JP6663914B2 - 露光用照明装置、露光装置及び露光方法 - Google Patents
露光用照明装置、露光装置及び露光方法 Download PDFInfo
- Publication number
- JP6663914B2 JP6663914B2 JP2017520796A JP2017520796A JP6663914B2 JP 6663914 B2 JP6663914 B2 JP 6663914B2 JP 2017520796 A JP2017520796 A JP 2017520796A JP 2017520796 A JP2017520796 A JP 2017520796A JP 6663914 B2 JP6663914 B2 JP 6663914B2
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- JP
- Japan
- Prior art keywords
- exposure
- optical filter
- light
- mask
- work
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 238000005286 illumination Methods 0.000 title claims description 21
- 238000000034 method Methods 0.000 title claims description 10
- 230000003287 optical effect Effects 0.000 claims description 162
- 238000002834 transmittance Methods 0.000 claims description 46
- 239000011159 matrix material Substances 0.000 claims description 26
- 230000007246 mechanism Effects 0.000 claims description 21
- 238000005452 bending Methods 0.000 claims description 17
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- 238000009434 installation Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
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- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
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Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Microscoopes, Condenser (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015106049 | 2015-05-26 | ||
| JP2015106049 | 2015-05-26 | ||
| PCT/JP2016/065545 WO2016190381A1 (ja) | 2015-05-26 | 2016-05-26 | 露光用照明装置、露光装置及び露光方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2016190381A1 JPWO2016190381A1 (ja) | 2018-03-15 |
| JP6663914B2 true JP6663914B2 (ja) | 2020-03-13 |
Family
ID=57393412
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017520796A Expired - Fee Related JP6663914B2 (ja) | 2015-05-26 | 2016-05-26 | 露光用照明装置、露光装置及び露光方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6663914B2 (zh) |
| KR (1) | KR20180012270A (zh) |
| CN (1) | CN107615170B (zh) |
| WO (1) | WO2016190381A1 (zh) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6587557B2 (ja) * | 2016-02-24 | 2019-10-09 | 株式会社ブイ・テクノロジー | 露光用照明装置、露光装置及び露光方法 |
| JP6870391B2 (ja) * | 2017-03-06 | 2021-05-12 | ウシオ電機株式会社 | 光照射装置 |
| KR20200060345A (ko) * | 2017-09-22 | 2020-05-29 | 가부시키가이샤 브이 테크놀로지 | 노광용 조명 장치, 노광 장치 및 노광 방법 |
| WO2019111736A1 (ja) * | 2017-12-08 | 2019-06-13 | 東京エレクトロン株式会社 | 光学装置、測定装置、接合システムおよび測定方法 |
| CN110262194A (zh) * | 2019-05-31 | 2019-09-20 | 深圳市华星光电技术有限公司 | 曝光设备的光学系统 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4310816B2 (ja) * | 1997-03-14 | 2009-08-12 | 株式会社ニコン | 照明装置、投影露光装置、デバイスの製造方法、及び投影露光装置の調整方法 |
| JP4545854B2 (ja) * | 1999-11-05 | 2010-09-15 | キヤノン株式会社 | 投影露光装置 |
| JP2006210553A (ja) * | 2005-01-27 | 2006-08-10 | Seiko Epson Corp | 露光装置、照度分布補正フィルター、及び半導体装置の製造方法 |
| JP5645126B2 (ja) * | 2011-01-25 | 2014-12-24 | Ｎｓｋテクノロジー株式会社 | 露光装置及び露光方法 |
-
2016
- 2016-05-26 WO PCT/JP2016/065545 patent/WO2016190381A1/ja active Application Filing
- 2016-05-26 CN CN201680030852.2A patent/CN107615170B/zh not_active Expired - Fee Related
- 2016-05-26 KR KR1020177033992A patent/KR20180012270A/ko unknown
- 2016-05-26 JP JP2017520796A patent/JP6663914B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN107615170A (zh) | 2018-01-19 |
| KR20180012270A (ko) | 2018-02-05 |
| CN107615170B (zh) | 2020-06-23 |
| WO2016190381A1 (ja) | 2016-12-01 |
| JPWO2016190381A1 (ja) | 2018-03-15 |
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