WO2016190381A1 - 露光用照明装置、露光装置及び露光方法 - Google Patents

露光用照明装置、露光装置及び露光方法 Download PDF

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Publication number
WO2016190381A1
WO2016190381A1 PCT/JP2016/065545 JP2016065545W WO2016190381A1 WO 2016190381 A1 WO2016190381 A1 WO 2016190381A1 JP 2016065545 W JP2016065545 W JP 2016065545W WO 2016190381 A1 WO2016190381 A1 WO 2016190381A1
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WIPO (PCT)
Prior art keywords
exposure
optical filter
light
mask
workpiece
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Application number
PCT/JP2016/065545
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English (en)
French (fr)
Japanese (ja)
Inventor
洋徳 川島
Original Assignee
株式会社ブイ・テクノロジー
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Application filed by 株式会社ブイ・テクノロジー filed Critical 株式会社ブイ・テクノロジー
Priority to CN201680030852.2A priority Critical patent/CN107615170B/zh
Priority to JP2017520796A priority patent/JP6663914B2/ja
Priority to KR1020177033992A priority patent/KR20180012270A/ko
Publication of WO2016190381A1 publication Critical patent/WO2016190381A1/ja

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Definitions

  • the present invention relates to an exposure illumination apparatus, an exposure apparatus, and an exposure method.
  • the exposure apparatus described in Patent Document 2 includes an illuminance distribution correction filter having a plurality of liquid crystal cells in order to cope with deterioration over time of the optical system, and controls each liquid crystal cell to control the illuminance distribution correction filter. It is disclosed that the light transmittance distribution is corrected, the illuminance distribution of light irradiated to the plurality of lens elements of the fly-eye lens is updated quickly, and the illuminance distribution of light irradiated to the reticle is made uniform.
  • the curvature correcting mechanism mirror bending mechanism
  • the reflected light diffuses and the illuminance decreases (darkens) in the portion where the reflecting surface of the reflecting mirror becomes convex, and the reflecting mirror decreases.
  • the reflected light converges and the illuminance increases (becomes brighter), and the illuminance distribution on the exposure surface varies, which may affect the exposure accuracy.
  • the exposure apparatus described in Patent Document 2 is an apparatus that controls each liquid crystal cell of the illuminance distribution correction filter to uniformize the illuminance distribution of light applied to the reticle, and variations in illuminance distribution due to curvature correction of the reflecting mirror. Is not mentioned.
  • the present invention has been made in view of the above-described problems, and an object of the present invention is to provide an exposure illumination apparatus and an exposure apparatus that can suppress variation in illuminance distribution on an exposure surface due to mirror bending by an optical filter. And providing an exposure method.
  • the above object of the present invention can be achieved by the following constitution.
  • a light source a fly-eye lens having a plurality of lens elements arranged in a matrix of p rows and q columns (p and q are integers), and uniformly emitting light from the light source;
  • a mirror bending mechanism capable of changing the shape of the reflecting surface, and a reflecting mirror that reflects the light emitted from the fly-eye lens;
  • An exposure illumination device that irradiates a workpiece with exposure light from the light source through a mask on which an exposure pattern is formed, and exposes and transfers the exposure pattern to the workpiece.
  • An optical filter disposed between the light source and the fly-eye lens and capable of changing an illuminance distribution on an exposure surface;
  • the optical filter is arranged in a matrix of p-2 to p + 2 rows and q-2 to q + 2 columns, each having a plurality of cells having a light transmittance distribution,
  • the exposure illumination device wherein the optical filter is movable in a direction perpendicular to the optical axis of the light.
  • the two columns of cells arranged around the optical filter are designed so that the size in the row direction is more than half of the cells arranged inside the optical filter (2).
  • the illumination apparatus for exposure as described in 1).
  • the optical filter includes the plurality of cells arranged in a matrix of p + 1 rows and q + 1 columns.
  • Each of the cells has the same light transmittance distribution.
  • the optical filter is moved in a direction perpendicular to the optical axis of the light according to the shape of the reflecting surface of the reflecting mirror so that the illuminance distribution on the exposure surface becomes uniform (1)
  • the exposure illumination device according to any one of (1) to (4).
  • each of the cells has a light transmittance distribution in which the light transmittance gradually increases from the central portion toward the peripheral portion.
  • the optical filter is movable along the optical axis of the light.
  • the plurality of optical filters are arranged side by side along the optical axis of the light.
