TW201740179A - A method of making a projection screen and a related projection screen - Google Patents

Abstract

The present invention provides a method of making a projection screen and a related projection screen, wherein comprising the following steps: creating a transparent microstructure array in which the matrix structure is arranged, the transparent microstructure comprising: A light incident surface having a preset focal length; a light reflecting surface disposed opposite to the light incident surface and located within a focal length range of the light incident surface; an incident light having a light incident surface and a side surface of the light reflecting surface and a predetermined incident angle Step S2: A reflective layer is formed on the light reflecting surface of the transparent microstructure, and the light absorber is filled between the sides of the adjacent transparent microstructure. The projection screen produced by the present invention is capable of emitting incident light at a predetermined angle of incidence in a predetermined angular range, and for the stray light incident at other angles, it is deflected to the side to be absorbed, thereby realizing that the emitted light is emitted at a predetermined angle Range the effect of gain and reduce stray light.

Description

Method for manufacturing projection screen and related projection screen

The present invention relates to the field of optical structure application technologies, and in particular, to a method for fabricating a projection screen and an associated projection screen.

The projection screen is applied to the projection system for projecting the projected image. The relative position of the projection screen and the projector is generally fixed. The emitted light is approximately incident at a certain angle of parallel light, and the incident light is reflected by the screen. The reflected light enters the human eye so that the viewer can view the image.

In a projection system, the position of the viewer relative to the projection screen is often fixed. It is hoped that the projection system will reflect the reflected light of the image on the screen only to the viewing area, and reduce the reflected light to the non-viewing area, which can improve the brightness of the viewing screen image, and people hope that the viewing area can be anywhere on the screen. The reflected light is illuminated.

Therefore, in view of the above, in view of the above, the present invention provides a method for fabricating a projection screen, and the formed surface structure is applied to a projection screen, which can adjust the range of the exit angle of the incident light reflected by the screen, and can realize the screen. The effect of the light exiting the gain over a preset range of angles.

The invention provides a method for manufacturing a projection screen, wherein the formed surface structure is applied to a projection screen, and the range of the exit angle of the incident light reflected by the screen is adjusted, and the effect of the output of the screen on the preset angle range can be achieved. .

To achieve the above object, the present invention provides a method for fabricating a projection screen, comprising fabricating a surface structure of a projection screen, and comprising the steps of: (1) fabricating a matrix-arranged transparent microstructure array, the transparent microstructure comprising: The incident light has a light incident surface having a predetermined focal length; the light reflecting surface is disposed opposite to the light incident surface and located within a focal length of the light incident surface; and connecting the light incident surface and the light a side surface of the light reflecting surface, wherein the side surface is parallel to the refracted light formed by the incident light of the predetermined incident angle through the side of the light incident surface; (2) being formed on the light reflecting surface of the transparent microstructure A reflective layer is formed to fill the light absorber between adjacent sides of the transparent microstructure.

Optionally, the step (1) comprises: (11) providing a substrate made of a photosensitive material, forming a light incident surface on one side of the substrate; (12) illuminating the substrate with approximately parallel light Forming one side of the light incident surface, exposing the substrate to an unexposed portion of the substrate to form the matrix-arranged transparent microstructure array.

Optionally, the approximately parallel light is ultraviolet light.

Optionally, the step (12) includes: illuminating the first region of the substrate with an approximately parallel light at a first angle to the normal of the substrate, and illuminating the substrate at a second angle to the normal to the substrate. a second region of the substrate, the first angle being different from the second angle.

Optionally, the step (11) includes: forming a light incident surface on one side of the substrate by using a roller having a corresponding microstructure on the surface; or using a flat stamper having a corresponding microstructure on the surface; The light incident surface is formed by pressing on one side of the substrate.

Optionally, the step (1) includes: providing a substrate; using a first stamper and a second stamper to align on both sides of the substrate, simultaneously pressing on both sides of the substrate to form a matrix row A transparent microstructured array of cloth, the first stamper surface having a microstructure corresponding to a light entrance face, the second stamper surface having a microstructure corresponding to a side surface and a light reflecting surface.

Optionally, the step (1) comprises: providing a substrate; forming a light incident surface on one side of the substrate by using a first stamper, and leaving an alignment mark, the first stamper surface having Corresponding to the microstructure of the light incident surface; aligned with the alignment mark, pressing a second stamper on the other side of the substrate to form a side surface and a light reflecting surface aligned with the light incident surface, the second pressure The mold has a microstructure corresponding to the side and the light reflecting surface.

