WO2009069428A1 - 光酸発生剤および光反応性組成物 - Google Patents

光酸発生剤および光反応性組成物 Download PDF

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Publication number
WO2009069428A1
WO2009069428A1 PCT/JP2008/069783 JP2008069783W WO2009069428A1 WO 2009069428 A1 WO2009069428 A1 WO 2009069428A1 JP 2008069783 W JP2008069783 W JP 2008069783W WO 2009069428 A1 WO2009069428 A1 WO 2009069428A1
Authority
WO
WIPO (PCT)
Prior art keywords
group
photoacid generator
optionally substituted
formula
phenylthiothiophene
Prior art date
Application number
PCT/JP2008/069783
Other languages
English (en)
French (fr)
Inventor
Katsumasa Yamamoto
Hirofumi Yamaguchi
Michio Suzuki
Original Assignee
Sumitomo Seika Chemicals Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Seika Chemicals Co., Ltd. filed Critical Sumitomo Seika Chemicals Co., Ltd.
Priority to JP2009543731A priority Critical patent/JP5738530B2/ja
Priority to CN2008801257716A priority patent/CN101925594B/zh
Priority to EP08854014.1A priority patent/EP2218715B1/en
Priority to US12/741,325 priority patent/US8216768B2/en
Publication of WO2009069428A1 publication Critical patent/WO2009069428A1/ja

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/26—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D333/30—Hetero atoms other than halogen
    • C07D333/34—Sulfur atoms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic

Abstract

　本発明は、 式（Ａ１）、式（Ｂ１）、または式（Ｃ１）： （式中、Ｒ１ａ～Ｒ４ａ、Ｒ１ｂ、Ｒ２ｂ、Ｒ１ｃ及びＲ２ｃは、それぞれ独立して、置換基を有してもよい単環式炭素環基、置換基を有してもよい縮合多環式炭素環基または置換基を有してもよい単環式複素環基を示し、Ｒ３ｂ～Ｒ５ｂ、Ｒ３ｃ～Ｒ７ｃは、それぞれ独立して、水素原子、炭素数１～１０のアルキル基、炭素数１～４のアルコキシ基、アシル基または水酸基を示す。Ｘ−は、無機酸イオンまたは有機酸イオンを示す。）で表されるジチエニルスルフィドジスルホニウム塩又はフェニルチオチオフェンスルホニウム塩、これを含有する光酸発生剤、並びに、当該光酸発生剤および酸反応性化合物を含有する光反応性組成物を提供する。
PCT/JP2008/069783 2007-11-28 2008-10-30 光酸発生剤および光反応性組成物 WO2009069428A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2009543731A JP5738530B2 (ja) 2007-11-28 2008-10-30 光酸発生剤および光反応性組成物
CN2008801257716A CN101925594B (zh) 2007-11-28 2008-10-30 光致酸发生剂及光反应性组合物
EP08854014.1A EP2218715B1 (en) 2007-11-28 2008-10-30 Photoacid generator and photoreactive composition
US12/741,325 US8216768B2 (en) 2007-11-28 2008-10-30 Photoacid generator and photoreactive composition

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2007-307634 2007-11-28
JP2007307632 2007-11-28
JP2007-307632 2007-11-28
JP2007-307633 2007-11-28
JP2007307633 2007-11-28
JP2007307634 2007-11-28

Publications (1)

Publication Number Publication Date
WO2009069428A1 true WO2009069428A1 (ja) 2009-06-04

Family

ID=40678331

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/069783 WO2009069428A1 (ja) 2007-11-28 2008-10-30 光酸発生剤および光反応性組成物

Country Status (6)

Country Link
US (1) US8216768B2 (ja)
EP (1) EP2218715B1 (ja)
JP (1) JP5738530B2 (ja)
CN (1) CN101925594B (ja)
TW (1) TWI444374B (ja)
WO (1) WO2009069428A1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011038014A (ja) * 2009-08-13 2011-02-24 Sumitomo Seika Chem Co Ltd 光酸発生剤および光反応性組成物
CN102081303A (zh) * 2009-11-26 2011-06-01 住友化学株式会社 光致抗蚀剂组合物
WO2011129206A1 (ja) * 2010-04-12 2011-10-20 住友精化株式会社 光酸発生剤及び光反応性組成物

Families Citing this family (10)

