WO2015111635A1 - 樹脂組成物 - Google Patents
樹脂組成物 Download PDFInfo
- Publication number
- WO2015111635A1 WO2015111635A1 PCT/JP2015/051575 JP2015051575W WO2015111635A1 WO 2015111635 A1 WO2015111635 A1 WO 2015111635A1 JP 2015051575 W JP2015051575 W JP 2015051575W WO 2015111635 A1 WO2015111635 A1 WO 2015111635A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- resin composition
- organic
- bisphenol
- type epoxy
- resin
- Prior art date
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- 239000011342 resin composition Substances 0.000 title claims abstract description 128
- 150000001875 compounds Chemical class 0.000 claims abstract description 55
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims abstract description 51
- 239000003822 epoxy resin Substances 0.000 claims abstract description 49
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 49
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 claims abstract description 46
- 239000004593 Epoxy Substances 0.000 claims abstract description 36
- 125000002723 alicyclic group Chemical group 0.000 claims abstract description 27
- 239000000945 filler Substances 0.000 claims abstract description 19
- 239000003505 polymerization initiator Substances 0.000 claims abstract description 15
- -1 ether compound Chemical class 0.000 claims description 126
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 40
- 238000007789 sealing Methods 0.000 claims description 25
- 239000000853 adhesive Substances 0.000 claims description 23
- 230000001070 adhesive effect Effects 0.000 claims description 22
- 239000003381 stabilizer Substances 0.000 claims description 20
- 238000004519 manufacturing process Methods 0.000 claims description 19
- 125000003118 aryl group Chemical group 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 14
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 10
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 10
- 238000002156 mixing Methods 0.000 claims description 10
- 238000001723 curing Methods 0.000 claims description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 6
- 239000003795 chemical substances by application Substances 0.000 claims description 5
- 239000002274 desiccant Substances 0.000 claims description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 4
- 239000011261 inert gas Substances 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 229910052786 argon Inorganic materials 0.000 claims description 2
- 238000010908 decantation Methods 0.000 claims description 2
- 238000004821 distillation Methods 0.000 claims description 2
- 238000001914 filtration Methods 0.000 claims description 2
- 238000004108 freeze drying Methods 0.000 claims description 2
- 239000007789 gas Substances 0.000 claims description 2
- 238000000746 purification Methods 0.000 claims description 2
- 238000007664 blowing Methods 0.000 claims 1
- 239000008393 encapsulating agent Substances 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 230000006866 deterioration Effects 0.000 abstract description 20
- 125000004432 carbon atom Chemical group C* 0.000 description 61
- 125000000217 alkyl group Chemical group 0.000 description 24
- 239000002245 particle Substances 0.000 description 18
- 238000000034 method Methods 0.000 description 15
- 230000035699 permeability Effects 0.000 description 15
- 239000000203 mixture Substances 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- 150000003983 crown ethers Chemical class 0.000 description 9
- 239000003999 initiator Substances 0.000 description 9
- 229910052711 selenium Inorganic materials 0.000 description 9
- 239000011669 selenium Substances 0.000 description 9
- 125000002947 alkylene group Chemical group 0.000 description 8
- 125000000753 cycloalkyl group Chemical group 0.000 description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 8
- 238000003860 storage Methods 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 7
- 125000003700 epoxy group Chemical group 0.000 description 7
- 239000010419 fine particle Substances 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 6
- 239000000460 chlorine Substances 0.000 description 6
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 6
- 238000005227 gel permeation chromatography Methods 0.000 description 6
- 125000000623 heterocyclic group Chemical group 0.000 description 6
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 6
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 6
- 238000000016 photochemical curing Methods 0.000 description 6
- 239000003504 photosensitizing agent Substances 0.000 description 6
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 5
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 5
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- 229910052801 chlorine Inorganic materials 0.000 description 5
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 5
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 5
- 238000009826 distribution Methods 0.000 description 5
- 229910052736 halogen Inorganic materials 0.000 description 5
- 125000001624 naphthyl group Chemical group 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 5
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 125000000129 anionic group Chemical group 0.000 description 4
- 238000012663 cationic photopolymerization Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 238000011049 filling Methods 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 150000002367 halogens Chemical class 0.000 description 4
- 150000002391 heterocyclic compounds Chemical class 0.000 description 4
- MGFYSGNNHQQTJW-UHFFFAOYSA-N iodonium Chemical compound [IH2+] MGFYSGNNHQQTJW-UHFFFAOYSA-N 0.000 description 4
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 4
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 4
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 239000003208 petroleum Substances 0.000 description 4
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 4
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 4
- 229920001296 polysiloxane Polymers 0.000 description 4
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 4
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 3
- IOSONAGXTXMCDY-UHFFFAOYSA-N 4-(benzylsulfanylmethyl)phenol Chemical compound C1=CC(O)=CC=C1CSCC1=CC=CC=C1 IOSONAGXTXMCDY-UHFFFAOYSA-N 0.000 description 3
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- DXIYJLVGNSDKDI-UHFFFAOYSA-N [4-(4-benzoylphenyl)sulfanylphenyl]-diphenylsulfanium Chemical compound C=1C=C(SC=2C=CC(=CC=2)[S+](C=2C=CC=CC=2)C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 DXIYJLVGNSDKDI-UHFFFAOYSA-N 0.000 description 3
- DAAHGUZODNTQGA-UHFFFAOYSA-N [4-[4-bis(4-fluorophenyl)sulfoniophenyl]sulfanylphenyl]-bis(4-fluorophenyl)sulfanium Chemical compound C1=CC(F)=CC=C1[S+](C=1C=CC(SC=2C=CC(=CC=2)[S+](C=2C=CC(F)=CC=2)C=2C=CC(F)=CC=2)=CC=1)C1=CC=C(F)C=C1 DAAHGUZODNTQGA-UHFFFAOYSA-N 0.000 description 3
- 125000000641 acridinyl group Chemical group C1(=CC=CC2=NC3=CC=CC=C3C=C12)* 0.000 description 3
- 125000003342 alkenyl group Chemical group 0.000 description 3
- 125000000304 alkynyl group Chemical group 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical class C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000007822 coupling agent Substances 0.000 description 3
- 125000004093 cyano group Chemical group *C#N 0.000 description 3
- 150000004292 cyclic ethers Chemical class 0.000 description 3
- 125000004122 cyclic group Chemical group 0.000 description 3
- 235000014113 dietary fatty acids Nutrition 0.000 description 3
- OWZDULOODZHVCQ-UHFFFAOYSA-N diphenyl-(4-phenylsulfanylphenyl)sulfanium Chemical compound C=1C=C([S+](C=2C=CC=CC=2)C=2C=CC=CC=2)C=CC=1SC1=CC=CC=C1 OWZDULOODZHVCQ-UHFFFAOYSA-N 0.000 description 3
- 150000002170 ethers Chemical class 0.000 description 3
- 239000000194 fatty acid Substances 0.000 description 3
- 229930195729 fatty acid Natural products 0.000 description 3
- 150000004665 fatty acids Chemical class 0.000 description 3
- 229920000578 graft copolymer Polymers 0.000 description 3
- 150000004820 halides Chemical class 0.000 description 3
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 3
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 3
- 230000014759 maintenance of location Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910001507 metal halide Inorganic materials 0.000 description 3
- 150000005309 metal halides Chemical class 0.000 description 3
- 239000002808 molecular sieve Substances 0.000 description 3
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 3
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- NKIFVPLJBNCZFN-UHFFFAOYSA-N phenacyl(diphenyl)sulfanium Chemical compound C=1C=CC=CC=1C(=O)C[S+](C=1C=CC=CC=1)C1=CC=CC=C1 NKIFVPLJBNCZFN-UHFFFAOYSA-N 0.000 description 3
- 125000001484 phenothiazinyl group Chemical group C1(=CC=CC=2SC3=CC=CC=C3NC12)* 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- 229920001451 polypropylene glycol Polymers 0.000 description 3
- 125000004309 pyranyl group Chemical group O1C(C=CC=C1)* 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 3
- 125000005409 triarylsulfonium group Chemical group 0.000 description 3
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 3
- 125000001834 xanthenyl group Chemical group C1=CC=CC=2OC3=CC=CC=C3C(C12)* 0.000 description 3
- 229910052724 xenon Inorganic materials 0.000 description 3
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 3
- QKAIFCSOWIMRJG-UHFFFAOYSA-N (4-methylphenyl)-(4-propan-2-ylphenyl)iodanium Chemical compound C1=CC(C(C)C)=CC=C1[I+]C1=CC=C(C)C=C1 QKAIFCSOWIMRJG-UHFFFAOYSA-N 0.000 description 2
- VQVGJEIVVJBMCV-UHFFFAOYSA-N (4-octoxyphenyl)-phenyliodanium Chemical compound C1=CC(OCCCCCCCC)=CC=C1[I+]C1=CC=CC=C1 VQVGJEIVVJBMCV-UHFFFAOYSA-N 0.000 description 2
- YBQHLCCONMXKNT-UHFFFAOYSA-N (9-oxothioxanthen-2-yl)-diphenylsulfanium Chemical compound C1=C2C(=O)C3=CC=CC=C3SC2=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 YBQHLCCONMXKNT-UHFFFAOYSA-N 0.000 description 2
- VFTFKUDGYRBSAL-UHFFFAOYSA-N 15-crown-5 Chemical compound C1COCCOCCOCCOCCO1 VFTFKUDGYRBSAL-UHFFFAOYSA-N 0.000 description 2
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical group C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 2
- XEZNGIUYQVAUSS-UHFFFAOYSA-N 18-crown-6 Chemical compound C1COCCOCCOCCOCCOCCO1 XEZNGIUYQVAUSS-UHFFFAOYSA-N 0.000 description 2
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- 125000001255 4-fluorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1F 0.000 description 2
- OZJPLYNZGCXSJM-UHFFFAOYSA-N 5-valerolactone Chemical compound O=C1CCCCO1 OZJPLYNZGCXSJM-UHFFFAOYSA-N 0.000 description 2
- KSMGAOMUPSQGTB-UHFFFAOYSA-N 9,10-dibutoxyanthracene Chemical compound C1=CC=C2C(OCCCC)=C(C=CC=C3)C3=C(OCCCC)C2=C1 KSMGAOMUPSQGTB-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- MDAMDUOJVXLIDB-UHFFFAOYSA-N C1=CC(O)=CC=C1CSCC(=O)C1=CC=CC=C1 Chemical compound C1=CC(O)=CC=C1CSCC(=O)C1=CC=CC=C1 MDAMDUOJVXLIDB-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 2
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 229930192627 Naphthoquinone Natural products 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 208000034189 Sclerosis Diseases 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
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- HKDYXDHJQBAOAC-UHFFFAOYSA-N trinaphthalen-2-ylsulfanium Chemical compound C1=CC=CC2=CC([S+](C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 HKDYXDHJQBAOAC-UHFFFAOYSA-N 0.000 description 1
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- AXYQQAVHPAUFQX-UHFFFAOYSA-N tris(2-methylphenyl)sulfanium Chemical compound CC1=CC=CC=C1[S+](C=1C(=CC=CC=1)C)C1=CC=CC=C1C AXYQQAVHPAUFQX-UHFFFAOYSA-N 0.000 description 1
- XUWXFPUSCUUNPR-UHFFFAOYSA-O tris(4-hydroxyphenyl)sulfanium Chemical compound C1=CC(O)=CC=C1[S+](C=1C=CC(O)=CC=1)C1=CC=C(O)C=C1 XUWXFPUSCUUNPR-UHFFFAOYSA-O 0.000 description 1
- WUKMCKCDYKBLBG-UHFFFAOYSA-N tris(4-methoxyphenyl)sulfanium Chemical compound C1=CC(OC)=CC=C1[S+](C=1C=CC(OC)=CC=1)C1=CC=C(OC)C=C1 WUKMCKCDYKBLBG-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/02—Polycondensates containing more than one epoxy group per molecule
- C08G59/025—Polycondensates containing more than one epoxy group per molecule characterised by the purification methods used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/02—Polycondensates containing more than one epoxy group per molecule
- C08G59/04—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof
- C08G59/06—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols
- C08G59/063—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols with epihalohydrins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/226—Mixtures of di-epoxy compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/32—Epoxy compounds containing three or more epoxy groups
- C08G59/3209—Epoxy compounds containing three or more epoxy groups obtained by polymerisation of unsaturated mono-epoxy compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/4007—Curing agents not provided for by the groups C08G59/42 - C08G59/66
- C08G59/4085—Curing agents not provided for by the groups C08G59/42 - C08G59/66 silicon containing compounds
-
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- C08K5/00—Use of organic ingredients
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- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/15—Heterocyclic compounds having oxygen in the ring
- C08K5/151—Heterocyclic compounds having oxygen in the ring having one oxygen atom in the ring
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- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5415—Silicon-containing compounds containing oxygen containing at least one Si—O bond
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J163/00—Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having a potential-jump barrier or a surface barrier
- H10K10/80—Constructional details
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2305/00—Condition, form or state of the layers or laminate
- B32B2305/30—Fillers, e.g. particles, powders, beads, flakes, spheres, chips
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/20—Displays, e.g. liquid crystal displays, plasma displays
- B32B2457/206—Organic displays, e.g. OLED
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/38—Layered products comprising a layer of synthetic resin comprising epoxy resins
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
- C08G59/687—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used containing sulfur
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- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
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- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/842—Containers
- H10K50/8426—Peripheral sealing arrangements, e.g. adhesives, sealants
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Definitions
- the present invention relates to a resin composition.
