WO2013027827A1 - 表面処理溶融めっき鋼材 - Google Patents
表面処理溶融めっき鋼材 Download PDFInfo
- Publication number
- WO2013027827A1 WO2013027827A1 PCT/JP2012/071444 JP2012071444W WO2013027827A1 WO 2013027827 A1 WO2013027827 A1 WO 2013027827A1 JP 2012071444 W JP2012071444 W JP 2012071444W WO 2013027827 A1 WO2013027827 A1 WO 2013027827A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- plating layer
- hot
- layer
- dip
- mass
- Prior art date
Links
- 229910000831 Steel Inorganic materials 0.000 title claims abstract description 223
- 239000010959 steel Substances 0.000 title claims abstract description 223
- 239000000463 material Substances 0.000 title claims abstract description 161
- 238000007747 plating Methods 0.000 claims abstract description 497
- 239000011248 coating agent Substances 0.000 claims abstract description 186
- 238000000576 coating method Methods 0.000 claims abstract description 184
- 229910007981 Si-Mg Inorganic materials 0.000 claims abstract description 104
- 229910008316 Si—Mg Inorganic materials 0.000 claims abstract description 104
- 229920005989 resin Polymers 0.000 claims abstract description 76
- 239000011347 resin Substances 0.000 claims abstract description 76
- 150000001875 compounds Chemical class 0.000 claims abstract description 33
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 29
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 23
- 229910052749 magnesium Inorganic materials 0.000 claims abstract description 22
- 239000000470 constituent Substances 0.000 claims abstract description 21
- 239000006087 Silane Coupling Agent Substances 0.000 claims abstract description 20
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 14
- 150000003755 zirconium compounds Chemical class 0.000 claims abstract description 13
- 239000004593 Epoxy Substances 0.000 claims abstract description 12
- 229920003180 amino resin Polymers 0.000 claims abstract description 11
- 150000003609 titanium compounds Chemical class 0.000 claims abstract description 11
- 229910001335 Galvanized steel Inorganic materials 0.000 claims description 121
- 239000008397 galvanized steel Substances 0.000 claims description 121
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 56
- 239000002245 particle Substances 0.000 claims description 51
- -1 phosphoric acid compound Chemical class 0.000 claims description 51
- NBIIXXVUZAFLBC-UHFFFAOYSA-N phosphoric acid Substances OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 23
- 239000000314 lubricant Substances 0.000 claims description 18
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 16
- 239000000049 pigment Substances 0.000 claims description 14
- 238000004040 coloring Methods 0.000 claims description 11
- 239000007787 solid Substances 0.000 claims description 5
- 239000010410 layer Substances 0.000 description 503
- 239000010408 film Substances 0.000 description 196
- 239000012071 phase Substances 0.000 description 130
- 230000007797 corrosion Effects 0.000 description 108
- 238000005260 corrosion Methods 0.000 description 108
- 229910052751 metal Inorganic materials 0.000 description 83
- 239000002184 metal Substances 0.000 description 81
- 238000000034 method Methods 0.000 description 77
- 239000011651 chromium Substances 0.000 description 70
- 229910045601 alloy Inorganic materials 0.000 description 50
- 239000000956 alloy Substances 0.000 description 50
- 230000037303 wrinkles Effects 0.000 description 49
- 238000001816 cooling Methods 0.000 description 47
- 239000011701 zinc Substances 0.000 description 46
- 239000002585 base Substances 0.000 description 35
- 238000010438 heat treatment Methods 0.000 description 31
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 30
- 239000000203 mixture Substances 0.000 description 30
- 239000007789 gas Substances 0.000 description 29
- 239000010936 titanium Substances 0.000 description 28
- 229910052719 titanium Inorganic materials 0.000 description 28
- 230000008569 process Effects 0.000 description 25
- 238000011156 evaluation Methods 0.000 description 24
- 230000000694 effects Effects 0.000 description 22
- 230000015572 biosynthetic process Effects 0.000 description 21
- 239000008199 coating composition Substances 0.000 description 21
- 238000012545 processing Methods 0.000 description 21
- 239000012298 atmosphere Substances 0.000 description 20
- 239000002344 surface layer Substances 0.000 description 20
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 18
- 235000011007 phosphoric acid Nutrition 0.000 description 18
- 239000000047 product Substances 0.000 description 18
- 230000009471 action Effects 0.000 description 17
- 239000006229 carbon black Substances 0.000 description 17
- 235000019241 carbon black Nutrition 0.000 description 17
- 230000002829 reductive effect Effects 0.000 description 17
- 239000000523 sample Substances 0.000 description 17
- 239000002904 solvent Substances 0.000 description 17
- 235000015523 tannic acid Nutrition 0.000 description 17
- 229920002258 tannic acid Polymers 0.000 description 17
- TUSDEZXZIZRFGC-UHFFFAOYSA-N 1-O-galloyl-3,6-(R)-HHDP-beta-D-glucose Natural products OC1C(O2)COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC1C(O)C2OC(=O)C1=CC(O)=C(O)C(O)=C1 TUSDEZXZIZRFGC-UHFFFAOYSA-N 0.000 description 16
- 241001163841 Albugo ipomoeae-panduratae Species 0.000 description 16
- 239000001263 FEMA 3042 Substances 0.000 description 16
- LRBQNJMCXXYXIU-PPKXGCFTSA-N Penta-digallate-beta-D-glucose Natural products OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-PPKXGCFTSA-N 0.000 description 16
- 238000004381 surface treatment Methods 0.000 description 16
- LRBQNJMCXXYXIU-NRMVVENXSA-N tannic acid Chemical compound OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-NRMVVENXSA-N 0.000 description 16
- 229940033123 tannic acid Drugs 0.000 description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 16
- 239000003973 paint Substances 0.000 description 15
- 229920005672 polyolefin resin Polymers 0.000 description 15
- 239000000126 substance Substances 0.000 description 15
- 238000012360 testing method Methods 0.000 description 15
- 238000011109 contamination Methods 0.000 description 14
- 238000005096 rolling process Methods 0.000 description 14
- 238000001035 drying Methods 0.000 description 13
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 12
- 229910052804 chromium Inorganic materials 0.000 description 12
- 238000002347 injection Methods 0.000 description 12
- 239000007924 injection Substances 0.000 description 12
- 229910052742 iron Inorganic materials 0.000 description 12
- 238000004519 manufacturing process Methods 0.000 description 12
- 239000003960 organic solvent Substances 0.000 description 12
- 239000001301 oxygen Substances 0.000 description 12
- 229910052760 oxygen Inorganic materials 0.000 description 12
- 238000007711 solidification Methods 0.000 description 12
- 230000008023 solidification Effects 0.000 description 12
- 238000000137 annealing Methods 0.000 description 11
- 239000003822 epoxy resin Substances 0.000 description 11
- 230000006872 improvement Effects 0.000 description 11
- 230000001590 oxidative effect Effects 0.000 description 11
- 229920000647 polyepoxide Polymers 0.000 description 11
- 238000007665 sagging Methods 0.000 description 11
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 10
- 229910001297 Zn alloy Inorganic materials 0.000 description 10
- 238000005259 measurement Methods 0.000 description 10
- 229920005862 polyol Polymers 0.000 description 10
- 238000001556 precipitation Methods 0.000 description 10
- 229910052712 strontium Inorganic materials 0.000 description 10
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 9
- 239000003431 cross linking reagent Substances 0.000 description 9
- 230000007423 decrease Effects 0.000 description 9
- 229910052747 lanthanoid Inorganic materials 0.000 description 9
- 150000002602 lanthanoids Chemical class 0.000 description 9
- 229920001225 polyester resin Polymers 0.000 description 9
- 239000004645 polyester resin Substances 0.000 description 9
- 229920006395 saturated elastomer Polymers 0.000 description 9
- 239000004408 titanium dioxide Substances 0.000 description 9
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 8
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 8
- 238000012937 correction Methods 0.000 description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- 235000013824 polyphenols Nutrition 0.000 description 8
- 238000004804 winding Methods 0.000 description 8
- 229910052727 yttrium Inorganic materials 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- FJMNNXLGOUYVHO-UHFFFAOYSA-N aluminum zinc Chemical compound [Al].[Zn] FJMNNXLGOUYVHO-UHFFFAOYSA-N 0.000 description 7
- 238000004458 analytical method Methods 0.000 description 7
- 238000005452 bending Methods 0.000 description 7
- 229910052790 beryllium Inorganic materials 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 7
- 125000000524 functional group Chemical group 0.000 description 7
- 230000005484 gravity Effects 0.000 description 7
- 239000012535 impurity Substances 0.000 description 7
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 7
- 150000003077 polyols Chemical class 0.000 description 7
- 229920005749 polyurethane resin Polymers 0.000 description 7
- 229910052706 scandium Inorganic materials 0.000 description 7
- 239000002335 surface treatment layer Substances 0.000 description 7
- 229920001864 tannin Polymers 0.000 description 7
- 235000018553 tannin Nutrition 0.000 description 7
- 239000001648 tannin Substances 0.000 description 7
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 6
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 6
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 230000006866 deterioration Effects 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 125000004185 ester group Chemical group 0.000 description 6
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 6
- 229910052748 manganese Inorganic materials 0.000 description 6
- 239000011572 manganese Substances 0.000 description 6
- 229910052759 nickel Inorganic materials 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- 229910019142 PO4 Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 239000003125 aqueous solvent Substances 0.000 description 5
- 230000008859 change Effects 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 230000008021 deposition Effects 0.000 description 5
- 238000013461 design Methods 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- 239000010452 phosphate Substances 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- 210000004894 snout Anatomy 0.000 description 5
- 230000001629 suppression Effects 0.000 description 5
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 5
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 5
- 239000004925 Acrylic resin Substances 0.000 description 4
- 229920000178 Acrylic resin Polymers 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 229910052788 barium Inorganic materials 0.000 description 4
- 229910052791 calcium Inorganic materials 0.000 description 4
- 238000004132 cross linking Methods 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 239000002612 dispersion medium Substances 0.000 description 4
- 238000002296 dynamic light scattering Methods 0.000 description 4
- 238000000921 elemental analysis Methods 0.000 description 4
- 239000010419 fine particle Substances 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 238000000879 optical micrograph Methods 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- 150000003016 phosphoric acids Chemical class 0.000 description 4
- 239000011164 primary particle Substances 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 239000011135 tin Substances 0.000 description 4
- 238000011144 upstream manufacturing Methods 0.000 description 4
- 229910052720 vanadium Inorganic materials 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 3
- LCFVJGUPQDGYKZ-UHFFFAOYSA-N Bisphenol A diglycidyl ether Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C)(C)C(C=C1)=CC=C1OCC1CO1 LCFVJGUPQDGYKZ-UHFFFAOYSA-N 0.000 description 3
- 229910052684 Cerium Inorganic materials 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 229910052693 Europium Inorganic materials 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 229910052779 Neodymium Inorganic materials 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 229910052777 Praseodymium Inorganic materials 0.000 description 3
- 229910052772 Samarium Inorganic materials 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 229910007570 Zn-Al Inorganic materials 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 3
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical class C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 3
- 229910052793 cadmium Inorganic materials 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 125000001153 fluoro group Chemical group F* 0.000 description 3
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 3
- 239000001530 fumaric acid Substances 0.000 description 3
- 235000011187 glycerol Nutrition 0.000 description 3
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 3
- 230000006698 induction Effects 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 238000010884 ion-beam technique Methods 0.000 description 3
- 229910052746 lanthanum Inorganic materials 0.000 description 3
- 230000000873 masking effect Effects 0.000 description 3
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 3
- 229920000768 polyamine Polymers 0.000 description 3
- 229920000098 polyolefin Polymers 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 235000013772 propylene glycol Nutrition 0.000 description 3
- 229910052705 radium Inorganic materials 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- 239000001993 wax Substances 0.000 description 3
- XJUNLJFOHNHSAR-UHFFFAOYSA-J zirconium(4+);dicarbonate Chemical compound [Zr+4].[O-]C([O-])=O.[O-]C([O-])=O XJUNLJFOHNHSAR-UHFFFAOYSA-J 0.000 description 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- AOBIOSPNXBMOAT-UHFFFAOYSA-N 2-[2-(oxiran-2-ylmethoxy)ethoxymethyl]oxirane Chemical compound C1OC1COCCOCC1CO1 AOBIOSPNXBMOAT-UHFFFAOYSA-N 0.000 description 2
- DOYKFSOCSXVQAN-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CCO[Si](C)(OCC)CCCOC(=O)C(C)=C DOYKFSOCSXVQAN-UHFFFAOYSA-N 0.000 description 2
- LZMNXXQIQIHFGC-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C(C)=C LZMNXXQIQIHFGC-UHFFFAOYSA-N 0.000 description 2
- AHYFYQKMYMKPKD-UHFFFAOYSA-N 3-ethoxysilylpropan-1-amine Chemical compound CCO[SiH2]CCCN AHYFYQKMYMKPKD-UHFFFAOYSA-N 0.000 description 2
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 2
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 2
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 2
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 2
- 229910002012 Aerosil® Inorganic materials 0.000 description 2
- 229910002016 Aerosil® 200 Inorganic materials 0.000 description 2
- 229910018134 Al-Mg Inorganic materials 0.000 description 2
- 229910018467 Al—Mg Inorganic materials 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- 239000004970 Chain extender Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229920001780 ECTFE Polymers 0.000 description 2
- 241000196324 Embryophyta Species 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 2
- 229910019018 Mg 2 Si Inorganic materials 0.000 description 2
- 239000002033 PVDF binder Substances 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 125000005595 acetylacetonate group Chemical group 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 238000004220 aggregation Methods 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 238000005275 alloying Methods 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 2
- 239000004842 bisphenol F epoxy resin Substances 0.000 description 2
- 239000004566 building material Substances 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 239000008119 colloidal silica Substances 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 210000001787 dendrite Anatomy 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 description 2
- 238000009503 electrostatic coating Methods 0.000 description 2
- 238000004993 emission spectroscopy Methods 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 2
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 2
- HNRMPXKDFBEGFZ-UHFFFAOYSA-N ethyl trimethyl methane Natural products CCC(C)(C)C HNRMPXKDFBEGFZ-UHFFFAOYSA-N 0.000 description 2
- 229920000840 ethylene tetrafluoroethylene copolymer Polymers 0.000 description 2
- 230000005496 eutectics Effects 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 229910021485 fumed silica Inorganic materials 0.000 description 2
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 2
- 238000001879 gelation Methods 0.000 description 2
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 2
- 230000036541 health Effects 0.000 description 2
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 238000010191 image analysis Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 238000011534 incubation Methods 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 229910052745 lead Inorganic materials 0.000 description 2
- 230000000670 limiting effect Effects 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 238000006263 metalation reaction Methods 0.000 description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 2
- 239000010445 mica Substances 0.000 description 2
- 229910052618 mica group Inorganic materials 0.000 description 2
- 230000005012 migration Effects 0.000 description 2
- 238000013508 migration Methods 0.000 description 2
- 239000003595 mist Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- ICRFXIKCXYDMJD-UHFFFAOYSA-N n'-benzyl-n'-ethenyl-n-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN(C=C)CC1=CC=CC=C1 ICRFXIKCXYDMJD-UHFFFAOYSA-N 0.000 description 2
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 2
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 238000010422 painting Methods 0.000 description 2
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 2
- 239000013500 performance material Substances 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920002493 poly(chlorotrifluoroethylene) Polymers 0.000 description 2
- 239000005023 polychlorotrifluoroethylene (PCTFE) polymer Substances 0.000 description 2
- 239000005056 polyisocyanate Substances 0.000 description 2
- 229920001228 polyisocyanate Polymers 0.000 description 2
- 239000003505 polymerization initiator Substances 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 229920002620 polyvinyl fluoride Polymers 0.000 description 2
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- 238000010526 radical polymerization reaction Methods 0.000 description 2
- 230000002441 reversible effect Effects 0.000 description 2
- 235000015067 sauces Nutrition 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- 238000004611 spectroscopical analysis Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 2
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 2
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 2
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 2
- PSDQQCXQSWHCRN-UHFFFAOYSA-N vanadium(4+) Chemical compound [V+4] PSDQQCXQSWHCRN-UHFFFAOYSA-N 0.000 description 2
- 239000012855 volatile organic compound Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- PFTAWBLQPZVEMU-DZGCQCFKSA-N (+)-catechin Chemical compound C1([C@H]2OC3=CC(O)=CC(O)=C3C[C@@H]2O)=CC=C(O)C(O)=C1 PFTAWBLQPZVEMU-DZGCQCFKSA-N 0.000 description 1
- DNIAPMSPPWPWGF-VKHMYHEASA-N (+)-propylene glycol Chemical compound C[C@H](O)CO DNIAPMSPPWPWGF-VKHMYHEASA-N 0.000 description 1
- JNYAEWCLZODPBN-JGWLITMVSA-N (2r,3r,4s)-2-[(1r)-1,2-dihydroxyethyl]oxolane-3,4-diol Chemical compound OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O JNYAEWCLZODPBN-JGWLITMVSA-N 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical compound C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 description 1
- MFWFDRBPQDXFRC-LNTINUHCSA-N (z)-4-hydroxypent-3-en-2-one;vanadium Chemical compound [V].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O MFWFDRBPQDXFRC-LNTINUHCSA-N 0.000 description 1
- YPFDHNVEDLHUCE-UHFFFAOYSA-N 1,3-propanediol Substances OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 1
- 229940035437 1,3-propanediol Drugs 0.000 description 1
- PXGZQGDTEZPERC-UHFFFAOYSA-N 1,4-cyclohexanedicarboxylic acid Chemical compound OC(=O)C1CCC(C(O)=O)CC1 PXGZQGDTEZPERC-UHFFFAOYSA-N 0.000 description 1
- UWFRVQVNYNPBEF-UHFFFAOYSA-N 1-(2,4-dimethylphenyl)propan-1-one Chemical compound CCC(=O)C1=CC=C(C)C=C1C UWFRVQVNYNPBEF-UHFFFAOYSA-N 0.000 description 1
- TURGQPDWYFJEDY-UHFFFAOYSA-N 1-hydroperoxypropane Chemical compound CCCOO TURGQPDWYFJEDY-UHFFFAOYSA-N 0.000 description 1
- FEPAFOYQTIEEIS-UHFFFAOYSA-N 2',5'-Bis(3,4,5-trihydroxybenzoyl)-beta-D-Furanose-2-C-Hydroxymethylribose Natural products OC1C(COC(=O)C=2C=C(O)C(O)=C(O)C=2)(O)C(O)OC1COC(=O)C1=CC(O)=C(O)C(O)=C1 FEPAFOYQTIEEIS-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- 229940117900 2,2-bis(4-glycidyloxyphenyl)propane Drugs 0.000 description 1
- SKQUTIPQJKQFRA-UHFFFAOYSA-N 2,3-dimethylbutane-1,4-diol Chemical compound OCC(C)C(C)CO SKQUTIPQJKQFRA-UHFFFAOYSA-N 0.000 description 1
- NSMWYRLQHIXVAP-UHFFFAOYSA-N 2,5-dimethylpiperazine Chemical compound CC1CNC(C)CN1 NSMWYRLQHIXVAP-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- QDCPNGVVOWVKJG-VAWYXSNFSA-N 2-[(e)-dodec-1-enyl]butanedioic acid Chemical compound CCCCCCCCCC\C=C\C(C(O)=O)CC(O)=O QDCPNGVVOWVKJG-VAWYXSNFSA-N 0.000 description 1
- HDPLHDGYGLENEI-UHFFFAOYSA-N 2-[1-(oxiran-2-ylmethoxy)propan-2-yloxymethyl]oxirane Chemical compound C1OC1COC(C)COCC1CO1 HDPLHDGYGLENEI-UHFFFAOYSA-N 0.000 description 1
- HVOBSBRYQIYZNY-UHFFFAOYSA-N 2-[2-(2-aminoethylamino)ethylamino]ethanol Chemical compound NCCNCCNCCO HVOBSBRYQIYZNY-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- DSKYSDCYIODJPC-UHFFFAOYSA-N 2-butyl-2-ethylpropane-1,3-diol Chemical compound CCCCC(CC)(CO)CO DSKYSDCYIODJPC-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- BWLBGMIXKSTLSX-UHFFFAOYSA-N 2-hydroxyisobutyric acid Chemical compound CC(C)(O)C(O)=O BWLBGMIXKSTLSX-UHFFFAOYSA-N 0.000 description 1
- MWCBGWLCXSUTHK-UHFFFAOYSA-N 2-methylbutane-1,4-diol Chemical compound OCC(C)CCO MWCBGWLCXSUTHK-UHFFFAOYSA-N 0.000 description 1
- QWGRWMMWNDWRQN-UHFFFAOYSA-N 2-methylpropane-1,3-diol Chemical compound OCC(C)CO QWGRWMMWNDWRQN-UHFFFAOYSA-N 0.000 description 1
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 1
- WVRNUXJQQFPNMN-VAWYXSNFSA-N 3-[(e)-dodec-1-enyl]oxolane-2,5-dione Chemical compound CCCCCCCCCC\C=C\C1CC(=O)OC1=O WVRNUXJQQFPNMN-VAWYXSNFSA-N 0.000 description 1
- SXFJDZNJHVPHPH-UHFFFAOYSA-N 3-methylpentane-1,5-diol Chemical compound OCCC(C)CCO SXFJDZNJHVPHPH-UHFFFAOYSA-N 0.000 description 1
- DUFCMRCMPHIFTR-UHFFFAOYSA-N 5-(dimethylsulfamoyl)-2-methylfuran-3-carboxylic acid Chemical compound CN(C)S(=O)(=O)C1=CC(C(O)=O)=C(C)O1 DUFCMRCMPHIFTR-UHFFFAOYSA-N 0.000 description 1
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 1
- GZVHEAJQGPRDLQ-UHFFFAOYSA-N 6-phenyl-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 GZVHEAJQGPRDLQ-UHFFFAOYSA-N 0.000 description 1
- CGLVZFOCZLHKOH-UHFFFAOYSA-N 8,18-dichloro-5,15-diethyl-5,15-dihydrodiindolo(3,2-b:3',2'-m)triphenodioxazine Chemical compound CCN1C2=CC=CC=C2C2=C1C=C1OC3=C(Cl)C4=NC(C=C5C6=CC=CC=C6N(C5=C5)CC)=C5OC4=C(Cl)C3=NC1=C2 CGLVZFOCZLHKOH-UHFFFAOYSA-N 0.000 description 1
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- 238000012935 Averaging Methods 0.000 description 1
- 241000003910 Baronia <angiosperm> Species 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- WRAGBEWQGHCDDU-UHFFFAOYSA-M C([O-])([O-])=O.[NH4+].[Zr+] Chemical compound C([O-])([O-])=O.[NH4+].[Zr+] WRAGBEWQGHCDDU-UHFFFAOYSA-M 0.000 description 1
