WO2016027832A1 - Procédé de fabrication de moule revêtu pour moulage sous pression - Google Patents

Procédé de fabrication de moule revêtu pour moulage sous pression Download PDF

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WO2016027832A1
WO2016027832A1 PCT/JP2015/073246 JP2015073246W WO2016027832A1 WO 2016027832 A1 WO2016027832 A1 WO 2016027832A1 JP 2015073246 W JP2015073246 W JP 2015073246W WO 2016027832 A1 WO2016027832 A1 WO 2016027832A1
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Prior art keywords
hard film
coating
hard
film
present
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PCT/JP2015/073246
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English (en)
Japanese (ja)
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サーレ アブスアイリキ
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日立金属株式会社
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Priority to CN201580044403.9A priority Critical patent/CN106660110B/zh
Priority to KR1020177004008A priority patent/KR101862526B1/ko
Priority to JP2016544231A priority patent/JP6274317B2/ja
Publication of WO2016027832A1 publication Critical patent/WO2016027832A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22C—FOUNDRY MOULDING
    • B22C9/00—Moulds or cores; Moulding processes
    • B22C9/06—Permanent moulds for shaped castings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22D—CASTING OF METALS; CASTING OF OTHER SUBSTANCES BY THE SAME PROCESSES OR DEVICES
    • B22D17/00—Pressure die casting or injection die casting, i.e. casting in which the metal is forced into a mould under high pressure
    • B22D17/20—Accessories: Details
    • B22D17/22—Dies; Die plates; Die supports; Cooling equipment for dies; Accessories for loosening and ejecting castings from dies
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22C—FOUNDRY MOULDING
    • B22C3/00—Selection of compositions for coating the surfaces of moulds, cores, or patterns
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation

Definitions

  • the present invention coats a hard film by arc ion plating, which is used for casting of various ferrous and non-ferrous metals represented by steel, aluminum, magnesium, zinc and alloys thereof, and particularly for casting of aluminum and alloys thereof.
  • the present invention relates to a method for manufacturing a die casting coating mold.
  • a die casting coating mold in which a hard film such as a nitride, carbonitride, oxynitride, or oxide is coated has been proposed.
  • the coating means the arc ion plating method is effective because the thermal load on the base material is small, so that the size of the mold is small and the adhesion of the hard film is excellent.
  • Patent Document 1 proposes coating a single layer of Cr nitride by an arc ion plating method.
  • Patent Document 2 proposes stacking a metal or alloy and a carbide, nitride, oxide, or carbonitride by an ion plating method. Further, in the cited document 3, it is disclosed that a chemically stable oxide film is applied. Specifically, an AlCr oxide is provided on a Cr oxide by an arc ion plating method. Proposed.
  • the present inventor has confirmed that local melting damage and seizure occur even in a die casting coating mold coated by an arc ion plating method having excellent film adhesion. Then, when the cause of the occurrence of melting damage or seizure in the die casting coating mold was examined, local defects such as voids and voids starting from irregularities such as droplets and particles contained in the hard coating, It was confirmed that seizure occurred.
  • an object of the present invention is to provide a method for manufacturing a die casting coating mold having excellent resistance to erosion and seizure against molten metal.
  • the present invention is a method of manufacturing a die casting coating mold in which a hard film is coated on the surface of a die casting mold base material by an arc ion plating method. Coating the hard film, smoothing the surface of the first hard film, and applying the second hard film by arc ion plating on the smoothed first hard film Is a method for manufacturing a die casting coating mold.
  • the smoothing process is preferably a bombard process.
  • the first hard film or the second hard film is preferably a chromium nitride.
  • the second hard coating preferably has a multilayer structure of at least two layers.
  • a coating die for die casting that can exhibit excellent melt resistance and seizure resistance against molten metal such as aluminum.
  • 3 is a photograph of appearance observation by an optical microscope after a erosion test of Examples 1 to 4 of the present invention. It is an external appearance observation photograph by the optical microscope after the melt-out test of Comparative Examples 1 and 2.
  • 2 is a photograph of an appearance observed with an optical microscope after a erosion test of Examples 10 to 12 of the present invention.
  • 6 is a photograph of appearance observation by an optical microscope after a erosion test of Invention Examples 13 to 15.
  • 2 is a photograph of appearance observation by an optical microscope after a erosion test of Examples 16 to 18 of the present invention.
