WO2005024390A1 - Procede de fabrication d'une sonde, sonde obtenue, et microscope-sonde a balayage - Google Patents

Procede de fabrication d'une sonde, sonde obtenue, et microscope-sonde a balayage Download PDF

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Publication number
WO2005024390A1
WO2005024390A1 PCT/JP2004/012821 JP2004012821W WO2005024390A1 WO 2005024390 A1 WO2005024390 A1 WO 2005024390A1 JP 2004012821 W JP2004012821 W JP 2004012821W WO 2005024390 A1 WO2005024390 A1 WO 2005024390A1
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WIPO (PCT)
Prior art keywords
probe
nanotube
joining
base
bonding
Prior art date
Application number
PCT/JP2004/012821
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English (en)
Japanese (ja)
Inventor
Takafumi Morimoto
Tooru Shinaki
Yoshiyuki Nagano
Yukio Kenbou
Yuuichi Kunitomo
Takenori Hiroki
Tooru Kurenuma
Hiroaki Yanagimoto
Hiroshi Kuroda
Shigeru Miwa
Ken Murayama
Mitsuo Hayashibara
Kishio Hidaka
Tadashi Fujieda
Original Assignee
Hitachi Kenki Fine Tech Co., Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Kenki Fine Tech Co., Ltd filed Critical Hitachi Kenki Fine Tech Co., Ltd
Priority to EP04772770A priority Critical patent/EP1666866A1/fr
Priority to US10/570,198 priority patent/US7388199B2/en
Priority to JP2005513675A priority patent/JP4427824B2/ja
Publication of WO2005024390A1 publication Critical patent/WO2005024390A1/fr

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q70/00—General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
    • G01Q70/08—Probe characteristics
    • G01Q70/10—Shape or taper
    • G01Q70/12—Nanotube tips

Definitions

  • the present invention relates to a method for manufacturing a probe suitable for stably attaching the nanotube to a base member with sufficient bonding strength in a scanning probe microscope or the like equipped with a probe using a carbon nanotube as a probe,
  • the present invention relates to the probe and the scanning probe microscope.
  • Patent Document 1 a scanning probe microscope or an electron microscope using a nanotube such as a carbon nanotube as a tip of a probe.
  • Nanotubes are used as a probe at the tip of a cantilever in a scanning probe microscope, and as a probe for an electron source in an electron microscope.
  • Patent Document 1 generally discloses a probe for scanning a surface signal of an electronic device and a method of manufacturing the same.
  • the electronic device includes a scanning probe microscope.
  • the probe disclosed in Patent Document 1 is made using various nanotubes such as carbon nanotubes. This aims to realize a probe with high resolution and high rigidity and high bending elasticity.
  • research and examination have been conducted on the tip of the scanning probe microscope in terms of how to sharpen it in order to increase its resolution. In this sense, nanotubes can be an important technology in the future.
  • Patent Document 1 Japanese Patent Application Laid-Open No. 2000-227435 discloses an example of a method for manufacturing a probe using carbon nanotubes. Carbon nanotubes are easy to produce, cheap and suitable for mass production. Patent Document 1 describes a method of manufacturing by arranging carbon nanotubes on a metal plate such as a holder by electrophoresis as an optimum manufacturing method. The carbon nanotubes arranged in the holder are attached to the attachment base end with the holder attached. The attachment base end is, for example, a probe of an atomic force microscope. This mounting work (assembly work) is performed while performing positioning and the like under observation by a scanning electron microscope (SEM).
  • SEM scanning electron microscope
  • a coating film is formed in a region including the base end of the attachment, and the carbon nanotube is attached to the base end.
  • the method of forming a coating film include a method of forming a carbon film by electron beam irradiation based on SEM, a method of forming a coating film by decomposing a reactive coating gas with an electron beam, and examples of CVD and PVD. Proposed.
  • the above-mentioned carbon film formed by electron beam irradiation based on SEM is usually called a “carbon contamination film”.
  • a technique has been proposed in which a carbon nanotube is formed in a middle portion between the carbon nanotube and the mounting base end to make the carbon nanotube thicker and stronger.
  • Patent Document 1 Japanese Patent Application Laid-Open No. 2000-227435
  • An object of the present invention is to increase the bonding strength of the bonding means by attaching the carbon nanotube or the like to the mounting base end portion and bonding the bonding means by a bonding means such as a coating film for bonding. It improves the electrical conductivity of the metal and further improves the bonding performance of the bonding means.