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- 206010008428 Chemical poisoning Diseases 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical group C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- IMQLKJBTEOYOSI-GPIVLXJGSA-N Inositol-hexakisphosphate Chemical compound OP(O)(=O)O[C@H]1[C@H](OP(O)(O)=O)[C@@H](OP(O)(O)=O)[C@H](OP(O)(O)=O)[C@H](OP(O)(O)=O)[C@@H]1OP(O)(O)=O IMQLKJBTEOYOSI-GPIVLXJGSA-N 0.000 description 1
- 229910000655 Killed steel Inorganic materials 0.000 description 1
- 229910000617 Mangalloy Inorganic materials 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- UEZVMMHDMIWARA-UHFFFAOYSA-N Metaphosphoric acid Chemical compound OP(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 229910019064 Mg-Si Inorganic materials 0.000 description 1
- 229910019406 Mg—Si Inorganic materials 0.000 description 1
- OPKOKAMJFNKNAS-UHFFFAOYSA-N N-methylethanolamine Chemical compound CNCCO OPKOKAMJFNKNAS-UHFFFAOYSA-N 0.000 description 1
- QSSUXQMIQFFXCV-UHFFFAOYSA-N N.N.[Ti+4] Chemical compound N.N.[Ti+4] QSSUXQMIQFFXCV-UHFFFAOYSA-N 0.000 description 1
- ZWNZGTHTOBNSDL-UHFFFAOYSA-N N.[Ti+4] Chemical compound N.[Ti+4] ZWNZGTHTOBNSDL-UHFFFAOYSA-N 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- 241000237502 Ostreidae Species 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- ALQSHHUCVQOPAS-UHFFFAOYSA-N Pentane-1,5-diol Chemical compound OCCCCCO ALQSHHUCVQOPAS-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- IMQLKJBTEOYOSI-UHFFFAOYSA-N Phytic acid Natural products OP(O)(=O)OC1C(OP(O)(O)=O)C(OP(O)(O)=O)C(OP(O)(O)=O)C(OP(O)(O)=O)C1OP(O)(O)=O IMQLKJBTEOYOSI-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- NRCMAYZCPIVABH-UHFFFAOYSA-N Quinacridone Chemical compound N1C2=CC=CC=C2C(=O)C2=C1C=C1C(=O)C3=CC=CC=C3NC1=C2 NRCMAYZCPIVABH-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- 229910021551 Vanadium(III) chloride Inorganic materials 0.000 description 1
- 229910021542 Vanadium(IV) oxide Inorganic materials 0.000 description 1
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- FEPAFOYQTIEEIS-IZUGRSKYSA-N [(2r,3r,4r)-3,4,5-trihydroxy-4-[(3,4,5-trihydroxybenzoyl)oxymethyl]oxolan-2-yl]methyl 3,4,5-trihydroxybenzoate Chemical compound C([C@H]1OC([C@@]([C@@H]1O)(O)COC(=O)C=1C=C(O)C(O)=C(O)C=1)O)OC(=O)C1=CC(O)=C(O)C(O)=C1 FEPAFOYQTIEEIS-IZUGRSKYSA-N 0.000 description 1
- GKXVJHDEWHKBFH-UHFFFAOYSA-N [2-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC=C1CN GKXVJHDEWHKBFH-UHFFFAOYSA-N 0.000 description 1
- LUSFFPXRDZKBMF-UHFFFAOYSA-N [3-(hydroxymethyl)cyclohexyl]methanol Chemical compound OCC1CCCC(CO)C1 LUSFFPXRDZKBMF-UHFFFAOYSA-N 0.000 description 1
- YIMQCDZDWXUDCA-UHFFFAOYSA-N [4-(hydroxymethyl)cyclohexyl]methanol Chemical compound OCC1CCC(CO)CC1 YIMQCDZDWXUDCA-UHFFFAOYSA-N 0.000 description 1
- RQMIWLMVTCKXAQ-UHFFFAOYSA-N [AlH3].[C] Chemical compound [AlH3].[C] RQMIWLMVTCKXAQ-UHFFFAOYSA-N 0.000 description 1
- YDONNITUKPKTIG-UHFFFAOYSA-N [Nitrilotris(methylene)]trisphosphonic acid Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CP(O)(O)=O YDONNITUKPKTIG-UHFFFAOYSA-N 0.000 description 1
- BFXRJTDKPLPXSK-UHFFFAOYSA-N [SiH4].CO[Si](CCCS)(OC)OC Chemical compound [SiH4].CO[Si](CCCS)(OC)OC BFXRJTDKPLPXSK-UHFFFAOYSA-N 0.000 description 1
- YDHWWBZFRZWVHO-UHFFFAOYSA-N [hydroxy(phosphonooxy)phosphoryl] phosphono hydrogen phosphate Chemical compound OP(O)(=O)OP(O)(=O)OP(O)(=O)OP(O)(O)=O YDHWWBZFRZWVHO-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000006230 acetylene black Substances 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- IBVAQQYNSHJXBV-UHFFFAOYSA-N adipic acid dihydrazide Chemical compound NNC(=O)CCCCC(=O)NN IBVAQQYNSHJXBV-UHFFFAOYSA-N 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- LHIJANUOQQMGNT-UHFFFAOYSA-N aminoethylethanolamine Chemical compound NCCNCCO LHIJANUOQQMGNT-UHFFFAOYSA-N 0.000 description 1
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 238000005311 autocorrelation function Methods 0.000 description 1
- AJGPQPPJQDDCDA-UHFFFAOYSA-N azanium;hydron;oxalate Chemical compound N.OC(=O)C(O)=O AJGPQPPJQDDCDA-UHFFFAOYSA-N 0.000 description 1
- UNTBPXHCXVWYOI-UHFFFAOYSA-O azanium;oxido(dioxo)vanadium Chemical compound [NH4+].[O-][V](=O)=O UNTBPXHCXVWYOI-UHFFFAOYSA-O 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 150000003819 basic metal compounds Chemical class 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- IKWQWOFXRCUIFT-UHFFFAOYSA-N benzene-1,2-dicarbohydrazide Chemical compound NNC(=O)C1=CC=CC=C1C(=O)NN IKWQWOFXRCUIFT-UHFFFAOYSA-N 0.000 description 1
- 229910002056 binary alloy Inorganic materials 0.000 description 1
- JRPRCOLKIYRSNH-UHFFFAOYSA-N bis(oxiran-2-ylmethyl) benzene-1,2-dicarboxylate Chemical compound C=1C=CC=C(C(=O)OCC2OC2)C=1C(=O)OCC1CO1 JRPRCOLKIYRSNH-UHFFFAOYSA-N 0.000 description 1
- KBWLNCUTNDKMPN-UHFFFAOYSA-N bis(oxiran-2-ylmethyl) hexanedioate Chemical compound C1OC1COC(=O)CCCCC(=O)OCC1CO1 KBWLNCUTNDKMPN-UHFFFAOYSA-N 0.000 description 1
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical class C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 1
- HCOMFAYPHBFMKU-UHFFFAOYSA-N butanedihydrazide Chemical compound NNC(=O)CCC(=O)NN HCOMFAYPHBFMKU-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- CJOBVZJTOIVNNF-UHFFFAOYSA-N cadmium sulfide Chemical compound [Cd]=S CJOBVZJTOIVNNF-UHFFFAOYSA-N 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- ADRVNXBAWSRFAJ-UHFFFAOYSA-N catechin Natural products OC1Cc2cc(O)cc(O)c2OC1c3ccc(O)c(O)c3 ADRVNXBAWSRFAJ-UHFFFAOYSA-N 0.000 description 1
- 235000005487 catechin Nutrition 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000006231 channel black Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- VNTLIPZTSJSULJ-UHFFFAOYSA-N chromium molybdenum Chemical compound [Cr].[Mo] VNTLIPZTSJSULJ-UHFFFAOYSA-N 0.000 description 1
- OGSYQYXYGXIQFH-UHFFFAOYSA-N chromium molybdenum nickel Chemical compound [Cr].[Ni].[Mo] OGSYQYXYGXIQFH-UHFFFAOYSA-N 0.000 description 1
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
- 229950001002 cianidanol Drugs 0.000 description 1
- 239000002817 coal dust Substances 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000004035 construction material Substances 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 150000004292 cyclic ethers Chemical group 0.000 description 1
- IFDVQVHZEKPUSC-UHFFFAOYSA-N cyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCC=CC1C(O)=O IFDVQVHZEKPUSC-UHFFFAOYSA-N 0.000 description 1
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 1
- OYOFUEDXAMRQBB-UHFFFAOYSA-N cyclohexylmethanediamine Chemical compound NC(N)C1CCCCC1 OYOFUEDXAMRQBB-UHFFFAOYSA-N 0.000 description 1
- 125000000950 dibromo group Chemical group Br* 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- XPPKVPWEQAFLFU-UHFFFAOYSA-N diphosphoric acid Chemical compound OP(O)(=O)OP(O)(O)=O XPPKVPWEQAFLFU-UHFFFAOYSA-N 0.000 description 1
- WBFZBNKJVDQAMA-UHFFFAOYSA-D dipotassium;zirconium(4+);pentacarbonate Chemical compound [K+].[K+].[Zr+4].[Zr+4].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O WBFZBNKJVDQAMA-UHFFFAOYSA-D 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- DUYCTCQXNHFCSJ-UHFFFAOYSA-N dtpmp Chemical compound OP(=O)(O)CN(CP(O)(O)=O)CCN(CP(O)(=O)O)CCN(CP(O)(O)=O)CP(O)(O)=O DUYCTCQXNHFCSJ-UHFFFAOYSA-N 0.000 description 1
- NFDRPXJGHKJRLJ-UHFFFAOYSA-N edtmp Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CCN(CP(O)(O)=O)CP(O)(O)=O NFDRPXJGHKJRLJ-UHFFFAOYSA-N 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- UPCIBFUJJLCOQG-UHFFFAOYSA-L ethyl-[2-[2-[ethyl(dimethyl)azaniumyl]ethyl-methylamino]ethyl]-dimethylazanium;dibromide Chemical compound [Br-].[Br-].CC[N+](C)(C)CCN(C)CC[N+](C)(C)CC UPCIBFUJJLCOQG-UHFFFAOYSA-L 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 239000003925 fat Substances 0.000 description 1
- 230000009969 flowable effect Effects 0.000 description 1
- 239000006232 furnace black Substances 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 229940074391 gallic acid Drugs 0.000 description 1
- 235000004515 gallic acid Nutrition 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 150000002429 hydrazines Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- XDBSEZHMWGHVIL-UHFFFAOYSA-M hydroxy(dioxo)vanadium Chemical compound O[V](=O)=O XDBSEZHMWGHVIL-UHFFFAOYSA-M 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- 238000009830 intercalation Methods 0.000 description 1
- 230000002687 intercalation Effects 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- VAKIVKMUBMZANL-UHFFFAOYSA-N iron phosphide Chemical compound P.[Fe].[Fe].[Fe] VAKIVKMUBMZANL-UHFFFAOYSA-N 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- GWVMLCQWXVFZCN-UHFFFAOYSA-N isoindoline Chemical compound C1=CC=C2CNCC2=C1 GWVMLCQWXVFZCN-UHFFFAOYSA-N 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000003273 ketjen black Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- GKQPCPXONLDCMU-CCEZHUSRSA-N lacidipine Chemical compound CCOC(=O)C1=C(C)NC(C)=C(C(=O)OCC)C1C1=CC=CC=C1\C=C\C(=O)OC(C)(C)C GKQPCPXONLDCMU-CCEZHUSRSA-N 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- OBJNZHVOCNPSCS-UHFFFAOYSA-N naphtho[2,3-f]quinazoline Chemical compound C1=NC=C2C3=CC4=CC=CC=C4C=C3C=CC2=N1 OBJNZHVOCNPSCS-UHFFFAOYSA-N 0.000 description 1
- AWIZFKXFPHTRHN-UHFFFAOYSA-N naphtho[2,3-f]quinoline Chemical compound C1=CC=C2C3=CC4=CC=CC=C4C=C3C=CC2=N1 AWIZFKXFPHTRHN-UHFFFAOYSA-N 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- UJVRJBAUJYZFIX-UHFFFAOYSA-N nitric acid;oxozirconium Chemical compound [Zr]=O.O[N+]([O-])=O.O[N+]([O-])=O UJVRJBAUJYZFIX-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000004843 novolac epoxy resin Substances 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- LYTNHSCLZRMKON-UHFFFAOYSA-L oxygen(2-);zirconium(4+);diacetate Chemical compound [O-2].[Zr+4].CC([O-])=O.CC([O-])=O LYTNHSCLZRMKON-UHFFFAOYSA-L 0.000 description 1
- 235000020636 oyster Nutrition 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- JRKICGRDRMAZLK-UHFFFAOYSA-L persulfate group Chemical group S(=O)(=O)([O-])OOS(=O)(=O)[O-] JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 description 1
- ZZSIDSMUTXFKNS-UHFFFAOYSA-N perylene red Chemical compound CC(C)C1=CC=CC(C(C)C)=C1N(C(=O)C=1C2=C3C4=C(OC=5C=CC=CC=5)C=1)C(=O)C2=CC(OC=1C=CC=CC=1)=C3C(C(OC=1C=CC=CC=1)=CC1=C2C(C(N(C=3C(=CC=CC=3C(C)C)C(C)C)C1=O)=O)=C1)=C2C4=C1OC1=CC=CC=C1 ZZSIDSMUTXFKNS-UHFFFAOYSA-N 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 238000010587 phase diagram Methods 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 229940068041 phytic acid Drugs 0.000 description 1
- 239000000467 phytic acid Substances 0.000 description 1
- 235000002949 phytic acid Nutrition 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 238000012643 polycondensation polymerization Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920005906 polyester polyol Polymers 0.000 description 1
- 229920006149 polyester-amide block copolymer Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920000166 polytrimethylene carbonate Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- PDEDQSAFHNADLV-UHFFFAOYSA-M potassium;disodium;dinitrate;nitrite Chemical compound [Na+].[Na+].[K+].[O-]N=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O PDEDQSAFHNADLV-UHFFFAOYSA-M 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- ULWHHBHJGPPBCO-UHFFFAOYSA-N propane-1,1-diol Chemical compound CCC(O)O ULWHHBHJGPPBCO-UHFFFAOYSA-N 0.000 description 1
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 229940005657 pyrophosphoric acid Drugs 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920003987 resole Polymers 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000010731 rolling oil Substances 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 238000000790 scattering method Methods 0.000 description 1
- 239000011163 secondary particle Substances 0.000 description 1
- CMZUMMUJMWNLFH-UHFFFAOYSA-N sodium metavanadate Chemical compound [Na+].[O-][V](=O)=O CMZUMMUJMWNLFH-UHFFFAOYSA-N 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- GQJPVGNFTLBCIQ-UHFFFAOYSA-L sodium;zirconium(4+);carbonate Chemical compound [Na+].[Zr+4].[O-]C([O-])=O GQJPVGNFTLBCIQ-UHFFFAOYSA-L 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- BFDQRLXGNLZULX-UHFFFAOYSA-N titanium hydrofluoride Chemical compound F.[Ti] BFDQRLXGNLZULX-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium(II) oxide Chemical compound [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N tolylenediamine group Chemical group CC1=C(C=C(C=C1)N)N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 229960001124 trientine Drugs 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- UNXRWKVEANCORM-UHFFFAOYSA-N triphosphoric acid Chemical compound OP(O)(=O)OP(O)(=O)OP(O)(O)=O UNXRWKVEANCORM-UHFFFAOYSA-N 0.000 description 1
- 229940048102 triphosphoric acid Drugs 0.000 description 1
- GRUMUEUJTSXQOI-UHFFFAOYSA-N vanadium dioxide Chemical compound O=[V]=O GRUMUEUJTSXQOI-UHFFFAOYSA-N 0.000 description 1
- JBIQAPKSNFTACH-UHFFFAOYSA-K vanadium oxytrichloride Chemical compound Cl[V](Cl)(Cl)=O JBIQAPKSNFTACH-UHFFFAOYSA-K 0.000 description 1
- HQYCOEXWFMFWLR-UHFFFAOYSA-K vanadium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[V+3] HQYCOEXWFMFWLR-UHFFFAOYSA-K 0.000 description 1
- UUUGYDOQQLOJQA-UHFFFAOYSA-L vanadyl sulfate Chemical compound [V+2]=O.[O-]S([O-])(=O)=O UUUGYDOQQLOJQA-UHFFFAOYSA-L 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
- B32B15/013—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of an iron alloy or steel, another layer being formed of a metal other than iron or aluminium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
- B32B15/013—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of an iron alloy or steel, another layer being formed of a metal other than iron or aluminium
- B32B15/015—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of an iron alloy or steel, another layer being formed of a metal other than iron or aluminium the said other metal being copper or nickel or an alloy thereof
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/10—Alloys containing non-metals
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C18/00—Alloys based on zinc
- C22C18/04—Alloys based on zinc with aluminium as the next major constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C21/00—Alloys based on aluminium
- C22C21/02—Alloys based on aluminium with silicon as the next major constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C21/00—Alloys based on aluminium
- C22C21/06—Alloys based on aluminium with magnesium as the next major constituent
- C22C21/08—Alloys based on aluminium with magnesium as the next major constituent with silicon
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C21/00—Alloys based on aluminium
- C22C21/10—Alloys based on aluminium with zinc as the next major constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/04—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor characterised by the coating material
- C23C2/06—Zinc or cadmium or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/04—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor characterised by the coating material
- C23C2/12—Aluminium or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/26—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/03—Alloys based on nickel or cobalt based on nickel
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/07—Alloys based on nickel or cobalt based on cobalt
Definitions
- the present invention relates to surface-treated hot-dip galvanized steel products.
- Priority is claimed on Japanese Patent Application No. 2011-182916, filed Aug. 24, 2011, the content of which is incorporated herein by reference.
- hot-dip Zn-Al-based plated steel materials have been widely used in applications such as building materials, materials for automobiles, and materials for household appliances.
- high aluminum (25 to 75% by mass) and zinc alloy plated steel plate represented by 55% aluminum and zinc alloy plated steel plate (galvaluum steel plate (registered trademark)) has corrosion resistance compared to ordinary hot dip galvanized steel plate.
- demand is continuing to expand as it excels.
- the corrosion resistance and the like of molten Zn-Al-based plated steel materials have been improved by the addition of Mg etc. into the plating layer (patented See references 1 to 4).
- Patent Document 1 contains Al by 3% to 13% of Si, 2% to 8% of Mg, 2% to 10% of Zn, and the balance is a hot-dip plating layer composed of Al and unavoidable impurities.
- a -Si-Mg-Zn-based hot-dip Al-based plated steel sheet is disclosed.
- the hot-dip plating layer further contains 0.002 to 0.08% of Be and 0 to 0.1% of Sr, or 3 to 13% of Si, 2 to 8% of Mg, and Zn.
- Patent Document 1 Although the corrosion resistance of the hot-dip galvanized steel material is improved by adding Mg to the plating layer, wrinkles are easily generated in the plating layer due to the addition of Mg. Patent Document 1 also describes that the oxidation of Mg is suppressed by adding Sr or Be to the plating layer, and as a result, the wrinkles are suppressed. However, the suppression of wrinkles is not sufficient.
- the present invention has been made in view of the above.
- the object of the present invention is to provide a surface-treated hot-dip galvanized steel material having a good appearance, which is excellent in white rust resistance, scratch resistance, and stain resistance of a processed part and has no appearance defect caused by a plating layer. It is.
- Mg is an element which is easily oxidized as compared with other elements constituting the plating layer at the time of hot-dip plating using a hot-dip plating bath containing Mg
- Mg is in the atmosphere on the surface layer of the hot-dip galvanized metal attached to steel materials. React with oxygen to form Mg-based oxides.
- Mg is concentrated in the surface layer of the hot-dip plated metal, and the formation of a Mg-based oxide film (a film composed of an oxide of a metal containing Mg) is promoted in the surface layer of the hot-dip metal.
- the Mg-based oxide film is formed before solidification of the inside of the hot-dip galvanized metal is completed, so the difference in fluidity between the surface layer and the inside of the hot-dip galvanized metal Will occur. For this reason, even if the inside of the hot-dipped metal flows, the Mg-based oxide film on the surface layer does not follow, and as a result, it is considered that wrinkles and sag occur.
- the present inventors have conducted intensive studies and found means for suppressing the appearance deterioration such as wrinkles and sagging. .
- a surface-treated hot-dip galvanized steel material according to a first aspect of the present invention comprises a steel material and a covering material on the surface of the steel material, and the covering material is a plating layer in order of proximity to the steel material.
- a coating film containing an organic resin on the surface of the plating layer wherein the plating layer contains Al, Zn, Si and Mg as constituent elements, and the Al content is 25 to 75 mass%, and the Mg content is 0.1 to 10% by mass, the plating layer contains 0.2 to 15% by volume of a Si-Mg phase, and the mass ratio of Mg in the Si-Mg phase to the total amount of Mg in the plating layer is It is 3% or more and 100% or less, and the organic resin is crosslinked by at least one selected from a silane coupling agent, a crosslinkable zirconium compound, a crosslinkable titanium compound, an epoxy compound, and an amino resin.
- the surface-treated hot-dip galvanized steel material as described in the above (1) contains Mg in any region having a diameter of 4 mm and a depth of 50 nm in the outermost layer 50 nm deep from the surface of the plated layer.
- the amount may be 0% by mass or more and less than 60% by mass.
- the plated layer may further contain 0.02 to 1.0% by mass of Cr as a constituent element.
- the film thickness of the coating film may be 0.1 to 10 ⁇ m.
- the coating film may further contain silica particles.
- the surface-treated hot-dip galvanized steel material as described in the above (5) may have the solid content mass ratio A / B of 2 to 20, where the organic resin is A and the silica particles are B.
- the silica particles contain spherical silica particles having an average particle diameter of 5 to 20 nm and spherical silica particles having an average particle diameter of 0.08 to 2 ⁇ m. You may
- the coating film may further contain a lubricant.
- the coating film may further contain a phosphoric acid compound.
- the coating film may further contain a coloring pigment.
- the surface-treated hot-dip galvanized steel material as described in any one of the above (1) to (10) comprises an undercoat layer containing a component derived from an organic resin and a silane coupling agent in the lower layer of the coating film. You may have.
- the white rust resistance, scratch resistance and contamination resistance of the processed portion are good, and the occurrence of wrinkles and sagging on the surface of the plating layer is suppressed.
- a surface-treated hot-dip galvanized steel product having a good appearance is provided.
- the photograph which photographed the appearance of the plating layer about level M50 of an example is shown. It is a graph which shows the over-aging process evaluation result about the hot-dip galvanized steel sheet of the level M5 of an Example.
- the surface-treated hot-dip galvanized steel product according to this embodiment includes a steel material 1 and a covering 28 on the surface of the steel material 1, as shown in FIGS. 11A to 11H.
- the coating 28 has an aluminum-zinc alloy plated layer 23 (hereinafter referred to as “plated layer 23”) and a coating film 24 containing an organic resin on the surface of the plated layer 23 in order of proximity to the steel material 1. That is, the plating layer 23 is plated on the surface of the steel material 1 and the upper layer thereof is further coated with the coating film 24 containing an organic resin as a film forming component.
- the steel material 1 include various members such as thin steel plates, thick steel plates, mold steels, steel pipes, and steel wires. That is, the shape of the steel material 1 is not particularly limited.
- the plating layer 23 is formed by a hot-dip plating process.
- the plating layer 23 contains Al, Zn, Si and Mg as constituent elements.
- the Al content in the plating layer 23 is 25 to 75% by mass.
- the Mg content is 0.1 to 10% by mass. Therefore, the corrosion resistance of the surface of the plating layer 23 is particularly improved by Al, and the edge corrosion of the cut end surface of the hot-dip galvanized steel material is particularly suppressed by the sacrificial corrosion protection action by Zn, thereby imparting high corrosion resistance to the hot-dip galvanized steel.
- the plating layer 23 contains 0.2 to 15% by volume of a Si—Mg phase.
- the Si-Mg phase is a phase composed of an intermetallic compound of Si and Mg, and is dispersed in the plating layer 23 and present.
- the volume ratio of the Si-Mg phase in the plating layer 23 is equal to the area ratio of the Si-Mg phase in the cut surface when the plating layer 23 is cut in the thickness direction.
- the Si-Mg phase in the cut surface of the plating layer 23 can be clearly confirmed by electron microscopic observation. Therefore, by measuring the area ratio of the Si-Mg phase in the cut surface, the volume ratio of the Si-Mg phase in the plating layer 23 can be indirectly measured.
- the volume ratio of the Si-Mg phase is more preferably 0.2 to 10%, and still more preferably 0.4 to 5%.
