WO1994011931B1 - Appareil et procede permettant de maintenir propre une fenetre de laser - Google Patents

Appareil et procede permettant de maintenir propre une fenetre de laser

Info

Publication number
WO1994011931B1
WO1994011931B1 PCT/US1993/010191 US9310191W WO9411931B1 WO 1994011931 B1 WO1994011931 B1 WO 1994011931B1 US 9310191 W US9310191 W US 9310191W WO 9411931 B1 WO9411931 B1 WO 9411931B1
Authority
WO
WIPO (PCT)
Prior art keywords
cavity
optical element
gases
debris
movement
Prior art date
Application number
PCT/US1993/010191
Other languages
English (en)
Other versions
WO1994011931A1 (fr
Filing date
Publication date
Priority claimed from US07/975,385 external-priority patent/US5359620A/en
Application filed filed Critical
Priority to EP93924408A priority Critical patent/EP0669047B1/fr
Priority to CA002149215A priority patent/CA2149215C/fr
Priority to JP06512106A priority patent/JP3103595B2/ja
Priority to DE69323211T priority patent/DE69323211T2/de
Publication of WO1994011931A1 publication Critical patent/WO1994011931A1/fr
Publication of WO1994011931B1 publication Critical patent/WO1994011931B1/fr

Links

Abstract

Dans une cavité de laser, un premier gaz est ionisé par une décharge électrique envoyée dans cette cavité pour contribuer à produire un rayonnement énergétique. Des débris (particulaires) sont produits pendant la formation de ce rayonnement énergétique. Le rayonnement et les débris se déplacent vers un élément optique, placé dans la cavité, qui peut être une fenêtre ou un miroir. Les débris tendent à se déposer partout dans la cavité, y compris sur l'élément optique qu'ils viennent ainsi souiller, ce qui nuit à l'efficacité du fonctionnement du laser. On envoie un gaz propre dans la cavité, au travers d'un passage (54) éloigné de l'élément optique (56). Ce gaz propre pénètre dans la cavité par un orifice (65) plus éloigné de l'élément optique que le passage. Le flux du premier gaz au travers de l'orifice crée un effet venturi sur le gaz propre, faisant en sorte que ce dernier s'éloigne de l'élément optique. Ce gaz propre empêche ainsi le premier gaz et les débris de se diriger vers l'élément optique. Des déflecteurs (62), placés dans la cavité entre le passage et l'orifice, provoquent des irrégularités de mouvement pour le premier gaz allant de l'orifice à l'élément optique, ce qui contribue encore à empêcher le déplacement des débris vers l'élément optique. Des déflecteurs (68), placés dans la cavité entre le passage et l'élément optique, préviennent aussi le mouvement de tout gaz vers l'élément optique. Un écran relié (66) électriquement à la terre, situé dans le passage éloigné, attire tous les ions présents dans le gaz propre.
PCT/US1993/010191 1992-11-12 1993-10-25 Appareil et procede permettant de maintenir propre une fenetre de laser WO1994011931A1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP93924408A EP0669047B1 (fr) 1992-11-12 1993-10-25 Appareil et procede permettant de maintenir propre une fenetre de laser
CA002149215A CA2149215C (fr) 1992-11-12 1993-10-25 Appareil et methode servant a garder propre une fenetre de laser
JP06512106A JP3103595B2 (ja) 1992-11-12 1993-10-25 レーザのクリーンウィンドウ維持装置及びその方法
DE69323211T DE69323211T2 (de) 1992-11-12 1993-10-25 Verfahren und Vorrichtung zum Aufrechterhalten eines sauberen Laserfensters

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/975,385 US5359620A (en) 1992-11-12 1992-11-12 Apparatus for, and method of, maintaining a clean window in a laser
US975,385 1992-11-12

Publications (2)

Publication Number Publication Date
WO1994011931A1 WO1994011931A1 (fr) 1994-05-26
WO1994011931B1 true WO1994011931B1 (fr) 1994-08-04

Family

ID=25522974

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1993/010191 WO1994011931A1 (fr) 1992-11-12 1993-10-25 Appareil et procede permettant de maintenir propre une fenetre de laser

