WO2003073810A1 - Verfahren zum bohren von löchern mittels eines laserstrahls in einem substrat, insbesondere in einem elektrischen schaltungssubstrat - Google Patents
Verfahren zum bohren von löchern mittels eines laserstrahls in einem substrat, insbesondere in einem elektrischen schaltungssubstrat Download PDFInfo
- Publication number
- WO2003073810A1 WO2003073810A1 PCT/DE2003/000314 DE0300314W WO03073810A1 WO 2003073810 A1 WO2003073810 A1 WO 2003073810A1 DE 0300314 W DE0300314 W DE 0300314W WO 03073810 A1 WO03073810 A1 WO 03073810A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- laser beam
- circular path
- circular
- hole
- paths
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 15
- 238000000034 method Methods 0.000 title claims description 14
- 230000007704 transition Effects 0.000 claims abstract description 6
- 230000033001 locomotion Effects 0.000 claims description 28
- 238000005553 drilling Methods 0.000 claims description 14
- 241000252185 Cobitidae Species 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000002861 polymer material Substances 0.000 description 2
- 229920002430 Fibre-reinforced plastic Polymers 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000012634 optical imaging Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
- H05K3/0032—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
- B23K26/382—Removing material by boring or cutting by boring
- B23K26/389—Removing material by boring or cutting by boring of fluid openings, e.g. nozzles, jets
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/42—Printed circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0388—Other aspects of conductors
- H05K2201/0394—Conductor crossing over a hole in the substrate or a gap between two separate substrate parts
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0548—Masks
- H05K2203/0554—Metal used as mask for etching vias, e.g. by laser ablation
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
- H05K3/0032—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
- H05K3/0035—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material of blind holes, i.e. having a metal layer at the bottom
Definitions
- the invention relates to a method for drilling holes by means of a laser beam in a substrate, in particular in an electrical circuit substrate, the laser beam centered on the substrate with its beam axis in the region of the hole to be drilled and with a beam spot diameter which is smaller than the diameter of the hole to be drilled is moved in concentric circular paths with a gradually changing radius within the cross-sectional area of the hole to be drilled.
- a further disadvantage of this type of beam guidance is that the laser beam must undergo a change in direction of 90 ° each time it changes from the radial movement to the circular movement and must be briefly stopped for this purpose and started in the new direction. Overall, this results in an unfavorable movement sequence for the deflection unit of the laser.
- the aim of the present invention is to improve a method for laser drilling of the type mentioned at the outset in such a way that the course of movement of the laser beam in the hole region is made more favorable and that the hole shape is as ideal as possible, i.e. the circular shape.
- this is achieved in that the transition from one circular path to the next circular path having a different radius takes place in the form of an arc, which moves approximately tangentially from the last circular path and clings approximately tangentially to the new circular path to be described, such that the starting point of a new circular path is offset from the starting and ending point of the previous circular path by a predetermined angle.
- the offset according to the invention of the starting points in the individual concentric circular paths achieves that asymmetries in the energy input which occur each time a circular path is started, for example due to inadequate suppression are distributed over the entire circumference of the initial pulses and hen symmetrical as possible, ie circular holes entste ⁇ .
- a further advantage is that there are no sharp changes in direction of the laser beam transition by direct Ü are required by a radial movement in a circular motion, making a total of more uniform Ge ⁇ speed of the individual elements in the deflection unit and a more even pulse train can be achieved, which in turn means that the energy distribution in the individual circular paths and in the entire hole to be drilled becomes more uniform.
- the starting points of the circular paths traversed by the laser beam when drilling a hole are preferably distributed uniformly over the entire circumference.
- the individual circular paths can be traversed once or several times. This can be done in such a way that each circular path is run through several times in succession before the laser beam is then directed onto the next circular path.
- the shape of the arc when moving from one circular path to the next can be selected differently.
- the shape of a quarter ellipse is particularly advantageous, whereby an offset of the start and end points of approximately 90 ° is generated in each case.
- the laser beam is expediently controlled in such a way that energy input occurs only when the
- the laser beam moves on one of the circular paths, while there is no energy input on the arc between the circular paths.
- This can for example take place in that the laser beam ⁇ nen at the time of arc travel between two Kreisbah ⁇ is turned off.
- the laser beam which emits pulses with a high energy density during the productive drilling movement on the circular paths, is switched over to the arc sections between the circular paths in a continuous wave mode with a low energy density.
