WO2002096956A1 - Dispositif de traitement continu par polymerisation plasma comportant une chambre verticale - Google Patents

Dispositif de traitement continu par polymerisation plasma comportant une chambre verticale Download PDF

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Publication number
WO2002096956A1
WO2002096956A1 PCT/KR2001/000907 KR0100907W WO02096956A1 WO 2002096956 A1 WO2002096956 A1 WO 2002096956A1 KR 0100907 W KR0100907 W KR 0100907W WO 02096956 A1 WO02096956 A1 WO 02096956A1
Authority
WO
WIPO (PCT)
Prior art keywords
chamber
substance
vertical
electrode
polymerization
Prior art date
Application number
PCT/KR2001/000907
Other languages
English (en)
Inventor
Sam-Chul Ha
Young-Man Jeong
Dong-Sik Youn
Seak-Je Jo
Original Assignee
Lg Electronics Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lg Electronics Inc. filed Critical Lg Electronics Inc.
Priority to CN01813566.8A priority Critical patent/CN1223613C/zh
Priority to PCT/KR2001/000907 priority patent/WO2002096956A1/fr
Priority to EP01938762A priority patent/EP1404722A1/fr
Priority to JP2003500135A priority patent/JP2004520493A/ja
Publication of WO2002096956A1 publication Critical patent/WO2002096956A1/fr

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/62—Plasma-deposition of organic layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • H01J37/3277—Continuous moving of continuous material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2252/00—Sheets
    • B05D2252/02—Sheets of indefinite length
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/338—Changing chemical properties of treated surfaces
    • H01J2237/3382—Polymerising

