WO2012141317A1 - Iii族窒化物結晶の製造方法およびiii族窒化物結晶 - Google Patents

Iii族窒化物結晶の製造方法およびiii族窒化物結晶 Download PDF

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WO2012141317A1
WO2012141317A1 PCT/JP2012/060187 JP2012060187W WO2012141317A1 WO 2012141317 A1 WO2012141317 A1 WO 2012141317A1 JP 2012060187 W JP2012060187 W JP 2012060187W WO 2012141317 A1 WO2012141317 A1 WO 2012141317A1
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group iii
iii nitride
crystal
nitride crystal
plane
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English (en)
French (fr)
Japanese (ja)
Inventor
創 松本
訓任 洲崎
健史 藤戸
哲 長尾
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Mitsubishi Chemical Corp
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Mitsubishi Chemical Corp
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Priority to CN201280018140.0A priority Critical patent/CN103502514A/zh
Priority to EP12771993.8A priority patent/EP2698456B1/en
Priority to KR1020137026845A priority patent/KR101882541B1/ko
Publication of WO2012141317A1 publication Critical patent/WO2012141317A1/ja
Priority to US14/054,036 priority patent/US9502241B2/en
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    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
    • C30B29/403—AIII-nitrides
    • C30B29/406—Gallium nitride
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02538—Group 13/15 materials
    • H01L21/0254—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/38—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
    • C30B33/02—Heat treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/85—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group III-V materials, e.g. GaAs
    • H10D62/8503—Nitride Group III-V materials, e.g. AlN or GaN

Definitions

  • the present invention relates to a group III nitride crystal excellent in workability and crystal quality and a method for producing a group III nitride crystal having such characteristics.
  • Group III nitride crystals are variously used as substrates for light-emitting elements such as light-emitting diodes (LEDs) and semiconductor lasers (LDs).
  • LEDs light-emitting diodes
  • LDs semiconductor lasers
  • GaN crystals are useful as substrates for blue light emitting devices such as blue light emitting diodes and blue semiconductor lasers, and active research has been conducted.
  • a group III nitride crystal it is necessary to process the grown group III nitride crystal into the shape of the substrate. For example, when manufacturing a disk-shaped substrate, the outer periphery of the grown group III nitride crystal is polished with a crystal grindstone or the like to have a circular cross section. In addition, slicing is frequently performed to obtain a desired size.
  • the group III nitride crystal it has been known that residual stress is generated inside the crystal as the crystal grows, and as a result, the crystal is warped.
  • a group III nitride crystal grown on a heterogeneous substrate is separated from the heterogeneous substrate, warping may be noticeable. Therefore, it has been proposed to perform heat treatment in order to reduce such warpage (see Patent Document 1).
  • warpage is reduced by reducing the difference in dislocation density between the substrate side surface of the group III nitride crystal and its opposite surface by heat treatment.
  • the GaN layer is heat-treated at 1200 ° C. for 24 hours, heat-treated at 1400 ° C. for 10 minutes, or heat-treated at 1600 ° C. for 2 hours.
  • Patent Document 1 describes means for reducing warpage, nothing is described about the basal plane dislocation to which the present invention is focused, and the inventors described in Patent Document 1 As a result of examining the means, it has become clear that none of them has sufficiently solved the problems of damage and cracking during peripheral processing and slicing. It was also found that there is still a need for improvement in terms of crystal quality. In view of such problems of the prior art, the present inventors have intensively studied to provide a group III nitride crystal having excellent workability and high quality and a method for producing the same.
  • the present inventors have found that controlling the basal plane dislocation of the crystal to a preferable state is extremely important for solving the problem.
  • the group III nitride crystal is heat-treated under conditions different from the conventional one, it becomes possible to control the dislocation of the group III nitride crystal to a preferable state, thereby weakening the periphery of the crystal. This has led to an epoch-making result that the problems caused by the residual stress distributed over the entire crystal substrate can be solved at once.
  • a group III nitride crystal in which the dislocation distribution state is different from the conventional one and the crystal quality is extremely excellent can be provided.
  • the present invention has been made based on these findings, and the contents thereof are as shown below.
