WO2013179897A1 - 熱電材料及びその製造方法並びにそれを用いた熱電変換モジュール - Google Patents
熱電材料及びその製造方法並びにそれを用いた熱電変換モジュール Download PDFInfo
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/80—Constructional details
- H10N10/85—Thermoelectric active materials
- H10N10/851—Thermoelectric active materials comprising inorganic compositions
- H10N10/8556—Thermoelectric active materials comprising inorganic compositions comprising compounds containing germanium or silicon
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/10—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects operating with only the Peltier or Seebeck effects
- H10N10/17—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects operating with only the Peltier or Seebeck effects characterised by the structure or configuration of the cell or thermocouple forming the device
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/80—Constructional details
- H10N10/85—Thermoelectric active materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/80—Constructional details
- H10N10/85—Thermoelectric active materials
- H10N10/851—Thermoelectric active materials comprising inorganic compositions
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/80—Constructional details
- H10N10/85—Thermoelectric active materials
- H10N10/851—Thermoelectric active materials comprising inorganic compositions
- H10N10/855—Thermoelectric active materials comprising inorganic compositions comprising compounds containing boron, carbon, oxygen or nitrogen
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/80—Constructional details
- H10N10/85—Thermoelectric active materials
- H10N10/857—Thermoelectric active materials comprising compositions changing continuously or discontinuously inside the material
Definitions
- the present invention relates to a thermoelectric material using semiconductor nanodots, specifically, a thermoelectric material including nanodots composed of silicon, germanium, or a silicon-based semiconductor, a thermoelectric conversion module using the thermoelectric material, and manufacture of the thermoelectric material Regarding the method.
- thermoelectric conversion technology for effective use of energy has been attracting attention in order to reduce environmental impact. Therefore, high-performance thermoelectric materials using rare metals such as BiTe, PbTe, and SiGe have been developed as thermoelectric materials used in the thermoelectric conversion technology using the Seebeck effect.
- rare metals such as BiTe, PbTe, and SiGe
- these use rare metals and there is a problem that they are not preferable from the viewpoint of environmental load and resource risk.
- S is the Seebeck coefficient
- ⁇ is the electrical conductivity
- k is the thermal conductivity
- T is the absolute temperature.
- thermoelectric material using a ubiquitous element typified by Si is preferable.
- the Seebeck coefficient S and the electrical conductivity ⁇ are sufficiently large, but there is a problem that the thermal conductivity k is large.
- thermoelectric material when a material having a nanostructure is used as the thermoelectric material, the thermal conductivity k is reduced by increasing phonon scattering or the like, and the quantum effect is obtained by using the low-dimensional nanostructure, and the power factor (S index called 2 sigma) have been reported to increase (non-patent documents 1-3).
- Non-Patent Documents 4 to 8 disclose high-performance thermoelectric materials using nanostructures such as nanowires, nanocomposites, and nanoporous materials.
- Non-Patent Document 9 It has also been reported that thermal conductivity is reduced by a material having a nanodot structure. It has also been reported that thermal conductivity is reduced by a material having a nanodot structure. Attempts have been made to form nano-openings in an ultrathin silicon oxide film formed on a silicon substrate and to epitaxially grow islands of nanodots there for use as optical devices (Non-Patent Documents 10 to 12). Furthermore, a method of epitaxially growing a SK dot superlattice using the Transki Clusternov (SK) growth has been attempted.
- SK Transki Clusternov
- Patent Document 1 discloses a method of manufacturing a semiconductor optical device in which nanodots composed of silicon compounds are epitaxially stacked by filling a space with a spacer layer composed of a material such as Si. It has been suggested to use the device as a thermoelectric conversion device (paragraph [0042] etc.).
- Shklyaev, et al. "Visible photoluminescence of Ge dots embedded in SiO / SiO2 matrices", APPLIED PHYSICS LETTERS VOLUME 80, NUMBER 8, 25 FEBRUARY 2002, 1432-1434.
- Alexander A. Shklyaev, et al. "High-density ultrasmall epitaxial Ge islands on Si (111) surfaces with a SiO2 coverage", PHYSICAL REVIEW B VOLUME 62, NUMBER 3 15 JULY 2000-I, 1540-1543.
- Alexander A. Shklyaev, et al. "Three-dimensional Si islands on Si (001) surfaces", PHYSICAL REVIEW B, VOLUME 65, 045307.
- thermoelectric material having excellent thermoelectric conversion efficiency can be obtained by the low-dimensional nanostructure.
