WO2016074252A1 - 液晶显示面板及其用于电连接的过孔 - Google Patents

液晶显示面板及其用于电连接的过孔 Download PDF

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Publication number
WO2016074252A1
WO2016074252A1 PCT/CN2014/091256 CN2014091256W WO2016074252A1 WO 2016074252 A1 WO2016074252 A1 WO 2016074252A1 CN 2014091256 W CN2014091256 W CN 2014091256W WO 2016074252 A1 WO2016074252 A1 WO 2016074252A1
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WIPO (PCT)
Prior art keywords
metal layer
insulating substrate
via hole
concave
line
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PCT/CN2014/091256
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English (en)
French (fr)
Inventor
叶岩溪
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深圳市华星光电技术有限公司
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Priority to US14/407,449 priority Critical patent/US20160274430A1/en
Publication of WO2016074252A1 publication Critical patent/WO2016074252A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136227—Through-hole connection of the pixel electrode to the active element through an insulation layer
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133345—Insulating layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
    • G02F1/136295—Materials; Compositions; Manufacture processes

Definitions

  • the present invention relates to the field of liquid crystal display technology, and in particular to the field of via via design, and more particularly to a liquid crystal display panel and a via for electrical connection.
  • the via hole can electrically connect the upper and lower layers of metal, thereby realizing the transmission of each signal in the liquid crystal display panel.
  • the industry generally forms an upper layer metal on an insulating layer having via holes by sputtering.
  • the upper layer metal material gradually diffuses from the edge of the via hole to the inner wall thereof, and adheres to the inner wall to form a connecting metal in contact with the underlying metal.
  • the existing via holes are small in size and are of a smooth design, that is, the inner walls of the via holes are planar structures, so that the area of the connecting metal layer formed is small, that is, the area of electrical connection between the upper and lower layers of metal is small. Therefore, the resistance of the electrical connection is too large, which not only increases power consumption, but also easily causes a problem of signal delay.
  • the technical problem to be solved by the embodiments of the present invention is to provide a liquid crystal display panel and a via hole thereof for electrical connection, which can increase the area of electrical connection between the upper and lower layers of metal, reduce resistance, and reduce electricity.
  • the power consumption of the signal transmission avoids signal delay.
  • a technical solution adopted by the present invention is to provide a via for electrical connection, the via is formed on an insulating substrate, and the upper and lower surfaces of the insulating substrate are respectively provided with a first metal layer and a second metal.
  • the inner wall of the via hole is provided with a concave-convex structure, and the metal material is adhered to the uneven structure of the via hole when the first metal layer is sputtered to realize electrical connection between the first metal layer and the second metal layer;
  • the direction of the line of sight perpendicular to the upper or lower surface of the insulating substrate, the edge of the via on the upper surface and/or the lower surface is a concave-convex curve, and the concave-convex structure is a centrally symmetrical pattern.
  • the concave-convex curve and the concave-convex structure have the same contour in the shape of the line of sight.
  • the shape of the concave-convex structure includes a sharp-angled zigzag shape and a rounded petal shape along a line of sight direction perpendicular to the upper surface or the lower surface of the insulating substrate.
  • another technical solution adopted by the present invention is to provide a via for electrical connection, the via is formed on the insulating substrate, and the upper and lower surfaces of the insulating substrate are respectively provided with a first metal layer and a second The metal layer, wherein the inner wall of the via hole is provided with a concave-convex structure, and the metal material is adhered to the uneven structure of the via hole when the first metal layer is sputtered to realize electrical connection between the first metal layer and the second metal layer.
  • the via is a concave-convex curve at the edge of the upper surface and/or the lower surface.
  • the concave-convex curve and the concave-convex structure have the same contour in the shape of the line of sight.
  • the vias are straight or smooth at the edges of the upper surface and/or the lower surface along a line of sight perpendicular to the upper or lower surface of the insulating substrate.
  • the concave-convex structure is a central symmetrical figure.