  • a method for producing a group III nitride crystal comprising the following steps (1) and (2): (1) A film forming step of forming a film made of an oxide, a hydroxide and / or an oxyhydroxide containing a group III element by heat-treating the group III nitride single crystal at 1000 ° C. or higher. (2) A film removing step for removing the film. [2] The method for producing a group III nitride crystal according to [1], wherein the film is formed directly on the single crystal. [3] The method for producing a group III nitride crystal according to [1] or [2], wherein the heat treatment is performed in the presence of an oxygen source.
  • a group III nitride crystal comprising a dislocation aggregate in which basal plane dislocations are arranged at intervals of 50 to 500 nm on the M plane, and the maximum length of the dislocation aggregate is 5 ⁇ m or more.
  • the dislocation accumulation degree (A / B) represented by the ratio of the number density of dislocation aggregates (A) and the number density of isolated dislocations (B) in the M plane is 1% or more.
  • ⁇ d / d (ave) [d (max) ⁇ d (min)] / d (ave)
  • d (max), d (min) and d (ave) are the maximum value, the minimum value when the lattice spacing of crystal planes perpendicular to the epitaxial growth direction is measured along the growth direction, And mean value.
  • the group III nitride crystal of the present invention is excellent in workability and high quality.
  • the group III nitride crystal of the present invention alleviates the problem of the fragility of the outer periphery of the crystal and the residual stress distributed over the entire crystal substrate, as seen in conventional group III nitride crystals. According to the production method of the present invention, a group III nitride crystal having such characteristics can be produced easily.
  • a GaN crystal may be described as a representative example of a group III nitride crystal, but the present invention is not limited to the GaN crystal and the manufacturing method thereof.
  • a numerical range represented by using “to” means a range including numerical values described before and after “to” as a lower limit value and an upper limit value.
  • the “C plane” is a plane equivalent to the ⁇ 0001 ⁇ plane in the hexagonal crystal structure (wurtzite type crystal structure).
  • the C plane is a group III plane, and in gallium nitride, it corresponds to the Ga plane.
  • the “M plane” is a plane comprehensively represented as a ⁇ 1-100 ⁇ plane, specifically, a (1-100) plane, a (01-10) plane, ( ⁇ 1010) plane, ( ⁇ 1100) plane, (0-110) plane, and (10-10) plane.
  • the “A plane” is a plane comprehensively represented as a ⁇ 2-1-10 ⁇ plane, specifically, a (2-1-10) plane, (-12-10) ) Plane, ( ⁇ 1-120) plane, ( ⁇ 2110) plane, (1-210) plane, and (11-20) plane.
  • the method for producing a group III nitride crystal of the present invention includes the following steps (1) and (2).
  • the manufacturing method of the present invention includes the step of performing the film removal step of (2) after performing the step of film formation of (1), and includes the steps of (1) and (2). The including step may be repeated. Further, steps other than (1) and (2) may be included before the step (1), between the steps (1) and (2), and after the step (2).
  • a film removing step for removing the film is
  • the group III nitride single crystal is heat-treated under such a condition that a film made of an oxide, hydroxide and / or oxyhydroxide containing a group III element is formed. I do.
  • the group III nitride single crystal used in the film forming step is a single crystal made of the same type of group III nitride as the group III nitride crystal to be produced in the present invention. For example, when a GaN crystal is to be manufactured, a GaN single crystal is used.
  • the group III nitride single crystal used in the film forming step single crystals grown by various growth methods can be used.
  • any known crystal growth method may be applied, and examples thereof include HVPE method, MOCVD method, flux method, and ammonothermal method.
  • a group III nitride single crystal grown by the HVPE method can be preferably used with a group III nitride single crystal grown on a different substrate such as sapphire as a base substrate.
  • the details of the HVPE method employed here are not particularly limited, and for example, conditions described in Examples described later can be referred to.
  • the temperature of the heat treatment is 1000 ° C. or higher.
  • the heat treatment temperature should be determined in relation to the heat treatment time.
  • the heat treatment temperature is preferably 1100 ° C. or higher, more preferably 1200 ° C. or higher, and further preferably 1300 ° C. or higher.
  • the upper limit of the heat treatment temperature is preferably 2500 ° C. or less, more preferably 2220 ° C. or less, further preferably 1600 ° C. or less, and further preferably 1400 ° C. or less.
