WO2011026295A1 - 真空基片传送系统 - Google Patents
真空基片传送系统 Download PDFInfo
- Publication number
- WO2011026295A1 WO2011026295A1 PCT/CN2009/076037 CN2009076037W WO2011026295A1 WO 2011026295 A1 WO2011026295 A1 WO 2011026295A1 CN 2009076037 W CN2009076037 W CN 2009076037W WO 2011026295 A1 WO2011026295 A1 WO 2011026295A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- transmission
- transmission mechanism
- chamber
- sealing
- vacuum
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 79
- 230000005540 biological transmission Effects 0.000 claims abstract description 217
- 230000007246 mechanism Effects 0.000 claims abstract description 165
- 238000007789 sealing Methods 0.000 claims abstract description 72
- 238000012546 transfer Methods 0.000 claims abstract description 46
- 230000001360 synchronised effect Effects 0.000 claims abstract description 17
- 230000003749 cleanliness Effects 0.000 abstract description 6
- 238000000034 method Methods 0.000 description 16
- 230000008569 process Effects 0.000 description 15
- 238000000576 coating method Methods 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- 239000011521 glass Substances 0.000 description 5
- 238000012423 maintenance Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 238000001755 magnetron sputter deposition Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005461 lubrication Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B35/00—Transporting of glass products during their manufacture, e.g. hot glass lenses, prisms
- C03B35/14—Transporting hot glass sheets or ribbons, e.g. by heat-resistant conveyor belts or bands
- C03B35/16—Transporting hot glass sheets or ribbons, e.g. by heat-resistant conveyor belts or bands by roller conveyors
- C03B35/163—Drive means, clutches, gearing or drive speed control means
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B35/00—Transporting of glass products during their manufacture, e.g. hot glass lenses, prisms
- C03B35/14—Transporting hot glass sheets or ribbons, e.g. by heat-resistant conveyor belts or bands
- C03B35/16—Transporting hot glass sheets or ribbons, e.g. by heat-resistant conveyor belts or bands by roller conveyors
- C03B35/165—Supports or couplings for roller ends, e.g. trunions, gudgeons
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B35/00—Transporting of glass products during their manufacture, e.g. hot glass lenses, prisms
- C03B35/14—Transporting hot glass sheets or ribbons, e.g. by heat-resistant conveyor belts or bands
- C03B35/16—Transporting hot glass sheets or ribbons, e.g. by heat-resistant conveyor belts or bands by roller conveyors
- C03B35/18—Construction of the conveyor rollers ; Materials, coatings or coverings thereof
- C03B35/186—End caps, end fixtures or roller end shape designs
Definitions
- This invention relates to a substrate transfer mechanism, and more particularly to a vacuum substrate transfer system suitable for transporting substrates in a vacuum sealing system. Background technique
- LCD-TFT Liquid Crystal Display-Thin Film Transistor
- OLED Organic Light-Emitting Diode
- CVD chemical vapor deposition processes
- PVD Physical Vapor Deposition
- organic material evaporation magnetron sputtering deposition or etching processes are all required to be performed in a vacuum sealed environment. Due to the strict process requirements of such processes, it must be carried out under vacuum and in a completely clean space environment, such as the evaporation process of organic light-emitting diodes.
- the deposits are vapor-like organic substances, such as air and water vapor.
- the organic evaporation material it is easy to react with the organic evaporation material to change the composition of the deposit on the substrate and affect its luminescence effect.
- the plasma glows and then impinges on the inert gas in the space.
- the degree of ionization is brought to an avalanche state, so that a large area and a large range of impact metal targets, metal atoms or/and atomic groups are separated from the target and deposited on the substrate under magnetic guidance, but the process is not good, and the vacuum environment is insufficient.
- the coating and coating process of such a glass substrate must ensure the absolute reliability of the vacuum system of the entire process.
- the simultaneous transfer of vacuum substrates is important, and the design of vacuum substrate synchronous transfer often tests the reliability of the vacuum system used throughout the process.
- the existing vacuum substrate transfer system such as in the production line of thin film solar panels, uses a large number of rollers, ball ejector pins and suction cups in the vacuum chamber of the transfer substrate, and the transmission mechanism is complicated, in order to ensure the synchronous operation of the entire transmission system.
- the driving mechanism drives all the conveying rollers inside the chamber to rotate synchronously, and the substrate such as glass is uniformly transmitted by friction.
- the synchronizing mechanism used therein generally connects all the conveying members together in the chamber by a sprocket, a chain or a timing pulley, and a timing belt. During the transfer and processing, it is easy to cause scratches, contamination and deformation of the substrate, such as the synchronous connection between the sprocket and the chain or / and the timing belt and the timing belt. And direct physical contact increases the source of pollution from the drive mechanism and pollutes the vacuum environment.
- An object of the present invention is to provide a vacuum substrate transfer system which is highly clean, non-contaminating, simple in structure, and capable of smoothly and efficiently synchronizing the transfer of substrates and ensuring the reliability of the vacuum system to the utmost extent.
- the technical solution of the present invention is: providing a vacuum substrate transport system, comprising: a driving mechanism, a transmission mechanism, and a sealed chamber forming a vacuum environment, wherein the chamber is provided with a fixing seat, wherein
- the transmission mechanism includes an outer transmission mechanism, a plurality of sets of sealed transmission mechanisms, and a plurality of sets of internal transmission mechanisms, and the plurality of sets of the internal transmission mechanisms are parallel to the bottom of the chamber and symmetrically distributed on both sides of the chamber, the driving mechanism and the
- the external transmission mechanism is disposed outside the chamber, and the two side walls of the chamber are provided with sealing holes corresponding to the plurality of sets of internal transmission mechanisms, and the sealing transmission mechanism is installed in the sealing hole, the external transmission mechanism and One end of the sealing transmission mechanism is connected, and the internal transmission mechanism is connected to the other end of the sealing transmission mechanism,
- the internal transmission mechanism includes a transmission shaft and a transmission wheel carrying the substrate, and the transmission shaft is grounded through the ground.