  • a mask support portion for supporting the mask; A workpiece support section for supporting the workpiece; (1) to the exposure illumination device according to any one of (8), With An exposure apparatus that irradiates the workpiece with exposure light from the light source through the mask and exposes and transfers the exposure pattern of the mask onto the workpiece.
  • the exposure apparatus according to (9) is used, and exposure light from the light source is irradiated onto the workpiece through the mask, and the exposure pattern of the mask is exposed and transferred to the workpiece.
  • Exposure method (11)
  • the optical filter may be moved in a direction perpendicular to the optical axis of the light while irradiating the workpiece with the exposure light from the light source through the mask. The exposure method as described.
  • the reflection includes a light source, a fly-eye lens having a plurality of lens elements arranged in a matrix of p rows and q columns, and a mirror bending mechanism that changes the shape of the reflecting surface.
  • Mirrors arranged in a matrix of p-2 to p + 2 rows and q-2 to q + 2 columns, each having a plurality of cells having a light transmittance distribution, arranged between the light source and the fly-eye lens
  • An optical filter movable in a direction orthogonal to the optical axis.
  • the mask supported by the mask support, the work supported by the work support, and the exposure surface caused by the shape change of the reflection surface by the mirror bending mechanism are provided.
  • FIG. 4 is a cross-sectional view taken along line ⁇ IV ′.
  • (A) shows the illuminance on the exposure surface of the light emitted from each lens element when light having a substantially uniform illuminance emitted from the light source unit is corrected by an optical filter and incident on each lens element of the fly-eye lens. It is a figure and (b) is a figure which shows the image of the whole illumination intensity in an exposure surface.
  • (A) is a top view which shows the illuminance distribution of the exposure surface when a mirror bending mechanism correct
  • (b) is a top view which shows the illuminance distribution of the corrected exposure surface.
  • FIG.6 It is a top view which shows the positional relationship of the optical filter and fly eye lens for correct
  • A) is a top view which shows the illumination intensity distribution of the exposure surface when the mirror bending mechanism correct
  • (b) is a top view which shows the illumination intensity distribution of the corrected exposure surface. It is a top view which shows the positional relationship of the optical filter and fly eye lens for correct
  • (A) is a top view which shows the illumination intensity distribution of the exposure surface when a mirror bending mechanism correct
  • (b) is a top view which shows the illumination intensity distribution of the corrected exposure surface. It is an enlarged view which shows the positional relationship of the optical filter and fly eye lens for correct
  • (A) is a plan view showing the illuminance distribution on the exposure surface where the illuminance of the portion corresponding to the region having a small curvature radius of the reflecting surface is high
  • (b) is a plan view showing the illuminance distribution on the corrected exposure surface It is.
  • FIG. 1 is a top view which shows the 1st modification of an optical filter with the positional relationship of a fly eye lens. It is a top view which shows the 2nd modification of an optical filter with the positional relationship of a fly eye lens.
  • (A) is a top view which shows the 3rd modification of an optical filter with the positional relationship of a fly-eye lens
  • (b) is a top view which shows the 4th modification of an optical filter with the positional relationship of a fly-eye lens. It is a top view of the 5th modification of an optical filter.
  • the proximity exposure apparatus PE uses a mask M smaller than the workpiece W as a material to be exposed, holds the mask M on a mask stage (mask support portion) 1, and holds the workpiece W on the workpiece stage (workpiece (workpiece)).
  • the mask M is irradiated with light for pattern exposure from the illumination device 3 toward the mask M in a state where the mask M and the workpiece W are placed close to each other with a predetermined exposure gap.
  • the pattern M is exposed and transferred onto the workpiece W.
  • the work stage 2 is moved stepwise with respect to the mask M in the two axial directions of the X axis direction and the Y axis direction, and exposure transfer is performed for each step.
  • an X-axis stage feed mechanism 5 for moving the X-axis feed base 5a stepwise in the X-axis direction is installed on the apparatus base 4.
  • a Y-axis stage feed mechanism 6 for step-moving the Y-axis feed base 6a in the Y-axis direction is installed in order to move the work stage 2 stepwise in the Y-axis direction.
  • the work stage 2 is installed on the Y-axis feed base 6 a of the Y-axis stage feed mechanism 6.
  • the work W On the upper surface of the work stage 2, the work W is held in a state of being sucked by a work chuck or the like. Further, a substrate side displacement sensor 15 for measuring the lower surface height of the mask M is disposed on the side portion of the work stage 2. Therefore, the substrate side displacement sensor 15 can move in the X and Y axis directions together with the work stage 2.