  • an object of the present invention is a method for manufacturing a probe by attaching a carbon nanotube or the like to an attachment base end and joining the probe using a carbon film or the like. It is an object of the present invention to provide a method of manufacturing a probe capable of improving the bonding strength by eliminating the effects of the above-described methods, improving the conductivity of the probe, and coating the entire periphery instead of coating on one side to enhance the bonding performance. . [0007] It is another object of the present invention to provide a probe having high bonding strength and high conductivity, and a scanning probe microscope provided with such a probe.
  • a method of manufacturing a probe, a probe, and a scanning probe microscope according to the present invention are configured as follows to achieve the above object.
  • the method for producing a probe according to the present invention comprises a method of manufacturing a nanotube such as a carbon nanotube, a base for holding the nanotube (an attachment base end), and a joint (a coating film or the like) for joining the nanotube to the base.
  • a method of manufacturing a probe in which the attachment of the nanotube and the base is performed under observation by an observation device, and the contamination film formed by the observation device is removed at the stage before joining by the joint is performed. This is a method in which steps are provided.
  • the contamination film is removed at a stage before the bonding using the bonding portion of the contamination film is performed. This exposes the surface of the nanotube. Therefore, when the nanotube and the base are subsequently bonded, the coating film and the like are directly bonded to the nanotube, eliminating the problem of insufficient strength caused by the contamination film and improving the bonding strength. It is possible to increase. In addition, by appropriately eliminating the contamination film, the conductivity of the probe can be increased.
  • the probe manufacturing method according to the present invention is characterized in that, in the above-described manufacturing method, preferably, the observation device is an electron microscope, and the contamination film is a carbon film.
  • the removal of the carbon film is performed by focused ion beam processing.
  • the removal of the carbon film is performed by heating.
  • a method of manufacturing a probe according to the present invention is a method of manufacturing a probe including a nanotube, a base holding the nanotube, and a bonding part bonding the nanotube to the base. It is characterized by being performed after the nanotube is transferred from the holder to which it has been attached to the base. [0015] In the method of manufacturing a probe according to the present invention, in the above-described manufacturing method, preferably, the bonding by the bonding portion is performed while rotating the nanotube and the base around an axis.
  • a method of manufacturing a probe according to the present invention is characterized in that, in the above-described manufacturing method, preferably, a bonding region formed by the bonding portion is formed near an end of the base.
  • a method for manufacturing a probe according to the present invention is a method for manufacturing a probe comprising a nanotube, a base holding the nanotube, and a bonding part for bonding the nanotube to the base. It is characterized by being performed while rotating the nanotube and the base around the axis. Since a joint is created around the entire joint between the nanotube and the base, the joint strength is higher than when only one side is used.
  • the method for manufacturing a probe according to the present invention is characterized in that, in the above-described manufacturing method, preferably, the bonding by the bonding portion is performed after the nanotube is replaced from the holder to which the nanotube is attached to the base. I do.
  • the bonding portion is a carbon film formed by electron beam irradiation.
  • the joint portion is a film of a substance formed by electron beam irradiation by introducing a reactive gas.
  • the joint portion is a film of a substance formed by focused ion beam irradiation.
  • the scanning probe microscope includes a probe portion provided so that the probe faces the sample, and a physical quantity generated between the probe and the sample when the probe scans the surface of the sample.
  • the measurement unit is configured to measure the surface of the sample by measuring the surface of the sample with a probe while maintaining a constant physical quantity in the measurement unit.
  • the probe includes a nanotube and the nanotube.
  • the contamination film formed by the observation means is removed at a stage before the joining by the joining means, which comprises a base for holding the tube and a joining means for joining the nanotube to the base.
  • the probe is provided so as to face the sample.
  • the probe is made to measure the surface of the sample by scanning the probe, and the probe comprises a nanotube, a base for holding the nanotube, and a joining means for joining the nanotube to the base, and the joining means comprises the entirety of the nanotube and the base. It is a coating film provided on the periphery.
  • the probe portion is a cantilever having the probe at the tip.
  • the probe according to the present invention is used for a scanning probe microscope or an electron microscope, and includes a probe comprising a nanotube, a base for holding the nanotube, and a joining means for joining the nanotube to the base. Prior to the bonding by means, the contamination film formed by the observation means has been removed.
