WO2017193780A1 - Manufacturing method for projection screen, and related projection screen - Google Patents

Manufacturing method for projection screen, and related projection screen Download PDF

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Publication number
WO2017193780A1
WO2017193780A1 PCT/CN2017/081152 CN2017081152W WO2017193780A1 WO 2017193780 A1 WO2017193780 A1 WO 2017193780A1 CN 2017081152 W CN2017081152 W CN 2017081152W WO 2017193780 A1 WO2017193780 A1 WO 2017193780A1
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WO
WIPO (PCT)
Prior art keywords
light
substrate
microstructure
transparent
projection screen
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Application number
PCT/CN2017/081152
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French (fr)
Chinese (zh)
Inventor
胡飞
周宇轩
李屹
Original Assignee
深圳市光峰光电技术有限公司
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Application filed by 深圳市光峰光电技术有限公司 filed Critical 深圳市光峰光电技术有限公司
Publication of WO2017193780A1 publication Critical patent/WO2017193780A1/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00Projectors or projection-type viewers; Accessories therefor
    • G03B21/54Accessories
    • G03B21/56Projection screens
    • G03B21/60Projection screens characterised by the nature of the surface
    • G03B21/62Translucent screens
    • G03B21/625Lenticular translucent screens
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00Projectors or projection-type viewers; Accessories therefor
    • G03B21/54Accessories
    • G03B21/56Projection screens
    • G03B21/60Projection screens characterised by the nature of the surface

Definitions

  • the present invention relates to the field of optical structure application technologies, and in particular, to a method for fabricating a projection screen and an associated projection screen.
  • the projection screen is applied to the projection system for projecting the projected image.
  • the relative position of the projection screen and the projector is generally fixed, and the emitted light is incident on the screen at a certain angle of parallel light, and the incident light is reflected by the screen and reflected.
  • the light enters the human eye so that the viewer can view the image.
  • the position of the viewer relative to the projection screen is often fixed. It is hoped that the projection system will reflect the reflected light of the image on the screen only to the viewing area, and reduce the reflected light to the non-viewing area, which can improve the brightness of the viewing screen image, and people hope that the viewing area can be reflected by any position on the screen. Light is shining.
  • the present invention provides a method for fabricating a projection screen, which is formed by applying a surface structure to a projection screen, and is capable of adjusting an exit angle range of incident light that is reflected by the screen, and can achieve a preset angle range for the screen to emit light. The effect of the internal gain.
  • the present invention provides the following technical solutions:
  • a method of making a projection screen comprising fabricating a surface structure of a projection screen:
  • Step S1 fabricating a matrix-arranged transparent microstructure array, the transparent microstructure comprising: a light incident surface having a predetermined focal length having a converging effect on incident light; and a light reflecting surface disposed opposite to the light incident surface And being located in a focal length range of the light incident surface; connecting the light incident surface and a side surface of the light reflecting surface, wherein the side surface is incident with a predetermined incident angle incident light passing through an edge of the light incident surface Refracted light in parallel;
  • Step S2 forming a reflective layer on the light reflecting surface of the transparent microstructure, and filling a light absorber between adjacent side surfaces of the transparent microstructure.
  • step S1 includes:
  • Step S11 providing a substrate made of a photosensitive material, and pressing the one side of the substrate to form the light incident surface;
  • Step S12 illuminating one side of the substrate forming the light incident surface with approximately parallel light, exposing the substrate to an unexposed portion of the substrate to form a transparent micro-array Structure array.
  • the approximately parallel light is ultraviolet light.
  • the step S12 includes: illuminating the first region of the substrate with approximately parallel light at a first angle to the normal of the substrate, and illuminating the first parallel light at a second angle to the normal of the substrate a second region of the substrate, the first angle being different from the second angle.
  • step S11 includes:
  • the light incident surface is formed on one side of the substrate by using a flat stamper having a corresponding microstructure on the surface.
  • step S1 includes:
  • first stamper and a second stamper aligned on both sides of the substrate, simultaneously pressing on both sides of the substrate to form a matrix-arranged transparent microstructure array, the first stamper surface having a corresponding a microstructure of the light incident surface, the second stamper surface having a microstructure corresponding to the side surface and the light reflecting surface.
  • step S1 includes:
  • a second stamper In alignment with the alignment mark, a second stamper is pressed on the other surface of the substrate to form a side surface and a light reflecting surface aligned with the light incident surface, and the second stamper has a side surface and a light reflecting surface. microstructure.
  • step S2 includes:
  • a reflective layer is coated on the bottom surface of the surface structure on which the light absorber is formed.
  • step S2 includes:
  • the flat plate is pressed on the light reflecting surface of the formed transparent microstructure by a side coated with the reflective material layer;
  • a light absorbing material is filled between adjacent sides of the transparent microstructure, and is cured to form a light absorber.
  • step S2 includes:
  • the flat plate is pressed on the light reflecting surface of the formed transparent microstructure with one side having an elastic reflective layer;
  • a liquid light absorbing material is filled between adjacent sides of the transparent microstructure, and is cured to form a light absorber.
  • the present invention also provides a projection screen which is fabricated in accordance with the above-described manufacturing method.
  • the projection screen made by the present invention has a surface structure including a matrix-arranged transparent microstructure array, a reflective layer and a light absorber, wherein the transparent microstructure includes a light incident surface, a light reflecting surface and a side surface, and light incident The incident light has a converging effect and has a preset focal length; the light reflecting surface is located in a focal length range of the light incident surface, and a reflective layer is disposed on the light reflecting surface to make the light reflecting surface have a reflecting effect; the side connecting light incident surface And light reflecting surface.
  • the method for fabricating a projection screen comprises: fabricating a surface structure of a projection screen, comprising: fabricating a matrix-arranged transparent microstructure array; forming a reflective layer on the light-reflecting surface of the transparent microstructure, A light absorber is filled between the sides of the adjacent transparent microstructures, and the transparent microstructures produced thereof satisfy the corresponding design requirements.
  • the surface structure of the projection screen is based on the light incident surface and the light reflecting surface of the transparent microstructure, and can adjust the range of the exit angle of the light emitted by the screen, so that the incident light with a certain incident angle can be reflected by the projection screen and then emitted at a preset angle range.
  • the incident angle of the incident light and the range of the exit angle of the required screen light the focal length of the light incident surface of the transparent microstructure, the width of the light incident surface, and the distance from the light reflecting surface to the focal plane of the light incident surface can be controlled.
  • the projected light incident at a certain angle of incidence is emitted within a predetermined range of angles.
  • the effect of gaining the light emitted by the screen within a preset angle range is realized; and the stray light incident at other angles is deflected to the side surface after entering the transparent microstructure through the light incident surface, and is absorbed by the side light absorber. It can avoid stray light emission. Thereby, the brightness and contrast of the screen image viewed by the viewer can be improved.
  • FIG. 1 is a flowchart of a method for fabricating a surface structure of a projection screen according to an embodiment of the present invention
  • FIG. 2 is a schematic diagram of a surface structure of a projection screen according to an embodiment of the present invention.
  • FIG. 3 is a flowchart of a method for fabricating a transparent microstructure according to an embodiment of the present invention
  • FIG. 4 is a schematic view showing a transparent microstructure formed by compression molding according to an embodiment of the present invention.
  • FIG. 5 is a schematic diagram of a method for fabricating a light absorber and a reflective layer according to an embodiment of the present invention
  • FIG. 6 is a schematic diagram of another method for fabricating a light absorber and a reflective layer according to an embodiment of the present invention.
  • FIG. 7 is a schematic diagram of another method for fabricating a light absorber and a reflective layer according to an embodiment of the present invention.
  • a method for fabricating a projection screen according to an embodiment of the present invention includes the surface structure of the projection screen. Referring to FIG. 1, the method includes:
  • Step S1 fabricating a matrix-arranged transparent microstructure array, the transparent microstructure comprising: a light incident surface having a predetermined focal length having a converging effect on incident light; and a light reflecting surface disposed opposite to the light incident surface And being located in a focal length range of the light incident surface; connecting the light incident surface and a side surface of the light reflecting surface, wherein the side surface is incident with a predetermined incident angle incident light passing through an edge of the light incident surface Refracted light in parallel;
  • Step S2 forming a reflective layer on the light reflecting surface of the transparent microstructure, and filling a light absorber between adjacent side surfaces of the transparent microstructure.
  • FIG. 2 is a schematic diagram of a surface structure of a projection screen produced in the embodiment.
  • the projection screen surface structure formed by the present embodiment comprises an array of matrix-arranged transparent microstructures 100, a reflective layer 104 and a light absorber 105, wherein the transparent microstructure 100 comprises a light incident surface 101, a light reflecting surface 102 and a side surface. 103, the light incident surface 101 has a converging effect on the incident light, and has a preset focal length; the light reflecting surface 102 is disposed opposite to the light incident surface 101, and is located in a focal length range of the light incident surface 101; and the reflective layer is disposed on the light reflecting surface 102. 104, causing the light reflection to have a reflection effect on the light.
  • the side surface 103 connects the light incident surface 101 and the light reflecting surface 102.
  • the surface structure is applied to the projection screen.
  • the incident light is irradiated to the projection screen at a certain incident angle
  • the incident light is irradiated into the transparent microstructure by the light incident surface 101 of the surface structure, and the formed refracted light is concentrated and irradiated to the focal plane.
  • the light reflecting surface 102 after being reflected, the light beam is again refracted through the light incident surface 101 to form an outgoing light.