  • 6 is an appearance observation photograph by an optical microscope after a erosion test of Comparative Examples 10 to 12. It is an external appearance observation photograph by the optical microscope after the erosion test of Comparative Examples 13 and 14.
  • the present inventor has found that it is effective to provide a smoothing process in the middle of the coating process of the hard film by the arc ion plating method in order to reduce local melting damage and seizure of the coating mold for die casting. As a result, the present invention has been reached.
  • the present inventor has confirmed that local melting damage and seizure occur due to droplets and particles contained in the hard coating. And by simply smoothing the hard coating on the outermost surface, defects starting from droplets and particles contained in the coating cannot be removed, and melting and seizure of the die casting mold are suppressed. I confirmed that I can't. And in order to suppress the melting loss and seizure of the die-casting die, it has been found that it is effective to provide a smoothing treatment during the formation of the hard coating.
  • the first hard coating is coated by an arc ion plating method, and the surface thereof is smoothed. By smoothing the surface of the first hard film, the surface unevenness caused by droplets or particles on the surface of the film can be smoothed and smoothed.
  • the second hard film by the arc ion plating method.
  • the above-mentioned “smoothing treatment” refers to treatment for reducing the surface roughness value of the surface of the hard coating, such as mechanical polishing, bombardment treatment or the like.
  • the arithmetic average roughness Ra and the maximum height Rz based on JIS-B-0601-2001 can be used for the above-mentioned surface roughness parameters.
  • a bombardment treatment using a gas such as argon or a bombardment treatment using metal ions can be applied. If bombarding is applied, it can be continuously processed in the same furnace, which is preferable to mechanical polishing described later. However, if the bombardment time is too long, the surface of the first hard coating becomes uneven, and the melt resistance tends to decrease. In order to exhibit better resistance to erosion, the bombardment treatment is preferably performed for 40 minutes or less. More preferably, it is 30 minutes or less. However, if the treatment time becomes too short, it is difficult to obtain the effect of improving the melt resistance. Therefore, it is preferable that the bombarding process has a processing time of 5 minutes or longer. Furthermore, it is preferable to set it as 10 minutes or more.
  • the gas bombardment treatment is preferably performed at a negative bias voltage applied to the substrate of ⁇ 700 V or more and ⁇ 400 V or less.
  • the negative bias voltage applied to the substrate is larger than ⁇ 400 V (plus side from ⁇ 400 V)
  • the first hard film is not sufficiently smoothed, so that the melt resistance and seizure resistance tend to decrease.
  • the negative bias voltage applied to the substrate is smaller than ⁇ 700 V (minus side from ⁇ 700 V)
  • many irregularities are easily formed on the surface of the first hard film, and the resistance to fusing and seizure decreases. Tend to.
  • the following mechanical polishing is effective in order to eliminate the surface irregularities caused by the droplets and to obtain a smooth surface state.
  • a method of polishing the surface of a hard film with a polishing cloth holding an abrasive such as diamond paste (2) Using diamond particles and a water-containing abrasive, sliding the film coated on the substrate at a high speed to generate Polishing by so-called aero lapping (registered trademark), etc. (3) Polishing by spraying abrasives with elasticity and adhesion without using air, so-called SMAP (Kamei Iron Works) Further, a more preferable smoothing can be realized by polishing the diamond paste of 3 ⁇ m or less after the mechanical polishing.
  • SMAP Koreanei Iron Works
  • the sample In order to mechanically polish the surface of the first hard film, it is necessary to remove the sample from the furnace after coating the first hard film. After the first hard film is smoothed by mechanical polishing, the sample may be returned to the furnace to cover the second hard film. Mechanical polishing can achieve a smoother surface state and is preferable for improving the resistance to erosion and seizure.
  • Nitride, carbide, carbonitride, carbonitride, oxynitride, and oxide can be applied to the first hard film and the second hard film of the present invention.
  • the first hard film and the second hard film may be a single layer, but preferably have a multilayer structure.
  • excellent mechanical properties can be added to the second hard film.
  • high hardness is added to the second hard film by laminating chromium nitride with excellent adhesion and chromium nitride obtained by adding a third element such as Si or B to the chromium nitride. can do.
  • the first hard film is preferably a nitride or carbonitride. If the first hard film on the substrate side is a nitride or carbonitride, it is preferable because the adhesion to the substrate tends to be more excellent. Further, a nitride is preferable.