  • a plurality of (four in the embodiment shown in the figure) X-axis linear guide rails 51 are arranged in the X-axis direction, and each guide rail 51 has a lower surface of the X-axis feed base 5 a.
  • a slider 52 fixed to the bridge is straddled.
  • the X-axis feed base 5 a is driven by the first linear motor 20 of the X-axis stage feed mechanism 5 and can reciprocate along the guide rail 51 in the X-axis direction.
  • a plurality of guide rails 53 for Y-axis linear guides are arranged on the X-axis feed base 5a in the Y-axis direction.
  • Each guide rail 53 has a slider 54 fixed to the lower surface of the Y-axis feed base 6a. Is straddled. Accordingly, the Y-axis feed base 6 a is driven by the second linear motor 21 of the Y-axis stage feed mechanism 6 and can reciprocate in the Y-axis direction along the guide rail 53.
  • the vertical coarse motion device 7 having a relatively coarse positioning resolution but a large moving stroke and moving speed, and the vertical coarse motion Positioning with high resolution is possible compared with the apparatus 7, and a vertical fine movement apparatus 8 is provided for finely adjusting the gap between the opposing surfaces of the mask M and the work W to a predetermined amount by finely moving the work stage 2 up and down. .
  • the vertical coarse movement device 7 moves the work stage 2 up and down with respect to the fine movement stage 6b by an appropriate drive mechanism provided on the fine movement stage 6b described later.
  • the stage coarse movement shafts 14 fixed at four positions on the bottom surface of the work stage 2 are engaged with linear motion bearings 14a fixed to the fine movement stage 6b, and are guided in the vertical direction with respect to the fine movement stage 6b.
  • it is desirable that the vertical coarse motion device 7 has high repeated positioning accuracy even if the resolution is low.
  • the vertical fine movement device 8 includes a fixed base 9 fixed to the Y-axis feed base 6a, and a linear guide guide rail 10 attached to the fixed base 9 with its inner end inclined obliquely downward.
  • a ball screw nut (not shown) is coupled to a slide body 12 that reciprocates along the guide rail 10 via a slider 11 straddling the guide rail 10, and an upper end surface of the slide body 12. Is in contact with the flange 12a fixed to the fine movement stage 6b so as to be slidable in the horizontal direction.
  • the vertical fine movement device 8 may drive the slide body 12 by a linear motor instead of driving the slide body 12 by the motor 17 and the ball screw.
  • the vertical fine movement device 8 is installed on one end side (left end side in FIG. 1) in the Y-axis direction of the Z-axis feed base 6a and two on the other end side, for a total of three units, and each is independently driven and controlled. It has become so. Accordingly, the vertical fine movement device 8 independently finely adjusts the heights of the three flanges 12 a based on the measurement results of the gap amounts between the mask M and the workpiece W at a plurality of locations by the gap sensor 27, and the workpiece stage 2. Fine-tune the height and inclination of In addition, when the height of the work stage 2 can be sufficiently adjusted by the vertical fine movement device 8, the vertical coarse movement device 7 may be omitted.
  • a bar mirror (both not shown) facing the interferometer is installed.
  • the bar mirror 19 facing the Y-axis laser interferometer 18 is arranged along the X-axis direction on one side of the Y-axis feed base 6a, and the bar mirror facing the X-axis laser interferometer is located on the Y-axis feed base 6a. It is arranged along the Y-axis direction on one end side.
  • the Y-axis laser interferometer 18 and the X-axis laser interferometer are each arranged so as to always face the corresponding bar mirror and supported by the apparatus base 4.
  • Two Y-axis laser interferometers 18 are installed apart from each other in the X-axis direction.
  • the two Y-axis laser interferometers 18 detect the position of the Y-axis feed base 6a and consequently the work stage 2 in the Y-axis direction and the yawing error via the bar mirror 19.
  • the X-axis laser interferometer detects the position of the X-axis feed base 5a and eventually the work stage 2 in the X-axis direction via the opposing bar mirror.
  • the mask stage 1 is inserted in a X, Y, ⁇ direction (in the X, Y plane) by inserting a mask base frame 24 composed of a substantially rectangular frame body and a gap into a central opening of the mask base frame 24.
  • the mask base frame 24 is held at a fixed position above the work stage 2 by a support column 4a protruding from the apparatus base 4.
