WO2009107812A1 - 基板型光導波路素子、波長分散補償素子、光フィルタ、光共振器、およびそれらの設計方法 - Google Patents
基板型光導波路素子、波長分散補償素子、光フィルタ、光共振器、およびそれらの設計方法 Download PDFInfo
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- WO2009107812A1 WO2009107812A1 PCT/JP2009/053766 JP2009053766W WO2009107812A1 WO 2009107812 A1 WO2009107812 A1 WO 2009107812A1 JP 2009053766 W JP2009053766 W JP 2009053766W WO 2009107812 A1 WO2009107812 A1 WO 2009107812A1
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- optical waveguide
- bragg grating
- refractive index
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- effective refractive
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/12007—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/124—Geodesic lenses or integrated gratings
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
- G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
- G02B6/02123—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating
- G02B2006/02166—Methods of designing the gratings, i.e. calculating the structure, e.g. algorithms, numerical methods
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
- G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
- G02B6/0208—Refractive index modulation gratings, e.g. Bragg gratings characterised by their structure, wavelength response
- G02B6/02085—Refractive index modulation gratings, e.g. Bragg gratings characterised by their structure, wavelength response characterised by the grating profile, e.g. chirped, apodised, tilted, helical
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/28—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals
- G02B6/293—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals with wavelength selective means
- G02B6/29379—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals with wavelength selective means characterised by the function or use of the complete device
- G02B6/29392—Controlling dispersion
- G02B6/29394—Compensating wavelength dispersion
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/015—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on semiconductor elements with at least one potential jump barrier, e.g. PN, PIN junction
- G02F1/0151—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on semiconductor elements with at least one potential jump barrier, e.g. PN, PIN junction modulating the refractive index
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
- G02F2201/06—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 integrated waveguide
- G02F2201/063—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 integrated waveguide ridge; rib; strip loaded
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
- G02F2201/30—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 grating
- G02F2201/307—Reflective grating, i.e. Bragg grating
Definitions
- the present invention relates to a substrate-type optical waveguide element that can be used for various applications such as a chromatic dispersion compensating element, an optical filter, and an optical resonator, and a design method thereof.
- This application claims priority based on Japanese Patent Application No. 2008-049842 filed in Japan on February 29, 2008, the contents of which are incorporated herein by reference.
- Patent Document 1 discloses an element having a plurality of Bragg grating elements whose periods are spatially changed so as to compensate chromatic dispersion for a plurality of wavelength channels as a dispersion compensating element having a Bragg grating pattern in a waveguide. It is disclosed.
- the refractive index distribution n (z) of the Bragg grating composed of a plurality of elements changes in a sinusoidal manner as follows (z is the light propagation) It is also disclosed to indicate the position of the point on the axis.
- FIG. 3 is chirped in the direction in which the local period decreases with increasing z.
- the origin phase ⁇ i varies discretely for each grating element i.
- Patent Document 1 exemplifies a case where a Bragg grating pattern is formed in an optical fiber.
- a Bragg grating having a certain period is formed in a waveguide line, a sampling structure is formed in the waveguide line so as to overlap the Bragg grating, and chromatic dispersion compensation is performed in a plurality of wavelength channels.
- a chromatic dispersion compensating element for performing is described.
- the sampling structure includes a pattern that is phase-sampled at a certain period longer than the period of the Bragg grating.
- Each period of phase sampling is divided into a plurality of spatial regions in the direction along the optical axis of the waveguide, and the phase of the Bragg grating changes discontinuously at the boundary where adjacent spatial regions contact each other.
- Patent Document 3 two optical waveguides are coupled by a plurality of directional couplers, and the optical path lengths of two waveguides in a region sandwiched between two adjacent directional couplers are different from each other, and A two-input / two-output optical dispersion equalizer that performs chromatic dispersion compensation using a structure in which a phase controller is provided in at least one of two waveguides as a basic component is described.
- This document shows a device that compensates a dispersion slope using this waveguide, and an element that compensates chromatic dispersion is provided in an optical input section. In order to further enhance the compensation effect, it is shown that the number of stages for connecting the basic components in series is increased.
- Patent Document 4 a structure including a directional coupler having an amplitude coupling ratio in a range from a positive value to a negative value on one side of two waveguides having an optical path difference is used as a basic constituent element.
- a design method of an optical signal processor that is configured in combination to constitute a two-input / two-output optical circuit without feedback (ie, reflection).
- the characteristics of the optical circuit are expressed using a 2 ⁇ 2 unitary matrix, the desired output characteristics of the crossport are given, and the amplitude parameter of the directional coupler, which is an unknown parameter of the optical circuit, is calculated.
- the configuration of the optical circuit is determined.
- a design example of a chromatic dispersion compensating element based on this design method is shown.
- Patent Document 5 describes a broadband chromatic dispersion compensation element using a high refractive index waveguide using a photonic crystal, and performs chromatic dispersion compensation with a transmissive optical waveguide structure. The sign of chromatic dispersion can be changed.
- a porous glass layer is formed as a thin film layer around the core pattern and on the lower clad layer, thereby forming a core pattern formed by etching (RIE) damage.
- RIE etching
- Non-Patent Document 1 describes an actual fiber Bragg grating chromatic dispersion compensation element manufactured by applying a design method similar to that of Patent Document 2, and the results are described.
- a Bragg grating pattern of a single channel at the center wavelength is designed using the knowledge of Non-Patent Document 2.
- the grating pattern is derived from the desired reflection and chromatic dispersion spectral characteristics by an inverse scattering solution.
- the fiber Bragg grating has a limit in the range in which the refractive index can be changed in order to produce a grating pattern, an operation is performed in which the spectral characteristics are inverse Fourier transformed and apodized so as not to exceed the limit. .
- phase sampling is effective because the range of change in refractive index is limited.
- Non-Patent Document 2 describes an algorithm for solving an inverse scattering problem by a layer peeling method, and shows an analysis example of a chromatic dispersion compensation element using a fiber Bragg grating.
- Non-Patent Document 3 describes a wavelength dispersion compensating element using a chirped Bragg grating waveguide on a substrate.
- This chromatic dispersion compensation element is formed by forming a rectangular optical waveguide core on a silica glass substrate by silver ion exchange, and further forming a Bragg grating pattern in a silica clad on the upper part of the core.
- the propagation axis of the core of the optical waveguide is bent.
- a laser beam pulse having a wavelength of 800 nm is incident, and 58 ps / nm is obtained for an optical waveguide having a grating length of 7 mm.
- the grating having a length of 50 mm enables chromatic dispersion compensation of an optical fiber corresponding to 50 km at a wavelength of 1550 nm.
- US Pat. No. 6,865,319 US Pat. No. 6,707,967 Japanese Patent No. 3262312 Japanese Patent No. 3415267 Japanese Patent No. 3917170 Japanese Patent Laid-Open No. 5-188231 H. Li, Y. Sheng, Y. et al. Li and J.L. E. Rothenberg, “Phase-only sampled fiber Bragg gratings for high-channel-count chromatic dispersion compensation”, Journal of Light tech. Vol. 9, Journal of Light tech. 2074-2083 R. Feced, M.M. N.
- optical signals are transmitted using optical pulses. Therefore, the following problem occurs with respect to (I).
- the transmission speed increases, the time width of the optical pulse is shortened, and the interval between the adjacent optical pulses on the time axis is narrowed. Therefore, it is important to control the time waveform of the optical pulse.
- the time width of an optical pulse is increased as it propagates through the optical fiber due to chromatic dispersion in which the propagation speed varies depending on the wavelength of light.
- Patent Documents 1 to 5 provide techniques relating to the chromatic dispersion compensation element with respect to (I).
- Patent Documents 1 and 2 describe a technique related to a multi-channel chromatic dispersion compensation element corresponding to a plurality of channels of wavelength division multiplexing optical fiber communication.
- optical elements for optical communication are often configured using optical waveguides. For this reason, downsizing the optical waveguide is important in promoting downsizing of optical components.
- a material having a high refractive index such as silicon (Si).
- the refractive index of Si is about 3.5, which is 2.3 times or more that of silica (SiO 2 ) (about 1.5). Since a high refractive index material such as Si is formed on a flat substrate, it is easy to couple a plurality of optical waveguides and is suitable for the purpose of integrating a plurality of optical components.
- optical waveguide is downsized, the raw material cost per optical element is reduced, and the unit price can be reduced. Since a high refractive index material such as Si is formed on a flat substrate, a large area substrate can be used to manufacture a large number of optical elements on a single substrate, which can further reduce manufacturing costs. become.
- the effective refraction of the optical waveguide in the design of the optical waveguide The rates must be equal to each other for a polarization state parallel to and orthogonal to the substrate surface. This is because the cross-sectional shape of the core of the high refractive index optical waveguide on the flat substrate is different from the circular core cross section of the semiconductor optical fiber. If the effective refractive index of the optical waveguide differs depending on the polarization, the chromatic dispersion generated in the optical waveguide changes depending on the polarization. In that case, the performance of the chromatic dispersion compensating element depends on the polarization of the optical pulse propagating through the optical fiber.
- Patent Literature 1 In the technology of Patent Literature 1, only a case where a Bragg grating using an optical fiber is formed as a device structure example is described. In other words, this technology is mainly intended for optical fiber Bragg gratings.
- the cross section of the optical fiber is circular, and its optical characteristics do not depend on the polarization direction of the propagating light. For this reason, there is no provision of a technique related to the design of an optical waveguide for reducing the polarization dependence.
- the effective refractive index is defined independently for each of the polarized light parallel to the substrate surface and the polarized light perpendicular to the substrate surface, and the structure of the waveguide is optimized so that both effective refractive indexes match.
- the shape of the effective refractive index pattern of the Bragg grating is determined by the above equation, and the chromatic dispersion characteristic obtained by simulation from the structure approaches a predetermined characteristic. As described above, this is due to the procedure of determining parameters in the equation such as the effective refractive index amplitude and element length.
- a Bragg grating optical waveguide is configured only by superimposing the Bragg grating patterns corresponding to each wavelength channel. Therefore, removal of interference between wavelength channels is not taken into the design method, and there is a problem that the characteristics of chromatic dispersion deteriorate due to interference between wavelength channels.
- this design method has a reverse procedure to the design method for specifying the effective refractive index pattern of the Bragg grating from predetermined element dimensions and optical characteristics.
- it is essential to determine the element length in advance, but this is not possible with the design method of Patent Document 1.
- Patent Document 2 does not include a design related to polarization dependence as in Patent Document 1. Therefore, it is impossible to apply the technique of this document to the design of a chromatic dispersion compensation element composed of a high refractive index optical waveguide with reduced polarization dependence on the substrate.
- This document adopts a policy of designing a grating waveguide mainly based on the phase sampling of the grating. This is because this document is intended for a low refractive index optical waveguide having a refractive index in the range of 1.4 to 1.5, such as an optical fiber, and has a limitation that the range in which the effective refractive index of the optical waveguide can be changed is narrow. Because.
- Patent Document 2 describes that the technique can be applied to a waveguide on a substrate, but it is only suitable for a similar low refractive index optical waveguide. Therefore, the technique of Patent Document 2 is not suitable for the purpose of reducing the grating length as much as possible without reducing the reflectivity by significantly changing the effective refractive index in the reflection type optical waveguide. . Furthermore, Patent Document 2 describes that the phase sampling pattern is effective in avoiding performance deterioration due to voids when a grating structure is manufactured. This is because this document is directed to a manufacturing method in which a grating pattern is baked on an optical fiber by irradiation with ultraviolet rays with the preparation of the optical fiber grating in mind. If the target is a high refractive index optical waveguide on a substrate, there should be no restriction of performance degradation due to voids.
- Patent Document 3 does not describe a technique for reducing polarization dependency.
- the optical waveguide alone in this document can only compensate for the dispersion slope, and cannot compensate for chromatic dispersion.
- Patent Document 4 does not describe a technique for reducing polarization dependency.
- the phase characteristics are antisymmetric with respect to the origin, so that the chromatic dispersion in the adjacent spectral region is inverted. Therefore, this chromatic dispersion compensation element can be used for chromatic dispersion compensation only for a limited spectral region, that is, a specific spectral region channel. It cannot be used for the purpose of compensating the chromatic dispersion of the channels.
- Patent Literature 5 The technology of Patent Literature 5 can compensate for chromatic dispersion in a wide wavelength band, but does not support multi-channeling. Therefore, the chromatic dispersion value is not large. Therefore, it cannot be used for the purpose of compensating the chromatic dispersion of a long-distance (for example, 40 km) optical fiber transmission line for the purpose of application to wavelength division multiplexing optical fiber communication.
- Patent Document 6 The problem to be solved by the technique of Patent Document 6 is a reduction in scattering loss generated at the core / cladding interface.
- the technical idea for solving the problem is to flatten the interface using a thin film layer having substantially the same refractive index as the core layer.
- a material having a refractive index much higher than that of silica glass-based materials such as silicon and silicon nitride is used as the core layer.
- silica glass-based materials such as silicon and silicon nitride
- Non-Patent Literature 1 The technology of Non-Patent Literature 1 has the same problem as Patent Literature 2.
- Non-Patent Document 3 Although the Bragg grating optical waveguide is formed on a flat substrate, a grating pattern is formed only in the cladding region above the optical waveguide core. Therefore, the effective refractive index of the optical waveguide is different for light linearly polarized in a direction parallel or perpendicular to the substrate surface. For this reason, the performance of chromatic dispersion varies greatly depending on the polarization state.
- Experiments in this document are carried out using a Ti: sapphire laser as a light source. Ti: sapphire lasers usually emit linearly polarized light. This document does not describe the polarization state, and does not consider how to eliminate the difference in effective refractive index due to the difference in polarization. Therefore, it is impossible to apply the technique of this document to the design of a chromatic dispersion compensation element composed of a high refractive index optical waveguide with reduced polarization dependence on the substrate.
- the substrate type optical waveguide device as shown in FIGS. 49A and 49B, a rib type core structure is known.
- the optical waveguide formed on the substrate 205 has a lower clad 206, cores 201 and 202, and an upper clad 207.
- the ribs 201 and 202 are composed of flat portions 201a and 202a and rectangular parallelepiped portions 201b and 202b positioned on the edges of the flat portions 201a and 202a.
- the optical waveguide shown in FIGS. 49A and 49B has a problem in that scattering loss increases due to the effect of the roughness of the rib side walls.
- the present invention has been made in view of the above circumstances, a substrate-type optical waveguide device capable of reducing the influence of inevitable core side wall roughness that occurs in the manufacturing process, and a chromatic dispersion compensation device using the same It is an object to provide a design method.
- the core of the optical waveguide includes an inner core having a convex portion forming a rib structure, and an outer core provided on the upper side of the inner core and covering the peripheral surface of the convex portion,
- a substrate-type optical waveguide device characterized in that a refractive index of an outer core is lower than an average refractive index of the inner core.
- the first Bragg grating pattern and the second Bragg grating pattern are viewed in a cross section orthogonal to the light guiding direction, Formed in parallel regions along the waveguide direction;
- the first Bragg grating pattern is irregularities formed on both outer walls of the core of the optical waveguide along the waveguide direction of the light;
- 2 Bragg grating patterns are irregularities formed on both inner side walls of a groove formed in the center in the width direction of the core along the light guiding direction and on the upper portion of the core;
- a portion with a large core width in the first Bragg grating pattern corresponds to a portion with a narrow groove width in the second Bragg grating pattern.
- the first wide portion and the narrow portion of the core width of the groove width of the second Bragg grating pattern of the Bragg grating pattern corresponds.
- the sign of the gradient of the envelope of the amplitude of the Bragg grating is inverted in each of the first Bragg grating pattern and the second Bragg grating pattern. It is preferable to include a plurality of isolated single coordinate points.
- the optical waveguide has a Bragg grating pattern, and this Bragg grating pattern takes only discrete values having three or more local periods.
- These discrete values exist at a plurality of locations over the entire length of the optical waveguide; among these discrete values, the value with the highest distribution frequency is defined as M, which is larger than this M and closest to this M; When the value is A and the value smaller than M and the value closest to M is B, it is preferable that the difference represented by AM is equal to the difference represented by MB.
- the optical waveguide is disposed along the light guiding direction in the center of the core and the width direction of the core. And a single mode optical waveguide in which the core has two regions separated by the gap, and a single mode is propagated across the two regions. It is preferable to constitute.
- the present invention is a chromatic dispersion compensating element comprising the substrate type optical waveguide element described in the above (1) to (5), wherein the optical waveguide has a Bragg grating pattern, and a plurality of wavelength channels are provided.
- a chromatic dispersion compensating element that compensates for chromatic dispersion and dispersion slope in the optical waveguide by varying the distance that the signal light propagates through the optical waveguide from when it enters the optical waveguide to when it is reflected. I will provide a.
- the present invention provides the chromatic dispersion compensating element design method according to the above (6), wherein the chromatic dispersion compensating element is configured such that the first Bragg grating pattern and the second Bragg grating pattern are light.
- the optical waveguide When viewed in a cross section orthogonal to the waveguide direction, the optical waveguide is formed in two regions parallel to the light guide direction; when viewed in a cross section orthogonal to the light guide direction, by changing the dimensions of the two regions and equalizing the effective refractive index of the optical waveguide with respect to two independent polarizations guided to the optical waveguide, a common effective refractive index for both polarizations is obtained.
- optical waveguide cross-sectional structure design process for obtaining the relationship between the dimensions of the two regions and the common effective refractive index, and specifying a chromatic dispersion, a dispersion slope and a reflectance as parameters, and a predetermined complex reflectance slope.
- a Bragg grating pattern design step of obtaining a shape distribution of the effective refractive index of the optical waveguide along the light guiding direction, Based on the relationship between the dimensions of the two regions obtained in the optical waveguide cross-sectional structure design process and the common effective refractive index, the shape distribution of the effective refractive index obtained in the Bragg grating pattern design process.
- a method for designing a chromatic dispersion compensating element is provided.
- the resolution of the discretization of the coordinate axes is paraphrased to be equal to or more than the change in pitch corresponding to the half value of the width of the reflection band.
- a coarse-graining step that takes more than the maximum value of the change from the center value of the pitch in the chirped Bragg grating, the sign of the gradient slope of the amplitude of the Bragg grating is inverted by this coarse-graining step.
- An optical waveguide including a plurality of isolated single coordinate points is preferably configured.
- the present invention also provides an optical filter comprising the substrate type optical waveguide device as described in (1) to (5) above.
- the present invention is the optical filter design method according to the above (9), in which the first Bragg grating pattern and the second Bragg grating pattern are in a light guiding direction. When viewed in a cross section orthogonal to each other, it has an optical waveguide formed in two regions arranged in parallel along the light guiding direction; and when viewed in a cross section orthogonal to the light guiding direction, By changing the dimensions of two regions and equalizing the effective refractive index of the optical waveguide for two independent polarizations guided in the optical waveguide, the common effective refractive index for both polarizations is obtained.
- the Bragg grating pattern design step for obtaining the effective refractive index shape distribution along the waveguide direction of the optical waveguide and the optical waveguide cross-sectional structure design step were used. Based on the relationship between the dimensions of the two regions and the common effective refractive index, the shape distribution of the effective refractive index obtained in the Bragg grating pattern design process is converted into a shape distribution of the dimensions of the two regions.
- the resolution of the discretization of the coordinate axes is more than the change in pitch corresponding to the half value of the width of the reflection band.