- the present invention relates to an adhesive and a cured body used for sealing an organic EL element.
- Organic EL elements are attracting attention as element bodies capable of high luminance light emission.
- the light emission characteristics deteriorate due to deterioration due to moisture.
- Patent Document 4 An energy ray curable resin composition that satisfies the curability, adhesiveness, and storage stability has been proposed.
- Patent Documents 5 to 7 also describe various resin compositions.
- Patent Document 8 the moisture content of a filling layer made of a thermosetting resin material (not cured by ultraviolet irradiation) for sealing an organic EL element is set to 0.01 wt% or less.
- Patent Document 8 also describes that the moisture content of the peripheral sealing layer made of an ultraviolet curable resin material for sealing an organic EL element is set to 0.1 wt% or less.
- Patent Document 9 describes a photosensitive additive adhesive having a hydrolyzable chlorine content of 100 ppm or less.
- Patent Document 10 describes a liquid crystal sealant having a hydrolyzable chlorine content of 600 ppm or less.
- Patent Document 1 when mass production is performed, a method is adopted in which an organic EL element is sandwiched between substrates having low moisture permeability, such as glass, and the outer peripheral portion is sealed. In this case, since this structure is a hollow sealing structure, there is a problem that moisture cannot be prevented from entering the hollow sealing structure, leading to deterioration of the organic EL element.
- Patent Documents 2 and 3 since these resin compositions have high moisture permeability, the organic EL element is deteriorated, and since sufficient adhesive force cannot be secured, the organic EL element is peeled off. There was a problem. Further, since metal is deposited on the organic EL element, there is a problem that the organic EL element deteriorates due to metal corrosion.
- Patent Document 4 various photopolymerization initiators are used without selecting a specific type of photopolymerization initiator such as bis- (4-t-butyl-phenyl) -iodonium-tris (trifluoromethanesulfonyl) methide.
- a specific type of photopolymerization initiator such as bis- (4-t-butyl-phenyl) -iodonium-tris (trifluoromethanesulfonyl) methide.
- a specific type of photopolymerization initiator such as bis- (4-t-butyl-phenyl) -iodonium-tris (trifluoromethanesulfonyl) methide.
- Patent Documents 5 to 7 are resin compositions used for other purposes in the first place, and there is no description about defining the amount of water.
- Patent Document 8 defines the amount of water, but an overcoat layer containing an olefin resin or a cyclic olefin resin mainly composed of carbon and hydrogen, and an epoxy-based thermosetting resin material (not cured by ultraviolet irradiation). Since the filling layer including the peripheral sealing layer including the epoxy-based ultraviolet curable resin material is combined, the adhesiveness, adhesion durability, etc. are not sufficient, and the sealing process of the organic EL element is complicated There was a problem.
- Patent Documents 9 to 10 each specify the amount of chlorine, but are resin compositions used for other purposes in the first place, and there is no description about specifying the amount of water.
- Patent Documents 11 to 12 describe that crown ether is added to a sealant for an organic EL element or a photocurable resin composition for a touch panel, but there is no description about defining the amount of moisture.
- This invention is made
- the present invention comprises (A) an alicyclic epoxy compound, (B) a bisphenol A type epoxy resin, (C) a bisphenol F type epoxy resin, and (D) a photocationic polymerization initiator, and
- the (B) bisphenol A type epoxy resin and the (C) bisphenol F type epoxy resin are compounds that do not have the (A) alicyclic epoxy compound,
- the resin composition has a water content of 1000 ppm or less. When this resin composition is used for sealing an organic EL element, the organic EL element is hardly deteriorated.
- the present invention also includes (A) an alicyclic epoxy compound, (B) a bisphenol A type epoxy resin, (C) a bisphenol F type epoxy resin, and (D) a photocationic polymerization initiator, And,
- the (B) bisphenol A type epoxy resin and the (C) bisphenol F type epoxy resin are compounds that do not have the (A) alicyclic epoxy compound, (H)
- the resin composition further contains a filler and has a water content of 50 ppm or more. Even if this resin composition contains a large amount of water in a resin composition that has not been considered in the past, it is difficult to deteriorate the organic EL element when used for sealing an organic EL element. Can do.
- the resin composition further contains (E) a stabilizer.
- the stabilizer is an ether compound.
- the stabilizer is a cyclic ether compound.
- the resin composition further contains (F) a silane coupling agent.
- it is a resin composition further containing (G) a sensitizer.
- the water content is 50 ppm or more and 700 ppm or less.
- the shear viscosity of the resin composition is 5 mPa ⁇ s or more and 2000 mPa ⁇ s or less at 25 ° C.
- said resin composition is 1 aspect of this invention
- the adhesive agent of this invention, the sealing agent for organic EL elements, a hardening body, an organic EL apparatus, a display, those manufacturing methods, etc. have the same structure and Has an effect.
- the deterioration of the organic EL element can be suppressed.
- the energy ray curable resin composition means a resin composition that can be cured by irradiation with energy rays.
- the energy rays mean energy rays typified by ultraviolet rays and visible rays.
- an energy beam curable resin composition is preferable.
- the energy ray curable resin composition contains (A) an alicyclic epoxy compound, (B) a bisphenol A type epoxy resin, (C) a bisphenol F type epoxy resin, and (D) a photocationic polymerization initiator. To do.
- the (B) bisphenol A type epoxy resin and the (C) bisphenol F type epoxy resin are compounds having no (A) alicyclic epoxy compound.
- the resin composition of this embodiment contains (A) an alicyclic epoxy compound.
- the resin composition of the present embodiment exhibits excellent adhesion, low moisture permeability, adhesion durability, and photocurability.
- an alicyclic epoxy compound a compound having at least one cyclohexene or cycloalkane ring such as cyclopentene ring or pinene ring is epoxidized with an appropriate oxidizing agent such as hydrogen peroxide or peracid. Or a derivative thereof, a hydrogenated epoxy compound obtained by hydrogenating an aromatic epoxy compound such as a bisphenol A type epoxy compound, or a compound having a cycloalkane ring so as to have a glycidyl ether structure by epichlorohydrin or the like. And the like. These compounds may be used alone or in combination of two or more.
- an alicyclic epoxy compound does not have an aromatic group.
- the alicyclic epoxy compound is not particularly limited, but may be within one molecule such as 3,4-epoxycyclohexenylmethyl-3 ′, 4′-epoxycyclohexenecarboxylate, 3,4-epoxycyclohexylmethyl (meth) acrylate, and the like.
- Examples thereof include alicyclic epoxy compounds having one or more epoxy groups and one or more ester groups, and epoxy compounds having a dicyclopentadiene structure.
- an alicyclic epoxy compound containing one or more epoxy groups and one or more ester groups in one molecule is more preferable in terms of excellent adhesiveness and photocurability.
- the molecular weight of the alicyclic epoxy compound is preferably 450 or less, more preferably 400 or less, still more preferably less than 300, and even more preferably 100 to 280 from the viewpoint of moisture permeability and storage stability.
- Molecular weight refers to number average molecular weight.
- the molecular weight is a polystyrene-equivalent number average molecular weight measured by GPC (gel permeation chromatography). For example, measurement is performed under the following conditions.
- Solvent (mobile phase): THF Deaerator: ERC-3310 manufactured by ERMA Pump: JA-SCO, PU-980 Flow rate 1.0ml / min Autosampler: AS-8020 manufactured by Tosoh Corporation Column oven: Hitachi L-5030 Set temperature 40 °C Column configuration: Tosoh TSK guard column MP ( ⁇ L) 6.0 mm ID x 4.0 cm 2 and Tosoh TSK-GELMULTIPORE HXL-M 7.8 mm ID x 30.0 cm x 2, Detector in total: RI Hitachi, Ltd. L-3350 Data processing: SIC480 data station
- the amount of component (A) used is 5 parts by mass in the total of 100 parts by mass of (A), (B) and (C) in terms of workability, photocurability, adhesiveness, moisture permeability and adhesion durability.
- the above is preferable, 10 parts by mass or more is more preferable, 30 parts by mass or more is still more preferable, and 40 parts by mass or more is most preferable.
- the amount of component (A) used is 95 parts by mass in total 100 parts by mass of (A), (B), and (C) in terms of workability, photocurability, adhesion, moisture permeability, and adhesion durability.
- the following is preferable, 90 parts by mass or less is more preferable, 80 parts by mass or less is still more preferable, and 70 parts by mass or less is most preferable.
- the resin composition of this embodiment contains (B) bisphenol A type epoxy resin.
- the bisphenol A type epoxy resin is obtained by condensing bisphenol A and epichlorohydrin in the presence of an alkali catalyst, for example. Furthermore, you may use the modified
- the molecular weight of the bisphenol A type epoxy resin is preferably from 100 to 5,000, more preferably from 150 to 1,000, and most preferably from 200 to 450 in terms of moisture permeability and the like.
- the molecular weight refers to the number average molecular weight.
- a polystyrene-equivalent number average molecular weight measured by GPC (gel permeation chromatography) was used.
