WO2011052568A1 - 有機光電変換素子 - Google Patents
有機光電変換素子 Download PDFInfo
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- WO2011052568A1 WO2011052568A1 PCT/JP2010/068941 JP2010068941W WO2011052568A1 WO 2011052568 A1 WO2011052568 A1 WO 2011052568A1 JP 2010068941 W JP2010068941 W JP 2010068941W WO 2011052568 A1 WO2011052568 A1 WO 2011052568A1
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- photoelectric conversion
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- 150000008376 fluorenones Chemical class 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- LHJOPRPDWDXEIY-UHFFFAOYSA-N indium lithium Chemical compound [Li].[In] LHJOPRPDWDXEIY-UHFFFAOYSA-N 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- YZASAXHKAQYPEH-UHFFFAOYSA-N indium silver Chemical compound [Ag].[In] YZASAXHKAQYPEH-UHFFFAOYSA-N 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000002687 intercalation Effects 0.000 description 1
- 238000009830 intercalation Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- GCICAPWZNUIIDV-UHFFFAOYSA-N lithium magnesium Chemical compound [Li].[Mg] GCICAPWZNUIIDV-UHFFFAOYSA-N 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- SJCKRGFTWFGHGZ-UHFFFAOYSA-N magnesium silver Chemical compound [Mg].[Ag] SJCKRGFTWFGHGZ-UHFFFAOYSA-N 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- UNFUYWDGSFDHCW-UHFFFAOYSA-N monochlorocyclohexane Chemical compound ClC1CCCCC1 UNFUYWDGSFDHCW-UHFFFAOYSA-N 0.000 description 1
- DCZNSJVFOQPSRV-UHFFFAOYSA-N n,n-diphenyl-4-[4-(n-phenylanilino)phenyl]aniline Chemical class C1=CC=CC=C1N(C=1C=CC(=CC=1)C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=CC=CC=1)C1=CC=CC=C1 DCZNSJVFOQPSRV-UHFFFAOYSA-N 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 150000004866 oxadiazoles Chemical class 0.000 description 1
- 229960003540 oxyquinoline Drugs 0.000 description 1
- 125000001792 phenanthrenyl group Chemical class C1(=CC=CC=2C3=CC=CC=C3C=CC12)* 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000548 poly(silane) polymer Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920002098 polyfluorene Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 238000004382 potting Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000009993 protective function Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 150000003219 pyrazolines Chemical class 0.000 description 1
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical compound C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 1
- 230000027756 respiratory electron transport chain Effects 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- ZJMWRROPUADPEA-UHFFFAOYSA-N sec-butylbenzene Chemical compound CCC(C)C1=CC=CC=C1 ZJMWRROPUADPEA-UHFFFAOYSA-N 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical class C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000005341 toughened glass Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/30—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising bulk heterojunctions, e.g. interpenetrating networks of donor and acceptor material domains
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2101/00—Properties of the organic materials covered by group H10K85/00
- H10K2101/30—Highest occupied molecular orbital [HOMO], lowest unoccupied molecular orbital [LUMO] or Fermi energy values
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/10—Transparent electrodes, e.g. using graphene
- H10K2102/101—Transparent electrodes, e.g. using graphene comprising transparent conductive oxides [TCO]
- H10K2102/103—Transparent electrodes, e.g. using graphene comprising transparent conductive oxides [TCO] comprising indium oxides, e.g. ITO
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/50—Photovoltaic [PV] devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
- H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/151—Copolymers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/20—Carbon compounds, e.g. carbon nanotubes or fullerenes
- H10K85/211—Fullerenes, e.g. C60
- H10K85/215—Fullerenes, e.g. C60 comprising substituents, e.g. PCBM
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Definitions
- the present invention relates to an organic photoelectric conversion element used for a photoelectric device such as a solar cell or an optical sensor.
- the organic photoelectric conversion element is an element including a pair of electrodes including an anode and a cathode, and an organic active layer provided between the pair of electrodes.
- one of the electrodes is made of a transparent material, and light is incident on the organic active layer from the transparent electrode side.
- Charges (holes and electrons) are generated in the organic active layer by the energy (h ⁇ ) of light incident on the organic active layer, and the generated holes are directed to the anode and the electrons are directed to the cathode. Therefore, the current (I) is supplied to the external circuit by connecting the external circuit to the electrode.
- the organic active layer is composed of an electron-accepting compound that is an n-type semiconductor material and an electron-donating compound that is a p-type semiconductor material.
- An electron-accepting compound and an electron-donating compound are mixed and used to form a one-layer organic active layer, and an electron-accepting layer containing an electron-accepting compound and an electron-donating compound containing an electron-donating compound
- the layers are joined to form an organic active layer having a two-layer structure (see, for example, Patent Document 1).
- the former organic active layer having a single layer structure is referred to as a bulk hetero organic active layer
- the latter organic active layer having a two-layer structure is referred to as a heterojunction organic active layer.
- the electron-accepting compound and the electron-donating compound constitute a phase of a fine and complex shape that continues from one electrode side to the other electrode side, and A complex interface is formed while being separated. Therefore, in the bulk hetero type organic active layer, the phase containing the electron-accepting compound and the phase containing the electron-donating compound are in contact with each other through an interface having a very large area. Therefore, an organic photoelectric conversion element having a bulk hetero-type organic active layer has a heterojunction type organic activity in which a layer containing an electron-accepting compound and a layer containing an electron-donating compound are in contact with each other through one flat interface. Compared with the organic photoelectric conversion element which has a layer, higher photoelectric conversion efficiency is obtained.
- An organic material used for the organic active layer of the organic photoelectric conversion element is an organic polymer compound that realizes light absorption based on a ⁇ - ⁇ * transition (Patent Document 2).
- Patent Document 2 An organic material used for the organic active layer of the organic photoelectric conversion element.
- the conventional organic photoelectric conversion element there is only one kind of electron donating compound that is usually used as an organic material mainly responsible for light absorption of the organic active layer, and the absorption band of the solar cell is effective for photoelectric conversion. It does not cover the wavelength range of light.
- Patent Document 3 it has been proposed to cover an effective solar wavelength range by expanding the absorption range by combining two or more electron donating compounds having different absorption wavelengths.
- the present invention provides an organic photoelectric conversion element having high photoelectric conversion efficiency by selecting a plurality of materials as an electron donating compound of an organic active layer based on a predetermined combination criterion.
