WO2004060022A1 - 発光装置及びその作製方法 - Google Patents
発光装置及びその作製方法 Download PDFInfo
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- WO2004060022A1 WO2004060022A1 PCT/JP2003/016539 JP0316539W WO2004060022A1 WO 2004060022 A1 WO2004060022 A1 WO 2004060022A1 JP 0316539 W JP0316539 W JP 0316539W WO 2004060022 A1 WO2004060022 A1 WO 2004060022A1
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- Prior art keywords
- sealant
- light
- substrate
- emitting device
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/846—Passivation; Containers; Encapsulations comprising getter material or desiccants
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
- H05B33/04—Sealing arrangements, e.g. against humidity
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/842—Containers
- H10K50/8426—Peripheral sealing arrangements, e.g. adhesives, sealants
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
- H10K50/8445—Encapsulations multilayered coatings having a repetitive structure, e.g. having multiple organic-inorganic bilayers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
- H10K59/1213—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements the pixel elements being TFTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/87—Passivation; Containers; Encapsulations
- H10K59/871—Self-supporting sealing arrangements
- H10K59/8722—Peripheral sealing arrangements, e.g. adhesives, sealants
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/301—Details of OLEDs
- H10K2102/302—Details of OLEDs of OLED structures
- H10K2102/3023—Direction of light emission
- H10K2102/3026—Top emission
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/301—Details of OLEDs
- H10K2102/302—Details of OLEDs of OLED structures
- H10K2102/3023—Direction of light emission
- H10K2102/3031—Two-side emission, e.g. transparent OLEDs [TOLED]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
- H10K50/856—Arrangements for extracting light from the devices comprising reflective means
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/38—Devices specially adapted for multicolour light emission comprising colour filters or colour changing media [CCM]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/875—Arrangements for extracting light from the devices
- H10K59/878—Arrangements for extracting light from the devices comprising reflective means
Definitions
- the invention disclosed in this specification relates to a light-emitting device having a light-emitting layer containing an organic compound, a method for manufacturing the device, or an electronic device in which the device is mounted as a component.
- the light-emitting device described in this specification includes, for example, EL display. Background art
- the EL element includes a layer containing an organic compound (hereinafter, referred to as an EL layer) from which luminescence generated by application of an electric field (ElectroLuminescenc) is obtained, an anode, and a cathode.
- Luminescence includes light emission when returning from the singlet excited state to the ground state (fluorescence) and light emission when returning from the triplet excited state to the ground state (phosphorescence).
- An EL element has a structure in which an EL layer is sandwiched between a pair of electrodes, and the EL layer usually has a laminated structure.
- a laminated structure called “hole transport layer Z light-emitting layer Z electron transport layer” is given.
- This structure has a very high luminous efficiency, and most light-emitting devices currently under research and development adopt this structure.
- a hole injection layer, a hole transport layer / a light emitting layer, an electron transport layer, or a hole injection layer, a hole transport layer, a Z light emitting layer, an electron transport layer, and an electron injection layer are stacked in this order on the anode.
- the structure to do is good.
- the light emitting layer may be doped with a fluorescent dye or the like.
- these layers may be formed using a low molecular material or a high molecular material.
- EL layer all layers provided between the cathode and the anode are collectively referred to as an EL layer. Therefore, the above-described hole injection layer, hole transport layer, light emitting layer, electron transport layer, and electron injection layer are all included in the EL layer.
- a light-emitting element formed by a cathode, an EL layer, and an anode is called an EL element, and includes a method in which an EL layer is formed between two types of striped electrodes provided so as to be orthogonal to each other (simple method).
- Matrix type or a method in which an EL layer is formed between pixel electrodes connected to a TFT and arranged in a matrix and a counter electrode (active matrix type).
- active matrix type which has a switch for each pixel (or one dot)
- the active matrix type which has a switch for each pixel (or one dot) is considered to be more advantageous because it can be driven at a lower voltage.
- the EL element is extremely susceptible to deterioration, and is easily oxidized or absorbed by the presence of oxygen or water to be deteriorated. Thus, there is a problem that the emission luminance of the EL element is reduced and the life is shortened. Therefore, conventionally, the arrival of oxygen or water to the EL element is prevented by covering the EL element with a counter substrate, sealing dry air inside, and attaching a desiccant.
- the substrate on which the element is formed and the counter substrate are bonded and adhered with a sealant (for example, Patent Document 1).
- the step of bonding the substrate on which the EL element is formed and the counter substrate with a sealant in this manner is called a sealing or sealing step.
- the structure of the EL element is such that the electrode on the substrate is formed as an anode, an organic compound layer is formed on the anode, and the cathode is formed on the organic compound layer.
- Light was extracted from the anode, which is a transparent electrode, to the TFT (hereinafter referred to as the bottom emission structure).
- the electrode on the substrate is formed as an anode, a layer containing an organic compound is formed on the anode, and a transparent layer is formed on the layer containing the organic compound.
- a top emission structure a structure in which a cathode serving as an electrode is formed (hereinafter, referred to as a top emission structure)
- a counter substrate formed of a material that blocks light cannot be used. This is the same for a dual emission structure that simultaneously emits light from the upper surface and the lower surface.