- nanowires having a one-dimensional structure are difficult to use as thermoelectric materials because of the structure.
- the crystal orientation, size, and spacing between nanostructures of the nanostructures are not uniform, resulting in poor controllability, thus lowering electrical conductivity and further improving quantum effects. It is also difficult to use.
- the nanoporous structure it is difficult to use the performance improvement using the quantum effect peculiar to the nanostructure.
- An object of the present invention is to provide a thermoelectric material excellent in thermoelectric conversion performance and a method for producing the thermoelectric material.
- the first aspect of the present invention provides: A semiconductor substrate; A semiconductor oxide film formed on a semiconductor substrate; A thermoelectric material comprising a thermoelectric layer provided on a semiconductor oxide film, A first nano opening is formed in the semiconductor oxide film,
- the thermoelectric layer has a shape in which a plurality of semiconductor nanodots are stacked on the first nanoopening so as to have a particle-filled structure, At least some of the plurality of semiconductor nanodots have second nano openings formed on the surface thereof, and are connected to each other with the crystal orientation aligned through the second nano openings.
- the semiconductor nanodot has a potential barrier layer provided on the surface,
- the second nano opening is preferably formed in the potential barrier layer.
- the semiconductor nanodot is preferably composed of a material selected from the group consisting of Si, Ge, SiGe, and a silicon-based compound of Mg, Fe, and Mn.
- the potential barrier layer is preferably composed of SiO 2 .
- the potential barrier layer is preferably composed of Si and has an oxide layer composed of SiO 2 on the surface.
- the semiconductor nanodots preferably have a diameter of 2 nm to 50 nm.
- the semiconductor nanodots preferably have an in-plane density of 10 11 cm ⁇ 2 or more.
- the potential barrier layer preferably has a thickness of 3 nm or less.
- the semiconductor nanodot preferably contains a p-type or n-type dopant.
- the second aspect of the present invention is A thermoelectric conversion module comprising p-type thermoelectric elements and n-type thermoelectric elements arranged alternately and electrically connected in series,
- the p-type thermoelectric element and the n-type thermoelectric element have the thermoelectric material of the first aspect of the present invention, It is provided on the main surface opposite to the main surface of the semiconductor substrate on which the semiconductor device is formed.
- the third aspect of the present invention is A method of manufacturing a thermoelectric material, A preparation step of preparing a semiconductor substrate; An oxidation step of oxidizing the semiconductor substrate and forming a semiconductor oxide film on the semiconductor substrate; An opening step of forming a first nano-opening in the semiconductor oxide film; A growth step of epitaxially growing and stacking a plurality of semiconductor nanodots made of a semiconductor material on the first nano opening.
- the growth step it is preferable to form a second nano-opening in the semiconductor nanodot and connect the plurality of semiconductor nano-dots via the second nano-opening.
- the semiconductor nanodots are connected to each other with their crystal orientations aligned to improve electrical conductivity.
- the thermal conductivity is reduced due to the structure of the nanodot itself, and the quantum effect due to the nanostructure is obtained, so that the power factor is increased. Accordingly, a thermoelectric material having excellent thermoelectric conversion performance and a thermoelectric conversion module including a thermoelectric conversion element using the thermoelectric material are realized.
- FIG. 2 is a sectional view taken along line AA in FIG. 1.
- FIG. 3A shows before formation of a film
- FIG. 3B shows after formation, respectively.
- FIG. 4A shows preparation of a nanodot
- FIG. 4B shows formation of the layer opening part in a barrier layer
- FIG. 4C shows preparation of a new nanodot, respectively.
- FIG. 4A shows creation of the nanodot comprised with a silicide.
- FIG. 6A is a high-resolution cross-sectional TEM image of epitaxially grown Si nanodots
- FIG. 6B is an enlarged view of a portion surrounded by a square in FIG. 6A.
- It is a schematic diagram which shows the thermoelectric conversion module by Embodiment 2 of this invention. It is a perspective view which shows the thermoelectric conversion module by Embodiment 2 of this invention. It is the schematic diagram corresponding to FIG. 7 which shows the alternative structure of a thermoelectric conversion module.
- thermoelectric material 10 by Embodiment 1 of this invention is demonstrated using FIG. 1, FIG.
- the thermoelectric material 10 according to the present embodiment includes a silicon substrate 1, a silicon oxide film 2 formed on the silicon substrate 1, and a thermoelectric layer 3 provided on the silicon oxide film 2.