Country Status (7)

Country Link
US (1) US5359620A (fr)
EP (1) EP0669047B1 (fr)
JP (1) JP3103595B2 (fr)
CA (1) CA2149215C (fr)
DE (1) DE69323211T2 (fr)
SG (1) SG54129A1 (fr)
WO (1) WO1994011931A1 (fr)

Families Citing this family (95)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5729564A (en) * 1996-07-31 1998-03-17 Visx, Incorporated Electrostatic precipitator for a gas discharge laser
US6019575A (en) * 1997-09-12 2000-02-01 United Technologies Corporation Erosion energy dissipater
DE29716875U1 (de) * 1997-09-19 1997-11-20 Tui Laser Ag Excimerlaser
US20020127497A1 (en) * 1998-09-10 2002-09-12 Brown Daniel J. W. Large diffraction grating for gas discharge laser
US6567450B2 (en) 1999-12-10 2003-05-20 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6865210B2 (en) * 2001-05-03 2005-03-08 Cymer, Inc. Timing control for two-chamber gas discharge laser system
US7856044B2 (en) 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
US6625191B2 (en) * 1999-12-10 2003-09-23 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
US6801560B2 (en) 1999-05-10 2004-10-05 Cymer, Inc. Line selected F2 two chamber laser system
US6904073B2 (en) * 2001-01-29 2005-06-07 Cymer, Inc. High power deep ultraviolet laser with long life optics
US7132123B2 (en) * 2000-06-09 2006-11-07 Cymer, Inc. High rep-rate laser with improved electrodes
US6690706B2 (en) * 2000-06-09 2004-02-10 Cymer, Inc. High rep-rate laser with improved electrodes
US7180081B2 (en) * 2000-06-09 2007-02-20 Cymer, Inc. Discharge produced plasma EUV light source
US6711202B2 (en) * 2000-06-09 2004-03-23 Cymer, Inc. Discharge laser with porous insulating layer covering anode discharge surface
US6914919B2 (en) * 2000-06-19 2005-07-05 Cymer, Inc. Six to ten KHz, or greater gas discharge laser system
US6693939B2 (en) 2001-01-29 2004-02-17 Cymer, Inc. Laser lithography light source with beam delivery
US6912052B2 (en) * 2000-11-17 2005-06-28 Cymer, Inc. Gas discharge MOPA laser spectral analysis module
US6839372B2 (en) * 2000-11-17 2005-01-04 Cymer, Inc. Gas discharge ultraviolet laser with enclosed beam path with added oxidizer
US20050025882A1 (en) * 2001-01-29 2005-02-03 Partlo William N. Optical elements with protective undercoating
US7190707B2 (en) * 2001-01-29 2007-03-13 Cymer, Inc. Gas discharge laser light source beam delivery unit
US6704340B2 (en) 2001-01-29 2004-03-09 Cymer, Inc. Lithography laser system with in-place alignment tool
US6704339B2 (en) 2001-01-29 2004-03-09 Cymer, Inc. Lithography laser with beam delivery and beam pointing control
US7230965B2 (en) * 2001-02-01 2007-06-12 Cymer, Inc. Anodes for fluorine gas discharge lasers
US7079564B2 (en) * 2001-04-09 2006-07-18 Cymer, Inc. Control system for a two chamber gas discharge laser
US6690704B2 (en) 2001-04-09 2004-02-10 Cymer, Inc. Control system for a two chamber gas discharge laser
US7230964B2 (en) * 2001-04-09 2007-06-12 Cymer, Inc. Lithography laser with beam delivery and beam pointing control
US7039086B2 (en) * 2001-04-09 2006-05-02 Cymer, Inc. Control system for a two chamber gas discharge laser
US7167499B2 (en) * 2001-04-18 2007-01-23 Tcz Pte. Ltd. Very high energy, high stability gas discharge laser surface treatment system
US7061959B2 (en) * 2001-04-18 2006-06-13 Tcz Gmbh Laser thin film poly-silicon annealing system
US7009140B2 (en) * 2001-04-18 2006-03-07 Cymer, Inc. Laser thin film poly-silicon annealing optical system
US7439530B2 (en) 2005-06-29 2008-10-21 Cymer, Inc. LPP EUV light source drive laser system
US6928093B2 (en) * 2002-05-07 2005-08-09 Cymer, Inc. Long delay and high TIS pulse stretcher
US20050259709A1 (en) 2002-05-07 2005-11-24 Cymer, Inc. Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
US7465946B2 (en) 2004-03-10 2008-12-16 Cymer, Inc. Alternative fuels for EUV light source
US7378673B2 (en) 2005-02-25 2008-05-27 Cymer, Inc. Source material dispenser for EUV light source
US7372056B2 (en) 2005-06-29 2008-05-13 Cymer, Inc. LPP EUV plasma source material target delivery system
US7598509B2 (en) 2004-11-01 2009-10-06 Cymer, Inc. Laser produced plasma EUV light source
US6768765B1 (en) * 2001-06-07 2004-07-27 Lambda Physik Ag High power excimer or molecular fluorine laser system
EP1280246B1 (fr) 2001-07-25 2006-03-08 TuiLaser AG Laser à décharge dans le gaz
US7088758B2 (en) 2001-07-27 2006-08-08 Cymer, Inc. Relax gas discharge laser lithography light source
US6963595B2 (en) * 2001-08-29 2005-11-08 Cymer, Inc. Automatic gas control system for a gas discharge laser
US7830934B2 (en) * 2001-08-29 2010-11-09 Cymer, Inc. Multi-chamber gas discharge laser bandwidth control through discharge timing
KR100940782B1 (ko) * 2001-09-13 2010-02-11 사이머 인코포레이티드 향상된 전극을 구비한 고반복률 레이저
US7095774B2 (en) * 2001-09-13 2006-08-22 Cymer, Inc. Cathodes for fluorine gas discharge lasers
US7339973B2 (en) * 2001-09-13 2008-03-04 Cymer, Inc. Electrodes for fluorine gas discharge lasers
US20050100072A1 (en) * 2001-11-14 2005-05-12 Rao Rajasekhar M. High power laser output beam energy density reduction
US7671349B2 (en) 2003-04-08 2010-03-02 Cymer, Inc. Laser produced plasma EUV light source
US6798812B2 (en) 2002-01-23 2004-09-28 Cymer, Inc. Two chamber F2 laser system with F2 pressure based line selection