- the transmission wheel is fixed at one end of the transmission shaft, and the other end of the transmission shaft is connected to the sealing transmission mechanism, the chamber Forming a substrate carrying area between the transfer wheels on both sides, the driving mechanism synchronously driving the external transmission mechanism, and the external transmission mechanism transmits power to the transmission shaft through the sealing transmission mechanism, the transmission shaft The rotation of the transfer wheel is driven.
- the sealing transmission mechanism comprises a sealed transmission gear, a sealing cover, an outer magnetic ring sleeve and an inner magnetic ring sleeve
- the sealing cover is sealingly mounted in the sealing hole
- the sealing cover has a hollow structure a protrusion
- the outer magnetic ring sleeve is sleeved on the protrusion of the sealing cover
- the sealing transmission gear is fixed on the outer magnetic ring sleeve
- the inner magnetic ring sleeve is fixedly sleeved on the transmission
- the shaft is accommodated in the convex hollow structure of the sealing cover, and the outer magnetic ring sleeve and the inner magnetic ring sleeve are respectively provided with permanent magnets.
- the outer magnetic ring sleeve and the inner magnetic ring sleeve maintain magnetic contact at all times, can maintain relative synchronous rotation, form a non-contact permanent magnet coupling structure, and simultaneously synchronize the power from the cavity by magnetic force transmission while sealing
- the internal transmission mechanism transmitted to the chamber effectively ensures the sealing performance and solves the problem of seal leakage during the power transmission process inside and outside the chamber.
- the vacuum substrate transport system further includes a sealing ring connected between the sidewall of the chamber and the sealing transmission mechanism to maintain the static sealing state of the chamber, which can effectively prevent Dust enters the vacuum chamber to improve sealing performance.
- the outer transmission mechanism includes an outer transmission gear, a driving sprocket, a driven sprocket and a chain, and the outer transmission gear and the driven sprocket are coaxially pivotally connected to the outer wall of the cavity.
- the outer transmission gear is connected to the sealing transmission mechanism, the driving sprocket is fixedly connected with the output shaft of the driving mechanism, and the chain is wound around the driving sprocket and the driven sprocket. The cooperation of the sprocket, the chain, and the gears is used to smoothly transmit power to the sealed transmission mechanism.
- the outer transmission mechanism further includes a linkage shaft and a plurality of outer transmission gears, each of the outer transmission gears being correspondingly connected to the sealing transmission mechanism, each of the outer transmission gears and the driven sprocket Both are fixed on the linkage shaft, and the outer wall of the chamber is provided with a bearing seat, and the linkage shaft is pivotally connected to the bearing housing.
- the external transmission gear can simultaneously drive the corresponding plurality of sets of sealed transmission mechanisms, thereby realizing the synchronous rotation of the plurality of internal transmission mechanisms in the chamber, so that the substrate transmission is more continuous, stable and reliable.
- the outer chamber is provided with two outer transmission mechanisms, and the driving mechanism is connected to any of the two outer transmission mechanisms, and the driving sprocket is a double-row sprocket and between two double-row sprocket wheels. Connected by a synchronous chain. Simultaneously driving the external transmission mechanism by the same driving mechanism enables the internal transmission mechanism in the chamber to fully and effectively realize synchronous rotation, thereby enabling the substrate to be transported more efficiently and smoothly, and enhancing the reliability of the synchronous transmission of the vacuum transmission system.
- the transfer wheel has a stepped shape with a high-order surface and a low-order surface.
- the substrate is carried on the transfer wheel, and on the one hand, the low step surface of the transfer wheel can effectively support the substrate, on the other hand,
- the wall surface formed between the high step surface of the transfer wheel and the low step surface can limit the substrate, can effectively prevent the substrate from shifting during the transfer process, and the sheet conveyance is more stable and reliable.
- the drive mechanism is a servo motor.
- the servo motor has fast response speed and high precision, and can smoothly and quickly convert the input control voltage signal into the mechanical output on the motor shaft, so that the substrate is fast, efficient, accurate, stable and reliable in the process of synchronous transmission.
- the sealing transmission mechanism is provided in the vacuum substrate conveying system of the present invention. a seal is received in the sealing hole of the side wall of the chamber, the internal transmission mechanism is disposed in the chamber, the driving mechanism drives the external transmission mechanism, and the external transmission mechanism is transmitted through the sealing transmission mechanism Power is applied to the internal transmission mechanism, and an external transmission mechanism for synchronously driving the sealed transmission mechanism is disposed outside the chamber for convenient maintenance and maintenance; the internal transmission mechanism includes a transmission shaft and a transmission wheel, and the structure is simple and compact, and the transmission wheel is used.
- the substrate is transported to minimize the transmission components in the vacuum chamber, and the contamination of the clean vacuum chamber by the direct physical contact of the transmission component or the lubrication of the transmission component is minimized, thereby solving the problem that the transmission mechanism itself is introduced into the vacuum system.
- the problem has greatly improved the cleanliness. Since the vacuum substrate transfer system of the present invention has high cleanliness, no pollution, and a simple and compact structure, it can smoothly and efficiently transfer substrates synchronously, and to ensure the reliability of the vacuum system to the utmost. Therefore, it is suitable for transmission lines with high requirements on vacuum environment, and is especially suitable for vacuum coating and coating processes of large-sized glass substrates such as LCD-TFT displays, organic light-emitting display devices (OLED) panels, and thin film solar panels.
