WO2012026223A1 - Grille de capture d'image de rayonnement, son procédé de fabrication, et système de capture d'image de rayonnement - Google Patents

Grille de capture d'image de rayonnement, son procédé de fabrication, et système de capture d'image de rayonnement Download PDF

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Publication number
WO2012026223A1
WO2012026223A1 PCT/JP2011/065574 JP2011065574W WO2012026223A1 WO 2012026223 A1 WO2012026223 A1 WO 2012026223A1 JP 2011065574 W JP2011065574 W JP 2011065574W WO 2012026223 A1 WO2012026223 A1 WO 2012026223A1
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Prior art keywords
grid
small
grids
radiation
small grids
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PCT/JP2011/065574
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English (en)
Japanese (ja)
Inventor
金子　泰久
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富士フイルム株式会社
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    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B6/00—Apparatus for radiation diagnosis, e.g. combined with radiation therapy equipment
    • A61B6/48—Diagnostic techniques
    • A61B6/484—Diagnostic techniques involving phase contrast X-ray imaging
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B6/00—Apparatus for radiation diagnosis, e.g. combined with radiation therapy equipment
    • A61B6/42—Apparatus for radiation diagnosis, e.g. combined with radiation therapy equipment with arrangements for detecting radiation specially adapted for radiation diagnosis
    • A61B6/4291—Apparatus for radiation diagnosis, e.g. combined with radiation therapy equipment with arrangements for detecting radiation specially adapted for radiation diagnosis the detector being combined with a grid or grating
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

Definitions

  • the present invention relates to a radiographic imaging grid used for radiographic imaging, a manufacturing method thereof, and a radiographic imaging system using the radiographic imaging grid.
  • a radiation imaging system using the Talbot interference effect is known as a kind of radiation phase imaging that obtains an image (hereinafter referred to as a phase contrast image) based on a phase change (angle change) when radiation passes through a subject.
  • An X-ray imaging system that uses, for example, X-rays as radiation, includes a first grid disposed behind the subject, and a Talbot interference distance determined by the grid pitch and X-ray wavelength of the first grid, and the X-ray irradiation direction. And a second grid disposed downstream of the X-ray image detector and an X-ray image detector disposed behind the second grid.
  • the X-rays that have passed through the first grid form a self-image (stripe image) at the position of the second grid due to the Talbot interference effect. This self-image is modulated by the X-ray phase change by the subject.
  • the X-ray imaging system acquires a phase contrast image of a subject from a change (phase shift) caused by the subject of a stripe image whose intensity is modulated by superimposing the self-image of the first grid and the second grid. .
  • This is called a fringe scanning method.
  • imaging is performed by an X-ray image detector at each scanning position while moving the second grid with respect to the first grid, and the above-described scanning of pixel data of each pixel obtained by the X-ray image detector is performed.
  • a phase differential image (corresponding to the angular distribution of X-rays refracted by the subject) is acquired from the amount of phase shift in intensity change with respect to the position.
  • translational movement is performed at a scanning pitch obtained by equally dividing the grid pitch in a direction substantially parallel to the plane of the first grid and substantially perpendicular to the grid direction of the first grid. ing.
  • a phase contrast image of the subject is obtained by integrating the obtained phase differential image along the fringe scanning direction.
  • the first and second grids are striped (striped) in which X-ray absorbers stretched in a direction perpendicular to the X-ray irradiation direction are arranged at a predetermined pitch in a direction orthogonal to the X-ray irradiation direction and the stretching direction. It has the following structure.
  • the arrangement pitch of the X-ray absorbers is determined by the distance from the X-ray focal point to the first grid and the distance between the first grid and the second grid, and is approximately 2 to 20 ⁇ m.
  • the line absorption part of the second grid requires high X-ray absorption, it requires a high aspect ratio structure in which the X-ray traveling direction thickness is about 100 ⁇ m.
  • FIG. 15A a technique is known in which a plurality of small grids 90 having a small size are arranged to form a grid 91 having a large area as a whole (see, for example, Patent Documents 1 and 2).
  • a small grid manufactured using a silicon semiconductor process has a rectangular shape with the outer periphery cut.