Optionally, the step (2) comprises: filling a liquid or semi-solid light absorbing material between sides of adjacent transparent microstructures; scraping off excess light absorbing material on the surface, and performing curing treatment to form the light Absorber; a reflective layer is coated on the bottom surface of the surface structure forming the light absorber.

Optionally, the step (2) comprises: providing a flat plate, the flat surface is coated with a semi-solid reflective material layer; and the flat plate is pressed against the formed transparent microstructure light by a side coated with the reflective material layer a reflecting surface; removing the flat plate, curing the reflective material layer, forming a reflective layer on the light reflecting surface of the transparent microstructure; filling the light absorbing material between the sides of the adjacent transparent microstructure, and solidifying to form light absorption body.

Optionally, the step (2) comprises: providing a flat plate, the flat surface is provided with an elastic reflective layer; and the flat plate is pressed on the light reflecting surface of the formed transparent microstructure by a surface having an elastic reflective layer Filling a liquid light absorbing material between adjacent sides of the transparent microstructure and curing treatment to form a light absorber.

The present invention also provides a projection screen which is fabricated in accordance with the above-described manufacturing method.

In order to more clearly describe a method of fabricating a projection screen of the present invention, a preferred embodiment of the present invention will be described in detail below with reference to the drawings.

An embodiment of the present invention provides a method for fabricating a projection screen. Referring to FIG. 1 , it is a flowchart of a method for fabricating a surface of a projection screen according to an embodiment of the present invention. As shown in the figure, the method for fabricating the projection screen comprises: fabricating a surface structure of the projection screen, and comprising the following steps: Step (S1): fabricating a matrix-arranged transparent microstructure array, the transparent microstructure comprising: a light incident surface having a predetermined focal length; the light reflecting surface is disposed opposite to the light incident surface and located within a focal length of the light incident surface; and connecting the light incident surface to the light a side surface of the reflecting surface, the side surface being parallel to the refracted light formed by the incident light of the predetermined incident angle passing through the side of the light incident surface; and (S2): forming on the light reflecting surface of the transparent microstructure A reflective layer is formed to fill the light absorber between adjacent sides of the transparent microstructure.

Please refer to FIG. 2. FIG. 2 is a schematic diagram of a surface structure of a projection screen according to an embodiment of the present invention. As shown in the figure, the projection screen surface structure formed by the present embodiment comprises an array of transparent microstructures 100 arranged in a matrix, a reflective layer 104 and a light absorber 105. The transparent microstructure 100 includes a light incident surface 101 and light. The reflecting surface 102 and the side surface 103, the light incident surface 101 has a converging effect on the incident light, and has a preset focal length; the light reflecting surface 102 is disposed opposite to the light incident surface 101, and is located in the focal length range of the light incident surface 101; The reflector 102 is provided with a reflective layer 104 that causes the light reflecting surface 102 to reflect light. The side surface 103 connects the light incident surface 101 and the light reflecting surface 102.

According to the above, the surface structure is applied to the projection screen. When the incident light is irradiated to the projection screen at a certain incident angle, the incident light is irradiated into the transparent microstructure by the light incident surface 101 of the surface structure, and the formed refracted light is concentrated and illuminated. On the light reflecting surface 102 before the focal plane, after being reflected, the light beam is again refracted through the light incident surface 101 to form an outgoing light. The reverse extension of the exiting light forms a virtual image of a point source within the transparent microstructure, each transparent microstructure having a virtual image of a point source, and the projection screen comprising a plurality of arrays of transparent microstructures arranged in a matrix form A virtual image of multiple point sources. The light reflected by the projection screen is equivalent to the combined light of light emitted from a plurality of point sources, which greatly improves the utilization of reflected light and improves the brightness and viewing experience. In the plane of the exit light angle adjustment, based on the light incident surface 101 having a certain width, the emission range of the outgoing light can be limited; the light reflecting surface 102 is located within the focal length of the light incident surface 101, so that the refracted light is focused before focusing on the focal plane. By adjusting the focal length and width of the design light incident surface 101 and the thickness of the transparent microstructure (ie, the distance between the light incident surface 101 and the light reflecting surface 102), the position of the virtual image of the point source formed by the transparent microstructure can be controlled, thereby realizing the screen The adjustment of the range of the exit light exit angle.

