WO2007029589A1 - 錫および錫合金の水系酸化防止剤 - Google Patents
錫および錫合金の水系酸化防止剤 Download PDFInfo
- Publication number
- WO2007029589A1 WO2007029589A1 PCT/JP2006/317199 JP2006317199W WO2007029589A1 WO 2007029589 A1 WO2007029589 A1 WO 2007029589A1 JP 2006317199 W JP2006317199 W JP 2006317199W WO 2007029589 A1 WO2007029589 A1 WO 2007029589A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- tin
- antioxidant
- solder
- molecule
- alkyl group
- Prior art date
Links
- 239000003963 antioxidant agent Substances 0.000 title claims abstract description 51
- 230000003078 antioxidant effect Effects 0.000 title claims abstract description 39
- 229910001128 Sn alloy Inorganic materials 0.000 title claims abstract description 38
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 title claims abstract description 31
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 31
- 150000001875 compounds Chemical class 0.000 claims abstract description 29
- 150000003839 salts Chemical class 0.000 claims abstract description 17
- 239000004094 surface-active agent Substances 0.000 claims abstract description 11
- 229910000679 solder Inorganic materials 0.000 claims description 51
- -1 alkali metal salt Chemical class 0.000 claims description 50
- 239000002253 acid Substances 0.000 claims description 26
- 125000004432 carbon atom Chemical group C* 0.000 claims description 26
- ABLZXFCXXLZCGV-UHFFFAOYSA-N phosphonic acid group Chemical group P(O)(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims description 20
- 238000007747 plating Methods 0.000 claims description 14
- 239000000126 substance Substances 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 11
- 239000000843 powder Substances 0.000 claims description 11
- 150000002148 esters Chemical class 0.000 claims description 9
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 9
- 238000004381 surface treatment Methods 0.000 claims description 9
- 239000011260 aqueous acid Substances 0.000 claims description 5
- 229910052783 alkali metal Inorganic materials 0.000 claims description 4
- 239000004020 conductor Substances 0.000 claims description 4
- 125000003277 amino group Chemical group 0.000 claims description 3
- 150000003863 ammonium salts Chemical class 0.000 claims description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 2
- 239000003112 inhibitor Substances 0.000 claims description 2
- 229910052698 phosphorus Inorganic materials 0.000 claims 1
- 239000011574 phosphorus Substances 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 abstract description 5
- 150000003014 phosphoric acid esters Chemical class 0.000 abstract description 2
- 230000001050 lubricating effect Effects 0.000 abstract 1
- 229910052718 tin Inorganic materials 0.000 description 23
- 229910019142 PO4 Inorganic materials 0.000 description 20
- 239000010452 phosphate Substances 0.000 description 20
- 230000000052 comparative effect Effects 0.000 description 19
- 239000000758 substrate Substances 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 238000007254 oxidation reaction Methods 0.000 description 12
- 238000012360 testing method Methods 0.000 description 12
- 230000003647 oxidation Effects 0.000 description 11
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 10
- 229910045601 alloy Inorganic materials 0.000 description 10
- 239000000956 alloy Substances 0.000 description 10
- LQZZUXJYWNFBMV-UHFFFAOYSA-N dodecan-1-ol Chemical compound CCCCCCCCCCCCO LQZZUXJYWNFBMV-UHFFFAOYSA-N 0.000 description 9
- 229910020994 Sn-Zn Inorganic materials 0.000 description 8
- 229910009069 Sn—Zn Inorganic materials 0.000 description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- PHNWGDTYCJFUGZ-UHFFFAOYSA-L hexyl phosphate Chemical compound CCCCCCOP([O-])([O-])=O PHNWGDTYCJFUGZ-UHFFFAOYSA-L 0.000 description 7
- 238000007654 immersion Methods 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 238000005406 washing Methods 0.000 description 7
- 239000010949 copper Substances 0.000 description 6
- 230000003064 anti-oxidating effect Effects 0.000 description 5
- 238000005461 lubrication Methods 0.000 description 5
- 230000003068 static effect Effects 0.000 description 5
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 4
- 239000012190 activator Substances 0.000 description 4
- 239000004480 active ingredient Substances 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 230000006355 external stress Effects 0.000 description 4
- 230000004907 flux Effects 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000005476 soldering Methods 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910020816 Sn Pb Inorganic materials 0.000 description 3
- 229910020922 Sn-Pb Inorganic materials 0.000 description 3
- 229910008783 Sn—Pb Inorganic materials 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 239000003093 cationic surfactant Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 239000002736 nonionic surfactant Substances 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 229920002503 polyoxyethylene-polyoxypropylene Polymers 0.000 description 3