- the resin composition of this embodiment contains (C) bisphenol F type epoxy resin.
- the bisphenol F type epoxy resin which has an alicyclic epoxy compound is not contained in (C) bisphenol F type epoxy resin.
- the bisphenol F type epoxy resin refers to, for example, one obtained by condensing bisphenol F and epichlorohydrin in the presence of an alkali catalyst. Furthermore, you may use the modified
- the molecular weight of the bisphenol F type epoxy resin is preferably 100 to 5000, more preferably 150 to 1000, and most preferably 200 to 450 in terms of moisture permeability and the like.
- the molecular weight refers to the number average molecular weight.
- a polystyrene-equivalent number average molecular weight measured by GPC (gel permeation chromatography) was used.
- the resin composition of the present embodiment contains (D) a cationic photopolymerization initiator.
- the resin composition of the present embodiment can be cured by irradiation with energy rays such as ultraviolet rays.
- the photocationic polymerization initiator is not particularly limited, but arylsulfonium salt derivatives (for example, Cyracure UVI-6990, Cyracure UVI-6974, manufactured by Dow Chemical Co., Ltd., and Adekaoptomer SP manufactured by Asahi Denka Kogyo Co., Ltd.) -150, Adekaoptomer SP-152, Adekaoptomer SP-170, Adekaoptomer SP-172, CPI-100P, CPI-101A, CPI-200K, CPI-210S, LW-S1, double bond manufactured by San Apro Ciba Cure 1190, etc.), aryl iodonium salt derivatives (eg, Irgacure 250, Ciba Specialty Chemicals, RP-2074, Rhodia Japan), allene-ion complex derivatives, diazonium salt derivatives, triazine initiators And Acid generators such as other halides.
- arylsulfonium salt derivatives for example
- A is an element having a valence m of Group VIA to Group VIIA.
- M 1 to 2.
- n 0 to 3, m and n are preferably integers.
- R represents an organic group bonded to A.
- D represents It is a structure shown by the following formula (2), (In the formula (2), E represents a divalent group, and G represents —O—, —S—, —SO—, —SO 2 —, —NH—, —NR′—, —CO—, —COO.
- a + 1 E And a G may be the same or different, a is preferably an integer, where R ′ is the same as defined above, X ⁇ is an onium counterion, and the number thereof is one molecule. N + 1 per hit.)
- the onium ion of the compound of the formula (1) is not particularly limited, but 4- (phenylthio) phenyldiphenylsulfonium, bis [4- (diphenylsulfonio) phenyl] sulfide, bis [4- ⁇ bis [4- (2-hydroxy Ethoxy) phenyl] sulfonio ⁇ phenyl] sulfide, bis ⁇ 4- [bis (4-fluorophenyl) sulfonio] phenyl ⁇ sulfide, 4- (4-benzoyl-2-chlorophenylthio) phenylbis (4-fluorophenyl) sulfonium, 4- (4-Benzoylphenylthio) phenyldiphenylsulfonium, 7-isopropyl-9-oxo-10-thia-9,10-dihydroanthracen-2-yldi-p-tolylsulfon
- R is an organic group bonded to A, and is an aryl group having 6 to 30 carbon atoms, a heterocyclic group having 4 to 30 carbon atoms, an alkyl group having 1 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, or Represents an alkynyl group having 2 to 30 carbon atoms, and these are alkyl, hydroxy, alkoxy, alkylcarbonyl, arylcarbonyl, alkoxycarbonyl, aryloxycarbonyl, arylthiocarbonyl, acyloxy, arylthio, alkylthio, aryl, heterocycle, aryloxy, It may be substituted with at least one selected from the group consisting of alkylsulfinyl, arylsulfinyl, alkylsulfonyl, arylsulfonyl, alkyleneoxy, amino, cyano, nitro groups and halogen.
- the number of R is m + n (m ⁇ 1) +1, which may be the same as or different from each other. Further, two or more R's are directly or —O—, —S—, —SO—, —SO 2 —, —NH—, —NR′—, —CO—, —COO—, —CONH—, carbon number A ring structure containing element A may be formed by bonding via 1 to 3 alkylene groups or phenylene groups.
- R ′ is an alkyl group having 1 to 5 carbon atoms or an aryl group having 6 to 10 carbon atoms.
- aryl groups having 6 to 30 carbon atoms include monocyclic aryl groups such as phenyl groups and condensed naphthyl, anthracenyl, phenanthrenyl, pyrenyl, chrysenyl, naphthacenyl, benzanthracenyl, anthraquinolyl, fluorenyl, naphthoquinone, anthraquinone, etc. And a polycyclic aryl group.
- heterocyclic group having 4 to 30 carbon atoms examples include cyclic groups containing 1 to 3 heteroatoms such as oxygen, nitrogen and sulfur, which may be the same or different.
- a monocyclic heterocyclic group such as thienyl, furanyl, pyranyl, pyrrolyl, oxazolyl, thiazolyl, pyridyl, pyrimidyl, pyrazinyl and indolyl, benzofuranyl, isobenzofuranyl, benzothienyl, isobenzothienyl, quinolyl, isoquinolyl, quinoxalinyl, quinazolinyl , Carbazolyl, acridinyl, phenothiazinyl, phenazinyl, xanthenyl, thiantenyl, phenoxazinyl, phenoxathinyl, chromanyl, isochromanyl, dibenzothienyl
- alkyl group having 1 to 30 carbon atoms examples include methyl, ethyl, propyl, butyl, pentyl, octyl, decyl, dodecyl, tetradecyl, hexadecyl, octadecyl and the like, isopropyl, isobutyl, sec-butyl, tert-butyl Branched alkyl groups such as isopentyl, neopentyl, tert-pentyl, isohexyl, cycloalkyl groups such as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, benzyl, naphthylmethyl, anthracenylmethyl, 1-phenylethyl, 2-phenylethyl Such an aralkyl group is exemplified.
- alkenyl group having 2 to 30 carbon atoms examples include vinyl, allyl, 1-propenyl, isopropenyl, 1-butenyl, 2-butenyl, 3-butenyl, 1-methyl-1-propenyl, and 1-methyl-2- Propenyl, 2-methyl-1-propenyl, 2-methyl-2-propenyl, 1-pentenyl, 2-pentenyl, 3-pentenyl, 4-pentenyl, 1-methyl-1-butenyl, 2-methyl-2-butenyl, Linear or branched such as 3-methyl-2-butenyl, 1,2-dimethyl-1-propenyl, 1-decenyl, 2-decenyl, 8-decenyl, 1-dodecenyl, 2-dodecenyl, 10-dodecenyl, etc. Cycloalkenyl groups such as 2-cyclohexenyl and 3-cyclohexenyl, and arylalkenyl groups such as styl
- the alkynyl group having 2 to 30 carbon atoms includes ethynyl, 1-propynyl, 2-propynyl, 1-butynyl, 2-butynyl, 3-butynyl, 1-methyl-2-propynyl, 1,1-dimethyl-2 -Linear or branched such as propynyl, 1-pentynyl, 2-pentynyl, 3-pentynyl, 4-pentynyl, 1-decynyl, 2-decynyl, 8-decynyl, 1-dodecynyl, 2-dodecynyl, 10-dodecynyl, etc.
- arylalkynyl groups such as phenylethynyl.
- the aryl group having 6 to 30 carbon atoms, the heterocyclic group having 4 to 30 carbon atoms, the alkyl group having 1 to 30 carbon atoms, the alkenyl group having 2 to 30 carbon atoms, or the alkynyl group having 2 to 30 carbon atoms is at least 1
- the substituent may include a linear alkyl group having 1 to 18 carbon atoms such as methyl, ethyl, propyl, butyl, pentyl, octyl, decyl, dodecyl, tetradecyl, hexadecyl, okdadecyl, and the like.
- Branched alkyl groups having 1 to 18 carbon atoms such as isopropyl, isobutyl, sec-butyl, tert-butyl, isopentyl, neopentyl, tert-pentyl and isohexyl; cycloalkyl having 3 to 18 carbon atoms such as cyclopropyl, cyclobutyl, cyclopentyl and cyclohexyl Group; hydroxy group; methoxy, ethoxy, propoxy, isopropoxy, Straight chain or branched alkoxy groups having 1 to 18 carbon atoms such as tooxy, isobutoxy, sec-butoxy, tert-butoxy, hexyloxy, decyloxy, dodecyloxy; acetyl, propionyl, butanoyl, 2-methylpropionyl, heptanoyl, 2-methyl Straight or branched alkylcarbonyl groups having 2 to 18 carbon atoms
- Arylthiocarbonyl group having 7 to 11 carbon atoms acetoxy, ethylcarbonyloxy, propylcarbonyloxy, isopropylcarbonyloxy, butylcarbonyloxy, isobutylcarbonyloxy, sec-butylcarbonyloxy, tert-butylcarbonyloxy, octylcarbonyloxy, tetra Linear or branched acyloxy groups having 2 to 19 carbon atoms such as decylcarbonyloxy and octadecylcarbonyloxy; phenylthio, 2-methylphenylthio, 3-methyl Ruphenylthio, 4-methylphenylthio, 2-chlorophenylthio, 3-chlorophenylthio, 4-chlorophenylthio, 2-bromophenylthio, 3-bromophenylthio, 4-bromophenylthio, 2-fluorophenylthio, 3-fluoro
- alkyl having 1 to 5 carbon atoms and / or aryl having 6 to 10 carbon atoms specifically examples include methyl, Linear alkyl groups such as ethyl, propyl, butyl and pentyl; branched alkyl groups such as isopropyl, isobutyl, sec-butyl, tert-butyl, isopentyl, neopentyl and tert-pentyl; cycloalkyl groups such as cyclopropyl, cyclobutyl and cyclopentyl
- the aryl group having 6 to 10 carbon atoms include phenyl and naphthyl); cyano group; nitro group; halogen such as fluorine, chlorine, bromine and iodine.
- R's are each directly or —O—, —S—, —SO—, —SO 2 —, —NH—, —NR′— (R ′ represents an alkyl group having 1 to 5 carbon atoms or a carbon number 6 to 10 aryl groups.
- alkyl group having 1 to 5 carbon atoms include linear alkyl groups such as methyl, ethyl, propyl, butyl and pentyl; isopropyl, isobutyl, sec-butyl, tert-butyl, isopentyl, neopentyl, tert-pentyl and the like Branched alkyl groups; cycloalkyl groups such as cyclopropyl, cyclobutyl, cyclopentyl and the like.
- aryl group having 6 to 10 carbon atoms include phenyl, naphthyl and the like), —CO—, —COO—, —CONH—, an alkylene or phenylene group having 1 to 3 carbon atoms, and Examples of forming a ring structure containing element A include the following.
- A is an element of VIA group to VIIA group (CAS notation)
- L is —O—, —S—, —SO—, —SO 2 —, —NH—, —NR′—, —CO—, —COO— , -CONH-.
- R ′ is the same as described above.
- m + n (m ⁇ 1) +1 R bonded to the element A of the valence m group VIA to VIIA may be the same or different from each other.
- At least one of R, more preferably all of R is an optionally substituted aryl having 6 to 30 carbon atoms or a heterocyclic group having 4 to 30 carbon atoms.