- a photoelectric conversion element is provided.
- the first electron-donating compound is an organic polymer compound having at least one of the structural unit represented by the following structural formula (1) and the structural unit represented by the following general formula (2).
- Ar 1 and Ar 2 are the same or different and each represents a trivalent heterocyclic group.
- R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are the same or different and are a hydrogen atom, a halogen atom, an alkyl group, an alkyloxy group, an alkylthio group, an aryl group, an aryloxy group, an arylthio group, Arylalkyl group, arylalkyloxy group, arylalkylthio group, acyl group, acyloxy group, amide group, acid imide group, amino group, substituted amino group, substituted silyl group, substituted silyloxy group, substituted silylthio group, substituted silylamino group, 1
- a valent heterocyclic group, heterocyclic oxy group, heterocyclic thio group, arylalkenyl group, arylalkynyl group, carboxyl group or cyano group is represented.
- R 50 is a hydrogen atom, halogen atom, alkyl group, alkyloxy group, alkylthio group, aryl group, aryloxy group, arylthio group, arylalkyl group, arylalkyloxy group, arylalkylthio group, acyl group, acyloxy group, amide Group, acid imide group, amino group, substituted amino group, substituted silyl group, substituted silyloxy group, substituted silylthio group, substituted silylamino group, monovalent heterocyclic group, heterocyclic oxy group, heterocyclic thio group, arylalkenyl group, An arylalkynyl group, a carboxyl group or a cyano group is represented.
- R 51 is an alkyl group having 6 or more carbon atoms, an alkyloxy group having 6 or more carbon atoms, an alkylthio group having 6 or more carbon atoms, an aryl group having 6 or more carbon atoms, an aryloxy group having 6 or more carbon atoms, or 6 or more carbon atoms.
- the internal quantum yield is 0.05 or more in a light absorption band of 300 nm to 900 nm of the organic active layer
- the organic photoelectric conversion element as described.
- the organic photoelectric conversion device has an anode, a cathode, and an organic active layer provided between the anode and the cathode, and the organic active layer has a first electron donating property.
- the organic photoelectric conversion device In the organic photoelectric conversion device according to the present invention, a plurality of materials having absorption bands with different wavelengths are mixed as the electron-donating compound constituting the organic active layer, and the difference in the HOMO energy level between the materials is 0. .20 eV, so that light absorption is performed in a wide wavelength band, and the amount of light contributing to photoelectric conversion can be increased to improve the photoelectric conversion efficiency.
- the organic photoelectric conversion element according to the present invention the anode, the organic active layer, the electron donating compound and the electron accepting compound constituting the organic active layer, the cathode, and other components formed as necessary, This will be described in detail below.
- the basic form of the photoelectric conversion device of the present invention is a bulk hetero type formed from an organic composition of a pair of electrodes, at least one of which is transparent or translucent, and an electron donating compound and an electron accepting compound. It has an organic active layer. Then, at least two kinds of electron donating compounds constituting the organic active layer are used.
- the difference from the energy level of the occupied molecular orbital is set to 0.20 eV or less.
- the energy level of HOMO (maximum occupied molecular orbital) of the first electron donating compound and the second electron donating compound is set to 0.20 eV or less.
- the photoelectric conversion element of the present invention is usually formed on a substrate.
- the substrate may be any substrate that does not chemically change when the electrodes are formed and the organic layer is formed.
- Examples of the material for the substrate include glass, plastic, polymer film, and silicon.
- the opposite electrode that is, the electrode far from the substrate
- the transparent or translucent electrode material examples include a conductive metal oxide film and a translucent metal thin film. Specifically, for example, using conductive materials such as indium oxide, zinc oxide, tin oxide, and composites thereof such as indium tin oxide (ITO), indium zinc oxide (IZO), and NESA. The produced film, gold, platinum, silver, copper, or the like is used. Among these electrode materials, ITO, indium / zinc / oxide, and tin oxide are preferable. Examples of the method for producing the electrode include a vacuum deposition method, a sputtering method, an ion plating method, a plating method, and the like. Moreover, you may use organic transparent conductive films, such as polyaniline and its derivative (s), polythiophene, and its derivative (s) as an electrode material.
- organic transparent conductive films such as polyaniline and its derivative (s), polythiophene, and its derivative (s) as an electrode material.
- the other electrode may not be transparent, and as the electrode material of the electrode, a metal, a conductive polymer, or the like can be used.
- the electrode material include, for example, lithium, sodium, potassium, rubidium, cesium, magnesium, calcium, strontium, barium, aluminum, scandium, vanadium, zinc, yttrium, indium, cerium, samarium, europium, terbium, ytterbium, and the like.
- alloys thereof or one selected from the group consisting of one or more of the above metals and gold, silver, platinum, copper, manganese, titanium, cobalt, nickel, tungsten, and tin
- the alloy include magnesium-silver alloy, magnesium-indium alloy, magnesium-aluminum alloy, indium-silver alloy, lithium-aluminum alloy, lithium-magnesium alloy, lithium-indium alloy, and calcium-aluminum alloy.
- an additional intermediate layer (such as a charge transport layer) other than the organic active layer may be used.
- an alkali metal such as lithium fluoride, a halide of an alkaline earth metal, an oxide, or the like can be used.
- fine particles of inorganic semiconductor such as titanium oxide, PEDOT (poly-3,4-ethylenedioxythiophene), and the like can be given.
- the organic active layer included in the photoelectric conversion element of the present invention includes a first electron donating compound, a second electron donating compound, and an electron accepting compound.
- the difference between the HOMO (maximum occupied molecular orbital) energy level of the first electron donating compound and the HOMO (maximum occupied molecular orbital) energy level of the second electron donating compound is 0.20 eV or less.
- Electrode donating compound examples include pyrazoline derivatives, arylamine derivatives, stilbene derivatives, triphenyldiamine derivatives, oligothiophene and derivatives thereof, polyvinylcarbazole and derivatives thereof, polysilane and derivatives thereof, and aromatic groups in side chains or main chains.
- Examples thereof include p-type semiconductor polymers such as polysiloxane derivatives having amine, polyaniline and derivatives thereof, polythiophene and derivatives thereof, polypyrrole and derivatives thereof, polyphenylene vinylene and derivatives thereof, and polythienylene vinylene and derivatives thereof.
