WO2017022515A1 - 炭素分析方法 - Google Patents
炭素分析方法 Download PDFInfo
- Publication number
- WO2017022515A1 WO2017022515A1 PCT/JP2016/071523 JP2016071523W WO2017022515A1 WO 2017022515 A1 WO2017022515 A1 WO 2017022515A1 JP 2016071523 W JP2016071523 W JP 2016071523W WO 2017022515 A1 WO2017022515 A1 WO 2017022515A1
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- WO
- WIPO (PCT)
- Prior art keywords
- carbon
- atom
- hydrolyzate
- analysis method
- mass
- Prior art date
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- 229910052799 carbon Inorganic materials 0.000 title claims abstract description 116
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 103
- 238000004458 analytical method Methods 0.000 title claims abstract description 41
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 30
- 239000002994 raw material Substances 0.000 claims abstract description 19
- 125000005843 halogen group Chemical group 0.000 claims abstract description 18
- 150000001721 carbon Chemical class 0.000 claims abstract description 13
- 239000000203 mixture Substances 0.000 claims abstract description 13
- 150000002736 metal compounds Chemical class 0.000 claims abstract description 11
- -1 metal halide compound Chemical class 0.000 claims description 48
- 229910001507 metal halide Inorganic materials 0.000 claims description 44
- 239000007788 liquid Substances 0.000 claims description 17
- 229910052751 metal Inorganic materials 0.000 claims description 17
- 239000002184 metal Substances 0.000 claims description 17
- 125000004429 atom Chemical group 0.000 claims description 12
- 239000012433 hydrogen halide Substances 0.000 claims description 11
- 229910000039 hydrogen halide Inorganic materials 0.000 claims description 11
- 238000010438 heat treatment Methods 0.000 claims description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 8
- 229910052801 chlorine Inorganic materials 0.000 claims description 6
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 6
- 229910052732 germanium Inorganic materials 0.000 claims description 6
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical group [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- 229910052721 tungsten Inorganic materials 0.000 claims description 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical group [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 4
- 230000003301 hydrolyzing effect Effects 0.000 abstract description 3
- 238000000034 method Methods 0.000 description 28
- 230000007062 hydrolysis Effects 0.000 description 21
- 238000006460 hydrolysis reaction Methods 0.000 description 21
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 16
- 239000011521 glass Substances 0.000 description 15
- 239000007787 solid Substances 0.000 description 15
- 238000001035 drying Methods 0.000 description 12
- 238000010521 absorption reaction Methods 0.000 description 11
- 238000002485 combustion reaction Methods 0.000 description 11
- 239000007789 gas Substances 0.000 description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 229910021642 ultra pure water Inorganic materials 0.000 description 10
- 239000012498 ultrapure water Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 239000012535 impurity Substances 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 7
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 7
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 6
- 125000004432 carbon atom Chemical group C* 0.000 description 6
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- IEXRMSFAVATTJX-UHFFFAOYSA-N tetrachlorogermane Chemical compound Cl[Ge](Cl)(Cl)Cl IEXRMSFAVATTJX-UHFFFAOYSA-N 0.000 description 5
- YOUIDGQAIILFBW-UHFFFAOYSA-J tetrachlorotungsten Chemical compound Cl[W](Cl)(Cl)Cl YOUIDGQAIILFBW-UHFFFAOYSA-J 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- 229910052736 halogen Inorganic materials 0.000 description 4
- 150000002367 halogens Chemical class 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- DWAWYEUJUWLESO-UHFFFAOYSA-N trichloromethylsilane Chemical compound [SiH3]C(Cl)(Cl)Cl DWAWYEUJUWLESO-UHFFFAOYSA-N 0.000 description 4
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 3
- 229910002092 carbon dioxide Inorganic materials 0.000 description 3
- 239000001569 carbon dioxide Substances 0.000 description 3
- 229910002091 carbon monoxide Inorganic materials 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- 238000011002 quantification Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- LXEXBJXDGVGRAR-UHFFFAOYSA-N trichloro(trichlorosilyl)silane Chemical compound Cl[Si](Cl)(Cl)[Si](Cl)(Cl)Cl LXEXBJXDGVGRAR-UHFFFAOYSA-N 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000020169 heat generation Effects 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000005457 ice water Substances 0.000 description 2
- 239000011344 liquid material Substances 0.000 description 2
- APOOHHZPEUGNQX-UHFFFAOYSA-N n-methyl-n-trichlorogermylmethanamine Chemical compound CN(C)[Ge](Cl)(Cl)Cl APOOHHZPEUGNQX-UHFFFAOYSA-N 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 238000000197 pyrolysis Methods 0.000 description 2
- 238000004445 quantitative analysis Methods 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- TYSSWEJEOFKGFN-UHFFFAOYSA-N trichloromethylgermanium Chemical compound ClC(Cl)(Cl)[Ge] TYSSWEJEOFKGFN-UHFFFAOYSA-N 0.000 description 2
- 239000005046 Chlorosilane Substances 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical group [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical group [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical group [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- 239000007900 aqueous suspension Substances 0.000 description 1
