WO1996014932A1 - Materiau fonctionnel photocatalytique et son procede de production - Google Patents
Materiau fonctionnel photocatalytique et son procede de production Download PDFInfo
- Publication number
- WO1996014932A1 WO1996014932A1 PCT/JP1995/002340 JP9502340W WO9614932A1 WO 1996014932 A1 WO1996014932 A1 WO 1996014932A1 JP 9502340 W JP9502340 W JP 9502340W WO 9614932 A1 WO9614932 A1 WO 9614932A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- photocatalyst
- liquid
- layer
- metal
- photocatalytic
- Prior art date
Links
- 239000000463 material Substances 0.000 title claims abstract description 94
- 230000001699 photocatalysis Effects 0.000 title claims abstract description 62
- 238000000034 method Methods 0.000 title claims description 74
- 238000004519 manufacturing process Methods 0.000 title claims description 18
- 239000011941 photocatalyst Substances 0.000 claims abstract description 164
- 229920005989 resin Polymers 0.000 claims abstract description 148
- 239000011347 resin Substances 0.000 claims abstract description 148
- 239000002245 particle Substances 0.000 claims abstract description 68
- 229910052751 metal Inorganic materials 0.000 claims abstract description 55
- 239000002184 metal Substances 0.000 claims abstract description 55
- 239000011159 matrix material Substances 0.000 claims abstract description 45
- 239000002346 layers by function Substances 0.000 claims abstract description 37
- 229920001187 thermosetting polymer Polymers 0.000 claims abstract description 35
- 238000010438 heat treatment Methods 0.000 claims abstract description 18
- 239000002344 surface layer Substances 0.000 claims abstract description 5
- 239000010410 layer Substances 0.000 claims description 75
- 239000007788 liquid Substances 0.000 claims description 58
- 230000008569 process Effects 0.000 claims description 45
- 239000010931 gold Substances 0.000 claims description 33
- 229910052737 gold Inorganic materials 0.000 claims description 31
- 239000000203 mixture Substances 0.000 claims description 30
- 239000000243 solution Substances 0.000 claims description 30
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 29
- 238000006243 chemical reaction Methods 0.000 claims description 22
- 239000011230 binding agent Substances 0.000 claims description 20
- 239000010949 copper Substances 0.000 claims description 19
- 229910052802 copper Inorganic materials 0.000 claims description 17
- 239000011344 liquid material Substances 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 16
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 15
- 239000003054 catalyst Substances 0.000 claims description 15
- 239000003795 chemical substances by application Substances 0.000 claims description 15
- 238000002156 mixing Methods 0.000 claims description 11
- 238000010893 electron trap Methods 0.000 claims description 10
- 230000001678 irradiating effect Effects 0.000 claims description 9
- 238000005381 potential energy Methods 0.000 claims description 8
- 229910052709 silver Inorganic materials 0.000 claims description 7
- 230000003287 optical effect Effects 0.000 claims description 6
- 239000011259 mixed solution Substances 0.000 claims description 5
- 239000004332 silver Substances 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 3
- 238000005260 corrosion Methods 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 229910021645 metal ion Inorganic materials 0.000 claims description 3
- 150000002739 metals Chemical class 0.000 claims description 2
- 239000003973 paint Substances 0.000 claims description 2
- 229910052763 palladium Inorganic materials 0.000 claims description 2
- 229910052707 ruthenium Inorganic materials 0.000 claims description 2
- 229910052718 tin Inorganic materials 0.000 claims description 2
- 239000010408 film Substances 0.000 claims 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract description 21
- 229910052760 oxygen Inorganic materials 0.000 abstract description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 7
- 239000001301 oxygen Substances 0.000 abstract description 7
- 230000001877 deodorizing effect Effects 0.000 abstract description 4
- 238000013032 photocatalytic reaction Methods 0.000 abstract description 2
- 238000001782 photodegradation Methods 0.000 abstract 2
- 230000000845 anti-microbial effect Effects 0.000 abstract 1
- 230000006870 function Effects 0.000 description 23
- 230000000844 anti-bacterial effect Effects 0.000 description 21
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 20
- 239000007787 solid Substances 0.000 description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 20
- 239000002253 acid Substances 0.000 description 19
- 238000004332 deodorization Methods 0.000 description 16
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 12
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 12
- 239000007789 gas Substances 0.000 description 12
- 239000010936 titanium Substances 0.000 description 12
- 229910052719 titanium Inorganic materials 0.000 description 12
- 235000020083 shōchū Nutrition 0.000 description 11
- 229910052782 aluminium Inorganic materials 0.000 description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 10
- 239000002781 deodorant agent Substances 0.000 description 8
- 239000011521 glass Substances 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 239000007864 aqueous solution Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 229920001577 copolymer Polymers 0.000 description 7
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 7
- 238000000354 decomposition reaction Methods 0.000 description 7
- 238000004299 exfoliation Methods 0.000 description 7
- 230000004224 protection Effects 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- 239000013078 crystal Substances 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 238000005299 abrasion Methods 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 5
- 230000001580 bacterial effect Effects 0.000 description 5
- XFVGXQSSXWIWIO-UHFFFAOYSA-N chloro hypochlorite;titanium Chemical compound [Ti].ClOCl XFVGXQSSXWIWIO-UHFFFAOYSA-N 0.000 description 5
- 238000007865 diluting Methods 0.000 description 5
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000002923 metal particle Substances 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- 230000004083 survival effect Effects 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 241000894006 Bacteria Species 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- 230000009471 action Effects 0.000 description 4
- 230000003373 anti-fouling effect Effects 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 238000005755 formation reaction Methods 0.000 description 4
- -1 gold ion Chemical class 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 210000001015 abdomen Anatomy 0.000 description 3
- 230000003187 abdominal effect Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 3
- 238000004898 kneading Methods 0.000 description 3
- 239000004848 polyfunctional curative Substances 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 238000005215 recombination Methods 0.000 description 3
- 230000006798 recombination Effects 0.000 description 3
- 229920002050 silicone resin Polymers 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- TUQLLQQWSNWKCF-UHFFFAOYSA-N trimethoxymethylsilane Chemical compound COC([SiH3])(OC)OC TUQLLQQWSNWKCF-UHFFFAOYSA-N 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 239000004566 building material Substances 0.000 description 2
- 239000001273 butane Substances 0.000 description 2
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 239000008204 material by function Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000006722 reduction reaction Methods 0.000 description 2
- 239000000741 silica gel Substances 0.000 description 2
- 229910002027 silica gel Inorganic materials 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 238000006557 surface reaction Methods 0.000 description 2
- HUYHHHVTBNJNFM-UHFFFAOYSA-N trimethylsilylsilicon Chemical compound C[Si](C)(C)[Si] HUYHHHVTBNJNFM-UHFFFAOYSA-N 0.000 description 2
- 239000002023 wood Substances 0.000 description 2
- MHVJRKBZMUDEEV-APQLOABGSA-N (+)-Pimaric acid Chemical compound [C@H]1([C@](CCC2)(C)C(O)=O)[C@@]2(C)[C@H]2CC[C@](C=C)(C)C=C2CC1 MHVJRKBZMUDEEV-APQLOABGSA-N 0.000 description 1
- MIZLGWKEZAPEFJ-UHFFFAOYSA-N 1,1,2-trifluoroethene Chemical group FC=C(F)F MIZLGWKEZAPEFJ-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 241000473391 Archosargus rhomboidalis Species 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 244000025254 Cannabis sativa Species 0.000 description 1
- 229910004613 CdTe Inorganic materials 0.000 description 1
- 241000588724 Escherichia coli Species 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910000576 Laminated steel Inorganic materials 0.000 description 1
- 229910016006 MoSi Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 102100033979 Protein strawberry notch homolog 1 Human genes 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 229940088710 antibiotic agent Drugs 0.000 description 1
- BBEAQIROQSPTKN-UHFFFAOYSA-N antipyrene Natural products C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 1
- 244000052616 bacterial pathogen Species 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 210000000941 bile Anatomy 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000007809 chemical reaction catalyst Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 1
- 230000002860 competitive effect Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000002772 conduction electron Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229940116318 copper carbonate Drugs 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 1
- GEZOTWYUIKXWOA-UHFFFAOYSA-L copper;carbonate Chemical compound [Cu+2].[O-]C([O-])=O GEZOTWYUIKXWOA-UHFFFAOYSA-L 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000009408 flooring Methods 0.000 description 1
- GVEPBJHOBDJJJI-UHFFFAOYSA-N fluoranthrene Natural products C1=CC(C2=CC=CC=C22)=C3C2=CC=CC3=C1 GVEPBJHOBDJJJI-UHFFFAOYSA-N 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- 230000002538 fungal effect Effects 0.000 description 1
- 238000009998 heat setting Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000036512 infertility Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000002075 main ingredient Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 1
- PPNQXAYCPNTVHH-UHFFFAOYSA-N methoxymethyl(trimethyl)silane Chemical compound COC[Si](C)(C)C PPNQXAYCPNTVHH-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- NDLPOXTZKUMGOV-UHFFFAOYSA-N oxo(oxoferriooxy)iron hydrate Chemical compound O.O=[Fe]O[Fe]=O NDLPOXTZKUMGOV-UHFFFAOYSA-N 0.000 description 1
- 230000020477 pH reduction Effects 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 230000003334 potential effect Effects 0.000 description 1
- 238000000634 powder X-ray diffraction Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 238000003307 slaughter Methods 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000012756 surface treatment agent Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- PQDJYEQOELDLCP-UHFFFAOYSA-N trimethylsilane Chemical compound C[SiH](C)C PQDJYEQOELDLCP-UHFFFAOYSA-N 0.000 description 1
- 239000011882 ultra-fine particle Substances 0.000 description 1
- 230000035899 viability Effects 0.000 description 1
- 229920006163 vinyl copolymer Polymers 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- B01J35/39—
-
- B01J35/30—
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/0009—Use of binding agents; Moulding; Pressing; Powdering; Granulating; Addition of materials ameliorating the mechanical properties of the product catalyst
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/04—Mixing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/08—Heat treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/16—Reducing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/34—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation
- B01J37/341—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation making use of electric or magnetic fields, wave energy or particle radiation
- B01J37/344—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation making use of electric or magnetic fields, wave energy or particle radiation of electromagnetic wave energy
- B01J37/345—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation making use of electric or magnetic fields, wave energy or particle radiation of electromagnetic wave energy of ultraviolet wave energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/148—Light sensitive titanium compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249967—Inorganic matrix in void-containing component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249967—Inorganic matrix in void-containing component
- Y10T428/249969—Of silicon-containing material [e.g., glass, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249967—Inorganic matrix in void-containing component
- Y10T428/24997—Of metal-containing material
Definitions
- the present invention provides a photocatalytic device having many functions such as antibacterial and protective equipment based on photocatalytic operation, antifouling, and decomposition of harmful substances (NOx, etc.).