  • the reverse extension of the exiting light forms a virtual image of a point source within the transparent microstructure, each transparent microstructure having a virtual image of a point source, and the projection screen comprising a plurality of arrays of transparent microstructures arranged in a matrix form A virtual image of multiple point sources.
  • the light reflected by the projection screen is equivalent to the combined light of the light emitted from the plurality of point sources, which greatly improves the utilization of the reflected light and improves the brightness and viewing experience.
  • the emission range of the outgoing light can be limited; the light reflecting surface 102 is located within the focal length of the light incident surface 101, so that the refracted light is focused before focusing on the focal plane.
  • the side surface 103 of the transparent microstructure 100 is parallel to the refracted light formed by the edge of the light incident surface 101 by the incident light of the predetermined incident angle, and the transparent microstructure may have one or more curved surfaces or plane sides 103.
  • There is a parallel incident light whose refracted light formed on the side where the light incident surface is connected to either side is parallel to the side surface, and the light absorber 105 is provided on the side surface 103.
  • the outgoing light formed by the transparent microstructure is emitted at a predetermined angular range, and the stray light incident at other angles is deflected to the transparent microstructure after entering the transparent microstructure through the light incident surface 101.
  • the side surface 103 is absorbed by the side light absorber. Therefore, the projection screen surface structure avoids the influence of stray light from being refracted by the light incident surface to affect the quality of the projected image.
  • the focal length and width of the transparent microstructure light incident surface and the thickness of the transparent microstructure are designed correspondingly.
  • the distance from the light reflecting surface can control the incident light with a certain incident angle to exit within a preset angle range, thereby realizing the effect of gaining the light emitted by the screen within a preset angle range.
  • the exiting light of the projection screen can be limited to the viewing area, the effect of the output light gain corresponding to the viewing area can be achieved, and the viewer can view the screen image. Brightness, while based on the side's absorption of stray light, reduces stray light and improves the contrast of the viewer's viewing of the screen image.
  • a transparent microstructure array formed in a matrix arrangement is formed, and the light incident surface, the light reflecting surface and the side surface of the transparent microstructure satisfy the corresponding design size requirements, and then are transparent.
  • the light-reflecting surface of the microstructure is formed to form a reflective layer, and the light-absorbing body is filled between the sides of the adjacent transparent microstructures, thereby completely forming a surface structure for forming a projection screen.
  • the following method is employed to fabricate a transparent microstructure array forming a matrix arrangement.
  • the fabrication method is formed by photolithography to form a transparent microstructure. Please refer to Figure 3, including the following steps:
  • Step S11 providing a substrate made of a photosensitive material.
  • the light incident surface is formed by pressing on one side of the substrate.
  • a light incident surface is formed on one side of the substrate, and the light incident surface may be formed on one side of the substrate by using a roller having a corresponding microstructure on the surface.
  • the light incident surface may be formed on one side of the substrate by using a flat stamper having a corresponding microstructure on the surface.
  • Step S12 illuminating one side of the substrate forming the light incident surface with approximately parallel light, exposing the substrate to an unexposed portion of the substrate to form a transparent micro-array Structure array.
  • the nearly parallel light in the present invention is the parallel light that we routinely describe. Since it is difficult to have absolute parallel light in nature, the present invention uses the approximation of parallel light instead of parallel light, so the approximate parallel light and parallel light appearing in this specification. Is synonymous.
  • approximately parallel light refers to light that is considered to be parallel within the error range, and it can be considered that the angle between the two sub-beams having the largest internal angle of the beam is less than 5°.
  • the side parallel to the light forming the light incident surface is irradiated with the parallel light, and the parallel light is refracted into the substrate, focused, and concentrated in the focus range.
  • the portion of the light that passes through the substrate is exposed to light, and the portion where no light passes is not exposed.
  • the side faces are formed by the parallel light exposure treatment, correspondingly forming a transparent microstructure.
  • the parallel light when the surface of the substrate is subjected to exposure treatment using parallel light, the parallel light is irradiated in a direction having an angle ⁇ with respect to the normal to the substrate, and 0° ⁇ ⁇ ⁇ 90°.
  • the parallel light irradiates the surface of the substrate at the same angle as the incident angle of the incident light for exposure processing, so that the side surface of the transparent microstructure formed after the exposure processing can meet the design requirements. .
  • the photosensitive material comprises a photosensitive resin
  • the approximately parallel light may be ultraviolet light
  • the photosensitive material can be cured under irradiation of ultraviolet light. It can be understood that parallel light of other wavelength types can also be used depending on the photosensitive material in actual production.
  • the portion of the substrate that is not exposed is washed away with a special solution to form a matrix-arranged transparent microstructure array.
  • the plane area is generally large, and the projector placement position is fixed relative to the screen. Therefore, the projector illuminates the incident light on the screen surface, and the incident angle of different areas irradiated on the screen surface will be different, which corresponds to the exit angle of the viewing area.
  • the range is also different.
  • the surface structure includes at least a first region and a second region, a transparent microstructure located in the first region, and a transparent portion located in the second region
  • the size of the microstructure is different, the focal lengths of the light incident surfaces of the transparent microstructures located in different regions are different, the range of the exit angle of the incident light formed by the transparent microstructure of the first region, and the incident light passing through the second
  • the range of exit angles of the outgoing light formed by the regional transparent microstructure is different.
  • the substrate made of the photosensitive material includes at least a first region and a second region, and a focal length of the light reflecting surface in the first region and a focal length of the light reflecting surface in the second region are different.
  • step S12 includes: illuminating the first region of the substrate with parallel light at a first angle to the normal of the substrate, and illuminating the second region of the substrate with parallel light at a second angle to the normal of the substrate .
  • incident light illuminating the first region of the screen surface structure is incident at a first incident angle
  • incident light illuminating the second region of the surface structure of the screen is incident at a second incident angle
  • the angle between the parallel light of the first region of the substrate and the normal of the substrate is the same as the first incident angle
  • the angle between the parallel light of the second region of the illumination substrate and the normal of the substrate is the same as the second incident angle, thereby forming a corresponding Transparent microstructure.
  • connection force between the transparent microstructures is small, so the light absorbing material and the reflective layer should be filled immediately after the microstructure is formed to increase the connection force between the microstructures. To ensure the integrity of the surface structure produced.
  • the above fabrication method lithographically fabricates a transparent microstructure array forming a matrix arrangement, which fully utilizes the special size design of the light incident surface of the surface structure, which does not require a mask, which reduces the cost of the photolithography process. And it can realize large-area microstructures in one time.
  • the transparent microstructure array forming the matrix arrangement can be formed by physical processing and compression molding.
  • the specific processing methods can be as follows.
  • the first fabrication scheme firstly providing a substrate, then aligning on both sides of the substrate by using a first stamper and a second stamper, and simultaneously pressing on both sides of the substrate to form a matrix-arranged transparent microstructure array .
  • the first stamper surface has a microstructure corresponding to the light incident surface
  • the second stamper surface has a microstructure corresponding to the side surface and the light reflecting surface, as shown in FIG.
  • the processing method adopts the first stamper and the second stamper to simultaneously press on both sides of the substrate, and simultaneously forms a light incident surface, a side surface and a light reflecting surface on both sides, and is formed at one time, and the processing is convenient.
  • the processed transparent microstructure may have a thickness layer between the light incident surface and the side surface, but is transparent.
  • the optical dimensions of the microstructure are designed to take into account the effect of this thickness layer on the optical path.
  • Another fabrication scheme is to separately form a microstructure on two sides of the substrate, specifically: firstly providing a substrate, first pressing a first stamper on one side of the substrate to form a light incident surface, and leaving Aligning the mark, the first stamper surface has a microstructure corresponding to the light incident surface; then, aligned with the alignment mark left on the substrate, and pressed and formed on the other side of the substrate by the second stamper
  • the surface of the surface alignment and the light reflecting surface, the second pressing mold has a microstructure corresponding to the side surface and the light reflecting surface. It can be understood that the side surface and the light reflecting surface can be formed on one side of the substrate, and then the light incident surface can be formed on the other surface by alignment.
  • the processed transparent microstructures may leave a thickness layer between the light incident surface and the side surface, in transparent micro
  • the thickness of the structure must be considered in the design of the optical dimensions of the structure.
  • the first stamper and the second stamper may adopt a roller having a corresponding microstructure on the surface, or a flat stamper having a corresponding microstructure on the surface may also be used.
  • the transparent microstructure arrays which are formed into a matrix arrangement are described in detail above, and the formation of the light absorber and the reflection layer will be described in detail below.
  • the following fabrication methods are employed to fabricate the light absorber and the reflective layer on the transparent microstructure formed.
  • the manufacturing method specifically includes the following steps:
  • S300 filling a liquid or semi-solid light absorbing material between adjacent sides of the transparent microstructure 100.
  • S301 scraping off the excess light absorbing material on the surface and performing a curing treatment to form the light absorbing body 105. After the light absorbing material fills the entire surface, the excess light absorbing material on the surface can be scraped off with a doctor blade to ensure that the surface is flat, and then the curing process is performed to cure the light absorbing material.
  • a reflective layer 104 is coated on the bottom surface of the surface structure forming the light absorber 105. After the light absorbing material is cured, a reflective layer is coated on the bottom surface thereof to complete the light absorber and the reflective layer.
  • the production method has the advantages of convenient implementation and low cost. However, it is impossible to completely remove the excess light absorbing material by using a scraper. Therefore, there may be a thin layer of light absorbing material between the reflective layer and the bottom surface of the transparent microstructure after molding, which affects the optical path due to the layer of light absorbing material. It is thin, so it does not completely absorb the light on the light path, but it will inevitably absorb part of the light, causing the screen gain to decrease.
