WO2009119772A1 - ガラス基板の加工方法及びその装置 - Google Patents
ガラス基板の加工方法及びその装置 Download PDFInfo
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- WO2009119772A1 WO2009119772A1 PCT/JP2009/056194 JP2009056194W WO2009119772A1 WO 2009119772 A1 WO2009119772 A1 WO 2009119772A1 JP 2009056194 W JP2009056194 W JP 2009056194W WO 2009119772 A1 WO2009119772 A1 WO 2009119772A1
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- WIPO (PCT)
- Prior art keywords
- glass substrate
- chamfering
- dimension
- processing apparatus
- positioning
- Prior art date
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
- B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
- B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
- B24B9/08—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass
- B24B9/10—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass of plate glass
- B24B9/102—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass of plate glass for travelling sheets
Definitions
- the present invention relates to a glass substrate processing method and apparatus, and more particularly to a glass substrate processing method and apparatus for chamfering a rectangular glass substrate used in FPD (Flat Panel Display).
- FPD Full Panel Display
- FPD glass substrates such as liquid crystal displays and plasma displays are manufactured by cutting and folding plate glass into a predetermined rectangular size in the cutting process, and chamfering the edge part in the chamfering process. Manufactured on a glass substrate. Then, the glass substrate is transferred to the surface polishing step through a cleaning step and an inspection step arranged after the chamfering step, and is manufactured into a glass substrate having a product thickness here.
- These processes are often performed in one line from the viewpoint of production efficiency, but in the case of one-piece production, a glass substrate may be brought into each apparatus for processing.
- the size of the glass substrate after processing is determined when searching for the conditions of the cutting device or the chamfering processing apparatus accompanying the job change or the replacement of the cutter or the chamfering grindstone. Measurement is performed, and a condition search of the processing apparatus is performed based on the dimensions. Moreover, the dimension measurement of the glass substrate after a process is implemented also in the periodic sampling inspection.
- Patent Document 1 discloses a dimension measuring device that solves the above-mentioned problems.
- the dimension measuring apparatus includes a light source that irradiates the glass substrate surface on a glass inspection table that supports the glass substrate in an inclined posture, and an imaging unit that includes a camera that images a region irradiated by the light source. Yes. Further, a head moving unit that allows the head having the imaging unit to move in both directions of the XY axes, a head position detecting unit that can detect the XY coordinates of the head, and an image of the peripheral edge portion of the glass substrate imaged by the camera are processed.
- An image processing device and an arithmetic processing device for calculating and measuring the dimensions of the glass substrate based on the position information of the XY axes by the head position detecting means and the peripheral edge position coordinate information of a plurality of locations of the glass substrate calculated by the image processing device. ing.
- the present invention has been made in view of such circumstances, and provides a glass substrate processing method and apparatus capable of reducing the time spent measuring the dimensions of the glass substrate and improving the operating efficiency of the processing apparatus. For the purpose.
- the present invention comprises a step of measuring an external dimension of a rectangular glass substrate processed by a glass substrate processing apparatus using a dimension measuring apparatus disposed in the processing apparatus.
- a method for processing a substrate is provided.
- the present invention provides a glass substrate processing apparatus that is a rectangular glass substrate processing apparatus and includes a dimension measuring device that measures the external dimensions of the glass substrate.
- the dimension measuring device was arranged in the glass substrate processing apparatus, and the glass substrate processed by the processing apparatus was measured by the dimension measuring apparatus. That is, since the external dimensions of the glass substrate are measured in the machine of the processing apparatus without taking out the glass substrate from the processing apparatus, it is possible to eliminate the above-described problems of Patent Document 1. Therefore, the time spent for measuring the dimensions of the glass substrate can be greatly shortened, and the operating efficiency of the processing apparatus is improved.
- the processing apparatus of a glass substrate has a chamfering means and a positioning means, and a glass substrate and the said chamfering means are moved relatively to the direction of the 2 sides which the said glass substrate opposes. It is preferable that the chamfering apparatus chamfers the glass substrate.
- the external dimension of the glass substrate before chamfering positioned by the positioning means arranged on the upstream side of the chamfering processing apparatus or the positioning means provided in the chamfering processing apparatus is measured by the dimension measuring apparatus. Is displayed. Thereby, the operation
- the external dimensions of the glass substrate after chamfering may be measured by the dimension measuring device.