  • the heat treatment time is preferably shortened when the heat treatment temperature is high, and is long when the heat treatment temperature is low.
  • the heat treatment time is preferably 15 minutes or longer, more preferably 30 minutes or longer, and even more preferably 1 hour or longer.
  • the upper limit of the heat treatment time is preferably 200 hours or less, more preferably 100 hours or less, and even more preferably 24 hours or less.
  • the heat treatment is preferably 0.25 to 24 hours, more preferably 1.0 to 10 hours.
  • the heat treatment is preferably performed for 1.0 to 200 hours, more preferably for 24 to 100 hours. From the viewpoint of sufficiently promoting film formation, when a heat treatment temperature in the range of 1150 to 1250 ° C. is adopted, the heat treatment is preferably 100 to 1000 hours, more preferably 200 to 500 hours.
  • the GaN layer is heat-treated at 1200 ° C. for 24 hours.
  • the group III nitride single crystal contains a group III element, an oxide, a hydroxide, and A film made of oxyhydroxide is not formed.
  • a GaN substrate on which SiO 2 is formed by CVD is heat-treated at 1600 ° C. for 2 hours in an atmospheric environment. When the temperature was raised to 1400 ° C.
  • Cited Document 1 includes the film forming process of the present invention. Does not suggest any.
  • the temperature lowering temperature of the group III nitride single crystal after the heat treatment is usually set to 100 ° C./hour or more, preferably 1000 ° C./hour or more, and preferably 3000 ° C./hour or more. More preferred.
  • ice water can be used for rapid cooling at a rate of 1 ⁇ 10 6 ° C./hour or more. The rate of temperature increase or the rate of temperature decrease may be kept constant or may be changed with time.
  • the heat treatment in the present invention may be performed under high pressure.
  • the pressure when carried out under high pressure is preferably 1 MPa or more, more preferably 10 MPa or more, and further preferably 5 GPa or more.
  • the pressure may be kept constant during the heat treatment or may be varied. Preferred is when it is kept constant.
  • the pressurization may be performed on the entire crystal or only on a part of the crystal. Further, the degree of pressurization may be changed depending on the crystal portion. For example, the pressurizing condition may be changed between the central portion and the outer peripheral portion. Since the degree of penetration of light elements by heat treatment of the part can be adjusted by partially changing the pressing condition, the pressing condition can be determined for each region according to the dislocation density of the crystal, for example. .
  • pressure may be applied after the heat treatment.
  • the film removal process described later may be performed after pressurization after the heat treatment, or may be performed after the film removal process has been performed, or the crystal after the heat treatment and the crystal after the film removal may be stacked and pressurized. Also good.
  • the kind of the atmospheric gas during the heat treatment is particularly Not limited.
  • the atmospheric gas include ammonia (NH 3 ), nitrogen (N 2 ), and a mixed gas thereof.
  • the ammonia (NH 3 ) concentration or nitrogen (N 2 ) concentration in the atmosphere is not particularly limited, but ammonia (NH 3 ) is usually 0.5% or more, preferably 1% or more, more preferably 5% or more, Usually, it is 50% or less, preferably 25% or less, more preferably 10% or less.
  • the N 2 concentration is usually 50% or more, preferably 75% or more, more preferably 90% or more, and usually 99.5% or less, preferably 99% or less, more preferably 95% or less.
  • the heat treatment in the present invention may be performed in a closed system or a distribution system, but is preferably performed in a distribution system.
  • the flow rate is usually 50 ml / min or more, preferably 150 ml / min or more, more preferably 180 ml / min or more, and usually 500 ml / min or less. It is preferably 300 ml / min or less, more preferably 250 ml / min or less.
  • the heat treatment in the present invention is also preferably performed in the presence of an oxygen source.
  • the oxygen source here means a material that supplies oxygen atoms used for film formation during heat treatment. For example, when a film containing a group III oxide, group III hydroxide, or oxyhydroxide is formed, oxygen atoms constituting the group III oxide, group III hydroxide, or oxyhydroxide are changed. Refers to the material to be supplied.