- the plating layer 23 is composed of a Si-Mg phase and other phases containing Zn and Al.
- the phase containing Zn and Al is mainly composed of an ⁇ -Al phase (dendritic structure) and a Zn-Al-Mg eutectic phase (interdendritic structure).
- Phase is comprised of phase from the more Mg-Zn 2 depending on the composition of the plating layer 23 (Mg-Zn 2 phase), and phase from the Si (Si phase), Fe-Al metal containing Zn and Al
- Various phases may be included such as a phase composed of an intercalation compound (Fe-Al phase).
- the phase containing Zn and Al occupies the portion of the plating layer 23 excluding the Si-Mg phase.
- the volume ratio of the phase containing Zn and Al in the plating layer 23 is preferably in the range of 99.8 to 85%, more preferably in the range of 99.8 to 90%, and even if it is in the range of 99.6 to 95%. Is more preferable.
- the mass ratio of Mg in the Si-Mg phase to the total amount of Mg in the plating layer 23 is 3% by mass or more and 100% by mass or less.
- Mg not contained in the Si-Mg phase is contained in the phase containing Zn and Al.
- Mg is contained in the ⁇ -Al phase, in the Zn-Al-Mg eutectic phase, in the Mg-Zn 2 phase, in the Mg-containing oxide film formed on the plating surface, etc. .
- Mg forms a solid solution in the ⁇ -Al phase.
- the mass ratio of Mg in the Si—Mg phase to the total amount of Mg in the plating layer 23 can be calculated after the Si—Mg phase is considered to have the stoichiometric composition of Mg 2 Si.
- the Si-Mg phase may contain a small amount of elements other than Si and Mg such as Al, Zn, Cr, Fe, etc.
- the composition ratio of Si to Mg in the Si-Mg phase is also stoichiometric. Although there may be slight variations from the composition, it is very difficult to strictly determine the amount of Mg in the Si-Mg phase taking these into consideration.
- the stoichiometric composition of the Si-Mg phase is Mg 2 Si as described above. It is considered to have
- the mass ratio R of Mg in the Si—Mg phase to the total amount of Mg in the plating layer 23 is calculated by the following equation (1).
- R 100 ⁇ AMg / (M ⁇ CMG / 100)
- R represents the mass ratio (mass%) of Mg in the Si-Mg phase to the total amount of Mg in the plating layer 23.
- AMg is contained in the Si-Mg phase in the plating layer 23 per unit area of the plating layer 23 in plan view Mg content as a (g / m 2), per the plan view unit area of M plating layer 23, the mass of the plating layer 23 (g / m 2), CMG content of total Mg in the plating layer 23 (Mass%) is shown respectively.
- the mass M of the plating layer 23 per unit area in plan view of the plating layer 23 refers to the mass of the plating layer 23 attached per unit area on the surface of the steel plate, based on the surface of the steel plate.
- AMg is calculated from the following equation (2).
- AMg V 2 ⁇ ⁇ 2 ⁇ ⁇ (2)
- V 2 indicates the volume (m 3 / m 2 ) of the Si—Mg phase in the plating layer 23 per unit area in plan view of the plating layer 23.
- ⁇ 2 indicates the density of the Si-Mg phase, and its value is 1.94 ⁇ 10 6 (g / m 3 ).
- ⁇ represents the content ratio by mass of Mg in the Si—Mg phase, and its value is 0.63.
- V 2 is calculated from the following equation (3).
- V 2 V 1 ⁇ R 2 /100 ...
- V 1 is the total volume (m 3 / m 2 ) of the plating layer 23 per unit area of the plating layer 23 in plan view
- R 2 is the volume ratio (volume%) of the Si-Mg phase in the plating layer 23 It shows each.
- V 1 is calculated from the following equation (4).
- V 1 M / ⁇ 1 (4)
- ⁇ 1 indicates the density (g / m 3 ) of the entire plating layer 23.
- the value of 1 1 is calculated by weighted averaging the densities of the constituent elements of the plating layer 23 at normal temperature based on the composition of the plating layer 23.
- Mg in the plating layer 23 is contained in the Si-Mg phase at a high ratio as described above. For this reason, the amount of Mg present in the surface layer of the plating layer 23 decreases, whereby the formation of the Mg-based oxide film on the surface layer of the plating layer 23 is suppressed. Therefore, the wrinkles of the plating layer 23 resulting from the Mg-based oxide film are suppressed. As the ratio of Mg in the Si-Mg phase to the total amount of Mg increases, the generation of wrinkles is suppressed. The proportion is more preferably 5% by mass or more, further preferably 20% by mass or more, and particularly preferably 50% by mass or more. The upper limit of the ratio of Mg in the Si-Mg phase to the total amount of Mg is not particularly limited, and this ratio may be 100% by mass.
- the Mg content is 0% by mass or more and less than 60% by mass in any region having a diameter of 4 mm (measurement part diameter) and depth 50 nm. Is preferred.
- the Mg content in the outermost layer of the plating layer 23 is measured by glow discharge optical spectroscopy (GD-OES). That is, as a more specific measurement method, the mass ratio of each element is calculated by converting each glow discharge intensity derived from each detected element by a known coefficient or a coefficient obtained from the measured value of a standard sample whose composition is known.
- the glow emission time corresponding to a depth of 50 nm is determined from the standard sample, and the mass ratio of the glow discharge intensity ratio of Mg converted is 0 mass% at any time up to the emission time determined by the standard sample. It is measured as being more than 60% by mass.
- the Mg content in the outermost layer of the plating layer 23 is smaller, wrinkles caused by the Mg-based oxide film are suppressed.
- the Mg content is preferably less than 40% by mass, and more preferably less than 20% by mass, in any region where the size in the outermost layer of the plating layer 23 is 4 mm in diameter and 50 nm in depth. It is particularly preferable if it is less than 10%.
- the area ratio of the Si—Mg phase on the surface of the plating layer 23 be 30% or less.
- the Si-Mg phase is thin on the surface of the plating layer 23, and tends to be formed like a network.
- the area ratio of the Si-Mg phase is large, the appearance of the plating layer 23 is Change.
- the distribution of the plating surface of the Si-Mg phase is not uniform, unevenness in gloss is observed in the appearance of the plating layer 23 visually. This gloss unevenness is an appearance defect called sagging.
- the area ratio of the Si—Mg phase on the surface of the plating layer 23 is 30% or less, the sagging is suppressed and the appearance of the plating layer 23 is improved. Furthermore, the low content of Si—Mg phase on the surface of the plating layer 23 is also effective for maintaining the corrosion resistance of the plating layer 23 over a long period of time. When the deposition of the Si-Mg phase on the surface of the plating layer 23 is suppressed, the deposition amount of the Si-Mg phase on the inside of the plating layer 23 relatively increases.
- the amount of Mg inside the plating layer 23 is increased, and thereby the sacrificial anticorrosive action of Mg is exhibited in the plating layer 23 for a long time, whereby the high corrosion resistance of the plating layer 23 is maintained for a long time
- the area ratio of the Si-Mg phase on the surface of the plating layer 23 is more preferably 20% or less, and 10% or less It is more preferable, and 5% or less is particularly preferable.
- the content of Mg in the plating layer 23 is in the range of 0.1 to 10% by mass as described above. If the content of Mg is less than 0.1% by mass, the corrosion resistance of the plating layer 23 can not be sufficiently secured. When the content is more than 10% by mass, not only the improvement effect of the corrosion resistance is saturated, but also, dross is easily generated in the hot-dip plating bath 2 at the time of production of the hot-dip galvanized steel material.
- the content of Mg is preferably 0.5% by mass or more, and more preferably 1.0% by mass or more.
- the content of Mg is particularly preferably 5.0% by mass or less, and more preferably 3.0% by mass or less. It is particularly preferable if the content of Mg is in the range of 1.0 to 3.0% by mass.
- the content of Al in the plating layer 23 is in the range of 25 to 75% by mass.
- the content is 25% by mass or more, the Zn content in the plating layer 23 does not become excessive, and the corrosion resistance on the surface of the plating layer 23 is sufficiently ensured.
- the content is 75% by mass or less, the sacrificial corrosion effect by Zn is sufficiently exhibited, and the hardening of the plating layer 23 is suppressed, and the workability of the hot-dip galvanized steel material is enhanced.
- the content of Al is 75% by mass or less also from the viewpoint of further suppressing the wrinkles of the plating layer 23 by preventing the fluidity of the hot-dip galvanized metal from being excessively lowered at the time of production of the hot-dip galvanized steel.
- the content of Al is particularly preferably 45% by mass or more.
- it is preferable that especially content of this Al is 65 mass% or less. It is particularly preferable if the content of Al is in the range of 45 to 65% by mass.
- the content of Si in the plating layer 23 is preferably in the range of 0.5 to 10% by mass with respect to the content of Al.
- the content of Si to Al is 0.5% by mass or more, excessive alloying of Al in the plating layer 23 and the steel material 1 is sufficiently suppressed.
- the content is more than 10% by mass, not only the action by Si is saturated but also dross is easily generated in the hot-dip plating bath 2 at the time of production of the hot-dip galvanized steel material.
- the content of Si is particularly preferably 1.0% by mass or more.
- it is preferable that especially content of this Si is 5.0 mass% or less. It is particularly preferable if the content of Si is in the range of 1.0 to 5.0% by mass.
- the mass ratio of Si: Mg in the plating layer 23 is preferably in the range of 100: 50 to 100: 300. In this case, the formation of the Si—Mg layer in the plating layer 23 is particularly promoted, and the generation of wrinkles in the plating layer 23 is further suppressed.
- the mass ratio of Si: Mg is more preferably 100: 70 to 100: 250, and further preferably 100: 100 to 100: 200.
- the plating layer 23 preferably further contains Cr as a constituent element.
- the Cr promotes the growth of the Si-Mg phase in the plating layer 23 and the volume ratio of the Si-Mg phase in the plating layer 23 becomes high, and the Si-Mg phase to the total amount of Mg in the plating layer 23 The percentage of Mg increases. Thereby, the wrinkles of the plating layer 23 are further suppressed.
- the content of Cr in the plating layer 23 is preferably in the range of 0.02 to 1.0% by mass.
- the content of Cr in the plating layer 23 is more than 1.0% by mass, not only the above-mentioned action is saturated, but also dross tends to be generated in the hot-dip plating bath 2 at the time of production of hot-dip galvanized steel material.
- the content of Cr is particularly preferably 0.05% by mass or more.
- the content of Cr is particularly preferably 0.5% by mass or less.
- the content of Cr is preferably in the range of 0.07 to 0.2% by mass.
- the content of Cr in the outermost layer 50 nm deep from the surface of the plating layer 23 is preferably 100 to 500 mass ppm. In this case, the corrosion resistance of the plating layer 23 is further improved. It is considered that this is because the presence of Cr in the outermost layer forms a passive film on the plating layer 23, and this suppresses the anodic dissolution of the plating layer 23.
- the content of Cr is preferably 150 to 450 mass ppm, more preferably 200 to 400 mass ppm.
- an alloy layer 25 containing Al and Cr is interposed between the plating layer 23 and the steel material 1.
- the alloy layer 25 is regarded as a layer different from the plating layer 23.
- the alloy layer 25 may contain various metal elements such as Mn, Fe, Co, Ni, Cu, Zn, Sn, etc. in addition to Al and Cr as constituent elements.
- the Cr in the alloy layer 25 promotes the growth of the Si-Mg phase in the plating layer 23, and the volume ratio of the Si-Mg phase in the plating layer 23 becomes high. The ratio of Mg in the Si-Mg phase to the total amount of Mg in the layer 23 is increased.
- the ratio of the content ratio of Cr in the alloy layer 25 to the content ratio of Cr in the plating layer 23 is preferably 2 to 50.
- the ratio of the content ratio of Cr in the alloy layer 25 to the content ratio of Cr in the plating layer 23 is more preferably 3 to 40, and further preferably 4 to 25.
- the amount of Cr in the alloy layer 25 can be derived by measuring the cross section of the plating layer 23 using an energy dispersive X-ray analyzer (EDS).
- the thickness of the alloy layer 25 is preferably in the range of 0.05 to 5 ⁇ m. If this thickness is 0.05 ⁇ m or more, the above-described action of the alloy layer 25 is effectively exhibited. If this thickness is 5 ⁇ m or less, the processability of the hot-dipped steel material is less likely to be impaired by the alloy layer 25.
- the corrosion resistance after processing of the plating layer 23 is also improved.
- the reason is considered to be as follows.
- cracks may occur in the plating layer 23.
- water and oxygen infiltrate into the plating layer 23 through the cracks, and the alloy in the plating layer 23 is directly exposed to a corrosion factor.
- Cr present in the surface layer of the plating layer 23 and Cr present in the alloy layer 25 suppress the corrosion reaction of the plating layer 23, thereby suppressing the spread of corrosion starting from the crack.
- the content of Cr in the outermost layer 50 nm deep from the surface of the plating layer 23 is preferably 300 mass ppm or more, particularly 200 to 400 It is preferable that it is the range of mass ppm.
- the ratio of the content ratio of Cr in the alloy layer 25 to the content ratio of Cr in the plating layer 23 is preferably 20 or more, The range of 20 to 30 is preferable.
- the plating layer 23 preferably further contains Sr as a constituent element.
- Sr as a constituent element.
- the formation of the Si—Mg layer in the plating layer 23 is particularly promoted by Sr.
- the formation of the Mg-based oxide film on the surface layer of the plating layer 23 is suppressed by Sr. It is considered that this is because the formation of the Sr oxide film is more likely to be formed preferentially than the Mg-based oxide film, thereby inhibiting the formation of the Mg-based oxide film. Thereby, the occurrence of wrinkles in the plating layer 23 is further suppressed.
- the content of Sr in the plating layer 23 is preferably in the range of 1 to 1000 mass ppm.
- the content of Sr is particularly preferably 5 mass ppm or more.
- the content of Sr is preferably 500 mass ppm or less, more preferably 300 mass ppm or less.
- the content of Sr is preferably in the range of 20 to 50 mass ppm.
- the plating layer 23 preferably further contains Fe as a constituent element.
- Fe also contributes to the refinement of the microstructure and spun structure of the plating layer 23, thereby improving the appearance and processability of the plating layer 23.
- the content of Fe in the plating layer 23 is preferably in the range of 0.1 to 0.6% by mass. If the content of Fe is less than 0.1% by mass, the microstructure and the spun structure of the plating layer 23 become coarse, the appearance of the plating layer 23 deteriorates, and the processability deteriorates.
- the content of Fe is particularly preferably 0.2% by mass or more. Further, the content of Fe is particularly preferably 0.5% by mass or less. It is particularly preferable if the content of Fe is in the range of 0.2 to 0.5% by mass.
- the floral print appearing on the surface of the steel plate 1 after plating is called a spangle.
- the plating layer 23 may further contain an element selected from alkaline earth elements, Sc, Y, lanthanoid elements, Ti and B as constituent elements.
- Alkaline earth elements Be, Ca, Ba, Ra
- Sc Y
- lanthanoid elements La, Ce, Pr, Nd, Pm, Sm, Eu, etc.
- the total content of these components in the plating layer 23 is 1.0 mass% or less in mass ratio.
- the ⁇ -Al phase (dendrite structure) of the plating layer 23 is refined to make the spangles finer, and hence the appearance of the plating layer 23 by spangles is improved Do. Furthermore, the generation of wrinkles in the plating layer 23 is further suppressed by at least one of Ti and B. This also refines the Si-Mg phase by the action of Ti and B, and this refined Si-Mg phase is effective in the flow of the hot-dip metal in the process of solidification of the hot-dip metal and formation of the plating layer 23 It is thought that it is to suppress it.
- the concentration of stress in the plating layer 23 at the time of bending is alleviated by the refinement of the plating structure, generation of large cracks and the like is suppressed, and the bending workability of the plating layer 23 is further improved.
- the total content of Ti and B in the hot-dip plating bath 2 is preferably in the range of 0.0005 to 0.1% by mass in mass ratio.
- the total content of Ti and B is preferably 0.001% by mass or more.
- it is preferable that especially the sum total of content of this Ti and B is 0.05 mass% or less. It is particularly preferable if the total content of Ti and B is in the range of 0.001 to 0.05% by mass.
- Zn occupies the remainder of the constituent elements of the plating layer 23 excluding constituent elements other than Zn.
- the plating layer 23 does not contain an element other than the above as a constituent element.
- the plating layer 23 contains only Al, Zn, Si, Mg, Cr, Sr, and Fe as constituent elements, or Al, Zn, Si, Mg, Cr, Sr, and Fe, and alkaline earths. It is preferable that only an element selected from the elements Sc, Y, lanthanoid elements, Ti and B is contained as a constituent element.
- the plating layer 23 may contain unavoidable impurities such as Pb, Cd, Cu, and Mn.
- the content of the unavoidable impurities is preferably as small as possible, and in particular, the total content of the unavoidable impurities is preferably 1% by mass or less in mass ratio to the plating layer 23.
- the coating film 24 coated on the upper layer of the plating layer 23 contains an organic resin as an essential film forming component, and the organic resin or organic resin and the aluminum-zinc alloy plating layer 23 are a silane coupling agent, a crosslinkable zirconium compound, It is crosslinked by at least one selected from a crosslinkable titanium compound, an epoxy compound, and an amino resin.
- the aluminum-zinc alloy plated layer 23 contains relatively high concentration of Al and also contains Mg. Thus, the surface of the plating layer 23 is covered with a Mg-based oxide film or an Al-based oxide film. In order to improve corrosion resistance and scratch resistance, it is important to improve the adhesion between these oxide films and the coating film.
- the present inventors set an organic resin as an essential film forming component, and the organic resin, or the organic resin and the aluminum-zinc alloy plated layer 23 are a silane coupling agent, a crosslinkable zirconium compound, and a crosslink.
- a coating that is cross-linked by at least one selected from an ionic titanium compound, an epoxy compound, and an amino resin is found to be effective in maximizing the adhesion between these oxide films and the coating
- the present invention has been completed.
- the coating film 24 which uses an organic resin as a film-forming component also has the feature of being excellent in contamination resistance.
- stain resistance refers to the ability to remove stains relatively easily even if oily stains such as fingerprints adhere, and to remove the stains relatively easily.
- the plated layer 23 of the present invention contains 25 to 75% by mass of Al and 0.2 to 15% by volume of a Si—Mg phase.
- An organic resin is used as a film forming component, and the organic resin or organic resin and the aluminum-zinc alloy plated layer 23 are at least one selected from a silane coupling agent, a crosslinkable zirconium compound, a crosslinkable titanium compound, an epoxy compound, and an amino resin
- the crosslinked coating film 24 also has a feature of being excellent in flexibility and slidability to a relatively hard material such as a press die. That is, in addition to being excellent in the ability to follow the deformation (elongation or compression) of the steel material 1 generated when the hot-dip galvanized steel material is processed, it also has the effect of reducing the frictional resistance received at the time of contact with the press die. ing.
- the surface-treated hot-dip galvanized steel coated with such a coating film 24 is excellent in that the coating film 24 is uniformly coated without being damaged, such as cracks or scratches, even at the processed part. Corrosion resistance (especially white rust resistance) and contamination resistance can be maintained. In addition, due to the excellent slidability of the coating film 24 as described above, the scratch resistance is also excellent.
- the crosslinking of the coating film 24 can be verified by, for example, measurement of a Fourier transform infrared spectrophotometer (FT-IR). Below, the structure of the coating film 24 is demonstrated.
- FT-IR Fourier transform infrared spectrophotometer
- the thickness of the coating film 24 is not particularly limited, but is preferably 0.1 ⁇ m to 10 ⁇ m, more preferably 0.3 ⁇ m to 7 ⁇ m, and still more preferably 0.5 ⁇ m to 5 ⁇ m.
- the thickness of the coating film 24 is less than 0.1 ⁇ m, sufficient corrosion resistance, scratch resistance and contamination resistance may not be obtained.
- it is not only economically disadvantageous that the thickness of the coating film 24 is more than 10 ⁇ m, but when the coating film 24 is formed from a water-based paint, coating film 24 defects such as wax may occur. It may not be possible to stably obtain the appearance and performance as a product.
- the thickness of the coating film 24 can be measured by observing the cross section of the coating film 24 or using an electromagnetic film thickness meter or the like. In addition, it may be calculated by dividing the mass of the coating film 24 attached per unit area of the plated steel material by the specific gravity of the coating film 24 or the specific gravity after drying of the coating solution.
- the adhesion mass of the coating film 24 can be calculated by calculating the mass difference of the plated steel before and after painting, calculating the mass difference of the plated steel before and after peeling the coating 24 after painting, or It can be determined by a method appropriately selected from existing methods, such as line analysis to measure the amount of an element whose content in the film is known in advance.
- the specific gravity of the coating film 24 or the specific gravity after drying of the coating solution is to measure the volume and mass of the isolated coating film 24 and to measure the volume and mass after taking an appropriate amount of the coating solution in a container and drying it.
- it may be determined by a method appropriately selected from existing methods, such as calculation from the blending amounts of the coating film components and the known specific gravities of the respective components.
- the cross-sectional observation method of the coating film 24 is not particularly limited, but the coated plated steel material is embedded in the room temperature drying type epoxy resin so that the vertical cross section of the coating film 24 can be seen and the embedded surface is mechanically polished.
- a scanning electron microscope or an FIB (focused ion beam) device, cut out a sample for observation with a thickness of 50 nm to 100 nm so that the vertical cross section of the coating film 24 can be seen from the coated plated steel
- the method etc. which observe a cross section by TEM (transmission electron microscope) can be mentioned.
- an organic resin it is not limited to a specific kind, For example, a polyester resin, a polyurethane resin, an epoxy resin, an acrylic resin, polyolefin resin, or the modified body of such resin etc. can be mentioned.
- the modified product is a reactive functional group contained in the structure of these resins, which is reacted with another compound (monomer, crosslinking agent, etc.) having a functional group capable of reacting with the functional group in the structure. It refers to the resin.
- one or two or more organic resins may be mixed and used, or at least one other in the presence of at least one organic resin.
- the organic resin obtained by modifying the organic resin of the above may be used alone or in combination of two or more.
- the polyester resin is not particularly limited, and, for example, one obtained by condensation polymerization of a polyester raw material composed of a polycarboxylic acid component and a polyol component can be used. In addition, it is possible to use one that has been made aqueous by dissolving or dispersing the polyester resin thus obtained in water.
- polycarboxylic acid component examples include phthalic acid, phthalic anhydride, tetrahydrophthalic acid, tetrahydrophthalic anhydride, hexahydrophthalic acid, hexahydrophthalic anhydride, methyl tetraphthalic acid, methyltetrahydrophthalic anhydride, hymic anhydride , Trimellitic acid, trimellitic acid anhydride, pyromellitic acid, pyromellitic acid anhydride, isophthalic acid, terephthalic acid, maleic acid, maleic acid anhydride, fumaric acid, itaconic acid, adipic acid, azelaic acid, sebacic acid, succinic acid, Succinic anhydride, lactic acid, dodecenyl succinic acid, dodecenyl succinic anhydride, cyclohexane-1,4-dicarboxylic acid, endo acid anhydride etc. can be mentioned.
- polyol component examples include ethylene glycol, diethylene glycol, 1,3-propanediol, 1,2-propanediol, triethylene glycol, 2-methyl-1,3-propanediol, 2,2-dimethyl-1, 3-propanediol, 2-butyl-2-ethyl-1,3-propanediol, 1,4-butanediol, 2-methyl-1,4-butanediol, 2-methyl-3-methyl-1,4- Butanediol, 1,5-pentanediol, 3-methyl-1,5-pentanediol, 1,6-hexanediol, 1,4-cyclohexanedimethanol, 1,3-cyclohexanedimethanol, 1,2-cyclohexanediene Methanol, hydrogenated bisphenol A, dimer diol, trimethylol ethane, trimethylo Trimethylolpropane, glycerin, and pen
- the above-mentioned polyurethane resin is not particularly limited, and examples thereof include those obtained by reacting a polyol compound and a polyisocyanate compound and then chain-extending with a chain extender.