- the external dimensions of the glass substrate after chamfering are different.
- the work of measuring with the measuring device can be omitted, and the operation efficiency of the chamfering device is further improved. Further, it is possible to reduce the occurrence of a problem that the glass substrate is wrinkled.
- the dimensions of the cut product and the product after chamfering may be measured at the same point, and the respective dimensions may be displayed, or the difference may be calculated to display the grinding allowance that is the chamfering amount. Accordingly, the condition search can be completed in the chamfering apparatus without taking out the glass substrate from the processing apparatus and measuring the dimensions. Moreover, when the dimension of the displayed post-chamfered product is measured, the additional processing amount of the chamfering grindstone of the chamfering means with respect to the glass substrate can be adjusted based on the measurement result.
- the chamfering apparatus includes a deviation amount calculating unit, and the positional deviation amount of the glass substrate from the position of the glass substrate set based on the dimension measured by the deviation amount calculating unit. It is preferable to perform chamfering by the chamfering means after calculating and positioning the glass substrate at the set position of the glass substrate based on the positional deviation amount by the positioning means.
- the amount of positional deviation from a preset position of the glass substrate is calculated by the amount of deviation calculating means, and the calculated positional deviation is calculated.
- the positioning means positions the glass substrate at the set position based on the amount, the additional adjustment amount of the positioning roller can be easily changed (automatic adjustment by servo), and the chamfering means Chamfering can be performed after position correction.
- the present invention is such that the dimension measuring device is attached so as to be movable integrally with the chamfering means, and the dimension measuring device is arranged in the direction of two sides of the glass substrate facing the glass substrate. It is preferable that the dimension of the glass substrate is measured by relatively moving the chamfering means integrally.
- the dimension measuring device is attached so as to be able to move integrally with the chamfering means that is relatively moved in the directions of the two opposing sides of the glass substrate,
- the dimension of a glass substrate is measured by moving relatively.
- the moving means of the chamfering means can also be used as the moving means of the dimension measuring device, thus simplifying the overall apparatus configuration. it can.
- the dimension measuring device is arranged in the glass substrate processing device, and the external dimensions of the glass substrate processed by this processing device are set in the processing device. Since it measured with the apparatus, the time spent measuring the dimension of a glass substrate can be reduced significantly and the operating efficiency of a processing apparatus can be improved.
- DESCRIPTION OF SYMBOLS 10 ... Dimension measuring apparatus, 12 ... Chamfering processing apparatus, 13 ... Processing part, 14, 16 ... Chamfering grindstone, 18, 20 ... Length measuring sensor, 22 ... Spindle, 24 ... Dolly, 26 ... Piston, 28 ... Spindle, DESCRIPTION OF SYMBOLS 30 ... Carriage, 46 ... Air cylinder, 48 ... Drive part, 50 ... Air supply mechanism, 52 ... Control means, 54 ... Air cylinder, 56 ... Drive part, 58 ... Air supply mechanism, 60 ... Suction table, 62 ... For positioning Roller, 64 ... arithmetic unit, 66 ... display means, 68 ... suction table drive unit, 69 ... positioning roller drive unit, 80 ... dimension measuring device, 82 ... positioning device, 84, 86 ... length measuring sensor.
- FIG. 1 shows a plan view in which the dimension measuring device 10 of the first embodiment is arranged in the chamfering device 12.
- This dimension measuring device 10 is a device that measures the vertical and horizontal width dimensions of a glass substrate G that is cut into a rectangular shape and flows through the chamfering processing device 12 before and after the chamfering processing. It is installed in the machine of a chamfering machine 12 that chamfers the edges of the four sides of G.
- embodiment demonstrates the dimension measuring apparatus 10 installed in the chamfering apparatus 12, it is not limited to this, The glass substrate G folding apparatus, The washing
- the dimension measuring apparatus 10 may be installed in the inspection apparatus and the surface polishing apparatus following the inspection apparatus.
- the dimension measuring apparatus 10 can be installed in any processing apparatus.
- the glass substrate G that flows through the processing apparatus may be a glass substrate G that is flowing in the processing apparatus along a processing step, or may be a glass substrate G that is separately charged into the processing apparatus.
