WO2009128669A3 - 발광 소자 및 그 제조방법 - Google Patents

발광 소자 및 그 제조방법 Download PDF

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Publication number
WO2009128669A3
WO2009128669A3 PCT/KR2009/001991 KR2009001991W WO2009128669A3 WO 2009128669 A3 WO2009128669 A3 WO 2009128669A3 KR 2009001991 W KR2009001991 W KR 2009001991W WO 2009128669 A3 WO2009128669 A3 WO 2009128669A3
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WO
WIPO (PCT)
Prior art keywords
layer
layer over
type semiconductor
conductive type
over
Prior art date
Application number
PCT/KR2009/001991
Other languages
English (en)
French (fr)
Other versions
WO2009128669A2 (ko
Inventor
송준오
Original Assignee
엘지이노텍주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020080034933A external-priority patent/KR101534846B1/ko
Priority claimed from KR1020080041610A external-priority patent/KR101550913B1/ko
Application filed by 엘지이노텍주식회사 filed Critical 엘지이노텍주식회사
Priority to EP09732760.5A priority Critical patent/EP2280426B1/en
Priority to US12/988,437 priority patent/US8502193B2/en
Priority to CN2009801203782A priority patent/CN102047454B/zh
Publication of WO2009128669A2 publication Critical patent/WO2009128669A2/ko
Publication of WO2009128669A3 publication Critical patent/WO2009128669A3/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/005—Processes
    • H01L33/0093—Wafer bonding; Removal of the growth substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/04—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/14—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a carrier transport control structure, e.g. highly-doped semiconductor layer or current-blocking structure
    • H01L33/145—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a carrier transport control structure, e.g. highly-doped semiconductor layer or current-blocking structure with a current-blocking structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/40—Materials therefor
    • H01L33/405—Reflective materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/40—Materials therefor
    • H01L33/42—Transparent materials

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Led Devices (AREA)

Abstract

실시예에 따른 발광 소자는 지지 기판; 상기 지지 기판 상에 웨이퍼 결합층; 상기 웨이퍼 결합층 상에 전류 차단층 및 반사성 전류 퍼짐층을 포함하는 제2 전극층; 상기 제2 전극층 상에 전류 주입층; 상기 전류 주입층 상에 슈퍼래티스 구조층; 상기 슈퍼래티스 구조층 상에 제2 도전형의 반도체층; 상기 제2 도전형의 반도체층 상에 활성층; 상기 활성층 상에 제1 도전형의 반도체층; 및 상기 제1 도전형의 반도체층 상에 제1 전극층을 포함한다.
PCT/KR2009/001991 2008-04-16 2009-04-16 발광 소자 및 그 제조방법 WO2009128669A2 (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP09732760.5A EP2280426B1 (en) 2008-04-16 2009-04-16 Light-emitting device
US12/988,437 US8502193B2 (en) 2008-04-16 2009-04-16 Light-emitting device and fabricating method thereof
CN2009801203782A CN102047454B (zh) 2008-04-16 2009-04-16 发光器件及其制造方法

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR10-2008-0034933 2008-04-16
KR1020080034933A KR101534846B1 (ko) 2008-04-16 2008-04-16 수직구조의 그룹 3족 질화물계 반도체 발광다이오드 소자및 제조방법
KR10-2008-0041610 2008-05-04
KR1020080041610A KR101550913B1 (ko) 2008-05-04 2008-05-04 수직구조의 그룹 3족 질화물계 반도체 발광다이오드 소자및 제조방법

Publications (2)

Publication Number Publication Date
WO2009128669A2 WO2009128669A2 (ko) 2009-10-22
WO2009128669A3 true WO2009128669A3 (ko) 2010-01-14

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2009/001991 WO2009128669A2 (ko) 2008-04-16 2009-04-16 발광 소자 및 그 제조방법

Country Status (4)

Country Link
US (1) US8502193B2 (ko)
EP (1) EP2280426B1 (ko)
CN (1) CN102047454B (ko)
WO (1) WO2009128669A2 (ko)