- An isolated single coordinate point where the sign of the slope of the envelope of the amplitude of the Bragg grating is inverted by having a coarse graining process that takes more than the maximum change from the center value of the pitch in the chirp Bragg grating It is preferable that an optical waveguide including a plurality of is formed.
- the present invention provides a first optical waveguide serving as a first reflecting mirror, a second optical waveguide serving as a second reflecting mirror, the first optical waveguide and the second optical waveguide. And a third optical waveguide sandwiched between them, and the first optical waveguide, the third optical waveguide, and the second optical waveguide are connected in series to form a single substrate type optical waveguide.
- An optical resonator, wherein the first optical waveguide and the second optical waveguide comprise the substrate type optical waveguide device according to any one of (1) to (5) above. provide.
- the present invention is the optical resonator design method according to the above (12), in which the reflection mirror has a first Bragg grating pattern and a second Bragg grating pattern in a light guiding direction.
- this effective refractive index is set to a common effective refractive index for both polarizations.
- An optical waveguide cross-sectional structure design step for obtaining a relationship between the dimension of the two regions and the common effective refractive index by obtaining; a predetermined complex reflectance spectrum by specifying two of reflectance and phase as parameters;
- a Bragg grating pattern design process for obtaining a shape distribution of an effective refractive index along the waveguide direction of the optical waveguide from the complex reflectance spectrum and a desired optical waveguide length; Based on the relationship between the dimensions of the two regions obtained in the design process and the common effective refractive index, the shape distribution of the effective refractive index obtained in the Bragg grating pattern design process is calculated according to the dimensions of the two regions.
- the resolution of the discretization of the coordinate axes is more than the change in pitch corresponding to the half value of the width of the reflection band, in other words.
- the invention described in (1) above is made of a high refractive index material as compared with a conventional high relative refractive index difference buried type optical waveguide consisting of only a core and a clad made of a high refractive index material. Since the light confinement in the inner core is weakened, the influence (scattering loss) exerted on the optical characteristics by the inevitable roughness of the inner core side wall that occurs in the manufacturing process can be suppressed. Furthermore, such core silicon (Si) or silicon nitride (Si x N y), is applicable to a material having a higher refractive index than the silica glass-based material.
- the polarization dependence of the optical characteristics can be reduced.
- the waveguide length can be shortened compared to the sampled grating.
- tolerance management in the manufacturing process is facilitated, which contributes to an improvement in manufacturing yield.
- the invention described in (5) above since the mode field diameter of the fundamental mode is widened, the influence (scattering loss) exerted on the optical characteristics by the inevitable roughness of the inner core side wall that occurs in the manufacturing process can be suppressed.
- FIG. 1A is a cross-sectional view showing a first embodiment of a substrate type optical waveguide device of the present invention.
- FIG. 1B is a partial perspective view of the same substrate type optical waveguide device.
- FIG. 2A is a partial plan view of a grating structure in the substrate type optical waveguide device of the present invention.
- FIG. 2B is a cross-sectional view of the grating structure.
- FIG. 2C is a partial perspective view of the grating structure.
- FIG. 3A is a partial plan view showing another example of the grating structure in the substrate type optical waveguide device of the present invention.
- FIG. 3B is a cross-sectional view of the grating structure.
- FIG. 3C is a partial perspective view of the grating structure.
- FIG. 4 is a sectional view showing a second embodiment of the substrate type optical waveguide device of the present invention.
- FIG. 5A is a graph showing an example of a change in effective refractive index with respect to win.
- Figure 5B is a graph showing an example of a change in w out with changes in w in.
- FIG. 6 is a graph showing changes in win and w out with respect to n eff in the second embodiment of the substrate-type optical waveguide device.
- FIG. 7 is a graph showing the wavelength dependence of the group delay time obtained in the first and second embodiments of the chromatic dispersion compensating element.
- FIG. 8 is a graph showing an effective refractive index profile in Example 1 of the chromatic dispersion compensating element.
- FIG. 9 is an enlarged graph showing a part of the effective refractive index profile of FIG.
- FIG. 10 is a graph showing an enlarged portion of the effective refractive index profile of FIG. 8 together with an envelope.
- FIG. 11 is a graph showing the pitch distribution in Example 1 of the chromatic dispersion compensating element.
- FIG. 12A is a graph showing the wavelength dependence of the group delay time obtained in Example 1 of the chromatic dispersion compensating element.
- FIG. 12B is an enlarged graph showing the vicinity of the wavelength 1571 nm of FIG. 12A.
- FIG. 12C is an enlarged graph showing the vicinity of the wavelength of 1590 nm in FIG. 12A.
- FIG. 12D is an enlarged graph showing the vicinity of the wavelength 1610 nm in FIG. 12A.
- FIG. 13 is a graph showing an enlarged part of the optical waveguide dimension profile in Example 1 of the chromatic dispersion compensating element.
- FIG. 14 is a cross-sectional view showing a third embodiment of the substrate type optical waveguide device of the present invention.
- FIG. 15 is a graph showing changes in win and w out with respect to n eff in the third embodiment of the substrate type optical waveguide device.
- FIG. 16 is a graph showing an effective refractive index profile in Example 2 of the chromatic dispersion compensating element.
- FIG. 17 is a graph showing an enlarged part of an optical waveguide dimension profile in Example 2 of the chromatic dispersion compensating element.
- FIG. 18 is a graph showing the wavelength dependence of the group delay time obtained in Example 3 of the chromatic dispersion compensating element.
- FIG. 19 is a graph showing an effective refractive index profile in Example 3 of the chromatic dispersion compensating element.
- FIG. 20 is a graph showing the pitch distribution in Example 3 of the chromatic dispersion compensating element.
- FIG. 21 is a graph showing the wavelength dependence of the group delay time obtained in Example 3 of the chromatic dispersion compensating element.
- FIG. 22 is a graph showing the wavelength dependence of the group delay time obtained in Example 4 of the chromatic dispersion compensating element.
- FIG. 23 is a graph showing an effective refractive index profile in Example 4 of the chromatic dispersion compensating element.
- FIG. 24 is a graph showing the pitch distribution in Example 4 of the chromatic dispersion compensating element.
- FIG. 25 is a graph showing the wavelength dependence of the group delay time obtained in Example 4 of the chromatic dispersion compensation element.
- FIG. 26 is an explanatory diagram illustrating an example of a method of connecting the chromatic dispersion compensating element and the optical transmission line.
- FIG. 27 is a graph showing optical characteristics specified for the first and fifth embodiments of the optical filter.
- FIG. 28 is a graph showing an effective refractive index profile in Example 1 of the optical filter.
- FIG. 29 is a graph showing an enlarged part of the effective refractive index profile of FIG.
- FIG. 30 is an enlarged graph showing a part of the optical waveguide dimension profile in Example 1 of the optical filter.
- FIG. 31 is a graph showing optical characteristics specified for the optical filter according to the second embodiment.
- FIG. 32 is a graph showing an effective refractive index profile in Example 2 of the optical filter.
- FIG. 33 is a graph showing a part of the effective refractive index profile of FIG. 32 in an enlarged manner.
- FIG. 34 is a graph showing an enlarged part of an optical waveguide dimension profile in Example 2 of the optical filter.
- FIG. 35 is a graph showing optical characteristics specified for the optical filter according to the third embodiment.
- FIG. 36 is a graph showing an effective refractive index profile in Example 3 of the optical filter.
- FIG. 37 is a graph showing an enlarged part of the effective refractive index profile of FIG.
- FIG. 38 is a graph showing an enlarged part of an optical waveguide dimension profile in Example 3 of the optical filter.
- FIG. 39 is a graph showing optical characteristics specified for the optical filter in Example 4.
- FIG. 39 is a graph showing optical characteristics specified for the optical filter in Example 4.
- FIG. 40 is a graph showing an effective refractive index profile in Example 4 of the optical filter.
- FIG. 41 is a graph showing an enlarged part of the effective refractive index profile of FIG.
- FIG. 42 is a graph showing an enlarged part of the optical waveguide dimension profile in Example 4 of the optical filter.
- FIG. 43 is a graph showing an effective refractive index profile in Example 5 of the optical filter.
- FIG. 44 is a graph showing an enlarged part of an optical waveguide dimension profile in Example 5 of the optical filter.
- FIG. 45 is a schematic diagram illustrating a configuration example of an optical resonator.
- FIG. 46 is a graph showing the reflection spectra of the first and second reflection mirrors on the lower side and the product of both on the upper side.
- FIG. 46 is a graph showing the reflection spectra of the first and second reflection mirrors on the lower side and the product of both on the upper side.
- FIG. 47 is a graph showing the Fabry-Perot resonance intensity characteristics on the lower side and the transmission characteristics of the optical resonator on the upper side.
- FIG. 48 is a graph showing the frequency dependence of the delay time on the upper side and the absolute value and phase of the complex electric field reflectance on the lower side in an example of an optical element having a single reflection channel.
- FIG. 49A is a cross-sectional view showing a schematic configuration of a substrate-type optical waveguide device of a comparative example.
- FIG. 49B is a partial perspective view of the same substrate type optical waveguide device.
- FIG. 50 is a cross-sectional view showing dimensions of each part of the substrate type optical waveguide device of the first embodiment.
- FIG. 51 is a contour map showing a simulation result of the light intensity distribution of the core in the example of the substrate type optical waveguide device shown in FIGS.
- FIG. 52 is a contour diagram showing a simulation result of the light intensity distribution of the core in Comparative Example 1 of the substrate type optical waveguide device shown in FIG.
- FIG. 1 schematically shows a first embodiment of the substrate type optical waveguide device of the present invention.
- 1A is a cross-sectional view
- FIG. 1B is a partial perspective view.
- FIG. 50 shows the dimensions of each part of the substrate type optical waveguide device of this embodiment.
- an optical waveguide is formed on a substrate 5, and the core is a composite core composed of two regions of an L-shaped inner core 1, 2 and an outer core 4.
- the optical waveguide includes a lower clad 6 formed on the substrate 5, inner cores 1 and 2 formed on the lower clad 6, and an outer core 4 formed on the inner cores 1 and 2. And an upper clad 7 formed on the inner cores 1 and 2 and the outer core 4.
- the optical waveguide of this embodiment is not limited to a straight waveguide, but may be a curved waveguide.
- the inner cores 1 and 2 are composed of two regions of a first rib 1 and a second rib 2.
- the first and second ribs (inner cores) 1 and 2 are made of a material having a higher refractive index than that of the outer core 4.
- First rib 1 and the height of the second rib 2 equally, as shown in Figure 50, t 2.
- the 1st and 2nd ribs 1 and 2 are the same shape, respectively, and form a convex part in a mutual butted part.
- the first and second ribs 1 are composed of flat portion 1a, a 2a, the plane portion 1a, the height t 1 of the rectangular portion 1b located above the 2a edges, and 2b
- the Rectangular solid portion 1b, 2b constitute the convex portion of the width w 1.
- the material constituting the rectangular parallelepiped portions 1b and 2b and the material constituting the flat portions 1a and 2a are the same.
- first and second ribs 1 and 2 examples include a high refractive index material such as silicon (Si).
- a high refractive index material such as silicon (Si).
- P-type or N-type conductivity can be imparted to the first rib 1 and the second rib 2 by adding appropriate impurities in the medium. That is, the first rib 1 may be a P-type region and the second rib 2 may be an N-type region. Conversely, the first rib 1 may be an N-type region and the second rib 2 may be a P-type region.
- Impurities (dopants) that impart conductivity to the high refractive index core made of a semiconductor can be appropriately selected according to the host medium.
- the base medium is a group IV semiconductor such as silicon
- a group III element such as boron (B) is used as an additive that imparts P-type polarity
- phosphorus (P) or the like is used as an additive that imparts N-type polarity.
- Group V elements such as arsenic (As) can be used.
- the first rib 1 and the second rib 2 of the core are high refractive index ribs made of a semiconductor such as Si, and one is P-type and the other is N-type. A PIN junction is formed in the plane of 2. Then, an electrode pad for applying a voltage is provided to each of the first rib 1 and the second rib 2, and a potential difference is applied between the two ribs 1 and 2, thereby inducing a change in refractive index due to a change in carrier concentration.
- the optical characteristics of the electrode element can be made variable.
- the outer core 4 is disposed on the inner cores 1 and 2 and covers the three directions of the convex portion formed of the rectangular parallelepipeds 1b and 2b, that is, the periphery including the flat portion of the rectangular parallelepiped and the two opposing rib side walls.
- the refractive index of the outer core 4 is lower than the average refractive index of the inner cores 1 and 2. Examples of the material include Si x N y, but other materials may be used. Width w 2 of the outer core 2 is greater than the width w 1 of the convex portion, the thickness t 3 of the outer core 4 is larger than the height t 1 of the convex portion.
- the composite core is present on the lower clad 6 formed on the substrate 5.
- the upper and side walls of the composite core are covered with an upper cladding 7.
- the upper cladding 7 and the lower cladding 6 are made of a material lower than the average refractive index of the composite core.
- the material of the upper cladding 7 and the material of the lower cladding 6 are not particularly limited. Specific examples include Si as the material of the substrate 5 and SiO 2 as the material of the upper clad 7 and the lower clad 6, but are not particularly limited thereto.
- the upper cladding 7 and the lower cladding 6 may have a sufficient thickness according to the thickness of the composite core.
- a silica glass-based material such as silicon (Si) or silicon nitride (Si x N y ) is used to reduce scattering loss due to roughness of the inner core side wall by expanding the mode field diameter as a structure having an outer core. Even a material having a higher refractive index is applicable.
- a grating structure can be provided due to a periodic variation of the core shape and dimensions.
- the Bragg grating pattern After calculating a predetermined complex reflectance spectrum by specifying three parameters consisting of chromatic dispersion, dispersion slope and reflectance as parameters, the complex reflectance spectrum and the length of the desired optical waveguide are calculated. From the above, there is a method for obtaining a shape distribution of the effective refractive index along the waveguide direction of an optical waveguide having a Bragg grating.
- a Bragg grating pattern on the side wall and upper part of the core, because these two types of Bragg grating patterns can reduce the polarization dependence of the optical characteristics.
- a description will be given of a configuration example and a design method of a substrate-type optical waveguide device having two types of Bragg grating patterns in the optical waveguide.
- FIG. 2 schematically shows an example of a grating structure in the substrate-type optical waveguide device of the present invention.
- the effective refractive index of the optical waveguide is periodically changed, and a Bragg grating can be configured.
- FIG. 2 only the core 10 is illustrated and illustration of the clad is omitted, but the clad actually surrounds the core 10.
- a substrate (not shown) exists under the cladding, and the bottom surface 14 of the core 10 is parallel to the substrate surface.
- the horizontal direction means a direction parallel to the substrate surface, and the vertical direction means a direction perpendicular to the substrate surface.
- the core 10 is preferably applied as an outer core.
- FIG. 2A is a plan view of a part of the core 10.
- Reference symbol C represents a single central axis in the horizontal plane of the optical waveguide core 10, and light propagates along the central axis C in the optical waveguide.
- This optical waveguide has a Bragg grating pattern (described later in detail), and at least one reflection band appears in the spectrum of this optical waveguide.
- the effective refractive index n eff is a value when the width of the core 10 of the optical waveguide is an average width w 0 .
- Average width w 0 of the core 10 is equal to the average value in one period of the horizontal width w out of the core 10 is a constant value along the central axis C over the entire optical waveguide.
- Recesses 12a and the projections 12b on the side wall 12 of the core 10 are alternately formed, the width w out to form a first Bragg grating pattern oscillates alternately every one period p G.
- This Bragg grating pattern is considered to be obtained by alternately changing the horizontal width (that is, the lateral width w out ) of the optical waveguide having a rectangular cross section (see FIG. 2B).
- An optical waveguide having a rectangular cross section has its own waveguide mode when the linearly polarized electric field of light is mainly along the horizontal direction (hereinafter referred to as TE-type polarization) and mainly along the vertical direction (hereinafter referred to as TM-type polarization).
- TE-type polarization linearly polarized electric field of light
- TM-type polarization vertical direction
- the effective refractive index n eff TE of the eigen mode in the TE-type polarized light changes more sensitively to changes in the width of the optical waveguide than the effective refractive index n eff TM of the eigen mode in the TM-type polarized light.
- the effective refractive index n eff TM of the eigenmode in the TM polarization is more sensitive to changes in the height (ie, thickness) of the optical waveguide than the effective refractive index n eff TE of the eigen mode in the TE polarization.
- this substrate type optical waveguide device two kinds of Bragg grating patterns are located in different regions in a cross section perpendicular to the light guiding direction. Also, two types of Bragg grating patterns are formed in regions that are arranged in parallel along the light guiding direction. That is, the range in which each Bragg grating pattern exists along the central axis C is the same.
- the combination of the first Bragg grating pattern and the second Bragg grating pattern can equalize the action on the TE-type polarization and the action on the TM-type polarization, thereby reducing the polarization dependency.
- a first Bragg grating pattern is provided on one or both side walls of the core, and a second Bragg grating pattern is provided on the upper surface of the core and / or It is preferable to provide it on the bottom surface.
- the first Bragg grating pattern is provided on both side walls of the core, and the second Bragg grating pattern is provided on the upper surface of the core.
- the shape of the core 10 is horizontally symmetric with respect to a vertical plane including the central axis C (symmetric in the vertical direction with respect to the central axis C in FIG. 2A).
- a material for forming the lower clad is formed on the entire surface of the substrate.
- the material constituting the core is formed on the lower clad and processed into the shape of the Bragg grating.
- a material to be the upper cladding is formed on the lower cladding and the core so that the core is surrounded by the lower cladding and the upper cladding around the cross section.
- the amplitude and period of the periodic fluctuation of the Bragg grating are not constant. Therefore, it is necessary to mold the core into a shape corresponding to such irregular fluctuations.
- Forming of the width of the core can be realized drawing using the optical mask including a grating pattern corresponding to the wavelength dispersion compensation of a plurality of channels (periodic variation of the horizontal width w out) and (lithography) by etching.
- FIG. 2B shows a cross section of the core in a plane perpendicular to the central axis C.
- the core 10 of the present embodiment instead of varying the height of the core, as shown in FIG. 2, periodically vary the width w in the groove provided in the core upper (trench) 13.
- the height of the core is t out, the depth of the groove 13 is t in.
- the groove 13 extends in a direction along the central axis C, the horizontal coordinate of the midpoint of the width w in the groove 13, located on the central axis C.
- the effective refractive index can be changed equivalently to changing the height of the core 10 periodically.
- the side wall of the groove 13 are formed alternately concave 13a and the convex portion 13b, the groove width w in the form a second Bragg grating pattern oscillates alternately every one period p G. Since the depth t in is constant in the groove 13, the groove 13 having a periodic variation of the width win can be realized by drawing (lithography) using an optical mask and etching.
- an optical waveguide having a Bragg grating in both the width direction and the height direction can be configured by forming the groove width win in the upper portion of the core in the same manner as the core width w out. . Accordingly, the polarization dependence can be reduced by making the change in the effective refractive index due to the first Bragg grating pattern in the width direction correspond to the change in the effective refractive index due to the second Bragg grating pattern in the height direction. .
- the core width w out wide portion of the side wall 12 (projecting portions 12b) and the grooves 13 the groove width w in the narrow portion of the inner wall (protrusion 13b ) and and the corresponding, and narrow portion of the core width w out of the side wall 12 (the recess 12a) and the groove 13 groove width w in a wide portion of the inner wall (recess 13a) it corresponds.
