WO2002084717A1 - Dispositif ceramique chauffant pour installation de fabrication/inspection de semi-conducteurs - Google Patents
Dispositif ceramique chauffant pour installation de fabrication/inspection de semi-conducteurs Download PDFInfo
- Publication number
- WO2002084717A1 WO2002084717A1 PCT/JP2002/003608 JP0203608W WO02084717A1 WO 2002084717 A1 WO2002084717 A1 WO 2002084717A1 JP 0203608 W JP0203608 W JP 0203608W WO 02084717 A1 WO02084717 A1 WO 02084717A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- ceramic heater
- semiconductor
- inspecting apparatus
- manufactring
- semiconductor manufacturing
- Prior art date
Links
- 239000000919 ceramic Substances 0.000 title abstract 5
- 239000004065 semiconductor Substances 0.000 title abstract 4
- 238000010438 heat treatment Methods 0.000 abstract 2
- 238000004519 manufacturing process Methods 0.000 abstract 2
- 238000005260 corrosion Methods 0.000 abstract 1
- 230000007797 corrosion Effects 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 238000009827 uniform distribution Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67103—Apparatus for thermal treatment mainly by conduction
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor
- H05B3/12—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
- H05B3/14—Heater elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material the material being non-metallic
- H05B3/141—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds
- H05B3/143—Conductive ceramics, e.g. metal oxides, metal carbides, barium titanate, ferrites, zirconia, vitrous compounds applied to semiconductors, e.g. wafers heating
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Ceramic Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Resistance Heating (AREA)
- Surface Heating Bodies (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002581569A JPWO2002084717A1 (ja) | 2001-04-11 | 2002-04-11 | 半導体製造・検査装置用セラミックヒータ |
EP02718530A EP1391919A1 (en) | 2001-04-11 | 2002-04-11 | Ceramic heater for semiconductor manufactring/inspecting apparatus |
US10/473,585 US20040206747A1 (en) | 2001-04-11 | 2002-04-11 | Ceramic heater for semiconductor manufacturing/inspecting apparatus |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001113247 | 2001-04-11 | ||
JP2001-113247 | 2001-04-11 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2002084717A1 true WO2002084717A1 (fr) | 2002-10-24 |
Family
ID=18964497
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2002/003608 WO2002084717A1 (fr) | 2001-04-11 | 2002-04-11 | Dispositif ceramique chauffant pour installation de fabrication/inspection de semi-conducteurs |
Country Status (4)
Country | Link |
---|---|
US (1) | US20040206747A1 (ja) |
EP (1) | EP1391919A1 (ja) |
JP (1) | JPWO2002084717A1 (ja) |
WO (1) | WO2002084717A1 (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007515778A (ja) * | 2003-05-08 | 2007-06-14 | ワットロー・エレクトリック・マニュファクチャリング・カンパニー | 多数領域セラミック加熱システム及びその製造方法 |
WO2017029876A1 (ja) * | 2015-08-20 | 2017-02-23 | 日本碍子株式会社 | 静電チャックヒータ |
JP2018032571A (ja) * | 2016-08-26 | 2018-03-01 | 京セラ株式会社 | ヒータ |
KR20190045669A (ko) * | 2017-10-24 | 2019-05-03 | (주)티티에스 | 열전대 삽입 홈을 구비한 히터 |
KR20190045688A (ko) * | 2017-10-24 | 2019-05-03 | (주)티티에스 | 세라믹 플레이트 제조 방법 |
CN115172231A (zh) * | 2022-09-08 | 2022-10-11 | 西北电子装备技术研究所(中国电子科技集团公司第二研究所) | 一种带有气氛保护的快速升降温共晶加热台 |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001017927A1 (fr) * | 1999-09-06 | 2001-03-15 | Ibiden Co., Ltd. | Briquette et substrat ceramique en nitrure d'aluminium carbone fritte destine a des equipements de fabrication ou de verification de semi-conducteurs |