  • the probe according to the present invention is used for a scanning probe microscope or an electron microscope, and includes a probe comprising a nanotube, a base for holding the nanotube, and a joining means for joining the nanotube to the base.
  • the bonding means is a coating film provided on the entire circumference of the nanotube and the base.
  • the probe manufacturing method of the present invention in a method of manufacturing a probe by attaching a nanotube to an installation base end and bonding it with a coating film or the like under observation by SEM or the like, before performing the bonding operation At this stage, the carbon contamination film etc. generated due to SEM etc. was removed and the above-mentioned joining was performed without the influence of the carbon contamination film etc., so that the nanotube and the mounting base end were directly joined. In addition, the strength can be improved and the conductivity can be improved. According to the present invention, when the holder is removed from the nanotube after the mounting operation, the contamination film is broken to expose the surface of the nanotube.
  • the bonding strength can be increased and the conductivity can be increased.
  • this probe can be used as AFM lithography based on its high conductivity.
  • a probe having high bonding strength and conductivity By providing a lobe, the durability of the device can be increased, and the charge can be released S with high conductivity, and the influence of static electricity can be eliminated to increase the measurement accuracy.
  • 11 is a holder (metal plate)
  • 12 is a carbon nanotube
  • 13 is a mounting base end.
  • the carbon nanotubes 12 are produced by, for example, an electrophoresis method and are obtained in a state of being attached to the holder 11.
  • the carbon nanotube 12 is a cylindrical member having a cross-sectional diameter force of Slnm—several tens of nm.
  • the attachment base end 13 is, for example, a probe (probe tip) formed on a cantilever used in an atomic force microscope.
  • the probe that is, the mounting base portion 13 is usually made by using a semiconductor film forming technique or the like.
  • the carbon nanotubes 12 are attached and joined to the distal end of the attachment base end portion 13, whereby the probe is assembled and manufactured.
  • step 1 the carbon nanotubes 12 are attached to the distal end of the base end 13 using the holder 11, the carbon film is formed (the carbon contamination film 14), and the carbon nanotubes 12 are attached to the bonding coating film 15. And the mounting base end 13.
  • step 1 the holder 11 is further separated from the carbon nanotube 12 by applying a force as indicated by an arrow 16. The result is shown in Step 2.
  • step 2 of FIG. 1B the holder 11 is separated from the carbon nanotube 12. At this time, a part of the carbon contamination film 14 is also torn apart and moves away together with the holder 11. As a result, in the right portion of the carbon nanotube 12 shown in FIG. 1B, a portion where the carbon contamination film does not exist is generated, and a portion serving as the surface of the carbon nanotube 12 is exposed.
  • step 3 shown in FIG. 1 (C) the carbon contamination film 14 is peeled off, and a bonding coating film 17 is formed again using the portion of the carbon nanotubes 12 whose surface is exposed.
  • the new bonding coating film 17 is composed of the exposed portion of the carbon nanotubes 12, the remaining carbon contamination film 14, and the first bonding coating film 15. It is attached to cover the film. In this way, the carbon nanotubes 12 are bonded to the mounting base 13 by a new bonding coating film 17 after removing the holder 11 after the mounting operation.
  • the carbon contamination film 14 is removed, and the effect thereof is reduced. It was made to join in a state where it was lost.
  • the carbon nanotube 12 and the mounting base 13 are bonded near the tip of the mounting base 13 or at the protruding portion using a new bonding coating film 17. As described above, direct bonding becomes possible, and improvement in bonding strength and conductivity can be achieved.
  • Steps (A)-(C) 113 are basically the same as those in the first embodiment.
  • 11 is a honoreda
  • 12 is a carbon nanotube
  • 13 is a base end portion
  • 14 is a force-contamination film
  • 15 is a first coating film for bonding
  • 21 is a new bonding film added after bonding. It is a coating film.
  • the region 22 without the coating film is widened due to the relationship between the carbon contamination film 14 and the coating film 15 for bonding. Therefore, when bonding is performed again with the bonding coating film 21 in step 3, the surface area of the bonding coating film 21 is enlarged, and the bonding portion is included in a portion other than the vicinity of the end of the mounting base end portion 13. To form.
  • the area of the exposed portion of the carbon nanotubes 12 can be increased, and the area directly contacting the bonding coating film 21 can be increased.
  • the joining strength can be increased.
  • FIG. 3 the same elements as those described in FIG. 1 or 2 are denoted by the same reference numerals, and description thereof will be omitted.
