WO2014103897A1 - Procédé de production de verre aluminosilicaté alcalin - Google Patents
Procédé de production de verre aluminosilicaté alcalin Download PDFInfo
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- WO2014103897A1 WO2014103897A1 PCT/JP2013/084160 JP2013084160W WO2014103897A1 WO 2014103897 A1 WO2014103897 A1 WO 2014103897A1 JP 2013084160 W JP2013084160 W JP 2013084160W WO 2014103897 A1 WO2014103897 A1 WO 2014103897A1
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- aluminosilicate glass
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
- C03C10/0018—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing SiO2, Al2O3 and monovalent metal oxide as main constituents
Definitions
- the present invention relates to a method for producing alkali aluminosilicate glass.
- glass used for a display of a liquid crystal display device requires strength, alkali aluminosilicate glass is used. Further, the glass is required to have high chemical resistance and durability, few bubbles in the glass, high homogeneity, and high flatness.
- glass is manufactured by weighing and mixing predetermined raw materials including silica sand and putting them in a melting furnace.
- the glass raw material charged in the melting furnace is heated from room temperature, heated to a maximum of about 1600 to 1700 ° C. in the melting furnace, melted, and vitrified.
- the melting of the silica sand is delayed, the unmelted silica sand is trapped by the bubbles generated in the glass melt and gathers near the surface of the glass melt, whereby the surface of the glass melt and other parts A difference occurs in the composition ratio of the SiO 2 component in the glass, and the homogeneity of the glass decreases.
- the melting point of quartz sand alone is as high as 1723 ° C., it is difficult to melt quartz sand alone by subsequent melting.
- silica fine particles may aggregate to form coarse secondary particles, and the glass raw material may not be completely melted. If the silica fine particles agglomerate, the homogeneity of the molten glass is deteriorated, so that the homogeneity and flatness of the formed glass are lowered.
- a glass raw material for granulating fine silica sand and fine alumina raw material For the purpose of improving the homogeneity of glass, a glass raw material for granulating fine silica sand and fine alumina raw material has been proposed.
- the glass raw material for granulating fine silica sand and fine alumina raw material has a granulation step, and thus has a problem of cost.
- the present invention provides a production method capable of obtaining an alkali aluminosilicate glass that is excellent in homogeneity with little generation of unmelted silica sand and fine bubbles in the glass without reducing the particle size of the silica sand. Objective.
- the inventors of the present invention have made it possible to prevent unmelted silica sand of the glass raw material by reducing the ratio of the specific surface area of the aluminum compound-containing raw material contained in the glass raw material and the specific surface area of the silica sand, and to reduce the number of defects in the alkali aluminosilicate glass. As a result, the present invention was completed.
- the present invention is as follows. 1. A method for producing an alkali aluminosilicate glass having an Al 2 O 3 content of more than 1 mol% by melting a glass raw material containing silica sand, an aluminum compound-containing raw material, and an alkali metal oxide-containing raw material. A method for producing an alkali aluminosilicate glass in which the ratio S W (Al) / S W (Si) of the specific surface area S W (Al) of the silica and the specific surface area S W (Si) of the silica sand is 6.0 or less. 2.
- the ratio D 50 (Al) / D 90 (Si) of the volume-based integrated sieve 50% diameter D 50 (Al) of the aluminum compound-containing raw material to the volume-based integrated sieve 90% diameter D 90 (Si) of silica sand is A method for producing an alkali aluminosilicate glass that is greater than 0.15. 3.
- the volume-based integrated sieve 90% diameter D 90 (Si) of silica sand is over 280 ⁇ m, and the volume-based integrated sieve 50% diameter D 50 (Al) and [D 90 (Si) -250 ⁇ m of the aluminum compound-containing material.
- the ratio D 50 (Al) / [D 90 (Si) -250 ⁇ m] is a method for producing an alkali aluminosilicate glass having a ratio of 0.5 or more. 4).
- the alkali aluminosilicate glass contains 50 to 80% of SiO 2 , Na 2 O, Li 2 O and K 2 O in total of 10% or more, and Al 2 O 3 of 5% or more in terms of mol% percentage. 5. Production of alkali aluminosilicate glass according to any one of items 1 to 4, wherein the total content of Na 2 O, Li 2 O and K 2 O) / (content of Al 2 O 3 ) ⁇ 2.5 Method.