- 238000000231 atomic layer deposition Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- QHGIKMVOLGCZIP-UHFFFAOYSA-N germanium dichloride Chemical compound Cl[Ge]Cl QHGIKMVOLGCZIP-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical group [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 239000002075 main ingredient Substances 0.000 description 1
- 229910052987 metal hydride Inorganic materials 0.000 description 1
- 150000004681 metal hydrides Chemical class 0.000 description 1
- 229910052914 metal silicate Inorganic materials 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 150000002816 nickel compounds Chemical class 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 238000006864 oxidative decomposition reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000011071 total organic carbon measurement Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N31/00—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N31/00—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods
- G01N31/12—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods using combustion
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
Definitions
- the present invention relates to a method for analyzing the amount of carbon contained in a raw material containing a metal halide compound having a hydrolyzable halogen.
- liquid materials that are raw materials of gas used in the manufacturing process are required to have higher purity.
- metal components have been sufficiently managed as impurities contained in liquid materials.
- Patent Document 1 a high dielectric constant film composed of a metal silicate is formed on a substrate by an atomic layer deposition method using a silicon-containing compound gas having a specific structure and a metal-containing compound gas.
- a silicon-containing compound gas having a specific structure and a metal-containing compound gas is formed on a substrate by an atomic layer deposition method using a silicon-containing compound gas having a specific structure and a metal-containing compound gas.
- carbon remains in the high dielectric constant film and leak current is likely to occur.
- a method is described that uses a material that defines the composition ratio of carbon atoms to silicon atoms.
- Patent Document 2 describes a semiconductor insulating material characterized by using a material that defines a composition ratio of carbon atoms to silicon atoms in order to obtain an interlayer insulating film with a small leakage current.
- Patent Document 3 discloses, as an analysis method of oil remaining on various metal parts for fuel cells and ceramic parts, hydrocarbons constituting the oil react with oxygen. An analysis method is described in which carbon monoxide is converted into carbon monoxide or carbon dioxide, and this is measured with an infrared detector to determine the amount of carbon.
- Patent Document 4 describes a method in which an organic substance adhering to a gold wire is pyrolyzed at a high temperature, and the generated methane and ethylene are measured with a pyrolysis gas chromatograph to quantify the total carbon content.
- Patent Document 5 as a method of analyzing carbon using a gas chromatograph, a sample is treated with a methane converter, and carbon monoxide, carbon dioxide, an organic compound, and the like contained in the sample are reduced with hydrogen to form carbon.
- a method for quantifying carbon by converting methane into methane and detecting the methane with a gas chromatograph is disclosed.
- the carbon quantification method described in Patent Document 3 is called a combustion infrared absorption method and can be analyzed even with a liquid sample.
- the carbon detection limit has reached 1 ppm by mass, which is an excellent carbon quantitative analysis method. is there.
- halogen gas or hydrogen halide gas is generated. Therefore, it is difficult to quantify carbon contained in the metal halide compound raw material by a combustion infrared absorption method or a pyrolysis gas chromatograph.
- the present invention is a safe method with no risk of equipment corrosion or work, and is contained in raw materials containing hydrolyzable metal halide compounds and organic components derived from impurities, etc., or hydrolysis. It is an object of the present invention to provide a method for quantitatively determining carbon contained in a metal compound containing a halogen atom and a carbon atom.
- the present inventor has made use of hydrolysis of a metal halide compound to obtain a hydrolyzable metal halide compound and an organic component derived from impurities and the like. It was found that carbon contained in the raw material contained or the amount of carbon contained in the metal compound containing hydrolyzable halogen atom and carbon atom can be efficiently quantified, and the present invention was completed. .
- the present invention is the following first and second inventions.
- a metal halide compound having hydrolyzability hereinafter referred to as “metal halide compound (P)”
- a raw material containing an organic component are mixed with water, and the metal halide compound (P ) Is hydrolyzed to form a hydrolyzate, and then a mixture of the hydrolyzate and the organic component is recovered, and a carbon content is obtained by carbon analysis of the mixture.