  • the processing method is preferably applied to the case of a transparent microstructure in which the light reflecting surface is a horizontal plane, and cannot be applied to the case where the light reflecting surface of the transparent microstructure is an inclined surface.
  • the light absorber and the reflective layer are formed on the transparent microstructure formed by the following method.
  • the manufacturing method specifically includes the following steps:
  • S400 providing a flat plate having a surface coated with a semi-solid reflective material layer.
  • the layer of reflective material is a semi-solid colloidal substance.
  • S401 The flat plate is pressed on the light reflecting surface of the transparent microstructure 100 with a surface coated with a reflective material layer.
  • the reflective material layer is bonded to the light reflecting surface of the transparent microstructure, and the reflective material layer is cured to form the reflective layer 104.
  • the semi-solid gel-like reflective material layer of the flat surface is required to be relatively thick, so that the gel-like reflective material covers the entire transparent micro during the pressing process of the flat plate. Structured light reflecting surface.
  • the gel-like reflective material is too thick, it may fall off and flow, and it may be contaminated onto other structural surfaces where it is not desired to coat the reflective layer. Therefore, the processing difficulty is increased and the process control requirements are relatively high.
  • the light absorber and the reflective layer are formed on the transparent microstructure formed by the following method.
  • the manufacturing method specifically includes the following steps:
  • S500 providing a flat plate, the surface of the flat plate is provided with an elastic reflective layer.
  • S501 The flat plate is pressed on the light reflecting surface of the transparent microstructure 100 with a surface having an elastic reflective layer.
  • the elastic reflective layer is deformed against the transparent microstructured light reflecting surface by suitable pressure pressing.
  • S502 filling a liquid light absorbing material between adjacent sides of the transparent microstructure, and curing treatment to form the light absorber.
  • a liquid light absorbing material may be filled between the sides of the adjacent transparent microstructures 100 by capillary filling or vacuum filling. The light absorbing material is then cured, and the transparent microstructure and the reflective layer are bonded together by the cured light absorbing material.
  • the light absorbing material may contaminate the light incident surface of the transparent microstructure 100 when the light absorbing material is filled during the processing. Therefore, before the filling of the light absorbing material, a protective layer for preventing the light incident surface from being contaminated may be coated on the light incident surface of the transparent microstructure, and the protective layer may be removed after the surface structure is completed.
  • the elastic reflecting layer of the flat surface is required to be relatively thick.
  • the plate is pressed against the bottom surface of the formed transparent microstructure with a suitable pressure so that the deformed elastic reflective layer can cover the entire bottom surface of the transparent microstructure. At this time, the deformation is large, and the stress can be reduced by a certain annealing method. Then, the light absorbing material is filled and solidified.
  • the surface structure can be attached to a thick substrate to ensure a certain strength, and then combined with the projection screen to form a projection screen having the surface structure.
  • the present invention also provides a projection screen which is fabricated by the fabrication method of the above embodiment.

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  • General Physics & Mathematics (AREA)
  • Overhead Projectors And Projection Screens (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

A manufacturing method for a projection screen, and a related projection screen, wherein the manufacturing method comprises manufacturing a surface structure of the projection screen. In step S1, an array of transparent micro-structures (100) arranged in a matrix is manufactured. The transparent micro-structure (100) comprises: a light incidence surface (101) having the function of converging incident light and having a pre-set focal length; a light reflection surface (102) arranged opposite the light incidence surface (101) and within the focal length range of the light incidence surface (101); and a side surface (103) connecting the light incidence surface (101) and the light reflection surface (102), wherein the side surface (103) is parallel to refracted light formed by means of the incidence of incident light with a pre-set incidence angle through an edge of the light incidence surface (101). In step S2, a reflection layer (104) is manufactured on the light reflection surface (102) of the transparent micro-structure (100), and a light absorber (105) is filled between side surfaces (103) of adjacent transparent micro-structures (100). Thus, incident light with a certain incidence angle is emitted in a pre-set angle range, and stray light with other incidence angles is deflected and refracted to a side surface and is absorbed, thus achieving the effect of gaining screen emergent light in the pre-set angle range.

Description

一种投影屏幕的制作方法及相关投影屏幕  Method for making projection screen and related projection screen 技术领域Technical field
本发明涉及光学结构应用技术领域,特别是涉及一种投影屏幕的制作方法及相关投影屏幕。The present invention relates to the field of optical structure application technologies, and in particular, to a method for fabricating a projection screen and an associated projection screen.
背景技术Background technique
投影屏幕,应用于投影系统中用于放映投影图像,投影屏幕与投影机的相对位置一般固定,发出的投射光近似为以一定角度的平行光入射到屏幕,入射光经屏幕发生反射,被反射的光线进入人眼,从而观看者可观看到图像。 The projection screen is applied to the projection system for projecting the projected image. The relative position of the projection screen and the projector is generally fixed, and the emitted light is incident on the screen at a certain angle of parallel light, and the incident light is reflected by the screen and reflected. The light enters the human eye so that the viewer can view the image.
技术问题technical problem
在投影系统中,观看者相对投影屏幕的位置往往是固定的。人们希望投影系统显示在屏幕上图像的反射光只反射到观看区域,而减少向非观看区域的反射光,这样可提高观看屏幕图像的亮度,同时人们希望观看区域能被屏幕上任意位置的反射光照射到。In a projection system, the position of the viewer relative to the projection screen is often fixed. It is hoped that the projection system will reflect the reflected light of the image on the screen only to the viewing area, and reduce the reflected light to the non-viewing area, which can improve the brightness of the viewing screen image, and people hope that the viewing area can be reflected by any position on the screen. Light is shining.
技术解决方案Technical solution
鉴于此,本发明提供一种投影屏幕的制作方法,制作形成的表面结构应用于投影屏幕,能够调整入射光经屏幕反射后出射光的出射角度范围,能实现对屏幕出射光在预设角度范围内增益的效果。In view of this, the present invention provides a method for fabricating a projection screen, which is formed by applying a surface structure to a projection screen, and is capable of adjusting an exit angle range of incident light that is reflected by the screen, and can achieve a preset angle range for the screen to emit light. The effect of the internal gain.
为实现以上目的,本发明提供如下技术方案:To achieve the above object, the present invention provides the following technical solutions:
一种投影屏幕的制作方法,包括制作投影屏幕的表面结构:A method of making a projection screen, comprising fabricating a surface structure of a projection screen:
步骤S1:制作矩阵式排布的透明微结构阵列,所述透明微结构包括:对入射光具有汇聚作用的、具有预设焦距的光入射面;光反射面,与所述光入射面相对设置,且位于所述光入射面的焦距范围内;连接所述光入射面与所述光反射面的侧面,所述侧面与预设入射角度的入射光经所述光入射面的边入射形成的折射光平行;Step S1: fabricating a matrix-arranged transparent microstructure array, the transparent microstructure comprising: a light incident surface having a predetermined focal length having a converging effect on incident light; and a light reflecting surface disposed opposite to the light incident surface And being located in a focal length range of the light incident surface; connecting the light incident surface and a side surface of the light reflecting surface, wherein the side surface is incident with a predetermined incident angle incident light passing through an edge of the light incident surface Refracted light in parallel;
步骤S2:在所述透明微结构的所述光反射面上制作形成反射层,在相邻的所述透明微结构的侧面之间填充光吸收体。Step S2: forming a reflective layer on the light reflecting surface of the transparent microstructure, and filling a light absorber between adjacent side surfaces of the transparent microstructure.
可选地,所述步骤S1包括:Optionally, the step S1 includes:
步骤S11:提供以感光材料制作的基板,在所述基板一面上压制形成所述光入射面;Step S11: providing a substrate made of a photosensitive material, and pressing the one side of the substrate to form the light incident surface;
步骤S12:以近似平行光照射所述基板的形成所述光入射面的一面,对所述基板作曝光处理,去除所述基板中未被曝光的部分,形成所述矩阵式排布的透明微结构阵列。Step S12: illuminating one side of the substrate forming the light incident surface with approximately parallel light, exposing the substrate to an unexposed portion of the substrate to form a transparent micro-array Structure array.
可选地,所述近似平行光为紫外光。Optionally, the approximately parallel light is ultraviolet light.
可选地,所述步骤S12包括:以与基板法线成第一夹角的近似平行光照射所述基板的第一区域,以与基板法线成第二夹角的近似平行光照射所述基板的第二区域,所述第一夹角不同于所述第二夹角。Optionally, the step S12 includes: illuminating the first region of the substrate with approximately parallel light at a first angle to the normal of the substrate, and illuminating the first parallel light at a second angle to the normal of the substrate a second region of the substrate, the first angle being different from the second angle.
可选地,所述步骤S11包括:Optionally, the step S11 includes:
采用表面有对应微结构的滚轮在所述基板一面上压制形成所述光入射面;Forming the light incident surface on one side of the substrate by using a roller having a corresponding microstructure on the surface;
或者,采用表面有对应微结构的平板压模在所述基板一面上压制形成所述光入射面。Alternatively, the light incident surface is formed on one side of the substrate by using a flat stamper having a corresponding microstructure on the surface.
可选地,所述步骤S1包括:Optionally, the step S1 includes:
提供一基板;Providing a substrate;
采用第一压模和第二压模在所述基板的两面对准,在所述基板的两面同时压制,形成矩阵式排布的透明微结构阵列,所述第一压模表面具有对应于光入射面的微结构,所述第二压模表面具有对应于侧面和光反射面的微结构。Using a first stamper and a second stamper aligned on both sides of the substrate, simultaneously pressing on both sides of the substrate to form a matrix-arranged transparent microstructure array, the first stamper surface having a corresponding a microstructure of the light incident surface, the second stamper surface having a microstructure corresponding to the side surface and the light reflecting surface.
