US20070296134A1 - Substrate transporting mechanism, substrate transporting method and substrate processing system - Google Patents
Substrate transporting mechanism, substrate transporting method and substrate processing system Download PDFInfo
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- US20070296134A1 US20070296134A1 US11/686,992 US68699207A US2007296134A1 US 20070296134 A1 US20070296134 A1 US 20070296134A1 US 68699207 A US68699207 A US 68699207A US 2007296134 A1 US2007296134 A1 US 2007296134A1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67236—Apparatus for manufacturing or treating in a plurality of work-stations the substrates being processed being not semiconductor wafers, e.g. leadframes or chips
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
- B65G49/063—Transporting devices for sheet glass
- B65G49/064—Transporting devices for sheet glass in a horizontal position
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
- B65G49/067—Sheet handling, means, e.g. manipulators, devices for turning or tilting sheet glass
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67201—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the load-lock chamber
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67709—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations using magnetic elements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67736—Loading to or unloading from a conveyor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
- B65G2249/02—Controlled or contamination-free environments or clean space conditions
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The present invention provides a substrate transporting mechanism and a substrate transporting method, in which driving force can be separated or combined together without using a mechanical synchronizing mechanism such as gear. A substrate transporting mechanism in a chamber 31 comprises a fixed stage 310 and a movable stage 320. On the movable stage 320, a first, a second, and a third driven magnets 331, 332, and 333 are supported by bearing units 322. These driven magnets are magnetically coupled with each other, and the third driven magnet 333 is magnetically coupled with the roller magnet 323. Further, the first driven magnet 331 is magnetically coupled with the driving magnet 330, and the driving force from the driving magnet 330 can be separated or combined.
Description
- 1. Field of the Invention
- The present invention relates to a substrate transporting mechanism and a substrate transporting method for transporting substrates such as glass substrates to be used in liquid crystal display (LCD) panel. The invention also relates to a substrate processing system using the transport of the substrates.
- 2. Description of the Related Art
- In a conventional type processing system for general semiconductor substrate or LCD glass substrate, a plurality of processing apparatuses such as coating-developing apparatus, etching apparatus, etc. are provided along the transport system. Some of the transport systems of the processing system for LCD glass substrate have the function to transport the substrates under vacuum condition (or under reduced pressure) in order to carry in or carry out the substrate to or from a vacuum side processing system.
- In such a transporting system as described above, motive power is transmitted by using a belt (metal or elastomer belt) or using a gear within a vacuum chamber, and the substrates are transported by means such as roller, robot arm, or moving plate. For the purpose of driving these mechanisms in a vacuum chamber, driving force must be transmitted from a driving source arranged on an atmospheric side to the transport unit arranged on the vacuum side in the chamber. For this purpose, it has been practiced in the past to form an opening on partition wall and to transmit the motive power to the vacuum side by placing a rotation shaft.
- However, according to the conventional driving force transmitting method, seal packing or magnetic fluid is used on the rotation shaft when the rotating driving force is transmitted into vacuum. In such case, problems arise such as the release of particles or gas from these elements.
- To solve the problems, the
Patent Document 1 as given below describes a vacuum robot for substrate transport, by which driving force is transmitted to the robot arm under vacuum condition by using magnetic coupling, and which comprises an outer ring magnet on the atmospheric side and an inner ring magnet on the vacuum side. - [Patent Document 1] JP-A-2002-66976
- In recent years, however, there have been strong demands on high-grade operation control such as the moving of the entire transport mechanism upward or downward after separating the transmission of the driving force to be applied on a part of the transport mechanism within the vacuum chamber to reduce installation area of the transporting system and to achieve more efficient substrate transport. In order to accomplish such high-grade operation control, it is necessary to have a synchronizing mechanism, which can freely separate and combine the driving shaft and the driven shaft from each other via gears. Mechanical synchronizing mechanism has complicated structure, and particles are generated from physical contact and friction of gears. When the means such as belt is used, particles are generated as the result of friction and contact of materials such as metal, elastomer, etc. Also, there are problems such as the release of gas or the contamination of vacuum condition from lubricants used for the portions where physical contact and friction occur.