- suitable p-type semiconductor polymers include organic polymer compounds having at least one structural unit of a structural unit represented by the following structural formula (1) and a structural unit represented by the following general formula (2). .
- Ar 1 and Ar 2 are the same or different and each represents a trivalent heterocyclic group.
- R 3 , R 4 , R 5 , R 6 , R 7 and R 8 are the same or different and are a hydrogen atom, a halogen atom, an alkyl group, an alkyloxy group, an alkylthio group, an aryl group, an aryloxy group, an arylthio group, Arylalkyl group, arylalkyloxy group, arylalkylthio group, acyl group, acyloxy group, amide group, acid imide group, amino group, substituted amino group, substituted silyl group, substituted silyloxy group, substituted silylthio group, substituted silylamino group, 1
- a valent heterocyclic group, heterocyclic oxy group, heterocyclic thio group, arylalkenyl group, arylalkynyl group, carboxyl group or cyano group is represented.
- R 50 is a hydrogen atom, halogen atom, alkyl group, alkyloxy group, alkylthio group, aryl group, aryloxy group, arylthio group, arylalkyl group, arylalkyloxy group, arylalkylthio group, acyl group, acyloxy group, amide Group, acid imide group, amino group, substituted amino group, substituted silyl group, substituted silyloxy group, substituted silylthio group, substituted silylamino group, monovalent heterocyclic group, heterocyclic oxy group, heterocyclic thio group, arylalkenyl group, An arylalkynyl group, a carboxyl group or a cyano group is represented.
- R 51 is an alkyl group having 6 or more carbon atoms, an alkyloxy group having 6 or more carbon atoms, an alkylthio group having 6 or more carbon atoms, an aryl group having 6 or more carbon atoms, an aryloxy group having 6 or more carbon atoms, or 6 or more carbon atoms.
- organic polymer compound a compound containing both the structural unit represented by the structural formula (1) and the structural unit represented by the general formula (2) is more preferable.
- the compound containing both of the above structural units include, for example, polymer compound A which is a copolymer of two compounds represented by the following structural formula (3), and structural formula (4) below.
- the polymer compound B shown is used.
- Electrode-accepting compound n-type semiconductor
- the electron-accepting compound include oxadiazole derivatives, anthraquinodimethane and its derivatives, benzoquinone and its derivatives, naphthoquinone and its derivatives, anthraquinone and its derivatives, tetracyanoanthraquinodimethane and its derivatives, fluorenone derivatives, Diphenyldicyanoethylene and its derivatives, diphenoquinone derivatives, metal complexes of 8-hydroxyquinoline and its derivatives, polyquinoline and its derivatives, polyquinoxaline and its derivatives, polyfluorene and its derivatives, fullerenes such as C 60 and its derivatives, bathocuproine, etc.
- Phenanthrene derivatives metal oxides such as titanium oxide, carbon nanotubes, and the like.
- titanium oxide, carbon nanotubes, fullerenes, and fullerene derivatives are preferable, and fullerenes and fullerene derivatives are particularly preferable.
- fullerene examples include C 60 fullerene, C 70 fullerene, C 76 fullerene, C 78 fullerene, such as C 84 fullerene, and the like.
- fullerene derivatives include C 60 fullerene derivatives, C 70 fullerene derivatives, C 76 fullerene derivatives, C 78 fullerene derivatives, and C 84 fullerene derivatives. Specific examples of the fullerene derivative include the following.
- fullerene derivatives include [6,6] phenyl-C61 butyric acid methyl ester (C60PCBM, [6,6] -Phenyl C61 butyric acid methyl ester), [6,6] phenyl-C71 butyric acid methyl ester (C70PCBM). , [6,6] -Phenyl C71 butyric acid methyl ester), [6,6] Phenyl-C85 butyric acid methyl ester (C84PCBM, [6,6] -Phenyl C85 butyric acid methyl ester), [6,6] Chenyl And C61 butyric acid methyl ester ([6,6] -Thienyl C61 butyric acid methyl ester).
- the ratio of the fullerene derivative is preferably 10 to 1000 parts by weight and more preferably 20 to 500 parts by weight with respect to 100 parts by weight of the electron donating compound. .
- the thickness of the organic active layer is usually preferably 1 nm to 100 ⁇ m, more preferably 2 nm to 1000 nm, still more preferably 5 nm to 500 nm, more preferably 20 nm to 200 nm.
- organic active layer In order to express various functions in the organic active layer, other components may be contained as necessary. Examples thereof include an ultraviolet absorber, an antioxidant, a sensitizer for sensitizing the function of generating charges by absorbed light, and a light stabilizer for increasing stability from ultraviolet rays.
- Components other than the electron-donating compound and the electron-accepting compound constituting the organic active layer are each 5 parts by weight or less, particularly 0.01 to less than 100 parts by weight of the total amount of the electron-donating compound and the electron-accepting compound. It is effective to blend in the proportion of 3 parts by weight.
- the organic active layer may contain a polymer compound other than the electron donating compound and the electron accepting compound of the present invention as a polymer binder in order to enhance mechanical properties.
- the polymer binder those that do not inhibit the electron transport property or hole transport property are preferable, and those that do not strongly absorb visible light are preferably used.
- polymer binder examples include poly (N-vinylcarbazole), polyaniline and derivatives thereof, polythiophene and derivatives thereof, poly (p-phenylene vinylene) and derivatives thereof, poly (2,5-chenylene vinylene) and derivatives thereof, Polycarbonate, polyacrylate, polymethyl acrylate, polymethyl methacrylate, polystyrene, polyvinyl chloride, polysiloxane and the like can be mentioned.
- the organic active layer is a bulk hetero type, and is formed by film formation from a solution containing the electron-donating compound, the electron-accepting compound, and other components blended as necessary. Can do.
- the solvent used for film formation from a solution is not particularly limited as long as it dissolves the above-described electron-donating compound and electron-accepting compound.
- solvents include toluene, xylene, mesitylene, tetralin, decalin, bicyclohexyl, unsaturated hydrocarbon solvents such as n-butylbenzene, sec-butylbenzene, tert-butylbenzene, carbon tetrachloride, chloroform, dichloromethane, Halogenated saturated hydrocarbon solvents such as dichloroethane, chlorobutane, bromobutane, chloropentane, bromopentane, chlorohexane, bromohexane, chlorocyclohexane and bromocyclohexane, halogenated unsaturated hydrocarbon solvents such as chlorobenzene, dichlorobenzene and trichlorobenzene, tetrahydrofuran And
- spin coating method for film formation, spin coating method, casting method, micro gravure coating method, gravure coating method, bar coating method, roll coating method, wire bar coating method, dip coating method, spray coating method, screen printing method, gravure printing, flexographic printing Coating methods such as a printing method, an offset printing method, an ink jet printing method, a dispenser printing method, a nozzle coating method, and a capillary coating method can be used.