- 238000002791 soaking Methods 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 239000012756 surface treatment agent Substances 0.000 description 3
- 239000013008 thixotropic agent Substances 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910020836 Sn-Ag Inorganic materials 0.000 description 2
- 229910020830 Sn-Bi Inorganic materials 0.000 description 2
- 229910020988 Sn—Ag Inorganic materials 0.000 description 2
- 229910018728 Sn—Bi Inorganic materials 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000002280 amphoteric surfactant Substances 0.000 description 2
- 239000003125 aqueous solvent Substances 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- 230000005496 eutectics Effects 0.000 description 2
- 238000005304 joining Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 230000035882 stress Effects 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- LJKDOMVGKKPJBH-UHFFFAOYSA-N 2-ethylhexyl dihydrogen phosphate Chemical compound CCCCC(CC)COP(O)(O)=O LJKDOMVGKKPJBH-UHFFFAOYSA-N 0.000 description 1
- DYBIGIADVHIODH-UHFFFAOYSA-N 2-nonylphenol;oxirane Chemical compound C1CO1.CCCCCCCCCC1=CC=CC=C1O DYBIGIADVHIODH-UHFFFAOYSA-N 0.000 description 1
- OZFLRNPZLCUVFP-UHFFFAOYSA-N 8-methylnonyl dihydrogen phosphate Chemical compound CC(C)CCCCCCCOP(O)(O)=O OZFLRNPZLCUVFP-UHFFFAOYSA-N 0.000 description 1
- KWIUHFFTVRNATP-UHFFFAOYSA-N Betaine Natural products C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- DBVJJBKOTRCVKF-UHFFFAOYSA-N Etidronic acid Chemical compound OP(=O)(O)C(O)(C)P(O)(O)=O DBVJJBKOTRCVKF-UHFFFAOYSA-N 0.000 description 1
- KWIUHFFTVRNATP-UHFFFAOYSA-O N,N,N-trimethylglycinium Chemical compound C[N+](C)(C)CC(O)=O KWIUHFFTVRNATP-UHFFFAOYSA-O 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 1
- ULUAUXLGCMPNKK-UHFFFAOYSA-N Sulfobutanedioic acid Chemical compound OC(=O)CC(C(O)=O)S(O)(=O)=O ULUAUXLGCMPNKK-UHFFFAOYSA-N 0.000 description 1
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical class CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 1
- MEESPVWIOBCLJW-KTKRTIGZSA-N [(z)-octadec-9-enyl] dihydrogen phosphate Chemical compound CCCCCCCC\C=C/CCCCCCCCOP(O)(O)=O MEESPVWIOBCLJW-KTKRTIGZSA-N 0.000 description 1
- 238000003916 acid precipitation Methods 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 229960003237 betaine Drugs 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 239000003673 groundwater Substances 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 239000002563 ionic surfactant Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000003002 pH adjusting agent Substances 0.000 description 1
- 239000006179 pH buffering agent Substances 0.000 description 1
- 230000020477 pH reduction Effects 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- WRKCIHRWQZQBOL-UHFFFAOYSA-N phosphoric Acid Monooctyl Ester Natural products CCCCCCCCOP(O)(O)=O WRKCIHRWQZQBOL-UHFFFAOYSA-N 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 150000008054 sulfonate salts Chemical class 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 230000003685 thermal hair damage Effects 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- 125000004417 unsaturated alkyl group Chemical group 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
- C23G1/04—Cleaning or pickling metallic material with solutions or molten salts with acid solutions using inhibitors
- C23G1/06—Cleaning or pickling metallic material with solutions or molten salts with acid solutions using inhibitors organic inhibitors
- C23G1/066—Cleaning or pickling metallic material with solutions or molten salts with acid solutions using inhibitors organic inhibitors phosphorus-containing compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/10—Metallic powder containing lubricating or binding agents; Metallic powder containing organic material
- B22F1/102—Metallic powder coated with organic material
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M137/00—Lubricating compositions characterised by the additive being an organic non-macromolecular compound containing phosphorus
- C10M137/12—Lubricating compositions characterised by the additive being an organic non-macromolecular compound containing phosphorus having a phosphorus-to-carbon bond
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
- C23F11/167—Phosphorus-containing compounds
- C23F11/1673—Esters of phosphoric or thiophosphoric acids
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F11/00—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent
- C23F11/08—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids
- C23F11/10—Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors
- C23F11/167—Phosphorus-containing compounds
- C23F11/1676—Phosphonic acids
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/3457—Solder materials or compositions; Methods of application thereof
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2223/00—Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions
- C10M2223/06—Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions having phosphorus-to-carbon bonds
- C10M2223/061—Metal salts
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2223/00—Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions
- C10M2223/06—Organic non-macromolecular compounds containing phosphorus as ingredients in lubricant compositions having phosphorus-to-carbon bonds
- C10M2223/063—Ammonium or amine salts
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2010/00—Metal present as such or in compounds
- C10N2010/02—Groups 1 or 11
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2010/00—Metal present as such or in compounds
- C10N2010/08—Groups 4 or 14
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2030/00—Specified physical or chemical properties which is improved by the additive characterising the lubricating composition, e.g. multifunctional additives
- C10N2030/10—Inhibition of oxidation, e.g. anti-oxidants
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
- H05K2203/0786—Using an aqueous solution, e.g. for cleaning or during drilling of holes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/12—Using specific substances
- H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax or thiol
Definitions
- the present invention relates to an aqueous antioxidant for tin and a tin alloy, and a surface treatment method using the same. Furthermore, the present invention relates to an electronic component, a solder ball, a solder powder, a ball grid array using the solder ball, a solder paste using the solder powder, the electronic component processed with the aqueous anti-oxidation agent, It relates to a mounted product using them.
- soldering is a technique for joining objects using a material having a relatively low melting point, and is widely used in joining and assembling electronic devices in the modern industry.
- solder is Sn-Pb alloy, and its eutectic composition (63% Sn-remainder Pb) has a low melting point of 183 ° C, so soldering is 220-230 °. Since it is performed in C, it causes little thermal damage to electronic components and boards.
- the Sn-Pb alloy also has good solderability and solidifies immediately during soldering, and does not easily crack or peel even when vibration is applied to the soldered part. Have it.
- Pure Sn plating is the best lead-free plating in terms of cost and workability. It is considered promising. However, pure Sn plating has a problem that it is easy to generate a whisker due to the internal stress of the surface acid, and the solder wettability deteriorates over time. Is strongly demanded.
- Sn—Zn alloys have melting points close to those of conventional Sn—Pb alloys, Sn—Zn alloys are advantageous in that it is not necessary to change current facilities and processes.
- the plating film is excellent in mechanical strength and cost.
- Zn is an active metal species, the solder wettability of Sn-Zn alloys, which are easily oxidized, is very poor. .
- solder paste is used for surface mounting an electronic component on a substrate, and its usage is increasing in recent years.
- the solder paste is generally composed of a solder alloy powder as a main component and added with a flux containing an adhesive, an activator, a thixotropic agent, a surfactant, a solvent, and the like.
- Sn-Ag (Cu), Sn-Zn, and Sn-Bi alloys are being investigated as lead-free solder pastes. Because it is close to the eutectic temperature of a solder, it is considered as a promising alternative candidate.
- solder paste using Sn-Zn alloy as solder powder causes an acid-oxidation reaction with the activator contained in the flux, resulting in solder wettability and storage stability.
- an inert gas atmosphere is required during reflow.
- Patent Document 1 exemplifies a phosphate ester type surfactant containing ethylene oxide and having an alkylphenol group having 8 to 30 carbon atoms as a lipophilic group.
- Patent Document 2 describes that a phosphate ester containing a saturated or unsaturated alkyl group having 10 to 26 carbon atoms is preferable.
- Patent Document 3 describes a phosphate ester containing a phenyl group or an alkyl group having 5 or less carbon atoms. In this case, the anti-oxidation function during humidification is excellent, but sufficient lubrication performance cannot be obtained. These are described in three patent documents. The phosphoric acid ester compounds listed are less effective in preventing discoloration and acidification during heating.
- Patent Document 1 Japanese Patent Publication No. 5-22322
- Patent Document 2 Japanese Patent Application Laid-Open No. 2004-137574
- Patent Document 3 Japanese Patent No. 3155139
- An object of the present invention is to provide an antioxidant exhibiting excellent solder wettability by treating tin or a tin alloy, which is excellent in antioxidant performance during heating or humidification. It is another object of the present invention to provide an anti-oxidation agent having excellent whisker characteristics and lubricity when an external load is applied.