  • a frame-shaped mask holder 26 is provided on the lower surface of the central opening of the mask frame 25. That is, a plurality of mask holder suction grooves connected to a vacuum suction device (not shown) are provided on the lower surface of the mask frame 25, and the mask holder 26 is sucked to the mask frame 25 through the plurality of mask holder suction grooves. Retained.
  • a plurality of mask suction grooves are provided on the lower surface of the mask holder 26 for sucking the peripheral portion of the mask M on which the mask pattern is not drawn.
  • the mask M passes through the mask suction grooves. Then, it is detachably held on the lower surface of the mask holder 26 by a vacuum suction device (not shown).
  • the illumination device 3 of the exposure apparatus PE of the present embodiment includes, for example, a high-pressure mercury lamp 61 that is a light source for ultraviolet irradiation, and a reflector 62 that collects light emitted from the high-pressure mercury lamp 61.
  • An optical filter 90 including a plurality of lamp units 60 each having a plane mirror 63 for changing the direction of the optical path EL, and a plurality of cells 91 each having the same light transmittance distribution and arranged in a matrix. 3), an exposure control shutter unit 64 that controls the opening and closing of the irradiation light path, and a plurality of lens elements 65a arranged downstream of the exposure control shutter unit 64 and arranged in a matrix.
  • a fly-eye lens 65 that emits the condensed light so as to have as uniform illumination distribution as possible in the irradiation region;
  • a plane mirror 66 for changing the direction of the optical path EL emitted from the eye lens 65, a collimation mirror 67 for irradiating light from the high-pressure mercury lamp 61 as parallel light, and a plane mirror for irradiating the parallel light toward the mask M 68.
  • the optical filter 90 is movable in two directions along a plane orthogonal to the optical path EL and in a direction along the optical path EL. Specifically, the optical filter 90 is movable in each direction by driving a frame 92 provided around it by a driving device 93. The driving device 93 can also move the optical filter 90 to a non-use position where the optical filter 90 is retracted from the optical path EL. The optical filter 90 can be adjusted along the optical path EL to adjust the intensity of illuminance on the exposure surface. For example, as the optical filter 90 is brought closer to the fly-eye lens 65, the illuminance on the exposure surface can be further reduced by the portion where the light transmittance of each cell 91 is low.
  • the optical filter 90 can be inclined with respect to the fly-eye lens 65.
  • the optical filter 90 can be tilted by swinging about an arbitrary axis CL extending in a direction orthogonal to the optical path EL.
  • the influence on the illuminance on the exposure surface due to the portion approaching the fly-eye lens 65 increases, and the illuminance on the exposure surface due to the portion far from the fly-eye lens 65.
  • the effect on is weakened.
  • the influence on the illuminance on the exposure surface may be changed by bending the optical filter 90.
  • each of the plurality of cells 91 of the optical filter 90 has a light transmittance at the center lower than that at the periphery, specifically, from the center toward the periphery.
  • the light transmittance distribution has the same light transmittance distribution that gradually increases.
  • the change in light transmittance from the central part to the peripheral part can be arbitrarily set such as a linear change, a sinusoidal change, an exponential change, and a Gaussian change.
  • the light transmittance distribution can be provided by depositing a chromium dot pattern on the quartz substrate of the optical filter 90, or by an optical filter whose transmittance varies radially from the center by the deposited multilayer film.
  • the light transmittance can be arbitrarily set by changing the size and density of the dot pattern.
  • the shape of the dot pattern can be arbitrarily set, such as a rectangle, a circle, and an ellipse.
  • the material of the optical filter 90 is preferably a quartz substrate, but may be soda glass.
  • the cell 91 of the optical filter 90 has substantially the same size as the lens element 65a of the fly-eye lens 65.
  • the plurality of cells 91 of the optical filter 90 arranged in a matrix are larger by two rows and two columns than the plurality of lens elements 65a of the fly-eye lens 65 arranged in a matrix. That is, when the lens elements 65a of the fly-eye lens 65 are arranged in a matrix of p rows and q columns (p and q are integers), the cells 91 of the optical filter 90 have a matrix shape of p + 2 rows and q + 2 columns. Is arranged. Note that the lens element 65a of the fly-eye lens 65 and the cell 91 of the optical filter 90 are arranged so that the directions of the rows and columns thereof coincide with each other.
  • the optical filter 90 shown in FIG. 3B in which the cells 91 are arranged in a matrix of 5 columns and 5 rows has a fly-eye lens 65 in which the lens elements 65a are arranged in a matrix of 3 rows and 3 rows. It is possible. Thereby, even if the optical filter 90 is moved in the range of one cell in the direction orthogonal to the optical path EL, the entire surface of the lens element 65a of the fly-eye lens 65 faces the cell 91 of the optical filter 90.