  • (A) and (C) of FIG. 3 respectively show steps 13 of the method of manufacturing the probe according to the third embodiment.
  • 11 is a holder
  • 12 is a carbon nanotube
  • 13 is a mounting base end
  • 14 is a carbon contamination film
  • 31 is a bonding coat. Film.
  • step 1 the holder 11 having the carbon nanotubes 12 is attached to the attachment base end 13. At this time, the holder 11, the carbon nanotubes 12, and the mounting base end 13 are joined by the carbon contamination film 14.
  • step 2 a part of the carbon contamination film 14 is removed before the coating operation.
  • a method using a focused ion beam (FIB) or a method using heating is adopted for removing the carbon contamination film 14.
  • FIB focused ion beam
  • Step 3 a bonding coating film 31 is formed between the carbon nanotube 12 and the mounting base end 13. Thereafter, the holder 11 is removed at an appropriate timing.
  • a part of the carbon contamination film 14 is removed before the coating operation for forming the bonding coating film 31, and the bonding coating film 31 is directly applied to the carbon nanotubes 12.
  • the contact can be ensured, the influence of the carbon contamination film 14 can be reliably eliminated, and the strength of bonding can be increased by directly expanding the contact area.
  • FIG. 4 the same elements as those described in FIGS. 1 and 2 are denoted by the same reference numerals, and description thereof will be omitted.
  • (A)-(C) of FIG. 4 respectively show steps 13 of the method for manufacturing a probe according to the fourth embodiment.
  • This fourth embodiment is a modification of the second embodiment.
  • 11 is a holder
  • 12 is a carbon nanotube
  • 13 is a mounting base end
  • 14 is a carbon contamination film
  • 15 is a bonding coating film.
  • the state shown in step 1 of FIG. 4 (A) is the same as the state shown in step 1 of FIG. 2 (A).
  • the axis of the carbon nanotube 12 is made to coincide with the rotation axis as shown by an arrow 41.
  • the coating operation for applying the coating film for bonding is performed while rotating the mounting base end portion 13 by rotating. Therefore, as shown in FIG. 4C, the bonding coating film 42 can be applied to the entire circumference of the carbon nanotube 12. More specifically, a bonding coating film 42 is provided over the entire circumference in the circumferential direction of the bonding portion between the carbon nanotube 12 and the base end portion 13 and the peripheral portion including the bonding portion. . Any structure can be used for the rotation drive mechanism.
  • the coating film 42 is a carbon film formed by electron beam irradiation, a film of a desired substance formed by electron beam irradiation by introducing a reactive gas, or FIB. This is a film of a desired substance to be deposited by irradiation.
  • a new bonding coating film can be provided on the entire circumference, so that the contact area between the carbon nanotube and the bonding coating film is increased, the bonding strength is improved, and the conductivity is further improved. Can be improved.
  • the coating film for bonding is a carbon film formed by electron beam irradiation, a film based on a desired substance formed by electron beam irradiation by introducing a reactive gas, or A film or the like based on a desired material deposited by irradiation with a focused ion beam is used.
  • This scanning probe microscope assumes an atomic force microscope (AFM) as a typical example.
  • the lower part of the scanning probe microscope is provided with a sample stage 111.
  • the sample 112 is placed on the sample stage 111.
  • the sample stage 111 is a mechanism for changing the position of the sample 112 in a three-dimensional coordinate system 113 composed of orthogonal X, Y, and Z axes.
  • the sample stage 111 includes an XY stage 114, a Z stage 115, and a sample holder 116.
  • the sample stage 111 is generally configured as a coarse movement mechanism that causes displacement (position change) on the sample side.
  • On the upper surface of the sample holder 116 of the sample stage 111 the sample 112 having a relatively large area and a thin plate shape is placed and held.
  • the sample 112 is, for example, a substrate or a wafer having a surface on which an integrated circuit pattern of a semiconductor device is manufactured.
  • the sample 112 is fixed on a sample holder 116.
  • the sample holder 116 has a sample fixing chuck mechanism.
  • an optical microscope 118 having a drive mechanism 117 is arranged above the sample 112.
  • the optical microscope 118 is supported by a driving mechanism 117.
  • the drive mechanism 117 includes a focus Z-direction movement mechanism 117a for moving the optical microscope 118 in the Z-axis direction, and an XY-direction movement mechanism 117b for moving the optical microscope 118 in the XY axes. Yes.
