WO2016070444A1 - 摩擦配向装置及液晶配向设备 - Google Patents

摩擦配向装置及液晶配向设备 Download PDF

Info

Publication number
WO2016070444A1
WO2016070444A1 PCT/CN2014/090860 CN2014090860W WO2016070444A1 WO 2016070444 A1 WO2016070444 A1 WO 2016070444A1 CN 2014090860 W CN2014090860 W CN 2014090860W WO 2016070444 A1 WO2016070444 A1 WO 2016070444A1
Authority
WO
WIPO (PCT)
Prior art keywords
comb
ito layer
friction
disposed
sealed space
Prior art date
Application number
PCT/CN2014/090860
Other languages
English (en)
French (fr)
Inventor
侯迎明
Original Assignee
深圳市华星光电技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 深圳市华星光电技术有限公司 filed Critical 深圳市华星光电技术有限公司
Publication of WO2016070444A1 publication Critical patent/WO2016070444A1/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133784—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by rubbing
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers

Definitions

  • the present invention relates to the field of display technologies, and in particular, to a friction alignment device and a liquid crystal alignment device.
  • TFT-LCD Thin Film Transistor Liquid Crystal Display
  • IPS In-Plane
  • FFS Flexible Field Switching
  • AD-SDS Advanced-Super Dimensional Switching, advanced super-dimensional field switch, referred to as ADS
  • a uniformly oriented alignment layer for example, an alignment layer formed of a polyimide layer
  • the alignment layer can usually be fabricated by rubbing.
  • the current orientation rubbing process mainly adopts a mechanical orientation rubbing method, specifically: rolling on an array substrate or a color film substrate on which a PI (Polyimide) film is formed by a rubbing roller attached with a rubbing cloth. Friction, a plurality of uniformly oriented grooves are formed to create an alignment layer.
  • the rubbing cloth used is usually cotton cloth, because the friction generated by the cotton cloth during the rubbing process is small, and the friction can be avoided. Residues cause black mura (spots) and other defects; but because the cotton fibers are too soft and uneven, the uniformity of the grooves formed is low, which causes bad rubbing; therefore, as the quality requirements of the products increase.
  • the rubbing cloth used is usually nylon cloth, and some triviality will inevitably occur during the rubbing orientation process, and the residual trivial will easily cause black mura and other defects, affecting the display of the product. effect.
  • the usual solutions mainly include: changing the friction cloth and improving the cleaning friction and trifle process, but all have little effect.
  • a friction aligning device includes a friction roller, and a friction cloth is disposed on an outer surface of the friction roller, wherein the friction aligning device further comprises:
  • the two ends of the loading device are respectively connected with the two ends of the friction roller;
  • a comb-shaped ITO layer the comb-shaped ITO layer is disposed in a space enclosed by the loading tool and the friction roller for combing the rubbing cloth; the comb-like ITO layer and the loading device Enclosing a sealed space, the comb-shaped ITO layer is grounded by a wire, and the electrostatic ions generated in the rubbing process are led out through the wire; a dust-discharging port is arranged on the loading device surrounding the sealed space;
  • the comb teeth of the comb-like ITO layer are disposed facing away from the friction roller, and the spacing between the comb teeth on the comb-like ITO layer ranges from 1 micrometer to 20 micrometers;
  • the dust collector being disposed at the dust exhaust port on the loading device for discharging debris in the sealed space to the outside.
  • the loading tool is integrally formed with the comb-shaped ITO layer.
  • the comb-shaped ITO layer has an extended end at both ends, and the two sides of the loader are respectively provided with grooves;
  • the extensions at the two ends of the comb-shaped ITO layer are respectively detachably connected to the grooves on both sides of the loader.
  • the dust exhaust port is disposed at any position on the loader that encloses the sealed space.
  • the dust exhaust port is disposed at a side of the loader that encloses a sealed space.
  • a friction aligning device includes a friction roller, and a friction cloth is disposed on an outer surface of the friction roller, and the friction aligning device further includes:
  • the two ends of the loading device are respectively connected with the two ends of the friction roller;
  • a comb-shaped ITO layer the comb-shaped ITO layer is disposed in a space enclosed by the loading tool and the friction roller for combing the rubbing cloth; the comb-like ITO layer and the loading device Enclosing a sealed space, the comb-shaped ITO layer is grounded by a wire, and the electrostatic ions generated in the rubbing process are led out through the wire; a dust exhaust port is disposed on the loading device surrounding the sealed space;
  • the dust collector being disposed at the dust exhaust port on the loading device for discharging debris in the sealed space to the outside.
  • the loading tool is integrally formed with the comb-shaped ITO layer.
  • the comb-shaped ITO layer has an extended end at both ends, and the two sides of the loader are respectively provided with grooves;
  • the extensions at the two ends of the comb-shaped ITO layer are respectively detachably connected to the grooves on both sides of the loader.
  • the spacing between the comb teeth on the comb-like ITO layer ranges from 1 micrometer to 20 micrometers.
  • the comb teeth of the comb-like ITO layer are disposed facing away from the friction roller.
  • the dust exhaust port is disposed at any position on the loader that encloses the sealed space.
  • the dust exhaust port is disposed at a side of the loader that encloses a sealed space.
  • a liquid crystal alignment device includes a friction base that carries a substrate to be rubbed, a driving mechanism, and a friction alignment device, wherein the friction alignment device is electrically connected to the driving mechanism; and the friction alignment device includes:
  • a friction roller and a friction cloth is disposed on an outer surface of the friction roller;
  • the two ends of the loading device are respectively connected with the two ends of the friction roller;
  • a comb-shaped ITO layer the comb-shaped ITO layer is disposed in a space enclosed by the loading tool and the friction roller for combing the rubbing cloth; the comb-like ITO layer and the loading device Enclosing a sealed space, the comb-shaped ITO layer is grounded by a wire, and the electrostatic ions generated in the rubbing process are led out through the wire; a dust exhaust port is disposed on the loading device surrounding the sealed space;