In this embodiment, the side surface 103 of the transparent microstructure 100 is parallel to the refracted light formed by the edge of the light incident surface 101 with the incident light of a predetermined incident angle, and one transparent microstructure may have one or more curved surfaces or The side surface 103 of the plane has a parallel incident light, and the refracted light formed by the side of the parallel incident light which is connected to either side of the light incident surface is parallel to the side surface, and the light absorbing body 105 is provided on the side surface 103. For incident light with a preset incident angle, the outgoing light formed by the transparent microstructure is emitted at a predetermined angular range, and the stray light incident at other angles is deflected to the transparent microstructure after entering the transparent microstructure through the light incident surface 101. The side surface 103 is absorbed by the side light absorber. Therefore, the projection screen surface structure prevents the stray light from being refracted by the light incident surface to affect the quality of the projected image.

In practical applications, according to the incident angle of the incident light reaching the projection screen and the required range of the exit angle of the emitted light of the screen, the focal length and width of the transparent incident light surface and the thickness of the transparent microstructure (ie, the light incident surface) are designed correspondingly. The distance from the light reflecting surface can control the incident light with a certain incident angle to exit within a preset angle range, thereby realizing the effect of gaining the light emitted by the screen within a preset angle range. If the range of the exit angle of the light emitted by the screen corresponds to the viewing area, the emitted light of the projection screen can be limited to the viewing area, which can achieve the effect of the output light gain corresponding to the viewing area, and can improve the viewer's viewing of the screen image. The brightness, while based on the side's absorption of stray light, reduces stray light and improves the contrast of the viewer's viewing of the screen image.

In the method for fabricating the surface structure of the projection screen provided by the embodiment, first, a transparent microstructure array formed in a matrix arrangement is formed, and the light incident surface, the light reflecting surface and the side surface of the transparent microstructure meet the corresponding design size requirements, and then are transparent. The light-reflecting surface of the microstructure is formed to form a reflective layer, and a light absorber is filled between the sides of the adjacent transparent microstructures, thereby completely forming a surface structure for forming a projection screen.

The specific fabrication method of the projection screen surface structure of the present invention will be described in detail below.

In a specific embodiment of the method for fabricating a projection screen surface structure of the present invention, the following method is employed to fabricate a transparent microstructure array forming a matrix arrangement. The fabrication method is formed by photolithography to form a transparent microstructure. Please refer to FIG. 3. FIG. 3 is a flowchart of a method for fabricating a transparent microstructure according to an embodiment of the present invention. As shown, the method of fabricating a transparent microstructure includes the following steps: Step (S11): providing a substrate made of a photosensitive material. The light incident surface is formed by pressing on one side of the substrate. Specifically, a light incident surface is formed on one side of the substrate, and the light incident surface may be formed on one side of the substrate by using a roller having a corresponding microstructure on the surface. Alternatively, the light incident surface may be formed on one side of the substrate by using a flat stamper having a corresponding microstructure on the surface. Step (S12): illuminating one side of the substrate forming the light incident surface with approximately parallel light, exposing the substrate to an unexposed portion of the substrate to form the matrix arrangement Transparent microstructure array.

The nearly parallel light in the present invention is the parallel light that we routinely describe. Since it is difficult to have absolute parallel light in nature, the present invention uses the approximation of parallel light instead of parallel light, so the approximate parallel light and parallel light appearing in this specification. Is synonymous. In general, approximately parallel light refers to light that is considered to be parallel within the error range, and it can be considered that the angle between the two sub-beams having the largest internal angle of the beam is less than 5°.

Since the light incident on the surface of the substrate has a converging effect on the light and has a predetermined focal length, the side parallel to the light forming the light incident surface is irradiated with the parallel light, and the parallel light is refracted into the substrate, and is focused and concentrated in the focus range. The portion of the light that passes through the substrate is exposed to light, and the portion where no light passes is not exposed. Thereby, the side faces are formed by the parallel light exposure treatment, correspondingly forming a transparent microstructure.

Further, when the surface of the substrate is subjected to exposure treatment using parallel light, the parallel light is irradiated in a direction having an angle θ with the normal to the substrate, and 0° ≤ θ < 90°. In the production process, according to the incident angle of the incident light in the actual application scene, the parallel light is irradiated to the surface of the substrate at the same angle as the incident angle of the incident light for exposure processing, so that the side surface of the transparent microstructure formed after the exposure processing can meet the design requirements.