- the ratio of the specific surface area of the aluminum compound-containing raw material contained in the glass raw material and the specific surface area of the silica sand is a specific range, the specific surface area of the aluminum compound-containing raw material is increased, and By reducing the specific surface area of the silica sand, the eutectic reaction of SiO 2 and Na 2 O can be promoted.
- FIG. 1 shows the phase diagram of SiO 2 , Na 2 O and Al 2 O 3 .
- a portion surrounded by a circle is a portion where SiO 2 and Na 2 O are dissolved by a eutectic reaction.
- 2A to 2C are schematic diagrams of an evaluation method for the amount of unmelted silica sand.
- FIGS. 3A to 3D show the results of melting the glass raw material at an evaluation temperature of 1450 ° C. for 3 minutes, 5 minutes, 7.5 minutes, and 10 minutes.
- 4 (a) and 4 (b) show the results of X-ray analysis of the glass raw material melted at 1450 ° C. for 5 minutes shown in FIG. 3 (b).
- FIG. 5 shows the results of measuring the temperature of the glass material surface layer and the temperature inside the glass material.
- FIG. 6 shows the result of analyzing the sensitivity (frequency) based on the particle size of SiO 2 contained in the glass raw material.
- FIGS. 7 (a) to (c) show that the 50% diameter D 50 under the volume-based integrated sieve of Al 2 O 3 in the glass raw material is 82 ⁇ m, and the volume-based integrated sieve under the volumetric SiO 2 in the glass raw material is 90%.
- the diameter D 90 96 .mu.m, each glass material to 324 ⁇ m or 354 ⁇ m, and dissolved for 10 minutes at rated temperature 1450 ° C. shows the results of measuring the unmelted SiO 2 amount.
- FIG. 7 (a) to (c) show that the 50% diameter D 50 under the volume-based integrated sieve of Al 2 O 3 in the glass raw material is 82 ⁇ m, and the volume-based integrated sieve under the volumetric SiO 2 in the glass raw material is 90%.
- FIG. 8 shows that the volume-based integrated sieve 50% diameter D 50 of Al 2 O 3 in the glass raw material is 82 ⁇ m, and the volume-based integrated sieve 90% diameter D 90 of SiO 2 in the glass raw material is 38 ⁇ m and 96 ⁇ m. , 284 ⁇ m, each glass material to 324 ⁇ m or 354 ⁇ m, and dissolved for 10 minutes at rated temperature 1450 ° C., shows the results of measuring the unmelted SiO 2 amount.
- FIG. 9 shows the result of analyzing the sensitivity (frequency) using the particle diameter of Al 2 O 3 contained in the glass raw material.
- FIG. 10 (a) to 10 (d) show that the 90% diameter D 90 below the volume-based integrated sieve of SiO 2 in the glass material is 354 ⁇ m, and 50% under the volume-based integrated sieve of Al 2 O 3 in the glass material.
- the diameter D 50 104 ⁇ m, 82 ⁇ m, 55 ⁇ m, each glass raw materials to 4 [mu] m, and dissolved for 10 minutes at rated temperature 1450 ° C. shows the results of measuring the unmelted SiO 2 amount.
- FIG. 11 shows that the 90% diameter D 90 under the volume basis of SiO 2 in the glass raw material is 354 ⁇ m, and the 50% diameter D 50 under the volume basis of Al 2 O 3 in the glass raw material is 104 ⁇ m and 82 ⁇ m.
- FIG. 12 shows that the 90% diameter D 90 under the volume basis of SiO 2 in the glass raw material is 354 ⁇ m, and the 50% diameter D 50 under the volume basis of Al 2 O 3 in the glass raw material is 104 ⁇ m and 82 ⁇ m. , 55 ⁇ m and 4 ⁇ m are melted at an evaluation temperature of 1450 ° C. for 10 minutes, and the results of XRD analysis are shown.
- FIG. 12 shows that the 90% diameter D 90 under the volume basis of SiO 2 in the glass raw material is 354 ⁇ m, and the 50% diameter D 50 under the volume basis of Al 2 O 3 in the glass raw material is 104 ⁇ m and 82 ⁇ m. , 55 ⁇ m and 4 ⁇ m are melted at an evaluation temperature of 1450 ° C. for 10 minutes, and the results of XRD analysis are shown.