- the surface treatment agent in the case of a surface treatment agent containing a ⁇ compound having two or more phosphonic acid groups in one molecule and no ester bond in the molecule, the surface treatment agent is heated or calorieated. Excellent anti-humidity performance, wettability and whisker resistance in wet conditions, but insufficient whisker resistance and lubrication in areas where external stress is applied. However, sufficient characteristics were not obtained.
- the present invention is as follows.
- a compound having two or more phosphonic acid groups in one molecule and no ester bond in the molecule, and Z or a salt thereof, and a phosphate ester having an alkyl group having 6 to 10 carbon atoms An aqueous anti-oxidation agent for tin and tin alloys.
- a compound having two or more phosphonic acid groups in one molecule and no ester bond in the molecule, and Z or a salt thereof are represented by the following formula (1), ( ⁇ ) or (III) Or a salt of Z or an alkali metal salt thereof, an ammonium salt, or an aminic compound thereof, and the compound according to any one of (1) to (3) above, Water-based antioxidant for tin and tin alloys.
- x 3 and ⁇ O ⁇ oPH I 3 may be the same or different hydrogen atoms, or
- Table 1 represents a lower alkyl group having 1 to 5 carbon atoms.
- R 2 and R 4 each represent the following group (A), which may be the same or different, R 3 represents the following group (A), or a lower alkyl group having 1 to 5 carbon atoms, n is Represents an integer from 1 to 3.
- X represents a hydrogen atom or a lower alkyl group having 1 to 5 carbon atoms
- Y represents a hydrogen atom
- a surface treatment method characterized by treating the surface of tin or a tin alloy with the aqueous acid / soaking agent according to any one of (1) to (4).
- a solder ball or solder powder characterized by using a tin alloy which has been subjected to a surface treatment using the aqueous acid-rich inhibitor according to any one of (1) to (4).
- a compound having two or more phosphonic acid groups in one molecule and no ester bond in the molecule, and Z or a salt thereof, and a phosphate ester having an alkyl group having 6 to 10 carbon atoms By surface-treating tin or a tin alloy with the water-based antioxidant of the present invention containing bismuth, it has excellent anti-oxidation performance during heating and humidification, exhibits good solder wettability, and has excellent whisker characteristics and lubrication when an external load is applied. It becomes tin or a tin alloy which is excellent in properties. Therefore, the water-based antioxidant of the present invention is suitable as an antioxidant for the tin- or tin-alloy-attached portion of the fitting portion between the FPC or FFC and the connector.
- tin alloys are more preferred because they do not contain lead in terms of environmental pollution and other problems.
- Sn alloy that does not contain lead Sn alloy such as solder alloy containing one or more of Zn, Bi, Cu, In, Ag and Sb.
- the composition of the antioxidant of the present invention comprises a phosphoric acid ester having a specific alkyl group and a compound having two or more phosphonic acid groups in one molecule and no ester bond in the molecule.
- This is an aqueous solution. It is difficult to dissolve a compound having two or more phosphonic acid groups in one molecule and not containing an ester bond in the molecule and a phosphate ester having an alkyl group. It is necessary to select the number of carbon atoms in the alkyl group. It was confirmed that the solubility in aqueous solution was low when the alkyl group of the phosphate ester having an alkyl group had 11 or more carbon atoms.
- a compound having two or more phosphonic acid groups in one molecule and no ester bond in the molecule, and Z or a salt thereof may be contained singly or in combination.
- the total content is preferably 0. OlgZL or more. 0. Less than OlgZL, the effect is small.
- there is no upper limit of the content because the properties do not deteriorate even if the content is too high, but the content is more preferably 0.01 to 500 g / L due to cost problems. More preferably, 0.1 to: LOOgZL.
- the force of a compound having two or more phosphonic acid groups in one molecule is more detailed than that of a compound having one phosphonic acid group in one molecule. It turned out to be excellent.
- the number of phosphonic acid groups in one molecule is preferably 2 to 6 because of cost issues.
- ⁇ 3 and ⁇ 3 each represent the same or different and Yogu hydrogen atom, or a lower alkyl group of 1 to 5 carbon atoms.
- R 2 and R 4 each represent the following group (A), which may be the same or different, R 3 represents the following group (A), or a lower alkyl group having 1 to 5 carbon atoms, n is Represents an integer from 1 to 3.
- X represents a hydrogen atom or a lower alkyl group having 1 to 5 carbon atoms
- Y represents a hydrogen atom
- Child a lower alkyl group having 1 to 5 carbon atoms, Yc xll alkyl group, hydroxyl group, or amino group.