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US20110127567A1 (en) 2008-06-02 2011-06-02 Korea University Industrial & Academic Collaboration Foundation Supporting substrate for preparing semiconductor light-emitting device and semiconductor light-emitting device using supporting substrates
KR100999726B1 (ko) * 2009-05-04 2010-12-08 엘지이노텍 주식회사 발광소자 및 그 제조방법
CN102142470B (zh) * 2010-01-28 2014-09-24 晶元光电股份有限公司 太阳能光电元件
CN102280552B (zh) * 2010-06-14 2015-06-03 鸿富锦精密工业（深圳）有限公司 发光二极管晶粒及其制作方法
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KR20120032258A (ko) * 2010-09-28 2012-04-05 삼성엘이디 주식회사 질화갈륨계 반도체소자 및 그 제조방법
KR20120040448A (ko) * 2010-10-19 2012-04-27 삼성엘이디 주식회사 수직형 발광 소자
WO2012066701A1 (ja) * 2010-11-19 2012-05-24 パナソニック株式会社 窒化物半導体装置
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US20130001510A1 (en) * 2011-06-29 2013-01-03 SemiLEDs Optoelectronics Co., Ltd. Optoelectronic device having current blocking insulation layer for uniform temperature distribution and method of fabrication
KR101286211B1 (ko) * 2012-02-16 2013-07-15 고려대학교 산학협력단 발광 소자 제조 방법 및 이를 이용하여 제조된 발광 소자
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KR102108196B1 (ko) * 2013-04-05 2020-05-08 서울바이오시스 주식회사 성장 기판이 분리된 자외선 발광소자 및 그 제조 방법
TW201511328A (zh) * 2013-09-13 2015-03-16 Lextar Electronics Corp 發光二極體
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JP6094819B2 (ja) * 2013-12-13 2017-03-15 ウシオ電機株式会社 半導体発光素子及びその製造方法
CN104617191A (zh) * 2015-01-14 2015-05-13 映瑞光电科技(上海)有限公司 一种具有电流阻挡结构的led垂直芯片及其制备方法
US9673352B2 (en) * 2015-04-30 2017-06-06 National Chiao Tung University Semiconductor light emitting device
KR101761835B1 (ko) * 2015-05-22 2017-07-26 서울바이오시스 주식회사 고효율 발광 다이오드
WO2016190569A1 (en) * 2015-05-22 2016-12-01 Seoul Viosys Co., Ltd. Light emitting diode with high efficiency
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CN105355742B (zh) * 2015-12-04 2017-11-07 天津三安光电有限公司 发光二极管芯片及其制作方法
US11411137B2 (en) * 2016-02-05 2022-08-09 The Regents Of The University Of California III-nitride light emitting diodes with tunnel junctions wafer bonded to a conductive oxide and having optically pumped layers
CN106129196A (zh) * 2016-08-30 2016-11-16 扬州乾照光电有限公司 一种用于倒装led芯片的外延片及其制备方法
CN106206884B (zh) * 2016-09-26 2018-10-12 湘能华磊光电股份有限公司 Led外延p层生长方法
CN107068822A (zh) * 2017-01-16 2017-08-18 湘能华磊光电股份有限公司 一种光取出效率高的led外延结构及其生长方法
CN108110098B (zh) * 2017-10-25 2019-12-31 华灿光电（浙江）有限公司 一种氮化镓基发光二极管外延片及其制造方法
CN108258006B (zh) * 2017-12-21 2021-04-06 厦门市三安光电科技有限公司 微发光元件
CN108588662A (zh) * 2018-06-13 2018-09-28 东北大学 一种包含CrN扩散障层的导电复合涂层及制备方法
KR20210062777A (ko) 2019-11-21 2021-06-01 삼성전자주식회사 반도체 발광 소자 및 그 제조 방법
CN111261762A (zh) * 2020-03-20 2020-06-09 西安唐晶量子科技有限公司 一种具有电流阻挡层的氮化镓基垂直结构发光二极管及其制作方法
JP2021196583A (ja) * 2020-06-18 2021-12-27 株式会社ジャパンディスプレイ 表示装置
CN114242866B (zh) * 2021-12-10 2024-01-26 厦门乾照光电股份有限公司 一种垂直结构led芯片及其制作方法

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Also Published As

Publication number Publication date
EP2280426A4 (en) 2014-03-19
EP2280426A2 (en) 2011-02-02
US20110101304A1 (en) 2011-05-05
CN102047454B (zh) 2013-04-10
WO2009128669A2 (ko) 2009-10-22
US8502193B2 (en) 2013-08-06
CN102047454A (zh) 2011-05-04
EP2280426B1 (en) 2017-07-05

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