- the polyol compound is not particularly limited as long as it is a compound containing two or more hydroxyl groups per molecule, and examples thereof include ethylene glycol, propylene glycol, diethylene glycol, 1,6-hexanediol, neopentyl glycol, and triethylene.
- the polyisocyanate compound is not particularly limited as long as it is a compound containing two or more isocyanate groups per molecule, and examples thereof include aliphatic isocyanates such as hexamethylene diisocyanate (HDI) and fats such as isophorone diisocyanate (IPDI).
- aromatic diisocyanates such as cyclic diisocyanates, tolylene diisocyanate (TDI), and aromatic aliphatic diisocyanates such as diphenylmethane diisocyanate (MDI), or mixtures thereof.
- the chain extender is not particularly limited as long as it is a compound containing one or more active hydrogens in the molecule, and examples thereof include ethylene diamine, propylene diamine, hexamethylene diamine, diethylene triamine, dipropylene triamine, triethylene tetramine, tetra Aliphatic polyamines such as ethylene pentamine, aromatic polyamines such as tolylenediamine, xylylene diamine, diaminodiphenylmethane, alicyclic polyamines such as diaminocyclohexylmethane, piperazine, 2,5-dimethylpiperazine, isophorone diamine, etc.
- Hydrazines such as hydrazine, succinic acid dihydrazide, adipic acid dihydrazide, phthalic acid dihydrazide, hydroxyethyl diethylene triamine, 2-[(2-aminoethyl) amino] ethanol, 3-amino Alkanolamines such as propanediol and the like. These compounds can be used alone or in combination of two or more.
- the epoxy resin is not particularly limited.
- bisphenol A epoxy resin, bisphenol F epoxy resin, hydrogenated bisphenol A epoxy resin, hydrogenated bisphenol F epoxy resin, resol resin epoxy resin, novolac epoxy resin Etc. can be used.
- said epoxy resin what forcedly emulsified these epoxy resins with surfactant and was aqueous-ized, these epoxy resins are made to react with amine compounds, such as diethanolamine and N- methyl ethanolamine, An organic acid or It is also possible to use one that has been neutralized with an inorganic acid to be made aqueous, or one that has been subjected to radical polymerization of a high acid value acrylic resin in the presence of these epoxy resins and then neutralized using ammonia or an amine compound etc. can do.
- the acrylic resin is not particularly limited, and examples thereof include alkyl (meth) acrylates such as ethyl (meth) acrylate, 2-ethylhexyl (meth) acrylate and n-butyl (meth) acrylate, and 2-hydroxyethyl (meth) What is obtained by radically polymerizing hydroxyalkyl (meth) acrylate such as acrylate and (meth) acrylic acid ester such as alkoxysilane (meth) acrylate together with (meth) acrylic acid in water using a polymerization initiator It can be mentioned.
- alkyl (meth) acrylates such as ethyl (meth) acrylate, 2-ethylhexyl (meth) acrylate and n-butyl (meth) acrylate
- 2-hydroxyethyl (meth) What is obtained by radically polymerizing hydroxyalkyl (meth) acrylate such as acrylate and (meth) acrylic acid
- the polymerization initiator is not particularly limited, and for example, persulfates such as potassium persulfate and ammonium persulfate, and azo compounds such as azobiscyanovaleric acid and azobisisobutyronitrile can be used.
- persulfates such as potassium persulfate and ammonium persulfate
- azo compounds such as azobiscyanovaleric acid and azobisisobutyronitrile
- (meth) acrylate” means acrylate and methacrylate
- (meth) acrylic acid” means acrylic acid and methacrylic acid.
- the above-mentioned polyolefin resin is not particularly limited.
- an unsaturated carboxylic acid such as methacrylic acid, acrylic acid, maleic acid, fumaric acid, fumaric acid, itaconic acid, crotonic acid and the like under high temperature and high pressure
- ammonia examples thereof include those obtained by neutralization with an amine compound, a basic metal compound such as KOH, NaOH, LiOH or the like, or ammonia containing such a metal compound, an amine compound, or the like to form a water system.
- the organic resin contains a resin containing at least one functional group selected from an ester group, a urethane group, and a urea group in the structure, thereby improving the corrosion resistance and scratch resistance as a surface-treated hot-dip galvanized steel It is preferable to In order to improve the corrosion resistance as a surface-treated hot-dip galvanized steel material, in the processed portion of the surface-treated hot-dip galvanized steel material, the coating film 24 uniformly covers the plated steel material as a substrate without damage such as cracks It is important to suppress the permeability of the corrosion factor) and the corrosion factor.
- the hardness of the coating film 24 and the plated steel material (base treatment layer 27 if there is a base treatment layer 27 described later) which is a substrate It is important that the strength is high.
- it is preferable to use an organic resin containing a specific resin structure as a film forming component, and specifically, as described above in the resin structure of the organic resin By introducing a functional group having a specific cohesive energy, it is possible to increase both the elongation and the strength of the coating film 24 to a high level, and to improve the adhesion and the corrosion resistance.
- the resin containing at least one functional group selected from an ester group, a urethane group, and a urea group in the resin structure is not particularly limited, and, for example, a polyester resin containing an ester group and a polyurethane resin containing a urethane group And polyurethane resins containing both urethane groups and urea groups. These may be used alone or in combination of two or more.
- an organic resin obtained by mixing a polyester resin containing an ester group and a polyurethane resin containing both a urethane group and a urea group, which contains all of the ester group, the urethane group, and the urea group is an organic resin It may be used as
- the content of the organic resin containing at least one functional group selected from an ester group, a urethane group and a urea group in the resin structure is preferably 60% by mass or more and 100% by mass or less in the organic resin, The preferred content is 80% by mass to 100% by mass. If it is less than 60% by mass, it may not be possible to simultaneously achieve corrosion resistance and scratch resistance as a surface-treated hot-dip galvanized steel material.
- the coating film 24 preferably further contains silica particles.
- silica particles corrosion resistance and scratch resistance can be further improved.
- the coating film 24 of the surface-treated hot-dip galvanized steel processed portion is cracked And other problems (deterioration of processability) occur, which may lower the corrosion resistance of the processed portion.
- the coating film 24 in which relatively hard silica particles are compounded with an organic resin is less likely to deteriorate in processability as compared with the organic resin which is simply hardened, and the silica particles themselves also have an effect of improving the corrosion resistance. Corrosion resistance and scratch resistance can be achieved at a high level.
- an organic resin be A
- silica particles be B
- a solid content mass ratio A / B be 2 or more and 20 or less.
- a / B is less than 2
- the corrosion resistance and the contamination resistance may be lowered
- a / B is more than 20, the improvement effect of the corrosion resistance and the scratch resistance may not be obtained.
- silica particles such as colloidal silica and fumed silica
- silica particles can be mentioned.
- Snowtex O, Snowtex N, Snowtex C, Snowtex IPA-ST made by Nissan Chemical Industries, Ltd.
- Adareite AT-20N, Adareite AT-20A made by Asahi Denka Kogyo
- Aerosil 200 manufactured by Nippon Aerosil Co., Ltd.
- functional spherical silica HPS series manufactured by Toa Synthetic Co., Ltd.
- Nipsil series manufactured by Tosoh Silica Corporation
- spherical silica particles having an average particle diameter of 5 nm or more and 20 nm or less as the silica particles in order to improve the corrosion resistance. If the average particle size of the spherical silica particles is less than 5 nm, problems such as gelation of the coating composition for forming the coating film 24 may occur. If the average particle size is more than 20 nm, corrosion resistance The improvement effect may not be obtained sufficiently.
- silica particles having an average particle diameter of 5 nm to 20 nm and spherical silica particles having an average particle diameter of 0.08 ⁇ m to 2 ⁇ m as silica particles makes corrosion resistance and scratch resistance compatible with each other in high dimensions. More preferred above. If the average particle size of the spherical silica particles is less than 0.08 ⁇ m, the effect of improving the scratch resistance may not be sufficiently obtained. If the average particle size is more than 2 ⁇ m, the corrosion resistance may be reduced.
- the content ratio of the spherical silica particles having an average particle size of 5 nm to 20 nm and the spherical silica particles having an average particle size of 0.08 ⁇ m to 2 ⁇ m in the coating film 24 is in the range of 30/70 to 80/20 by mass ratio. Is preferable, and more preferably in the range of 40/60 to 50/50. Further, the ratio of the average particle diameter of the spherical silica particles having an average particle diameter of 5 nm to 20 nm and the spherical silica particles having an average particle diameter of 0.08 ⁇ m to 2 ⁇ m contained in the coating film 24 is 1/350 to 1/0. It is preferably in the range of 16, and more preferably in the range of 1/150 to 1/30.
- the crosslinking agent for crosslinking the organic resin is limited to at least one selected from silane coupling agents, crosslinkable zirconium compounds, crosslinkable titanium compounds, epoxy compounds, and amino resins from the viewpoint of corrosion resistance and scratch resistance. Be done. These crosslinking agents may be used alone or in combination of two or more. As a method of using these crosslinking agents, those obtained by crosslinking the crosslinking agent in advance at the stage of producing an organic resin may be used as a raw material of a coating composition for forming a coating, or the crosslinking agent may be used as a coating It may be used as a raw material of the composition, and may be crosslinked in the coating composition or at the time of film formation.
- the type of the silane coupling agent is not particularly limited.
- vinyl trimethoxysilane sold by Shin-Etsu Chemical Co., Ltd., Toray Dow Corning, Chisso, Momentive Performance Materials Japan, etc.
- the crosslinkable zirconium compound is not particularly limited, and examples thereof include zirconyl nitrate, zirconyl acetate, zirconyl sulfate, ammonium zirconium carbonate, potassium zirconium carbonate, sodium zirconium carbonate, zirconium acetate and the like. Among these compounds, zirconium compounds containing a zirconium carbonate complex ion are preferred.
- zirconium compound containing zirconium carbonate complex ions is not particularly limited, zirconium carbonate complex ions [Zr (CO 3) 2 (OH ) 2 ] 2- or [Zr (CO 3) 3 (OH ) ] 3- ammonium salts, potassium salts, sodium salts and the like can be mentioned. These crosslinkable zirconium compounds may be used alone or in combination of two or more.
- the crosslinkable titanium compound is not particularly limited.
- These crosslinkable titanium compounds may be used alone or in combination of two or more.
- the epoxy compound is not particularly limited as long as it is a compound having a plurality of epoxy groups (oxirane rings) which are cyclic ether groups of 3 members, and examples thereof include: adipic acid diglycidyl ester, phthalic acid diglycidyl ester, terephthalic acid diglycidyl ester Glycidyl ester, sorbitan polyglycidyl ether, pentaerythritol polyglycidyl ether, glycerin polyglycidyl ether, trimethylpropane polyglycidyl ether, neopentyl glycol polyglycidyl ether, ethylene glycol diglycidyl ether, polyethylene glycol diglycidyl ether, propylene glycol diglycidyl ether Polypropylene glycol diglycidyl ether, 2,2-bis- (4-glycidyloxyphenyl) propane, tris (2 3-epoxypropyl) isocyanurate,
- epoxy compounds may be used alone or in combination of two or more. Since many of these epoxy compounds have a glycidyl group in which one —CH 2 — group is added to an epoxy group, the term “glycidyl” is included in the compound name.
- amino resin For example, a melamine resin, benzoguanamine resin, a urea resin, glycoluryl resin etc. can be mentioned. These amino resins may be used alone or in combination of two or more.
- the content of the crosslinking agent in the coating film 24 is preferably 0.1% by mass to 20% by mass, and more preferably 1% by mass to 15% by mass. If the content of the crosslinking agent is less than 0.1% by mass, the amount used may be insufficient and the addition effect may not be obtained. If the amount used exceeds 20% by mass, the coating 24 becomes brittle due to excessive crosslinking. Corrosion resistance may be reduced.
- the coating film 24 preferably further contains a lubricant in order to improve corrosion resistance and scratch resistance.
- a lubricant By containing a lubricant, the lubricity of the surface-treated hot-dip galvanized steel material is enhanced, in other words, the effect of reducing the frictional resistance received at the time of contact with a press die or the like is enhanced. Damage and damage during handling can be prevented.
- the lubricant is not particularly limited, and known lubricants can be used, but it is preferable to use at least one selected from fluorocarbon resin lubricants and polyolefin resin lubricants.
- the fluorocarbon resin-based lubricant is not particularly limited.
- PTFE polytetrafluoroethylene
- FEP tetrafluoroethylene-hexafluoropropylene copolymer
- PFA tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer
- PCTFE polychlorotrifluoroethylene
- PVDF polyvinylidene fluor
- the polyolefin resin lubricant is not particularly limited, and examples thereof include hydrocarbon waxes such as paraffin, microcrystalline, polyethylene, and polypropylene, and derivatives thereof.
- the derivative of hydrocarbon wax is not particularly limited, and examples thereof include carboxylated polyolefins and chlorinated polyolefins.
- One of these polyolefin-based lubricants may be used alone, or two or more thereof may be used in combination.
- the softening point of the polyolefin resin particles is 125 ° C. or higher and the average particle diameter is 0.5 ⁇ m to 3 ⁇ m.
- the softening point of the polyolefin resin particles refers to the temperature at which the heated polyolefin resin particles soften and begin to deform, and refers to the temperature measured by the method described in JIS K 2207.
- polyolefin resin particles having a softening point of 125 ° C. or higher examples include Chemipal W900, W700, W300, W308, W800, W310 (above, softening point 132 ° C.), Chemipearl W100 (softening point 128 ° C.) manufactured by Mitsui Chemicals, Inc. A-113 (softening point 126 ° C), A-375, A-575, AB-50 (above, softening point 125 ° C) manufactured by Gifu Serac Manufacturing Co., Ltd. Hitec E-4A, E- made by Toho Chemical Industry Co., Ltd.
- Polyethylene resin particles such as 4B, E-1000, E-6314 (above, softening point 138 ° C.), Chemipearl WP100 (softening point 148 ° C.) manufactured by Mitsui Chemicals, AC-35 (softened) manufactured by Gifu Serac Mfg.
- Polypropylene resins such as Hitech P-5043 (softening point 157 ° C) and P-5300 (softening point 145 ° C) manufactured by Toho Chemical Industry Co., Ltd. Child including but not limited to those of the resin particles.
- the content of the lubricant in the coating film 24 is preferably 0.5% by mass to 10% by mass, and more preferably 1% by mass to 5% by mass. If the content of the lubricant is less than 0.5% by mass, the effect of improving the corrosion resistance and scratch resistance may not be obtained. If the content is more than 10% by mass, the corrosion resistance may be reduced.
- the coating film 24 preferably further contains a phosphoric acid compound in order to improve the corrosion resistance.
- the phosphate compound is a compound that releases phosphate ions.
- a phosphoric acid compound is contained, when a coating composition for forming the coating film contacts the plating layer 23 at the time of coating film formation, or after coating film formation, phosphoric acid derived from the phosphoric acid compound is used.
- the ions When the ions are eluted, they react with the Mg-based oxide film on the surface of the plating layer 23 to form a poorly-soluble Mg phosphate film on the surface of the plating layer 23. Thereby, the white rust resistance can be significantly improved.
- the phosphate compound does not release phosphate ions, that is, it is insoluble in the environment, the non-soluble phosphate compound inhibits the migration of corrosion factors such as water and oxygen, thereby improving the corrosion resistance.
- the phosphoric acid compound is not particularly limited.
- phosphoric acids such as ortho phosphoric acid, meta phosphoric acid, pyrophosphoric acid, triphosphoric acid, tetraphosphoric acid and the like and salts thereof, aminotri (methylene phosphonic acid), 1-hydroxyethylidene Phosphonic acids such as 1,1-diphosphonic acid, ethylenediaminetetra (methylene phosphonic acid) and diethylene triamine penta (methylene phosphonic acid) and salts thereof, organic phosphoric acids such as phytic acid and salts thereof .
- the cationic species of the salts are not particularly limited, and examples thereof include Cu, Co, Fe, Mn, Sn, V, Mg, Ba, Al, Ca, Sr, Nb, Y, Ni and Zn. These phosphoric acid compounds may be used alone or in combination of two or more.
- the content of the phosphoric acid compound in the coating film 24 is preferably 0.1% by mass to 10% by mass, and more preferably 0.5% by mass to 5% by mass. If the content of the phosphoric acid compound is less than 0.1% by mass, the effect of improving the corrosion resistance may not be obtained, and if it is more than 5% by mass, the corrosion resistance is reduced or the coating film 24 is formed. In some cases, the stability of the paint is reduced (more specifically, defects such as gelation and precipitation of aggregates occur).
- the coating film 24 preferably further contains a color pigment in order to enhance the design of the surface-treated hot-dip galvanized steel material.
- the type of coloring pigment is not particularly limited, and, for example, coloring inorganic pigments such as titanium dioxide, carbon black, graphite, iron oxide, lead oxide, coal dust, talc, cadmium yellow, cadmium red, chromium yellow and the like, phthalocyanines Blue, phthalocyanine green, quinacridone, perylene, anthrapyrimidine, carbazole violet, anthrapyridine, azo orange, flavanthrone yellow, iso indoline yellow, azo yellow, indaslon blue, dibromo anzathrone red, perylene red, azo red, anthraquinone red etc.
- the coating film 24 contains carbon black as a coloring pigment. It is preferable to contain.
- the type of carbon black is not particularly limited. For example, known carbon blacks such as furnace black, ketjen black, acetylene black and channel black can be used. Also, known ozone treated, plasma treated, liquid phase oxidized carbon black can be used.
- the particle diameter of the carbon black used for the coloring pigment is not particularly limited as long as there is no problem in the dispersibility in the coating composition for forming a coating film, the coating film quality, and the paintability, specifically, A primary particle size of 10 nm to 120 nm can be used. In consideration of the design and corrosion resistance of a thin film, it is preferable to use fine particle carbon black having a primary particle diameter of 10 nm to 50 nm as a coloring pigment. When these carbon blacks are dispersed in an aqueous solvent, it is generally difficult to disperse as it is the primary particle size because aggregation occurs in the dispersing process.
- the fine particle carbon black is present in the form of secondary particles having a particle size larger than the primary particle size in the paint composition (coating solution) for forming a coating film, and the paint composition It exists in the same form also in the coating film 24 formed using things.
- the particle size of carbon black dispersed in the coating film 24 is important, and the average particle size should be controlled to be 20 nm to 300 nm. Is preferred.
- the content of the carbon black in the coating film 24 is d mass% and the thickness of the coating film 24 is b ⁇ m, it is preferable to satisfy d ⁇ 15, b ⁇ 10, and d ⁇ bb20.
- the absolute amount of carbon black can be represented by the product of the content (d mass%) of carbon black contained in the coating film 24 and the coating film thickness (b ⁇ m). That is, when d ⁇ b is less than 20, the designability (hiding property) may be reduced.
- d is more than 15, the film forming property of the coating film 24 may be reduced, and the corrosion resistance and the scratch resistance may be reduced.
- the coating film 24 When the coating film 24 is tinted, it is preferable to contain titanium dioxide as a coloring pigment.
- the content of titanium dioxide in the coating film 24 is preferably 10% by mass or more and 70% by mass or less.
- the designability mass of titanium dioxide
- the coating film 24 contains carbon black and is colored in a dark color, it is more noticeable when scratched than in the case where there is no coloring or when colored in a tint. It has the feature of. Titanium dioxide not only has the effect of raising the scratch resistance, but also has the effect of bringing the appearance close to light color and making the scratches less noticeable.
- carbon black and titanium dioxide in the coating film 24 can be used to improve scratch resistance while securing the designability (masking property) and corrosion resistance at the time of coloring with a thin film having a film thickness of 10 ⁇ m or less, in particular. It is preferable to contain both. In this case, it is preferable that carbon black and titanium dioxide be contained at a mass ratio of 0.5 / 9.5 to 3/7.
- At least one of silica particles, polyolefin resin particles, and color pigments may be present as a particulate component, if necessary.
- the particulate component contained in the paint composition used to form the coating film 24 may undergo any physical or chemical change during the formation of the coating film 24 (eg, bonding or aggregation of particles, paint, etc. Even if it does not suffer from significant dissolution in solvent, reaction with other components, etc., it shall be regarded as maintaining its shape and size as it was in paint, even after film formation. Can.
- the particulate silica particles, polyolefin resin particles, and color pigments used in the present invention are not significantly dissolved in the solvent of the coating composition used to form the coating film 24, and the solvent and other coating film components It is chosen not to react with Also, for the purpose of enhancing the retention of the form of the presence of these particulate components in the paint, the paint, which has been dispersed in a solvent with a known surfactant or dispersing agent such as a dispersing resin, as necessary It can also be used as a raw material of a composition. Therefore, the particle sizes of these particulate components contained in the coating film 24 specified in the present invention can be expressed by the particle sizes in the coating composition used for forming the coating film 24. .
- the particle sizes of the particulate component (silica particles, polyolefin resin particles, and color pigments) used in the present invention can be measured by the dynamic light scattering method (Nanotrack method). According to the dynamic scattering method, the diameter of the fine particles in the dispersion medium whose temperature, viscosity and refractive index are known can be easily determined.
- the particulate component used in the present invention is selected so as not to dissolve significantly in the solvent of the paint and not to react with the solvent or other components of the coating film. It can be adopted as the particle size of the particulate component in the paint.
- the dynamic light scattering method fine particles dispersed in a dispersion medium and moving in brown are irradiated with laser light to observe the scattered light from the particles, the autocorrelation function is determined by the photon correlation method, and the cumulant method is used. Measure the particle size.
- FPAR-1000 manufactured by Otsuka Electronics Co., Ltd. can be used as a particle size measurement apparatus by the dynamic light scattering method.
- a dispersion sample containing particles to be measured is measured at 25 ° C. to obtain a cumulant average particle diameter, and the average value of a total of five measurements is taken as the average particle diameter of the particles.
- the measurement of the average particle size by the dynamic light scattering method is described in detail, for example, in Journal of Chemical Physics, Vol. 57, No. 11 (Dec., 1972), p. 4814. .
- the coating film 24 is observed from the cross section to directly measure its shape and particle diameter. It is also possible.
- the cross-sectional observation method of the coating film 24 is not particularly limited, but after surface-coating hot-dip galvanized steel is embedded in a room temperature drying epoxy resin so that the vertical cross section of the coating film 24 can be seen, the embedded surface is mechanically polished A sample for observation with a thickness of 50 nm to 100 nm so that the vertical cross section of the coating film 24 can be seen from the surface-treated hot-dip galvanized steel using an SEM (scanning electron microscope) method or an FIB (focused ion beam) device. A method of cutting out and observing the cross section of the coating film with a TEM (transmission electron microscope) can be suitably used.
- SEM scanning electron microscope
- FIB focused ion beam
- the composition of the surface treatment layer 27 is not particularly limited, but the coating film 24 and the substrate can be obtained by providing the surface treatment layer 27 including at least one selected from a silane coupling agent and an organic resin.
- the adhesion to the plated steel can be further enhanced, and the corrosion resistance and scratch resistance of the surface-treated hot-dip galvanized steel can be further enhanced.
- the base treatment layer 27 containing both the silane coupling agent and the organic resin the coating film 24 and the base treatment layer 27 containing either one of the silane coupling agent and the organic resin are more effective.
- the adhesion to the plated steel material as the base material can be further enhanced, and the corrosion resistance and scratch resistance of the surface-treated hot-dip galvanized steel material can be further enhanced.