- the silicon substrate 1 is preferably a single crystal silicon substrate.
- the silicon oxide film 2 is preferably an ultrathin oxide film having a thickness of about a monomolecular film or bimolecular film of SiO 2 .
- the thermoelectric layer 3 is configured such that a plurality of nanodots 4 surrounded by a potential barrier layer (hereinafter referred to as a barrier layer) 5 are stacked so as to have a particle-packed structure.
- a potential barrier layer hereinafter referred to as a barrier layer
- the nanodot refers to a substantially spherical or substantially oval spherical nanocrystal having a size of nanometer order. However, depending on the manufacturing process, it may take a shape far from spherical or elliptical. “Plural” means that two or more nanodots are stacked in the vertical direction. For example element when used as a high tens ⁇ m about the thermoelectric conversion element can be used thermoelectric materials nanodots 4 rises 10 2 to 10 5 about loading in the longitudinal direction.
- the silicon oxide film 2 has an oxide film opening (hereinafter simply referred to as a film opening) 2a, and the nanodots 4 are provided on the film opening 2a.
- a barrier layer opening (hereinafter simply referred to as a layer opening) 5a is also formed in the barrier layer 5, and at least some of the plurality of nanodots 4 are aligned with each other in crystal orientation via the layer opening 5a. It is connected. That is, the plurality of nanodots 4 are configured to be epitaxially grown and stacked on the silicon oxide film 2.
- the nanodots 4 are stacked so as to have a particle-packed structure.
- the particle packing structure may be a regular packing structure or a random packing structure.
- a part may have a regular filling structure and a part may have a random filling structure.
- the nanodots 4 are preferably stacked linearly on the film opening 2a.
- a plurality of layer openings 5 a may be formed in one barrier layer 5, and the nanodots 4 may have a tree-like or randomly grown configuration.
- voids are formed between the plurality of nanodots 4, but the voids may include a portion made of a material such as silicon generated in the manufacturing process of the thermoelectric material 10.
- the nanodot 4 is made of Si, Ge or SiGe, or silicide such as Mg, Fe, or Mn.
- the chemical formulas of these silicides are represented by Mg 2 Si, ⁇ -FeSi 2 , and MnSi x , respectively.
- the nanodot 4 preferably has a diameter of 1 nm to 100 nm, and more preferably 2 nm to 50 nm in order to exhibit the quantum effect remarkably. Further, the nanodot 4 preferably has an in-plane density of 10 9 cm ⁇ 2 or more and 10 13 cm ⁇ 2 or less, and more preferably 10 11 cm ⁇ 2 or more, in order to improve the electric conductivity ⁇ . Furthermore, in order to maintain the improved electrical conductivity ⁇ , the size of each nanodot 4 is preferably substantially uniform.
- the barrier layer 5 is made of a material having a larger band gap than the material constituting the nanodots 4.
- the barrier layer 5 can be made of SiO 2
- the nanodot 4 is made of Ge, SiGe, or silicide
- the barrier layer 5 can be made of Si or SiGe.
- a surface oxide layer (not shown) made of SiO 2 is formed on the outermost surface of the barrier layer 5.
- the barrier layer 5 preferably has a thickness of 3 nm or less in order to sufficiently exhibit the thermoelectric properties of the material constituting the nanodot 4.
- the manufacturing method of the thermoelectric material 10 by Embodiment 1 of this invention is demonstrated using FIG. 3 when the nanodot 4 is comprised with Si.
- the manufacturing method of the thermoelectric material 10 according to the present embodiment includes a preparation step S1 for preparing the silicon substrate 1, an oxidation step S2 for oxidizing the substrate surface of the silicon substrate 1 to form a silicon oxide film 2, and a silicon oxide film 2.
- An opening step S3 for forming the film opening 2a, a growth step S4 for epitaxially growing and depositing nanodots 4 made of Si on the film opening 2a, and the like are included.
- the surface of the silicon substrate 1 is oxidized under a low oxygen partial pressure / high temperature condition such as an oxygen partial pressure of 2 ⁇ 10 ⁇ 4 Pa and 600 ° C. to a thickness of about one molecular layer or two molecular layers.
- a silicon oxide film 2 is formed.
- the silicon oxide film 2 is irradiated with the Si atomic beam 20a generated by the silicon evaporation source 20 shown in FIG. 3A under high vacuum (for example, 10 ⁇ 5 Pa or less), for example, at a temperature of 500 ° C. or more.