US7301980B2 (en) * 2002-03-22 2007-11-27 Cymer, Inc. Halogen gas discharge laser electrodes
US7016388B2 (en) * 2002-05-07 2006-03-21 Cymer, Inc. Laser lithography light source with beam delivery
US7741639B2 (en) * 2003-01-31 2010-06-22 Cymer, Inc. Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control
US7217941B2 (en) 2003-04-08 2007-05-15 Cymer, Inc. Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source
US7277188B2 (en) 2003-04-29 2007-10-02 Cymer, Inc. Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
US7209507B2 (en) * 2003-07-30 2007-04-24 Cymer, Inc. Method and apparatus for controlling the output of a gas discharge MOPA laser system
US6973112B2 (en) * 2003-07-31 2005-12-06 Visx, Incorporated Passive gas flow management and filtration device for use in an excimer or transverse discharge laser
US6894785B2 (en) * 2003-09-30 2005-05-17 Cymer, Inc. Gas discharge MOPA laser spectral analysis module
US6873418B1 (en) 2003-09-30 2005-03-29 Cymer, Inc. Optical mountings for gas discharge MOPA laser spectral analysis module
US7277464B2 (en) * 2003-12-18 2007-10-02 Cymer, Inc. Method and apparatus for controlling the output of a gas discharge laser system
US20060146906A1 (en) * 2004-02-18 2006-07-06 Cymer, Inc. LLP EUV drive laser
US7196342B2 (en) 2004-03-10 2007-03-27 Cymer, Inc. Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source
US7522650B2 (en) * 2004-03-31 2009-04-21 Cymer, Inc. Gas discharge laser chamber improvements
US7006547B2 (en) * 2004-03-31 2006-02-28 Cymer, Inc. Very high repetition rate narrow band gas discharge laser system
US20050286599A1 (en) * 2004-06-29 2005-12-29 Rafac Robert J Method and apparatus for gas discharge laser output light coherency reduction
US7355191B2 (en) 2004-11-01 2008-04-08 Cymer, Inc. Systems and methods for cleaning a chamber window of an EUV light source
US7482609B2 (en) 2005-02-28 2009-01-27 Cymer, Inc. LPP EUV light source drive laser system
US20060222034A1 (en) 2005-03-31 2006-10-05 Cymer, Inc. 6 Khz and above gas discharge laser system
US7365349B2 (en) 2005-06-27 2008-04-29 Cymer, Inc. EUV light source collector lifetime improvements
US7141806B1 (en) 2005-06-27 2006-11-28 Cymer, Inc. EUV light source collector erosion mitigation
US7317536B2 (en) 2005-06-27 2008-01-08 Cymer, Inc. Spectral bandwidth metrology for high repetition rate gas discharge lasers
US7633989B2 (en) 2005-06-27 2009-12-15 Cymer, Inc. High pulse repetition rate gas discharge laser
US7180083B2 (en) 2005-06-27 2007-02-20 Cymer, Inc. EUV light source collector erosion mitigation
US7653095B2 (en) * 2005-06-30 2010-01-26 Cymer, Inc. Active bandwidth control for a laser
US7394083B2 (en) 2005-07-08 2008-07-01 Cymer, Inc. Systems and methods for EUV light source metrology
US20070071047A1 (en) * 2005-09-29 2007-03-29 Cymer, Inc. 6K pulse repetition rate and above gas discharge laser system solid state pulse power system improvements
US7706424B2 (en) * 2005-09-29 2010-04-27 Cymer, Inc. Gas discharge laser system electrodes and power supply for delivering electrical energy to same
US7317179B2 (en) 2005-10-28 2008-01-08 Cymer, Inc. Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate
US7679029B2 (en) 2005-10-28 2010-03-16 Cymer, Inc. Systems and methods to shape laser light as a line beam for interaction with a substrate having surface variations
US7453077B2 (en) 2005-11-05 2008-11-18 Cymer, Inc. EUV light source
US7812329B2 (en) 2007-12-14 2010-10-12 Cymer, Inc. System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
US7655925B2 (en) 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
JP5499432B2 (ja) * 2007-10-05 2014-05-21 ソニー株式会社 撮像装置
US8519366B2 (en) 2008-08-06 2013-08-27 Cymer, Inc. Debris protection system having a magnetic field for an EUV light source
US7756171B2 (en) * 2008-10-21 2010-07-13 Cymer, Inc. Method and apparatus for laser control in a two chamber gas discharge laser
US7720120B2 (en) * 2008-10-21 2010-05-18 Cymer, Inc. Method and apparatus for laser control in a two chamber gas discharge laser
US7751453B2 (en) * 2008-10-21 2010-07-06 Cymer, Inc. Method and apparatus for laser control in a two chamber gas discharge laser
JP5687488B2 (ja) 2010-02-22 2015-03-18 ギガフォトン株式会社 極端紫外光生成装置
US9066412B2 (en) * 2010-04-15 2015-06-23 Asml Netherlands B.V. Systems and methods for cooling an optic
CN102769246A (zh) * 2012-08-01 2012-11-07 山东能源机械集团大族再制造有限公司 一种二氧化碳激光器
US9341752B2 (en) 2012-11-07 2016-05-17 Asml Netherlands B.V. Viewport protector for an extreme ultraviolet light source
US9497840B2 (en) * 2013-09-26 2016-11-15 Asml Netherlands B.V. System and method for creating and utilizing dual laser curtains from a single laser in an LPP EUV light source
US9241395B2 (en) * 2013-09-26 2016-01-19 Asml Netherlands B.V. System and method for controlling droplet timing in an LPP EUV light source
JP6031064B2 (ja) * 2014-05-15 2016-11-24 ファナック株式会社 ガス循環式のレーザ発振装置
CN105226484A (zh) * 2015-11-11 2016-01-06 成都微深科技有限公司 一种具有漏粒子收集装置的二氧化碳激光器
KR102493940B1 (ko) * 2017-12-05 2023-01-30 사이머 엘엘씨 레이저 방전 체임버 내의 먼지 포집용 부직포 스크린
CN108418083A (zh) * 2018-02-08 2018-08-17 北京科益虹源光电技术有限公司 一种用于激光器的窗口结构及准分子激光器