Definitions

  • the present invention relates to a continuous processing apparatus by plasma polymerization with a vertical chamber, and more particularly, to a continuous processing apparatus by plasma polymerization with at least one vertical chamber in which a material to be subject to surface processing is vertically moved
  • a coated layer with ah excellent hardness and abrasion resistance is formed thereon.
  • a product with such a coated layer is used as a magnetic disk, an optical disk or a cemented carbide tool.
  • WO 99/28530 (laid open June 10, 1999) discloses a surface processing apparatus by plasma polymerization.
  • FIG. 1 is a schematic plan view of a plasma polymerizing apparatus in accordance with a conventional art.
  • a conventional plasma polymerizing apparatus includes a vacuum chamber 1 , vacuum pumps 5 and 6 controlling a pressure inside the vacuum chamber, measuring instruments 7 and 8 measuring a vacuum degree, a power supply unit 3 generating a potential difference to a substance, and reactive gas controlling units 9 and 10 injecting a polymerizing gas such as an unsaturated hydrocarbon gas such as acetylene and a non- polymerizing gas such as nitrogen around the substance to be surface- processed.
  • a polymerizing gas such as an unsaturated hydrocarbon gas such as acetylene
  • a non- polymerizing gas such as nitrogen around the substance to be surface- processed.
  • a substance 2 is disposed in the chamber and a rotary pump 6 is initiated. After the pressure inside the chamber is adjusted at 10 6 Torr, a diffusion pump 5 is initiated to maintain the pressure inside the chamber at 10 "6 Torr.
  • the substance is biased by the power supply unit, and the opposite electrode 4 is grounded.
  • an unsaturated aliphatic hydrocarbon gas such as acetylene and a non-polymerizing gas such as nitrogen are injected into the chamber.
  • plasma discharging occurs with DC or a high frequency.
  • the substance fails to maintain a certain tensile force, sagging down due to gravity. Also, in such a case, each portion of the surface of the substrate has different surface-processing effect.
  • an object of the present invention is to provide a continuous processing apparatus by plasma polymerization that is capable of more effectively obtaining a high quality plasma polymerized film.
  • Still yet another object of the present invention is to provide a plasma polymerization processing system having a plurality of chambers of which an installation space is considerably reduced.
  • Another object of the present invention is to provide a plasma polymerization processing system that is capable of preventing a substance to be surface-processed from sagging down due to gravity.
  • a continuous processing apparatus by plasma polymerization having a plurality of chambers to perform a surface processing by plasma polymerization on the surface of a substance being moved into a chamber, includes: at least one vertical chamber in which a substance to be coated is vertically moved and at least one electrode is included therein.
  • the electrode is preferably disposed in parallel to the movement direction of a substance in the vertical chamber.
  • the continuous processing apparatus by plasma polymerization of the present invention in case that the continuous processing apparatus includes a plurality of vertical chambers, preferably, a substance is surface-processed by plasma polymerization in one of the vertical chambers.
  • a substance to be surface-processed by being continuously moved to the plurality of chambers can be used in itself as an electrode when power is applied thereto.
  • the vertical chamber includes a chamber body in which a substance is moved vertically, one side thereof being opened, a chamber door combined to the opened side of the chamber body, and at least one electrode disposed in parallel to the movement direction of the substance.
  • the vertical chamber is an integrated vertical chamber in which a partition plate is formed at the center thereof to divide the chamber into two vertical areas.
  • the continuous processing apparatus by plasma polymerization of the present invention may include at least one horizontal chamber in which a substance is horizontally moved as well as a vertical chamber in which the substance is moved vertically, so that a plurality of chambers can be connected in various form.
  • the continuous processing apparatus by plasma polymerization of the present invention includes an unwinding chamber having an unwinding roll for unwinding a substance wound in a roll state and a winding roll for winding a surface-processed substance, for a continuous surface processing.
  • Figure 1 is a schematic view showing a plasma polymerizing apparatus in accordance with a conventional art
  • Figure 2A is a sectional view showing a continuous processing apparatus by plasma polymerization in accordance with one embodiment of the present invention
  • Figure 2B is an enlarged sectional view showing a vertical chamber of Figure 2A in accordance with one embodiment of the present invention
  • Figure 2C is a sectional view of another example of a vertical chamber n accordance with a preferred embodiment of the present invention
  • Figure 2D is a sectional view of still another example of a vertical chamber in accordance with the preferred embodiment of the present invention
  • Figure 3A is a sectional view showing one example of supply of gas into the vertical chamber in accordance with the preferred embodiment of the present invention
  • Figure 3B is a sectional view showing another example of supply of gas into the vertical chamber in accordance with the preferred embodiment of the present invention
  • Figure 4 is a sectional view of a horizontal chamber of a continuous processing apparatus by plasma polymerization in accordance with the preferred embodiment of the present invention
  • Figure 5A is a sectional view showing a vertical chamber having two vertical areas in accordance with one embodiment of the present invention.
  • Figure 5B is a sectional view showing a vertical chamber having two vertical areas in accordance with another embodiment of the present invention.
  • Figure 6 is a sectional view showing a vertical chamber having two vertical areas in accordance with still another embodiment of the present invention.
  • Figure 2A is a sectional view showing a continuous processing apparatus by plasma polymerization in accordance with one embodiment of the present invention.
  • the a continuous processing apparatus by plasma polymerization of the present invention roughly includes a first vertical chamber 20a, a second vertical chamber 20b, a horizontal chamber 21 disposed between the two vertical chambers 20a and 20b, an unwinding roll 25 for unwinding a substance wound thereon so as to be conveyed to the chamber, and a winding roll 26 for winding the surface-processed substance of a sheet form thereon.
  • the horizontal chamber may be a horizontal pipe simply used as a convey path of the substance regardless of the surface processing.
  • the unwinding roll and the winding roll may be installed in separate chambers (i.e., an unwinding chamber and a winding chamber) unlike those as shown in Figure 2A.
  • a third and a fourth vertical chamber may be further included depending on a polymerizing system.
  • various modifications can be made by constructing a polymerizing system with more than four vertical chambers, or with a plurality of horizontal chambers.