- spin coating, flexographic printing, gravure printing, ink jet printing, and dispenser printing are preferred.
- the photoelectric conversion element of the present invention can be operated as an organic thin film solar cell by generating a photovoltaic force between the electrodes by irradiating light such as sunlight from a transparent or translucent electrode. It can also be used as an organic thin film solar cell module by integrating a plurality of organic thin film solar cells.
- a photocurrent flows and it can be operated as an organic photosensor. It can also be used as an organic image sensor by integrating a plurality of organic photosensors.
- the organic thin film solar cell can basically have the same module structure as a conventional solar cell module.
- the solar cell module generally has a structure in which cells are formed on a support substrate such as metal or ceramic, and the cell is covered with a filling resin or protective glass, and light is taken in from the opposite side of the support substrate. It is also possible to use a transparent material such as tempered glass for the support substrate, configure a cell thereon, and take in light from the transparent support substrate side.
- a module structure called a super straight type, a substrate type, and a potting type, a substrate integrated module structure used in an amorphous silicon solar cell, and the like are known. Even in an organic thin-film solar cell to which the organic photoelectric conversion element of the present invention is applied, these module structures can be appropriately selected depending on the purpose of use, the place of use and the environment.
- a typical super straight type or substrate type module cells are arranged at regular intervals between support substrates that are transparent on one or both sides and treated with antireflection, and adjacent cells are connected by metal leads or flexible wiring. It is connected, and the collector electrode is arrange
- plastic materials such as ethylene vinyl acetate (EVA) may be used between the substrate and the cell in the form of a film or a filling resin depending on the purpose in order to protect the cell and improve the current collection efficiency.
- EVA ethylene vinyl acetate
- the surface protective layer is made of a transparent plastic film, or the protective function is achieved by curing the filling resin. It is possible to eliminate the supporting substrate on one side.
- the periphery of the support substrate is fixed in a sandwich shape with a metal frame in order to ensure internal sealing and module rigidity, and a sealing material is hermetically sealed between the support substrate and the frame. Further, if a flexible material is used for the cell itself, the support substrate, the filling material, and the sealing material, a solar cell can be formed on the curved surface.
- a solar cell using a flexible support such as a polymer film
- cells are sequentially formed while feeding out a roll-shaped support, cut to a desired size, and then the periphery is sealed with a flexible and moisture-proof material.
- the battery body can be produced.
- SCAF module structure described in Solar Energy Materials and Solar Cells, 48, p383-391.
- a solar cell using a flexible support can be used by being bonded and fixed to a curved glass or the like.
- Example 1 Transparent substrate-Transparent anode-Formation of hole transport layer
- a transparent glass substrate having a transparent electrode (anode) formed by sputtering and patterned with ITO having a thickness of about 150 nm was prepared.
- the glass substrate was washed with an organic solvent, an alkaline detergent, and ultrapure water and dried.
- UV ozone apparatus to dry the substrate (UV-0 3 devices, Techno Vision Co., Ltd., model number "UV-312") was carried out UV-0 3 processing at.
- a suspension of poly (3,4) ethylenedioxythiophene / polystyrene sulfonic acid (manufactured by HC Starck B-Tech, trade name “Bytron P TP AI 4083”) is prepared. It filtered with the filter of 0.5 micron diameter. The filtered suspension was formed into a film with a thickness of 70 nm by spin coating on the side of the substrate on which the transparent electrode was provided. The obtained film was dried on a hot plate under an atmospheric environment at 200 ° C. for 10 minutes to form a hole transport layer on the transparent electrode.
- a polymer compound A (first electron-donating compound) represented by the following structural formula (3), poly (3-hexylthiophene) (P3HT) (second electron-donating compound), A chlorobenzene solution of the acceptor compound [6,6] -phenyl C61 butyric acid methyl ester ([6,6] -PCBM) in a weight ratio of 2: 1: 4 was prepared.
- the obtained solution was spin-coated on the surface of the hole transport layer of the substrate, and then dried in an N 2 atmosphere. As a result, a bulk hetero organic active layer was formed on the hole transport layer.
- Polymer compound A which is a copolymer of the two compounds represented by the structural formula (3), had a polystyrene-equivalent weight average molecular weight of 17,000 and a polystyrene-equivalent number average molecular weight of 5000. Further, the light absorption edge wavelength of the polymer A was 925 nm.
- the HOMO energy level of the second electron donating compound (P3HT) was 5.1, and the HOMO energy level of the first electron donating compound (polymer compound A) was 5.0.
- the substrate is placed in a resistance heating vapor deposition apparatus, LiF is deposited on the organic active layer by about 2.3 nm to form an electron transport layer, and then Al is deposited to a thickness of about 70 nm.
- a cathode was formed.
- an epoxy resin rapid curing type araldite
- a glass substrate was adhered on the cathode to perform a sealing process, thereby obtaining an organic photoelectric conversion element.
- the shape of the obtained photoelectric conversion element was a regular square of 2 mm ⁇ 2 mm. Further, the internal quantum yield of the obtained photoelectric conversion element was 0.05 or more in the range of 300 nm to 900 nm.
- Example 2 Transparent substrate-Transparent anode-Formation of hole transport layer
- a transparent glass substrate having a transparent electrode (anode) formed by sputtering and patterned with ITO having a thickness of about 150 nm was prepared.
- the glass substrate was washed with an organic solvent, an alkaline detergent, and ultrapure water and dried.
- UV ozone apparatus to dry the substrate (UV-0 3 devices, Techno Vision Co., Ltd., model number "UV-312") was carried out UV-0 3 processing at.
- a suspension of poly (3,4) ethylenedioxythiophene / polystyrene sulfonic acid (manufactured by HC Starck B-Tech, trade name “Bytron P TP AI 4083”) is prepared. It filtered with the filter of 0.5 micron diameter. The filtered suspension was formed into a film with a thickness of 70 nm by spin coating on the side of the substrate on which the transparent electrode was provided. The obtained film was dried on a hot plate under an atmospheric environment at 200 ° C. for 10 minutes to form a hole transport layer on the transparent electrode.