- the top emission structure and the dual emission structure can reduce the number of material layers through which light emitted from the layer containing an organic compound passes, and can suppress stray light between material layers having different refractive indexes.
- the bottom emission structure remove the desiccant to prevent the desiccant from absorbing moisture. Careful handling was required, and it was necessary to work quickly when enclosing.
- disposing a desiccant on the pixel portion hinders display.
- the substrate on which the EL element is formed and the opposing substrate are bonded with a UV-curable or thermosetting sealant, and the EL element is placed in a space sealed by the sealant, the opposing substrate, and the substrate.
- a UV-curable or thermosetting sealant Existing. It is preferable that water and oxygen do not exist in this space and do not enter the space. If water and oxygen exist, there is a problem that the EL element is deteriorated.
- Sealants are also referred to as sealants.
- the UV-curable sealant is more advantageous for mass production because the UV-curable sealant and the thermosetting sealant cure quickly and require a smaller device scale. Therefore, many sealing devices for mass production have only a UV irradiation function as a seal hardening function, but in such a case, a thermosetting sealing agent cannot be used.
- sealants before curing are in contact with each other for a long time, they may be mixed and lose their shape. In addition, since the mixed portion of the mixed sealant does not cure uniformly, the bonding strength may be reduced.
- an object of the present invention disclosed in the present specification is to provide a light emitting device having a structure capable of overcoming the above problems and preventing oxygen or moisture from reaching an EL element, and a method for manufacturing the same. I do.
- only the bottom emission structure In a top emission structure and a dual emission structure, no sealing agent is enclosed, and even if a sealing device having only a UV irradiation function is used, all sealing agents are not damaged by UV irradiation to the EL element.
- Another challenge is to cure and seal the EL element.
- the invention disclosed in this specification includes a first electrode, an organic compound layer in contact with the first electrode, and a second electrode in contact with the organic compound layer, between a pair of substrates at least one of which is translucent.
- a light-emitting device including a pixel portion having a plurality of EL elements each including an electrode, wherein the first sealant surrounds the pixel portion, and the pixel is disposed in an area surrounded by the first sealant.
- a second sealant provided so as to cover the entire surface of the portion, and a structure in which a pair of substrates is fixed with the first sealant and the second sealant.
- a sealant including a gap material (filament, fine particles, etc.) for maintaining a pair of substrates can be used
- a transparent sealant can be used as the first sealant.
- Light emitted from the EL element is emitted through the second sealant and one of the pair of substrates.
- One of the pair of substrates may be a transparent sealing substrate, and the other substrate may be a substrate provided with the EL element, to provide a top emission structure in which these substrates are bonded. Further, the light emitted from the EL element may be emitted through the second sealant and one of the pair of substrates and emitted through the other substrate.
- the first sealant surrounding the pixel portion is formed by a pair of first patterns provided so as to sandwich the pixel portion.
- a second pattern surrounding the pixel portion and the pair of first patterns, and a space between the pair of first patterns is filled with at least a second sealant.
- the pair of first patterns may be, for example, two linear patterns
- the second pattern may be, for example, a square pattern
- the corners of the square pattern may be curved.
- the second sealant is a thermosetting resin, does not include a gap material, and has a light-transmitting property after thermosetting. Also, before bonding the pair of substrates, the vicinity of the midpoint of each of the two sides of the second pattern existing along the pair of the first patterns is slightly separated as shown in FIG. 2 (A). When a pair of substrates are bonded together, they are bonded. When the second pattern has a shape with curved corners, no bubbles are formed at the corners during lamination.
- both ends of the pair of first patterns are not in contact with the second pattern, and there is an opening between both ends of the pair of first patterns and the second pattern.
- These openings are present near the four corners of the pixel portion or the four corners of the second pattern.
- the second sealant is extruded in the direction of the pixel portion, and the pixel portion can be sealed without air bubbles entering the pixel portion.
- the surface of the substrate on the sealing side is smooth and excellent in flatness so that air bubbles are not mixed.
- the second sealant immediately after application has a height higher than the first sealant, when bonding the two substrates together, the second sealant is crushed before the first sealant. It spreads to cover the base. At this time, the presence of the pair of first patterns allows the pixel portion to be reliably filled with the second sealant.
- the first sealant extends after the second sealant has spread over the entire surface of the pixel portion. At this time, near the midpoint of each of the two sides of the second pattern, which exists along the pair of first patterns. Gaps are closed. At this time, the second sealant is completely shielded from the outside air by the first sealant. Therefore, both the first sealing agent and the second sealing agent can prevent water or oxygen from reaching the EL element.
- the first sealant is first cured by UV irradiation, and then the second sealant is cured by heating.
- the second sealant is heated for a long time to cure, but the first sealant is already mixed and does not mix with the second sealant.
- a light-blocking mask or the like is attached to the pixel portion to selectively prevent the pixel portion from being irradiated with UV.
- the substrate surface is pressed vertically in a direction in which the sealant between the substrates is crushed until the sealant is completely cured.
- the invention disclosed in the present specification does not require a long press in the heating step for curing the second sealant after the first sealant is cured. That is, in the encapsulation process, it is usually necessary to keep pressing the substrate until the seal is hardened at the time of bonding the substrates, but in the present invention, after the first sealant is hardened first by UV irradiation, In this case, the gap between the substrates is always kept, and the press is not required. Therefore, the sealing device is only for UV curable sealant. Among them, sealing can be performed with a UV-curable sealing agent and a thermosetting sealing agent.