  • the outer periphery to be cut coincides with the end portion of the grid portion 93 that is provided with an X-ray absorption portion and actually functions as a grid.
  • the cut end portion 94 may be inclined with respect to the end portion of the grid portion 93 as shown in FIG. 16B.
  • the end portion 95 may be uneven as a result of chipping that occurs during cutting, chipping that occurs during handling after cutting, and the like. Accordingly, as shown in FIG. 15A, the actual small grid 90 needs to be provided with a non-grid portion 96 as a cutting margin that does not function as a grid outside the grid portion 93.
  • This distance DS is preferably short. More specifically, the interval DS is more preferably less than or equal to the size of one pixel (for example, 150 ⁇ m or less) of an X-ray image detector used for capturing a phase contrast image. This is because when the interval DS becomes larger than the pixel size, the portion becomes an area where a phase contrast image cannot be acquired, and the image quality is deteriorated.
  • Patent Documents 1 and 2 do not disclose a method for arranging the small grids 90 by narrowing the interval DS between the grid portions 93.
  • An object of the present invention is to arrange a plurality of small grids so that the interval between the grid portions of adjacent small grids is less than the size of one pixel of the X-ray image detector.
  • a grid for radiographic imaging includes N (N is an integer of 2 or more) small grids, and each small grid has a grid portion in which radiation absorbing portions are arranged at a predetermined pitch. And a radiation transmissive non-grid portion provided on the outer periphery of the grid portion. Between the adjacent small grids, the grid portion of one small grid and the non-grid portion of the other small grid are overlapped so as to face each other.
  • the boundary between the grid portion and the non-grid portion of one small grid and the boundary between the grid portion and the non-grid portion of the other small grid coincide.
  • N N small grids may be stacked alternately one above the other. Thereby, even when a plurality of small grids are overlapped, it is possible to suppress the thickness of the radiation image capturing grid from being increased.
  • N small grids may be stacked in a staircase pattern. At this time, it is preferable to bond a radiation-transmitting dummy substrate under a plurality of small grids. Further, instead of the dummy substrate, it may be held by a concave support substrate. Further, the N small grids may be arranged so as to be inclined so as to form a substantially concave or substantially spherical grid surface.
  • the method for manufacturing a radiographic imaging grid according to the present invention includes N grids each including a grid part in which radiation absorbing parts are arranged at a predetermined pitch and a radiation transmissive non-grid part provided on the outer periphery of the grid part ( N is an integer greater than or equal to 2), and the adjacent small grids are superposed so that the grid portion of one small grid and the non-grid portion of the other small grid face each other. And a joining step for joining.
  • an alignment mark forming step for forming an alignment mark having visibility and radiation transparency by visible light on the non-grid portion, and a position for detecting the position of the alignment mark and adjusting the position of the adjacent small grid It is also preferable to further include an adjustment step. Further, in the position adjustment step, adjacent small grids are arranged so that the surfaces provided with the alignment marks face each other with a space therebetween, and a position detection device is inserted into this space to detect the position of the alignment mark. The position may be adjusted accordingly.
  • the radiographic imaging system of the present invention includes a radiation source that emits radiation, a first grid that transmits radiation and generates a fringe image, a second grid that applies intensity modulation to the fringe image, a radiation source, A third grid which is arranged between the first grid and shields the radiation emitted from the radiation source in a selective manner and detects a plurality of line light sources, and a fringe image whose intensity is modulated by the second grid is detected.
  • At least one of the first to third grids includes N pieces of grid portions in which radiation absorbing portions are arranged at a predetermined pitch and radiation transmissive non-grid portions provided on the outer periphery of the grid portion ( N is an integer of 2 or more). Between the adjacent small grids, the grid portion of one small grid and the non-grid portion of the other small grid are overlapped so as to face each other.
  • the interval between the grid portions is not affected by the size of the non-grid portion.
  • a plurality of small grids can be arranged to be narrow.
