WO2014128421A1 - Substrat pour dispositif a diode electroluminescente organique - Google Patents
Substrat pour dispositif a diode electroluminescente organique Download PDFInfo
- Publication number
- WO2014128421A1 WO2014128421A1 PCT/FR2014/050370 FR2014050370W WO2014128421A1 WO 2014128421 A1 WO2014128421 A1 WO 2014128421A1 FR 2014050370 W FR2014050370 W FR 2014050370W WO 2014128421 A1 WO2014128421 A1 WO 2014128421A1
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- WIPO (PCT)
- Prior art keywords
- layer
- substrate according
- vitreous material
- diffusing
- mgo
- Prior art date
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- 239000000758 substrate Substances 0.000 title claims abstract description 27
- 239000011521 glass Substances 0.000 claims abstract description 57
- 239000000463 material Substances 0.000 claims abstract description 56
- 239000000126 substance Substances 0.000 claims abstract description 19
- 239000000203 mixture Substances 0.000 claims abstract description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 8
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 4
- 239000002245 particle Substances 0.000 claims description 16
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 claims description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 4
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 claims description 4
- 239000000470 constituent Substances 0.000 claims description 4
- 229910000019 calcium carbonate Inorganic materials 0.000 claims description 2
- 239000004408 titanium dioxide Substances 0.000 claims description 2
- WMWLMWRWZQELOS-UHFFFAOYSA-N bismuth(iii) oxide Chemical compound O=[Bi]O[Bi]=O WMWLMWRWZQELOS-UHFFFAOYSA-N 0.000 abstract 2
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 abstract 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 abstract 1
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052593 corundum Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
- 239000002253 acid Substances 0.000 description 10
- 239000000243 solution Substances 0.000 description 9
- 230000009477 glass transition Effects 0.000 description 7
- 230000004888 barrier function Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 238000004031 devitrification Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000002425 crystallisation Methods 0.000 description 4
- 230000008025 crystallization Effects 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 238000000113 differential scanning calorimetry Methods 0.000 description 3
- 230000031700 light absorption Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 229910006404 SnO 2 Inorganic materials 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000010411 cooking Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000001627 detrimental effect Effects 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000002386 leaching Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- DHDHJYNTEFLIHY-UHFFFAOYSA-N 4,7-diphenyl-1,10-phenanthroline Chemical class C1=CC=CC=C1C1=CC=NC2=C1C=CC1=C(C=3C=CC=CC=3)C=CN=C21 DHDHJYNTEFLIHY-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- -1 B 2 O 3 Inorganic materials 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910017493 Nd 2 O 3 Inorganic materials 0.000 description 1
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical class CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- GHPGOEFPKIHBNM-UHFFFAOYSA-N antimony(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Sb+3].[Sb+3] GHPGOEFPKIHBNM-UHFFFAOYSA-N 0.000 description 1
- 229940027991 antiseptic and disinfectant quinoline derivative Drugs 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000002419 bulk glass Substances 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 229940043397 deconex Drugs 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 238000000572 ellipsometry Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 1
- 230000005525 hole transport Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical compound C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 description 1
- 229940005642 polystyrene sulfonic acid Drugs 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000007764 slot die coating Methods 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 238000002798 spectrophotometry method Methods 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 238000007736 thin film deposition technique Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- 150000001651 triphenylamine derivatives Chemical class 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
- C03C17/04—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass by fritting glass powder
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
- C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
- C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
- C03C3/066—Glass compositions containing silica with less than 40% silica by weight containing boron containing zinc
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/20—Compositions for glass with special properties for chemical resistant glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
- C03C8/04—Frit compositions, i.e. in a powdered or comminuted form containing zinc
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/14—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
- H10K50/854—Arrangements for extracting light from the devices comprising scattering means
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
- H10K77/10—Substrates, e.g. flexible substrates
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/44—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the composition of the continuous phase
- C03C2217/45—Inorganic continuous phases
- C03C2217/452—Glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
- C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
- C03C2217/475—Inorganic materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/77—Coatings having a rough surface
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/10—Transparent electrodes, e.g. using graphene
- H10K2102/101—Transparent electrodes, e.g. using graphene comprising transparent conductive oxides [TCO]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Definitions
- the invention relates to the field of substrates for organic light - emitting diode devices. It relates more specifically to chemical compositions of vitreous material and glass frits particularly well suited to the formation of layers.