  • the dust collector being disposed at the dust exhaust port on the loading device for discharging debris in the sealed space to the outside.
  • the loading tool is integrally formed with the comb-shaped ITO layer.
  • the comb-shaped ITO layer has an extended end at both ends, and the two sides of the loader are respectively provided with grooves;
  • the extensions at the two ends of the comb-shaped ITO layer are respectively detachably connected to the grooves on both sides of the loader.
  • the spacing between the comb teeth on the comb-like ITO layer ranges from 1 micrometer to 20 micrometers.
  • the comb teeth of the comb-like ITO layer are disposed facing away from the friction roller.
  • the dust exhaust port is disposed at any position on the loader that encloses the sealed space.
  • the dust exhaust port is disposed at a side of the loader that encloses a sealed space.
  • the present invention adds a comb-like ITO layer to a friction roller which is provided with a rubbing cloth. Since the comb teeth have a space therebetween, and the distance is more closely spaced, the comb-like ITO layer can rub against The cloth is carded to filter finer debris into the sealed space; the debris in the sealed space is then discharged to the outside through the dust collector; and the electrostatic ions generated in the rubbing process are led out by the wires.
  • FIG. 1 is a schematic structural view of a friction alignment device according to Embodiment 1 of the present invention.
  • FIG. 2 is a schematic structural view of a friction alignment device according to Embodiment 2 of the present invention.
  • FIG. 3 is a schematic structural diagram of a liquid crystal alignment device according to Embodiment 3 of the present invention.
  • the display panel of the present invention may be, for example, a TFT-LCD (Thin Film Transistor Liquid) Crystal Display, thin film transistor liquid crystal display panel), AMOLED (Active Matrix Organic Light Emitting) Diode, active matrix OLED panel) and other display panels.
  • TFT-LCD Thin Film Transistor Liquid
  • AMOLED Active Matrix Organic Light Emitting Diode
  • active matrix OLED panel active matrix OLED panel
  • a comb-shaped ITO layer is attached to the friction roller sleeved with the friction cloth, and the comb-shaped ITO layer can comb the friction cloth, and can filter the debris to the sealed space; The dust discharges the debris in the sealed space to the outside; and the electrostatic ions generated by the wires are led out. Therefore, the embodiments of the present invention can solve some trivialities that occur in the friction orientation process existing in the prior art, and these residual trivialities are liable to cause problems such as black mura and the like, which affect the display effect of the product. And it can solve the problem that static electricity is accumulated on the array substrate during the actual production process, and it is easy to adsorb friction and trivial.
  • Embodiment 1 is a schematic structural view of a friction alignment device according to Embodiment 1 of the present invention. For the convenience of description, only parts related to the embodiment of the present invention are shown.
  • the friction aligning device includes a friction roller 101, a rubbing cloth 102, a loader 103, a comb-like ITO layer 104, a wire 105, and a dust eliminator 106.
  • the friction cloth 102 is sleeved on the outer surface of the friction roller 101, and the two ends of the loader 103 are respectively connected to the two ends of the friction roller 101;
  • the comb-shaped ITO layer 104 is disposed on In the space enclosed by the loading device 103 and the friction roller 101, the comb-shaped ITO layer 104 and the loading device 103 enclose a sealed space, and the comb-shaped ITO layer 104 is grounded through the wire 105;
  • a dust exhaust port is disposed on the loader 103 enclosing the sealed space; the dust remover 106 is disposed at the dust exhaust port on the loader 103.
  • the dust exhaust port may be disposed at any position on the loader 103 surrounding the sealed space.
  • the dust exhaust port is disposed in the loader 103 enclosing the sealed space.
  • the sides are such that the dust collector 106 can be placed under the friction abutment so as not to affect operation on the friction abutment.
  • the dust collector 106 is disposed outside the loader 103; specifically, the dust collector 106 is installed at the dust exhaust port.
  • the comb-shaped ITO layer 104 is used for combing the rubbing cloth 102, and the debris can be filtered to the sealed space; the dust extractor 106 is used for the inside of the sealed space.
  • the chips are discharged to the outside; the wires 105 are used to conduct electrostatic ions generated in the rubbing process.
  • the loader 103 and the comb-shaped ITO layer 104 are integrally formed. This makes it easy for the operator to mount the loader 103 with the comb-like ITO layer 104 at both ends of the friction roller 101.
  • the comb-shaped ITO layer 104 has extensions at both ends thereof, and the two sides of the loading tool 103 are respectively provided with grooves; wherein the extensions of the comb-shaped ITO layer 104 are respectively The grooves on both sides of the loader 103 are detachably connected.
  • the comb teeth of the comb-like ITO layer 104 are disposed facing away from the friction roller 101.
  • the comb-like ITO layer can effectively comb the rubbing cloth 102, and the debris can be filtered to the sealed space.
  • the spacing between the comb teeth on the comb-like ITO layer 104 is 20 microns. Since the comb teeth have a space therebetween, the rubbing cloth 102 can be combed, and the chips can be filtered to the sealed space.
  • a comb-shaped ITO layer is attached to the friction roller sleeved with the friction cloth, and the comb-shaped ITO layer can comb the friction cloth, and can filter the debris to the sealed space; The debris in the sealed space is then discharged to the outside through a dust collector; and the electrostatic ions generated in the rubbing process are led out by the wires.
  • Embodiment 2 is a schematic structural view of a friction alignment device according to Embodiment 2 of the present invention. For the convenience of description, only parts related to the embodiment of the present invention are shown.
  • the friction aligning device includes a friction roller 201, a rubbing cloth 202, a loader 203, a comb-like ITO layer 204, a wire 205, and a dust eliminator 206.
  • the friction cloth 202 is sleeved on the outer surface of the friction roller 201, and the two ends of the loader 203 are respectively connected to the two ends of the friction roller 201;