- the long side direction of the glass substrate G is defined as vertical, and the short side direction is defined as horizontal.
- the glass substrate G shown in FIG. 1 has a regular position, that is, two sides of the glass substrate G are chamfered grindstones 14 and 16 by the positioning roller 62 of the positioning means 82 disposed in the processing unit 13 of the chamfering processing device 12. Is positioned at a position that is parallel to the chamfering movement paths A and B without being inclined, and is sucked by the suction table 60 and fixed to the suction table 60.
- the positioning roller 62 is placed on a carriage 24, 30, 38, 44 on which the spindles 22, 28, 36, 42 of the chamfering grindstones 14, 16, 34, 40 are mounted via a positioning roller driving unit 69 (see FIG. 2). Installed.
- the installation location of the positioning roller 62 is not limited to the carriages 24, 30, 38, and 44.
- the positioning roller 62 may be lowered below the suction table after the glass substrate G is sucked by the suction table 60 after being lifted to a position where it can be positioned.
- the vertical and horizontal dimensions before chamfering and the vertical and horizontal dimensions after chamfering are measured by a pair of length measuring sensors arranged oppositely across the glass substrate G, for example, contact type length measuring sensors 18 and 20. Measured.
- a non-contact type length measuring sensor such as a laser meter may be used instead of the contact type length measuring sensor.
- the length measuring sensors 18 and 20 are installed on the carriages 24 and 30 on which the spindles 22 and 28 of the chamfering grindstones 14 and 16 are mounted via the air cylinders 46 and 54, respectively. It is attached to the tip of pistons 26 and 32.
- the carriages 24 and 30 have their home positions at the positions indicated by two-dot chain lines in FIG. 1, and are linearly moved from the positions along the movement paths A and B to the positions indicated by the solid lines by the drive units 48 and 56 in FIG.
- The By this moving operation, the positions of the two vertical sides of the glass substrate G are measured by measuring the four points (P1, P1 ′, P2, P2 ′) of the length measuring sensors 18 and 20, and the dimensions of the horizontal sides are measured based on the measurement data. Is calculated.
- the chamfering grindstone 14 can also chamfer the first vertical side of the glass substrate G by this moving operation.
- the air cylinder 46 to which the length measuring sensor 18 is attached is connected to an air supply mechanism 50, and the air supply to the air cylinder 46 by the air supply mechanism 50 is controlled by the control means 52.
- the control means 52 controls the air supply mechanism 50 so that air is supplied to the air cylinder 46 at the home position in FIG.
- the piston 26 is extended, and the length measurement sensor 18 is brought into contact with the first measurement point P1 (upper side-right side in FIG. 1) of the first long side portion of the glass substrate G.
- the control unit 52 controls the air supply mechanism 50 to contract the piston 26.
- control means 52 controls the drive unit 48 to move the carriage 24 along the movement path A, and when the carriage 24 reaches the second measurement point P2 (upper side-left side in FIG. 1), the movement of the carriage 24 is reached. Stop. Thereafter, the control means 52 controls the air supply mechanism 50 so as to supply air to the air cylinder 46. Accordingly, the piston 26 is extended, and the length measurement sensor 18 is brought into contact with the second measurement point P2 on the first vertical side of the glass substrate G.
- the measurement operation of the length measurement sensor 20 is the same as that of the length measurement sensor 18 and is therefore omitted.
- 2 is an air supply mechanism of the air cylinder 54
- 56 is a drive unit of the carriage 30.
- the first measurement point of the length measuring sensor 20 is P1 '
- the second measurement point is P2'.
- the glass substrate G is rotated 90 degrees in FIG.
- Numerals 34 and 40 are corner chamfering wheels.
- the spindles 36 and 42 of the grindstones 34 and 40 are mounted on the carriages 38 and 44, and the carriages 38 and 44 are moved along the corners of the glass substrate G, whereby the corner portions of the glass substrate G are chamfered.
- the four measurement data from the length measuring sensors 18 and 20 are output to the control means 52 shown in FIG. 2, and the control means 52 calculates the dimension of the horizontal side of the glass substrate G by the calculation unit 64 based on these measurement data. The result is displayed on the display means 66.