- the silane coupling agent contained in the surface treatment layer 27 is not particularly limited, and is, for example, commercially available from Shin-Etsu Chemical Co., Toray Dow Corning Co., Chisso Co., Momentive Performance Materials Japan Co., Ltd., etc.
- the organic resin contained in the base treatment layer 27 is not particularly limited, and for example, known organic resins such as polyester resin, polyurethane resin, epoxy resin, phenol resin, acrylic resin, polyolefin resin and the like can be used.
- the organic resin contained in the coating film 24 is a polyester resin, it is a base in the sense that the compatibility with the organic resin in the coating film 24 is enhanced and the adhesion of the coating film 24 to the base material plated steel is enhanced.
- the treatment layer 27 also contain a polyester resin.
- the content of the at least one material selected from the silane coupling agent and the organic resin contained in the base treatment layer 27 is not particularly limited, but preferably 50% by mass or more in the base treatment layer 27. When the content is less than 50% by mass, the content is small, and the adhesion to the coating film 24, the corrosion resistance, and the scratch resistance may not be improved.
- the undercoating layer 27 preferably further contains a polyphenol compound.
- the polyphenol compound refers to a compound having two or more phenolic hydroxyl groups bonded to a benzene ring, or a condensate thereof. Examples of compounds having two or more phenolic hydroxyl groups bonded to a benzene ring include gallic acid, pyrogallol, catechol and the like.
- the condensate of the compound having two or more phenolic hydroxyl groups bonded to the benzene ring is not particularly limited, and examples thereof include polyphenol compounds widely distributed in the plant kingdom generally called tannic acid.
- Tannic acid is a generic term for aromatic compounds of complex structure having a large number of phenolic hydroxyl groups widely distributed in the plant world.
- the tannic acid used in the undercoat layer 27 may be either hydrolyzable tannic acid or condensed tannic acid.
- the tannic acid is not particularly limited, and examples thereof include hamameli tannin, oyster tannin, chatannin, pentaploid tannin, gallic tannin, myroba tannin, dividibitannin, argarabilla tannin, baronia tannin, catechin tannin and the like. .
- tannic acid commercially available ones, such as “tannic acid extract A”, “B tannic acid”, “N tannic acid”, “technical tannic acid”, “purified tannic acid”, “Hi tannic acid”, It is also possible to use F tannic acid, “local tannic acid” (all manufactured by Dainippon Pharmaceutical Co., Ltd.), “tannic acid: AL” (manufactured by Fuji Chemical Industry Co., Ltd.), and the like. These tannic acids may be used alone or in combination of two or more.
- the undercoating layer 27 preferably further contains silica particles. It does not specifically limit as a kind of silica particle, for example, silica particles, such as colloidal silica and fumed silica, can be mentioned. As a commercial item, for example, Snowtex O, Snowtex N, Snowtex C, Snowtex IPA-ST (made by Nissan Chemical Industries, Ltd.), Adareite AT-20N, AT-20A (made by Asahi Denka Kogyo), Aerosil 200 (Made by Nippon Aerosil Co., Ltd.) etc. can be mentioned. As the above-mentioned silica particles, it is preferable to contain spherical silica particles having an average particle diameter of 5 nm or more and 20 nm or less in order to improve the corrosion resistance.
- the surface treatment layer 27 preferably further contains at least one selected from a phosphoric acid compound, a fluoro complex compound, and a vanadium (IV) compound in order to improve the corrosion resistance.
- the phosphoric acid compound is not particularly limited, and examples thereof include phosphoric acid, ammonium salts of phosphoric acid, alkali metal salts of phosphoric acid, and alkaline earth metal salts of phosphoric acid.
- the fluoro complex compound is not particularly limited, and examples thereof include titanium hydrofluoric acid, zircon hydrofluoric acid, ammonium salts thereof, alkali metal salts and the like.
- the vanadium (IV) compound is not particularly limited.
- vanadium pentoxide V 2 O 5
- metavanadic acid HVO 3
- ammonium metavanadate NH 4 VO 3
- sodium metavanadate NaVO 3
- Vanadium (V) a compound such as vanadium oxytrichloride (VOCl 3 ), reduced to vanadium (IV) with a reducing agent such as alcohol or organic acid, or vanadium dioxide (VO 2 ), vanadium oxyacetyl acetonate (VO (C 5 H 7 O 2) 2), vanadium such as vanadium oxysulfate (VOSO 4) (IV) containing compounds, vanadium acetylacetonate (V (C 5 H 7 O 2) 3), trioxide Compounds such as vanadium (V 2 O 3 ) and vanadium trichloride (VCl 3 ) And vanadium (III) oxidized to vanadium (IV) with an optional oxidizing agent.
- a reducing agent such as alcohol or organic acid
- the adhesion amount of the undercoating layer 27 is not particularly limited, but is preferably in the range of 10 mg / m 2 to 1000 mg / m 2 . If the adhesion amount of the undercoating layer 27 is less than 10 mg / m 2 , the effect of providing the undercoating layer 27 can not be sufficiently obtained. If the adhesion amount exceeds 1000 mg / m 2 , the undercoating layer 27 tends to be cohesively broken. Adhesion to the base metal plate may be reduced. From the viewpoint of stable effects and economy, the more preferable range of the amount of application is 50 mg / m 2 to 700 mg / m 2 .
- the surface-treated hot-dip galvanized steel material according to the present embodiment is manufactured by aluminum / zinc alloy plating on the surface of the steel material 1 and further coating the upper layer thereof with a coating film 24 containing an organic resin as a film forming component.
- a hot-dip plating bath 2 having a composition that matches the composition of the constituent elements of the plating layer 23 is prepared at the time of production of the hot-dip galvanized steel material.
- the alloy layer 25 is formed between the steel material 1 and the plating layer 23 by the hot-dip plating process, the fluctuation of the composition due to it is negligibly small.
- a hot-dip plating bath 2 containing 1 to 1000 ppm by mass of Sr, 0.1 to 1.0% by mass of Fe, and Zn is prepared.
- Zn occupies the remainder of the components in the hot-dip plating bath 2 excluding the components other than Zn.
- the mass ratio of Si: Mg in the hot-dip plating bath 2 is preferably in the range of 100: 50 to 100: 300.
- the hot-dip plating bath 2 may further contain a component selected from alkaline earth elements, Sc, Y, lanthanoid elements, Ti, and B. These components are contained in the hot-dip plating bath 2 as needed.
- the total content of the alkaline earth elements (Be, Ca, Ba, Ra), Sc, Y and the lanthanoid elements (La, Ce, Pr, Nd, Pm, Sm, Eu, etc.) in the hot-dip plating bath 2 is It is preferable that it is 1.0% or less in mass ratio.
- the hot-dip plating bath 2 contains a component consisting of at least one of Ti and B
- the total content of Ti and B in the hot-dip plating bath 2 is in the range of 0.0005 to 0.1% by mass ratio. Is preferred.
- the hot-dip plating bath 2 does not contain components other than the above.
- the hot-dip plating bath 2 preferably contains only Al, Zn, Si, Mg, Cr, Sr, and Fe.
- the hot-dip plating bath 2 preferably also contains only elements selected from Al, Zn, Si, Mg, Cr, Sr, and Fe, and alkaline earth elements, Sc, Y, lanthanoid elements, Ti and B.
- the hot-dip bath 2 preferably contains 25 to 75% of Al, 0.02 to 1.0% of Cr, and 0.5 to 0.5% of Si with respect to Al by mass ratio. 10%, 0.1 to 0.5% of Mg, 0.1 to 0.6% of Fe, 1 to 500 ppm of Sr, or further from alkaline earth element, lanthanoid element, Ti and B It is preferable to contain the selected components and to make the balance Zn.
- the hot-dip plating bath 2 may contain unavoidable impurities such as Pb, Cd, Cu, Mn and the like.
- the content of the unavoidable impurities is preferably as small as possible, and in particular, the total content of the unavoidable impurities is preferably 1% by mass or less in mass ratio with respect to the hot-dip plating bath 2.
- the corrosion resistance of the surface of the plating layer 23 is particularly improved by Al, and especially the hot-dip galvanized steel Edge creep at the cut end face of is suppressed, and the hot-dip galvanized steel material is imparted with high corrosion resistance.
- the sacrificial anticorrosive effect of the plating layer 23 is further strengthened by the fact that the plating layer 23 contains Mg which is a metal lower than Zn, and the corrosion resistance of the hot-dipped steel material is further improved.
- wrinkles are less likely to occur in the plated layer 23 formed by the hot-dip plating process.
- Mg tends to be concentrated in the surface layer of the hot-dip metal, and a Mg-based oxide film is thus formed. It was easy to generate wrinkles in the plating layer 23 due to the Mg-based oxide film.
- the concentration of Mg in the surface layer of the hot-dip plated metal attached to the steel material 1 is suppressed and the hot-dip galvanized metal flows Also, wrinkles are less likely to occur on the surface of the plating layer 23. Furthermore, the flowability inside the hot-dip plated metal is reduced, and the flow itself of the hot-dip plated metal is suppressed, which makes it more difficult for the wrinkles to occur.
- the ⁇ -Al phase precipitates as primary crystals and grows in a dendritic manner.
- the concentrations of Mg and Si in the remaining hot-dip plated metal that is, in the not-solidified component of the hot-dip plated metal
- Si-Mg phase Si-containing phase
- This Si-Mg phase is a phase composed of an alloy of Mg and Si as described above.
- the precipitation and growth of this Si-Mg phase are promoted by Cr, Fe and Sr.
- the migration of Mg to the surface layer of the hot-dip plated metal is inhibited by incorporating Mg in the hot-dip metal into the Si-Mg phase, and the concentration of Mg on the surface layer of the hot-dip metal is suppressed.
- Sr in the hot-dip plated metal also contributes to the suppression of the concentration of Mg. This is because Sr is an element which is easily oxidized in the same manner as Mg in the hot-dipped metal, so Sr competes with Mg to form an oxide film on the plating surface, and as a result, formation of a Mg-based oxide film is suppressed. It is considered to be
- the Si-Mg phase solidifies and grows in the hot-dip plated metal in the remainder other than the primary ⁇ -Al phase, so that the hot-dip plated metal becomes a solid-liquid mixed phase, and the hot-dip galvanized metal itself
- the flowability of the coating decreases, and as a result, the occurrence of wrinkles on the surface of the plating layer is suppressed.
- Fe is important in controlling the microstructure and the spangle of the plating layer 23. Although the reason that Fe affects the structure of the plating layer 23 is not necessarily clear at the moment, it is because Fe is alloyed with Si in the hot-dip metal and this alloy becomes a solidification nucleus when the hot-dip metal is solidified. it is conceivable that.
- Sr is a minor element like Mg
- the sacrificial anticorrosive action of the plating layer 23 is further strengthened by Sr, and the corrosion resistance of the hot-dip galvanized steel material is further improved.
- Sr also exerts the function of suppressing the acicularization of the precipitation form of the Si phase and the Si-Mg phase, so that the Si phase and the Si-Mg phase are spheroidized, and the generation of cracks in the plating layer 23 is suppressed.
- an alloy layer 25 containing a part of Al in the hot-dip plated metal is also formed between the plating layer 23 and the steel material 1.
- an Fe—Al based alloy layer 25 mainly composed of Al in the hot-dip plating bath 2 and Fe in the steel material 1 is formed.
- the alloy layer 25 containing Al in the hot-dip plating bath 2 and part or all of the constituent elements of pre-plating, or further containing Fe in the steel material 1. is formed.
- the alloy layer 25 further contains Cr as well as Al as a constituent element.
- the alloy layer 25 contains Si, Mn, Fe, Co, Ni, Cu, Zn, in addition to Al and Cr as constituent elements, depending on the composition of the hot-dip plating bath 2, the presence or absence of pre-plating, the composition of the steel material 1, etc. It may contain various metal elements such as Sn.
- the alloy layer 25 a part of Cr in the hot-dip plated metal is contained at a higher concentration than in the plating layer 23.
- the growth of the Si-Mg phase in the plating layer 23 is promoted by Cr in the alloy layer 25, and the volume ratio of the Si-Mg phase in the plating layer 23 increases.
- the ratio of Mg in the Si—Mg phase to the total amount of Mg in the plating layer 23 is increased. Thereby, the wrinkles of the plating layer are further suppressed.
- the corrosion resistance of the hot-dipped steel material is further improved by forming the alloy layer 25.
- the ratio of the content ratio of Cr in the alloy layer 25 to the content ratio of Cr in the plating layer 23 is preferably 2 to 50.
- the ratio of the content ratio of Cr in the alloy layer 25 to the content ratio of Cr in the plating layer 23 is preferably 3 to 40, and more preferably 4 to 25.
- the amount of Cr in the alloy layer 25 can be derived by measuring the cross section of the plating layer 23 using an energy dispersive X-ray analyzer (EDS).
- the thickness of the alloy layer 25 is preferably in the range of 0.05 to 5 ⁇ m. When the thickness of the alloy layer 25 is in the above range, the corrosion resistance of the hot-dip galvanized steel material is sufficiently improved, and the workability is also sufficiently improved.
- the concentration of Cr is kept in a certain range near the surface, and the corrosion resistance of the plating layer 23 is further improved accordingly. Although this reason is not clear, it is presumed that the composite oxide film is formed in the vicinity of the surface of the plating layer 23 when Cr bonds with oxygen. In order to improve the corrosion resistance of the plated layer 23, it is preferable that the content of Cr in the outermost layer of 50 nm deep in the plated layer 23 is 100 to 500 mass ppm.
- the corrosion resistance after bending deformation of the plating layer 23 is also improved.
- the reason is considered to be as follows.
- cracks may occur in the plated layer 23 and the coated film on the plated layer 23.
- water and oxygen infiltrate into the plating layer 23 through the cracks, and the alloy in the plating layer 23 is directly exposed to a corrosion factor.
- Cr present in the surface layer of the plating layer 23 and Cr present in the alloy layer 25 suppress the corrosion reaction of the plating layer 23, thereby suppressing the spread of corrosion starting from the crack.
- the hot-dip galvanized metal handled in the above preferred embodiment is a multi-component molten metal containing seven or more elements, and the solidification process is extremely complicated and difficult to predict theoretically, but the inventor Have obtained the above important findings through observation and the like in experiments.
- the composition of the hot-dip plating bath 2 as described above, the suppression of wrinkles and sagging in the plating layer 23 and the securing of corrosion resistance and workability of the hot-dip galvanized steel material are achieved as described above.
- the content of Al in the hot-dip plating bath 2 is less than 25%, the Zn content in the plating layer 23 becomes excessive, the corrosion resistance on the surface of the plating layer 23 becomes insufficient, and the content is 75%.
- the content is increased, the effect of sacrificial corrosion due to Zn is reduced, and the plated layer 23 is hardened to deteriorate the bending processability of the hot-dip galvanized steel material.
- the content is more than 75%, the fluidity of the hot-dip plated metal is increased, and the generation of wrinkles in the plating layer 23 may be induced.
- the content of Al is preferably 45% or more.
- the content of Al is preferably 65% or less.
- the content of Al is preferably in the range of 45 to 65%.
- the content of Cr in the hot-dip plating bath 2 is less than 0.02%, the corrosion resistance of the plating layer 23 will not be sufficiently secured, and wrinkles and sagging of the plating layer 23 will not be sufficiently inhibited.
- the content of Cr is particularly preferably 0.05% or more. Further, the content of Cr is particularly preferably 0.5% or less. The content of Cr is preferably in the range of 0.07 to 0.2%.
- the content of Si relative to Al in the hot-dip plating bath 2 is less than 0.5%, the above-described action can not be exhibited, and if the content is more than 10%, the action by Si is not only saturated but also the hot-dip plating bath 2 It becomes easy for dross to occur.
- the content of Si is particularly preferably 1.0% or more. Further, the content of Si is particularly preferably 5.0% or less. Further, the content of Si is preferably in the range of 1.0 to 5.0%.
- the content of Mg in the hot-dip plating bath 2 is less than 0.1%, the corrosion resistance of the plating layer 23 can not be sufficiently secured, and if the content is more than 10%, the improvement of the corrosion resistance is merely saturated. As a result, dross tends to occur in the hot-dip plating bath 2.
- the content of Mg is preferably 0.5% or more, more preferably 1.0% or more.
- the content of Mg is particularly preferably 5.0% or less, and more preferably 3.0% or less. In particular, the content of Mg is preferably in the range of 1.0 to 3.0%.
- the content of Fe in the hot-dip plating bath 2 is less than 0.1%, the microstructure and the spangly structure of the plating layer 23 may be coarsened, the appearance of the plating layer 23 may be degraded, and the processability may be degraded.
- the content is more than 0.6%, the spangles of the plating layer 23 become too fine or disappear, and the appearance is not improved by the spangles, and dross is easily generated in the hot-dip plating bath 2 turn into.
- the content of Fe is particularly preferably 0.2% or more.
- the content of Fe is particularly preferably 0.5% or less. In particular, the content of Fe is preferably in the range of 0.2 to 0.5%.
- the content of Sr in the hot-dip plating bath 2 is less than 1 ppm, the above-mentioned action is not exhibited, and when the content is more than 500 ppm, not only the action of Sr is saturated but also the dross in the hot-dip plating bath 2 Is more likely to occur.
- the content of Sr is particularly preferably 5 ppm or more.
- the content of Sr is particularly preferably 300 ppm or less.
- the content of Sr is more preferably in the range of 20 to 50 ppm.
- the hot-dip plating bath 2 contains a component selected from an alkaline earth element and a lanthanide element, the alkaline earth element (Be, Ca, Ba, Ra), Sc, Y, and a lanthanoid element (La, Ce, Pr, Nd, Pm, Sm, Eu, etc.) exert the same function as Sr.
- the total content of these components in the hot-dip plating bath 2 is preferably 1.0% or less by mass as described above.
- the hot-dip plating bath 2 particularly contains Ca, the generation of dross in the hot-dip plating bath 2 is significantly suppressed.
- the hot-dip plating bath 2 contains Mg, even if the content of Mg is 10% by mass or less, the occurrence of dross to a certain extent can not be avoided, and in order to ensure a good appearance of the hot-dip galvanized steel Although it is necessary to remove the dross from the hot-dip plating bath 2, if the hot-dip plating bath 2 further contains Ca, the occurrence of dross due to Mg is significantly suppressed.
- the content of Ca in the hot-dip plating bath 2 is preferably in the range of 100 to 5000 mass ppm. When the content is 100 mass ppm or more, the generation of dross in the hot-dip plating bath 2 is effectively suppressed. When the content of Ca is excessive, there is a possibility that the dross resulting from this Ca may occur, but when the content of Ca is 5000 mass ppm or less, the dross resulting from Ca is suppressed.
- the content is further preferably in the range of 200 to 1000 mass ppm.
- the ⁇ -Al phase (dendrite structure) of the plating layer 23 is refined, so that the spangles of the plating layer 23 are refined.
- the appearance of the plating layer 23 is improved.
- the occurrence of wrinkles in the plating layer 23 is further suppressed.
- This also refines the Si-Mg phase by the action of Ti and B, and this refined Si-Mg phase is effective in the flow of the hot-dip metal in the process of solidification of the hot-dip metal and formation of the plating layer 23 It is thought that it is to suppress it.
- the concentration of stress in the plating layer 23 at the time of bending is alleviated by the refinement of the plating structure, generation of large cracks and the like is suppressed, and bending workability is further improved.
- the total content of Ti and B in the hot-dip plating bath 2 is preferably in the range of 0.0005 to 0.1% by mass ratio.
- the total content of Ti and B is particularly preferably 0.001% or more.
- the total content of Ti and B is preferably 0.05% or less.
- the total content of Ti and B is preferably in the range of 0.001 to 0.05%.
- the plating layer 23 is formed by the hot-dip plating process using such a hot-dip plating bath 2.
- concentration of Mg in the surface layer is suppressed.
- the Mg content is less than 60% by mass in any region having a diameter of 4 mm and a depth of 50 nm in the outermost layer 50 nm deep from the surface of the plating layer 23 preferable.
- the amount of the Mg-based oxide film in the outermost layer of the plating layer 23 is particularly reduced, and the wrinkle caused by the Mg-based oxide film is further suppressed. The smaller the Mg content in the outermost layer, the more the wrinkles caused by the Mg-based oxide film are suppressed.
- the Mg content is more preferably less than 40% by mass, still more preferably less than 20% by mass, and particularly preferably less than 10% by mass. Particularly in the outermost layer having a thickness of 50 nm of the plating layer 23, it is preferable that there is no part where the Mg content is 60 mass% or more, and further preferably no part where the Mg content is 40 mass% or more It is further preferable that there is no part where the Mg content is 20% by mass or more.
- the physical meaning of Mg content is explained.
- the Mg content in the stoichiometric MgO oxide is about 60% by mass. That is, the fact that the Mg content is less than 60% by mass means that the MgO of the stoichiometric composition (the oxide film of MgO alone) is not present in the outermost layer of the plating layer 23, or the MgO of this stoichiometric composition is formed. Means that it is significantly suppressed. In the present embodiment, the excessive oxidation of Mg in the outermost layer of the plating layer 23 is suppressed, whereby the formation of the oxide film of MgO alone is suppressed.
- the Mg content in the outermost layer of the plating layer 23 can be analyzed using a Glow Discharge Spectrometer.
- a Glow Discharge Spectrometer When it is difficult to obtain accurate quantitative concentration analysis values, an oxide film of MgO alone is recognized as the outermost layer of the plating layer 23 by comparing concentration curves of a plurality of elements contained in the plating layer 23. You just need to make sure that it is not.
- the volume ratio of the Si-Mg phase in the plating layer 23 is preferably in the range of 0.2 to 15% by volume.
- the volume ratio of the Si-Mg phase is more preferably 0.2 to 10%, further preferably 0.3 to 8%, and particularly preferably 0.4 to 5%.
- a bump having a height larger than 200 ⁇ m and a steepness larger than 1.0 is It is preferred that it does not exist.
- the steepness is a value defined by (height of ridge ( ⁇ m)) / (width of bottom of ridge ( ⁇ m)).
- the bottom of the ridge is the point where the ridge intersects with a virtual plane including the flat surface around the ridge.
- the height of the ridge is the height from the bottom of the ridge to the tip of the ridge.
- the coating film 24 is formed on the plating layer 23 to be described later, the bumps are prevented from piercing the coating film 24 and the thickness of the coating film 24 can be easily made uniform. It will be. Thereby, the appearance of the surface-treated hot-dip galvanized steel material on which the coating film layer is formed is improved, and the surface-treated hot-dip galvanized steel material can further exhibit corrosion resistance and the like by the coating film layer.
- the adjustment of the degree of concentration of Mg, the state of the Si-Mg phase, the thickness of the alloy layer 25 and the steepness of the bump on the surface of the plating layer 23 is carried out using the hot-dip plating bath 2 of the above composition for the steel material 1 It can be achieved by applying a hot-dip plating process.
- Hot-dip plating for forming a plating layer on the steel material 1 on which the pre-plating layer 26 containing at least one component selected from Cr, Mn, Fe, Co, Ni, Cu, Zn, Sn is formed Hot-dip plating may be applied.
- the pre-plating layer 26 is formed on the surface of the steel material 1 by performing the pre-plating treatment on the steel material 1 before the hot-dip plating treatment.
- the pre-plating layer 26 improves the wettability between the steel material 1 and the hot-dipped metal during the hot-dip plating treatment, and the adhesion between the steel material 1 and the plating layer 23 is improved.
- the pre-plating layer 26 depends on the type of metal constituting the pre-plating layer 26, but also contributes to the further improvement of the surface appearance and corrosion resistance of the plating layer 23.
- the pre-plated layer 26 containing Cr when the pre-plated layer 26 containing Cr is formed, the formation of the alloy layer 25 containing Cr is promoted between the steel material 1 and the plating layer 23, and the corrosion resistance of the hot-dipped steel material is further improved.