- FIG. 1 shows a schematically illustrated laser arrangement for drilling holes in a multilayer substrate
- FIG. 2 shows the diagram of a conventional drilling movement on circular paths
- FIG. 3 shows the diagram of a drilling movement according to the invention of a laser beam on four concentric circular paths
- FIG. 4 shows a movement sequence of a laser beam modified compared to FIG. 3, five concentric circular paths being traversed in two cycles in succession.
- the arrangement shown schematically in FIG. 1 and in no way to scale shows a laser 1 with a deflection unit 2 and an optical imaging unit 3, via which a laser beam 4 is directed onto a substrate 10.
- this substrate has an upper, first metal layer (copper layer) 11 and a lower, second metal layer 12, between which a dielectric layer 13 is arranged.
- This dielectric layer consists for example of a polymer material such as RCC or a glass fiber reinforced polymer material such as FR4. It is known that the metal layers, which generally consist of copper, require a different amount of energy for processing or transmission than the dielectric. Accordingly, different laser settings, such as different pulse refresh rates and different focusing of the laser beam can be selected.
- blind holes with a diameter D1 are to be drilled in the substrate 1.
- holes 14 can be drilled through the copper layer 11 with a first setting of the laser, for example, and then the blind holes 15 can be made in the dielectric layer 13 with another laser setting. Regardless of which material is drilled, it is assumed here that the laser beam 4 with its focal spot F1 is moved in concentric circles in the hole region to be drilled until the material is completely removed from the hole 14 or 15 in question.
- the laser beam is first centered on the center M of the hole to be drilled and from there moved in the radial direction to a first circular path, where it starts its circular movement at point P1 via the circular path Kl starts.
- the beam has returned to point P1, it is stopped and moved again in the radial direction to circular path K2, where it then starts its circular movement on point K2 from point P2.
- the drilling movement ends with a slight overlap from point P2 to point P3.
- This type of drilling movement in concentric paths with radial intermediate steps usually takes place with a laser that is in continuous operation, since irregular switching off occurs at the respective starting points P1 and P2 during the radial movement at the respective starting points P1 and P2.
- the radial movement and the arrangement of the starting points P1 and P2 in a radial line creates a borehole whose circumference L does not have the desired circular shape, but has a bulge to the right.
- FIG. 3 shows the movement of the laser beam in the method according to the invention.
- the laser beam is also in this Case first centered on the center M of the hole to be drilled. From there, he performs first an arcuate motion to the arc portion bl, a circle ⁇ preferably arc, to the start point A on the first circular path Kl. From the start point A passes through the pulsed laser beam, the circular path Kl until it again after the end of this circular path arrives at starting point A. From this starting point A, it then moves on an arc section b2 to the next starting point B on the circular path K2.
- the arc section b2 is preferably a quarter ellipse and causes an angular offset between the starting point A and the starting point B of 90 °.
- the laser beam then moves from the starting point B on the circular path K2 until this circle is closed.
- the laser beam then moves again on an arc section b3 to the starting point C on the next circular path K3. If this circular path K 3 has been traversed, the laser beam moves on the arc section b4 to the starting point D on the circular path K4.
- the laser beam can be moved back to the center M via a further arc section bO; from there it can be moved to a next hole or to its center, or it can return to the inner circle Kl via an arc section bO ⁇ in order to start a new cycle with concentric circular movements in the same hole.
- the laser preferably emits a pulsed energy beam on the circular paths.
- the laser beam is switched off on arc sections bl to b4 or bO or operated in continuous light mode with a low energy density.
- FIG. 4 shows a movement sequence similar to that of FIG. 3.
- the invention is of course not limited to the exemplary embodiments shown. Variations in the angular offset of the individual starting points are possible.
- the individual circular paths can also be traversed in reverse order, so that in this case first the outer circular paths and then the inner ones are traversed by the laser beam.