In this embodiment, the photosensitive material comprises a photosensitive resin, and the approximately parallel light may be ultraviolet light, and the photosensitive material can be cured under irradiation of ultraviolet light. It can be understood that parallel light of other wavelength types can also be used depending on the photosensitive material in actual production.

After the exposure process, the portion of the substrate that is not exposed is washed away with a special solution to form a matrix-arranged transparent microstructure array.

For the projection screen, the plane area is generally large, and the projector is placed at a fixed position relative to the screen. Therefore, the projector illuminates the incident light on the surface of the screen, and the incident angle of the different areas of the screen surface is different, which corresponds to the exit angle of the viewing area. The range is also different.

In view of this, in an embodiment of the projection screen surface structure formed by the present invention, the surface structure includes at least a first region and a second region, a transparent microstructure located in the first region, and a transparent portion located in the second region. The size of the microstructure is different, the focal lengths of the light incident surfaces of the transparent microstructures located in different regions are different, the range of the exit angle of the incident light formed by the transparent microstructure of the first region, and the incident light passing through the second The range of exit angles of the outgoing light formed by the regional transparent microstructure is different.

Correspondingly, in the manufacturing method of the present invention, the substrate made of the photosensitive material includes at least a first region and a second region, and a focal length of the light reflecting surface in the first region and a focal length of the light reflecting surface in the second region are different. Correspondingly, the step (S12) comprises: illuminating the first region of the substrate with parallel light at a first angle to the normal of the substrate, and illuminating the second region of the substrate with parallel light at a second angle to the normal of the substrate .

It is assumed that in an actual application scenario, incident light that is irradiated in a first region of the surface structure of the screen is incident at a first incident angle, and incident light that is incident on a second region of the surface structure of the screen is incident at a second incident angle, and the surface structure is fabricated. The angle between the parallel light of the first region of the substrate and the normal of the substrate is the same as the first incident angle, and the angle between the parallel light of the second region of the substrate and the normal of the substrate is the same as the second incident angle, thereby forming a corresponding transparent micro structure.

In the manufacturing method, after the transparent microstructure array is formed, the connection force between the transparent microstructures is small, so the light absorbing material and the reflective layer should be filled immediately after the microstructure is formed to increase the connection force between the microstructures. To ensure the integrity of the surface structure produced.

The above fabrication method lithographically fabricates a transparent microstructure array forming a matrix arrangement, which fully utilizes the special size design of the light incident surface of the surface structure, which does not require a mask, which reduces the cost of the photolithography process. And it can realize large-area microstructures in one time.

In another specific embodiment of the method for fabricating a surface structure of the present invention, the transparent microstructure array forming the matrix arrangement can be formed by physical processing and compression molding. The specific processing methods can be as follows.

Please refer to FIG. 4. FIG. 4 is a schematic diagram of manufacturing a transparent microstructure by compression molding according to an embodiment of the present invention; as shown in FIG. 4, the first fabrication scheme provided by the present invention first provides a substrate 106, and then The first stamper 107 and the second stamper 108 are aligned on both sides of the substrate 106, and simultaneously pressed on both sides of the substrate 106 to form a matrix-arranged transparent microstructure array. Wherein, the surface of the first stamper 107 has a microstructure corresponding to the light incident surface, and the surface of the second stamper 108 has a microstructure corresponding to the side surface and the light reflecting surface.

In this processing mode, the first stamper 107 and the second stamper 108 are simultaneously pressed on both sides of the substrate 106, and the light incident surface, the side surface, and the light reflecting surface are simultaneously formed on both sides, and the molding is convenient in one time. However, in processing, it is required that the two-sided stamper must be aligned, thus ensuring the formation of a complete transparent microstructure.

In addition, in the actual processing, in order to ensure that the transparent microstructures after processing have sufficient strength to be joined together, the processed transparent microstructure may have a thickness layer between the light incident surface and the side surface, but is transparent. The optical dimensions of the microstructure are designed to take into account the effect of this thickness layer on the optical path.

Another fabrication scheme is to separately form a microstructure on two sides of the substrate, specifically: firstly providing a substrate, first pressing a first stamper on one side of the substrate to form a light incident surface, and leaving a pair a first stamper surface having a microstructure corresponding to the light incident surface; then, aligned with the alignment mark left on the substrate, and pressed and formed on the other side of the substrate with the second stamper to form a light incident surface The aligned side surface and the light reflecting surface, the second pressing mold having a microstructure corresponding to the side surface and the light reflecting surface. It can be understood that the side surface and the light reflecting surface can be formed on one side of the substrate, and then the light incident surface can be formed on the other surface by alignment.