- FIG. 12 shows that the 90% diameter D 90 under the volume basis of SiO 2 in the glass raw material is 354 ⁇ m, and the 50% diameter D 50 under the volume basis of Al 2 O
- FIG. 13 is a graph in which S W (Al) / S W (Si) is plotted on the horizontal axis and the amount of unmelted SiO 2 (wt%) is plotted on the vertical axis.
- FIG. 14 is a graph in which D 50 (Al) / D 90 (Si) is plotted on the horizontal axis and the amount of unmelted SiO 2 (wt%) is plotted on the vertical axis.
- FIG. 15 is a graph in which S W (Al) / [D 90 (Si) ⁇ 250 ⁇ m] is plotted on the horizontal axis and the amount of unmelted SiO 2 (wt%) is plotted on the vertical axis.
- an alkali aluminosilicate glass is formed by melting a silicon source, an aluminum compound-containing raw material, an alkali metal oxide-containing raw material such as soda ash serving as an alkali metal source, and a glass raw material containing a magnesium source.
- a glass raw material is manufactured as follows.
- a glass raw material is prepared by mixing raw materials so as to have a composition of a target alkali aluminosilicate glass including a silicon source, an aluminum compound-containing raw material, soda ash, and a magnesium source.
- the glass raw material and, if necessary, cullet having the same composition as that of the target alkali aluminosilicate glass are continuously fed into the melting furnace from the glass raw material inlet of the melting furnace, and 1600-1700 Melt at 0 ° C. to obtain molten glass.
- cullet is glass waste discharged
- a glass plate is formed so that the molten glass has a predetermined thickness by a known forming method such as a float method, a downdraw method, a fusion method, or a roll-out method.
- the formed glass plate is gradually cooled and then cut into a predetermined size to obtain a plate-like alkali aluminosilicate glass.
- Silica sand is used as the silicon source.
- Examples of the aluminum compound-containing raw material include alumina and aluminum hydroxide. Any soda ash may be used as long as it is used for glass production.
- Examples of the magnesium source include magnesium hydroxide and magnesium oxide.
- the ratio S W (Al) / S W (Si) between the specific surface area S W (Al) of the aluminum compound-containing raw material and the specific surface area S W (Si) of the silica sand is 6.0 or less and 4.0 or less. Is preferable, and it is more preferable that it is 2.5 or less. If the ratio S W (Al) / S W (Si) of the specific surface area S W (Al) of the aluminum compound-containing raw material and the specific surface area S W (Si) of the silica sand is exceeded, the dissolution rate of SiO 2 becomes slow and unmelted. Silica sand increases and defects in the glass tend to occur.
- the ratio of the aluminum compound-containing starting material of D 50 (Al) and silica sand of D 90 (Si), D 50 (Al) / D 90 (Si) is 0.15 greater, preferably at least 0.20, More preferably, it is 0.24 or more.
- D 90 (Si) of silica sand is over 280 ⁇ m, and the ratio of D 50 (Al) and [D 90 (Si) -250 ⁇ m] of the aluminum compound-containing raw material is D 50 (Al) / [D 90 (Si) -250 ⁇ m. ] Is 0.5 or more, preferably 0.7 or more, and more preferably 0.9 or more.
- D 50 (Al) of the aluminum compound-containing raw material is 50 ⁇ m or more, and D 90 (Si) of the silica sand is 400 ⁇ m or less.
- D 50 (Al) of the aluminum compound-containing raw material is preferably 80 ⁇ m or more, more preferably 90 ⁇ m or more, and preferably 100 ⁇ m or more.
- silica sand of D 90 (Si) is less than 380 .mu.m, more preferably at most 360 .mu.m, also preferably at 250 ⁇ m or more, and more preferably at least 280 .mu.m.
- D 50 (Al) of the aluminum compound-containing raw material is less than 50 ⁇ m, unmelted silica sand increases and defects are likely to occur in the glass, and if D 90 (Si) of the silica sand exceeds 400 ⁇ m, unmelted silica sand Will increase, and defects in glass are more likely to occur. Further, with the D 90 (Si) of 250 ⁇ m or more quartz sand, it is possible to reduce the unmelted silica sand, disadvantages is less likely to occur in the glass.
- FIG. 1 shows a phase diagram of silica sand (SiO 2 ), soda ash (Na 2 O) and Al 2 O 3 contained in the high alumina raw material.
- a reaction product obtained by reacting Na 2 O and Al 2 O 3 has a high melting point and does not dissolve at first unless the temperature is high.