- unevenness of the first Bragg grating pattern and the unevenness of the second Bragg grating pattern is synchronized, each local period p G match. This is preferable because the design of the optical waveguide dimensions becomes easy.
- a protrusion (ridge) 15 may be provided as shown in FIGS. 3A to 3C instead of the groove (trench) 13 as a structure provided on the core.
- the groove 13 is preferable from the viewpoint of easy control of the effective refractive index, but the protrusion 15 may be selected when there are restrictions due to the material or process conditions.
- the protrusions 15 are manufactured by further forming a material constituting the core and forming periodic fluctuations in the width direction by optical drawing (lithography) and etching.
- the period of the unevenness of the first Bragg grating pattern and the period of irregularities of the second Bragg grating pattern is synchronized, each local period p G match. This is preferable because the design of the optical waveguide dimensions becomes easy.
- the groove 13 and / or the protrusion 15 is preferably formed at the center in the width direction and at the upper part in the vertical direction of the core 10. In this case, the horizontal coordinate of the midpoint of the width w in the grooves 13 and / or protrusion 15 is located on the center axis C of the core 10.
- the second Bragg grating pattern can be configured by using a groove-like structure and a protrusion-like structure in combination.
- the grooves 13 shown in FIGS. 2A to 2C and the protrusions 15 shown in FIGS. 3A to 3C are connected to the light guiding direction, but the cores can also be formed by forming recesses and / or protrusions for each local period. A periodic change can be given in the height direction.
- the groove 13 and the protrusion 15 formed on the upper surface 11 of the core 10 are formed in a part of the center of the core 10 in the width direction, but the thickness of the core 10 itself may be changed.
- the second Bragg grating pattern is constituted by the protrusion 15 and / or the groove 13 formed at the center in the width direction and at the upper part in the vertical direction.
- the groove 13 is most preferable because it is obtained by forming only one layer of material to form the core.
- an optical waveguide having a cross-sectional structure as shown in FIG. As a structure of a Bragg grating optical waveguide with reduced polarization dependence, an optical waveguide having a cross-sectional structure as shown in FIG.
- the cross-sectional structure of the core 10 is made uniform in the substrate type optical waveguide devices of FIGS. 2A to 2C and FIGS. 3A to 3C.
- an optical waveguide having a composite core structure as shown in FIG. 4 is preferable in order to increase the accuracy of the effective refractive index.
- the core of the substrate-type optical waveguide device 20 having the cross-sectional structure of FIG. 4 is a composite core composed of two regions of the inner cores 21 and 22 and the outer core 24.
- the inner core is composed of two regions of a first rib 21 and a second rib 22, and a central gap 23 is provided therebetween.
- the first and second ribs 21 and 22 are made of a material having a higher refractive index than that of the outer core 24.
- the central gap 23 need not be made of a material having a higher refractive index than that of the outer core 24.
- the height of the first and second ribs 21, 22 and the central gap 23 are equal, as shown in Figure 4, t 2.
- a central gap between the first and second ribs 21 and 22 increases the cross-sectional area of the region where light is confined in the inner core while maintaining the condition that only a single mode exists in a single polarization state. it can.
- accuracy degradation of the effective refractive index due to a processing error of a Bragg grating (described later) formed on the outer core 24 can be reduced, it is also effective in reducing the polarization dependence of the effective refractive index.
- the first and second ribs 21 and 22 have the same shape, and have shapes that are inverted in the horizontal direction. Specifically, the first and second flat portions 21a of the ribs 21 and 22 respectively the thickness t 2, 22a and, the plane portion 21a, the height t 1 located on the 22a of the edge, the width w 1 It is comprised from the rectangular parallelepiped parts 21b and 22b.
- the material constituting the rectangular parallelepiped portions 21b and 22b is the same as the material constituting the flat portions 21a and 22a.
- the width of the central gap 23 is w 2 and is made of a material having a lower refractive index than the first and second ribs 21 and 22.
- the first and second ribs 21 and 22 are silicon (Si) and the central gap 23 is silica (SiO 2 ).
- the central gap 23 may be made of silicon oxynitride (SiO x N y ) or silicon nitride (Si x N y ) instead of silica (silicon oxide).
- the composition ratio x: y is controlled so that the refractive index is 1.5 for SiO x N y and the refractive index is 2.0 for Si x N y. Any other composition ratio may be used as long as it has a lower refractive index than Si of the ribs 21 and 22.
- the P-type or N-type conductivity can be imparted to the first rib 21 and the second rib 22 by adding an appropriate impurity in the medium. That is, the first rib 21 may be a P-type region and the second rib 22 may be an N-type region. Conversely, the first rib 21 may be an N-type region and the second rib 22 may be a P-type region.
- Impurities (dopants) that impart conductivity to the high refractive index core made of a semiconductor can be appropriately selected and used according to the base medium.
- the base medium is a group IV semiconductor such as silicon
- a group III element such as boron (B) is used as an additive that imparts P-type polarity
- phosphorus (P) or the like is used as an additive that imparts N-type polarity.
- Group V elements such as arsenic (As) can be used.
- the first rib 21 and the second rib 22 of the core are high refractive index ribs made of a semiconductor such as Si, and one is P-type and the other is N-type, and a central gap 23 made of an insulator.
- a PIN junction can be formed in the plane represented by the thickness t 2 of the inner cores 21 and 22.
- an electrode pad for applying a voltage is provided on each of the first rib 21 and the second rib 22, and a potential difference is applied between the two ribs 21 and 22, thereby inducing a change in refractive index due to a change in carrier concentration.
- the optical characteristics of the electrode element can be varied.
- the central gap 23 made of an insulator between the two ribs 21 and 22 constituting the P-type / N-type region, an effect of suppressing the leakage current between the P-type region and the N-type region is obtained.
- current consumption can be greatly reduced.
- a voltage of several volts was applied between the two ribs, a current of about sub-milliamperes (sub-mA) flowed between the P-type and N-type regions.
- the leakage current between the P-type and N-type regions was only about sub-nanoampere (sub-nA) even when a voltage of 30 to 40 V was applied.
- first rib 21 and the second rib 22 have conductivity of opposite polarity (P type or N type) and that an electrode pad for applying a voltage is provided. Instead, it is possible to use the inner cores 21 and 22 without applying an external voltage.
- the outer core 24 is disposed on the inner cores 21 and 22.
- the refractive index of the outer core 24 is lower than the average refractive index of the inner cores 21 and 22.
- Examples of the material include Si x N y, but other materials may be used.
- first and second Bragg grating patterns similar to those of the core 10 of FIG. 2 are formed on the upper surface 24 a and the side wall 24 b of the outer core 24. Specifically, a first Bragg grating pattern, the width w in the groove (trench) 24c formed on the upper surface 24a of the outer core 24 periodically with a width w out of the outer core 24 is periodically changed A changed second Bragg grating pattern is provided.
- the thickness of the outer core 24 at t out, the depth of the groove 24c is t in.
- w in and w out change periodically.
- the Bragg grating pattern on the upper surface 24a is composed of the grooves 24c.
- the protrusions 15 may be employed.
- the composite core is present on the lower clad 26 formed on the substrate 25.
- the upper and side walls of the composite core are covered with an upper clad 27.
- the upper clad 27 and the lower clad 26 are made of a material lower than the average refractive index of the composite core.
- the material of the upper clad 27 and the material of the lower clad 26 may be the same or different. Specific examples include Si as a material for the substrate 25 and SiO 2 as a material for the upper clad 27 and the lower clad 26, but the material is not particularly limited thereto.
- the upper clad 27 and the lower clad 26 may have a sufficient thickness according to the thickness of the composite core. For example, for the dimension example of the composite core described above, the thickness of the lower clad 26 is about 2000 nm, and the maximum thickness of the upper clad 27 (thickness on the plane portions 21a and 22a) is about 2000 nm.
- the average refractive index of the inner core (the total average refractive index of the two ribs and the central gap) is higher than the average refractive index of the outer core 24, more electric field will be generated when light is guided to the composite core.
- the ratio of the effective refractive index that varies by w out and w in is reduced as compared with the case where the core is uniform. Therefore, even if there is an error in the processing size of the Bragg grating pattern formed on the outer core, the effect on the effective refractive index is small. Therefore, the accuracy of the effective refractive index can be increased. In microfabrication on a flat substrate, it is generally necessary to consider an error of about 10 nm. According to the composite core as shown in FIG.
- the influence of the processing accuracy on the error of the effective refractive index can be set to 80 ppm or less of the average value of the effective refractive index.
- the average value of the effective refractive index indicates the effective refractive index of the optical waveguide with an average width w 0 as shown in FIG. 2A.
- [1] Specify the dimension of the cross-sectional structure of the optical waveguide with reduced polarization dependence, and calculate the electric field distribution of the eigenmode of the TE-type polarization and TM-type polarization in the cross-section.
- the effective refractive index is calculated from the electric field distribution of each eigenmode, and the correspondence relationship with the optical waveguide dimensions for determining the cross-sectional structure from the effective refractive index is obtained.
- [2] Designate desired wavelength dispersion characteristics and reflection characteristics, and prepare data necessary for determining the structure of the optical waveguide.
- the shape distribution (profile) of the effective refractive index in the direction along the central axis C of the optical waveguide is obtained from the chromatic dispersion characteristic and reflection characteristic of [2] by solving the inverse scattering problem.
- the shape of the Bragg grating optical waveguide (the central axis C of the optical waveguide is determined from the shape distribution of the effective refractive index obtained in [3].
- the present design method includes a design process (a) relating to the cross-sectional structure of the optical waveguide comprising step [1], a Bragg grating pattern design process (b) comprising steps [2] and [3], and a step [4].
- the design step (c) related to the chromatic dispersion compensating element consisting of the above is included, and the order of the step (a) and the step (b) is not limited.
- the first and second ribs 21 and 22 are Si
- the central gap 23 is SiO 2
- the outer core 24 is Si x N y
- the substrate 25 is Si
- the lower clad 26 is made of SiO 2 and the upper clad 27 is made of SiO 2
- t 1 250 nm
- t 2 50 nm
- w 1 280 nm
- w 2 160 nm
- t out 600 nm
- t in 100 nm
- the lower clad 26 was calculated when the thickness of the upper clad 27 was 2000 nm and the maximum thickness of the upper clad 27 was 2000 nm.
- the design method of the present invention can also be applied to the structure of an optical waveguide having a uniform core as shown in FIGS. 2A to 2C and FIGS. 3A to 3C.
- the dimension of the optical waveguide for determining the cross-sectional structure means w out for the first Bragg grating pattern formed by unevenness formed on the side wall 24b, and the first dimension formed in the groove 24c on the upper surface 24a. for 2 of the Bragg grating pattern refers to w in. Therefore, w out and w in film mode matching method of an electric field distribution of the eigenmode by specifying (FMM method), was calculated by the finite element method or beam propagation method determines the effective refractive index corresponding to the eigenmodes. As a result, correspondence between w out and w in the effective refractive index is obtained.
- FIG. 5A is a graph showing the change in the effective refractive index with respect to w in
- FIG. 5B is a graph showing a change in w out with changes in w in.
- mode 1 is TE-type polarized light (polarization degree of 98% or more)
- mode 2 is TM-type polarization (polarization degree of 97% or more).
- the difference between n eff TE and n eff TM is 20 ppm or less, which is smaller than the change in effective refractive index due to processing error. Therefore, polarization dependence can be ignored.
- the effective refractive index of mode 1 is defined as the effective refractive index n eff of this optical waveguide.
- the effective refractive index of mode 1 is used in the following design procedure.
- the effective refractive index of mode 2 is used instead of the effective refractive index of the optical waveguide.
- n eff or the average of the effective refractive indexes of both the mode 1 and mode 2 modes may be used as the effective refractive index n eff of the optical waveguide.
- the average value of n eff is set to 2.3480.
- the characteristics of the chromatic dispersion required for the chromatic dispersion compensating element are opposite in sign to the chromatic dispersion of the optical fiber transmission line and have the same absolute value so as to cancel the chromatic dispersion of the target optical fiber transmission line.
- the wavelength band of the optical signal to be transmitted is in the L-band region (1566.31 to 1612.65 nm), and the optical transmission line is constituted by a dispersion-shifted fiber (G653) having a length of 40 km. Specifies the chromatic dispersion to be imposed on the dispersion compensation element.
- optical signals for 50 channels of an L-band ITU grid with a frequency interval of 100 GHz (about 0.84 nm in terms of wavelength interval) are transmitted.
- the bit rate of the optical signal to be transmitted is 40 Gbit / s
- the use band of each channel is 80 GHz
- the delay time is defined as a constant value outside the use band.
- the dispersion-shifted fiber exhibits anomalous dispersion in the L band, and the group delay time increases as the wavelength increases. If the length of the optical transmission line is 40 km and the center wavelength of the used band is about 1590 nm, the chromatic dispersion value is 116 ps / nm, and the dispersion slope (higher-order chromatic dispersion) value is 2.8 ps / nm 2 .
- the wavelength dispersion compensation element generates normal dispersion in which the group delay time decreases as the wavelength increases.
- the absolute values of the chromatic dispersion and dispersion slope of the chromatic dispersion-compensating element must be equal to those of the dispersion-shifted fiber.
- the wavelength dependence of the group delay time required for the chromatic dispersion compensation element is shown in FIG. Since it is necessary to generate a certain chromatic dispersion and dispersion slope within one wavelength channel, the group delay time needs to be continuous. However, since the spectrum of the optical signal is separated from each other and independent between the wavelength channels, there is no problem even if the group delay time changes discontinuously at the boundary of each wavelength channel.
- the Bragg grating patterns of a plurality of wavelength channels can be superimposed on the same region of a single optical waveguide due to the characteristics of the group delay time that repeats discontinuous changes between wavelength channels.
- the characteristics required for the design are the intensity and phase spectrum of the Bragg grating optical waveguide, that is, the complex reflectance spectrum.
- the intensity of the reflectance is flat in the wavelength region 1570 to 161.2 nm and is set to 85%.
- the phase of the reflectance reflects the wavelength dispersion characteristic of the Bragg grating optical waveguide.
- the relationship of the following formula 1 is established between the group delay time ⁇ d and the phase ⁇ .
- the variable ⁇ is the wavelength
- the constant ⁇ is the circular ratio
- c is the speed of light (in the medium).
- Step [3] an effective refractive index profile in the direction along the central axis C of the Bragg grating optical waveguide is derived from the predetermined complex reflectance spectrum obtained in step [2]. The derivation process will be described below.
- Equation 2 E (z) and H (z) are converted into traveling wave A + (z) and backward wave A ⁇ in the coupled mode equation as in Equations 4 and 5 below. Convert to (z). The reflected wave corresponds to A ⁇ (z).
- the coupled mode equation is expressed as the following Expression 6 and Expression 7 using the traveling wave A + (z) and the backward wave A ⁇ (z).
- the wave number k (z) is expressed by the following equation 8
- the potential q (z) in the coupled mode equation is expressed by the following equation 9.
- c light is the speed of light (in vacuum).
- the overall length z of the Bragg grating optical waveguide is specified as 10.2 mm.
- the total length is estimated as follows. Multiply the maximum value of the group delay time to be generated in the Bragg grating optical waveguide by the speed of light in vacuum, and further divide by the average value of the effective refractive index.
- the inverse scattering method of Non-Patent Document 2 is applied to the design of a grating pattern of an optical waveguide with a high refractive index, and the potential q (z) is obtained from the complex reflectance spectrum R ( ⁇ ) by the following procedure.
- equations 4 and 5 are expressed as the following equations 11 and 12.
- Equation 11 and Equation 12 represent the influence of reflection. From Equations 11 and 12, the coupling equation is transformed into the following Gel'fand-Levitan-Marchenko equation (Equation 13 and Equation 14).
- Equation 15 Equation 15 below.
- FIG. 8 is a graph in which the effective refractive index profile in this example is plotted over the entire length of the Bragg grating optical waveguide.
- the amplitude of the effective refractive index changes over the entire length of the optical waveguide.
- the potential q (z) in Equation 10 and Equation 15 is a real number.
- FIG. 9 shows a part of the effective refractive index profile by enlarging the horizontal axis of the graph of FIG. As shown in FIG. 9, the effective refractive index vibrates as a function of the coordinate z, indicating that a Bragg grating pattern is formed.
- the amplitude of the Bragg grating is changed to constitute the amplitude modulation type Bragg grating pattern.
- the sign of the slope of the envelope of the amplitude of the Bragg grating is inverted.
- the phase of the vibration of the Bragg grating changes depending on the change in amplitude.
- a part of the effective refractive index distribution of FIG. 8 is enlarged and shown in FIG. 10 together with an envelope (dotted line) of the Bragg grating amplitude.
- the envelope is shown only for the maximum value of the amplitude.
- the arrow indicates the coordinate point of the waveguide where the sign of the envelope gradient is reversed.
- the sign reversal indicates a steep or discontinuous change that occurs at a single isolated coordinate point.
- sign inversion occurs, it occurs through two points, and no steep or discontinuous change appears.
- the envelope amplitude does not become zero at an isolated coordinate point where the sign of the envelope gradient is inverted, and there is no region where the amplitude is continuously zero. Therefore, the waveguide length can be shortened as compared with the sampled Bragg rating.
- the accuracy of specifying the coordinate point where the sign of the envelope gradient is inverted depends on the step of discretization of the coordinate z of the waveguide along the horizontal axis. If the step is ⁇ P, the accuracy of specifying the coordinate point is in the range of ⁇ ⁇ P.
- the resolution of the discretization of the coordinate z means the discretization step ⁇ P of the coordinate z.
- the pitch is obtained as a distance between adjacent maximum values by extracting all the maximum values of the change in effective refractive index that defines the Bragg grating pattern.
- the pitch on the vertical axis was set in the range from 200 nm to 450 nm.
- the pitch value with the highest appearance frequency is the main pitch or the center value of the pitch, and corresponds to half of the value obtained by dividing the center wavelength (1590.83 nm) by n av .
- the discrete change of the pitch has ⁇ P as the minimum unit of change, and the increment / decrement from the main pitch is an integral multiple of ⁇ P. Therefore, the discrete amount of change in the pitch changes according to changes in the step of discretization of the coordinates of the waveguide along the horizontal axis.
- a discrete change in pitch is a feature not found in chirped Bragg gratings. In the chirped Bragg grating, the pitch continuously changes along the optical waveguide direction. In the chirp Bragg grating, the amplitude of the Bragg grating also changes at the same time, but the change in amplitude is only used to realize a secondary characteristic such as apodization.
- the amplitude modulation type Bragg grating and the chirped Bragg grating have different design methods and are classified into different categories. Since it is relative to the amplitude modulation type, the chirped Bragg grating is classified as a frequency modulation type.
- the calculation used for conversion from the complex reflectance spectrum to the impulse response is a real number type, and is intended for an amplitude modulation type Bragg grating.
- the condition for selecting the amplitude-modulated Bragg grating (details will be described later) is that, by coarse-graining, the resolution of the coordinate axis discretization, that is, the sampling period, changes in pitch corresponding to half the width of the reflection band. More than minutes.
- the chirped Bragg grating is set to be equal to or greater than the maximum value of the change from the center value of the pitch. At this time, it is preferable to satisfy the following two conditions.
- the frequency range of the specified spectral characteristic is all included from the origin (frequency zero) to the region where the corresponding spectral channel exists.
- the real number type is selected in the conversion from the above complex reflectance spectrum to the impulse response.