  • the comb-shaped ITO layer 204 is disposed on The comb-shaped ITO layer 204 and the loading tool 203 enclose a sealed space in the space surrounded by the loading 203 and the friction roller 201, and the comb-shaped ITO layer 204 is grounded through the wire 205;
  • a dust exhaust port is disposed on the loader 203 enclosing the sealed space; the dust remover 206 is disposed at the dust exhaust port on the loader 203.
  • the dust exhaust port can be disposed at any position on the loader 203 surrounding the sealed space.
  • the dust exhaust port is disposed in the loader 203 surrounding the sealed space.
  • the sides are such that the dust collector 206 can be placed under the friction abutment so as not to affect operation on the friction abutment.
  • the dust collector 206 is disposed outside the loader 203; specifically, the dust remover 206 is installed at the dust exhaust port.
  • the comb-shaped ITO layer 204 is used for combing the rubbing cloth 202, and the debris can be filtered to the sealed space; the dust extractor 206 is used for the inside of the sealed space.
  • the chips are discharged to the outside; the wires 205 are used to guide the electrostatic ions generated in the rubbing process.
  • the loader 203 and the comb-shaped ITO layer 204 are integrally formed. This makes it easy for the operator to mount the loader 203 with the comb-like ITO layer 204 at both ends of the friction roller 201.
  • the comb-shaped ITO layer 204 has extensions at both ends thereof, and the two sides of the loading tool 203 are respectively provided with grooves; wherein the extensions of the comb-shaped ITO layer 204 are respectively The grooves on both sides of the loader 203 are detachably connected.
  • the comb teeth of the comb-like ITO layer 204 are disposed facing away from the friction roller 201.
  • the comb-like ITO layer can effectively comb the rubbing cloth 202, and the debris can be filtered to the sealed space.
  • the spacing between the comb teeth on the comb-like ITO layer 204 is 1 micron. Since the comb teeth have a space between them and the distance is set more closely, the rubbing cloth 202 can be combed, and finer debris can be efficiently filtered to the sealed space.
  • the spacing between the comb teeth on the comb-like ITO layer 204 is not limited to 1 micron or 20 micron; the interval between the comb teeth on the comb-shaped ITO layer may be 1 Micron to 20 microns. Within this range, the rubbing cloth 202 can be effectively combed, and the chips can be filtered to the sealed space. Alternatively, the interval between the comb teeth on the comb-shaped ITO layer 204 may be set according to the capillary size of the rubbing cloth 202.
  • a comb-shaped ITO layer is attached to the friction roller which is provided with the friction cloth, and the comb-shaped ITO layer can comb the friction cloth, and can filter finer debris to the same. Sealing the space; then discharging the debris in the sealed space to the outside through a dust collector; and discharging the electrostatic ions generated in the rubbing process through the wires.
  • FIG. 3 is a schematic structural diagram of a liquid crystal alignment device according to Embodiment 3 of the present invention. For the convenience of description, only parts related to the embodiment of the present invention are shown.
  • the liquid crystal alignment device includes a friction base 300 carrying a substrate to be rubbed, a driving mechanism, and a friction alignment device, and the friction alignment device is electrically connected to the driving mechanism.
  • the friction alignment device includes a friction roller 301, a friction cloth 302, a loader 303, a comb-like ITO layer 304, a wire 305, and a dust ejector 306.
  • the friction cloth 302 is sleeved on the outer surface of the friction roller 301, and the two ends of the loader 303 are respectively connected to the two ends of the friction roller 301;
  • the comb-shaped ITO layer 304 is disposed on The space between the loader 303 and the friction roller 301, the comb-shaped ITO layer 304 and the loader 303 enclose a sealed space, and the comb-shaped ITO layer 304 is grounded through the wire 305;
  • a dust exhaust port is disposed on the loader 303 surrounding the sealed space; the dust collector 306 is disposed at the dust exhaust port on the loader 303.
  • the dust exhaust port can be disposed at any position on the loader 303 surrounding the sealed space.
  • the dust exhaust port is disposed in the loader 303 surrounding the sealed space.
  • the sides are such that the dust rig 306 can be placed under the friction abutment so as not to affect operation on the friction abutment.
  • the dust collector 306 is disposed outside the loader 303; specifically, the dust remover 306 is installed at the dust exhaust port.
  • the comb-shaped ITO layer 304 is used for combing the rubbing cloth 302, and the debris can be filtered to the sealed space; the dust extractor 306 is used for the inside of the sealed space.
  • the chips are discharged to the outside; the wires 305 are used to conduct electrostatic ions generated in the rubbing process.
  • the loader 303 and the comb-shaped ITO layer 304 are integrally formed. This makes it easy for the operator to mount the loader 303 with the comb-like ITO layer 304 at both ends of the friction roller 301.
  • the comb-shaped ITO layer 304 has an extended end at both ends, and the two sides of the loader 303 are respectively provided with grooves; wherein the extensions of the comb-shaped ITO layer 304 are respectively The grooves on both sides of the loader 303 are detachably connected.
  • the comb teeth of the comb-like ITO layer 304 are disposed facing away from the friction roller 301.
  • the comb-like ITO layer can effectively comb the rubbing cloth 302, and the debris can be filtered to the sealed space.
  • the spacing between the comb teeth on the comb-like ITO layer may range from 1 micron to 20 microns.
  • the interval between the comb teeth on the comb-shaped ITO layer 304 may be set according to the capillary size of the rubbing cloth 302. Since the comb teeth have a space between them and the distance is set more closely, the rubbing cloth 302 can be combed, and finer chips can be efficiently filtered to the sealed space.
  • the comb-shaped ITO layer is added on the friction roller which is provided with the friction cloth, and the comb-shaped ITO layer can be disposed because the comb teeth have a space therebetween and the distance is more closely arranged.
  • the combing of the rubbing cloth can filter finer debris into the sealed space; then the debris in the sealed space is discharged to the outside through the dust collector; and the electrostatic ions generated in the rubbing process are led out by the wires.