  • the oxygen source may be supplied as a gas containing oxygen atoms, or may be supplied by generating a compound containing oxygen atoms by reaction. Examples of the gas containing oxygen atoms include oxygen molecules, water molecules, carbon dioxide molecules, and carbon monoxide molecules.
  • the concentration of the gas containing oxygen atoms or the compound containing oxygen atoms in the atmosphere is not particularly limited, but in the case of water molecules, it is usually 0.1% or more, preferably 0.5% or more, more preferably 1.0% or more. It is usually 30% or less, preferably 20% or less, more preferably 10% or less.
  • generates a water molecular gas can be mentioned, for example.
  • Other examples of the material constituting the inner wall of the reaction vessel include silica, zirconia, titania, and a sintered body containing at least one of these.
  • the surface of the substrate holder or the like installed in the reaction vessel is made of alumina or an aspect in which an alumina rod or alumina powder is installed in the reaction vessel is also adopted.
  • the shape of the reaction vessel is not particularly limited, and examples thereof include a cylindrical vessel, and examples thereof include a cylindrical alumina tube.
  • the group III nitride single crystal to be heat-treated can be placed vertically or horizontally while stacking or arranging a plurality of crystals.
  • the surface of the group III nitride single crystal so as not to be in surface contact with the reaction vessel or the like.
  • a cylindrical container By using a cylindrical container, it is easy to prevent the surface contact between the group III nitride single crystal and the reaction container, and it is possible to easily distribute the atmospheric gas over the entire surface.
  • a film made of an oxide, a hydroxide and / or an oxyhydroxide containing a group III element was formed on a group III nitride single crystal by the film forming process of the present invention. It can be easily confirmed by analyzing the cleaning solution after washing with nitric acid.
  • the film made of an oxide, hydroxide and / or oxyhydroxide containing a group III element include a group III oxide, a group III hydroxide or an oxyhydroxide. It may be a mixture of Specifically, when the group III element is Ga, gallium oxide and gallium oxyhydroxide can be exemplified.
  • a film in which gallium metal, gallium oxide and gallium oxyhydroxide are usually mixed is formed, and the outermost surface becomes black, so that the film formation can be visually confirmed.
  • “Forming a film made of an oxide, hydroxide and / or oxyhydroxide containing a group III element” means “an oxide, hydroxide and / or oxywater containing a group III element” It is intended to form a film made of an oxide as a main component, and does not eliminate a film containing impurities mixed in the manufacturing process or by-produced gallium metal. Absent.
  • the amount of the oxide, hydroxide and / or oxyhydroxide containing the above-mentioned group III element constituting the coating can be determined from the weight reduction ratio before and after acid cleaning, and from the amount of coating formed Can take into account the movement of dislocations inside the crystal.
  • the weight reduction ratio when using a substrate having a diameter of 63 mm ⁇ is preferably 3% to 15%. Overall, the weight reduction ratio is closely related to the specific surface area, but there is an ideal range regardless of the size and shape, and the lower limit is preferably 1% or more from the viewpoint of sufficiently forming a film, and 2% or more is further Good, 2.5% or more is particularly good.
  • the upper limit is limited because there are fewer crystals to produce, and is preferably 60% or less, more preferably 35% or less, and particularly preferably 25% or less.
  • a film comprising an oxide, hydroxide and / or oxyhydroxide containing a group III element may be formed directly on the group III nitride single crystal, or an intermediate layer on the group III nitride single crystal. However, it may be formed directly on the group III nitride single crystal because the effect of the present invention is more remarkable.
  • the film formed in the film formation process is removed.
  • the coating removal method include a method of immersing crystals in an acid solution and a mechanical polishing method.
  • a method of immersing crystals in an acid solution or a mixed acid solution is preferable because of its excellent efficiency and simplicity.
  • Nitric acid is suitable as the acid species used for immersing the crystal, and sulfuric acid and hydrochloric acid are also exemplified.
  • the concentration is preferably 10% or more, and more preferably 30% or more. If a high-concentration acid solution or mixed acid solution is used, the film removal tends to be efficient.
  • the film removal step using an acid solution or a mixed acid solution is preferably performed while heating. Specifically, it is preferably performed at 60 ° C. or higher, and more preferably at 80 ° C. or higher.
  • the removal of the film in the film removal step may not be to completely remove the film made of an oxide, hydroxide and / or oxyhydroxide containing a group III element formed in the film formation step.
