Classifications

• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
  • C23C14/228—Gas flow assisted PVD deposition
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
  • C23C14/0623—Sulfides, selenides or tellurides
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
  • C23C14/50—Substrate holders
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
  • C23C14/54—Controlling or regulating the coating process
  • C23C14/541—Heating or cooling of the substrates
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
  • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
  • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
  • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/58—After-treatment
  • C23C14/5806—Thermal treatment

Definitions

• the present invention concerns a method for thermally converting metallic precursor layers on substrates into semiconducting layers, and also an apparatus for carrying out the method and for producing solar modules on substrates.
• Such convertible metallic layers which are also referred to as precursor layers, can contain copper, gallium and indium.
• the precursor layer can be applied to the substrate, which can be a glass substrate, by means of known technologies, e.g. by sputtering.
• CIGS copper indium gallium selenide
• chalcogens that is to say selenium, sulphur, tellurium and compounds thereof among one another or with other substances or mixtures thereof, have to be supplied onto said layers.
• chalcogens At room temperature, that is to say around 20 0 C, said chalcogens assume a solid state of matter and evaporate at temperatures above approximately 350 0 C.
• Such glass substrates prepared with a CIGS layer can then be processed further as blanks to form solar modules, this including various contact-connections and, if appropriate, the application of passivations, filter layers, etc.
• the precursor layer is converted as completely as possible into the CIGS layer with an identical layer thickness over the area.
• EP 0 662 247 Bl has disclosed a method for producing a chalcopyrite semiconductor on a substrate, in which the substrate prepared with metals, such as copper, indium or gallium, is heated in an inert process gas to a process temperature of at least 350 0 C at a heating rate of at least 10°C/second.
• the process temperature is maintained for a time period of 10 seconds to 1 hour, in which the substrate is exposed to sulphur or selenium as a component in excess relative to the components copper, indium or gallium.
• a covering is situated above the layer construction on the substrate at a distance of less than 5 mm in the sense of an encapsulation.
• the partial pressure of sulphur or selenium lies above the partial pressure that would form over a stoichiometrically exact composition of the starting components copper, indium or gallium and sulphur.
• the invention is based on the object, then, of providing an accelerated and simple-to-realize fast method for thermally converting metallic layers on any desired substrates into semiconducting layers, and also an apparatus suitable for carrying out the method and serving for producing solar modules with high efficiency.
• the substrates previously prepared at least with a metallic precursor layer are heated in a furnace, which is segmented into different temperature regions, at a pressure at approximately atmospheric ambient pressure in a plurality of steps in each case to a predetermined temperature up to the end temperature between 400 0 C and 600 0 C and are converted into semiconducting layers whilst maintaining the end temperature in an atmosphere comprising a mixture of a carrier gas and vaporous chalcogens .
• the substrates are subsequently cooled to room temperature in at least one step.
• the substrate is previously prepared with a precursor layer and, above the latter, with a layer of chalcogens prior to introduction into the furnace.
• This chalcogen layer is preferably produced by vapour deposition of selenium onto the precursor layer.
• the invention is furthermore characterized in that the precursor layers are produced by successive sputtering of copper, indium and gallium.
• substrates comprising glass are firstly provided with a first molybdenum layer by sputtering, onto which layer are then sputtered a second layer composed of copper/gallium (CuGA) from a composite target and, finally, a third layer composed of indium from an indium target under a high vacuum.
• CuGA copper/gallium
• the heating of the substrates and the conversion of the precursor layers are performed in the absence of oxygen and hydrogen, or with a lowest possible oxygen partial pressure.
• the substrate After the conclusion of the conversion of the metallic precursor layers into CIGS layers, the substrate can also be cooled in a step-response function.
• the substrates are transported step by step through the segmented furnace and are in each case heated to a higher temperature in successive segments, the predetermined residence duration in the individual segments being identical .
• the residence duration can be 60 seconds.
• the substrates are heated in the segments from room temperature, that is to say from an ambient temperature of approximately 20 0 C, with a decreasing temperature difference up to the end and reaction temperature, the temperature gradient varying from segment to segment in such a way that the heating rate is approximately twice as high in the second section as in the preceding section and the succeeding section, in which the end and reaction temperature is reached.
• the heating process can be effected in each section in a step-response function to the respective desired temperature.
• the heating can be performed in stages from room temperature to 150 0 C, 400 0 C and 500 0 C - 600 0 C, in which case the 550 0 C mark must not be exceeded as end temperature .