- Na 2 O and SiO 2 react with each other to form a low melting point reaction product, an effect is obtained that the dissolution rate of SiO 2 is accelerated by the reaction product, but Na 2 O is converted to Al 2 O 3.
- the dissolution rate of SiO 2 becomes slow.
- the temperature rising rate of the glass raw material is slow, the reaction of Na 2 O and Al 2 O 3 proceeds, and the dissolution rate of SiO 2 is thought to be slow.
- the reaction of Na 2 O and Al 2 O 3 is suppressed by increasing the specific surface area of the aluminum compound-containing raw material and decreasing the specific surface area of the silica sand, and SiO 2 and Na
- the eutectic reaction of 2 O can be promoted.
- the “specific surface area” in the present specification refers to a specific surface area obtained by measuring the particle size by particle size measurement and then calculating by the following formula (1) assuming a sphere.
- Specific surface area ⁇ [4 ⁇ R 2 ⁇ (number of particles having a radius of R per 1 g)] (1)
- R represents a radius when assuming a sphere.
- the number per 1 g of particles having a radius R is determined by the following equation (2).
- Number of particles having a radius of R per 1 g 1 g ⁇ volume frequency ratio of particles having a radius of R determined by particle size measurement / [density ⁇ (4/3) ⁇ R 3 ] (2)
- the “particle diameter” in this specification is a sphere equivalent diameter, and specifically measured by a dry laser diffraction / scattering particle diameter / particle size distribution measuring apparatus (manufactured by Nikkiso Co., Ltd., Microtrac MT3300). The particle size in the particle size distribution of the powder.
- the particle size D 50 (median particle size) refers to the particle size when the cumulative frequency is 50% on a volume basis in the particle size distribution of the powder measured by the laser diffraction method / scattering method.
- the particle size D 90 refers to the particle size when the cumulative frequency is 90% on a volume basis in the particle size distribution of the powder measured by the laser diffraction method / scattering method.
- the glass obtained by the production method of the present invention is an alkali aluminosilicate glass.
- a preferable composition of the alkali aluminosilicate glass will be described.
- Alkaline aluminosilicate glass is SiO 2 50-50%, Al 2 O 3 0-10%, B 2 O 3 0-4%, MgO 5-30%, ZrO in terms of mole percentage on oxide basis.
- at least 1 selected from 2 , P 2 O 5 , TiO 2 and La 2 O 3 is contained in a total of 0.5 to 10% and Na 2 O is contained in 1 to 17%.
- the content of SiO 2 is preferably 50 to 80%, more preferably 55 to 75%, and still more preferably 58 to 70%.
- the content of Al 2 O 3 is 1% or more, preferably 1 to 10%, more preferably 1 to 7%, still more preferably 2 to 5%. When the content of Al 2 O 3 is less than 1%, strength, chemical resistance and durability are deteriorated.
- the content of B 2 O 3 is preferably 0 to 4%, preferably 0.3 to 3%, more preferably 0.5 to 2%.
- the content of MgO is preferably 5 to 30%, more preferably 10 to 28%, and further preferably 15 to 25%.
- the alkali aluminosilicate glass preferably contains at least one selected from ZrO 2 , P 2 O 5 , TiO 2 and La 2 O 3 .
- the alkali aluminosilicate glass can be whitened.
- the total amount is preferably 0.5 to 10%.
- the content of ZrO 2 in the alkali aluminosilicate glass is preferably 0 to 5%, more preferably 0.5 to 3%.
- the content of P 2 O 5 in the alkali aluminosilicate glass is preferably 0 to 10%, more preferably 0.5 to 7%, and further preferably 1 to 6%.
- the content of TiO 2 in the alkali aluminosilicate glass is preferably 0 to 10%, more preferably 0.5 to 7%, and further preferably 1 to 6%.
- the content of La 2 O 3 in the alkali aluminosilicate glass is preferably 0 to 2%, more preferably 0.2 to 1%.
- the strength of the glass by the subsequent ion exchange treatment can be increased.
- the content of Na 2 O in the alkali aluminosilicate glass is preferably 1 to 17%, more preferably 3 to 11%, still more preferably 4 to 14%.
- a desired surface compressive stress layer can be easily formed by ion exchange. Further, it is possible to improve the weather resistance by a 17% or less of Na 2 O.