  • the shape of the concave-convex structure includes a sharp-angled zigzag shape and a rounded petal shape along a line of sight direction perpendicular to the upper surface or the lower surface of the insulating substrate.
  • another technical solution adopted by the present invention is to provide a liquid crystal display panel having at least one via hole formed on an insulating substrate, and the upper and lower surfaces of the insulating substrate are respectively provided with a first metal layer and a second metal And a layer, wherein the inner wall of the via hole is provided with a concave-convex structure, and the metal material is adhered to the uneven structure of the via hole when the first metal layer is sputtered to realize electrical connection between the first metal layer and the second metal layer.
  • the insulating substrate is an integrally formed structure.
  • the insulating substrate includes a first insulating layer, a second insulating layer, and a third metal layer interposed therebetween.
  • first metal layer and the second metal layer are electrically connected, the third metal layer and the first metal layer Insulated with the second metal layer.
  • the insulating substrate is disposed on the array substrate of the liquid crystal display panel.
  • the via is a concave-convex curve at the edge of the upper surface and/or the lower surface.
  • the concave-convex curve and the concave-convex structure have the same contour in the shape of the line of sight.
  • the vias are straight or smooth at the edges of the upper surface and/or the lower surface along a line of sight perpendicular to the upper or lower surface of the insulating substrate.
  • the concave-convex structure is a central symmetrical figure.
  • the shape of the concave-convex structure includes a sharp-angled zigzag shape and a rounded petal shape along a line of sight direction perpendicular to the upper surface or the lower surface of the insulating substrate.
  • the beneficial effects of the embodiments of the present invention are as follows:
  • the embodiment of the present invention has a concave-convex structure by designing an inner wall of a via hole formed on an insulating substrate, and the sputtering is formed on the concave-convex structure compared with the prior art.
  • the upper second metal layer has a larger area, thereby increasing the area of electrical connection between the first metal layer and the second metal layer, reducing resistance, reducing power consumption of electrical signal transmission, and avoiding signal delay.
  • Figure 1 is a plan view showing the structure of a via hole according to a first embodiment of the present invention
  • Figure 2 is a schematic view showing the cooperation of the preferred embodiment of the insulating substrate of Figure 1 and the first metal layer and the second metal layer;
  • Figure 3 is a plan view showing the structure of a via hole according to a second embodiment of the present invention.
  • Figure 4 is a plan view showing the structure of a via hole according to a third embodiment of the present invention.
  • Figure 5 is a plan view showing the structure of a via hole according to a fourth embodiment of the present invention.
  • Fig. 6 is a cross-sectional view showing the structure of a liquid crystal display panel having the insulating substrate shown in Fig. 1.
  • FIG. 1 is a plan view showing the structure of a via hole according to a first embodiment of the present invention.
  • the via 10 of the present embodiment is formed on an insulating substrate 20 .
  • the upper and lower surfaces of the insulating substrate 20 are respectively provided with a first metal layer 30 and a second metal layer 40 as shown in FIG. 2 along the first metal.
  • the layer 30 faces the line of sight of the second metal layer 40, the diameter of the via 10 gradually decreases, and the inner wall of the via 10 is provided with the uneven structure 11.
  • the metal material (of the first metal layer 30) is attached to the uneven structure 11 of the inner wall of the via hole 10 and forms a metal layer which is the first metal layer.
  • the concave-convex structure 11 of the inner wall of the via hole 10 is substantially a pleated structure, and the pleat structure is disposed along the direction of gravity (ie, the line of sight direction), so that the metal layer sputtered on the concave-convex structure 11 also has gravity.
  • the direction of the wrinkle structure is set.
  • the design of the convex-concave structure 11 of the present embodiment increases the area of the inner wall of the via hole 10, so that the metal layer formed on the uneven structure 11 is sputtered (
  • the first metal layer 30) has a larger area, so that the area of electrical connection between the first metal layer 30 and the second metal layer 40 can be increased, the resistance is reduced, the power consumption of electrical signal transmission is reduced, and signal delay is avoided.