- It is an object of the present invention to provide a substrate transporting mechanism and a substrate transporting method in the substrate transport within a vacuum system, by which it is possible: (1) to transmit driving force from atmospheric side to vacuum side by magnetic coupling via a vacuum chamber partition wall; (2) to transmit the driving force within the vacuum chamber by magnetic coupling; and (3) to use magnetic coupling for separating and combining the transmission of the driving force within the vacuum chamber without using mechanical synchronizing mechanism such as gears.
- The present invention provides a substrate transporting mechanism, which can achieve high-grade operation control in a vacuum system, and by which it is possible to extensively reduce mechanical contact and friction and to minimize the generation of particles and gas release, and also to attain simple structure of the system.
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FIG. 1 is a schematical perspective view of a substrate processing system; -
FIG. 2 is a perspective view to show a structure of a vertical conveyor; -
FIG. 3 is a schematical drawing to explain substrate transport using the vertical conveyor; -
FIG. 4 is a schematical perspective view to show general features of a vacuum side processing system; -
FIG. 5 is a plan view of asubstrate transporting mechanism 32 shown inFIG. 4 ; -
FIG. 6 (a) andFIG. 6 (b) each represents a cross-sectional view of a substrate being transported by asubstrate transporting mechanism 32 as shown inFIG. 4 ; -
FIG. 7 (a) andFIG. 7 (b) each represents a cross-sectional view after the substrate is stopped by thesubstrate transporting mechanism 32 as shown inFIG. 4 ; -
FIG. 8 is an enlarged view of adriving magnet 330 and a first drivenmagnet 331; and -
FIG. 9 (a) andFIG. 9 (b) each represents a cross-sectional view along the dotted line A-A′ inFIG. 8 . - Description will be given below on an embodiment of the present invention referring to the drawings.
- Description will be given below on an embodiment of a substrate processing system of the invention referring to
FIG. 1 .FIG. 1 shows an LCD glasssubstrate processing system 1, which comprises a carrying-in carrying-out unit 10 for carrying in an LCD glass substrate (hereinafter simply referred as “substrate”) L to the processing system and for carrying out the substrate after the completion of the processing,atmospheric processing apparatuses vacuum processing apparatus 30 for carrying out the processing on the substrates L under reduced pressure, and atransport system 40 for connecting the carrying-in carrying-outunit 10 with theatmospheric processing apparatuses vacuum processing apparatus 30 and for transporting the substrates L. Cleaning apparatus, coating-developing apparatus, exposure apparatus, etc. are included in the atmospheric processing systems. Etching apparatus, film depositing apparatus, ion implanter, etc. are included in the vacuum processing system. - In the LCD glass
substrate processing system 1 as shown inFIG. 1 , the carrying-in carrying-out unit 10 comprises a carrying-inunit 130 and a carrying-out unit 140, and these units are connected to a carrying-in carrying-out conveyor 150, which moves the substrates L up and down. - One end of a
transport system 40 is connected to the carrying-in carrying-out unit 10, and thetransport system 40 comprises anupper conveyor 410 connected to the carrying-inunit 130 and alower conveyor 420 connected to the carrying-outunit 140. Further, at adequate points on the transport route, there are providedvertical conveyors upper conveyor 410 and thelower conveyor 420. - The
atmospheric processing apparatuses transport system 40 to match each of thevertical conveyors transport system 40, avacuum processing apparatus 30 is arranged at a position adjacent to thevertical conveyor 465. - Now, referring
FIG. 2 , description will be given on a structure of the vertical conveyor by taking an example on thevertical conveyor 462. As shown inFIG. 2 , thevertical conveyor 462 transports the substrate L in vertical direction between theupper conveyor 410 and thelower conveyor 420. In the example shown inFIG. 2 , there are providedtransport boards 480 in four stages. Motors 490 andball screws 495 are arranged to match thetransport boards 480 respectively. Each of the transport boards is connected to thematching ball screw 495 via aconnection 486, and thetransport boards 480 are moved up and down by driving force of themotor 490. By such arrangement, thetransport boards 480 can be moved up or down independently from each other. It may be so arranged that the transport boards can be moved together up or down by providing a single motor and a single ball screw commonly used for the transport boards. - Next, referring to