• the heating in the individual sections is performed over in each case an identical time duration, which can be 60 seconds.
• the substrates are cooled for example at a cooling rate of 8°C/sec.
• the pressure in the process chamber during the conversion process can be set to atmospheric pressure, e.g. to approximately 1000 hPa.
• a further configuration of the invention is characterized in that in the segment with the highest target temperature, a mixture of a chalcogen vapour/carrier gas mixture is brought over the surface of the substrate.
• the chalcogen vapour/carrier gas mixture can also be supplied from a heated source outside the muffle furnace.
• the chalcogen vapour/carrier gas mixture can contain vaporous chalcogen evaporated from the substrate in preceding segments .
• the chalcogen vapour/carrier gas mixture is produced from a mixture of chalcogen evaporated from the substrates in a preceding segment and additionally supplied chalcogen vapour from a source.
• a mixture of selenium vapour and nitrogen can be used as chalcogen vapour/carrier gas mixture.
• the object on which the invention is based is also achieved by means of an apparatus by virtue of the fact that the furnace is divided into a plurality of successive sections having different temperature regions, which are connected to one another by a continuous furnace channel, in which case, between an inlet-side section and an outlet-side section, further sections that can be heated independently of one another are arranged as heating zones and afterwards at least one section is arranged as a cooling zone, that in the furnace channel that connects the sections there is situated a thermally and mechanically low-mass transport device for the step-by-step and simultaneous transport of all the substrates situated in the sections at a high speed from one section to the respective next section, and that the furnace is equipped with inlet- and outlet-side locks.
• inlet-side section can be embodied as lock introduction chamber and the outlet-side section can be embodied as output lock.
• ambient pressure should prevail in the furnace.
• the transport device comprises graphite rollers which are mounted rotatably in the furnace and on which the substrates are guided displaceably in segments longitudinally through the furnace channel, and in that a displaceable and rotatable push rod concomitantly provided with transport lugs with the spacing pitch of the substrates is mounted between the rollers, the transport lugs of which, as viewed in the transport direction, can in each case be brought into engagement with the trailing edge of the substrates, it being possible for the leading edge of the substrates to be brought into engagement with the transport lug of the respective preceding substrate for braking purposes.
• the transport lugs can be brought into engagement by- rotation of the push rod and, after transport travel has been effected, can be pivoted into a position out of engagement with the substrates.
• the residence duration of the substrates in the individual segments is identical and can be 60 seconds, for example.
• a further development of the invention is characterized in that the furnace is subdivided into six segments, it being possible for the segments to be temperature- regulated to different, respectively successively higher target temperatures, and a chalcogen vapour/carrier gas mixture with a predetermined concentration being situated in the segment having the highest target temperature.
• the target temperatures are graded in the individual segments in such a way that a target temperature of for example 150 0 C can be set in the first segment, a target temperature of 400 0 C can be set in the following segment, and a target temperature of 550 0 C can be set in the next segment, for the substrates.
• segment following the segment having the highest target temperature is connected to an exhaust gas channel for discharging and conditioning excess chalcogen vapour/carrier gas mixture.
• the inlet- and outlet-side locks comprise gas curtains that ensure that the interior of the furnace is sufficiently sealed with respect to oxygen and hydrogen .
• the object on which the invention is based is also achieved by means of a solar module comprising a CIGS layer on a substrate, produced by providing a substrate prepared with a metallic precursor layer, heating the substrate in a plurality of stages to in each case a higher target temperature with different temperature gradients up to the conversion temperature of 550 0 C for converting the precursor layer into a CIGS layer with a vaporous chalcogen applied to the precursor layer.
• the cooling can be effected for example in a step- response function or at a cooling rate of approximately 8-10°C/second.
• the temperature gradient varies from segment to segment in such a way that the heating rate is approximately twice as high in the second section as in the preceding section and the succeeding section, in which the end and reaction temperature is reached.
• the method according to the invention achieves a particularly uniform lattice structure of the CIGS layer in association with a higher efficiency of the solar module.
• chalcogen vaporous selenium, sulphur, tellurium, compounds thereof among one another or with other substances or mixtures thereof are used as the chalcogen.
• the metallic precursor layers contain copper, indium and gallium.
• the invention realizes an accelerated method for converting the metallic layers into semiconducting layers .
• Advantages of the present method are a faster conversion of metallic layers into semiconducting layers, shorter cycle times in the industrial process and a more cost-effective fabrication since lower capital expenditure arises owing to fewer installations required.