  • the concave-convex structure of the via hole 10 is a central symmetrical pattern, and the via hole 10
  • the edge of the upper surface of the insulating base 20 is a concave-convex curve, and the concave-convex curve is the same as the contour of the shape of the uneven structure 11.
  • the via 10 may have a concave-convex curve at the edge of the lower surface of the insulating substrate 20, and the concave-convex curve has the same contour as that of the concave-convex structure 11.
  • the via 10 may be provided with a straight line or a smooth curve at the edge of the upper surface of the insulating substrate 20.
  • the contour of the concave-convex curve and the concave-convex structure 11 is not The overlap, that is, the via hole 10 further includes a rectangular or circular region disposed between the uppermost end of the uneven structure 11 and the upper surface of the insulating base 20.
  • the concave-convex structure 11 of the inner wall of the via 10 may be provided in other shapes, such as a square rounded petal shape as shown in FIG. 3, or a circular rounded petal shape as shown in FIG.
  • the circular toroidal shape shown in FIG. 5 is not limited to the square sharp-angled jagged shape shown in FIG.
  • the square rounded petal shape indicates that the via hole 10 includes a rectangular area indicated by a broken line in FIG. 3 and a plurality of semicircular areas or semi-elliptical areas outside the rectangular area
  • the annular rounded petal shape indicates that the via hole 10 includes FIG. 4 .
  • the annular sharp-angled serrations indicating that the via 10 includes a circular area indicated by a broken line in FIG. 5 and the circular area
  • the outer plurality of sharp-edged zigzag regions, the square sharp-angled serrations, indicate that the via 10 includes a rectangular region shown by a broken line in FIG. 1 and a plurality of sharp-angled zigzag regions outside the rectangular region.
  • the first metal layer 30 and the second metal layer 40 can be respectively IPS (In-Plane) Switching, plane conversion technology)
  • IPS In-Plane
  • FFS Ringe Field
  • the edge field switching technology displays the data line and the source of the pixel electrode in the panel, and can also be used for any other display panel design structure that requires a via to achieve electrical connection.
  • the insulating substrate 20 may be an integrally formed structure, such as an insulating layer sandwiched between the data line and the source of the pixel electrode in the IPS display panel, or may be a multi-layer structure, for example, the insulating substrate 20 includes the first insulating layer. a layer, a second insulating layer, and a third metal layer interposed therebetween, wherein the third metal layer is a common electrode layer of the FFS display panel, when the first metal layer 30 and the second metal layer 40 are electrically connected, The third metal layer is insulated from the first metal layer 30 and the second metal layer 40.
  • the embodiment of the present invention further provides a liquid crystal display panel 60 as shown in FIG. 6 having the above-mentioned insulating substrate 20, and an insulating substrate 20 having a via hole 10 is preferably disposed on the array substrate 61 thereof, and thus has the foregoing embodiment.
  • the same technical effect of the via 10 is preferably disposed on the array substrate 61 thereof, and thus has the foregoing embodiment. The same technical effect of the via 10 .