FIG. 3 , description will be given on buffer function of thevertical conveyor 462. As shown inFIG. 3 , thevertical conveyor 462 comprises a plurality oftransport boards 480, each of which supports the substrate L from below and is moved up or down in combination with each other. InFIG. 3 , only thetransport boards vertical conveyor 462 can be varied as appropriate according to the scale of the system and other factors. Thetransport boards transport boards transport boards 480, and detailed description on each transport board is not given here. - Among said plurality of
transport boards 480, one transport board constitutes a part of theupper conveyor 410, and another transport board constitutes a part of thelower conveyor 420. In the example shown inFIG. 3 , thetransport board 480 c constitutes a part of theupper conveyor 410, and thetransport board 480 f constitutes a part of thelower conveyor 420. Each of theother transport boards upper conveyor 410 or from thelower conveyor 420 in some cases. Each of thetransport boards - Now, referring to
FIG. 3 , description will be given on a case where two substrates are buffered or turned out. Under the condition that one substrate is placed on thetransport board 480 f, theupper conveyor 410 and thelower conveyor 420 are stopped. Next, when thevertical conveyor 462 is moved up by one stage only, thetransport board 480 d and thetransport board 480 g become a part of theupper conveyor 410 and a part of thelower conveyor 420 respectively. When theupper conveyor 410 and thelower conveyor 420 are operated, the other LCD glass substrates are placed on thetransport board 480 g. When thevertical conveyor 462 is moved up by one stage only, thetransport boards upper conveyor 410 and thelower conveyor 420 respectively. Under this condition, thetransport boards - Then, the substrates on the
transport boards transport boards vertical conveyor 462 are moved down by a procedure reverse to the above, and it is transported in the returning direction by thelower conveyor 420. In this way, thevertical conveyor 462 fulfills the function of buffer. As a result, theupper conveyor 410 and thelower conveyor 420 can transport the other substrates even during the processing of the two substrates. - In the above, description has been given on the case where the substrate to be transported on the
lower conveyor 420 is buffered or turned out. Buffering can be performed in similar manner on the substrate, which is transported on theupper conveyor 410. Also, description has been given in the above by taking an example on thevertical conveyor 462, while the same applies to the other vertical conveyors. - In the
transport system 40 of the present embodiment, each of the vertical conveyors arranged at each point fulfills the functions as given below. - The
vertical conveyor 461 is disposed at a position closest to the carrying-in unit 130 (the carrying-out unit 140), and it fulfills the function of an input buffer or an output buffer of the substrate L or fulfills the function to switch over the transport route between theupper conveyor 410 and thelower conveyor 420. - The
vertical conveyor 462 is arranged at a position to match theprocessing system 20, and it plays a role as a buffer for the substrate L or a role to give or take the substrate L to or from theprocessing system 20. The substrate L is given or taken between thevertical conveyor 462 and theprocessing system 20 via atransport arm 471. The arrangement and the function of the atmosphericside processing systems - The
transport arm 471 is provided with a plate (a fork) to lift up and transport the substrate L. The substrate L placed on thetransport board 480 of thevertical conveyor 462 is carried to theprocessing system 20. Thetransport arm 471 has a driving mechanism to drive in vertical direction, and the substrate L can be lifted up from any of thetransport boards FIG. 3 . When thetransport arm 471 lifts up the substrate L from thetransport board 480 c, which constitutes a part of theupper conveyor 410, transport rollers R of thetransport board 480 c are stopped to rotate and to drive. Similarly, when thetransport arm 471 lifts up the substrate L from thetransport board 480 f, which constitutes a part of thelower conveyor 420, the transport rollers R of thetransport board 480 f are stopped to rotate and to drive. - The
vertical conveyor 463 is provided between theprocessing systems 20 and 22, and it has the function as a buffer or the function to switch over the transport route between theupper conveyor 410 and thelower conveyor 420. - The