可选地,所述步骤S1包括:Optionally, the step S1 includes:
提供一基板;Providing a substrate;
采用第一压模在所述基板的一面上压制形成光入射面,并留下对准标记,所述第一压模表面具有对应于光入射面的微结构;Forming a light incident surface on one side of the substrate by using a first stamper, and leaving an alignment mark, the first stamper surface having a microstructure corresponding to the light incident surface;
与所述对准标记对准,采用第二压模在所述基板的另一面上压制形成与光入射面对准的侧面和光反射面,所述第二压模具有对应于侧面和光反射面的微结构。In alignment with the alignment mark, a second stamper is pressed on the other surface of the substrate to form a side surface and a light reflecting surface aligned with the light incident surface, and the second stamper has a side surface and a light reflecting surface. microstructure.
可选地,所述步骤S2包括:Optionally, the step S2 includes:
在相邻所述透明微结构的侧面之间填充液态或者半固态的吸光材料;Filling a liquid or semi-solid light absorbing material between adjacent sides of the transparent microstructure;
刮去表面多余的吸光材料,并进行固化处理,形成所述光吸收体;Scraping off the excess light absorbing material on the surface and performing a curing treatment to form the light absorbing body;
在形成光吸收体的表面结构的底面上涂制反射层。A reflective layer is coated on the bottom surface of the surface structure on which the light absorber is formed.
可选地,所述步骤S2包括:Optionally, the step S2 includes:
提供一平板,所述平板表面涂有半固态的反射材料层;Providing a flat plate surface coated with a semi-solid reflective material layer;
所述平板以涂有反射材料层的一面压在形成的透明微结构的光反射面上;The flat plate is pressed on the light reflecting surface of the formed transparent microstructure by a side coated with the reflective material layer;
移去平板,对反射材料层作固化处理,在透明微结构的光反射面上形成反射层;Removing the flat plate, curing the reflective material layer, and forming a reflective layer on the light reflecting surface of the transparent microstructure;
在相邻所述透明微结构的侧面之间填充吸光材料,经固化形成光吸收体。A light absorbing material is filled between adjacent sides of the transparent microstructure, and is cured to form a light absorber.
可选地,所述步骤S2包括:Optionally, the step S2 includes:
提供一平板,所述平板表面设有弹性的反射层;Providing a flat plate having an elastic reflective layer on the surface thereof;
所述平板以具有弹性反射层的一面压在形成的透明微结构的光反射面上;The flat plate is pressed on the light reflecting surface of the formed transparent microstructure with one side having an elastic reflective layer;
在相邻所述透明微结构的侧面之间填充液态的吸光材料,经固化处理,形成光吸收体。A liquid light absorbing material is filled between adjacent sides of the transparent microstructure, and is cured to form a light absorber.
本发明还提供了一种投影屏幕,按照上述的制作方法制作。The present invention also provides a projection screen which is fabricated in accordance with the above-described manufacturing method.
有益效果Beneficial effect
由上述内容可知,本发明制作的投影屏幕,其表面结构包括矩阵式排布的透明微结构阵列、反射层和光吸收体,其中,透明微结构包括光入射面、光反射面和侧面,光入射面对入射光具有汇聚作用,并具有预设焦距;光反射面位于光入射面的焦距范围内,在光反射面设置有反射层,使光反射面对光具有反射作用;侧面连接光入射面和光反射面。It can be seen from the above that the projection screen made by the present invention has a surface structure including a matrix-arranged transparent microstructure array, a reflective layer and a light absorber, wherein the transparent microstructure includes a light incident surface, a light reflecting surface and a side surface, and light incident The incident light has a converging effect and has a preset focal length; the light reflecting surface is located in a focal length range of the light incident surface, and a reflective layer is disposed on the light reflecting surface to make the light reflecting surface have a reflecting effect; the side connecting light incident surface And light reflecting surface.
本发明所提供的投影屏幕的制作方法,包括制作投影屏幕的表面结构,包括:制作矩阵式排布的透明微结构阵列;在所述透明微结构的光反射面上制作形成反射层,在相邻的所述透明微结构的侧面之间填充光吸收体,其制作的透明微结构满足相应的设计要求。The method for fabricating a projection screen provided by the present invention comprises: fabricating a surface structure of a projection screen, comprising: fabricating a matrix-arranged transparent microstructure array; forming a reflective layer on the light-reflecting surface of the transparent microstructure, A light absorber is filled between the sides of the adjacent transparent microstructures, and the transparent microstructures produced thereof satisfy the corresponding design requirements.
所述投影屏幕表面结构基于透明微结构的光入射面和光反射面,能够调整屏幕出射光的出射角度范围,能够使以一定入射角的入射光经投影屏幕反射后,以预设角度范围出射。根据入射光的入射角以及所要求屏幕出射光的出射角度范围,通过相应设计透明微结构的光入射面的焦距、光入射面的宽度以及光反射面到光入射面焦平面的距离,能够控制以一定入射角入射的投射光在预设角度范围内出射。实现了对屏幕出射光在预设角度范围内增益的效果;并且,对于以其它角度入射的杂散光,经光入射面进入透明微结构后会偏折射到侧面,被侧面的光吸收体吸收。可避免杂散光射出。从而能够提高观看者观看到屏幕图像的亮度和对比度。The surface structure of the projection screen is based on the light incident surface and the light reflecting surface of the transparent microstructure, and can adjust the range of the exit angle of the light emitted by the screen, so that the incident light with a certain incident angle can be reflected by the projection screen and then emitted at a preset angle range. According to the incident angle of the incident light and the range of the exit angle of the required screen light, the focal length of the light incident surface of the transparent microstructure, the width of the light incident surface, and the distance from the light reflecting surface to the focal plane of the light incident surface can be controlled. The projected light incident at a certain angle of incidence is emitted within a predetermined range of angles. The effect of gaining the light emitted by the screen within a preset angle range is realized; and the stray light incident at other angles is deflected to the side surface after entering the transparent microstructure through the light incident surface, and is absorbed by the side light absorber. It can avoid stray light emission. Thereby, the brightness and contrast of the screen image viewed by the viewer can be improved.
附图说明DRAWINGS
为了更清楚地说明本发明实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the embodiments or the description of the prior art will be briefly described below. Obviously, the drawings in the following description are only It is a certain embodiment of the present invention, and other drawings can be obtained from those skilled in the art without any creative work.
图1为本发明实施例提供的一种投影屏幕表面结构制作方法的流程图;1 is a flowchart of a method for fabricating a surface structure of a projection screen according to an embodiment of the present invention;
图2为本发明实施例提供的一种投影屏幕表面结构的示意图;2 is a schematic diagram of a surface structure of a projection screen according to an embodiment of the present invention;
图3为本发明实施例提供的一种制作透明微结构的方法流程图;3 is a flowchart of a method for fabricating a transparent microstructure according to an embodiment of the present invention;
图4为本发明实施例提供的以压模压制方式制作透明微结构的示意图;4 is a schematic view showing a transparent microstructure formed by compression molding according to an embodiment of the present invention;
图5为本发明实施例提供的一种制作光吸收体和反射层的方法示意图;FIG. 5 is a schematic diagram of a method for fabricating a light absorber and a reflective layer according to an embodiment of the present invention; FIG.
图6为本发明实施例提供的另一种制作光吸收体和反射层的方法示意图;FIG. 6 is a schematic diagram of another method for fabricating a light absorber and a reflective layer according to an embodiment of the present invention; FIG.
图7为本发明实施例提供的另一种制作光吸收体和反射层的方法示意图。FIG. 7 is a schematic diagram of another method for fabricating a light absorber and a reflective layer according to an embodiment of the present invention.
本发明的最佳实施方式BEST MODE FOR CARRYING OUT THE INVENTION
为了使本技术领域的人员更好地理解本发明中的技术方案,下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都应当属于本发明保护的范围。In order to make those skilled in the art better understand the technical solutions in the present invention, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. The embodiments are only a part of the embodiments of the invention, and not all of the embodiments. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without creative efforts shall fall within the scope of the present invention.
本发明实施例提供的一种投影屏幕的制作方法,包括制作投影屏幕的表面结构,请参考图1,包括:A method for fabricating a projection screen according to an embodiment of the present invention includes the surface structure of the projection screen. Referring to FIG. 1, the method includes:
步骤S1:制作矩阵式排布的透明微结构阵列,所述透明微结构包括:对入射光具有汇聚作用的、具有预设焦距的光入射面;光反射面,与所述光入射面相对设置,且位于所述光入射面的焦距范围内;连接所述光入射面与所述光反射面的侧面,所述侧面与预设入射角度的入射光经所述光入射面的边入射形成的折射光平行;Step S1: fabricating a matrix-arranged transparent microstructure array, the transparent microstructure comprising: a light incident surface having a predetermined focal length having a converging effect on incident light; and a light reflecting surface disposed opposite to the light incident surface And being located in a focal length range of the light incident surface; connecting the light incident surface and a side surface of the light reflecting surface, wherein the side surface is incident with a predetermined incident angle incident light passing through an edge of the light incident surface Refracted light in parallel;
步骤S2:在所述透明微结构的所述光反射面上制作形成反射层,在相邻的所述透明微结构的侧面之间填充光吸收体。Step S2: forming a reflective layer on the light reflecting surface of the transparent microstructure, and filling a light absorber between adjacent side surfaces of the transparent microstructure.