- Organic light-emitting diode devices which will be referred to hereinafter by their acronym OLED, usually used in the art, are devices emitting light by means of a phenomenon of electroluminescence. These OLED devices generally include an organic electroluminescent system between two electrodes. One of the electrodes is deposited on a glass sheet in the form of an electroconductive layer. OLED devices can be used as display screens or as lighting devices.
- the light extracted from the device is a white, polychromatic light.
- the light extraction efficiency is, however, naturally low, of the order of 0.25, the light being trapped inside the device because of differences in refractive indices between its different elements.
- vitreous materials whose chemical composition comprises 40 to 60% by weight of B1 2 O 3 and 5 to 30% by weight of ZnO.
- the vitreous materials are generally obtained by a process in which a glass frit (with the same chemical composition as the material) is mixed with a typically organic medium to form a paste, which is deposited on the glass sheet before it is baked. .
- the glass transition temperature of the glass frit must be low enough to be able to cook at temperatures at which the glass sheet can not be deformed. At the same time, the frit must not crystallize (devitrify) during cooking, which would have the effect of generating too much roughness and high optical absorption.
- the linear thermal expansion coefficient of the frit must also be adapted to that of the glass sheet, generally be close to the latter, or slightly lower, in order to avoid during the cooling the appearance in the glassy material of mechanical stresses susceptible to damage it.
- the object of the invention is to provide compositions of vitreous material (and glass frit) having a good compromise between improved chemical resistance, in particular to acids, a high refractive index, a coefficient of thermal expansion and a transition temperature. vitreous, and low ability to devitrification.
- the subject of the invention is a diffusing substrate for an organic light-emitting diode device comprising a glass sheet coated on one of its faces with a layer comprising a vitreous material, such that said vitreous material has a chemical composition comprising the following constituents, varying within the weight limits defined below:
- the invention also relates to an organic light-emitting diode device comprising a diffusing substrate according to the invention, wherein an electroconductive layer is disposed on the layer comprising a vitreous material.
- an electroconductive layer is disposed on the layer comprising a vitreous material.
- the subject of the invention is also a glass frit whose chemical composition comprises the following constituents, varying within the weight limits defined below:
- the preferred characteristics in terms of oxide contents concern both the chemical composition of the vitreous material deposited on the glass sheet and that of the glass frit (used for the deposition).
- the contents indicated are weight contents.
- the weight content of Bi 2 0 3 is advantageously at least 62%, in particular 63% and even 64% or 65% and / or at most 83%, in particular 82% or even 81%, even 80%, 79%. % or 78%. It is preferably in a range from 65 to 80%, especially 68 to 75%.
- a too low content of Bi 2 0 3 does not make it possible to obtain the desired refractive indices, while too high a content leads to unacceptable glass yellowing.
- the weight content of B 2 O 3 is preferably at least 6%, especially 7% or 7.5% and / or at most 11%, especially 10%, or even 9.5% or 9%. It is preferably in a range from 6 to 11%, especially from 7 to 10%.
- a high content of B 2 O 3 has the effect of increasing the glass transition temperature and lowering the chemical resistance of the material, while a too low content makes the glass more easily devitrifiable.
- the weight content of SiO 2 is preferably at least 7%, especially 7.5% or even 8% and / or at most 18%, 17%, 16%, 15%, 14%, or 13% including 12% or 11% and even 10% or 9%. It is preferably in a range from 7 to 12%, especially 7.5 to 10%. An excessively high content of SiO 2 causes a detrimental reduction in the refractive index, while a too low content decreases both the chemical resistance and the thermal stability.
- the weight content of ZnO is preferably at most 9.5%, especially 9% or 8%, even 7% or 6% or 5%, and even less than 5%. According to one embodiment, the ZnO content is even at most 1%, especially 0.5%, or 0.1%, or even zero.