- polymer compound B first electron-donating compound represented by the following structural formula (4)
- poly (3-hexylthiophene) P3HT
- second electron-donating compound P3HT
- a chlorobenzene solution of the acceptor compound [6,6] -phenyl C61 butyric acid methyl ester ([6,6] -PCBM) in a weight ratio of 2: 1: 4 was prepared.
- the obtained solution was spin-coated on the surface of the hole transport layer of the substrate, and then dried in an N 2 atmosphere. As a result, a bulk hetero organic active layer was formed on the hole transport layer.
- the polymer compound A represented by the structural formula (4) had a polystyrene equivalent weight average molecular weight of 17887 and a polystyrene equivalent number average molecular weight of 5,000. Further, this polymer B had a light absorption edge wavelength of 645 nm. Further, the HOMO energy level of the second electron donating compound (P3HT) was 5.1, and the HOMO energy level of the first electron donating compound (polymer compound B) was 5.3.
- the substrate is placed in a resistance heating vapor deposition apparatus, LiF is deposited on the organic active layer by about 2.3 nm to form an electron transport layer, and then Al is deposited to a thickness of about 70 nm.
- a cathode was formed.
- an epoxy resin rapid curing type araldite
- a glass substrate was adhered on the cathode to perform a sealing process, thereby obtaining an organic photoelectric conversion element.
- the shape of the obtained photoelectric conversion element was a regular square of 2 mm ⁇ 2 mm. Further, the internal quantum yield of the obtained photoelectric conversion element was 0.05 or more in the range of 300 nm to 900 nm.
- a suspension of poly (3,4) ethylenedioxythiophene / polystyrene sulfonic acid (manufactured by HC Starck B-Tech, trade name “Bytron P TP AI 4083”) is prepared. It filtered with the filter of 0.5 micron diameter. The filtered suspension was formed into a film with a thickness of 70 nm by spin coating on the side of the substrate on which the transparent electrode was provided. The obtained film was dried on a hot plate under an atmospheric environment at 200 ° C. for 10 minutes to form a hole transport layer on the transparent electrode.
- the obtained solution was spin-coated on the surface of the hole transport layer of the substrate, and then dried in an N 2 atmosphere. As a result, a bulk hetero organic active layer was formed on the hole transport layer.
- the substrate is placed in a resistance heating vapor deposition apparatus, LiF is deposited on the organic active layer by about 2.3 nm to form an electron transport layer, and then Al is deposited to a thickness of about 70 nm.
- a cathode was formed.
- an epoxy resin rapid curing type araldite
- a glass substrate was adhered on the cathode to perform a sealing process, thereby obtaining an organic photoelectric conversion element.
- the shape of the obtained photoelectric conversion element was a regular square of 2 mm ⁇ 2 mm. Further, the internal quantum yield of the obtained photoelectric conversion element is less than 0.05 in the range of 300 nm to 900 nm, and the wavelength range of photoelectric conversion efficiency is narrow.
- a suspension of poly (3,4) ethylenedioxythiophene / polystyrene sulfonic acid (manufactured by HC Starck B-Tech, trade name “Bytron P TP AI 4083”) is prepared. It filtered with the filter of 0.5 micron diameter. The filtered suspension was formed into a film with a thickness of 70 nm by spin coating on the side of the substrate on which the transparent electrode was provided. The obtained film was dried on a hot plate under an atmospheric environment at 200 ° C. for 10 minutes to form a hole transport layer on the transparent electrode.
- the obtained solution was spin-coated on the surface of the hole transport layer of the substrate, and then dried in an N 2 atmosphere. As a result, a bulk hetero organic active layer was formed on the hole transport layer.
- the HOMO energy level of the second electron donating compound (P3HT) was 5.1, and the HOMO energy level of the first electron donating compound was 4.8.
- the substrate is placed in a resistance heating vapor deposition apparatus, LiF is deposited on the organic active layer by about 2.3 nm to form an electron transport layer, and then Al is deposited to a thickness of about 70 nm.
- a cathode was formed.
- an epoxy resin rapid curing type araldite
- a glass substrate was adhered on the cathode to perform a sealing process, thereby obtaining an organic photoelectric conversion element.
- the shape of the obtained photoelectric conversion element was a regular square of 2 mm ⁇ 2 mm. Further, the internal quantum yield of the obtained photoelectric conversion element is less than 0.05 in the range of 300 nm to 900 nm, and the wavelength range of photoelectric conversion efficiency is narrow.
- the photoelectric conversion efficiency of the photoelectric conversion elements obtained in Examples 1 and 2 and Comparative Examples 1 and 2 was determined as follows.
- the photoelectric conversion efficiency of the obtained photoelectric conversion element (an organic thin film solar cell is assumed: the shape is a 2 mm ⁇ 2 mm regular square) solar simulator (trade name “CEP-2000, manufactured by Spectrometer Co., Ltd., irradiance 100 mW / cm 2) )), And the generated current and voltage were measured.
- the organic photoelectric conversion element according to the present invention can improve photoelectric conversion efficiency, is useful for photoelectric devices such as solar cells and optical sensors, and is particularly suitable for organic solar cells.