  • the substance conveyed from the unwinding roll passes a thorough hole 22b, advances into the first vertical chamber and is moved vertically, so that the substance undergoes surface processing.
  • Tension rolls 23a and 23b are disposed on the path where the substance is conveyed between each chamber and between the unwinding roll and the winding roll, to allow a tensile force to the substance and thus prevent the substance from sagging down as well as to change the movement direction of the substance. Accordingly, even though the substance is moved along a continuously long path, a certain movement rate is constantly maintained.
  • At least one vertical chamber is installed in the polymerization processing system, and a plurality of vertical chambers and horizontal chambers may be disposed together according to a purpose of surface processing.
  • a gas atmosphere, a pressure and an applied voltage in each chamber are suitably controlled so that surface processing may be performed by different processes by chambers.
  • at least one polymerization condition among a type of gas, a supply ratio of gases, range of voltage applied to an electrode and a pressure inside the chamber is rendered to be the same for a more than two adjacent chambers, so as to be used as a polymerization chamber.
  • each chamber may be divided into a pre-processing, a first polymerization processing, a second polymerization processing and a post-processing, so that when a substance passes several chambers, various surface-processing can be made for the substance.
  • a chamber for pre-processing it is preferred to perform cleaning to remove various contaminants attached on the surface of the substance before the polymerized film is formed by plasma discharging.
  • the pre-processing chamber is to be positioned ahead the movement path of the substance.
  • Nonpolymerization gas such as oxygen, nitrogen or argon is injected into the pre-processing chamber, so that the surface of the substance is cleaned by plasma discharging.
  • the polymerizing process in which the polymerization gas is injected into the chamber and a DC or a high frequency voltage is applied thereto to cause plasma discharging, may be performed in the vertical chamber or in the horizontal chamber.
  • at least one vertical chamber is preferably used as a polymerization chamber.
  • the plasma polymerization processing apparatus having the plurality of chambers including the vertical chamber can accomplish various surface processing effects of the substance through multi-step processes, and every surface processing required for the substance can be performed by one time once the substance is moved from the unwinding roll to the winding roll.
  • the electrode is also installed vertically inside the chamber.
  • FIG 2B is an enlarged sectional view of the vertical chamber of Figure 2A in accordance with one embodiment of the present invention.
  • the vertical chamber is formed rectangular parallelepiped of which width-to-height ratio is greater than '1 ', and the area occupied by the base plane of the chamber is very small compared with the that of the horizontal chamber, so that the overall space of the polymerization processing system is considerably reduced.
  • An electrode 27 is installed in the chamber, which is disposed vertically to be parallel to the movement direction of the substance 24. Though it is shown in the drawing that one electrode is installed in both chambers, several electrode may be disposed vertically in a line.
  • Substance through holes 22a and 22b are shown installed at the upper side face and the lower side face of the chamber.
  • Figure 2C is a sectional view of another example of a vertical chamber n accordance with a preferred embodiment of the present invention.
  • a vertical chamber 20 includes a chamber body 29a including an electrode 27 therein and a chamber door 29b attached to one side of the chamber, for opening and closing the chamber.
  • Another electrode 28 is attached on the inner face of the chamber door.
  • the electrode Since the electrode is attached on the chamber door, only one face of the electrode (the opposite face of the substance) participates in the plasma discharging, and generation of carbide on the other face due to the polymerization material is prevented. In addition, since the electrode is simply attached on the chamber door, installation of the electrode is easy.
  • electrodes may be disposed in parallel to the movement direction of the substance.
  • the substance through hole 22a is formed at the top and the bottom of the chamber.
  • the through hole may be selectively formed at the top and the bottom or at the upper and the lower side faces according to the convey path of the substance and the connection structure between chambers.
  • the movement direction of the substance can be freely changed from vertical direction to the horizontal direction and then from the horizontal direction to the vertical direction.
  • Figure 2D is a sectional view of still another example of a vertical chamber in accordance with the preferred embodiment of the present invention.
  • a vertical chamber is somewhat different from that of Figure 2C. That is, the electrode 28 installed in a chamber door 29c is separated from the door face. In this structure, it is easy to render the position of the electrode to be near the surface of a substance by controlling the distance between the electrode and the substance.
  • two electrodes facing both surfaces of the substance are installed in the chambers.
  • a DC or an AC voltage may be applied to the electrode, and power may be also applied to the surface- processed substance so that the substance can be used as an electrode.
  • power is applied to the portion contacting the substance so that the power can be indirectly applied to the substance.
  • rollers are installed in various chambers such as an unwinding chamber having an unwinding roll, a winding chamber having a winding roll and a polymerization chamber, and preferably, power is applied to one of the rollers contacted by the substance being moved, thereby applying the power to the substance.
  • a power supply unit is additionally included inside or outside the chamber to apply power to the roller.
  • the substance can be an anode or a cathode.
  • the substance becomes anode and the facing electrode becomes an opposed electrode facing both faces of the substance.
  • gas flowing introduced into the chamber is critical. If gas does not evenly flow in the chamber, homogeneity of surface processing of the substance is degraded. Especially, in the continuous surface processing, it is very hard to maintain gas flowing evenly for the substance being conveyed. Thus, in case of the vertical chamber of the preferred embodiment of the present invention, since the movement direction of the substance is vertical, compared to the horizontal chamber, the gas supplied into the chamber flows very evenly against the substance.
  • Figure 3A is a sectional view showing one example of supply of gas into the vertical chamber in accordance with the preferred embodiment of the present invention.
  • a gas inlet 31a is formed at the bottom of the vertical chamber 20, and a gas outlet 31 b is formed at the top thereof.
  • gas flowing is parallel to the movement direction of the substance, so that gas is supplied evenly to each position of the surface of the substance.
  • gas may flow in the same direction as the movement direction of the substance or in the opposite direction.