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003572347A JP4250533B2 (ja) | 2002-02-21 | 2003-02-04 | 基板においてレーザビームによって孔を穿つための方法 |
KR1020047012905A KR100944579B1 (ko) | 2002-02-21 | 2003-02-04 | 레이저빔으로 기판, 특히 전기회로 기판에 구멍을 뚫는 방법 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10207288.4 | 2002-02-21 | ||
DE10207288A DE10207288B4 (de) | 2002-02-21 | 2002-02-21 | Verfahren zum Bohren von Löchern mittels eines Laserstrahls in einem Substrat, insbesondere in einem elektrischen Schaltungsubstrat |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2003073810A1 true WO2003073810A1 (de) | 2003-09-04 |
Family
ID=27740277
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/DE2003/000314 WO2003073810A1 (de) | 2002-02-21 | 2003-02-04 | Verfahren zum bohren von löchern mittels eines laserstrahls in einem substrat, insbesondere in einem elektrischen schaltungssubstrat |
Country Status (6)
Country | Link |
---|---|
US (1) | US6781092B2 (de) |
JP (1) | JP4250533B2 (de) |
KR (1) | KR100944579B1 (de) |
CN (1) | CN100471360C (de) |
DE (1) | DE10207288B4 (de) |
WO (1) | WO2003073810A1 (de) |
Cited By (3)
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KR101242143B1 (ko) * | 2004-08-04 | 2013-03-12 | 일렉트로 싸이언티픽 인더스트리이즈 인코포레이티드 | 정밀하게 시간 조정된 레이저 펄스를 원형 및 나선형 궤적으로 이동시킴으로써 구멍을 처리하는 방법 |
CN105983786A (zh) * | 2015-02-04 | 2016-10-05 | 大族激光科技产业集团股份有限公司 | 一种采用激光实现玻璃加工的方法 |
EP3486026A4 (de) * | 2016-07-13 | 2020-01-22 | Omron Corporation | Laserverarbeitungsverfahren und laserverarbeitungsvorrichtung |
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US20040112881A1 (en) * | 2002-04-11 | 2004-06-17 | Bloemeke Stephen Roger | Circle laser trepanning |
DE102005042072A1 (de) * | 2005-06-01 | 2006-12-14 | Forschungsverbund Berlin E.V. | Verfahren zur Erzeugung von vertikalen elektrischen Kontaktverbindungen in Halbleiterwafern |
US7872211B2 (en) * | 2005-06-10 | 2011-01-18 | Igor Troitski | Laser-dynamic system for using in games |
JP4774852B2 (ja) * | 2005-08-02 | 2011-09-14 | セイコーエプソン株式会社 | 構造体の製造方法 |
JP2007268576A (ja) * | 2006-03-31 | 2007-10-18 | Hitachi Via Mechanics Ltd | レーザ加工方法 |
KR101511199B1 (ko) * | 2006-08-22 | 2015-04-10 | 캠브리지 테크놀로지 인코포레이티드 | 엑스-와이 고속 천공 시스템에서 공진 스캐너를 사용하기 위한 시스템 및 방법 |
US20090312859A1 (en) * | 2008-06-16 | 2009-12-17 | Electro Scientific Industries, Inc. | Modifying entry angles associated with circular tooling actions to improve throughput in part machining |
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US8230664B2 (en) * | 2008-07-28 | 2012-07-31 | Sonoco Development, Inc. | Pouch opening feature and method for making the same |
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CN101829850A (zh) * | 2010-04-01 | 2010-09-15 | 深圳市大族激光科技股份有限公司 | 盲孔加工方法 |
JP2010240743A (ja) * | 2010-07-21 | 2010-10-28 | Hitachi Via Mechanics Ltd | レーザ加工方法 |
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US9289858B2 (en) * | 2011-12-20 | 2016-03-22 | Electro Scientific Industries, Inc. | Drilling holes with minimal taper in cured silicone |
US8716625B2 (en) * | 2012-02-03 | 2014-05-06 | Trumpf Werkzeugmaschinen Gmbh + Co. Kg | Workpiece cutting |
CN104308370B (zh) * | 2014-08-25 | 2016-05-11 | 上海柏楚电子科技有限公司 | 一种圆弧快速切割方法 |
US10875208B1 (en) * | 2015-01-26 | 2020-12-29 | John Bean Technologies Corporation | Portioning strips from a block work product |
CN104759764B (zh) * | 2015-03-28 | 2018-02-02 | 大族激光科技产业集团股份有限公司 | 一种玻璃的激光钻孔方法 |
JP6810951B2 (ja) * | 2016-07-29 | 2021-01-13 | 三星ダイヤモンド工業株式会社 | 脆性材料基板のレーザー加工方法およびレーザー加工装置 |
JP6813168B2 (ja) * | 2016-07-29 | 2021-01-13 | 三星ダイヤモンド工業株式会社 | 脆性材料基板のレーザー加工方法およびレーザー加工装置 |