- composition of the alkali aluminosilicate glass obtained by the production method of the present invention include the following.
- the total content of SiO 2 and Al 2 O 3 is 75% or less, the total content of Na 2 O and K 2 O is 12 to 25%, and the total content of MgO and CaO is 7 to 15%.
- composition which is displayed at a certain glass (iii) mol%, a SiO 2 68 ⁇ 80%, the Al 2 O 3 5 ⁇ 10% , The a 2 O 5 ⁇ 15%, glass K 2 O 0 to 1%, the MgO 4 ⁇ 15% and a ZrO 2 containing 0 to 1%
- composition 1 In terms of mol%, SiO 2 68.0%, Al 2 O 3 10.0%, MgO 8.0%, Na 2 O 14.0%
- Specific surface area ⁇ [4 ⁇ R 2 ⁇ (number of particles having a radius of R per 1 g)] (1)
- R represents a radius when assuming a sphere.
- Example 1 3 (a) to 3 (d) show the results of melting the glass raw material at an evaluation temperature of 1450 ° C. for 3, 5, 7.5, and 10 minutes.
- 3A to 3D the value represented by “%” is the ratio (%) of SiO 2 when SiO 2 before heating is 100%.
- FIG. 3 (a) it was found that the melting of the upper and lower heat transfer portions of the glass raw material crest was fast, but the melting of the central portion was slow. Further, as shown in FIG. 3 (b), the center portion of the glass raw materials, it was found that many SiO 2 remaining dissolved.
- FIG. 4A and 4B show the results of X-ray analysis of the glass raw material melted at 1450 ° C. for 5 minutes shown in FIG. 3B.
- “Qz” indicates the undissolved residue of SiO 2 .
- FIG. 4B it was found that NaAlSiO 4 was generated in the central portion of the glass raw material, and the undissolved residue (Qz) of SiO 2 was large.
- FIG. 6 shows the result of analyzing the sensitivity (frequency) using the particle diameter of SiO 2 contained in the glass raw material.
- the particle diameter of SiO 2 is 90% diameter D 90 ( ⁇ m) under a volume-based integrated sieve.
- Tables 1 and 2 show the particle size distribution of SiO 2 .
- Each glass raw material in which D 50 of Al 2 O 3 in the glass raw material is 82 ⁇ m and D 90 of SiO 2 in the glass raw material is 38 ⁇ m, 96 ⁇ m, 284 ⁇ m, 324 ⁇ m or 354 ⁇ m is melted at an evaluation temperature of 1450 ° C. for 10 minutes. The amount of unmelted SiO 2 was measured. The results are shown in FIGS.
- silica sand having a small particle size has a high pulverization cost and carries over becomes a problem, it is considered preferable to use silica sand having a D 90 of SiO 2 of 250 ⁇ m or more.
- FIG. 9 shows the result of analyzing the sensitivity (frequency) using the particle diameter of Al 2 O 3 contained in the glass raw material.
- the particle size of Al 2 O 3 is D 50 ( ⁇ m).
- Tables 3 and 4 show the particle size distribution of Al 2 O 3 .
- FIGS. 10 (a) to 10 (d) The results of measuring the amount of unmelted SiO 2 are shown in FIGS. 10 (a) to 10 (d) and FIG. Moreover, the result of the XRD analysis is shown in FIG. In FIG. 12, “Qz” refers to the undissolved residue of SiO 2 , and “Cri” refers to the high-temperature crystal phase of Qz.
- D 50 (Al) is D 50 ( ⁇ m) of the alumina-containing material
- D 90 (Si) is D 90 ( ⁇ m) of silica sand
- Sw (Al) is the specific surface area (calculation) of alumina (cm 2 / g)
- Sw (Si) are specific surface areas (calculations) of quartz sand (cm 2 / g).
- FIG. 13 is a graph in which S W (Al) / S W (Si) is plotted on the horizontal axis and the amount of unmelted SiO 2 (wt%) is plotted on the vertical axis.
- Table 5 and FIG. 13 it is a method for producing an alkali aluminosilicate glass having an Al 2 O 3 content of more than 1 mol%, comprising a specific surface area S W (Al) of an aluminum compound-containing raw material and silica sand.
- the ratio S W (Al) / S W (Si) of the specific surface area S W (Si) can be reduced and the occurrence of defects can be effectively suppressed. all right.