- the pre-plating layer 26 containing Fe or Ni is formed, the wettability between the steel material 1 and the hot-dip plated metal is improved, the adhesion of the plating layer 23 is greatly improved, and the precipitation of the Si-Mg phase is further The surface appearance of the plating layer 23 is further enhanced.
- the promotion of the precipitation of the Si-Mg phase is considered to occur due to the reaction between the pre-plating layer 26 and the hot-dip plated metal.
- the adhesion amount of the pre-plating layer 26 is not particularly limited, but the adhesion amount on one surface of the steel material 1 is preferably in the range of 0.1 to 3 g / m 2 . If this adhesion amount is less than 0.1 g / m 2 , coating of the surface of the steel material with the pre-plating layer 26 is difficult, and the improvement effect by pre-plating is not sufficiently exhibited. When the adhesion amount exceeds 3 g / m 2 , not only the improvement effect is saturated but also the manufacturing cost is increased.
- the steel material 1 to be treated is a member formed of steel such as carbon steel, alloy steel, stainless steel, nickel chromium steel, nickel chromium molybdenum steel, chromium steel, chromium molybdenum steel, manganese steel and the like.
- Examples of the steel material 1 include various members such as thin steel plates, thick steel plates, mold steels, steel pipes, and steel wires. That is, the shape of the steel material 1 is not particularly limited.
- the steel material 1 may be subjected to flux treatment before the hot-dip plating treatment. This flux treatment improves the wettability and adhesion of the steel material 1 to the hot-dip plating bath 2.
- the steel material 1 may be subjected to a heating annealing / reduction treatment before being immersed in the hot-dip plating bath 2, or this treatment may be omitted. As described above, the steel material 1 may be pre-plated before the hot-dip plating process.
- the hot-dip plating processing apparatus shown by FIG. 1 is equipped with the conveying apparatus which conveys the steel plate 1a continuously.
- the conveyance device is configured of a feeding device 3, a winding device 12, and a plurality of conveyance rolls 15.
- the feeding machine 3 holds the coil 13 (first coil 13) of the long steel plate 1a.
- the first coil 13 is unwound by the feeder 3, and the steel plate 1 a is conveyed to the winder 12 while being supported by the conveyance rolls 15.
- a winder 12 winds the steel plate 1a, and the winder 12 holds a coil 14 (second coil 14) of the steel plate 1a.
- the heating furnace 4 heats the steel plate 1a.
- the heating furnace 4 is configured of a non-oxidizing furnace or the like.
- the annealing / cooling unit 5 heats and anneals the steel plate 1 a and subsequently cools it.
- the annealing / cooling unit 5 is connected to the heating furnace 4, and an annealing furnace is provided on the upstream side, and a cooling zone (cooler) is provided on the downstream side.
- the inside of the annealing / cooling unit 5 is maintained in a reducing atmosphere.
- the snout 6 is a cylindrical member in which the steel plate 1 a is conveyed, one end of which is connected to the annealing / cooling unit 5, and the other end is disposed in the hot-dip plating bath 2 in the pot 7.
- the interior of the snout 6 is maintained in a reducing atmosphere as in the annealing and cooling unit 5.
- the pot 7 is a container for storing the hot-dip plating bath 2, and a sink roll 8 is disposed inside thereof.
- the injection nozzle 9 injects gas toward the steel plate 1a.
- the injection nozzle 9 is disposed above the pot 7.
- the injection nozzle 9 is disposed at a position where the gas can be injected toward both sides of the steel plate 1 a pulled up from the pot 7.
- the cooling device 10 cools the hot-dip plated metal adhering to the steel plate.
- an air cooler, a mist cooler or the like is provided, and the steel plate 1a is cooled by the cooling device 10.
- the temper rolling and shape correction device 11 performs temper rolling and shape correction of the steel plate 1 a on which the plating layer 23 is formed.
- the temper rolling / shape correction device 11 includes a skin pass mill or the like for temper rolling the steel plate 1a, and a tension leveler or the like for straightening the steel plate 1a after temper rolling.
- the steel plate 1a is unwound from the feeding device 3 and continuously fed out. After the steel plate 1a is heated in the heating furnace 4, it is conveyed to the annealing / cooling unit 5 in a reducing atmosphere, and is annealed in the annealing furnace while removing rolling oil etc. adhering to the surface of the steel plate 1a. After the surface is cleaned, such as reduction and removal of oxide film, it is cooled in the cooling zone. Next, the steel plate 1 a passes through the snout 6, further penetrates the pot 7 and is immersed in the hot-dip plating bath 2 in the pot 7. The steel plate 1 a is supported by the sink roll 8 in the pot 7 so that the transport direction is converted upward and is pulled out of the hot-dip plating bath 2. Thereby, the hot-dip plated metal adheres to the steel plate 1a.
- gas is injected from the injection nozzle 9 to both surfaces of the steel plate 1a, whereby the adhesion amount of the hot-dip plated metal adhering to the steel plate 1a is adjusted.
- gas wiping method Such a method of adjusting the adhesion amount by gas injection is called gas wiping method.
- the adhesion amount of the hot-dip plated metal is preferably adjusted in the range of 40 to 200 g / m 2 on both sides of the steel plate 1a.
- wiping gas As a type of gas (wiping gas) injected to the steel plate 1a in the gas wiping method, air, nitrogen, argon, helium, water vapor and the like can be mentioned. These wiping gases may be preheated and then injected to the steel plate 1a.
- the hot-dip plating bath 2 having a specific composition the surface oxidation and concentration of Mg in the hot-dip metal (the oxidation of Mg and the increase in Mg concentration in the surface layer of the hot-dip metal) are essentially suppressed. Ru.
- the plating adhesion amount (deposited on the steel plate 1a without impairing the effects of the invention) Adjustment of the amount of hot-dip galvanized metal).
- the method of adjusting the plating adhesion amount is, of course, not limited to the gas wiping method, and various adhesion amount control methods can be applied.
- an adhesion amount control method other than the gas wiping method for example, a roll drawing method in which the steel plate 1a is passed between a pair of rolls disposed directly above the bath surface of the hot-dip plating bath 2, A method of disposing a shielding plate in close proximity and wiping the hot-dip plated metal with this shielding plate, an electromagnetic force wiping method of applying a downward moving force to the hot-dip galvanized metal adhering to the steel plate 1a using an electromagnetic force.
- the method of adjusting plating adhesion amount using natural gravity fall without adding external force, etc. are mentioned. Two or more plating adhesion amount adjustment methods may be combined.
- the steel plate 1 a is conveyed further upward than the arrangement position of the injection nozzle 9, and is then conveyed so as to be folded downward by being supported by the two conveyance rolls 15. That is, the steel plate 1a is transported along a reverse U-shaped path. In the reverse U-shaped path, the steel plate 1a is cooled by the cooling device 10 by air cooling, mist cooling, or the like. Thereby, the hot-dip plated metal adhering on the surface of the steel plate 1a solidifies, and the plating layer 23 is formed.
- the surface temperature of the hot-dip plated metal becomes 300 ° C. or less by the cooling device 10 in order for the solidification of the hot-dip plated metal to be completed completely by being cooled by the cooling device 10 It is preferable to cool down.
- the surface temperature of the hot-dip plated metal is measured, for example, by a radiation thermometer.
- the cooling rate from when the steel plate 1a is pulled out of the hot-dip plating bath 2 to when the surface of the hot-dip plated metal on the steel plate 1a is cooled to 300.degree. It is preferably in the range of 5 to 100 ° C./sec.
- the cooling device 10 preferably has a temperature control function for adjusting the temperature of the steel plate 1a along the transport direction and the plate width direction. Cooling device 10 may be divided into a plurality of parts along the conveyance direction of steel plate 1a. In FIG. 1, the primary cooling device 101 cools the steel plate 1 a in a path transported further upward than the arrangement position of the injection nozzle 9, and the secondary cooling device 102 cools the steel plate 1 a downstream of the primary cooling device 101. And are provided. The primary cooling device 101 and the secondary cooling device 102 may be further divided into a plurality.
- the steel plate 1a is cooled by the primary cooling device 101 until the surface of the hot-dip plated metal reaches a temperature of 300 ° C. or lower, and the steel plate 1a is further cooled by the secondary cooling device 102. It can cool so that the temperature at the time of being introduced to 100 ° C. or less.
- the cooling rate of the surface of the hot-dip plated metal is 50 ° C./sec or less while the surface temperature of the hot-dip galvanized metal on the steel plate 1a is 500 ° C. or higher.
- the precipitation of the Si-Mg phase on the surface of the plating layer 23 is particularly suppressed, and hence the generation of the sag is suppressed.
- Be The cooling rate in this temperature range is more preferably 40 ° C./sec or less, and particularly preferably 35 ° C./sec or less.
- the shape correction is applied.
- the rolling reduction by temper rolling is preferably in the range of 0.3 to 3%. It is preferable that the elongation rate of the steel plate 1a by shape correction is 3% or less.
- the steel plate 1 a is taken up by the winding machine 12, and the coil 14 of the steel plate 1 a is held by the winding machine 12.
- the temperature of the hot-dip plating bath 2 in the pot 7 is a temperature higher than the solidification start temperature of the hot-dip plating bath 2 and not higher than 40.degree. Is preferred. It is further preferable that the temperature of the hot-dip plating bath 2 in the pot 7 is a temperature which is higher than the solidification start temperature of the hot-dip plating bath 2 and not higher than 25 ° C. higher than the solidification start temperature.
- the time required for the hot-dip galvanized metal adhering to the hot-dip steel plate 1a to solidify is shortened after the hot-dip steel plate 1a is pulled out from the hot-dip bath 2 .
- the time during which the hot-dip plated metal adhering to the steel plate 1a is in a flowable state is also shortened, and therefore, the wrinkles are further less likely to occur in the plating layer 23.
- the temperature of the hot-dip plating bath 2 is equal to or lower than the temperature which is 20 ° C. higher than the solidification start temperature of the hot-dip plating bath 2, the generation of wrinkles in the plating layer 23 is particularly remarkably suppressed.
- steel plate 1a When steel plate 1a is drawn from hot-dip plating bath 2, it may be drawn into a non-oxidizing atmosphere or a low-oxidizing atmosphere, and further, gas is applied to steel plate 1a in this non-oxidizing atmosphere or a low-oxidizing atmosphere. Adjustment of the adhesion amount of the hot-dip metal plating may be performed by the wiping method. For that purpose, for example, as shown in FIG.
- the hollow member 22 be surrounded by the hollow member 22 and the inside of the hollow member 22 be filled with a non-oxidizing gas such as nitrogen gas or a low-oxidizing gas.
- the nonoxidizing gas or the low oxidizing gas means a gas having a low oxygen concentration as compared to the atmosphere.
- the oxygen concentration of the non-oxidizing gas or the low-oxidizing gas is preferably 1000 ppm or less.
- the atmosphere filled with the nonoxidizing gas or the low oxidizing gas is a nonoxidizing atmosphere or a low oxidizing atmosphere.
- the injection nozzle 9 is disposed inside the hollow member 22.
- the hollow member 22 is provided so as to surround the transport path of the steel material 1 from the inside of the hot-dip plating bath 2 (upper part of the hot-dip plating bath 2) to the upper side of the hot-dip plating bath 2.
- the gas injected from the injection nozzle 9 is also preferably a non-oxidizing gas such as nitrogen gas or a low-oxidizing gas.
- the steel plate 1a drawn from the hot-dip plating bath 2 is exposed to a non-oxidizing atmosphere or a low-oxidizing atmosphere, so oxidation of the hot-dip plated metal attached to the steel plate 1a is suppressed, and the surface layer of this hot-dip metal In addition, it is more difficult to form a Mg-based oxide film. For this reason, the occurrence of wrinkles in the plating layer 23 is further suppressed.
- the hollow member 22 even if a part of the hot dip plating processing apparatus including the transport path of the steel plate 1a or the whole hot dip plating processing apparatus is disposed in the non-oxidizing atmosphere or the low-oxidizing atmosphere Good.
- the steel sheet 1a after hot-dip plating be further subjected to an overaging treatment.
- the workability of the hot-dip galvanized steel product is further improved.
- the overaging treatment is performed by holding the steel plate 1a within a predetermined temperature range for a predetermined time.
- FIG. 3A and 3B show the apparatus used for the overageing treatment, of which Figure 3A shows the heating apparatus.
- FIG. 3B shows the heat retention container 20.
- a heating apparatus is provided with the conveying apparatus by which the steel plate 1a after the hot dip galvanization process is conveyed continuously.
- This conveyance device is configured by the feeding device 16, the winding device 17, and a plurality of conveyance rolls 21 as in the case of the conveyance device in the hot-dip plating processing apparatus.
- a heating furnace 18 such as an induction heating furnace is provided in the conveyance path of the steel plate 1a by the conveyance device.
- the heat insulating container 20 is not particularly limited as long as the heat insulating container 20 can hold the coil 19 of the steel plate 1a therein and has a heat insulating property.
- the heat retention container 20 may be a large container (heat retention room).
- the coil 14 of the hot-dip galvanized steel plate 1a is transported from the winding machine 12 of the hot dip plating processing apparatus by a crane or a truck, etc. Will be held by In the heating device, first, the steel plate 1a is unwound from the feeding device 16 and continuously fed out. The steel plate 1a is heated to a temperature suitable for the overageing treatment in the heating furnace 18, and then wound up by the winding machine 17. The coiling machine 17 holds the coil 19 of the steel plate 1a.
- the coil 19 of the steel plate 1 a is transported from the winder 17 by a crane, a carriage, or the like, and is held in the heat insulation container 20.
- the coil 19 of the steel plate 1a is held for a certain period of time in the heat insulating container 20, whereby the steel plate 1a is subjected to an overaging treatment.
- the plated layer 23 formed on the surface of the steel plate 1a according to the present embodiment contains Mg, and a slight Mg-based oxide film exists on the surface of the plated layer 23. Therefore, in the coil of the steel plate 1a at the time of overaging treatment Even if the plated layers 23 overlap each other, burning and welding do not easily occur between the plated layers 23. For this reason, even if the heat retention time at the time of the overageing treatment is long, or even if the heat keeping temperature is high temperature, the seizure hardly occurs and the steel plate 1a can be sufficiently subjected to the overageing treatment. As a result, the processability of the hot-dip galvanized steel sheet is greatly improved, and the efficiency of the overaging treatment is improved.
- the temperature of the steel plate 1a after heating by the heating device is in the range of 180 to 220 ° C., that is, the temperature of the steel plate 1a is in the above range.
- the holding time y (hr) of the steel plate 1a in the heat insulation container satisfies the following formula (5).
- T (° C.) in the formula (5) is the temperature (holding temperature) of the steel plate 1a during the holding time y (hr), and is the minimum temperature when temperature fluctuation occurs in the steel plate 1a.
- the hot-dip plating processing apparatus and the heating apparatus are separate apparatuses, the hot-dip plating processing apparatus may also serve as the heating apparatus because the hot-dip plating processing apparatus includes the heating furnace 18.
- various elements may be appropriately modified as needed by adding, removing, replacing, etc.
- the hot-dip plating processing apparatus and heating apparatus according to the present embodiment are suitable when the steel material 1 is the steel plate 1a, the configuration of the hot-dip plating processing apparatus, heating apparatus, etc. can be variously changed in design according to the shape etc. of the steel material 1 is there. In the case where the steel material 1 is subjected to a pretreatment for plating, the pretreatment for plating can be variously changed according to the type, shape, and the like of the steel material 1.
- the surface-treated hot-dip galvanized steel material according to each embodiment of the present invention is manufactured by forming the above-described coating film 24 on the upper layer of the steel material 1 subjected to the above-described hot-dip plating treatment. Moreover, when providing the base treatment layer 27 mentioned above, the base treatment layer 27 is formed in the upper layer of the steel materials 1 to which the hot-dip plating process was given above, and the coating film 24 is laminatedly formed on the surface of this base treatment layer 27. Do.
- the coating film 24 and the base treatment layer 27 are formed, after the base treatment layer 27 is applied on the steel material 1 and dried and baked, the coating film 24 is applied on the base treatment layer 27 and dried and baked You may In addition, after the coating composition for forming a coating film and the coating composition for forming a base treatment layer are applied to the base steel material 1 by wet on wet or multilayer simultaneous coating, both coating compositions are dried and baked simultaneously. It is also good.
- the plating layer 23 may be subjected to nickel plating treatment, cobalt plating treatment, etc., washing with pure water or various organic solvent solutions, acid, Washing with an aqueous solution or various organic solvent solution optionally containing an alkali or various etching agents may be performed.
- a small amount of Mg-based oxide film may be present on the surface of the plating layer 23, or inorganic and organic stains may be attached to the surface of the plating layer 23.
- the method for forming the coating film 24 is not particularly limited.
- the coating composition containing an organic resin in an aqueous solvent or an organic solvent-based solvent may be applied onto a plated steel material and formed by heating and drying. it can.
- a coating composition using an aqueous solvent hereinafter, abbreviated as aqueous coating
- organic solvent coating a line dedicated to coating for using a coating composition using an organic solvent-based solvent
- the water-based solvent used in the water-based paint means that water is a main component of the solvent.
- the amount of water occupied in the solvent is preferably 50% by mass or more.
- the solvent other than water may be an organic solvent-based solvent, but an organic solvent-containing substance as defined in the Organic Solvent Poisoning Prevention Rule of the Industrial Safety and Health Act (Organic solvents listed in Table 6-2 of the Ordinance on Labor Safety and Health Act Enforcement More preferably not exceeding 5% of the weight).
- the organic solvent solvent means that the organic solvent is a main component of the solvent.
- the coating composition for forming the coating film 24 is not limited to a specific method, and can be obtained by any method.
- a method of adding the components of the coating film 24 to an aqueous solvent or an organic solvent solvent as a dispersion medium, stirring with a disper, and dissolving or dispersing may be mentioned.
- the dispersion medium is an aqueous solvent
- a known hydrophilic solvent etc. such as ethanol, isopropyl alcohol, t-butyl alcohol and propylene glycol etc.
- Alcohols, cellosolves such as ethylene glycol monobutyl ether and ethylene glycol monoethyl ether, esters such as ethyl acetate and butyl acetate, and ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone may be added.
- any known method can be used without particular limitation.
- a coating method roll coating, curtain coating, spray coating, bar coating, immersion, electrostatic coating, or the like can be used.
- the heating and drying method for forming the coating film 24 from the coating composition is not particularly limited, and any method can be used. For example, it is possible to heat the plated steel in advance before applying the coating composition, to heat the plated steel after applying, or to combine them for drying.
- the heating method is also not particularly limited, and the coating composition can be dried and baked using hot air, induction heating, near infrared rays, direct heat, etc. alone or in combination.
- the dry baking temperature is preferably 100 ° C. to 250 ° C., more preferably 120 ° C. to 230 ° C., and most preferably 130 ° C. to 220 ° C. in terms of the ultimate plate temperature.
- the dry baking time is preferably 1 second to 60 seconds, and more preferably 3 seconds to 20 seconds. If the dry baking time is less than 1 second, the film formation of the coating film 24 may be insufficient, and the corrosion resistance, scratch resistance, and contamination resistance may decrease, and if it exceeds 60 seconds, the productivity decreases. .
- the base treatment layer 27 is formed by applying a coating agent for forming the base treatment layer 27 on at least one surface of the plated steel material and drying by heating.
- a coating agent for forming the base treatment layer 27 on at least one surface of the plated steel material and drying by heating.
- the baking and drying method is not particularly limited, and the plated steel may be heated in advance, or the coated steel may be heated after coating, or drying may be performed by combining these.
- a hot air, induction heating, near infrared rays, direct fire etc. can be used individually or in combination.
- the baking and drying temperature is preferably 60 ° C. to 150 ° C. as the ultimate temperature. If the reached temperature is less than 60 ° C., the drying is insufficient, and the adhesion between the coating film 24 and the base material plated steel and the corrosion resistance of the surface-treated hot-dip galvanized steel may be reduced. The adhesion between the coating film 24 and the base material plated steel may be lowered. A more preferable ultimate temperature is 70 ° C to 130 ° C.
- the surface-treated hot-dip galvanized steel product manufactured according to the present embodiment is less in unevenness of the plated surface due to the occurrence of wrinkles or sagging of the plated layer 23, and is therefore compared to the conventional high Al-containing and Mg-containing plated steel materials. Appearance is good. Further, due to the effect of the coating film 24, in particular, the white rust resistance of the processed portion is also excellent, and the scratch resistance and the contamination resistance are also excellent. White rust resistance, scratch resistance, and contamination resistance of the processed portion are characteristics which were not considered in the conventional high Al-containing and Mg-containing plated steel materials.
- This surface-treated hot-dip galvanized steel material can be employed in construction materials, materials for automobiles, materials for household appliances, and various other applications, and in particular, it is suitably employed in applications where corrosion resistance at the machined part is required. it can.
- FIG. 11A to 11H show the layer structure of the surface-treated hot-dip galvanized steel material according to the embodiment of the present invention.
- FIG. 11A shows a layer structure formed of the steel material 1, the plating layer 23, and the coating film 24.
- FIG. 11B shows a layer structure formed of the steel material 1, the alloy layer 25, the plating layer 23, and the coating film 24.
- FIG. 11C shows a layer structure formed of the steel material 1, the pre-plating layer 26, the plating layer 23, and the coating film 24.
- FIG. 11D shows a layer structure formed of the steel material 1, the plating layer 23, the base treatment layer 27, and the coating film 24.
- FIG. 11E shows a layer structure formed by the steel material 1, the alloy layer 25, the plating layer 23, the base treatment layer 27, and the coating film 24.
- FIG. 11A shows a layer structure formed of the steel material 1, the plating layer 23, and the coating film 24.
- FIG. 11B shows a layer structure formed of the steel material 1, the alloy layer 25, the plating layer 23, and the
- FIG. 11F shows a layer structure formed of the steel material 1, the pre-plating layer 26, the plating layer 23, the base treatment layer 27, and the coating film 24.
- FIG. 11G shows a layer structure formed of the steel material 1, the pre-plating layer 26, the alloy layer 25, the plating layer 23, and the coating film 24.
- FIG. 11H shows a layer structure formed of the steel material 1, the pre-plating layer 26, the alloy layer 25, the plating layer 23, the base treatment layer 27, and the coating film 24.
- the invention is further illustrated by the example using a hot-dip galvanized steel sheet as the hot-dip galvanized steel material.
- the present invention is not limited to the following examples.
- Hot-dip galvanized steel sheet (hot-dip galvanized steel) First, a method for producing a hot-dip galvanized steel sheet, an evaluation test method for a hot-dip galvanized steel sheet obtained by the method, and test results will be described.
- the adhesion amount (one side) is 0.5 g / m 2 in the level M68 and the adhesion amount (one side in the level M69) by performing Ni pre-plating before the steel plate 1a is subjected to the hot-dip plating treatment.
- a pre-plated layer 26 of 2.0 g / m 2 was formed.
- Zn-10% Cr pre-plating treatment was performed to form a pre-plated layer 26 with a deposition amount (one side) of 1.0 g / m 2 . In the other examples and comparative examples, the pre-plating treatment was not performed.
- the temperature at the time of penetration of the steel plate 1a into the hot-dip plating bath 2 was 580.degree.
- the steel plate 1a was pulled out of the hot-dip plating bath 2, it was pulled out into an air atmosphere, and gas wiping was also performed in the air atmosphere.
- the transport path of the steel plate 1a on the upstream side of the hot-dip plating bath 2 is surrounded by the seal box (hollow member 22), and the injection nozzle 9 is disposed inside this seal box. While the inside was made into nitrogen atmosphere, gas wiping with nitrogen gas was performed inside the hollow member 22.