- the second sealant covering the pixel portion is cured by heating without UV irradiation.
- the pixel portion is not damaged by UV irradiation, which eliminates the problem of a decrease in emission luminance and a shortened life of the EL element. (The invention's effect)
- the pixel portion in the sealing process of the top emission structure and the dual emission structure, even in the sealing device having only the UV irradiation function, the pixel portion can be formed without damaging the EL element by the UV irradiation.
- the covering sealant can be cured. Therefore, a highly reliable light emitting device can be obtained.
- the first sealant around the pixel portion is cured in a short time by UV irradiation before the second sealant, after the first sealant is cured, the first sealant and the second sealant are cured. Even if the sealant has been in contact for a long time, the two do not mix, so they do not lose their shape and the adhesive strength does not decrease. Therefore, a highly reliable light emitting device can be obtained.
- FIG. 1 is a diagram showing the first embodiment.
- FIG. 2 is a diagram showing the first embodiment.
- FIG. 3 is a diagram showing the second embodiment.
- FIG. 4 is a diagram showing the third embodiment.
- FIG. 5 is a diagram illustrating a configuration of an active matrix light emitting device according to a first embodiment.
- FIG. 6 is a diagram illustrating a second embodiment.
- FIG. 7 is a view showing that the light transmittance is improved by the second sealing agent.
- FIG. 8 is a diagram illustrating an example of the electronic device according to the third embodiment.
- FIG. 9 is a diagram illustrating an example of the electronic device according to the third embodiment. BEST MODE FOR CARRYING OUT THE INVENTION
- FIG. 1 is a top view of an active matrix type light emitting device embodying the invention disclosed in this specification.
- 11 is a first substrate
- 12 is a second substrate
- 13 is a pixel portion
- 14 is a drive circuit portion
- 15 is a terminal portion
- 16a and 16b are first portions.
- the sealant, 17a is a second sealant.
- the material of the first substrate 11 is not particularly limited, but it is preferable that the material of the first substrate 11 has the same coefficient of thermal expansion for bonding to the second substrate 12.
- a light-transmitting substrate such as a glass substrate, a quartz substrate, or a plastic substrate is used.
- a top emission type a semiconductor substrate or metal Substrates can also be used.
- the substrate has a light-transmitting property.
- the first substrate 11 is provided with a pixel portion 13 having a plurality of EL elements, a drive circuit portion 14, and a terminal portion 15.
- the first sealants 16a and 16b are arranged so as to surround the pixel portion 13 and the drive circuit portion 14. Further, a part of the first sealant overlaps with the terminal portion 15 (or the wiring extending from the terminal electrode).
- the first sealant includes a gap material for maintaining a distance between the pair of substrates. Since the gap material is included, it is preferable that the first sealant and the element (TFT, etc.) do not overlap so that a short circuit or the like does not occur when any load is applied.
- the first sealant includes a pair of first patterns 16a and second patterns 16b.
- the pair of first patterns 16a is linear and provided inside the second pattern 16b.
- the upper surface shape of the second pattern 16b is rectangular, and surrounds the pixel portion 13 and the pair of first patterns 16a.
- the corners of the second rectangular pattern 16b may be curved.
- two linear patterns are arranged so as to sandwich the pixel portion, and a rectangular pattern having a curved corner is arranged so as to surround the pixel portion.
- the pair of substrates includes a first sealant denoted by 16a and 16b disposed around the pixel portion, and a first sealant. It is fixed with a second sealant 1 a that is in contact with and covers the pixel portion. That is the second sealing agent, t is blocked completely from the outside air by the first sealing agent.
- the second sheet one Le agent, and a light-transmitting material after curing, also contains gap material Therefore, it has higher translucency than the first sealant.
- the second sealant 17a protrudes from the opening 18 between the end of the pair of first patterns and the second pattern.
- FIG. 2A shows an example of a top view of a sealing substrate (second substrate 22) before bonding.
- FIG. 2A illustrates an example in which a light-emitting device having one pixel portion is formed from one substrate.
- first sealant indicated by 26a and 26b is formed on a second substrate 22 using a dispenser
- first sealant is placed between a pair of first patterns 26a of the first sealant.
- a second sealant 27a having a lower viscosity than the sealant is dropped.
- the top view in the dropped state corresponds to FIG. 2 (A).
- the second substrate is bonded to the first substrate having the pixel portion 23 including the EL element.
- the first substrate is further provided with a drive circuit portion 2 and a terminal portion 25 (see the top view immediately after the first substrate and the second substrate are attached to each other). As shown in Fig.
- the viscosity of the first sealant is high, so it spreads only slightly when pasted, but the viscosity of the second sealant is low, so that as shown in Fig. 2 (B), The second sealant spreads quickly in a plane.
- the second sealant is supplied from the opening 28 between the end of the pair of first patterns 26a of the first sealant and the second pattern 26b in the direction of the arrow a in FIG. 2B. To Extruded. This makes it possible to prevent bubbles from being present in the region filled with the second sealant.
- the first sealant indicated by 26a and 26b does not mix immediately when it comes into contact with the second sealant 27b, and the second sealant must be mixed with the second sealant if it does not mix with the second sealant. It has a viscosity that does not change at the formation position depending on the sealant.