- FIG. 1 is a perspective view of a vacuum substrate transfer system of the present invention.
- Figure 2 is a cross-sectional view of the vacuum substrate transfer system of Figure 1.
- Figure 3 is an enlarged schematic view of a portion A of Figure 2.
- the present invention discloses a vacuum substrate transport system including a closed chamber 100 for forming a vacuum environment, a drive mechanism 200, an external transmission mechanism 300, a seal transmission mechanism 400, and an internal transmission mechanism 500.
- the driving mechanism 200 and the external transmission mechanism 300 are both disposed outside the vacuum chamber 100.
- the sealing transmission mechanism 400 is disposed on the sidewall of the chamber 100, and the external transmission is taken by the sealing transmission mechanism 400.
- the power of the mechanism 300 is transmitted to the internal transmission mechanism 500, and the internal transmission mechanism 500 for conveying the substrate 600 is disposed in the chamber 100.
- the internal transmission mechanism 500 includes a transmission shaft 502 and a transmission wheel 504 through the transmission wheel 504.
- the substrate 600 is transferred to minimize the transmission components in the vacuum chamber 100, which solves the problem that the transmission mechanism itself introduces contamination of the vacuum system, and greatly improves the cleanliness.
- the vacuum substrate conveying system of the invention has high cleanliness, no pollution, simple and compact structure, can synchronously and efficiently transfer the substrate 600 synchronously, and ensures the reliability of the vacuum system to the utmost extent, so it is more suitable for the vacuum environment.
- the transmission line is especially suitable for vacuum coating and coating processes of large-sized glass substrates such as LCD-TFT displays, organic light-emitting display devices (OLED) panels, and thin film solar panels.
- the closed chamber 100 of the vacuum substrate transport system is a transfer chamber 100 of any linear production apparatus or any coating, coating chamber including a linear conveyor, the shape and size of the chamber 100
- the cavity 100 is formed by the main body 102 and the cavity cover 104.
- the two sides of the cavity 100 are provided with a fixing seat 106.
- the two sides of the cavity 100 are provided with bearing housings 108 on both sides of the fixing base 106.
- the two sidewalls of the chamber 100 between the fixing base 106 and the bearing housing 108 are respectively provided with two rows respectively corresponding to the sealing holes 110.
- the transmission mechanism of the vacuum substrate transport system includes an outer transmission mechanism 300, a plurality of sets of sealed transmission mechanisms 400, and a plurality of sets of internal transmission mechanisms 500.
- the plurality of sets of the internal transmission mechanisms 500 are parallel and symmetrically distributed with the bottom of the chamber 100.
- the inner side of the chamber 100 is provided with a sealing hole 110 corresponding to the plurality of sets of the inner transmission mechanism 500, and the sealing transmission mechanism 400 is installed in the sealing hole 110.
- the transmission mechanism 300 is coupled to one end of the seal transmission mechanism 400, and the internal transmission mechanism 500 is coupled to the other end of the seal transmission mechanism 400.
- the internal transmission mechanism 500 includes a transmission shaft 502 and a transfer wheel carrying the substrate 600. 504, the transmission shaft 502 is pivotally grounded through the fixing base 106, the transmission wheel 504 is fixed to one end of the transmission shaft 502, and the other end of the transmission shaft 502 is connected to the sealing transmission mechanism 400.
- a substrate carrying area is formed between the 504, the driving mechanism 200 synchronously drives the external transmission mechanism 300, and the external transmission mechanism 300 transmits power to the transmission shaft 502 through the sealing transmission mechanism 400, and the transmission shaft 502 drives the transmission wheel 504 to rotate, thereby realizing the bearing
- the transfer of the substrate 600 on the transfer wheel 504 is described.
- the transfer wheel 504 is stepped and has a high-order surface and a low-order surface.
- the substrate 600 is carried on the transfer wheel 504.
- the low step surface of the transfer wheel 504 can effectively support the substrate 600
- the high step surface of the transfer wheel 504 and the low step surface The wall formed therebetween can limit the substrate 600, can effectively prevent the substrate 600 from shifting during the transfer process, and make the substrate 600 transfer more stable and reliable.
- the sealing transmission mechanism 400 includes a sealed transmission gear 402, a sealing cover 404, an outer magnetic ring sleeve 406 and an inner magnetic ring sleeve 408.
- the sealing cover 404 is sealingly mounted in the sealing hole 110.
- the sealing cover 404 has a hollow structure, the hollow portion is in communication with the chamber 100, the outer magnetic ring sleeve 406 is fixedly sleeved on the protrusion of the sealing cover 404, and the sealed transmission gear 402 is fixed at
- the outer magnetic ring sleeve 408 is fixedly sleeved on the transmission shaft 502 and received in the hollow structure of the sealing cover 404, the outer magnetic ring sleeve 406 and the inner magnetic ring
- the sleeves 408 are each provided with a permanent magnet 410.
- the vacuum substrate transport system further includes a sealing ring 412.
- the sealing ring 412 is a 0-type sealing ring disposed between the sealing cover 404 and the side wall of the chamber 100, and the sealing cover 404 is screwed.
- the 0-ring seal 412 is pressed against the chamber 100 to maintain the chamber 100 in a static sealed state, thereby effectively preventing dust from entering the vacuum chamber 100 and improving the sealing performance.
- the outer transmission mechanism 300 includes a plurality of outer transmission gears 302, a drive sprocket 304, a driven sprocket 306, a chain 308, and a linkage shaft 310, and the plurality of outer transmission gears 302 and the plurality of The sealing transmission gear 402 of the sealing transmission mechanism 400 is correspondingly engaged.