- (I) facilitates coarse-graining, and (II) is not intended for chirped Bragg gratings, so there is no need to select a complex type that complicates processing.
- the pitch value takes five discrete values, of which the frequency concentrates on the intermediate value and the three values that are above and below it.
- the vertical axis represents a region including three values. Among them, the frequency of taking the central pitch (340 nm) is the highest, and this becomes the main pitch.
- the average value of the minimum value (272 nm) and the maximum value (408 nm) of the pitch in the range of the vertical axis in FIG. 11 matches the main pitch.
- the center wavelength is calculated assuming that the product of the average value of the effective refractive index (2.3480) and the main pitch gives a half value of the center wavelength of the reflection band of the Bragg grating, it becomes 1597 nm, which is substantially coincident with the center of the wavelength band of FIG. Therefore, the chromatic dispersion of a plurality of wavelength channels is generated around the center wavelength mainly due to repeated change of +68 nm or ⁇ 68 nm from the main pitch.
- the Bragg grating pattern of the present embodiment is formed by changing the amplitude continuously and simultaneously changing the pitch discretely.
- the design method according to the present embodiment is suitable for an application for producing an optical waveguide on a flat substrate.
- the characteristics of chromatic dispersion of the Bragg grating optical waveguide having the effective refractive index profile shown in FIG. 8 were reproduced by simulation and confirmed to match the characteristics used as input data (FIG. 7).
- the simulation for confirmation was executed as a forward problem in which the effective refractive index profile of FIG. 8 was substituted into the coupled mode equations of Equations 6 and 7 and solved.
- Expression 1 is applied to the phase component of the complex reflectance spectrum as a result, the wavelength dependence of the group delay time is obtained as shown in FIG. 12A. Comparing FIG. 12A and FIG. 7, it can be seen that a predetermined wavelength dispersion characteristic is reproduced.
- Step [4] Based on the correspondence between the dimension of the optical waveguide prepared in step [1] and the effective refractive index, the effective refractive index profile obtained in step [3] is converted into distribution data (profile) of the dimension of the optical waveguide. Given the effective refractive index, w out and w in a size parameter to decide is obtained. Therefore, by associating the effective refractive index and w out and w in at each point of coordinate z, the distribution data of the optical waveguide dimensions w out and w in is obtained.
- the Bragg grating pattern shown in FIG. 9 has a sinusoidal shape.
- a rectangular wave shape in which a combination of a line with a certain width and a space in which the width changes according to the pitch is repeatedly arranged.
- the profile data dimensions w out and w in the optical waveguide from the profile of the effective refractive index into a profile of a rectangular wave shape.
- the following two restrictions are imposed when converting to a rectangular wave shape.
- the line width is fixed to 180 nm (the space varies depending on the pitch).
- the amplitude of the line having the rectangular wave shape is adjusted so as to coincide with the core area covered by the sinusoidal Bragg grating pattern.
- the profile of w out and w in FIG. 13 is obtained.
- the range of the horizontal axis in FIG. 13 is in the same region as the horizontal axis in FIG.
- a groove provided in the core upper since the varied according to the width of the groove in the Bragg grating pattern, indicating the anti-phase change of w in decreases when w out increases.
- the core upper part provided with projections, in the case of changing in accordance with the width of the projections in the Bragg grating pattern shows forward topological changes that w in also increased when w out increases.
- step [1] the procedure for fabricating a Bragg grating optical waveguide with reduced polarization dependency has been described in steps [1] to [4].
- the element length is estimated to be half or less compared to the case where an optical fiber Bragg grating is used.
- step [1] may be executed after either step [2] or step [3] as long as it is executed before step [4].
- n eff TE and n eff TM is the difference in the Example 50 Reach twice.
- a linear relationship is maintained between the group delay time and the wavelength, and the variation of the group delay time due to the variation of the change is approximately 50 times larger than that of the present embodiment. That is, according to the present embodiment, it is possible to reduce the polarization dependence of chromatic dispersion to about 1/50 in a chromatic dispersion compensating element using an optical waveguide having a high refractive index.
- the Bragg grating optical waveguide described in this embodiment can also be used for chromatic dispersion compensation in other wavelength regions.
- an example for the C band region is provided in another embodiment.
- FIG. 14 shows a cross-sectional structure of a substrate type optical waveguide device according to this embodiment.
- the core of the substrate type optical waveguide device 30 having the cross section shown in FIG. This embodiment is the same as the second embodiment shown in FIG. 4 except that the inner cores 31 and 32 do not have a central gap.
- the structure of the outer core 34, the first Bragg grating pattern formed on the side wall 34b of the outer core 34, the second Bragg grating pattern formed in the groove 34c on the upper surface 34a, the substrate 35, the lower cladding 36, and the upper cladding 37 are as follows. This is the same as the second embodiment shown in FIG.
- the inner cores 31 and 32 are composed of two regions of a first rib 31 and a second rib 32, and no central gap is provided therebetween.
- the first and second ribs 31 and 32 are made of a material having a higher refractive index than that of the outer core 34.
- the first rib 31 height of the second rib 32 equally, as shown in FIG. 14, t 2.
- the 1st and 2nd ribs 31 and 32 are the same shape, respectively, and have the shape reversed in the horizontal direction mutually.
- the first and second flat portions 31a of the ribs 31 and 32 respectively the thickness t 2, 32a and, the plane portion 31a, the height t 1 located on the 32a of the edge, the width w 1 It is comprised from the rectangular parallelepiped parts 31b and 32b.
- the material constituting the rectangular parallelepiped portions 31b and 32b is the same as the material constituting the flat portions 31a and 32a.
- the first rib 31 and the second rib 32 are joined at a joint portion 33 at the center.
- the cross-sectional area of the inner core decreases, so that the variation in effective refractive index due to the size variation of the first and second ribs 31 and 32 increases.
- the manufacturing process for providing the central gap can be omitted, the manufacturing process can be simplified, and the manufacturing period and cost can be reduced. In the case where priority is given to shortening of the manufacturing period and cost reduction over the performance of the element, the structure of this embodiment is preferable.
- the substrate type optical waveguide device of the present embodiment by adding appropriate impurities to the first rib 31 and the second rib 32 in the medium, respectively.
- Type or N-type conductivity can be imparted.
- An electrode pad for applying a voltage is provided on each of the first rib 31 and the second rib 32, and a potential difference is applied between the two ribs 31 and 32, thereby inducing a change in refractive index due to a change in carrier concentration.
- the optical characteristics of the electrode element can be varied.
- the 1st rib 31 and the 2nd rib 32 may be comprised from the same material also including the presence or absence of an additive.
- the inner core can be configured as a layer in which the two ribs 31 and 32 are integrated.
- the first and second ribs 31 and 32 are made Si and the outer core 34 is made in the structure of the optical waveguide having the composite core (no central gap) shown in FIG.
- the substrate 35 is made of Si
- the lower clad 36 is made of SiO 2
- the upper clad 37 is made of SiO 2
- t 1 250 nm
- t 2 50 nm
- w 1 100 nm
- w 2 160 nm
- the thickness of the lower cladding 36 was 2000 nm
- the maximum thickness of the upper cladding 37 was 2000 nm.
- the change in w out and win with respect to the effective refractive index is calculated according to step [1] as in the first embodiment.
- the result is shown in FIG.
- the average effective refractive index is 2.2225.
- a 50-channel chromatic dispersion compensating element of an L-band ITU grid with a frequency interval of 100 GHz is designed for a dispersion-shifted fiber having a length of 40 km.
- the wavelength dependence of the group delay time to be imposed on the chromatic dispersion compensation element is the same as that shown in FIG.
- the reflectance is also 85% in the wavelength region 1570-1612.2 nm. Therefore, the predetermined characteristic is the same complex reflectance spectrum as that of the first embodiment.
- the bit rate of the optical signal to be transmitted is 40 Gbit / s as in the first embodiment, and the use band of each wavelength channel is defined as 80 GHz.
- the effective refractive index profile of FIG. 16 is obtained by setting the overall length of the Bragg grating optical waveguide to 10.737 mm. This profile is the same as the profile of FIG. 8 except for the following points.
- the profile is enlarged in the direction of the central axis by the amount that the average value of the effective refractive index is smaller than that in Example 1, and the entire length of the optical waveguide is extended.
- FIG. 17 shows an enlarged view of a part thereof.
- the Bragg grating optical waveguide of this embodiment can also be designed to cope with a wavelength band other than the L band.
- the complex reflectance spectrum obtained in the corresponding wavelength band can be obtained according to step [2] described in the first embodiment, and the shape can be designed according to steps [3] and [4].
- Example 3 of chromatic dispersion compensating element using a Bragg grating optical waveguide having the cross-sectional structure shown in FIG. 4 in the same manner as in Example 1, according to steps [2] to [4] of Example 1, the C band (1528 .77 to 1577.03 nm), a design example of a chromatic dispersion compensation element of ITU grid 40 channel with a frequency interval of 100 GHz will be described.
- the material constituting the optical waveguide is the same as in the first embodiment.
- the target optical fiber is a standard dispersion single mode fiber (G652) having a length of 30 km.
- the chromatic dispersion value is 510 ps / nm and the dispersion slope value is 1.74 ps / nm 2 .
- the bit rate of the transmission optical signal is 10 Gbit / s
- the use band of each wavelength channel is 20 GHz
- the group delay time is defined to be constant outside the use band.
- FIG. 18 shows the wavelength dependence of the group delay time required for the chromatic dispersion compensation element.
- the range of the horizontal axis is 1533.85 to 1565.58 nm.
- the reflectance is flat over the entire wavelength range indicated by the horizontal axis in FIG. 18, and is 85%.
- the length of the Bragg grating optical waveguide is 9.9 mm
- the effective refractive index profile (shape distribution) of FIG. 19 is obtained.
- the length required for the optical fiber Bragg grating having an equivalent function is estimated based on the result shown in Non-Patent Document 1, it is considered to be about 10 mm. Therefore, according to the present embodiment, the length of the optical waveguide necessary for compensation of chromatic dispersion is shortened to less than half that in the case of the optical fiber Bragg grating.
- FIG. 20 shows the change in pitch over the entire length in the pitch range of 200 to 450 nm. Similar to FIG. 11, the center pitch is most frequently taken, and this is the main pitch. Moreover, the average value of the minimum value (discrete value next to the median) and the maximum value (discrete value next to the median) in the range of the vertical axis in FIG. 20 matches the main pitch.
- Example 1 the chromatic dispersion characteristics shown in FIG. 21 are obtained by substituting the effective refractive index shape distribution given in FIG. 19 into the coupled mode equations of Equations 6 and 7. Comparing FIG. 21 and FIG. 18, it can be seen that the predetermined wavelength dispersion characteristic is reproduced.
- Example 1 From the relationship of w in and w out to the effective refractive index n eff of FIG. 6, by determining the size of the Bragg grating optical waveguide, for C-band compact with reduced polarization dependence A chromatic dispersion compensating element can be produced.
- Example 4 a Bragg grating optical waveguide having the cross-sectional structure shown in FIG. 4 is used in the same manner as in Example 1, and according to steps [2] to [4] of Example 1, an L-band unit is used.
- a design example of a chromatic dispersion compensation element for one wavelength channel will be described.
- the material constituting the optical waveguide is the same as in the first embodiment.
- the target optical fiber is a dispersion-shifted fiber having a length of 30 km.
- the reflectance is set to 85%, and the wavelength dependency of the group delay time specifies the characteristics shown in FIG. 22 to obtain a predetermined complex reflectance spectrum.
- the effective refractive index profile (shape distribution) of FIG. 23 is obtained.
- FIG. 24 shows the change in pitch over the entire length in the pitch range of 200 to 450 nm.
- the pitch takes only three values (a discrete value does not appear outside the range of the vertical axis). Similar to FIG. 11, the frequency of taking the central pitch (340 nm) is the highest, and this is the main pitch.
- the maximum value (discrete value next to the median) is 68 nm larger than the center value, and the minimum value (discrete value next to the median) is 68 nm smaller than the center value.
- the average value of the maximum value and the minimum value matches the center value that is the main pitch.
- the tendency of the discrete change in pitch is reversed on the front end side and the rear end side from the peak position of the effective refractive index.
- the pitch takes only a binary value of only the center value and the maximum value. That is, it shows a binary change from the center value to the long wavelength side.
- the pitch takes only binary values of only the central value and the minimum value, and shows a binary change from the central value to the short wavelength side.
- Chromatic dispersion can be compensated by a Bragg grating with a simple pitch change compared to a chirped Bragg grating with a continuously changing pitch.
- the Bragg grating in Example 1 is considered to be configured by combining a plurality of patterns based on the pattern of this example.
- the effective refractive index profile given in FIG. 23 is substituted into the coupled mode equations of Equations 6 and 7 to solve the chromatic dispersion characteristics shown in FIG. Comparing FIG. 25 and FIG. 22, it can be seen that a predetermined wavelength dispersion characteristic is reproduced.
- the optical signal emitted from the Bragg grating optical waveguide propagates in the opposite direction along the path of the incident optical signal. That is, since the outgoing signal light propagates on the same path as the incident signal light, a method for separating the outgoing signal light from the incident signal light is required.
- an optical circulator 102 is connected to the chromatic dispersion compensation element 101, a port through which incident signal light enters the chromatic dispersion compensation element, and outgoing signal light is extracted from the chromatic dispersion compensation element. A configuration of a chromatic dispersion compensating element having a port will be described.
- the chromatic dispersion compensating element 101 of this embodiment may be any of the chromatic dispersion compensating elements 101 of Embodiments 1 to 4 as long as it corresponds to the chromatic dispersion compensating element of the present invention, or may be another.
- An optical circulator 102 is connected to the front end side of the chromatic dispersion compensation element 101.
- the optical circulator 102 includes an incident optical fiber 103 that propagates incident signal light, a coupling optical fiber 104 that connects the chromatic dispersion compensation element 101 and the optical circulator 102, and an outgoing optical fiber 105 that propagates outgoing signal light. Is connected.
- the incident signal light is transferred from the incident optical fiber 103 to the coupling optical fiber 104 by the optical circulator 102 and is incident on the chromatic dispersion compensating element 101.
- the outgoing signal light reflected in the chromatic dispersion compensating element 101 moves from the coupling optical fiber 104 to the outgoing optical fiber 105 through the optical circulator 102.
- the tip of the coupling optical fiber 104 (tip on the chromatic dispersion compensation element 101 side) is processed into a lens, or the coupling optical fiber 104 is processed.
- a microlens is disposed between the chromatic dispersion compensation element 101 and the coupling optical fiber 104 is closely connected to the front end portion of the Bragg grating optical waveguide of the chromatic dispersion compensation element 101.
- the loss associated with the connection is about 1 dB, for example. Since the loss inside the optical circulator 102 is about 1 dB, the total optical loss due to the connection of the optical circulator 102 is about 2 dB.
- the incident optical fiber 103 is connected to the transmitter side of the optical fiber transmission line, and the optical fiber transmission line
- the outgoing optical fiber 105 may be connected to the receiver side.
- Example 1 of optical filter An optical filter having reflection bands in 10 different wavelength channels is configured using the substrate-type optical waveguide in the second embodiment of the above-described substrate-type optical waveguide element.
- the optical filter design method includes the following steps [1] to [4].
- [1] Specify the dimension (w in / w out ) of the cross-sectional structure of the optical waveguide core, and calculate the electric field distribution of the eigenmode in the TE-type polarization and TM-type polarization in the cross section.
- the above dimensions are adjusted so that the effective refractive index is the same for both polarizations.
- w in / w out is determined so that the polarization dependence is eliminated.
- a correspondence relationship between the effective refractive index and w in / w out is obtained so that the dimension of the cross-sectional structure of the optical waveguide core can be determined from the effective refractive index.
- This step is an optical waveguide cross-sectional structure design process.
- a desired reflection characteristic is designated as an optical filter, and data necessary for determining the structure of the optical waveguide is obtained.
- the reflectance and phase at each wavelength are designated as the reflection characteristics.
- the frequency range includes the entire frequency region including desired reflection characteristics from the origin (frequency zero).
- the shape distribution of the effective refractive index along the waveguide direction of the optical waveguide is derived from the complex electric field reflectance spectrum obtained in step [2] by solving the inverse scattering problem. This step includes a calculation process for converting a complex electric field reflection spectrum into a time response, which is a real type conversion.
- Steps [2] and [3] are a Bragg grating pattern design process.
- step [4] Based on the relationship between the effective refractive index obtained in step [1] and the cross-sectional dimension of the optical waveguide core, the shape distribution of the effective refractive index obtained in step [3] is used in the optical waveguide direction of the Bragg grating optical waveguide. Determine the shape along.
- This step is an optical filter design process. Note that the order of the steps can be changed in accordance with the design steps of the chromatic dispersion compensating element described above.
- Step [1] The cross-sectional structure of the waveguide is as shown in FIG.
- the effective refractive index of the TE polarization is regarded as the effective refractive index of the waveguide, is plotted to calculate the correspondence between the effective refractive index and w in and w out, the Fig.
- the optical characteristics of an optical filter having reflection bands in 10 different wavelength channels are specified.
- spectrum regions are often distinguished using frequencies instead of wavelengths.
- the spectral characteristics of the optical filter will be discussed below as a function of frequency.
- the reflectance spectrum R ( ⁇ ) of the complex electric field is calculated from the reflectance and phase at each frequency.
- R ( ⁇ ) is composed of a real component and an imaginary component.
- R is the electric field
- ⁇ is the frequency
- is the absolute value of the electric field reflectivity
- ⁇ ( ⁇ ) is the phase.
- the absolute value of the reflectance is normalized by 1 (that is, 100%).
- the absolute value of the electric field reflectance is 0.95 (95%) so that the power reflectance
- the chromatic dispersion in the reflection band of each channel is set to zero.
- the phase is a linear function with respect to frequency. From the above, the optical characteristics designated for the optical filter of this embodiment are shown in FIG. In FIG.
- the left vertical axis represents the absolute value
- the right vertical axis represents the phase ⁇ ( ⁇ ), which are plotted by a solid line and a broken line, respectively.
- the horizontal axis is the frequency ⁇ with the unit as THz, and the optical characteristics are specified by equally dividing the channel from 192.6 THz to 193.6 THz into 10 channels at intervals of 0.1 THz.
- the center frequency is 193.1 THz. When converted to the center wavelength, it becomes 15552. It can be seen that the spectral width of the reflection band in each channel is 0.01 THz, and the phase linearly changes within the range.
- Step [3] Based on the inverse scattering problem solution, the effective refractive index distribution in the waveguide direction of the optical waveguide constituting the optical filter is derived. The procedure is as described in step [3] in the design direction of the chromatic dispersion compensating element.
- the optical path length corresponding to ⁇ t in step [2] is set to the minimum value and specified based on the loss and allowable dimensions of the optical waveguide.
- the potential q (z) is obtained by solving the inverse scattering problem.
- the effective refractive index distribution n eff (z) is obtained.
- the conversion used when deriving the impulse response from the complex reflectance spectrum R ( ⁇ ) is assumed to be a real type.
- q (z) obtained by the above equation 15 is also a real number, and an effective refractive index distribution of the amplitude modulation type Bragg grating in which the amplitude of the Bragg grating changes and the phase changes accompanying the amplitude is obtained.
- the definition of amplitude modulation in the present invention will be described later.
- n eff (z) is plotted in FIGS.
- the horizontal axis z represents coordinates in the optical waveguide direction.