EP3335826A1 (de) * | 2016-12-13 | 2018-06-20 | Universita' Degli Studi Dell'Insubria | Laserbasierte lochherstellung und ätzen von transparenten materialien |
JP2018134678A (ja) * | 2017-02-23 | 2018-08-30 | ローランドディー.ジー.株式会社 | 加工方法 |
CN108188585B (zh) * | 2017-12-25 | 2020-04-17 | 大族激光科技产业集团股份有限公司 | 一种在陶瓷上加工cd纹的方法 |
JP7325194B2 (ja) * | 2019-02-19 | 2023-08-14 | 三菱重工業株式会社 | 溶接物製造方法、溶接物製造システム及び溶接物 |
JP7291510B2 (ja) * | 2019-03-25 | 2023-06-15 | 三菱重工業株式会社 | レーザ加工方法 |
US11508947B2 (en) * | 2019-09-30 | 2022-11-22 | Samsung Display Co., Ltd. | Method of manufacturing electronic apparatus |
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US3576965A (en) * | 1967-09-25 | 1971-05-04 | Laser Tech Sa | Method and device for boring workpieces, particularly watch jewels by means of laser pulses |
JPH02169194A (ja) * | 1988-12-23 | 1990-06-29 | Shin Meiwa Ind Co Ltd | 穴あけ切断方法 |
US4959119A (en) * | 1989-11-29 | 1990-09-25 | E. I. Du Pont De Nemours And Company | Method for forming through holes in a polyimide substrate |
SU1750900A1 (ru) * | 1990-05-08 | 1992-07-30 | Особое конструкторское бюро "Старт" | Способ лазерного сверлени отверстий и устройство дл его осуществлени |
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US5910255A (en) * | 1996-11-08 | 1999-06-08 | W. L. Gore & Associates, Inc. | Method of sequential laser processing to efficiently manufacture modules requiring large volumetric density material removal for micro-via formation |
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US5841099A (en) * | 1994-07-18 | 1998-11-24 | Electro Scientific Industries, Inc. | Method employing UV laser pulses of varied energy density to form depthwise self-limiting blind vias in multilayered targets |
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DE19905571C1 (de) * | 1999-02-11 | 2000-11-16 | Bosch Gmbh Robert | Verfahren zur Erzeugung definiert konischer Löcher mittels eines Laserstrahls |
TW482705B (en) * | 1999-05-28 | 2002-04-11 | Electro Scient Ind Inc | Beam shaping and projection imaging with solid state UV Gaussian beam to form blind vias |
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2002
- 2002-02-21 DE DE10207288A patent/DE10207288B4/de not_active Expired - Lifetime
-
2003
- 2003-02-04 CN CNB038043424A patent/CN100471360C/zh not_active Expired - Fee Related
- 2003-02-04 JP JP2003572347A patent/JP4250533B2/ja not_active Expired - Fee Related
- 2003-02-04 WO PCT/DE2003/000314 patent/WO2003073810A1/de active Application Filing
- 2003-02-04 KR KR1020047012905A patent/KR100944579B1/ko active IP Right Grant
- 2003-02-21 US US10/369,623 patent/US6781092B2/en not_active Expired - Fee Related
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101242143B1 (ko) * | 2004-08-04 | 2013-03-12 | 일렉트로 싸이언티픽 인더스트리이즈 인코포레이티드 | 정밀하게 시간 조정된 레이저 펄스를 원형 및 나선형 궤적으로 이동시킴으로써 구멍을 처리하는 방법 |
JP2013091102A (ja) * | 2004-08-04 | 2013-05-16 | Electro Scientific Industries Inc | 円状及びスパイラル形の軌道において正確にタイミングを図ったレーザパルスを移動することによって穴を形成する方法。 |
CN105983786A (zh) * | 2015-02-04 | 2016-10-05 | 大族激光科技产业集团股份有限公司 | 一种采用激光实现玻璃加工的方法 |
CN105983786B (zh) * | 2015-02-04 | 2019-06-11 | 大族激光科技产业集团股份有限公司 | 一种采用激光实现玻璃加工的方法 |
EP3486026A4 (de) * | 2016-07-13 | 2020-01-22 | Omron Corporation | Laserverarbeitungsverfahren und laserverarbeitungsvorrichtung |
Also Published As
Publication number | Publication date |
---|---|
US20030201260A1 (en) | 2003-10-30 |
JP4250533B2 (ja) | 2009-04-08 |
KR100944579B1 (ko) | 2010-02-25 |
US6781092B2 (en) | 2004-08-24 |
JP2005518679A (ja) | 2005-06-23 |
DE10207288A1 (de) | 2003-09-11 |
KR20040083537A (ko) | 2004-10-02 |
DE10207288B4 (de) | 2005-05-04 |
CN100471360C (zh) | 2009-03-18 |
CN1636426A (zh) | 2005-07-06 |
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