  • the optical filter 90 may be changeable to an optical filter 90 having another light transmittance distribution by a switching mechanism (not shown). If necessary, the optical filter 90 can be cooled by blowing cooling air from a nozzle (not shown). When cooling the peripheral part of the optical filter 90, cooling water may be circulated through the frame 92 provided around the optical filter 90 for cooling.
  • the high-pressure mercury lamp 61 may be a single lamp or may be configured by an LED. Further, the installation order of the optical filter 90 and the exposure control shutter unit 64 may be reversed. Further, a DUV cut filter, a polarization filter, and a band pass filter may be disposed between the fly-eye lens 65 and the exposure surface.
  • the plane mirror 68 is made of a glass material formed in a rectangular shape when viewed from the front.
  • the plane mirror 68 is supported on the mirror deformation unit holding frame 71 by a plurality of mirror deformation units (mirror bending mechanisms) 70 provided on the back side of the plane mirror 68.
  • Each mirror deformation unit 70 includes a pad 72 that is fixed to the back surface of the flat mirror 68 with an adhesive, a support member 73 that is fixed to the pad 72 at one end, and an actuator 74 that drives the support member 73.
  • the support member 73 is provided with a ball joint 76 as a bending mechanism that allows bending of ⁇ 0 ⁇ 5 deg or more at a position close to the pad 72 with respect to the holding frame 71, and is opposite to the holding frame 71.
  • An actuator 74 is attached to the other end.
  • a plurality of contact sensors 77 are attached to the back surface of each position of the flat mirror 68 that reflects exposure light at the position of an alignment mark (not shown) on the mask side.
  • the plane mirror 68 is sensing the displacement amount of the plane mirror 68 by the contact sensor 77 based on a command from the mirror control unit 80 connected to each actuator 74 by the signal line 81 (see FIG. 2).
  • the actuator 74 of each mirror deformation unit 70 By driving the actuator 74 of each mirror deformation unit 70 and changing the length of each support member 73, the shape of the plane mirror 68 is changed, and the curvature of the reflecting surface is locally changed, thereby the plane mirror 68 declination angles can be corrected.
  • each mirror deformation unit 70 is provided with a ball joint 76, so that the portion on the support side can be rotated three-dimensionally, and each pad 72 is placed on the surface of the plane mirror 68. Can be tilted along. For this reason, the adhesive peeling between each pad 72 and the plane mirror 68 is prevented, and the stress of the plane mirror 68 between the pads 72 having different movement amounts is suppressed, and the average fracture stress value is made of a small glass material. Even when the shape of the plane mirror 68 is locally changed, the plane mirror 68 can be bent on the order of 10 mm without damaging the plane mirror 68, and the curvature can be greatly changed.
  • the exposure control shutter unit 64 when the exposure control shutter unit 64 is controlled to be opened during exposure in the illumination apparatus 3, the light emitted from the high-pressure mercury lamp 61 is reflected by the plane mirror 63 and fly. The light enters the entrance surface of the eye lens 65. Then, the light emitted from the exit surface of the fly-eye lens 65 is converted into parallel light while its traveling direction is changed by the plane mirror 66, the collimation mirror 67, and the plane mirror 68. Then, this parallel light is irradiated as light for pattern exposure substantially perpendicularly to the surface of the mask W held on the mask stage 1 and further the work W held on the work stage 2, and the pattern of the mask M is irradiated. It is exposed and transferred onto the workpiece W.
  • a drive signal is transmitted from the mirror control unit 80 to each actuator 74 of the plane mirror 68 in order to correct the pattern of the mask M exposed and transferred onto the work W in accordance with the exposed pattern of the work W. Then, the actuator 74 of each mirror deformation unit 70 changes the length of each support member 73 and locally changes the shape of the plane mirror 68 to correct the declination angle of the plane mirror 68.
  • the illuminance of the exposure light applied to the mask M also locally changes due to the local shape change of the plane mirror 68. That is, the illuminance distribution on the exposure surface is deteriorated, which may affect the exposure accuracy of the workpiece W.
  • the plane mirror 68 is pushed from the back surface by the actuator 74 and the reflection surface of the plane mirror 68 becomes convex, so that the reflected light diffuses and the illuminance decreases (darkens).
  • the reflected light converges and the illuminance increases (becomes brighter).