- the water is preferably pure water having a total organic carbon content of 500 ppb or less.
- the metal atom constituting the metal halide compound (P) is preferably a silicon atom, a germanium atom or a tungsten atom, and the halogen atom is preferably a chlorine atom.
- the metal halide compound (P) is preferably used by being supported on a carrier.
- the second invention is a hydrolyzable metal compound containing a halogen atom and a carbon atom (hereinafter referred to as “metal halide compound (Q)”), which is hydrolyzed with water to give a hydrolyzate containing the carbon atom. After the decomposition product is formed, the hydrolyzate is subjected to carbon analysis to obtain a carbon content.
- the water is preferably pure water having a total organic carbon content of 500 ppb or less.
- the metal atom constituting the metal halide compound (Q) is preferably a silicon atom or a germanium atom, and the halogen atom is preferably a chlorine atom.
- the metal halide compound (Q) is preferably supported on a carrier.
- the carbon analysis method of the present invention since the hydrolyzate produced does not contain a halogen component, the amount of carbon can be analyzed efficiently using a conventional quantitative method. And corrosion etc. of the metal part of a carbon analyzer can be avoided.
- the amount of carbon derived from the organic component contained as an impurity or the like can be obtained, and when the metal halide compound (P) is a compound containing a carbon atom, it is contained as an impurity or the like.
- the total amount of carbon with the amount of carbon derived from the organic component can be obtained.
- the carbon content of the metal halide compound (Q) to be analyzed can be obtained.
- the object of analysis in the present invention is a hydrolyzable metal halide compound (P) containing a halogen atom and a metal atom bonded to the halogen atom, which is used in the production of a semiconductor or the like that needs to control the amount of carbon.
- Or (Q) is the main ingredient.
- “having hydrolyzability” and “hydrolyzable” means forming a hydrolyzate while generating hydrogen halide by the reaction of the target compound and water.
- the hydrolyzable halogen atom include a chlorine atom and a fluorine atom. Of these, a chlorine atom is preferred.
- Examples of the metal atom constituting the metal halide compound (P) or (Q) include a silicon atom, a titanium atom, a germanium atom, a zirconium atom, a molybdenum atom, a tin atom, a hafnium atom, and a tungsten atom. Among these, a silicon atom, a germanium atom, or a tungsten atom is preferable.
- the metal halide compounds (P) and (Q) may be either solid or liquid.
- the metal halide compound (P) used in the first invention is a compound containing a halogen atom and a metal atom, and may contain a carbon atom.
- a silicon chloride compound, a germanium chloride compound or a tungsten chloride compound having a bond of a halogen atom and a metal atom, or a bond of a halogen atom and a metal atom and a bond of a carbon atom and a metal atom is preferable.
- Carbon atoms are preferably included as hydrocarbon groups.
- Examples of the silicon chloride compound include trichloromethylsilane, dichlorodimethylsilane, chlorotrimethylsilane, tetrachlorosilane, and hexachlorodisilane.
- Examples of the germanium chloride compound include trichloromethyl germanium, trichlorodimethylamino germanium, germanium (II) chloride, and germanium (IV) chloride.
- examples of the tungsten chloride compound include tungsten chloride (III), tungsten chloride (IV), tungsten chloride (VI), and the like.
- the hydrolyzate of chlorosilane compounds is usually polysiloxane.
- the metal halide compound (P) used in the first invention may be only one type or two or more types. It is preferable that the said metal halide compound (P) contains the compound which consists of a halogen atom and a metal atom.
- the metal halide compound (Q) used in the second invention is a compound containing a halogen atom, a carbon atom and a metal atom.
- a silicon chloride compound and a germanium chloride compound are preferable.
- the silicon chloride compound include trichloromethylsilane, dichlorodimethylsilane, and chlorotrimethylsilane.
- the germanium chloride compound include trichloromethyl germanium and trichlorodimethylamino germanium.
- the metal halide compound (Q) used in the second invention may be only one type or two or more types.
- the organic component in the first invention is usually an oil component, which is a component contained in a trace amount as an impurity or the like.
- the hydrolyzability of the organic component is not particularly limited because it does not affect the quantitativeness.
- the metal halide compound (P) and the raw material containing the organic component or the metal halide compound (Q) are hydrolyzed with water.
- the water is not particularly limited, but pure water is preferable.
