WO2008102785A1 - 無定形微粒子粉末、その製造方法およびそれを用いたペロブスカイト型チタン酸バリウム粉末 - Google Patents

無定形微粒子粉末、その製造方法およびそれを用いたペロブスカイト型チタン酸バリウム粉末 Download PDF

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WO2008102785A1
WO2008102785A1 PCT/JP2008/052783 JP2008052783W WO2008102785A1 WO 2008102785 A1 WO2008102785 A1 WO 2008102785A1 JP 2008052783 W JP2008052783 W JP 2008052783W WO 2008102785 A1 WO2008102785 A1 WO 2008102785A1
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sup
particle powder
fine
production
perovskite
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WO2008102785A9 (ja
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Junya Fukazawa
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Nippon Chemical Industrial Co Ltd
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Nippon Chemical Industrial Co Ltd
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Priority to JP2009500200A priority Critical patent/JP5270528B2/ja
Priority to CN2008800056813A priority patent/CN101675005B/zh
Priority to US12/527,936 priority patent/US20100092375A1/en
Priority to DE112008000453T priority patent/DE112008000453T5/de
Publication of WO2008102785A1 publication Critical patent/WO2008102785A1/ja
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Abstract

炭酸バリウム等の副生物の残存もなく、安定した品質の微細なペロブスカイト型チタン酸バリウム粉末を得ることができる無定形微粒子粉末及びその製造方法を提供する。 チタン、バリウム、乳酸および蓚酸を含む微粒子粉末であって、平均粒径が３μｍ以下で、ＢＥＴ比表面積が６ｍ2／ｇ以上であり、Ｂａ原子とＴｉ原子のモル比（Ｂａ／Ｔｉ）が０．９８～１．０２であり、かつＸ線回折において非晶質で、１１２０～１１４０ｃｍ-1及び１０４０～１０６０ｃｍ-1にそれぞれ赤外線吸収スペクトルのピークを有する無定形微粒子粉末。チタン成分、バリウム成分及び乳酸成分を含む溶液（Ａ液）と、蓚酸成分を含む溶液（Ｂ液）とをアルコールを含む溶媒中で接触させる無定形微粒子粉末の製造方法。
PCT/JP2008/052783 2007-02-20 2008-02-19 無定形微粒子粉末、その製造方法およびそれを用いたペロブスカイト型チタン酸バリウム粉末 Ceased WO2008102785A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2009500200A JP5270528B2 (ja) 2007-02-20 2008-02-19 無定形微粒子粉末、その製造方法およびそれを用いたペロブスカイト型チタン酸バリウム粉末
CN2008800056813A CN101675005B (zh) 2007-02-20 2008-02-19 无定形微粒粉末、其制造方法和使用其的钙钛矿型钛酸钡粉末
US12/527,936 US20100092375A1 (en) 2007-02-20 2008-02-19 Amorphous fine-particle powder, method for producing the same and perovskite-type barium titanate powder produced by using the same
DE112008000453T DE112008000453T5 (de) 2007-02-20 2008-02-19 Pulver aus amorphen feinen Partikeln, Verfahren zu seiner Herstellung und Bariumtitanat-Pulver des Perowskittyps, das unter seiner Verwendung hergestellt wird

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Application Number Priority Date Filing Date Title
JP2007040018 2007-02-20
JP2007-040018 2007-02-20

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WO2008102785A1 true WO2008102785A1 (ja) 2008-08-28
WO2008102785A9 WO2008102785A9 (ja) 2009-09-17

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US (1) US20100092375A1 (ja)
JP (1) JP5270528B2 (ja)
KR (1) KR20090115732A (ja)
CN (1) CN101675005B (ja)
DE (1) DE112008000453T5 (ja)
TW (1) TW200838805A (ja)
WO (1) WO2008102785A1 (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012155346A (ja) * 2012-05-11 2012-08-16 Tokyo Univ Of Science 多結晶チタン酸バリウム粒子の製造方法
JP2017071518A (ja) * 2015-10-05 2017-04-13 株式会社ノリタケカンパニーリミテド チタン酸バリウム微粒子とその分散体
JPWO2017217235A1 (ja) * 2016-06-14 2019-04-11 デンカ株式会社 高純度チタン酸バリウム系粉末及びその製造方法、並びに樹脂組成物及び指紋センサ
JP2021042105A (ja) * 2019-09-12 2021-03-18 日揮触媒化成株式会社 チタン酸アルカリ土類金属の組成物とその製造方法、及び、これを含むペースト
JP2023104221A (ja) * 2022-01-17 2023-07-28 日本電気硝子株式会社 チタン酸バリウム前駆体分散液及びその製造方法
WO2025115895A1 (ja) * 2023-12-01 2025-06-05 堺化学工業株式会社 チタン酸バリウム粒子およびその製造方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101679494B1 (ko) * 2012-03-30 2016-11-24 캐논 가부시끼가이샤 압전 세라믹, 압전 세라믹의 제조 방법, 압전 소자 및 전자 디바이스
WO2018163234A1 (ja) * 2017-03-06 2018-09-13 日本碍子株式会社 セキュリティインク顔料、セキュリティインク、印刷物およびセキュリティインク顔料を生産する方法
JP6573653B2 (ja) * 2017-12-07 2019-09-11 日本化学工業株式会社 ペロブスカイト型チタン酸バリウム粉末の製造方法
JP2021034631A (ja) * 2019-08-28 2021-03-01 株式会社村田製作所 積層型電子部品および積層型電子部品の製造方法
KR20230068725A (ko) * 2021-11-11 2023-05-18 삼성전기주식회사 커패시터 부품
WO2025254768A2 (en) * 2024-06-05 2025-12-11 Heraeus Covantics North America Llc Process for producing a sintered layered body by controlling the chlorine content of a powder employed

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JPH01294527A (ja) * 1988-05-20 1989-11-28 Mitsubishi Petrochem Co Ltd Ａｂｏ↓３型ペロブスカイト型金属酸化物の製造方法
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JPH0259426A (ja) * 1988-08-26 1990-02-28 Toho Titanium Co Ltd 結晶性チタン酸バリウム超微粒子の製造方法
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