WO2005116103A1 - 光学的立体造形用放射線硬化性液状樹脂組成物及びそれを光硬化させて得られる光造形物 - Google Patents
光学的立体造形用放射線硬化性液状樹脂組成物及びそれを光硬化させて得られる光造形物 Download PDFInfo
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- WO2005116103A1 WO2005116103A1 PCT/JP2005/009645 JP2005009645W WO2005116103A1 WO 2005116103 A1 WO2005116103 A1 WO 2005116103A1 JP 2005009645 W JP2005009645 W JP 2005009645W WO 2005116103 A1 WO2005116103 A1 WO 2005116103A1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/49—Phosphorus-containing compounds
- C08K5/51—Phosphorus bound to oxygen
- C08K5/52—Phosphorus bound to oxygen only
- C08K5/524—Esters of phosphorous acids, e.g. of H3PO3
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Definitions
- the present invention relates to a radiation-curable liquid resin composition for optical three-dimensional modeling and a photolithographic product obtained by photo-curing the composition.
- one layer of the radiation-curable liquid resin composition is supplied onto the cured resin layer, and the liquid surface is selectively irradiated with light, whereby the previously formed cured resin layer is formed.
- a new cured resin layer is integrally laminated on top of this.
- the above process is repeated a predetermined number of times while changing or not changing the pattern to be irradiated with light, whereby a three-dimensional object formed by integrally laminating a plurality of cured resin layers is formed.
- This optical three-dimensional modeling method can easily and easily obtain power even in a complicated three-dimensional object.
- This technology is extremely useful in the prototyping process in the development of new products in the automotive and consumer electronics industries, and is becoming an indispensable means for shortening the development period and reducing costs.
- (A) radical polymerizable organic compounds such as urethane (meth) acrylate, oligoester (meth) acrylate, epoxy (meth) acrylate, thiol and ene conjugate, and photosensitive polyimide.
- a resin composition containing the same see JP-A-1-204915, JP-A-2-208305 and JP-A-3-160013).
- a resin containing a cationically polymerizable organic compound such as an epoxy conjugate, a cyclic ether conjugate, a cyclic ratatone compound, a cyclic acetal conjugate, a cyclic thioether compound, a spiro ortho ester compound, or a butyl ether compound.
- a cationically polymerizable organic compound such as an epoxy conjugate, a cyclic ether conjugate, a cyclic ratatone compound, a cyclic acetal conjugate, a cyclic thioether compound, a spiro ortho ester compound, or a butyl ether compound.
- a resin composition containing a radically polymerizable organic compound and a cationically polymerizable organic compound JP-A-2-28261, JP-A-2-75618, JP-A-6-228413, JP-A-6-228413) 11-310626, JP-A-11-228610, JP-A-11-24939).
- JP-A-8-256062 and JP-A-2003-73457 disclose optical three-dimensional structures.
- An anti-oxidation agent is described as a component that can be added to the radiation-curable liquid resin composition used in the molding method. It has been described.
- An object of the present invention is to provide a radiation-curable liquid resin composition for optical three-dimensional modeling that has a small side surface step, has excellent surface smoothness, and can obtain a high-precision optical molded article. is there.
- the present invention provides the following radiation-curable liquid resin composition for optical three-dimensional molding and an optical molded article.
- Optical stereolithography wherein the content of the component (A) is 0.1 to 10% by mass relative to the total amount of the composition, and the content of the polyether polyol conjugate (F) is 1 to 35% by mass.
- Radiation curable liquid resin composition wherein the content of the component (A) is 0.1 to 10% by mass relative to the total amount of the composition, and the content of the polyether polyol conjugate (F) is 1 to 35% by mass.
- (G) Number average particle size measured by electron microscopy 10 to: The radiation for optical three-dimensional modeling according to 1 or 2 above, which contains 1 to 35% by mass of an elastomer particle having a LOOO nm of the total amount of the composition. Curable liquid resin composition.
- R 1 and R 2 are each independently an optionally branched alkyl group having 1 to 4 carbon atoms, and m and n are each independently 1 or 2. ]
- R 3 and R 4 are each independently an optionally branched alkyl group having 6 to 10 carbon atoms. ]
- R 5 is hydrogen or a methyl group
- R 6 and R 7 are each independently an organic group
- R 6 and R 7 are combined to form a cyclic structure. You may. ]
- An optically molded article obtained by irradiating the radiation curable liquid resin composition for optical three-dimensional molding according to any one of the above items 1 to 4 with light.
- the radiation-curable liquid resin composition for optical three-dimensional modeling of the present invention (hereinafter, referred to as the composition of the present invention) is capable of obtaining a high-precision stereolithographic product having excellent surface smoothness due to small side steps. There is an advantage that can be.
- the radiation-curable liquid resin composition for optical stereolithography of the present invention contains the above components (A) to (F) as essential components.
- the components (A) to (F) and the optional component (G) will be described.