- the linkage shaft 310 is pivotally connected to the outer wall bearing housing 108 of the chamber 100, and the plurality of outer transmission gears 302 are coaxially fixed with the driven sprocket 306.
- the driving sprocket 304 On the linkage shaft 310, the driving sprocket 304 is located below the driven sprocket 306, and two Between the two, the chain 308 is wound on the driven sprocket 306 and the driving sprocket 304.
- the driving sprocket 304 is fixedly connected to the output shaft of the driving mechanism 200.
- the driving sprocket 304 is connected.
- the driven sprocket 306 is rotated by the chain 308. The power is smoothly transmitted to the sealed transmission mechanism by cooperation of the sprocket, the chain, and the gear.
- a plurality of the outer transmission gears 302 can simultaneously drive the corresponding plurality of sets of the sealing transmission mechanisms 400, thereby achieving synchronous rotation of the plurality of sets of internal transmission mechanisms 500 in the chamber 100, so that the substrate 600 is more continuously and stably transmitted. .
- two outer transmission mechanisms 300 are disposed on the outer sides of the chamber 100, and the driving mechanism 200 is connected to any one of the two external transmission mechanisms 300.
- the driving mechanism 200 drives the two external transmission mechanisms 300 to move synchronously.
- the driving sprocket 304 of the external transmission mechanism 300 is a double-row sprocket, and a sprocket of the driving sprocket 304 passes.
- the chain 308 is coupled to the driven sprocket 306, and the other sprocket is coupled to one of the sprocket wheels of the drive sprocket 304 on the other side of the chamber 100 via a timing chain 312.
- the internal transmission mechanism 500 in the chamber 100 is fully and effectively synchronized, thereby enabling the substrate 600 to be transferred more efficiently and smoothly, and the vacuum substrate conveying system is enhanced.
- the reliability of synchronous transmission can be understood that the external transmission mechanism 300 can employ other forms of transmission, such as pulleys, timing belts or gear sets, and the like, any of which can be coupled to the drive mechanism 200 and can transmit power to the seal transmission mechanism 400.
- the drive train can be used in the outer drive of the present invention.
- the drive mechanism 200 is a servo motor.
- the servo motor has fast response speed and high precision, and can smoothly and quickly convert the input control voltage signal into the mechanical output on the motor shaft, so that the substrate 600 is fast, efficient, accurate, stable and reliable in the process of synchronous transmission.
- the external drive mechanism 300 located on the side of the chamber 100 is driven by the control drive mechanism 200.
- the main chain moving wheel 304 and the synchronous chain 312 drive the driving sprocket 304 on the other side of the chamber 100 to rotate synchronously.
- the driving sprocket 304 drives the driven sprocket 306 through the chain 308.
- the driven sprocket 306 coaxially drives multiple The outer drive gear 302 rotates, and the outer magnetic ring sleeve 406 in the seal transmission mechanism 400 is sealed by meshing with the plurality of seal transmission gears 402, respectively.
- the end of the cover 404 is pivoted, and the permanent magnet 410 on the outer magnetic ring sleeve 406 is in magnetic contact with the permanent magnet 410 on the inner magnetic ring sleeve, and the inner magnetic ring sleeve 408 is made relative to the outer magnetic ring sleeve 406 by magnetic force.
- the same speed rotation in the same direction or in the opposite direction which in turn drives the inner transmission shaft 502 to rotate synchronously, so that the transmission wheels 504 on both sides of the chamber 100 rotate with the corresponding transmission shaft 502 to continuously and smoothly transfer the substrate 600.
- the sealing transmission mechanism 400 is disposed at On the side wall of the chamber 100, the internal transmission mechanism 500 is disposed in the chamber 100, and the two external transmission mechanisms 300 are disposed outside the chamber 100 for convenient maintenance and maintenance; the internal transmission mechanism 500 includes a transmission shaft 502 and a transmission wheel. 504, the structure is simple and compact, and the substrate 600 is conveyed by the transfer wheel 504 to minimize the transmission components in the vacuum chamber 100, thereby minimizing the direct physical contact of the transmission component or the lubrication of the transmission component to the clean vacuum chamber.
- the vacuum substrate transfer system is highly clean, non-contaminating, and simple and compact in structure, ensuring smooth, efficient and efficient simultaneous transfer of the substrate 600, and maximizing the reliability of the vacuum system.