Similarly, in this fabrication scheme, in order to ensure that the transparent microstructures after processing have sufficient strength to be joined together, the processed transparent microstructures may leave a thickness layer between the light incident surface and the side surface, in transparent micro The thickness of the structure must be considered in the design of the optical dimensions of the structure.

In the above two manufacturing schemes, the first stamper and the second stamper may adopt a roller having a corresponding microstructure on the surface, or a flat stamper having a corresponding microstructure on the surface may also be used.

The transparent microstructure arrays which are formed into a matrix arrangement are described in detail above, and the formation of the light absorber and the reflection layer will be described in detail below.

In one embodiment of the fabrication method of the present invention, the following fabrication methods are employed to fabricate the light absorber and the reflective layer on the transparent microstructure formed.

Please refer to FIG. 5 . FIG. 5 is a schematic diagram of a method for fabricating a light absorber and a reflective layer according to an embodiment of the present invention. As shown, the specific steps of the fabrication method include filling a liquid or semi-solid light absorbing material 109 between adjacent sides of the transparent microstructure 100. The excess light absorbing material 109 on the surface is scraped off and subjected to a curing treatment to form a light absorber 105. After the light absorbing material 109 fills the entire surface, the excess light absorbing material 109 on the surface can be scraped off with a doctor blade to ensure that the surface is flat, and then the curing treatment is performed to cure the light absorbing material 109. A reflective layer 104 is coated on the bottom surface of the surface structure forming the light absorber 105. After the light absorbing material 109 is cured, a reflective layer is coated on the bottom surface thereof to complete the light absorber and the reflective layer.

The production method has the advantages of convenient implementation and low cost. However, it is impossible to completely remove the excess light absorbing material 109 by using a doctor blade. Therefore, there may be a thin layer of light absorbing material 109 between the reflective layer and the bottom surface of the transparent microstructure after molding, which affects the light path due to the light absorbing material 109. It is extremely thin, so it does not completely absorb the light on the light path, but it will inevitably absorb part of the light, causing the screen gain to decrease. On the other hand, if the light reflecting surface of the transparent microstructure is an inclined surface, the thickness of the light absorbing material 109 in the optical path is not uniform. This means that the light absorbing material 109 absorbs uneven light at different angles, which results in inconsistent gain of the screen for different angles of light. Therefore, the processing method is preferably applied to the case of a transparent microstructure in which the light reflecting surface is a horizontal plane, and cannot be applied to the case where the light reflecting surface of the transparent microstructure is an inclined surface.

In another embodiment of the fabrication method of the present invention, the light absorber and the reflective layer are formed on the transparent microstructure formed by the following method.

Please refer to FIG. 6. FIG. 6 is a schematic diagram of another method for fabricating a light absorber and a reflective layer according to an embodiment of the present invention. As shown, the specific steps of the fabrication method include providing a flat plate having a semi-solid reflective material layer 110 coated thereon. The reflective material layer 110 is a semi-solid colloidal substance. The flat plate is pressed against the light reflecting surface of the transparent microstructure 100 with a side coated with the reflective material layer 110. The flat plate is removed, and the reflective material layer 110 is cured, and the reflective layer 104 is formed on the light reflecting surface of the transparent microstructure. After the flat plate is removed, the reflective material layer 110 is adhered to the light reflecting surface of the transparent microstructure, and the reflective material layer 110 is cured to form the reflective layer 104. A light absorbing material 109 is filled between adjacent sides of the transparent microstructure, and is cured to form the light absorber. Thereby, the reflective layer and the light absorber are completed.

In this manufacturing method, when the light reflecting surface of the transparent microstructure 100 is an inclined surface, the semi-solid colloidal reflective material layer 110 of the flat surface is required to be relatively thick, so that the gel-like reflective material covers the entire transparent during the flat pressing process. Microstructured light reflecting surface. However, if the gel-like reflective material is too thick, it may fall off and flow, and it may be contaminated onto other structural surfaces where it is not desired to coat the reflective layer. Therefore, the processing difficulty is increased and the process control requirements are relatively high.