vertical conveyor 464 is arranged at a position to match theprocessing apparatus 21, and it fulfills the function of a buffer for the substrate L or plays a role to give or take the substrate L to or from theprocessing apparatus 21. The substrate L is given or taken between thevertical conveyor 464 and theprocessing apparatus 21 via atransport arm 472. Thetransport arm 472 fulfills the function similar to that of thetransport arm 471. - The
vertical conveyor 465 connects the most downstream portion of theupper conveyor 410 with the most upstream portion of thelower conveyor 420, and it has the function as a buffer for the substrate L or fulfills the function to connect theupper conveyor 410 with thelower conveyor 420. Also, thevertical conveyor 465 is arranged at a position adjacent to theprocessing system 30 as mentioned later, and it plays a role to give or take the substrate L to or from the asubstrate transporting device 32, which is provided in a load-lock chamber 31. - Next, referring to
FIG. 4 , detailed description will be given on thevacuum processing apparatus 30.FIG. 4 is a schematical perspective view of aprocessing system 30 for performing film deposition to the substrate L. Thisprocessing system 30 comprises a load-lock chamber 31, atransfer chamber 33, and aprocess chamber 35. - In
FIG. 4 , the load-lock chamber 31 has the function to repeat pressure reduction and restoration to normal pressure to carry the substrate L from the atmospheric environment via a first gate valve G1. The load-lock chamber 31 is connected to thetransfer chamber 33 via a second gate valve G2, and thetransfer chamber 33 is connected to theprocess chamber 35 via a third gate valve G3. Thetransfer chamber 33 has the function to carry in and carry out the substrate L via thetransport arm 34 while maintaining the pressure in theprocess chamber 35. Theprocess chamber 35 is under a predetermined reduced pressure condition and has the function to form CVD film and oxynitridation film on the substrate and to perform water repellent processing. - The substrate L is transported from the
vertical conveyor 465 of thetransport system 40 into the load-lock chamber 31 via an opening where the first gate valve G1 is provided. After the air is evacuated by pumping until the pressure in the load-lock chamber 31 is reduced from normal pressure to a predetermined reduced pressure, the substrate L is transported to theprocess chamber 35 under the predetermined reduced pressure condition via thetransfer chamber 33, and CVD film oxynitridation film is formed on it or water repellent processing is performed. - The
substrate transporting device 32 according to the present invention is disposed in the load-lock chamber 31. The substrate L is transported from thevertical conveyor 465 in axial direction as shown by the arrow X into the load-lock chamber 31. After the completion of the processing, the substrate L is carried out to thevertical conveyor 465. Or, a second carrying-in carrying-out device (not shown) may be provided via a gate valve on a surface (e.g. as shown by the arrow Y) of the load-lock chamber 31 different from the surface, with which thevertical conveyor 465 or thetransfer chamber 33 is kept in contact. In case the processing in the atmosphericside processing systems 21 and 22 is not required and only the processing at the vacuumside processing system 30 is to be performed, the substrate L can be directly carried in or out between a second carrying-in carrying-out device and the load-lock chamber 31, and this is more efficient. -
FIG. 5 is a plan view of thesubstrate transporting mechanism 32 as shown inFIG. 4 .FIG. 6 (a) shows a cross-sectional view along the dotted line A-A′ inFIG. 5 , and -
FIG. 6 (b) represents a cross-sectional view along the dotted line B-B′. - In
FIG. 5 , thesubstrate transporting mechanism 32 in the load-lock chamber 31 comprises a fixedstage 310 and amovable stage 320. On themovable stage 320, rotation axes of a plurality oftransport rollers 321 are supported by bearingunits 322. On each of thetransport rollers 321, aroller magnet 323 is mounted. Also, on some of thetransport rollers 321,rollers 321′ are mounted viaroller rotation shafts 324. - On the
movable stage 320, a first, a second, and a third drivenmagnets bearing unit 322 as shown in upper portion ofFIG. 5 . These driven magnets are magnetically coupled with each other. Also, the third drivenmagnet 333 is magnetically coupled with theroller magnet 323. Further, the first drivenmagnet 331 is magnetically coupled with the drivingmagnet 330. A single driven magnet, e.g. the third drivenmagnet 333, may be used instead of the first, the second, and the third drivenmagnets - A driving