- the weight content of ZnO is preferably in a range from 2 to 8%, especially from 3 to 6%. High levels of ZnO are detrimental to good chemical resistance, particularly to acids, and increase the risk of devitrification.
- the weight content of MgO is preferably at most 3%, especially 2.5% and even 2%. In some embodiments, this content is even less than 0.5% and even 0.1%, or even zero. In another embodiment, the MgO content is at least 0.5%, especially 1%, more particularly in a range from 0.5 to 3%, especially 1 to 2.5%. The addition of MgO makes it possible to improve the chemical resistance of the vitreous material.
- the sum of the weight contents of MgO and ZnO is advantageously at least 1%, in particular 2% or 3% and even 4 or 5% and / or at most 9%, in particular 8% and even 7%. It is preferably in a range from 2 to 9%, especially 3 to 8% or 2 to 5%. It appeared that a cumulative content of MgO and ZnO too high resulted in a risk of devitrification during the manufacture of the frit.
- the weight content of CaO is preferably at most 4% and even 3% or 2%. In some embodiments, this content is even less than 0.5% and even 0.1%, or even zero. In another embodiment, the CaO content is at least 0.5%, especially 1%, more particularly in a range of 1 to 4%, especially 1.5 to 3.5%.
- the sum of the weight contents of CaO and MgO is preferably at least 0.5%, especially 1% or 1.5%, or even 2% or 3%. According to one embodiment, it may, however, be less than 0.5% and even 0.1%, or even zero.
- the sum of the weight contents of CaO and MgO is preferably in a range from 0.5 to 4%.
- the addition of CaO and / or MgO, in addition to a decrease in the ZnO content improves the acid resistance of the vitreous material.
- the content of Al 2 O 3 is preferably at least 1%, especially 2%. It is preferably in a range from 1 to 6% or 1 to 4%, especially 2 to 3%.
- the addition of alumina improves the chemical resistance of the material.
- the BaO content is advantageously at most 10%, especially 5% and even 3% or even 1% or 0.5%, or even 0.1%. It can even be zero.
- the total content of alkaline oxides (Li 2 0, Na 2 ⁇ 0, K 2 O) is preferably at most 3%, especially 2% and even 1% or 0.5%. According to a preferred embodiment, this content is preferably in a range from 0.02 to 1%, especially from 0.05 to 0.2%. In this case, the only alkaline oxide present is advantageously Na 2 ⁇ 0.
- the addition of alkaline oxides, even at low levels, has the effect of significantly reducing the glass transition temperature.
- each of the lower bounds can be combined with each of the upper bounds, the set of possible ranges not being recalled here for the sake of brevity.
- each range for a given oxide can be combined with any other range for the other oxides.
- not all combinations can be indicated so as not to unnecessarily burden the present text.
- Tables 1 and 2 define 10 particularly preferred compositions resulting from combinations of ranges defined above. It goes without saying that each of these ranges can be combined with any other range from tables for other oxides.
- the sum of the weight contents of Bi 2 O 3 , B 2 O 3 , SiO 2 , ZnO, MgO, BaO and CaO is at least 95%, especially 96% or 97% and even 98% or 99% .
- the sum of the weight contents of B1 2 O 3 , B 2 O 3 , SiO 2 , ZnO, MgO and CaO is at least 95%, especially 96% or 97% and even 98% or 99%.
- the total content of P 2 O 5 , b 2 0 5 and V 2 0 5 is preferably at most 1%, especially 0.5%, and even zero.
- the composition is preferably free of lead oxide.
- the chemical composition of the vitreous material or the frit may advantageously comprise the oxides T1O 2 and / or SnO 2 , which have proved to be particularly effective in terms of improving the resistance to acids.
- the T1O 2 content is preferably at least 0.5% or 1% and / or at most 5% / 2% in particular.
- the content of SnO 2 is preferably at least 0.2% or 0.5% and / or at most 5%, especially 3% or 2%.
- the total content of T1O 2 and ZrO 2 is at most 1%, especially 0.5% and even 0.1%, or even zero, these oxides may have an adverse effect on the devitrification of this type of glasses.