- n av corresponding to the average value of the refractive index distribution of the grating optical waveguide is 2.348.
- FIG. 29 is an enlarged view of the effective refractive index distribution of FIG. 28 with respect to a part of the optical waveguide. It can be seen that n eff vibrates with half the value obtained by dividing the center wavelength (1552.52 nm) corresponding to the center frequency (193.1 THz) by n av , indicating a pattern that defines the Bragg grating.
- a characteristic of the amplitude modulation type Bragg grating of the present invention is that the sign of the gradient of the amplitude envelope of the Bragg grating is inverted. That is, in the present invention, a change in which the sign of the gradient of the amplitude of the Bragg grating is inverted is called amplitude modulation.
- the inversion of the sign shows a steep steepness or discontinuity that occurs at an isolated single coordinate point, and there is a waveguide region where the amplitude is continuously zero between the two points where the sign is inverted. The characteristics of the sampled Bragg grating do not appear.
- the amplitude becomes zero only at an isolated coordinate point where the sign of the envelope gradient is inverted, and therefore there is no region where the amplitude is substantially zero. Therefore, the waveguide length can be shortened as compared with the sampled Bragg rating.
- each coordinate point is accompanied by a phase discontinuous change. Since the local period (pitch) changes when the phase changes discontinuously, the pitch takes a value different from half of the value obtained by dividing the central wavelength (1552.52 nm) by n av at the coordinate point.
- the accuracy of specifying the coordinate point where the sign of the envelope gradient is inverted depends on the discrete step of the waveguide coordinate z on the horizontal axis. If the step is ⁇ P, the accuracy of specifying the coordinate point is in the range of ⁇ ⁇ P.
- the sign of the slope of the envelope of the amplitude of the Bragg grating is inverted, and as a result, there are coordinate points at which the pitch changes discretely.
- the pitch is obtained as a distance between adjacent maximum values by extracting all the maximum values of changes in the effective refractive index that define the Bragg grating pattern.
- the pitch value having the highest appearance frequency is the main pitch or the center value of the pitch, and corresponds to half of the value obtained by dividing the center wavelength (1552.52 nm) by n av .
- the main pitch is about 401.2 nm.
- a discrete change in pitch has ⁇ P as a minimum unit of change, and an increase / decrease amount from the main pitch is an integral multiple of ⁇ P. Therefore, the discrete amount of change in the pitch changes in accordance with the change in the discrete step of the waveguide coordinates on the horizontal axis.
- a discrete change in pitch is a feature not found in chirped Bragg gratings.
- the pitch continuously changes along the optical waveguide direction.
- the amplitude of the Bragg grating also changes at the same time, but the change in amplitude is only used to realize secondary characteristics such as apodization. This characteristic is achieved by changing the frequency of the Bragg grating along the light guiding direction. In this step, a chirped Bragg grating cannot be constructed.
- q (z) obtained by Equation 15 is a complex number. If q (z) is a complex number, when determining the q (z) from n eff (z), n eff (z) Since a real number, it is necessary to take only the real part of q (z) . Therefore, the amplitude modulation type Bragg grating and the chirped Bragg grating have different design methods and are classified into different categories. Since it is relative to the amplitude modulation type, the chirped Bragg grating is classified as a frequency modulation type.
- Step [4] Based on a corresponding relationship between the optical waveguide dimension w in and w out and the effective refractive index n eff prepared in Step [1], the effective refractive index distribution n eff (z) obtained in Step [3] w in and w out To distribution data (profile). Than the corresponding relationship shown in FIGS. 5A and 5B, w in and w out are determined a dimension parameter should be determined to give the effective refractive index. As shown in FIG. 29, the Bragg grating pattern in the effective refractive index distribution has a sinusoidal shape.
- the line width is fixed at 140 nm.
- the space changes according to the pitch of the grating.
- the line width is set to a value larger than the limit value of processing accuracy.
- the line amplitude of the rectangular wave shape is adjusted so as to coincide with the core area covered by the sinusoidal Bragg grating pattern.
- the profile of w out and w in FIG. 30 is obtained.
- the range of the horizontal axis in FIG. 30 is in the same region as the horizontal axis in FIG.
- the application of the optical filter of this embodiment is, for example, that after passing through an optical amplifier, only the signal light of the wavelength multiplexed channel is taken out as reflected light regardless of the polarization, and spontaneous emission light noise existing in the wavelength region around the signal light is extracted. Used to remove Note that the number of channels, the channel spacing, and the spectral width of the reflection band are not limited to the values in this embodiment, and can be designed by designating optimum values according to the application.
- This embodiment is a design example of a beam splitter having a power reflectivity of about 40%.
- the beam splitter can be used for the purpose of branching the signal light of each channel into two paths.
- This beam splitter design method is performed in the same manner as the optical filter of the first embodiment, except that the power reflectance parameter is changed.
- the design steps are composed of four steps as in the first embodiment.
- Correspondence between the effective refractive index and w in and w out in step [1] is used the same as in Example 1.
- the absolute value of the electric field reflectance is set to 0.64 (64%) so that the power reflectance in the reflection band of each channel is about 0.4 (40%).
- the chromatic dispersion in the reflection band of each channel is set to zero.
- the optical characteristics designated for the optical filter of this embodiment are shown in FIG. As in the first embodiment, optical characteristics are designated by equally dividing 10 channels at intervals of 0.1 THz from 192.6 THz to 193.6 THz. The center frequency is 193.1 THz, the spectral width of the reflection band in each channel is 0.01 THz, and the phase changes linearly within that range.
- the effective refractive index profile of the waveguide derived in step [3] is shown in FIG. 32 and FIG. Also, w in and w out profile of the rectangular wave shape obtained in Step [4] is shown in Figure 34.
- This embodiment is a design example of an optical filter having a single reflection band.
- the design steps are the same as in Examples 1 and 2.
- the power reflectance of the reflection band is about 90%.
- Correspondence between the effective refractive index and w in and w out are the same as in Example 1 and 2.
- the specified optical characteristics are shown in FIG.
- the spectral width of the reflection band is 0.01 THz.
- the effective refractive index distribution derived based on the inverse scattering problem solution using these optical characteristics is shown in FIGS.
- FIG. 38 shows the result of converting the effective refractive index into a rectangular wave profile.
- the optical filter of the present embodiment can be used for extracting signal light of a specific single channel as reflected light.
- the spectrum width of the reflection band is not limited to 0.01 THz, and can be designed by designating an arbitrary width.
- the present embodiment is a design example of an interleaver for wavelength channels at intervals of 0.1 THz.
- the optical filter is designed with a channel spacing of 0.2 THz and a reflection band width of each channel of 0.1 THz.
- the specified optical characteristics are shown in FIG. FIG. 40 and FIG. 41 show the effective refractive index distribution derived based on the inverse scattering problem solution using this optical characteristic.
- the result of converting the effective refractive index into a profile having a rectangular wave shape is shown in FIG.
- the optical filter (interleaver) of the present embodiment can branch the signal light into two paths of odd-numbered and even-numbered channels for each channel at intervals of 0.1 THz.
- Example 5 of optical filter> This example uses the substrate-type optical waveguide (see FIG. 14) in the third embodiment of the above-described substrate-type optical waveguide element, and uses the optical characteristics described in Example 1 of the optical filter (see FIG. 27).
- the optical filter which has this is designed.
- the correspondence relationship between the effective refractive index of the optical waveguide and w in and w out are shown in Figure 15.
- FIG. 43 shows the effective refractive index distribution derived based on the inverse scattering problem solution using these optical characteristics.
- FIG. 44 shows the result of converting the effective refractive index into a rectangular wave profile.
- the optical resonator 150 has optical waveguides (the first optical waveguide 151 and the second optical waveguide 152) to be the reflection mirrors 151 and 152 at both ends, and the reflection mirrors 151 and 152
- the third optical waveguide 153 including the optical resonator medium is sandwiched between them.
- the first optical waveguide 151, the third optical waveguide 153, and the second optical waveguide 152 are connected in series to form a single substrate type optical waveguide, and the reflection mirrors 151 and 152 at both ends thereof.
- An optical waveguide having a Bragg grating pattern and having a reflection function is used.
- An optical waveguide having a reflection function can be designed according to the above-described optical filter design method by setting desired reflection characteristics.
- the third optical waveguide 153 serving as an optical resonator medium may have any predetermined optical path length for allowing light to resonate between the reflecting mirrors 151 and 152.
- the reflectance of at least one of the mirrors is lower than 1 (100%).
- a fourth optical waveguide 154 for emission is provided in order to emit part of the light transmitted from the reflection mirror of the second optical waveguide 152.
- the fourth optical waveguide 154 is preferably formed as a single substrate type optical waveguide connected in series with the first to third optical waveguides.
- the optical resonator is designed to have a function of selecting any one of a plurality of wavelength channels.
- An example of the plurality of wavelength channels is an ITU grid arranged at a frequency interval of 100 GHz, for example.
- the optical characteristics of the components of the optical resonator having such a function will be described with reference to FIGS.
- the lower graph of FIG. 46 shows the power reflection spectrum (solid line) of the first reflecting mirror and the power reflection spectrum (broken line) of the second reflecting mirror.
- the spectrum obtained as the product of the power reflection spectra of the first and second reflecting mirrors is shown in the upper graph of FIG.
- the power reflectivity of the reflection bands of the first and second reflection mirrors is set to 0.9 (90%).
- the wavelength of light resonating in the optical resonator is limited to a region where the reflection regions of both spectra overlap. This is generally referred to as a vernier function, and is used for extracting a specific wavelength component by combining two optical filters having different comb-shaped power reflection spectra, and further changing the characteristics of one optical filter. This is used to vary the wavelength component to be extracted.
- the resonance characteristic of the optical resonator including the first and second optical waveguides having the characteristics shown in FIG. 46 is shown in the upper graph of FIG.
- the vertical axis represents the common logarithmic scale. Assuming that the power reflectivity of the mirrors at both ends is constant at 0.9 without depending on the wavelength, the resonance characteristic is the lower graph (FP) in FIG. In this resonance characteristic, the resonance peak is normalized as 1.
- the optical length of the optical resonator is 1000 ⁇ m. When the effective refractive index of the optical waveguide is 1.94945, the optical length is converted to the waveguide length, which is about 513 ⁇ m.
- the resonance characteristics of the upper graph of FIG. 47 are based on a spectrum obtained by multiplying the spectrum of the upper graph of FIG. 46 by the characteristics of the lower graph of FIG.
- the resonance characteristic of the upper graph in FIG. 47 has a peak at 193.1 THz (1552.52 nm).
- the vernier function Utilizing the vernier function by fixing the effective refractive index of the first optical waveguide, changing the effective refractive index of the second optical waveguide, and changing the local period of the Bragg grating pattern in the second reflecting mirror
- different single-channel wavelength components can be selected for the reflection spectrum of the first reflecting mirror. That is, the selected wavelength can be varied by changing the effective refractive index of the second optical waveguide.
- the effective refractive index of the first reflecting mirror may be changed, or the effective refractive indexes of both reflecting mirrors may be changed.
- the side channel suppression ratio is about 24 dB.
- the phase shift generated when propagating through the third optical waveguide as the optical resonator medium that is, the effective refractive index of the third optical waveguide may be adjusted.
- the phase shift is 0.477 ⁇ .
- the design method of the first reflecting mirror in this embodiment includes the following steps [1] to [4].
- [1] Specify the dimension (w in / w out ) of the cross-sectional structure of the optical waveguide core, and calculate the electric field distribution of the eigenmode in the TE-type polarization and TM-type polarization in the cross section.
- the above dimensions are adjusted so that the effective refractive index is the same for both polarizations.
- w in / w out is determined so that the polarization dependence is eliminated.
- a correspondence relationship between the effective refractive index and w in / w out is obtained so that the dimension of the cross-sectional structure of the optical waveguide core can be determined from the effective refractive index.
- This step is an optical waveguide cross-sectional structure design process.
- a desired reflection characteristic is designated as a reflection mirror, and data necessary for determining the structure of the optical waveguide is obtained.
- the reflectance and phase at each wavelength are designated as the reflection characteristics.
- the frequency range includes all frequency regions including desired reflection characteristics from the origin (frequency zero).
- the shape distribution of the effective refractive index along the waveguide direction of the optical waveguide is derived from the reflectance spectrum of the complex electric field obtained in step [2] by solving the inverse scattering problem. This step includes a calculation process for converting a complex electric field reflection spectrum into a time response, which is a real type conversion.
- Steps [2] and [3] are a Bragg grating pattern design process.
- step [4] Based on the relationship between the effective refractive index obtained in step [1] and the cross-sectional dimension of the optical waveguide core, the shape distribution of the effective refractive index obtained in step [3] is used in the optical waveguide direction of the Bragg grating optical waveguide. Determine the shape along.
- This step is a reflection mirror design process. Note that the order of the steps can be changed in accordance with the design steps of the chromatic dispersion compensating element described above.
- Step [1] The cross-sectional structure of the waveguide is as shown in FIG.
- the effective refractive index of the TE polarization is regarded as the effective refractive index of the waveguide, is plotted to calculate the correspondence between the effective refractive index and w in and w out, the Fig.
- the complex electric field reflectance spectrum R ( ⁇ ) of the grating optical waveguide is calculated from the power reflection spectrum and the desired phase characteristics shown in the lower graph of FIG.
- R ( ⁇ ) is composed of a real component and an imaginary component.
- the complex electric field reflectivity is expressed by polar coordinate display as in the above-described formula A.
- the absolute value of the reflectance is normalized by 1 (that is, 100%).
- the absolute value of the electric field reflectance is 0.95 (95%) so that the power reflectance
- the chromatic dispersion in the reflection band of each channel is set to zero.
- the phase is a linear function with respect to frequency. From the above, the optical characteristics designated for the reflecting mirror of this embodiment are shown in FIG. In FIG. 27, the left vertical axis represents the absolute value
- the horizontal axis is the frequency ⁇ with the unit as THz, and the optical characteristics are specified by equally dividing the channel from 192.6 THz to 193.6 THz into 10 channels at intervals of 0.1 THz.
- the center frequency is 193.1 THz. When converted to the center wavelength, it becomes 15552. It can be seen that the spectral width of the reflection band in each channel is 0.01 THz, and the phase linearly changes within the range.
- Step [3] Based on the inverse scattering problem solution, the effective refractive index distribution in the waveguide direction of the optical waveguide constituting the reflecting mirror is derived. The procedure is as described in step [3] in the design direction of the chromatic dispersion compensating element.
- the optical path length corresponding to ⁇ t in step [2] is set to the minimum value and specified based on the loss and allowable dimensions of the optical waveguide.
- the potential q (z) is obtained by solving the inverse scattering problem.
- the effective refractive index distribution n eff (z) is obtained.
- the conversion used when deriving the impulse response from the complex reflectance spectrum R ( ⁇ ) is assumed to be a real type.
- q (z) obtained by the above equation 15 is also a real number, and an effective refractive index distribution of the amplitude modulation type Bragg grating in which the amplitude of the Bragg grating changes and the phase changes accompanying the amplitude is obtained.
- the definition of amplitude modulation in the present invention will be described later.
- n eff (z) is plotted in FIGS.
- the horizontal axis z represents coordinates in the optical waveguide direction.
- n av corresponding to the average value of the refractive index distribution of the grating optical waveguide is 2.348.
- FIG. 29 is an enlarged view of the effective refractive index distribution of FIG. 28 with respect to a part of the optical waveguide. It can be seen that n eff vibrates with half the value obtained by dividing the center wavelength (1552.52 nm) corresponding to the center frequency (193.1 THz) by n av , indicating a pattern that defines the Bragg grating.
- the feature of the amplitude modulation type Bragg grating of the present invention is that the sign of the gradient of the amplitude envelope of the Bragg grating is inverted, as described in ⁇ Example 1 of optical filter>.
- Step [4] Based on a corresponding relationship between the optical waveguide dimension w in and w out and the effective refractive index n eff prepared in Step [1], the effective refractive index distribution n eff (z) obtained in Step [3] w in and w out To distribution data (profile). Than the corresponding relationship shown in FIGS. 5A and 5B, w in and w out are determined a dimension parameter should be determined to give the effective refractive index. As shown in FIG. 29, the Bragg grating pattern in the effective refractive index distribution has a sinusoidal shape.
- the line width is fixed at 140 nm.
- the space changes according to the pitch of the grating.
- the line width is set to a value larger than the limit value of processing accuracy.
- the rectangular wave line amplitude is adjusted so as to coincide with the core area covered by the sinusoidal Bragg grating pattern.
- the profile of w out and w in FIG. 30 is obtained.
- the range of the horizontal axis in FIG. 30 is in the same region as the horizontal axis in FIG. 28 to 30 shown in the present embodiment are the same as those shown in the first embodiment of the optical filter described above.
- the design procedure of the first optical waveguide serving as the first reflection mirror has been described above, but the power reflection spectrum of the lower graph of FIG. Based on the phase characteristics, it can be designed in the same manner.
- the third optical waveguide is connected in series between the first optical waveguide and the second optical waveguide.
- the length of the third optical waveguide is as described above.
- the application of the optical resonator of this embodiment can be used as an optical filter for extracting a specific frequency component and a laser resonator.
- the third optical waveguide needs to have an optical amplification function by optical gain. By reducing the polarization dependency, an optical resonator corresponding to an arbitrary polarization can be manufactured.
- Example 2 of optical resonator> This example uses the substrate-type optical waveguide (see FIG. 14) in the third embodiment of the substrate-type optical waveguide element described above, and uses the optical characteristics described in Example 1 of the optical resonator (FIG. 46, FIG. 46). 47) is designed.
- the correspondence relationship between the effective refractive index of the optical waveguide and w in and w out are shown in Figure 15.
- FIG. 43 shows an effective refractive index distribution derived based on the inverse scattering problem solution using these optical characteristics.
- FIG. 44 shows the result of converting the effective refractive index into a rectangular wave profile. 43 to 44 are the same as those shown in the fifth embodiment of the optical filter described above.
- the amplitude modulation type Bragg grating according to the present invention is different from the chirped Bragg grating.
- the Bragg grating pattern is uniquely defined, and there is no difference between the amplitude modulation type and the chirped Bragg grating. However, it is applied to a continuous effective refractive index distribution, and not to a discrete effective refractive index distribution that is coarse-grained. This point will be supplemented below.
- the effective refractive index distribution of the Bragg grating is obtained as an effective refractive index distribution related to discrete points sampled at regular intervals with respect to the coordinate axis along the light propagation direction. If the sampling theorem derived by Nyquist, Shannon, and Someya is applied to the effective refractive index distribution of the Bragg grating, the coordinate interval of discrete points in the effective refractive index distribution obtained by design, that is, If the sampling period is equal to or less than half the local period (pitch) of the sinusoidal change in effective refractive index of the target Bragg grating, a continuous effective refractive index distribution corresponding to the discrete effective refractive index distribution is obtained. It is uniquely required. In order to obtain a continuous effective refractive index distribution, a Whitaker-Shannon interpolation formula using a sinc function is used as in the following Expression B.
- z is a continuous coordinate
- q (z) is a potential giving an effective refractive index distribution defined by continuous coordinates
- q (nZ IS ) is a potential giving an effective refractive index distribution defined by discrete coordinates.
- Z iS is sampling period.
- n is an integer designating discrete coordinate points.
- the Bragg grating length is finite
- n is finite.
- Reconstructing an (original) continuous waveform from a discrete waveform is called reconstruction.