- the component (A) used in the composition of the present invention is a compound having a phenolic hydroxyl group and a Z or phosphite group.
- known antioxidants and the like can be mentioned, and a hindered phenol compound or a phosphorus compound is particularly preferable.
- the curing of the radically polymerizable compound is hindered to a certain extent, and thus, even after irradiation with light, the polymerization of the cationically polymerizable compound and the like gradually progresses. (Delay curability), and the level difference on the side of the modeled product is reduced.
- the component (A) include the following compounds.
- the hindered phenolic compound include pentaerythrityltyl-tetrakis [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate] (ilganox 1010), thiodiethylenebis [3- (3,5 —Di-tert-butyl-4-hydroxyphenyl) propionate (Irganox 1035FF), benzenepropanoic acid—3,5-bis (1,1-dimethylethyl) -4-hydroxy, ethylenebis (oxyethylene) bis [3- (5-tert— Butyl-4-hydroxy-1-m-tolyl) propionate] (ilganox 245), octadecyl-3- (3,5-t-butyl-4-hydroxyphenyl) propionate (ilganox 1076), 3,3,3,3 ", 5,5 ', 5 "hexar t-buty
- Examples of the phosphorus compound include tris (2,4-di-butylbutyl) phosphite (ilgafos 168) and bis [2,4bis (1,1 dimethylethyl) -6-methylphenyl] ethyl ester Acid (ilgafos 38), 6- [3- (3-t-butyl-4-hydroxy-5-methylphenyl) propoxy] -2,4,8,10-tetra-t-butylbenz [d, f] [l, 3 2] —Dioxaphosphuepin (Sumilyzer-1 GP) and the like.
- Irgafos is a registered trademark of Ciba 'Specialty Chemicals Co., Ltd.
- Sumilizer is a registered trademark of Sumitomo Chemical Co., Ltd.
- the hindered phenol-based component (A) include, for example, Irganox 1010, 1035FF, 245, 1076, 1330, 3114, 1520L, 3125 (all of which are Chino Specialty Chemicals Co., Ltd.), Sumilizer BHT, GA-80 (manufactured by Sumitomo Chemical Co., Ltd.), Cya nox 1790 (manufactured by Scitech Co., Ltd.), and the like.
- phosphorus-based (A) components include, for example, Irgafos 168, 12, and 38 (all manufactured by Ciba's Chemicals, Inc., Chemicals, Inc.), ADK STAB 329K, PEP36, PEP-8 ( As mentioned above, Asahi Denka Kogyo Co., Ltd.), Sandstab P-EPQ (manufactured by Clariant), Weston 618, 619G, Ultranox 626 (above, manufactured by General Electric), Sumilizer GP (manufactured by Sumitomo Chemical) and the like can be mentioned.
- IT and R 2 are each independently an optionally branched alkyl group having 1 to 4 carbon atoms, and m and n are each independently 1 or 2.
- R 3 and R 4 are each independently an optionally branched alkyl group having 6 to 10 carbon atoms.
- R 6 and R 7 are each independently an organic group, and R 6 and R 7 may combine to form a cyclic structure .
- the content of the component (A) in the composition of the present invention is usually 0.1 with respect to the total amount of the composition. To 10% by mass, preferably 0.1 to 5% by mass, and particularly preferably 1.0 to 5.0% by mass.
- the component (B) used in the composition of the present invention is a cationically polymerizable compound, which undergoes a polymerization reaction or a crosslinking reaction when irradiated with light in the presence of a cationic photopolymerization initiator. It is.
- the (B) cationic polymerizable compound is not particularly limited, but a compound having two or more alicyclic epoxy groups in one molecule is preferable. By including a compound having two or more alicyclic epoxy groups in one molecule in a total amount of the component (B) of 50% by mass or more, favorable curing speed and mechanical strength can be maintained.
- (B) the cationically polymerizable compound include bisphenol A diglycidyl ether, bisphenol F diglycidyl ether, bisphenol S diglycidyl ether, brominated bisphenol A diglycidyl ether, and brominated bis.
- Polyglycidyl ethers of polyether polyols diglycidyl esters of aliphatic long-chain dibasic acids; monoglycidyl ethers of higher aliphatic alcohols; phenol, cresol, butylphenol Monoglycidyl ethers of polyether alcohols obtained by adding an enol or alkylene oxide; glycidyl esters of higher fatty acids; epoxidized soybean oil; butyl epoxystearate; octyl epoxystearate; epoxidized flax oil; Examples thereof include polybutadiene.
- the above cationically polymerizable compound can constitute the component (B) alone or in combination of two or more.