- the second sealant 27b protrudes from the opening 28, and the protruding peripheral edge of the second sealant 27b is curved.
- the second sealant 26 b of the first sealant is completely connected in the direction of the arrow in FIG. 2 (B).
- the sealant 27 b is completely shielded from the outside air, so that oxygen and moisture can be blocked. Also, the bonding area of the total increases, so that the bonding strength also increases.
- the first sealing agent or the second sealing agent is formed on the second substrate 22 and then the substrates are attached to each other.
- the first sealant or the second sealant may be formed on one substrate.
- UV irradiation is performed to cure the first sealant.
- the pixel portion is selectively protected from UV irradiation using a light shielding mask or the like.
- a light-shielding mask having a Cr film formed on quartz glass was used.
- the second sealant is cured by heating.
- the heating temperature at this time is set so that the EL element is not damaged. Specifically, the temperature is preferably from 60 ° C. to 100 ° C.
- the heating time is preferably from 1 hour to 3 hours.
- Figure 2 (B) shows the dashed lines.
- In 29 becomes the substrate cutting line.
- a dividing line may be set in parallel along the second pattern 26b of the first sealant formed on the terminal portion 25. According to the procedure described above, the shape of the second sealant 17a shown in FIG. 1A can be obtained.
- FIG. 1 (A) shows an example in which the second sealant 17 a protrudes from the opening 18.
- various shapes can be obtained. It can be.
- Various shapes can be obtained by adjusting the pressing time, speed, pressure, and the like.
- the second sealant 17b does not protrude from the opening, and the peripheral edge of the second sealant just draws an arc to fill the gap between the first sealant. It has a filling shape.
- the periphery of the second sealant 17c may have a shape that is concave from the opening and is curved.
- the one pattern is not limited to a linear shape, and it is sufficient that a pair of patterns is arranged symmetrically with respect to the pixel portion.
- the second pattern of the first sealant is not limited to a square shape. It suffices if there is no break in bonding the substrates.
- the shape of the first sealant may be slightly curved so that the second sealant having a low viscosity is easily spread.
- FIG. 3 shows a part of a cross-sectional structure in a pixel portion of the invention disclosed in this specification.
- 300 is the first substrate, 301 a, 30 lb is the insulating layer, 302 is the first electrode 308 is the first electrode, 309 is the insulator, 310 is the lower layer, 311 is the second electrode, 312 is the transparent protective layer, 313 is the second sealant, 31 4 is a second substrate.
- a TFT 302 (p-channel TFT) provided on the first substrate 300 is an element for controlling a current flowing through the light emitting EL layer 310, and 304 is a drain region (or a source region). is there.
- Reference numeral 306 denotes a drain electrode (or source electrode) connecting the first electrode and the drain region (or source region).
- a wiring 307 such as a power supply line and a source wiring is formed at the same time.
- the first electrode and the drain electrode are formed separately, but they may be the same.
- an insulating layer 301a serving as a base insulating film (here, the lower layer is a nitride insulating film and the upper layer is an oxide insulating film) is formed, and is provided between the gate electrode 305 and the active layer. Is provided with a gate insulating film.
- one pixel is provided with one or more TFTs (n-channel TFT or p-channel TFT).
- a TFT having one channel formation region 303 is shown here, the present invention is not particularly limited to this, and a TFT having a plurality of channels may be used.
- Reference numeral 308 denotes a first electrode, that is, an anode (or a cathode) of the OLED.
- a film containing a gold material or a compound material as a main component or a stacked film thereof may be used in a total thickness of 100 nm to 800 nm.
- a titanium nitride film is used as the first electrode 308.
- an insulator 309 (referred to as a bank, a partition, a barrier, a bank, or the like) covering an end portion (and the wiring 307) of the first electrode 308 is provided.
- an inorganic material silicon oxide, silicon nitride, silicon oxynitride, or the like
- a photosensitive or non-photosensitive organic material polyimide, acrylic, polyamide, polyimide amide, resist, or benzocyclobutene
- a stack of these layers can be used, a photosensitive organic resin covered with a silicon nitride film is used here.
- the insulator when a positive photosensitive acrylic is used as the material of the organic resin, it is preferable that only the upper end of the insulator has a curved surface having a radius of curvature.
- a negative type which becomes insoluble in an etchant by photosensitive light or a posi type which becomes soluble in an etchant by light can be used.
- the layer 310 containing an organic compound is formed by an evaporation method or a coating method.
- a vacuum degree of 5 X 1 0- 2 T orr ( 0. 6 6 5 P a) below preferably is evacuated to 1 0 one 4 ⁇ 1 0- 6 P a deposition
- the deposition is performed in a chamber.
- the organic compound has been vaporized by resistance heating before vapor deposition, and the shutter must be opened during vapor deposition. Scatters in the direction of the substrate.
- the vaporized organic compound is scattered upward and is deposited on the substrate through an opening provided in the mail mask.
- Alq 3 , Al Q 3 partially doped with red light-emitting dye Nile Red, A 1 q 3 > p—Et TAZ, and TPD (aromatic diamine) are sequentially laminated by vapor deposition. Can give a white color.