- high vacuum for example, 10 ⁇ 5 Pa or less
- the reaction shown in the following formula (1) Si + SiO 2 ⁇ 2SiO ⁇ (1)
- the silicon oxide film 2 disappears and SiO is sublimated to form a film opening 2a as shown in FIG. 3B.
- the silicon oxide film 2 is irradiated with the Si atomic beam 20a. Then, Si atoms are vapor-deposited on the dangling bonds of Si on the surface of the silicon substrate 1 exposed on the film opening 2a to form the nanodots 4.
- the irradiation of the Si atomic beam 20a is stopped, and the barrier layer 5 made of SiO 2 is provided around the nano dots 4 by oxidizing the nano dots 4 made of Si.
- the irradiation of the Si atomic beam 20a is resumed, and the layer opening 5a is formed according to the above formula (1).
- the layer opening 5a may be formed under the same vacuum conditions and temperature conditions as the opening step S3 in which the film opening 2a is formed. For example, considering the size and composition of the barrier layer 5, different vacuum conditions may be used. -You may form on temperature conditions.
- Si atoms are vapor-deposited on the layer opening 5a to create a new nanodot 4.
- many of the nanodots 4 are connected in a state where crystal orientations are aligned through the layer opening 5a. That is, by repeating the above-described processes shown in FIGS. 4A to 4C, a plurality of nanodots 4 are epitaxially grown on the film opening 2a formed in the silicon oxide film 2 and stacked.
- the opening step S3 and the growth step S4 have been described separately.
- the formation of the film opening 2a in the opening step S3 and the creation of the nanodot 4 in the growth step S4. Will continuously proceed by irradiating the silicon oxide film 2 with the Si atomic beam 20a.
- the film opening 2a is formed by irradiation with the Si atomic beam 20a, but it can also be formed by irradiation with a Ge atomic beam generated by a germanium evaporation source (not shown).
- the silicon oxide film 2 disappears, and SiO and GeO are sublimated to form a film opening 2a.
- the nanodot 4 is made of Si.
- an opening process S3 and a growth process S4 using a plurality of evaporation sources For example, when the nanodot 4 is made of iron silicide, as shown in FIG. 5, the film opening 2a is formed by the Si atom beam 20a generated by the silicon evaporation source 20, and the Si atom beam 20a and the iron evaporation source 22 are used.
- the nanodots 4 made of iron silicide can be created.
- Nanodots composed of manganese silicide and magnesium silicide can also be created under similar conditions.
- the barrier layer 5 made of a desired material can be provided by irradiating an atomic beam of a material such as Si, SiGe, or silicide constituting the barrier layer 5.
- a material such as Si, SiGe, or silicide constituting the barrier layer 5.
- the barrier layer 5 is composed of a material other than SiO 2
- the barrier layer 5 is oxidized to form a surface oxide layer composed of SiO 2 on the surface.
- 20a (Ge atomic beam) is irradiated, and the layer opening 5a is formed according to the above formula (1) or (2).
- FIG. 6A is a high-resolution cross-sectional TEM image of a thermoelectric layer portion of a thermoelectric material manufactured by the above-described method, and shows a cross section of Si nanodots epitaxially grown on a single crystal silicon substrate.
- the size of the nanodot was made to be about 3 nm in diameter.
- the barrier layer composed of SiO 2 cannot be visually recognized because it has a thickness of about 1 or 2 molecules, that is, less than 1 nm.
- FIG. 6B which is an enlarged view of a portion surrounded by a square in FIG. 6A, it can be seen that a substantially spherical nanodot composed of Si is created in the circled portion. It can also be seen that voids are formed between the circled portions, and the nanodots are randomly spread and stacked.
- the thermal conductivity k of the thermoelectric material thus manufactured was measured by the 2 ⁇ method. That is, when a voltage of frequency ⁇ is applied to the thermoelectric material, the generated Joule heat changes at the frequency 2 ⁇ , and therefore the electric resistance value of the thermoelectric material also changes at the frequency 2 ⁇ , and the amplitude of the output voltage is measured. The thermal conductivity k was measured.
- thermal conductivity k of k 0.67 ⁇ 0.11 W / mK was obtained. Since bulk Si has a thermal conductivity k of about 150 W / mK, the value of the thermal conductivity k is greatly reduced by using a thermoelectric layer having a configuration in which nanodots are stacked as in this embodiment. I understand. In general, it is known that by making a material amorphous, phonon scattering increases and the value of thermal conductivity k is minimized. The value of the thermal conductivity k of the thermoelectric material manufactured by the manufacturing method according to the present embodiment was much lower than the thermal conductivity of about 2.0 W / mK of amorphous silicon.