- E in the formula (2) is a linear, branched or cyclic alkylene group having 1 to 8 carbon atoms such as methylene, ethylene and propylene; arylene having 6 to 20 carbon atoms such as phenylene, xylylene, naphthylene, biphenylene and anthracenylene.
- the divalent group of the heterocyclic compound refers to a divalent group formed by removing one hydrogen atom from two different ring carbon atoms of the heterocyclic compound.
- the above-mentioned alkylene group, arylene group or divalent group of the heterocyclic compound may have at least one substituent, and specific examples of the substituent include methyl, ethyl, propyl, butyl, pentyl, octyl and the like.
- G in the formula (2) is —O—, —S—, —SO—, —SO 2 —, —NH—, —NR′— (R ′ is the same as above), —CO—, —COO—, —CONH— represents an alkylene or phenylene group having 1 to 3 carbon atoms.
- alkylene group having 1 to 3 carbon atoms include linear or branched alkylene groups such as methylene, ethylene and propylene.
- a in the formula (2) is an integer of 0 to 5.
- a + 1 E and a G may be the same as or different from each other.
- N in the formula (1) represents the number of repeating units of the [DA + R m-1 ] bond, and is preferably an integer of 0 to 3.
- Preferred examples of the onium ion [A + ] in the formula (1) include sulfonium, iodonium, and selenium. Typical examples include the following.
- sulfonium ions include triphenylsulfonium, tri-p-tolylsulfonium, tri-o-tolylsulfonium, tris (4-methoxyphenyl) sulfonium, 1-naphthyldiphenylsulfonium, 2-naphthyldiphenylsulfonium, tris (4-fluorophenyl) ) Sulfonium, tri-1-naphthylsulfonium, tri-2-naphthylsulfonium, tris (4-hydroxyphenyl) sulfonium, 4- (phenylthio) phenyldiphenylsulfonium, 4- (p-tolylthio) phenyldi-p-tolylsulfonium, 4 -(4-methoxyphenylthio) phenylbis (4-methoxyphenyl) sulfonium, 4-
- Examples of the iodonium ion include diphenyliodonium, di-p-tolyliodonium, bis (4-dodecylphenyl) iodonium, bis (4-methoxyphenyl) iodonium, (4-octyloxyphenyl) phenyliodonium, bis (4-decyloxyphenyl) ) Iodonium, 4- (2-hydroxytetradecyloxy) phenylphenyliodonium, 4-isopropylphenyl (p-tolyl) iodonium, isobutylphenyl (p-tolyl) iodonium, and the like.
- Selenium ions include triphenyl selenium, tri-p-tolyl selenium, tri-o-tolyl selenium, tris (4-methoxyphenyl) selenium, 1-naphthyldiphenyl selenium, tris (4-fluorophenyl) selenium, tri-1- Triaryl selenium such as naphthyl selenium, tri-2-naphthyl selenium, tris (4-hydroxyphenyl) selenium, 4- (phenylthio) phenyldiphenyl selenium, 4- (p-tolylthio) phenyldi-p-tolyl selenium; diphenylphenacyl Diaryl selenium such as selenium, diphenylbenzyl selenium, diphenylmethyl selenium; phenylmethylbenzyl selenium, 4-hydroxyphenylmethylbenzyl selenium, phenyl Monoaryl selenium such as ruphen
- sulfonium and iodonium preferred are triphenylsulfonium, tri-p-tolylsulfonium, 4- (phenylthio) phenyldiphenylsulfonium, bis [4- (diphenylsulfonio) phenyl.
- X ⁇ is a counter ion.
- the number is n + 1 per molecule.
- Halides such as a boron compound, a phosphorus compound, an antimony compound, an arsenic compound, and an alkylsulfonic acid compound, a metide compound, etc. are mentioned.
- halogen ions such as F ⁇ , Cl ⁇ , Br ⁇ and I ⁇ ; OH ⁇ ; ClO 4 ⁇ ; FSO 3 ⁇ , ClSO 3 ⁇ , CH 3 SO 3 ⁇ , C 6 H 5 SO 3 ⁇ , CF 3 SO Sulfonate ions such as 3 ⁇ ; sulfate ions such as HSO 4 ⁇ and SO 4 2 ⁇ ; carbonate ions such as HCO 3 ⁇ and CO 3 2 ⁇ ; H 2 PO 4 ⁇ , HPO 4 2 ⁇ , PO 4 Phosphate ions such as 3- ; Fluorophosphate ions such as PF 6 ⁇ , PF 5 OH ⁇ , and fluorinated alkyl fluorophosphate ions; BF 4 ⁇ , B (C 6 F 5 ) 4 ⁇ , B ( C 6 H 4 CF 3) 4 - borate ions such as; AlCl 4 -; BiF 6 -, and
- fluorinated alkyl fluorophosphate ion examples include a fluorinated alkyl fluorophosphate ion represented by the following formula (4) and the like.
- Rf represents an alkyl group substituted with a fluorine atom.
- the number b of Rf is 1 to 5, and is preferably an integer.
- the b Rf's may be the same or different.
- the number b of Rf is more preferably 2 to 4, and most preferably 2 to 3.
- Rf represents an alkyl group substituted with a fluorine atom, and preferably has 1 to 8 carbon atoms, more preferably 1 to 4 carbon atoms.
- alkyl group include linear alkyl groups such as methyl, ethyl, propyl, butyl, pentyl and octyl; branched alkyl groups such as isopropyl, isobutyl, sec-butyl and tert-butyl; and cyclopropyl, cyclobutyl, cyclopentyl and cyclohexyl.
- a cycloalkyl group etc. are mentioned.
- CF 3 CF 3 CF 2 , (CF 3 ) 2 CF, CF 3 CF 2 CF 2 , CF 3 CF 2 CF 2 CF 2 , (CF 3 ) 2 CFCF 2 , CF 3 CF 2 (CF 3 ) CF, (CF 3 ) 3 C and the like.
- preferred fluorinated alkyl fluorophosphate anions include [(CF 3 CF 2 ) 2 PF 4 ] ⁇ , [(CF 3 CF 2 ) 3 PF 3 ] ⁇ , [((CF 3 ) 2 CF) 2 PF 4 ] ⁇ , [((CF 3 ) 2 CF) 3 PF 3 ] ⁇ , [(CF 3 CF 2 CF 2 ) 2 PF 4 ] ⁇ , [(CF 3 CF 2 CF 2 ) 3 PF 3 ] ⁇ , [ ((CF 3 ) 2 CFCF 2 ) 2 PF 4 ] ⁇ , [((CF 3 ) 2 CFCF 2 ) 3 PF 3 ] ⁇ , [(CF 3 ) 2 CFCF 2 ) 2 PF 4 ] ⁇ and [( CF 3 CF 2 CF 2 CF 2 ) 3 PF 3 ] — and the like.
- the cationic photopolymerization initiator one that has been previously dissolved in a solvent may be used in order to facilitate dissolution in an epoxy compound or an epoxy resin.
- the solvent include alcohols such as methanol, ethanol, n-propyl alcohol, isopropyl alcohol, n-butanol and isobutanol; acetone, methyl ethyl ketone, methyl isobutyl ketone, methyl n-butyl ketone, methyl n-propyl ketone, cyclohexane Ketones such as pentanone and cyclohexanone; ethers such as diethyl ether, ethyl-tert-butyl ether, tetrahydrofuran, 1,3-dioxane, 1,4-dioxane; propylene carbonate, ethylene carbonate, 1,2-butylene carbonate, dimethyl Carbonates such as carbonate and diethyl carbonate;
- photocationic polymerization initiators may be used alone or in combination of two or more.
- anionic species of the cationic photopolymerization initiator include halides such as boron compounds, phosphorus compounds, antimony compounds, arsenic compounds, and alkyl sulfonic acid compounds. These anionic species may be used alone or in combination of two or more. Among these, fluorides are preferable because they are excellent in photocurability and improve adhesion and adhesion durability. Of the fluorides, hexafluoroantimonate is preferred.
- the use amount of the cationic photopolymerization initiator is preferably 0.01 to 5 parts by mass, and preferably 0.05 to 5 parts by mass with respect to 100 parts by mass in total of the components (A), (B) and (C) 3 parts by mass is more preferred. If the usage-amount of a photocationic polymerization initiator is 0.01 mass part or more, photocurability will not worsen, and if it is 5 mass parts or less, adhesive durability will not be reduced.
- the resin composition of this embodiment may contain (E) a stabilizer. By containing a stabilizer, the resin composition of the present embodiment exhibits excellent storage stability.
- the stabilizer is not particularly limited, and examples thereof include an antioxidant, an ether compound, and a mixture thereof.
- ether compounds are preferable, and examples thereof include polyalkylene oxides such as polyethylene glycol, polypropylene glycol, and polyoxytetramethylene glycol, and cyclic ethers.
- examples of cyclic ethers include crown ethers.
- a cyclic ether it is preferable to use a crown ether.
- crown ether it is possible to achieve excellent curability suitable for manufacturing an organic EL display device with respect to the added amount.
- the end of the polyalkylene oxide is not particularly limited, and may be a hydroxyl group, may be etherified or esterified with another compound, or may have a functional group such as an epoxy group. It may be the basis. Of these, a hydroxyl group, an epoxy group, and the like are preferable because they react with the photopolymerizable compound.
- polyalkylene oxide a polyalkylene oxide-added bisphenol derivative is also preferably used, and particularly a compound having a terminal hydroxyl group or epoxy group is more preferably used.
- the stabilizer preferably has two or more polyethylene glycols and / or polypropylene glycols in the molecule.
- stabilizers having two or more polyethylene glycols in the molecule include, for example, “Likaresin BEO-60E”, “Likaresin EO-20” (all manufactured by Shin Nippon Rika Co., Ltd.), etc. Is mentioned.
- examples of commercially available stabilizers having two or more polypropylene glycols in the molecule include “Lika Resin BPO-20E” and “Lika Resin PO-20” (both manufactured by Shin Nippon Rika Co., Ltd.).
- the crown ether is not particularly limited, and examples thereof include 12-crown-4, 15-crown-5, 18-crown-6, and dicyclohexano-18-crown-6.
- a stabilizer By containing a stabilizer, not only the storage stability is improved, but also the curing rate can be adjusted, and a photocurable resin composition that cures after a certain period of time from light irradiation can be obtained.
- the amount of the (E) stabilizer used is preferably 0.05 to 20 parts by mass, and 0.1 to 10 parts by mass with respect to 100 parts by mass in total of the components (A), (B) and (C). More preferred is 0.5 to 5 parts by mass. If it is 0.05 mass part or more, storage stability will improve, and if it is 20 mass parts or less, sclerosis
- the resin composition of this embodiment may further contain (F) a silane coupling agent.
- a silane coupling agent uses a compound different from the compound used as (A) the alicyclic epoxy compound.
- the silane coupling agent is not particularly limited, but ⁇ -chloropropyltrimethoxysilane, vinyltrimethoxysilane, vinyltrichlorosilane, vinyltriethoxysilane, vinyl-tris ( ⁇ -methoxyethoxy) silane, ⁇ -methacryloxypropyl Trimethoxysilane, ⁇ -acryloxypropyltrimethoxysilane, ⁇ - (3,4-epoxycyclohexyl) ethyltrimethoxysilane, ⁇ -glycidoxypropyltrimethoxysilane, ⁇ -glycidoxypropyltriethoxysilane, ⁇ - Mercaptopropyltrimethoxysilane, ⁇ -aminopropyltriethoxysilane, N- ⁇ - (aminoethyl) - ⁇ -aminopropyltrimethoxysilane, N- ⁇ - (aminoethyl) - ⁇
- silane coupling agents may be used alone or in combination of two or more.