- a layer containing an organic compound is formed by a coating method using spin coating, it is preferable to perform baking by vacuum heating after coating.
- an aqueous solution of poly (ethylenedioxythiophene) Z poly (styrenesulfonate) (PEDOTZP SS) acting as a hole injection layer is applied to the entire surface, baked, and then the luminescent center dye (1 , 1,4,4-tetraphenyl-1,3-butadiene (TPB), 4-dicyanomethylene-12-methyl-6- (p-dimethylaminostyryl) -14H-pyran (DCM 1), Nile Red, coumarin 6, etc.)
- TPB 1,4,4-tetraphenyl-1,3-butadiene
- DCM 1 4-dicyanomethylene-12-methyl-6- (p-dimethylaminostyryl) -14H-pyran
- a coated polyvinyl carbazole (PVK) solution may be applied to the entire surface and fired.
- PEDOTZP SSS uses water as a solvent and is insoluble in organic solvents. Therefore, there is no need to worry about redissolving when PVK is applied from above. Since PEDOTZP SSS and PVK have different solvents, it is preferable not to use the same film forming chamber.
- the layer 310 containing an organic compound can be made into a single layer, and the 1,3,4-year-old oxadiazole derivative (PBD) can be dispersed in the hole transporting polyvinyl carbazole (PVK). Good. Also 30 1;%? 80 is dispersed as an electron transporting agent, and white light can be obtained by dispersing an appropriate amount of the four dyes (TPB, coumarin 6, DCM1, and Nile Red).
- Reference numeral 311 denotes a second electrode made of a conductive film, that is, a cathode (or an anode) of the OLED.
- Examples of the material of the second electrode 311 include alloys such as Mg Ag, Mg In, Al Li, CaF 2 , and Ca N, or elements belonging to Group 1 or 2 of the periodic table and aluminum.
- a light-transmitting film formed by co-evaporation may be used.
- an aluminum film with a thickness of 1 nm to 10 nm or an aluminum film containing a small amount of Li is used.
- the material in contact with the layer 310 containing an organic compound can be formed of a material other than an oxide, and the reliability of the light emitting device can be improved.
- a light-transmitting layer made of C a F 2 , MgF 2 , or B a F 2 (thickness l nm to 5 nm) is used as a cathode buffer layer. ) May be formed.
- an auxiliary electrode may be provided on the second electrode 311 in a region which is not a light emitting region.
- a resistive heating method by vapor deposition may be used, and the cathode may be selectively formed using a vapor deposition mask.
- Reference numeral 312 denotes a transparent protective layer formed by a vapor deposition method, which protects the second electrode 311 made of a metal thin film. Further, the transparent protective layer 312 is covered with a second sealing agent 313. Since the second electrode 311 is an extremely thin metal film, it is easily oxidized when exposed to oxygen, and may react with a solvent or the like contained in the sealant to deteriorate.
- the second electrode 3 11 made of such a metal thin film is used as a transparent protective layer 3 1 2, for example.
- a transparent protective layer 3 1 2 for example, by covering with C a F 2 , MgF 2 , or B a F 2 , the reaction between the second electrode 311 and components such as a solvent contained in the second sealant 313 is prevented. In addition, it effectively blocks oxygen and moisture without using a desiccant.
- C a F 2 , MgF 2 , and B a F 2 can be formed by a vapor deposition method, and by continuously forming a cathode and a transparent protective layer by a vapor deposition method, contamination of impurities and The electrode surface can be prevented from contacting the outside air.
- the transparent protective layer 312 can be formed under conditions that hardly damage the layer containing an organic compound. Further, C a F 2, MgF 2 or by sandwiching providing a layer having a B a F 2 consisting of light-transmitting, and further protect the second electrode 31 1 and below the second electrode 3 1 1 You may.
- a metal having no oxygen atom (a material having a large work function) such as a titanium nitride film is used as the first electrode, and a metal having no oxygen atom itself (a material having a small work function) is used as the second electrode.
- material for example, an aluminum thin film, further C a F 2, MgF 2 or by covering with B a F 2, anoxia close to zero as possible the region between the first electrode and the second electrode, State can be maintained.
- the second sealant 313 bonds the second substrate 314 and the first substrate 300 by the method described in Embodiment Mode 1.
- a material having a light-transmitting property after curing, and a thermosetting resin may be used as the second sealant 313, a material having a light-transmitting property after curing, and a thermosetting resin may be used.
- a heat-resistant thermosetting epoxy resin having a specific gravity of 1.17 (25 ° C), a viscosity of 900 OmPa ⁇ s, and a tensile shear adhesive strength of ⁇ 2 Tg (glass transition point) 74 is used.
- the overall transmittance can be improved.
- the light transmittance when a second sealant was filled between a pair of glass substrates and the light transmittance when a nitrogen gas was filled between a pair of glass substrates were determined.
- Figure 7 shows a graph in which the former transmittance is represented by a solid line and the latter is represented by a dotted line. As shown by the solid line in FIG. 7, the light transmittance when the second sealant is filled between the pair of glass substrates is 85% or more in the visible light region.
- the vertical axis indicates the light transmittance
- the horizontal axis indicates the light wavelength.
- FIG. 3B shows a simplified laminated structure in the light emitting region. Light emission is emitted in the direction of the arrow shown in FIG.