- control unit 52 controls the suction table driving unit 68 to rotate the suction table 60 by 90 degrees, and acquires the dimension of the vertical side of the glass substrate G by the method described above. Display. Thereby, the vertical and horizontal dimensions of the glass substrate G before chamfering are measured.
- chamfering of the vertical and horizontal sides of the glass substrate G is performed by the chamfering grindstones 14 and 16.
- This chamfering may be performed by a known chamfering method.
- one chamfering grindstone is described per side.
- two or more chamfering grindstones may be provided on one side to improve the surface roughness.
- the vertical and horizontal dimensions of the glass substrate G after the chamfering are obtained by the method described above. Then, the vertical and horizontal dimensions of the glass substrate G after the chamfering process are divided from the vertical and horizontal dimensions of the glass substrate G before the chamfering process, a grinding allowance as a chamfering amount is calculated, and this is displayed on the display means 66. Thereby, the measured value of the grinding allowance can be confirmed.
- the control means 52 controls the additional processing amount of the chamfering grindstones 14 and 16 with respect to the glass substrate G so as to approach the target value. Moreover, the additional processing amount with respect to the glass substrate G of the chamfering grindstones 14 and 16 can be adjusted in real time based on the vertical and horizontal dimensions after the chamfering.
- the dimension measuring apparatus 10 is installed in the machine of the chamfering apparatus 12, and the vertical and horizontal dimensions of the glass substrate G before the chamfering process are measured, and the chamfering process is performed.
- the subsequent vertical and horizontal dimensions were measured, and those dimensions were displayed. Therefore, it is possible to omit the work of taking out the glass substrate for dimension measurement from the chamfering processing line and measuring the dimension of the glass substrate with another dimension measuring device as before, so that the time spent for measuring the dimension of the glass substrate G is shortened.
- the operating efficiency of the chamfering apparatus can be improved.
- the dimension measuring apparatus 10 can complete the condition search in the chamfering apparatus without taking out the glass substrate G from the chamfering apparatus 12 and measuring the dimensions repeatedly until the condition can be obtained. .
- the length measuring sensors 18 and 20 of the dimension measuring apparatus 10 are attached to the carriages 24 and 30 of the chamfering grindstones 14 and 16 that are moved with respect to the edge of the glass substrate G, the chamfering is performed.
- the carriages 24 and 30 of the grindstones 14 and 16 can also be used as moving means for the length measuring sensors 18 and 20. Therefore, the overall configuration of the dimension measuring apparatus 10 is simplified.
- the vertical and horizontal dimensions of the glass substrate G before chamfering are measured, then chamfering on four sides is performed, and finally the vertical and horizontal dimensions of the glass substrate G after chamfering are calculated.
- measuring it is not limited to this procedure.
- the length measuring sensors 18 and 20 are brought into contact with the vertical sides of the glass substrate G before chamfering processing to acquire the horizontal side dimensions, and then the vertical chamfering processing of the vertical sides of the glass substrate G is performed on the chamfering grindstone 14. , 16, and then the length measuring sensors 18 and 20 are brought into contact with the vertical side after the chamfering process to acquire the horizontal side dimension, thereby obtaining the grinding allowance of the vertical side. Then, the glass substrate G is rotated by 90 degrees, and according to the above procedure, the length measuring sensors 18 and 20 are brought into contact with the horizontal sides of the glass substrate G before chamfering processing, and the dimensions of the vertical sides are obtained.
- vertical and horizontal dimension measurement and chamfering may be carried out with one chamfering machine 12, but another chamfering machine is provided at two positions. It is efficient to perform vertical and horizontal dimension measurement and chamfering.
- a length measuring sensor may be attached to the carriages 38 and 44 on which the corner-exclusive chamfering stones 34 and 40 are mounted. Although the number of length measuring sensors is increased, the sensing operation can be performed once, so that the sensing tact can be shortened.
- the case of measuring the dimensions of both the chamfered glass substrate before and after chamfering is described.
- the dimensions of only the glass substrate before chamfering are measured.
- only the dimension of the glass substrate after chamfering may be measured in order to adjust the processing accuracy of the chamfering apparatus.
- FIG. 3 is a plan view showing a dimension measuring apparatus 80 according to the second embodiment.