- the total content of coloring elements (Fe 2 O 3 , CuO, CoO, Cr 2 O 3 , MnO 2 , Se, Ag, Cu, Au, Nd 2 O 3 , Er 2 O 3 ) is also preferably zero (except impurities inevitable).
- Antimony oxide (Sb 2 O 3) can be added to the composition in order to reduce the light absorption of the layer, in particular to make it less yellow. Its content is preferably at least 1, especially 2% and / or at most 5%, especially 4 or 3%.
- the refractive index for a wavelength of 550 nm of the glass constituting the vitreous material or the glass frit is preferably in a range from 1.8 to 2.2, in particular from 1.85 to 2, 1, and even 1.88 to 2.0, or even 1.89 to 1.98.
- the glass transition temperature Tg of the glass constituting the vitreous material or the glass frit is preferably in a range from 440 to 500 ° C., in particular from 450 to 480 ° C.
- the glass transition temperature is measured by Differential Scanning Calorimetry (DSC), under nitrogen, with a temperature rise rate of 10 ° C / min. We consider here the beginning of the curve ("onset temperature") for the determination of the Tg.
- the difference between the crystallization temperature Tx and the glass transition temperature Tg is preferably at least 100 ° C in order to avoid any devitrification of the vitreous material during its shaping.
- the crystallization temperature is determined by taking into consideration the start of the crystallization (onset temperature) curve, obtained by differential scanning calorimetry.
- the linear thermal expansion coefficient between 20 and 300 ° C of the glass constituting the vitreous material or the glass frit is preferably in a range from 70 to 100.10 -7 / ° C, particularly 75 to 95.10 "7 ° C, and even 80 to 90.10 " 7 ° C
- the glass sheet preferably has a refractive index for a wavelength of 550 nm in a range from 1.4 to 1.6. It is preferably a glass of the silico-soda-lime type, obtained by the floating process (known as the "float" process), discharging the molten glass onto a molten tin bath.
- the glass sheet is preferably colorless and has a light transmittance of at least 80% or even 90% within the meaning of EN 410: 1998.
- the thickness of the glass sheet is preferably in a range from 0.1 to 6 mm, in particular from 0.3 to 3 mm.
- the glass sheet is coated on one of its faces with a layer comprising a vitreous material.
- this layer is deposited in contact with the glass sheet.
- the layer covers at least 80%, especially 90% and even 95% of the surface of the glass sheet.
- the layer is advantageously made of vitreous material.
- the glass sheet diffuses the light (it may be in particular a satin glass, for example by an acid treatment), or that a layer diffuser is disposed under the layer comprising a vitreous material, in particular in contact with both the glass sheet and the layer consisting of vitreous material.
- the diffusing aspect is thus not obtained by the layer itself.
- the layer comprising a vitreous material further comprises diffusing elements.
- the layer is even advantageously made of vitreous material and diffusing elements.
- the layer is itself diffusing, and it will be called diffusing layer.
- the diffusing elements are chosen from particles and cavities.
- the diffusing layer can contain both particles and cavities.
- the particles are preferably chosen from particles of alumina, zirconia, silica, titanium dioxide, calcium carbonate and barium sulfate.
- the diffusing layer may comprise a single type of particles, or several different types of particles.
- the cavities are preferably formed during cooking by removal of organic compounds, for example medium. They are preferably closed and not connected.
- the diffusing elements preferably have a characteristic dimension allowing diffusion of the visible light, especially between 200 nm and 5 ⁇ m. A characteristic dimension may be a median diameter.
- the mass concentration of particles in the diffusing layer is preferably in a range from 0.2 to 10%, especially from 0.5 to 8%, and even from 0.8 to 5%.
- the diffusing elements can be distributed homogeneously in the vitreous material. They may alternatively be distributed in a heterogeneous manner, for example by providing gradients.
- the diffusing layer may also consist of several elementary layers differentiating from each other by a different nature, size or proportion of diffusing elements.
- the physical thickness of the layer comprising a vitreous material is preferably in a range from 0.5 to 100 ⁇ m, especially from 1 to 80 ⁇ m and more particularly from 2 to 60 ⁇ m, or even from 2 to 30 ⁇ m.