- a photocatalytic device having many functions such as antibacterial and protective equipment based on photocatalytic operation, antifouling, and decomposition of harmful substances (NOx, etc.).
- it relates to photocatalytic functional materials that can be manufactured in low-temperature (about 300 or less) processes.
- anatase-type oxidized titanium or the like is added to the surface of the base material.
- a method for forming the thin K of the photocatalyst according to the present invention has been proposed in the past, and one of the methods is to use an anatase-type oxidized titanium abdomen as one method.
- No. there is a method of kneading in a binder, applying it to the surface of the base material and heat-treating it.
- a binder layer is formed on the surface of the plate-shaped member, and the binder is formed.
- anatase-type oxidized titanium as a main body and a part of the photocatalyst fine powder which is blown out so that a part of the powder comes out of the binder layer.
- the calendar is solidifying
- the invention should be resolved ⁇ 3 ⁇ 4
- the anatase type titanium oxide particles described above are mixed in a binder, In the method of applying this to the surface of the base material and heat-treating it, the binder covers most of the active site of the photocatalyst particles. As a result, the characteristics of using a photocatalyst, such as detachability, were not sufficient.
- the photocatalyst layer forming the surface of the base material has a thermal treatment temperature of 800 with no drip. It becomes porous with a porosity of 40% or more. *
- the surface is easily peeled because the photocatalyst particles have a structure in which S appears on the outermost surface. There was a tendency.
- the present invention has been made in view of the above circumstances, and produces a functional material having a good photocatalytic activity even in a low-temperature heat treatment.
- the purpose of the present invention is to provide a photocatalytic functional material having a high mechanical strength on the surface of the functional material.
- the photocatalytic functional material of the present invention includes a photocatalyst, an electron-trapping metal, and a photo-resistant matrix. It is characterized by having an ephemeris (photocatalyst functional layer).
- the photocatalyst reaction on the photocatalyst can be understood as proceeding as follows: First, as the first stage, photons are broken down into electrons and holes. The next reaction is raw ,
- equation (3) is consistent with the next reaction shown in equation (4) where the holes and electrons recombine and return to photons.
- the photocatalyst is transferred to the light-resistant matrix because the photocatalytic functional layer contains the electron-capturing metal. Nevertheless, the function of the photo-etching medium such as armor, antibacterial, etc. is exhibited.
- Figure 12 shows the potential energy levels of the valence electrons and the conduction electrons of each type of semiconductor (Photocatalyst J, Asaishoku Shoten, p.54, 1988).
- the electrons of the valence electron are excited by the conduction flf, and the electron with the potential energy level at the lower end of the conduction layer and the valence electron.
- Emperor A hole having a potential energy level is generated, and a potential energy level having a hole is an acid.
- the holes are from H * 0.
- the reduction reaction of gold having a generation level that is more positive than the general energy level, that is, the B element trapping gold ion The bombed gold is reoxidized by the active acid *, so that the electron-trapping metal ions are erased *. I will not run out.
- Table 1 shows the potential energy levels of the electrons of the various photocatalysts and the poten- tials of reactions (ji-element reactions) that receive typical electrons. Indicates the level of the energy.
- the potential energy level of the electrons is 10.4 IV.
- a metal having a more positive generation level that is, Cu, Ag, Ru, Pd, Pt, Re, Ir, ⁇ , Fe, Sn etc. can be used for good
- the ultraviolet ray arrival depth refers to the depth at which the ultraviolet ray can reach the surface without being absorbed into the surface layer.
- Has a wavelength that is a little larger than the forbidden width of the Emperor ( h / ⁇ , h is the blank constant and JL is the wavelength of light).
- E g is the forbidden margin of the Emperor.
- the depth of arrival d of spectroscopy in the semiconductor is expressed by the reciprocal of ⁇ .
- the surface layer of the present invention is composed of semiconductors such as photocatalyst, edible matrix, and gold, and it is considered that UV absorption of photocatalyst is large. Assuming that the volume ratio of the photocatalyst in the Ha layer and X is X, the ultraviolet ray arrival depth dv is
- Table 2 shows the forbidden widths of typical photo-etching media.
- the photocatalyst may be in the form of a particle, a film, or a solid solution. What is the target
- the photocatalytic functional layer contains a small amount of particles that do not have a photocatalytic action.
- fillers such as gold and its oxides, which are added to improve surface smoothness, can be used.
- the degree of crystallization of the photocatalyst particles was as follows: the photocatalyst particles peeled off from the photocatalyst functional layer were subjected to powder X-ray diffraction under the condition of 50 kV—300 ⁇ . Only the largest peak of the crystal is detected
- photocatalyst particles examples include Tio, ZnO, SrTio, FeO., Cds, CdSe, WO, and FeTio. ,, G a P
- Oxides and non-oxides such as CdO, Sn0,, S1C, InP, etc. CdFe0, Bi, 0i. MoSi, In * 0 *. It is possible to raise the semiconductor by the force $ , among which T i O, Z n O, S r T i O,, CdS, CdSe, Gap, MoS, SiC, etc. are higher than the water purple generation position when the conduction band position is represented by a band model. Since it is above and the upper end of the valence valley is below the acid-purple potential, it has more energy than the band gap.
- Irradiation with light having a wavelength of less than 10 nm will generate an active acid, and the action of armor protection, antibacterial action, or antifouling action by the decomposition of organic compounds by acidification. It is superior in the point of occurrence, and Fe0, W0
- Anoxase is useful in that 0, Zn0, Sn0, etc. can be obtained at a low raw material price, and it is easy to obtain more active fine particles.
- the particles having an inorganic photocatalytic effect of the present application may be used alone or in combination of two or more. May be used as a mixture
- the light-resistant matrix consists of inorganic materials and resin that are difficult to decompose by light.
- Examples of photo-corrosion resistant matrices that contain resin whose side chains are decomposed by light but whose main chain is not decomposed by light are as follows. It is as follows.
- Silica silicates, glass, translucent aluminum, glaze, etc. It is preferable that it has translucency.
- Tetrafluoroethylene resin Tetrafluoroethylene copolymer, tetrafluoroethylene copolymer, tetrafluoroethylene Ethylene hexafluoropropylene vinylidene fluoride copolymer, acrylic Silicone resin, etc.
- the resin is partially decomposed, but the main ffl is not.
- thermosetting resin examples include silicone resin, fluorine resin and the like, and colored resin may be used.
- a light-curing resin may be used instead of the heat-setting resin, where the light-hardening resin is a light containing ultraviolet rays. These are cells that harden by being illuminated, with the advantage that photocurable resins do not require heat treatment. Therefore, it is particularly useful for the combination of resin bases having no heat resistance.
- Electron-capturing metal particles may be present in a state of being basically mixed with photocatalyst particles or thermosetting resin, or may be functional. Even if it is exposed on the outermost surface of the wood
- the metal particles since the metal particles exist in contact with the outside air, they are deodorized and deodorized by the metal particles themselves during the light irradiation due to the catalytic action of the metal particles themselves. It is possible to promptly proceed a reaction based on the application of a light-it medium such as an oxidation-decomposition reaction of an odorous gas, for example.
- a light-it medium such as an oxidation-decomposition reaction of an odorous gas, for example.
- S odor gas is adsorbed on the gold particles that have been exposed to B on the surface, and then the active oxygen and odor gas generated based on the action of the photocatalyst. causes a flat surface reaction on the surface of the photocatalytic functional layer, decomposing the odorous gas, and this reaction (cycle) proceeds rapidly.
- the reaction is then promoted and in this cycle neither the photocatalyst nor the gold particles produce any chemical changes.
- the reaction is tactile It is a medium reaction
- gold particles since the gold particles are brought into contact with the outside air, the operation of the gold particles is expected even when the light is not illuminated.