- This dimension measuring device 80 is provided with a positioning means 82 on the upstream side of the processing portion 13 of the chamfering processing device 12 with respect to the dimension measuring device 10 shown in FIG. 1, and between the chamfering processing device 12 and the positioning means 82. 1 is structurally different in that a pair of length measuring sensors 84 and 86 are provided facing each other.
- the glass substrate G is positioned by the positioning rollers 62, 62... Of the positioning means 82 on the upstream side of the processing unit 13 of the chamfering processing device 12, is suction fixed by the suction table 60, and then moves the suction table 60. Thus, the glass substrate G is conveyed to the processing unit 13. While the glass substrate G is being transported, the dimension measuring device 80 is positioned at the upstream side in the transport direction of the glass substrate G indicated by the two-dot chain line in FIG. (Not shown), the length measuring sensor 84 is brought into contact, and the length measuring sensor 86 is brought into contact with the second measurement point P2 ′ (not shown) on the second vertical side.
- the glass substrate G is further conveyed, and the length measurement sensor 84 is brought into contact with the second measurement point P2 on the first vertical side at the position downstream of the conveyance direction of the glass substrate G indicated by the solid line, and the second The length measurement sensor 86 is brought into contact with the first measurement point P1 ′ on the vertical side of the dimension to measure the dimension.
- the glass substrate G is conveyed to the process part 13, and a chamfering process is performed by moving the glass substrate G relatively with respect to the chamfering grindstones 14 and 16.
- the glass substrate G is conveyed again to the positioning device side, that is, upstream, the length measuring sensor 84 is brought into contact with the second measurement point P2 on the first vertical side, and the second vertical
- the length measurement sensor 86 is brought into contact with the first measurement point P1 ′ on the side
- the glass substrate G is further conveyed upstream, the length measurement sensor 84 is brought into contact with the first measurement point P1 on the first vertical side
- the length measurement sensor 86 is brought into contact with the second measurement point P2 ′ on the second vertical side to perform dimension measurement.
- the glass substrate G may be transported but stopped.
- one chamfering grindstone is described for one side, but two or more chamfering grindstones may be provided on one side to improve the surface roughness.
- the vertical and horizontal dimension measurement and chamfering may be performed by rotating the glass substrate G 90 degrees with one chamfering processing device 12, but another chamfering processing device is provided, and two positions are provided. It is efficient to perform vertical and horizontal dimension measurement and chamfering.
- the corner-specific chamfering grindstone may be provided downstream of each chamfering device, but a position for performing only corner chamfering processing may be provided downstream of each of the vertical and horizontal chamfering devices.
- a pair of length measuring sensors are provided opposite to each other, and the four length measuring sensors are simultaneously brought into contact with all four measurement points to measure the dimensions. You may make it do.
- the positioning operation of the glass substrate G by the positioning means 82 will be described.
- air is ejected from the air ejection holes of the suction table 60 to float the glass substrate G on the suction table 60.
- the glass substrate positioning roller 62 provided in the previous stage of the chamfering process is moved to the glass substrate.
- the glass substrate G is moved in contact with the edge of G, and the glass substrate G is positioned at a preset position.
- the positioning roller 62 is retracted from the glass substrate G at the same time or after the suction. The above is the positioning operation. Thereafter, the glass substrate G is chamfered.
- two positioning rollers 62 are arranged in parallel with each other in the conveying direction. However, even if one side is pressed at one point and the other side is pressed at two points, positioning is performed at a total of three points. Good.
- positioning rollers may be arranged before and after the transport direction. As long as the glass substrate G can be positioned, the number of positioning rollers and the arrangement position are not limited.
- the material of the positioning roller 62 that constitutes the positioning means is resin, metal, or rubber, but even if any material is selected, it will be worn out by long-term use.
- the wear amount increases, the positioned glass substrate G is inclined (inclined from the normal position) by the wear amount, although the positioning roller 62 attempts to position the normal position.
- the traveling paths A and B of the chamfering grindstones 14 and 16 with respect to the edge of the glass substrate G are inclined, so that the chamfering allowance is small in some parts and the chamfering allowance is large in other parts. As a result, there arises a problem that the chamfering quality deteriorates.