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Abstract
Description
通常、前者の1層構造の有機活性層はバルクへテロ型有機活性層と呼称され、後者の2層積層構造の有機活性層はヘテロジャンクション型有機活性層と呼称される。
[2] 第1の電子供与性化合物が、下記構造式(1)で示される構造単位及び下記一般式(2)で示される構造単位の少なくとも一方の構造単位を有する有機高分子化合物であることを特徴とする、上記[1]に記載の有機光電変換素子。
[3] 有機活性層の光吸収帯域300nmから900nmの領域で内部量子収率が0.05以上を有していることを特徴とする、上記[1]または[2]のいずれか1つに記載の有機光電変換素子。
本発明にかかる有機光電変換素子では、有機活性層を構成する電子供与性化合物として、それぞれ異なった波長の吸収帯域を持つ複数の材料を混合させ、かつそれぞれの材料のHOMOエネルギーレベルの差が0.20eV以内に設定しており、それにより、広域波長帯で光吸収を行い、光電変換に寄与する光量を増やして光電変換効率を向上させることができる。
本発明に係る有機光電変換素子を構成する、陽極、有機活性層、有機活性層を構成する電子供与性化合物及び電子受容性化合物、陰極、および必要に応じて形成される他の構成要素について、以下に詳しく説明する。
本発明の光電変換素子の基本的形態としては、少なくとも一方が透明又は半透明である一対の電極と、電子供与性化合物と電子受容性化合物との有機組成物から形成されるバルクへテロ型の有機活性層を有する。そして、有機活性層を構成する電子供与性化合物として、少なくとも2種を用い、第1の電子供与性化合物のHOMO(最高占有分子軌道)のエネルギーレベルと第2の電子供与性化合物のHOMO(最高占有分子軌道)のエネルギーレベルとの差を0.20eV以下に設定する。
透明又は半透明の電極から入射した光エネルギーがフラーレン誘導体等の電子受容性化合物及び/又は共役高分子化合物等の電子供与性化合物に吸収され、電子と正孔がクーロン結合してなる励起子を生成する。生成した励起子が移動して、電子受容性化合物と電子供与性化合物が隣接しているヘテロ接合界面に達すると、界面でのそれぞれのHOMOエネルギー及びLUMOエネルギーの違いにより電子と正孔が分離し、独立に動くことができる電荷(電子と正孔)が発生する。発生したそれぞれの電荷は、それぞれ電極へ移動することにより外部へ電気エネルギー(電流)として取り出すことができる。さらに、本発明では、有機活性層を構成する電子供与性化合物として、少なくとも2種を用い、第1の電子供与性化合物のHOMO(最高占有分子軌道)のエネルギーレベルと第2の電子供与性化合物のHOMO(最高占有分子軌道)のエネルギーレベルとの差を0.20eV以下に設定する。かかる構成により、有機活性層の光吸収波長域を広げることができ、しかも正孔の移動も容易とすることができる。
本発明の光電変換素子は、通常、基板上に形成される。この基板は、電極を形成し、有機物の層を形成する際に化学的に変化しないものであればよい。基板の材料としては、例えば、ガラス、プラスチック、高分子フィルム、シリコン等が挙げられる。不透明な基板の場合には、反対の電極(即ち、基板から遠い方の電極)が透明又は半透明であることが好ましい。
前記の透明又は半透明の電極材料としては、導電性の金属酸化物膜、半透明の金属薄膜等が挙げられる。具体的には、例えば、酸化インジウム、酸化亜鉛、酸化スズ、及びそれらの複合体であるインジウム・スズ・オキサイド(ITO)、インジウム・亜鉛・オキサイド(IZO)、NESA等の導電性材料を用いて作製された膜や、金、白金、銀、銅等が用いられる。これら電極材料の中でも、ITO、インジウム・亜鉛・オキサイド、酸化スズが好ましい。電極の作製方法としては、真空蒸着法、スパッタリング法、イオンプレーティング法、メッキ法等が挙げられる。また、電極材料として、ポリアニリン及びその誘導体、ポリチオフェン及びその誘導体等の有機の透明導電膜を用いてもよい。
光電変換効率を向上させるための手段として有機活性層以外の付加的な中間層(電荷輸送層など)を使用しても良い。中間層として用いられる材料としては、例えば、フッ化リチウム等のアルカリ金属、アルカリ土類金属のハロゲン化物、酸化物等を用いることができる。また、酸化チタン等の無機半導体の微粒子、PEDOT(ポリ-3,4-エチレンジオキシチオフェン)などが挙げられる。
本発明の光電変換素子に含まれる有機活性層は、第1の電子供与性化合物と第2の電子供与性化合物と電子受容性化合物とを含む。前記第1の電子供与性化合物のHOMO(最高占有分子軌道)のエネルギーレベルと前記第2の電子供与性化合物のHOMO(最高占有分子軌道)のエネルギーレベルとの差が0.20eV以下である。
前記電子供与性化合物としては、例えば、ピラゾリン誘導体、アリールアミン誘導体、スチルベン誘導体、トリフェニルジアミン誘導体、オリゴチオフェン及びその誘導体、ポリビニルカルバゾール及びその誘導体、ポリシラン及びその誘導体、側鎖又は主鎖に芳香族アミンを有するポリシロキサン誘導体、ポリアニリン及びその誘導体、ポリチオフェン及びその誘導体、ポリピロール及びその誘導体、ポリフェニレンビニレン及びその誘導体、ポリチエニレンビニレン及びその誘導体等のp型半導体ポリマーが挙げられる。
さらに、好適なp型半導体ポリマーとして、下記構造式(1)で示される構造単位及び下記一般式(2)で示される構造単位の少なくとも一方の構造単位を有する有機高分子化合物を挙げることができる。
電子受容性化合物としては、例えば、オキサジアゾール誘導体、アントラキノジメタン及びその誘導体、ベンゾキノン及びその誘導体、ナフトキノン及びその誘導体、アントラキノン及びその誘導体、テトラシアノアントラキノジメタン及びその誘導体、フルオレノン誘導体、ジフェニルジシアノエチレン及びその誘導体、ジフェノキノン誘導体、8-ヒドロキシキノリン及びその誘導体の金属錯体、ポリキノリン及びその誘導体、ポリキノキサリン及びその誘導体、ポリフルオレン及びその誘導体、C60等のフラーレン類及びその誘導体、バソクプロイン等のフェナントレン誘導体、酸化チタンなどの金属酸化物、カーボンナノチューブ等が挙げられる。電子受容性化合物としては、好ましくは、酸化チタン、カーボンナノチューブ、フラーレン、フラーレン誘導体であり、特に好ましくはフラーレン、フラーレン誘導体である。
フラーレン誘導体としてはC60フラーレン誘導体、C70フラーレン誘導体、C76フラーレン誘導体、C78フラーレン誘導体、C84フラーレン誘導体が挙げられる。フラーレンの誘導体の具体的構造としては、以下のようなものが挙げられる。
有機活性層に、種々の機能を発現させるために、必要に応じて他の成分を含有させてもよい。例えば、紫外線吸収剤、酸化防止剤、吸収した光により電荷を発生させる機能を増感するためのため増感剤、紫外線からの安定性を増すための光安定剤、等が挙げられる。
