first angle to the normal of the substrate, and illuminating the second region of the substrate with parallel light at a second angle to the normal of the substrate .
  • incident light illuminating the first region of the screen surface structure is incident at a first incident angle
  • incident light illuminating the second region of the surface structure of the screen is incident at a second incident angle
  • the angle between the parallel light of the first region of the substrate and the normal of the substrate is the same as the first incident angle
  • the angle between the parallel light of the second region of the illumination substrate and the normal of the substrate is the same as the second incident angle, thereby forming a corresponding Transparent microstructure.
  • connection force between the transparent microstructures is small, so the light absorbing material and the reflective layer should be filled immediately after the microstructure is formed to increase the connection force between the microstructures. To ensure the integrity of the surface structure produced.
  • the above fabrication method lithographically fabricates a transparent microstructure array forming a matrix arrangement, which fully utilizes the special size design of the light incident surface of the surface structure, which does not require a mask, which reduces the cost of the photolithography process. And it can realize large-area microstructures in one time.
  • the transparent microstructure array forming the matrix arrangement can be formed by physical processing and compression molding.
  • the specific processing methods can be as follows.
  • the first fabrication scheme firstly providing a substrate, then aligning on both sides of the substrate by using a first stamper and a second stamper, and simultaneously pressing on both sides of the substrate to form a matrix-arranged transparent microstructure array .
  • the first stamper surface has a microstructure corresponding to the light incident surface
  • the second stamper surface has a microstructure corresponding to the side surface and the light reflecting surface, as shown in FIG.
  • the processing method adopts the first stamper and the second stamper to simultaneously press on both sides of the substrate, and simultaneously forms a light incident surface, a side surface and a light reflecting surface on both sides, and is formed at one time, and the processing is convenient.
  • the processed transparent microstructure may have a thickness layer between the light incident surface and the side surface, but is transparent.
  • the optical dimensions of the microstructure are designed to take into account the effect of this thickness layer on the optical path.
  • Another fabrication scheme is to separately form a microstructure on two sides of the substrate, specifically: firstly providing a substrate, first pressing a first stamper on one side of the substrate to form a light incident surface, and leaving Aligning the mark, the first stamper surface has a microstructure corresponding to the light incident surface; then, aligned with the alignment mark left on the substrate, and pressed and formed on the other side of the substrate by the second stamper
  • the surface of the surface alignment and the light reflecting surface, the second pressing mold has a microstructure corresponding to the side surface and the light reflecting surface. It can be understood that the side surface and the light reflecting surface can be formed on one side of the substrate, and then the light incident surface can be formed on the other surface by alignment.
  • the processed transparent microstructures may leave a thickness layer between the light incident surface and the side surface, in transparent micro
  • the thickness of the structure must be considered in the design of the optical dimensions of the structure.
  • the first stamper and the second stamper may adopt a roller having a corresponding microstructure on the surface, or a flat stamper having a corresponding microstructure on the surface may also be used.
  • the transparent microstructure arrays which are formed into a matrix arrangement are described in detail above, and the formation of the light absorber and the reflection layer will be described in detail below.
  • the following fabrication methods are employed to fabricate the light absorber and the reflective layer on the transparent microstructure formed.
  • the manufacturing method specifically includes the following steps:
  • S300 filling a liquid or semi-solid light absorbing material between adjacent sides of the transparent microstructure 100.
  • S301 scraping off the excess light absorbing material on the surface and performing a curing treatment to form the light absorbing body 105. After the light absorbing material fills the entire surface, the excess light absorbing material on the surface can be scraped off with a doctor blade to ensure that the surface is flat, and then the curing process is performed to cure the light absorbing material.
  • a reflective layer 104 is coated on the bottom surface of the surface structure forming the light absorber 105. After the light absorbing material is cured, a reflective layer is coated on the bottom surface thereof to complete the light absorber and the reflective layer.
  • the production method has the advantages of convenient implementation and low cost. However, it is impossible to completely remove the excess light absorbing material by using a scraper. Therefore, there may be a thin layer of light absorbing material between the reflective layer and the bottom surface of the transparent microstructure after molding, which affects the optical path due to the layer of light absorbing material. It is thin, so it does not completely absorb the light on the light path, but it will inevitably absorb part of the light, causing the screen gain to decrease.
  • the processing method is preferably applied to the case of a transparent microstructure in which the light reflecting surface is a horizontal plane, and cannot be applied to the case where the light reflecting surface of the transparent microstructure is an inclined surface.
  • the light absorber and the reflective layer are formed on the transparent microstructure formed by the following method.
  • the manufacturing method specifically includes the following steps:
  • S400 providing a flat plate having a surface coated with a semi-solid reflective material layer.
  • the layer of reflective material is a semi-solid colloidal substance.
  • S401 The flat plate is pressed on the light reflecting surface of the transparent microstructure 100 with a surface coated with a reflective material layer.
  • the reflective material layer is bonded to the light reflecting surface of the transparent microstructure, and the reflective material layer is cured to form the reflective layer 104.
  • the semi-solid gel-like reflective material layer of the flat surface is required to be relatively thick, so that the gel-like reflective material covers the entire transparent micro during the pressing process of the flat plate. Structured light reflecting surface.
  • the gel-like reflective material is too thick, it may fall off and flow, and it may be contaminated onto other structural surfaces where it is not desired to coat the reflective layer. Therefore, the processing difficulty is increased and the process control requirements are relatively high.
  • the light absorber and the reflective layer are formed on the transparent microstructure formed by the following method.
  • the manufacturing method specifically includes the following steps:
  • S500 providing a flat plate, the surface of the flat plate is provided with an elastic reflective layer.
  • S501 The flat plate is pressed on the light reflecting surface of the transparent microstructure 100 with a surface having an elastic reflective layer.
  • the elastic reflective layer is deformed against the transparent microstructured light reflecting surface by suitable pressure pressing.
  • S502 filling a liquid light absorbing material between adjacent sides of the transparent microstructure, and curing treatment to form the light absorber.
  • a liquid light absorbing material may be filled between the sides of the adjacent transparent microstructures 100 by capillary filling or vacuum filling. The light absorbing material is then cured, and the transparent microstructure and the reflective layer are bonded together by the cured light absorbing material.
  • the light absorbing material may contaminate the light incident surface of the transparent microstructure 100 when the light absorbing material is filled during the processing. Therefore, before the filling of the light absorbing material, a protective layer for preventing the light incident surface from being contaminated may be coated on the light incident surface of the transparent microstructure, and the protective layer may be removed after the surface structure is completed.
  • the elastic reflecting layer of the flat surface is required to be relatively thick.
  • the plate is pressed against the bottom surface of the formed transparent microstructure with a suitable pressure so that the deformed elastic reflective layer can cover the entire bottom surface of the transparent microstructure. At this time, the deformation is large, and the stress can be reduced by a certain annealing method. Then, the light absorbing material is filled and solidified.
  • the surface structure can be attached to a thick substrate to ensure a certain strength, and then combined with the projection screen to form a projection screen having the surface structure.
  • the present invention also provides a projection screen which is fabricated by the fabrication method of the above embodiment.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Overhead Projectors And Projection Screens (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