- the calculation unit (deviation amount calculation means) 64 shown in FIG. 2 calculates the positional deviation amount from the preset position of the glass substrate G based on the positional information of the length measurement sensor, Based on the amount of displacement, the control means 52 changes the additional adjustment amount of the positioning roller 62 and positions the glass substrate G at the set position. That is, since the inclination amount of the glass substrate G is calculated by measuring two edges of one side of the glass substrate G (two-side four-point measurement), the inclination amount is corrected when the inclination amount exceeds the threshold value. Thus, the additional adjustment amount of the positioning roller 62 is changed. Specifically, the control means 52 controls the positioning roller drive unit (servo motor) 69 to perform automatic adjustment. As a result, the chamfer allowance becomes uniform and the processing quality is improved. Thus, even when the positioning roller 62 is worn, the position after positioning can be grasped and adjusted in the apparatus, so that the production efficiency is improved.
- the control means 52 controls the positioning roller drive unit (servo motor) 69 to perform automatic adjustment.
- chamfering and dimension measurement may be performed one side at a time, or two sides may be performed simultaneously, but it is preferable to perform two sides at the same time because processing efficiency is better. Furthermore, when a glass substrate is fixed and a chamfering grindstone is conveyed, four sides may be simultaneously used.
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
Abstract
Description
更に、コーナー専用の面取砥石34、40が搭載された台車38、44にも、測長センサを取り付けてもよい。測長センサが増えるが、センシング動作は1回で済むため、センシングタクトを短縮することができる。
また、一対の測長センサ84、86の他、さらに一対の測長センサを対向して設け、測定ポイント4点の全てに対して4台の測長センサをそれぞれ同時に当接させて寸法を測定するようにしてもよい。
さらにガラス基板が固定で、面取砥石が搬送される場合、4辺同時でも良い。
本出願は、2008年3月26日出願の日本特許出願2008-080269に基づくものであり、その内容はここに参照として取り込まれる。
Claims (9)
- ガラス基板の加工装置によって加工される矩形状のガラス基板の外形寸法を、前記加工装置に配置された寸法測定装置によって測定する工程を具備する、ガラス基板の加工方法。
- 前記ガラス基板の加工装置が、面取手段と位置決め手段を有し、前記ガラス基板と前記面取手段とが前記ガラス基板の対向する2辺の方向に相対的に移動されることにより前記ガラス基板を面取りする面取加工装置であって、前記ガラス基板が前記位置決め手段で位置決めされた面取加工前のガラス基板である請求項1に記載のガラス基板の加工方法。
- 前記面取加工装置がズレ量算出手段を具備し、前記ズレ量算出手段が測定された前記寸法に基づいて設定されたガラス基板の位置からのガラス基板の位置ズレ量を算出し、前記位置決め手段により該位置ズレ量に基づいてガラス基板を前記設定されたガラス基板の位置に位置決めした後、前記面取手段による面取加工を行う請求項2に記載のガラス基板の加工方法。
- 前記ガラス基板の加工装置が、面取手段を有し、ガラス基板と前記面取手段とが前記ガラス基板の対向する2辺の方向に相対的に移動されることにより前記ガラス基板を面取りする面取加工装置であって、前記寸法測定装置によって測定されるガラス基板が面取加工後のガラス基板である請求項1に記載のガラス基板の加工方法。
- ガラス基板に対してガラス基板の対向する2辺の方向に、前記寸法測定装置と前記面取手段が一体となって相対的に移動されることによりガラス基板の寸法を測定する請求項2~4のいずれかに記載のガラス基板の加工方法。
- 矩形状のガラス基板の加工装置であって、
前記ガラス基板の外形寸法を測定する寸法測定装置を具備するガラス基板の加工装置。 - 前記ガラス基板の加工装置が、面取手段を有し、前記ガラス基板と前記面取手段とが前記ガラス基板の対向する2辺の方向に相対的に移動されることにより前記ガラス基板を面取りする面取加工装置である請求項6に記載のガラス基板の加工装置。