- gold particles (copper, etc.) have the function of absorbing odorous substances such as methyl mel-butane, and so on. It has an effect of deodorization, etc.
- the inner side of the protection is due to the adsorption of bad odor components, so it is effective to exceed the amount of moisture absorbed. Therefore, it is preferable to use light irradiation for bottles that are to be used for a long period of time, and furthermore to use silver or other metal. Is preferred because the metal itself has some degree of bacterial activity.
- the mixing ratio between the thermosetting resin and the photocatalyst in the photocatalyst functional layer is 5 to 5. It is preferable that the angle is 803 ⁇ 4. Furthermore, the ratio is more preferably in the range of 10 to 503 ⁇ 4. ⁇ If the ratio is 5 or less, The shochu on the surface is not sufficiently abrasion, and if it is 80 or more, the absolute amount of the photocatalyst particles is small, so the photocatalyst operation is not sufficient, This is because sufficient odor control and antibacterial effect may not be obtained as a medium function material.If this ratio is 10% or more, it is more resistant. Good wear properties, good antibacterial effect (R30) below 50 ⁇ ,
- the photocatalyst functional material includes a base material, a photocatalyst, an electron-capturing metal fixed on the surface of the base material, and It is characterized by providing a photocatalyst function including a tactile matrix, and a photocatalyst.
- the base material K is made of m-porcelain, ceramic, enamel, metal, glass, thermosetting resin, thermoplastic resin, or the like. Compounds such as any of the above may be basically anything, any shape of the base material may be used, such as spheres »Cylinders, cylinders, tiles, S Simple shapes such as wood, flooring, etc., as well as complex shapes such as sanitary porcelains, wash basins, bathtubs, tableware, pans, etc. It doesn't matter
- the thickness of the optical Ut medium functional layer is preferably 0.1 to 20 ⁇ m, more preferably 0.1 to 5 «, and 0.2 to 1 Wa. The most preferred is 0.1. If the temperature is less than 0.1 ⁇ >, sufficient photocatalytic action tends to not be realized, and if it is larger than 5 ⁇ n, When the wavelength exceeds 20 ⁇ n, cracks are likely to be generated in the layer.
- This photocatalyst functional layer may be formed directly on the base material, or may be formed via a middle M layer made of a binder.
- the layer made of the agent has a higher strength than the film made of a mixture of the photocatalytic matrix and the photocatalyst particles, and has a higher contact property. Therefore, the base material and the photocatalyst functional layer can be firmly bonded through such an intermediate layer, and the peeling resistance is improved. Can be improved
- the intermediate layer need not be of the same type as the matrix (resin, etc.) in the photocatalytic functional layer.
- the tactile matrix is made of a resin with high light resistance
- the resin to be inserted is slightly less light resistant than the resin with lower light resistance. It may be made of inexpensive resin, or it may use colored resin for its design, and the middle ffl layer like this can be used.
- the amount of light-resistant matrix (thermosetting resin, gall, etc.) in the photocatalytic functional layer can be reduced, and the photocatalyst particles can be reduced. Since it is possible to concentrate the distribution of the seeds closer to the vicinity of Table II, the photocatalytic activity becomes more active, and the sterility and bactericidal properties are improved. Protection Improve functions such as sex
- the binder is preferably one that does not deteriorate when it comes into contact with the photocatalyst in the photocatalyst function calendar.
- Examples of the binder are as follows. .
- Sekiguchi resin Sekiguchi resin, Shirazan resin, Fluoro resin (tetrafluoro) Ethylene resin, tetrafluoroethylene Hexafluorobutyl mouth pyrene copolymer, tetrafluoroethylene Sulfurov mouth Virene vinylidene fluoride copolymer, fluorovinyl resin, fluorovinyl resin, black mouth Trifluoroethylene resin, vinyl ether, fluorinated resin, vinyl copolymer, vinyl ester, fluorinated resin Acrylate copolymers), acrylic silicone resin, silica-based glass, boron-based glass, glaze, frit, etc.
- the photocatalyst functional film of the present invention comprises a flexible film-like base material, a photocatalyst, and an electroconductive medium fixed to the surface of the base material. It is characterized by having a child-capturing metal layer and a photocatalytic functional layer containing a photo-resistant matrix.
- Laminate treatment is to apply a contact agent and then apply various films such as separately manufactured PVC film. If the deodorization and fungal film can be obtained by manipulating the process of wearing, it can be performed without the need for a special production line. Mineral treatment can provide deodorant and antibacterial functions to building materials made of stacked steel plates.
- the method of manufacturing this film is, for example, that the film is arranged opposite to a predetermined IH ⁇ inclined slightly downward from the liquid discharge section.
- the method of passing a liquid material that has lost the photocatalyst, the thermosetting resin, and the electron-capturing metal to the ra of the hot plate can be cited.
- the paint-like composition of the present invention includes a photocatalyst, an electron-capturing metal, and a fluid-state shochu-tactile matrix. This is useful when you want to add a new function, such as deodorization or antibacterial, to a finished tile or the like.
- prepare the B agent containing the hardening resin hardening agent mix it and apply it at the site, where the thermosetting resin will be cured at room temperature. If it is, it can be widely used outside and inside the house.
- thermosetting resin base eg silicazol
- electron-capturing gold gold
- Reagent B is prepared with a hardener that can cause a hardening polymerization reaction with the main agent in solution A (for example, if the main agent in solution A is silicazol, For example, Trim.
- a process for heating and hardening the liquid material applied to the surface of the base material A process for heating and hardening the liquid material applied to the surface of the base material.
- thermosetting resin a liquid containing the main component of the thermosetting resin is prepared at a time, and then a hardening agent is added to the liquid.
- thermosetting resin a thermosetting resin
- light-curing resin By using a curable resin, it is possible to irradiate light containing ultraviolet rays instead of heat-treating a liquid-coated base material.
- Another method of manufacturing a photocatalyst functional material according to the present invention includes a process of adjusting a sol containing photocatalyst particles to an SS, and an electron trapping process for the sol.
- the photocatalyst particles should be singly dispersed, such as in the case of anatase-type oxidized titanium. Since point B has a pH of 6.5, disperse with acid or alkaline, and in order to improve the dispersibility, use a dispersant (peptizer). ) Or a surface active agent or a surface treatment agent may be added.
- the solvent used for the photocatalyst sol solution may be basically any solvent. In general, water and ethanol are often used in the process of mixing photocatalyst particle zol and gold ⁇ liquid containing liquid.
- the gold-containing solution adjusted to almost the same pH as that of the solution to the photocatalytic zol solution, and then add the PH of the gold-containing solution to the photocatalyst zol solution. Same as liquid This is done by preventing the zeta potential in the solution of the photocatalyst zol from changing so much that it is a single part of the photocatalyst zol.
- the metal-containing liquid is used when the photocatalyst particles are irradiated with light and tt elements and holes are generated.
- a solution consisting of a solute containing a metal and a solvent that can capture the particles, and more specifically, the solution K is silver usate, copper acetate, or the like. Copper sulphate, 1st saturated net, 2nd salted copper, copper carbonate, 1st salted
- Five Examples include iron, ferric ferric oxide, chloroauric acid, sodium chloride, and the like, and water, water, propanol, and the like as the solvent.
- a process for diluting the suspension of a mixture of sol and resin with a solvent can be added.
- the diluent used here has a low viscosity. (0.1 to 10 cps fe degree), which is intended to make the coating on the base material easier and to increase the speed of this purpose. If anything, it is basically anything, for example, ethanol, propanol, water, etc.
- a drying process may be included in the process of applying a liquid containing a hardening agent to a base material and the process of heating and hardening the liquid.
- the method of applying the liquid material to which the hardener is added to the base material may be basically any method, but it is not a problem. Or the single-ring method is relatively simple.
- the heating and hardening process is 100 °C and may be carried out for a long time at a low temperature, or 100 °C or more and the base material and thermosetting resin.
- the temperature of the shochu may be shorter than the temperature of the thermosetting tree, because the temperature of the photocatalyst particles is generally higher than that of the thermosetting tree body.
- the photocatalyst particles were found to be lower than the lower surface of the base material. It is hoped that it will not be buried in.
- the method of fixing the trapping metal layer to the photocatalytic functional layer is the following in addition to the method of mixing the metal layer with the photocatalyst or thermosetting hardener. Can also be by law, Immediately, a mixed layer of the photocatalyst and the resin is formed on the base material.After that, the liquid containing the electron-capturing metal is passed through the mixed layer. Use (painting etc.)
- the gold is fixed to the surface of the base material.
- the metal-containing liquid the above-mentioned liquids can be used, and as a solvent for the liquid-containing liquid, particularly when ethanol is used, water and water are used. Compared to water, the surface tension is low and wettability is low because the drying speed is faster than that of water, which contributes to the productivity improvement of the gold coating process. It is not harmful unlike other volatile solvents such as ether, acetate, methanol, etc., in that it improves the carrying efficiency of metal. I like it in some respects.
- the process of fixing the metal to the surface of the base material by irradiating the metal-coated surface with light containing ultraviolet rays involves drying the coated metal-containing solution. It may be done after drying, and in this case, the efficiency of the endurance of the metal can be improved as compared with the case where it does not dry.