magnet 330 is accommodated in the atmospheric air in ahollow partition wall 340, which is prepared by forming the partition wall of the load-lock chamber 31 in convex shape. Rotating driving force from the drivingmagnet 330 in the atmospheric air is transmitted to the first drivenmagnet 331 via the partition wall. This driving force is turned to a direction in parallel to the rotation axis and is transmitted to the second and the third drivenmagnets roller magnet 323, which is magnetically coupled with the third drivenmagnet 333, transmits the driving force from the third drivenmagnet 333 as a driving force in a perpendicular crossing direction. - Each of the plurality of the third driven
magnets 333 is magnetically coupled with each of the plurality ofroller magnets 323 via the drivenrotation shafts 327. The magnetically coupled driving force is transmitted to thetransport roller 321, and the substrate L is transported as shown inFIG. 6 . - The substrate L thus transported is disposed at a position to a pre-determined position of the process chamber, and
positioning units 328 with two support pins are moved as shown by open arrows inFIG. 5 . At least two positioningunits 328 may be provided on diagonal lines. -
FIG. 6 shows cross-sectional views, each showing a substrate being transported by thesubstrate transporting mechanism 32 shown inFIG. 5 .FIG. 6 (a) represents a cross-sectional view along the dotted line A-A′ inFIG. 5 , andFIG. 6 (b) represents a cross-sectional view along the dotted line B-B′ inFIG. 5 . - In
FIG. 6 , the drivingmagnet 330 is driven by a motor arranged in the atmospheric air. The driving force of the drivingmagnet 330 is coupled with a first drivenmagnet 331 and is transmitted to the second and the third drivenmagnets roller magnet 323, and thetransport roller 321 and theroller 321′ are rotated. After being carried in by thetransport roller 321, the substrate L is positioned by apositioning unit 328 shown inFIG. 5 . The fixedstage 310 is fixed by fixingpillars 311. Themovable stage 320 is moved up and down bymovable pillars 312, and it is moved to upper position when the substrate L is being transported, and the drivingmagnet 330 is coupled with the first drivenmagnet 331. -
FIG. 7 shows cross-sectional views after the substrate is stopped in thesubstrate transporting mechanism 32 shown inFIG. 5 .FIG. 7 (a) represents a cross-sectional view along the dotted line A-A′ inFIG. 5 , andFIG. 7 (b) represents a cross-sectional view along the dotted line B-B′ inFIG. 5 . - As explained in connection with
FIG. 6 , after the substrate L is carried in as shown inFIG. 7 , the transporting of the substrate L is stopped, and the air in the load-lock chamber 31 is evacuated. Under vacuum condition, themovable stage 320 is moved to lower position as shown by open arrows inFIG. 7 , and the substrate L is placed on the fixedstage 310. In this case, the drivingmagnet 330 and the first drivenmagnet 331 are separated from each other. -
FIG. 8 is an enlarged view of the drivingmagnet 330 and the first drivenmagnet 331. InFIG. 8 , the drivingmagnet 330 and the first drivenmagnet 331 are separated from each other or are coupled with each other via apartition unit 351 of thehollow partition wall 340.Reference numeral 352 denotes a driving rotation shaft of the drivingmagnet 330, and numeral 353 denotes rotation shafts of the second and the third drivenmagnets -
FIG. 9 shows cross-sectional views along the dotted line A-A′ inFIG. 8 .FIG. 9 (a) represents a cross-sectional view of a case where the drivingmagnet 330 and the first drivenmagnet 331 are coupled with each other, andFIG. 9 (b) shows a case where the drivingmagnet 330 and the first drivenmagnet 331 are separated from each other. - As shown by an open arrow in
FIG. 9 (a), rotating driving force of the drivingmagnet 330 is transmitted to the first drivenmagnet 331 via thepartition unit 351 of thehollow partition wall 340 in semi-circular shape. Then, the rotating driving force of the first drivenmagnet 331 is transmitted to the second and the third drivenmagnets magnet 333 is further transmitted to theroller magnet 323 and rotates thetransport roller 321, which is supported by the bearingunit 322. - When the driven
magnets FIG. 9 (b), the drivingmagnet 330 and the first drivenmagnet 331 are separated from each other. - On the conventional mechanical driving force transmitting method, complicated synchronizing mechanism has been required for combination and separation of the driving force. Also, there has been the problem of the generation of contaminants such as particles as the result of mechanical coupling and separation. In the substrate transporting mechanism according to the present invention, the combination and the separation of the driving force are carried out by magnetic coupling to solve the problems.