- (B) Commercially available cationic polymerizable compounds include UVR-6100, UVR-6105, UVR-6110, UVR-6128, UVR-6200, UVR-6216 (all manufactured by Union Carnoide), Ceroxide 2021, Ceroxide 2021P, Ceroxide 2081, Ceroxide 2083, Ceroxide 2085, Eporide GT—300, Eporide GT—301, Eporide GT—302, Eporide GT—400, Eporide 401, Eporide 403 )), KRM—2100, KRM—2110, KRM—2199, KRM—2400, KR M—2410, KRM—2408, KRM—2490, KRM—2200, KRM—2720, KRM 2750 (more than Asahi Denka Kogyo ( Co., Ltd.), Rapi-cure DVE-3, CHVE, PEPC (hereafter, made by ISP) Epicoat 828, Epicoat 812, Epicoat 1031, Epicoat 872, Epicoat
- the content of the component (B) in the composition of the present invention is more preferably 40 to 75% by mass, more preferably 30 to 80% by mass, which is usually 15 to 85% by mass, based on the total amount of the composition. V, even more preferred.
- the content of the component (B) exceeds 85% by mass, the deformation such as warpage of the stereolithography tends to increase, while when it is less than 15% by mass, the mechanical and thermal characteristics of the stereolithography are sufficient. Tend not to be obtained.
- the component (C) used in the composition of the present invention is a cationic polymerization initiator, and is a compound capable of initiating the cationic polymerization of the component (B) by receiving radiation.
- the radiation means visible light, ultraviolet light, infrared light, electron beam, X-ray, ⁇ -ray, j8-ray, ⁇ -ray and the like.
- (C) the cationic polymerization initiator include a compound represented by the following general formula (4).
- M is a metal or metalloid constituting the central atom of the halide complex [MX], for example, B, p + q
- (C) Commercially available cationic polymerization initiators include UVI-6950, UVI-6970, UVI-6974, UVI-6990 (all manufactured by Union Carbide), Adeka Optomer SP-150, SP — 151, SP—170, SP—172 (all manufactured by Asahi Den-Dani Kogyo Co., Ltd.), Irgacure 261 (all manufactured by Ciba Specialty Chemicals Co., Ltd.), CI-2481, CI 2624, CI 2639, CI 2064 (Manufactured by Nippon Soda Co., Ltd.), CD-1010, CD-1011, CD-1012 (manufactured by Sartoma), DTS-102, DTS-103, NAT-103, NDS-103, TPS-103 , MDS-103, MPI-103, BBI-103 (all manufactured by Midori Kagaku), PCI-061T, PCI-062T, PCI-020 PCI, PCI, PC
- UVI-6970, UVI-6974, Adeka Optoma SP-170, SP-172, CD-1012, MPI-103, and CPI-110A have high photocuring sensitivity to resin compositions containing them. It is particularly preferable because it can be expressed.
- the above-mentioned cationic photopolymerization initiators can constitute the component (C) alone or in combination of two or more.
- the content of the component (C) in the composition of the present invention is usually from 0.1 to 10% by mass, preferably from 0.2 to 5% by mass, and more preferably from 0.1 to 10% by mass relative to the total amount of the composition. 1 to 5% by mass .
- the content of the component (C) is less than 0.1% by mass, the radiation curability of the obtained resin composition is reduced, and a three-dimensional product having sufficient mechanical strength must be formed. I can't do it.
- the content exceeds 10% by mass when the obtained resin composition is subjected to the optical three-dimensional molding method, it is not possible to obtain appropriate light transmittance, and it is difficult to control the curing depth. The modeling accuracy of a three-dimensional object tends to decrease.
- the monofunctional monomer and the polyfunctional monomer may be used alone or in combination of two or more, and ⁇ ⁇ indicates a component (D) which is a combination of at least one monofunctional monomer and at least one polyfunctional monomer. ) Can be configured.
- the component (D) has a trifunctional or higher functionality, ie, a polyfunctional monomer having three or more ethylenically unsaturated bonds in one molecule. It is preferred that they are contained in proportions.
- the content of the trifunctional or higher polyfunctional monomer is more preferably 70% by mass or more, particularly preferably 80% by mass or more, and most preferably 100% by mass. When the content ratio of the trifunctional or higher polyfunctional monomer is 60% by mass or more, the radiation curability of the obtained resin composition is further improved, and the three-dimensional object to be formed is temporally deformed. Tend.
- the monofunctional monomer as the component (D) include acrylamide, (meth) atalyloyl morpholine, 7-amino-3,7-dimethyloctyl (meth) acrylate, isobutoxymethyl (meth) acrylamide, and isovol-loxyshetyl.