- thermoelectric material 10 including the thermoelectric layer 3 having the plurality of nanodots 4 and the manufacturing method thereof have been described.
- the thermoelectric layer 3 is composed of a plurality of nanodots 4
- the thermal conductivity k is reduced by increasing phonon scattering due to the nanostructure.
- the nanodot 4 is made of Si
- the problematic thermal conductivity k can be greatly reduced, as can be seen from the results of the 2 ⁇ method.
- thermoelectric material 10 having excellent thermoelectric conversion performance is realized.
- the provision of the spacer layer increases the ratio of the material constituting the spacer layer to the material constituting the nanodot (see FIG. 10). Therefore, the thermoelectric property of the material constituting the nanodot has not been sufficiently exhibited.
- the nanodot 4 since the nanodot 4 has a stacked configuration and the barrier layer 5 has a configuration provided around the nanodot 4, the ratio of the material constituting the nanodot 4 is increased. The excellent thermoelectric properties of the material will be exhibited by nanostructuring.
- the nanodot 4 is provided on the film opening 2a formed in the silicon oxide film 2, the nanodot 4 is epitaxially grown across the amorphous structure of SiO 2 that increases phonon scattering.
- the nanodot 4 has a barrier layer 5 having a thickness of 10 nm or less, that is, several atomic layers provided around it, and is connected through a layer opening 5 a formed in the barrier layer 5. Since such a structure can be created by continuously irradiating atomic beams, the manufacturing process of the thermoelectric material 10 can be simplified.
- thermoelectric material having the same structure as the thermoelectric material 10 according to the present embodiment can be obtained.
- the semiconductor oxide film for example, a Si x Ge y O z film formed by oxidizing a SiGe mixed crystal substrate or a GeO x film formed by oxidizing a Ge substrate can be used.
- thermoelectric material 10 a substrate made of a semiconductor is used as the substrate of the thermoelectric material 10
- a semiconductor thin film deposited on a glass substrate or the like by an electron beam heating method or the like may be used as the semiconductor substrate.
- another semiconductor thin film may be formed on a silicon substrate or the like.
- thermoelectric material 60 according to Embodiment 2 of the present invention will be described with reference to FIG.
- atomic beams of materials such as Si, Ge, SiGe, and silicide constituting the nanodot 4 were irradiated (see FIG. 4).
- a dopant that is, an atomic beam of an acceptor atom or a donor atom is irradiated.
- thermoelectric material 60 constitutes a p-type semiconductor or an n-type semiconductor. Except for the above points, the configuration of the thermoelectric material 60 and each process of the manufacturing method thereof are the same as those in the first embodiment, and therefore, the same reference numerals are given and description thereof is omitted.
- the acceptor atom can be boron, aluminum, gallium, indium or the like, and the donor atom can be phosphorus, arsenic, antimony or the like.
- the nanodot 54 is made of a material other than Si or Ge, a material well known to those skilled in the art can be used as an acceptor atom or a donor atom.
- FIG. 7 is a schematic diagram showing a thermoelectric conversion module 70 according to Embodiment 2 of the present invention.
- the thermoelectric conversion module 70 includes a thermoelectric conversion element using the thermoelectric material 60.
- the thermoelectric conversion module refers to an aggregate of a plurality of thermoelectric conversion elements.
- the thermoelectric conversion module 70 includes thermoelectric conversion elements alternately disposed between the electrodes 72a and 72b, that is, p-type thermoelectric elements 71a and n-type thermoelectric elements 71b.
- the electrode 72a is provided on the module surface of the silicon substrate 81, and an electrical insulating material 73 such as a ceramic plate is provided on the electrode 72b.
- thermoelectric conversion module 70 is illustrated as being two-dimensionally arranged. However, as illustrated in FIG. 8, the thermoelectric conversion module 70 is three-dimensionally disposed. It has a configuration. In FIG. 8, the electrodes 72a and 72b are omitted.
- thermoelectric conversion module 70 has a configuration for thermoelectrically converting Joule heat generated by the operation of the semiconductor device 83 and conducted to the module surface of the silicon substrate 81.
- thermoelectric element 71a and the n-type thermoelectric element 71b are electrically connected in series.