  • the gas inlet is disposed at the upper side of the chamber and the gas output is disposed at the lower side thereof, so that the substance movement direction and the gas flowing can be opposite to each other.
  • Figure 3B is a sectional view showing another example of supply of gas into the vertical chamber in accordance with the preferred embodiment of the present invention.
  • the gas is supplied in the horizontal direction to the chamber, unlike the embodiment of Figure 3.
  • the gas supplied to a gas inlet 32a flows vertically to the substance movement direction and then discharged through a gas output 32b.
  • more gas inlets and gas outlets may be formed at the right and the left sides of the chamber to make the gas to flow evenly and smoothly.
  • an ash removing unit is not necessary to remove carbide or various dusts attached on the surface of the substance, simplifying the structure of the apparatus.
  • the plasma polymerizing apparatus as shown in Figure 2A includes the horizontal chamber as well as the vertical chamber. Like the vertical chamber, the horizontal chamber also can be a polymerization chamber. In the horizontal chamber, the pre-process may be performed before polymerization process or the post-process may be performed after polymerization process.
  • Figure 4 is a sectional view of a horizontal chamber of a continuous processing apparatus by plasma polymerization in accordance with the preferred embodiment of the present invention.
  • Substance pass holes 45a and 45b are formed at right and left ends of the chamber, and an upper door 42a and a lower door 42b are installed at the upper and the lower portion of the chamber.
  • Electrodes 43a and 43b are attached on the upper door and the lower door, respectively.
  • a gas inlet and a gas outlet may be formed at the chamber.
  • the electrode may be attached on the door face of the upper door and the lower door, or may be attached spaced apart from the door face.
  • the upper door is opened upwardly, while the lower door is opened downwardly.
  • the horizontal chamber may be used as a polymerization chamber, a pre-processing chamber or a post-processing chamber when the electrode is attached thereon. Or, without the electrode, the horizontal chamber may be simply used as a movement path for the substance.
  • Figure 5A is a sectional view showing a vertical chamber having two vertical areas in accordance with one embodiment of the present invention.
  • a vertical chamber 50a includes a partition plate 52 formed in the vertical direction at the center inside one chamber.
  • the partition plate 52 divides the chamber into two vertical areas 51a and 51b. At least one electrode is disposed at each vertical area.
  • two electrodes are formed facing to each other in each vertical area.
  • horizontal paths (or a horizontal chamber) 58a and 58b are formed to be connected.
  • substance 55 passes the left horizontal path 58a and is introduced into one horizontal area 51a, it passes the substance through hole 57a formed at the upper portion of the partition plate, is moved to another vertical area 51b, and then, passes another horizontal path 58b, so as to be moved out.
  • each vertical area of the vertical chamber is separated by the partition plate, it serves as an independent chamber and performs a surface processing with different processes, respectively.
  • a pre-processing is performed at one vertical area and a polymerizing process is performed at the other vertical area.
  • a post-processing may be performed at the other vertical area.
  • polymerizing process may be performed at both vertical areas.
  • Reference numeral 57b denotes a substance pass hole between the vertical chamber and the horizontal path
  • 57c denotes a substance pass hole formed at the end of the horizontal path
  • 56 denotes a tension roll.
  • Figure 5B is a sectional view showing a vertical chamber having two vertical areas in accordance with another embodiment of the present invention. As shown in Figure 5B, the vertical chamber is the same as that of
  • Figure 5A in the aspect that the vertical chamber 50b is divided into two vertical areas by virtue of the partition plate 52 formed at the center inside the chamber, except that a substance 55, passing one vertical area 51a, passes another horizontal region 58 before proceeding to another vertical area 51b.
  • the horizontal area is integrally formed with the vertical chamber, and the substance is move between the vertical area and the horizontal path through the pass hole 57d formed between the vertical area and the horizontal area.
  • the vertical chamber having the integrally formed horizontal area and two vertical areas has advantages that since a surface processing is made independently at each area, space utilization is maximized, and the three kins of surface process can be consecutively performed in a single chamber.
  • Figure 6 is a sectional view showing a vertical chamber having two vertical areas in accordance with still another embodiment of the present invention.
  • a vertical chamber 60 includes a chamber body 61 having two vertical areas 61a and 61b as divided by a partition plate 65 formed at the center inside the chamber, and chamber doors 62a and 62b installed at both ends of the chamber body, for opening and closing the chamber.
  • a substance 66 passes a through hole 68 and is moved in each vertical area of the vertical chamber.
  • Each tension roll 67 changes a movement direction of the substance, rendering the substance to move from outside to the vertical area and from one vertical area to another vertical area.
  • the vertical chamber includes electrodes 64a and 64b disposed in parallel to the substance proceeding direction at both sides of the central partition plate 65 of the chamber body, and electrodes 63a and 63b are disposed in parallel to the substance proceeding direction on the door face of the chamber door.
  • the electrodes installed at the chamber door may be attached on the door face or disposed spaced apart from the door face so that the interval with the substance can be adjusted.
  • the continuous processing apparatus by plasma polymerization of the present invention has many advantages. For example, first, since the vertical chamber can be possibly formed solely or by plural ones, or can be formed along with the horizontal chamber, various forms of plasma polymerization processing system can be constructed.
  • the plurality of chambers can be utilized for various functions and use such as the polymerization chamber, the post-processing chamber and pre-processing chamber according to purposes of surface processing.
  • the plasma polymerization processing apparatus including the veritcal chamber is a requisite element for a continuous processing apparatus by which substances can be surface-processed rapidly and in large quantities.
  • the present invention may be embodied in several forms without departing from the spirit or essential characteristics thereof, it should also be understood that the above-described embodiments are not limited by any of the details of the foregoing description, unless otherwise specified, but rather should be construed broadly within its spirit and scope as defined in the appended claims, and therefore all changes and modifications that fall within the meets and bounds of the claims, or equivalence of such meets and bounds are therefore intended to be embraced by the appended claims.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