• the present invention concerns a novel thermal process for any desired substrates in which metallic layers, which can contain copper, gallium and indium, are converted with selenium and/or sulphur into semiconducting semiconductor layers.
• the conversion is effected at ambient or atmospheric pressure.
• the special feature of the present invention is that rather than working under vacuum, work is performed under atmospheric conditions, or under increased process pressure, whereby the speed of the chemical reactions involved in the conversion is considerably increased.
• Figure 1 a schematic illustration of a furnace that is divided into a plurality of segments and is suitable for the step-by-step transport of substrates;
• Figure 2 schematically illustrated details of the furnace according to Figure 1;
• Figure 3 a schematic plan view of the transport device.
• the method according to the invention for thermally- converting metallic layers, which can contain copper, gallium or indium, on substrates into semiconducting CIGS layers can be performed per se in any desired furnace 1, e.g. a muffle furnace, which has to meet the following preconditions .
• the furnace 1 must comprise heatable or coolable segments Sl...Sn, of which the heatable segments Sl...Sn must be suitable at least in part for carrying out fast thermal processes.
• the furnace 1 must be able to be operated under atmospheric pressure and must be provided with suitable devices for feeding in and discharging gas .
• a further important precondition is that care is taken to ensure that the interior of the furnace 1, over the entire length thereof, is constantly kept largely free of oxygen and, if appropriate, also of hydrogen.
• the furnace 1 overall is composed of graphite, has a double-walled high-grade steel enclosure and, in accordance with Figure 1, is subdivided into six successive segments S1...S6.
• locks 2, 3 in the form of gas curtains composed of an inert gas are provided on the inlet and outlet sides.
• the oxygen partial pressure in the furnace 1 must in any event be kept extremely low.
• the locks 2, 3 simultaneously enable substrates 4 to be transported by means of a transport device 5 through the individual segments S1...S6 of the furnace 1 in a continuous method.
• the transport device 5 in accordance with Figure 3 can comprise graphite rollers 6 which are mounted rotatably in the furnace 1 and on which the substrates 4 are pushed in segments longitudinally through the furnace 1.
• a displaceable and rotatable push rod 8 concomitantly provided with transport lugs 7 with the spacing pitch of the substrates 4 and equipped with a drive (not illustrated) is provided for this purpose.
• the transport lugs 7, before each transport travel are brought into engagement with the substrates 4 by rotation of the push rod 8 upwards and all the substrates 4 are accelerated simultaneously.
• the substrates 4 are braked, their leading edge engaging with the transport lug 7 of the respective preceding substrate 4.
• the transport lugs 7 are pivoted away again, whereupon the transport rod 8 is moved back to its starting position again.
• the residence duration of the substrates 4 in the individual segments Sl...Sn is in each case identical and is 60 seconds, for example.
• the gas guiding in the interior of the furnace 1 is configured in such a way that all the gases and vapours supplied to the furnace 1 or arising in the latter are guided from the segment Sl via the following segments S2...Sn to an exhaust gas channel 9. Gas transport in the opposite direction is precluded.
• the furnace 1 contains six segments connected to one another via a continuous furnace channel, the segment Sl being temperature- regulated to an internal temperature of approximately 15O 0 C, such that the substrates 4 introduced into the segment 1 are immediately subjected to a first heating process.
• the oxygen and hydrogen entrained into the segment Sl with the transport of the substrates 4 are also removed completely from the segment Sl .
• the substrates are heated to a temperature of 400 0 C, and to approximately 500 0 C in the following segment S3, the temperature gradient varying from segment to segment in such a way that the heating rate is significantly higher, e.g. approximately twice as high, in the second section S2 than in the preceding section Sl and the succeeding section S3, until finally the end and reaction temperature is reached in the section S4 with 550 0 C.
• This reaction temperature is maintained in the succeeding section S5.
• Figure 1 illustrates adjacent to the section S5 a section S6, illustrated with an active cooling device 14 in the form of a water cooling. Since, in the event of excessively rapid cooling, thermally induced problems can occur with large-area substrates, it is also possible to insert an intermediate section without heating before the section S6, or to omit the cooling device of the section S6.
• metallic precursor layers 10 composed of copper, gallium and indium are situated on a molybdenum layer on the previously prepared substrates 4.
• substrates 4 comprising glass are firstly provided with a first molybdenum layer by sputtering, onto which layer are then sputtered a second layer composed of copper/gallium (CuGA) from a composite target and, finally, a third layer composed of indium from an indium target under a high vacuum (Figure 1) .