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3212928C2 (de) * 1982-04-07 1984-01-26 Lambda Physik GmbH, 3400 Göttingen Entladungsgepumpter Laser
US4611327A (en) * 1983-11-25 1986-09-09 Amoco Corporation Gas transport laser system
JPS6269575A (ja) * 1985-09-21 1987-03-30 Ushio Inc ガスレ−ザ管の汚損防止装置
US4737963A (en) * 1986-01-03 1988-04-12 Amada Engineering Service Co., Inc. Laser tube for a laser generator
JPS6364377A (ja) * 1986-09-04 1988-03-22 Mitsubishi Electric Corp レ−ザ発振器
JPS63108786A (ja) * 1986-10-25 1988-05-13 Hitachi Ltd ガスレ−ザ発生装置
JPH0714089B2 (ja) * 1987-05-18 1995-02-15 ファナック株式会社 レ−ザ発振装置及びレ−ザ発振装置のレ−ザガスの封入方法
US4959840A (en) * 1988-01-15 1990-09-25 Cymer Laser Technologies Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser
JPH02310978A (ja) * 1989-05-25 1990-12-26 Hitachi Ltd 金属蒸気レーザ装置
KR920001791A (ko) * 1990-06-01 1992-01-30 다께바야시 쇼오고 가스레이저 장치