- the insulating layer 301a and the insulating layer 301b are collectively shown as an insulating layer 301.
- a first electrode 318 made of a transparent conductive film is used as shown in FIG. 3C instead of the first electrode 308 made of a metal layer, light emission is emitted to both the upper surface and the lower surface. can do.
- the transparent conductive film ITO (indium tin oxide alloy), indium oxide zinc oxide alloy ( ⁇ 2 ⁇ 3 —Zn ⁇ ), zinc oxide (ZnO), or the like may be used.
- a transparent conductive film may be formed by a sputtering method using an evening gate in which silicon oxide is mixed with ITO. This embodiment can be freely combined with Embodiment 1.
- Fig. 4 shows an example in which a plurality of pixel sections are formed on one substrate, that is, an example in which multiple substrates are formed. Here, an example in which four panels are formed using one substrate is shown.
- a filler containing filler (diameter 6 / m to 24 m) and having a viscosity of 370 Pa ⁇ s is used.
- the first sealants 32a and 32b have a simple seal pattern, they can be formed by a printing method.
- the second sealing agent 33 having a light-transmitting property after curing is dropped.
- a heat-resistant thermosetting epoxy resin having a specific gravity of 1.17 (25 ° C), a viscosity of 900 OmPas, a tensile shear adhesive strength of 15 NZmm 2 , and a Tg (glass transition point) of 74 is used.
- the first substrate provided with the pixel portion 34 and the second substrate provided with the sealant are bonded to each other.
- the second sealant 33 is spread so as to have a shape as shown in FIG. 1 (A), FIG. 1 (B), or FIG. 1 (C), and the first sealant 32, Fill between 32 b.
- the first sealant 32a, 32b the second sealant 33 can be filled without bubbles.
- UV irradiation is performed to cure the first sealants 32a and 32b.
- the pixel area is selectively protected from UV irradiation using a light shielding plate or the like.
- the second sealant 33 is cured by heating.
- the heating temperature at this time should be such that the EL element is not damaged. Specifically from 60 Preferably between 100 ° C and 100 ° C.
- the heating time is preferably about 1 hour to 3 hours.
- a scribe line 35 indicated by a chain line is formed using a scriber device.
- the scribe line 35 may be formed along the second pattern of the first sealant.
- the bonded first substrate and the second substrate are separated using a breaking force device.
- a breaking force device As shown in FIG. 4E, four panels can be manufactured from the pair of substrates.
- Embodiment 1 can be freely combined with Embodiment 1 or Embodiment 2.
- FIG. 5 shows an example of a light-emitting device including an EL element having a layer containing an organic compound as a light-emitting layer.
- FIG. 5A is a top view illustrating the light-emitting device
- FIG. 5B is a cross-sectional view of FIG. 5A cut along A-A ′.
- 1101 shown by a dotted line is a source signal line driving circuit
- 1102 is a pixel portion
- 1103 is a gate signal line driving circuit.
- 1104 is a sealing substrate
- 1105 is a first sealant
- the inside surrounded by the first sealant 1105 is a transparent second sealant 110
- the second sealant 1107 protrudes at the four upper corners of the pixel region.
- Reference numeral 1108 denotes wiring for transmitting signals input to the source signal line driving circuit 1101 and the gate signal line driving circuit 1103, and is connected to an external input terminal. Receives video signals and clock signals from FPC (Flexible Printed Circuit) 1109. Although only the FPC is shown here, a printed wiring board (PWB) may be attached to the FPC.
- the light-emitting device in this specification includes not only the light-emitting device body but also a state in which an FPC or a PWB is attached.
- a driving circuit and a pixel portion are formed over the substrate 110.
- a source signal line driving circuit 1101 and a pixel portion 1102 are shown as driving circuits.
- the source signal line driver circuit 1101 is a CMOS circuit formed by combining the n-channel TFT 1123 and the p-channel TFT 1124.
- the TFT forming the drive circuit may be formed by a known CMOS circuit, a PMOS circuit, or an NMOS circuit.
- a one-piece driver in which a drive circuit is formed on a substrate is shown. However, this is not always necessary, and the driver can be formed not on the substrate but outside.
- the pixel portion 1102 includes a plurality of TFTs including a switching TFT 111, a current controlling TFT 111, and a first electrode (anode) 113 electrically connected to a drain thereof. It is formed by pixels.
- the first electrode 1 1 1 3 is in direct contact with the TFT drain, so that the lower layer of the first electrode 1 1 1 3 can be in ohmic contact with the silicon drain. It is preferable that the material layer has a large work function on the surface in contact with the layer containing an organic compound.
- the material layer has a large work function on the surface in contact with the layer containing an organic compound.
- the first electrode 111 may be a single layer of a titanium nitride film, or may be a laminate of three or more layers.
- insulators are formed at both ends of the first electrode (anode) 111.
- the insulator 111 may be formed using an organic resin film or an insulating film containing silicon.
- an insulator having a shape shown in FIG. 5 is formed using a positive photosensitive acrylic resin film as the insulator 111.
- the insulator 111 may be covered with a protective film formed of an aluminum nitride film, an aluminum nitride oxide film, or a silicon nitride film.