Abstract

一种液晶显示面板及其用于电连接的过孔（10）。该过孔（10）开设于绝缘基体（20）上，绝缘基体（20）的上下表面分别设置有第一金属层（30）和第二金属层（40），且过孔（10）的内壁设置有凹凸结构（11），溅射形成第一金属层（30）时金属原料附着于凹凸结构（11）上，以实现第一金属层（30）和第二金属层（40）的电连接。通过上述方式，能够增大上下两层金属之间电连接的面积，减小电阻，降低电信号传递的功耗，避免信号延迟。

Description

液晶显示面板及其用于电连接的过孔
【技术领域】
本发明涉及液晶显示技术领域，具体涉及过孔via设计技术领域，特别是涉及一种液晶显示面板及其用于电连接的过孔。
【背景技术】
作为液晶显示面板中不可缺少的设计结构，过孔能够将上下两层金属电连接，以此实现液晶显示面板中各个信号的传递。当前，业界普遍通过溅射方式在具有过孔的绝缘层上形成上层金属，溅射时上层金属原料从过孔的边缘逐渐向其内壁扩散，并附着于内壁形成与下层金属相接触的连接金属层。然而，现有的过孔尺寸较小且均为平滑型设计，即过孔的内壁为平面型结构，使得形成的连接金属层面积较小，即上下两层金属之间电连接的面积较小，从而导致电连接的电阻过大，不仅增大功耗，而且容易产生信号延迟的问题。
【发明内容】
有鉴于此，本发明实施例所要解决的技术问题是提供一种液晶显示面板及其用于电连接的过孔，能够增大上下两层金属之间电连接的面积，减小电阻，降低电信号传递的功耗，避免信号延迟。
为解决上述技术问题，本发明采用的一个技术方案是：提供一种用于电连接的过孔，过孔开设于绝缘基体上，绝缘基体的上下表面分别设置有第一金属层和第二金属层，其中，过孔的内壁设置有凹凸结构，溅射形成第一金属层时金属原料附着于过孔的凹凸结构上，以实现第一金属层和第二金属层的电连接；其中，沿垂直于绝缘基体的上表面或下表面的视线方向，过孔在上表面和/或下表面的边缘为凹凸曲线，凹凸结构为中心对称图形。
其中，凹凸曲线与凹凸结构在沿视线方向所呈形状的轮廓线相同。
其中，沿垂直于绝缘基体的上表面或下表面的视线方向，凹凸结构所呈形状包括尖角锯齿状和圆角花瓣状。
为解决上述技术问题，本发明采用的另一个技术方案是：提供一种用于电连接的过孔，过孔开设于绝缘基体上，绝缘基体的上下表面分别设置有第一金属层和第二金属层，其中，过孔的内壁设置有凹凸结构，溅射形成第一金属层时金属原料附着于过孔的凹凸结构上，以实现第一金属层和第二金属层的电连接。
其中，沿垂直于绝缘基体的上表面或下表面的视线方向，过孔在上表面和/或下表面的边缘为凹凸曲线。
其中，凹凸曲线与凹凸结构在沿视线方向所呈形状的轮廓线相同。
其中，沿垂直于绝缘基体的上表面或下表面的视线方向，过孔在上表面和/或下表面的边缘为直线或平滑曲线。
其中，沿视线方向，凹凸结构为中心对称图形。
其中，沿垂直于绝缘基体的上表面或下表面的视线方向，凹凸结构所呈形状包括尖角锯齿状和圆角花瓣状。
为解决上述技术问题，本发明采用的又一个技术方案是：提供一种液晶显示面板，其绝缘基体上开设有至少一个过孔，绝缘基体的上下表面分别设置有第一金属层和第二金属层，其中，过孔的内壁设置有凹凸结构，溅射形成第一金属层时金属原料附着于过孔的凹凸结构上，以实现第一金属层和第二金属层的电连接。
其中，绝缘基体为一体成型结构。
其中，绝缘基体包括第一绝缘层、第二绝缘层和夹设于两者之间的第三金属层，第一金属层和第二金属层电连接时，第三金属层与第一金属层和第二金属层绝缘。
其中，绝缘基体设置于液晶显示面板的阵列基板上。
其中，沿垂直于绝缘基体的上表面或下表面的视线方向，过孔在上表面和/或下表面的边缘为凹凸曲线。
其中，凹凸曲线与凹凸结构在沿视线方向所呈形状的轮廓线相同。
其中，沿垂直于绝缘基体的上表面或下表面的视线方向，过孔在上表面和/或下表面的边缘为直线或平滑曲线。
其中，沿视线方向，凹凸结构为中心对称图形。
其中，沿垂直于绝缘基体的上表面或下表面的视线方向，凹凸结构所呈形状包括尖角锯齿状和圆角花瓣状。
通过上述技术方案，本发明实施例所产生的有益效果是：本发明实施例通过设计开设于绝缘基体上的过孔的内壁具有凹凸结构，相比较于现有技术，使得溅射形成在凹凸结构上的第二金属层具有更大的面积，从而能够增大第一金属层和第二金属层之间电连接的面积，减小电阻，降低电信号传递的功耗，避免信号延迟。