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Liquid Crystal (AREA)
  • Preliminary Treatment Of Fibers (AREA)

Abstract

一种摩擦配向装置，包括：摩擦滚轮（101、201、301），在摩擦滚轮（101、201、301）外表面套设摩擦布（102、202、302），装载具（103、203、303）两端分别与摩擦滚轮（101、201、301）两端连接；梳子状ITO层（104、204、304）设置于装载具（103、203、303）与摩擦滚轮（101、201、301）围成的空间内；梳子状ITO层（104、204、304）与装载具（103、203、303）围成密封空间，梳子状ITO层（104、204、304）通过导线（105、205、305）接地；在装载具（103、203、303）上设置有排尘口；排尘器（106、206、306）设置于排尘口处。从而能过滤碎屑，并将碎屑排到外界，以及能将产生的静电离子导出。

Description

摩擦配向装置及液晶配向设备 技术领域
本发明涉及显示技术领域，特别涉及一种摩擦配向装置及液晶配向设备。
 背景技术
目前，薄膜晶体管液晶显示器（Thin Film Transistor Liquid Crystal Display，简称TFT-LCD）是显示产品中主要使用的显示装置。随着技术的进步，消费者对液晶显示产品的显示效果提出了更高的要求，普通的TN（Twisted Nematic，扭曲向列）型液晶显示器的显示效果已经不能满足市场的需求。目前，各大厂商正逐渐将显示效果更优良的各种广视角技术应用于液晶显示产品中，比如IPS（In-Plane Switching，共面转换）、FFS（Fringe Field Switching，边缘场开关）、AD-SDS（Advanced-Super Dimensional Switching，高级超维场开关，简称为ADS）等广视角技术。
在液晶显示器的制造过程中，需要在基板上制造一个均匀取向的取向层（例如由聚酰亚胺层形成的取向层），以确保液晶分子能均匀、有序的排列在该取向层上。取向层通常可通过摩擦工艺（rubbing）制造。目前的取向摩擦工艺主要采用一种机械取向摩擦的方式，具体为：通过贴附有摩擦布的摩擦辊，在形成有PI（Polyimide，聚酰亚胺）膜的阵列基板或彩膜基板上滚动摩擦，形成许多均匀取向的沟槽，从而产生取向层。
在传统的TN型产品摩擦取向过程中，由于对产品的显示品质要求不高，所使用的摩擦布通常为棉布，这是由于在摩擦过程中，棉布产生的摩擦琐屑很少，能够避免摩擦琐屑残留造成黑mura(斑点)等不良；但是由于棉布纤维过软且参差不齐，其形成的沟槽均匀度较低，会造成rubbing（摩擦）不良；因此，随着对产品品质要求的提高，在ADS型、IPS型或者FFS型产品摩擦取向过程中，使用的摩擦布通常为尼龙布，在摩擦取向过程中难免会出现一些琐屑，而残留的琐屑容易造成黑mura等不良，影响产品的显示效果。在实际生产过程中，摩擦琐屑多出现在阵列基板上，这是因为在阵列基板上形成有ITO（Indi微米 tin oxide，氧化铟锡）等导电层，其上聚集的静电容易吸附摩擦琐屑。
现有技术中，通常的 解决方法主要有：更换摩擦布以及改进清洗摩擦琐屑工艺，但均收效甚微。
故，有必要提出一种新的技术方案，以解决上述技术问题。
 技术问题
本发明的目的在于提供一种摩擦配向装置及液晶配向设备，其能够将碎屑进行过滤，并将过滤的碎屑排到外界，以及能够将产生的静电离子导出。
 技术解决方案
一种摩擦配向装置，包括一摩擦滚轮，在所述摩擦滚轮外表面套设有摩擦布，其中所述摩擦配向装置还包括：
一装载具，所述装载具两端分别与所述摩擦滚轮两端连接；
一梳子状ITO层，所述梳子状ITO层设置于所述装载具与所述摩擦滚轮围成的空间内，用于对所述摩擦布进行梳理；所述梳子状ITO层与所述装载具围成一密封空间，所述梳子状ITO层通过导线接地，并通过所述导线将摩擦制程中产生的静电离子导出；在围成密封空间的所述装载具上设置有一排尘口；其中所述梳子状ITO层的梳齿背向所述摩擦滚轮设置，所述梳子状ITO层上的梳齿之间的间隔范围为1微米至20微米；以及
一排尘器，所述排尘器设置于所述装载具上的所述排尘口处，用于将所述密封空间内的碎屑排到外界。
优选的，其中所述装载具与所述梳子状ITO层为一体成型。
优选的，其中所述梳子状ITO层两端具有延伸段，所述装载具两侧分别开设有凹槽；
其中，所述梳子状ITO层两端的延伸段分别与所述装载具两侧的凹槽为可拆卸连接。
优选的，其中所述排尘口设置在围成密封空间的所述装载具上的任何位置。
优选的，其中所述排尘口设置在围成密封空间的所述装载具的侧边。
一种摩擦配向装置，包括一摩擦滚轮，在所述摩擦滚轮外表面套设有摩擦布，所述摩擦配向装置还包括：
一装载具，所述装载具两端分别与所述摩擦滚轮两端连接；
一梳子状ITO层，所述梳子状ITO层设置于所述装载具与所述摩擦滚轮围成的空间内，用于对所述摩擦布进行梳理；所述梳子状ITO层与所述装载具围成一密封空间，所述梳子状ITO层通过导线接地，并通过所述导线将摩擦制程中产生的静电离子导出；在围成密封空间的所述装载具上设置有一排尘口；以及
一排尘器，所述排尘器设置于所述装载具上的所述排尘口处，用于将所述密封空间内的碎屑排到外界。
优选的，所述装载具与所述梳子状ITO层为一体成型。
优选的，所述梳子状ITO层两端具有延伸段，所述装载具两侧分别开设有凹槽；
其中，所述梳子状ITO层两端的延伸段分别与所述装载具两侧的凹槽为可拆卸连接。
优选的，所述梳子状ITO层上的梳齿之间的间隔范围为1微米至20微米。
优选的，所述梳子状ITO层的梳齿背向所述摩擦滚轮设置。
优选的，其中所述排尘口设置在围成密封空间的所述装载具上的任何位置。
优选的，其中所述排尘口设置在围成密封空间的所述装载具的侧边。
一种液晶配向设备，包括承载待摩擦基板的摩擦基台、驱动机构以及摩擦配向装置，所述摩擦配向装置与所述驱动机构电性连接；所述摩擦配向装置包括：
一摩擦滚轮，在所述摩擦滚轮外表面套设有摩擦布；
一装载具，所述装载具两端分别与所述摩擦滚轮两端连接；
一梳子状ITO层，所述梳子状ITO层设置于所述装载具与所述摩擦滚轮围成的空间内，用于对所述摩擦布进行梳理；所述梳子状ITO层与所述装载具围成一密封空间，所述梳子状ITO层通过导线接地，并通过所述导线将摩擦制程中产生的静电离子导出；在围成密封空间的所述装载具上设置有一排尘口；以及