- the light source that emits light containing ultraviolet rays only needs to have an ultraviolet ray illuminance that does not damage the base resin.
- fluorescent lamps, BL lamps, ultraviolet lamps, xenon lamps, mercury lamps, septum lights, etc. can be used. ⁇ department field if the number at ra, the ultraviolet-ray irradiation of 1 7 m W / cm 2 not ⁇ Oh Ru's is not the good or in. was but One is I water silver lamp in ⁇ case of this Are generally unsuitable,
- the method of irradiating the light including the ultraviolet rays is preferably such that the sample is set up so that the light is illuminated vertically on the illuminated surface. Because the efficiency is good,
- the irradiation time of light including ultraviolet kneading is generally on the order of a few seconds to a few hours. If the irradiation time is too short, the above metal is fully reduced. Conversely, if the length is too long, the electron trapping effect of the above-mentioned gold particles will be weak, and if a light source with a large UV illuminance is used, There is a risk that the resin material will be damaged. This is because that ⁇
- the manufacturing method of the photocatalyst functional material of another aspect of the present invention includes a process of preparing a zole containing the photocatalyst particles, and an electron trapping process for the zol.
- a step of heating and hardening the liquid material applied to the surface of the base material includes a process of preparing a zole containing the photocatalyst particles, and an electron trapping process for the zol.
- the mixed liquid is used between the step of mixing the solution containing the photocatalyst zol and the solution containing the Xiaozi-capturing metal anion and the step of adding the resin.
- This process involves fixing the gold to the surface of the photocatalyst particles by irradiating light containing ultraviolet rays to the surface. It is recommended that the solution be stirred while the solution is being stirred, and that the metal is applied to the zole of the object S, which has a photocatalytic function.
- the stirring device used in this case includes, for example, a supersonic wave vibrator, a supersonic wave generator, a homogenizer, and the like. Can be used,
- Light sources that emit light including ultraviolet rays can be used in the same manner as described above, and the method of irradiating light including ultraviolet rays is also fundamental.
- the light source and the distance ⁇ is a number c B ⁇ number 1 0 cn extent of the container is not good.
- top surface of the near-to technique Ru and the light source or al onset to that heat by Ri specimen soluble liquid is dry Ku you This is because the illuminance decreases when it is too far away, and the illuminating time depends on the illuminance of the light source, but it takes several seconds to several ten minutes. When illuminated, the gold is firmly attached to the photocatalyst particles.
- Figure 1 shows the amounts of thermosetting resin added and shochu in Examples 1 and 2. This is a graph showing the relationship between wear and wear.
- thermosetting resin is a graph showing the relationship between the addition amount of the thermosetting resin and the photoactivity in Examples 1 and 2,
- FIG. 3 is a graph showing the relationship between the added amount of the thermosetting resin and the M-relation between the abrasion resistance and the photoactivity of the thermosetting resin in Example 3.
- Figure 4 is a graph showing the relationship between the amount of thermosetting resin added and the amount of shochu * abrasion and photoactivity in the wiping test of Example 4.
- FIG. 5 is a graph showing the relationship between the resin ratio and the photoactivity of the photocatalytic functional layer in Example 5;
- FIG. 6 is a graph showing the relationship between the resin ratio of the photocatalytic functional layer and the viability of Escherichia coli in Example 5.
- FIG. 7 is a graph showing the deodorization of the metal-free sample in the test of Example 6.
- Figure 8 is a graph showing the armor resistance of the copper-added sample in the wiping test of Example 6,
- FIG. 9 is a graph showing the M relationship between the K thickness of the photocatalyst function W and the luminous intensity in the test of Example 6.
- 121 10 is a diagram showing the results of an Auger analysis on the sample surface of Example 1.
- FIG. 11 is a graph showing the relationship between the weight ratio of titanium oxide and the surface hardness of the photocatalytic functional layer in Example 3.
- Fig. 12 shows the relationship between the photocatalyst structure and the energy levels.
- Titanium oxide with an average particle size of 0,01 n (dissolved K concentration 0% by weight , Nitric acid dispersion type, pH 0.8, Nissan Chemical Co., Ltd. TA15) as a main ingredient of silicacasol (purchased ⁇ 13% by weight%, said (Glass force A) was added and diluted with propanol. Then, as a hardening agent, trimethylsilylsilane (Nippon Gohsei) was added. A glass (B) made of synthetic rubber was added, and the solution was applied to a 10 cm square aluminum substrate. After that, 1
- Fig.10 The results of the Auger analysis on the sample surface of this step are shown in Fig.10,) indicates the analysis results of the outermost layer, and (b) and (c) indicate the results.
- the titanium source purple is almost on the outermost layer.
- titanium oxide particles are almost completely removed from the outermost layer. It has been found that they exist almost completely without being exposed, and therefore, in the case of the present invention, a normal surface reaction catalyst other than the light catalyst is used.
- the thickness of the optical tt medium functional layer obtained in this manner was about 0.8 ⁇ , and the crystal form of titanium oxide was an anase.
- the weight ratio of silica and trimethyl thimethylsilan was adjusted to be 3: 1 and the amount of copper fixed on the surface of the material Is 0.5 to 3 ug / cm * (equivalent to 0.06 to 0.04 weight equivalent to the solid weight of oxidized titanium and resin).
- the obtained samples were evaluated for odor resistance and female resistance to peeling, and for the evaluation of pit resistance, the following methods were used to determine the odor resistance.
- R 30 ' is an evaluation index of the armoring property obtained as follows: First, a methyl mercaptan gas having a degree of 3 ⁇ is obtained. , Into a 11 L glass container containing the sample, leave it for 1 and let the sample fill the sample with the gas. 1 day light irradiation (the light source (BLB lamp 4W) is arranged in a sample of 8 coi from the sample) to decompose the adsorbed gas into light. Inject melka butane gas into the container so as to have an initial concentration of 3 ppm, and measure the change of the swollenness 30 minutes after the start of the test.
- the light source the light source (BLB lamp 4W)
- the peeling resistance was evaluated by performing ffi dynamic abrasion using a plastic erasing rubber and comparing changes in the outer lining. It is shown below: O: No change for 40 round trips
- Hm Scratched by less than 10 times of sliding after 5 times
- HX Scratched by less than 5 times of sliding, peeling off layer containing photocatalyst Separation
- the deodorizing property is considered to be the effect of copper on the food and drink with R30 'in the case of resin alone (100%). Only shows a value of 10% or less.However, the photocatalyst particles have a weight of 80% or more. When this was done (resin content is less than 2 ⁇ ⁇ ), the protection characteristic was better than 5 ⁇ ⁇ .
- Example 2 (Middle layer, copper, coating method)
- a liquid obtained by mixing the sol and the trimethyloxymethylsilane at a weight ratio of 3: 1 to obtain a solution having a solution concentration of 20 weight ⁇ is 10 weight.
- the resin layer was laid on an aluminum substrate at the corner, dried at 150, and a resin layer (middle layer) with a film thickness of about 5 m was formed.
- a photocatalytic functional layer made of titanium oxide, resin and copper is formed on the middle layer surface in the same manner as in Example 1.
- the belly thickness of the photocatalytic functional layer was set to about 0.3 ⁇ .
- the photocatalyst particles (A) are formed by interposing a siloxane resin layer between the base material and the photocatalytic functional layer.
- the addition of matrix resin in an amount of about 5% by weight based on the sum of the weights of the (natases particles) and the matrix resin. And more than 10% by weight of the matrix resin relative to the sum of the weights of the photocatalyst particles and the matrix resin. With the addition, the peeling resistance became ⁇ .
- the deodorizing property is also 9 ⁇ ⁇ or more, which is a good result. Indicated .
- a resin layer having a thickness of about 5 im was formed in the same manner as in Example 2.
- Example 1 copper nitrate (19.6.65) was mixed with the aqueous solution and the titanium oxychloride used in Example 1. Then, the mixed solution was used in Example 1 for this mixed solution. And then dilute with ethanol, and then add the trimethyloxysilane used in Example 1. This liquid was applied to a 10 cm square aluminum substrate and dried at 150 * C to obtain a photocatalyst having a film thickness of about 0.3 n. A functional layer was formed and a sample was obtained, in which the weight ratio of silica gel and trimetoxymethylsilan was 3: 1. The crystal form of the titanium oxide was anatase, and the solid weight of copper acetate with respect to the total weight of the resin weight and the photocatalyst weight. Should be 2% ,
- the obtained samples were evaluated for deodorization, exfoliation, and surface hardness.
- Table IS hardness is the hardness measured by using a lead brush with different hardness from 6B to 9H to pull the surface of the material and to cause scratches. did .
- Fig. 3 The results relating to deodorization and shochu female sex are shown in Fig. 3.
- a siloxane resin layer was interposed in between, as in Example 2.
- the exfoliation property of the shochu is reduced by adding about 5% by weight of the matrix resin to the total weight of the photocatalyst particles and the matrix resin.
- the addition of 10% by weight or more of matrix resin to the sum of the weight of the photocatalyst particles and the matrix resin resulted in the resistance to peeling.
- the releasability was O
- the deodorant property was 8 ⁇ ⁇ or more when the photocatalyst particles were added by more than 10%, indicating a favorable result.
- the amount of matrix resin relative to the sum of the weight of photocatalyst particles and matrix V resin is 5% by weight. It has been found that good results are obtained when the weight is not more than 8 o and the weight ⁇ is not dropped, preferably 5 times or more and less than 50 weight%.
