US5729564A
(en)
*
|
1996-07-31 |
1998-03-17 |
Visx, Incorporated |
Electrostatic precipitator for a gas discharge laser
|
US6019575A
(en)
*
|
1997-09-12 |
2000-02-01 |
United Technologies Corporation |
Erosion energy dissipater
|
DE29716875U1
(de)
*
|
1997-09-19 |
1997-11-20 |
TUI Laser AG, 82166 Gräfelfing |
Excimerlaser
|
US6567450B2
(en)
|
1999-12-10 |
2003-05-20 |
Cymer, Inc. |
Very narrow band, two chamber, high rep rate gas discharge laser system
|
US20020127497A1
(en)
*
|
1998-09-10 |
2002-09-12 |
Brown Daniel J. W. |
Large diffraction grating for gas discharge laser
|
US6801560B2
(en)
*
|
1999-05-10 |
2004-10-05 |
Cymer, Inc. |
Line selected F2 two chamber laser system
|
US6865210B2
(en)
|
2001-05-03 |
2005-03-08 |
Cymer, Inc. |
Timing control for two-chamber gas discharge laser system
|
US6625191B2
(en)
*
|
1999-12-10 |
2003-09-23 |
Cymer, Inc. |
Very narrow band, two chamber, high rep rate gas discharge laser system
|
US7856044B2
(en)
*
|
1999-05-10 |
2010-12-21 |
Cymer, Inc. |
Extendable electrode for gas discharge laser
|
US7180081B2
(en)
*
|
2000-06-09 |
2007-02-20 |
Cymer, Inc. |
Discharge produced plasma EUV light source
|
US6711202B2
(en)
*
|
2000-06-09 |
2004-03-23 |
Cymer, Inc. |
Discharge laser with porous insulating layer covering anode discharge surface
|
US6690706B2
(en)
*
|
2000-06-09 |
2004-02-10 |
Cymer, Inc. |
High rep-rate laser with improved electrodes
|
US7132123B2
(en)
*
|
2000-06-09 |
2006-11-07 |
Cymer, Inc. |
High rep-rate laser with improved electrodes
|
US6904073B2
(en)
*
|
2001-01-29 |
2005-06-07 |
Cymer, Inc. |
High power deep ultraviolet laser with long life optics
|
US6693939B2
(en)
|
2001-01-29 |
2004-02-17 |
Cymer, Inc. |
Laser lithography light source with beam delivery
|
US6914919B2
(en)
*
|
2000-06-19 |
2005-07-05 |
Cymer, Inc. |
Six to ten KHz, or greater gas discharge laser system
|
US6912052B2
(en)
*
|
2000-11-17 |
2005-06-28 |
Cymer, Inc. |
Gas discharge MOPA laser spectral analysis module
|
US6839372B2
(en)
*
|
2000-11-17 |
2005-01-04 |
Cymer, Inc. |
Gas discharge ultraviolet laser with enclosed beam path with added oxidizer
|
US6704339B2
(en)
|
2001-01-29 |
2004-03-09 |
Cymer, Inc. |
Lithography laser with beam delivery and beam pointing control
|
US20050025882A1
(en)
*
|
2001-01-29 |
2005-02-03 |
Partlo William N. |
Optical elements with protective undercoating
|
US7190707B2
(en)
*
|
2001-01-29 |
2007-03-13 |
Cymer, Inc. |
Gas discharge laser light source beam delivery unit
|
US6704340B2
(en)
|
2001-01-29 |
2004-03-09 |
Cymer, Inc. |
Lithography laser system with in-place alignment tool
|
US7230965B2
(en)
*
|
2001-02-01 |
2007-06-12 |
Cymer, Inc. |
Anodes for fluorine gas discharge lasers
|
US7230964B2
(en)
*
|
2001-04-09 |
2007-06-12 |
Cymer, Inc. |
Lithography laser with beam delivery and beam pointing control
|
US7079564B2
(en)
|
2001-04-09 |
2006-07-18 |
Cymer, Inc. |
Control system for a two chamber gas discharge laser
|
US6690704B2
(en)
|
2001-04-09 |
2004-02-10 |
Cymer, Inc. |
Control system for a two chamber gas discharge laser
|
US7039086B2
(en)
*
|
2001-04-09 |
2006-05-02 |
Cymer, Inc. |
Control system for a two chamber gas discharge laser
|
US7061959B2
(en)
*
|
2001-04-18 |
2006-06-13 |
Tcz Gmbh |
Laser thin film poly-silicon annealing system
|
US7009140B2
(en)
*
|
2001-04-18 |
2006-03-07 |
Cymer, Inc. |
Laser thin film poly-silicon annealing optical system
|
US7167499B2
(en)
*
|
2001-04-18 |
2007-01-23 |
Tcz Pte. Ltd. |
Very high energy, high stability gas discharge laser surface treatment system
|
US20050259709A1
(en)
|
2002-05-07 |
2005-11-24 |
Cymer, Inc. |
Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
|
US7378673B2
(en)
|
2005-02-25 |
2008-05-27 |
Cymer, Inc. |