- the total organic carbon (TOC) content in the pure water is preferably 500 mass ppb or less, more preferably 100 mass ppb or less, and particularly preferably 50 mass ppb or less (ultra pure water).
- TOC total organic carbon
- the heat generation is intense at this time, it is preferable to cool the contents according to the degree of heat generation.
- the time required for hydrolysis depends on the type or amount of the metal halide compound (P) or (Q), but it is generally preferable to leave it at about 25 ° C. for 24 hours or more.
- the amount of water used is preferably 1 to 100 parts by weight, more preferably 5 to 50 parts by weight, based on 1 part by weight of the metal halide compound (P) or (Q), from the viewpoint of hydrolysis reactivity. is there. If the amount of water used is less than 1 part by mass, hydrolysis may not proceed sufficiently. In addition, when there is too much usage-amount of water, it may take time and effort to remove water at a post process.
- the hydrolyzate obtained by hydrolysis of the metal halide compound (P) or (Q) is generally a solid, and after hydrolysis, the aqueous phase is a suspension containing hydrogen halide such as hydrogen chloride. Become a liquid. Since this hydrogen halide adversely affects the analyzer, a solid substance suitable for analysis is obtained by heating and drying the suspension under normal pressure or reduced pressure and removing it together with water.
- a mixture of a hydrolyzate and an organic component is usually obtained in a form in which the organic component is included in the hydrolyzate.
- a hydrolyzate of the metal halide compound (P) and a mixture of the hydrolyzate of the organic component are obtained.
- the temperature for the heating and drying is preferably 30 to 180 ° C., more preferably 80 to 120 ° C., because hydrogen halide can be efficiently removed without altering the hydrolyzate. If the heating temperature is less than 30 ° C, the drying may be insufficient and hydrogen halide may remain and adversely affect the analyzer. If the drying temperature exceeds 180 ° C, the organic components contained in the hydrolyzate may be reduced. This is not preferable because the possibility of volatilization or decomposition increases. Furthermore, the atmosphere of heat drying is not particularly limited, but an inert gas atmosphere is preferable. By setting it as inert gas atmosphere, drying of a hydrolyzate is accelerated
- the above-mentioned heat drying is preferably terminated when the pH test paper moistened with water is placed over the exhaust gas to confirm that the pH is 6 or more and a constant weight. Thereafter, the carbon content can be obtained by subjecting the recovered material to carbon analysis.
- the hydrolyzate obtained by hydrolysis of a metal halide compound (P) may not become a solid.
- a metal halide compound (P) and a carrier in combination are not particularly limited, but it is preferable to use a powder made of a compound having a carbon content less than the lower limit of quantification of the analyzer so as not to hinder analysis later.
- the carrier for example, silica having a particle size of 0.3 to 3 ⁇ m obtained by hydrolyzing high-purity tetraethoxysilane with ammonia and calcining can be used.
- silica having a carbon amount determined by the combustion infrared absorption method of 0.003 to less than 0.001% by mass is preferable.
- carrier a support
- An accurate carbon amount can be obtained by analyzing the carbon amount of the carrier in advance.
- the amount of the carrier used is preferably 5 to 100 parts by mass, more preferably 10 to 50 parts by mass with respect to 1 part by mass of the metal halide compound from the viewpoint of workability.
- the metal halide compound (P) that gives a liquid hydrolyzate and a carrier are used in combination, after hydrolysis, a mixed liquid (water suspension) composed of water, a liquid hydrolyzate, a carrier, and an organic component is used. Suspension) is obtained. And when this liquid mixture is heat-dried, the composite_body
- the hydrolyzate when the hydrolyzate is a solid, after the hydrolysis, by heating and drying as described above, the hydrolyzate is recovered and subjected to carbon analysis. Can be obtained.
- the hydrolyzate when the hydrolyzate is a liquid, as described above, the hydrolyzate is hydrolyzed by using the support and the metal halide compound (Q) in combination and then drying by heating. A composite in which is attached to the carrier is obtained. Thereafter, the carbon content can be obtained by subjecting the recovered material to carbon analysis.
- an apparatus for combusting the recovered material at a high temperature and quantifying the generated carbon dioxide with an infrared detector is suitably used.
- LECO carbon / sulfur analyzer CS844 type or CS744 type
- Horiba carbon / sulfur analyzer EMIA-920V2 or EMIA-810W
- Elemental Total Organic Carbon Measurement Device (vario TOC cube) Etc.