- Fig. 11 shows the results obtained by measuring the surface hardness. The sum of the weight of the photocatalyst particles and the matrix resin in the mixed layer of the photocatalyst particles and the resin is shown. If the matrix resin content is more than 10% by weight, the surface hardness is 5B or more, and the surface hardness is sufficient, and if it is more than 60% by weight, the surface hardness is Example 4 (hardening, harbor legal, medium-M layer existence, light irradiation at harbor meeting) where the hardness became more satisfactory than H
- a resin layer with an abdominal thickness of about 5 ⁇ m was formed on a 10-cm-square aluminum substrate by the same method as in Example 2 *.
- Example 3 the aqueous solution of copper sulfate used in Example 3 was mixed with titanium oxychloride, and the mixture was stirred with a 0.5 in W / c in BLB lamp. Illuminated for 15 minutes
- Example 2 After that, add the silica used in Example 1, dilute with ethanol, and use the trimethylsilicone used in Example 1. sheet was obtained run-a by adding the liquid-like material. the this liquid material was applied to the trees fat layer of the substrate, 1 5 0 ⁇ about 0 to grass 2 ⁇ in at. 3 mu [pi of A sample was obtained by forming the photocatalyst function JS, where the ratio of silicacas to trimetoxymethylsilane was 3: 1. The crystal form of titanium oxide was anatase, and the solid weight of acetic acid network was 2 weight based on the total weight of the resin and the weight of the photocatalyst. 3 ⁇ 4 3 ⁇ 4 , ,
- the obtained sample was evaluated for its deodorization and sculpting resistance, and the results are shown in Fig. 4.
- the results were as follows. With a siloxane resin layer interposed therebetween, a matrix of about 5% by weight with respect to the sum of the weight of the optical medium particles and the matrix resin is obtained. With the addition of the resin, the shochu resistance was reduced.In addition, the exfoliation of the shochu was enhanced by the addition of the matrix resin containing 10% by weight or more of photocatalytic particles. It became ⁇ . When the particles were added more than 50 weight%, the result was more than 90 °, and the results were good, and after all, as in Example 2, the light contact was good.
- Matrix resin is not less than 96 weights and not more than 96 weights, preferably less than 96 weights, based on the weight sum of the particles and the matrix resin. It has been found that good results are obtained when the weight is 5% by weight or more and 50% by weight or less, mm5 ( ⁇ . Port, mm ⁇ t).
- a resin layer with an abdominal thickness of about 5 m was formed on an aluminum substrate of 1 Ocm square with the same tR in the same way as in Example 2.
- Example 3 the aqueous solution of copper acetate and titanium oxychloride used in Example 3 were mixed, and then, the silica sol used in Example 1 was added. This was further diluted with ethanol, and the liquid substance was obtained by adding the trimiximethylsilan used in Example 1 to the liquid. The liquid was coated on the resin layer of the base plate and dried at 150 to form a mixed layer having a thickness of about 0.1 Um. A sample was obtained, in which the weight ratio of silica gel and trimethoxymethylsilan was adjusted to 3: 1 by weight.
- Weight of solid weight (weight of resin) and weight of solid weight of oxidized titanium sol (weight of photocatalyst) Varying the ratio in various ways (0%, 10%, 20%, 50%, 80%, 90%, in terms of the ratio of the resin weight to the total weight of the resin weight and the photocatalyst weight) 100%), and the weight of solids in the acetic acid network relative to the total weight of the resin weight and the photocatalyst weight varied in various ways (0%, 2%, 1%). 0 ⁇ ), and tested for its deodorant properties and bacterial te.
- R30 is the light that illuminates the belly-shaped surface of the sample in a 11-L glass container. 8 CB from the source (BLB lamp 4W), and place the inside of the container so that the initial concentration of methyl carbane gas is 3 ⁇ . Input, during light irradiation and Obtained by measuring the change in concentration three minutes after the hour
- Bacterial survival rate is less than 10%
- Fig. 5 shows the results of the deodorant property.
- the R30 value was even with resin 096. Less than 50%.
- the weight of the photocatalyst to 50% of the total weight of the resin weight and the photocatalyst is reduced.
- the R30 value was over 50%, and when copper was added by 10%, the light contact with respect to the total weight of the resin weight and the photocatalytic weight was found. Even when the weight of the medium was about 20%, the R 30 value showed a good value exceeding 5096.
- Figure 6 shows the results of the antibacterial activity.
- the thickness is about 0.1 ⁇ and no copper is added
- the light weight relative to the total weight of the resin weight and the photocatalyst weight is shown. Even if the catalyst weight is increased up to 80%, it can only be accelerated to ++, but at least 296 of copper is added.
- the antibacterial property of + + + is shown even if the photocatalyst weight is reduced to about 10% of the total weight of the resin weight and the photocatalyst weight.
- Example 6 ( ⁇ g 3 ⁇ 4 W)
- a resin layer of 5 ⁇ was formed on a 1 Ocm square aluminum substrate by the same method as in Example 2.
- Example 3 aqueous solution of the peroxidic acid network used in Example 3 and titanium oxychloride were mixed, and then the silicazol used in Example 1 was added. This was Further, after dilution with ethanol, the liquid used in Example 1 was added with the trimethoxymethyltinsilane to obtain a liquid substance. The liquid substance was obtained. Was coated on the resin layer of the above-mentioned substrate, dried at 150 and formed into photocatalytic layers having various film thicknesses to obtain a sample. The ratio of silica to trimethylsilan was adjusted so that the ratio of S to S was 3: 1.
- the weight ratio of the solid weight of tyrusylane (resin weight) to the solid weight of titanium oxyzole (photocatalytic S) was 50%.
- the solid weight of copper acetate is now 2% of the total weight of fat and photocatalyst *
- the obtained sample was measured for its deodorant properties and luminous intensity.
- Fig. 7 shows the experimental results of the deodorization properties without gold added, which were measured for comparison. If the film thickness is not more than 3 ⁇ as shown in the figure, R 3 0 does not exceed 50%.
- Figure 8 shows the experimental results of the deodorization when copper is added, where the white dots indicate the results under light irradiation and the white dots indicate the results under dark conditions.
- Fig. 9 shows the measurement results of the luminous intensity of the sample, where the luminous intensity was measured by using a luminous intensity meter (manufactured by Nippon Denshoku Industries Co., Ltd., VGS-10). It was measured by the method of JIS ⁇ 8741 at an angle of incidence of 60 ', and the luminous intensity was less than 0.5 m when mixed with resin and photocatalyst when the film thickness was less than 0.5 m. It was found that there was good cross-slaughter, but it was very good for the outside K. Therefore, it is necessary to use gold in order to achieve both deodorant and luminous properties. It is preferable to add ⁇ .
- Example 7 (ffi, ⁇ )
- an aqueous solution of silver m-ate (70%) and the titanium oxide oxidized (used in Example 1, having a dissolution rate of 10 weight%, dispersing type of usic acid, PH 0. 8) was mixed, and the mixture was irradiated with a 0.5 mW / coa BLB lamp for 15 minutes while stirring, and then a zirconizol was added thereto. After diluting with ethanol, and then adding trimethyl methoxymethylsilane, a liquid was obtained. The liquid was removed from the above-mentioned base plate. The sample was coated on the resin layer and dried at 150 * C to form a mixed layer with a thickness of about 0.3 m, and a sample was obtained.
- the ratio of the weight ratio of toluene to the amount of trimethylsilylsilane was 3: 1, and the crystal form of titanium oxidized was anatase. , And the iris and trimethyl
- the weight ratio between the solid fi content (resin weight) of silane and the solid weight weight of titanium oxyzol (photocatalytic weight) was set to 50%.
- the solid weight of solid silver nitrate based on the sum of the weight of the catalyst and the weight of the photocatalyst is
- a cell layer with a thickness of about 5 ⁇ m was formed on an aluminum substrate of 1 O cn angle by the same method as in Example 2.
- Example 3 the aqueous solution of copper ft-acid and the solution of titanium oxychloride used in Example 3 were mixed, and then the trimethyl methine used in Example 1 was mixed. After adding lucirane and diluting with ethanol, a liquid was obtained. The liquid was applied on resin ⁇ of the above-mentioned base plate, and then coated with 150 ⁇ m. Dry at * 0 and light with a thickness of 0.5 ⁇ A sample was obtained by forming a catalyst functional layer. The solid weight of trimethoxymethylsilan (resin weight) and the weight of oxidized titanzol were determined. The weight ratio of the shape weight (photocatalyst weight) was 50%. The solid weight of the ffl acid was based on the total weight of the resin and the weight of the photocatalyst. 2%.
- the oxidized titanium sol used in Example 1 was added to a water-dispersible fluorinated resin coating solution (tetrafluoroethylene, hexafluoroethylene). Fluoropropylene, vinylidene fluoride copolymer, dissolved K concentration 50% by weight, Sumitomo SL-Em, THV350C) The mixture was added, diluted with ethanol to obtain a liquid, which was applied to a 10 cm square aluminum substrate, and coated with 150. Dried to form a 0.5 ⁇ m thick S-layer. • Solid weight of fluorinated resin (solid weight) and titanium oxide solid weight.