Source material dispenser for EUV light source
|
US7439530B2
(en)
|
2005-06-29 |
2008-10-21 |
Cymer, Inc. |
LPP EUV light source drive laser system
|
US7598509B2
(en)
|
2004-11-01 |
2009-10-06 |
Cymer, Inc. |
Laser produced plasma EUV light source
|
US7465946B2
(en)
|
2004-03-10 |
2008-12-16 |
Cymer, Inc. |
Alternative fuels for EUV light source
|
US7372056B2
(en)
|
2005-06-29 |
2008-05-13 |
Cymer, Inc. |
LPP EUV plasma source material target delivery system
|
US6928093B2
(en)
*
|
2002-05-07 |
2005-08-09 |
Cymer, Inc. |
Long delay and high TIS pulse stretcher
|
US6768765B1
(en)
*
|
2001-06-07 |
2004-07-27 |
Lambda Physik Ag |
High power excimer or molecular fluorine laser system
|
DE50109133D1
(de)
|
2001-07-25 |
2006-05-04 |
Tuilaser Ag |
Gasentladungslaser
|
US7088758B2
(en)
|
2001-07-27 |
2006-08-08 |
Cymer, Inc. |
Relax gas discharge laser lithography light source
|
US6963595B2
(en)
*
|
2001-08-29 |
2005-11-08 |
Cymer, Inc. |
Automatic gas control system for a gas discharge laser
|
US7830934B2
(en)
*
|
2001-08-29 |
2010-11-09 |
Cymer, Inc. |
Multi-chamber gas discharge laser bandwidth control through discharge timing
|
US7339973B2
(en)
*
|
2001-09-13 |
2008-03-04 |
Cymer, Inc. |
Electrodes for fluorine gas discharge lasers
|
US7095774B2
(en)
*
|
2001-09-13 |
2006-08-22 |
Cymer, Inc. |
Cathodes for fluorine gas discharge lasers
|
KR100940782B1
(ko)
*
|
2001-09-13 |
2010-02-11 |
사이머 인코포레이티드 |
향상된 전극을 구비한 고반복률 레이저
|
US20050100072A1
(en)
*
|
2001-11-14 |
2005-05-12 |
Rao Rajasekhar M. |
High power laser output beam energy density reduction
|
US7671349B2
(en)
*
|
2003-04-08 |
2010-03-02 |
Cymer, Inc. |
Laser produced plasma EUV light source
|
US6798812B2
(en)
|
2002-01-23 |
2004-09-28 |
Cymer, Inc. |
Two chamber F2 laser system with F2 pressure based line selection
|
US7301980B2
(en)
*
|
2002-03-22 |
2007-11-27 |
Cymer, Inc. |
Halogen gas discharge laser electrodes
|
US7016388B2
(en)
*
|
2002-05-07 |
2006-03-21 |
Cymer, Inc. |
Laser lithography light source with beam delivery
|
US7741639B2
(en)
*
|
2003-01-31 |
2010-06-22 |
Cymer, Inc. |
Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control
|
US7217941B2
(en)
|
2003-04-08 |
2007-05-15 |
Cymer, Inc. |
Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source
|
US7277188B2
(en)
|
2003-04-29 |
2007-10-02 |
Cymer, Inc. |
Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
|
US7209507B2
(en)
*
|
2003-07-30 |
2007-04-24 |
Cymer, Inc. |
Method and apparatus for controlling the output of a gas discharge MOPA laser system
|
US6973112B2
(en)
|
2003-07-31 |
2005-12-06 |
Visx, Incorporated |
Passive gas flow management and filtration device for use in an excimer or transverse discharge laser
|
US6873418B1
(en)
|
2003-09-30 |
2005-03-29 |
Cymer, Inc. |
Optical mountings for gas discharge MOPA laser spectral analysis module
|
US6894785B2
(en)
*
|
2003-09-30 |
2005-05-17 |
Cymer, Inc. |
Gas discharge MOPA laser spectral analysis module
|
US7277464B2
(en)
*
|
2003-12-18 |
2007-10-02 |
Cymer, Inc. |
Method and apparatus for controlling the output of a gas discharge laser system
|
US20060146906A1
(en)
*
|
2004-02-18 |
2006-07-06 |
Cymer, Inc. |
LLP EUV drive laser
|
US7196342B2
(en)
|
2004-03-10 |
2007-03-27 |
Cymer, Inc. |
Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source
|
US7006547B2
(en)
*
|
2004-03-31 |
2006-02-28 |
Cymer, Inc. |
Very high repetition rate narrow band gas discharge laser system
|
US7522650B2
(en)
*
|
2004-03-31 |
2009-04-21 |
Cymer, Inc. |
Gas discharge laser chamber improvements
|
US20050286599A1
(en)
*
|
2004-06-29 |
2005-12-29 |
Rafac Robert J |
Method and apparatus for gas discharge laser output light coherency reduction
|
US7355191B2
(en)
|
2004-11-01 |
2008-04-08 |
Cymer, Inc. |