In another embodiment of the present invention, the light absorber and the reflective layer are formed on the transparent microstructure formed by the following method. Please refer to FIG. 7. FIG. 7 is a schematic diagram of another method for fabricating a light absorber and a reflective layer according to an embodiment of the present invention. As shown, the specific steps of the manufacturing method include: providing a flat plate having an elastic reflective layer on the surface of the flat plate. The flat plate is pressed against the light reflecting surface of the transparent microstructure 100 with a side having an elastic reflective layer 111. The elastic reflective layer is deformed against the transparent microstructured light reflecting surface by suitable pressure pressing. A liquid light absorbing material 109 is filled between adjacent sides of the transparent microstructure, and is cured to form the light absorber. Wherein, the liquid light absorbing material 109 may be filled between the sides of the adjacent transparent microstructures 100 by capillary filling or vacuum filling. The material of the light absorbing 109 is then cured, and the transparent microstructure and the reflective layer are bonded together by the cured light absorbing material 109. If the bonding force is insufficient, other auxiliary fixing means may be employed.

In addition, the light absorbing material 109 may contaminate the light incident surface of the transparent microstructure 100 when the light absorbing material 109 is filled in the process. Therefore, before the light absorbing material 109 is filled, a protective layer for preventing contamination of the light incident surface can be coated on the light incident surface of the transparent microstructure, and the protective layer can be removed after the surface structure is completed.

When the light reflecting surface of the transparent microstructure 100 is an inclined surface, the elastic reflecting layer 111 of the flat surface is required to be relatively thick. The plate is pressed against the bottom surface of the formed transparent microstructure with a suitable pressure so that the deformed elastic reflective layer 111 can cover the entire bottom surface of the transparent microstructure. At this time, the deformation is large, and the stress can be reduced by a certain annealing method. Then, the light absorbing material is filled and solidified.

After the surface structure is integrally formed, the surface structure can be attached to a thick substrate to ensure a certain strength, and then combined with the projection screen to form a projection screen having the surface structure.

The present invention also provides a projection screen which is fabricated by the fabrication method of the above embodiment.

It can be seen from the above that the surface structure of the projection screen made by the present invention comprises a matrix-arranged transparent microstructure array, a reflective layer and a light absorber, wherein the transparent microstructure comprises a light incident surface, a light reflecting surface and a side surface, and the light is incident. The incident light has a converging effect and has a preset focal length; the light reflecting surface is located in a focal length range of the light incident surface, and a reflective layer is disposed on the light reflecting surface to make the light reflecting surface have a reflecting effect; the side connecting light incident surface And light reflecting surface.

The method for fabricating a projection screen provided by the present invention comprises: fabricating a surface structure of a projection screen, comprising: fabricating a matrix-arranged transparent microstructure array; forming a reflective layer on the light-reflecting surface of the transparent microstructure, A light absorber is filled between the sides of the adjacent transparent microstructures, and the transparent microstructures produced thereof satisfy the corresponding design requirements.

The projection screen surface structure is based on the light incident surface and the light reflecting surface of the transparent microstructure, and can adjust the range of the exit angle of the light emitted by the screen, so that the incident light with a certain incident angle can be reflected by the projection screen and then emitted at a preset angle range. According to the incident angle of the incident light and the range of the exit angle of the required light emitted by the screen, the focal length of the light incident surface of the transparent microstructure, the width of the light incident surface, and the distance from the light reflecting surface to the focal plane of the light incident surface can be controlled. The projected light incident at a certain angle of incidence is emitted within a predetermined range of angles. The effect of gaining the light emitted by the screen in a preset angle range is realized; and the stray light incident at other angles is deflected to the side surface after entering the transparent microstructure through the light incident surface, and is absorbed by the side light absorber. It can avoid stray light emission. Thereby, the brightness and contrast of the screen image viewed by the viewer can be improved.

It is to be understood that the foregoing detailed description of the embodiments of the present invention is not intended to Both should be included in the scope of the patent in this case.

<present invention>
S1~S2‧‧‧ method steps
S11~S12‧‧‧ method steps
100‧‧‧Transparent microstructure
101‧‧‧Light incident surface
102‧‧‧Light reflecting surface
103‧‧‧ side
104‧‧‧reflective layer
105‧‧‧Light absorber
106‧‧‧Substrate
107‧‧‧First stamper
108‧‧‧Second stamper
109‧‧‧Light absorbing materials
110‧‧‧reflective material layer
111‧‧‧Elastic reflective layer

1 is a flow chart of a method for fabricating a surface of a projection screen according to an embodiment of the present invention; FIG. 2 is a schematic diagram of a surface structure of a projection screen according to an embodiment of the present invention; FIG. 4 is a schematic diagram of a transparent microstructure prepared by compression molding according to an embodiment of the present invention; FIG. 5 is a schematic diagram of a method for fabricating a light absorber and a reflective layer according to an embodiment of the present invention; Another schematic diagram of a method for fabricating a light absorber and a reflective layer according to an embodiment of the present invention; and FIG. 7 is a schematic diagram of another method for fabricating a light absorber and a reflective layer according to an embodiment of the present invention.