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Description
真空基片传送系统
技术领域
本发明涉及一种基片的传送机构， 尤其涉及一种适用于在真空密封系统中 传送基片的真空基片传送系统。 背景技术
随着科学技术的迅猛发展， 对工业工艺要求日益增高， 真空技术在高科技 产业化的发展中展现出广阔的应用前景， 尤其体现在对真空环境要求极高的数 码显示面板产业中。 玻璃基片材料等薄板广泛应用于薄膜晶体管显示屏
( LCD-TFT, Liquid Crystal Display-Thin Film Transistor ), 有机发光显示器件 ( OLED, Organic Light-Emitting Diode )面板、 薄膜太阳能面板应用及其他类似 者的制程中， 其中化学气相沉积制程（CVD, Chemical Vapor Deposition ), 物理 气相沉积制程沪 （PVD, Physical Vapor Deposition ), 有机物质蒸镀、 磁控溅射 沉积或蚀刻制程均需要在真空密封环境下进行。 由于此类制程的工艺要求比较 严格， 即必须在真空状态下以及完全洁净的空间环境中进行， 如有机发光二极 管的蒸镀制程， 其沉积物为呈蒸汽状的有机物质， 如有空气、 水汽等存在的话 极易与有机蒸镀材料发生反应进而改变基片上的沉积物成分， 影响其发光效应； 再如， 磁控溅射沉积制程过程中， 等离子体辉光放电后相互撞击空间内惰性气 体使离子化程度达到雪崩状态， 从而大面积、 大范围的撞击金属靶材， 金属原 子或 /和原子团脱离靶材在磁力引导下沉积到基底上， 然此过程如密封不好、 真 空环境不足将严重影响辉光放电的程度， 同时空气中的氧气和水汽也会将靶材 侵蚀， 导致磁控溅射制程中断或 /和沉积薄膜受到影响； 类此种种玻璃等基片的 镀膜、 覆膜制程， 都必须要保证整个制程的真空系统的绝对可靠性。 在此类制 程中， 真空基片的同步传送就凸显了重要意义， 真空基片同步传送的设计往往 考验着用于整个制程的真空系统的可靠性。 现有的真空基片传送系统， 如在薄 膜太阳能电池板的生产线中， 传送基片的真空腔室内釆用大量的滚轮、 滚珠顶 杆和吸盘， 传动机构复杂， 为了保证整个传送系统的同步运行， 一般釆用一个
驱动机构带动腔室内部的所有传送滚轮同步转动， 利用摩擦力匀速传送玻璃等 基片。 其中釆用的同步机构一般为在腔室内用链轮、 链条或同步带轮、 同步带 将所有的传送部件联系在一起。 在传送和加工过程中， 很容易使基片出现刮伤、 污染和变形等缺陷， 此种腔室内部的同步联系方式， 由于链轮与链条或 /和同步 带轮与同步带间的相对运动以及直接的物理接触会使来自驱动机构的污染源增 多， 给真空环境带来污染。
因此， 有必要提供一种高清洁度、 无污染、 结构简单紧凑、 能够平稳、 快 速有效地同步传送基片以及具有较高可靠性的真空基片传送系统。 发明内容
本发明的目的是提供一种高清洁度、 无污染、 结构简单同时能够平稳、 快 速有效地同步传送基片以及能最大限度的确保真空系统的可靠性的真空基片传 送系统。
为实现上述目的， 本发明的技术方案为： 提供了一种真空基片传送系统， 包括驱动机构、 传动机构、 形成真空环境的密闭腔室， 所述腔室内设有固定座， 其中， 所述传动机构包括外传动机构、 多组密封传动机构以及多组内传动机构 , 多组所述内传动机构与所述腔室底部平行并对称分布在所述腔室内两侧， 所述 驱动机构与所述外传动机构设置在所述腔室外， 所述腔室两侧壁对应所述多组 内传动机构开设有密封孔， 所述密封传动机构安装在所述密封孔中， 所述外传 动机构与所述密封传动机构的一端相连， 所述内传动机构与所述密封传动机构 的另一端相连， 所述内传动机构包括传动轴和承载基片的传送轮， 所述传动轴 枢接地穿过所述固定座， 所述传送轮固定在所述传动轴的一端， 所述传动轴的 另一端连接所述密封传动机构， 所述腔室内两侧的所述传送轮之间形成基片承 载区， 所述驱动机构同步驱动所述外传动机构， 所述外传动机构通过所述密封 传动机构传送动力给所述传动轴， 所述传动轴带动所述传送轮转动。
较佳地， 所述密封传动机构包括密封传动齿轮、 密封盖、 外磁环套以及内 磁环套， 所述密封盖密封的安装于所述密封孔中， 所述密封盖具有中空结构的
凸起， 所述外磁环套固定套设在所述密封盖的凸起上， 所述密封传动齿轮固定 在所述外磁环套上， 所述内磁环套固定套设在所述传动轴上并容置于所述密封 盖的凸起的中空结构内， 所述外磁环套与所述内磁环套均设有永磁体。 所述外 磁环套和所述内磁环套时刻保持磁联系， 能够维持相对的同步转动， 形成无接 触式永磁联轴结构， 在密封的同时， 通过磁力传动把来自腔室外的动力同步传 送给腔室内的内传动机构， 有效保证了密封性能， 解决了腔室内外动力传动过 程中的密封泄露问题。
较佳地， 所述真空基片传送系统还包括密封圈， 所述密封圈连接于所述腔 室侧壁与所述密封传动机构之间， 使所述腔室保持静密封状态， 能有效防止灰 尘进入真空腔室内， 提高密封性能。
较佳地， 所述外传动机构包括外传动齿轮、 主动链轮、 从动链轮以及链条， 所述外传动齿轮与所述从动链轮同轴枢接在所述腔室外壁上， 所述外传动齿轮 与所述密封传动机构相连， 所述主动链轮与所述驱动机构的输出轴固定连接， 所述链条缠绕于所述主动链轮与所述从动链轮上。 利用链轮、 链条、 齿轮的配 合协作将动力平稳传送给所述密封传动机构。 更具体地， 所述外传动机构还包 括联动轴和多个外传动齿轮， 各所述外传动齿轮与所述密封传动机构——对应 相连， 各所述外传动齿轮与所述从动链轮均固定在所述联动轴上， 所述腔室外 壁设有轴承座， 所述联动轴枢接在所述轴承座上。 通过同轴设计， 所述外传动 齿轮能同时驱动对应的多组密封传动机构， 从而实现腔室内多组内传动机构的 同步转动， 使得基片传送更连续平稳可靠。