また、有機活性層は、機械的特性を高めるため、本発明の電子供与性化合物及び電子受容性化合物以外の高分子化合物を高分子バインダーとして含んでいてもよい。高分子バインダーとしては、電子輸送性又はホール輸送性を阻害しないものが好ましく、また可視光に対する吸収が強くないものが好ましく用いられる。前記高分子バインダーとしては、ポリ(N-ビニルカルバゾール)、ポリアニリン及びその誘導体、ポリチオフェン及びその誘導体、ポリ(p-フェニレンビニレン)及びその誘導体、ポリ(2,5-チェニレンビニレン)及びその誘導体、ポリカーポネート、ポリアクリレート、ポリメチルアクリレート、ポリメチルメタクリレート、ポリスチレン、ポリ塩化ビニル、ポリシロキサン等が挙げられる。
本願発明では、有機活性層は、バルクへテロ型であり、上記電子供与性化合物、電子受容性化合物、および必要に応じて配合される他の成分とを含む溶液からの成膜により形成することができる。
本発明の光電変換素子は、透明又は半透明の電極から太陽光等の光を照射することにより、電極間に光起電力が発生し、有機薄膜太陽電池として動作させることができる。有機薄膜太陽電池を複数集積することにより有機薄膜太陽電池モジュールとして用いることもできる。
有機薄膜太陽電池は、従来の太陽電池モジュールと基本的には同様のモジュール構造をとりうる。太陽電池モジュールは、一般的には金属、セラミック等の支持基板の上にセルが構成され、その上を充填樹脂や保護ガラス等で覆い、支持基板の反対側から光を取り込む構造をとるが、支持基板に強化ガラス等の透明材料を用い、その上にセルを構成してその透明の支持基板側から光を取り込む構造とすることも可能である。具体的には、スーパーストレートタイプ、サブストレートタイプ、ポッティングタイプと呼ばれるモジュール構造、アモルファスシリコン太陽電池などで用いられる基板一体型モジュール構造等が知られている。本発明の有機光電変換素子を適用した有機薄膜太陽電池でも使用目的や使用場所および環境により、適宜これらのモジュール構造を選択できる。
(透明基板-透明陽極-正孔輸送層の形成)
スパッタ法にて成膜された約150nmの膜厚のITOがパターニングされてなる透明電極(陽極)を表面に有する透明ガラス基板を準備した。このガラス基板を有機溶媒、アルカリ洗剤、超純水で洗浄し、乾かした。乾かした基板にUVオゾン装置(UV-03装置、テクノビジョン社製、型番「UV-312」)にてUV-03処理を行った。
正孔輸送層材料としてポリ(3,4)エチレンジオキシチオフェン/ポリスチレンスルフォン酸(HCスタルクビーテック社製、商品名「Bytron P TP AI 4083」)の懸濁液を用意し、この懸濁液を0.5ミクロン径のフィルターでろ過した。濾過した懸濁液を、前記基板の透明電極がある面側に、スピンコートにより70nmの厚みで成膜した。得られた膜を大気環境下のホットプレート上で200℃で10分間乾燥して、透明電極上に正孔輸送層を形成した。
次に、下記構造式(3)に表される高分子化合物A(第1の電子供与性化合物)と、ポリ(3-ヘキシルチオフェン)(P3HT)(第2の電子供与性化合物)と、電子受容性化合物である[6,6]-フェニル C61 ブチリックアシッドメチルエステル([6,6]-PCBM)の重量比2:1:4のクロロベンゼン溶液を調整した。
最後に、上記基板を抵抗加熱蒸着装置内に置き、有機活性層の上部にLiFを約2.3nm制膜して電子輸送層を形成し、続いてAlを約70nmの膜厚で成膜して陰極を形成した。その後、さらに封止材としてエポキシ樹脂(急速硬化型アラルダイト)を用いて陰極上にガラス基板を接着することで封止処理を施し、有機光電変換素子を得た。
得られた光電変換素子の形状は、2mm×2mmの正四角形であった。また、得られた光電変換素子の内部量子収率は300nm~900nmの範囲で0.05以上であった。
(透明基板-透明陽極-正孔輸送層の形成)
スパッタ法にて成膜された約150nmの膜厚のITOがパターニングされてなる透明電極(陽極)を表面に有する透明ガラス基板を準備した。このガラス基板を有機溶媒、アルカリ洗剤、超純水で洗浄し、乾かした。乾かした基板にUVオゾン装置(UV-03装置、テクノビジョン社製、型番「UV-312」)にてUV-03処理を行った。
正孔輸送層材料としてポリ(3,4)エチレンジオキシチオフェン/ポリスチレンスルフォン酸(HCスタルクビーテック社製、商品名「Bytron P TP AI 4083」)の懸濁液を用意し、この懸濁液を0.5ミクロン径のフィルターでろ過した。濾過した懸濁液を、前記基板の透明電極がある面側に、スピンコートにより70nmの厚みで成膜した。得られた膜を大気環境下のホットプレート上で200℃で10分間乾燥して、透明電極上に正孔輸送層を形成した。
次に、下記構造式(4)に表される高分子化合物B(第1の電子供与性化合物)と、ポリ(3-ヘキシルチオフェン)(P3HT)(第2の電子供与性化合物)と、電子受容性化合物である[6,6]-フェニル C61 ブチリックアシッドメチルエステル([6,6]-PCBM)の重量比2:1:4のクロロベンゼン溶液を調整した。
最後に、上記基板を抵抗加熱蒸着装置内に置き、有機活性層の上部にLiFを約2.3nm制膜して電子輸送層を形成し、続いてAlを約70nmの膜厚で成膜して陰極を形成した。その後、さらに封止材としてエポキシ樹脂(急速硬化型アラルダイト)を用いて陰極上にガラス基板を接着することで封止処理を施し、有機光電変換素子を得た。
得られた光電変換素子の形状は、2mm×2mmの正四角形であった。また、得られた光電変換素子の内部量子収率は300nm~900nmの範囲で0.05以上であった。
(透明基板-透明陽極-正孔輸送層の形成)
スパッタ法にて成膜された約150nmの膜厚のITOがパターニングされてなる透明電極(陽極)を表面に有する透明ガラス基板を準備した。このガラス基板を有機溶媒、アルカリ洗剤、超純水で洗浄し、乾かした。乾かした基板にUVオゾン装置(UV-03装置、テクノビジョン社製、型番「UV-312」)にてUV-03処理を行った。
正孔輸送層材料としてポリ(3,4)エチレンジオキシチオフェン/ポリスチレンスルフォン酸(HCスタルクビーテック社製、商品名「Bytron P TP AI 4083」)の懸濁液を用意し、この懸濁液を0.5ミクロン径のフィルターでろ過した。濾過した懸濁液を、前記基板の透明電極がある面側に、スピンコートにより70nmの厚みで成膜した。得られた膜を大気環境下のホットプレート上で200℃で10分間乾燥して、透明電極上に正孔輸送層を形成した。
次に、ポリ(3-ヘキシルチオフェン)(P3HT)(電子供与性化合物)と、電子受容性化合物である[6,6]-フェニル C61 ブチリックアシッドメチルエステル([6,6]-PCBM)の重量比1:0.8のクロロベンゼン溶液を調整した。