  • an oxide, hydroxide and / or oxyhydroxide containing a group III element may remain on the crystal surface after the film removal step is performed, or the film containing these is completely removed. Also good.
  • the film made of an oxide, hydroxide and / or oxyhydroxide containing a group III element is removed and the oxide, hydroxide and / or oxyx containing a group III element. It may be one that removes components other than hydroxides, and is preferably one that removes at least group III metal, and particularly one that removes gallium metal.
  • Group III metal can be removed by immersion in the above acid solution or mixed acid solution.
  • the film removal step in the present invention may be performed immediately after performing the film formation step, may be performed after a certain time, or may be performed after performing other steps. Examples of other processes include roughing with a polishing machine, slicing process described later, and peripheral processing.
  • the group III nitride crystal of the present invention is characterized in that dislocation aggregates in which basal plane dislocations are arranged at intervals of 50 nm to 500 nm are included in the M plane, and the maximum length of the dislocation aggregates is 5 ⁇ m or more.
  • the basal plane dislocation as referred to in the present invention is different from threading dislocation which is widely known in GaN crystals and the like.
  • the threading dislocation is a considerable number of dislocations of about 10 9 / cm 2 generated in the GaN crystal because the lattice constant is greatly different when a GaN crystal is vapor-phase grown on a different substrate such as a sapphire substrate.
  • the basal plane dislocation referred to in the present invention is a dislocation introduced when a slip occurs on the bottom surface due to stress induction, and the propagation direction is parallel to the basal plane (0001) plane of GaN.
  • the inventors of the present invention have grasped a form that is transmitted while drawing an arc on the basal plane by SEM-CL observation and transmission electron microscope observation.
  • the dislocation aggregate referred to in the present invention is a structure in which basal plane dislocations are arranged at intervals of 50 nm to 500 nm.
  • dislocation aggregates in which basal plane dislocations are arranged in parallel at such narrow intervals have not been observed over a range of 5 ⁇ m or more.
  • the dislocation aggregates observed in the group III nitride crystal of the present invention preferably have 10 or more basal plane dislocations arranged in parallel, more preferably 100 or more in parallel, and 1000 or more in parallel. It is more preferable that they are lined up.
  • the maximum length of the dislocation aggregate is preferably 5 ⁇ m or more, more preferably 10 ⁇ m or more, and further preferably 50 ⁇ m or more.
  • the maximum length is preferably 400 ⁇ m or less, more preferably 200 ⁇ m or less, and further preferably 100 ⁇ m or less.
  • the number density of dislocation aggregates in the group III nitride crystal of the present invention is preferably 5 ⁇ 10 3 pieces / cm 2 or more, more preferably 8 ⁇ 10 3 pieces / cm 2 or more, and 1 ⁇ More preferably, it is 10 4 pieces / cm 2 or more.
  • the plane for measuring the number density of dislocation aggregates in the present invention is the M plane.
  • a group III nitride single crystal is heat-treated at 1000 ° C. or higher to form a film made of an oxide, hydroxide and / or oxyhydroxide containing a group III element.
  • dislocations isolated in the center isolated dislocations: isolated dislocations not forming dislocation aggregates
  • many dislocation aggregates satisfying the above conditions are observed at the center of the crystal.
  • the number of dislocation aggregates in the center can be increased 2 to 10 times by heat-treating a group III nitride crystal such as a GaN crystal according to the production method of the present invention.
  • the dislocation accumulation degree (A / B) represented by the ratio of the number density of dislocation aggregates (A) and the number density of isolated dislocations (B) observed in the M plane is preferably 1% or more. Yes, more preferably 2% or more, still more preferably 3% or more.
  • the residual stress existing over the entire crystal is reduced, and it is difficult for relatively large cracks to be generated due to damage such as small cracks generated in the outer peripheral portion having low brittleness.
  • Such aggregation of basal plane dislocations is considered to be the result of the basal plane dislocations exhibiting the most stable arrangement in the form of assisting the driving force that reduces the residual stress inside the crystal. It should be noted that the accumulation of isolated dislocations in the same plane means that the isolated dislocations are collected in the same plane as in the result of observation by a cathodoluminescence scanning electron microscope in Example 11 shown in FIG.