- the weight ratio of the amount was set to 50%, and a copper acetate (199.65) aqueous solution was coated on the mixed layer. After this, a 0.5 nW / cm 'BLB lamp is irradiated for 2 minutes.
- the abdominal thickness of the photocatalyst function layer obtained in this way was about 0.8 mm, and the crystal form of titanium oxide was A
- the mass fixed to the solid is 3 to 10 / xg / cm * (0.04 to 0.12 mass% phase with respect to the solid weight of the titanium oxide and the resin).
- Example 10 (hollow substrate) After heating the stainless steel base plate to 600 ⁇ C, the glaze was coated and a hollow substrate of 1 O cm square was made.
- the medium WI calendar and the photocatalyst functional layer were formed on the low substrate by the same method as in Example 2; however, the weight of the photocatalyst was the same as that of the photocatalyst. 50% with respect to the sum of the weight with the resin,
- the obtained wipes were evaluated for odor resistance (R30) and abrasion resistance, as a result, the odor resistance was 84%, and the ware resistance was O%. And the results of the present invention showed good results.
- the present invention provides a good photocatalytic material which can be manufactured even by a low-temperature heat treatment of less than 300.
- the photocatalyst function can be added to the base material in various forms by a simple construction method such as pasting or coating on the site.
- a resin-based matrix has not yet been obtained, and it has a balance between exfoliation of shochu and photocatalytic function.
- a photocatalyst functional material with excellent characteristics can be provided.
Description
Claims
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP95938018A EP0792687B1 (en) | 1994-11-16 | 1995-11-16 | Photocatalytic functional material and method of production thereof |
AT95938018T ATE231031T1 (de) | 1994-11-16 | 1995-11-16 | Photokatalytisch funktionelles material und methode zu dessen herstellung |
CA 2204768 CA2204768C (en) | 1994-11-16 | 1995-11-16 | Photocatalytic functional material and method of production thereof |
DE69529420T DE69529420T2 (de) | 1994-11-16 | 1995-11-16 | Photokatalytisch funktionelles material und methode zu dessen herstellung |
JP51592896A JP3282184B2 (ja) | 1994-11-16 | 1995-11-16 | 光触媒機能材及びその製造方法 |
US08/849,645 US6191062B1 (en) | 1994-11-16 | 1995-11-16 | Photocatalytic functional material and method for producing the same |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31899594 | 1994-11-16 | ||
JP6/318995 | 1994-11-16 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1996014932A1 true WO1996014932A1 (fr) | 1996-05-23 |
Family
ID=18105327
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP1995/002340 WO1996014932A1 (fr) | 1994-11-16 | 1995-11-16 | Materiau fonctionnel photocatalytique et son procede de production |
Country Status (9)
Country | Link |
---|---|
US (1) | US6191062B1 (ja) |
EP (1) | EP0792687B1 (ja) |
JP (1) | JP3282184B2 (ja) |
KR (1) | KR970706901A (ja) |
CN (1) | CN1070736C (ja) |
AT (1) | ATE231031T1 (ja) |
DE (1) | DE69529420T2 (ja) |
ES (1) | ES2186733T3 (ja) |
WO (1) | WO1996014932A1 (ja) |
Cited By (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10128229A (ja) * | 1996-11-01 | 1998-05-19 | Toto Ltd | 防汚性膜構造材 |
EP0824127A3 (en) * | 1996-08-14 | 1998-05-27 | Japan Synthetic Rubber Co., Ltd. | Water-type dispersion composition |
JPH10237397A (ja) * | 1997-02-24 | 1998-09-08 | Nitto Denko Corp | 粘着テープ |
EP0866101A1 (en) * | 1996-10-08 | 1998-09-23 | Nippon Soda Co., Ltd. | Photocatalytic coating composition and photocatalyst-bearing structure |
FR2766494A1 (fr) * | 1997-07-22 | 1999-01-29 | Rhodia Chimie Sa | Dispersion de particules de titane comprenant un liant a base d'un polyorganosiloxane |
JPH11227091A (ja) * | 1998-02-13 | 1999-08-24 | Ne Chemcat Corp | 光触媒担持基板の製造法 |
JPH11291408A (ja) * | 1998-04-06 | 1999-10-26 | Shin Etsu Chem Co Ltd | 親水性塗膜を有する物品 |
JP2001105535A (ja) * | 1999-10-13 | 2001-04-17 | Hiraoka & Co Ltd | 変退色防止性に優れた着色シート |
JP2001113640A (ja) * | 1999-10-15 | 2001-04-24 | Hiraoka & Co Ltd | 防汚性シート |
US6228480B1 (en) | 1995-06-19 | 2001-05-08 | Nippon Soda Co., Ltd. | Photocatalyst-carrying structure and photocatalyst coating material |
JP2001232215A (ja) * | 2000-02-25 | 2001-08-28 | Nippon Soda Co Ltd | 抗菌及び防黴効果を有する光触媒担持構造体 |
JP2001327872A (ja) * | 2000-05-24 | 2001-11-27 | Cleanup Corp | 光触媒性被膜及びその製造方法 |
JP2002045705A (ja) * | 2000-08-08 | 2002-02-12 | Nippon Soda Co Ltd | 光触媒担持構造体及び光触媒層形成用組成物 |
JP2003181998A (ja) * | 2002-09-24 | 2003-07-03 | Hiraoka & Co Ltd | 変退色防止性に優れた着色シート |
JP2008006389A (ja) * | 2006-06-30 | 2008-01-17 | Takiron Co Ltd | 光触媒部材 |
JP2011020009A (ja) * | 2009-07-13 | 2011-02-03 | Hokkaido Univ | 揮発性芳香族化合物分解用光触媒体および光触媒機能製品 |
JP2011031136A (ja) * | 2009-07-30 | 2011-02-17 | Toto Ltd | 光触媒塗装体、および光触媒コーティング液 |
JP2015192983A (ja) * | 2014-03-24 | 2015-11-05 | Toto株式会社 | 光触媒塗装体およびそのための光触媒コーティング液 |
CN106824293A (zh) * | 2017-03-06 | 2017-06-13 | 东北大学秦皇岛分校 | 一种纳米二氧化钛光催化降解剂及其制备方法 |
Families Citing this family (61)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09234375A (ja) | 1996-03-01 | 1997-09-09 | Mitsubishi Paper Mills Ltd | 光反応性有害物除去材 |
US6027766A (en) | 1997-03-14 | 2000-02-22 | Ppg Industries Ohio, Inc. | Photocatalytically-activated self-cleaning article and method of making same |
US7096692B2 (en) * | 1997-03-14 | 2006-08-29 | Ppg Industries Ohio, Inc. | Visible-light-responsive photoactive coating, coated article, and method of making same |
KR100313891B1 (ko) * | 1999-05-27 | 2001-11-15 | 구자홍 | 광촉매필터, 그 제조방법 및 그를 이용한 공기정화장치 |
JP2001080974A (ja) * | 1999-09-08 | 2001-03-27 | Fuji Photo Film Co Ltd | 複合基板材料およびその製造方法 |
TW539579B (en) * | 1999-09-08 | 2003-07-01 | Showa Denko Kk | Photocatalytic titanium dioxide powder, process for producing same, and applications thereof |
US6303183B1 (en) | 1999-11-08 | 2001-10-16 | Aos Holding Company | Anti-microbial porcelain enamel coating |
KR200182489Y1 (ko) * | 1999-12-10 | 2000-05-15 | 김승현 | 광촉매에 의한 항균기능이 부여된 조명기구 |
US6569520B1 (en) † | 2000-03-21 | 2003-05-27 | 3M Innovative Properties Company | Photocatalytic composition and method for preventing algae growth on building materials |
US6921579B2 (en) * | 2000-09-11 | 2005-07-26 | Cardinal Cg Company | Temporary protective covers |
CA2422035A1 (en) | 2000-09-11 | 2002-03-21 | Cardinal Cg Company | Hydrophilic surfaces carrying temporary protective covers |
EP1360156A1 (en) | 2001-02-08 | 2003-11-12 | Cardinal CG Company | Edge treatments for coated substrates |
US20050126428A1 (en) * | 2001-04-25 | 2005-06-16 | Tai-Kyu Lee | Photocatalytic coating material having photocatalytic activity and adsorption property and method for preparing the same |
FR2824846B1 (fr) * | 2001-05-16 | 2004-04-02 | Saint Gobain | Substrat a revetement photocatalytique |
EP1426107A1 (en) * | 2001-06-15 | 2004-06-09 | Andes Electric Co., Ltd. | Photocatalyst material and method for preparation thereof |