  • the first hard coating is more preferably a chromium-based nitride or carbonitride containing 50% or more of Cr in an atomic ratio (atomic%) of a metal (including metalloid) portion, and Cr It is more preferable to contain 70% or more.
  • the second hard film on the surface side is preferably a nitride, carbonitride, oxynitride, or oxide. Further, nitride or oxynitride is preferable. In particular, a nitride is preferable.
  • the second hard coating is more preferably a chromium-based nitride or carbonitride containing 50% or more of Cr in an atomic ratio (atomic%) of a metal (including metalloid) portion, and Cr It is more preferable to contain 70% or more.
  • the second hard coating contains at least one of Si and B.
  • the film structure becomes finer, and the wear resistance and the erosion resistance are further improved.
  • the second hard coating contains 3% or more of one or more of Si and B in the atomic ratio (atomic%) of the metal (including metalloid) portion. More preferably, it is 5% or more.
  • the second hard coating contains at least 15% of Si and B in an atomic ratio (atomic%) of a metal (including metalloid) portion, and at least 1 type of Si and B. It is more preferable to contain it at 10% or less.
  • the surface of the second hard film is preferably smoothed.
  • the surface of the second hard film is polished to have an arithmetic average roughness Ra (conforming to JIS-B-0601-2001) of 0.05 ⁇ m or less and a maximum height Rz (JIS-B-0601-2001). Is more preferably 1.00 ⁇ m or less, and further preferably Rz is 0.60 ⁇ m or less.
  • the base material of the present invention is not particularly defined, it is preferable to use hot tool steel represented by JIS-G-4404 (2006) SKD61 and its improved material. Based on hot tool steel containing C and Cr, which determine the basic characteristics of tool steel, in the mass range of C: 0.35 to 0.45% and Cr: 4.0 to 6.0%. It is preferable to use it as a material.
  • the substrate may be preliminarily applied with a surface hardening treatment using diffusion such as nitriding treatment or carburizing treatment. It is preferable to use a base material that has been subjected to a nitriding treatment because melting resistance and seizure resistance tend to be further improved.
  • the arithmetic average roughness Ra (conforms to JIS-B-0601-2001) is 0.05 ⁇ m or less, and the maximum height Rz (conforms to JIS-B-0601-2001). It is preferable to use a substrate having a surface roughness of 1.00 ⁇ m or less.
  • the surface roughness of the substrate before coating is also polished smoothly.
  • the surface roughness of the base material before coating the hard film is A
  • the surface roughness of the first hard film before the smoothing process is B
  • the surface of the first hard film after the smoothing process When the roughness is C, it is preferable that each arithmetic average roughness Ra and maximum height Rz satisfy the relationship of A ⁇ C ⁇ B.
  • the relationship between Ra and Rz described above satisfies the relationship of A ⁇ C ⁇ D ⁇ B, where D is the subsequent surface roughness.
  • the degree of removal that is, the surface roughness C after the smoothing treatment, is the surface roughness before the smoothing treatment. It is preferable that the smoothing process is performed so that C / B is less than 1.0 for Ra and C / B is less than 0.5 for Rz. By satisfying these equations, defects in the hard coating can be further reduced.
  • the total film thickness of the hard coating is preferably 3 ⁇ m or more. Furthermore, the total film thickness of the hard coating is more preferably 5 ⁇ m or more, and further preferably 10 ⁇ m or more. On the other hand, if the total film thickness of the hard film becomes too thick, film peeling tends to occur. Therefore, the total film thickness of the hard coating is preferably 40 ⁇ m or less, and more preferably 30 ⁇ m or less.
  • another film may be provided between the first hard film and the substrate. Further, another film may be provided on the second hard film. When another film is provided on the second hard film, the surface of the second hard film may be smoothed to provide a third or subsequent hard film.
  • a sample for evaluating the resistance to fusing required for a die casting die was prepared.
  • As the base material a steel material equivalent to SKD61 of JIS-G-4404 (2006), which has a hardness of 46 HRC and is generally used as hot work tool steel, was used.
  • the dimensions of the substrate for evaluation were a cylindrical shape having a diameter of 10 mm and a length of 120 mm, and the surface was polished so that the arithmetic average roughness Ra was 0.01 ⁇ m and the maximum height Rz was 0.07 ⁇ m.
