WO2014104573A1 - 절삭공구용 다층박막과 이를 포함하는 절삭공구 - Google Patents
절삭공구용 다층박막과 이를 포함하는 절삭공구 Download PDFInfo
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- WO2014104573A1 WO2014104573A1 PCT/KR2013/010334 KR2013010334W WO2014104573A1 WO 2014104573 A1 WO2014104573 A1 WO 2014104573A1 KR 2013010334 W KR2013010334 W KR 2013010334W WO 2014104573 A1 WO2014104573 A1 WO 2014104573A1
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- thin film
- lattice constant
- cutting tool
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- 239000010409 thin film Substances 0.000 title claims abstract description 106
- 238000005520 cutting process Methods 0.000 title claims abstract description 29
- 239000000463 material Substances 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 5
- 238000005299 abrasion Methods 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 24
- 230000007246 mechanism Effects 0.000 description 11
- 230000003014 reinforcing effect Effects 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 9
- 238000003475 lamination Methods 0.000 description 6
- 239000010408 film Substances 0.000 description 4
- 241000276498 Pollachius virens Species 0.000 description 3
- 229910010037 TiAlN Inorganic materials 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000002356 single layer Substances 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000011056 performance test Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- 230000002787 reinforcement Effects 0.000 description 2
- PCTMTFRHKVHKIS-BMFZQQSSSA-N (1s,3r,4e,6e,8e,10e,12e,14e,16e,18s,19r,20r,21s,25r,27r,30r,31r,33s,35r,37s,38r)-3-[(2r,3s,4s,5s,6r)-4-amino-3,5-dihydroxy-6-methyloxan-2-yl]oxy-19,25,27,30,31,33,35,37-octahydroxy-18,20,21-trimethyl-23-oxo-22,39-dioxabicyclo[33.3.1]nonatriaconta-4,6,8,10 Chemical compound C1C=C2C[C@@H](OS(O)(=O)=O)CC[C@]2(C)[C@@H]2[C@@H]1[C@@H]1CC[C@H]([C@H](C)CCCC(C)C)[C@@]1(C)CC2.O[C@H]1[C@@H](N)[C@H](O)[C@@H](C)O[C@H]1O[C@H]1/C=C/C=C/C=C/C=C/C=C/C=C/C=C/[C@H](C)[C@@H](O)[C@@H](C)[C@H](C)OC(=O)C[C@H](O)C[C@H](O)CC[C@@H](O)[C@H](O)C[C@H](O)C[C@](O)(C[C@H](O)[C@H]2C(O)=O)O[C@H]2C1 PCTMTFRHKVHKIS-BMFZQQSSSA-N 0.000 description 1
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000005272 metallurgy Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/38—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
- C23C28/44—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by a measurable physical property of the alternating layer or system, e.g. thickness, density, hardness
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/10—Heating of the reaction chamber or the substrate
- C30B25/105—Heating of the reaction chamber or the substrate by irradiation or electric discharge
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/60—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape characterised by shape
- C30B29/68—Crystals with laminate structure, e.g. "superlattices"
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
- Y10T428/24967—Absolute thicknesses specified
- Y10T428/24975—No layer or component greater than 5 mils thick
Definitions
- the present invention relates to a multi-layered thin film for cutting tools, and more specifically, a multi-layered thin film laminated in the form of ABCD or ABCB with a superlattice thin film of several nanometers to several tens of nanometers in thickness can have low quality deviation and excellent wear resistance.
- a multilayer thin film for cutting tools is a multi-layered thin film laminated in the form of ABCD or ABCB with a superlattice thin film of several nanometers to several tens of nanometers in thickness can have low quality deviation and excellent wear resistance.
- a so-called superlattice having a lattice constant is formed by forming a matching interface between the films despite the difference in lattice constant of each single layer.
- the coating is made, it is possible to realize a hardness higher than twice the general hardness of each single film, and various attempts have been made to apply this phenomenon to a thin film for cutting tools.
- the reinforcing mechanisms used for the superlattice coating include Koehler's model, Hall-Petch relationship, and coherency strain model. These reinforcing mechanisms include A and B lattice constant differences and modulus of elasticity when A and B materials are alternately deposited. The hardness is increased by controlling the lamination cycle.