  • the optical filter 90 having a plurality of cells 91 whose light transmittance in the central portion is lower than that in the peripheral portion is moved to a direction perpendicular to the optical path EL. 91.
  • the optical filter 90 is arranged on the optical path EL, and the center portion where the light transmittance of the cell 91 is low is formed in each lens element 65a corresponding to the portion where the illuminance is high on the exposure surface by changing the shape of the plane mirror 68.
  • the optical filter 90 is moved so as to face each other. Thereby, the dispersion
  • the lens elements 65a may be appropriately set from three or more arranged in the vertical direction and three or more in the horizontal direction, and the number of cells 91 of the optical filter 90 is also the number of lenses of the fly-eye lens 65. It is designed appropriately according to the number of elements 65a.
  • the irradiation area becomes substantially trapezoidal due to the shape change of the plane mirror 68, and the illuminance distribution of the exposure light on the exposure surface (on the workpiece W) is substantially uniform in the left-right direction of the exposure surface.
  • the lower part is lowered in the vertical direction.
  • the correction of the illuminance distribution is performed by moving the optical filter 90 relative to the fly-eye lens 65 downward in the figure by approximately 3/4 pitch of the cell 91, thereby reducing the light transmittance.
  • the center part of each cell 91 that is lowered is opposed to the upper part of each lens element 65 a of the fly-eye lens 65.
  • the illuminance distribution on the exposure surface becomes substantially uniform as a whole as the illuminance of the portion with high illuminance decreases, and the exposure accuracy improves. If necessary, the intensity of exposure light at a place where the illuminance is desired to be reduced can be adjusted by moving the optical filter 90 along the optical path EL.
  • FIG. 8A shows that the irradiation area is substantially shaped by changing the shape of the plane mirror 68, and the illuminance distribution of the exposure light on the exposure surface is lowered at the center of the exposure surface.
  • the illuminance distribution is corrected by moving the optical filter 90 relative to the fly-eye lens 65 by approximately 1/2 pitch in the vertical direction and approximately 1/2 pitch in the horizontal direction.
  • the central portion where the light transmittance of each cell 91 is low is opposed to the peripheral portion of each lens element 65 a of the fly-eye lens 65.
  • FIG. 8B the illuminance distribution on the exposure surface becomes substantially uniform as a whole as the illuminance at the peripheral portion where the illuminance is high decreases.
  • the irradiation area becomes substantially pincushioned by changing the shape of the plane mirror 68, and the illuminance distribution of the exposure light on the exposure surface is high at the center of the exposure surface.
  • Such correction of the illuminance distribution makes the positions of the lens elements 65a of the fly-eye lens 65 and the cells 91 of the optical filter 90 coincide as shown in FIG.
  • the illuminance distribution on the exposure surface becomes substantially uniform as a whole as the illuminance at the central portion where the illuminance is high decreases.
  • the optical filter 90 can be moved in the direction orthogonal to the optical path EL to change the illuminance on the exposure surface, thereby correcting variations in the illuminance distribution.
  • the optical filter 90 can suppress variations in the illuminance distribution on the exposure surface caused by the shape change of the reflection surface by the mirror deformation unit 70.
  • each cell 91 has the same light transmittance distribution, and the optical filter 90 is moved in a direction orthogonal to the optical path EL according to the shape of the reflection surface so that the illuminance distribution on the exposure surface is uniform. Therefore, the illuminance distribution can be corrected and the workpiece W can be uniformly exposed regardless of the bending direction (unevenness) of the reflecting surface and the magnitude of the curvature correction.
  • each cell 91 has a light transmittance distribution in which the light transmittance gradually increases from the central portion toward the peripheral portion. Therefore, the center of each cell 91 is located in a portion where the illuminance is increased by changing the shape of the reflecting surface.
  • the illuminance distribution on the exposure surface can be made uniform by matching the portions and reducing the illuminance of the portion with high illuminance.
  • the optical filter 90 is movable along the optical path EL, the intensity of illuminance on the exposure surface can be adjusted.
  • the exposure light from the lamp unit 60 is corrected by the optical filter 90 and irradiated onto the workpiece W through the mask M. Then, since the exposure pattern is exposed and transferred to the workpiece W, a highly accurate exposure result can be obtained.
  • each cell 91 of the optical filter 90 is designed to have the same size.
  • the upper and lower two rows of cells 91 arranged around the optical filter 90 are arranged inside the optical filter 90 in the column direction (up and down direction) size. What is necessary is just to design so that it may become more than half of the cells 91 (in FIG. 12, half).