  • FIG. 2B is a cross-sectional view showing a cross section taken along the line IIB-IIB in FIG. 2A. It is sectional drawing which shows the structure of the grid part of a small grid. It is sectional drawing which shows the manufacture procedure 1 of a small grid. It is sectional drawing which shows the manufacturing procedure 2 of a small grid. It is sectional drawing which shows the manufacturing procedure 3 of a small grid. It is sectional drawing which shows the manufacture procedure 4 of a small grid. It is sectional drawing which shows the manufacturing procedure 5 of a small grid.
  • FIG. 9B is a cross-sectional view showing a cross section taken along line IXB-IXB in FIG. 9A. It is a top view of the grid which piled up the three or more small grids in the step shape.
  • FIG. 10B is a sectional view showing a section taken along line XB-XB in FIG. 10A. It is sectional drawing of the grid which joined the 3 or more small grid to the concave-shaped support substrate. It is sectional drawing of the grid which inclined the small grid and made it concave. It is a perspective view of the grid which piled up the small grid in a plurality of directions. It is a disassembled perspective view of the grid which piled up the small grid in two directions.
  • FIG. 15B is a cross-sectional view showing a cross section taken along line XVB-XVB in FIG. 15A. It is a top view which illustrates the small grid where the perimeter was cut ideally. It is a top view which illustrates the small grid by which the outer periphery was cut diagonally. It is a top view which illustrates the small grid by which the outer periphery was cut in the uneven
  • the X-ray imaging system 10 of the present invention includes an X-ray source 11, a source grid 12, a first grid 13, a second grid 14, and an X-ray image detector 15. .
  • the X-ray source 11 emits X-rays toward the subject H arranged in the Z direction.
  • the radiation source grid 12 is disposed opposite to the X-ray source 11 in the Z direction.
  • the first grid 13 is arranged in parallel at a position away from the radiation source grid 12 by a predetermined distance in the Z direction.
  • the second grid 14 is arranged in parallel at a position away from the first grid 13 by a predetermined distance in the Z direction.
  • the X-ray image detector 15 is disposed so as to face the second grid 14.
  • a flat panel detector using a semiconductor circuit is used as the X-ray image detector 15, for example.
  • the radiation source grid 12, the first grid 13, and the second grid 14 are absorption grids, and a plurality of X-ray absorption parts 17, 18, and 19 are provided in a striped pattern.
  • the X-ray absorbers 17, 18, and 19 are linearly extended in the X direction orthogonal to the Z direction, and are periodically arranged at a predetermined pitch along the Y direction orthogonal to the Z direction and the X direction. Yes.
  • the radiation source grid 12, the first grid 13, and the second grid 14 absorb X-rays by the X-ray absorption units 17, 18, and 19, and X-rays are transmitted by the X-ray transmission unit provided between the X-ray absorption units. Make lines transparent.
  • the first grid 13 does not generate a Talbot interference effect, and the grating pitch is relative to the wavelength of the X-ray so that X-rays are projected linearly (geometrically) onto the second grid 14. Is set.
  • the source grid 12 and the first grid 13 have substantially the same configuration as the second grid 14 except that the widths, pitches, thicknesses in the X-ray irradiation direction, and the like of the X-ray absorbers 17 and 18 are different. Therefore, detailed description is omitted.
  • the small grids 21 and 22 include grid portions 21a and 22a that function as grids, and non-grid portions 21b and 22b that are provided on the outer periphery of the grid portions 21a and 22a and do not function as grids, respectively. ing.
  • the small grids 21 and 22 are joined so that the grid part 21a and the non-grid part 22b overlap with the non-grid part 21b and the grid part 22a, and each grid part and the non-grid part when viewed from the Z direction. And the two grid portions 21a and 22a are joined together so as to form one large grid portion.
  • the small grids 21 and 22 include an X-ray transparent substrate 24 formed of a material having X-ray transparency such as silicon, and the X-rays.
  • the X-ray absorber 19 is provided on the transparent substrate 24.
  • the X-ray absorber 19 is provided in the grid portions 21a and 22a.
  • the X-ray absorber 19 is provided in the X-ray transparent substrate 24 along the X direction and is provided in a plurality of grooves 25 arranged along the Y direction, and is a metal having excellent X-ray absorption. For example, it is composed of gold or platinum.