请参考图2,图2为本实施例制作的一种投影屏幕表面结构的示意图。本实施例制作形成的投影屏幕表面结构,包括矩阵式排布的透明微结构100的阵列、反射层104和光吸收体105,其中,透明微结构100包括光入射面101、光反射面102和侧面103,光入射面101对入射光具有汇聚作用,并具有预设焦距;光反射面102与光入射面101相对设置,位于光入射面101的焦距范围内;在光反射面102设置有反射层104,使光反射面对光具有反射作用。侧面103连接光入射面101和光反射面102。Please refer to FIG. 2. FIG. 2 is a schematic diagram of a surface structure of a projection screen produced in the embodiment. The projection screen surface structure formed by the present embodiment comprises an array of matrix-arranged transparent microstructures 100, a reflective layer 104 and a light absorber 105, wherein the transparent microstructure 100 comprises a light incident surface 101, a light reflecting surface 102 and a side surface. 103, the light incident surface 101 has a converging effect on the incident light, and has a preset focal length; the light reflecting surface 102 is disposed opposite to the light incident surface 101, and is located in a focal length range of the light incident surface 101; and the reflective layer is disposed on the light reflecting surface 102. 104, causing the light reflection to have a reflection effect on the light. The side surface 103 connects the light incident surface 101 and the light reflecting surface 102.
该表面结构应用于投影屏幕,当入射光以一定入射角照射到投影屏幕,入射光由表面结构的光入射面101照射进入透明微结构,形成的折射光被汇聚,并照射到位于焦平面之前的光反射面102上,经反射后,光束再次经光入射面101折射射出形成出射光。出射光的反向延长线在透明微结构内形成一个点光源的虚像,每个透明微结构具有一个点光源的虚像,投影屏幕包括多个矩阵式排布的透明微结构的阵列,就形成了多个点光源的虚像。经投影屏幕反射后的光,相当于从多个点光源发出的光的合光,大大提高了反射光利用率,提高亮度和观影体验。在出射光角度调整平面内,基于光入射面101具有一定的宽度,能够限制出射光的出射范围;光反射面102位于光入射面101的焦距范围内,使折射光在聚焦到焦平面前被反射,通过调整设计光入射面101的焦距和宽度、透明微结构的厚度(即光入射面101与光反射面102的距离)能够控制透明微结构形成的点光源虚像的位置,从而实现对屏幕出射光出射角度范围的调整。The surface structure is applied to the projection screen. When the incident light is irradiated to the projection screen at a certain incident angle, the incident light is irradiated into the transparent microstructure by the light incident surface 101 of the surface structure, and the formed refracted light is concentrated and irradiated to the focal plane. On the light reflecting surface 102, after being reflected, the light beam is again refracted through the light incident surface 101 to form an outgoing light. The reverse extension of the exiting light forms a virtual image of a point source within the transparent microstructure, each transparent microstructure having a virtual image of a point source, and the projection screen comprising a plurality of arrays of transparent microstructures arranged in a matrix form A virtual image of multiple point sources. The light reflected by the projection screen is equivalent to the combined light of the light emitted from the plurality of point sources, which greatly improves the utilization of the reflected light and improves the brightness and viewing experience. In the plane of the exit light angle adjustment, based on the light incident surface 101 having a certain width, the emission range of the outgoing light can be limited; the light reflecting surface 102 is located within the focal length of the light incident surface 101, so that the refracted light is focused before focusing on the focal plane. By adjusting the focal length and width of the design light incident surface 101 and the thickness of the transparent microstructure (ie, the distance between the light incident surface 101 and the light reflecting surface 102), the position of the virtual image of the point source formed by the transparent microstructure can be controlled, thereby realizing the screen. The adjustment of the range of the exit light exit angle.
所述透明微结构100的侧面103与预设入射角度的入射光经所述光入射面101的边形成的折射光平行,一个透明微结构可以具有一个或多个呈曲面或平面的侧面103,存在一平行入射光,该平行入射光在光入射面与任一侧面连接的边形成的折射光都平行于该侧面,在侧面103设置光吸收体105。对于以预设入射角的入射光,经透明微结构后形成的出射光以预设角度范围射出,对于以其它角度入射的杂散光,经光入射面101进入透明微结构后,会偏折射到侧面103,被侧面的光吸收体吸收。从而该投影屏幕表面结构避免了杂散光由光入射面折射射出而对投影图像质量产生影响。The side surface 103 of the transparent microstructure 100 is parallel to the refracted light formed by the edge of the light incident surface 101 by the incident light of the predetermined incident angle, and the transparent microstructure may have one or more curved surfaces or plane sides 103. There is a parallel incident light whose refracted light formed on the side where the light incident surface is connected to either side is parallel to the side surface, and the light absorber 105 is provided on the side surface 103. For incident light with a preset incident angle, the outgoing light formed by the transparent microstructure is emitted at a predetermined angular range, and the stray light incident at other angles is deflected to the transparent microstructure after entering the transparent microstructure through the light incident surface 101. The side surface 103 is absorbed by the side light absorber. Therefore, the projection screen surface structure avoids the influence of stray light from being refracted by the light incident surface to affect the quality of the projected image.
在实际应用中,根据入射光到达投影屏幕的入射角以及所要求的屏幕出射光的出射角度范围,通过相应设计透明微结构光入射面的焦距和宽度、透明微结构的厚度(即光入射面与光反射面的距离),能够控制以一定入射角的入射光在预设角度范围内出射,实现对屏幕出射光在预设角度范围内增益的效果。如果将屏幕出射光的出射角度范围对应于观看区域,则可将投影屏幕的出射光限定在观看区域,可实现对对应于观看区域的出射光增益的作用,能够提高观看者观看到屏幕图像的亮度,同时基于侧面对杂散光的吸收作用,使杂散光减少,能够提高观看者观看到屏幕图像的对比度。In practical applications, according to the incident angle of the incident light reaching the projection screen and the required range of the exit angle of the screen outgoing light, the focal length and width of the transparent microstructure light incident surface and the thickness of the transparent microstructure (ie, the light incident surface) are designed correspondingly. The distance from the light reflecting surface can control the incident light with a certain incident angle to exit within a preset angle range, thereby realizing the effect of gaining the light emitted by the screen within a preset angle range. If the range of the exit angle of the screen exiting light corresponds to the viewing area, the exiting light of the projection screen can be limited to the viewing area, the effect of the output light gain corresponding to the viewing area can be achieved, and the viewer can view the screen image. Brightness, while based on the side's absorption of stray light, reduces stray light and improves the contrast of the viewer's viewing of the screen image.
本实施例提供的投影屏幕表面结构的制作方法,首先制作形成矩阵式排布的透明微结构阵列,该透明微结构的光入射面、光反射面和侧面满足相应的设计尺寸要求,然后在透明微结构的光反射面制作形成反射层,在相邻的透明微结构的侧面之间填充光吸收体,从而完整制作形成投影屏幕的表面结构。In the method for fabricating the surface structure of the projection screen provided by the embodiment, first, a transparent microstructure array formed in a matrix arrangement is formed, and the light incident surface, the light reflecting surface and the side surface of the transparent microstructure satisfy the corresponding design size requirements, and then are transparent. The light-reflecting surface of the microstructure is formed to form a reflective layer, and the light-absorbing body is filled between the sides of the adjacent transparent microstructures, thereby completely forming a surface structure for forming a projection screen.
下面对本发明投影屏幕表面结构的具体制作方法进行详细描述。The specific manufacturing method of the surface structure of the projection screen of the present invention will be described in detail below.
在本发明投影屏幕表面结构制作方法的一种具体实施方式中,制作形成矩阵式排布的透明微结构阵列采用以下方法。该制作方法是以光刻的方式制作形成透明微结构。请参考图3,包括以下步骤:In a specific embodiment of the method for fabricating the surface structure of the projection screen of the present invention, the following method is employed to fabricate a transparent microstructure array forming a matrix arrangement. The fabrication method is formed by photolithography to form a transparent microstructure. Please refer to Figure 3, including the following steps:
步骤S11:提供以感光材料制作的基板。在所述基板一面上压制形成所述光入射面。Step S11: providing a substrate made of a photosensitive material. The light incident surface is formed by pressing on one side of the substrate.
其中具体的,在基板一面上压制形成光入射面,可采用表面有对应微结构的滚轮在所述基板一面上压制形成所述光入射面。或者,也可采用表面有对应微结构的平板压模在所述基板一面上压制形成所述光入射面。Specifically, a light incident surface is formed on one side of the substrate, and the light incident surface may be formed on one side of the substrate by using a roller having a corresponding microstructure on the surface. Alternatively, the light incident surface may be formed on one side of the substrate by using a flat stamper having a corresponding microstructure on the surface.
步骤S12:以近似平行光照射所述基板的形成所述光入射面的一面,对所述基板作曝光处理,去除所述基板中未被曝光的部分,形成所述矩阵式排布的透明微结构阵列。Step S12: illuminating one side of the substrate forming the light incident surface with approximately parallel light, exposing the substrate to an unexposed portion of the substrate to form a transparent micro-array Structure array.