  • a fragile region in the outer peripheral portion of the crystal can be easily removed in addition to the above effects. Without being bound by any theory, this is because the oxygen, nitrogen, carbon, hydrogen or molecules of these are introduced into gaps where the dislocation cores have broken atomic bonds, and thereby the wurtzite crystal structure around the dislocations. This is thought to be due to the loss of integrity. As a result, the state becomes extremely brittle, and mechanically, if an impact much lower than that of the outer peripheral machining is given, only the relevant part is crushed. For this reason, the propagation of cracks toward the central portion starting from damage at the outer peripheral portion is also greatly suppressed.
  • the manufacturing method of the present invention is excellent in that the two problems of the residual stress in the central portion and the weakness in the outer peripheral portion can be solved at once.
  • the group III nitride crystal of the present invention provided thereby has the characteristics that the brittleness of the outer peripheral portion is improved, the residual stress is small, cracks are difficult to occur, and the crystal quality is excellent.
  • the Group III nitride crystal of the present invention has a low value of machining damage resistance. Further, the group III nitride crystal of the present invention has a long dislocation propagation maximum distance.
  • the dislocation propagation maximum distance here refers to the longest dislocation observed around the Vickers indentation introduced by the Vickers test.
  • the group III nitride crystal according to another aspect of the present invention is characterized in that ⁇ d / d (ave) is 4 ⁇ 10 ⁇ 5 or less.
  • the present inventors have found that the residual stress can be reduced by setting the ⁇ d / d (ave) of the group III nitride crystal to 4 ⁇ 10 ⁇ 5 or less, thereby improving the workability of the group III nitride crystal. Succeeded to improve.
  • the change ⁇ d / d (ave) of the lattice constant here is a scale indicating the magnitude of the change when the lattice spacing of crystal planes orthogonal to the epitaxial growth direction is measured along the growth direction.
  • ⁇ d / d (ave) [d (max) ⁇ d (min)] / d (ave) Is a parameter derived by.
  • d (max) represents the maximum value of the lattice plane interval in the measurement range
  • d (min) represents the minimum value of the lattice plane interval in the measurement range
  • d (ave) represents the average value of the lattice plane interval in the measurement range. Residual stress can be reduced by reducing ⁇ d / d (ave).
  • ⁇ d / d (ave) is usually 4 ⁇ 10 ⁇ 5 or less, preferably 3 ⁇ 10 ⁇ 5 or less, and preferably 2 ⁇ 10 ⁇ 5 or less. More preferred.
  • ⁇ d / d (ave) is usually 4 ⁇ 10 ⁇ 5 or less, preferably 3 ⁇ 10 ⁇ 5 or less, and preferably 2 ⁇ 10 ⁇ 5 or less. More preferred.
  • the measurement ranges of d (max), d (min), and d (ave) may be arbitrarily determined depending on the size of the group III nitride crystal to be measured.
  • the lattice spacing was measured with a measurement distance of 3.5 mm and a measurement interval of 100 ⁇ m.
  • the above ⁇ d / d (ave) may convert the measured crystal plane into a change in a-axis length. For example, when the change of lattice constant in the growth direction of the lattice spacing of ⁇ 10-10 ⁇ plane, ⁇ 30-30 ⁇ plane, ⁇ 2-1-10 ⁇ plane, ⁇ 4-2-20 ⁇ plane is obtained Is multiplied by 2 / ⁇ 3, 2 ⁇ 3, 1 and 2, respectively, to obtain the a-axis length.
  • the basal plane dislocation is controlled to the optimum position by heat-treating the group III nitride single crystal at 1000 ° C. or higher according to the production method of the present invention. Good.
  • the strain distribution in the direction orthogonal to the twisted surface (C-plane) of the basal plane dislocation is uniform, the collective behavior between the dislocations easily occurs by heat treatment. When the collective behavior progresses to a vertically arranged arrangement, the strain distribution of each basal plane dislocation is canceled out, and the internal strain in the system is reduced (dislocation polygonization).