- the effective refractive index n eff is used.
- Bragg grating pattern data for an optical mask in order to form a Bragg grating pattern by optical exposure, Bragg grating pattern data for an optical mask must be prepared.
- the pattern data for the optical mask is prepared as a digital file such as GDS format. Since the number of data points is infinite in the continuous effective refractive index distribution, the file capacity becomes infinite. Therefore, a discrete effective refractive index distribution with a finite number of data points must be used as optical mask pattern data. As described above, even if a continuous effective refractive index distribution is reconstructed, it is necessary to convert it into a discrete distribution. For this reason, a discrete effective refractive index distribution before reconstruction is used for the mask pattern data.
- the shape of the effective refractive index distribution varies depending on the sampling period of discretization and the form of discretization. This causes a difference between an amplitude modulation type and a chirped Bragg grating.
- a discretized version of the effective refractive index distribution after reconstruction may be used as mask data.
- FIG. 48 shows an example of the characteristics of an optical element having a single reflection channel.
- the upper graph of FIG. 48 plots the frequency dependence of the delay time, and the lower graph of FIG. 48 plots the absolute value and phase of the complex electric field reflectivity.
- the frequency width of the reflection channel is about 1.244 THz.
- the center frequency is 193.1 THz.
- the spectral occupancy at half the width of the reflection channel is only about 0.32% with respect to the center frequency, and is a narrow band. In each embodiment of the present invention, the width of each channel is even narrower.
- a Bragg grating satisfying the above characteristics is constituted by a chirped Bragg grating
- a resolution corresponding to changing the pitch by only 0.32% at the maximum is required for discretization of the coordinate axis of the Bragg grating. That is, the number of divisions for discretizing each pitch is at least 0.32% of the inverse number 313 points.
- the number of data points is at least 0.32% of the inverse number 313 points.
- the maximum change in pitch of 0.32% is only about 1 nm when the center value of the pitch is 340 nm. In order to make it chirp, it is necessary to further subdivide it, but it is difficult to precisely produce an optical mask pattern with an accuracy of nanometer or less.
- the amplitude modulation type is advantageous from the viewpoint of improving the accuracy of the manufacturing process, shortening the processing time, and reducing the cost.
- the resolution of the coordinate axis discretization is more than the pitch change corresponding to the half value of the width of the reflection band, in other words, in the chirped Bragg grating.
- Coarse graining may be performed by taking a value greater than the maximum value of the change from the center value of the pitch.
- the fundamental propagation mode was simulated using a mode solver, and the effective refractive index of the rib was calculated.
- the upper clad 7 and the lower clad 6 are made of SiO 2 having a refractive index of 1.45, and the high refractive index ribs 1, 2 are used.
- FIG. 51 is a contour map showing the light intensity distribution of the core as a simulation result of the first embodiment.
- the interface of each material is also shown for reference.
- the effective refractive index of the fundamental propagation mode was calculated by the same simulation. They were 2.8220 and 2.8370, respectively. That is, the effective refractive index with respect to -1.79% change in w 1 varies -0.27%, so that the effective refractive index which varies + 0.26% with respect to the + 1.79% variation w 1 .
- FIG. 52 is a contour map of the light intensity distribution of the core as a simulation result of Comparative Example 1.
- the effective refractive index of the fundamental propagation mode was calculated by the same simulation, they were 2.7648 and 2.7836, respectively. That is, the effective refractive index fluctuated by ⁇ 0.35% with respect to the w 1 variation of ⁇ 1.79%, and the effective refractive index fluctuated by + 0.33% with respect to the w 1 variation of + 1.79%. .
- the present invention it is possible to provide a substrate type optical waveguide device that can reduce the influence of inevitable core side wall roughness that occurs in the manufacturing process, a wavelength dispersion compensation device using the same, and a design method thereof.
Abstract
Description
本願は、2008年2月29日に、日本に出願された特願2008-049842号に基づき優先権を主張し、その内容をここに援用する。
特許文献1には、導波路中にブラッググレーティングパターンを有する分散補償素子として、複数個の波長チャンネルに対する波長分散を補償するよう、周期が空間的に変化したブラッググレーティングの要素を複数個有する素子が開示されている。又、特許文献1では、導波路の光軸に沿った方向において、複数個の要素からなるブラッググレーティングの屈折率分布n(z)は次式のような正弦波的な変化(zは光伝搬軸上の点の位置)を示すとも開示されている。
特許文献1の技術においては、デバイス構造例として光ファイバを用いたブラッググレーティングを形成する場合のみが記載されている。すなわちこの技術は、光ファイバブラッググレーティングを主な対象としている。光ファイバの断面は円形であり、その光学特性は伝搬する光の偏光方向には依存しない。そのため、偏光依存性を低減するための光導波路の設計に関する技術の提供は一切ない。偏光依存性を考慮した設計では、基板面に平行な偏光と垂直な偏光おのおのに対し実効屈折率を独立に定義して、両実効屈折率が一致するように導波路の構造を最適化することが必要になる。しかし、この文献では前式のように偏光にかかわりなく単一の実効屈折率n(z)が定義されている。したがって、この文献の技術を、基板上の偏光依存性を低減した高屈折率光導波路からなる波長分散補償素子の設計に応用することは不可能である。
特許文献2には、特許文献1と同様に偏光依存性を考慮した設計に関する記載がない。したがって、この文献の技術を、基板上の偏光依存性を低減した高屈折率光導波路からなる波長分散補償素子の設計に応用することは不可能である。
この文献では、主としてグレーティングの位相サンプリングに基づき、グレーティング導波路を設計するという方針が採用されている。これは、この文献が光ファイバのように屈折率が1.4~1.5の範囲にある低屈折率光導波路を対象としていて、光導波路の実効屈折率を変化できる範囲が狭いという制約のためである。特許文献2には、その技術が基板上の導波路にも適用できると記載されているが、あくまで同様の低屈折率光導波路に適するだけである。したがって、特許文献2の技術は、反射型の光導波路において実効屈折率を大幅に変化させることにより、反射率を低減することなくグレーティング長を出来る限り短縮して小型化するという目的には適さない。
さらに、特許文献2には、位相サンプリングパターンは、グレーティング構造を作製するときボイドによる性能劣化を回避するのに有効であるという趣旨の記載がある。これは、この文献が光ファイバグレーティングの作製を念頭として、紫外線照射で光ファイバにグレーティングパターンを焼き付けるという製造方法を対象としているからである。基板上の高屈折率光導波路を対象とするのであれば、ボイドによる性能劣化という制約はないはずである。
特許文献3には、偏光依存性を低減する技術の記載はない。この文献の光導波路単体では、分散スロープを補償することのみが可能であり、波長分散を補償することはできない。波長分散を補償するためには別の光素子を当該光導波路に接続した構成とする必要があるため、この文献の技術で小型化を達成することは不可能である。
特許文献4には、偏光依存性を低減する技術の記載はない。この文献の波長分散補償素子では位相特性が原点に関して反対称になることから、隣接するスペクトル領域での波長分散が反転してしまう。よって、この波長分散補償素子は、ある限定されたスペクトル領域、すなわち特定のスペクトル領域チャンネルのみを対象とした波長分散補償には用いることができるが、波長多重光ファイバ通信への応用を目的として複数のチャンネルの波長分散を補償する用途には利用できない。
特許文献5の技術は、波長の広い帯域での波長分散補償が可能であるが、多チャンネル化には対応していない。そのため、その波長分散値は大きくない。よって、波長多重光ファイバ通信への応用を目的として、長距離(例えば40km)の光ファイバ伝送路の波長分散を補償する用途には利用できない。
特許文献6の技術が解決しようとする課題は、コア・クラッド界面で生じる散乱損失の減少である。しかし、その課題を解決するための技術思想は、コア層と略同一の屈折率を有する薄膜層を用いて界面を平坦にするというものである。また、この技術においては、薄膜層がコアと同一の屈折率を有することが重要であるため、コア層としてシリコンや窒化ケイ素など、シリカガラス系材料よりもはるかに高い屈折率を有する材料を用いた場合には、略同一の屈折率を有する多孔質ガラス層を薄膜層として形成するのに適用できる適切な材料および成膜工程が存在せず、適用することができない。
非特許文献1の技術は、特許文献2と同様の問題がある。
平板基板上に形成されたブラッググレーティング光導波路であるが、光導波路コアの上部のクラッド領域にのみグレーティングパターンが形成されている。よって、基板面に対して平行もしくは垂直な方向に直線偏光した光に対して、それぞれ光導波路の実効屈折率は異なる。このため、波長分散の性能は偏光状態により大きく異なってしまう。この文献での実験は、Ti:サファイアレーザを光源として実施されている。Ti:サファイアレーザは通常、直線偏光した光を出射する。この文献には偏光状態に関する記載がなく、偏光の相違による実効屈折率の差をどのようにして解消するのか考慮されていない。したがって、この文献の技術を、基板上の偏光依存性を低減した高屈折率光導波路からなる波長分散補償素子の設計に応用することは不可能である。
すなわち、
(1)本発明は、光導波路のコアが、リブ構造をなす凸部を有する内側コアと、この内側コアの上側に設けられて前記凸部の周面を被覆する外側コアとを備え、 前記外側コアの屈折率が、前記内側コアの平均屈折率よりも低いことを特徴とする基板型光導波路素子を提供する。
(4)上記(1)~(3)に記載の基板型光導波路素子では、前記光導波路にブラッググレーティングパターンを有し、このブラッググレーティングパターンが、局所周期が3通り以上の離散値のみをとり;これら離散値が、前記光導波路の全長にわたってそれぞれ複数箇所に存在し;これらすべての離散値のうちで最も分布頻度の高い値をMとし、このMよりも大きい値でかつこのMに最も近い値をAとし、前記Mよりも小さい値でかつこのMに最も近い値をBとした場合、A-Mで表される差が、M-Bで表される差と等しいことが好ましい。
(8)上記(7)に記載の波長分散補償素子の設計方法では、前記ブラッググレーティングパターン設計工程において、座標軸の離散化の分解能を反射帯の幅の半値に対応するピッチ変化分以上に、言い換えると、チャープトブラッググレーティングにおけるピッチの中心値からの変化分の最大値以上に取る粗視化工程を有することにより、この粗視化工程によりブラッググレーティングの振幅の包絡線の勾配の符号が反転する孤立した単一の座標点を複数個含む光導波路が構成されることが好ましい。
(10)また、本発明は、上記(9)に記載の光フィルタの設計方法であって、前記光フィルタが、第1のブラッググレーティングパターン及び第2のブラッググレーティングパターンが光の導波方向と直交する断面で見た場合に、光の導波方向に沿って並列した二つの領域に形成された光導波路を有し;前記光の導波方向と直交する断面で見た場合に、前記二つの領域の寸法を変化させ、前記光導波路に導波される互いに独立な二つの偏光に対する前記光導波路の実効屈折率を等化して、両偏光に対する共通の実効屈折率を求めることによって、前記二つの領域の寸法と前記共通の実効屈折率との関係を求める光導波路断面構造設計工程と、パラメータとして反射率および位相の二つを指定して所定の複素反射率スペクトルを算出した後、前記複素反射率スペクトルと所望の光導波路の長さとから、前記光導波路の導波方向に沿う実効屈折率の形状分布を得るブラッググレーティングパターン設計工程と、前記光導波路断面構造設計工程で求めた前記二つの領域の寸法と前記共通の実効屈折率との関係に基づいて、前記ブラッググレーティングパターン設計工程で得た前記実効屈折率の形状分布を、前記二つの領域の寸法の形状分布に変換することにより、前記二つの領域の寸法の変化からなる前記第1及び第2のブラッググレーティングパターンを得る光フィルタ設計工程と;を有することを特徴とする光フィルタの設計方法を提供する。
(11)上記(10)に記載の光フィルタの設計方法での、前記ブラッググレーティングパターン設計工程において、座標軸の離散化の分解能を反射帯の幅の半値に対応するピッチ変化分以上に、言い換えると、チャープトブラッググレーティングにおけるピッチの中心値からの変化分の最大値以上に取る粗視化工程を有することにより、ブラッググレーティングの振幅の包絡線の勾配の符号が反転する孤立した単一の座標点を複数個含む光導波路が構成されることが好ましい。
(13)また、本発明は、上記(12)に記載の光共振器の設計方法であって、前記反射ミラーが、第1のブラッググレーティングパターンおよび第2のブラッググレーティングパターンが光の導波方向と直交する断面で見た場合に、光の導波方向に沿って並列した二つの領域に形成された光導波路を有し、前記光の導波方向と直交する断面で見た場合に、前記二つの領域の寸法を変化させ、前記光導波路に導波される互いに独立な二つの偏光に対する前記光導波路の実効屈折率を等化して、この実効屈折率を両偏光に対する共通の実効屈折率を求めることによって、前記二つの領域の寸法と前記共通の実効屈折率との関係を求める光導波路断面構造設計工程と;パラメータとして反射率および位相の二つを指定して所定の複素反射率スペクトルを算出した後、前記複素反射率スペクトルと所望の光導波路の長さとから、前記光導波路の導波方向に沿う実効屈折率の形状分布を得るブラッググレーティングパターン設計工程と;前記光導波路断面構造設計工程で求めた前記二つの領域の寸法と前記共通の実効屈折率との関係に基づいて、前記ブラッググレーティングパターン設計工程で得た前記実効屈折率の形状分布を、前記二つの領域の寸法の形状分布に変換することにより、前記二つの領域の寸法の変化からなる前記第1および第2のブラッググレーティングパターンを得る反射ミラー設計工程と;を有することを特徴とする光共振器の設計方法を提供する。
(14)上記(13)に記載の光共振器の設計方法では、前記ブラッググレーティングパターン設計工程において、座標軸の離散化の分解能を反射帯の幅の半値に対応するピッチ変化分以上に、言い換えると、チャープトブラッググレーティングにおけるピッチの中心値からの変化分の最大値以上に取る粗視化工程を有することにより、ブラッググレーティングの振幅の包絡線の勾配の符号が反転する孤立した単一の座標点を複数個含む光導波路が構成されることが好ましい。
上記(2)に記載の発明によれば、ブラッググレーティングパターンを有する基板型光導波路素子において、光学特性の偏光依存性を低減することができる。
上記(3)に記載の係る発明によれば、サンプルドグレーティングよりも導波路長を短縮することができる。
上記(4)に記載の発明によれば、徐々にピッチが変化する従来のチャープ型グレーティングと比較して、製造プロセスにおける公差管理が容易になり、製造歩留まりの向上に寄与する。
上記(5)に記載の発明によれば、基本モードのモードフィールド径が広がるため、製造プロセスにおいて生じる不可避の内側コア側壁の荒れが光学特性に与える影響(散乱損失)を抑制することができる。
上記(7)に記載の発明によれば、二通りのブラッググレーティングパターンを有する波長分散補償素子の設計を容易に実現することが可能になる。
上記(8)に記載の発明によれば、さらに小型化した波長分散補償素子を設計することが可能になる。
上記(9)に記載の発明によれば、光学特性の変動が少ない光フィルタを実現することができる。