  • the two columns of left and right cells 91 arranged around the optical filter 90 have a size in the row direction (left-right direction) of more than half of the cells 91 arranged inside the optical filter 90 (half in FIG. 12).
  • the optical filter 90 shown in FIG. 13 can be made smaller by one cell in the vertical direction and the horizontal direction than those shown in FIG. In this case, each cell 91 arranged around the optical filter 90 is given by cutting a cell having the same light transmittance distribution as the cell 91 arranged inside into a predetermined size.
  • the optical filter 90 is arranged in a matrix of p + 1 rows and q + 1 columns, and has a plurality of cells 91 each having the same light transmittance distribution. Also good.
  • the optical filter 90 is 1 in either the row direction (left-right direction) (to the right in FIG. 14) with respect to the p-row cells 91 corresponding to the p-row lens elements 65a of the fly-eye lens 65.
  • Row cells 91 are arranged, and either one of the column directions (up and down directions) with respect to q columns of cells 91 corresponding to q columns of lens elements 65a of fly-eye lens 65 (downward in FIG. 14).
  • one column of cells 91 may be arranged.
  • the illuminance on the exposure surface can be changed by moving the optical filter 90 in the direction orthogonal to the optical path EL with respect to the fly-eye lens 65, as in the optical filter 90 of the above embodiment.
  • the optical filter 90 is arranged in a matrix of p-2 rows and q-2 columns, and a plurality of cells each having the same light transmittance distribution. 91 may be included.
  • the lens elements 65a located in the upper and lower rows and the left and right columns correspond to the lens elements 65a.
  • the illuminance cannot be reduced.
  • the practical effect is small.
  • the illuminance on the exposure surface can be increased by moving the optical filter 90 in the direction orthogonal to the optical path EL with respect to the fly-eye lens 65, as in the optical filter 90 of the above embodiment. Can be changed.
  • the optical filter 90 is arranged in a matrix of p-1 rows and q-1 columns, and has a plurality of cells 91 each having the same light transmittance distribution. It may be. Also in this case, in the cell 91 of the optical filter 90, among the p-row and q-column lens elements 65a of the fly-eye lens 65, the lens elements 65a located in the upper and lower rows and the left and right columns correspond to the lens elements 65a. There is no cell 91 to perform, and the illuminance cannot be reduced. However, since the illuminance of the irradiation light emitted from the outer lens element 65a is darker than that of the central lens element 65a, the practical effect is small.
  • the illuminance on the exposure surface can be increased by moving the optical filter 90 in the direction orthogonal to the optical path EL with respect to the fly-eye lens 65, as in the optical filter 90 of the above embodiment.
  • the cells 91 of the optical filter 90 may be arranged in a matrix of p rows and q columns, which is the same as the lens elements 65 a of the fly-eye lens 65.
  • the optical filter 90 is positioned at each cell 91A located at the center (3 rows ⁇ 3 columns in the figure) and at the outer periphery (upper and lower rows, 2 left and right columns in the figure).
  • Cell 91B Each cell 91A, 91B has a light transmittance distribution in which the light transmittance gradually increases from the central portion toward the peripheral portion, and the central portion of the cell 91B in the outer peripheral portion rather than the central portion of each central cell 91A. Is set so that the light transmittance is higher.
  • the optical filter 90 is provided. The influence of the illuminance due to the irradiation light irradiated from each lens element 65a can be averaged.
  • the number of optical filters 90 is designed as one, but two or more optical filters 90 may be arranged side by side along the optical axis of light.
  • the two optical filters 90 of the above embodiment are arranged by shifting the position of the central portion where the light transmittance is low, thereby adjusting the illuminance distribution at a plurality of locations on the exposure surface for exposure.
  • the illuminance distribution on the surface can be made uniform.
  • the adjustment of the illuminance distribution at a plurality of locations on the exposure surface can also be achieved by moving the optical filter 90 while the exposure control shutter unit 64 is open.
  • the light transmittance distribution of the optical filter of the above embodiment has been described on the assumption that the light transmittance in the central portion is lower than the light transmittance in the peripheral portion. It may be an optical filter having a light transmittance distribution higher than the light transmittance. Also in this case, the illuminance distribution on the exposure surface can be made uniform by disposing the portion with low light transmittance of the optical filter facing the portion with high illuminance on the exposure surface.
  • the optical filter is positioned on the lamp unit side of the fly-eye lens, it can be disposed between two fly-eye lenses.