  • a substrate that had been previously gas-nitrided was used. And the hard film was coat
  • the surface-polished substrate was degreased and washed and fixed to the substrate holder.
  • the substrate temperature was then heated to about 500 ° C., and heat degassing was performed in a vacuum of 1 ⁇ 10 ⁇ 3 Pa.
  • Ar gas was introduced, a bias voltage of ⁇ 500 V was applied to the substrate, and Ar bombardment was performed for 20 minutes.
  • a bias voltage of ⁇ 800 V was applied to the substrate, and Ti bombardment was performed for about 5 minutes.
  • the substrate was bombarded in the same manner for all samples.
  • CrN was selected for the first hard coating
  • CrSiBN was selected for the second hard coating, and the substrate was coated.
  • the contents of the smoothing treatment of the first hard film and the second hard film of Example 2 are shown in Tables 1 and 2. Detailed sample preparation conditions will be specifically described below.
  • AERO LAP YT-300 aero lapping device manufactured by Yamashita Towers Co., Ltd. The film was smoothed. And the surface roughness of the 1st hard film was measured. And after performing degreasing washing
  • the surface was cleaned by performing Ar bombardment treatment and Ti bombardment treatment. Thereafter, nitrogen gas is introduced, a bias voltage of ⁇ 120 V is applied to the base material, and the second hard film comprising CrSiBN of about 4.0 ⁇ m under the base material temperature of 500 ° C. and the reaction gas pressure of 3.0 Pa. Was coated.
  • the composition of the target was Cr 92 Si 3 B 5 .
  • the second hard film after coating was polished using an aero lapping apparatus, and then smoothed by polishing using a 3 ⁇ m diamond paste.
  • Example 1 of the present invention The process up to the first hard coating was the same as Example 1 of the present invention.
  • the substrate is taken out of the chamber and polished using an aero lapping device (AERO LAP YT-300) manufactured by Yamashita Towers. And polished.
  • AERO LAP YT-300 aero lapping device manufactured by Yamashita Towers. And polished.
  • the process after the smoothing treatment of the first film was the same as Example 1 of the present invention.
  • Example 1 of the present invention The process up to the first hard coating was the same as Example 1 of the present invention.
  • the negative bias voltage applied to the substrate is set to ⁇ 500 V, and bombarding using Ar gas is performed. Conducted for 30 minutes.
  • the base material after performing this smoothing process was taken out from the chamber, and the surface roughness of the 1st hard film was measured.
  • the substrate was returned to the chamber and the same surface cleaning as in Example 1 of the present invention was performed.
  • nitrogen gas was introduced, a bias voltage of ⁇ 120 V was applied to the base material, and the base material temperature was 500 ° C. and the reaction gas pressure was 3.0 Pa.
  • the same as Example 1 of the present invention The second hard film was coated.
  • the method for smoothing the second hard film is the same as in Example 1 of the present invention.
  • Example 1 of the present invention The process up to the first hard coating was the same as Example 1 of the present invention.
  • the base material was taken out of the chamber, and a nylon nonwoven fabric (polishing pad # 400 manufactured by Bell Star Abrasives Industries Co., Ltd.) coated with an abrasive as the smoothing treatment was used.
  • the process after the smoothing treatment of one film was the same as Example 1 of the present invention.
  • Example 1 ⁇ Comparative Example Sample No. 1>
  • the process up to the first hard coating was the same as Example 1 of the present invention.
  • the base material is taken out of the chamber, and as a comparative example of the smoothing treatment, instead of the smoothing treatment of the present invention, shot blast treatment (projection material: steel grit 200 to 300 ⁇ m) )It was used. Shot blasting was performed for about 10 seconds.
  • the process after the shot blasting treatment of the first film was the same as that of Example 1 of the present invention.
  • Example 1 of the present invention The process up to the first hard coating was the same as Example 1 of the present invention. After the coating of the first hard film, no polishing treatment or the like was performed, and the second hard film was coated in the same process as in Invention Example 10 to prepare a sample. The method for smoothing the second hard film is the same as in Example 1 of the present invention.
  • the surface roughness of the base material and the hard film was determined by using a contact type surface roughness measuring device SURFCOM 480A manufactured by Tokyo Seimitsu Co., Ltd., according to JIS-B-0601-2001, and an arithmetic average roughness Ra and a maximum height roughness Rz. was measured.