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Publication number Priority date Publication date Assignee Title
JP6414411B2 (ja) 2013-08-09 2018-10-31 ディーエスエム アイピー アセッツ ビー．ブイ．Ｄｓｍ Ｉｐ Ａｓｓｅｔｓ Ｂ．Ｖ． 積層造形用の低粘度液状放射線硬化型歯科アライナー成形型用樹脂組成物
JP6056032B2 (ja) 2013-11-05 2017-01-11 ディーエスエム アイピー アセッツ ビー．ブイ． 付加造形用の安定化マトリックス充填液状放射線硬化性樹脂組成物
EP3294780A4 (en) 2015-06-08 2018-11-21 DSM IP Assets B.V. Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication
US9983474B2 (en) * 2015-09-11 2018-05-29 Taiwan Semiconductor Manufacturing Company, Ltd. Photoresist having sensitizer bonded to acid generator
EP3341793B1 (en) 2015-10-01 2021-05-26 DSM IP Assets B.V. Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication
WO2017087614A1 (en) 2015-11-17 2017-05-26 Dsm Ip Assets, B.V. Improved antimony-free radiation curable compositions for additive fabrication, and applications thereof in investment casting processes
WO2017160845A1 (en) 2016-03-14 2017-09-21 Dsm Ip Assets B.V. Radiation curable compositions for additive fabrication with improved toughness and high temperature resistance
WO2019117723A1 (en) 2017-12-15 2019-06-20 Dsm Ip Assets B.V. Compositions and methods for high-temperature jetting of viscous thermosets to create solid articles via additive fabrication
KR20200104368A (ko) 2017-12-29 2020-09-03 디에스엠 아이피 어셋츠 비.브이. 적층 제작을 위한 조성물 및 물품, 및 이의 사용 방법
JP2022546933A (ja) 2019-08-30 2022-11-10 コベストロ （ネザーランズ） ビー．ブイ． 付加造形のための液状ハイブリッドｕｖ／ｖｉｓ放射線硬化性樹脂組成物

Citations (4)

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US3205157A (en) 1962-03-13 1965-09-07 North American Aviation Inc Electromagnetic radiation polymerization
US4231951A (en) 1978-02-08 1980-11-04 Minnesota Mining And Manufacturing Company Complex salt photoinitiator
JP2004189720A (ja) 2002-11-26 2004-07-08 Sumitomo Seika Chem Co Ltd 光重合開始剤および光硬化性組成物
JP2005504329A (ja) * 2001-06-29 2005-02-10 インターナショナル・ビジネス・マシーンズ・コーポレーション フォトリソグラフィ用のチオフェン含有光酸発生剤

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CH632755A5 (de) * 1976-04-10 1982-10-29 Basf Ag Verfahren zur herstellung von thiophenverbindungen.
US5731364A (en) * 1996-01-24 1998-03-24 Shipley Company, L.L.C. Photoimageable compositions comprising multiple arylsulfonium photoactive compounds
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Publication number Priority date Publication date Assignee Title
US3205157A (en) 1962-03-13 1965-09-07 North American Aviation Inc Electromagnetic radiation polymerization
US4231951A (en) 1978-02-08 1980-11-04 Minnesota Mining And Manufacturing Company Complex salt photoinitiator
JP2005504329A (ja) * 2001-06-29 2005-02-10 インターナショナル・ビジネス・マシーンズ・コーポレーション フォトリソグラフィ用のチオフェン含有光酸発生剤
JP2004189720A (ja) 2002-11-26 2004-07-08 Sumitomo Seika Chem Co Ltd 光重合開始剤および光硬化性組成物

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CAMERON J.F. ET AL.: "Complex triarylsulfonium salts as photoacid generators for deep UV microlithography: synthesis, identification and lithographic characterization of key individual components", PROCEEDINGS OF SPIE-THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, vol. 3049, 1997, pages 473 - 484, XP008021333 *
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011038014A (ja) * 2009-08-13 2011-02-24 Sumitomo Seika Chem Co Ltd 光酸発生剤および光反応性組成物
CN102081303A (zh) * 2009-11-26 2011-06-01 住友化学株式会社 光致抗蚀剂组合物
WO2011129206A1 (ja) * 2010-04-12 2011-10-20 住友精化株式会社 光酸発生剤及び光反応性組成物
JP5669825B2 (ja) * 2010-04-12 2015-02-18 住友精化株式会社 光酸発生剤及び光反応性組成物

Also Published As

Publication number Publication date
CN101925594B (zh) 2013-11-20
JP5738530B2 (ja) 2015-06-24
EP2218715B1 (en) 2017-06-28
EP2218715A4 (en) 2012-02-15
US20100233621A1 (en) 2010-09-16
JPWO2009069428A1 (ja) 2011-04-07
EP2218715A1 (en) 2010-08-18
CN101925594A (zh) 2010-12-22
TW200934768A (en) 2009-08-16
US8216768B2 (en) 2012-07-10
TWI444374B (zh) 2014-07-11

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