- thermoelectric material 60 prepared by doping as described above can be used as the p-type and n-type thermoelectric elements 71a and 71b.
- the electrode 72a can be provided by depositing a metal such as aluminum on the semiconductor substrate 81 and subsequently performing a photolithography process. In general, since the formation of the semiconductor device 83 includes metal deposition and photolithography processes, the electrode 72 a can be provided simultaneously with the formation of the device 83.
- the p-type and n-type thermoelectric elements 71a and 71b are joined to the electrodes 72a and 72b so as to be electrically connected in series. In this way, the thermoelectric conversion module 70 is provided on the module surface of the silicon substrate 81.
- a joining member may be interposed between the p-type and n-type thermoelectric elements 71a and 71b and the electrodes 72a and 72b.
- FIG. 9 shows an alternative configuration of the thermoelectric conversion module 70 according to the present embodiment.
- a conductive layer 74 is formed on the upper surface of the silicon substrate 81 by highly doping impurities such as aluminum by thermal diffusion, and then an electrode 72a as shown in FIG. 9 is formed by an etching process.
- a silicon oxide film (not shown) is formed on the electrode 72a by oxidizing the electrode 72a, and then the above-described opening process S3 and growth process S4 are performed.
- the thermoelectric material 60 which comprises the p-type and n-type thermoelectric elements 71a and 71b and the electrode 72a can be provided on the silicon substrate 81.
- thermoelectric material 60 since the nanodots 54 of the thermoelectric material 60 have acceptor atoms or donor atoms, the thermoelectric material 60 can be used as the p-type thermoelectric element 71 a and the n-type thermoelectric element 71 b in the thermoelectric conversion module 70.
- thermoelectric conversion module 70 on the back surface of the semiconductor device 83 such as an LSI, the exhaust heat generated by the device 83 is converted into electric energy by the thermoelectric conversion module 70. This not only eliminates the need for electric power for cooling the semiconductor device 83 and the like to prevent temperature rise due to exhaust heat, but also makes it possible to effectively use exhaust heat, so that the energy efficiency of the entire system is greatly increased.
- thermoelectric module 70 can be completely incorporated into the formation of the semiconductor device 83.
- the thermoelectric module 70 can be provided easily and efficiently.
- thermoelectric power generation module Although demonstrated as a case where the p-type and n-type semiconductor which the thermoelectric material 60 manufactured by this embodiment comprised were used as a thermoelectric power generation module, it is also possible to use as a Peltier module by the same structure.
- thermoelectric module 70 is stacked on the back surface (module surface) of the LSI, and the first-stage (LSI side) module is used as the Peltier module, and the second-stage module is used as the thermoelectric power generation module.
- the Peltier module When the Peltier module is operated, the LSI side of the module is cooled and the opposite side becomes hot. This heat is transmitted to the thermoelectric power generation module to generate power. Even in this case, the energy efficiency of the entire system can be improved by effectively utilizing the exhaust heat.
- thermoelectric material 10 or 60 according to the present invention when the thermoelectric material 10 or 60 according to the present invention is manufactured using the silicon substrate 1 obtained by crystallizing the surface of the polycrystalline silicon substrate, the thermoelectric material 10 or 60 can be preferably used for manufacturing a solar cell. Is possible.
- thermoelectric material according to the present invention can be widely applied to the manufacture of thermoelectric conversion elements that mutually convert thermal energy and electrical energy, light emitting elements such as lasers, and solar cells.