本发明中的近似平行光即我们日常所述的平行光,由于自然界难以存在绝对平行的光,本发明采用近似平行光的称谓代替平行光,因此在本说明书中出现的近似平行光与平行光为同义词。一般的,近似平行光指在误差范围内认为是平行的光,可以认为光束内部夹角最大的两个子光束的夹角小于5°。The nearly parallel light in the present invention is the parallel light that we routinely describe. Since it is difficult to have absolute parallel light in nature, the present invention uses the approximation of parallel light instead of parallel light, so the approximate parallel light and parallel light appearing in this specification. Is synonymous. In general, approximately parallel light refers to light that is considered to be parallel within the error range, and it can be considered that the angle between the two sub-beams having the largest internal angle of the beam is less than 5°.
由于基板表面形成的光入射面对光具有汇聚作用,并具有预设焦距,因此以近似平行光照射在基板形成光入射面的一面,平行光折射进入基板,被聚焦,汇聚在聚焦范围内。在基板中光经过的部分会被曝光处理,而没有光经过的部分不会被曝光。从而通过平行光曝光处理的方式形成侧面,对应形成透明微结构。Since the light incident on the surface of the substrate has a converging effect on the light, and has a predetermined focal length, the side parallel to the light forming the light incident surface is irradiated with the parallel light, and the parallel light is refracted into the substrate, focused, and concentrated in the focus range. The portion of the light that passes through the substrate is exposed to light, and the portion where no light passes is not exposed. Thereby, the side faces are formed by the parallel light exposure treatment, correspondingly forming a transparent microstructure.
另外,在采用平行光对基板表面进行曝光处理时,平行光以与所述基板法线具有夹角θ的方向照射,0°≤θ<90°。在制作时,要根据实际应用场景中入射光的入射角,平行光以与入射光入射角相同的角度照射基板表面进行曝光处理,这样曝光处理后形成的透明微结构的侧面能正好满足设计要求。Further, when the surface of the substrate is subjected to exposure treatment using parallel light, the parallel light is irradiated in a direction having an angle θ with respect to the normal to the substrate, and 0° ≤ θ < 90°. In the production process, according to the incident angle of the incident light in the actual application scenario, the parallel light irradiates the surface of the substrate at the same angle as the incident angle of the incident light for exposure processing, so that the side surface of the transparent microstructure formed after the exposure processing can meet the design requirements. .
在本实施例中,感光材料包括感光树脂,近似平行光可采用紫外光,感光材料能够在紫外光的照射下固化。可以理解的是,在实际制作中根据感光材料的不同也可采用其它波长类型的平行光。In this embodiment, the photosensitive material comprises a photosensitive resin, and the approximately parallel light may be ultraviolet light, and the photosensitive material can be cured under irradiation of ultraviolet light. It can be understood that parallel light of other wavelength types can also be used depending on the photosensitive material in actual production.
经曝光处理后,采用专门的溶液洗去基板未被曝光的部分,则形成矩阵式排布的透明微结构阵列。After the exposure process, the portion of the substrate that is not exposed is washed away with a special solution to form a matrix-arranged transparent microstructure array.
对于投影屏幕其平面面积一般比较大,而投影机放置位置相对屏幕固定,因此投影机照射到屏幕表面的入射光,照射在屏幕表面不同区域的入射角度会不同,其对应于观看区域的出射角度范围也不同。For the projection screen, the plane area is generally large, and the projector placement position is fixed relative to the screen. Therefore, the projector illuminates the incident light on the screen surface, and the incident angle of different areas irradiated on the screen surface will be different, which corresponds to the exit angle of the viewing area. The range is also different.
鉴于此,在本发明制作形成的投影屏幕表面结构的一种实施例中,该表面结构至少包括第一区域和第二区域,位于第一区域内的透明微结构和位于第二区域内的透明微结构的尺寸设计不同,位于不同区域的透明微结构的光入射面的焦距不同,入射光经所述第一区域透明微结构形成的出射光的出射角度范围,与入射光经所述第二区域透明微结构形成的出射光的出射角度范围不同。In view of this, in an embodiment of the projection screen surface structure formed by the present invention, the surface structure includes at least a first region and a second region, a transparent microstructure located in the first region, and a transparent portion located in the second region The size of the microstructure is different, the focal lengths of the light incident surfaces of the transparent microstructures located in different regions are different, the range of the exit angle of the incident light formed by the transparent microstructure of the first region, and the incident light passing through the second The range of exit angles of the outgoing light formed by the regional transparent microstructure is different.
相应的,在本发明制作方法中,感光材料制作的基板至少包括第一区域和第二区域,在第一区域内的光反射面的焦距和第二区域内的光反射面的焦距不同。相应的,步骤S12包括:以与基板法线成第一夹角的平行光照射所述基板的第一区域,以与基板法线成第二夹角的平行光照射所述基板的第二区域。Correspondingly, in the manufacturing method of the present invention, the substrate made of the photosensitive material includes at least a first region and a second region, and a focal length of the light reflecting surface in the first region and a focal length of the light reflecting surface in the second region are different. Correspondingly, step S12 includes: illuminating the first region of the substrate with parallel light at a first angle to the normal of the substrate, and illuminating the second region of the substrate with parallel light at a second angle to the normal of the substrate .
假设在实际应用场景中,照射在屏幕表面结构的第一区域的入射光以第一入射角入射,照射在屏幕表面结构的第二区域的入射光以第二入射角入射,则在制作表面结构时,照射基板第一区域的平行光与基板法线的夹角与第一入射角相同,照射基板第二区域的平行光与基板法线的夹角与第二入射角相同,从而形成对应的透明微结构。It is assumed that in an actual application scenario, incident light illuminating the first region of the screen surface structure is incident at a first incident angle, and incident light illuminating the second region of the surface structure of the screen is incident at a second incident angle, thereby fabricating a surface structure The angle between the parallel light of the first region of the substrate and the normal of the substrate is the same as the first incident angle, and the angle between the parallel light of the second region of the illumination substrate and the normal of the substrate is the same as the second incident angle, thereby forming a corresponding Transparent microstructure.
该制作方法中在透明微结构阵列成形后,各透明微结构之间的连接力较小,因此应该在微结构形成后立即填充光吸收材料和反射层,以增大微结构之间的连接力,保证所制作表面结构的完整性。In the manufacturing method, after the transparent microstructure array is formed, the connection force between the transparent microstructures is small, so the light absorbing material and the reflective layer should be filled immediately after the microstructure is formed to increase the connection force between the microstructures. To ensure the integrity of the surface structure produced.
上述制作方法以光刻的方式制作形成矩阵式排布的透明微结构阵列,充分利用了表面结构光入射面的特殊尺寸设计,该光刻工艺不需要掩膜板,降低了光刻工艺成本,并且能实现一次成型大面积微结构。The above fabrication method lithographically fabricates a transparent microstructure array forming a matrix arrangement, which fully utilizes the special size design of the light incident surface of the surface structure, which does not require a mask, which reduces the cost of the photolithography process. And it can realize large-area microstructures in one time.
在本发明表面结构制作方法的另一种具体实施方式中,制作形成矩阵式排布的透明微结构阵列可采用物理加工方式,采用压模压制的方式。具体的加工方法可采用以下两种。In another specific embodiment of the method for fabricating a surface structure of the present invention, the transparent microstructure array forming the matrix arrangement can be formed by physical processing and compression molding. The specific processing methods can be as follows.
第一种制作方案:首先提供基板,然后采用第一压模和第二压模在所述基板的两面对准,在所述基板的两面同时压制,形成矩阵式排布的透明微结构阵列。其中,第一压模表面具有对应于光入射面的微结构,第二压模表面具有对应于侧面和光反射面的微结构,可参考图4所示。The first fabrication scheme: firstly providing a substrate, then aligning on both sides of the substrate by using a first stamper and a second stamper, and simultaneously pressing on both sides of the substrate to form a matrix-arranged transparent microstructure array . Wherein, the first stamper surface has a microstructure corresponding to the light incident surface, and the second stamper surface has a microstructure corresponding to the side surface and the light reflecting surface, as shown in FIG.
这种加工方式,采用第一压模和第二压模在基板两面同时压制,在两面同时分别形成光入射面、侧面和光反射面,一次成型,加工方便。但在加工中,要求两面的压模必须要对准,这样保证形成完整的透明微结构。The processing method adopts the first stamper and the second stamper to simultaneously press on both sides of the substrate, and simultaneously forms a light incident surface, a side surface and a light reflecting surface on both sides, and is formed at one time, and the processing is convenient. However, in processing, it is required that the two-sided stamper must be aligned, thus ensuring the formation of a complete transparent microstructure.
另外,在实际加工中,为了保证加工成型后的透明微结构有足够强度的连接力连接在一起,加工成型的透明微结构在光入射面和侧面之间可留有一个厚度层,但在透明微结构的光学尺寸设计时就要考虑这一厚度层对光路的影响。In addition, in the actual processing, in order to ensure that the transparent microstructures after processing have sufficient strength to be joined together, the processed transparent microstructure may have a thickness layer between the light incident surface and the side surface, but is transparent. The optical dimensions of the microstructure are designed to take into account the effect of this thickness layer on the optical path.
另一种制作方案是分两次在基板的两面上分别压制形成微结构,具体为:首先提供一基板,先采用第一压模在所述基板的一面上压制形成光入射面,并留下对准标记,该第一压模表面具有对应于光入射面的微结构;然后,与基板上留下的对准标记对准,采用第二压模在基板的另一面上压制形成与光入射面对准的侧面和光反射面,所述第二压模具有对应于侧面和光反射面的微结构。可以理解的是,也可以是先在基板一面上制作形成侧面和光反射面,然后通过对准,在另一面上压制形成光入射面。Another fabrication scheme is to separately form a microstructure on two sides of the substrate, specifically: firstly providing a substrate, first pressing a first stamper on one side of the substrate to form a light incident surface, and leaving Aligning the mark, the first stamper surface has a microstructure corresponding to the light incident surface; then, aligned with the alignment mark left on the substrate, and pressed and formed on the other side of the substrate by the second stamper The surface of the surface alignment and the light reflecting surface, the second pressing mold has a microstructure corresponding to the side surface and the light reflecting surface. It can be understood that the side surface and the light reflecting surface can be formed on one side of the substrate, and then the light incident surface can be formed on the other surface by alignment.