  • the plurality of partition walls 26 separating the X-ray absorption parts 19 function as X-ray transmission parts.
  • the width W 2 is about 2 to 20 ⁇ m
  • the pitch P 2 is about 4 to 40 ⁇ m.
  • the thickness T 2 in the X direction of the X-ray absorption unit 19 is preferably as thick as possible in order to obtain high X-ray absorption, but vignetting of cone-beam X-rays radiated from the X-ray source 11 is considered. And it is preferable that it is about 100 micrometers.
  • the width W 2 is 2.5 ⁇ m
  • the pitch P 2 is 5 ⁇ m
  • the thickness T 2 is 100 ⁇ m.
  • the grid manufacturing method of the present invention will be described using the second grid 14 as an example.
  • the radiation source grid 12 and the first grid 13 are also manufactured by the same manufacturing method, and detailed description thereof is omitted.
  • the small grid 22 is manufactured in the same procedure, detailed description is abbreviate
  • the support substrate 28 is bonded to the lower surface of the X-ray transparent substrate 24 made of silicon.
  • the support substrate 28 is made of a material having low X-ray absorption, and is preferably borosilicate glass, soda lime glass, quartz, alumina, GaAs, Ge, or the like, and more preferably the same silicon as the X-ray transparent substrate 24.
  • borosilicate glass for example, Pyrex (registered trademark) glass, Tempax (registered trademark) glass, or the like can be used.
  • a conductive sheath layer 30 is provided on the surface of the support substrate 28 bonded to the X-ray transparent substrate 24.
  • the seed layer 30 is made of, for example, Au or Ni, or a metal film formed of Al, Ti, Cr, Cu, Ag, Ta, W, Pb, Pd, Pt, or a metal film formed of an alloy thereof. Preferably there is. Further, the seeds layer 30 may be provided on the X-ray transparent substrate 24 or may be provided on both the X-ray transparent substrate 24 and the support substrate 28.
  • an etching mask 32 is formed on the X-ray transparent substrate 24 by using a general photolithography technique.
  • the etching mask 32 has a striped pattern that extends linearly in the X direction and is periodically arranged at a predetermined pitch in the Y direction.
  • a plurality of grooves 25 are formed in the X-ray transparent substrate 24 by dry etching using the etching mask 32.
  • the groove 25 requires a high aspect ratio of, for example, a width of several ⁇ m and a depth of about 100 ⁇ m. Therefore, a Bosch process, a cryo process, or the like is used for dry etching for forming the groove 25.
  • a groove may be formed by using a photosensitive resist instead of the silicon substrate and exposing with synchrotron radiation.
  • the groove 25 is filled with an X-ray absorber such as gold by electrolytic plating to form an X-ray absorber 19.
  • the X-ray transparent substrate 24 to which the support substrate 28 is bonded is immersed in a plating solution with a current terminal connected to the sheath layer 30.
  • the other electrode anode
  • gold is embedded in the groove 25.
  • the filling of the X-ray absorbing material into the groove 25 is not limited to the electrolytic plating method, and may be performed by applying a paste-like or colloidal X-ray absorbing material.
  • the outer periphery of the X-ray transparent substrate 24 and the like on which the X-ray absorbing portion 19 is formed is cut into a rectangular shape by dicing or the like, and a small grid 21 is formed.
  • a non-grid portion 21b having a width that can be used as a joining margin when joining the small grids is formed on the outer periphery of the grid portion 21a.
  • the support substrate 28, the seed layer 30 and the etching mask 32 are removed by polishing or the like.
  • the support substrate 28 and the seed layer 30 may be left on the small grid 21.
  • two alignment marks 34 and 35 are used for alignment when joining the non-grid portions 21 b and 22 b of the small grids 21 and 22. Individually formed.
  • the alignment marks 34 and 35 are provided at positions that overlap when the grid portions 19 of the small grids 21 and 22 are joined.
  • the alignment marks 34 and 35 are formed by, for example, forming a thin film used for the alignment mark on the small grids 21 and 22 and partially removing the thin film using etching or a photolithography technique.
  • the alignment marks 34 and 35 are made of an X-ray transmissive material such as Al, Ti, Cr, resist or the like.