- the steel plate 1a was cooled until the surface temperature of the hot-dip plated metal (plating layer 23) became 300.degree.
- the cooling rate during cooling was 45 ° C./sec.
- the cooling rate in the temperature range where the surface temperature of the hot-dip plated metal is 500 ° C. or higher is changed, and the cooling rate at the level M76 in this process is 38 ° C./sec, the level M77.
- the cooling rate was 28 ° C./sec.
- the rolling reduction during temper rolling was 1%, and the elongation of the steel plate 1a during shape correction was 1%.
- FIG. 4A An image obtained by photographing the cut surface of the hot-dip galvanized steel sheet obtained at level M5 with an electron microscope is shown in FIG. 4A. Furthermore, elemental analysis was performed on the part where precipitation of the Si-Mg phase was observed using an energy dispersive X-ray analyzer (EDS). The results are shown in FIG. 4B. According to this result, it can be seen that only two elements of Mg and Si are strongly detected. O (oxygen) was also detected because oxygen adsorbed to the sample was detected at the sample preparation stage.
- EDS energy dispersive X-ray analyzer
- the area ratio (%) of the Si-Mg phase in this cut surface is measured by performing image analysis based on the captured image in a range where the length in the direction orthogonal to the thickness direction in the cut surface of the plating layer 23 is 20 mm. did.
- the Si-Mg phase showed a dark gray tone and was clearly distinguished from the other phases, so that it was possible to easily distinguish by image analysis.
- the area ratio (%) thus obtained was considered to coincide with the volume ratio of the Si-Mg phase, and the volume ratio of the Si-Mg phase was evaluated.
- the results are shown in Tables 4 to 6.
- the elemental analysis of the components contained in the plated layer 23 of the hot-dip galvanized steel sheet in the depth direction (the thickness direction of the plated layer 23) was performed by glow discharge optical spectroscopy (GD-OES).
- GD-OES glow discharge optical spectroscopy
- the diameter of the measurement area is 4 mm
- the output is 35 W
- the measurement atmosphere is Ar gas
- the measurement pressure is 600 Pa
- the discharge mode is normal sputtering
- the duty cycle is 0.1
- the analysis time is 80 seconds
- the sampling time is 0.02 sec / sec.
- the emission intensity of the element contained in the plating layer 23 was measured under the condition of point.
- GD-OES data is usually in the form of a change in emission intensity with respect to sputtering time
- the sputtering depth is measured by observing the cross section of the sample after the measurement is completed, and this sputtering depth is divided by the total sputtering time.
- the sputtering rate was calculated, and the depth position of the plating layer 23 in the GD-OES depth direction profile was specified.
- the hot-dip galvanized steel sheet was cut in the thickness direction to obtain a sample.
- the sample was embedded in a resin so that the cut surface was exposed, and then the cut surface was polished to a mirror surface.
- the thickness of this alloy layer 25 was measured. Further, a 10 ⁇ m ⁇ 20 ⁇ m portion of the polished surface was sampled from the polished surface by a focused ion beam apparatus, and a micro sample processed to a thickness of 50 nm or less was produced.
- the Cr concentration in the alloy layer 25 was quantitatively analyzed using an energy dispersive X-ray analyzer (EDS) under the conditions of an acceleration voltage of 200 kV and a probe diameter of 1 nm.
- EDS energy dispersive X-ray analyzer
- FIG. 7A shows a photograph of the surface of the plating layer 23 taken at level M5.
- FIG. 7B shows a photograph of the surface of the plating layer 23 taken at level M10.
- FIG. 8A shows an optical micrograph of the surface of the plating layer 23 at level M62.
- FIG. 8B shows an optical micrograph of the surface of the plating layer 23 at the level M5.
- FIG. 9 shows a photograph of the appearance of the plating layer 23 at level M50.
- the degree of wrinkles on the surface of the plating layer 23 was evaluated according to the following criteria.
- the results are shown in Tables 4 to 6. 5: no wrinkles observed 4: Minor wrinkles (wrinkles as shown in FIG. 7A). 3: Wrinkles are small (in the case of evaluation of the degree of wrinkles between 4 and 2). 2: Moderate wrinkles (better than shown in FIG. 7B). 1: Wrinkles are significant (wrinkles as shown in FIG. 7B).
- the degree of dross adhering to the plating layer 23 was evaluated according to the following criteria.
- the results are shown in Tables 4 to 6. 2: the surface of the plating layer 23, there is no adhesion of dross with irregularities, or deposition of dross with irregularities are observed less than 5 points per 1 m 2. 1: the surface of the plating layer 23, deposition of dross with irregularities are observed over 5 points per 1 m 2.
- the horizontal axis represents the incubation temperature t (° C.)
- the vertical axis represents the incubation conditions y (hr).
- the evaluation results of the heat retention temperature and the heat retention time are shown at positions corresponding to the heat retention temperature t (° C.) and the heat retention time y (hr) during the test in this graph.
- the region sandwiched by the broken lines in the graph is a region where the heat retention temperature t (° C.) and the heat retention time y (hr) satisfy the following formula (5).
- the coating agent for forming the base treatment layer 27 includes the organic resin shown in Table 7, the silane coupling agent shown in Table 8, the polyphenol compound shown in Table 9, the silica particles shown in Table 10, and Table 11.
- the phosphoric acid compound to be shown, the fluoro complex compound to be shown in Table 12, and the vanadium (IV) compound to be shown in Table 13 are compounded in the amount (mass% of solid content) to be shown in Table 14 Prepared by stirring.
- the coating agent is coated with a roll coater so that the adhesion amount of 100 mg / m 2 is achieved on the surface of the hot-dip galvanized steel sheet produced by the production method of the hot-dip galvanized steel sheet, and dried at a reaching plate temperature of 70 ° C.
- the base treatment layer 27 was formed as needed.
- the coating composition for forming the coating film 24 includes the organic resin shown in Table 15, the silica particles shown in Table 16, the lubricants shown in Table 17, the phosphoric acid compounds shown in Table 18, and the Table 19
- the color pigment and the cross-linking agent shown in Table 20 were blended in the compounding amounts (% by mass of solid content) shown in Tables 21 to 29, and the mixture was prepared by stirring using a paint disperser.
- the above coating composition is formed in a predetermined thickness on the upper layer of the base treatment layer 27 formed in the above (2.1.1) (in the case where the base treatment layer 27 is not present, the hot-dip galvanized steel sheet prepared in the above [1.1]).
- the examples of the present invention exhibited excellent corrosion resistance, scratch resistance, and contamination resistance, which were excellent in the rating of 3 or more in any of the evaluation tests.
- Comparative Examples 1 to 10, 12 and 13 in which the content of the hot-dip plating layer was out of the range of the present invention were inferior in the corrosion resistance at the machined part.
- Comparative Example 11 in which the coating film 24 was not coated was inferior in the corrosion resistance, the scratch resistance and the stain resistance of the machined part.
- a surface-treated hot-dip galvanized steel material having good white rust resistance, scratch resistance and contamination resistance at a processed portion, and suppressing the occurrence of wrinkles and sagging on the surface of a plating layer and having a good appearance Is provided.
Abstract
Description
本願は、2011年8月24日に、日本に出願された特願2011-182916号に基づき優先権を主張し、その内容をここに援用する。
(1)本発明の第一の態様に係る表面処理溶融めっき鋼材は、鋼材と、この鋼材の表面上の被覆物と、を備え、前記被覆物が、前記鋼材から近い順に、めっき層と、前記めっき層の表面上の有機樹脂を含む塗膜とを有し、前記めっき層が構成元素としてAl、Zn、Si及びMgを含み、且つAl含有量が25~75質量%、Mg含有量が0.1~10質量%であり、前記めっき層が0.2~15体積%のSi-Mg相を含み、前記Si-Mg相中のMgの、前記めっき層中のMg全量に対する質量比率が3%以上100%以下であり、前記有機樹脂が、シランカップリング剤、架橋性ジルコニウム化合物、架橋性チタン化合物、エポキシ化合物、アミノ樹脂から選ばれる少なくとも1種によって架橋されている。
本実施形態に係る表面処理溶融めっき鋼材は、図11A~図11Hに示すとおり、鋼材1と、この鋼材1の表面上の被覆物28とを備える。この被覆物28は、鋼材1から近い順に、アルミニウム・亜鉛合金めっき層23(以下、「めっき層23」という)と、めっき層23の表面上の有機樹脂を含む塗膜24とを有する。すなわち、鋼材1の表面上にめっき層23がめっきされ、更にその上層に有機樹脂を造膜成分とする塗膜24が被覆されている。鋼材1としては、薄鋼板、厚鋼板、型鋼、鋼管、鋼線等の種々の部材が挙げられる。すなわち、鋼材1の形状は特に制限されない。めっき層23は、溶融めっき処理により形成される。
めっき層23は、構成元素としてAl、Zn、Si及びMgを含む。めっき層23内のAl含有量は、25~75質量%である。Mg含有量は、0.1~10質量%である。このため、Alによって特にめっき層23の表面の耐食性が向上すると共に、Znによる犠牲防食作用によって特に溶融めっき鋼材の切断端面におけるエッジクリープが抑制されて、溶融めっき鋼材に高い耐食性が付与される。更に、Siによってめっき層23中のAlと鋼材1との間の過度の合金化が抑制され、めっき層23と鋼材1との間に介在する合金層25(後述)によって溶融めっき鋼材の加工性を損なうことが抑制される。更に、めっき層23がZnよりも卑な金属であるMgを含有することで、めっき層23の犠牲防食作用が強化され、溶融めっき鋼材の耐食性が更に向上する。
R=100×AMg/(M×CMG/100)…(1)
Rはめっき層23中のMg全量に対するSi-Mg相中のMgの質量比率(質量%)を、AMgはめっき層23の平面視単位面積当たりの、めっき層23中のSi-Mg相に含まれるMg含有量(g/m2)を、Mはめっき層23の平面視単位面積当たりの、めっき層23の質量(g/m2)を、CMGはめっき層23中の全Mgの含有量(質量%)を、それぞれ示す。ここで、めっき層23の平面視単位面積当たりの、めっき層23の質量Mとは、鋼板の表面を基準にして、鋼板の表面の上の単位面積当たりに付着するめっき層23の質量のことを言う。
AMg=V2×ρ2×α …(2)
V2はめっき層23の平面視単位面積当たりの、めっき層23中のSi-Mg相の体積(m3/m2)を示す。ρ2はSi-Mg相の密度を示し、その値は1.94×106(g/m3)である。αはSi-Mg相中のMgの含有質量比率を示し、その値は0.63である。
V2=V1×R2/100 …(3)
V1はめっき層23の平面視単位面積あたりの、めっき層23の全体体積(m3/m2)を、R2はめっき層23中のSi-Mg相の体積比率(体積%)を、それぞれ示す。
V1=M/ρ1 …(4)
ρ1は、めっき層23全体の密度(g/m3)を示す。ρ1の値は、めっき層23の組成に基づいてめっき層23の構成元素の常温での密度を加重平均することで算出される。
めっき層23の上層に被覆されている塗膜24は、有機樹脂を必須の造膜成分とし、有機樹脂もしくは有機樹脂とアルミニウム・亜鉛合金めっき層23とがシランカップリング剤、架橋性ジルコニウム化合物、架橋性チタン化合物、エポキシ化合物、アミノ樹脂から選ばれる少なくとも1種によって架橋されている。アルミニウム・亜鉛合金めっき層23は比較的高濃度のAlを含有しているとともに、Mgも含有している。それにより、めっき層23表面はMg系酸化皮膜やAl系酸化皮膜で覆われている。耐食性や耐傷付き性を改善するためには、これらの酸化皮膜と塗膜との密着性を高めることが重要である。本発明者らは、鋭意検討の結果、有機樹脂を必須の造膜成分とし、有機樹脂同士が、もしくは有機樹脂とアルミニウム・亜鉛合金めっき層23とがシランカップリング剤、架橋性ジルコニウム化合物、架橋性チタン化合物、エポキシ化合物、アミノ樹脂から選ばれる少なくとも1種によって架橋されるような塗膜を形成することが、これらの酸化皮膜と塗膜との密着性を最大限高めるのに有効との知見を新たに得て、本発明を完成するに至った。また、このような塗膜形成により、塗膜の腐食因子(水や酸素等)に対するバリヤー性を高め、腐食の進行を遅らせることも可能になり、耐食性が格段に向上するとの知見も得た。また、有機樹脂を造膜成分とする塗膜24は耐汚染性にも優れるという特長も有している。ここで耐汚染性とは指紋等の油性汚れが付着しても目立ちにくく、比較的簡単に汚れを除去することができる性能のことを指す。
以下に、塗膜24の構成について説明する。
塗膜24の厚みは特に限定されないが、0.1μm以上10μm以下であることが好ましく、より好ましくは0.3μm以上7μm以下、更に好ましくは0.5μm以上5μm以下である。塗膜24の厚みが0.1μm未満であると、十分な耐食性、耐傷付き性、耐汚染性が得られないことがある。一方、塗膜24の厚みが10μm超であると、経済的に不利であるばかりか、塗膜24が水系塗料から形成される場合にワキ等の塗膜24欠陥が発生することがあり、工業製品としての外観や性能を安定して得ることができないことがある。
有機樹脂としては、特定の種類に限定されず、例えば、ポリエステル樹脂、ポリウレタン樹脂、エポキシ樹脂、アクリル樹脂、ポリオレフィン樹脂、又はこれらの樹脂の変性体等を挙げることができる。ここで変性体とは、これらの樹脂の構造中に含まれる反応性官能基に、その官能基と反応し得る官能基を構造中に含む他の化合物(モノマーや架橋剤など)を反応させた樹脂のことを指す。このような有機樹脂としては、1種又は2種以上の有機樹脂(変性していないもの)を混合して用いてもよいし、少なくとも1種の有機樹脂の存在下で、少なくとも1種のその他の有機樹脂を変性することによって得られる有機樹脂を1種又は2種以上混合して用いてもよい。
上記塗膜24は、更にシリカ粒子を含有することが好ましい。シリカ粒子を含有することで、更に耐食性と耐傷付き性を向上させることができる。特に、耐傷付き性を向上させるためには塗膜24を硬質化することが考えられるが、造膜成分である有機樹脂を硬質化させると、表面処理溶融めっき鋼材加工部の塗膜24に亀裂等の不具合(加工性の低下)が生じ、加工部の耐食性を低下させる懸念がある。一方、有機樹脂に比較的硬質なシリカ粒子を複合化させた塗膜24は、単に硬質化させた有機樹脂に比べ加工性も低下し難く、シリカ粒子自身にも耐食性を向上させる効果があるため、耐食性と耐傷付き性を高次元で両立させることができる。
上記塗膜24は、更に潤滑剤を含有することが、耐食性、耐傷付き性を向上させる上で好ましい。潤滑剤を含有することにより、上記表面処理溶融めっき鋼材の潤滑性が高まり、言い換えると、プレス金型等との接触の際に受ける摩擦抵抗を低減する効果が高まり、加工部における塗膜24の損傷や取り扱い時の傷入りを防止することができる。
上記塗膜24は、更にリン酸化合物を含有することが耐食性を向上させる上で好ましい。リン酸化合物はリン酸イオンを放出する化合物であることが更に好ましい。リン酸化合物を含有させた場合には、塗膜形成時、それを形成するための塗料組成物がめっき層23に接触した際、または塗膜形成後に塗膜24からリン酸化合物由来のリン酸イオンが溶出した際に、めっき層23表面のMg系酸化皮膜と反応し、めっき層23表面に難溶性のリン酸Mg系皮膜を形成する。これにより、耐白錆性を大幅に向上させることができる。リン酸化合物がリン酸イオンを放出しない、すなわち環境中で非溶解性の場合は、非溶解性のリン酸化合物が水、酸素等の腐食因子の移動を阻害することにより耐食性を向上する。
上記塗膜24は、更に着色顔料を含有することが、表面処理溶融めっき鋼材の意匠性を高める上で好適である。着色顔料の種類としては、特に限定はされず、例えば、二酸化チタン、カーボンブラック、グラファイト、酸化鉄、酸化鉛、コールダスト、タルク、カドミウムイエロー、カドミウムレッド、クロムイエロー等の着色無機顔料や、フタロシアニンブルー、フタロシアニングリーン、キナクリドン、ペリレン、アンスラピリミジン、カルバゾールバイオレット、アントラピリジン、アゾオレンジ、フラバンスロンイエロー、イソインドリンイエロー、アゾイエロー、インダスロンブルー、ジブロムアンザスロンレッド、ペリレンレッド、アゾレッド、アントラキノンレッド等の着色有機顔料や、アルミニウム粉、アルミナ粉、ブロンズ粉、銅粉、スズ粉、亜鉛粉、リン化鉄、金属コーティングマイカ粉、二酸化チタンコーティングマイカ粉、二酸化チタンコーティングガラス粉、二酸化チタンコーティングアルミナ粉等の光輝材などを挙げることができる。
上記塗膜24中には、必要に応じ、シリカ粒子、ポリオレフィン樹脂粒子、及び着色顔料のうちの少なくとも1種が、粒子状成分として存在することがある。
上記塗膜24の下層、すなわち、塗膜24とめっき鋼材との間には、更に下地処理層27を有することが好ましい。下地処理層27の組成は、特に限定されるものではないが、シランカップリング剤、及び有機樹脂から選ばれる少なくとも1種を含む下地処理層27を設けることで、塗膜24と基材であるめっき鋼材との密着性を更に高め、表面処理溶融めっき鋼材の耐食性や耐傷付き性を更に高めることができる。また、シランカップリング剤と有機樹脂の両者を含む下地処理層27を設けることで、シランカップリング剤と有機樹脂のいずれか一方を含む下地処理層27を設けた場合よりも、塗膜24と基材であるめっき鋼材との密着性を更に一層高めることができ、表面処理溶融めっき鋼材の耐食性や耐傷付き性を更に一層高めることができる。
本実施形態に係る表面処理溶融めっき鋼材は、鋼材1の表面上にアルミニウム・亜鉛合金めっきし、更にその上層に有機樹脂を造膜成分とする塗膜24を被覆することで製造される。
好ましい実施形態では、溶融めっき鋼材の製造時に、めっき層23の構成元素の組成と一致する組成を有する溶融めっき浴2が準備される。溶融めっき処理により鋼材1とめっき層23との間に合金層25が形成されるが、それによる組成の変動は無視し得るほどに小さい。
5.0×1022×t-10.0≦y≦7.0×1024×t-10.0 …(5)
(但し、150≦t≦250)
式(5)中のt(℃)は、前記保持時間y(hr)中における鋼板1aの温度(保持温度)であり、鋼板1aに温度変動が生じる場合にはその最低温度である。
本発明の各実施形態に係る表面処理溶融めっき鋼材は、上述した溶融めっき処理が施された鋼材1の上層に上述した塗膜24を形成することにより製造する。また、上述した下地処理層27を設ける場合には、上述した溶融めっき処理が施された鋼材1の上層に下地処理層27を形成し、この下地処理層27の表面に塗膜24を積層形成する。ここで、塗膜24と下地処理層27を形成する際には、下地処理層27を鋼材1上に塗布し乾燥焼付させた後に、塗膜24を下地処理層27上に塗布し、乾燥焼付させてもよい。また、塗膜形成用の塗料組成物と下地処理層形成用の塗料組成物とを、ウェットオンウェット又は多層同時塗布により基材鋼材1に塗布した後に、両塗料組成物を同時に乾燥焼付させてもよい。
塗膜24の形成方法としては、特に限定されないが、例えば、水系溶媒又は有機溶剤系溶媒中に有機樹脂を含有する塗料組成物をめっき鋼材上に塗布し、加熱乾燥することで形成することができる。水系溶媒を用いた塗料組成物(以後、水系塗料と略す。)を用いると、有機溶剤系溶媒を用いた塗料組成物(以後、有機溶剤系塗料と略す。)を使用するための塗装専用ラインを余分に通板する必要がなくなるため、製造コストを大幅に削減することが可能である上に、揮発性有機化合物(VOC)の排出も大幅に抑制できる等の環境面におけるメリットもあるため、水系塗料を用いることが好ましい。ここで、水系塗料において用いられる水系溶媒とは、水が溶媒の主成分である溶媒であることを意味する。溶媒中に占める水の量は50質量%以上であることが好ましい。水以外の溶媒は有機溶剤系溶媒でもよいが、労働安全衛生法の有機溶剤中毒予防規則で定義される有機溶剤含有物(労働安全衛生法施行令の別表第六の二に掲げられた有機溶剤を重量の5%を超えて含有するもの)には該当しないものであることがより好ましい。また、有機溶剤系溶媒とは、有機溶剤が溶媒の主成分である溶媒であることを意味する。