Similar Documents

Publication Publication Date Title
WO1994011931B1 (fr) Appareil et procede permettant de maintenir propre une fenetre de laser
CA2149215A1 (fr) Appareil et methode servant a garder propre une fenetre de laser
US4376637A (en) Apparatus and method for destructive removal of particles contained in flowing fluid
US4534034A (en) Discharge-pumped laser
KR0148563B1 (ko) 내연기관 및 외연기관에 있어서 매연처리 저감방법 및 그 장치
AU757797B2 (en) Method and apparatus for laser analysis of dioxins
US4434562A (en) Curing apparatus and method
ATE210337T1 (de) Vorrichtung und verfahren zu filtern von makropartikeln aus einem plasmastrahl
EP0945892A3 (fr) Dispositif et méthode pour nettoyer une source d' ions en cours d' utilisation
DE69617858T2 (de) Reinigungsverfahren und Vorrichtung für Vacuumröhre in einem CVD-System
JPH06201567A (ja) 質量スペクトル測定用手段を含む装置
DE3689109D1 (de) Vorrichtung und verfahren fuer die rueckfuehrung von wasser.
US3765153A (en) Apparatus for removing contaminants entrained in a gas stream
AU719504B2 (en) Electrostatic precipitator for a gas discharge laser
EP0476255A2 (fr) Procédé pour la génération d'air ionisé
WO2002019378A3 (fr) Systeme permettant d'extraire des particules dans un faisceau ionique et technique a cet effet
JPH08508448A (ja) 汚染空気を浄化する移動式装置
US5476538A (en) Method of removing aerosols by the radiation effect
WO2003026799A1 (fr) Extraction de mercure elementaire par photo-ionisation
KR900019219A (ko) 빔 디포지션법 및 이를 실시하기 위한 장치
JP3101744B2 (ja) 排ガス処理方法および排ガス処理装置
JPH09245992A (ja) X線発生装置
US5870664A (en) Method and apparatus for removing impurity by an improved electrode
US6798814B2 (en) Gas discharge laser, method of operating a gas discharge laser, and use of a sintered filter
US5567935A (en) Velocity selected laser ablation metal atom source