  • the thickness of the alignment marks 34 and 35 may be such that it can be identified during alignment, for example, 0.01 to 1 ⁇ m.
  • the size of the alignment marks 34 and 35 is preferably not more than one pixel of the X-ray image detector 15 in consideration of the effect on the grid performance, and is preferably about 50 to 100 ⁇ m, for example.
  • the shape of the alignment marks 34 and 35 is a cross shape, it may be any shape as long as it is easy to align. Further, although two alignment marks 34 and 35 are provided, three or more alignment marks may be provided.
  • the small grids 21 and 22 are positioned and joined to each other by the alignment device. As shown in FIG. 6, in the alignment apparatus, the small grids 21 and 22 are held by a position adjusting mechanism (not shown) so that the alignment marks 34 and 35 of the small grids 21 and 22 face each other. For example, the small grid 21 is disposed such that the alignment mark 34 faces downward, and the small grid 22 is disposed such that the alignment arc 35 faces upward.
  • the position adjustment mechanism is configured so that each of the small grids 21 and 22 has an extending direction (X direction) of the X-ray absorber 19, an arrangement direction of the X-ray absorber 19 (Y direction), and ⁇ around the Z direction orthogonal to the grid surface. It can be moved in three directions of Z.
  • two sets of position detection units 39 having a pair of alignment cameras 37 and 38 arranged back to back so as to photograph the upper side and the lower side are inserted,
  • the alignment marks 34 and 35 are photographed by the respective cameras. Images taken by the alignment cameras 37 and 38 of each position detection unit 39 are processed by an image processing device (not shown), and the amount of positional deviation between the alignment mark 34 and the alignment mark 35 is detected.
  • the position adjustment mechanism adjusts the positions of the small grids 21 and 22 based on the detected displacement amount.
  • the adhesive preferably has X-ray permeability and does not deform such as shrinkage when solidified.
  • a thermosetting adhesive or an instantaneous adhesive can be used.
  • the X-rays emitted from the X-ray source 11 are partially shielded by the X-ray absorber 17 of the source grid 12, thereby reducing the effective focus size in the Y direction, and a large number of lines in the Y direction.
  • a light source (dispersed light source) is formed.
  • the X-rays of a large number of line light sources formed by the radiation source grid 12 cause a phase difference when passing through the subject H, and the X-rays pass through the first grid 13 to refract the subject H.
  • a fringe image reflecting the transmission phase information of the subject H determined from the rate and the transmission optical path length is formed.
  • the fringe image of each line light source is projected onto the second grid 14 and coincides (overlaps) at the position of the second grid 14, so that the image quality of the phase contrast image can be improved without reducing the X-ray intensity. it can.
  • the intensity of the fringe image is modulated by the second grid 14 and, for example, a phase differential image is generated by a fringe scanning method.
  • the fringe scanning method translates in the Y direction at a scanning pitch in which the second grid 14 is equally divided (for example, divided into five) with respect to the first grid 13. This is a method of shooting while moving.
  • the subject H is irradiated with X-rays from the X-ray source 11 and detected by the X-ray image detector 15, and the pixel data of each pixel of the X-ray image detector 15 is detected.
  • a phase differential image is obtained by calculating the phase shift amount (phase shift amount with and without the subject H). By integrating this phase differential image along the fringe scanning direction (Y direction), a phase contrast image of the subject H is obtained.
  • the grid for radiographic imaging according to the present embodiment is configured by joining the small grids 21 and 22, a large area can be obtained and the imaging area of the phase contrast image can be increased. Can do.
  • the small grids 21 and 22 are joined so that the grid part 21a and the non-grid part 22b overlap the non-grid part 21b and the grid part 22a. Since the boundary with the grid portion coincides and the two grid portions 21a and 22a are joined to form one large grid portion in succession, the grid portions 21a and 22a of the small grids 21 and 22 The interval between them becomes smaller than the pixel size, and a high-quality phase contrast image can be obtained.
  • the alignment marks 34 and 35 are provided after the small grids 21 and 22 are manufactured.