较佳地， 所述腔室外设有两所述外传动机构， 所述驱动机构与所述两外传 动机构任一相连， 所述主动链轮为双排链轮， 两双排链轮之间通过同步链条相 连。 通过同一驱动机构同步驱动所述外传动机构， 使所述腔室内的内传动机构 充分有效地实现同步转动， 从而能更有效平稳地传送基片， 增强所述真空传动 系统同步传送的可靠性。
较佳地， 所述传送轮呈阶梯状， 具有高阶面和低阶面。 所述基片承载于所 述传送轮上， 一方面， 所述传送轮的低台阶面能有效支撑所述基片， 另一方面，
所述传送轮的高台阶面与所述低台阶面之间形成的壁面能对所述基片起限位作 用， 能有效防止基片在传送过程中发生偏移， 片传送更加平稳可靠。
较佳地， 所述驱动机构为伺服电机。 伺服电机响应速度快、 精度高， 能将 输入的控制电压信号平稳快速转换为电机轴上的机械输出量， 使得基片在同步 传送的过程中快速有效、 精确且平稳可靠。
与现有技术相比， 由于本发明的真空基片传送系统中用于提供动力的驱动 机构和用于传递驱动机构输出动力的外传动机构均设置在所述真空腔室外， 所 述密封传动机构密封容置在所述腔室侧壁的密封孔中， 所述内传动机构设置在 所述腔室内， 所述驱动机构驱动所述外传动机构， 所述外传动机构通过所述密 封传动机构传送动力给所述内传动机构， 用于同步带动密封传动机构的外传动 机构设置在腔室外部， 方便维修和保养； 所述内传动机构包括传动轴和传送轮， 结构简单紧凑， 通过传送轮来传送基片， 使真空腔室内的传动部件达到最少， 最大限度地避免因传动部件的直接物理接触或传动部件的润滑而给洁净真空腔 室带来污染， 解决了传动机构本身引入真空系统污染的问题， 大大的提高了清 洁度。 由于本发明真空基片传送系统高清洁度、 无污染、 结构简单紧凑， 能够 平稳、 快速有效地同步传送基片， 以及最大限度的确保真空系统的可靠性。 因 此比较适用于对真空环境要求高的传送线上， 尤其适合于 LCD-TFT显示屏、 有 机发光显示器件 ( OLED )面板、薄膜太阳能面板等大尺寸玻璃基材的真空镀膜、 覆膜制程。 附图说明
图 1为本发明真空基片传送系统的立体示意图。
图 2为图 1所示真空基片传送系统的截面图。
图 3为图 2中 A部分的放大示意图。 具体实施方式
为了详细说明本发明的技术内容、 构造特征， 以下结合实施方式并配合附
图作进一步说明， 其中不同图中相同的标号代表相同的部件。 如图 1-3所示， 本 发明公开了一种真空基片传送系统， 包括用于形成真空环境的密闭腔室 100、驱 动机构 200、 外传动机构 300、 密封传动机构 400以及内传动机构 500, 所述驱 动机构 200与外传动机构 300均设置在真空腔室 100外，所述密封传动机构 400 设置在所述腔室 100侧壁上， 通过所述密封传动机构 400把来自所述外传动机 构 300的动力传送给所述内传动机构 500, 用于传送基片 600的内传动机构 500 设置在腔室 100内， 所述内传动机构 500包括传动轴 502和传送轮 504, 通过传 送轮 504来传送基片 600, 使真空腔室 100内的传动部件达到最少， 解决了传动 机构本身引入真空系统污染的问题， 大大的提高了清洁度。 本发明真空基片传 送系统高清洁度、 无污染、 结构简单紧凑， 能够平稳、 快速有效地同步传送基 片 600, 以及最大限度的确保真空系统的可靠性， 因此比较适用于对真空环境要 求高的传送线上， 尤其适合于 LCD-TFT显示屏、 有机发光显示器件（OLED ) 面板、 薄膜太阳能面板等大尺寸玻璃基片的真空镀膜、 覆膜制程。
参考图 1-2, 所述真空基片传送系统的密闭腔室 100为任何直线型生产设备 的传送腔室 100或任何包括线型传送装置的覆膜、 镀膜腔室， 腔室 100形状和 大小不固定， 所述腔室 100由主体 102和腔盖 104配合形成， 所述腔室 100内 两侧设置有固定座 106, 所述腔室 100外对应固定座 106的两侧设置有轴承座 108, 所述腔室 100的位于所述固定座 106与所述轴承座 108之间的两侧壁开设 有两排分别——对应的密封孔 110。所述真空基片传送系统的传动机构包括外传 动机构 300、 多组密封传动机构 400以及多组内传动机构 500 , 多组所述内传动 机构 500与所述腔室 100底部平行并对称分布在所述腔室 100内两侧， 所述腔 室 100两侧壁对应多组所述内传动机构 500开设有密封孔 110,所述密封传动机 构 400安装在所述密封孔 110中，所述外传动机构 300与所述密封传动机构 400 的一端相连， 所述内传动机构 500与所述密封传动机构 400的另一端相连， 所 述内传动机构 500包括传动轴 502和承载基片 600的传送轮 504, 所述传动轴 502枢接地穿过所述固定座 106, 所述传送轮 504固定在传动轴 502的一端， 传 动轴 502另一端连接所述密封传动机构 400,所述腔室 100内两侧的所述传送轮
504之间形成基片承载区， 驱动机构 200同步驱动外传动机构 300, 外传动机构 300通过密封传动机构 400传送动力给传动轴 502, 传动轴 502带动传送轮 504 转动， 从而实现对承载于所述传送轮 504上的基片 600的传送。
较佳地， 所述传送轮 504呈阶梯状， 具有高阶面和低阶面。 基片 600承载 于所述传送轮 504上， 一方面， 所述传送轮 504的低台阶面能有效支撑所述基 片 600, 另一方面， 传送轮 504的高台阶面与所述低台阶面之间形成的壁面能对 基片 600起限位作用， 能有效防止基片 600在传送过程中发生偏移，使基片 600 传送更加平稳可靠。