  • the Z direction moving mechanism 117a moves the optical microscope 118 in the Z axis direction
  • the XY direction moving mechanism 117b connects the unit of the optical microscope 118 and the Z direction moving mechanism 117a to each XY axis. Move in the direction.
  • the XY direction moving mechanism 117b is a force fixed to the frame member.
  • the frame member is not shown.
  • the optical microscope 118 is arranged with its objective lens 118a facing downward, and is arranged at a position facing the surface of the sample 112 from directly above.
  • a camera 119 is attached to the upper end of the optical microscope 118. The camera 119 captures and acquires an image of a specific region on the sample surface captured by the objective lens 118a, and outputs image data.
  • a cantilever 121 having a probe 120 at its tip is arranged in a state of approaching.
  • the cantilever 121 is fixed to the mounting part 122.
  • the attachment section 122 is provided with, for example, an air suction section (not shown), and the air suction section is connected to an air suction apparatus (not shown).
  • the cantilever 121 is fixed and attached by its large area base being sucked by the air suction part of the attachment part 122.
  • the probe described above is used as the probe 120.
  • the probe 120 is formed from the mounting base end 13 and the carbon nanotube 12.
  • the tip of the probe 120 becomes the carbon nanotube 12 at the tip of the probe.
  • the mounting section 122 is mounted on a Z fine movement mechanism 123 that generates a fine movement in the Z direction. Further, the Z fine movement mechanism 123 is attached to the lower surface of the cantilever displacement detecting section 124.
  • the cantilever displacement detector 124 has a configuration in which a laser light source 126 and a photodetector 127 are mounted on a support frame 125 in a predetermined arrangement relationship.
  • the cantilever displacement detector 124 and the cantilever 121 are maintained in a fixed positional relationship, and the laser light 128 emitted from the laser light source 126 is reflected on the back of the cantilever 121 and enters the photodetector 127.
  • the device cantilever displacement detecting section constitutes an optical lever type optical detecting device. When a deformation such as a twist or a radius is generated in the cantilever 121 by the optical lever type optical detection device, the deformation can be detected.
  • the cantilever displacement detector 124 is attached to the XY fine movement mechanism 129.
  • the XY fine movement mechanism 129 causes the cantilever 121 and the probe 120 to move a small distance in each of the XY axes. It is moved by. At this time, the cantilever displacement detecting section 124 is moved at the same time, and the positional relationship between the cantilever 121 and the cantilever displacement detecting section 124 is unchanged.
  • the Z fine movement mechanism 123 and the XY fine movement mechanism 129 are usually constituted by piezoelectric elements.
  • the Z fine movement mechanism 123 and the XY fine movement mechanism 129 cause a displacement of the probe 120 by a minute distance (for example, several tens xm, maximum lOOxm) in each of the X-axis direction, the Y-axis direction, and the Z-axis direction. .
  • the XY fine movement mechanism 129 is attached to the above-mentioned frame member (not shown) to which a unit relating to the optical microscope 118 is attached.
  • the observation field of view by the optical microscope 118 includes the surface of the specific region of the sample 112 and the tip (back surface) of the cantilever 121 including the probe 120.
  • the controller 132 is, for example, a controller for realizing a measurement mechanism by an atomic force microscope (AFM) in principle.
  • the first control device 133 is a control device for drive control of each of a plurality of drive mechanisms and the like, and the second control device 134 is a higher-level control device.
  • the comparator 131 compares the voltage signal Vd output from the photodetector 127 with a preset reference voltage (Vref), and outputs a deviation signal si thereof.
  • the controller 132 generates a control signal s2 so that the deviation signal si becomes 0, and supplies the control signal s2 to the Z fine movement mechanism 123.
  • the Z fine movement mechanism 123 that has received the control signal s2 adjusts the height position of the cantilever 121, and keeps the distance between the probe 120 and the surface of the sample 112 at a constant distance.
  • the control loop from the photodetector 127 to the Z fine movement mechanism 123, when the probe 120 scans the sample surface, while detecting the deformation state of the cantilever 121 by the optical lever type optical detection device This is a feedback servo control loop for maintaining the distance between the sample and the sample 112 at a predetermined constant distance determined based on the reference voltage (Vref).
  • Vref reference voltage
  • the first control device 133 performs control for driving each part of the scanning probe microscope. This device is provided with the following functional units.