下地処理層27は、下地処理層27を形成するためのコーティング剤をめっき鋼材の少なくとも片面に塗布し、加熱乾燥することで形成される。コーティング剤の塗布方法に特に制限はないが、公知のロールコート、スプレー塗布、バーコート、浸漬、静電塗布等を適宜使用することができる。焼付乾燥方法に特に制限はなく、あらかじめめっき鋼材を加熱しておくか、塗布後にめっき鋼材を加熱するか、あるいはこれらを組み合わせて乾燥を行ってもよい。加熱方法に特に制限はなく、熱風、誘導加熱、近赤外線、直火等を単独又は組み合わせて使用することができる。焼付乾燥温度については、到達温度で60℃~150℃であることが好ましい。到達温度が60℃未満であると、乾燥が不十分で、塗膜24と基材めっき鋼材との密着性や表面処理溶融めっき鋼材の耐食性が低下することがあり、150℃超であると、塗膜24と基材めっき鋼材との密着性が低下することがある。より好ましい到達温度は70℃~130℃である。
まず、溶融めっき鋼板の作製方法、及びそれにより得られた溶融めっき鋼板の評価試験方法、試験結果について説明する。
鋼材1として厚み0.80mm、幅1000mmの長尺の鋼板1a(低炭素アルミニウムキルド鋼製)を用いた。この鋼板1aに対し、図1に示す溶融めっき処理装置を用いて、溶融めっき処理を施した。処理条件は表1~表3に示すとおりである。表1~表3に示される凝固開始温度は、Zn-Al二元系の浴の状態図の液相曲線から導き出した値であり、表1~表3に示す各溶融めっき浴組成におけるAlの含有量に対応する値である。なお、水準M68、M69では、鋼鈑1aに溶融めっき処理を施す前に、Niプレめっきを施すことで、水準M68では付着量(片面)0.5g/m2、水準M69では付着量(片面)2.0g/m2のプレめっき層26を形成した。水準M70では、Zn-10%Crプレめっき処理を施し、付着量(片面)1.0g/m2のプレめっき層26を形成した。他の実施例及び比較例ではプレめっき処理を施さなかった。
前記溶融めっき鋼板の作製で得られた溶融めっき鋼板について、次の評価試験をおこなった。
溶融めっき鋼板を厚み方向に切断してサンプルを得た。このサンプルを、その切断面が表出するように樹脂に埋め込んだ後、切断面を鏡面状に研磨した。この切断面を電子顕微鏡により観察したところ、この切断面には、めっき層23にSi-Mg相が分布している様子が明瞭に現れた。
上述の式(1)~(4)により、めっき層23における全Mg量に対するSi-Mg相中のMg量の質量比率(表4~表6中のMg量質量比率)を算出した。その結果を表4~表6に示す。
溶融めっき鋼板におけるめっき層23に含まれる成分の、深さ方向(めっき層23の厚み方向)の元素分析を、グロー放電発光分光分析(GD-OES:Glow Discharge - Optical Emission Spectroscopy)によりおこなった。測定にあたっては、測定領域の直径を4mm、出力を35W、測定雰囲気をArガス、測定圧力を600Pa、放電モードをノーマルスパッタ、Duty Cycle0.1、分析時間を80秒、サンプリング時間を0.02sec/pointとする条件で、めっき層23に含まれる元素の発光強度を測定した。得られた発光強度値を定量濃度値(質量%濃度)に換算する為、成分濃度が既知の7000系Al合金、鉄鋼材料等の標準試料の元素分析も別途おこなった。尚、通常、GD-OESデータは、発光強度のスパッタ時間に対する変化の形であるため、測定終了後のサンプルの断面観察によりスパッタ深さを測定し、このスパッタ深さを合計スパッタ時間で除することでスパッタ速度を算出し、GD-OES深さ方向プロファイルにおけるめっき層23の深さ位置を特定した。
表層Mg量評価の場合と同様にして、GD-OESにより、大きさが直径4mmで、めっき層最表面から深さ50nmとなる領域におけるCr発光強度の積分値を測定した。同様に、めっき層23全体のCr発光強度の積分値も測定し、更にこの値に対する、前記領域におけるCr発光強度の積分値の比を求めた。このCr発光強度の積分値の比と、ICPによるめっき層23全体のCr量の化学分析値とに基づいて、大きさが直径4mmで、めっき層最表面から深さ50nmとなる領域における、Crの含有量を算出した。その結果を表4~表6に示す。
めっき層23の表面を電子顕微鏡により観察した。水準M5について、めっき層23の表面を電子顕微鏡により撮影した写真を図6に示す。この観察結果によれば、めっき層23の表面にSi-Mg相が分布している様子が確認できる。この結果に基づいて、めっき層23の表面におけるSi-Mg相の面積を測定し、これに基づいて、めっき層表面におけるSi-Mg相の面積比率を算出した。その結果を表4~表6に示す。
溶融めっき鋼板を厚み方向に切断してサンプルを得た。このサンプルを、その切断面が表出するように樹脂に埋め込んだ後、切断面を鏡面状に研磨した。この切断面には、めっき層23と鋼板1aとの界面に介在する合金層25が現れた。この合金層25の厚みを測定した。さらに研磨面から収束イオンビーム装置により、研磨面の10μm×20μm部分をサンプリングし、50nm厚み以下に加工したマイクロサンプルを作製した。このマイクロサンプルについて、エネルギー分散型X線分析装置(EDS)を用い、加速電圧200kV、プローブ径1nmの条件で、合金層25内のCr濃度を定量分析した。
溶融めっき鋼板におけるめっき層23の表面の外観を目視及び光学顕微鏡により観察した。図7Aは水準M5におけるめっき層23の表面を撮影した写真を示す。図7Bは水準M10におけるめっき層23の表面を撮影した写真を示す。図8Aは水準M62におけるめっき層23の表面の光学顕微鏡写真を示す。図8Bは水準M5におけるめっき層23の表面の光学顕微鏡写真を示す。図9は水準M50におけるめっき層23の外観を撮影した写真を示す。
5:しわが認められない。
4:しわが軽微(図7Aに示される程度のしわ)。
3:しわが小程度(しわの程度が4と2の間程度の評価の場合)。
2:しわが中程度(図7Bに示されるよりは良好)。
1:しわが著しい(図7Bに示される程度のしわ)。
2:タレが認められない。
1:タレが認められる(図9に示される程度のタレ)。
2:めっき層23の表面に、凹凸を伴うドロスの付着がなく、或いは凹凸を伴うドロスの付着が1m2あたり5箇所未満認められる。
1:めっき層23の表面に、凹凸を伴うドロスの付着が1m2あたり5箇所以上認められる。
水準M5の溶融めっき鋼板のコイルに対し、保温温度t(℃)及び保温時間y(hr)を変化させて、過時効処理を施した。その結果を下記のように評価した。
3:コイルにめっき層間で凝着が生じず、且つ加工性が向上した。
2:コイルにめっき層間で凝着が生じないが、加工性は改善しない。
1:コイルにめっき層間で凝着が生じた。
5.0×1022×t-10.0≦y≦7.0×1024×t-10.0 …(5)
(但し、150≦t≦250)
続いて、表面処理溶融めっき鋼材の作製方法、及びそれにより得られた表面処理溶融めっき鋼板の評価試験方法、試験結果について説明する。
(2.1.1.下地処理層27)
下地処理層27を形成するためのコーティング剤は、表7に示す有機樹脂と、表8に示すシランカップリング剤と、表9に示すポリフェノール化合物と、表10に示すシリカ粒子と、表11に示すリン酸化合物と、表12に示すフルオロ錯化合物と、表13に示すバナジウム(IV)化合物とを、表14に示す配合量(固形分の質量%)で配合し、塗料用分散機を用いて攪拌することで調製した。次いで、前記溶融めっき鋼板の作製方法で作製した溶融めっき鋼板の表面に前記コーティング剤を100mg/m2の付着量になるようにロールコーターで塗装し、到達板温度70℃の条件で乾燥させることで、必要に応じて下地処理層27を形成させた。
塗膜24を形成するための塗料組成物は、表15に示す有機樹脂と、表16に示すシリカ粒子と、表17に示す潤滑剤と、表18に示すリン酸化合物と、表19に示す着色顔料と、表20に示す架橋剤とを、表21~29に示す配合量(固形分の質量%)で配合し、塗料用分散機を用いて攪拌することで調製した。前記(2.1.1)で形成した下地処理層27(下地処理層27がない場合は前記[1.1]で作製した溶融めっき鋼板)の上層に、上記塗料組成物を所定の膜厚になるようにロールコーターで塗装し、所定の到達板温度になるように加熱乾燥し、塗膜24を形成させることで表面処理溶融めっき鋼板を得た。前記表面処理溶融めっき鋼板の塗膜構成及び塗膜24の膜厚、到達板温度も表21~29に示す。
前記(2.1.2)で得た表面処理溶融めっき鋼板から、70mm×150mmサイズの試験片を切り出し、加工部耐食性、耐傷付き性、及び耐汚染性を下記に示す評価方法及び評価基準にて評価した。その評価結果を表30~38に示す。
前記試験片の中央部にエリクセン試験機(JIS Z 2247のA寸法に準拠)にて6mm押し出し加工したのち、端面をテープシールし、JIS Z 2371に準拠した塩水噴霧試験(Salt Spray Test)を24時間、72時間、及び120時間行い、エリクセン加工を施した部分の各々の試験時間における錆発生状況を観察し、下記の評価基準で評価した。
5:白錆発生面積が1%未満。
4:白錆発生面積が1%以上、5%未満。
3:白錆発生面積が5%以上、10%未満。
2:白錆発生面積が10%以上、30%未満。
1:白錆発生面積が30%以上。
前記試験片をラビングテスター(大平理化工業社製)に設置後、ラビングテスターの摺動冶具先端に前記試験片と平行になるように30mm×30mmの段ボール紙を取り付け、その段ボール紙を9.8N(1.0kgf)の荷重で5往復、及び10往復擦った後の皮膜状態を下記の評価基準で評価した。
5:擦り面に全く痕跡が認められない。
4:擦り面に極僅かに摺動傷が付く(目を凝らして何とか摺動傷が判別できるレベル)。
3:擦り面に僅かに摺動傷が付く(目を凝らすと容易に摺動傷が判別できるレベル)。
2:擦り面に明確な摺動傷が付く(瞬時に摺動傷が判別できるレベル)。
1:擦り面の皮膜が脱落し、下地の金属板が露出する。
前記試験片に指を押し付けることで指紋を付着させ、1時間常温で静置した後に脱脂綿で指紋を拭き取り、指紋の跡残りを下記の評価基準で評価した。
5:指紋跡が全くない。
4:指紋痕が極僅かに残る(目を凝らして何とか指紋跡が判別できるレベル)。
3:指紋痕が僅かに残る(目を凝らすと容易に指紋跡が判別できるレベル)。
2:指紋痕が残る(瞬時に指紋跡が判別できるが、指紋跡がない部位と色調は明確に変化がない)。
1:指紋痕がはっきり残る(瞬時に指紋跡が判別できて、指紋跡がない部位と色調も明確に変化がある)。
1a:鋼板
2:溶融めっき浴
3:繰出機
4:加熱炉
5:焼鈍・冷却部
6:スナウト
7:ポット
8:シンクロール
9:噴射ノズル
10:冷却装置
11:調質圧延・形状矯正装置
12:巻取機
13:コイル(第一のコイル)
14:コイル(第二のコイル)
15:搬送ロール
16:繰出機
17:巻取機
18:加熱炉
19:コイル
20:保温容器
21:搬送ロール
22:中空の部材
23:アルミニウム・亜鉛合金めっき層(めっき層)
24:塗膜
25:合金層
26:プレめっき層
27:下地処理層
28:被覆物
101:一次冷却装置
102:二次冷却装置
Claims (12)
- 鋼材と、
この鋼材の表面上の被覆物と、
を備え、
前記被覆物が、前記鋼材から近い順に、めっき層と、前記めっき層の表面上の有機樹脂を含む塗膜とを有し、
前記めっき層が構成元素としてAl、Zn、Si及びMgを含み、且つAl含有量が25~75質量%、Mg含有量が0.1~10質量%であり、
前記めっき層が0.2~15体積%のSi-Mg相を含み、
前記Si-Mg相中のMgの、前記めっき層中のMg全量に対する質量比率が3%以上100%以下であり、
前記有機樹脂が、シランカップリング剤、架橋性ジルコニウム化合物、架橋性チタン化合物、エポキシ化合物、アミノ樹脂から選ばれる少なくとも1種によって架橋されている
ことを特徴とする表面処理溶融めっき鋼材。 - 前記めっき層における表面より50nm深さの最外層内で、大きさが直径4mm、深さ50nmとなるいかなる領域においても、Mg含有量が0質量%以上60質量%未満である
ことを特徴とする請求項1に記載の表面処理溶融めっき鋼材。 - 前記めっき層が構成元素として更に0.02~1.0質量%のCrを含む
ことを特徴とする請求項1又は2に記載の表面処理溶融めっき鋼材。 - 前記塗膜の膜厚が0.1~10μmである
ことを特徴とする請求項1~3のいずれか1項に記載の表面処理溶融めっき鋼材。 - 前記塗膜が更にシリカ粒子を含有する
ことを特徴とする請求項1~4のいずれか1項に記載の表面処理溶融めっき鋼材。 - 前記有機樹脂をA、前記シリカ粒子をBとして、固形分質量比A/Bが2~20である
ことを特徴とする請求項5に記載の表面処理溶融めっき鋼材。 - 前記シリカ粒子が平均粒子径5~20nmの球状シリカ粒子と平均粒子径0.08~2μmの球状シリカ粒子を含有する
ことを特徴とする請求項5又は6に記載の表面処理溶融めっき鋼材。 - 前記塗膜が更に潤滑剤を含有する
ことを特徴とする請求項1~7のいずれか1項に記載の表面処理溶融めっき鋼材。 - 前記塗膜が更にリン酸化合物を含有する
ことを特徴とする請求項1~8のいずれか1項に記載の表面処理溶融めっき鋼材。 - 前記塗膜が更に着色顔料を含有する
ことを特徴とする請求項1~9のいずれか1項に記載の表面処理溶融めっき鋼材。 - 前記塗膜の下層に有機樹脂とシランカップリング剤に起因する成分を含有する下地処理層を有する
ことを特徴とする請求項1~10のいずれか1項に記載の表面処理溶融めっき鋼材。 - 前記有機樹脂と前記めっき層とが、シランカップリング剤、架橋性ジルコニウム化合物、架橋性チタン化合物、エポキシ化合物、アミノ樹脂から選ばれる少なくとも1種によって架橋されている
ことを特徴とする請求項1~11のいずれか1項に記載の表面処理溶融めっき鋼材。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013509758A JP5408385B2 (ja) | 2011-08-24 | 2012-08-24 | 表面処理溶融めっき鋼材 |
CN201280040813.2A CN103748253B (zh) | 2011-08-24 | 2012-08-24 | 表面处理热浸镀钢材 |
KR1020147005873A KR20140053277A (ko) | 2011-08-24 | 2012-08-24 | 표면 처리 용융 도금 강재 |
KR1020157016640A KR101807927B1 (ko) | 2011-08-24 | 2012-08-24 | 표면 처리 용융 도금 강재 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011-182916 | 2011-08-24 | ||
JP2011182916 | 2011-08-24 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2013027827A1 true WO2013027827A1 (ja) | 2013-02-28 |
Family
ID=47746562
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2012/071444 WO2013027827A1 (ja) | 2011-08-24 | 2012-08-24 | 表面処理溶融めっき鋼材 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5408385B2 (ja) |
KR (2) | KR20140053277A (ja) |
CN (1) | CN103748253B (ja) |
MY (1) | MY166355A (ja) |
WO (1) | WO2013027827A1 (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017193753A (ja) * | 2016-04-20 | 2017-10-26 | 新日鐵住金株式会社 | 熱処理用鋼管、熱処理鋼管の製造方法及び熱処理鋼管 |
EP3354772A4 (en) * | 2016-04-26 | 2019-09-25 | Nippon Steel & Sumikin Coated Sheet Corporation | TREATED SURFACE STEEL |
JP2022077158A (ja) * | 2020-11-11 | 2022-05-23 | Jfe鋼板株式会社 | 材質安定性に優れた溶融亜鉛系めっき鋼板の製造方法 |
WO2022153694A1 (ja) * | 2021-01-18 | 2022-07-21 | 日本製鉄株式会社 | めっき鋼材 |
JP7475162B2 (ja) | 2019-03-01 | 2024-04-26 | Jfe鋼板株式会社 | 塗装鋼板及び塗装鋼板の製造方法 |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5527293B2 (ja) * | 2011-08-24 | 2014-06-18 | 新日鐵住金株式会社 | 表面処理溶融めっき鋼材 |
US10392686B2 (en) * | 2015-09-29 | 2019-08-27 | Nippon Steel Corporation | Mg-containing Zn alloy coated steel |
CN106435439A (zh) * | 2016-10-31 | 2017-02-22 | 北京卫星制造厂 | 一种镁合金表面高耐蚀性热喷涂涂层的制备方法 |
CN108118218B (zh) * | 2016-11-30 | 2019-07-23 | 宝山钢铁股份有限公司 | 一种抗切口腐蚀性能优良的热浸镀层钢板及其制造方法 |
WO2019186645A1 (ja) * | 2018-03-26 | 2019-10-03 | 日新製鋼株式会社 | 溶融Al系めっき鋼板の製造方法、および溶融Al系めっき鋼板 |
JP6680412B1 (ja) * | 2018-05-25 | 2020-04-15 | 日本製鉄株式会社 | 表面処理鋼板 |
KR102196211B1 (ko) | 2019-02-20 | 2020-12-30 | 포스코강판 주식회사 | 내융착성이 우수한 도금강판 및 그 제조방법 |
CN111206198A (zh) * | 2020-01-07 | 2020-05-29 | 江苏中超航宇精铸科技有限公司 | 一种储存精铸用蜡料的金属容器的制造方法 |
CN111560607B (zh) * | 2020-06-24 | 2022-08-09 | 攀钢集团攀枝花钢铁研究院有限公司 | 热镀锌铝镁钢板表面处理液及热镀锌铝镁无铬钝化板的制备方法 |
CN112176329A (zh) * | 2020-08-10 | 2021-01-05 | 唐山钢铁集团有限责任公司 | 一种用于锌铝镁镀层产品的表面钝化剂及涂覆的生产方法 |
KR102626695B1 (ko) * | 2020-10-20 | 2024-01-22 | 닛폰세이테츠 가부시키가이샤 | Zn계 도금 강판 |
CN113174554B (zh) * | 2021-04-02 | 2023-01-03 | 酒泉钢铁(集团)有限责任公司 | 一种铁基非晶纳米晶复合聚磁介质棒及其制备方法 |
CN113403561A (zh) * | 2021-04-30 | 2021-09-17 | 郑慧彬 | 一种紧固件表面处理镀锌设备 |
CN116219271B (zh) * | 2022-07-22 | 2024-01-09 | 宝山钢铁股份有限公司 | 一种铝硅镀层钢板、热成形部件及其制造方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000328216A (ja) * | 1999-03-15 | 2000-11-28 | Nippon Steel Corp | 高耐食性めっき鋼板 |
JP2001131725A (ja) * | 1999-11-08 | 2001-05-15 | Nippon Steel Corp | 耐熱性、耐食性に優れた溶融アルミめっき鋼板及びその製造法 |
JP2001323357A (ja) * | 2000-03-10 | 2001-11-22 | Nippon Steel Corp | 外観に優れた高耐食性Al系めっき鋼板 |
JP2004339530A (ja) * | 2003-05-13 | 2004-12-02 | Nippon Steel Corp | 加工性に優れたMg含有めっき鋼材およびその製造方法 |
JP2006036835A (ja) * | 2004-07-23 | 2006-02-09 | Jsr Corp | 硬化性樹脂組成物及び反射防止膜 |
JP2006052462A (ja) * | 2004-07-07 | 2006-02-23 | Nippon Steel Corp | 加工部耐食性に優れる表面処理めっき鋼板 |
JP2010229483A (ja) * | 2009-03-26 | 2010-10-14 | Nisshin Steel Co Ltd | 耐食性に優れたZn−Al系めっき鋼板およびその製造方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6465114B1 (en) * | 1999-05-24 | 2002-10-15 | Nippon Steel Corporation | -Zn coated steel material, ZN coated steel sheet and painted steel sheet excellent in corrosion resistance, and method of producing the same |
JP2001089868A (ja) * | 1999-07-16 | 2001-04-03 | Nippon Steel Corp | プレコート金属板用下地処理剤、それを塗布した塗装下地処理金属板、及びそれを使用した塗膜の加工密着性に優れるプレコート金属板 |
JP4136286B2 (ja) * | 1999-08-09 | 2008-08-20 | 新日本製鐵株式会社 | 耐食性に優れたZn−Al−Mg−Si合金めっき鋼材およびその製造方法 |
JP4629984B2 (ja) * | 2004-03-01 | 2011-02-09 | 日本ペイント株式会社 | 鋼材用水性被覆剤、被覆方法及び被覆鋼材 |
-
2012
- 2012-08-24 CN CN201280040813.2A patent/CN103748253B/zh active Active
- 2012-08-24 MY MYPI2014700349A patent/MY166355A/en unknown
- 2012-08-24 WO PCT/JP2012/071444 patent/WO2013027827A1/ja active Application Filing
- 2012-08-24 KR KR1020147005873A patent/KR20140053277A/ko not_active Application Discontinuation
- 2012-08-24 JP JP2013509758A patent/JP5408385B2/ja active Active
- 2012-08-24 KR KR1020157016640A patent/KR101807927B1/ko active IP Right Grant
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000328216A (ja) * | 1999-03-15 | 2000-11-28 | Nippon Steel Corp | 高耐食性めっき鋼板 |
JP2001131725A (ja) * | 1999-11-08 | 2001-05-15 | Nippon Steel Corp | 耐熱性、耐食性に優れた溶融アルミめっき鋼板及びその製造法 |
JP2001323357A (ja) * | 2000-03-10 | 2001-11-22 | Nippon Steel Corp | 外観に優れた高耐食性Al系めっき鋼板 |
JP2004339530A (ja) * | 2003-05-13 | 2004-12-02 | Nippon Steel Corp | 加工性に優れたMg含有めっき鋼材およびその製造方法 |
JP2006052462A (ja) * | 2004-07-07 | 2006-02-23 | Nippon Steel Corp | 加工部耐食性に優れる表面処理めっき鋼板 |
JP2006036835A (ja) * | 2004-07-23 | 2006-02-09 | Jsr Corp | 硬化性樹脂組成物及び反射防止膜 |
JP2010229483A (ja) * | 2009-03-26 | 2010-10-14 | Nisshin Steel Co Ltd | 耐食性に優れたZn−Al系めっき鋼板およびその製造方法 |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017193753A (ja) * | 2016-04-20 | 2017-10-26 | 新日鐵住金株式会社 | 熱処理用鋼管、熱処理鋼管の製造方法及び熱処理鋼管 |
EP3354772A4 (en) * | 2016-04-26 | 2019-09-25 | Nippon Steel & Sumikin Coated Sheet Corporation | TREATED SURFACE STEEL |
US11136659B2 (en) | 2016-04-26 | 2021-10-05 | Nippon Steel Coated Sheet Corporation | Surface-treated steel material |
JP7475162B2 (ja) | 2019-03-01 | 2024-04-26 | Jfe鋼板株式会社 | 塗装鋼板及び塗装鋼板の製造方法 |
JP2022077158A (ja) * | 2020-11-11 | 2022-05-23 | Jfe鋼板株式会社 | 材質安定性に優れた溶融亜鉛系めっき鋼板の製造方法 |
JP7315522B2 (ja) | 2020-11-11 | 2023-07-26 | Jfe鋼板株式会社 | 材質安定性に優れた溶融亜鉛系めっき鋼板の製造方法 |
WO2022153694A1 (ja) * | 2021-01-18 | 2022-07-21 | 日本製鉄株式会社 | めっき鋼材 |
JP7156573B1 (ja) * | 2021-01-18 | 2022-10-19 | 日本製鉄株式会社 | めっき鋼材 |
KR20230116070A (ko) * | 2021-01-18 | 2023-08-03 | 닛폰세이테츠 가부시키가이샤 | 도금 강재 |
KR102639488B1 (ko) | 2021-01-18 | 2024-02-23 | 닛폰세이테츠 가부시키가이샤 | 도금 강재 |
Also Published As
Publication number | Publication date |
---|---|
JP5408385B2 (ja) | 2014-02-05 |
CN103748253B (zh) | 2015-06-03 |
MY166355A (en) | 2018-06-25 |
KR101807927B1 (ko) | 2017-12-11 |
JPWO2013027827A1 (ja) | 2015-03-19 |
CN103748253A (zh) | 2014-04-23 |
KR20140053277A (ko) | 2014-05-07 |
KR20150080014A (ko) | 2015-07-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2013027827A1 (ja) | 表面処理溶融めっき鋼材 | |
JP6087461B1 (ja) | 表面処理鋼材 | |
JP5408384B2 (ja) | 塗装めっき鋼材 | |
WO2011102434A1 (ja) | 溶融めっき鋼材及びその製造方法 | |
JPWO2012029977A1 (ja) | クロメートフリー塗装金属板 | |
CN114502673B (zh) | 表面处理溶液组合物、利用其进行表面处理的三元系热浸镀锌合金钢板及其制造方法 | |
JP5527293B2 (ja) | 表面処理溶融めっき鋼材 | |
JP5751093B2 (ja) | 表面処理溶融めっき鋼材 | |
KR101249583B1 (ko) | 내식성이 우수한 크로메이트-프리 피복 용융 아연 도금 강판 | |
WO2021065485A1 (ja) | 表面処理鋼材 | |
KR102407717B1 (ko) | 삼원계 용융아연합금 도금강판용 표면처리 조성물, 이를 이용하여 표면처리된 삼원계 용융아연합금도금 강판 및 이의 제조방법 | |
JP7082004B2 (ja) | 塗装金属板 | |
EP4265818A1 (en) | Composite plated steel sheet having excellent post-formation corrosion resistance, and manufacturing method therefor | |
KR102385548B1 (ko) | 삼원계 용융아연합금 도금강판용 표면처리 조성물, 이를 이용하여 표면처리된 삼원계 용융아연합금도금 강판 및 이의 제조방법 | |
JP6772943B2 (ja) | 塗装鋼板 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ENP | Entry into the national phase |
Ref document number: 2013509758 Country of ref document: JP Kind code of ref document: A |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 12825938 Country of ref document: EP Kind code of ref document: A1 |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
ENP | Entry into the national phase |
Ref document number: 20147005873 Country of ref document: KR Kind code of ref document: A |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 12825938 Country of ref document: EP Kind code of ref document: A1 |