同样,在此制作方案中,为了保证加工成型后的透明微结构有足够强度的连接力连接在一起,加工成型的透明微结构在光入射面和侧面之间可留一个厚度层,在透明微结构的光学尺寸设计时就要考虑这一厚度层的影响。Similarly, in this fabrication scheme, in order to ensure that the transparent microstructures after processing have sufficient strength to be joined together, the processed transparent microstructures may leave a thickness layer between the light incident surface and the side surface, in transparent micro The thickness of the structure must be considered in the design of the optical dimensions of the structure.
在上述两种制作方案中,所述第一压模和所述第二压模可以采用表面有对应微结构的滚轮,或者也可采用表面有对应微结构的平板压模。In the above two manufacturing schemes, the first stamper and the second stamper may adopt a roller having a corresponding microstructure on the surface, or a flat stamper having a corresponding microstructure on the surface may also be used.
以上详细描述了制作形成矩阵式排布的透明微结构阵列,下面就制作形成光吸收体和反射层进行详细描述。The transparent microstructure arrays which are formed into a matrix arrangement are described in detail above, and the formation of the light absorber and the reflection layer will be described in detail below.
在本发明制作方法的一种具体实施方式中,在制作形成的透明微结构上制作光吸收体和反射层采用以下制作方法。In one embodiment of the fabrication method of the present invention, the following fabrication methods are employed to fabricate the light absorber and the reflective layer on the transparent microstructure formed.
请参考图5,该制作方法具体包括步骤:Referring to FIG. 5, the manufacturing method specifically includes the following steps:
S300:在相邻所述透明微结构100的侧面之间填充液态或者半固态的吸光材料。S300: filling a liquid or semi-solid light absorbing material between adjacent sides of the transparent microstructure 100.
S301:刮去表面多余的吸光材料,并进行固化处理,形成光吸收体105。吸光材料填满整个表面后,可用刮刀刮去表面多余的吸光材料,保证表面平整,然后进行固化处理使吸光材料固化。S301: scraping off the excess light absorbing material on the surface and performing a curing treatment to form the light absorbing body 105. After the light absorbing material fills the entire surface, the excess light absorbing material on the surface can be scraped off with a doctor blade to ensure that the surface is flat, and then the curing process is performed to cure the light absorbing material.
S302:在形成所述光吸收体105的所述表面结构的底面上涂制反射层104。吸光材料固化后,在其底面上涂制反射层,从而制作完成光吸收体和反射层。S302: A reflective layer 104 is coated on the bottom surface of the surface structure forming the light absorber 105. After the light absorbing material is cured, a reflective layer is coated on the bottom surface thereof to complete the light absorber and the reflective layer.
该制作方法工艺实施方便,成本低。但采用刮刀不可能完全把多余的吸光材料去除掉,因此成型后可能存在在反射层与透明微结构的底面之间会有薄薄的一层吸光材料,影响光路,由于这一层吸光材料极薄,所以不会把光路上的光完全吸收,但是不可避免的会吸收部分光,造成屏幕增益降低。另一方面,如果透明微结构的光反射面为倾斜面,则挡在光路中吸光材料厚度不均匀。这意味着这层吸光材料对不同角度的出射光吸收不均匀,会导致屏幕对不同角度出射光的增益不一致。因此该加工方式优选应用于光反射面为水平面的透明微结构情况,而不能应用于透明微结构的光反射面为倾斜面的情况。The production method has the advantages of convenient implementation and low cost. However, it is impossible to completely remove the excess light absorbing material by using a scraper. Therefore, there may be a thin layer of light absorbing material between the reflective layer and the bottom surface of the transparent microstructure after molding, which affects the optical path due to the layer of light absorbing material. It is thin, so it does not completely absorb the light on the light path, but it will inevitably absorb part of the light, causing the screen gain to decrease. On the other hand, if the light reflecting surface of the transparent microstructure is an inclined surface, the thickness of the light absorbing material in the optical path is not uniform. This means that this layer of light absorbing material absorbs uneven light at different angles, which will result in inconsistent gain of the screen for different angles of light. Therefore, the processing method is preferably applied to the case of a transparent microstructure in which the light reflecting surface is a horizontal plane, and cannot be applied to the case where the light reflecting surface of the transparent microstructure is an inclined surface.
在本发明制作方法的另一种具体实施方式中,在制作形成的透明微结构上制作光吸收体和反射层采用以下制作方法。In another embodiment of the fabrication method of the present invention, the light absorber and the reflective layer are formed on the transparent microstructure formed by the following method.
请参考图6,该制作方法具体包括步骤:Referring to FIG. 6, the manufacturing method specifically includes the following steps:
S400:提供一平板,所述平板表面涂有半固态的反射材料层。反射材料层为一种半固态的胶状物质。S400: providing a flat plate having a surface coated with a semi-solid reflective material layer. The layer of reflective material is a semi-solid colloidal substance.
S401:所述平板以涂有反射材料层的一面压在所述透明微结构100的光反射面上。S401: The flat plate is pressed on the light reflecting surface of the transparent microstructure 100 with a surface coated with a reflective material layer.
S402:移去平板,对反射材料层作固化处理,在所述透明微结构的所述光反射面上形成所述反射层104。S402: removing the flat plate, and curing the reflective material layer, and forming the reflective layer 104 on the light reflecting surface of the transparent microstructure.
移去平板后,反射材料层粘接在透明微结构的光反射面上,对反射材料层作固化处理,形成反射层104。After the flat plate is removed, the reflective material layer is bonded to the light reflecting surface of the transparent microstructure, and the reflective material layer is cured to form the reflective layer 104.
S403:在相邻所述透明微结构的侧面之间填充吸光材料,经固化形成所述光吸收体105。从而制作完成反射层和光吸收体。S403: filling a light absorbing material between adjacent sides of the transparent microstructure, and curing to form the light absorber 105. Thereby, the reflective layer and the light absorber are completed.
在此制作方法中,当透明微结构100的光反射面为倾斜面时,需要平板表面的半固态的胶状反射材料层比较厚,才能在平板下压过程中胶状反射材料覆盖整个透明微结构光反射面。但是如果胶状反射材料太厚可能会脱落、流动,沾染到其他不希望涂覆反射层的结构表面上,因此该加工工艺难度会增大,工艺控制要求会比较高。In this manufacturing method, when the light reflecting surface of the transparent microstructure 100 is an inclined surface, the semi-solid gel-like reflective material layer of the flat surface is required to be relatively thick, so that the gel-like reflective material covers the entire transparent micro during the pressing process of the flat plate. Structured light reflecting surface. However, if the gel-like reflective material is too thick, it may fall off and flow, and it may be contaminated onto other structural surfaces where it is not desired to coat the reflective layer. Therefore, the processing difficulty is increased and the process control requirements are relatively high.
在本发明另一种具体实施方式中,在制作形成的透明微结构上制作光吸收体和反射层采用以下方法。请参考图7,该制作方法具体包括步骤: In another embodiment of the present invention, the light absorber and the reflective layer are formed on the transparent microstructure formed by the following method. Referring to FIG. 7, the manufacturing method specifically includes the following steps:
S500:提供一平板,所述平板表面设有弹性的反射层。S500: providing a flat plate, the surface of the flat plate is provided with an elastic reflective layer.
S501:所述平板以具有弹性反射层的一面压在所述透明微结构100的光反射面上。S501: The flat plate is pressed on the light reflecting surface of the transparent microstructure 100 with a surface having an elastic reflective layer.
通过适宜的压力压制,使弹性的反射层会形变紧贴在透明微结构光反射面上。The elastic reflective layer is deformed against the transparent microstructured light reflecting surface by suitable pressure pressing.
S502:在相邻所述透明微结构的侧面之间填充液态的吸光材料,经固化处理,形成所述光吸收体。S502: filling a liquid light absorbing material between adjacent sides of the transparent microstructure, and curing treatment to form the light absorber.
其中,可采用毛细填充方式或者抽真空填充方式在相邻所述透明微结构100的侧面之间填充液态的吸光材料。然后对吸光材料进行固化处理,通过固化后的吸光材料将各透明微结构及反射层粘接在一起。Wherein, a liquid light absorbing material may be filled between the sides of the adjacent transparent microstructures 100 by capillary filling or vacuum filling. The light absorbing material is then cured, and the transparent microstructure and the reflective layer are bonded together by the cured light absorbing material.
若其中粘结力不够的话,可采用其它辅助固定手段。If the bonding force is insufficient, other auxiliary fixing means may be employed.
另外,在该加工过程中在填入吸光材料时,吸光材料可能会污染到透明微结构100的光入射面。因此可以在填充吸光材料之前,在透明微结构的光入射面上涂制用于防止光入射面被污染的保护层,在表面结构制作完成后再去除保护层。In addition, the light absorbing material may contaminate the light incident surface of the transparent microstructure 100 when the light absorbing material is filled during the processing. Therefore, before the filling of the light absorbing material, a protective layer for preventing the light incident surface from being contaminated may be coated on the light incident surface of the transparent microstructure, and the protective layer may be removed after the surface structure is completed.