【附图说明】
图1是本发明第一实施例的过孔的结构俯视图；
图2是图1所示绝缘基体与第一金属层和第二金属层的优选实施例的配合示意图；
图3是本发明第二实施例的过孔的结构俯视图；
图4是本发明第三实施例的过孔的结构俯视图；
图5是本发明第四实施例的过孔的结构俯视图；
图6是具有图1所示绝缘基材的液晶显示面板的结构剖视图。
【具体实施方式】
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，本发明以下所描述的实施例仅仅是本发明的一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其它实施例，都属于本发明保护的范围。
图1是本发明第一实施例的过孔的结构俯视图。如图1所示，本实施例的过孔10开设于绝缘基体20上，绝缘基体20的上下表面分别设置有图2所示的第一金属层30和第二金属层40，沿第一金属层30朝向第二金属层40的视线方向，过孔10的直径逐渐减小，且过孔10的内壁设置有凹凸结构11。在溅射形成第一金属层30的制造过程中，（制造第一金属层30的）金属原料附着于过孔10的内壁的凹凸结构11上并形成金属层，该金属层为第一金属层30的一部分，从而通过该部分的金属层连接第一金属层30和第二金属层40，实现第一金属层30和第二金属层40之间的电连接。
本实施例中，过孔10内壁的凹凸结构11实质上为褶皱结构，且该褶皱结构沿重力方向（即视线方向）走向设置，因此溅射形成于凹凸结构11上的金属层也具有沿重力方向走向设置的褶皱结构。
相比较于现有技术中过孔（图1中虚线所示），本实施例凸凹结构11的设计增大了过孔10的内壁的面积，使得溅射形成于凹凸结构11上的金属层（第一金属层30）具有更大的面积，从而能够增大第一金属层30和第二金属层40之间电连接的面积，减小电阻，降低电信号传递的功耗，避免信号延迟。
请再次参阅图1所示，沿图2所示的垂直于绝缘基体20的上表面或下表面的视线方向（箭头所示方向），优选过孔10的凹凸结构为中心对称图形，过孔10在绝缘基体20的上表面的边缘为凹凸曲线，且凹凸曲线与凹凸结构11所呈形状的轮廓线相同。
同理，过孔10在绝缘基体20的下表面的边缘也可以为凹凸曲线，且凹凸曲线与凹凸结构11所呈形状的轮廓线相同。
在其他实施例中，沿图2所示的视线方向，可设置过孔10在绝缘基体20的上表面的边缘为直线或平滑曲线，此时凹凸曲线与凹凸结构11所呈形状的轮廓线不重叠，即过孔10还包括设置于凹凸结构11的最上端与绝缘基体20的上表面之间的呈矩形或圆形的区域。
沿图2所示的视线方向，其他实施例还可以设置过孔10内壁的凹凸结构11呈其他形状，例如图3所示的方形圆角花瓣状，或者图4所示的环形圆角花瓣状，又或者图5所示的环形尖角锯齿状，并不仅限于图1所示的方形尖角锯齿状。其中，方形圆角花瓣状表示过孔10包括图3中虚线所示矩形区域以及该矩形区域外部的多个半圆形区域或半椭圆形区域，环形圆角花瓣状表示过孔10包括图4中虚线所示圆形区域以及该圆形区域外部的多个半圆形区域或半椭圆形区域，环形尖角锯齿状表示过孔10包括图5中虚线所示圆形区域以及该圆形区域外部的多个尖角锯齿形区域，方形尖角锯齿状表示过孔10包括图1中虚线所示矩形区域以及该矩形区域外部的多个尖角锯齿形区域。
在本实施例中，第一金属层30和第二金属层40既可以分别为IPS（In-Plane Switching，平面转换技术）显示面板中数据线和像素电极的源极，也可以为FFS（Fringe Field Switching，边缘场开关技术）显示面板中数据线和像素电极的源极，还可以为其他任何需要过孔实现电连接的信号传递的显示面板设计结构。
另外，绝缘基体20既可以为一体成型结构，例如在IPS显示面板中夹设于数据线和像素电极的源极之间的绝缘层，也可以为多层结构，例如绝缘基体20包括第一绝缘层、第二绝缘层和夹设于两者之间的第三金属层，其中第三金属层为FFS显示面板的公共电极层，在第一金属层30和第二金属层40电连接时，第三金属层与第一金属层30和第二金属层40绝缘。