- Other layers may be deposited on the layer comprising a vitreous material, and in particular in contact with it. It may for example be a planarization layer, intended to cover any particles located on the surface of the layer comprising a vitreous material, in particular of the diffusing layer, so as to reduce the roughness of the latter.
- the planarization layer may for example consist of the vitreous material defined above, or of another vitreous material.
- a barrier layer for example silica or silicon nitride, the thickness of which is in particular in a range from 5 to 30 nm, may be deposited on the layer comprising a glassy material or the planarization layer, in contact with it .
- the blur is at least 40%, especially 50%, and even 60% or 70%, even 80%.
- the blur sometimes called “sail” is measured by a haze-meter according to ASTM D1003.
- the layer comprising a vitreous material is advantageously coated with an electroconductive layer.
- the latter is preferably in direct contact with the layer comprising a vitreous material, or optionally with the planarization layer or the barrier layer.
- the electroconductive layer is preferably based on a transparent conductive oxide (TCO), such as, for example, indium tin oxide (ITO).
- TCO transparent conductive oxide
- ITO indium tin oxide
- Other conductive materials are possible, for example silver layers or conductive polymers.
- the diffusing substrate may thus comprise (or consist of), by way of examples: A non-diffusing glass sheet, then a diffusing layer consisting of the vitreous material and diffusing elements, then (optionally) a planarization layer, then (optionally) a barrier layer, and finally an electroconductive layer, each layer mentioned being in direct contact with the layer which precedes it and the layer which follows it,
- a non-diffusing glass sheet then a diffusing layer, then a layer made of vitreous material, then (optionally) a barrier layer, and finally an electroconductive layer, each layer mentioned being in direct contact with the layer that precedes it and the layer that follows it,
- a diffusing glass sheet then a layer consisting of the glassy material, then (optionally) a barrier layer, and finally an electroconductive layer, each layer mentioned being in direct contact with the layer that precedes and the layer that follows.
- the glass sheet coated with the layer comprising a vitreous material and the electroconductive layer (acting as a first electrode) is associated with an organic electroluminescent system in the form of a less a layer of organic material, itself coated with an electroconductive layer acting as second electrode.
- the organic electroluminescent system is therefore located between the substrate and the second electrode, in direct contact with the first and the second electrode.
- the electroluminescent system is preferably composed of several layers: hole injection layer (for example polyethylene dioxythiophene doped with polystyrene sulfonic acid or copper phthalocyanine), hole transport layer (for example triphenylamine derivatives), emission layer (for example metal complexes of quinoline derivatives), electron transport layer (for example, oxadiazole, triazole, bathophenanthroline derivatives, etc.), layer of injection of electrons (for example lithium or cesium) etc.
- hole injection layer for example polyethylene dioxythiophene doped with polystyrene sulfonic acid or copper phthalocyanine
- hole transport layer for example triphenylamine derivatives
- emission layer for example metal complexes of quinoline derivatives
- electron transport layer for example, oxadiazole, triazole, bathophenanthroline derivatives, etc.
- layer of injection of electrons for example lithium or cesium
- the OLED device according to the invention is preferably used as a source of polychromatic lighting, in particular white light. It is preferably a rear-emission device in the sense that light is emitted through the glass sheet.
- the second electrode is made of a reflective material, for example a metal film, in particular aluminum, silver, magnesium, etc.
- the OLED device therefore comprises successively a glass sheet, a layer comprising a vitreous material, optionally a barrier or planarization layer, an electroconductive layer (typically made of ITO), a multi-layer electroluminescent system and a reflecting electrode.
- the glass frit according to the invention is preferably obtained by melting raw materials and then forming the frit.
- the raw materials (oxides, carbonates, etc.) can be melted at temperatures of the order of 950 to 1100 ° C., and then the glass obtained can be cast, for example rolled between two rolls.
- the glass obtained can then be milled, for example in a ball mill, a jet mill, a ball mill, or an attritor mill.
- the glass frit is preferably in the form of particles whose dgo is at most 10 ⁇ m, in particular 5 ⁇ m, or even 4 ⁇ m.