一排尘器，所述排尘器设置于所述装载具上的所述排尘口处，用于将所述密封空间内的碎屑排到外界。
优选的，所述装载具与所述梳子状ITO层为一体成型。
优选的，所述梳子状ITO层两端具有延伸段，所述装载具两侧分别开设有凹槽；
其中，所述梳子状ITO层两端的延伸段分别与所述装载具两侧的凹槽为可拆卸连接。
优选的，所述梳子状ITO层上的梳齿之间的间隔范围为1微米至20微米。
优选的，所述梳子状ITO层的梳齿背向所述摩擦滚轮设置。
优选的，其中所述排尘口设置在围成密封空间的所述装载具上的任何位置。
优选的，其中所述排尘口设置在围成密封空间的所述装载具的侧边。
 有益效果
相对现有技术，本发明通过在套设有摩擦布的摩擦滚轮上加装梳子状ITO层，由于梳齿之间具有间隔，且该距离间隔设置的更紧密，该梳子状ITO层能够对摩擦布进行梳理，能够将更加细小的碎屑进行过滤至密封空间；然后通过排尘器将所述密封空间内的碎屑排到外界；以及通过导线将摩擦制程中产生的静电离子导出。
 附图说明
图1为本发明实施例一提供的摩擦配向装置的结构示意图；
图2为本发明实施例二提供的摩擦配向装置的结构示意图；
图3为本发明实施例三提供的液晶配向设备的结构示意图。
 本发明的最佳实施方式
本说明书所使用的词语“实施例”意指用作实例、示例或例证。此外，本说明书和所附权利要求中所使用的冠词“一”一般地可以被解释为意指“一个或多个”，除非另外指定或从上下文清楚导向单数形式。
本发明的显示面板可以是诸如TFT-LCD（Thin Film Transistor Liquid Crystal Display，薄膜晶体管液晶显示面板）、AMOLED（Active Matrix Organic Light Emitting Diode，有源矩阵有机发光二极管面板）等显示面板。
在本发明实施例中，通过在套设有摩擦布的摩擦滚轮上加装梳子状ITO层，该梳子状ITO层能够对摩擦布进行梳理，能够将碎屑进行过滤至密封空间；然后通过排尘器将所述密封空间内的碎屑排到外界；以及通过导线将产生的静电离子导出。因此，本发明实施例能够解决现有技术中存在的在摩擦取向过程中出现的一些琐屑，而这些残留的琐屑容易造成黑mura等不良，影响产品的显示效果的问题。以及能够解决在实际生产过程中，阵列基板上会聚集静电，容易吸附摩擦琐屑的问题。
实施例一
请参阅图1，为本发明实施例一提供的摩擦配向装置的结构示意图。为了便于说明，仅示出了与本发明实施例相关的部分。
所述摩擦配向装置包括：摩擦滚轮101、摩擦布102、装载具103、梳子状ITO层104、导线105、以及排尘器106。
在本发明实施例中，所述摩擦布102套设在所述摩擦滚轮101外表面，所述装载具103两端分别与所述摩擦滚轮101两端连接；所述梳子状ITO层104设置于所述装载具103与所述摩擦滚轮101围成的空间内，所述梳子状ITO层104与所述装载具103围成一密封空间，所述梳子状ITO层104通过导线105接地；另外，在围成密封空间的所述装载具103上设置有一排尘口；所述排尘器106设置于所述装载具103上的所述排尘口处。
然而，可以理解的是，所述排尘口可以设置在围成密封空间的所述装载具103上的任何位置，优选的，所述排尘口设置在围成密封空间的所述装载具103的侧边，这样能够使得所述排尘器106可以放置在摩擦基台下方，从而不影响摩擦基台上运作。所述排尘器106设置在所述装载具103外侧；具体的，所述排尘器106安装在所述排尘口处。
在本发明实施例中，所述梳子状ITO层104用于对所述摩擦布102进行梳理，能够将碎屑进行过滤至密封空间；所述排尘器106用于将所述密封空间内的碎屑排到外界；所述导线105用于将摩擦制程中产生的静电离子导出。
作为本发明一实施例，所述装载具103与所述梳子状ITO层104为一体成型。这样能够方便操作人员将带有所述梳子状ITO层104的所述装载具103安装在所述摩擦滚轮101两端。
作为本发明另一实施例，所述梳子状ITO层104两端具有延伸段，所述装载具103两侧分别开设有凹槽；其中，所述梳子状ITO层104两端的延伸段分别与所述装载具103两侧的凹槽为可拆卸连接。这样设计的好处是：一旦所述梳子状ITO层104有损坏，需要更换时，操作人员能够很方便的从所述装载具103上拆卸下来，也很容易将新的所述梳子状ITO层104安装至所述装载具103上。同样，当所述装载具103有损坏，需要更换时，操作人员也能够很方便的进行更换，因此，这种设计能够给操作人员带来方便。
作为本发明一优选实施例，所述梳子状ITO层104的梳齿背向所述摩擦滚轮101设置。这样该梳子状ITO层能够有效的对摩擦布102进行梳理，能够将碎屑进行过滤至密封空间。
在本发明实施例中，所述梳子状ITO层104上的梳齿之间的间隔为20微米。由于梳齿之间具有间隔，因此，能够对摩擦布102进行梳理，能够将碎屑进行过滤至密封空间。
综上所述，本发明实施例一通过在套设有摩擦布的摩擦滚轮上加装梳子状ITO层，该梳子状ITO层能够对摩擦布进行梳理，能够将碎屑进行过滤至密封空间；然后通过排尘器将所述密封空间内的碎屑排到外界；以及通过导线将摩擦制程中产生的静电离子导出。
实施例二
请参阅图2，为本发明实施例二提供的摩擦配向装置的结构示意图。为了便于说明，仅示出了与本发明实施例相关的部分。
所述摩擦配向装置包括：摩擦滚轮201、摩擦布202、装载具203、梳子状ITO层204、导线205、以及排尘器206。
在本发明实施例中，所述摩擦布202套设在所述摩擦滚轮201外表面，所述装载具203两端分别与所述摩擦滚轮201两端连接；所述梳子状ITO层204设置于所述装载具203与所述摩擦滚轮201围成的空间内，所述梳子状ITO层204与所述装载具203围成一密封空间，所述梳子状ITO层204通过导线205接地；另外，在围成密封空间的所述装载具203上设置有一排尘口；所述排尘器206设置于所述装载具203上的所述排尘口处。
然而，可以理解的是，所述排尘口可以设置在围成密封空间的所述装载具203上的任何位置，优选的，所述排尘口设置在围成密封空间的所述装载具203的侧边，这样能够使得所述排尘器206可以放置在摩擦基台下方，从而不影响摩擦基台上运作。所述排尘器206设置在所述装载具203外侧；具体的，所述排尘器206安装在所述排尘口处。