  • the position of the optical microscope 118 is changed by a driving mechanism 117 including a focusing Z-direction moving mechanism 117a and an XY-direction moving mechanism 117b.
  • the first control device 133 includes a first drive control unit 141 and a second drive control unit 142 for controlling the respective operations of the Z-direction movement mechanism unit 117a and the XY-direction movement mechanism unit 117b.
  • Images of the sample surface and the cantilever 121 obtained by the optical microscope 118 are captured by the camera 119 and taken out as image data.
  • Image data obtained by the camera 119 of the optical microscope 118 is input to the first control device 133 and processed by the internal image processing unit 143.
  • the control signal s2 output from the controller 132 is the height signal of the probe 120 in the scanning probe microscope (atomic force microscope). Is what it means. Information on the change in the height position of the probe 120 can be obtained from the height signal of the probe 120, that is, the control signal s2.
  • the control signal s2 including the height position information of the probe 120 is supplied to the Z fine movement mechanism 123 for drive control as described above, and is taken into the data processing unit 144 in the control device 133.
  • the scanning of the measurement area on the surface of the sample 112 by the probe 120 on the sample surface is performed by driving the XY fine movement mechanism 129.
  • the drive control of the XY fine movement mechanism 129 is performed by the XY scanning control unit 145 which provides the XY scanning signal s3 to the XY fine movement mechanism 129.
  • the XY stage 114 and the Z stage 115 of the sample stage 111 are driven by an X drive control unit 146 that outputs an X direction drive signal, a Y drive control unit 147 that outputs a Y direction drive signal, and a Z direction drive signal.
  • the output is controlled by the Z drive control unit 148.
  • the first control device 133 stores, as necessary, the set control data, the input optical microscope image data, the data related to the height position of the probe, and the like. ).
  • a second control device 134 which is positioned higher than the first control device 133, is provided.
  • the second control device 134 stores and executes the normal measurement program and sets the normal measurement conditions, and stores and stores the automatic measurement program, and sets and stores the measurement conditions. Performs processing such as storage of measurement data, image processing of measurement results, and display on the display device (monitor) 135.
  • the automatic measurement includes a measurement process in which the probe is inclined with respect to a side wall such as a convex part or a concave part on the sample surface to measure the side wall, and the inclination posture of the probe is measured. There is a program for automatically changing the measurement of the same side wall.
  • the communication device In the setting of measurement conditions, it has the functions of setting basic measurement items such as measurement range and measurement speed, setting of automatic measurement conditions such as setting of tilt angle and measurement conditions for each tilt posture measurement, and setting these conditions to a setting file.
  • the communication device may be configured to have a communication function, and may have a function of communicating with an external device.
  • the second control device 134 has the above-described functions, and thus includes a CPU 151 as a processing device and a storage unit 152.
  • the storage unit 152 stores the above programs, condition data, and the like.
  • the second control device 134 includes an image display control unit 153, a communication unit, and the like.
  • an input device 136 is connected to the second control device 134 via an interface 154.
  • the input device 136 can set and change measurement programs, measurement conditions, data, and the like stored in the storage unit 152. You can do it.
  • the CPU 151 of the second control device 134 provides higher-level control commands and the like to each functional unit of the first control device 133 via the bus 155, and also controls the image processing unit 143, the data processing unit 144, and the like. Provides image data and data relating to the height position of the probe.
  • the tip of the probe 120 of the cantilever 121 is made to face a predetermined region on the surface of the sample 112 such as a semiconductor substrate placed on the sample stage 111.
  • the probe 120 is brought close to the surface of the sample 112 by the Z stage 115 which is a probe approach mechanism, and an atomic force is applied to cause the cantilever 121 to deform radially.
  • the amount of radius due to the radius deformation of the cantilever 121 is detected by the optical lever type optical detection device described above. In this state, the probe surface 120 is moved (XY scan) by moving the probe 120 with respect to the sample surface.
  • the XY movement of the surface of the sample 112 by the probe 120 is caused by moving (finely moving) the side of the probe 120 by the XY fine movement mechanism 129 or by moving (coarse movement) the side of the sample 112 by the XY stage 114. This is performed by creating a relative movement relationship in the XY plane between the sample 112 and the probe 120.
  • the movement on the probe 120 side is performed by giving an XY scanning signal s3 related to the XY fine movement to the XY fine movement mechanism 129 including the cantilever 121.