  • the aggregation behavior of basal plane dislocations depends on temperature. For example, it may be heat treated at temperatures above 1000 ° C. to [Delta] d / d a (ave) to 4 ⁇ 10 -5 or less, to [Delta] d / d a (ave) to 3 ⁇ 10 -5 or less 1100 ° C. Heat treatment may be performed at the above temperature, and heat treatment may be performed at a temperature of 1200 ° C. or higher in order to make ⁇ d / d (ave) 2 ⁇ 10 ⁇ 5 or less.
  • the group III nitride crystal of the present invention comprises a nitride of a group III element.
  • gallium nitride, aluminum nitride, indium nitride, or a single crystal in which these are mixed can be given.
  • a GaN crystal or AlGaN crystal obtained by heat-treating a C-plane grown GaN single crystal according to the manufacturing method of the present invention to form a coating film and removing the coating film can be given as a preferred example.
  • a large group III nitride crystal can be easily produced, so that the group III nitride crystal of the present invention can be made large.
  • a large group III nitride crystal of 3 inches or more can be used.
  • the group III nitride crystal of the present invention is usefully used as a substrate by appropriately processing as necessary.
  • a basal plane substrate, a nonpolar substrate, and a semipolar substrate can be provided at low cost.
  • a template substrate having a C surface obtained by growing GaN by MOCVD on a sapphire substrate having a diameter of 76 mm ⁇ as a main surface is prepared. It was placed on the coated carbon substrate holder 108 and placed in the reactor 100 of the HVPE apparatus (see FIG. 1). After the reactor 100 was heated to 1020 ° C., HCl gas was supplied through the introduction pipe 103, and GaCl gas G 3 generated by reacting with Ga in the reservoir 106 was supplied into the reactor through the introduction pipe 104. In such a GaN layer growth step on the base substrate 110, the reactor temperature of 1020 ° C.
  • the growth pressure is 1.01 ⁇ 10 5 Pa
  • the partial pressure of the GaCl gas G3 is 6.52. ⁇ and 10 2 Pa
  • the partial pressure of NH 3 gas G4 and 7.54 ⁇ 10 3 Pa and the partial pressure of hydrogen chloride (HCl) and 3.55 ⁇ 10 1 Pa.
  • the temperature in the reactor was lowered to room temperature to obtain a C-plane grown GaN crystal that was a group III nitride crystal.
  • the obtained GaN crystal had a growth surface with a mirror surface, the thickness measured with a stylus thickness meter was 3.5 mm, and the weight measured with a precision weigher was 63.0311 g. .
  • the obtained GaN crystal was subjected to the following heat treatment (high temperature corrosion annealing) without performing pretreatment such as cleaning, etching, and cap.
  • the heat treatment was performed by installing the GaN crystal 201 in an alumina tube (Al 2 O 3 99.7%) 200 and introducing a mixed gas of ammonia and nitrogen from the gas introduction tube 203 at a flow rate of 200 ml / min.
  • Ammonia / nitrogen mixed gas (NH 3 8.5% + N 2 91.5%) is 45 days or more until a uniform mixed gas is obtained after mixing ammonia gas and nitrogen gas in a 4.9 MPa 47-liter cylinder. Used after standing.
  • the heater 202 was used to raise the temperature from room temperature to 600 ° C. at 300 ° C./hour, and from 600 ° C. to 1300 ° C. was raised at 250 ° C./hour.
  • the obtained crystals are immersed in concentrated nitric acid (containing 69% of HNO 3 ) at 120 ° C. to completely remove gallium metal adhering to the surface, and cream-like gallium oxyhydroxide and white gallium oxide remain on the surface.
  • a crystal sample was obtained (Example 1). Since the weight after the concentrated nitric acid treatment was 61.1681 g, the weight reduction ratio was 2.96%.
  • ⁇ Outer peripheral machining> As a grinding wheel for crystal grinding, a grinding stone having an average grain diameter of 25 ⁇ m and vitrified as a bonding agent was used, and the grinding wheel processing surface was arranged to be perpendicular to the (0001) plane of the crystal.
  • the grindstone rotation speed was 2500 m / min, and the crystal rotation speed was 5 mm / sec.
  • the grindstone processing surface was controlled so as to approach the crystal center of 0.02 to 0.04 mm per crystal rotation.