- the amount of the (F) silane coupling agent used is 0 with respect to a total of 100 parts by mass of the component (A), the component (B), and the component (C) in that adhesion and adhesion durability can be obtained. 1 to 10 parts by weight is preferred, 0.5 to 8 parts by weight is more preferred, 1 to 7 parts by weight is even more preferred, and 2 to 5 parts by weight is most preferred.
- the resin composition of this embodiment contains (G) a photosensitizer.
- a photosensitizer means a compound that absorbs energy rays and efficiently generates cations from a photocationic polymerization initiator.
- the photosensitizer is not particularly limited, but benzophenone derivatives, phenothiazine derivatives, phenyl ketone derivatives, naphthalene derivatives, anthracene derivatives, phenanthrene derivatives, naphthacene derivatives, chrysene derivatives, perylene derivatives, pentacene derivatives, acridine derivatives, benzothiazole derivatives, Benzoin derivative, fluorene derivative, naphthoquinone derivative, anthraquinone derivative, xanthene derivative, xanthone derivative, thioxanthene derivative, thioxanthone derivative, coumarin derivative, ketocoumarin derivative, cyanine derivative, azine derivative, thiazine derivative, oxazine derivative, indoline derivative, azulene derivative, tri Allylmethane derivatives, phthalocyanine derivatives, spiropyran derivatives, spiroox
- phenylketone derivatives such as 2-hydroxy-2-methyl-1-phenyl-propan-1-one and / or anthracene derivatives such as 9,10-dibutoxyanthracene are preferable, and phenylketone derivatives are more preferable. 2-hydroxy-2-methyl-1-phenyl-propan-1-one is most preferred.
- the usage-amount of a photosensitizer is with respect to a total of 100 mass parts of (A) component, (B) component, and (C) component by the point that sclerosis
- 0.1 to 10 parts by mass is preferable, 0.5 to 5 parts by mass is more preferable, and 1 to 3 parts by mass is most preferable.
- the resin composition according to this embodiment may further contain (H) a filler.
- a filler fine particles are preferable.
- the fine particles are not particularly limited, and inorganic or organic transparent fine particles can be used.
- inorganic fine particles include silica particles, glass fillers, spherical alumina, crushed alumina, magnesium oxide, beryllium oxide, oxides such as titanium oxide, zirconia, and zinc oxide, and nitrides such as boron nitride, silicon nitride, and aluminum nitride.
- Carbides such as silicon carbide, hydroxides such as aluminum hydroxide and magnesium hydroxide, metals and alloys such as copper, silver, iron, aluminum, nickel and titanium, carbon-based filling such as diamond and carbon Wood, calcium carbonate, barium sulfate, talc, mica and the like.
- organic fine particles include crosslinked styrene particles, crosslinked acrylic particles, fluorine-modified crosslinked acrylic particles, crosslinked styrene-acrylic particles, and crosslinked silicone particles.
- the 50% particle diameter of the fine particles is preferably in the range of 0.001 ⁇ m to 30 ⁇ m. By being in these ranges, the particle diameter is not too small to easily aggregate, and the particle diameter is not too large to easily settle. Further, two or more kinds of fine particles can be used as necessary.
- the 50% particle diameter means the particle diameter when the volume cumulative frequency is 50%.
- the particle diameter measurement method is not particularly limited, and examples thereof include a laser diffraction particle size distribution meter, a laser Doppler particle size distribution meter, a dynamic light scattering particle size distribution meter, and an ultrasonic particle size distribution meter.
- the amount of the (H) filler used is preferably 0.01 to 20 parts by mass, and 0.1 to 10 parts by mass with respect to 100 parts by mass in total of the components (A), (B) and (C). Is more preferable, and 0.5 to 5 parts by mass is most preferable.
- the resin composition of the present embodiment may contain other cationically polymerizable compounds such as an aliphatic epoxy compound, an oxetane compound, and a vinyl ether compound.
- the resin composition of the present embodiment includes various elastomers such as acrylic rubber and urethane rubber, graft copolymers such as methyl methacrylate-butadiene-styrene graft copolymers and acrylonitrile-butadiene-styrene graft copolymers, solvents Additives such as fillers, reinforcing materials, plasticizers, thickeners, dyes, pigments, flame retardants and surfactants may be used.
- elastomers such as acrylic rubber and urethane rubber
- graft copolymers such as methyl methacrylate-butadiene-styrene graft copolymers and acrylonitrile-butadiene-styrene graft copolymers
- solvents Additives such as fillers, reinforcing materials, plasticizers, thickeners, dyes, pigments, flame retardants and surfactants may be used.
- the water content of the resin composition of the present embodiment is preferably 1000 ppm or less, more preferably 500 ppm or less, and most preferably 100 ppm or less in terms of suppressing deterioration of the organic EL element.
- this moisture content exceeds 1000 ppm, it cannot prevent that the water
- the moisture content is, for example, 5, 10, 50, 100, 200, 300, 400, 500, 600, 700, 800 ppm, 900 ppm, 1000 ppm or less, and between any two of the numerical values exemplified here. It may be within the range of the value of.
- the water content of the resin composition has a considerable influence on the viscosity of the resin composition. Although it cannot be said unconditionally depending on the composition of the resin composition, there is often a tendency for the viscosity of the resin composition to decrease as the water content of the resin composition increases.
- an organic EL device can be obtained by adding a (H) filler to the (A) component, the (B) component, the (C) component, and the (D) component, even if the water content of the resin composition is large. It is intended to suppress the deterioration.
- the organic EL element can be hardly deteriorated when used for sealing the organic EL element.
- a (H) filler to the (A) component, the (B) component, the (C) component, and the (D) component, even if the water content of the resin composition exceeds 700 ppm, Deterioration of the EL element can be suppressed.
- the water content of the resin composition of the present embodiment is preferably 50 ppm or more, more preferably 100 ppm or more, still more preferably 300 ppm or more, and most preferably 500 ppm or more in terms of productivity.
- the water content is, for example, 50, 100, 200, 300, 400, 500, 600, 700, 800, 900, 1000, 1100, 1200, 1300, 1400, 1500, 1600, 1700, 1800, 1900, 2000. It is 2500 ppm or more, and may be within a range of values between any two of the numerical values exemplified here.
- the amount of the (H) filler used is not particularly limited, but is preferably 0.1 to 20 parts by mass relative to a total of 100 parts by mass of the resin composition. More preferable is 10 parts by mass. Most preferred is 2.0 to 5.0 parts by weight. Therefore, when the resin composition does not contain (H) filler, the water content of the resin composition of the present embodiment is preferably 1000 ppm or less from the viewpoint of suppressing deterioration of the organic EL device. (H) When the filler is included, 50 ppm or more is preferable.
- the upper limit of the water content of the resin composition of the present embodiment is preferably 2500 ppm or less, more preferably 1500 ppm or less in terms of suppressing deterioration of the organic EL element.
- the water content is, for example, 50, 100, 200, 300, 400, 500, 600, 700, 800, 900, 1000, 1100, 1200, 1300, 1400, 1500, 1600, 1700, 1800, 1900, 2000. It is 2500 ppm or less, and may be within a range of values between any two of the numerical values exemplified here.
- the viscosity of the resin composition of this embodiment is preferably 25 mC ⁇ s at a shear viscosity of 5 mPa ⁇ s or more because the adhesive will not spread more than necessary. .
- a shear viscosity of 2000 mPa ⁇ s or less is preferable because it can be applied with high accuracy using a commercially available coating apparatus such as a dispenser.
- the shear viscosity is more preferably 1000 mPa ⁇ s or less.
- the viscosity is 5 mPa ⁇ s, 10 mPa ⁇ s, 25 mPa ⁇ s, 50 mPa ⁇ s, 75 mPa ⁇ s, 100 mPa ⁇ s, 250 mPa ⁇ s, 500 mPa ⁇ s, 750 mPa ⁇ s, 1000 mPa ⁇ s, 2000 mPa ⁇ s. It may be within the range of any two values.
- the resin composition of the present embodiment may be cured by irradiation with energy rays to form a cured body. At this time, in the present embodiment, the resin composition may be cured by irradiation with energy rays using the following light source.
- the light source used for curing or adhering the resin composition of the present embodiment is not particularly limited, but is a halogen lamp, a metal halide lamp, a high power metal halide lamp (containing indium, etc.), a low pressure mercury lamp, a high pressure mercury lamp, Examples thereof include a high-pressure mercury lamp, a xenon lamp, a xenon excimer lamp, a xenon flash lamp, and a light emitting diode (hereinafter referred to as LED). These light sources are preferable in that the irradiation of energy rays corresponding to the reaction wavelength of each photopolymerization initiator can be efficiently performed.
- the above light sources have different emission wavelengths and energy distributions. Therefore, the light source is appropriately selected depending on the reaction wavelength of the photopolymerization initiator. Natural light (sunlight) can also be a reaction initiation light source.
- irradiation of the light source direct irradiation, condensing irradiation with a reflecting mirror, or condensing irradiation with a fiber or the like may be performed.
- a low wavelength cut filter, a heat ray cut filter, a cold mirror, or the like can also be used.
- the resin composition of this embodiment may be subjected to post-heating treatment in order to accelerate the curing rate after light irradiation.
- the post-heating temperature is preferably 120 ° C. or less, and more preferably 80 ° C. or less, from the point of not damaging the organic EL element.
- the post-heating temperature is preferably 30 ° C. or higher, more preferably 40 ° C. or higher, in terms of promoting the curing rate.
- the resin composition of this embodiment may be used as an adhesive.
- the adhesive of the present embodiment can be suitably used for bonding packages such as organic EL elements.
- the mixing method of each component is not particularly limited, and examples thereof include a stirring method using a stirring force accompanying rotation of a propeller, a method using a normal disperser such as a planetary stirrer by rotation and revolution, and the like. These mixing methods are preferable in that stable mixing can be performed at low cost.
- the manufacturing method of the resin composition of this embodiment includes the process of reducing a moisture content. Although it does not specifically limit as a water content reduction method, The following methods are mentioned.
- the desiccant is not particularly limited as long as the resin composition is not affected, but is not limited to polymer adsorbents (molecular sieve, synthetic zeolite, alumina, silica gel, etc.), inorganic salts (calcium chloride, anhydrous magnesium sulfate, quicklime, anhydrous sodium sulfate) And anhydrous calcium sulfate) and solid alkalis (sodium hydroxide, potassium hydroxide, etc.).
- polymer adsorbents molecular sieve, synthetic zeolite, alumina, silica gel, etc.
- inorganic salts calcium chloride, anhydrous magnesium sulfate, quicklime, anhydrous sodium sulfate
- anhydrous calcium sulfate solid alkalis
- the water content may be reduced by reducing the moisture for each component before mixing, or by reducing the moisture after mixing each component.