本发明实施例还提供一种具有上述绝缘基材20的如图6所示的液晶显示面板60，优选具有过孔10的绝缘基材20设置于其阵列基板61上，因此具有与前述实施例的过孔10相同的技术效果。
再次说明，以上所述仅为本发明的实施例，并非因此限制本发明的专利范围，凡是利用本发明说明书及附图内容所作的等效结构或等效流程变换，例如各实施例之间技术特征的相互结合，或直接或间接运用在其他相关的技术领域，均同理包括在本发明的专利保护范围内。

Claims (18)

  1. 一种用于电连接的过孔，其中，所述过孔开设于绝缘基体上，所述绝缘基体的上下表面分别设置有第一金属层和第二金属层，其中，所述过孔的内壁设置有凹凸结构，溅射形成所述第一金属层时金属原料附着于所述过孔的凹凸结构上，以实现所述第一金属层和所述第二金属层的电连接；其中，沿垂直于所述绝缘基体的上表面或下表面的视线方向，所述过孔在所述上表面和/或所述下表面的边缘为凹凸曲线，所述凹凸结构为中心对称图形。
  2. 根据权利要求1所述的过孔，其中，所述凹凸曲线与所述凹凸结构在沿所述视线方向所呈形状的轮廓线相同。
  3. 根据权利要求1所述的过孔，其中，沿垂直于所述绝缘基体的上表面或下表面的视线方向，所述凹凸结构所呈形状包括尖角锯齿状和圆角花瓣状。
  4. 一种用于电连接的过孔，其中，所述过孔开设于绝缘基体上，所述绝缘基体的上下表面分别设置有第一金属层和第二金属层，其中，所述过孔的内壁设置有凹凸结构，溅射形成所述第一金属层时金属原料附着于所述过孔的凹凸结构上，以实现所述第一金属层和所述第二金属层的电连接。
  5. 根据权利要求4所述的过孔，其中，沿垂直于所述绝缘基体的所述上表面或所述下表面的视线方向，所述过孔在所述上表面和/或所述下表面的边缘为凹凸曲线。
  6. 根据权利要求5所述的过孔，其中，所述凹凸曲线与所述凹凸结构在沿所述视线方向所呈形状的轮廓线相同。
  7. 根据权利要求4所述的过孔，其中，沿垂直于所述绝缘基体的所述上表面或所述下表面的视线方向，所述过孔在所述上表面和/或所述下表面的边缘为直线或平滑曲线。
  8. 根据权利要求4所述的过孔，其中，沿垂直于所述绝缘基体的所述上表面或所述下表面的视线方向，所述凹凸结构为中心对称图形。
  9. 根据权利要求8所述的过孔，其中，沿垂直于所述绝缘基体的上表面或下表面的视线方向，所述凹凸结构所呈形状包括尖角锯齿状和圆角花瓣状。
  10. 一种液晶显示面板，其中，所述液晶显示面板的绝缘基体上开设有至少一个过孔，所述绝缘基体的上下表面分别设置有第一金属层和第二金属层，其中，所述过孔的内壁设置有凹凸结构，溅射形成所述第一金属层时金属原料附着于所述过孔的凹凸结构上，以实现所述第一金属层和所述第二金属层的电连接。
  11. 根据权利要求10所述的液晶显示面板，其中，所述绝缘基体为一体成型结构。
  12. 根据权利要求10所述的液晶显示面板，其中，所述绝缘基体包括第一绝缘层、第二绝缘层和夹设于两者之间的第三金属层，所述第一金属层和所述第二金属层电连接时，所述第三金属层与所述第一金属层和所述第二金属层绝缘。
  13. 根据权利要求10所述的液晶显示面板，其中，所述绝缘基体设置于所述液晶显示面板的阵列基板上。
  14. 根据权利要求10所述的液晶显示面板，其中，沿垂直于所述绝缘基体的所述上表面或所述下表面的视线方向，所述过孔在所述上表面和/或所述下表面的边缘为凹凸曲线。
  15. 根据权利要求13所述的液晶显示面板，其中，所述凹凸曲线与所述凹凸结构在沿所述视线方向所呈形状的轮廓线相同。
  16. 根据权利要求10所述的液晶显示面板，其中，沿垂直于所述绝缘基体的所述上表面或所述下表面的视线方向，所述过孔在所述上表面和/或所述下表面的边缘为直线或平滑曲线。
  17. 根据权利要求10所述的液晶显示面板，其中，沿垂直于所述绝缘基体的所述上表面或所述下表面的视线方向，所述凹凸结构为中心对称图形。
  18. 根据权利要求17所述的液晶显示面板，其中，沿垂直于所述绝缘基体的上表面或下表面的视线方向，所述凹凸结构所呈形状包括尖角锯齿状和圆角花瓣状。
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CN107479292B (zh) * 2017-09-28 2020-08-04 武汉华星光电技术有限公司 阵列基板、阵列基板的制作方法及液晶显示面板