- In the
vacuum processing apparatus 30 with thesubstrate transporting mechanism 32 as described above, the driving force from the drivingmagnet 330 is transmitted to the drivenmagnet 331 when themovable stage 320 is moved up (FIG. 6 ), and this force rotates thetransport rollers magnets transport rollers vertical conveyor 465 in axial direction as shown by the arrow X inFIG. 4 into the load-lock chamber 31. Then, the substrate is stopped at a predetermined position. Next, the opening, through which the substrate L has been carried in, is closed by the first gate valve G1. Then, as described above, themovable stage 320 is moved down (FIG. 7 ), and the substrate L is placed on the fixedstage 310. When the pressure in the load-lock chamber 31 is reduced to a predetermined pressure, the second gate valve G2 between the load-lock chamber 31 and thetransfer chamber 33 is opened. Then, thetransport arm 34 transports the substrate L on the fixedstage 310 in axial direction shown by the arrow Y, which perpendicularly crosses the axial direction shown by the arrow X. In this case, themovable stage 320 is moved down. Thus, the plate (fork) to lift up and transport the substrate L can be easily inserted under the substrate L. - The substrate L is transported from the
transfer chamber 33 to theprocess chamber 35 via the third gate valve G3 and is processed by film forming processing. Then, the substrate L is sent back to the fixedstage 310 of thesubstrate transporting mechanism 32 along a route reverse to the route when it has been carried in. The pressure in the load-lock chamber 31 is brought back to the atmospheric pressure, and themovable stage 320 is moved up so that the substrate L can be carried out of the load-lock chamber 31 by thetransport rollers - When the predetermined processing has been completed in the
vacuum processing apparatus 30, the substrate L carried out of the load-lock chamber 31 is transported to the carrying-outunit 140 by thevertical conveyor 465 and thelower conveyor 420, and a series of processing is completed. - In the above, referring to the attached drawings, description has been given on the preferred embodiment of the LCD glass substrate processing system according to the present invention, while the invention is not limited to the above embodiment.
- For instance, in the embodiment as described above, the substrate L is transported in the
transport system 40 under the condition exposed to the atmosphere within a clean room, while it may be designed in such manner that theentire transport system 40 including the connection with theprocessing apparatus 30 is enclosed in a housing, which maintains an atmosphere with high-grade cleanness in its internal space, and that the substrate L is transported to the next process under clean condition. Further, the internal space of the housing for enclosing the transport system is turned to vacuum condition, and the attachment of particles and moisture on the surface of the substrate L can be minimized and the substrate processing with higher quality can be achieved. - As described above, it would be obvious to those skilled in the art that various modifications and changes can be made without departing from the spirit and the scope of the technical concept as set forth in the attached claims, and these modifications and changes naturally belong to the technical concept of the present invention.
Claims (7)
1. A substrate transport mechanism arranged in a chamber and provided with a fixed stage where a substrate is placed and with a movable stage where the substrate is transported, wherein:
there are provided a plurality of transport rollers for transporting the substrates, roller magnets mounted on the transport rollers, and driven magnets magnetically coupled with the roller magnets on the movable stage;
when the movable stage is moved up to upper position, the driven magnet is magnetically coupled with driving magnet arranged outside of said chamber and is driven, and said substrate is separated from said fixed stage and is supported by said transport roller; and
when the movable stage is moved down to lower position, said driven magnets and the driving magnets are magnetically separated from each other, and said substrates are placed on said fixed stage.
2. A substrate transporting mechanism according to claim 1 , wherein said driven magnets comprise a plurality of magnets sequentially and magnetically coupled with each other, and one of said plurality of magnets is magnetically coupled with said roller magnet and rotates the transport rollers.
3. A substrate transporting mechanism according to claim 1 , wherein said driving magnet is arranged in a hollow partition wall prepared by turning a part of partition wall of said chamber in inward direction and formed in convex shape.
4. A substrate transporting mechanism according to claim 3 , wherein said hollow partition wall has a partition unit with a cross-section in approximately semi-circular form, and driving force from the driving magnet is transmitted to the driven magnet via the partition unit.