- the water content reducing step may be used alone or in combination of two or more. In order to prevent re-mixing of the water after the water content reduction step, it is preferable to handle in an inert gas atmosphere.
- the resin composition of the present embodiment is applied on one substrate (back plate), and the resin composition is applied to the resin composition. After being activated by irradiation with light, the organic EL element is sealed without being exposed to light or heat by blocking the light and bonding the back plate and the substrate on which the EL element is formed through the composition. It can be performed.
- the resin composition of the present embodiment is applied to one substrate, the other substrate is bonded through the resin composition, and the resin composition of the present embodiment is irradiated with light.
- An organic EL display device can be manufactured by using the method.
- the organic EL element sealing agent of the present embodiment containing the stabilizer is applied to the entire surface or a part of the moisture-proof substrate, and then irradiated with light. And until the said resin composition hardens
- the manufacturing method of the organic EL display device of the present embodiment it is preferable to heat after bonding the moisture-proof substrate and the organic EL element. By heating after bonding the moisture-proof substrate and the organic EL element, the curing rate of the resin composition can be accelerated.
- B-1 Bisphenol A type epoxy resin (“jER828” manufactured by Mitsui Chemicals, molecular weight 360 to 390)
- B-2) Bisphenol A type epoxy resin (“YL980” manufactured by Mitsui Chemicals, molecular weight 240)
- C-1 Bisphenol F type epoxy resin (“jER806” manufactured by Mitsui Chemicals, molecular weight 320 to 340)
- C-2 Bisphenol F type epoxy resin (“YL983U” manufactured by Mitsui Chemicals, molecular weight 360 to 380)
- C-3 Bisphenol F type epoxy resin (“KRM-2490” manufactured by ADEKA, molecular weight 340 to 380)
- component (D) Triarylsulfonium salt hexafluoroantimonate (“ADEKA OPTMER SP-170” manufactured by ADEKA, anionic species is hexafluoroantimonate)
- component (F) ⁇ -Glycidoxypropyltrimethoxysilane (“KBM-403” manufactured by Shin-Etsu Silicone)
- component (F-2) ⁇ -Glycidoxypropyltriethoxysilane (“KBE-403” manufactured by Shin-Etsu Silicone)
- F-3) 3-Methacryloxypropyltrimethoxysilane (“A-174” manufactured by Momentive Performance Materials)
- H-1 Silica (“SFP-30M” manufactured by Denki Kagaku Kogyo Co., Ltd., average particle size 0.7 ⁇ m)
- H-2 Coupling agent surface-treated silica (“SFP-30MHE” manufactured by Denki Kagaku Kogyo Co., Ltd.)
- H-3) Hydrophobic surface-treated silica (“R-974” manufactured by Aerosil Co., Ltd., average particle size: 12 ⁇ m)
- the raw materials of the types shown in Tables 1 to 4 were mixed at the composition ratios shown in Tables 1 to 4 to prepare resin compositions of experimental examples.
- the unit of the composition ratio is part by mass.
- the following water removal step was performed as necessary. After sufficiently mixing each component, 15 parts by mass of molecular sieve 3A is added to 100 parts by mass of the resin composition in an inert gas (nitrogen gas) atmosphere, and 5 to 5 at a stirring speed of 50 to 200 rpm. Stir for 70 hours. The resin composition after stirring was filtered to obtain resin compositions having water amounts shown in Tables 1 to 4. The molecular sieve was heated at 200 ° C. or higher for 2 hours or longer, cooled, and then stored in a desiccator containing silica gel.
- inert gas nitrogen gas
- the viscosity (shear viscosity) of the composition was measured using an E-type viscometer under the conditions of a temperature of 25 ° C. and a rotation speed of 10 rpm.
- the resin composition was cured under the following light irradiation conditions. After photocuring the resin composition under the condition of an integrated light amount of 4,000 mJ / cm 2 with a wavelength of 365 nm by a UV curing device equipped with an electrodeless discharge metal halide lamp (manufactured by Fusion), in an oven at 80 ° C., A post-heating treatment was performed for 30 minutes to obtain a cured body.
- [Moisture permeability] A sheet-like cured body having a thickness of 0.1 mm was produced under the above-mentioned photocuring conditions, and calcium chloride (anhydrous) was used as a moisture absorbent according to JIS Z0208 “Method of testing moisture permeability of moisture-proof packaging materials (cup method)”. The measurement was performed under conditions of an ambient temperature of 60 ° C. and a relative humidity of 90%. The permeation humidity is preferably 120 g / (m 2 ⁇ 24 hr) or less. In addition, about the value of permeation
- PCT Adhesion durability
- the adhesion retention is preferably 40% or more, and more preferably 50% or more. Most preferred is 75% or more.
- Adhesion retention (%) (Tensile shear adhesive strength after PCT) ⁇ (Initial tensile shear adhesive strength) ⁇ 100
- the organic EL device immediately after fabrication was exposed for 1000 hours at 85 ° C. and a relative humidity of 85% by mass, and then a voltage of 6 V was applied to observe the light emission state of the organic EL device visually and with a microscope.
- the diameter of the spot was measured.
- the diameter of the dark spot is preferably 10 ⁇ m or less, more preferably 5 ⁇ m or less, and most preferably no dark spot.
- the diameter of the dark spot is preferably 100 ⁇ m or less, more preferably 50 ⁇ m or less, and most preferably no dark spot.
- the present embodiment can provide an excellent resin composition capable of suppressing deterioration of the organic EL element. Moreover, it is excellent in high precision coating property, adhesiveness, low moisture permeability, and adhesion durability with a small amount of use.
- the fact that the resin composition of this embodiment has low moisture permeability is supported by low moisture permeability.
- the use of the (H) filler supports that the deterioration of the organic EL element is suppressed even when the water content of the resin composition is large.
- the resin composition of the present invention can suppress deterioration of the organic EL device.