- the recovered material after hydrolysis and heat drying is May contain this organic component. Therefore, the carbon analysis of the carrier or the carbon analysis of the dried carrier obtained by removing the water after contacting the carrier, water and the container in accordance with the hydrolysis and heat drying procedures should be performed in advance. Is preferred. An analysis example is shown below.
- Example 1 20.04 parts by mass of ultrapure water (total organic carbon content: 18 mass ppb) was put in a clean glass container. Then, 1.95 parts by mass of disilicon hexachloride raw material (hereinafter abbreviated as “HCD raw material”) distilled and purified at normal pressure is added little by little while cooling ultrapure water by bringing ice water into contact with the glass container. did. As a result, HCD was hydrolyzed, and a slurry that became cloudy with the hydrolyzate (polysiloxane) produced was obtained. The glass container was then sealed and allowed to stand at about 25 ° C. for 24 hours, and then the opened glass container was heated in a nitrogen stream at 90 ° C.
- HCD raw material disilicon hexachloride raw material
- the mass of the white solid was 0.86 parts by mass. It was 0.001 mass% when carbon content of the obtained white solid was calculated
- A [(B ⁇ C / 100) / D] ⁇ 1000000 (1)
- A is the amount of carbon (mass ppm) contained in the HCD raw material
- B is the mass of the white solid after the hydrolyzate is dried by heating
- C is the amount of carbon (mass%) determined by the combustion infrared absorption method
- D is the mass of the HCD raw material subjected to hydrolysis.
- the analytical value of the carbon content is increased by 0.001 to 0.002 mass% by the hydrolysis operation.
- the carbon amount of the white solid is 0.001% by mass, the amount of carbon contained in the HCD raw material is considered to be substantially zero. Therefore, even if the carbon component was contained, the carbon content was determined to be 4 mass ppm below the lower limit of quantification.
- Example 2 Carbon analysis was performed in the same manner as in Example 1 except that HCD stored in a glass bottle at room temperature for 2 years (hereinafter abbreviated as “HCD sample”) was used. It was 0.054 mass% when carbon content of the white solid which is the obtained hydrolyzate was calculated
- the glass bottle that stored the HCD had an inner lid made of polyethylene, but it turned black brown to become hard and was not flexible at all. Further, the inner lid was firmly fixed to the inner wall of the opening of the glass bottle, and there was a white deposit on the interface between the inner lid and the glass. The collected HCD sample was pale yellow. The reason why 226 mass ppm of carbon was detected in Example 2 is presumed to be that organic substances were mixed in HCD along with deterioration and alteration of the inner lid made of polyethylene.
- Example 3 5.15 parts by mass of ultrapure water (total organic carbon content: 18 mass ppb) was placed in a clean glass container. Then, 0.02 parts by mass of trichloromethylsilane (hereinafter abbreviated as “TCMS”) was added to 1.93 parts by mass of distilled and purified HCD while cooling the ultrapure water by bringing ice water into contact with the glass container. The mixed solution was added little by little to ultrapure water, and the mixture was allowed to stand for 5 hours after the addition. HCD and TCMS were hydrolyzed to obtain a cloudy slurry. Thereafter, the same operation as in Example 1 was performed to obtain 0.83 parts by mass of a white solid.
- TCMS trichloromethylsilane
- the carbon amount of the obtained white solid was determined by a combustion infrared absorption method and found to be 0.161% by mass. Based on this analysis value, the carbon content (E) contained in the mixed liquid of HCD and TCMS was 690 mass ppm from the following formula (2).
- E [(B ⁇ C / 100) / (D + F)] ⁇ 1000000 (2)
- E is the carbon content (mass ppm) contained in the mixed liquid of HCD and TCMS
- B is the mass of the white solid after the hydrolyzate is heated and dried
- C is the carbon content determined by the combustion infrared absorption method ( % By mass)
- D and F are the masses of HCD and TCMS respectively subjected to hydrolysis.
- Example 4 2.04 parts by mass of support X and 0.65 parts by mass of dichlorodimethylsilane (DCDMS) are put in a clean glass container, and 5.09 parts by mass of ultrapure water (content of total organic carbon: 18 parts by mass). ppb) was added and these were stirred for 30 minutes. Thereafter, the glass container was sealed and left at about 25 ° C. for 24 hours. Next, the opened glass container was heated at 90 ° C. for 8 hours and further at 120 ° C. for 19 hours under a nitrogen stream. As a result, 2.27 parts by mass of a dried product was obtained. When the carbon content of the dried product was determined by the combustion infrared absorption method, it was 4.32% by mass.