US6888106B2 (en) * | 2000-04-07 | 2005-05-03 | Ibiden Co., Ltd. | Ceramic heater |
US7071551B2 (en) * | 2000-05-26 | 2006-07-04 | Ibiden Co., Ltd. | Device used to produce or examine semiconductors |
WO2002003435A1 (fr) * | 2000-07-04 | 2002-01-10 | Ibiden Co., Ltd. | Plaque chaude destinee a la fabrication et aux essais de semiconducteurs |
WO2002047129A1 (fr) | 2000-12-05 | 2002-06-13 | Ibiden Co., Ltd. | Substrat ceramique pour dispositifs de production et de controle de semi-conducteurs et procede de production dudit substrat ceramique |
US20060088692A1 (en) * | 2004-10-22 | 2006-04-27 | Ibiden Co., Ltd. | Ceramic plate for a semiconductor producing/examining device |
US7645342B2 (en) | 2004-11-15 | 2010-01-12 | Cree, Inc. | Restricted radiated heating assembly for high temperature processing |
US7730737B2 (en) * | 2004-12-21 | 2010-06-08 | Taiwan Semiconductor Manufacturing Co., Ltd. | Cooling station lifter pins |
US8709162B2 (en) * | 2005-08-16 | 2014-04-29 | Applied Materials, Inc. | Active cooling substrate support |
US9100992B2 (en) | 2012-10-08 | 2015-08-04 | Minco Products, Inc. | Heater assembly |
US10543549B2 (en) | 2013-07-16 | 2020-01-28 | Illinois Tool Works Inc. | Additive manufacturing system for joining and surface overlay |
DE102013113052A1 (de) * | 2013-11-26 | 2015-05-28 | Aixtron Se | Heizeinrichtung für einen CVD-Reaktor |
JP6219227B2 (ja) * | 2014-05-12 | 2017-10-25 | 東京エレクトロン株式会社 | ヒータ給電機構及びステージの温度制御方法 |
JP6219229B2 (ja) * | 2014-05-19 | 2017-10-25 | 東京エレクトロン株式会社 | ヒータ給電機構 |
JP6378942B2 (ja) | 2014-06-12 | 2018-08-22 | 東京エレクトロン株式会社 | 載置台及びプラズマ処理装置 |
US20170145586A1 (en) * | 2015-11-23 | 2017-05-25 | Hobart Brothers Company | System and method for single crystal growth with additive manufacturing |
US10852261B2 (en) * | 2016-10-29 | 2020-12-01 | Sendsor Gmbh | Sensor and method for measuring respiratory gas properties |
DE102017124256A1 (de) | 2016-10-29 | 2018-05-03 | Sendsor Gmbh | Sensor und Verfahren zum Messen der Eigenschaften des Atemgas |
JP6866255B2 (ja) * | 2017-08-09 | 2021-04-28 | 東京エレクトロン株式会社 | プラズマ処理装置 |
US11371748B2 (en) | 2019-08-05 | 2022-06-28 | The Merchant Of Tennis, Inc. | Portable heater with ceramic substrate |
JP2022042379A (ja) * | 2020-09-02 | 2022-03-14 | 東京エレクトロン株式会社 | 載置台及びプラズマ処理装置 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0669137A (ja) * | 1992-08-14 | 1994-03-11 | Ngk Insulators Ltd | セラミックスヒーター |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW444922U (en) * | 1994-09-29 | 2001-07-01 | Tokyo Electron Ltd | Heating device and the processing device using the same |
US6222161B1 (en) * | 1998-01-12 | 2001-04-24 | Tokyo Electron Limited | Heat treatment apparatus |
JP3434721B2 (ja) * | 1998-11-30 | 2003-08-11 | 東芝セラミックス株式会社 | 封止端子 |
JP2001118664A (ja) * | 1999-08-09 | 2001-04-27 | Ibiden Co Ltd | セラミックヒータ |
US6835916B2 (en) * | 1999-08-09 | 2004-12-28 | Ibiden, Co., Ltd | Ceramic heater |
US6717116B1 (en) * | 1999-08-10 | 2004-04-06 | Ibiden Co., Ltd. | Semiconductor production device ceramic plate |
EP1199908A4 (en) * | 1999-10-22 | 2003-01-22 | Ibiden Co Ltd | CERAMIC HEATING PLATE |
WO2001035459A1 (en) * | 1999-11-10 | 2001-05-17 | Ibiden Co., Ltd. | Ceramic substrate |
ATE301916T1 (de) * | 1999-11-19 | 2005-08-15 | Ibiden Co Ltd | Keramisches heizgerät |