较佳地， 参考图 3 , 所述密封传动机构 400包括密封传动齿轮 402、 密封盖 404、外磁环套 406以及内磁环套 408,所述密封盖 404密封的安装于密封孔 110 中， 所述密封盖 404具有中空结构的凸起， 该中空部分与所述腔室 100相通， 所述外磁环套 406固定套设在密封盖 404的凸起上， 所述密封传动齿轮 402固 定在所述外磁环套 406上， 所述内磁环套 408固定套设在所述传动轴 502上并 容置于密封盖 404中空结构内， 所述外磁环套 406与所述内磁环套 408均设有 永磁体 410。 由于永磁体 410相互之间的引力和斥力的作用，使外磁环套 406和 内磁环套 408 时刻保持磁联系， 能够维持相对的同步转动， 形成无接触式永磁 联轴结构， 在密封的同时， 通过磁力传动把来自腔室 100外的动力同步传送给 腔室 100内的内传动机构 500, 有效保证了密封性能， 解决了腔室内外动力传动 过程中的密封泄露问题。 较佳地， 所述真空基片传送系统还包括密封圈 412, 所 述密封圈 412为 0型密封圈， 设置在密封盖 404与腔室 100侧壁之间， 通过螺 钉将所述密封盖 404与 0型密封圈 412压在腔室 100上， 使腔室 100保持静密 封状态， 从而有效防止灰尘进入真空腔室 100内， 提高密封性能。
较佳地， 所述外传动机构 300包括多个外传动齿轮 302、 主动链轮 304、 从 动链轮 306、 链条 308以及联动轴 310, 多个所述外传动齿轮 302分别与多个所 述密封传动机构 400的密封传动齿轮 402——对应啮合， 所述联动轴 310枢接 在腔室 100外壁轴承座 108中， 多个所述外传动齿轮 302与所述从动链轮 306 同轴固定在联动轴 310上， 所述主动链轮 304位于从动链轮 306的下方， 且两
者之间通过链条 308连接， 所述链条 308缠绕于从动链轮 306和主动链轮 304 上， 所述主动链轮 304与所述驱动机构 200的输出轴固定连接， 所述主动链轮 304由驱动机构 200驱动， 并通过所述链条 308带动从动链轮 306转动。 通过利 用链轮、 链条、 齿轮的配合协作将动力平稳传送给所述密封传动机构。 通过同 轴设计， 多个所述外传动齿轮 302能同时驱动对应的多组密封传动机构 400, 从 而实现腔室 100内多组内传动机构 500的同步转动， 使得基片 600传送更连续 平稳可靠。
在本发明的实施例中， 所述腔室 100外两侧设有两所述外传动机构 300, 所 述驱动机构 200与两所述外传动机构 300任一相连， 两所述外传动机构 300之 间通过同步链条 312连接， 驱动机构 200驱动两外传动机构 300同步运动， 其 中， 所述外传动机构 300的主动链轮 304为双排链轮， 所述主动链轮 304的一 链轮通过链条 308与从动链轮 306相连，另一链轮通过同步链条 312与腔室 100 另一侧的主动链轮 304的其一链轮相连。 通过同一驱动机构 200同步驱动所述 外传动机构 300, 使腔室 100内的内传动机构 500充分有效地实现同步转动，从 而能更有效平稳地传送基片 600, 增强所述真空基片传送系统同步传送的可靠 性。 可以理解地， 所述外传动机构 300可以釆用其他形式的传动， 例如带轮、 同步带或齿轮组等其他组合， 任何可以与所述驱动机构 200相连并可以将动力 传送给密封传动机构 400的传动组均可用于本发明的外传动中。
较佳地， 所述驱动机构 200为伺服电机。 伺服电机响应速度快、 精度高， 能将输入的控制电压信号平稳快速转换为电机轴上的机械输出量，使得基片 600 在同步传送的过程中快速有效、 精确且平稳可靠。
以下对本发明真空基片传送系统的工作原理做进一步详细的说明： 在本发明真空基片传送系统的传动过程中， 通过控制驱动机构 200驱动位 于所述腔室 100—侧的外传动机构 300中的主链动轮 304,同步链条 312带动腔 室 100另一侧的主动链轮 304同步转动， 所述主动链轮 304通过链条 308带动 从动链轮 306,从动链轮 306同轴带动多个外传动齿轮 302转动， 通过分别与多 个密封传动齿轮 402的啮合使所述密封传动机构 400中的外磁环套 406以密封
盖 404端部为轴转动， 所述外磁环套 406上的永磁体 410与内磁环套上的永磁 体 410保持磁力联系， 通过磁力作用使内磁环套 408相对外磁环套 406做同向 或反向的同速转动， 继而带动内传动轴 502同步转动， 从而实现腔室 100内两 侧的传动轮 504随相应的传动轴 502—起转动， 连续平稳地传送基片 600。 由于 本发明的真空基片传送系统中用于提供动力的驱动机构 200和用于传递驱动机 构输出动力的外传动机构 300均设置在所述真空腔室 100外， 所述密封传动机 构 400设置在腔室 100侧壁上， 所述内传动机构 500设置在腔室 100内， 两外 传动机构 300设置在腔室 100外部， 方便维修和保养； 所述内传动机构 500包 括传动轴 502和传送轮 504, 结构简单紧凑， 通过传送轮 504来传送基片 600, 使真空腔室 100 内的传动部件达到最少， 最大限度地避免因传动部件的直接物 理接触或传动部件的润滑而给洁净真空腔室 100 带来污染， 解决了传动机构本 身引入真空系统污染的问题， 大大的提高了清洁度。 所述真空基片传送系统高 清洁度、 无污染、 结构简单紧凑， 能够保证基片 600平稳、 快速有效的同步传 送， 以及最大限度的确保真空系统的可靠性。
本发明真空基片传送系统所涉及的密封传动机构的磁力工作原理为本领域 普通技术人员所熟知， 在此不再做详细的说明。
以上所揭露的仅为本发明的较佳实例而已， 当然不能以此来限定本发明之 权利范围， 因此依本发明权利要求所作的等同变化， 仍属于本发明所涵盖的范 围。
Claims