- the present invention in forming a multi-layer thin film consisting of a super lattice, by controlling the period of the lattice constant and elastic modulus of the multi-layer thin film so that two or more thin film reinforcement mechanisms act, wear resistance of the conventional super lattice coating Compared to the above, the present invention provides an improved cutting tool multilayer thin film and a cutting tool in which the multilayer thin film is formed.
- the present invention is a multi-layer thin film for a cutting tool in which a unit thin film consisting of a thin layer A, a thin layer B, a thin layer C, and a thin layer D is laminated two or more times, and the elastic modulus (k) between the thin layers is k A > k B , k D > k C or k C > k B , k D > k A , and the lattice constant L between the thin layers is L A , L C > L B , L D or L B , L D > L A , L C , and provides a multilayer thin film for a cutting tool, wherein a difference between the maximum value and the minimum value of the lattice constant L is within 20%.
- the lattice constant average period ⁇ L of the multilayer thin film may be 1/2 of the elastic modulus average period ⁇ k .
- the thickness of the unit thin film may be 4 ⁇ 50nm, more preferably 10 ⁇ 30nm.
- the thin layer B and the thin layer D may be made of the same material.
- the present invention also provides a cutting tool in which the multilayer thin film is formed on the surface of the cutting tool.
- the lamination cycle of the elastic modulus and lattice constant according to the lamination cycle of the unit thin film is illustrated.
- the two or more reinforcing mechanisms act on the multilayer thin film, so that the quality of the cutting tool is less than that of the multilayer thin film on which one reinforcing mechanism is applied, and the wear resistance can be improved. do.
- Figure 1 shows the relationship between the elastic modulus and the period of the lattice constant of a conventional superlattice multilayer thin film.
- Figure 2 shows the relationship between the elastic modulus and the lattice constant period of the superlattice multilayer thin film according to the present invention.
- 3 is a graph showing the change of lattice constant according to the Al content of the (Ti 1-x Al x ) N-based thin film.
- Example 4 is a photograph showing the cutting performance test results of the multilayer thin film formed according to Example 1 of the present invention and the multilayer thin film formed according to the comparative example.
- Example 5 is a photograph showing the cutting performance test results of the multilayer thin film formed according to Example 2 of the present invention and the multilayer thin film formed according to the comparative example.
- the elastic modulus and the lattice constant do not coincide with each other, and when differently adjusted, in particular, two or more reinforcing mechanisms (ie, Koehler's model mechanisms and Hall-Petch relation mechanisms) in the laminated superlattice membrane It can be worked smoothly, as well as improve the wear resistance of the multilayer thin film, confirmed that the quality deviation is reduced compared to the multilayer thin film mainly work one reinforcing mechanism during mass production, and completed the present invention.
- two or more reinforcing mechanisms ie, Koehler's model mechanisms and Hall-Petch relation mechanisms
- the multilayer thin film according to the present invention is a multi-layer thin film for a cutting tool, in which a thin film in which unit thin films consisting of thin layer A, thin layer B, thin layer C, and thin layer D are sequentially laminated is two or more layers, and the modulus of elasticity between the unit thin films ( k) is k A > k B , k D > k C or k C > k B , k D > k A , and the lattice constant L between the unit thin films is L A , L C > L B , L D or L B , L D > L A , L C , and the difference between the maximum value and the minimum value of the lattice constant L is within 20%.
- Figure 2 shows an example of the relationship between the elastic modulus and the lattice constant period of the superlattice multilayer thin film according to the present invention.
- the superlattice multilayer thin film according to the present invention is different from FIG. 1, and the period (blue) of the elastic modulus is about twice the period (red) of the lattice constant, and thus the elastic modulus and lattice constant It can be seen that the periods of do not match.
- the Koehler model which is related to the modulus of elasticity, explains that the reinforcing effect occurs at less than 20 to 30 nm, which is about 100 atomic layers, which is a critical thickness at which the thickness of the A thin film and the B thin film is sufficiently small to make dislocations difficult.
- the Hall-petch model which explains the periods of the material being separated by the lattice constant, explains that the reinforcing effect occurs at a lower number of several nm.
- the present invention is adjusted so that the period of the elastic modulus and the period of the lattice constant are mutually inconsistent so that the two reinforcing effects can occur.
- the multilayer thin film according to the present invention is intended for the unit thin film is composed of four layers, the stacking order of each unit thin film may be made in the order of A-B-C-D or A-B-C-B. That is, the second layer and the fourth layer may be made of different materials or the same material.