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Abstract
Description
半導体基板と、
半導体基板上に形成された半導体酸化膜と、
半導体酸化膜上に設けられた熱電層とを備えた熱電材料であって、
半導体酸化膜には第1ナノ開口部が形成され、
熱電層は、複数の半導体ナノドットが粒子充填構造を有するように該第1ナノ開口部上に積み上がった形をとり、
複数の半導体ナノドットの少なくとも一部は、その表面に形成された第2ナノ開口部を有し、かつ、該第2ナノ開口部を介して互いに結晶方位を揃えて連結している。
第2ナノ開口部は、該ポテンシャルバリア層に形成されることが好ましい。
交互に配設され且つ電気的に直列接続されたp型熱電素子及びn型熱電素子を備えた熱電変換モジュールであって、
p型熱電素子及びn型熱電素子は、本発明の第1態様の熱電材料を有し、
半導体デバイスが形成される半導体基板の主面と反対側の主面に設けられる。
熱電材料の製造方法であって、
半導体基板を準備する準備工程と、
半導体基板を酸化し、該半導体基板上に半導体酸化膜を形成する酸化工程と、
半導体酸化膜に第1ナノ開口部を形成する開口工程と、
第1ナノ開口部上に、半導体材料で構成される複数の半導体ナノドットをエピタキシャル成長させて積み上げる成長工程とを含む。
成長工程では、半導体ナノドットに第2ナノ開口部を形成し、該第2ナノ開口部を介して複数の半導体ナノドットを連結させることが好ましい。
まず、図1、図2を用いて、本発明の実施形態1による熱電材料10について説明する。
図1、図2に示すように、本実施形態による熱電材料10は、シリコン基板1と、シリコン基板1上に形成されたシリコン酸化膜2と、シリコン酸化膜2上に設けられた熱電層3とを備える。シリコン基板1は、単結晶シリコン基板を用いることが好ましい。シリコン酸化膜2は、SiO2の単分子膜又は二分子膜程度の厚さを有する極薄酸化膜であることが好ましい。熱電層3は、ポテンシャルバリア層(以下、バリア層)5に包囲された複数のナノドット4が粒子充填構造を有するように積み上がった形で構成される。
本実施形態による熱電材料10の製造方法は、シリコン基板1を準備する準備工程S1と、シリコン基板1の基板表面を酸化してシリコン酸化膜2を形成する酸化工程S2と、シリコン酸化膜2に膜開口部2aを形成する開口工程S3と、膜開口部2a上にSiで構成されるナノドット4をエピタキシャル成長させて積み上げる成長工程S4と、等を含む。
Si+SiO2→2SiO↑ …(1)
によりシリコン酸化膜2が消失し、SiOが昇華して、図3Bに示すように膜開口部2aが形成される。
Ge+SiO2→SiO↑+GeO↑ …(2)
によりシリコン酸化膜2が消失し、SiO及びGeOが昇華して膜開口部2aが形成される。
SixGeyOz+aSi→bSiO↑+cGeO↑ …(3)
GeOx+dSi→eSiO↑+GeO↑ …(4)
により開口部が形成され、Ge原子線を用いた場合には、それぞれ下記の式(5),(6)に示す反応、
SixGeyOz+fGe→gSiO↑+hGeO↑ …(5)
GeOx+iGe→jGeO↑ …(6)
により開口部が形成される。係数a~jは、x,y,zによって決定される。その他、化学式がSiFexOyで表されるシリサイドを酸化して形成した酸化膜にも、開口部が形成されることが考えられる。
次に、本発明の実施形態2による熱電材料60について、実施形態1の説明に用いた図1等により説明する。
実施形態1では、熱電材料の製造方法における成長工程S4において、ナノドット4を構成するSi、Ge、SiGe、シリサイド等の材料の原子線を照射した(図4を参照)。一方、本実施形態では、成長工程S4で、ナノドット54を構成する材料の原子線に加えて、ドーパント、即ちアクセプタ原子又はドナー原子の原子線を照射する。その結果、熱電層53が有するナノドット54はドープされ、熱電材料60はp型半導体又はn型半導体を構成する。以上の点を除き、熱電材料60の構成及びその製造方法の各工程は、実施形態1と同様であり、それゆえ同一の符号を付して説明は省略する。
図7に示すように、熱電変換モジュール70は、電極72aと電極72bとの間に交互に配設された熱電変換素子、即ちp型熱電素子71a及びn型熱電素子71bを有する。電極72aはシリコン基板81のモジュール面上に設けられており、電極72b上には電気絶縁材73、例えばセラミック板が設けられる。
2 シリコン酸化膜
2a 酸化膜開口部(第1ナノ開口部)
3 熱電層
4 ナノドット
5 バリア層
5a バリア層開口部(第2ナノ開口部)
10,60 熱電材料
20 シリコン蒸発源
22 鉄蒸発源
70 熱電変換モジュール
83 半導体デバイス
Claims (12)
- 半導体基板と、
半導体基板上に形成された半導体酸化膜と、
半導体酸化膜上に設けられた熱電層とを備え、
半導体酸化膜には第1ナノ開口部が形成され、
熱電層は、複数の半導体ナノドットが粒子充填構造を有するように該第1ナノ開口部上に積み上がった形をとり、
複数の半導体ナノドットの少なくとも一部は、その表面に形成された第2ナノ開口部を有し、かつ、該第2ナノ開口部を介して互いに結晶方位を揃えて連結していることを特徴とする熱電材料。 - 半導体ナノドットは、表面に設けられたポテンシャルバリア層を有し、