  • the measurement conditions were as follows: evaluation length: 4.0 mm, measurement speed: 0.3 mm / s, cut-off value: 0.8 mm.
  • Table 1 shows the surface roughness A of the base material before coating the hard coating, the surface roughness B before the smoothing treatment of the first hard coating, and the surface roughness C after the smoothing treatment of the first hard coating. And the measurement result of the surface roughness D after the smoothing process of a 2nd hard film is shown, respectively.
  • the example of the present invention in which the surface of the first hard film was smoothed has a lower erosion rate (%) than the comparative example in which the smoothing treatment of the present invention is not performed. It was confirmed that the damage was excellent.
  • the present invention examples 2 and 4 in which the maximum height Rz after polishing of the first film is 0.5 ⁇ m or less and the maximum height Rz after polishing of the second film is 0.6 ⁇ m or less are excellent. It showed good resistance to erosion.
  • FIG. 1 shows photographs of appearance observation with an optical microscope after evaluating the corrosion resistance of Examples 1 to 4 of the present invention. In the inventive examples 1 to 4 which showed excellent resistance to erosion, no erosion was confirmed at the tip and side portions.
  • FIG. 1 shows photographs of appearance observation with an optical microscope after evaluating the corrosion resistance of Examples 1 to 4 of the present invention. In the inventive examples 1 to 4 which showed excellent resistance to erosion, no erosion was confirmed at the tip and side portions.
  • the hard coating obtained by applying the production method of the present invention has a smooth surface roughness on the outermost surface of the coating and is excellent in resistance to melting. As shown in FIG. 1, almost no erosion pitting corrosion was confirmed on the surface of the film after the molten aluminum corrosion resistance evaluation test.
  • the hard coatings of Comparative Examples 1 and 2 subjected to shot blasting resulted in significantly poor resistance to melting.
  • the surface of the hard coating of Comparative Example 1 was roughened to increase the surface roughness value of the hard coating, and the surface of the hard coating of Comparative Example 2 was subjected to the smoothing treatment itself of the present invention on the first hard coating. As a result, the macro particles were not removed, and the surface roughness could not be reduced sufficiently.
  • Example 2 The substrate type, substrate polishing, and substrate bombardment conditions used in Example 2 were the same as in Example 1. Some substrates were previously subjected to nitriding treatment. Table 3 shows the types of the first hard film and the second hard film of Example 2 and the contents of the smoothing treatment. Detailed sample preparation conditions will be specifically described below.
  • the surface was cleaned by performing Ar bombardment treatment and Ti bombardment treatment. Thereafter, nitrogen gas is introduced, a bias voltage of ⁇ 120 V is applied to the base material, and the second hard film made of about 5.0 ⁇ m of CrSiBN under the base material temperature of 500 ° C. and the reaction gas pressure of 3.0 Pa. Was coated.
  • a target having a composition of Cr 92 Si 3 B 5 was used (numbers are atomic ratios, and so on). Then, the second hard film after coating was polished using an aero lapping apparatus, and then smoothed by polishing using a 3 ⁇ m diamond paste.
  • ⁇ Invention Sample Sample No. 12> A base material on which a nitride layer of about 100 ⁇ m was formed by nitriding was used. And it was the same as that of the example 10 of this invention until the coating of the 1st hard film. After the first hard film is coated, in order to smooth the surface of the first hard film by bombarding, the negative bias voltage applied to the substrate is set to ⁇ 500 V, and bombarding using Ar gas is performed. Conducted for 30 minutes. Thereafter, nitrogen gas is introduced, a bias voltage of ⁇ 120 V is applied to the base material, and the second hard film made of about 5.0 ⁇ m of CrSiBN under the base material temperature of 500 ° C. and the reaction gas pressure of 3.0 Pa. (The composition of the target was the same as in Example 10 of the present invention). Finally, the smoothing process described in Example 10 of the present invention was performed.
  • Example 12 A base material on which a nitride layer of about 100 ⁇ m was formed by nitriding was used.
  • the process up to the smoothing treatment of the first hard film was the same as Example 12 of the present invention.
  • nitrogen gas is introduced, a bias voltage of ⁇ 120 V is applied to the substrate, and the substrate temperature is 500 ° C. and the reaction gas pressure is 3.0 Pa.
  • the second hard film was coated with 0 ⁇ m CrN, followed by coating with about 4.0 ⁇ m CrSiBN (the target composition is the same as in Example 10 of the present invention).