- ethylenediaminetetrakismethylenephosphonic acid, diethylenetriamine pentakismethylenephosphonic acid, etc. are particularly preferred as the compound represented by the above general formula (III).
- 1-hydroxyethane 1,1-diphosphonic acid is particularly preferred.
- the alkali metal salt of the above compound is preferably a sodium salt, potassium salt or the like.
- the salt with an amine compound is preferably a triethylamine salt or a triethanolamine salt!
- the phosphate ester having an alkyl group having 6 to 10 carbon atoms may be a mixture of a monoalkyl ester and a dialkyl ester, preferably a monoalkyl ester or a dialkyl ester! /. When it is obtained as a mixture of monoalkyl ester and dialkyl ester in production, it can be used as it is without separation, and in the case of a mixture, it may be a mixture in any proportion.
- the phosphate ester examples include monohexyl phosphate ester, dihexyl phosphate ester, mono 2-ethylhexyl phosphate ester, di-2-ethylhexyl phosphate ester, monooctyl phosphate ester, dioctyl phosphate ester, monoiso Decyl phosphate ester, diisodecyl phosphate ester and the like are preferable.
- the content of the antioxidant is preferably from 0.01 to LOOgZL, more preferably from 0.1 to LOg / L. When the content is less than 0. Olg / L, the film formation is insufficient, and when it exceeds lOOgZL, the stability of the liquid is remarkably lowered.
- the anti-oxidation agent of the present invention comprises a compound having two or more phosphonic acid groups in one molecule and containing no ester bond in the molecule, Z or a salt thereof, and 6 to 10 carbon atoms.
- a phosphate ester having an alkyl group can be used by dissolving in an aqueous solvent.
- aqueous solvent water is preferable in consideration of solubility and cost, but alcohols, glycols, ketones and the like may be contained in addition to water.
- the aqueous antioxidant of the present invention further improves the acid resistance of the surface to be treated by adjusting the pH to 5 or less.
- the pH of the anti-oxidation agent is more preferably ⁇ 1 to 5 in view of the influence on the material and the like.
- As the pH adjuster generally available acids and alkalis can be used.
- the acid resistance of the surface to be treated is further improved. Even if the addition amount of the surfactant is less than 0. OlgZL or exceeds 1OgZL, the effect of improving acid resistance cannot be obtained.
- the addition amount of the surfactant is preferably 0.1 to LOg / L.
- surfactant one or more of commercially available ion-based, cationic, non-ionic, and amphoteric surfactants can be appropriately selected and used.
- cationic surfactant sulfate ester type, sulfonate salt type, phosphate ester salt type, sulfosuccinate type, etc.
- quaternary ammonium salt type Amine salt type isotropic non-ionic surfactants include: products with higher alcohol ethylene oxide, products with higher alcohol propylene oxide, alkylphenol ethylene oxide adducts, polyoxyethylene polyoxypropylene Block polymers 1, ethyleneoxyamine polyoxyethylene polyoxypropylene block polymers, higher aliphatic amine amine oxide adducts, aliphatic amide ethylene oxide carbonates, etc., are amphoteric surfactants such as amino acid type and betaine type. Etc. are preferred.
- one or more of one-on or two-on Is preferably selected and used.
- nonionic surfactants the higher glycol ethylene oxide adducts, higher alcohol propylene oxide adducts, alkyl phenol ethylene oxide adducts, polyoxyethylene polyoxypropylene block polymers are particularly preferred for the polyethylene glycol type. Etc. can be particularly preferably used.
- a sulfate ester salt type and a phosphate ester salt type are particularly preferable.
- the antioxidant of the present invention may contain an additive in an amount within a range that does not impair the original properties for the purpose of imparting desired performance.
- additives include preservatives and pH buffering agents, and conventionally known additives can be used.
- any method that forms a film on the surface of tin or tin alloy may be used.
- tin or tin alloy may be used. Examples include a method of simply immersing in an antioxidant, a method of applying an antioxidant using a shower or a device such as an air coater, blade coater, rod coater, knife coater, gravure coater, reverse coater, cast coater, etc. .
- the temperature of the antioxidant during the surface treatment is preferably 15 to 80 ° C, more preferably 30 to 70 ° C.
- the surface of the conductor of the connection terminal portion of the electronic component is tinned or tin-plated and then surface-treated to provide excellent oxidation resistance, solder wettability, and whisker resistance.
- An electronic component with good lubricity can be obtained.
- the electronic component in the present invention includes a substrate.