- DCDMS dichlorodimethylsilane
- the amount of carbon contained in the mixture of the carrier X and DCDMS was determined to be 3.65% by mass from the formula (2). Since the carbon content of the carrier X was as small as 0.001% by mass, ignoring it, the carbon content contained in DCDMS could be determined to be 15.1% by mass.
- the carbon analysis method in the present invention is a safe and simple method that can accurately quantify the amount of carbon managed in the manufacture of semiconductors, and thus is a useful analysis method in the field of electronic materials such as semiconductors.
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Abstract
Description
第1発明は、加水分解性を有するハロゲン化金属化合物(以下、「ハロゲン化金属化合物(P)」という)及び有機成分を含む原料と、水とを混合して、上記ハロゲン化金属化合物(P)を加水分解させて、加水分解物を形成した後、該加水分解物及び上記有機成分の混合物を回収し、該混合物の炭素分析によって炭素量を得ることを特徴とする、炭素分析方法である。
第1発明において、上記水は、全有機炭素の含有量が500ppb以下の純水であることが好ましい。
第1発明において、上記ハロゲン化金属化合物(P)を構成する金属原子がケイ素原子、ゲルマニウム原子又はタングステン原子であり、上記ハロゲン原子が塩素原子であることが好ましい。
第1発明において、上記加水分解物を得た際に副生したハロゲン化水素を、30~180℃の加熱により除去することが好ましい。
第1発明において、上記加水分解物が液体の場合、上記ハロゲン化金属化合物(P)は、担体に担持させて用いることが好ましい。
第2発明は、加水分解性を有し、ハロゲン原子及び炭素原子を含む金属化合物(以下、「ハロゲン化金属化合物(Q)」という)を、水により加水分解させて、上記炭素原子を含む加水分解物を形成した後、該加水分解物を炭素分析して炭素量を得ることを特徴とする、炭素分析方法である。
第2発明において、上記水は、全有機炭素の含有量が500ppb以下の純水であることが好ましい。
第2発明において、上記ハロゲン化金属化合物(Q)を構成する金属原子がケイ素原子又はゲルマニウム原子であり、上記ハロゲン原子が塩素原子であることが好ましい。
第2発明において、上記加水分解物を得た際に副生したハロゲン化水素を、30~180℃の加熱により除去することが好ましい。
第2発明において、上記加水分解物が液体の場合、上記ハロゲン化金属化合物(Q)は、担体に担持させて用いることが好ましい。
加水分解性ハロゲン原子としては、塩素原子、フッ素原子等が挙げられる。これらのうち、塩素原子が好ましい。また、ハロゲン化金属化合物(P)又は(Q)を構成する金属原子としては、ケイ素原子、チタン原子、ゲルマニウム原子、ジルコニウム原子、モリブデン原子、スズ原子、ハフニウム原子、タングステン原子等が挙げられ、これらのうち、ケイ素原子、ゲルマニウム原子又はタングステン原子が好ましい。
上記ハロゲン化金属化合物(P)及び(Q)は、固体及び液体のいずれでもよい。
第1発明で用いられるハロゲン化金属化合物(P)は、1種のみであってよいし、2種以上であってもよい。
上記ハロゲン化金属化合物(P)は、ハロゲン原子及び金属原子からなる化合物を含むことが好ましい。
第2発明で用いられるハロゲン化金属化合物(Q)は、1種のみであってよいし、2種以上であってもよい。
加水分解では、ハロゲン化金属化合物(P)又は(Q)に含まれるハロゲン原子の当量より過剰な量の水を清浄な容器に収容し、そこにハロゲン化金属化合物(P)又は(Q)を少量ずつ添加することが好ましい。この時に発熱が激しい場合は、発熱の程度に応じて内容物を冷却することが好ましい。加水分解に要する時間は、ハロゲン化金属化合物(P)又は(Q)の種類又は量によるが、一般に、約25℃で24時間以上放置することが好ましい。
水の使用量が1質量部未満では、加水分解が十分に進まないことがある。尚、水の使用量が多すぎると、後工程で水の除去に手間がかかることがある。