- (Meth) acrylate isovol (Meth) acrylate, 2-ethylhexyl (Meth) acrylate, ethyl diethylene glycol (Meth) acrylate, t-octyl (Meth) acrylamide, diacetone (Meth) acrylamide, Dimethylaminoethyl (meth) acrylate, getylaminoethyl (meth) acrylate, lauryl (meth) acrylate, dicyclopentadiene (meth) acrylate, dicyclopente-loxoxetyl (meth) acrylate, dicyclopente- Le (meta) atarilate, N, N—Dimethi Le (meth) acrylamide tetrachloro mouth phenyl (meth) acrylate, 2-tetrachloro mouth phenoxy shetyl (meth) acrylate, tetrahydrofurfuryl (meth) atearylate, t
- the multifunctional monomer of the component (D) include ethylene glycol di (meth) acrylate, dicyclopentenyl di (meth) acrylate, triethylene glycol diatalate, tetraethylene glycol di (meth) acrylate, Tricyclodecanedilmethylene di (meth) acrylate, tris (2-hydroxyethyl) isocyanurate di (meth) acrylate, tris (2-hydroxyethyl) isocyanurate tri (meth) acrylate, Proprotaton modified tris (2-hydroxyethyl) isocyanurate tri (meth) atalylate, trimethylol propane tri (meth) acrylate, ethylene oxide (hereinafter referred to as “EO”) modified trimethylol propane tri (meta) ) Atharylate, propylene oxide (hereinafter referred to as “PO”) Trimethylol propane tri (meth) acrylate, tripropylene glycol di (meth) atalylate
- component (D) Commercially available monofunctional monomers of component (D) include, for example, Aronix M-101, M-102, M-111, M-113, M-117, M-152, TO-1210 (and above, Toagosei Co., Ltd.), KAYARAD TC-110S, R-564, R-128H (Nippon Kayaku Co., Ltd.), Biscoat 192, Biscoat 220, Biscoat 2311HP, Biscoat 2000, Biscoat 2100, Biscoat 2150, VISCOAT 8F, VISCOAT 17F (all manufactured by Osaka Organic Chemical Industry Co., Ltd.) and the like.
- component (D) Commercially available polyfunctional monomers of component (D) include, for example, SA1002 (all manufactured by Mitsubishi Idani Gaku Co., Ltd.), Biscoat 195, Biscoat 230, Biscoat 260, Biscoat 215, and Pisco 310.
- VISCOAT 214HP VISCOAT 295, VISCOAT 300, VISCOAT 360, VISCOAT GPT, VISCOAT 400, VISCOAT 700, VISCOAT 540, VISCOAT 3000, VISCOTE 3700 (all manufactured by Osaka Organic Chemical Industry Co., Ltd.), CALAD R—526, HDDA , NPGDA, TPGDA, MANDA, R—551, R—712, R—604, R—684, PET—30, GPO—303, TMPTA, THE—330, DPHA ⁇ DPHA— 2H ⁇ DPHA— 2C, DPHA— 21 , D—310, D—330, DPCA—20, DPCA—30, DPCA—60, DPCA—120, DN—0075, DN—2475, T—1420, T—2020, T—2040, TPA—320, TPA — 3 30, RP—1040, RP—2040, R—011, R—300, R—205 (Nippon Dani
- New Frontier BPE-4, BR-42M, GX-8345 (all manufactured by Dai-ichi Kogyo Pharmaceutical Co., Ltd.), ASF-400 (all manufactured by Nippon Steel Chemical Co., Ltd.), Lipoxy SP-1506, SP -1507, SP-1509, VR-77, SP-4010, SP-4060 (all manufactured by Showa Polymer Co., Ltd.), NK Ester A-BPE-4 (all manufactured by Shin-Nakamura Chemical Co., Ltd.) ) And the like.
- the content of the component (D) in the composition of the present invention is usually from 0.1 to 25% by mass, and preferably from 0.1 to 15% by mass, based on the total amount of the composition.
- the radiation curability of the resin composition obtained by adding the component (D) is improved, and at the same time, the three-dimensional object to be formed is deformed with time. If the content is more than mass%, there is a disadvantage in that the impact resistance and fracture toughness of the cubic object decrease.
- the component (E) used in the composition of the present invention is a radical polymerization initiator, a compound which is decomposed by receiving radiation such as light, and which initiates a radical polymerization reaction of the component (D) by generated radicals. It is.
- (E) the radical polymerization initiator include, for example, acetophenone, acetophenone benzyl ketal, anthraquinone, 1- (4-isopropylphenyl) 2-hydroxy-12-methylpropane-one, carbazole, xanthone, 4-chloro Mouth benzophenone, 4,4'-diaminobenzophenone, 1,1-dimethoxy deoxybenzoin, 3,3 'dimethyl 4-methoxybenzophenone, thioxanthone compound, 2-methyl-1 [4 (methylthio) phenyl ] — 2-morpholinopropane-1-one, 2-benzyl 2-dimethylamino-1- (4-morpholinophenyl) -butane-1-one, triphenylamine, 2,4,6 trimethylbenzoy Ludiphenylphosphine oxide, bis (2,6 dimethoxy benzoyl) 2,4,4 trimethylpentylphosphin
- radical polymerization initiators can constitute the component (E) alone or in combination of two or more.
- the content of the component (E) in the composition of the present invention is usually from 0.01 to 10% by mass, and preferably from 0.1 to 5% by mass, based on the total amount of the composition.
- the content ratio of the component (E) is less than 0.01% by mass, the radical polymerization reaction rate (curing rate) of the obtained resin composition is low, so that it takes time for molding and the resolution is low. Or tend to decrease.