- the average period of the elastic modulus and the average period of the lattice constant is different from each other, it is included in the scope of the present invention, preferably the average period of the elastic modulus may be twice the average period of the lattice constant.
- the deposition of the unit thin film was performed by the in-arc ion plating method of physical vapor deposition (PVD), and the deposition was performed using an initial vacuum pressure of 8.5 ⁇ 10. -5 Decompression below Torr and N as reaction gas 2
- the reaction gas pressure was 40mTorr or less (preferably 10 ⁇ 35m) Torr), the temperature was 400-600 degreeC, and the board
- the lattice constant of each unit thin film constituting the multilayer thin film can be obtained by XRD analysis after forming a single layer thin film.
- the radius values of atoms, ions, and covalent bonds which are theoretically obtained from experiments, are theoretically obtained.
- the lattice constant was calculated by calculating the radius value of the covalent bond quantitatively according to the atomic ratio to the B1 HCP structure.
- Lattice constant: a 4.24 ⁇ -0.125x ⁇ (x is the molar ratio of Al)
- Example 1 of the present invention the TiAlN-based thin film was prepared in the case of forming the multilayer thin film by the method according to the present invention and the case of forming the multilayer thin film by the conventional method.
- the lamination structure and composition of the multilayer thin film were performed as shown in Table 2 below, and a total of 180 layers of thin films composed of four unit thin films were formed so that the average period of the lattice constant was 5 to 10 nm and the period of elastic modulus was 10 to 20 nm. Thus, a multilayer thin film having a final thin film thickness of 2.6 to 3.2 ⁇ m was obtained.
- the base material on which the multilayer thin film was deposited was utilized A30, a P30 grade of Korean metallurgy, and SPKN1504EDSR was used.
- Example 2 of the present invention the AlCr-based thin film was prepared in the case where the multilayer thin film was formed by the method according to the present invention and the case where the multilayer thin film was formed by the conventional method.
- the lamination structure and composition of the multilayer thin film were performed as shown in Table 3 below, and a total of 180 layers of thin films consisting of four unit thin films were repeatedly laminated so that the average period of the lattice constant was 5 to 10 nm and the period of elastic modulus was 10 to 20 nm. Thus, a multilayer thin film having a final thin film thickness of 2.3 to 2.6 ⁇ m was obtained.
- K20 K44UF material was used as the model number BE2060.
- Examples 2-1 and 2-2 of the present invention show improved slope and clearance wear patterns compared to Comparative Example 2-3.
- the superlattice multilayer thin film laminated by controlling the period of elastic modulus and lattice constant according to the present invention exhibits improved wear resistance compared to the case where it is not.
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- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Inorganic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Ceramic Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
박막 | 타겟 조성(원자%) | 탄성계수(k)(GPa) |
TiN | Ti = 99.9 | 416 |
TiAlN | Ti : Al = 75 : 25 | 422 |
TiAlN | Ti : Al = 50 : 50 | 430 |
AlTiN | Ti : Al = 33 : 67 | 398 |