L'invention concerne un dispositif de traitement continu par polymérisation plasma comportant une pluralité de chambres, destiné à mettre en oeuvre un traitement de surface par polymérisation plasma à la surface d'une substance introduite dans une chambre. Ledit dispositif comporte au moins une chambre verticale dans laquelle une substance est déplacée verticalement, ladite chambre contenant au moins une électrode. Comme la chambre verticale peut être individuelle ou constituée de plusieurs chambres, ou formée avec la chambre horizontale, divers types de systèmes de traitement par polymérisation plasma peuvent être réalisés. Par ailleurs, la pluralité de chambres peut servir à différentes fonctions et utilisations telles que chambre de polymérisation, chambre de traitement ultérieur et chambre de traitement préalable destinées à des fins de traitement de surface.
PCT/KR2001/000907 2001-05-30 2001-05-30 Dispositif de traitement continu par polymerisation plasma comportant une chambre verticale WO2002096956A1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CN01813566.8A CN1223613C (zh) 2001-05-30 2001-05-30 具有直立室的等离子体聚合连续处理设备
PCT/KR2001/000907 WO2002096956A1 (fr) 2001-05-30 2001-05-30 Dispositif de traitement continu par polymerisation plasma comportant une chambre verticale
EP01938762A EP1404722A1 (fr) 2001-05-30 2001-05-30 Dispositif de traitement continu par polymerisation plasma comportant une chambre verticale
JP2003500135A JP2004520493A (ja) 2001-05-30 2001-05-30 垂直チャンバを具備したプラズマ重合連続処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/KR2001/000907 WO2002096956A1 (fr) 2001-05-30 2001-05-30 Dispositif de traitement continu par polymerisation plasma comportant une chambre verticale