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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050012873A1 (en) * 2003-07-15 2005-01-20 Myung-Jae Park Array substrate, method of manufacturing the same and display apparatus having the same
CN101369078A (zh) * 2007-08-17 2009-02-18 北京京东方光电科技有限公司 Tft-lcd阵列基板结构及其制造方法
CN101483162A (zh) * 2008-01-09 2009-07-15 索尼株式会社 半导体装置及其制造方法
CN103762278A (zh) * 2014-01-29 2014-04-30 英利集团有限公司 一种mwt太阳能电池及其制作方法
CN103781289A (zh) * 2012-10-25 2014-05-07 株式会社电装 电子装置及其制造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001021910A (ja) * 1999-07-06 2001-01-26 Matsushita Electric Ind Co Ltd 導電性ビアホール及びその製造方法
US7714820B2 (en) * 2003-06-27 2010-05-11 Samsung Electronics Co., Ltd. Contact structure of conductive films and thin film transistor array panel including the same
CN101459181A (zh) * 2007-12-14 2009-06-17 群康科技(深圳)有限公司 薄膜晶体管基板与液晶显示装置
JP5336102B2 (ja) * 2008-04-03 2013-11-06 三菱電機株式会社 Ｔｆｔ基板
US9439289B2 (en) * 2012-01-12 2016-09-06 Ibiden Co., Ltd. Wiring board and method for manufacturing the same
CN202917490U (zh) * 2012-11-29 2013-05-01 京东方科技集团股份有限公司 阵列基板和显示装置
WO2014103922A1 (ja) * 2012-12-27 2014-07-03 シャープ株式会社 表示素子、表示装置、及び表示素子の製造方法
JP2014215444A (ja) * 2013-04-25 2014-11-17 株式会社ジャパンディスプレイ 液晶表示装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050012873A1 (en) * 2003-07-15 2005-01-20 Myung-Jae Park Array substrate, method of manufacturing the same and display apparatus having the same
CN101369078A (zh) * 2007-08-17 2009-02-18 北京京东方光电科技有限公司 Tft-lcd阵列基板结构及其制造方法
CN101483162A (zh) * 2008-01-09 2009-07-15 索尼株式会社 半导体装置及其制造方法
CN103781289A (zh) * 2012-10-25 2014-05-07 株式会社电装 电子装置及其制造方法
CN103762278A (zh) * 2014-01-29 2014-04-30 英利集团有限公司 一种mwt太阳能电池及其制作方法

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