- a solder ball using a tin alloy treated with the anti-oxidation agent of the present invention has excellent oxidation resistance and is disposed as a ball grid array as an electrical connection member or in an electronic component. It can be used favorably as a mounted product connected to.
- a tin alloy powder is treated with the antioxidant of the present invention, and a flux containing an adhesive, an activator, a thixotropic agent, a surfactant, a solvent, and the like is added to the solder paste. It can also be used. This solder paste is excellent in oxidation resistance and whisker resistance. Conventionally known pressure-sensitive adhesives, activators, thixotropic agents, surfactants and solvents can be used.
- Comparative Example 2 As a comparative example, as shown in Table 2, six types of aqueous solutions were prepared in the same manner as in the examples (Comparative Examples 1 to 6). Since Comparative Example 7 was not treated with antioxidant, no antioxidant was prepared. Further, as Comparative Example 8, the power obtained by changing the hexyl phosphate of the solution of Example 2 to oleyl phosphate was suspended in brown, and the active ingredient was completely dissolved.
- hexyl phosphate ester, 2-ethylhexyl phosphate ester, isodecyl phosphate ester and butyl phosphate ester are all mixtures of monoalkyl phosphate ester and dialkyl phosphate ester.
- Nitrilotrismethylenephosphonic acid 1 / L 2 Hexyl phosphate: 0.5g / L
- Nonylphenol ethylene oxide 12 mol adduct 1 g / L
- Nitrilotrismethylenephosphonic acid K salt 1 g / s 6 Hexyl phosphate: 0.5 g / L
- Nitrilotrismethylenephosphonic acid 1 g / L 2
- Nitryltrismethylenephosphonic acid K salt 1 g / L 6
- This substrate was tinned with a thickness of about 5 m (plating bath: Tincoat K (manufactured by Nikko Metal Plating Co., Ltd.)), plating conditions: cathode current density 2AZdm 2 , temperature 20 ° C , Liquid flow and force sword rocking).
- This tinned base material (hereinafter referred to as "Sn base material”) was immersed in the above antioxidant for 10 seconds at a bath temperature of 60 ° C, then washed with water and dried to obtain a test substrate. It was.
- test boards were heat-treated in an electric furnace maintained at 220 ° C for 1 hour in the air atmosphere, and then solder wettability (zero cross time) with lead-free solder was measured by the meniscograph method based on the following measurement conditions .
- the evaluation criteria are as follows.
- ⁇ Zero crossing time 1 second or more and less than 3 seconds
- ⁇ Zero crossing time 3 seconds or more and less than 5 seconds
- test boards were PCT-treated (temperature standing at 105 ° C, humidity 100% for 16 hours), and solder wettability (zero cross time) with lead-free solder was measured by meniscograph method. The measurement was performed in the same manner as the term of heat resistance and acidity.
- the evaluation criteria are as follows.
- ⁇ Zero crossing time 1 second or more and less than 3 seconds
- ⁇ Zero crossing time 3 seconds or more and less than 5 seconds
- the substrate was left for 24 hours in a constant temperature and humidity atmosphere at a temperature of 85 ° C and a humidity of 85%. Thereafter, after the substrate was sufficiently dried, the surface was observed with a scanning electron microscope (SEM). As a result, no whisker was generated in any of the examples and comparative examples.
- SEM scanning electron microscope
- the evaluation criteria are as follows.
- the lubricity of the surface of the test substrate was evaluated by the coefficient of static friction.
- Sn-Zn substrate Sn-Zn plated substrate
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CN2006800328749A CN101258268B (zh) | 2005-09-07 | 2006-08-31 | 锡和锡合金的水系抗氧化剂 |
JP2007534363A JP4601670B2 (ja) | 2005-09-07 | 2006-08-31 | 錫および錫合金の水系酸化防止剤 |
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KR (1) | KR100964063B1 (ko) |
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- 2006-08-31 KR KR1020087007170A patent/KR100964063B1/ko active IP Right Grant
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- 2006-09-06 TW TW095132844A patent/TW200712257A/zh unknown
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TWI327605B (ko) | 2010-07-21 |
KR20080049768A (ko) | 2008-06-04 |
JPWO2007029589A1 (ja) | 2009-03-19 |
KR100964063B1 (ko) | 2010-06-16 |
CN101258268B (zh) | 2010-11-10 |
JP4601670B2 (ja) | 2010-12-22 |
CN101258268A (zh) | 2008-09-03 |
TW200712257A (en) | 2007-04-01 |
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