  • the smoothing process described in Example 10 of the present invention was performed.
  • Example 10 of the present invention The process up to the first hard coating was the same as Example 10 of the present invention.
  • the negative bias voltage applied to the substrate is set to ⁇ 500 V, and bombarding using Ar gas is performed. Performed for 45 minutes.
  • nitrogen gas is introduced, a bias voltage of ⁇ 120 V is applied to the substrate, and the substrate temperature is 500 ° C. and the reaction gas pressure is 3.0 Pa.
  • the second hard film was coated with 0 ⁇ m CrN, followed by coating with about 4.0 ⁇ m CrSiBN (the target composition is the same as in Example 10 of the present invention). Finally, the smoothing process described in Example 10 of the present invention was performed.
  • Example 10 of the present invention The process up to the first hard coating was the same as Example 10 of the present invention.
  • the negative bias voltage applied to the substrate is set to ⁇ 500 V, and bombarding using Ar gas is performed. Conducted for 60 minutes.
  • nitrogen gas is introduced, a bias voltage of ⁇ 120 V is applied to the substrate, and the substrate temperature is 500 ° C. and the reaction gas pressure is 3.0 Pa.
  • a second hard film composed of 0 ⁇ m CrSiBN was coated (the composition of the target was the same as Example 10 of the present invention). Finally, the smoothing process described in Example 10 of the present invention was performed.
  • Example 17 The process up to the first hard coating was the same as Example 1 of the present invention.
  • the negative bias voltage applied to the substrate is set to ⁇ 500 V, and bombarding using Ar gas is performed. Conducted for 60 minutes.
  • nitrogen gas is introduced, a bias voltage of ⁇ 120 V is applied to the substrate, and the substrate temperature is 500 ° C. and the reaction gas pressure is 3.0 Pa.
  • a 0 ⁇ m CrN coating was applied, followed by a coating of about 4.0 ⁇ m CrSiBN (the composition of the target was the same as in Example 10 of the present invention), and a second hard coating was applied.
  • the smoothing process described in Example 10 of the present invention was performed.
  • Example 1 of the present invention The process up to the first hard coating was the same as Example 1 of the present invention.
  • the negative bias voltage applied to the substrate is set to ⁇ 700 V, and bombarding using Ar gas is performed. Conducted for 30 minutes.
  • nitrogen gas is introduced, a bias voltage of ⁇ 120 V is applied to the substrate, and the substrate temperature is 500 ° C. and the reaction gas pressure is 3.0 Pa.
  • a 0 ⁇ m CrN coating was applied, followed by a coating of about 4.0 ⁇ m CrSiBN (the composition of the target was the same as in Example 1 of the present invention), and a second hard coating was applied.
  • the smoothing process described in Example 10 of the present invention was performed.
  • Example Sample No. 10 Nitrogen gas was introduced into the furnace, a bias voltage of ⁇ 120 V was applied to the substrate, and about 5.0 ⁇ m of CrN was coated under the condition of a reaction gas pressure of 3.0 Pa, followed by about 5.0 ⁇ m of CrSiBN. Was coated. A target having a composition of Cr 92 Si 3 B 5 was used (numbers are atomic ratios, and so on). Finally, the smoothing process described in Example 10 of the present invention was performed.
  • Example Sample No. 11 Nitrogen gas was introduced into the furnace, a bias voltage of ⁇ 120 V was applied to the substrate, and TiAlN of about 13.0 ⁇ m was coated under the condition of a reaction gas pressure of 3.0 Pa. The composition of the target used was Ti 50 Al 50 . Finally, the smoothing process described in Example 10 of the present invention was performed.
  • Example Sample No. 12 A base material on which a nitride layer of about 100 ⁇ m was formed by nitriding was used. Nitrogen gas was introduced into the furnace, a bias voltage of ⁇ 120 V was applied to the base material, and under the conditions of a reaction gas pressure of 3.0 Pa, each film thickness was 10 nm or less, and VN and AlCrSiN were alternately laminated. A 0.0 ⁇ m laminated film was coated. The composition of the target used for coating the AlCrSiN was Al 60 Cr 37 Si 3 . Finally, the smoothing process described in Example 10 of the present invention was performed.