5. A substrate transporting mechanism according to claim 1 , wherein the pressure in internal space of said chamber can be reduced to a predetermined pressure.
6. A substrate transporting method using a substrate transporting mechanism according to one of claims 1 to 5, wherein said method comprises the steps of:
carrying in said substrate to said movable stage or carrying out the substrate from the movable stage along a first axial direction by rotation of said transport roller when the movable stage is at upper position; and
carrying in said substrate to said fixed stage along a second axial direction almost perpendicularly crossing said first axial direction and carrying out the substrate from the fixed stage when the movable stage is at lower position.
7. A substrate processing system, comprising a load-lock chamber able to communicate with an atmospheric side via a first gate valve, a process chamber for performing a predetermined processing to the substrate in the chamber, and a transfer chamber, said transfer chamber being able to communicate with said load-lock chamber via a second gate valve, and able to communicate with said process chamber via a third gate valve and having transport arms for carrying in and out the substrate to or from said load-lock chamber and said process chamber inside said transfer chamber; and
said load-lock chamber has the substrate transporting mechanism according to claim 5 inside said chamber.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006-175661 | 2006-06-26 | ||
JP2006175661A JP2008004898A (en) | 2006-06-26 | 2006-06-26 | Substrate transport apparatus, substrate transport method, and substrate processing system |
Publications (1)
Publication Number | Publication Date |
---|---|
US20070296134A1 true US20070296134A1 (en) | 2007-12-27 |
Family
ID=38872825
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/686,992 Abandoned US20070296134A1 (en) | 2006-06-26 | 2007-03-16 | Substrate transporting mechanism, substrate transporting method and substrate processing system |
Country Status (5)
Country | Link |
---|---|
US (1) | US20070296134A1 (en) |
JP (1) | JP2008004898A (en) |
KR (1) | KR100778208B1 (en) |
CN (1) | CN101096245A (en) |
TW (1) | TW200804159A (en) |
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CN102442542A (en) * | 2010-09-09 | 2012-05-09 | 东京毅力科创株式会社 | Substrate transfer apparatus and substrate transfer method |
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WO2019186065A1 (en) * | 2018-03-29 | 2019-10-03 | Saint-Gobain Glass France | Improved conveyor assembly |
WO2020078681A1 (en) * | 2018-10-15 | 2020-04-23 | Hegla Gmbh & Co. Kg | Laminated glass cutting system and method for cutting laminated glass panels |
US11211277B2 (en) * | 2018-01-17 | 2021-12-28 | Kokusai Electric Corporation | Substrate processing apparatus |
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JP2512782B2 (en) * | 1988-02-26 | 1996-07-03 | 東京エレクトロン株式会社 | Pantograph type wafer carrier |
JP2808826B2 (en) * | 1990-05-25 | 1998-10-08 | 松下電器産業株式会社 | Substrate transfer device |
JPH0492446A (en) * | 1990-08-07 | 1992-03-25 | Plasma Syst:Kk | Substrate conveyance robot |
JPH06122642A (en) * | 1992-09-14 | 1994-05-06 | Mitsubishi Kasei Corp | Novel phosphite compound and production of aldehyde with the same |
JPH08172121A (en) * | 1994-12-20 | 1996-07-02 | Hitachi Ltd | Substrate carrier device |
-
2006
- 2006-06-26 JP JP2006175661A patent/JP2008004898A/en active Pending
- 2006-12-14 TW TW095146877A patent/TW200804159A/en unknown
- 2006-12-14 KR KR1020060127500A patent/KR100778208B1/en not_active IP Right Cessation
- 2006-12-15 CN CNA2006101732981A patent/CN101096245A/en active Pending
-
2007
- 2007-03-16 US US11/686,992 patent/US20070296134A1/en not_active Abandoned
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CN102442542A (en) * | 2010-09-09 | 2012-05-09 | 东京毅力科创株式会社 | Substrate transfer apparatus and substrate transfer method |
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Also Published As
Publication number | Publication date |
---|---|
JP2008004898A (en) | 2008-01-10 |
CN101096245A (en) | 2008-01-02 |
KR100778208B1 (en) | 2007-11-22 |
TW200804159A (en) | 2008-01-16 |
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