在本发明实施例中，所述梳子状ITO层204用于对所述摩擦布202进行梳理，能够将碎屑进行过滤至密封空间；所述排尘器206用于将所述密封空间内的碎屑排到外界；所述导线205用于将摩擦制程中产生的静电离子导出。
作为本发明一实施例，所述装载具203与所述梳子状ITO层204为一体成型。这样能够方便操作人员将带有所述梳子状ITO层204的所述装载具203安装在所述摩擦滚轮201两端。
作为本发明另一实施例，所述梳子状ITO层204两端具有延伸段，所述装载具203两侧分别开设有凹槽；其中，所述梳子状ITO层204两端的延伸段分别与所述装载具203两侧的凹槽为可拆卸连接。这样设计的好处是：一旦所述梳子状ITO层204有损坏，需要更换时，操作人员能够很方便的从所述装载具203上拆卸下来，也很容易将新的所述梳子状ITO层204安装至所述装载具203上。同样，当所述装载具203有损坏，需要更换时，操作人员也能够很方便的进行更换，因此，这种设计能够给操作人员带来方便。
作为本发明一优选实施例，所述梳子状ITO层204的梳齿背向所述摩擦滚轮201设置。这样该梳子状ITO层能够有效的对摩擦布202进行梳理，能够将碎屑进行过滤至密封空间。
在本发明实施例中，所述梳子状ITO层204上的梳齿之间的间隔为1微米。由于梳齿之间具有间隔，且该距离间隔设置的更紧密，因此，能够对摩擦布202进行梳理，能够有效地将更加细小的碎屑进行过滤至密封空间。
然而，可以理解的是，所述梳子状ITO层204上的梳齿之间的间隔并不限于1微米或20微米设置；所述梳子状ITO层上的梳齿之间的间隔范围可以为1微米至20微米。在该范围内，都能够有效的对摩擦布202进行梳理，能够将碎屑进行过滤至密封空间。或者是，所述梳子状ITO层204上的梳齿之间的间隔，也可以根据摩擦布202的毛细大小来进行设置。
综上所述，本发明实施例二通过在套设有摩擦布的摩擦滚轮上加装梳子状ITO层，该梳子状ITO层能够对摩擦布进行梳理，能够将更加细小的碎屑进行过滤至密封空间；然后通过排尘器将所述密封空间内的碎屑排到外界；以及通过导线将摩擦制程中产生的静电离子导出。
实施例三
请参阅图3，为本发明实施例三提供的一种液晶配向设备的结构示意图。为了便于说明，仅示出了与本发明实施例相关的部分。
所述液晶配向设备，包括承载待摩擦基板的摩擦基台300、驱动机构以及摩擦配向装置，所述摩擦配向装置与所述驱动机构电性连接。
其中，所述摩擦配向装置包括：摩擦滚轮301、摩擦布302、装载具303、梳子状ITO层304、导线305、以及排尘器306。
在本发明实施例中，所述摩擦布302套设在所述摩擦滚轮301外表面，所述装载具303两端分别与所述摩擦滚轮301两端连接；所述梳子状ITO层304设置于所述装载具303与所述摩擦滚轮301围成的空间内，所述梳子状ITO层304与所述装载具303围成一密封空间，所述梳子状ITO层304通过导线305接地；另外，在围成密封空间的所述装载具303上设置有一排尘口；所述排尘器306设置于所述装载具303上的所述排尘口处。
然而，可以理解的是，所述排尘口可以设置在围成密封空间的所述装载具303上的任何位置，优选的，所述排尘口设置在围成密封空间的所述装载具303的侧边，这样能够使得所述排尘器306可以放置在摩擦基台下方，从而不影响摩擦基台上运作。所述排尘器306设置在所述装载具303外侧；具体的，所述排尘器306安装在所述排尘口处。
在本发明实施例中，所述梳子状ITO层304用于对所述摩擦布302进行梳理，能够将碎屑进行过滤至密封空间；所述排尘器306用于将所述密封空间内的碎屑排到外界；所述导线305用于将摩擦制程中产生的静电离子导出。
作为本发明一实施例，所述装载具303与所述梳子状ITO层304为一体成型。这样能够方便操作人员将带有所述梳子状ITO层304的所述装载具303安装在所述摩擦滚轮301两端。
作为本发明另一实施例，所述梳子状ITO层304两端具有延伸段，所述装载具303两侧分别开设有凹槽；其中，所述梳子状ITO层304两端的延伸段分别与所述装载具303两侧的凹槽为可拆卸连接。这样设计的好处是：一旦所述梳子状ITO层304有损坏，需要更换时，操作人员能够很方便的从所述装载具303上拆卸下来，也很容易将新的所述梳子状ITO层304安装至所述装载具303上。同样，当所述装载具303有损坏，需要更换时，操作人员也能够很方便的进行更换，因此，这种设计能够给操作人员带来方便。
作为本发明一优选实施例，所述梳子状ITO层304的梳齿背向所述摩擦滚轮301设置。这样该梳子状ITO层能够有效的对摩擦布302进行梳理，能够将碎屑进行过滤至密封空间。
在本发明实施例中，所述梳子状ITO层上的梳齿之间的间隔范围可以为1微米至20微米。或者是，所述梳子状ITO层304上的梳齿之间的间隔，也可以根据摩擦布302的毛细大小来进行设置。由于梳齿之间具有间隔，且该距离间隔设置的更紧密，因此，能够对摩擦布302进行梳理，能够有效地将更加细小的碎屑进行过滤至密封空间。
综上所述，本发明实施例通过在套设有摩擦布的摩擦滚轮上加装梳子状ITO层，由于梳齿之间具有间隔，且该距离间隔设置的更紧密，该梳子状ITO层能够对摩擦布进行梳理，能够将更加细小的碎屑进行过滤至密封空间；然后通过排尘器将所述密封空间内的碎屑排到外界；以及通过导线将摩擦制程中产生的静电离子导出。
尽管已经相对于一个或多个实现方式示出并描述了本发明，但是本领域技术人员基于对本说明书和附图的阅读和理解将会想到等价变型和修改。本发明包括所有这样的修改和变型，并且仅由所附权利要求的范围限制。特别地关于由上述组件执行的各种功能，用于描述这样的组件的术语旨在对应于执行所述组件的指定功能（例如其在功能上是等价的）的任意组件（除非另外指示），即使在结构上与执行本文所示的本说明书的示范性实现方式中的功能的公开结构不等同。此外，尽管本说明书的特定特征已经相对于若干实现方式中的仅一个被公开，但是这种特征可以与如可以对给定或特定应用而言是期望和有利的其他实现方式的一个或多个其他特征组合。而且，就术语“包括”、“具有”、“含有”或其变形被用在具体实施方式或权利要求中而言，这样的术语旨在以与术语“包含”相似的方式包括。
综上所述，虽然本发明已以优选实施例揭露如上，但上述优选实施例并非用以限制本发明，本领域的普通技术人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。