- the content ratio of the component (E) exceeds 10% by mass, an excessive amount of the polymerization initiator lowers the curing characteristics of the resin composition and adversely affects the moisture resistance and heat resistance of the three-dimensional object. May have an effect.
- the component (F) used in the composition of the present invention is a polyether polyol.
- the radiation curability of the resin composition is improved, and the mechanical properties, particularly the elastic modulus, of the cured product obtained by irradiating the composition of the present invention with light are improved. It is possible to suppress a temporal change in the shape and mechanical properties of the three-dimensional object obtained by the molding.
- the polyether polyol (F) preferably has three or more hydroxyl groups in one molecule, and particularly preferably has three to six hydroxyl groups in one molecule.
- polyether polyol examples include trivalent or higher polyvalent polyols such as trimethylolpropane, glycerin, pentaerythritol, sorbitol, sucrose, and quadrol.
- polyether polyols obtained by modifying norecone with cyclic ethereal conjugates such as ethylene oxide (EO), propylene oxide (PO), butylene oxide, and tetrahydrofuran.
- EO modification ethylene oxide
- PO propylene oxide
- tetrahydrofuran examples include EO modification.
- Trimethylolpropane PO-modified trimethylolpropane, tetrahydrofuran-modified trimethylolpropane, EO-modified glycerin, PO-modified glycerin, tetrahydrofuran-modified glycerin, EO-modified pentaerythritol, PO-modified pentaerythritol, tetrahydrofuran-modified pentaerythritol, EO-modified sorbitol, PO-modified sorbitol , EO-modified sucrose, PO-modified sucrose, EO-modified sucrose, EO-modified quadol, and the like.
- the above-mentioned polyether polyols can constitute the component (F) alone or in combination of two or more.
- F polyether polyols include Sanix TP-400, Sanix GP-600, Sanix GP-1000, Sanix SP-750, Sanix GP-250, and Sanix GP- 400, Sannics GP-600 (manufactured by Sanyo Chemical Co., Ltd.), TM P-3Glycol, PNT-4 Glycol, EDA-P-4, EDA-P-8 (manufactured by Nippon Emulsifier Co., Ltd.), G—300, G—400, G—700, T—400, EDP—450, SP—600, SC-800 (all manufactured by Asahi Deni Dani Kogyo Co., Ltd.), SCP—400, SCP—1000, SP-1600 (all manufactured by Sakamoto Yakuhin Kogyo Co., Ltd.).
- the content of the component (F) in the composition of the present invention is usually 1 to 35% by mass, preferably 1 to 25% by mass, and particularly preferably 3 to 15% by mass based on the total amount of the composition. %.
- the content of the component (F) is less than 1% by mass, the delayed curing property of the resin composition is reduced, and the radiation curing property cannot be sufficiently improved. In some cases, it is not possible to obtain a three-dimensional object having good stability and physical stability.
- the content ratio of the component (F) exceeds 35% by mass, the radiation curability of the obtained resin composition tends to decrease, and the elastic modulus of the three-dimensional object obtained by stereolithography tends to decrease. .
- the component (G) used in the composition of the present invention is an elastomer particle having a number average particle diameter of 10 to: LOOO nm as measured by electron microscopy.
- elastomer particles having a number average particle diameter of 10 to 1000 nm include polybutadiene, polyisoprene, butadiene Z acrylonitrile copolymer, styrene Z butadiene copolymer, and styrene Z isoprene copolymer.
- Ethylene Z propylene copolymer ethylene Z ao olefin copolymer, ethylene Z ao olefin Z polyene copolymer, acrylic rubber, butadiene Z (meth) acrylate copolymer, styrene Z butadiene block copolymer And elastomer particles containing a styrene-Z isoprene block copolymer or the like as a base component.
- elastomer particles which may be core Z-shell type particles, polybutadiene, polyisoprene, styrene Z-butadiene copolymer, styrene Z-isoprene copolymer, butadiene Z (meth) acrylate Elastomer particles obtained by coating a polymer, styrene Z-butadiene block copolymer, styrene Z isoprene block copolymer, etc. with a partially cross-linked core coated with a methyl methacrylate polymer.
- particles coated with a methyl metharylate Z glycidyl meta acrylate copolymer are particularly preferred.
- component (G) commercially available core Z-shell type elastomer particles as described above include, for example, Reginas Bond RKB (manufactured by Reginas Kasei Co., Ltd.), Techno MBS-61, MBS-69 (all above). And Techno Polymer Co., Ltd.).
- the content ratio of the component (G) in the composition of the present invention is usually 1 to 35% by mass, preferably 2 to 20% by mass, and particularly preferably 3 to 15% by mass based on the total amount of the composition. %.
- the content of the component (G) is less than 1% by weight, impact resistance and fracture toughness are reduced.
- the content is more than 35% by weight, the viscosity increases and bubbles may be generated during molding.