上記(10)に記載の発明によれば、二通りのブラッググレーティングパターンを有する光フィルタの設計を容易に実現することが可能になる。
上記(11)に記載の発明によれば、さらに小型化した光フィルタを設計することが可能になる。
上記(12)に記載の発明によれば、光学特性の変動が少ない光共振器を実現することができる。
上記(13)に記載の発明によれば、二通りのブラッググレーティングパターンを有する光共振器の設計を容易に実現することが可能になる。
上記(14)に記載の発明によれば、さらに小型化した光共振器を設計することが可能になる。
2,22,32…内側コアの第2のリブ
3,20,30…基板型光導波路素子
23…中央ギャップ
4,24,34…外側コア
5,25,35…基板
6,26,36…下部クラッド
7,27,37…上部クラッド
10…コア
12…側壁
12a…凹部(コア幅の狭い部分)
12b…凸部(コア幅の広い部分)
13…溝
13a…凹部(溝幅の広い部分)
13b…凸部(溝幅の狭い部分)
15…突起
15a…凹部(突起幅の狭い部分)
15b…凸部(突起幅の広い部分)
101…波長分散補償素子
102…光サーキュレータ
150…光共振器
151…第1の光導波路(反射ミラー)
152…第2の光導波路(反射ミラー)
153…第3の光導波路。
<基板型光導波路素子の第1形態例>
図1に、本発明の基板型光導波路素子の第1形態例を模式的に示す。図1Aは断面図、図1Bは部分斜視図である。また、図50に、本形態例の基板型光導波路素子の各部の寸法を示す。この基板型光導波路素子においては、光導波路が基板5上に形成されており、そのコアは、L字型の内側コア1,2と外側コア4の2領域からなる複合コアである。具体的には、光導波路は、基板5上に形成された下部クラッド6と、下部クラッド6上に形成された内側コア1,2と、内側コア1,2の上に形成された外側コア4と、内側コア1,2および外側コア4の上に形成された上部クラッド7から構成されている。本形態例の光導波路は、直線導波路に限らず、曲がり導波路であっても良い。
第1および第2のリブ1,2は、おのおの同一形状で、互いの突き合せ部分で凸部を形成する。具体的には、第1および第2のリブ1,2は平面部1a,2aと、その平面部1a,2aの縁の上に位置する高さt1の直方体部1b,2bとから構成される。直方体部1b,2bは、幅w1の凸部を構成している。直方体部1b,2bを構成する材料と平面部1a,2aを構成する材料は同じである。
第1のリブ1と第2のリブ2には、媒質中に適宜の不純物を添加することにより、それぞれP型またはN型の導電性を付与できる。すなわち、第1のリブ1をP型領域として、第2のリブ2をN型領域としても良い。逆に、第1のリブ1をN型領域として、第2のリブ2をP型領域としても良い。
なお、第1のリブ1および第2のリブ2に極性(P型またはN型)が反対の導電性を付与すること、および電圧を印加する電極パッドを設けることは本形態例において必須の構成ではなく、内側コア1,2に外部電圧を印加しないで利用することも可能である。
図2に、本発明の基板型の光導波路素子におけるグレーティング構造の一例を模式的に示す。光導波路において光の伝搬方向に導波路の幅または厚みを周期的に変化させると、光導波路の実効屈折率が周期的に変化し、ブラッググレーティングを構成できる。図2ではコア10のみを図示し、クラッドの図示を省略したが、実際はクラッドがコア10の周囲を囲んでいる。また、クラッドの下には基板(図示せず)が存在し、コア10の底面14は基板面に平行である。水平方向とは基板面に平行な方向をいい、垂直方向とは基板面に垂直な方向をいう。本グレーティング構造を本発明の基板型光導波路素子に適用する場合は、コア10が外側コアとして適用することが好ましい。
また、二通りのブラッググレーティングパターンが、光の導波方向に沿って並列した領域に形成されている。すなわちそれぞれのブラッググレーティングパターンが中心軸Cに沿って存在する範囲は、同一である。
これにより、第1のブラッググレーティングパターンと第2のブラッググレーティングパターンとの組み合わせによって、TE型偏光への作用とTM型偏光への作用を等化し、偏光依存性を低減することができる。
まず、基板上に下部クラッドとなる材料を一面に成膜する。次にコアを構成する材料を下部クラッド上に成膜し、ブラッググレーティングの形状に加工する。その後、上部クラッドとなる材料を、下部クラッドおよびコアの上に成膜し、コアが断面の周囲を下部クラッドおよび上部クラッドで取り囲まれるようにする。
図2A~図2Cに示す溝13および図3A~図3Cに示す突起15は、光の導波方向につながっているが、局所周期ごとに凹部および/または凸部を形成することによっても、コアの高さ方向に周期的変化を与えることができる。コア10の上面11に形成された溝13および突起15は、コア10の幅方向中央の一部に形成されているが、コア10の厚み自体を変化させても構わない。
偏光依存性を低減したブラッググレーティング光導波路の構造として、図4のような断面構造を有する光導波路が挙げられる。偏光依存性を低減する原理の簡単な説明のために、図2A~図2Cおよび図3A~図3Cの基板型光導波路素子ではコア10の断面構造は一様とした。しかし、光導波路の寸法を変えて実効屈折率を変化させる場合、実効屈折率の精度を上げるためには、図4に示すような複合コア構造を有する光導波路が好ましい。
図4の断面構造を有する基板型光導波路素子20のコアは、内側コア21,22と外側コア24の2領域からなる複合コアである。
t1、t2、w1、w2の例としては、t1=250nm、t2=50nm、w1=280nm、w2=160nmが挙げられるが、特にこれに限定されない。
なお、第1のリブ21および第2のリブ22に極性(P型またはN型)が反対の導電性を付与すること、および電圧を印加する電極パッドを設けることは本形態例において必須の構成ではなく、内側コア21,22に外部電圧を印加しないで利用することも可能である。
具体的には、外側コア24の幅woutを周期的に変化させた第1のブラッググレーティングパターンと、外側コア24の上面24aに形成された溝(トレンチ)24cの幅winを周期的に変化させた第2のブラッググレーティングパターンを備えている。外側コア24の厚みはtoutで、溝24cの深さはtinである。
tout、tinの例としては、tout=600nm、tin=100nmが挙げられるが、特にこれに限定されない。win、woutは周期的に変化する。
なお、図4に示す例では、上面24aのブラッググレーティングパターンは溝24cから構成されているが、上述したように、突起15(図3A~図3C参照)を採用しても良い。
次に、偏光依存性を低減したブラッググレーティング光導波路の設計において、本発明にて新たに提案する手順を説明する。この手順による設計の流れの概要を箇条書きで記載すると、以下の各ステップになる。
[2]所望の波長分散特性および反射特性を指定し、光導波路の構造決定に必要なデータを準備する。
[3]光導波路長を与えておき、逆散乱問題解法により上記[2]の波長分散特性および反射特性から、光導波路の中心軸Cに沿う方向での実効屈折率の形状分布(プロファイル)を導出する。
[4]上記[1]で得た実効屈折率と光導波路寸法との対応関係に基づき、[3]で得た実効屈折率の形状分布からブラッググレーティング光導波路の形状(光導波路の中心軸Cに沿う方向での光導波路寸法のプロファイル)を決定する。
なお、ステップ[1]は、ステップ[4]の前に完了していれば良いから、各ステップを[1]→[2]→[3]→[4]の順序で行なっても、[2]→[3]→[1]→[4]の順序で行なっても、[2]→[1]→[3]→[4]の順序で行なっても、[1]と[2]および[3]をそれぞれ並行して行っても、構わない。
すなわち、本設計方法は、ステップ[1]からなる光導波路の断面構造に関する設計工程(a)と、ステップ[2]および[3]からなるブラッググレーティングパターンの設計工程(b)と、ステップ[4]からなる波長分散補償素子に関する設計工程(c)を有するものであって、工程(a)と工程(b)の順序は限定されない。
本実施例の場合、「断面構造を決めるための光導波路の寸法」とは、側壁24bに形成した凹凸による第1のブラッググレーティングパターンに対してはwout、上面24aの溝24cに形成した第2のブラッググレーティングパターンに対してはwinを指す。そこで、woutおよびwinを指定して固有モードの電界分布をフィルムモードマッチング法(FMM法)、有限要素法もしくはビーム伝搬法により計算し、固有モードに対応する実効屈折率を求める。その結果、woutおよびwinと実効屈折率の対応関係が得られる。
なお、ここではmode1の実効屈折率を以下の設計手順で用いるが、neff TEとneff TMとの差が誤差未満であるから、代わりに、mode2の実効屈折率を光導波路の実効屈折率neffとしたり、mode1・mode2両モードの実効屈折率の平均を光導波路の実効屈折率neffとしても良い。
波長分散補償素子に求められる波長分散の特性は、対象とする光ファイバ伝送路の波長分散を打ち消すべく、光ファイバ伝送路の波長分散とは符号が逆で、絶対値は等しい。本実施例では、伝送する光信号の波長帯域はLバンド領域(1566.31~1612.65nm)にあり、光伝送路が長さ40kmの分散シフトファイバ(G653)により構成されているとして、波長分散補償素子に課すべき波長分散を規定する。また、対象とする光伝送路では、周波数の間隔が、100GHz(波長間隔に換算すると約0.84nm)のLバンドITUグリッドの50チャンネル分の光信号が伝送されるものとする。伝送する光信号のビットレートは40Gbit/s、各チャンネルの使用帯域は80GHzとし、使用帯域外では遅延時間は一定値と規定する。
本発明では、ブラッググレーティングの振幅が変化して位相は振幅に従属して変化するという振幅変調型のブラッググレーティングを用いた設計を、後述する粗視化という処理を用いて行なう。粗視化を容易にするため、設計の入力データとして用いる複素反射率スペクトルにおいては、周波数の原点すなわち0Hzから所定の群遅延時間の特性が求められる周波数領域をすべて含める。
このステップでは、ステップ[2]で得た所定の複素反射率スペクトルから、ブラッググレーティング光導波路の中心軸Cに沿う方向での実効屈折率プロファイルを導出する。以下、その導出過程について説明する。
式10および式15のポテンシャルq(z)は実数とする。その結果、複素反射率スペクトルR(k)からインパルス応答(言い換えると「時間応答」)を与えるr(z)へと変換するための演算は実数型となり、振幅が変化して位相が振幅に従属して変化する。
振幅変調の例を示すため、図8の実効屈折率分布の一部を拡大して、ブラッググレーティング振幅の包絡線(点線)とともに図10に示す。包絡線は振幅の極大値に対してのみ表示してある。振幅の極小値に対する包絡線に対しても、極大値に対する包絡線と同一の点で符号が反転するため、極大値に対する包絡線を考慮するだけで十分である。矢印が包絡線の勾配の符号が反転する導波路の座標点を示す。符号の反転は孤立した単一の座標点で生じるという階段的な急峻な変化あるいは不連続な変化を示す。
これに対し、サンプルドブラッググレーティングでは、符号の反転が生ずる場合、それは二点を介して発生し、階段的な急峻な変化あるいは不連続な変化は現れない。さらに、その二点間では振幅が連続的にゼロになる導波路の領域が存在する。本実施例の振幅変調型グレーティングでは、包絡線の勾配の符号が反転する孤立した座標点で包絡線の振幅はゼロとならず、振幅が連続的にゼロとなる領域は存在しない。よって、サンプルドブラッグレーティングよりも導波路長を短縮することができる。
包絡線の勾配の符号が反転する孤立した座標点は導波路上で複数個存在する。おのおのの座標点では、付随的に位相の不連続な変化をともなう。位相が不連続に変化すると局所周期(ピッチ)が変化するため、ピッチがその座標点で中心波長(1590.83nm)をnavで除した値の半分とは異なる値をとる。包絡線の勾配の符号が反転する座標点を特定する精度は、横軸にとっている導波路の座標zの離散化の刻みによる。その刻みをΔPとすると、座標点を特定する精度は±ΔPの範囲にある。このように、本発明の振幅変調型ブラッググレーティングには、ブラッググレーティングの振幅の包絡線の勾配の符号が反転し、その結果、ピッチが離散的に変化する座標点が存在する。
本発明では、他の実施例すべてを含めて、座標zの離散化の分解能は座標zの離散化の刻みΔPを意味する。
ピッチの離散的な変化は、チャープトブラッググレーティングには見られない特徴である。チャープトブラッググレーティングでは、ピッチは光導波方向に沿って連続的に変化する。チャープトブラッググレーティングでは、ブラッググレーティングの振幅も同時に変化するが、振幅の変化はアポダイズのような副次的特性の実現に利用されるにとどまる。フィルタの反射スペクトルのチャンネル数・位相特性などの主要な特性はブラッググレーティングの周波数を光の導波方向に沿って変化させることによって達成される。本ステップでは、チャープトブラッググレーティングを構成することはできない。チャープトブラッググレーティングを構成するには、複素反射率スペクトルR(ν)から時間応答(インパルス応答)への変換を複素数型へと切り替える必要がある。その結果、式15により得られるq(z)は複素数となる。q(z)が複素数であると、q(z)からneff(z)を求めるにあたり、neff(z)は実数であるため、q(z)の実部のみをとることが必要である。よって、振幅変調型ブラッググレーティングとチャープトブラッググレーティングとは設計方法を異にし、互いに異なる範疇に分類される。振幅変調型に相対することから、チャープトブラッググレーティングは、周波数変調型に分類される。
このとき、次の二つの条件を満足させることが好ましい。(I)指定するスペクトル特性の周波数範囲を原点(周波数ゼロ)から該当するスペクトルチャンネルの存在する領域まですべてを含める。(II)上述の複素反射率スペクトルからインパルス応答への変換において実数型を選択する。
ここで、(I)は粗視化を容易にするため、(II)はチャープトブラッググレーティングが対象でないので、処理が複雑になる複素数型を選択する必要がないためである。
ステップ[1]で用意した光導波路の寸法と実効屈折率との対応関係に基づき、ステップ[3]で求めた実効屈折率プロファイルを、光導波路の寸法の分布データ(プロファイル)へと変換する。実効屈折率を与えると、決めるべき寸法パラメータであるwoutおよびwinが求まる。よって、座標zの各点での実効屈折率とwoutおよびwinを対応づけることにより、光導波路寸法woutおよびwinの分布データが得られる。
(2)正弦波的な形状のブラッググレーティングパターンがカバーするコア面積と一致するように矩形波的な形状のラインの振幅を調整する。
本実施例に記載したブラッググレーティング光導波路は、他の波長領域の波長分散補償にも利用できる。他の波長帯での波長分散補償素子の例として、他の実施例でCバンド領域を対象とした事例を提供する。
図14に、本形態例の基板型の光導波路素子の断面構造を示す。図14に示した断面を有する基板型光導波路素子30のコアは、内側コア31,32と外側コア34の2領域からなる複合コアである。本形態例は、内側コア31,32が中央ギャップを有しない点が異なる以外は、図4に示す第2形態例と同様である。外側コア34、外側コア34の側壁34bに形成される第1のブラッググレーティングパターン、上面34aの溝34cに形成される第2のブラッググレーティングパターン、基板35、下部クラッド36、上部クラッド37の構成は、図4に示す第2形態例と同様である。
なお、第1のリブ31および第2のリブ32に極性(P型またはN型)が反対の導電性を付与すること、および電圧を印加する電極パッドを設けることは本形態例において必須の構成ではなく、内側コア31,32に外部電圧を印加しないで利用することも可能である。
また、第1のリブ31および第2のリブ32が添加物の有無も含めて同一の材料から構成されても良い。この場合は中央の接合部33が存在せず、2つのリブ31,32が一体化された層として内側コアを構成できる。
本実施例は、波長分散補償素子に関する実施例2として、図14の複合コア(中央ギャップなし)を有する光導波路の構造において、第1および第2のリブ31,32をSi、外側コア34をSixNy、基板35をSi、下部クラッド36をSiO2、上部クラッド37をSiO2で構成し、t1=250nm、t2=50nm、w1=100nm、w2=160nm、tout=600nm、tin=100nm、下部クラッド36の厚みを2000nm、上部クラッド37の最大厚みを2000nmとした場合で算出した。
次に、実施例3として、実施例1と同様に図4に記載の断面構造を有するブラッググレーティング光導波路を用いて、実施例1のステップ[2]から[4]にしたがい、Cバンド(1528.77~1577.03nm)内で周波数の間隔が100GHzのITUグリッド40チャンネルの波長分散補償素子の設計例について記述する。
次に、実施例4として、実施例1と同様に図4に記載の断面構造を有するブラッググレーティング光導波路を用いて、実施例1のステップ[2]から[4]にしたがい、Lバンドの単一の波長チャンネルに対する波長分散補償素子の設計例について記述する。
実施例1ないし4の波長分散補償素子では、ブラッググレーティング光導波路から出射した光信号は、入射した光信号の経路を逆方向に伝搬する。つまり、出射信号光が入射信号光と同一の経路上を伝搬するため、出射信号光を入射信号光から分離する方法が必要になる。本実施例では、図26に示すように、波長分散補償素子101に光サーキュレータ102を接続して、入射信号光を波長分散補償素子に入射するポートと、出射信号光を波長分散補償素子から取り出すポートを有する波長分散補償素子の構成について説明する。
上述の基板型の光導波路素子の第2形態例にある基板型の光導波路を用いて、10個の異なる波長チャンネルに反射帯を有する光フィルタを構成する。光フィルタの設計方法は、以下のステップ[1]~[4]からなる。
[2]光フィルタとして所望の反射特性を指定し、光導波路の構造決定に必要なデータを得る。反射特性として指定するのは、各波長での反射率および位相である。周波数の範囲には、原点(周波数ゼロ)から所望の反射特性を含む周波数領域すべてを含める。
[3]光導波路長を与えておき、逆散乱問題解法によりステップ[2]で得た複素電界反射率スペクトルから光導波路の導波方向に沿う実効屈折率の形状分布を導出する。本ステップには、複素電界反射スペクトルを時間応答に変換する計算過程が含まれるが、それは実数型の変換とする。
ステップ[2]および[3]は、ブラッググレーティングパターン設計工程となる。
[4]ステップ[1]で得た実効屈折率を光導波路コアの断面寸法との対応関係に基づき、ステップ[3]で得た実効屈折率の形状分布からブラッググレーティング光導波路の光導波方向に沿う形状を決定する。このステップは、光フィルタ設計工程となる。
なお、上述した波長分散補償素子の設計ステップにならい、ステップの順序を入れ替えることができる。
・ステップ[1]
導波路の断面構造は図4のとおりである。
TE偏光での実効屈折率を導波路の実効屈折率とみなして、実効屈折率とwinおよびwoutとの対応を計算しプロットすると、図6となる。
10個の異なる波長チャンネルに反射帯を有する光フィルタの光学特性を指定する。光通信では、波長の代わりに周波数を用いてスペクトル領域を区別する場合が多い。本実施例では、以下、周波数の関数として光フィルタのスペクトル特性を論ずる。各周波数での反射率および位相より複素電界の反射率スペクトルR(ν)を計算する。直交座標系ではR(ν)は実数成分と虚数成分とから構成されるが、極座標系に座標変換して、複素電界の反射率を電界反射率の絶対値と位相に分離した方が光フィルタの特性を取り扱う上で便利である。そこで、次の式Aのように極座標表示で複素電界の反射率を表現する。
本実施例の光フィルタでは、各チャンネルの反射帯での波長分散はゼロと設定する。波長分散がゼロの場合、位相は周波数に対して線形な関数となる。以上より、本実施例の光フィルタに対して指定する光学特性を図示すると、図27のようになる。図27では、左の縦軸に電界反射率の絶対値|R(ν)|、右の縦軸に位相φ(ν)をとり、それぞれ実線および破線でプロットしてある。横軸は単位をTHzとした周波数νであり、192.6THzから193.6THzまで0.1THz間隔で10個のチャンネルに等分割して光学特性を指定している。中心周波数は193.1THzである。中心波長に換算すると、1552.52nmとなる。各チャンネルでの反射帯のスペクトル幅は0.01THzであり、その範囲内で位相が線形変化していることがわかる。
図27には、反射帯が存在するチャンネル付近の周波数帯のみを表示してある。所望の光学特性として逆散乱解法の対象とする光学特性では、原点(0THz)から反射チャンネルが存在する周波数帯すべてを含める。ただし、図27以外の周波数領域では、反射チャンネルは存在しないので電界反射率の値はゼロである。
逆散乱問題解法に基づき、光フィルタを構成する光導波路の導波方向での実効屈折率分布を導出する。その手順は、上述した波長分散補償素子の設計方向におけるステップ[3]で説明したとおりである。
その結果、上述の式15により得られるq(z)も実数となり、ブラッググレーティングの振幅が変化して位相は振幅に付随して変化する振幅変調型ブラッググレーティングの実効屈折率の分布が得られる。本発明での振幅変調の定義は後で述べる。
符号の反転は孤立した単一の座標点で生じるという階段的な急峻性あるいは不連続性を示し、符号が反転する二点間で振幅が連続的にゼロになる導波路領域が介在するという、サンプルドブラッググレーティングが有する特性は現れない。本発明の振幅変調型グレーティングでは包絡線の勾配の符号が反転する孤立した座標点でのみ振幅ゼロとなるため、実質的に振幅がゼロとなる領域は存在しない。よって、サンプルドブラッグレーティングよりも導波路長を短縮できる。
ステップ[1]で用意した光導波路寸法winおよびwoutと実効屈折率neffとの対応関係に基づき、ステップ[3]で得た実効屈折率分布neff(z)をwinおよびwoutの分布データ(プロファイル)に変換する。図5Aおよび図5Bに示した対応関係より、実効屈折率を与えると決めるべき寸法パラメータであるwinおよびwoutが求められる。図29のように実効屈折率の分布におけるブラッググレーティングパターンは正弦波的な形状を有する。