- 前記寸法測定装置によって測定されたガラス基板の寸法に基づいて、設定されたガラス基板の位置からの位置ズレ量を算出するズレ量算出手段と、
前記ズレ量算出手段によって算出された位置ズレ量に基づいてガラス基板を前記位置に位置決めする位置決め手段と、を備え
前記面取手段は、前記位置決め手段によるガラス基板の位置決め後に、前記面取加工を行う請求項7に記載のガラス基板の加工装置。 - 前記寸法測定装置が、前記面取手段と一体的に移動可能となるように取り付けられている請求項7、又は8に記載のガラス基板の加工装置。
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CN102079057A (zh) * | 2009-11-26 | 2011-06-01 | 旭硝子株式会社 | 玻璃基板的加工方法及其装置 |
JP2015003858A (ja) * | 2014-07-11 | 2015-01-08 | 坂東機工株式会社 | ガラス板の加工寸法自動測定、自動修正方法及びガラス板加工装置 |
JPWO2015083530A1 (ja) * | 2013-12-04 | 2017-03-16 | 旭硝子株式会社 | ガラス板製造装置及び方法 |
WO2019003403A1 (ja) | 2017-06-30 | 2019-01-03 | 東芝三菱電機産業システム株式会社 | 基板位置決め装置及び基板位置決め方法 |
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JP5682819B2 (ja) * | 2011-03-08 | 2015-03-11 | 旭硝子株式会社 | ガラス板の面取り方法及び面取り装置並びにガラス板 |
CN103009206A (zh) * | 2011-09-28 | 2013-04-03 | 上海双明光学科技有限公司 | 一种超薄超小高精度芯片玻璃基板的制作方法 |
CN103376079B (zh) * | 2012-04-27 | 2016-08-17 | 上海福耀客车玻璃有限公司 | 一种在线检测玻璃尺寸的装置 |
CN105290912B (zh) * | 2014-06-03 | 2019-01-22 | 安瀚视特控股株式会社 | 玻璃板制造方法及玻璃板制造装置 |
DE102016001995A1 (de) * | 2016-02-19 | 2017-08-24 | Siempelkamp Logistics & Service GmbH | Vorrichtung und Verfahren zum Beschneiden und Vermessen einer Platte |
JP6973237B2 (ja) * | 2018-03-29 | 2021-11-24 | 日本電気硝子株式会社 | 板ガラスの製造方法 |
CN109108736B (zh) * | 2018-07-25 | 2020-05-29 | 郑州旭飞光电科技有限公司 | 基板玻璃研磨设备的校正方法 |
KR102200216B1 (ko) * | 2018-12-14 | 2021-01-07 | 주식회사 포스코 | 빌렛 자동 연마 장치 및 방법 |
CN114161262B (zh) * | 2021-12-03 | 2023-07-14 | 四川兴事发木业有限公司 | 打磨用木门磨边系统 |
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- 2009-03-26 CN CN2009801107681A patent/CN101980833A/zh active Pending
- 2009-03-26 KR KR1020107021232A patent/KR20110009090A/ko not_active Application Discontinuation
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Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102079057A (zh) * | 2009-11-26 | 2011-06-01 | 旭硝子株式会社 | 玻璃基板的加工方法及其装置 |
JP2011110648A (ja) * | 2009-11-26 | 2011-06-09 | Asahi Glass Co Ltd | ガラス基板の加工方法及びその装置 |
JPWO2015083530A1 (ja) * | 2013-12-04 | 2017-03-16 | 旭硝子株式会社 | ガラス板製造装置及び方法 |
JP2015003858A (ja) * | 2014-07-11 | 2015-01-08 | 坂東機工株式会社 | ガラス板の加工寸法自動測定、自動修正方法及びガラス板加工装置 |
WO2019003403A1 (ja) | 2017-06-30 | 2019-01-03 | 東芝三菱電機産業システム株式会社 | 基板位置決め装置及び基板位置決め方法 |
CN110832633A (zh) * | 2017-06-30 | 2020-02-21 | 东芝三菱电机产业系统株式会社 | 基板定位装置及基板定位方法 |
EP3648153A4 (en) * | 2017-06-30 | 2021-02-24 | Toshiba Mitsubishi-Electric Industrial Systems Corporation | SUBSTRATE POSITIONING DEVICE AND SUBSTRATE POSITIONING METHOD |
CN110832633B (zh) * | 2017-06-30 | 2023-06-02 | 东芝三菱电机产业系统株式会社 | 基板定位装置及基板定位方法 |
Also Published As
Publication number | Publication date |
---|---|
TW200948536A (en) | 2009-12-01 |
KR20110009090A (ko) | 2011-01-27 |
JPWO2009119772A1 (ja) | 2011-07-28 |
CN101980833A (zh) | 2011-02-23 |
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