- the distribution of Particle diameters can be determined using a laser granulometer.
- the layer comprising a vitreous material is preferably obtained by a process in which:
- the glass frit according to the invention is mixed with an organic medium so as to form a paste
- the organic medium is typically selected from alcohols, glycols, terpineol esters.
- the mass proportion of medium is preferably in a range from 10 to 50%.
- the deposition of the paste can be carried out in particular by screen printing, by roll coating, by dipping, by knife application, by spraying, by spinning, by vertical layering or by means of a slot-shaped die (slot die coating).
- a screen made of textile or metal mesh, layering tools and a doctor blade the control of the thickness being ensured by the choice of the mesh of the screen and its tension, by the choice of the distance between the glass sheet and the screen, by the pressures and speeds of movement of the doctor blade.
- the deposits are typically dried at a temperature of 100 to 150 ° C by infrared or ultraviolet radiation depending on the nature of the medium.
- the firing is preferably carried out in an oven at a temperature in a range from 500 to 600 ° C, especially from 510 to 580 ° C.
- the electroconductive layer may be deposited by a variety of thin film deposition techniques, such as for example the cathodic sputtering technique, in particular assisted by magnetic field (magnetron process), chemical vapor deposition (CVD), in particular assisted by plasma (PECVD, APPECVD), or liquid deposition.
- Different glass frits were obtained by melting raw materials. To do this, sufficient raw materials were carried to obtain 300 g of glass for 1 h 30 at a temperature of 1000 ° C in crucibles heated by Joule effect of 400 cm 3 .
- Tg glass transition temperature
- T x crystallization temperature
- n the refractive index for a wavelength of 550 nm
- the leaching of bismuth in an acid medium denoted L and expressed in mg / l.
- the T x is measured by differential scanning calorimetry.
- Bismuth leaching was measured by dipping glass substrates coated with a layer of the glassy material studied in an acidic solution. To do this, layers 10 .mu.m thick were deposited by screen printing on soda-lime-calcium glass substrates, from frits having a d90 of 3.4 .mu.m and a d50 of 1.7 .mu.m.
- the acid solution is a solution based on acetic acid sold under the Neutrax reference by the company Franklab, diluted to 1.3% by volume in deionized water to reach a pH of 3.
- Comparative Examples C1 to C5 devitrify too easily to be shaped glassy material, hence their very high light absorption.
- the examples according to the invention all have significantly better acid resistance than that of Comparative Example C6.
- the resistance to the bases was also evaluated by measuring the mass loss (denoted "Mb") obtained after immersing the samples in a pH11 solution (solution diluted to 1% of the concentrate marketed by Borer under the trade name deconex® PV 110) for 18 h at 50 ° C.
- Mb mass loss
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Abstract
Description
Claims
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201480010391.3A CN105073666B (zh) | 2013-02-25 | 2014-02-24 | 用于具有有机发光二极管的器件的衬底 |
US14/770,190 US10084144B2 (en) | 2013-02-25 | 2014-02-24 | Substrate for device having an organic light-emitting diode |
RU2015140758A RU2683454C2 (ru) | 2013-02-25 | 2014-02-24 | Подложка для устройства с органическим электролюминесцентным диодом |
KR1020157025701A KR20150125967A (ko) | 2013-02-25 | 2014-02-24 | 유기 발광 다이오드를 갖는 장치의 기판 |
EP14713170.0A EP2958867A1 (fr) | 2013-02-25 | 2014-02-24 | Substrat pour dispositif a diode electroluminescente organique |