光学マスクを用いた描画およびドライエッチングによるパターン転写プロセスでは、一定の幅の線(ライン)と幅とがピッチに応じて変化する空白(スペース)の組み合わせが繰り返し配列される矩形波的な形状を採用すると、ドライエッチング後の形状の揺らぎが少ない。そこで、実効屈折率のプロファイルから光導波路寸法woutおよびwinのプロファイルデータを得た後、矩形波的な形状のプロファイルに変換する。ただし、矩形波的な形状への変換の際、次の2つの制限を課すことにする。
(2)正弦波的な形状のブラッググレーティングパターンがカバーするコア面積と一致するよう矩形波な形状のライン振幅を調節する。
本実施例の光フィルタの用途は、例えば、光増幅器を経た後、波長多重されたチャンネルの信号光のみを偏光によらず反射光として取り出し、信号光周辺の波長領域に存在する自然放出光ノイズを除去することに用いられる。なお、チャンネル数、チャンネル間隔、反射帯のスペクトル幅は本実施例の数値に限定されるものではなく、用途に応じて最適の数値を指定し設計することができる。
本実施例は、電力反射率が約40%のビームスプリッタの設計例である。ビームスプリッタは、各チャンネルの信号光を二経路に分岐する用途に使用できる。
このビームスプリッタの設計方法は、電力反射率のパラメータを変更するほかは、実施例1の光フィルタと同様に実施される。
本実施例は、単一の反射帯を有する光フィルタの設計例である。設計のステップは実施例1および2と同様である。反射帯の電力反射率は約90%とする。実効屈折率とwinおよびwoutとの対応関係は実施例1および2と同一である。指定する光学特性は図35に示される。反射帯のスペクトル幅は0.01THzである。
この光学特性を用いて逆散乱問題解法に基づき導出される実効屈折率の分布を図36および図37に示す。実効屈折率を矩形波的形状のプロファイルに変換した結果を図38に示す。本実施例の光フィルタは、特定の単一チャンネルの信号光を反射光として取り出すことに用いることができる。
なお、反射帯のスペクトル幅は0.01THzに制限されることはない、任意の幅を指定して設計することができる。
本実施例は、0.1THz間隔の波長チャンネルに対するインターリーバの設計例である。本実施例においては、チャンネル間隔を0.2THzとして、各チャンネルの反射帯の幅を0.1THzとして光フィルタを設計する。指定する光学特性は図39に示される。この光学特性を用いて逆散乱問題解法に基づき導出される実効屈折率分布を図40および図41に示す。実効屈折率を矩形波的な形状のプロファイルに変換した結果を図42に示す。
本実施例の光フィルタ(インターリーバ)は、0.1THz間隔の各チャンネルに対して、信号光を奇数番号・偶数番号チャンネルの二経路に分岐することができる。
本実施例は、上述した基板型の光導波路素子の第3形態例にある基板型の光導波路(図14参照)を用いて、光フィルタの実施例1に記載した光学特性(図27参照)を有する光フィルタを設計したものである。本実施例では、光導波路の実効屈折率とwinおよびwoutとの対応関係は、図15に示される。
ステップ[3]においてnav=2.22252とするほかは光フィルタの実施例1と同様にして、実効屈折率の分布を導出する。この光学特性を用いて逆散乱問題解法に基づき導出される実効屈折率の分布を図43に示す。実効屈折率を矩形波的形状のプロファイルに変換した結果を図44に示す。
図45に示すように、光共振器150は、両端に反射ミラー151,152となる光導波路(第1の光導波路151および第2の光導波路152)を配置し、これら反射ミラー151,152の間に、光共振器媒質を含む第3の光導波路153が挟まれた構成となる。本発明では、第1の光導波路151と第3の光導波路153と第2の光導波路152が直列に接続されて単一の基板型の光導波路として形成され、その両端の反射ミラー151,152には、ブラッググレーティングパターンを有し反射機能を有する光導波路を用いる。そして、反射機能を有する光導波路の設計は、所望の反射特性を設定することで、上述した光フィルタの設計方法に従って実施可能である。光共振器媒質となる第3の光導波路153は、反射ミラー151,152間で光が共振するための、所定の光路長を有するものであれば良い。
光共振器は、複数の波長チャンネルのいずれかを選択する機能を有するように設計する。複数の波長チャンネルの例は、例えば、周波数間隔100GHzで並んだITUグリッドである。かかる機能を有する光共振器の構成要素の光学特性について、図46および図47に基づいて説明する。図46の下側のグラフに、第1の反射ミラーの電力反射スペクトル(実線)および第2の反射ミラーの電力反射スペクトル(破線)を示す。
第1および第2の反射ミラーの電力反射スペクトルの積として得られたスペクトルを図46の上側のグラフに示す。第1および第2の反射ミラーの反射帯の電力反射率を0.9(90%)とする。光共振器中で共鳴する光の波長は、双方のスペクトルの反射域が重なる領域に制限される。これは、一般にバーニア機能と呼ばれ、互いに異なる櫛型の電力反射スペクトルを有する光フィルタを二つ組み合わせて、特定の波長成分を抽出する用途に用い、さらに、一方の光フィルタの特性を可変することにより、抽出する波長成分を可変することに用いられる。
選択した波長チャンネルでの共鳴電力を最大にするには、光共振器媒質である第3の光導波路を伝搬する際に生ずる位相シフト、すなわち第3の光導波路の実効屈折率を調節すればよい。図47の上側のグラフでは、位相シフトは0.477πとしてある。
本実施例での第1の反射ミラーの設計方法は、以下のステップ[1]~[4]からなる。
[2]反射ミラーとして所望の反射特性を指定し、光導波路の構造決定に必要なデータを得る。反射特性として指定するのは、各波長での反射率および位相である。周波数範囲には、原点(周波数ゼロ)から所望の反射特性を含む周波数領域すべてを含める。
[3]光導波路長を与えておき、逆散乱問題解法によりステップ[2]で得た複素電界の反射率スペクトルから光導波路の導波方向に沿う実効屈折率の形状分布を導出する。本ステップには、複素電界反射スペクトルを時間応答に変換する計算過程が含まれるが、それは実数型の変換とする。
ステップ[2]および[3]は、ブラッググレーティングパターン設計工程となる。
[4]ステップ[1]で得た実効屈折率を光導波路コアの断面寸法との対応関係に基づき、ステップ[3]で得た実効屈折率の形状分布からブラッググレーティング光導波路の光導波方向に沿う形状を決定する。このステップは、反射ミラー設計工程となる。
なお、上述した波長分散補償素子の設計ステップにならい、ステップの順序を入れ替えることができる。
・ステップ[1]
導波路の断面構造は図4のとおりである。
TE偏光での実効屈折率を導波路の実効屈折率とみなして、実効屈折率とwinおよびwoutとの対応を計算しプロットすると、図6となる。
図46の下側のグラフにある電力反射スペクトルと所望の位相特性より、グレーティング光導波路の複素電界反射率スペクトルR(ν)を計算する。直交座標系ではR(ν)は実数成分と虚数成分とから構成されるが、極座標系に座標変換して、複素電界反射率を電界反射率の絶対値と位相に分離した方が反射ミラーの特性を取り扱う上で便利である。そこで、上述した式Aのように極座標表示で複素電界反射率を表現する。
本実施例の反射ミラーでは、各チャンネルの反射帯での波長分散はゼロと設定する。波長分散がゼロの場合、位相は周波数に対して線形な関数となる。以上より、本実施例の反射ミラーに対して指定する光学特性を図示すると、図27のようになる。図27では、左の縦軸に電界反射率の絶対値|R(ν)|、右の縦軸に位相φ(ν)をとり、それぞれ実線および破線でプロットしてある。横軸は単位をTHzとした周波数νであり、192.6THzから193.6THzまで0.1THz間隔で10個のチャンネルに等分割して光学特性を指定している。中心周波数は193.1THzである。中心波長に換算すると、1552.52nmとなる。各チャンネルでの反射帯のスペクトル幅は0.01THzであり、その範囲内で位相が線形変化していることがわかる。
図27には、反射帯が存在するチャンネル付近の周波数帯のみを表示してある。所望の光学特性として逆散乱解法の対象とする光学特性では、原点(0THz)から反射チャンネルが存在する周波数帯すべてを含める。ただし、図27以外の周波数領域では、反射チャンネルは存在しないので電界反射率の値はゼロである。
逆散乱問題解法に基づき、反射ミラーを構成する光導波路の導波方向での実効屈折率分布を導出する。その手順は、上述した波長分散補償素子の設計方向におけるステップ[3]で説明したとおりである。
その結果、上述の式15により得られるq(z)も実数となり、ブラッググレーティングの振幅が変化して位相は振幅に付随して変化する振幅変調型ブラッググレーティングの実効屈折率分布が得られる。本発明での振幅変調の定義は後で述べる。
ステップ[1]で用意した光導波路寸法winおよびwoutと実効屈折率neffとの対応関係に基づき、ステップ[3]で得た実効屈折率分布neff(z)をwinおよびwoutの分布データ(プロファイル)に変換する。図5Aおよび図5Bに示した対応関係より、実効屈折率を与えると決めるべき寸法パラメータであるwinおよびwoutが求められる。図29のように実効屈折率分布におけるブラッググレーティングパターンは正弦波的な形状を有する。
光学マスクを用いた描画およびドライエッチングによるパターン転写プロセスでは、一定の幅の線(ライン)と幅とがピッチに応じて変化する空白(スペース)の組み合わせが繰り返し配列される矩形波的な形状を採用すると、ドライエッチング後の形状の揺らぎが少ない。そこで、実効屈折率のプロファイルから光導波路寸法woutおよびwinのプロファイルデータを得た後、矩形波的形状のプロファイルに変換する。ただし、矩形波的形状への変換の際、次の2つの制限を課すことにする。
(2)正弦波的形状のブラッググレーティングパターンがカバーするコア面積と一致するよう矩形波形状のライン振幅を調節する。
第3の光導波路は、第1の光導波路と第2の光導波路との間に直列に接続する。第3の光導波路の長さは前述のとおりである。基板上の光導波路を用いる場合には、第1、第3及び第2の光導波路が直列接続された光導波路を光学マスク上に定義することができる。
本実施例は、上述した基板型の光導波路素子の第3形態例にある基板型の光導波路(図14参照)を用いて、光共振器の実施例1に記載した光学特性(図46、図47参照)を有する第1の反射ミラーを設計したものである。本実施例では、光導波路の実効屈折率とwinおよびwoutとの対応関係は、図15に示される。
ステップ[3]においてnav=2.22252とするほかは光共振器の実施例1と同様にして、実効屈折率分布を導出する。この光学特性を用いて逆散乱問題解法に基づき導出される実効屈折率分布を図43に示す。実効屈折率を矩形波的形状のプロファイルに変換した結果を図44に示す。なお、これら図43~図44は、上述の光フィルタの実施例5で示したものと同一である。
上記の説明では、本発明による振幅変調型のブラッググレーティングは、チャープトブラッググレーティングとは異なるものとしている。一方、以下に述べる標本化定理(sampling theorem)によると、ブラッググレーティングパターンは一義的に定義され、振幅変調型やチャープトブラッググレーティングという相異は現れない。ただし、それは連続的な実効屈折率分布に対して適用されるのであって、粗視化(coarse graining)した離散的な実効屈折率の分布には適用されない。その点について、以下補足する。
コア側壁荒れの影響について評価するため、モードソルバーを用いて基本伝搬モードをシミュレーションし、リブの実効屈折率を計算した。
本実施例では、図1および図50に示す第1形態例の基板型の光導波路素子において、上部クラッド7および下部クラッド6を屈折率1.45のSiO2とし、高屈折率リブ1,2を屈折率3.48のSiとし、外側コア4を屈折率2.0の窒化ケイ素とし、各部の寸法は、凸部の高さt1=250nm、平面部の厚みt2=50nm、外側コア4の厚みt3=600nm、凸部の幅w1=560nm(片側の直方体部に対しては280nm)、外側コア4の幅w2=1400nmとした。
Claims (14)
- 光導波路のコアが、リブ構造をなす凸部を有する内側コアと、この内側コアの上に設けられて前記凸部の周面を被覆する外側コアとを備え;
前記外側コアの屈折率が、前記内側コアの平均屈折率よりも低い;
ことを特徴とする基板型光導波路素子。 - 第1のブラッググレーティングパターン及び第2のブラッググレーティングパターンのそれぞれが、前記光の導波方向と直交する断面で見た場合に、光の導波方向に沿って並列した領域に形成され;
前記第1のブラッググレーティングパターンが、前記光の導波方向に沿って前記光導波路の前記コアの両外側壁に形成された凹凸であり;
前記第2のブラッググレーティングパターンが、前記光の導波方向に沿って前記コアの幅方向中央でかつこのコアの上部に形成された溝の両内側壁に形成された凹凸であり;
前記光の導波方向に沿って見た場合に、前記第1のブラッググレーティングパターンにおけるコア幅の広い部分と前記第2のブラッググレーティングパターンにおける溝幅の狭い部分とが対応し、なおかつ前記第1のブラッググレーティングパターンのコア幅の狭い部分と前記第2のブラッググレーティングパターンの溝幅の広い部分とが対応している;
ことを特徴とする請求項1に記載の基板型光導波路素子。 - 前記第1のブラッググレーティングパターン及び前記第2のブラッググレーティングパターンは、おのおの、ブラッググレーティングの振幅の包絡線の勾配の符号が反転する孤立した単一の座標点を複数個含むことを特徴とする請求項2に記載の基板型光導波路素子。
- 前記光導波路にブラッググレーティングパターンを有し;
このブラッググレーティングパターンが、局所周期が3通り以上の離散値のみをとり;
これら離散値が、前記光導波路の全長にわたってそれぞれ複数箇所に存在し;
これらすべての離散値のうちで最も分布頻度の高い値をMとし、このMよりも大きい値でかつこのMに最も近い値をAとし、前記Mよりも小さい値でかつこのMに最も近い値をBとした場合、A-Mで表される差が、M-Bで表される差と等しいことを特徴とする請求項1~3のいずれか一項に記載の基板型光導波路素子。 - 前記光導波路が、コアと、そのコアの幅方向の中央に、前記光の導波方向に沿って配置されるとともに屈折率が前記コアよりも低いギャップ部を備え;
前記コアが、前記ギャップ部により分離された2つの領域を備え、これら2つの領域にまたがって単一のモードが伝搬されるシングルモード光導波路を構成している;
ことを特徴とする請求項1~4のいずれか一項に記載の基板型光導波路素子。 - 光導波路にブラッググレーティングパターンを有し;複数の波長チャンネルに対して、信号光が前記光導波路に入射してから反射するまでにこの光導波路を伝搬する距離が波長に応じて異なることにより、前記光導波路における波長分散および分散スロープを補償する;波長分散補償素子であって、
請求項1~5のいずれか一項に記載の基板型光導波路素子からなることを特徴とする波長分散補償素子。 - 請求項6に記載の波長分散補償素子の設計方法であって、
前記波長分散補償素子が、第1のブラッググレーティングパターン及び第2のブラッググレーティングパターンが光の導波方向と直交する断面で見た場合に、光の導波方向に沿って並列した光導波路を有し;
前記第1および第2のブラッググレーティングパターンとなる二つの領域の前記光の導波方向と直交する断面における寸法を変化させて、前記光導波路に導波される互いに独立な二つの偏光に対する前記光導波路の実効屈折率を等化して、両偏光に対する共通の実効屈折率を求めることによって、前記二つの領域の寸法と前記共通の実効屈折率との関係を求める光導波路断面構造設計工程と、
パラメータとして波長分散、分散スロープおよび反射率の三つを指定して所定の複素反射率スペクトルを算出した後、前記複素反射率スペクトルと所望の光導波路の長さとから、前記光導波路の、前記光の導波方向に沿う実効屈折率の形状分布を得るブラッググレーティングパターン設計工程と、
前記光導波路断面構造設計工程で求めた前記二つの領域の寸法と前記共通の実効屈折率との関係に基づいて、前記ブラッググレーティングパターン設計工程で得た前記実効屈折率の形状分布を、前記二つの領域の寸法の形状分布に変換することにより、前記二つの領域の寸法の変化からなる前記第1のブラッググレーティングパターン及び前記第2のブラッググレーティングパターンを得る波長分散補償素子の設計工程と、
を有することを特徴とする波長分散補償素子の設計方法。 - 前記ブラッググレーティングパターン設計工程で、座標軸の離散化の分解能を反射帯の幅の半値に対応するピッチ変化分以上に取る粗視化工程をさらに備え;
この粗視化工程により、ブラッググレーティングの振幅の包絡線の勾配の符号が反転する孤立した単一の座標点を複数個含む光導波路が構成される;
ことを特徴とする請求項7に記載の波長分散補償素子の設計方法。 - 請求項1~5のいずれか一項に記載の基板型光導波路素子からなることを特徴とする光フィルタ。
- 請求項9に記載の光フィルタの設計方法であって、
前記光フィルタが、第1のブラッググレーティングパターン及び第2のブラッググレーティングパターンが光の導波方向と直交する断面で見た場合に、光の導波方向に沿って並列した光導波路を有し;
前記第1および第2のブラッググレーティングパターンとなる二つの領域の前記光の導波方向と直交する断面における寸法を変化させて、前記光導波路に導波される互いに独立な二つの偏光に対する前記光導波路の実効屈折率を等化して、両偏光に対する共通の実効屈折率を求めることによって、前記二つの領域の寸法と前記共通の実効屈折率との関係を求める光導波路断面構造設計工程と、
パラメータとして反射率および位相の二つを指定して所定の複素反射率スペクトルを算出した後、前記複素反射率スペクトルと所望の光導波路の長さとから、前記光導波路の導波方向に沿う実効屈折率の形状分布を得るブラッググレーティングパターン設計工程と、
前記光導波路断面構造設計工程で求めた前記二つの領域の寸法と前記共通の実効屈折率との関係に基づいて、前記ブラッググレーティングパターン設計工程で得た前記実効屈折率の形状分布を、前記二つの領域の寸法の形状分布に変換することにより、前記二つの領域の寸法の変化からなる前記第1および第2のブラッググレーティングパターンを得る光フィルタ設計工程と、
を有することを特徴とする光フィルタの設計方法。 - 前記ブラッググレーティングパターン設計工程で、座標軸の離散化の分解能を反射帯の幅の半値に対応するピッチ変化分以上に取る粗視化工程をさらに有し;
この粗視化工程により、ブラッググレーティングの振幅の包絡線の勾配の符号が反転する孤立した単一の座標点を複数個含む光導波路が構成される;
ことを特徴とする請求項10に記載の光フィルタの設計方法。 - 第1の反射ミラーとなる第1の光導波路と、第2の反射ミラーとなる第2の光導波路と、これら第1の光導波路及び第2の光導波路との間に挟まれた第3の光導波路とを有し;これら第1の光導波路と第3の光導波路と第2の光導波路とが直列に接続されて単一の基板型光導波路を形成する光共振器であって、
前記第1の光導波路および前記第2の光導波路が、請求項1~5のいずれか一項に記載の基板型光導波路素子からなる
ことを特徴とする光共振器。 - 請求項12に記載の光共振器の設計方法であって、
前記反射ミラーが、第1のブラッググレーティングパターンおよび第2のブラッググレーティングパターンが光の導波方向と直交する断面で見た場合に、光の導波方向に沿って並列した光導波路を有し;
前記第1および第2のブラッググレーティングパターンとなる二つの領域の前記光の導波方向と直交する断面における寸法を変化させて、前記光導波路に導波される互いに独立な二つの偏光に対する前記光導波路の実効屈折率を等化して、両偏光に対する共通の実効屈折率を求めることによって、前記二つの領域の寸法と前記共通の実効屈折率との関係を求める光導波路断面構造設計工程と;
パラメータとして反射率および位相の二つを指定して所定の複素反射率スペクトルを算出した後、前記複素反射率スペクトルと所望の光導波路の長さとから、前記光導波路の導波方向に沿う実効屈折率の形状分布を得るブラッググレーティングパターン設計工程と;
前記光導波路断面構造設計工程で求めた前記二つの領域の寸法と前記共通の実効屈折率との関係に基づいて、前記ブラッググレーティングパターン設計工程で得た前記実効屈折率の形状分布を、前記二つの領域の寸法の形状分布に変換することにより、前記二つの領域の寸法の変化からなる前記第1および第2のブラッググレーティングパターンを得る反射ミラー設計工程と;
を有することを特徴とする光共振器の設計方法。 - 前記ブラッググレーティングパターン設計工程で、座標軸の離散化の分解能を反射帯の幅の半値に対応するピッチ変化分以上に取る粗視化工程をさらに有し;
この粗視化工程により、ブラッググレーティングの振幅の包絡線の勾配の符号が反転する孤立した単一の座標点を複数個含む光導波路が構成される;
ことを特徴とする請求項13に記載の光共振器の設計方法。
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CN200980106226.7A CN101952755B (zh) | 2008-02-29 | 2009-02-27 | 基板型光波导元件、波长色散补偿元件、光滤波器、光共振器以及它们的设计方法 |
US12/870,671 US8824044B2 (en) | 2008-02-29 | 2010-08-27 | Planar optical waveguide element, chromatic dispersion compensator, optical filter, optical resonator and methods for designing the element, chromatic dispersion compensator, optical filter and optical resonator |
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