  • FIG. 3A is a front view
  • FIG. 3B is a side view
  • the crystal cutting wire W an apparatus was prepared in which 70 wires with electrodeposited diamond abrasive grains having an average particle diameter of 12 to 25 ⁇ m were arranged in parallel, and 6 of them contributed to the cutting of the crystal sample.
  • the wires W arranged in parallel travel when the roller R1 and the roller R2 rotate in the same direction, and the two rollers R1 and R2 are as shown in FIG. 4B.
  • An M-plane slice plate piece was cut out from each of the obtained crystal samples and subjected to chemical polishing on one M-plane until a surface state suitable for fluorescence microscope observation and SEM-CL observation was obtained.
  • An M-plane single-side polished sample having a uniform thickness was obtained. Separately, the C-surface front and back surfaces are ground and polished by 500 ⁇ m or more to remove the gallium hydroxide layers and gallium oxide layers on the front and back surfaces of the C-surface, and then chemical polishing is performed until a surface state suitable for SEM-CL observation is obtained. As a result, a C-surface double-side polished sample having a uniform thickness of 1.3 mm ⁇ 0.05 mm was also obtained.
  • the dislocation aggregate in which the basal plane dislocations were accumulated had a size of 10 ⁇ m to 50 ⁇ m. It was observed.
  • the number of dislocation aggregates present in an area of approximately 0.0054 cm 2 was counted using the same fluorescence microscope at each of the 25 mm, 20 mm, and 15 mm sites from the outer edge of the M-surface single-side polished sample. The number density of dislocation aggregates was calculated by dividing the number by the measurement area.
  • One of the dislocation aggregates in the heat-treated sample of Example 11 was observed in more detail using scanning electron microscope cathodoluminescence.
  • the spatial resolution of the scanning electron microscope cathode luminescence used was 3 nm, and the acceleration voltage of the electron beam was set to 3 kV.
  • the incident electron beam was parallel to the m-axis direction.
  • a structure in which basal plane dislocations were arranged at intervals of 50 to 500 nm in the c-axis direction was observed over a range of 5 ⁇ m or more in the c-axis direction and the a-axis direction, respectively.
  • the measurement of the lattice spacing of these samples was performed using a high resolution X-ray diffractometer.
  • the X-ray beam uses CuK ⁇ 1 line by an X-ray tube, and is narrowed down by a monochromator and a pinhole type slit.
  • the full width at half maximum (FWHM) of Gaussian beam approximation on the sample surface is 100 ⁇ m in the horizontal direction and 200 ⁇ m in the vertical direction. It was made to become.
  • the sample was fixed to the sample stage so that the c-axis direction was parallel to the horizontal direction.
  • a 2 ⁇ - ⁇ scan of the (30-30) plane which is a crystal plane perpendicular to the growth direction on the line is continuously performed over a length of 3.5 mm at intervals of 100 ⁇ m. The change of the lattice spacing was examined.
  • FIG. 6 shows the result of measuring the change in the lattice spacing of the (30-30) plane at the center of each sample substrate of Example 11 and Comparative Example 11.
  • the maximum value d (max), minimum value d (min), average value d (ave), and [d (max) -d (min)] / d (ave) of the lattice spacing are shown in Table 3 below. It was as shown.
  • FIG. 7 shows the result of converting FIG. 6 to a-axis length change data by multiplying the (30-30) plane interval by 2 ⁇ 3 and converting it to a-axis length change data.
  • the present invention relates to a single crystal gallium nitride (GaN) substrate that can be used as a substrate of a blue light emitting element such as a blue light emitting diode (LED) or a blue semiconductor laser (LD) made of a group III nitride semiconductor, and a single crystal gallium nitride substrate (
  • the present invention relates to a growth method of GaN) and a manufacturing method of a single crystal gallium nitride substrate (GaN).

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CN105917035B (zh) 2014-01-17 2019-06-18 三菱化学株式会社 GaN基板、GaN基板的制造方法、GaN结晶的制造方法和半导体器件的制造方法
WO2015118920A1 (ja) * 2014-02-07 2015-08-13 日本碍子株式会社 複合基板、発光素子及びそれらの製造方法
JP6839694B2 (ja) * 2018-12-17 2021-03-10 株式会社デンソー 酸化ガリウム膜の成膜方法

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