WO2017077995A1 - 表示基板、表示装置及び表示基板の製造方法 - Google Patents
表示基板、表示装置及び表示基板の製造方法 Download PDFInfo
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- WO2017077995A1 WO2017077995A1 PCT/JP2016/082381 JP2016082381W WO2017077995A1 WO 2017077995 A1 WO2017077995 A1 WO 2017077995A1 JP 2016082381 W JP2016082381 W JP 2016082381W WO 2017077995 A1 WO2017077995 A1 WO 2017077995A1
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- G—PHYSICS
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Abstract
Description
上記した特許文献1に記載されたアクティブ素子アレイ基板では、金属膜からなる実装端子が層間絶縁膜の下層側に配される構成とされているが、実装端子が層間絶縁膜の上層側に配されて層間絶縁膜端部を跨ぐ配置とされた場合には、次の問題が生じるおそれがある。すなわち、実装端子のパターニングに際して、層間絶縁膜の上層側に成膜した金属膜を、マスクを介してエッチングする場合には、金属膜のうち、層間絶縁膜端部と重畳する部分がエッチングにより除去され難くなるため、除去されずに残留した部分によって隣り合う実装端子間が短絡されるおそれがあったのである。
本発明の表示基板は、画像を表示可能な表示領域と前記表示領域を取り囲む形で外周側に配される非表示領域とに区分される基板と、前記非表示領域に配される複数の端子部と、前記表示領域と前記非表示領域とに跨る形で配されて端部である第1絶縁膜端部が複数の前記端子部と前記表示領域との間に配される第1絶縁膜であって、前記第1絶縁膜端部が前記基板の板面に対して傾斜状をなしていて少なくとも一部における傾斜角度が35°以下とされる第1絶縁膜と、前記表示領域と前記非表示領域とに跨る形で前記第1絶縁膜の上層側に配されて端部である第2絶縁膜端部が複数の前記端子部と前記表示領域との間に配される第2絶縁膜であって、前記第2絶縁膜端部が前記基板の板面に対して傾斜状をなしていてその傾斜角度が前記第1絶縁膜端部の傾斜角度よりも大きい第2絶縁膜と、少なくとも前記非表示領域にて前記第2絶縁膜の上層側に配される金属膜からなり前記第1絶縁膜端部及び前記第2絶縁膜端部を跨ぎつつ複数の前記端子部に接続される複数の端子配線部と、を備える。
(1)前記第2絶縁膜は、第1膜厚部と、前記第1膜厚部に対して前記端子部側に配されるとともに前記第2絶縁膜端部を含んでいて前記第1膜厚部よりも膜厚が薄い第2膜厚部と、から構成される。このようにすれば、第2膜厚部が第1膜厚部よりも膜厚が薄くされることで、仮に第2絶縁膜の膜厚を全域にわたって第1膜厚部と同じにした場合に比べると、第2膜厚部に含まれる第2絶縁膜端部が基板の板面に対してなす傾斜角度が小さくなる。従って、例えば当該表示基板の製造に際して第2絶縁膜をマスクとして利用して第1絶縁膜がパターニングされると、第1絶縁膜端部が基板の板面に対してなす傾斜角度をより小さくすることができる。これにより、第1絶縁膜端部の傾斜角度を35°以下に容易に保つことができるので、隣り合う端子配線部間の短絡防止の確実性が一層高いものとなる。
(1)前記第2絶縁膜成膜工程では、前記第2絶縁膜が感光性材料を用いて成膜されており、前記第2絶縁膜形成工程には、フォトマスクとして透過領域及び半透過領域を含むハーフトーンマスクまたはグレートーンマスクを用いて前記第2絶縁膜を露光する露光工程であって、少なくとも前記半透過領域が第2絶縁膜端部の形成予定位置と重畳する位置に配されてなる前記ハーフトーンマスクまたは前記グレートーンマスクを用いるようにした露光工程と、前記第2絶縁膜を現像する現像工程と、が少なくとも含まれる。第2絶縁膜成膜工程では、感光性材料を用いて第2絶縁膜が成膜される。第2絶縁膜形成工程に含まれる露光工程では、透過領域及び半透過領域を含むハーフトーンマスクまたはグレートーンマスクを用いて第2絶縁膜が露光される。その後、現像工程にて第2絶縁膜が現像されることで、第2絶縁膜端部を有する第2絶縁膜が形成される。このうち、露光工程にて用いられるハーフトーンマスクまたはグレートーンマスクは、少なくとも半透過領域が第2絶縁膜端部の形成予定位置と重畳する位置に配されているので、露光・現像された第2絶縁膜は、第2絶縁膜端部を含む部分の膜厚が、他の部分の膜厚よりも薄くなる。従って、その後に行われる第1絶縁膜形成工程において、第2絶縁膜を介して第1絶縁膜がエッチングすると、第1絶縁膜端部が基板の板面に対してなす傾斜角度がより小さなものとなる。これにより、第1絶縁膜端部の傾斜角度を35°以下に容易に保つことができるので、隣り合う端子配線部間の短絡防止の確実性が一層高いものとなる。
本発明によれば、短絡防止の確実性を向上させることができる。
本発明の実施形態1を図1から図20によって説明する。本実施形態では、位置入力機能を備えた液晶表示装置10に備えられる液晶パネル(表示装置、表示パネル)11について例示する。なお、各図面の一部にはX軸、Y軸及びZ軸を示しており、各軸方向が各図面で示した方向となるように描かれている。また、図3,図6及び図7などの上側を表側とし、同図下側を裏側とする。