S1~S2‧‧‧ method steps

Claims (11)

A method for fabricating a projection screen, further comprising: fabricating a surface structure of the projection screen, comprising the steps of: (1) fabricating a matrix-arranged transparent microstructure array, the transparent microstructure comprising: a converging effect on incident light And a light incident surface having a preset focal length; a light reflecting surface disposed opposite to the light incident surface and located within a focal length of the light incident surface; and a side connecting the light incident surface and the light reflecting surface And the side surface is parallel to the refracted light formed by the incident light of the predetermined incident angle through the side of the light incident surface; (2) forming a reflective layer on the light reflecting surface of the transparent microstructure, in the phase A light absorber is filled between the sides of the adjacent transparent microstructures. The method for manufacturing a projection screen according to claim 1, wherein the step (1) comprises: (11) providing a substrate made of a photosensitive material, and pressing the one side of the substrate to form the light incident surface And (12) illuminating one side of the substrate forming the light incident surface with approximately parallel light, exposing the substrate to removing unexposed portions of the substrate to form a transparent arrangement of the matrix arrangement Structure array. The method for fabricating a projection screen according to claim 2, wherein the approximately parallel light is ultraviolet light. The method for fabricating a projection screen according to claim 2, wherein the step (12) comprises: illuminating a first region of the substrate with a substantially parallel light at a first angle to a normal to the substrate, to A substantially parallel light of the substrate normal at a second angle illuminates a second region of the substrate, the first angle being different from the second angle. The method for manufacturing a projection screen according to claim 1, wherein the step (11) comprises: forming the light incident surface on one side of the substrate by using a roller having a corresponding microstructure on the surface; or A plate stamper having a corresponding microstructure on the surface is pressed on one side of the substrate to form the light incident surface. The method for fabricating a projection screen according to claim 1, wherein the step (1) comprises: providing a substrate; and aligning the two sides of the substrate with the first stamper and the second stamper, Simultaneously pressing on both sides of the substrate to form a matrix-arranged transparent microstructure array having a microstructure corresponding to a light incident surface, the second stamp surface having a side surface and light reflection The microstructure of the surface. The method for fabricating a projection screen according to claim 1, wherein the step (1) comprises: providing a substrate; forming a light incident surface on one side of the substrate by using a first stamper, and leaving Aligning the mark, the first stamper surface has a microstructure corresponding to the light incident surface; and is aligned with the alignment mark, and the second stamper is pressed on the other side of the substrate to form a light incident surface The aligned side surface and the light reflecting surface, the second pressing mold having a microstructure corresponding to the side surface and the light reflecting surface. The method for fabricating a projection screen according to any one of claims 1 to 7, wherein the step (2) comprises: filling a liquid or semi-solid light absorbing between sides of the adjacent transparent microstructures. a material; scraping off excess surface light absorbing material and performing a curing treatment to form the light absorbing body; and coating a reflective layer on a bottom surface of the surface structure forming the light absorbing body. The method for fabricating a projection screen according to any one of claims 1 to 7, wherein the step (2) comprises: providing a flat plate having a surface coated with a semi-solid reflective material layer; The flat plate is pressed on the light reflecting surface of the formed transparent microstructure by a surface coated with the reflective material layer; the flat plate is removed, the reflective material layer is cured, and a reflective layer is formed on the light reflecting surface of the transparent microstructure; A light absorbing material is filled between the sides of the transparent microstructure, and is cured to form a light absorber. The method for manufacturing a projection screen according to any one of claims 1 to 7, wherein the step (2) comprises: providing a flat plate having an elastic reflective layer; the flat plate A side having an elastic reflective layer is pressed against the light reflecting surface of the formed transparent microstructure; a liquid light absorbing material is filled between the sides of the adjacent transparent microstructure, and is cured to form a light absorber. A projection screen produced by the method of producing a projection screen according to any one of claims 1-10.