WO2009034916A1 - 蒸気放出装置、有機薄膜蒸着装置及び有機薄膜蒸着方法 - Google Patents

蒸気放出装置、有機薄膜蒸着装置及び有機薄膜蒸着方法 Download PDF

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Publication number
WO2009034916A1
WO2009034916A1 PCT/JP2008/065986 JP2008065986W WO2009034916A1 WO 2009034916 A1 WO2009034916 A1 WO 2009034916A1 JP 2008065986 W JP2008065986 W JP 2008065986W WO 2009034916 A1 WO2009034916 A1 WO 2009034916A1
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WO
WIPO (PCT)
Prior art keywords
vapor deposition
emission
emission section
organic thin
vapor
Prior art date
Application number
PCT/JP2008/065986
Other languages
English (en)
French (fr)
Inventor
Toshio Negishi
Tatsuhiko Koshida
Original Assignee
Ulvac, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac, Inc. filed Critical Ulvac, Inc.
Priority to CN2008801072226A priority Critical patent/CN101803462B/zh
Priority to EP08830347.4A priority patent/EP2187709B1/en
Priority to JP2009532158A priority patent/JPWO2009034916A1/ja
Priority to KR1020107005203A priority patent/KR101128745B1/ko
Publication of WO2009034916A1 publication Critical patent/WO2009034916A1/ja
Priority to US12/719,216 priority patent/US20100209609A1/en

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Abstract

　蒸発材料の使用効率を向上させるとともに、蒸発材料の経時劣化を防止し、さらに、蒸着時の熱によるマスクの変形を確実に防止することができる有機材料蒸着技術を提供する。本発明の有機材料用蒸発源は、複数の放出口１２が面内に配列されたシャワープレート型の放出部１１と、放出部１１内に設けられ、導入される有機蒸発材料の蒸気を噴出口１５を介して放出部１１の底部１１ａに向って放出させて放出部１１内に供給する供給管１４と、少なくとも放出部１１の放出口１２側の部位に設けられる冷却手段１７とを有する。冷却手段１７は、例えば放出部１１を全体的に覆うように形成され、放出部１１の放出口１２と対応する部位に、当該有機蒸発材料の蒸気を通過させる蒸気通過孔１７ａを有する。
PCT/JP2008/065986 2007-09-10 2008-09-04 蒸気放出装置、有機薄膜蒸着装置及び有機薄膜蒸着方法 WO2009034916A1 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
CN2008801072226A CN101803462B (zh) 2007-09-10 2008-09-04 蒸气放出装置、有机薄膜蒸镀装置及有机薄膜蒸镀方法
EP08830347.4A EP2187709B1 (en) 2007-09-10 2008-09-04 Vapor emission device, organic thin-film vapor deposition apparatus and method of organic thin-film vapor deposition
JP2009532158A JPWO2009034916A1 (ja) 2007-09-10 2008-09-04 蒸気放出装置、有機薄膜蒸着装置及び有機薄膜蒸着方法
KR1020107005203A KR101128745B1 (ko) 2007-09-10 2008-09-04 증기 방출 장치, 유기 박막 증착 장치 및 유기 박막 증착 방법
US12/719,216 US20100209609A1 (en) 2007-09-10 2010-03-08 Vapor emission device, organic thin film vapor deposition apparatus, and method for depositing organic thin film

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2007-234441 2007-09-10
JP2007234441 2007-09-10
JP2007-299139 2007-11-19
JP2007299139 2007-11-19
JP2008043480 2008-02-25
JP2008-043480 2008-02-25

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/719,216 Continuation US20100209609A1 (en) 2007-09-10 2010-03-08 Vapor emission device, organic thin film vapor deposition apparatus, and method for depositing organic thin film

Publications (1)

Publication Number Publication Date
WO2009034916A1 true WO2009034916A1 (ja) 2009-03-19