JP2015558532A JP6449788B2 (ja) | 2013-02-25 | 2014-02-24 | 有機発光ダイオードを有するデバイスのための基材 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
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FR1351619A FR3002533A1 (fr) | 2013-02-25 | 2013-02-25 | Substrat pour dispositif a diode electroluminescente organique |
FR1351619 | 2013-02-25 | ||
FR1360522 | 2013-10-29 | ||
FR1360522 | 2013-10-29 |
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WO2014128421A1 true WO2014128421A1 (fr) | 2014-08-28 |
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PCT/FR2014/050370 WO2014128421A1 (fr) | 2013-02-25 | 2014-02-24 | Substrat pour dispositif a diode electroluminescente organique |
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US (1) | US10084144B2 (fr) |
EP (1) | EP2958867A1 (fr) |
JP (1) | JP6449788B2 (fr) |
CN (1) | CN105073666B (fr) |
MY (1) | MY174696A (fr) |
RU (1) | RU2683454C2 (fr) |
WO (1) | WO2014128421A1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10319934B2 (en) | 2014-04-22 | 2019-06-11 | Saint-Gobain Glass France | Transparent supported electrode for OLED |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105247702B (zh) * | 2013-09-30 | 2018-10-26 | 乐金显示有限公司 | 有机电子器件 |
EP3028999B1 (fr) * | 2014-12-01 | 2017-05-24 | Saint-Gobain Glass France | Substrat oled diffusif transparent et procédé de fabrication d'un tel substrat |
US20170254930A1 (en) * | 2016-03-03 | 2017-09-07 | Corning Incorporated | Structured light-transmitting articles and methods for making the same |
US10280317B2 (en) * | 2016-07-07 | 2019-05-07 | Northwestern University | Enhanced conductivity, adhesion and environmental stability of printed graphene inks with nitrocellulose |
JP2019020723A (ja) | 2017-07-12 | 2019-02-07 | Hoya Candeo Optronics株式会社 | 導光板、画像表示装置 |
KR102642282B1 (ko) * | 2017-07-12 | 2024-02-28 | 호야 가부시키가이샤 | 도광판 및 화상 표시 장치 |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070224429A1 (en) * | 2006-03-23 | 2007-09-27 | Keiichiro Hayakawa | Dielectric and display device having a dielectric and dielectric manufacturing method |
US20080185962A1 (en) * | 2007-02-06 | 2008-08-07 | Noritake Co., Limited | Lead-free acid-resistant glass composition and glass paste comprised of the same |
US20090004597A1 (en) * | 2006-01-12 | 2009-01-01 | Takenori Ueoka | Photosensitive Composition, Display Member, and Process for Producing The Same |
US20090042715A1 (en) * | 2005-12-27 | 2009-02-12 | Ichiro Uchiyama | Lead-Free Bismuth Glass |
WO2011089343A1 (fr) | 2010-01-22 | 2011-07-28 | Saint-Gobain Glass France | Substrat verrier revetu d'une couche haut indice sous un revetement electrode et dispositif electroluminescent organique comportant un tel substrat |
US20120025245A1 (en) * | 2009-01-26 | 2012-02-02 | Asahi Glass Company, Limited | Substrate for electronic device and electronic device using same |
WO2012017183A1 (fr) * | 2010-08-06 | 2012-02-09 | Saint-Gobain Glass France | Support a couche diffusante pour dispositif a diode electroluminescente organique, dispositif electroluminescent organique comportant un tel support |
WO2012035565A1 (fr) * | 2010-09-16 | 2012-03-22 | Daunia Solar Cell S.R.L. | Agent d'étanchéité à faible température de ramollissement et utilisation dans le domaine de l'électronique |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6255239B1 (en) * | 1998-12-04 | 2001-07-03 | Cerdec Corporation | Lead-free alkali metal-free glass compositions |
CN1286753C (zh) * | 2002-03-29 | 2006-11-29 | 松下电器产业株式会社 | 铋系玻璃组合物、使用它作为密封部件的磁头和等离子显示板 |
US7494607B2 (en) * | 2005-04-14 | 2009-02-24 | E.I. Du Pont De Nemours And Company | Electroconductive thick film composition(s), electrode(s), and semiconductor device(s) formed therefrom |
