Classifications

• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/02—Pretreatment of the material to be coated
  • C23C14/021—Cleaning or etching treatments
  • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
  • C23C10/06—Solid state diffusion of only metal elements or silicon into metallic material surfaces using gases
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
  • C23C14/24—Vacuum evaporation
  • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
  • C23C14/325—Electric arc evaporation
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
  • C23C14/54—Controlling or regulating the coating process
  • C23C14/541—Heating or cooling of the substrates

Definitions

• the temperature of the reaction of carbidization would be 500-540 ° C, and this as a material for the cutting tool used steel.
• the temperature of the carbidization reaction would be equal to 620-680°C, ⁇ vaya hard alloy.
• titanium nitride as an evaporating carbon base material.
• a titanium alloy be used as a vaporizable carbide base material.
• the resulting invention allows to stabilize the composition of the formation of the thickness, which reduces the technical process of its application. Otherwise, the present invention excludes the risk of an explosion safety situation.
• the best variant of the existence of the invention material consists in evaporating the carbide-bearing material in a vacuum with an arc discharge and applying voltage to the cutting tool. P ⁇ - ⁇ m they clean and warm up the working air of the cutting tool of the ka ⁇ day b ⁇ mbardpr ⁇ v ⁇ y and karbidization reaction temperature running tool. Then we vaporize the ⁇ carbid ⁇ - ⁇ brazcheg ⁇ material ⁇ yadensi ⁇ yu ⁇ at the working ⁇ ve ⁇ - n ⁇ st and ⁇ sya ⁇ vy ⁇ ezhushchego iyas ⁇ rumenta d ⁇ ⁇ braz ⁇ vania ⁇ - shelters.
• ⁇ -5 - carbide of the building material is used titanium.
• Titanium was used as a vaporized carbide-forming material, and as a material, steel of the following composition was used:
• the coating was applied to the cutting inserts.
• a hard alloy of the following composition was used:
• the application of the penetration is similar to example I, with the exception of ⁇ g ⁇ , which is to clean the working surface of the plates of the bottom bombardi ⁇ v ⁇ ⁇ th and ⁇ nage of titanium pr ⁇ v ⁇ dizh with its heating up to a temperature of 620°C.
• Tests were carried out on five slabs for each batch in the following modes: cutting speed V - 160 m/min; ⁇ dacha ⁇ -0.3 mm/ ⁇ b; cutting depth I - I mm.
• Titanium nitrate is used as a vaporizable carbon fiber material
• steel is used as a core material in Example I.
• the working surface of the drills of the cataract b ⁇ mbardi ⁇ v ⁇ y and ⁇ nami nitrida ⁇ ita with ⁇ dn ⁇ temporary and temperature 5 ⁇ 0° ⁇ .
• the voltage was syaizhazh d ⁇ 300 V and in the course of ⁇ réelle ⁇ minutes there was a ⁇ nden ⁇ atshchya and ⁇ n ⁇ v ni ⁇ tita n ⁇ t on the working load drill, s ⁇ pr ⁇ v ⁇ awaiting him by carbidization with carbon steel.
• the thickness of the coating representing titanium carbide (N C) was 2 ⁇ m.
• a titanium alloy of the following composition is used:
• Titanium alloy was used as the vaporized carbide-forming material, with teriala ⁇ sn ⁇ vy ⁇ hard alloy, making up ⁇ g ⁇ privedey in example 2.
• the application of the hole is similar to the example, with the exception of ⁇ g ⁇ , which is to clean the working surface of the drills of the bottom bomber ⁇ with titanium, aluminum and molybdenum pr ⁇ even with a daytime heating up to a temperature of 650 ° ⁇ .
• Example 7 Application of the application on twist drills ⁇ 5 mm.
• Example 8 Coating coating on cutting plates.
• composition ⁇ Example 2 ⁇ stzh plates may exist up to a temperature of 680°C. Testing of plates is also similar to example 2. The test results are shown in Table 8.
• test results given in the example 1,2,3,4,5,6,7,8 st ⁇ - -II- typical characteristics of drills.
• the total invention allows to increase the rate of closure with a rate of 0.1-0.7 m ⁇ m/min, which reduces the time of the technical ⁇ g ⁇ cycle.
• This invention can be successfully used to obtain here the melting of wear and tear on the cutting tool, burnt from any materials containing carbon in its composition, such as experience, hard alloys, ceramic alloys and others.

Landscapes

• Chemical & Material Sciences (AREA)
• Chemical Kinetics & Catalysis (AREA)
• Engineering & Computer Science (AREA)
• Materials Engineering (AREA)
• Mechanical Engineering (AREA)
• Metallurgy (AREA)
• Organic Chemistry (AREA)
• Physical Vapour Deposition (AREA)
• Drilling Tools (AREA)
• Cutting Tools, Boring Holders, And Turrets (AREA)
• Materials For Medical Uses (AREA)
• Food-Manufacturing Devices (AREA)

Priority Applications (15)

Applications Claiming Priority (1)

Publications (1)

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ID=21616808

Family Applications (1)

Country Status (15)

Cited By (1)

Families Citing this family (7)

Citations (1)

Family Cites Families (6)

• 1983
  • 1983-08-25 NL NL8320315A patent/NL8320315A/nl not_active Application Discontinuation
  • 1983-08-25 DE DE19833390523 patent/DE3390523C2/de not_active Expired - Lifetime
  • 1983-08-25 GB GB08508273A patent/GB2155044B/en not_active Expired
  • 1983-08-25 JP JP83503277A patent/JPS60502110A/ja active Pending
  • 1983-08-25 AT AT0908483A patent/AT382892B/de not_active IP Right Cessation
  • 1983-08-25 BR BR8307748A patent/BR8307748A/pt not_active IP Right Cessation
  • 1983-08-25 WO PCT/SU1983/000030 patent/WO1985001071A1/ru active IP Right Grant
  • 1983-08-25 CH CH1660/85A patent/CH666054A5/de not_active IP Right Cessation
  • 1983-08-25 AU AU20735/83A patent/AU559857B2/en not_active Ceased
  • 1983-12-29 FR FR8321028A patent/FR2557595B1/fr not_active Expired
• 1984
  • 1984-01-04 CA CA000444620A patent/CA1216252A/en not_active Expired
• 1985
  • 1985-03-27 SE SE8501521A patent/SE454705B/sv not_active IP Right Cessation
  • 1985-04-09 DK DK159385A patent/DK159385D0/da not_active IP Right Cessation
  • 1985-04-12 FI FI851485A patent/FI80296C/fi not_active IP Right Cessation
  • 1985-04-18 NO NO851558A patent/NO851558L/no unknown

Patent Citations (1)

Non-Patent Citations (2)

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