  • the alignment marks may be formed during the manufacturing of the small grids 21 and 22.
  • a bridge portion 40 that connects the partition walls 26 may be formed on the X-ray transparent substrate 24, and one or a plurality of the bridge portions 40 may be used as an alignment mark.
  • the formation process of the alignment mark performed after manufacture of a small grid in the said embodiment can be abolished.
  • the bridge portion 40 has an effect of reinforcing the partition wall 26, it is possible to prevent a sticking phenomenon in which the partition walls 26 stick to each other when the groove 25 is filled with gold by an electrolytic plating method.
  • the boundaries between the grid portions and the non-grid portions are made to coincide with each other, but as shown in FIG. You may make a part overlap. In this case, it is necessary to perform alignment so that the X-ray absorption part 19 of the grid part 21a and the X-ray absorption part 19 of the grid part 22a overlap in the overlapping part.
  • the boundary between the respective grid portions and the non-grid portions may not be matched, and a gap DS may be provided between them. According to this, since the alignment accuracy can be lowered, the manufacturing cost and the manufacturing throughput can be reduced.
  • the interval DS is preferably set to a size (150 ⁇ m) or less of one pixel of the X-ray image detector 15.
  • the small grids 21 and 22 from which the support substrate 28 is removed are used.
  • the surfaces provided with the grid portions 43a and 44a of the small grids 43 and 44 may be joined to each other, or as shown in FIG. 8D, the surface provided with the support substrate 42 and the grid portion 42a. You may join the surface provided with.
  • the second grid 14 is configured by the two small grids 21 and 22, but a large area grid may be configured by using three or more small grids.
  • a large area grid 46 may be formed by joining four small grids 45a to 45d.
  • FIG. 9B if the small grids 45a to 45d are alternately overlapped, the thickness of the grid 46 can be suppressed even if the number of small grids increases.
  • the gap CL generated between the small grids may be left as it is when used as an absorption grid.
  • the X-ray transmissive substrate used for the small grids 45a to 45d is made of a material having the same X-ray permeability, It is preferable to fill the gap CL.
  • the small grids 51a to 51e may be overlapped and joined in a staircase pattern.
  • dummy substrates 52a to 52d having X-ray transparency are provided under the small grids 51a, 51b, 51d, and 51e as shown by two-dot chain lines. It is preferable to join.
  • a concave support substrate 54 may be used instead of the dummy substrate.
  • the small grids 51a to 51e are temporarily fixed with an adhesive in order, and all the small grids are temporarily fixed, and then the adhesive for main bonding is small with the support substrate 54. What is necessary is just to fill between the grids 51a to 51e.
  • the small grids 51a, 51b, 51d and 51e of the grid 50 are inclined so as to be directed to the X-ray focal point.
  • a grid may be configured. When the grid is enlarged using a plurality of small grids, vignetting of cone-beam X-rays occurs. However, since a grid with a converging structure is obtained by tilting the small grids, X-rays are obtained. Vignetting can be reduced. Further, each small grid may be inclined using a concave support substrate.
  • the small grids are arranged only in one direction (Y direction) and overlap each other.
  • the small grids are arranged in two directions (X direction and Y direction). They may be arranged together and overlap each other.
  • the grid 60 is formed by first joining the four sides of the lowermost small grid 61 with the second small grids 62a to 62d being overlapped, and then joining the three stages.
  • the small grids 63a to 63d of the eyes are joined around the small grids 62a to 62d in the second stage. According to this, the area of the grid can be increased in the two-dimensional direction. If the grid portion of each small grid is replaced by a cross-shaped grid instead of a striped grid, and each small grid is inclined toward the X-ray focal point, a spherical grid can be obtained.
  • the X-rays that have passed through the first and second grids 13 and 14 are linearly projected.
  • the Talbot interference is performed by diffracting the X-rays by the grid. It is good also as a structure (structure described in patent 44459797) which produces an effect.
  • a phase-type grid can be used as the first grid 13, and the phase-type grid used in place of the first grid 13 is a fringe image (self-image) generated by the Talbot interference effect. )
  • the second grid 14 At the position of the second grid 14.