EP2168927A4 (fr) * | 2007-07-20 | 2012-01-11 | Nippon Electric Glass Co | Matériau d'étanchéité, comprimé d'étanchéité et composition de verre pour un scellement étanche |
JP5309629B2 (ja) | 2008-03-13 | 2013-10-09 | セントラル硝子株式会社 | 耐酸性を有する無鉛ガラス組成物 |
KR20110113177A (ko) * | 2009-01-26 | 2011-10-14 | 아사히 가라스 가부시키가이샤 | 유기 led 소자의 산란층용 유리 및 유기 led 소자 |
WO2011046156A1 (fr) * | 2009-10-15 | 2011-04-21 | 旭硝子株式会社 | Verre pour une couche de diffusion dans un élément de diode électroluminescente organique, et élément de diode électroluminescente organique l'utilisant |
CN101891390B (zh) * | 2009-12-31 | 2012-09-05 | 四川虹欧显示器件有限公司 | 一种无铅介质浆料及其制造方法 |
US9224983B2 (en) * | 2010-12-20 | 2015-12-29 | Samsung Electronics Co., Ltd. | Substrate for surface light emitting device and method of manufacturing the substrate, surface light emitting device, lighting apparatus, and backlight including the same |
-
2014
- 2014-02-24 JP JP2015558532A patent/JP6449788B2/ja not_active Expired - Fee Related
- 2014-02-24 CN CN201480010391.3A patent/CN105073666B/zh not_active Expired - Fee Related
- 2014-02-24 US US14/770,190 patent/US10084144B2/en not_active Expired - Fee Related
- 2014-02-24 WO PCT/FR2014/050370 patent/WO2014128421A1/fr active Application Filing
- 2014-02-24 EP EP14713170.0A patent/EP2958867A1/fr not_active Withdrawn
- 2014-02-24 MY MYPI2015702788A patent/MY174696A/en unknown
- 2014-02-24 RU RU2015140758A patent/RU2683454C2/ru not_active IP Right Cessation
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20090042715A1 (en) * | 2005-12-27 | 2009-02-12 | Ichiro Uchiyama | Lead-Free Bismuth Glass |
US20090004597A1 (en) * | 2006-01-12 | 2009-01-01 | Takenori Ueoka | Photosensitive Composition, Display Member, and Process for Producing The Same |
US20070224429A1 (en) * | 2006-03-23 | 2007-09-27 | Keiichiro Hayakawa | Dielectric and display device having a dielectric and dielectric manufacturing method |
US20080185962A1 (en) * | 2007-02-06 | 2008-08-07 | Noritake Co., Limited | Lead-free acid-resistant glass composition and glass paste comprised of the same |
US20120025245A1 (en) * | 2009-01-26 | 2012-02-02 | Asahi Glass Company, Limited | Substrate for electronic device and electronic device using same |
WO2011089343A1 (fr) | 2010-01-22 | 2011-07-28 | Saint-Gobain Glass France | Substrat verrier revetu d'une couche haut indice sous un revetement electrode et dispositif electroluminescent organique comportant un tel substrat |
US20120313134A1 (en) * | 2010-01-22 | 2012-12-13 | Saint-Gobain Glass France | Glass substrate coated with a high-index layer under an electrode coating, and organic light-emitting device comprising such a substrate |
WO2012017183A1 (fr) * | 2010-08-06 | 2012-02-09 | Saint-Gobain Glass France | Support a couche diffusante pour dispositif a diode electroluminescente organique, dispositif electroluminescent organique comportant un tel support |
WO2012035565A1 (fr) * | 2010-09-16 | 2012-03-22 | Daunia Solar Cell S.R.L. | Agent d'étanchéité à faible température de ramollissement et utilisation dans le domaine de l'électronique |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10319934B2 (en) | 2014-04-22 | 2019-06-11 | Saint-Gobain Glass France | Transparent supported electrode for OLED |
Also Published As
Publication number | Publication date |
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CN105073666A (zh) | 2015-11-18 |
JP2016508952A (ja) | 2016-03-24 |
US20160013432A1 (en) | 2016-01-14 |
MY174696A (en) | 2020-05-08 |
US10084144B2 (en) | 2018-09-25 |
EP2958867A1 (fr) | 2015-12-30 |
RU2683454C2 (ru) | 2019-03-28 |
CN105073666B (zh) | 2020-02-14 |
RU2015140758A (ru) | 2017-03-30 |
JP6449788B2 (ja) | 2019-01-09 |
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