最後に、上記基板を抵抗加熱蒸着装置内に置き、有機活性層の上部にLiFを約2.3nm制膜して電子輸送層を形成し、続いてAlを約70nmの膜厚で成膜して陰極を形成した。その後、さらに封止材としてエポキシ樹脂(急速硬化型アラルダイト)を用いて陰極上にガラス基板を接着することで封止処理を施し、有機光電変換素子を得た。
得られた光電変換素子の形状は、2mm×2mmの正四角形であった。また、得られた光電変換素子の内部量子収率は300nm~900nmの範囲で0.05未満であり、光電変換効率の波長範囲が狭い。
(透明基板-透明陽極-正孔輸送層の形成)
スパッタ法にて成膜された約150nmの膜厚のITOがパターニングされてなる透明電極(陽極)を表面に有する透明ガラス基板を準備した。このガラス基板を有機溶媒、アルカリ洗剤、超純水で洗浄し、乾かした。乾かした基板にUVオゾン装置(UV-03装置、テクノビジョン社製、型番「UV-312」)にてUV-03処理を行った。
正孔輸送層材料としてポリ(3,4)エチレンジオキシチオフェン/ポリスチレンスルフォン酸(HCスタルクビーテック社製、商品名「Bytron P TP AI 4083」)の懸濁液を用意し、この懸濁液を0.5ミクロン径のフィルターでろ過した。濾過した懸濁液を、前記基板の透明電極がある面側に、スピンコートにより70nmの厚みで成膜した。得られた膜を大気環境下のホットプレート上で200℃で10分間乾燥して、透明電極上に正孔輸送層を形成した。
次に、ポリ(2-メトキシ-5-(2’-エチルヘキシルオキシ)-1,4-フェニレンビニレン)(MEH-PPV)(第1の電子供与性化合物)と、ポリ(3-ヘキシルチオフェン)(P3HT)(第2の電子供与性化合物)と、電子受容性化合物である[6,6]-フェニル C61 ブチリックアシッドメチルエステル([6,6]-PCBM)の重量比2:1:4のクロロベンゼン溶液を調整した。
最後に、上記基板を抵抗加熱蒸着装置内に置き、有機活性層の上部にLiFを約2.3nm制膜して電子輸送層を形成し、続いてAlを約70nmの膜厚で成膜して陰極を形成した。その後、さらに封止材としてエポキシ樹脂(急速硬化型アラルダイト)を用いて陰極上にガラス基板を接着することで封止処理を施し、有機光電変換素子を得た。
得られた光電変換素子の形状は、2mm×2mmの正四角形であった。また、得られた光電変換素子の内部量子収率は300nm~900nmの範囲で0.05未満であり、光電変換効率の波長範囲が狭い。
実施例1,2および比較例1,2で得た光電変換素子の光電変換効率は、以下のようにして求めた。
得られた光電変換素子(有機薄膜太陽電池を想定:形状は、2mm×2mmの正四角形)の光電変換効率をソーラシミュレーター(分光計器製、商品名「CEP-2000型、放射照度100mW/cm2」)を用いて一定の光を照射し、発生する電流と電圧を測定した。
Claims (3)
- 陽極と、陰極と、該陽極と該陰極との間に設けられる有機活性層とを有し、有機活性層が第1の電子供与性化合物と第2の電子供与性化合物と電子受容性化合物とを含み、前記第1の電子供与性化合物のHOMO(最高占有分子軌道)のエネルギーレベルと前記第2の電子供与性化合物のHOMO(最高占有分子軌道)のエネルギーレベルとの差が0.20eV以下である有機光電変換素子。
- 第1の電子供与性化合物が、下記構造式(1)で示される構造単位及び下記一般式(2)で示される構造単位の少なくとも一方の構造単位を有する有機高分子化合物であることを特徴とする請求項1に記載の有機光電変換素子。
- 有機活性層の光吸収帯域300nmから900nmの領域で内部量子収率が0.05以上を有していることを特徴とする請求項1または2に記載の有機光電変換素子。
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WO2012070390A1 (ja) * | 2010-11-26 | 2012-05-31 | 住友化学株式会社 | 有機光電変換素子 |
US20150014597A1 (en) * | 2012-01-25 | 2015-01-15 | Council Of Scientific & Industrial Research | Coating composition for prevention of substrate oxidation |
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JP5292514B2 (ja) | 2009-05-21 | 2013-09-18 | ポリエラ コーポレイション | 共役ポリマーおよび光電子デバイスにおけるその使用 |
WO2014089066A1 (en) * | 2012-12-03 | 2014-06-12 | The University Of Akron | An organic polymer photo device with broadband response and increased photo-responsitivity |
US9484537B2 (en) * | 2013-08-28 | 2016-11-01 | Taiwan Semiconductor Manufacturing Company, Ltd. | Organic photo diode with dual electron blocking layers |
US9385348B2 (en) | 2013-08-29 | 2016-07-05 | The Regents Of The University Of Michigan | Organic electronic devices with multiple solution-processed layers |
KR20160047571A (ko) | 2013-08-29 | 2016-05-02 | 더 리젠츠 오브 더 유니버시티 오브 미시간 | 다중의 용액 가공된 층을 지닌 유기 전자 디바이스 |
JP6276602B2 (ja) * | 2014-02-03 | 2018-02-07 | 住友化学株式会社 | 有機光電変換素子 |
WO2016009693A1 (ja) * | 2014-07-17 | 2016-01-21 | ソニー株式会社 | 光電変換素子、撮像装置、光センサ及び光電変換素子の製造方法 |
GB2592685A (en) | 2020-03-06 | 2021-09-08 | Sumitomo Chemical Co | Photoactive composition |
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