本発明の実施形態2を図21から図25によって説明する。この実施形態2では、ゲート絶縁膜116、第1層間絶縁膜119及び第1平坦化膜120に突部31を設けるようにしたものを示す。なお、上記した実施形態1と同様の構造、作用及び効果について重複する説明は省略する。
本発明の実施形態3を図26から図28によって説明する。この実施形態3では、上記した実施形態1,2を組み合わせるようにしたものを示す。なお、上記した実施形態1,2と同様の構造、作用及び効果について重複する説明は省略する。
本発明の実施形態4を図29によって説明する。この実施形態4では、上記した実施形態1から露光工程にて用いるフォトマスクをハーフトーンマスクHMに変更したものを示す。なお、上記した実施形態1と同様の構造、作用及び効果について重複する説明は省略する。
本発明は上記記述及び図面によって説明した実施形態に限定されるものではなく、例えば次のような実施形態も本発明の技術的範囲に含まれる。
(1)上記した各実施形態では、端子配線部がTFT接続部と同じ第3金属膜からなる場合を示したが、端子配線部が位置検出配線と同じ第4金属膜からなる構成であっても構わない。
Claims (8)
- 画像を表示可能な表示領域と前記表示領域を取り囲む形で外周側に配される非表示領域とに区分される基板と、
前記非表示領域に配される複数の端子部と、
前記表示領域と前記非表示領域とに跨る形で配されて端部である第1絶縁膜端部が複数の前記端子部と前記表示領域との間に配される第1絶縁膜であって、前記第1絶縁膜端部が前記基板の板面に対して傾斜状をなしていて少なくとも一部における傾斜角度が35°以下とされる第1絶縁膜と、
前記表示領域と前記非表示領域とに跨る形で前記第1絶縁膜の上層側に配されて端部である第2絶縁膜端部が複数の前記端子部と前記表示領域との間に配される第2絶縁膜であって、前記第2絶縁膜端部が前記基板の板面に対して傾斜状をなしていてその傾斜角度が前記第1絶縁膜端部の傾斜角度よりも大きい第2絶縁膜と、
少なくとも前記非表示領域にて前記第2絶縁膜の上層側に配される金属膜からなり前記第1絶縁膜端部及び前記第2絶縁膜端部を跨ぎつつ複数の前記端子部に接続される複数の端子配線部と、を備える表示基板。 - 前記第2絶縁膜は、第1膜厚部と、前記第1膜厚部に対して前記端子部側に配されるとともに前記第2絶縁膜端部を含んでいて前記第1膜厚部よりも膜厚が薄い第2膜厚部と、から構成される請求項1記載の表示基板。
- 前記第1絶縁膜は、前記第1絶縁膜端部が前記基板の板面に対してなす傾斜角度が全域にわたって35°以下とされる請求項1または請求項2記載の表示基板。
- 前記第1絶縁膜における前記第1絶縁膜端部には、隣り合う前記端子配線部の間に配されて前記端子部側に向けて突出する突部が設けられており、
前記第1絶縁膜端部は、少なくとも前記突部が前記基板の板面に対して傾斜状をなしていてその傾斜角度が35°以下とされる請求項1から請求項3のいずれか1項に記載の表示基板。 - 前記突部は、突出基端から突出先端までの突出寸法にて前記第2絶縁膜端部の膜厚寸法を除した比率が0.2以下とされる請求項4記載の表示基板。
- 請求項1から請求項5のいずれか1項に記載された表示基板と、前記表示基板と対向する形で配される対向基板と、を備える表示装置。
- 画像を表示可能な表示領域と前記表示領域を取り囲む形で外周側に配される非表示領域とに区分されて前記非表示領域に複数の端子部が配される基板に、前記表示領域と前記非表示領域とに跨る形で第1絶縁膜を成膜する第1絶縁膜成膜工程と、
前記表示領域と前記非表示領域とに跨る形で前記第1絶縁膜の上層側に第2絶縁膜を成膜する第2絶縁膜成膜工程と、
前記第2絶縁膜を、端部である第2絶縁膜端部が複数の前記端子部と前記表示領域との間にて前記基板の板面に対して傾斜状をなすよう形成する第2絶縁膜形成工程と、
前記第2絶縁膜を介して前記第1絶縁膜をエッチングし、端部である第1絶縁膜端部が複数の前記端子部と前記表示領域との間にて前記基板の板面に対して傾斜状をなしていて少なくとも一部における傾斜角度が前記第2絶縁膜端部の傾斜角度よりも大きく且つ35°以下となるよう形成する第1絶縁膜形成工程と、
前記表示領域と前記非表示領域とに跨る形で前記第2絶縁膜の上層側に金属膜を成膜する金属膜成膜工程と、
前記金属膜の上層側にレジストを形成するレジスト形成工程と、
前記レジストを介して前記金属膜をエッチングし、前記第1絶縁膜端部及び前記第2絶縁膜端部を跨ぎつつ複数の前記端子部に接続される複数の端子配線部を形成する端子配線部形成工程と、を少なくとも備える表示基板の製造方法。 - 前記第2絶縁膜成膜工程では、前記第2絶縁膜が感光性材料を用いて成膜されており、
前記第2絶縁膜形成工程には、
フォトマスクとして透過領域及び半透過領域を含むハーフトーンマスクまたはグレートーンマスクを用いて前記第2絶縁膜を露光する露光工程であって、少なくとも前記半透過領域が第2絶縁膜端部の形成予定位置と重畳する位置に配されてなる前記ハーフトーンマスクまたは前記グレートーンマスクを用いるようにした露光工程と、
前記第2絶縁膜を現像する現像工程と、が少なくとも含まれる請求項7記載の表示基板の製造方法。
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