1.一种真空基片传送系统， 包括驱动机构、 传动机构、 形成真空环境的密闭 腔室， 所述腔室内设有固定座， 其特征在于： 所述传动机构包括外传动机构、 多组密封传动机构以及多组内传动机构， 多组所述内传动机构与所述腔室底部 平行并对称分布在所述腔室内两侧， 所述驱动机构与所述外传动机构设置在所 述腔室外， 所述腔室两侧壁对应所述多组内传动机构开设有密封孔， 所述密封 传动机构安装在所述密封孔中， 所述外传动机构与所述密封传动机构的一端相 连， 所述内传动机构与所述密封传动机构的另一端相连， 所述内传动机构包括 传动轴和承载基片的传送轮， 所述传动轴枢接地穿过所述固定座， 所述传送轮 固定在所述传动轴的一端， 所述传动轴的另一端连接所述密封传动机构， 所述 腔室内两侧的所述传送轮之间形成基片承载区， 所述驱动机构同步驱动所述外 传动机构， 所述外传动机构通过所述密封传动机构传送动力给所述传动轴， 所 述传动轴带动所述传送轮转动。
2.如权利要求 1所述的真空基片传送系统， 其特征在于： 所述密封传动机构 包括密封传动齿轮、 密封盖、 外磁环套以及内磁环套， 所述密封盖密封的安装 于所述密封孔中， 所述密封盖具有中空结构的凸起， 所述外磁环套固定套设在 所述密封盖的凸起上， 所述密封传动齿轮固定在所述外磁环套上， 所述内磁环 套固定套设在所述传动轴上并容置于所述密封盖的凸起的中空结构内， 所述外 磁环套与所述内磁环套均设有永磁体。
3.如权利要求 1所述的真空基片传送系统， 其特征在于： 所述真空基片传送 系统还包括密封圈， 所述密封圈连接于所述腔室侧壁与所述密封传动机构之间。
4.如权利要求 1所述的真空基片传送系统， 其特征在于： 所述外传动机构包 括外传动齿轮、 主动链轮、 从动链轮以及链条， 所述外传动齿轮与所述从动链 轮同轴枢接在所述腔室外壁上， 所述外传动齿轮与所述密封传动机构相连， 所 述主动链轮与所述驱动机构的输出轴固定连接， 所述链条缠绕于所述主动链轮 与所述从动链轮上。
5.如权利要求 4所述的真空基片传送系统， 其特征在于： 所述外传动机构还 包括联动轴和多个外传动齿轮， 各所述外传动齿轮与所述密封传动机构一一对 应相连， 各所述外传动齿轮与所述从动链轮均固定在所述联动轴上， 所述腔室 外壁设有轴承座， 所述联动轴枢接在所述轴承座上。
6.如权利要求 4所述的真空基片传送系统， 其特征在于： 所述腔室外设有两 所述外传动机构， 所述驱动机构与所述两外传动机构任一相连， 所述主动链轮 为双排链轮， 两双排链轮之间通过同步链条相连。
7.如权利要求 1所述的真空基片传送系统， 其特征在于： 所述传送轮呈阶梯 状。
8.如权利要求 1所述的真空基片传送系统， 其特征在于： 所述驱动机构为伺 服电机。
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| CN200910192013A CN101648649B (zh) | 2009-09-03 | 2009-09-03 | 真空基片传送系统 |
| CN200910192013.2 | 2009-09-03 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101826452B (zh) * | 2010-03-30 | 2011-09-07 | 东莞宏威数码机械有限公司 | 基片上载装置 |
| CN102674005A (zh) * | 2011-03-14 | 2012-09-19 | 无锡康力电子有限公司 | 电子级超薄玻璃清洗设备用传送装置 |
| CN103043441A (zh) * | 2011-10-14 | 2013-04-17 | 黄正栋 | 传动装置 |
| CN102560443A (zh) * | 2011-12-31 | 2012-07-11 | 汉能科技有限公司 | 一种工艺腔传输控制系统 |
| CN105448767B (zh) * | 2014-06-03 | 2018-02-13 | 上海理想万里晖薄膜设备有限公司 | 实现基板正交传送的真空搬运装置及其搬运方法 |
| CN106044048A (zh) * | 2016-07-29 | 2016-10-26 | 芜湖鸣人热能设备有限公司 | 钢板运输装置 |
| CN106746720B (zh) * | 2016-12-02 | 2019-01-22 | 徐州市凯诺机械有限公司 | 一种玻璃基板镀膜机构 |
| CN108639659A (zh) * | 2018-06-19 | 2018-10-12 | 江苏港星方能超声洗净科技有限公司 | 直通式真空装置 |
| CN110079791A (zh) * | 2019-04-25 | 2019-08-02 | 北京捷造光电技术有限公司 | 一种用于pecvd反应区的伸缩式滚轮传输结构 |
| CN112606287B (zh) * | 2020-10-23 | 2022-06-07 | 浙江中科玖源新材料有限公司 | 一种聚酰亚胺流延膜干燥设备 |
| CN112093378B (zh) * | 2020-11-10 | 2021-01-29 | 山东金宜善新材料有限公司 | 四溴双酚a离心物料上料装置 |
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- 2009-09-03 CN CN200910192013A patent/CN101648649B/zh not_active Expired - Fee Related
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| CN101648649A (zh) | 2010-02-17 |
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