- the resin composition of the present invention is suitably applied to bonding of electronic products, particularly display components such as organic EL, electronic components such as image sensors such as CCD and CMOS, and device packages used for semiconductor components. can do.
- it is optimal for adhesion for sealing for organic EL, and satisfies the characteristics required for adhesives for element packages such as organic EL elements.
- the resin composition of this invention can be used for the display or organic electroluminescent apparatus which has flexibility.
Abstract
Description
特許文献1では、量産化を行う際には、有機EL素子を、水分の透過性が低い基材、例えば、ガラス等で挟み込み、外周部を封止する方法を採用する。この場合、この構造は中空封止構造となっているため、中空封止構造内部へ水分が浸入することを防げず、有機EL素子の劣化につながる課題があった。
前記(B)ビスフェノールA型エポキシ樹脂と、前記(C)ビスフェノールF型エポキシ樹脂は、前記(A)脂環式エポキシ化合物を有さない化合物であり、
水分量が1000ppm以下である、樹脂組成物である。この樹脂組成物は、有機EL素子封止用に用いた場合に有機EL素子を劣化させにくい。
また、本発明は、(A)脂環式エポキシ化合物と、(B)ビスフェノールA型エポキシ樹脂と、(C)ビスフェノールF型エポキシ樹脂と、(D)光カチオン重合開始剤と、を含有し、かつ、
前記(B)ビスフェノールA型エポキシ樹脂と、前記(C)ビスフェノールF型エポキシ樹脂は、前記(A)脂環式エポキシ化合物を有さない化合物であり、
(H)充填剤をさらに含有し、水分量が50ppm以上である、樹脂組成物である。
この樹脂組成物は、従来では考えられなかった樹脂組成物における水分量が多く含有している場合であっても、有機EL素子封止用に用いた場合に有機EL素子を劣化させにくくすることができる。
好ましくは、(E)安定剤をさらに含有する樹脂組成物である。
好ましくは、(E)安定剤がエーテル化合物である。
好ましくは、(E)安定剤が環状エーテル化合物である。
好ましくは、(A)脂環式エポキシ化合物が芳香族基を有しない。
好ましくは、(F)シランカップリング剤をさらに含有する樹脂組成物である。
好ましくは、(G)増感剤をさらに含有する樹脂組成物である。
好ましくは、水分量が50ppm以上700ppm以下である。
好ましくは、樹脂組成物のせん断粘度が、25℃において、5mPa・s以上2000mPa・s以下である。
本明細書において、エネルギー線硬化性樹脂組成物とは、エネルギー線を照射することによって硬化させることができる樹脂組成物を意味する。ここで、エネルギー線とは、紫外線、可視光線等に代表されるエネルギー線を意味する。
本実施形態の樹脂組成物としては、エネルギー線硬化性樹脂組成物が好ましい。エネルギー線硬化性樹脂組成物は、(A)脂環式エポキシ化合物と、(B)ビスフェノールA型エポキシ樹脂と、(C)ビスフェノールF型エポキシ樹脂と、(D)光カチオン重合開始剤とを含有する。
上記(B)ビスフェノールA型エポキシ樹脂と、上記(C)ビスフェノールF型エポキシ樹脂は、上記(A)脂環式エポキシ化合物を有さない化合物である。
本実施形態の樹脂組成物は、(A)脂環式エポキシ化合物を含有する。脂環式エポキシ化合物を用いることにより、本実施形態の樹脂組成物は優れた接着性、低透湿性、接着耐久性、光硬化性を示す。
溶媒(移動相):THF
脱気装置:ERMA社製ERC-3310
ポンプ:日本分光社製PU-980
流速1.0ml/min
オートサンプラ:東ソー社製AS-8020
カラムオーブン:日立製作所製L-5030
設定温度40℃
カラム構成:東ソー社製TSKguardcolumnMP(×L)6.0mmID×4.0cm 2本、及び東ソー社製TSK-GELMULTIPORE HXL-M 7.8mmID×30.0cm 2本、計4本
検出器:RI 日立製作所製L-3350
データ処理:SIC480データステーション
本実施形態の樹脂組成物は、(B)ビスフェノールA型エポキシ樹脂を含有する。
なお、本明細書において、脂環式エポキシ化合物を有するビスフェノールA型エポキシ樹脂は、(B)ビスフェノールA型エポキシ樹脂に含まれない。
本実施形態の樹脂組成物は、(C)ビスフェノールF型エポキシ樹脂を含有する。なお、本明細書において、脂環式エポキシ化合物を有するビスフェノールF型エポキシ樹脂は、(C)ビスフェノールF型エポキシ樹脂に含まれない。
本実施形態の樹脂組成物は、(D)光カチオン重合開始剤を含有する。光カチオン重合開始剤を用いる場合、本実施形態の樹脂組成物は、紫外線等のエネルギー線照射により硬化可能となる。
(AはVIA族~VIIA族の原子価mの元素。m=1~2。n=0~3。m、nは整数が好ましい。RはAに結合している有機基を示す。Dは下式(2)で示す構造であり、
(式(2)中、Eは2価の基を表し、Gは-O-、-S-、-SO-、-SO2-、-NH-、-NR'-、-CO-、-COO-、-CONH-、炭素数1~3のアルキレン基又はフェニレン基(R'は炭素数1~5のアルキル基又は炭素数6~10のアリール基)。a=0~5。a+1個のE及びa個のGはそれぞれ同一であっても異なっていてもよい。aは整数が好ましい。ここでR'は前記のものと同じ。X-はオニウムの対イオンであり、その個数は1分子当りn+1である。)
炭素数1~5のアルキル基の具体例としてはメチル、エチル、プロピル、ブチル、ペンチル等の直鎖アルキル基;イソプロピル、イソブチル、sec-ブチル、tert-ブチル、イソペンチル、ネオペンチル、tert-ペンチル等の分岐アルキル基;シクロプロピル、シクロブチル、シクロペンチル等のシクロアルキル基等が挙げられる。炭素数6~10のアリール基の具体例としてはフェニル、ナフチル等が挙げられる)、-CO-、-COO-、-CONH-、炭素数1~3のアルキレン若しくはフェニレン基を介して結合して元素Aを含む環構造を形成した例としては下記のものを挙げることができる。
これらのアニオン種は、1種又は2種以上を選択して使用してもよい。これらの中では、光硬化性に優れ、接着性、接着耐久性が向上する点で、フッ化物が好ましい。フッ化物の中では、ヘキサフルオロアンチモネートが好ましい。
本実施形態の樹脂組成物は、(E)安定剤を含有してもよい。安定剤を含有することにより、本実施形態の樹脂組成物は、優れた貯蔵安定性を示す。
本実施形態の樹脂組成物は、(F)シランカップリング剤をさらに含有してもよい。シランカップリング剤を含有することにより、本実施形態の樹脂組成物は、優れた接着性及び接着耐久性を示す。
本実施形態において(F)シランカップリング剤は、(A)脂環式エポキシ化合物として用いられる化合物と異なる化合物を用いる。
これらのシランカップリング剤は、1種又は2種以上を選択して使用してもよい。これらの中では、β-(3,4-エポキシシクロヘキシル)エチルトリメトキシシラン、γ-グリシドキシプロピルトリメトキシシラン、γ-グリシドキシプロピルトリエトキシシラン、γ-メタクリロキシプロピルトリメトキシシラン、γ-アクリロキシプロピルトリメトキシシランからなる群のうちの1種又は2種以上が好ましい。
本実施形態の樹脂組成物は、(G)光増感剤を含有する。光増感剤とは、エネルギー線を吸収して、光カチオン重合開始剤からカチオンを効率よく発生させる化合物をいう。
本実施形態に係る樹脂組成物は、(H)充填剤を更に含有していてもよい。充填剤としては、微粒子が好ましい。微粒子は、特に限定されるものではないが、無機系又は有機系の透明微粒子等を用いることができる。
微粒子の50%粒子径は、0.001μm以上30μm以下の範囲であることが好ましい。これらの範囲であることにより、粒子径が小さすぎて凝集し易くなってしまうこともないし、粒子径が大きすぎ沈降し易くなってしまうこともない。又、微粒子は、必要に応じてそれらの2種以上を用いることもできる。
本実施形態の樹脂組成物の水分量は、有機EL素子の劣化を抑制する点で、1000ppm以下が好ましく、500ppm以下がより好ましく、100ppm以下が最も好ましい。この水分量が1000ppmを超える場合には、樹脂組成物中に含まれる水分が有機EL素子に接触することを防げず、有機EL素子の劣化につながる場合がある。尚、この水分量は、例えば、5、10、50、100、200、300、400、500、600、700、800ppm、900ppm、1000ppm以下、であり、ここで例示した数値のいずれか2つの間の値の範囲内であってもよい。樹脂組成物の水分量は、樹脂組成物の粘度に少なからず影響を与える。樹脂組成物の組成によって一概には言えないが、樹脂組成物の水分量が多い方が粘度について低くなる傾向が見られることが多い。
本実施形態は、(A)成分と(B)成分と(C)成分と(D)成分にさらに(H)充填剤を加えることにより、樹脂組成物の水分量が多くても、有機EL素子の劣化を抑制するものである。
つまり、従来では考えられなかった樹脂組成物における水分量が多く含有している場合であっても、有機EL素子封止用に用いた場合に有機EL素子を劣化させにくくすることができる。
例えば、(A)成分と(B)成分と(C)成分と(D)成分にさらに(H)充填剤を加えることにより、樹脂組成物の水分量が700ppmを超える場合であっても、有機EL素子の劣化を抑制することができる。
また、(A)成分と(B)成分と(C)成分と(D)成分と(H)充填剤および、それら以外の成分を加えてもよい。それら以外の成分を必要に応じて2種以上を用いることもできる。
本実施形態の樹脂組成物の水分量は、生産性などの点で、50ppm以上が好ましく、100ppm以上がより好ましく、300ppm以上が尚更好ましく、500ppm以上が最も好ましい。尚、この水分量は、例えば、50、100、200、300、400、500、600、700、800、900、1000、1100、1200、1300、1400、1500、1600、1700、1800、1900、2000、2500ppm以上であり、ここで例示した数値のいずれか2つの間の値の範囲内であってもよい。
樹脂組成物の水分量の観点から、(H)充填剤の使用量は、特に限定しないが、樹脂組成物の合計100質量部に対して、0.1~20質量部が好ましく、1.0~10質量部がより好ましい。2.0~5.0質量部が最も好ましい。
従って、本実施形態の樹脂組成物の水分量は、樹脂組成物に(H)充填剤を含んでいない場合は、有機EL素子の劣化を抑制する点で、1000ppm以下が好ましく、樹脂組成物に(H)充填剤を含んでいる場合は、50ppm以上が好ましい。樹脂組成物に(H)充填剤を含んでいる場合、本実施形態の樹脂組成物の水分量の上限値は、有機EL素子の劣化を抑制する点で、2500ppm以下が好ましく、1500ppm以下がより好ましく、1000ppm以下が尚更好ましく、500ppm以下が最も好ましい。尚、この水分量は、例えば、50、100、200、300、400、500、600、700、800、900、1000、1100、1200、1300、1400、1500、1600、1700、1800、1900、2000、2500ppm以下であり、ここで例示した数値のいずれか2つの間の値の範囲内であってもよい。
本実施形態の樹脂組成物の粘度は、優れた塗布性を得るために、25℃において、せん断粘度は5mPa・s以上であれば、接着剤が必要以上に濡れ広がってしまうことがないので好ましい。せん断粘度は2000mPa・s以下であれば、ディスペンサー等市販の塗布装置を用い、高精度に塗布することが可能となるので好ましい。せん断粘度は1000mPa・s以下であることがより好ましい。尚、この粘度は、5mPa・s、10mPa・s、25mPa・s、50mPa・s、75mPa・s、100mPa・s、250mPa・s、500mPa・s、750mPa・s、1000mPa・s、2000mPa・sのうち任意の2つの値の範囲内であってもよい。
本実施形態の樹脂組成物は、エネルギー線の照射により硬化させ、硬化体としてもよい。その際、本実施形態では、下記の光源を用いたエネルギー線の照射により、樹脂組成物の硬化を行ってもよい。
本実施形態の樹脂組成物の硬化や接着に用いられる光源としては、特に限定されないが、ハロゲンランプ、メタルハライドランプ、ハイパワーメタルハライドランプ(インジウム等を含有する)、低圧水銀ランプ、高圧水銀ランプ、超高圧水銀ランプ、キセノンランプ、キセノンエキシマランプ、キセノンフラッシュランプ、ライトエミッティングダイオード(以下、LEDという)等が挙げられる。これらの光源は、それぞれの光重合開始剤の反応波長に対応したエネルギー線の照射を効率よく行える点で、好ましい。
本実施形態の樹脂組成物は、接着剤として用いてもよい。本実施形態の接着剤は、有機EL素子等のパッケージ等の接着に、好適に用いることができる。
本実施形態の樹脂組成物の製造方法については、上記の成分を十分に混合できれば特に制限されない。各成分の混合方法としては、特に限定されないが、プロペラの回転に伴う撹拌力を利用する撹拌方法、自転公転による遊星式撹拌機等の通常の分散機を利用する方法等が挙げられる。これらの混合方法は、低コストで、安定した混合を行える点で、好ましい。
本実施形態の樹脂組成物の製造方法は、水分量を低減する工程を含むことが好ましい。
水分量の低減方法としては、特に限定されないが、以下の方法が挙げられる。
(2)減圧条件下で加熱し、水分を除去する。
(3)減圧条件下で蒸留精製する。
(4)乾燥窒素や乾燥アルゴンガス等の不活性ガスを各成分に吹き込み水分を除去する。