- the modeling accuracy of the obtained three-dimensional object tends to decrease.
- the radiation-curable liquid resin composition of the present invention may further contain a photosensitizer (polymerization accelerator), a reactive diluent, and the like.
- a photosensitizer polymerization accelerator
- the photosensitizer include amine compounds such as triethanolamine, methyldiethanolamine, triethylamine, and ethylamine; thioxanthone, thioxanthone derivatives, anthraquinone, anthraquinone derivatives, anthracene, anthracene derivatives, perylene.
- the radiation-curable liquid resin composition for stereolithography of the present invention contains various additives as other optional components within a range that does not impair the object and effects of the present invention. ⁇ ⁇ You can.
- Examples of powerful additives include polyamides, polyamideimides, polyurethanes, polybutadiene, polychloroprene, polyester, styrene-butadiene block copolymer, petroleum resin, xylene resin, ketone resin, cellulose resin, fluorine-based oligomer, Polymers or oligomers such as silicone oligomers and polysulfide oligomers; polymerization inhibitors such as phenothiazine and 2,6-di-t-butyl-4-methylphenol; polymerization initiation assistants; leveling agents; Surfactants; plasticizers; ultraviolet absorbers; silane coupling agents; inorganic fillers; pigments;
- the radiation-curable liquid resin composition of the present invention can be produced by uniformly mixing the above components (A) to (G) and, if necessary, the above optional components.
- the viscosity (25 ° C.) of the radiation-curable liquid resin composition thus obtained is preferably 10 to 20, OOOcps, more preferably 50 to 10, and OOOcps. Preferably, it is 50 cps to 5, OOOcps.
- the composition of the present invention is prepared by charging an appropriate amount of the above-mentioned components (A) to (G) and other additives into a stirring vessel, usually at a temperature of 30 to 70 ° C, preferably 50 to 60 ° C, It can be produced by stirring usually for 1 to 6 hours, preferably for 1 to 2 hours.
- the stereolithography of the present invention is obtained by irradiating the composition of the present invention with light.
- the radiation-curable liquid resin composition of the present invention obtained as described above is suitably used as a radiation-curable liquid resin composition in an optical three-dimensional molding method. That is, the radiation-curable liquid resin composition of the present invention is selectively irradiated with light such as visible light, ultraviolet light, or infrared light to supply the energy required for curing by an optical three-dimensional molding method.
- light such as visible light, ultraviolet light, or infrared light
- Means for selectively irradiating the radiation-curable liquid resin composition with light is not particularly limited. Various means can be adopted. For example, a method of irradiating the composition while scanning convergent light or the like obtained using a laser beam or a lens, a mirror, or the like, using a mask having a light transmitting portion of a predetermined pattern, and passing through this mask Means for irradiating the composition with non-convergent light, a light guide member formed by bundling a number of optical fibers, and irradiating the composition with light through the optical fibers corresponding to a predetermined pattern on the light guide member.
- means for shooting can be employed.
- a mask that electro-optically forms a mask image including a light transmitting area and a light non-transmitting area according to a predetermined pattern according to the same principle as that of the liquid crystal display device is used. You can also.
- a small spot diameter is used as a means for selectively irradiating the composition with light.
- the light irradiation surface (for example, the scanning plane of the convergent light) of the resin thread contained in the container is the liquid surface of the resin composition and the contact surface with the container wall of the light transmitting container. Any of these may be used.
- the liquid surface of the resin composition or the contact surface with the container wall is used as the light irradiation surface, the light can be irradiated directly from outside of the container or through the container wall.
- the light irradiation position (irradiation surface) is continuously changed from the uncured portion to the uncured portion.
- the cured portions are laminated to form a desired three-dimensional shape.
- the irradiation position can be moved by various methods, for example, by moving any one of a light source, a container for storing the resin composition, and a cured portion of the resin composition, and moving the resin to the container. Examples of the method include an additional supply of the composition. A typical example of the above-described optical three-dimensional molding method will be described.
- the supporting stage provided so as to be able to move up and down in a container is caused to lower (settle) the surface level of the resin composition by a very small amount.
- the thin layer (1) is formed by supplying the resin composition thereon. Next, the thin layer (1) is selectively irradiated with light to form a solid cured resin layer (1). Next, a radiation-curable liquid resin composition is supplied on the cured resin layer (1) to form a thin layer (2), and the thin layer (2) is selectively irradiated with light. Thus, a new cured resin layer (2) is formed on the cured resin layer (1) so as to be continuously and integrally laminated thereon. And light illuminated By repeating this process a predetermined number of times with or without changing the pattern to be formed, a three-dimensional object in which a plurality of cured resin layers (n) are physically laminated is formed.
- the three-dimensionally obtained object thus obtained is taken out of the container, and after removing the unreacted resin composition remaining on the surface thereof, washing is performed if necessary.
- the detergent include alcohol-based organic solvents such as alcohols such as isopropyl alcohol and ethyl alcohol; ketone-based organic solvents such as acetone, ethyl acetate, and methyl ethyl ketone; and terpenes.