当透明微结构100的光反射面为倾斜面时,需要平板表面的弹性反射层比较厚。用适当压力把平板压在已成型的透明微结构底面上,使形变的弹性反射层可以覆盖整个透明微结构底面。此时形变较大,可以用一定的退火手段降低应力。然后填入吸光材料固化成型。When the light reflecting surface of the transparent microstructure 100 is an inclined surface, the elastic reflecting layer of the flat surface is required to be relatively thick. The plate is pressed against the bottom surface of the formed transparent microstructure with a suitable pressure so that the deformed elastic reflective layer can cover the entire bottom surface of the transparent microstructure. At this time, the deformation is large, and the stress can be reduced by a certain annealing method. Then, the light absorbing material is filled and solidified.
在整体制作完表面结构后,可将表面结构贴附在一个较厚的基底上,保证具有一定的强度,然后与投影屏幕结合,制作形成具有该表面结构的投影屏幕。After the surface structure is integrally formed, the surface structure can be attached to a thick substrate to ensure a certain strength, and then combined with the projection screen to form a projection screen having the surface structure.
本发明还提供了一种投影屏幕,该投影屏幕用上述实施例中的制作方法制作。The present invention also provides a projection screen which is fabricated by the fabrication method of the above embodiment.
以上对本发明所提供的一种投影屏幕的制作方法及相关投影屏幕进行了详细介绍。本文中应用了具体个例对本发明的原理及实施方式进行了阐述,以上实施例的说明只是用于帮助理解本发明的方法及其核心思想。应当指出,对于本技术领域的普通技术人员来说,在不脱离本发明原理的前提下,还可以对本发明进行若干改进和修饰,这些改进和修饰也落入本发明权利要求的保护范围内。The method for fabricating a projection screen and the related projection screen provided by the present invention are described in detail above. The principles and embodiments of the present invention have been described herein with reference to specific examples, and the description of the above embodiments is only to assist in understanding the method of the present invention and its core idea. It should be noted that those skilled in the art can make various modifications and changes to the present invention without departing from the spirit and scope of the invention.

Claims (11)

1、一种投影屏幕的制作方法,其特征在于,包括制作投影屏幕的表面结构:What is claimed is: 1. A method of fabricating a projection screen, comprising: fabricating a surface structure of a projection screen:
步骤S1:制作矩阵式排布的透明微结构阵列,所述透明微结构包括:Step S1: fabricating a matrix-arranged transparent microstructure array, the transparent microstructure comprising:
对入射光具有汇聚作用且具有预设焦距的光入射面;a light incident surface having a convergence effect on incident light and having a preset focal length;
光反射面,与所述光入射面相对设置,且位于所述光入射面的焦距范围内;a light reflecting surface disposed opposite to the light incident surface and located within a focal length of the light incident surface;
连接所述光入射面与所述光反射面的侧面,所述侧面与预设入射角度的入射光经所述光入射面的边入射形成的折射光平行;Connecting the light incident surface and a side surface of the light reflecting surface, wherein the side surface is parallel to the refracted light formed by the incident light of the predetermined incident angle through the side of the light incident surface;
步骤S2:在所述透明微结构的所述光反射面上制作形成反射层,在相邻的所述透明微结构的侧面之间填充光吸收体。Step S2: forming a reflective layer on the light reflecting surface of the transparent microstructure, and filling a light absorber between adjacent side surfaces of the transparent microstructure.
2、如权利要求1所述的制作方法,其特征在于,所述步骤S1包括:2. The method according to claim 1, wherein the step S1 comprises:
步骤S11:提供以感光材料制作的基板,在所述基板一面上压制形成所述光入射面;Step S11: providing a substrate made of a photosensitive material, and pressing the one side of the substrate to form the light incident surface;
步骤S12:以近似平行光照射所述基板的形成所述光入射面的一面,对所述基板作曝光处理,去除所述基板中未被曝光的部分,形成矩阵式排布的透明微结构阵列。Step S12: irradiating one side of the substrate forming the light incident surface with approximately parallel light, exposing the substrate to remove unexposed portions of the substrate to form a matrix-arranged transparent microstructure array. .
3、如权利要求2所述的制作方法,其特征在于,所述近似平行光为紫外光。3. The method according to claim 2, wherein the approximately parallel light is ultraviolet light.
4、如权利要求2所述的制作方法,其特征在于, 4. The method of manufacturing of claim 2, wherein
所述步骤S12包括:以与基板法线成第一夹角的近似平行光照射所述基板的第一区域,以与基板法线成第二夹角的近似平行光照射所述基板的第二区域,所述第一夹角不同于所述第二夹角。The step S12 includes: illuminating the first region of the substrate with approximately parallel light at a first angle to the normal of the substrate, and illuminating the second of the substrate with approximately parallel light at a second angle to the normal of the substrate a region, the first angle is different from the second angle.
5、如权利要求2所述的制作方法,其特征在于,所述步骤S11包括:The manufacturing method according to claim 2, wherein the step S11 comprises:
采用表面有对应微结构的滚轮在所述基板一面上压制形成所述光入射面;Forming the light incident surface on one side of the substrate by using a roller having a corresponding microstructure on the surface;
或者,采用表面有对应微结构的平板压模在所述基板一面上压制形成所述光入射面。Alternatively, the light incident surface is formed on one side of the substrate by using a flat stamper having a corresponding microstructure on the surface.
6、如权利要求1所述的制作方法,其特征在于,所述步骤S1包括:The manufacturing method according to claim 1, wherein the step S1 comprises:
提供一基板;Providing a substrate;
采用第一压模和第二压模在所述基板的两面对准,在所述基板的两面同时压制,形成矩阵式排布的透明微结构阵列,所述第一压模表面具有对应于光入射面的微结构,所述第二压模表面具有对应于侧面和光反射面的微结构。Using a first stamper and a second stamper aligned on both sides of the substrate, simultaneously pressing on both sides of the substrate to form a matrix-arranged transparent microstructure array, the first stamper surface having a corresponding a microstructure of the light incident surface, the second stamper surface having a microstructure corresponding to the side surface and the light reflecting surface.
7、如权利要求1所述的制作方法,其特征在于,所述步骤S1包括:The manufacturing method according to claim 1, wherein the step S1 comprises:
提供一基板;Providing a substrate;
采用第一压模在所述基板的一面上压制形成光入射面,并留下对准标记,所述第一压模表面具有对应于光入射面的微结构;Forming a light incident surface on one side of the substrate by using a first stamper, and leaving an alignment mark, the first stamper surface having a microstructure corresponding to the light incident surface;
与所述对准标记对准,采用第二压模在所述基板的另一面上压制形成与光入射面对准的侧面和光反射面,所述第二压模具有对应于侧面和光反射面的微结构。In alignment with the alignment mark, a second stamper is pressed on the other surface of the substrate to form a side surface and a light reflecting surface aligned with the light incident surface, and the second stamper has a side surface and a light reflecting surface. microstructure.
8、如权利要求1-7任一项所述的制作方法,其特征在于,所述步骤S2包括:The manufacturing method according to any one of claims 1 to 7, wherein the step S2 comprises:
在相邻所述透明微结构的侧面之间填充液态或者半固态的吸光材料;Filling a liquid or semi-solid light absorbing material between adjacent sides of the transparent microstructure;
刮去表面多余的吸光材料,并进行固化处理,形成所述光吸收体;Scraping off the excess light absorbing material on the surface and performing a curing treatment to form the light absorbing body;
在形成光吸收体的表面结构的底面上涂制反射层。A reflective layer is coated on the bottom surface of the surface structure on which the light absorber is formed.
9、如权利要求1-7任一项所述的制作方法,其特征在于,所述步骤S2包括:The manufacturing method according to any one of claims 1 to 7, wherein the step S2 comprises:
提供一平板,所述平板表面涂有半固态的反射材料层;Providing a flat plate surface coated with a semi-solid reflective material layer;
所述平板以涂有反射材料层的一面压在形成的透明微结构的光反射面上;The flat plate is pressed on the light reflecting surface of the formed transparent microstructure by a side coated with the reflective material layer;
移去平板,对反射材料层作固化处理,在透明微结构的光反射面上形成反射层;Removing the flat plate, curing the reflective material layer, and forming a reflective layer on the light reflecting surface of the transparent microstructure;
在相邻所述透明微结构的侧面之间填充吸光材料,经固化形成光吸收体。A light absorbing material is filled between adjacent sides of the transparent microstructure, and is cured to form a light absorber.
10、如权利要求1-7任一项所述的制作方法,其特征在于,所述步骤S2包括:The manufacturing method according to any one of claims 1 to 7, wherein the step S2 comprises:
提供一平板,所述平板表面设有弹性的反射层;Providing a flat plate having an elastic reflective layer on the surface thereof;
所述平板以具有弹性反射层的一面压在形成的透明微结构的光反射面上;The flat plate is pressed on the light reflecting surface of the formed transparent microstructure with one side having an elastic reflective layer;
在相邻所述透明微结构的侧面之间填充液态的吸光材料,经固化处理,形成光吸收体。A liquid light absorbing material is filled between adjacent sides of the transparent microstructure, and is cured to form a light absorber.
11、一种投影屏幕,其特征在于,该投影屏幕按照如权利要求1~10中任一项所述的制作方法制作。A projection screen, the projection screen being produced according to the manufacturing method according to any one of claims 1 to 10.
PCT/CN2017/081152 2016-05-12 2017-04-19 Manufacturing method for projection screen, and related projection screen WO2017193780A1 (en)

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