- FIG. 14 is a graph in which D 50 (Al) / D 90 (Si) is plotted on the horizontal axis and the amount of unmelted SiO 2 (wt%) is plotted on the vertical axis.
- the ratio of the aluminum compound-containing starting material of D 50 (Al) and silica sand of D 90 (Si), D 50 (Al) / D 90 (Si) is 0.15 greater
- the amount of unmelted SiO 2 can be reduced and the occurrence of defects can be effectively suppressed.
- FIG. 15 is a graph in which Sw (Al) / [D 90 (Si) ⁇ 250 ⁇ m] is plotted on the horizontal axis and the amount of unmelted SiO 2 (wt%) is plotted on the vertical axis.
- D 90 (Si) of the silica sand is over 280 ⁇ m
- the ratio of D 50 (Al) of the aluminum compound-containing raw material to [D 90 (Si) ⁇ 250 ⁇ m] D 50 (Al ) / [D 90 (Si) -250 ⁇ m] is 0.5 or more, it was found that the amount of unmelted SiO 2 can be reduced and the occurrence of defects can be effectively suppressed.
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Abstract
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CN201380068993.XA CN104884401A (zh) | 2012-12-27 | 2013-12-19 | 碱铝硅酸盐玻璃的制造方法 |
KR1020157017115A KR20150103007A (ko) | 2012-12-27 | 2013-12-19 | 알칼리 알루미노실리케이트 유리의 제조 방법 |
JP2014554395A JPWO2014103897A1 (ja) | 2012-12-27 | 2013-12-19 | アルカリアルミノシリケートガラスの製造方法 |
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JP2018070430A (ja) * | 2016-11-02 | 2018-05-10 | 日本電気硝子株式会社 | アルミノシリケートガラスの製造方法 |
WO2018088503A1 (fr) * | 2016-11-14 | 2018-05-17 | 旭硝子株式会社 | Procédé de fabrication de verre fondu et procédé de fabrication d'article en verre |
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JP5699434B2 (ja) * | 2009-04-02 | 2015-04-08 | 旭硝子株式会社 | 情報記録媒体基板用ガラス、情報記録媒体用ガラス基板および磁気ディスク |
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- 2013-12-19 WO PCT/JP2013/084160 patent/WO2014103897A1/fr active Application Filing
- 2013-12-19 JP JP2014554395A patent/JPWO2014103897A1/ja not_active Withdrawn
- 2013-12-19 KR KR1020157017115A patent/KR20150103007A/ko not_active Application Discontinuation
- 2013-12-19 CN CN201380068993.XA patent/CN104884401A/zh active Pending
- 2013-12-27 TW TW102148854A patent/TW201431817A/zh unknown
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JP2010202413A (ja) * | 2007-06-27 | 2010-09-16 | Asahi Glass Co Ltd | ガラスの製造方法、ガラス原料の製造方法及びガラス原料 |
JP2012036075A (ja) * | 2010-07-12 | 2012-02-23 | Nippon Electric Glass Co Ltd | 珪酸塩ガラスの製造方法 |
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JP2018070430A (ja) * | 2016-11-02 | 2018-05-10 | 日本電気硝子株式会社 | アルミノシリケートガラスの製造方法 |
WO2018088503A1 (fr) * | 2016-11-14 | 2018-05-17 | 旭硝子株式会社 | Procédé de fabrication de verre fondu et procédé de fabrication d'article en verre |
KR20190082781A (ko) | 2016-11-14 | 2019-07-10 | 에이지씨 가부시키가이샤 | 용융 유리의 제조 방법 및 유리 물품의 제조 방법 |
JPWO2018088503A1 (ja) * | 2016-11-14 | 2019-10-03 | Agc株式会社 | 溶融ガラスの製造方法およびガラス物品の製造方法 |
TWI742195B (zh) * | 2016-11-14 | 2021-10-11 | 日商Agc股份有限公司 | 熔融玻璃之製造方法及玻璃物品之製造方法 |
KR102413987B1 (ko) | 2016-11-14 | 2022-06-29 | 에이지씨 가부시키가이샤 | 용융 유리의 제조 방법 및 유리 물품의 제조 방법 |
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KR20150103007A (ko) | 2015-09-09 |
TW201431817A (zh) | 2014-08-16 |
CN104884401A (zh) | 2015-09-02 |
JPWO2014103897A1 (ja) | 2017-01-12 |
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