  • the scanning signal s3 related to the fine XY movement is given from the XY scanning control unit 145 in the first control device 133.
  • the movement on the sample side is performed by giving drive signals from the X drive control unit 146 and the Y drive control unit 147 to the XY stage 114 of the sample stage 11.
  • the XY fine movement mechanism 129 is configured by using a piezoelectric element, and can perform high-precision and high-resolution running movement. Further, the measurement range measured by XY scanning by the XY fine movement mechanism 129 is limited by the stroke of the piezoelectric element, and thus is a range determined by a distance of about 10 Ozm at the maximum. According to the XY scanning by the XY fine movement mechanism 129, the measurement is performed in a narrow range. On the other hand, since the XY stage 114 is usually configured using an electromagnetic motor as a driving unit, the stroke can be increased to several hundred mm. According to the XY scan with the XY stage, the measurement is performed over a wide area.
  • the radius of the cantilever 121 based on the feedback servo control loop (the amount of deformation due to the radius). Is controlled so as to be constant.
  • the radius of the cantilever 121 is controlled so as to always coincide with the target radius (a reference voltage Vref ⁇ is set) as a reference.
  • Vref ⁇ a reference voltage
  • the distance between the probe 120 and the surface of the sample 112 is kept constant. Therefore, for example, the probe 120 moves (scans) while tracing the fine uneven shape (profile) of the surface of the sample 112, and obtains the height signal of the probe to obtain the fine concave / convex shape of the surface of the sample 112. Can be measured.
  • the present invention utilizes a nanotube such as a carbon nanotube as a probe of a scanning probe microscope or the like, and the influence of a carbon contamination film or the like on the bonding of the nanotubes.
  • a nanotube such as a carbon nanotube as a probe of a scanning probe microscope or the like, and the influence of a carbon contamination film or the like on the bonding of the nanotubes.
  • FIG. 1 is a procedure diagram showing a manufacturing method according to a first embodiment of the present invention.
  • FIG. 2 is a procedure diagram showing a manufacturing method according to a second embodiment of the present invention.
  • FIG. 3 is a flowchart showing a manufacturing method according to a third embodiment of the present invention.
  • FIG. 4 is a flowchart showing a manufacturing method according to a fourth embodiment of the present invention.
  • FIG. 5 is a configuration diagram showing a scanning probe microscope according to the present invention.

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  • Carbon And Carbon Compounds (AREA)

Abstract

L'invention concerne un procédé de fabrication d'une sonde par insertion d'un nanotube de carbone à une extrémité d'une base de montage et jonction mutuelle au moyen d'un film de carbone. L'invention concerne un outre la sonde obtenue et un microscope-sonde à balayage. Ce procédé de fabrication permet d'accroître la résistance de la jonction, car du fait que l'effet d'un film de contamination du carbone est éliminé, la conductivité de la sonde peut être augmentée et la capacité de jonction peut être accrue par application du revêtement sur toute la périphérie de la sonde, au lieu d'appliquer le revêtement sur un côté de celle-ci. La sonde fabriquée selon ce procédé comprend le nanotube en carbone (12), la partie d'extrémité (13) de la base de montage maintenant le nanotube en carbone, et un film de revêtement (17) reliant ledit nanotube à la base de montage. Une opération pour la jonction du nanotube à la partie d'extrémité de la base de montage est effectuée par observation au microscope électronique, et le film de contamination du carbone (14) formé par le microscope électronique est retiré avant d'effectuer la jonction au moyen du film de revêtement.
PCT/JP2004/012821 2003-09-03 2004-09-03 Procede de fabrication d'une sonde, sonde obtenue, et microscope-sonde a balayage WO2005024390A1 (fr)

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EP04772770A EP1666866A1 (fr) 2003-09-03 2004-09-03 Procede de fabrication d'une sonde, sonde obtenue, et microscope-sonde a balayage
US10/570,198 US7388199B2 (en) 2003-09-03 2004-09-03 Probe manufacturing method, probe, and scanning probe microscope
JP2005513675A JP4427824B2 (ja) 2003-09-03 2004-09-03 プローブの製造方法、プローブおよび走査型プローブ顕微鏡

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JP2003-311579 2003-09-03

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EP1666866A1 (fr) 2006-06-07
US20060284084A1 (en) 2006-12-21
US7388199B2 (en) 2008-06-17
JPWO2005024390A1 (ja) 2007-11-08

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