- Representative aliphatic organic solvents include low-viscosity thermosetting resins and radiation-curable resins. In the case of producing a three-dimensional object having good surface smoothness, it is preferable to wash using the above-mentioned thermosetting resin or radiation-curing resin.
- the post-cured resin not only hardens the resin on the surface but also hardens the unreacted resin composition that may remain inside the three-dimensional object. Even if you prefer to do a post cure.
- the optically formed object of the present invention is high in accuracy and has excellent surface smoothness with few side steps.
- each component was charged into a stirring vessel and stirred at 60 ° C. for 3 hours to prepare liquid resin compositions of Examples 1 to 8 and Comparative Examples 1 to 6.
- the formulation in Table 1 is shown in mass%.
- the laser power on the irradiated surface (liquid surface) is 100 mW, and the scanning speed is such that the curing depth is 0.2 mm for each composition.
- a process for forming a cured resin layer (thickness xomm) by selectively irradiating the radiation-curable resin composition with laser light to form a sample for evaluation was performed.
- the test piece was taken out of the solid creator, and the resin composition adhering to the outer surface was was washed away.
- the test pieces were allowed to stand in a constant temperature and humidity room at a temperature of 23 ° C and a humidity of 50% for 24 hours, and then the measurement was performed. Irregularities (steps) on the side of the object were measured with a laser microscope (OPTIPHOT-POL, manufactured by Nikon Corporation).
- IrganoxlOlO pentaerythrityl-tetrakis [3- (3,5-di-t-butyl 4-hydroxyphenyl) propionate] (manufactured by Ciba Specialty Chemicals Co., Ltd.)
- Irganoxl520L 4,6 bis (octylthiomethyl) o Talesol (manufactured by Chinoku Suzuki Charity Chemicals Co., Ltd.)
- Irganox245 Triethylene glycol-bis [3- (3-t-butyl-5-methyl-4-hydroxyphenyl) propionate] Ciba's Specialty Chemicals Co., Ltd.
- Irgafos38 bis [2,4bis (1,1dimethylethyl) -6-methylphenyl] ethyl ester phosphite (manufactured by Ciba Specialty Chemicals Co., Ltd.)
- CPI-6976 (1) diphenyl (ferthiophene) sulfo-dumhexafluoro antimonate and (2) bis [4 (diphenylsulfo-o) phenyl] sulfide bishexaflu Mixture of ovalantimonate (Acet Corporation)
- composition of the present invention is suitably used for optical three-dimensional modeling.
- composition of the present invention is suitably used for applications that require higher three-dimensional modeling accuracy, particularly improvement in surface smoothness caused by side steps between the respective layers of the modeled product.
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Epoxy Resins (AREA)
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Abstract
Description
Claims
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/596,744 US20070232713A1 (en) | 2004-05-26 | 2005-05-26 | Radiation Curable Liquid Resin Composition for Optical Three-Dimensional Molding and Optical Molded Article Obtained by Photocuring Same |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004-156251 | 2004-05-26 | ||
| JP2004156251A JP4620380B2 (ja) | 2004-05-26 | 2004-05-26 | 光学的立体造形用放射線硬化性液状樹脂組成物及びそれを光硬化させて得られる光造形物 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2005116103A1 true WO2005116103A1 (ja) | 2005-12-08 |
Family
ID=35450851
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2005/009645 Ceased WO2005116103A1 (ja) | 2004-05-26 | 2005-05-26 | 光学的立体造形用放射線硬化性液状樹脂組成物及びそれを光硬化させて得られる光造形物 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20070232713A1 (ja) |
| JP (1) | JP4620380B2 (ja) |
| KR (1) | KR20070052705A (ja) |
| CN (1) | CN1957011A (ja) |
| WO (1) | WO2005116103A1 (ja) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008115057A1 (en) * | 2007-03-20 | 2008-09-25 | Dsm Ip Assets B.V. | Stereolithography resin compositions and three-dimensional objects made therefrom |