  • the cell pitch of the optical filter has been described as being constant, the light from the lamp unit is not parallel light, and is incident on the fly-eye lens through the optical filter while being slightly condensed or diffused. In this case, the pitch of each cell of the optical filter may be shifted according to the angle between the parallel light and the optical path.
  • the present invention is based on a Japanese patent application (Japanese Patent Application No. 2015-106049) filed on May 26, 2015, the contents of which are incorporated herein by reference.
  • Mask stage (mask support part) 2 Work stage (work support part) 3 Illumination device (exposure illumination device) 60 Lamp unit (light source) 65 Fly-eye lens 65a Lens element 68 Flat mirror (reflecting mirror) 70 Mirror deformation unit (mirror bending mechanism) 90 Optical filter 91 Cell EL Optical path (optical axis) M Mask PE Proximity exposure device W Workpiece

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Microscoopes, Condenser (AREA)
PCT/JP2016/065545 2015-05-26 2016-05-26 露光用照明装置、露光装置及び露光方法 WO2016190381A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN201680030852.2A CN107615170B (zh) 2015-05-26 2016-05-26 曝光用照明装置、曝光装置和曝光方法
JP2017520796A JP6663914B2 (ja) 2015-05-26 2016-05-26 露光用照明装置、露光装置及び露光方法
KR1020177033992A KR20180012270A (ko) 2015-05-26 2016-05-26 노광용 조명 장치, 노광 장치 및 노광 방법

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Application Number Priority Date Filing Date Title
JP2015-106049 2015-05-26
JP2015106049 2015-05-26

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JP2017151259A (ja) * 2016-02-24 2017-08-31 株式会社ブイ・テクノロジー 露光用照明装置、露光装置及び露光方法
CN108535918A (zh) * 2017-03-06 2018-09-14 优志旺电机株式会社 光照射装置
WO2019059315A1 (ja) * 2017-09-22 2019-03-28 株式会社ブイ・テクノロジー 露光用照明装置、露光装置及び露光方法
WO2019111736A1 (ja) * 2017-12-08 2019-06-13 東京エレクトロン株式会社 光学装置、測定装置、接合システムおよび測定方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
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CN110262194A (zh) * 2019-05-31 2019-09-20 深圳市华星光电技术有限公司 曝光设备的光学系统

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JPH10319321A (ja) * 1997-03-14 1998-12-04 Nikon Corp 照明装置及び該照明装置を用いた投影露光装置並びに該投影露光装置を用いたデバイスの製造方法及び該投影露光装置の製造方法
JP2001135564A (ja) * 1999-11-05 2001-05-18 Canon Inc 投影露光装置
JP2006210553A (ja) * 2005-01-27 2006-08-10 Seiko Epson Corp 露光装置、照度分布補正フィルター、及び半導体装置の製造方法
JP2012155086A (ja) * 2011-01-25 2012-08-16 Nsk Technology Co Ltd 露光装置及び露光方法

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JPH10319321A (ja) * 1997-03-14 1998-12-04 Nikon Corp 照明装置及び該照明装置を用いた投影露光装置並びに該投影露光装置を用いたデバイスの製造方法及び該投影露光装置の製造方法
JP2001135564A (ja) * 1999-11-05 2001-05-18 Canon Inc 投影露光装置
JP2006210553A (ja) * 2005-01-27 2006-08-10 Seiko Epson Corp 露光装置、照度分布補正フィルター、及び半導体装置の製造方法
JP2012155086A (ja) * 2011-01-25 2012-08-16 Nsk Technology Co Ltd 露光装置及び露光方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017151259A (ja) * 2016-02-24 2017-08-31 株式会社ブイ・テクノロジー 露光用照明装置、露光装置及び露光方法
CN108535918A (zh) * 2017-03-06 2018-09-14 优志旺电机株式会社 光照射装置
WO2019059315A1 (ja) * 2017-09-22 2019-03-28 株式会社ブイ・テクノロジー 露光用照明装置、露光装置及び露光方法
WO2019111736A1 (ja) * 2017-12-08 2019-06-13 東京エレクトロン株式会社 光学装置、測定装置、接合システムおよび測定方法
JPWO2019111736A1 (ja) * 2017-12-08 2021-01-14 東京エレクトロン株式会社 光学装置、測定装置、接合システムおよび測定方法

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CN107615170A (zh) 2018-01-19
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CN107615170B (zh) 2020-06-23
JPWO2016190381A1 (ja) 2018-03-15

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