CrN | Cr = 99.9 | 475 |
CrAlN | Cr : Al = 50 : 50 | 367 |
AlCrN | Cr : Al = 30 : 70 | 403 |
AlCrSiN | Cr : Al : Si = 30 : 65 : 5 | 338 |
박막 | 타겟 | A | B | C | D | 비고 |
1-1 | 조성 | Ti:Al=50:50 | Ti:Al=75:25 | Ti:Al=33:67 | Ti:Al=75:25 | 실시예 |
격자상수 | 423 | 442.5 | 409.7 | 442.5 | ||
탄성계수 | 430 | 422 | 398 | 422 | ||
1-2 | 조성 | Ti:Al=33:67 | Ti:Al=33:67 | Ti:Al=75:25 | Ti:Al=75:25 | 비교예 |
격자상수 | 409.7 | 409.7 | 442.5 | 442.5 | ||
탄성계수 | 398 | 398 | 422 | 422 | ||
1-3 | 조성 | Ti:Al=33:67 | Ti:Al=75:25 | Ti:Al=33:67 | Ti:Al=75:25 | 비교예 |
격자상수 | 409.7 | 442.5 | 409.7 | 442.5 | ||
탄성계수 | 398 | 422 | 398 | 422 | ||
1-4 | 조성 | Ti:Al=33:67 | Ti:Al=33:67 | Ti:Al=50:50 | Ti:Al=50:50 | 비교예 |
격자상수 | 409.7 | 409.7 | 423 | 423 | ||
탄성계수 | 398 | 398 | 430 | 430 | ||
1-5 | 조성 | Ti:Al=33:67 | Ti:Al=50:50 | Ti:Al=33:67 | Ti:Al=50:50 | 비교예 |
격자상수 | 409.7 | 423 | 409.7 | 423 | ||
탄성계수 | 398 | 430 | 398 | 430 |
박막 | 항목 | A | B | C | D | 비고 |
2-1 | 조성 | Cr:Al:Si=30:65:5 | Cr:Al=50:50 | Cr:Al=30:70 | Cr:Al=50:50 | 실시예 |
격자상수 | 393.8 | 402 | 382.7 | 402 | ||
탄성계수 | 338 | 367 | 403 | 367 | ||
2-2 | 조성 | Cr=99.9 | Cr:Al=30:70 | Cr:Al=50:50 | Cr:Al=30:70 | 실시예 |
격자상수 | 420 | 382.7 | 402 | 382.7 | ||
탄성계수 | 475 | 403 | 367 | 403 | ||
2-3 | 조성 | Cr:Al=30:70 | Cr:Al=50:50 | Cr:Al=30:70 | Cr:Al=50:50 | 비교예 |
격자상수 | 382.7 | 402 | 382.7 | 402 | ||
탄성계수 | 403 | 367 | 403 | 367 |
Claims (5)
- 박층A, 박층B, 박층C 및 박층D로 이루어진 단위박막이 2회 이상 적층된 절삭공구용 다층박막으로,상기 박층 간의 탄성계수(k)는, kA>kB,kD>kC 이거나 kC>kB,kD>kA 이고,상기 박층 간의 격자상수(L)는, LA,LC>LB,LD 이거나 LB,LD>LA,LC 이며,상기 격자상수(L)의 최대값과 최소값의 차이가 20% 이내인 것을 특징으로 하는 절삭공구용 다층박막.
- 제 1 항에 있어서,상기 다층박막의 격자상수 평균 주기(λL)는 탄성계수 평균 주기(λk)의 1/2인 것을 특징으로 하는 절삭공구용 다층박막.
- 제 1 항 또는 제 2 항에 있어서,상기 단위박막의 두께는 4~50nm인 것을 특징으로 하는 절삭공구용 다층박막.
- 제 1 항 또는 제 2 항에 있어서,상기 박층B와 박층D는 동일한 물질로 이루어진 것을 특징으로 하는 절삭공구용 다층박막.
- 제 1 항 또는 제 2 항에 기재된 다층박막이 형성된 절삭공구.
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DE112013006240.2T DE112013006240B4 (de) | 2012-12-27 | 2013-11-14 | Mehrlagige Dünnschicht für Schneidwerkzeug und Schneidwerkzeug damit |
US14/649,551 US20150307998A1 (en) | 2012-12-27 | 2013-11-14 | Multilayer thin film for cutting tool and cutting tool including the same |
CN201380068184.9A CN104870684B (zh) | 2012-12-27 | 2013-11-14 | 切削工具用多层薄膜和包含其的切削工具 |
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KR1020120155125A KR101471257B1 (ko) | 2012-12-27 | 2012-12-27 | 절삭공구용 다층박막과 이를 포함하는 절삭공구 |
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PCT/KR2013/010334 WO2014104573A1 (ko) | 2012-12-27 | 2013-11-14 | 절삭공구용 다층박막과 이를 포함하는 절삭공구 |
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CN (2) | CN104884668B (ko) |
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- 2013-05-21 US US14/653,266 patent/US20150337459A1/en not_active Abandoned
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Also Published As
Publication number | Publication date |
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CN104884668B (zh) | 2017-09-01 |
CN104884668A (zh) | 2015-09-02 |
RU2015130314A (ru) | 2017-01-31 |
DE112013006240B4 (de) | 2023-06-29 |
CN104870684A (zh) | 2015-08-26 |
WO2014104495A1 (ko) | 2014-07-03 |
US20150337459A1 (en) | 2015-11-26 |
CN104870684B (zh) | 2017-09-08 |
RU2613258C2 (ru) | 2017-03-15 |
KR20140085016A (ko) | 2014-07-07 |
KR101471257B1 (ko) | 2014-12-09 |
DE112013006240T5 (de) | 2015-10-08 |
US20150307998A1 (en) | 2015-10-29 |
DE112013006267T5 (de) | 2015-09-24 |
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