WO2009017064A1 - アルカリ現像性感光性樹脂組成物及びβ－ジケトン化合物 - Google Patents

アルカリ現像性感光性樹脂組成物及びβ－ジケトン化合物 Download PDF

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Publication number
WO2009017064A1
WO2009017064A1 PCT/JP2008/063423 JP2008063423W WO2009017064A1 WO 2009017064 A1 WO2009017064 A1 WO 2009017064A1 JP 2008063423 W JP2008063423 W JP 2008063423W WO 2009017064 A1 WO2009017064 A1 WO 2009017064A1
Authority
WO
WIPO (PCT)
Prior art keywords
compound
alkali
resin composition
photosensitive resin
group
Prior art date
Application number
PCT/JP2008/063423
Other languages
English (en)
French (fr)
Inventor
Takashi Yamada
Naomi Sato
Koichi Kimijima
Original Assignee
Adeka Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2007201355A external-priority patent/JP4726868B2/ja
Priority claimed from JP2008054688A external-priority patent/JP5550814B2/ja
Priority claimed from JP2008089070A external-priority patent/JP5065123B2/ja
Application filed by Adeka Corporation filed Critical Adeka Corporation
Priority to EP08791667A priority Critical patent/EP2175320B1/en
Priority to US12/596,098 priority patent/US8338081B2/en
Priority to CN2008800121371A priority patent/CN101657759B/zh
Publication of WO2009017064A1 publication Critical patent/WO2009017064A1/ja

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/04—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters
    • C08F299/0407—Processes of polymerisation
    • C08F299/0421—Polymerisation initiated by wave energy or particle radiation
    • C08F299/0428—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F299/0435—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/04—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters
    • C08F299/0485—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters from polyesters with side or terminal unsaturations
    • C08F299/0492—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters from polyesters with side or terminal unsaturations the unsaturation being in acrylic or methacrylic groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C08G59/1438—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing oxygen
    • C08G59/1455—Monocarboxylic acids, anhydrides, halides, or low-molecular-weight esters thereof
    • C08G59/1461—Unsaturated monoacids
    • C08G59/1466—Acrylic or methacrylic acids

Abstract

　アルカリ現像性感光性樹脂組成物は、２個以上の（メタ）アクリロイル基及び水酸基を有する化合物（Ａ）の、（メタ）アクリロイル基に、β－ジケトン部位を有する化合物又はβ－ケトエステル基を有する化合物（Ｂ）を付加させて得られる反応生成物の水酸基と、多塩基酸無水物（Ｃ）とのエステル化反応により得られる構造を有する光重合性不飽和化合物（Ｊ）を含有する。上記β－ジケトン部位を有する化合物としては新規化合物である下記一般式（Ｉ）で表されるβ－ジケトン化合物が好ましく用いられる。（式中、Ｒ１は、炭素原子数１～２０のアルキル基であり、Ｒ２は、Ｒ１１、ＯＲ１１、ＣＯＲ１１、ＳＲ１１、ＣＯＮＲ１２Ｒ１３又はＣＮを表し、Ｒ１１、Ｒ１２及びＲ１３は、それぞれ独立に、水素原子、炭素原子数１～２０のアルキル基等を表し、ａは０～３の整数を表し、ｂは０～４の整数を表す。）
PCT/JP2008/063423 2007-08-01 2008-07-25 アルカリ現像性感光性樹脂組成物及びβ－ジケトン化合物 WO2009017064A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP08791667A EP2175320B1 (en) 2007-08-01 2008-07-25 Alkali-developable photosensitive resin composition
US12/596,098 US8338081B2 (en) 2007-08-01 2008-07-25 Alkali-developable photosensitive resin composition and β-diketone compound
CN2008800121371A CN101657759B (zh) 2007-08-01 2008-07-25 碱显影性感光性树脂组合物和β-二酮化合物

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2007-201355 2007-08-01
JP2007201355A JP4726868B2 (ja) 2007-08-01 2007-08-01 アルカリ現像性感光性樹脂組成物
JP2008-054688 2008-03-05
JP2008054688A JP5550814B2 (ja) 2008-03-05 2008-03-05 カルバゾリル基を有するβ−ジケトン化合物及び該化合物を用いた光重合開始剤
JP2008-089070 2008-03-31
JP2008089070A JP5065123B2 (ja) 2008-03-31 2008-03-31 アルカリ現像性感光性樹脂組成物

Publications (1)

Publication Number Publication Date
WO2009017064A1 true WO2009017064A1 (ja) 2009-02-05

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Application Number Title Priority Date Filing Date
PCT/JP2008/063423 WO2009017064A1 (ja) 2007-08-01 2008-07-25 アルカリ現像性感光性樹脂組成物及びβ－ジケトン化合物

Country Status (5)

Country Link
US (1) US8338081B2 (ja)
EP (1) EP2175320B1 (ja)
KR (1) KR20100028020A (ja)
TW (1) TWI420242B (ja)
WO (1) WO2009017064A1 (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012111400A1 (ja) * 2011-02-18 2012-08-23 株式会社Adeka 着色感光性組成物
JP6620743B2 (ja) * 2014-07-04 2019-12-18 三菱ケミカル株式会社 樹脂、感光性樹脂組成物、硬化物、カラーフィルタ及び画像表示装置
JP6699493B2 (ja) * 2016-10-03 2020-05-27 住友電気工業株式会社 光ファイバ心線
JP2019124847A (ja) * 2018-01-17 2019-07-25 東芝メモリ株式会社 パターン形成材料およびパターン形成方法

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Title
See also references of EP2175320A4

Also Published As

Publication number Publication date
KR20100028020A (ko) 2010-03-11
EP2175320A1 (en) 2010-04-14
TW200921274A (en) 2009-05-16
US20100129753A1 (en) 2010-05-27
EP2175320A4 (en) 2012-01-04
US8338081B2 (en) 2012-12-25
TWI420242B (zh) 2013-12-21
EP2175320B1 (en) 2013-03-13

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