(5)凍結乾燥により水分を除去する。
本実施形態の硬化性樹脂組成物を用いて有機EL表示装置を製造する方法としては、例えば、一方の基板上(背面板)に本実施形態の樹脂組成物を塗布し、該樹脂組成物に光を照射して活性化させた後に、光を遮断し、該組成物を介して背面板とEL素子を形成した基板を貼り合せることにより、有機EL素子を光や熱に晒すことなく封止を行うことができる。
(A)成分の脂環式エポキシ化合物として下記を用いた。
(A-1)3,4-エポキシシクロヘキセニルメチル-3',4'-エポキシシクロヘキセンカルボキシレート(ダイセル化学社製「セロキサイド2021P」)
(A-2)3,4-エポキシシクロヘキシルメチルメタアクリレート(ダイセル社製「サイクロマーM100」)
(A-3)水添ビスフェノールA型エポキシ樹脂(三井化学社製「YX8000」、分子量380~430)
(A-4)ジシクロペンタジエン型エポキシ化合物(ADEKA社製「EP-4088S」、分子量300~340)
(B-1)ビスフェノールA型エポキシ樹脂(三井化学社製「jER828」、分子量360~390)
(B-2)ビスフェノールA型エポキシ樹脂(三井化学社製「YL980」、分子量240)
(C-1)ビスフェノールF型エポキシ樹脂(三井化学社製「jER806」、分子量320~340)
(C-2)ビスフェノールF型エポキシ樹脂(三井化学社製「YL983U」、分子量360~380)
(C-3)ビスフェノールF型エポキシ樹脂(ADEKA社製「KRM-2490」、分子量340~380)
(D-1)トリアリールスルフォニウム塩ヘキサフルオロアンチモネート(ADEKA社製「アデカオプトマーSP-170」、アニオン種はヘキサフルオロアンチモネート)
(D-2)トリアリールスルフォニウム塩(サンアプロ社製「CPI-200K」、アニオン種はリン化合物)
(E-1)18-クラウン-6-エーテル(日本曹達社製 「クラウンエーテル O-18」)
(E-2)15-クラウン-5-エーテル(日本曹達社製 「クラウンエーテル O-15」)
(E-3)ジシクロヘキサノ-18-クラウン-6-エーテル(東京化成工業社製)
(F-1)γ-グリシドキシプロピルトリメトキシシラン(信越シリコーン社製 「KBM-403」)
(F-2)γ-グリシドキシプロピルトリエトキシシラン(信越シリコーン社製 「KBE-403」)
(F-3)3-メタクリロキシプロピルトリメトキシシラン(モメンティブ パフォーマンス マテリアルズ社製 「A-174」)
(G-1)2-ヒドロキシ-2-メチル-1-フェニル-プロパン-1-オン(BASF社製「DAROCUR 1173」)
(G-2)9,10-ジブトキシアントラセン(川崎化成工業社製「ANTHRACURE UVS-1331)
(H-1)シリカ(電気化学工業社製「SFP-30M」、平均粒子径0.7μm)
(H-2)カップリング剤表面処理シリカ(電気化学工業社製「SFP-30MHE」)
(H-3)疎水性表面処理シリカ(アエロジル社製「R-974」、平均粒子径12μm)
(H-4)アルミナ(電気化学工業社製「ASFP-30」、平均粒子径1.7μm)
各成分を十分に混合した後、不活性ガス(窒素ガス)雰囲気下にて、樹脂組成物100質量部に対し、モレキュラーシーブ3Aを15質量部加え、攪拌速度50~200rpmの条件下で5~70時間攪拌した。攪拌後の樹脂組成物を濾過することにより、表1~4に示す水分量を有する樹脂組成物を得た。モレキュラーシーブは200℃以上で2時間以上加熱し、冷却した後、シリカゲルの入ったデシケータ内にて保管したものを使用した。
組成物の粘度(せん断粘度)はE型粘度計を用い、温度25℃、回転数10rpmの条件下で測定した。
樹脂組成物の水分量はカールフィッシャー水分計を用いて測定した。
樹脂組成物の硬化物性及び接着性の評価に際し、下記光照射条件により、樹脂組成物を硬化させた。無電極放電メタルハライドランプ搭載UV硬化装置(フュージョン社製)により、365nmの波長の積算光量4,000mJ/cm2の条件にて、樹脂組成物を光硬化させた後、80℃のオーブン中で、30分間の後加熱処理を実施し、硬化体を得た。
厚さ0.1mmのシート状の硬化体を上記光硬化条件にて作製し、JIS Z0208「防湿包装材料の透湿度試験方法(カップ法)」に準じ、吸湿剤として塩化カルシウム(無水)を用い、雰囲気温度60℃、相対湿度90%の条件で測定した。透過湿度は120g/(m2・24hr)以下であることが好ましい。なお、透過湿度の値について、より小さい値の方が低透湿性であると判断できる。
ホウ珪酸ガラス試験片(縦25mm×横25mm×厚2.0mm、テンパックス(登録商標)ガラス」を2枚用い、接着面積0.5cm2、接着厚み80μmで、上記の光硬化条件にて樹脂組成物を硬化させた。硬化後、この樹脂組成物からなる接着剤で接合した試験片を用い、引張剪断接着強さ(単位:MPa)を、温度23℃、相対湿度50%の環境下で、引張速度10mm/分で測定した。なお、引張剪断接着強さの値について、より大きい値の方が接着強さが強いと判断できる。
ホウ珪酸ガラス試験片(縦25mm×横25mm×厚2.0mm、テンパックス(登録商標)ガラス)を2枚用い、接着面積0.5cm2、接着厚み80μmで、上記の光硬化条件にて樹脂組成物を硬化させた。硬化後、この樹脂組成物からなる接着剤で接合した試験片を用い、プレッシャークッカー(以下、PCTという)121℃、相対湿度100質量%、2atmの雰囲気下にて10時間暴露し、暴露後の試験片の引張剪断接着強さ(単位:MPa)を、温度23℃、相対湿度50%の環境下で、引張速度10mm/分で測定し、接着保持率を下記(式1)にて求めた。接着保持率は、40%以上が好ましく、50%以上が好ましい。最も好ましいのは、75%以上である。
接着保持率(%)=(PCT後の引張剪断接着強さ)÷(初期の引張剪断接着強さ)×100
〔有機EL素子基板の作製〕
ITO電極付きガラス基板をアセトン、イソプロパノールを用いて洗浄した。その後、真空蒸着法にて以下の化合物を薄膜となるように順次蒸着し、有機EL素子基板を得た。
・銅フタロシアニン
・N,N'-ジフェニル-N,N'-ジナフチルベンジジン(α-NPD)
・トリス(8-ヒドロキシキノリナト)アルミニウム
・フッ化リチウム
・アルミニウム
実験例で得られた樹脂組成物を、窒素雰囲気下にて塗工装置にてガラスに塗布し、有機EL素子基板と貼り合わせ、接着厚み10μmで前記光硬化条件にて、この樹脂組成物からなる接着剤を硬化させ、有機EL素子を作製した(有機EL評価)。
作製した直後の有機EL素子を、85℃、相対湿度85質量%の条件下にて1000時間暴露した後、6Vの電圧を印加し、有機EL素子の発光状態を目視と顕微鏡で観察し、ダークススポットの直径を測定した。
なお、ダークススポットの直径は、10μm以下が好ましく、5μm以下がより好ましく、ダークススポットはないことが最も好ましい。
作製した直後の有機EL素子を、85℃、相対湿度85質量%の条件下にて1000時間暴露した後、6Vの電圧を印加し、有機EL素子の発光状態を目視と顕微鏡で観察し、ダークススポットの直径を測定した。
組成物の初期粘度(V0)を測定した後、容器に入れて蓋をした状態(密閉系)で約40℃の高温環境下における促進試験で4週間後の組成物の粘度(V4)を測定した。そして、式:V4/V0にしたがって粘度変化率を求めた。粘度変化率が小さいものを保存安定性良好と判断できる。粘度変化率は3.0以下が好ましく、2.0以下がより好ましく、1.5以下が最も好ましい。
実験例1-25は、有機EL評価の耐久性において、ダークススポットの直径が、全て120μm以下である。つまり、実験例1-25は、有機EL素子の劣化を抑制することができたことがわかる。実験例23-25は、充填剤の使用することにより、樹脂組成物の水分量が1000ppmを超えても、有機EL素子の劣化を抑制できる。
実験例26-31は、有機EL評価の耐久性において、ダークススポットの直径が、120μmより大きかった。従って、有機EL素子の耐久性が悪かった。実験例26-31は、有機EL素子の劣化を抑制することができなかった。
本実施形態は、有機EL素子の劣化を抑制することができる優れた樹脂組成物を提供できる。また、微量な使用量で、高精度な塗布性、接着性、低透湿性、接着耐久性に優れている。本実施形態の樹脂組成物が低透湿性を有することは、透湿度が小さいことから、裏付けられる。例えば、実験例において、(E)成分を使用した場合、有機ELの低透湿性が向上した。また実験例において、(H)充填剤の使用することにより、樹脂組成物の水分量が多くても、有機EL素子の劣化を抑制することが、裏付けられる。
Claims (19)
- (A)脂環式エポキシ化合物と、
(B)ビスフェノールA型エポキシ樹脂と、
(C)ビスフェノールF型エポキシ樹脂と、
(D)光カチオン重合開始剤と、
を含有し、かつ、
前記(B)ビスフェノールA型エポキシ樹脂と、前記(C)ビスフェノールF型エポキシ樹脂は、前記(A)脂環式エポキシ化合物を有さない化合物であり、水分量が1000ppm以下である、
樹脂組成物。 - (A)脂環式エポキシ化合物と、
(B)ビスフェノールA型エポキシ樹脂と、
(C)ビスフェノールF型エポキシ樹脂と、
(D)光カチオン重合開始剤と、
を含有し、かつ、
前記(B)ビスフェノールA型エポキシ樹脂と、前記(C)ビスフェノールF型エポキシ樹脂は、前記(A)脂環式エポキシ化合物を有さない化合物であり、
(H)充填剤をさらに含有し、水分量が50ppm以上である、
樹脂組成物。 - (E)安定剤をさらに含有する請求項1又は請求項2に記載の樹脂組成物。
- (E)安定剤がエーテル化合物である請求項3に記載の樹脂組成物。
- (E)安定剤が環状エーテル化合物である請求項3~4のうち1項に記載の樹脂組成物。
- (A)脂環式エポキシ化合物が芳香族基を有しない請求項1~5のうち1項に記載の樹脂組成物。
- (F)シランカップリング剤をさらに含有する請求項1~6のうちの1項に記載の樹脂組成物。
- (G)増感剤をさらに含有する請求項1~7のうちの1項に記載の樹脂組成物。
- 水分量が50ppm以上700ppm以下である請求項1~8のうちの1項に記載の樹脂組成物。
- せん断粘度が、25℃において、5mPa・s以上2000mPa・s以下である請求項1~9のうちの1項に記載の樹脂組成物。
- 請求項1~10のうちの1項に記載の樹脂組成物からなる接着剤。
- 請求項1~10のうちの1項に記載の樹脂組成物を製造する方法であって、
(1)混合前の各成分毎に水分を低減し、各成分を混合する工程、及び/又は(2)各成分の混合後に水分を低減する工程、
を含む製造方法。 - 請求項12に記載の製造方法であって、
(1)又は(2)の水分を低減する工程が、
(a)乾燥剤により水分を除去し、水分を除去した後、乾燥剤をデカンテーション又はろ過により分離する工程、
(b)減圧条件下で加熱し、水分を除去する工程、
(c)減圧条件下で蒸留精製する工程、
(d)乾燥窒素や乾燥アルゴンガス等の不活性ガスを各成分に吹き込み水分を除去する工程、
(e)凍結乾燥により水分を除去する工程、
からなる群から選ばれる1種又は2種以上の工程を含む製造方法。 - 請求項1~11のうちの1項に記載の樹脂組成物又は接着剤からなる有機EL素子用封止剤。
- 請求項1~11のうちの1項に記載の樹脂組成物又は接着剤を硬化してなる硬化体。
- 請求項1~11のうちの1項に記載の樹脂組成物又は接着剤を用いてなる有機EL装置。
- 請求項1~11のうちの1項に記載の樹脂組成物又は接着剤を用いてなるディスプレイ。
- 請求項1~11のうちの1項に記載の樹脂組成物又は接着剤を用いてなるフレキシブル性を有するディスプレイ又は有機EL装置。
- 請求項14に記載の有機EL素子用封止剤を基材の全面又は一部に塗布した後、光を照射する工程と、
前記有機EL素子用封止剤が硬化するまでの間に、前記基材と有機EL素子とを貼合して前記有機EL素子を封止する工程と、
を有する有機EL装置の製造方法。
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JPWO2020171186A1 (ja) * | 2019-02-21 | 2021-12-23 | デンカ株式会社 | 組成物 |
JP2023022040A (ja) * | 2019-02-21 | 2023-02-14 | デンカ株式会社 | 組成物 |
JP7397151B2 (ja) | 2019-02-21 | 2023-12-12 | デンカ株式会社 | 組成物 |
WO2020171186A1 (ja) * | 2019-02-21 | 2020-08-27 | デンカ株式会社 | 組成物 |
CN113227159A (zh) * | 2019-03-27 | 2021-08-06 | 电化株式会社 | 组合物 |
JP7269323B2 (ja) | 2019-03-27 | 2023-05-08 | デンカ株式会社 | 組成物 |
JPWO2020196669A1 (ja) * | 2019-03-27 | 2020-10-01 | ||
CN113227159B (zh) * | 2019-03-27 | 2024-04-19 | 电化株式会社 | 组合物 |
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KR20160111377A (ko) | 2016-09-26 |
US10683414B2 (en) | 2020-06-16 |
TWI669338B (zh) | 2019-08-21 |
JPWO2015111635A1 (ja) | 2017-03-23 |
TW201533145A (zh) | 2015-09-01 |
KR20210078573A (ko) | 2021-06-28 |
CN105916937A (zh) | 2016-08-31 |
US20170009071A1 (en) | 2017-01-12 |
KR102385321B1 (ko) | 2022-04-11 |
CN105916937B (zh) | 2018-11-16 |
JP6560985B2 (ja) | 2019-08-14 |
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