JP2001297857A (ja) * | 1999-11-24 | 2001-10-26 | Ibiden Co Ltd | 半導体製造・検査装置用セラミックヒータ |
WO2001041508A1 (fr) * | 1999-11-30 | 2001-06-07 | Ibiden Co., Ltd. | Appareil chauffant en ceramique |
JP2001237053A (ja) * | 1999-12-14 | 2001-08-31 | Ibiden Co Ltd | 半導体製造・検査装置用セラミックヒータおよび支持ピン |
US20040222211A1 (en) * | 1999-12-28 | 2004-11-11 | Ibiden Co., Ltd. | Carbon-containing aluminum nitride sintered body, and ceramic substrate for a semiconductor producing/examining device |
US20040011782A1 (en) * | 1999-12-29 | 2004-01-22 | Ibiden Co., Ltd | Ceramic heater |
JP3228923B2 (ja) * | 2000-01-18 | 2001-11-12 | イビデン株式会社 | 半導体製造・検査装置用セラミックヒータ |
JP3228924B2 (ja) * | 2000-01-21 | 2001-11-12 | イビデン株式会社 | 半導体製造・検査装置用セラミックヒータ |
WO2001062686A1 (fr) * | 2000-02-24 | 2001-08-30 | Ibiden Co., Ltd. | Piece frittee en nitrure d'aluminium, substrat en ceramique, corps chauffant en ceramique et mandrin electrostatique |
JP2001244320A (ja) * | 2000-02-25 | 2001-09-07 | Ibiden Co Ltd | セラミック基板およびその製造方法 |
US20030098299A1 (en) * | 2000-03-06 | 2003-05-29 | Ibiden Co., Ltd. | Ceramic heater |
JP2001253777A (ja) * | 2000-03-13 | 2001-09-18 | Ibiden Co Ltd | セラミック基板 |
JP2001302330A (ja) * | 2000-04-24 | 2001-10-31 | Ibiden Co Ltd | セラミック基板 |
WO2001084888A1 (en) * | 2000-04-29 | 2001-11-08 | Ibiden Co., Ltd. | Ceramic heater and method of controlling temperature of the ceramic heater |
WO2001084886A1 (fr) * | 2000-05-02 | 2001-11-08 | Ibiden Co., Ltd. | Dispositif de chauffage en ceramique |
EP1211725A4 (en) * | 2000-05-10 | 2003-02-26 | Ibiden Co Ltd | ELECTROSTATIC CHUCK |
US7071551B2 (en) * | 2000-05-26 | 2006-07-04 | Ibiden Co., Ltd. | Device used to produce or examine semiconductors |
US20040035846A1 (en) * | 2000-09-13 | 2004-02-26 | Yasuji Hiramatsu | Ceramic heater for semiconductor manufacturing and inspecting equipment |
-
2002
- 2002-04-11 WO PCT/JP2002/003608 patent/WO2002084717A1/ja not_active Application Discontinuation
- 2002-04-11 EP EP02718530A patent/EP1391919A1/en not_active Withdrawn
- 2002-04-11 JP JP2002581569A patent/JPWO2002084717A1/ja active Pending
- 2002-04-11 US US10/473,585 patent/US20040206747A1/en not_active Abandoned
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0669137A (ja) * | 1992-08-14 | 1994-03-11 | Ngk Insulators Ltd | セラミックスヒーター |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007515778A (ja) * | 2003-05-08 | 2007-06-14 | ワットロー・エレクトリック・マニュファクチャリング・カンパニー | 多数領域セラミック加熱システム及びその製造方法 |
JP4908217B2 (ja) * | 2003-05-08 | 2012-04-04 | ワットロー・エレクトリック・マニュファクチャリング・カンパニー | 多数領域セラミック加熱システム及びその製造方法 |
WO2017029876A1 (ja) * | 2015-08-20 | 2017-02-23 | 日本碍子株式会社 | 静電チャックヒータ |
JP6129451B1 (ja) * | 2015-08-20 | 2017-05-17 | 日本碍子株式会社 | 静電チャックヒータ |
US10292209B2 (en) | 2015-08-20 | 2019-05-14 | Ngk Insulators, Ltd. | Electrostatic chuck heater |
JP2018032571A (ja) * | 2016-08-26 | 2018-03-01 | 京セラ株式会社 | ヒータ |
KR20190045669A (ko) * | 2017-10-24 | 2019-05-03 | (주)티티에스 | 열전대 삽입 홈을 구비한 히터 |
KR20190045688A (ko) * | 2017-10-24 | 2019-05-03 | (주)티티에스 | 세라믹 플레이트 제조 방법 |
KR102015643B1 (ko) * | 2017-10-24 | 2019-08-28 | (주)티티에스 | 열전대 삽입 홈을 구비한 히터 |
KR101994178B1 (ko) * | 2017-10-24 | 2019-09-30 | (주)티티에스 | 세라믹 플레이트 제조 방법 |
CN115172231A (zh) * | 2022-09-08 | 2022-10-11 | 西北电子装备技术研究所(中国电子科技集团公司第二研究所) | 一种带有气氛保护的快速升降温共晶加热台 |
Also Published As
Publication number | Publication date |
---|---|
JPWO2002084717A1 (ja) | 2004-08-05 |
EP1391919A1 (en) | 2004-02-25 |
US20040206747A1 (en) | 2004-10-21 |
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