Claims (19)

  1. 一种摩擦配向装置，包括一摩擦滚轮，在所述摩擦滚轮外表面套设有摩擦布，其中所述摩擦配向装置还包括：
    一装载具，所述装载具两端分别与所述摩擦滚轮两端连接；
    一梳子状ITO层，所述梳子状ITO层设置于所述装载具与所述摩擦滚轮围成的空间内，用于对所述摩擦布进行梳理；所述梳子状ITO层与所述装载具围成一密封空间，所述梳子状ITO层通过导线接地，并通过所述导线将摩擦制程中产生的静电离子导出；在围成密封空间的所述装载具上设置有一排尘口；其中所述梳子状ITO层的梳齿背向所述摩擦滚轮设置，所述梳子状ITO层上的梳齿之间的间隔范围为1微米至20微米；以及
    一排尘器，所述排尘器设置于所述装载具上的所述排尘口处，用于将所述密封空间内的碎屑排到外界。
  2. 根据权利要求1所述的摩擦配向装置，其中所述装载具与所述梳子状ITO层为一体成型。
  3. 根据权利要求1所述的摩擦配向装置，其中所述梳子状ITO层两端具有延伸段，所述装载具两侧分别开设有凹槽；
    其中，所述梳子状ITO层两端的延伸段分别与所述装载具两侧的凹槽为可拆卸连接。
  4. 根据权利要求1所述的摩擦配向装置，其中所述排尘口设置在围成密封空间的所述装载具上的任何位置。
  5. 根据权利要求4所述的摩擦配向装置，其中所述排尘口设置在围成密封空间的所述装载具的侧边。
  6. 一种摩擦配向装置，包括一摩擦滚轮，在所述摩擦滚轮外表面套设有摩擦布，其中所述摩擦配向装置还包括：
    一装载具，所述装载具两端分别与所述摩擦滚轮两端连接；
    一梳子状ITO层，所述梳子状ITO层设置于所述装载具与所述摩擦滚轮围成的空间内，用于对所述摩擦布进行梳理；所述梳子状ITO层与所述装载具围成一密封空间，所述梳子状ITO层通过导线接地，并通过所述导线将摩擦制程中产生的静电离子导出；在围成密封空间的所述装载具上设置有一排尘口；以及
    一排尘器，所述排尘器设置于所述装载具上的所述排尘口处，用于将所述密封空间内的碎屑排到外界。
  7. 根据权利要求6所述的摩擦配向装置，其中所述装载具与所述梳子状ITO层为一体成型。
  8. 根据权利要求6所述的摩擦配向装置，其中所述梳子状ITO层两端具有延伸段，所述装载具两侧分别开设有凹槽；
    其中，所述梳子状ITO层两端的延伸段分别与所述装载具两侧的凹槽为可拆卸连接。
  9. 根据权利要求6所述的摩擦配向装置，其中所述梳子状ITO层上的梳齿之间的间隔范围为1微米至20微米。
  10. 根据权利要求6所述的摩擦配向装置，其中所述梳子状ITO层的梳齿背向所述摩擦滚轮设置。
  11. 根据权利要求6所述的摩擦配向装置，其中所述排尘口设置在围成密封空间的所述装载具上的任何位置。
  12. 根据权利要求11所述的摩擦配向装置，其中所述排尘口设置在围成密封空间的所述装载具的侧边。
  13. 一种液晶配向设备，包括承载待摩擦基板的摩擦基台、驱动机构以及摩擦配向装置，所述摩擦配向装置与所述驱动机构电性连接；其中所述摩擦配向装置包括：
    一摩擦滚轮，在所述摩擦滚轮外表面套设有摩擦布；
    一装载具，所述装载具两端分别与所述摩擦滚轮两端连接；
    一梳子状ITO层，所述梳子状ITO层设置于所述装载具与所述摩擦滚轮围成的空间内，用于对所述摩擦布进行梳理；所述梳子状ITO层与所述装载具围成一密封空间，所述梳子状ITO层通过导线接地，并通过所述导线将摩擦制程中产生的静电离子导出；在围成密封空间的所述装载具上设置有一排尘口；以及
    一排尘器，所述排尘器设置于所述装载具上的所述排尘口处，用于将所述密封空间内的碎屑排到外界。
  14. 根据权利要求13所述的液晶配向设备，其中所述装载具与所述梳子状ITO层为一体成型。
  15. 根据权利要求13所述的液晶配向设备，其中所述梳子状ITO层两端具有延伸段，所述装载具两侧分别开设有凹槽；
    其中，所述梳子状ITO层两端的延伸段分别与所述装载具两侧的凹槽为可拆卸连接。
  16. 根据权利要求13所述的液晶配向设备，其中所述梳子状ITO层上的梳齿之间的间隔范围为1微米至20微米。
  17. 根据权利要求13所述的液晶配向设备，其中所述梳子状ITO层的梳齿背向所述摩擦滚轮设置。
  18. 根据权利要求13所述的液晶配向设备，其中所述排尘口设置在围成密封空间的所述装载具上的任何位置。
  19. 根据权利要求18所述的液晶配向设备，其中所述排尘口设置在围成密封空间的所述装载具的侧边。
PCT/CN2014/090860 2014-11-07 2014-11-12 摩擦配向装置及液晶配向设备 WO2016070444A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201410623748.7A CN104375326B (zh) 2014-11-07 2014-11-07 摩擦配向装置及液晶配向设备
CN201410623748.7 2014-11-07