  • Example Sample No. 14 A base material on which a nitride layer of about 100 ⁇ m was formed by nitriding was used. In Comparative Example 14, the base material was only nitrided and no hard coating was provided. Finally, the smoothing process described in Example 10 of the present invention was performed.
  • ⁇ Surface roughness evaluation> the surface of the second hard film or the surface of the substrate was polished, and the arithmetic average roughness Ra was 0.04 ⁇ m and the maximum height Rz was 0.05 ⁇ m.
  • the surface roughness of the base material and the hard coating was evaluated using a contact surface roughness measuring device SURFCOM 480A manufactured by Tokyo Seimitsu Co., Ltd. according to JIS-B-0601-2001, with an evaluation length of 4.0 mm and a measurement speed of 0. Measurement was performed under the conditions of 3 mm / s and a cutoff value of 0.8 mm.
  • the example of the present invention in which the surface of the first hard film was smoothed has a lower erosion rate (%) than that of the comparative example that has not been smoothed, resulting in resistance to erosion. It was confirmed that it was excellent.
  • the inventive examples 10 and 11 polished and the bias voltage applied to the substrate at ⁇ 500 V in the smoothing step and the inventive examples 12 to 14 subjected to the argon bombardment for 30 minutes had a loss rate (%). ) was 0%, indicating excellent melt resistance.
  • Examples 11 to 14 of the present invention in which the base material was subjected to nitriding treatment had a melting rate of 0% and exhibited excellent resistance to melting.
  • FIG. 3 shows photographs of appearance observation with an optical microscope after the corrosion resistance evaluation of Examples 10 to 12 of the present invention.
  • FIG. 4 shows photographs of appearance observation with an optical microscope after evaluating the corrosion resistance of Examples 13 to 15 of the present invention.
  • FIG. 5 shows photographs of appearance observation with an optical microscope after the evaluation of the corrosion resistance of Examples 16 to 18 of the present invention.
  • Examples 10 to 14 of the present invention that showed particularly excellent resistance to erosion, no erosion was confirmed at the tip and side portions.
  • FIG. 6 shows photographs of external appearance observation with an optical microscope after the evaluation of the corrosion resistance of Comparative Examples 10 to 12.
  • FIG. 7 shows photographs of external observation using an optical microscope after the evaluation of the resistance to melting of Comparative Examples 13 and 14. In the comparative example, large melting damage was confirmed in both the tip portion and the side portion. It has been confirmed that the melt resistance is improved by performing a process of smoothing the surface of the first hard coating.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Molds, Cores, And Manufacturing Methods Thereof (AREA)

Abstract

　La présente invention concerne un procédé de fabrication d'un moule revêtu pour moulage sous pression, ledit moule étant exceptionnel en termes de résistance au grippage et de résistance à l'érosion par rapport au métal fondu. Ce procédé de fabrication d'un moule revêtu pour moulage sous pression comporte les étapes suivantes : une étape de revêtement de la surface du matériau de base d'un moule moulé sous pression avec un premier film de revêtement dur, par un procédé de placage ionique à l'arc; une étape de mise en œuvre d'un traitement permettant de niveler la surface du premier film de revêtement dur; et une étape de revêtement du premier film de revêtement dur nivelé avec un second film de revêtement dur, par un procédé de placage ionique à l'arc.
PCT/JP2015/073246 2014-08-20 2015-08-19 Procédé de fabrication de moule revêtu pour moulage sous pression WO2016027832A1 (fr)

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CN201580044403.9A CN106660110B (zh) 2014-08-20 2015-08-19 压铸用被覆模具的制造方法
KR1020177004008A KR101862526B1 (ko) 2014-08-20 2015-08-19 다이캐스트용 피복 금형의 제조 방법
JP2016544231A JP6274317B2 (ja) 2014-08-20 2015-08-19 ダイカスト用被覆金型の製造方法

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JP2022040425A (ja) * 2020-08-30 2022-03-11 Ｒｔｍ 株式会社 金型の冷却孔の表面処理方法
US20220290289A1 (en) * 2021-03-10 2022-09-15 Vapor Technologies, Inc. Pvd coatings for aluminum die casting molds

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KR20200106537A (ko) 2018-02-27 2020-09-14 히다찌긴조꾸가부시끼가이사 피복부재 및 그 제조 방법
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JPWO2016027832A1 (ja) 2017-04-27
KR101862526B1 (ko) 2018-05-29

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