- This protective film is an insulating film mainly composed of silicon nitride or silicon nitride oxide obtained by a sputtering method (DC method or RF method), or a thin film mainly composed of carbon. If a silicon target is formed in an atmosphere containing nitrogen and argon, a silicon nitride film can be obtained. Further, a silicon nitride target may be used. Further, the protective film may be formed using a film forming apparatus using remote plasma. Further, in order to allow light to pass through the protective film, the thickness of the protective film is preferably as small as possible.
- a layer 115 containing an organic compound is selectively formed by an evaporation method using an evaporation mask or an inkjet method. Further, a second electrode (cathode) 1116 is formed on the layer 1115 containing the organic compound. As a result, an EL element 111 composed of the first electrode (anode) 111, the layer containing the organic compound 111, and the second electrode (cathode) 111 is formed.
- the light emitting element 1 1 18 is an example of white light emission Therefore, a color filter including a colored layer 1 131 and a BM (light-shielding layer) 1 132 (an overcoat layer is not shown here for simplicity) is provided. What is indicated by 1 1 1 7 is a transparent protective layer.
- a full-color display can be obtained without using a color filter.
- the sealing substrate 1104 is bonded with the first sealing agent 1105 and the second sealing agent 1107.
- the first sealant 1105 and the second sealant 1107 are materials that do not transmit moisture and oxygen as much as possible.
- the sealing substrate 1104 is made of a glass substrate, a quartz substrate, FRP (Fiberglass-Reinforced Plastics), P VF (polyvinyl fluoride), Mylar, polyester, acrylic, or the like, in addition to the glass substrate and the quartz substrate.
- a plastic substrate can be used.
- the sealing substrate 1104 may be sealed with a third sealing agent so as to further cover the side surface (exposed surface). It is possible.
- the EL element By enclosing the EL element in the first sealant 1105 and the second sealant 1107 in the manner described above, the EL element can be completely shut off from the outside, and when moisture and oxygen are The substance which promotes the deterioration of the organic compound layer can be prevented from entering. Therefore, a highly reliable light emitting device can be obtained.
- This embodiment can be freely combined with any one of Embodiment Modes 1 to 3.
- FIG. 6A an example different from the cross-sectional structure shown in Embodiment 2 is shown in FIG.
- 700 is the first substrate
- 700a and 701b are insulating layers
- 7002 is an insulator
- 710 is an insulating layer
- 710 is an insulating layer
- 11 is a second electrode
- 712 is a transparent protective layer
- 713 is a second sealant
- 714 is a second substrate.
- a TFT 702 (p-channel TFT) provided on the first substrate 700 is an element for controlling a current flowing through the EL layer 710 that emits light
- 704 is a drain region (or source). Region)
- 705 is a gate electrode.
- one pixel is provided with one or more TFTs (n-channel TFTs or P-channel TFTs).
- TFTs n-channel TFTs or P-channel TFTs.
- a TFT having one channel formation region 703 is shown here, the present invention is not particularly limited thereto, and a TFT having a plurality of channels may be used.
- first electrodes 708 a to 708 c formed of a stack of metal layers are formed, and insulators (banks, After forming 709, etching is performed in a self-aligned manner using the insulator 709 as a mask, and a part of the insulator is etched and a part (central part) of the first electrode is removed.
- a step is formed in the first electrode by thin etching. By this etching, the center of the first electrode is made thin and flat, and the end of the first electrode covered with an insulator is made thick. That is, the first electrode has a shape in which the concave portion is formed. Then, a layer containing an organic compound is formed on the first electrode. 10 and the second electrode 7 11 are formed to complete the EL element.
- the structure shown in Fig. 6 (A) reflects or converges the light emitted in the horizontal direction on the slope formed at the step of the first electrode, and moves in one direction (the direction passing through the second electrode). This is to increase the amount of light emitted.
- the metal layer 708 b on which the slope is formed is preferably made of a material that reflects light, for example, a material containing aluminum, silver, or the like as a main component, and a metal in contact with the layer containing an organic compound 710.
- the layer 708a is preferably an anode material having a large work function or a cathode material having a small work function. Since a wiring 707 such as a power supply line and a source wiring is also formed at the same time, it is preferable to select a material having low resistance.
- the inclination angle (also referred to as a taper angle) of the inclined surface toward the center of the first electrode is preferably more than 50 ° and less than 60 °, and more preferably 54.7 °.
- the angle of inclination, the material and film thickness of the organic compound layer, or the second layer are appropriately adjusted so that the light reflected on the inclined surface of the first electrode is not dispersed between the layers and does not become stray light. It is necessary to set the electrode material and film thickness.
- a stacked layer of a titanium film (60 nm) and a titanium nitride film (film thickness 100 nm) is used as 708a, and an aluminum film (350 nm) containing a small amount of Ti is used as 708b. ), And a titanium film (100 nm) as 708 c.
- This 708 c protects 708 b to prevent hillocks and alteration of the aluminum film.
- a titanium nitride film may be used to provide a light-shielding property to prevent reflection of the aluminum film.
- 704a made of silicon is used as 708a.
- a titanium film was used as a lower layer of 708a in order to obtain a good ohmic contact, other metal films may be used without particular limitation.
- 708a may be a single layer of a titanium nitride film.
- FIG. 6 (B) shows a structure different from that of FIG. 6 (A).