• a first molybdenum layer by sputtering, onto which layer are then sputtered a second layer composed of copper/gallium (CuGA) from a composite target and, finally, a third layer composed of indium from an indium target under a high vacuum (Figure 1) .
• CuGA copper/gallium
• the precursor layers are converted into a semiconducting CIGS layer in the segments S3-S5.
• This process requires firstly a temperature of 550 0 C in the segment S3 S5, and the presence of vaporous chalcogen, e.g. vaporous selenium.
• the substrates 4 are heated from 400 0 C to approximately 500 0 C in the segment S3 and to 550 0 C - 600 0 C in the segment S4 and a chalcogen vapour/carrier gas mixture is simultaneously conducted into the segments S3-S5 with sufficient concentration onto the surface of the substrates 4.
• the metallic precursor layer is converted abruptly into the desired semiconducting CIGS layer, after which the excess chalcogen vapour/carrier gas mixture is disposed of via the exhaust gas channel 9.
• the heating of the segments S1-S5 can be effected externally with the aid of an electrical or other heating 15 illustrated schematically in Figure 1.
• the heating is then effected by the heated graphite walls, or in the segment S6, or in further segments the cooling is effected by, for example, cooled graphite walls of the furnace channel.
• chalcogen vapour/carrier gas mixture can be provided from an additional source 12.
• the substrates, prior to introduction into the furnace 1 have already been provided with a vapour-deposited chalcogen layer, which then evaporates in the segments S2 and S3 and is conducted by means of the internal gas guiding in the furnace 1 as chalcogen vapour 13, e.g. selenium vapour, into segment S4, and S5, where, if appropriate, residual chalcogen still present finally evaporates and is likewise available there for the conversion process.
• the conversion process is referred to as selenium annealing in the case where selenium vapour is used as the chalcogen.
• the two variants can also be combined with one another.
• An additional chalcogen vapour/carrier gas mixture can simultaneously be introduced into the segment S2,S3 or S3 if the concentration of the chalcogen evaporated from the substrates is insufficient ( Figure 1).
• the substrates 4 are pushed into a further segment S6, in which cooling as rapidly as possible is effected by a cooling device 14, whereupon the substrates 4 are then discharged through a lock or pushed into a further segment S and from there discharged through a lock with a temperature of less than 100 0 C.
• the furnace 1 can also contain more than six segments, and that other temperature stipulations can also be set/chosen in the individual segments, provided that a temperature of 500-600 0 C is reached in the segment in which the metallic precursor layer is intended to be converted into the desired CIGS layer. A temperature of 550 0 C is a minimum here.
• the pressure in the furnace 1 can be at ambient pressure, e.g. at 1000 hPa.

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• Chemical & Material Sciences (AREA)
• Engineering & Computer Science (AREA)
• Chemical Kinetics & Catalysis (AREA)
• Materials Engineering (AREA)
• Organic Chemistry (AREA)
• Metallurgy (AREA)
• Mechanical Engineering (AREA)
• Thermal Sciences (AREA)
• Physics & Mathematics (AREA)
• General Chemical & Material Sciences (AREA)
• Geochemistry & Mineralogy (AREA)
• Life Sciences & Earth Sciences (AREA)
• Photovoltaic Devices (AREA)
• Physical Vapour Deposition (AREA)
• Physical Or Chemical Processes And Apparatus (AREA)
• Surface Treatment Of Glass (AREA)
• Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
• Glass Compositions (AREA)
• Chemical Vapour Deposition (AREA)

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• 2008
  • 2008-09-11 WO PCT/EP2008/007466 patent/WO2009033674A2/en not_active Ceased
  • 2008-09-11 US US12/529,872 patent/US20100151129A1/en not_active Abandoned
  • 2008-09-11 TW TW097134931A patent/TWI424073B/zh not_active IP Right Cessation
  • 2008-09-11 EP EP08804026A patent/EP2205772A2/en not_active Withdrawn
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  • 2008-09-11 KR KR1020097021552A patent/KR20100051586A/ko not_active Withdrawn
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  • 2008-09-11 KR KR1020097021149A patent/KR20100052429A/ko not_active Withdrawn
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  • 2008-09-11 WO PCT/EP2008/062061 patent/WO2009034131A2/en not_active Ceased
  • 2008-09-11 EP EP08830338.3A patent/EP2205773B1/en not_active Not-in-force
  • 2008-09-11 US US12/528,913 patent/US20100203668A1/en not_active Abandoned
• 2015
  • 2015-08-12 US US14/824,806 patent/US20150368789A1/en not_active Abandoned

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