US7718144B2 (en) | 2002-02-20 | 2010-05-18 | Monzyk Bruce F | Photolytic cell for providing physiological gas exchange |
WO2003011359A2 (en) * | 2001-08-01 | 2003-02-13 | Monzyk Bruce F | Artificial pulmonary capillary |
US6902813B2 (en) * | 2001-09-11 | 2005-06-07 | Cardinal Cg Company | Hydrophilic surfaces carrying temporary protective covers |
US6679978B2 (en) | 2002-02-22 | 2004-01-20 | Afg Industries, Inc. | Method of making self-cleaning substrates |
EP1512728B1 (en) * | 2002-05-30 | 2014-01-01 | Toto Ltd. | Photocatalytic coating material, photocatalytic composite material and process for producing the same, self-cleaning water-based coating compositions, and self-cleaning member |
US7138182B2 (en) | 2002-07-31 | 2006-11-21 | Cardinal Cg Compay | Temperable high shading performance coatings |
US20040149307A1 (en) * | 2002-12-18 | 2004-08-05 | Klaus Hartig | Reversible self-cleaning window assemblies and methods of use thereof |
EP1579025B1 (en) * | 2002-12-31 | 2010-09-29 | Cardinal CG Company | Coater having substrate cleaning device and coating deposition method employing such coater |
JP2004288898A (ja) * | 2003-03-24 | 2004-10-14 | Canon Inc | 太陽電池モジュールの製造方法 |
US20040224145A1 (en) * | 2003-05-05 | 2004-11-11 | Weir John Douglas | Self-decontaminating or self-cleaning coating for protection against hazardous bio-pathogens and toxic chemical agents |
CN1311105C (zh) * | 2003-10-22 | 2007-04-18 | 顺德市凯纳方实业有限公司 | 复合光催化抗菌泡沫金属的生产方法 |
US20050154030A1 (en) * | 2003-12-12 | 2005-07-14 | Microban Products Company | Antimicrobial composition |
US7294404B2 (en) * | 2003-12-22 | 2007-11-13 | Cardinal Cg Company | Graded photocatalytic coatings |
WO2005088351A2 (en) * | 2004-03-17 | 2005-09-22 | Thorkild Andersen | Contact lens, container and insert for avoiding infection of the eye |
US7354624B2 (en) * | 2004-05-28 | 2008-04-08 | Ppg Industries Ohio, Inc. | Multi-layer coatings and related methods |
US7354650B2 (en) * | 2004-05-28 | 2008-04-08 | Ppg Industries Ohio, Inc. | Multi-layer coatings with an inorganic oxide network containing layer and methods for their application |
US7959980B2 (en) * | 2004-05-28 | 2011-06-14 | Ppg Industries Ohio, Inc. | Hydrophilic compositions, methods for their production, and substrates coated with such compositions |
WO2006017349A1 (en) | 2004-07-12 | 2006-02-16 | Cardinal Cg Company | Low-maintenance coatings |
DE602005024993D1 (de) * | 2004-10-04 | 2011-01-05 | Cardinal Cg Co | Dünnfilmbeschichtung und technologie zum zeitweiligen schutz, isolierverglasungseinheiten und dazugehörige verfahren |
US20060096614A1 (en) * | 2004-11-08 | 2006-05-11 | Krisko Annette J | Surface treating methods, compositions and articles |
JP2008520525A (ja) | 2004-11-15 | 2008-06-19 | 日本板硝子株式会社 | 配列構造を有するコーティングの蒸着方法および設備 |
US7923114B2 (en) * | 2004-12-03 | 2011-04-12 | Cardinal Cg Company | Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films |
US8092660B2 (en) * | 2004-12-03 | 2012-01-10 | Cardinal Cg Company | Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films |
JP3965480B2 (ja) * | 2004-12-16 | 2007-08-29 | Toto株式会社 | 複合材、コーティング液および複合材の製造方法 |
US7438948B2 (en) * | 2005-03-21 | 2008-10-21 | Ppg Industries Ohio, Inc. | Method for coating a substrate with an undercoating and a functional coating |
US7342716B2 (en) | 2005-10-11 | 2008-03-11 | Cardinal Cg Company | Multiple cavity low-emissivity coatings |
US20070141319A1 (en) * | 2005-12-21 | 2007-06-21 | Shulong Li | Photocatalytic substrate and process for producing the same |
JPWO2007097284A1 (ja) * | 2006-02-20 | 2009-07-16 | 多摩化学工業株式会社 | 均一分散性光触媒コーティング液及びその製造方法並びにこれを用いて得られる光触媒活性複合材 |
US7989094B2 (en) | 2006-04-19 | 2011-08-02 | Cardinal Cg Company | Opposed functional coatings having comparable single surface reflectances |
US20080011599A1 (en) | 2006-07-12 | 2008-01-17 | Brabender Dennis M | Sputtering apparatus including novel target mounting and/or control |
US8017247B2 (en) * | 2007-03-30 | 2011-09-13 | Alcoa Inc. | Self cleaning aluminum alloy substrates |
US7910220B2 (en) * | 2007-07-25 | 2011-03-22 | Alcoa Inc. | Surfaces and coatings for the removal of carbon dioxide |
EP2069252B1 (en) * | 2007-09-14 | 2016-11-23 | Cardinal CG Company | Low-maintenance coating technology |
US20090281207A1 (en) * | 2008-05-06 | 2009-11-12 | John Stratton | De-polluting and self-cleaning epoxy siloxane coating |
US8617665B2 (en) * | 2009-08-03 | 2013-12-31 | Alcoa, Inc. | Self-cleaning substrates and methods for making the same |
US8932978B2 (en) * | 2012-03-21 | 2015-01-13 | National Tsing Hua University | Photocatalyst composition and preparation for the same |
CN105618020A (zh) * | 2014-10-28 | 2016-06-01 | 睿泽企业股份有限公司 | 光催化剂基材的制作方法及制作设备 |
CN104974752B (zh) * | 2015-08-07 | 2017-03-22 | 京东方科技集团股份有限公司 | 白光荧光材料及其制备方法与应用 |
EP3387163B1 (en) | 2015-12-11 | 2020-04-29 | Cardinal CG Company | Method of coating both sides of a substrate |
CN106378136B (zh) * | 2016-08-17 | 2018-11-02 | 上海交通大学 | 超薄层钛酸铁修饰的三氧化二铁薄膜及其制备方法和应用 |
US10604442B2 (en) | 2016-11-17 | 2020-03-31 | Cardinal Cg Company | Static-dissipative coating technology |
CN107008336B (zh) * | 2017-03-31 | 2020-01-31 | 山东师范大学 | 一种光催化材料SnO2@Fe2O3的制备及应用 |
CN112121234A (zh) * | 2020-08-21 | 2020-12-25 | 中国科学院金属研究所 | 一种具有可控、持久抗感染骨科内植入物及其制备方法 |
CN112138217A (zh) * | 2020-08-21 | 2020-12-29 | 中国科学院金属研究所 | 一种具有可控、持久抗感染医用导管及其制备方法 |
CN112080940B (zh) * | 2020-08-21 | 2022-01-14 | 中国科学院金属研究所 | 一种具有持久抗菌、抗病毒特性的织物及其制备方法 |
CN112246239B (zh) * | 2020-10-23 | 2023-05-05 | 南京国豪环保材料科技有限公司 | 一种催化材料和具有甲醛分解功能的软木板 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01135842A (ja) * | 1987-11-21 | 1989-05-29 | Agency Of Ind Science & Technol | 光触媒固定膜 |
JPH0549861A (ja) * | 1991-08-21 | 1993-03-02 | Mitsui Eng & Shipbuild Co Ltd | シート状環境浄化装置 |
JPH05337337A (ja) * | 1991-12-21 | 1993-12-21 | Franz D Oeste | ガス,廃ガス,蒸気及びゾルの浄化方法及び装置 |
JPH081010A (ja) * | 1994-06-21 | 1996-01-09 | Mitsui Mining & Smelting Co Ltd | 貼付用光触媒体 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4892712A (en) * | 1987-09-04 | 1990-01-09 | Nutech Energy Systems Inc. | Fluid purification |
US5194161A (en) * | 1989-09-25 | 1993-03-16 | Board Of Regents, The University Of Texas System | Materials and methods for enhanced photocatalyzation of organic compounds with palladium |
JPH0483515A (ja) * | 1990-07-27 | 1992-03-17 | Hitachi Ltd | フロン系冷媒の分解方法 |
US5616532A (en) * | 1990-12-14 | 1997-04-01 | E. Heller & Company | Photocatalyst-binder compositions |
CN1036051C (zh) * | 1991-12-13 | 1997-10-08 | 中国科学院兰州化学物理研究所 | 用于净化空气的光催化剂 |
JP2667331B2 (ja) | 1992-03-13 | 1997-10-27 | 東陶機器株式会社 | 光触媒機能を有する部材及びその製造方法 |
US5595813A (en) * | 1992-09-22 | 1997-01-21 | Takenaka Corporation | Architectural material using metal oxide exhibiting photocatalytic activity |
JP3316048B2 (ja) * | 1992-11-06 | 2002-08-19 | 株式会社竹中工務店 | 建築材料及びその製造方法 |
AU676299B2 (en) * | 1993-06-28 | 1997-03-06 | Akira Fujishima | Photocatalyst composite and process for producing the same |
ES2191043T3 (es) | 1993-12-10 | 2003-09-01 | Toto Ltd | Material multifuncional dotado de funcion fotocatalitica y metodo para producirlo. |