更に、加熱乾燥の雰囲気は、特に限定されないが、不活性ガス雰囲気が好ましい。不活性ガス雰囲気とすることで、加水分解物の乾燥が促進され、有機成分の酸化分解も抑制できる。不活性ガスとしては、窒素を用いることが好ましい。
その後、回収物を、炭素分析に供することにより、炭素量を得ることができる。
担体は、特に限定されないが、後に分析の障害にならないようにするため、炭素の含有量が分析装置の定量下限未満の化合物からなる粉体を用いることが好ましい。上記担体としては、例えば、高純度のテトラエトキシシランをアンモニアで加水分解した後、焼成させて得られた粒径が0.3~3μmのシリカを用いることができる。特に、燃焼赤外線吸収法で求めた炭素量が0.003~0.001質量%未満であるシリカが、好適である。
担体を用いる場合、容器に、担体と、ハロゲン化金属化合物(P)を含む原料とを加え、過剰な水を加えて加水分解を行う。尚、予め、担体の炭素量を分析しておくことにより、正確な炭素量を得ることができる。
その後、回収物を、炭素分析に供することにより、炭素量を得ることができる。
その後、回収物を、炭素分析に供することにより、炭素量を得ることができる。
例えば、LECO社製炭素・硫黄分析装置(CS844型又はCS744型)、堀場製作所製炭素・硫黄分析装置(EMIA-920V2又はEMIA-810W)、エレメンタール社製全有機炭素測定装置(vario TOC cube)等を用いることができる。
高純度のテトラエトキシシランをアンモニアで加水分解させ、析出したシリカを900℃で焼成することで粒径2μmの球状シリカを得た。球状シリカを超純水で洗浄してから乾燥させたものを「担体X」とした。この担体乾燥物の炭素量を、燃焼赤外線吸収法で求めた結果、0.001質量%であった。
清浄なガラス容器に、1.10質量部の担体X及び20.00質量部の超純水を入れて30分間撹拌後、ガラス容器ごと窒素気流下、90℃で8時間、更に120℃で19時間乾燥させた。次いで、得られた担体乾燥物の炭素量を、燃焼赤外線吸収法で求めた結果、0.003質量%であった。
したがって、加水分解及び加熱乾燥に伴って増大した炭素量は0.002質量%であった。同様な操作をもう一度繰り返す試験、及び、超純水の添加量を5質量部に減らした試験を行ったが、増大した炭素量は、それぞれ0.001質量%及び0.003質量%であった。
清浄なガラス容器に20.04質量部の超純水(全有機炭素の含有量:18質量ppb)を入れた。そして、ガラス容器に氷水を接触させて超純水を冷却しながら、常圧で蒸留精製した1.95質量部の六塩化二ケイ素原料(以下、「HCD原料」と略す。)を少しずつ添加した。これによりHCDは加水分解され、生成した加水分解物(ポリシロキサン)により白濁したスラリーを得た。次いで、ガラス容器を密封して約25℃で24時間放置した後、開封したガラス容器ごと窒素気流下、90℃で8時間、更に120℃で19時間加熱した。これにより乾燥物(白色固体)を得た。事前に測定しておいた風袋との質量差より、白色固体の質量は0.86質量部であった。得られた白色固体の炭素量を燃焼赤外線吸収法で求めたところ、0.001質量%であった。この分析値を基に、加水分解前のHCD原料に含まれる炭素量(A)は、下記式(1)から4質量ppmとなった。
A=〔(B×C/100)/D〕×1000000 (1)
ここで、AはHCD原料に含まれる炭素量(質量ppm)、Bは加水分解物を加熱乾燥させた後の白色固体の質量、Cは燃焼赤外線吸収法で求めた炭素量(質量%)、Dは加水分解に供したHCD原料の質量である。
しかしながら、分析例1及び2から、加水分解操作によって、炭素量の分析値が0.001~0.002質量%高くなることが確認されている。上記のように、白色固体の炭素量は、0.001質量%であるため、HCD原料に含まれる炭素量は、実質的にゼロであると考えられる。従って、炭素成分が含まれていたとしても、炭素量を、定量下限未満の4質量ppmと決定した。
ガラスビンに室温で2年間保管したHCD(以下、「HCD試料」と略す。)を用いた以外は、実施例1と同様な方法で、炭素分析を行った。得られた加水分解物である白色固体の炭素量を燃焼赤外線吸収法で求めたところ、0.054質量%であった。加水分解操作で炭素量は0.001~0.002質量%増えることが分かっているので、0.054質量%から0.002質量%を引いた0.052質量%を白色固体の炭素量とした。そして、上記式(1)により、加水分解前のHCD試料に含まれた炭素量を求めると、226質量ppmであった。
尚、HCDを保管していたガラスビンにはポリエチレン製の内蓋があったが、黒褐色に変色して硬くなっており、全く柔軟性はなくなっていた。また、内蓋は、ガラスビンの開口部内壁に固く固着しており、内蓋とガラスの界面には白い付着物があった。そして、採取したHCD試料は薄く黄色に着色していた。