Publications (1)

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WO2002096956A1 true WO2002096956A1 (fr) 2002-12-05

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PCT/KR2001/000907 WO2002096956A1 (fr) 2001-05-30 2001-05-30 Dispositif de traitement continu par polymerisation plasma comportant une chambre verticale

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EP (1) EP1404722A1 (fr)
JP (1) JP2004520493A (fr)
CN (1) CN1223613C (fr)
WO (1) WO2002096956A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005256075A (ja) * 2004-03-11 2005-09-22 Jfe Steel Kk 金属ストリップの連続式化学蒸着装置
CN103632917A (zh) * 2013-11-27 2014-03-12 苏州市奥普斯等离子体科技有限公司 一种连续材料表面常压等离子体处理装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110331378B (zh) * 2019-07-18 2024-01-19 中国科学院金属研究所 金刚石薄膜连续制备使用的hfcvd设备及其镀膜方法

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JPS57182302A (en) * 1981-05-06 1982-11-10 Shuzo Hattori Apparatus for forming polymer film by plasma polymerization
JPS58145540A (ja) * 1982-02-19 1983-08-30 Nippon Denso Co Ltd 車両用エンジン温度表示装置
JPS61112312A (ja) * 1984-11-07 1986-05-30 Hitachi Ltd 真空連続処理装置
JPH04110467A (ja) * 1990-08-31 1992-04-10 Terumo Corp 機能性膜の製造方法およびその製造装置
JPH04314349A (ja) * 1991-04-11 1992-11-05 Mitsutoyo Corp 真空リソグラフィ装置
JPH06136506A (ja) * 1992-10-21 1994-05-17 Nisshin Steel Co Ltd 金属帯材のプラズマ重合処理方法及び装置

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JPS57182302A (en) * 1981-05-06 1982-11-10 Shuzo Hattori Apparatus for forming polymer film by plasma polymerization
JPS58145540A (ja) * 1982-02-19 1983-08-30 Nippon Denso Co Ltd 車両用エンジン温度表示装置
JPS61112312A (ja) * 1984-11-07 1986-05-30 Hitachi Ltd 真空連続処理装置
JPH04110467A (ja) * 1990-08-31 1992-04-10 Terumo Corp 機能性膜の製造方法およびその製造装置
JPH04314349A (ja) * 1991-04-11 1992-11-05 Mitsutoyo Corp 真空リソグラフィ装置
JPH06136506A (ja) * 1992-10-21 1994-05-17 Nisshin Steel Co Ltd 金属帯材のプラズマ重合処理方法及び装置

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DATABASE WPI Week 199221, Derwent World Patents Index; AN 1992-172611, XP002970686 *
PATENT ABSTRACTS OF JAPAN *
SHARMA A.K. ET AL.: "Continuous plasma polymerization investigated by means of a magnetically enhanced glow discharge with moving substrates", JOURNAL OF APPLIED POLYMER SCIENCE: APPLIED POLYMER SYMPOSIUM 38 (PLASMA POLYMERIZATION AND PLASMA TREATMENT), vol. 38, 1984, pages 225 - 234, XP002972915 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005256075A (ja) * 2004-03-11 2005-09-22 Jfe Steel Kk 金属ストリップの連続式化学蒸着装置
JP4553608B2 (ja) * 2004-03-11 2010-09-29 Ｊｆｅスチール株式会社 金属ストリップの連続式化学蒸着装置
CN103632917A (zh) * 2013-11-27 2014-03-12 苏州市奥普斯等离子体科技有限公司 一种连续材料表面常压等离子体处理装置

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JP2004520493A (ja) 2004-07-08
CN1444605A (zh) 2003-09-24
CN1223613C (zh) 2005-10-19
EP1404722A1 (fr) 2004-04-07

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