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Application Number Title Priority Date Filing Date
PCT/JP2008/065986 WO2009034916A1 (ja) 2007-09-10 2008-09-04 蒸気放出装置、有機薄膜蒸着装置及び有機薄膜蒸着方法

Country Status (7)

Country Link
US (1) US20100209609A1 (ja)
EP (1) EP2187709B1 (ja)
JP (1) JPWO2009034916A1 (ja)
KR (1) KR101128745B1 (ja)
CN (1) CN101803462B (ja)
TW (1) TWI428460B (ja)
WO (1) WO2009034916A1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
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WO2011028867A1 (en) * 2009-09-03 2011-03-10 Universal Display Corporation Organic vapor jet printing device with a chiller plate
KR101132834B1 (ko) 2009-10-29 2012-04-02 한국생산기술연구원 유기박막 증착 장치
JP2018500716A (ja) * 2014-09-30 2018-01-11 オスラム オーエルイーディー ゲゼルシャフト ミット ベシュレンクテル ハフツングＯＳＲＡＭ ＯＬＥＤ ＧｍｂＨ 有機電子素子の製造方法及び有機電子素子

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KR101084234B1 (ko) 2009-11-30 2011-11-16 삼성모바일디스플레이주식회사 증착원, 이를 구비하는 증착 장치 및 박막 형성 방법
KR101256193B1 (ko) * 2011-05-06 2013-04-19 주식회사 에스에프에이 박막 증착장치 및 이에 사용되는 선형증발원
CN103947301B (zh) * 2011-11-22 2017-07-25 株式会社神户制钢所 等离子产生源及具备它的真空等离子处理装置
JP2013211137A (ja) * 2012-03-30 2013-10-10 Samsung Display Co Ltd 真空蒸着方法及びその装置
KR101375527B1 (ko) * 2012-05-02 2014-03-17 주식회사 에스에프에이 일체형 증발 소스 및 그를 구비하는 평판표시소자용 기판 증착장치
KR101325864B1 (ko) * 2012-08-27 2013-11-05 에스엔유 프리시젼 주식회사 유기발광다이오드 봉지공정용 증착장치
DE102012220986B4 (de) * 2012-11-16 2015-04-02 Innovent E.V. Technologieentwicklung Dosiereinheit und ihre Verwendung
KR102192500B1 (ko) * 2013-10-24 2020-12-17 히다치 조센 가부시키가이샤 진공증착장치용 매니폴드
JP6345899B2 (ja) * 2016-02-23 2018-06-20 鴻海精密工業股▲ふん▼有限公司 蒸着マスク、蒸着マスクの製造方法および有機ｅｌ表示装置の製造方法
CN110573647B (zh) * 2017-04-26 2021-10-08 株式会社爱发科 蒸发源和成膜装置
US11842907B2 (en) 2020-07-08 2023-12-12 Applied Materials, Inc. Spot heating by moving a beam with horizontal rotary motion

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011028867A1 (en) * 2009-09-03 2011-03-10 Universal Display Corporation Organic vapor jet printing device with a chiller plate
CN102597299A (zh) * 2009-09-03 2012-07-18 通用显示公司 具有冷却器板的有机蒸汽喷射装置
CN102597299B (zh) * 2009-09-03 2015-05-13 通用显示公司 有机蒸汽喷射印刷装置和方法
KR101132834B1 (ko) 2009-10-29 2012-04-02 한국생산기술연구원 유기박막 증착 장치
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Also Published As

Publication number Publication date
TWI428460B (zh) 2014-03-01
KR101128745B1 (ko) 2012-03-27
EP2187709A4 (en) 2011-11-09
US20100209609A1 (en) 2010-08-19
EP2187709A1 (en) 2010-05-19
JPWO2009034916A1 (ja) 2010-12-24
TW200925303A (en) 2009-06-16
CN101803462B (zh) 2012-06-27
CN101803462A (zh) 2010-08-11
KR20100053631A (ko) 2010-05-20
EP2187709B1 (en) 2018-03-21

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