WO2009025259A1 - 磁気ディスク用ガラス基板の製造方法 - Google Patents

磁気ディスク用ガラス基板の製造方法 Download PDF

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Publication number
WO2009025259A1
WO2009025259A1 PCT/JP2008/064711 JP2008064711W WO2009025259A1 WO 2009025259 A1 WO2009025259 A1 WO 2009025259A1 JP 2008064711 W JP2008064711 W JP 2008064711W WO 2009025259 A1 WO2009025259 A1 WO 2009025259A1
Authority
WO
WIPO (PCT)
Prior art keywords
glass substrate
polishing
group
magnetic disk
producing glass
Prior art date
Application number
PCT/JP2008/064711
Other languages
English (en)
French (fr)
Japanese (ja)
Inventor
Mizuho Ishida
Kara Yoshida
Hiroshi Usui
Original Assignee
Asahi Glass Company, Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Company, Limited filed Critical Asahi Glass Company, Limited
Priority to CN200880001536.8A priority Critical patent/CN101588895B/zh
Publication of WO2009025259A1 publication Critical patent/WO2009025259A1/ja
Priority to US12/477,197 priority patent/US20090239450A1/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • B24B37/044—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor characterised by the composition of the lapping agent
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C03C15/02—Surface treatment of glass, not in the form of fibres or filaments, by etching for making a smooth surface
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Surface Treatment Of Glass (AREA)
PCT/JP2008/064711 2007-08-23 2008-08-18 磁気ディスク用ガラス基板の製造方法 WO2009025259A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN200880001536.8A CN101588895B (zh) 2007-08-23 2008-08-18 磁盘用玻璃基板的制造方法
US12/477,197 US20090239450A1 (en) 2007-08-23 2009-06-03 Process for producing glass substrate for magnetic disks

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-216839 2007-08-23
JP2007216839A JP2009050920A (ja) 2007-08-23 2007-08-23 磁気ディスク用ガラス基板の製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/477,197 Continuation US20090239450A1 (en) 2007-08-23 2009-06-03 Process for producing glass substrate for magnetic disks

Publications (1)

Publication Number Publication Date
WO2009025259A1 true WO2009025259A1 (ja) 2009-02-26

Family

ID=40378161

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/064711 WO2009025259A1 (ja) 2007-08-23 2008-08-18 磁気ディスク用ガラス基板の製造方法

Country Status (5)

Country Link
US (1) US20090239450A1 (zh)
JP (1) JP2009050920A (zh)
CN (1) CN101588895B (zh)
SG (1) SG183731A1 (zh)
WO (1) WO2009025259A1 (zh)

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* Cited by examiner, † Cited by third party
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JP5233621B2 (ja) * 2008-12-02 2013-07-10 旭硝子株式会社 磁気ディスク用ガラス基板及びその製造方法。
JP5326638B2 (ja) * 2009-02-18 2013-10-30 富士電機株式会社 磁気記録媒体用ガラス基板の製造方法、それが使用される磁気記録媒体用ガラス基板、および、垂直磁気記録媒体
JPWO2011021478A1 (ja) * 2009-08-17 2013-01-17 コニカミノルタアドバンストレイヤー株式会社 ガラス基板の製造方法、ガラス基板、磁気記録媒体の製造方法および磁気記録媒体
JP2011110637A (ja) * 2009-11-25 2011-06-09 Asahi Glass Co Ltd 磁気ディスク用ガラス基板の製造方法
JP4858622B2 (ja) * 2010-02-26 2012-01-18 旭硝子株式会社 磁気記録媒体用ガラス基板の製造方法
US9053736B2 (en) 2010-04-20 2015-06-09 Kao Corporation Method for manufacturing an aluminosilicate glass substrate for hard disks
JP5499324B2 (ja) * 2010-04-28 2014-05-21 旭硝子株式会社 情報記録媒体用ガラス基板及びその製造のための研磨用コロイダルシリカスラリー、並びに情報記録媒体
JP5940270B2 (ja) 2010-12-09 2016-06-29 花王株式会社 研磨液組成物
JP5768554B2 (ja) * 2011-07-21 2015-08-26 旭硝子株式会社 磁気記録媒体用ガラス基板の製造方法および磁気記録媒体用ガラス基板
JP2014041978A (ja) 2012-08-23 2014-03-06 Fujimi Inc 研磨用組成物、研磨用組成物の製造方法、及び研磨用組成物原液の製造方法
JP6110681B2 (ja) * 2013-02-13 2017-04-05 株式会社フジミインコーポレーテッド 研磨用組成物、研磨用組成物製造方法および研磨物製造方法
JP6420260B2 (ja) * 2014-01-31 2018-11-07 Hoya株式会社 磁気ディスク用基板の製造方法及び磁気ディスクの製造方法
CN106271959A (zh) * 2016-08-15 2017-01-04 安徽省银锐玻璃机械有限公司 玻璃手工磨边的方法
JP6734146B2 (ja) * 2016-08-23 2020-08-05 山口精研工業株式会社 磁気ディスク基板用研磨剤組成物
JP7122097B2 (ja) * 2017-10-24 2022-08-19 山口精研工業株式会社 磁気ディスク基板用研磨剤組成物
JP7083680B2 (ja) * 2018-04-05 2022-06-13 花王株式会社 研磨液組成物
US10479911B1 (en) 2018-06-05 2019-11-19 Cabot Microelectronics Corporation Composition and method for polishing memory hard disks exhibiting reduced edge roll off
WO2021053732A1 (ja) 2019-09-17 2021-03-25 Ａｇｃ株式会社 研磨剤、ガラスの研磨方法、及びガラスの製造方法
CN111421399A (zh) * 2020-04-26 2020-07-17 东莞南玻工程玻璃有限公司 一种玻璃表面除霉的抛光方法

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JP2003051468A (ja) * 2002-06-04 2003-02-21 Hitachi Chem Co Ltd Ｃｍｐ研磨方法
JP2007063372A (ja) * 2005-08-30 2007-03-15 Kao Corp 研磨液組成物
JP2007191696A (ja) * 2005-12-22 2007-08-02 Kao Corp ガラス基板用研磨液組成物

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CN102863943B (zh) * 2005-08-30 2015-03-25 花王株式会社 硬盘用基板用研磨液组合物、基板的研磨方法和制造方法
CN1986612B (zh) * 2005-12-22 2012-07-25 花王株式会社 玻璃基板用研磨液组合物
JP5168358B2 (ja) * 2008-10-01 2013-03-21 旭硝子株式会社 研磨液及び研磨方法
JP5499324B2 (ja) * 2010-04-28 2014-05-21 旭硝子株式会社 情報記録媒体用ガラス基板及びその製造のための研磨用コロイダルシリカスラリー、並びに情報記録媒体

Patent Citations (3)

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Publication number Priority date Publication date Assignee Title
JP2003051468A (ja) * 2002-06-04 2003-02-21 Hitachi Chem Co Ltd Ｃｍｐ研磨方法
JP2007063372A (ja) * 2005-08-30 2007-03-15 Kao Corp 研磨液組成物
JP2007191696A (ja) * 2005-12-22 2007-08-02 Kao Corp ガラス基板用研磨液組成物

Also Published As

Publication number Publication date
SG183731A1 (en) 2012-09-27
US20090239450A1 (en) 2009-09-24
JP2009050920A (ja) 2009-03-12
CN101588895A (zh) 2009-11-25
CN101588895B (zh) 2011-10-26

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