第2ナノ開口部は、該ポテンシャルバリア層に形成されたことを特徴とする、請求項1に記載の熱電材料。 - 半導体ナノドットは、Si、Ge、SiGe並びにMg、Fe及びMnのシリコン系化合物から成る群から選択される材料で構成されたことを特徴とする、請求項1又は2に記載の熱電材料。
- ポテンシャルバリア層は、SiO2で構成されたことを特徴とする、請求項2に記載の熱電材料。
- ポテンシャルバリア層は、Siで構成され、かつ、表面にSiO2で構成された酸化層を有することを特徴とする、請求項2に記載の熱電材料。
- 半導体ナノドットは、2nm以上50nm以下の直径を有することを特徴とする、請求項1~5のいずれか1項に記載の熱電材料。
- 半導体ナノドットは、1011cm-2以上の面内密度を有することを特徴とする、請求項1~6のいずれか1項に記載の熱電材料。
- ポテンシャルバリア層は、3nm以下の厚さを有することを特徴とする、請求項2に記載の熱電材料。
- 半導体ナノドットは、p型又はn型のドーパントを含むことを特徴とする、請求項1~8のいずれか1項に記載の熱電材料。
- 交互に配設され且つ電気的に直列接続されたp型熱電素子及びn型熱電素子を備えた熱電変換モジュールであって、
p型熱電素子及びn型熱電素子は、請求項9に記載の熱電材料を有し、
半導体デバイスが形成される半導体基板の主面と反対側の主面に設けられたことを特徴とする熱電変換モジュール。 - 半導体基板を準備する準備工程と、
半導体基板を酸化し、該半導体基板上に半導体酸化膜を形成する酸化工程と、
半導体酸化膜に第1ナノ開口部を形成する開口工程と、
第1ナノ開口部上に、半導体材料で構成される複数の半導体ナノドットをエピタキシャル成長させて積み上げる成長工程とを含むことを特徴とする、熱電材料の製造方法。 - 成長工程では、半導体ナノドットに第2ナノ開口部を形成し、該第2ナノ開口部を介して複数の半導体ナノドットを連結させることを特徴とする、請求項11に記載の熱電材料の製造方法。
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US20180190891A1 (en) * | 2015-06-30 | 2018-07-05 | Sumitomo Electric Industries, Ltd. | Thermoelectric material, thermoelectric element, optical sensor, and method for manufacturing thermoelectric material |
US10944037B2 (en) * | 2015-06-30 | 2021-03-09 | Sumitomo Electric Industries, Ltd. | Thermoelectric material, thermoelectric element, optical sensor, and method for manufacturing thermoelectric material |
JP2017107932A (ja) * | 2015-12-08 | 2017-06-15 | 富士通株式会社 | 熱電変換素子及びその製造方法 |
JP2019119652A (ja) * | 2018-01-10 | 2019-07-22 | 国立研究開発法人物質・材料研究機構 | 断熱材料、その製造方法および内燃機関 |
JP7010474B2 (ja) | 2018-01-10 | 2022-02-10 | 国立研究開発法人物質・材料研究機構 | 断熱材料、その製造方法および内燃機関 |
JP2022040587A (ja) * | 2020-08-31 | 2022-03-11 | 国立大学法人東北大学 | 金属間化合物からなる多孔質フィルム、並びにその製造方法及び応用 |
JP7493775B2 (ja) | 2020-08-31 | 2024-06-03 | 国立大学法人東北大学 | 金属間化合物からなる多孔質フィルム、並びにその製造方法及び応用 |
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US9076925B2 (en) | 2015-07-07 |
CN103959496B (zh) | 2015-05-13 |
EP2784835A4 (en) | 2014-12-10 |
CN103959496A (zh) | 2014-07-30 |
EP2784835A1 (en) | 2014-10-01 |
US20140299172A1 (en) | 2014-10-09 |
KR20140070672A (ko) | 2014-06-10 |
TWI462354B (zh) | 2014-11-21 |
EP2784835B1 (en) | 2016-03-16 |
RU2561659C1 (ru) | 2015-08-27 |
TW201405896A (zh) | 2014-02-01 |
JPWO2013179897A1 (ja) | 2016-01-18 |
JP5424436B1 (ja) | 2014-02-26 |
KR101482598B1 (ko) | 2015-01-14 |
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