  • the above embodiment has been described by taking X-rays as an example of radiation, but it can also be applied to grids used for radiation such as ⁇ rays, ⁇ rays, ⁇ rays, electron beams, and ultraviolet rays.
  • the present invention can also be applied to a scattered radiation removal grid that removes radiation scattered by a subject when the radiation passes through the subject.
  • the above embodiments can be implemented in combination with each other within a consistent range.

Abstract

L'invention concerne une grille permettant de capturer une image de rayonnement, plusieurs petites grilles étant aménagées de façon que l'intervalle entre des parties de grille de petites grilles contiguës soit plus petit ou égal à la taille d'un pixel d'un détecteur d'image de rayon X. Une seconde grille servant de grille de capture d'image de rayonnement est configurée à partir d'au moins deux petites grilles. Chaque petite grille comprend une partie grille qui fonctionne comme une grille, et une partie non-grille qui est placée à la périphérie extérieure de la partie grille et ne fait pas office de grille. Deux petites grilles contiguës sont jointes de façon que la partie grille d'une petite grille et la partie non-grille de l'autre petite grille se chevauchent, et la limite entre la partie grille et la partie non-grille de ladite petite grille et la limite de la partie grille et de la partie non-grille de ladite autre petite grille correspondent. En conséquence, les parties grille des petites grilles contiguës sont continues de façon à constituer une grande partie grille.
PCT/JP2011/065574 2010-08-25 2011-07-07 Grille de capture d'image de rayonnement, son procédé de fabrication, et système de capture d'image de rayonnement WO2012026223A1 (fr)

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Application Number Priority Date Filing Date Title
JP2010188429A JP2012045099A (ja) 2010-08-25 2010-08-25 放射線画像撮影用グリッド及びその製造方法、並びに放射線画像撮影システム
JP2010-188429 2010-08-25

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WO2012026223A1 true WO2012026223A1 (fr) 2012-03-01

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Cited By (8)

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JP2014006194A (ja) * 2012-06-26 2014-01-16 Canon Inc 構造体の製造方法
WO2015033552A1 (fr) 2013-09-04 2015-03-12 Canon Kabushiki Kaisha Réseau d'absorption et interféromètre de talbot
CN107847199A (zh) * 2015-06-30 2018-03-27 皇家飞利浦有限公司 具有全视场探测器的扫描x射线装置
US20180226167A1 (en) * 2017-02-08 2018-08-09 Shimadzu Corporation Method of producing diffraction grating
CN110621232A (zh) * 2017-05-15 2019-12-27 皇家飞利浦有限公司 用于狭缝扫描差分相位对比成像的格栅安装装置
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WO2013129308A1 (fr) * 2012-03-02 2013-09-06 富士フイルム株式会社 Grille d'absorption pour imagerie radiologique, son procédé de fabrication ainsi que système d'imagerie radiologique
WO2013129309A1 (fr) * 2012-03-02 2013-09-06 富士フイルム株式会社 Grille d'absorption pour imagerie radiologique, son procédé de fabrication ainsi que système d'imagerie radiologique
JP2014006194A (ja) * 2012-06-26 2014-01-16 Canon Inc 構造体の製造方法
WO2015033552A1 (fr) 2013-09-04 2015-03-12 Canon Kabushiki Kaisha Réseau d'absorption et interféromètre de talbot
CN107847199A (zh) * 2015-06-30 2018-03-27 皇家飞利浦有限公司 具有全视场探测器的扫描x射线装置
CN107847199B (zh) * 2015-06-30 2021-08-17 皇家飞利浦有限公司 具有全视场探测器的扫描x射线装置
US20180226167A1 (en) * 2017-02-08 2018-08-09 Shimadzu Corporation Method of producing diffraction grating
US10643760B2 (en) * 2017-02-08 2020-05-05 Shimadzu Corporation Method of producing diffraction grating
CN110621232A (zh) * 2017-05-15 2019-12-27 皇家飞利浦有限公司 用于狭缝扫描差分相位对比成像的格栅安装装置
US11311260B2 (en) * 2019-04-24 2022-04-26 Shimadzu Corporation X-ray phase imaging apparatus

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