| US20080292993A1 (en) * | 2006-12-22 | 2008-11-27 | Canon Kabushiki Kaisha | Photo-cationic polymerizable epoxy resin composition, liquid discharge head, and manufacturing method thereof |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4750381B2 (ja) * | 2004-05-31 | 2011-08-17 | Jsr株式会社 | 光学的立体造形用放射線硬化性液状樹脂組成物及びそれを光硬化させて得られる光造形物 |
| JP4744200B2 (ja) * | 2005-06-20 | 2011-08-10 | シーメット株式会社 | 平滑化した造形端面を有する立体造形物 |
| JP5334389B2 (ja) * | 2007-03-29 | 2013-11-06 | Jsr株式会社 | 光学的立体造形用光硬化性樹脂組成物及び立体造形物 |
| CN101215369B (zh) * | 2008-01-16 | 2010-04-07 | 京东方科技集团股份有限公司 | 光固化树脂、感光树脂组合物及其制备方法 |
| US8501033B2 (en) * | 2009-03-13 | 2013-08-06 | Dsm Ip Assets B.V. | Radiation curable resin composition and rapid three-dimensional imaging process using the same |
| KR102187131B1 (ko) * | 2014-10-15 | 2020-12-04 | 동우 화인켐 주식회사 | 입체 조형용 광경화성 수지 조성물 |
| CN107111225B (zh) | 2014-12-23 | 2021-07-27 | 普利司通美国轮胎运营有限责任公司 | 聚合物产品的增材制造方法 |
| US11097531B2 (en) | 2015-12-17 | 2021-08-24 | Bridgestone Americas Tire Operations, Llc | Additive manufacturing cartridges and processes for producing cured polymeric products by additive manufacturing |
| WO2018051924A1 (ja) * | 2016-09-13 | 2018-03-22 | 株式会社Adeka | 硬化性組成物、その硬化方法、それにより得られる硬化物 |
| JP6865460B2 (ja) * | 2016-09-29 | 2021-04-28 | シーメット株式会社 | 光学的立体造形用樹脂組成物 |
| US11453161B2 (en) | 2016-10-27 | 2022-09-27 | Bridgestone Americas Tire Operations, Llc | Processes for producing cured polymeric products by additive manufacturing |
| CN112470551B (zh) * | 2018-09-26 | 2024-05-14 | 电化株式会社 | 有机电致发光显示元件用密封剂 |
| CN111070672A (zh) * | 2019-11-18 | 2020-04-28 | 深圳光韵达光电科技股份有限公司 | 基于热固化机理的3d打印方法及装置 |
| WO2021131790A1 (ja) * | 2019-12-27 | 2021-07-01 | 三井化学株式会社 | 硬化性組成物および有機el表示装置 |
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| JPH1077331A (ja) * | 1996-09-02 | 1998-03-24 | Japan Synthetic Rubber Co Ltd | 液状硬化性樹脂組成物 |
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| TW482765B (en) * | 1996-08-05 | 2002-04-11 | Sumitomo Chemical Co | Phosphites, process for producing the same and their use |
| JP2001257285A (ja) * | 2000-03-09 | 2001-09-21 | Nippon Steel Chem Co Ltd | 熱紫外線硬化型樹脂層付き銅箔及びこれを用いた半導体装置の製造方法 |
| WO2001095030A2 (en) * | 2000-06-09 | 2001-12-13 | Dsm N.V. | Resin composition and three-dimensional object |
| US20040137368A1 (en) * | 2003-01-13 | 2004-07-15 | 3D Systems, Inc. | Stereolithographic resins containing selected oxetane compounds |
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- 2004-05-26 JP JP2004156251A patent/JP4620380B2/ja not_active Expired - Lifetime
-
2005
- 2005-05-26 CN CNA2005800169428A patent/CN1957011A/zh active Pending
- 2005-05-26 US US11/596,744 patent/US20070232713A1/en not_active Abandoned
- 2005-05-26 KR KR1020067027043A patent/KR20070052705A/ko not_active Withdrawn
- 2005-05-26 WO PCT/JP2005/009645 patent/WO2005116103A1/ja not_active Ceased
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| JPH1077331A (ja) * | 1996-09-02 | 1998-03-24 | Japan Synthetic Rubber Co Ltd | 液状硬化性樹脂組成物 |
| JPH11310626A (ja) * | 1998-02-24 | 1999-11-09 | Jsr Corp | 光硬化性液状樹脂組成物 |
| JP2003073457A (ja) * | 2001-08-31 | 2003-03-12 | Asahi Denka Kogyo Kk | 光学的立体造形用樹脂組成物およびこれを用いた光学的立体造形方法 |
| JP2003238691A (ja) * | 2002-02-15 | 2003-08-27 | Jsr Corp | 光硬化性樹脂組成物 |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080292993A1 (en) * | 2006-12-22 | 2008-11-27 | Canon Kabushiki Kaisha | Photo-cationic polymerizable epoxy resin composition, liquid discharge head, and manufacturing method thereof |
| WO2008115057A1 (en) * | 2007-03-20 | 2008-09-25 | Dsm Ip Assets B.V. | Stereolithography resin compositions and three-dimensional objects made therefrom |
| CN103760752A (zh) * | 2007-03-20 | 2014-04-30 | 帝斯曼知识产权资产管理有限公司 | 立体光刻树脂组合物以及由其制成的三维物品 |
| US8980971B2 (en) | 2007-03-20 | 2015-03-17 | Dsm Ip Assets B.V. | Stereolithography resin compositions and three-dimensional objects made therefrom |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4620380B2 (ja) | 2011-01-26 |
| JP2005336302A (ja) | 2005-12-08 |
| US20070232713A1 (en) | 2007-10-04 |
| CN1957011A (zh) | 2007-05-02 |
| KR20070052705A (ko) | 2007-05-22 |
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