Systems and methods for cleaning a chamber window of an EUV light source
|
US7482609B2
(en)
|
2005-02-28 |
2009-01-27 |
Cymer, Inc. |
LPP EUV light source drive laser system
|
US20060222034A1
(en)
|
2005-03-31 |
2006-10-05 |
Cymer, Inc. |
6 Khz and above gas discharge laser system
|
US7365349B2
(en)
|
2005-06-27 |
2008-04-29 |
Cymer, Inc. |
EUV light source collector lifetime improvements
|
US7141806B1
(en)
|
2005-06-27 |
2006-11-28 |
Cymer, Inc. |
EUV light source collector erosion mitigation
|
US7180083B2
(en)
|
2005-06-27 |
2007-02-20 |
Cymer, Inc. |
EUV light source collector erosion mitigation
|
US7317536B2
(en)
|
2005-06-27 |
2008-01-08 |
Cymer, Inc. |
Spectral bandwidth metrology for high repetition rate gas discharge lasers
|
US7633989B2
(en)
*
|
2005-06-27 |
2009-12-15 |
Cymer, Inc. |
High pulse repetition rate gas discharge laser
|
US7653095B2
(en)
*
|
2005-06-30 |
2010-01-26 |
Cymer, Inc. |
Active bandwidth control for a laser
|
US7394083B2
(en)
|
2005-07-08 |
2008-07-01 |
Cymer, Inc. |
Systems and methods for EUV light source metrology
|
US7706424B2
(en)
*
|
2005-09-29 |
2010-04-27 |
Cymer, Inc. |
Gas discharge laser system electrodes and power supply for delivering electrical energy to same
|
US20070071047A1
(en)
*
|
2005-09-29 |
2007-03-29 |
Cymer, Inc. |
6K pulse repetition rate and above gas discharge laser system solid state pulse power system improvements
|
US7679029B2
(en)
|
2005-10-28 |
2010-03-16 |
Cymer, Inc. |
Systems and methods to shape laser light as a line beam for interaction with a substrate having surface variations
|
US7317179B2
(en)
|
2005-10-28 |
2008-01-08 |
Cymer, Inc. |
Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate
|
US7453077B2
(en)
|
2005-11-05 |
2008-11-18 |
Cymer, Inc. |
EUV light source
|
US7655925B2
(en)
|
2007-08-31 |
2010-02-02 |
Cymer, Inc. |
Gas management system for a laser-produced-plasma EUV light source
|
US7812329B2
(en)
|
2007-12-14 |
2010-10-12 |
Cymer, Inc. |
System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
|
JP5499432B2
(ja)
*
|
2007-10-05 |
2014-05-21 |
ソニー株式会社 |
撮像装置
|
US8519366B2
(en)
|
2008-08-06 |
2013-08-27 |
Cymer, Inc. |
Debris protection system having a magnetic field for an EUV light source
|
US7720120B2
(en)
*
|
2008-10-21 |
2010-05-18 |
Cymer, Inc. |
Method and apparatus for laser control in a two chamber gas discharge laser
|
US7751453B2
(en)
*
|
2008-10-21 |
2010-07-06 |
Cymer, Inc. |
Method and apparatus for laser control in a two chamber gas discharge laser
|
US7756171B2
(en)
*
|
2008-10-21 |
2010-07-13 |
Cymer, Inc. |
Method and apparatus for laser control in a two chamber gas discharge laser
|
JP5687488B2
(ja)
|
2010-02-22 |
2015-03-18 |
ギガフォトン株式会社 |
極端紫外光生成装置
|
US9066412B2
(en)
*
|
2010-04-15 |
2015-06-23 |
Asml Netherlands B.V. |
Systems and methods for cooling an optic
|
CN102769246A
(zh)
*
|
2012-08-01 |
2012-11-07 |
山东能源机械集团大族再制造有限公司 |
一种二氧化碳激光器
|
US9341752B2
(en)
|
2012-11-07 |
2016-05-17 |
Asml Netherlands B.V. |
Viewport protector for an extreme ultraviolet light source
|
US9241395B2
(en)
*
|
2013-09-26 |
2016-01-19 |
Asml Netherlands B.V. |
System and method for controlling droplet timing in an LPP EUV light source
|
US9497840B2
(en)
*
|
2013-09-26 |
2016-11-15 |
Asml Netherlands B.V. |
System and method for creating and utilizing dual laser curtains from a single laser in an LPP EUV light source
|
JP6031064B2
(ja)
|
2014-05-15 |
2016-11-24 |
ファナック株式会社 |
ガス循環式のレーザ発振装置
|
CN105226484A
(zh)
*
|
2015-11-11 |
2016-01-06 |
成都微深科技有限公司 |
一种具有漏粒子收集装置的二氧化碳激光器
|
US11614012B2
(en)
*
|
2017-12-05 |
2023-03-28 |
Cymer, Llc |
Nonwoven screens for dust trapping in laser discharge chambers
|
CN108418083A
(zh)
*
|
2018-02-08 |
2018-08-17 |
北京科益虹源光电技术有限公司 |
一种用于激光器的窗口结构及准分子激光器
|