La présente invention a trait à un procédé de fabrication pour un écran de projection et à un écran de projection connexe, le procédé de fabrication consistant à fabriquer une structure de surface de l'écran de projection. À l'étape S1, un réseau de microstructures transparentes (100) disposées sous la forme d'une matrice est fabriqué. La microstructure transparente (100) comporte : une surface d'incidence de lumière (101) servant à faire converger la lumière incidente et ayant une longueur focale prédéfinie ; une surface de réflexion de lumière (102) située en regard de la surface d'incidence de lumière (101) et à l'intérieur de la plage de longueurs focales de cette surface d'incidence de lumière (101) ; et une surface latérale (103) reliant ladite surface d'incidence de lumière (101) et la surface de réflexion de lumière (102), la surface latérale (103) étant parallèle à la lumière réfractée formée grâce à l'incidence de la lumière incidente ayant un angle d'incidence prédéfini par l'intermédiaire d'un bord de la surface d'incidence de lumière (101). À l'étape S2, une couche de réflexion (104) est fabriquée sur la surface de réflexion de lumière (102) de la microstructure transparente (100), et un absorbeur de lumière (105) remplit l'espace entre les surfaces latérales (103) de microstructures transparentes (100) adjacentes. Ainsi, une lumière incidente ayant un certain angle d'incidence est émise dans une plage d'angles prédéfinie, et une lumière parasite ayant d'autres angles d'incidence est déviée et réfractée vers une surface latérale et est absorbée, ce qui a pour effet d'obtenir une lumière émergente d'écran dans la plage d'angles prédéfinie.
PCT/CN2017/081152 2016-05-12 2017-04-19 Procédé de fabrication pour un écran de projection, et écran de projection connexe WO2017193780A1 (fr)

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CN201610316152.1 2016-05-12
CN201610316152.1A CN107367898B (zh) 2016-05-12 2016-05-12 一种投影屏幕的制作方法及相关投影屏幕

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