KR100357482B1 (ko) * | 1993-12-10 | 2003-03-10 | 도토기키 가부시키가이샤 | 광촉매기능을갖는다기능재료및그의제조방법 |
TW431908B (en) * | 1994-02-07 | 2001-05-01 | Ishihara Sangyo Kaisha | Titanium oxide photocatalyst |
US5981425A (en) * | 1998-04-14 | 1999-11-09 | Agency Of Industrial Science & Tech. | Photocatalyst-containing coating composition |
-
1995
- 1995-11-16 WO PCT/JP1995/002340 patent/WO1996014932A1/ja active IP Right Grant
- 1995-11-16 AT AT95938018T patent/ATE231031T1/de not_active IP Right Cessation
- 1995-11-16 ES ES95938018T patent/ES2186733T3/es not_active Expired - Lifetime
- 1995-11-16 US US08/849,645 patent/US6191062B1/en not_active Expired - Lifetime
- 1995-11-16 CN CN95196286A patent/CN1070736C/zh not_active Expired - Lifetime
- 1995-11-16 KR KR1019970703282A patent/KR970706901A/ko not_active Application Discontinuation
- 1995-11-16 EP EP95938018A patent/EP0792687B1/en not_active Expired - Lifetime
- 1995-11-16 JP JP51592896A patent/JP3282184B2/ja not_active Expired - Lifetime
- 1995-11-16 DE DE69529420T patent/DE69529420T2/de not_active Expired - Lifetime
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01135842A (ja) * | 1987-11-21 | 1989-05-29 | Agency Of Ind Science & Technol | 光触媒固定膜 |
JPH0549861A (ja) * | 1991-08-21 | 1993-03-02 | Mitsui Eng & Shipbuild Co Ltd | シート状環境浄化装置 |
JPH05337337A (ja) * | 1991-12-21 | 1993-12-21 | Franz D Oeste | ガス,廃ガス,蒸気及びゾルの浄化方法及び装置 |
JPH081010A (ja) * | 1994-06-21 | 1996-01-09 | Mitsui Mining & Smelting Co Ltd | 貼付用光触媒体 |
Cited By (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6228480B1 (en) | 1995-06-19 | 2001-05-08 | Nippon Soda Co., Ltd. | Photocatalyst-carrying structure and photocatalyst coating material |
EP0824127A3 (en) * | 1996-08-14 | 1998-05-27 | Japan Synthetic Rubber Co., Ltd. | Water-type dispersion composition |
EP0866101A1 (en) * | 1996-10-08 | 1998-09-23 | Nippon Soda Co., Ltd. | Photocatalytic coating composition and photocatalyst-bearing structure |
EP0866101A4 (en) * | 1996-10-08 | 2002-04-17 | Nippon Soda Co | PHOTOCATALYTIC COATING COMPOSITION AND PHOTOCATALYST CONTAINING SYSTEM |
JPH10128229A (ja) * | 1996-11-01 | 1998-05-19 | Toto Ltd | 防汚性膜構造材 |
JPH10237397A (ja) * | 1997-02-24 | 1998-09-08 | Nitto Denko Corp | 粘着テープ |
WO1999005231A1 (fr) * | 1997-07-22 | 1999-02-04 | Rhodia Chimie | Dispersion de particules de titane comprenant un liant a base d'un polyorganosiloxane |
FR2766494A1 (fr) * | 1997-07-22 | 1999-01-29 | Rhodia Chimie Sa | Dispersion de particules de titane comprenant un liant a base d'un polyorganosiloxane |
JPH11227091A (ja) * | 1998-02-13 | 1999-08-24 | Ne Chemcat Corp | 光触媒担持基板の製造法 |
JPH11291408A (ja) * | 1998-04-06 | 1999-10-26 | Shin Etsu Chem Co Ltd | 親水性塗膜を有する物品 |
JP2001105535A (ja) * | 1999-10-13 | 2001-04-17 | Hiraoka & Co Ltd | 変退色防止性に優れた着色シート |
JP2001113640A (ja) * | 1999-10-15 | 2001-04-24 | Hiraoka & Co Ltd | 防汚性シート |
JP2001232215A (ja) * | 2000-02-25 | 2001-08-28 | Nippon Soda Co Ltd | 抗菌及び防黴効果を有する光触媒担持構造体 |
JP2001327872A (ja) * | 2000-05-24 | 2001-11-27 | Cleanup Corp | 光触媒性被膜及びその製造方法 |
JP2002045705A (ja) * | 2000-08-08 | 2002-02-12 | Nippon Soda Co Ltd | 光触媒担持構造体及び光触媒層形成用組成物 |
JP2003181998A (ja) * | 2002-09-24 | 2003-07-03 | Hiraoka & Co Ltd | 変退色防止性に優れた着色シート |
JP2008006389A (ja) * | 2006-06-30 | 2008-01-17 | Takiron Co Ltd | 光触媒部材 |
JP4695553B2 (ja) * | 2006-06-30 | 2011-06-08 | タキロン株式会社 | 光触媒部材 |
JP2011020009A (ja) * | 2009-07-13 | 2011-02-03 | Hokkaido Univ | 揮発性芳香族化合物分解用光触媒体および光触媒機能製品 |
JP2011031136A (ja) * | 2009-07-30 | 2011-02-17 | Toto Ltd | 光触媒塗装体、および光触媒コーティング液 |
JP2015192983A (ja) * | 2014-03-24 | 2015-11-05 | Toto株式会社 | 光触媒塗装体およびそのための光触媒コーティング液 |
CN106824293A (zh) * | 2017-03-06 | 2017-06-13 | 东北大学秦皇岛分校 | 一种纳米二氧化钛光催化降解剂及其制备方法 |
Also Published As
Publication number | Publication date |
---|---|
CN1164198A (zh) | 1997-11-05 |
DE69529420D1 (de) | 2003-02-20 |
KR970706901A (ko) | 1997-12-01 |
EP0792687A4 (en) | 1998-05-06 |
DE69529420T2 (de) | 2003-08-14 |
EP0792687A1 (en) | 1997-09-03 |
US6191062B1 (en) | 2001-02-20 |
ATE231031T1 (de) | 2003-02-15 |
EP0792687B1 (en) | 2003-01-15 |
CN1070736C (zh) | 2001-09-12 |
ES2186733T3 (es) | 2003-05-16 |
JP3282184B2 (ja) | 2002-05-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO1996014932A1 (fr) | Materiau fonctionnel photocatalytique et son procede de production | |
CN102159317B (zh) | 亲水性薄膜以及使用该亲水性薄膜的构件和结构物 | |
JP3559892B2 (ja) | 光触媒皮膜およびその形成方法 | |
WO1995015816A1 (fr) | Substance multifonction a effet photocatalytique et procede de production | |
TW200829345A (en) | Method for protecting substrate | |
CN1701105A (zh) | 光催化剂涂布液、光催化剂膜和光催化剂构件 | |
CN106163802B (zh) | 带抗菌层的基材、抗菌片、放射线摄影装置、触控面板 | |
JP2004346201A (ja) | 水性塗料組成物、抗菌性部材及び塗膜形成方法 | |
JP6283922B1 (ja) | 光触媒材及び光触媒塗料組成物 | |
JP2004346202A (ja) | 水性塗料組成物、抗菌性部材及び塗膜形成方法 | |
WO2015133316A1 (ja) | 光触媒塗工液及びそれを用いた光触媒フィルム | |
JP5368720B2 (ja) | 光触媒塗膜及び光触媒組成物 | |
JPH07304616A (ja) | 抗菌・抗カビ性複合微粒子分散液、その製造方法、および透明コーティング液 | |
JP2013216596A (ja) | 抗菌剤、抗菌剤分散液、およびこれを用いた抗菌加工製品 | |
JP3250394B2 (ja) | 光触媒作用を有する部材、光触媒薄膜形成用組成物、及び光触媒作用を有する部材の製造方法 | |
JP2002273234A (ja) | 光触媒体の製造方法 | |
JP3653761B2 (ja) | 光触媒を有する部材の形成方法 | |
JPH07222928A (ja) | 金属微粒子を含む触媒を有する部材の作製方法 | |
JP4110279B2 (ja) | 光触媒皮膜を塗布した基材および光触媒皮膜を基材上に形成する方法 | |
JP4576811B2 (ja) | 機能性建築部材の製造方法 | |
JP3866147B2 (ja) | 加工性,隠蔽性,光触媒活性に優れた塗装金属板及びその製造方法 | |
JP2000063733A (ja) | 光触媒機能を有するプレコート鋼板 | |
WO1999033565A1 (fr) | Photocatalyseur a base d'oxyde de titane, procede de preparation et utilisation de ce dernier | |
CA2204768C (en) | Photocatalytic functional material and method of production thereof | |
US11964739B2 (en) | Coatings that reduce or prevent barnacle attachment to a marine structure |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WWE | Wipo information: entry into national phase |
Ref document number: 95196286.8 Country of ref document: CN |
|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): CA CN JP KR US |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): AT BE CH DE DK ES FR GB GR IE IT LU MC NL PT SE |
|
DFPE | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101) | ||
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
ENP | Entry into the national phase |
Ref document number: 2204768 Country of ref document: CA Ref document number: 2204768 Country of ref document: CA Kind code of ref document: A |
|
WWE | Wipo information: entry into national phase |
Ref document number: 08849645 Country of ref document: US Ref document number: 1995938018 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1019970703282 Country of ref document: KR |
|
WWP | Wipo information: published in national office |
Ref document number: 1995938018 Country of ref document: EP |
|
WWP | Wipo information: published in national office |
Ref document number: 1019970703282 Country of ref document: KR |
|
WWR | Wipo information: refused in national office |
Ref document number: 1019970703282 Country of ref document: KR |
|
WWG | Wipo information: grant in national office |
Ref document number: 1995938018 Country of ref document: EP |