この実施例2で226質量ppmの炭素が検出されたのは、ポリエチレン製の内蓋の劣化や変質に伴って有機物がHCD中に混入したためと推察される。
清浄なガラス容器に5.15質量部の超純水(全有機炭素の含有量:18質量ppb)を入れた。そして、ガラス容器に氷水を接触させて超純水を冷却しながら、1.93質量部の蒸留精製したHCDに0.02質量部のトリクロロメチルシラン(以下、「TCMS」と略す)を加えた混合液を超純水に少しずつ添加し、全て添加後5時間放置した。HCD及びTCMSは加水分解され、白濁したスラリーを得た。以下、実施例1と同様の操作を行い、0.83質量部の白色固体を得た。得られた白色固体の炭素量を燃焼赤外線吸収法で求めたところ、0.161質量%であった。この分析値を基に、HCD及びTCMSの混合液に含まれる炭素量(E)は、下記式(2)から690質量ppmとなった。
E=〔(B×C/100)/(D+F)〕×1000000 (2)
ここで、EはHCD及びTCMSの混合液に含まれる炭素量(質量ppm)、Bは加水分解物を加熱乾燥させた後の白色固体の質量、Cは燃焼赤外線吸収法で求めた炭素量(質量%)、DとFはそれぞれ加水分解に供したHCD及びTCMSの質量である。
2.04質量部の担体X及び0.65質量部のジクロロジメチルシラン(DCDMS)を清浄なガラス容器に入れ、更に、5.09質量部の超純水(全有機炭素の含有量:18質量ppb)を入れて、これらを30分間撹拌した。その後、ガラス容器を密封して約25℃で24時間放置した。次に、開封したガラス容器ごと窒素気流下、90℃で8時間、更に120℃で19時間加熱した。これにより乾燥物2.27質量部を得た。この乾燥物の炭素量を燃焼赤外線吸収法で求めたところ、4.32質量%であった。
以上より、担体XとDCDMSの混合物に含まれる炭素量は、式(2)から3.65質量%と求められた。担体Xの炭素量は0.001質量%と微量なので無視すると、DCDMSに含まれる炭素量は15.1質量%と求めることができた。
Claims (10)
- 加水分解性を有するハロゲン化金属化合物及び有機成分を含む原料と、水とを混合して、前記ハロゲン化金属化合物を加水分解させて、加水分解物を形成した後、該加水分解物及び前記有機成分の混合物を回収し、該混合物の炭素分析によって炭素量を得ることを特徴とする、炭素分析方法。
- 前記水が、全有機炭素の含有量が500ppb以下の純水である請求項1に記載の炭素分析方法。
- 前記ハロゲン化金属化合物を構成する金属原子がケイ素原子、ゲルマニウム原子又はタングステン原子であり、前記ハロゲン原子が塩素原子である請求項1又は2に記載の炭素分析方法。
- 前記加水分解物を得た際に副生したハロゲン化水素を、30~180℃の加熱により除去する請求項1乃至3のいずれか一項に記載の炭素分析方法。
- 前記加水分解物が液体の場合、前記ハロゲン化金属化合物は、担体に担持させて用いられる請求項1乃至4のいずれか一項に記載の炭素分析方法。
- 加水分解性を有し、ハロゲン原子及び炭素原子を含む金属化合物を、水により加水分解させて、前記炭素原子を含む加水分解物を形成した後、該加水分解物を炭素分析して炭素量を得ることを特徴とする、炭素分析方法。
- 前記水が、全有機炭素の含有量が500ppb以下の純水である請求項6に記載の炭素分析方法。
- 前記金属化合物を構成する金属原子がケイ素原子又はゲルマニウム原子であり、前記ハロゲン原子が塩素原子である請求項6又は7に記載の炭素分析方法。
- 前記加水分解物を得た際に副生したハロゲン化水素を、30~180℃の加熱により除去する請求項6乃至8のいずれか一項に記載の炭素分析方法。
- 前記加水分解物が液体の場合、前記金属化合物は、担体に担持させて用いられる請求項6乃至9のいずれか一項に記載の炭素分析方法。
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CN107923893B (zh) | 2021-02-12 |
CN107923893A (zh) | 2018-04-17 |
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KR20180037000A (ko) | 2018-04-10 |
TWI755358B (zh) | 2022-02-21 |
JP6702325B2 (ja) | 2020-06-03 |
TW201718402A (zh) | 2017-06-01 |
KR102581692B1 (ko) | 2023-09-22 |
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