Publications (1)

Publication Number Publication Date
WO2016070444A1 true WO2016070444A1 (zh) 2016-05-12

Family

ID=52554346

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2014/090860 WO2016070444A1 (zh) 2014-11-07 2014-11-12 摩擦配向装置及液晶配向设备

Country Status (2)

Country Link
CN (1) CN104375326B (zh)
WO (1) WO2016070444A1 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110888267B (zh) * 2019-11-26 2020-12-08 Tcl华星光电技术有限公司 液晶配向装置及其操作方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1525222A (zh) * 2003-02-25 2004-09-01 常阳工学株式会社 摩擦辊以及使用它进行定向处理的液晶显示元件
JP2005266019A (ja) * 2004-03-17 2005-09-29 Dainippon Printing Co Ltd ラビング方法及び装置
CN101000437A (zh) * 2007-01-24 2007-07-18 友达光电股份有限公司 配向膜的配向装置
CN101144941A (zh) * 2006-09-11 2008-03-19 北京京东方光电科技有限公司 一种摩擦装置及其用途
CN203084381U (zh) * 2013-03-06 2013-07-24 京东方科技集团股份有限公司 摩擦装置
CN203465490U (zh) * 2013-08-16 2014-03-05 昆山龙腾光电有限公司 除静电装置以及防静电摩擦配向系统

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002062534A (ja) * 2000-08-17 2002-02-28 Hitachi Ltd 液晶表示装置の製造方法及び装置
KR100577792B1 (ko) * 2001-12-22 2006-05-10 비오이 하이디스 테크놀로지 주식회사 러빙포의 재정렬 기능이 부가된 액정표시장치의 러빙머신및 이를 이용한 러빙방법
CN201440195U (zh) * 2009-05-27 2010-04-21 深圳晶华显示器材有限公司 一种用于lcd摩擦工序的装置
CN202372732U (zh) * 2011-12-02 2012-08-08 北京京东方光电科技有限公司 一种摩擦装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1525222A (zh) * 2003-02-25 2004-09-01 常阳工学株式会社 摩擦辊以及使用它进行定向处理的液晶显示元件
JP2005266019A (ja) * 2004-03-17 2005-09-29 Dainippon Printing Co Ltd ラビング方法及び装置
CN101144941A (zh) * 2006-09-11 2008-03-19 北京京东方光电科技有限公司 一种摩擦装置及其用途
CN101000437A (zh) * 2007-01-24 2007-07-18 友达光电股份有限公司 配向膜的配向装置
CN203084381U (zh) * 2013-03-06 2013-07-24 京东方科技集团股份有限公司 摩擦装置
CN203465490U (zh) * 2013-08-16 2014-03-05 昆山龙腾光电有限公司 除静电装置以及防静电摩擦配向系统

Also Published As

Publication number Publication date
CN104375326A (zh) 2015-02-25
CN104375326B (zh) 2017-08-25

Similar Documents

Publication Publication Date Title
JP4960155B2 (ja) 液晶表示装置
WO2019114063A1 (zh) Oled 触控显示面板及其制备方法
WO2014015543A1 (zh) 液晶面板及其制作方法
US9165950B2 (en) Anti-static structure of array substrate
WO2013143197A1 (zh) 液晶显示面板及其制造方法以及液晶显示装置
WO2018218711A1 (zh) Tft基板和液晶显示面板
WO2016179914A1 (zh) 偏光板及液晶显示面板
WO2016074262A1 (zh) 一种coa阵列基板及液晶显示面板
WO2016008184A1 (zh) 一种显示面板及显示装置
US20110063549A1 (en) Color filter substrate, lcd, and manufacturing method thereof
WO2016095251A1 (zh) 一种液晶显示面板的制作方法
WO2019015077A1 (zh) 一种阵列基板及其制造方法、液晶显示装置
WO2016026167A1 (zh) 一种液晶显示面板及阵列基板
WO2016070401A1 (zh) 曲面显示面板及曲面显示装置
WO2014012292A1 (zh) 液晶显示面板及其应用的显示装置
WO2013174029A1 (zh) 液晶面板及其液晶配向方法
KR100440415B1 (ko) 액정 표시 소자의 제조 방법 및 그 제조 장치
WO2016070444A1 (zh) 摩擦配向装置及液晶配向设备
WO2017020322A1 (zh) 一种ffs阵列基板及其制造方法和显示装置
WO2020125467A1 (zh) 显示面板、显示装置以及显示面板的制造方法
WO2017124595A1 (zh) 显示面板制作方法及液晶显示器
WO2017177537A1 (zh) 一种液晶显示面板及液晶显示器
US20080291374A1 (en) Structure of a display panel
WO2015085618A1 (zh) 薄膜晶体管阵列基板、制造方法及液晶显示装置
WO2013010348A1 (zh) 液晶涂布装置和方法、承载台

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 14905662

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 14905662

Country of ref document: EP

Kind code of ref document: A1