- the number of masks is increased by using the insulating layer 801c as an interlayer insulating film and providing the first electrode and the drain electrode (or the source electrode) in different layers. This is a structure that can increase the area of the light emitting region.
- 800 is the first substrate
- 801a, 801b, and 801c are insulating layers
- 802 is a chopper (p-channel TFT)
- 803 is a channel formation region
- 804 is a drain.
- Area (or source area) 805 is the gate electrode
- 806 is a drain electrode (or source electrode)
- 807 is a wiring
- 808 is a first electrode
- 809 is an insulator
- 810 is an EL layer
- 811 is a second electrode
- 8 12 is a transparent protective layer
- 8 13 is a second sealant
- 8 14 is a second substrate.
- a double-sided light-emitting device can be manufactured.
- This embodiment can be freely combined with any one of Embodiment Modes 1 to 3 and Embodiment 1.
- Such electronic devices include video cameras, digital cameras, head-mounted displays (goggle-type displays), car navigation systems, projectors, power stereos, personal computers, and personal digital assistants (mobile computers, mobile phones or e-books). Etc.).
- Figures 8 and 9 show examples of these.
- FIG. 8A shows a personal computer, which includes a main body 2001, an image input section 2002, a display section 2003, a keyboard 204, and the like.
- Fig. 8 (B) shows a video camera.
- Main unit 210 display unit 210, audio input unit 210, operation switch 210, battery 210, image receiving unit 210 Including 6 mag.
- Figure 8 (C) shows a mobile computer (mobile computer). It includes a body 2201, a camera section 2202, an image receiving section 2203, an operation switch 2204, a display section 2205, and the like.
- FIG. 8 (D) shows a player using a recording medium on which a program is recorded (hereinafter, referred to as a recording medium), including a main body 2401, a display section 2402, a speaker section 2403, a recording medium 2404, an operation switch 2405, and the like.
- a recording medium including a main body 2401, a display section 2402, a speaker section 2403, a recording medium 2404, an operation switch 2405, and the like.
- This player can use a DVD (DigtiAls Tilt e DiSc), a CD, or the like as a recording medium, and can perform music appreciation, movie appreciation, games, and the Internet.
- FIG. 8E shows a digital camera, which includes a main body 2501, a display portion 2502, an eyepiece portion 2503, an operation switch 2504, an image receiving portion (not shown), and the like.
- Figure 9 (A) shows a mobile phone, including a main body 2901, an audio output unit 2902, an audio input unit 2903, a display unit 2904, an operation switch 2905, an antenna 2906, an image input unit (CCD, image sensor, etc.) 2907, etc. including.
- FIG. 9B illustrates a portable book (electronic book) including a main body 3001, display portions 3002 and 3003, a storage medium 3004, an operation switch 3005, an antenna 3006, and the like.
- FIG. 9C illustrates a display, which includes a main body 3101, a support base 3102, a display section 3103, and the like.
- the display shown in Fig. 9 (C) is a small, medium or large display, for example, a screen size of 5 to 20 inches.
- a substrate having one side of lm and mass-produce it by performing multiple-paneling it is preferable to use a substrate having one side of lm and mass-produce it by performing multiple-paneling.
- the application range of the invention disclosed in this specification is extremely wide, and the invention can be applied to manufacturing methods of electronic devices in various fields.
- the electronic apparatus of the present embodiment can be realized by using a configuration formed by any combination of Embodiment Modes 1 to 3 and Embodiments 1 and 2.
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Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
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AU2003296080A AU2003296080A1 (en) | 2002-12-26 | 2003-12-24 | Light-emitting device and method for manufacturing same |
JP2004562904A JP4610343B2 (ja) | 2002-12-26 | 2003-12-24 | 発光装置及びその作製方法 |
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JP2002378668 | 2002-12-26 | ||
JP2002-378668 | 2002-12-26 |
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WO2004060022A1 true WO2004060022A1 (ja) | 2004-07-15 |
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PCT/JP2003/016539 WO2004060022A1 (ja) | 2002-12-26 | 2003-12-24 | 発光装置及びその作製方法 |
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US (5) | US7109655B2 (ja) |
JP (1) | JP4610343B2 (ja) |
CN (1) | CN100531484C (ja) |
AU (1) | AU2003296080A1 (ja) |
TW (1) | TWI352553B (ja) |
WO (1) | WO2004060022A1 (ja) |
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Also Published As
Publication number | Publication date |
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US20050040762A1 (en) | 2005-02-24 |
US20130092919A1 (en) | 2013-04-18 |
US20170155091A1 (en) | 2017-06-01 |
AU2003296080A1 (en) | 2004-07-22 |
JP4610343B2 (ja) | 2011-01-12 |
US7948175B2 (en) | 2011-05-24 |
TW200420181A (en) | 2004-10-01 |
TWI352553B (en) | 2011-11-11 |
US20110221335A1 (en) | 2011-09-15 |
CN100531484C (zh) | 2009-08-19 |
US9577218B2 (en) | 2017-02-21 |
US8330363B2 (en) | 2012-12-11 |
JPWO2004060022A1 (ja) | 2006-05-11 |
US7109655B2 (en) | 2006-09-19 |
CN1732715A (zh) | 2006-02-08 |
US10103355B2 (en) | 2018-10-16 |
US20070052347A1 (en) | 2007-03-08 |
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